JP7202168B2 - Film forming apparatus, organic EL panel manufacturing system, and film forming method - Google Patents

Description

The present invention relates to a film forming apparatus for forming a film on a substrate, an organic EL panel manufacturing system, and a film forming method.

In the manufacture of an electronic device such as an organic EL element, a substrate such as glass is placed on a mask with the film formation surface facing downward, and a film is formed on the film formation surface through the mask. From the viewpoint of film quality, it is necessary to form a film with a uniform film thickness, and for this purpose, it is necessary to adhere the substrate and the mask while forming the film.

Therefore, Patent Literature 1 describes a method of forming a film by attracting a metal mask to a substrate by the magnetic force of a magnet. This patent document 1 describes that plate-like magnets are brought close to the substrate one by one from one end of the substrate to the opposite end to bring the metal mask into close contact with the substrate.

Japanese Patent Application Laid-Open No. 2004-152704

However, as the size of the substrate increases, when the substrate is placed on the mask, the weight of the substrate causes both the substrate and the mask to bend into a mortar shape. Thus, when both the substrate and the mask are bent into a mortar shape, even by the method described in Patent Document 1, the bending of the mask is not partially eliminated and a gap is formed between the substrate and the mask. It happened. If the film is formed in a state in which the mask remains warped, it leads to variations in the film thickness.

SUMMARY OF THE INVENTION An object of the present invention is to prevent the mask from remaining flexed when the mask is brought into close contact with the substrate.

According to the first aspect of the present invention, a film forming apparatus includes a mask holding part for holding a mask on which a substrate is placed, a plurality of magnets for attracting the mask, and a main body to which the plurality of magnets are attached. and is arranged above the position where the mask is held by the mask holding part, and the main surface descends in an inclined state and further descends to rotate to a horizontal state . and a movable first member, each of the plurality of magnets having a magnetic pole surface opposite the surface attached to the main surface, and the plurality of magnets oriented in a predetermined direction along the main surface. a first pair of magnets arranged adjacent to each other with a first spacing, wherein the magnetic poles of the magnetic pole faces are different from each other, and a second spacing wider than the first spacing. and a second pair of magnets arranged in alignment and having different magnetic polarities on the magnetic pole faces.
According to the second aspect of the present invention, the film forming apparatus includes a mask holding part for holding a mask on which a substrate is placed, a plurality of magnets for attracting the mask, and a main body to which the plurality of magnets are attached. and is positioned above the position at which the mask is held by the mask holding portion, and is rotated so that the main surface descends in an inclined state and further descends to turn into a horizontal state. a first member, each of the plurality of magnets having a pole face opposite the face attached to the major surface, the plurality of magnets oriented in a predetermined direction along the major surface; a third magnet pair having a first magnetic force and having different magnetic poles on the magnetic pole faces, and arranged adjacent to each other at a position sandwiched between the third magnet pair, and a fourth magnet pair having a second magnetic force weaker than the first magnetic force, wherein the magnetic poles of the magnetic pole faces are different from each other.

According to the present invention, when the mask is brought into close contact with the substrate, it is possible to prevent the residual deflection of the mask.

1 is a schematic diagram of a film forming apparatus according to a first embodiment; FIG. (a) is a plan view of the magnet unit according to the first embodiment. (b) is a cross-sectional view of the magnet unit taken along line IIB-IIB in (a). It is a figure for demonstrating the magnet group in 1st Embodiment. (a), (b) and (c) are diagrams for explaining some steps of the film forming method according to the first embodiment. (a) and (b) is a figure for demonstrating the one part process of the film-forming method which concerns on 1st Embodiment. (a) is a plan view of a magnet unit according to a second embodiment. (b) is a cross-sectional view of the magnet unit taken along line VIB-VIB in (a). (a) is a plan view of a magnet unit according to a third embodiment. (b) is a sectional view of the magnet unit taken along line VIIB--VIIB in (a). (a) is a plan view of a magnet unit according to a fourth embodiment. (b) is a sectional view of the magnet unit taken along line VIIIB-VIIIB of (a). (a) is a plan view of a magnet unit according to a fifth embodiment. (b) is a cross-sectional view of the magnet unit taken along line IXB-IXB of (a). (a) is a plan view of a magnet unit according to a sixth embodiment. (b) is a cross-sectional view of the magnet unit along line XB-XB of (a). FIG. 11 is a schematic configuration diagram of a manufacturing system according to a seventh embodiment;

Preferred embodiments of the present invention will be described below with reference to the drawings. However, the embodiments described below merely exemplify preferred configurations of the present invention, and do not limit the scope of the present invention to those configurations. Also, in the following description, the hardware configuration and software configuration of the device, manufacturing conditions, dimensions, materials, shapes, etc. are not intended to limit the scope of the present invention only to them, unless otherwise specified. Absent.

[First embodiment]
FIG. 1 is a schematic diagram of a film forming apparatus 100 according to the first embodiment. The film forming apparatus 100 forms a thin film (material layer) having a desired pattern on the surface of a parallel plate glass substrate 5, which is an example of a substrate, by vacuum deposition. Any material such as an organic material or an inorganic material (for example, a metal or a metal oxide) can be selected as the vapor deposition material. Specifically, it can be applied to manufacturing equipment for electronic devices (eg, organic EL display devices, thin-film solar cells). In the present embodiment, the film forming apparatus 100 is used in a film forming step among the manufacturing steps of an organic EL element in which an organic thin film is formed on the surface of a glass substrate 5 as a film forming substrate. The film forming apparatus 100 of the present embodiment shown in FIG. 1 is a vapor deposition apparatus, but is not limited to this. There may be. In FIG. 1, the vertical direction is the Z direction, and two horizontal directions perpendicular to the Z direction are the X direction and the Y direction.

The film forming apparatus 100 includes an apparatus main body 100A and a control section 50 that controls the apparatus main body 100A. The apparatus main body 100A includes a chamber 4 having a film forming space 2 for forming a film forming material on a glass substrate 5 and a gate valve 15 for carrying the glass substrate 5 into/out of the chamber 4 . The apparatus main body 100A also includes a positioning mechanism 1 that holds the glass substrate 5 and the mask 6 placed in the film forming space 2 inside the chamber 4 and positions the glass substrate 5 and the mask 6 relative to each other. Prepare. The apparatus main body 100 A also includes a mask suction mechanism 14 that sucks the mask 6 and brings the mask 6 into close contact with the glass substrate 5 . A film formation source (vapor deposition source) 7 containing a film formation material is provided in the film formation space 2 of the chamber 4 .

The positioning mechanism 1 has a plate 10 provided outside the chamber 4 and a drive section 11 that drives the plate 10 . The positioning mechanism 1 also has a substrate holding part 8 provided inside the chamber 4 to hold the glass substrate 5 and a mask holding part 9 provided inside the chamber 4 to hold the mask 6 . After placing the glass substrate 5 on the mask 6 , the substrate holding part 8 retreats from the glass substrate 5 .

A shaft 12 is fixed to the plate 10 . The shaft 12 extends from the outside to the inside of the chamber 4 through a through hole provided in the upper partition wall 3 of the chamber 4 . A substrate holding part 8 is attached to the lower part of the shaft 12 so that the glass substrate 5 can be held in the film forming space 2 . The through hole provided in the upper partition wall 3 is formed to be larger than the outer diameter of the shaft 12 so that the shaft 12 and the upper partition wall 3 do not interfere with each other. Outside the chamber 4 the shaft 12 is covered by a bellows 13 fixed to the plate 10 and the upper partition 3 .

The mask suction mechanism 14 has a drive section 16 and a plate 19 driven up and down in the Z direction by the drive section 16 . Actuator 16 and plate 19 are arranged outside chamber 4 .

A shaft 21 is fixed to the plate 19 . The shaft 21 extends through the outside and inside of the chamber 4 through a through-hole provided in the upper partition wall 3 of the chamber 4 . A substrate pressing portion 17 made of a material that is not attracted by magnetic force, that is, a magnetic material other than a ferromagnetic material, such as a diamagnetic material, is provided below the shaft 21 . The through-hole provided in the upper partition wall 3 is formed larger than the outer diameter of the shaft 21 so that the shaft 21 and the upper partition wall 3 do not interfere with each other. Outside the chamber 4 the shaft 21 is covered by a bellows 41 fixed to the plate 19 and the upper partition 3 . The substrate holding portion 17 includes a substrate holding plate 20, which is an example of a second member and contacts the glass substrate 5 when lowered by driving the driving portion 16, and an abutment block 23 attached to the upper surface of the substrate holding plate 20. and have

Here, one of the main items in the film formation quality is the uniformity of the film thickness. For example, when an electrode layer is formed by film formation, if the thickness of the electrode layer varies, the resistance value of the electrode layer also varies, leading to uneven light emission. For that purpose, it is necessary to form the film so that the film thickness is uniform. Therefore, in the present embodiment, the mask attracting mechanism 14 attracts the mask 6 made of a material that can be attracted by magnetic force, such as a ferromagnetic material, and brings the mask 6 into close contact with the glass substrate 5 .

The mask suction mechanism 14 has a drive section 18 , an elevation unit 22 driven up and down in the Z direction by the drive section 18 , and a magnet unit 24 rotatably supported by the elevation unit 22 . The lifting unit 22 and the magnet unit 24 are arranged inside the chamber 4 and above the position of the mask 6 held by the mask holding part 9 . The substrate holding portion 17 has a box shape, and an elevating unit 22 and a magnet unit 24 are arranged inside. The substrate pressing plate 20 is the bottom plate of the substrate pressing portion 17 . The substrate pressing plate 20 is arranged so as to be positioned between the magnet unit 24 and the glass substrate 5 .

The magnet unit 24 has a yoke 29 as a first member and a plurality of magnets 30 attached to the yoke 29 . The yoke 29 is rotatably supported on the lifting unit 22 by a shaft 25 extending in the Y direction. The yoke 29 is a plate-shaped member having a main surface 291 which is a lower surface on the substrate side and a surface 292 which is an upper surface opposite to the main surface 291 . A plurality of magnets 30 are attached to the main surface 291 of the yoke 29 . Each magnet 30 is fixed to the yoke 29 by its own magnetic force, but may be further fixed to the yoke 29 by a fixing member such as an adhesive.

The driving part 18 is arranged outside the chamber 4 and fixed to the plate 19 . The lifting unit 22 is connected to a shaft 28 extending from the drive section 18 . The lifting unit 22 and the magnet unit 24 are driven up and down in the Z direction relative to the substrate pressing portion 17 through the shaft 28 by the driving portion 18 .

The shaft 28 extends through the outside and inside of the chamber 4 through a through hole provided in the upper partition wall 3 of the chamber 4 . A lifting unit 22 is attached to the lower portion of the shaft 28 . The through hole provided in the upper partition wall 3 is formed to be larger than the outer diameter of the shaft 28 so that the shaft 28 and the upper partition wall 3 do not interfere with each other. Outside the chamber 4 the shaft 28 is covered by a bellows 42 .

A surface 292 of the yoke 29 is provided with a stopper 26 that can be engaged with and disengaged from the lifting unit 22 and a stopper 27 that can be engaged with and disengaged from the abutment block 23 . When the stopper 27 is separated from the abutting block 23, the magnet unit 24 rotates around the shaft 25 due to its own weight, and the main surface 291 is inclined with respect to the horizontal state. The main surface 291 is held in an inclined state at a predetermined angle with respect to the horizontal state by the stopper 26 engaging, that is, being caught by the lifting unit 22 .

The inclination angle of the magnet unit 24, that is, the main surface 291 is determined by the length of the stopper 26 in the Z direction. The stopper 26 is adjustable in length in the Z direction, and the inclination angle of the magnet unit 24, that is, the main surface 291 can be adjusted to a desired predetermined angle. Further, the magnet unit 24 descends by the shaft 28 so that the stopper 27 abuts against the abutment block 23 . Thereafter, the magnet unit 24 is further lowered to rotate about the shaft 25, and the main surface 291 changes from the inclined state to the horizontal state. The mechanism for rotating the magnet unit 24 is not limited to the one described above, and the magnet unit 24 may be rotated directly by an actuator.

Since the shafts 12, 21, and 28 are confined in a closed space communicating with the chamber 4 by the bellows 13, 41, and 42, the entire shafts 12, 21, and 28 are kept in the same state as the deposition space 2 (for example, , vacuum).

Bellows 13, 41 and 42 are preferably flexible in the X, Y and Z directions. As a result, the resistance generated when the bellows 13, 41, and 42 are displaced by the positioning mechanism 1 can be sufficiently reduced, and the load during position adjustment can be reduced.

The mask holder 9 is installed on the surface of the upper partition wall 3 on the film forming space side inside the chamber 4, and holds the mask 6 in a horizontal state. The mask 6 is made of a material that is attracted by magnetic force, and has a mask foil 6A and a mask frame 6B to which the mask foil 6A is fixed. The mask foil 6A is formed with openings corresponding to the film formation pattern. The mask frame 6B has higher rigidity than the mask foil 6A so as to support the glass substrate 5, and is fixed to the mask holder 9 while the mask foil 6A is stretched. The mask foil 6A of the mask 6 is attracted by magnetic force as the magnet unit 24 approaches. The mask foil 6A attracted by the magnetic force is pressed against the substrate holding plate 20 together with the glass substrate 5, so that the glass substrate 5 and the mask foil 6A can be brought into close contact with each other.

A series of operations of the positioning mechanism 1 , the mask suction mechanism 14 , and the film formation source 7 are controlled by the controller 50 . The control unit 50 can be configured by, for example, a computer having a processor, memory, storage, I/O, and the like. In this case, the functions of the control unit 50 are implemented by the processor executing programs stored in the memory or storage. As the computer, a general-purpose personal computer may be used, or a built-in computer or PLC (programmable logic controller) may be used. Alternatively, part or all of the functions of the control unit 270 may be configured with a circuit such as ASIC or FPGA. The control unit 50 may be provided for each film forming apparatus, or one control unit 50 may control a plurality of film forming apparatuses.

As the size of the glass substrate 5 increases, when the glass substrate 5 is placed on the mask 6 , the central portion of the glass substrate 5 and the mask 6 bends into a mortar shape due to the weight of the glass substrate 5 . If there is a difference between the warped shape of the glass substrate 5 and the warped shape of the mask 6 , a gap is generated between the glass substrate 5 and the mask 6 .

The magnet unit 24 of the mask suction mechanism 14 will be specifically described below. FIG. 2(a) is a plan view of the magnet unit 24 according to the first embodiment. FIG. 2(b) is a sectional view of the magnet unit 24 along line IIB-IIB in FIG. 2(a).

A plurality of magnets 30 are provided on the main surface 291 of the yoke 29 . A main surface 291 of the yoke 29 has a rectangular shape and is approximately the same size as the mask foil 6A shown in FIG. The plurality of magnets 30 are arranged in a matrix in an arrangement direction A1 parallel to an imaginary axis L1 that is the center of rotation and an arrangement direction A2 perpendicular to the arrangement direction A1 along the main surface 291. ing. Axis L1 is at the center of axis 25 .

Each magnet 30 is a permanent magnet and has a pair of magnetic pole faces 31 and 32 with magnetic poles as S or N poles. That is, if the magnetic pole of one of the pair of magnetic pole faces 31 and 32 is the S pole, the magnetic pole of the other magnetic pole face is the N pole. In this embodiment, the magnets 30 are rectangular in plan view, and have the same size and magnetic force. The pole face 32 of each magnet 30 is attached to the major face 291 of the yoke 29, with the opposite pole face 31 facing outward. In the present embodiment, the plurality of magnets 30 are arranged so that the magnetic poles of the magnetic pole faces 31 alternate between N poles and S poles in the arrangement direction A2, which is a predetermined direction. The plurality of magnets 30 are arranged such that the magnetic poles of the magnetic pole faces 31 are of the same polarity in the arrangement direction A1. Since the magnets 30 whose magnetic pole on the magnetic pole surface 31 is the S pole and the magnets 30 whose magnetic pole on the magnetic pole surface 31 is the N pole are alternately arranged in the arrangement direction A2, two magnets 30 adjacent to each other in the arrangement direction A2 are arranged. A magnetic circuit is formed at In FIG. 2A, magnets with the same polarity are connected to each other in the arrangement direction A1, but the present invention is not limited to this. may

In FIGS. 2(a) and 2(b), the magnets whose magnetic pole faces 31 are N poles are shown by hatching, and the magnets whose magnetic pole faces 31 are S poles are shown by diagonal hatching. The central portion P1 of the arrangement pattern of the plurality of magnets 30, which is surrounded by a two-dot chain line in FIG. part.

Among the plurality of magnets 30, the magnet group 130 positioned at the center in the arrangement direction A1 will be described. FIG. 2(b) shows a cross section of the magnet group 130. As shown in FIG. The multiple magnets 30 include a magnet group 130 located in the center in the arrangement direction A1. The magnet group 130 consists of a plurality of magnets 30 ₁ to 30 ₁₆ arranged in the arrangement direction A2. In FIG. 2(b), the pole faces 31 of the magnets 30 ₁ , 30 ₃ , 30 ₅ , 30 ₇ , 30 ₉ , 30 ₁₁ , 30 ₁₃ and 30 ₁₅ are south poles, and the magnets 30 ₂ , 30 ₄ and 30 The pole faces 31 of ₆ , 30 ₈ , 30 ₁₀ , 30 ₁₂ , 30 ₁₄ and 30 ₁₆ are north poles. Thus, in the magnet group 130, the magnetic poles of the magnetic pole faces 31 are arranged in the arrangement direction A2 such that the S poles and the N poles are alternately arranged. In addition, in the magnet group 130, there may be a part of the arrangement in which the magnetic poles of the magnetic pole faces of adjacent magnets are of the same polarity.

The magnet group 130 includes magnet pairs 131 which are first magnet pairs arranged adjacent to each other at a first interval D1 and having different magnetic poles on the magnetic pole faces 31 . The magnet group 130 includes magnet pairs 132 which are second magnet pairs arranged adjacent to each other at a distance D2, which is a second distance wider than the distance D1, and having different magnetic poles on the magnetic pole faces 31 . In the magnet group 130, there are a plurality of first magnet pairs, one example of which is the magnet pair 131 consisting of the magnets _30-10 and _30-11 . Magnet pair 132 is magnet _30-8 and magnet _30-9 . In this embodiment, the magnet pair 131 and the magnet pair 132 are adjacent to each other.

FIG. 3 is a diagram for explaining the magnet group 130 in the first embodiment. The polarities of the magnets _30-10 and _30-11 adjacent to each other in the magnet pair 131 are opposite to each other. Also, the polarities of the magnets ₃₀₈ and 309 adjacent to each other _in the magnet pair 132 are opposite to each other.

The magnetic flux (magnetic circuit) generated by the magnet pair 131 is B1, and the magnetic flux (magnetic circuit) generated by the magnet pair 132 is B2. In FIG. 3, the magnetic fluxes B1 and B2 are indicated by dashed lines. The magnetic flux B2 has a lower density than the magnetic flux B1 and spreads over a wider range than the magnetic flux B1 because the distance D2 between the magnets ₃₀₈ and 309 _in the magnet pair 132 is wider than the distance D1. Therefore, the magnet pair 132 has a lower attractive force than the magnet pair 131 , but has an attractive force greater than or equal to a predetermined force over a wider range (that is, farther) than the magnet pair 132 . Therefore, the attractive force due to the magnetic flux B2 of the magnet pair 132 is stronger than the attractive force due to the magnetic flux B1 of the magnet pair 131 at a distance, and is weaker than the attractive force due to the magnetic flux B1 of the magnet pair 131 at a near distance.

As shown in FIG. 2B, the magnet pair 132 is preferably located on the center C1 side of the magnet group 130 relative to the magnet pair 131. In the present embodiment, the magnet pair 132 straddles the center C1. is located in In this embodiment, the magnet pair 132 is positioned at the central portion P1 (FIG. 2(a)) of the arrangement pattern of the plurality of magnets 30. As shown in FIG. The distance D3 between the magnet pair 131 and the magnet pair 132 shown in FIG. 3 is within the range of the distance D1 or more and the distance D2 or less, and is the same distance as the distance D1 in this embodiment. That is, only the distance between the magnets ₃₀₈ and ₃₀₉ is D2, and the distance between the other two magnets is D1.

Next, a film forming method for forming a film on the glass substrate 5 using the film forming apparatus 100 shown in FIG. 1 will be described. First, the process of placing the glass substrate 5 on the mask 6 will be described. It is assumed that the glass substrate 5 is held by the substrate holding portion 8 shown in FIG. By driving the substrate holding unit 8 by the drive unit 11 , the glass substrate 5 and the mask 6 are aligned, and the glass substrate 5 is placed on the mask 6 . When the glass substrate 5 is placed on the mask 6 , the weight of the glass substrate 5 causes the glass substrate 5 and the mask foil 6</b>A to bend into a mortar shape. Since the glass substrate 5 and the mask 6 are aligned with each other, the amount of bending of the glass substrate 5 and the mask foil 6A is maximized at the central portion of the glass substrate 5 and the mask foil 6A.

When the placement of the glass substrate 5 on the mask foil 6A is completed, the driving section 16 lowers the substrate holding portion 17 to a predetermined position while holding the substrate holding plate 20 of the substrate holding portion 17 in a horizontal state. A plate 20 is brought into contact with the glass substrate 5 .

Next, the process of bringing the glass substrate 5 and the mask foil 6A into close contact with each other by the mask suction mechanism 14 will be described. FIGS. 4(a), 4(b), 4(c), 5(a), and 5(b) are for explaining some steps of the film forming method according to the first embodiment. is a diagram. 4(a), 4(b), 4(c), 5(a), and 5(b), the mask foil 6A and the glass substrate 5 are separated from the time when the yoke 29 starts to descend. 4 schematically illustrates the process until the two come into close contact with each other. 4(a), 4(b), 4(c), 5(a), and 5(b) show the magnet group 130 of the plurality of magnets 30. . 4(a), 4(b), 4(c), 5(a), and 5(b) schematically show the attractive forces received by the magnets 30 with arrows. ing. The length of the arrow indicates the range of the suction force greater than or equal to the predetermined force, and the thickness of the arrow indicates the strength of the suction force.

As shown in FIG. 4(a), the substrate pressing plate 20 is in contact with the glass substrate 5, but the glass substrate 5 and the mask foil 6A of the mask 6 are bent in a mortar shape. The yoke 29 is held above the substrate holding plate 20 while being inclined at a predetermined angle. At that time, the magnet unit 24 is arranged so that the lower end portion of the yoke 29 in the inclination direction coincides with the end portion of the mask foil 6A in the X direction and the Y direction. Also, the magnet unit 24 is arranged so that the central portion P1 of the array pattern of the plurality of magnets 30 in FIG.

Next, as shown in FIG. 4B, the lifting unit 22 and the magnet unit 24 are lowered while the stopper 26 is engaged with the lifting unit 22, that is, with the main surface 291 of the yoke 29 being inclined. As _a result, the attractive force of the magnet 301 positioned near the lower end of the yoke 29 in the tilt direction acts on one end of the mask foil 6A in the X direction. Then, as the magnet unit 24 gradually descends, the magnet 30 ₂ , the magnet 30 ₃ , . As a result, the mask foil 6A is gradually attracted to the magnet unit 24 from one end of the mask foil 6A in the X direction toward the other end.

At this time, since the mask foil 6A is attracted to the magnet unit 24, the glass substrate 5 is also pushed up by the mask foil 6A and brought into close contact with the substrate holding plate 20. As shown in FIG. Furthermore, in this embodiment, since the magnets _30-8 and _30-9 located in the central portion of the yoke 29 form a magnetic circuit at a distance, the central portion of the mask foil 6A is also attracted. In this manner, the central portion of the mask foil 6A and the central portion of the glass substrate 5 are brought into close contact with each other, and the mask foil 6A and the glass substrate are gradually separated from one end of the mask foil 6A to the other end while the flexure of the mask foil 6A is evened out. The contact area with 5 spreads.

In some cases, the central portion of the mask foil 6A and the central portion of the glass substrate 5 are already in close contact while the mask foil 6A is being flattened from one end in the X direction to the other end. The attraction force by magnets _30-8 and _30-9 located in the part is relatively weak compared to other magnets. Therefore, by further lowering the elevating unit 22, as shown in FIG. 4(c), the mask foil 6A is pushed by the attractive force of the surrounding magnets, and the bending of the mask foil 6A is eliminated, and the mask foil 6A adheres to the glass substrate 5. do.

After the stopper 27 comes into contact with the abutment block 23 as shown in FIG. 4(c), the lifting unit 22 is further lowered, so that the stopper 26 and the lifting unit 22 are separated from each other as shown in FIG. 5(a). As a result, the yoke 29 rotates around the shaft 25 . As a result, the inclination angle of the main surface 291 of the yoke 29 gradually decreases. In the portion from the central portion to the other end where the mask foil 6A and the glass substrate 5 are not completely in close contact with each other, the bending of the mask foil 6A is eliminated, and the contact area between the glass substrate 5 and the mask foil 6A gradually expands. increase to

By further lowering the lifting unit 22, the main surface 291 changes from the inclined state to the horizontal state as shown in FIG. 5(b). When the lifting unit 22 descends to a predetermined position and the main surface 291 becomes horizontal, the mask foil 6A and the main surface 291 of the yoke 29 become parallel. As a result, the entire surface of the mask foil 6A is brought into close contact with the glass substrate 5. Next, as shown in FIG.

According to the first embodiment, the distance D2 between the two magnets in the magnet pair 132 is wider than the distance D1 between the magnets in the magnet pair 131 . Therefore, the range over which each magnet of the magnet pair 132 exerts an attractive force greater than or equal to a predetermined force is wider than the range over which each magnet of the magnet pair 131 exerts an attractive force greater than or equal to a predetermined force. As a result, when the mask 6 is brought into close contact with the glass substrate 5 , the attractive force of each magnet of the magnet pair 132 reaches the bottom of the portion of the mask 6 that is bent in the shape of a mortar. Therefore, it is possible to effectively suck the mortar-shaped bent portion, and to prevent the mask 6 from remaining bent.

Moreover, since it is the central portion of the mask 6 that bends like a mortar, the closer the magnet pair 132 is to the central portion of the mask 6 the better. Therefore, the magnet pair 132 is preferably located on the center C1 side of the magnet group 130 relative to the magnet pair 131 . In the first embodiment, the magnet pair 132 is located in the central portion P1 of the arrangement pattern of the plurality of magnets 30. As shown in FIG. By arranging the magnet pair 132 at a location corresponding to the central portion of the mask 6 in this way, it is possible to more effectively prevent the residual deflection of the mask 6 .

A magnet group adjacent to the magnet group 130 in the arrangement direction A1 may also have the same configuration as the magnet group 130, although not shown.

[Second embodiment]
A film forming apparatus according to the second embodiment will be described. FIG. 6(a) is a plan view of a magnet unit according to the second embodiment. FIG. 6(b) is a sectional view of the magnet unit taken along line VIB--VIB in FIG. 6(a). In the film forming apparatus of the second embodiment, the configuration of the magnet unit is different from that of the first embodiment, and the configuration other than that is the same as that of the first embodiment, and the description of the similar configuration is omitted. The magnet unit 24A of the second embodiment will be specifically described below.

A main surface 291 of the yoke 29 is provided with a plurality of magnets 30A. A main surface 291 of the yoke 29 has a rectangular shape and is approximately the same size as the mask foil 6A shown in FIG. The plurality of magnets 30A are arranged in a matrix in an arrangement direction A1 parallel to an imaginary axis L1 that is the center of rotation and an arrangement direction A2 perpendicular to the arrangement direction A1 along the main surface 291. ing.

Each magnet 30A is a permanent magnet, and has a pair of magnetic pole faces 31A and 32A whose magnetic poles are S poles or N poles. That is, if the magnetic pole of one of the pair of magnetic pole faces 31A and 32A is the S pole, the magnetic pole of the other magnetic pole face is the N pole. In this embodiment, each magnet 30A is rectangular in plan view and has the same magnetic force. The pole face 32A of each magnet 30A is attached to the major surface 291 of the yoke 29, with the opposite pole face 31A facing outward. In this embodiment, the plurality of magnets 30A are arranged such that the magnetic poles of the magnetic pole faces 31A alternate between N poles and S poles in the arrangement direction A1, which is a predetermined direction. The plurality of magnets 30A are arranged so that the magnetic poles of the magnetic pole faces 31A are of the same polarity in the arrangement direction A2. Since the magnets 30A whose magnetic pole on the magnetic pole surface 31A is the S pole and the magnets 30A whose magnetic pole on the magnetic pole surface 31A is the N pole are alternately arranged in the arrangement direction A1, two magnets 30A adjacent to each other in the arrangement direction A1 are arranged. A magnetic circuit is formed at In FIG. 6A, magnets of the same polarity are connected to each other in the arrangement direction A2, but the present invention is not limited to this, and magnets of the same polarity are arranged at intervals in the arrangement direction A2. may

In FIGS. 6(a) and 6(b), the magnets whose magnetic pole faces 31A serve as N poles are shown by hatching, and the magnets whose magnetic pole faces 31A serve as S poles are shown by diagonal hatching. A central portion P2 of the array pattern of the plurality of magnets 30A, which is surrounded by a two-dot chain line in FIG. part.

Among the plurality of magnets 30A, the magnet group 130A located at the center in the arrangement direction A2 will be described. FIG. 6B shows a cross section of the magnet group 130A. The multiple magnets 30A include a magnet group 130A located in the center in the arrangement direction A2. The magnet group 130A is composed of a plurality of magnets 30A ₁ to 30A ₁₂ arranged in the arrangement direction A1. In FIG. 6(b), the magnetic pole faces 31A of the magnets 30A ₁ , 30A ₃ , 30A ₅ , 30A ₇ , 30A ₉ and 30A ₁₁ are north poles. Magnetic pole faces 31A of magnets 30A ₂ , 30A ₄ , 30A ₆ , 30A ₈ , 30A ₁₀ and 30A ₁₂ are south poles. Thus, in the magnet group 130A, the magnetic poles of the magnetic pole faces 31A are arranged so that the S poles and the N poles are alternately arranged in the arrangement direction A1. In addition, in the magnet group 130A, there may be a part of the arrangement in which the magnetic poles of the magnetic pole faces of the adjacent magnets are of the same polarity.

The magnet group 130A includes magnet pairs 131A, which are first magnet pairs arranged adjacent to each other at a first interval D21 and having different magnetic poles on the magnetic pole faces 31A. Also, the magnet group 130A includes a magnet pair 132A, which is a second magnet pair arranged adjacent to each other with a second spacing D22 wider than the spacing D21 and having different magnetic poles on the magnetic pole faces 31A. In the magnet group 130A, there are a plurality of first magnet pairs, one example of which is a magnet pair 131A consisting of magnets 30A- ₈ and 30A- ₉ . Magnet pair 132A is magnet 30A ₆ and magnet 30A ₇ . In this embodiment, the magnet pair 131A and the magnet pair 132A are adjacent to each other, and the distance therebetween is preferably D21 or more and D22 or less, for example, D21.

As shown in FIG. 6B, the magnet pair 132A is preferably located on the center C2 side of the magnet group 130A relative to the magnet pair 131A. is located in In this embodiment, the magnet pair 132A is located in the central portion P2 (FIG. 6(a)) of the arrangement pattern of the plurality of magnets 30A.

According to the second embodiment, the interval D22 between the two magnets in the magnet pair 132A is wider than the interval D21 between the magnets in the magnet pair 131A. Therefore, the range over which each magnet of the magnet pair 132A exerts an attractive force greater than or equal to a predetermined force is wider than the range over which each magnet of the magnet pair 131A exerts an attractive force greater than or equal to a predetermined force. As a result, when the mask 6 of FIG. 1 is brought into close contact with the glass substrate 5, the attraction force of each magnet of the magnet pair 132A reaches the bottom of the portion of the mask 6 that is bent into a mortar shape. Therefore, it is possible to effectively suck the mortar-shaped bent portion, and to prevent the mask 6 from remaining bent.

Moreover, since it is the central portion of the mask 6 that bends like a mortar, the closer the magnet pair 132A is to the central portion of the mask 6, the better. Therefore, it is preferable that the magnet pair 132A be located on the center C2 side of the magnet group 130A relative to the magnet pair 131A. In the second embodiment, the magnet pair 132A is located in the central portion P2 of the arrangement pattern of the plurality of magnets 30A. By arranging the magnet pair 132A at a location corresponding to the central portion of the mask 6 in this way, it is possible to more effectively prevent the mask 6 from remaining flexed.

A magnet group adjacent to the magnet group 130A in the arrangement direction A2 may also have the same configuration as the magnet group 130A, and in FIG. 6A, has the same configuration as the magnet group 130A.

[Third embodiment]
A film forming apparatus according to the third embodiment will be described. FIG. 7(a) is a plan view of a magnet unit according to the third embodiment. FIG. 7(b) is a sectional view of the magnet unit taken along line VIIB--VIIB in FIG. 7(a). In the film forming apparatus of the third embodiment, the configuration of the magnet unit is different from that of the first embodiment, and the configuration other than that is the same as that of the first embodiment, and the description of the similar configuration is omitted. The magnet unit 24B of the third embodiment will be specifically described below.

A main surface 291 of the yoke 29 is provided with a plurality of magnets 30B. A main surface 291 of the yoke 29 has a rectangular shape and is approximately the same size as the mask foil 6A shown in FIG. The plurality of magnets 30B are arranged in a matrix in an arrangement direction A1 parallel to an imaginary axis L1 that is the center of rotation and an arrangement direction A2 perpendicular to the arrangement direction A1 along the main surface 291. ing.

Each magnet 30B is a permanent magnet and has a pair of magnetic pole faces 31B and 32B with magnetic poles as S poles or N poles. That is, if the magnetic pole of one of the pair of magnetic pole faces 31B and 32B is the S pole, the magnetic pole of the other magnetic pole face is the N pole. In this embodiment, each magnet 30B is rectangular in plan view and has the same magnetic force. The pole face 32B of each magnet 30B is attached to the main face 291 of the yoke 29, with the opposite pole face 31B facing outward. In this embodiment, the plurality of magnets 30B are arranged so that the magnetic poles of the magnetic pole faces 31B alternate between the N poles and the S poles in the arrangement direction A1 and the arrangement direction A2, which are predetermined directions. That is, the plurality of magnets 30B are arranged so that the magnetic poles of the magnetic pole faces 31B are arranged in a zigzag pattern with N poles and S poles. Since the magnet 30B whose magnetic pole on the magnetic pole surface 31B is the S pole and the magnet 30B whose magnetic pole on the magnetic pole surface 31B is the N pole are alternately arranged in the arranging directions A1 and A2, A magnetic circuit is formed by two adjacent magnets 30B.

In FIGS. 7(a) and 7(b), the magnets whose magnetic pole faces 31B are N poles are shown by hatching, and the magnets whose magnetic pole faces 31B are S poles are shown by diagonal hatching. The central portion P3 of the arrangement pattern of the plurality of magnets 30B, which is surrounded by a two-dot chain line in FIG. 7A, corresponds to the bottom portion of the mortar-shaped bent portions of the glass substrate 5 and the mask 6 shown in FIG. part.

Among the plurality of magnets 30B, the magnet group 130B located at the center in the arrangement direction A1 will be described. FIG. 7B shows a cross section of the magnet group 130B. The multiple magnets 30B include a magnet group 130B located in the center in the arrangement direction A1. The magnet group 130B has the same arrangement as the magnet group 130 described in the first embodiment, and includes a magnet pair 131 and a magnet pair 132 . In addition, in the magnet group 130B, there may be a part of the arrangement in which the magnetic poles of the magnetic pole faces of the adjacent magnets are of the same polarity.

Therefore, according to the third embodiment, similarly to the first embodiment, the portion of the mask 6 that is bent in the shape of a mortar can be effectively sucked, and the remaining bending of the mask 6 can be prevented. can.

Although not shown, a magnet group adjacent to the magnet group 130B in the arrangement direction A1 may also have the same configuration as the magnet group 130B.

[Fourth Embodiment]
A film forming apparatus according to the fourth embodiment will be described. FIG. 8(a) is a plan view of a magnet unit according to the fourth embodiment. FIG. 8(b) is a sectional view of the magnet unit taken along line VIIIB-VIIIB in FIG. 8(a). In the film forming apparatus of the fourth embodiment, the configuration of the magnet unit is different from that of the first embodiment, and the configuration other than that is the same as that of the first embodiment, and the description of the similar configuration is omitted. The magnet unit 24C of the fourth embodiment will be specifically described below.

A main surface 291 of the yoke 29 is provided with a plurality of magnets 30C. A main surface 291 of the yoke 29 has a rectangular shape and is approximately the same size as the mask foil 6A shown in FIG. The plurality of magnets 30C are arranged in a matrix in an arrangement direction A1 that is parallel to a virtual axis L1 that is a rotation center and an arrangement direction A2 that is perpendicular to the arrangement direction A1 along the main surface 291. ing.

Each magnet 30C is a permanent magnet and has a pair of magnetic pole faces 31C and 32C with magnetic poles as S or N poles. That is, if the magnetic pole of one of the pair of magnetic pole faces 31C and 32C is the S pole, the magnetic pole of the other magnetic pole face is the N pole. In this embodiment, each magnet 30C has a rectangular shape in a plan view and has the same size. The pole face 32C of each magnet 30C is attached to the major surface 291 of the yoke 29, with the opposite pole face 31C facing outward. In this embodiment, the plurality of magnets 30C are arranged so that the magnetic poles of the magnetic pole faces 31C alternate between N poles and S poles in the arrangement direction A2, which is a predetermined direction. The plurality of magnets 30C are arranged so that the magnetic poles of the magnetic pole faces 31C are of the same polarity in the arrangement direction A1. Since the magnet 30C whose magnetic pole on the magnetic pole surface 31C is the S pole and the magnet 30C whose magnetic pole on the magnetic pole surface 31C is the N pole are alternately arranged in the arrangement direction A2, two magnets 30C adjacent to each other in the arrangement direction A2 are arranged. A magnetic circuit is formed at In FIG. 8A, the magnets with the same polarity are connected in the arrangement direction A1, but the magnets with the same polarity are arranged with a gap in the arrangement direction A2. may

In FIGS. 8(a) and 8(b), the magnets whose magnetic pole faces 31C are N poles are shown by hatching, and the magnets whose magnetic pole faces 31C are S poles are shown by diagonal hatching. A center portion P4 of the arrangement pattern of the plurality of magnets 30C, which is surrounded by a two-dot chain line in FIG. 8A, corresponds to the bottom portion of the mortar-shaped bent portions of the glass substrate 5 and the mask 6 shown in FIG. part.

Among the plurality of magnets 30C, the magnet group 130C located at the center in the arrangement direction A1 will be described. FIG. 8B shows a cross section of the magnet group 130C. The multiple magnets 30C include a magnet group 130C located in the center in the arrangement direction A1. The magnet group 130C consists of a plurality of magnets 30C ₁ to 30C ₁₈ arranged in the arrangement direction A2. In FIG. 8(b), magnetic pole faces 31C of magnets _30C1 , _30C3 , _30C5 , _30C7 , _30C9 , _30C11 , _30C13 , _30C15 , and _30C17 are south poles. Magnetic pole faces 31C of magnets _30C2 , _30C4 , _30C6 , _30C8 , _30C10 , _30C12 , _30C14 , _30C16 , and _30C18 are north poles. Thus, in the magnet group 130C, the magnetic poles of the magnetic pole faces 31C are arranged so that the S poles and the N poles are alternately arranged in the arrangement direction A2. In addition, in the magnet group 130C, there may be a part of the arrangement in which the magnetic poles of the magnetic pole faces of the adjacent magnets are of the same polarity.

The magnet group 130C includes a magnet pair 133C, which is the third magnet pair having the first magnetic force F1. The magnet group 130C also includes a magnet pair 134C, which is a fourth magnet pair having a second magnetic force F2 weaker than the first magnetic force F1. Magnet pair 133C is magnet _30C8 and magnet _30C11 . The magnets 30C- ₈ and 30C- ₁₁ have different magnetic poles on the pole faces 31C. Magnet pair _134C is magnet _30C9 and magnet 30C10. The magnets _30C9 and _30C10 differ from each other in the magnetic poles of the magnetic pole faces 31C. The magnets _30C9 and _30C10 are arranged adjacent to each other in the arrangement direction A2. Magnet _30C8 and magnet _30C11 are arranged with magnet pair 134C interposed therebetween. _In the present embodiment, among the plurality of magnets 30C, all magnets other than the magnets _30C9 and 30C10 have the first magnetic force. The adjacent magnets _30C12 and _30C13 form a magnet pair 135C having the same configuration as the magnet pair 131 (FIG. 3) described in the first embodiment. The magnetic force of a magnet can be measured, for example, with a gaussmeter. The second magnetic force F2 is preferably half or less than the first magnetic force F1. Furthermore, the second magnetic force F2 is preferably 1/3 or less of the first magnetic force F1.

_In this manner, the magnets _30C9 and 30C10 having weaker magnetic forces are arranged between the magnets _30C8 and _30C11 . The magnetic flux (magnetic circuit) formed by the magnets _30C8 , _30C11 , and the magnet pair 133C spreads over a wide range, and the attractive force of a predetermined force or more is generated as in the case of the magnet pair 132 (FIG. 3) described in the first embodiment. It will be wide-ranging. Therefore, the attractive force by the magnetic circuit of the magnet pair 134C is stronger than the attractive force by the magnetic circuit of the magnet pair 135C in the distance, and is weaker than the attractive force by the magnetic circuit of the magnet pair 135C in the vicinity.

The magnet pair 134C is positioned across the center C4 as shown in FIG. 8(b). In this embodiment, the magnet pair 134C is positioned at the central portion P4 (FIG. 8A) of the arrangement pattern of the plurality of magnets 30C.

According to the fourth embodiment, as in the first embodiment, each magnet of the magnet pair 133C widens the range where the attractive force equal to or greater than the predetermined force reaches. As a result, when the mask 6 is brought into close contact with the glass substrate 5 , the attractive force of each magnet of the magnet pair 133</b>C reaches the bottom of the portion of the mask 6 that is bent in the shape of a mortar. Therefore, it is possible to effectively suck the mortar-shaped bent portion, and to prevent the mask 6 from remaining bent.

Moreover, since it is the central portion of the mask 6 that bends like a mortar, the closer the magnet pair 133C is to the central portion of the mask 6, the better. Therefore, in the fourth embodiment, the magnet pair 134C sandwiched between the magnet pairs 133C is positioned at the central portion P4 of the arrangement pattern of the plurality of magnets 30C. By arranging the magnet pair 134</b>C at a location corresponding to the central portion of the mask 6 in this way, it is possible to more effectively prevent the remaining deflection of the mask 6 .

Although not shown, a magnet group adjacent to the magnet group 130C in the arrangement direction A1 may also have the same configuration as the magnet group 130C.

[Fifth embodiment]
A film forming apparatus according to the fifth embodiment will be described. FIG. 9(a) is a plan view of a magnet unit according to the fifth embodiment. FIG. 9(b) is a sectional view of the magnet unit taken along line IXB-IXB in FIG. 9(a). In the film forming apparatus of the fifth embodiment, the configuration of the magnet unit is different from that of the first embodiment, and the configuration other than that is the same as that of the first embodiment, and the description of the similar configuration is omitted. The magnet unit 24D of the fifth embodiment will be specifically described below.

A main surface 291 of the yoke 29 is provided with a plurality of magnets 30D. A main surface 291 of the yoke 29 has a rectangular shape and is approximately the same size as the mask foil 6A shown in FIG. The plurality of magnets 30D are arranged in a matrix in an arrangement direction A1 parallel to an imaginary axis L1 that is the center of rotation and an arrangement direction A2 perpendicular to the arrangement direction A1 along the main surface 291. ing.

Each magnet 30D is a permanent magnet, and has a pair of magnetic pole faces 31D and 32D whose magnetic poles are S poles or N poles. That is, if the magnetic pole of one of the pair of magnetic pole faces 31D and 32D is the S pole, the magnetic pole of the other magnetic pole face is the N pole. The pole face 32D of each magnet 30D is attached to the main face 291 of the yoke 29, with the opposite pole face 31D facing outward. In this embodiment, the plurality of magnets 30D are arranged such that the magnetic poles of the magnetic pole faces 31D are of the same polarity in the arrangement direction A2. Each magnet 30D has a rectangular shape in plan view.

In FIGS. 9(a) and 9(b), the magnets whose magnetic pole faces 31D are N poles are shown by shading, and the magnets whose magnetic pole faces 31D are S poles are shown by diagonal hatching. A center portion P5 of the arrangement pattern of the plurality of magnets 30D, which is surrounded by a two-dot chain line in FIG. 9A, corresponds to the bottom portion of the mortar-shaped bent portions of the glass substrate 5 and the mask 6 shown in FIG. part.

Among the plurality of magnets 30D, the magnet group 130D located at the center in the arrangement direction A2 will be described. FIG. 9(b) shows a cross section of the magnet group 130D. The multiple magnets 30D include a magnet group 130D located in the center in the arrangement direction A2. The magnet group 130D is composed of a plurality of magnets 30D ₁ to 30D ₁₄ arranged in the arrangement direction A1. In FIG. 9B, the magnetic pole faces 31D of magnets 30D ₁ , 30D ₃ , 30D ₅ , 30D ₈ , 30D ₉ , 30D ₁₁ , and 30D ₁₃ are north poles, and magnets 30D ₂ , 30D ₄ , 30D ₆ , 30D ₇ , 30D ₁₀ , 30D ₁₂ and 30D ₁₄ are south poles. In the magnet group 130D, there may be a partial arrangement in which the magnetic pole faces of adjacent magnets have the same polarity. In this embodiment, the magnetic pole faces 31D of the adjacent magnets 30D- ₆ and 30D- ₇ are arranged to have the same polarity, and the magnetic pole faces 31D of the adjacent magnets 30D- ₈ and 30D- ₉ are arranged to have the same polarity. In the magnet group 130D, the magnetic poles of the magnetic pole faces of the other two adjacent magnets are different from each other. In the magnet group 130D, the magnetic poles of the magnetic pole surface 31D may be arranged so that the S poles and the N poles are alternately arranged in the arrangement direction A1.

The magnet group 130D includes a magnet pair 133D, which is the third magnet pair having the first magnetic force F1. The magnet group 130D also includes a magnet pair 134D, which is a fourth magnet pair having a second magnetic force F2 weaker than the first magnetic force F1. Magnet pair 133D is magnet 30D ₆ and magnet 30D ₉ . The magnets 30D ₆ and 30D ₉ have different magnetic poles on the pole faces 31D. Magnet pair 134D is magnet _30D7 and magnet _30D8 . Magnet 30D ₇ and magnet 30D ₈ differ from each other in the magnetic pole of magnetic pole face 31D. The magnets _30D7 and _30D8 are arranged adjacent to each other in the arrangement direction A1. Magnet 30D ₆ and magnet 30D ₉ are arranged to sandwich magnet pair 134D. In this embodiment, among the plurality of magnets 30D, all magnets other than magnet _30D7 and magnet _30D8 have the first magnetic force. The magnetic force of a magnet can be measured, for example, with a gaussmeter. The second magnetic force F2 is preferably half or less than the first magnetic force F1. Furthermore, the second magnetic force F2 is preferably 1/3 or less of the first magnetic force F1.

The magnet pair 134D is positioned straddling the center C5 as shown in FIG. 9(b). In this embodiment, the magnet pair 134D is positioned at the central portion P5 (FIG. 9A) of the arrangement pattern of the plurality of magnets 30D.

According to the fifth embodiment, similarly to the fourth embodiment, the portion of the mask 6 bent into a mortar shape can be effectively sucked, and the bending of the mask 6 can be prevented from remaining.

Moreover, since it is the central portion of the mask 6 that bends like a mortar, the closer the magnet pair 133D is to the central portion of the mask 6, the better. Therefore, in the fifth embodiment, the magnet pair 134D sandwiched by the magnet pairs 133D is positioned at the central portion P5 of the arrangement pattern of the plurality of magnets 30D. By arranging the magnet pair 134</b>D at a location corresponding to the central portion of the mask 6 in this way, it is possible to more effectively prevent the remaining deflection of the mask 6 .

[Sixth embodiment]
A film forming apparatus according to the sixth embodiment will be described. FIG. 10(a) is a plan view of a magnet unit according to the sixth embodiment. FIG. 10(b) is a cross-sectional view of the magnet unit taken along line XB--XB in FIG. 10(a). In the film forming apparatus of the sixth embodiment, the configuration of the magnet unit is different from that of the first embodiment, and the configuration other than that is the same as that of the first embodiment, and the description of the similar configuration is omitted. The magnet unit 24E of the sixth embodiment will be specifically described below.

A main surface 291 of the yoke 29 is provided with a plurality of magnets 30E. A main surface 291 of the yoke 29 has a rectangular shape and is approximately the same size as the mask foil 6A shown in FIG. The plurality of magnets 30E are arranged in a matrix in an arrangement direction A1 parallel to a virtual axis L1 that is a rotation center and an arrangement direction A2 perpendicular to the arrangement direction A1 along the main surface 291. ing.

Each magnet 30E is a permanent magnet and has a pair of magnetic pole faces 31E and 32E with magnetic poles as S or N poles. That is, if the magnetic pole of one of the pair of magnetic pole faces 31E and 32E is the S pole, the magnetic pole of the other magnetic pole face is the N pole. In this embodiment, each magnet 30E has a rectangular shape in a plan view and has the same size. The pole face 32E of each magnet 30E is attached to the major surface 291 of the yoke 29, with the opposite pole face 31E facing outward. In this embodiment, the plurality of magnets 30E are arranged so that the magnetic poles of the magnetic pole faces 31E alternate between the N poles and the S poles in the arrangement direction A1 and the arrangement direction A2, which are predetermined directions. That is, the plurality of magnets 30E are arranged so that the magnetic poles of the magnetic pole faces 31E are arranged in a zigzag pattern with N poles and S poles. Since the magnets 30E having the S pole on the magnetic pole surface 31E and the magnets 30E having the N pole on the magnetic pole surface 31E are alternately arranged in the arrangement directions A1 and A2, A magnetic circuit is formed by two adjacent magnets 30E.

In FIGS. 10(a) and 10(b), the magnets whose magnetic pole faces 31E are N poles are shown by hatching, and the magnets whose magnetic pole faces 31E are S poles are shown by diagonal hatching. A central portion P6 of the arrangement pattern of the plurality of magnets 30E, which is surrounded by a two-dot chain line in FIG. 10A, corresponds to the bottom portion of the mortar-shaped bent portions of the glass substrate 5 and the mask 6 shown in FIG. part.

Among the plurality of magnets 30E, the magnet group 130E positioned at the center in the arrangement direction A1 will be described. FIG. 10(b) shows a cross section of the magnet group 130E. The multiple magnets 30E include a magnet group 130E located in the center in the arrangement direction A1. The magnet group 130E has the same arrangement as the magnet group 130C described in the fourth embodiment, and includes a magnet pair 133C, a magnet pair 134C, and a magnet pair 135C.

Therefore, according to the sixth embodiment, similarly to the fourth embodiment, the portion of the mask 6 that is bent into a mortar shape can be effectively sucked, and the remaining bending of the mask 6 can be prevented. can.

[Seventh Embodiment]
Next, a manufacturing system including any one of the film forming apparatuses of the above-described embodiments will be described. FIG. 11 is a schematic configuration diagram of a manufacturing system according to the seventh embodiment, exemplifying a manufacturing system 300 for manufacturing an organic EL panel.

The manufacturing system 300 includes a plurality of film forming apparatuses 100, a transfer chamber 1101, a transfer chamber 1102, a transfer chamber 1103, a substrate supply chamber 1105, a mask stock chamber 1106, a transfer chamber 1107, a glass supply chamber 1108, a bonding chamber 1109, and an unloading chamber. A chamber 1110 and the like are provided. Since the film forming apparatus 100 can be used for forming different functional layers such as a light-emitting layer, a hole injection layer, a hole transport layer, an electron transport layer, and an electrode layer of an organic EL panel, each film forming apparatus Materials and masks may differ. Each film forming apparatus 100 includes any one of the magnet units described in the first to sixth embodiments, and can carry out any one of the film forming methods in the first to sixth embodiments. Each film forming apparatus 100 can perform a film forming method of forming a film forming pattern on the glass substrate 5 through the mask 6 after the glass substrate 5 shown in FIG. 1 is set on the mask 6 .

A substrate is supplied to the substrate supply chamber 1105 from the outside. A robot 1120 as a transport mechanism is arranged in the transport chamber 1101 , the transport chamber 1102 , and the transport chamber 1103 . A robot 1120 transfers substrates between chambers. At least one of the plurality of film forming apparatuses 100 provided in the manufacturing system 300 of the present embodiment includes an organic material vapor deposition source. A plurality of film forming apparatuses 100 included in the manufacturing system 300 may be apparatuses for forming films of the same material, or may be apparatuses for forming films of different materials. For example, each deposition apparatus may vapor-deposit organic materials having different emission colors. In the manufacturing system 300, an organic material is vapor-deposited on a substrate supplied from the substrate supply chamber 1105, or a film of an inorganic material such as a metal material is formed to manufacture an organic EL panel.

A robot 1120 transports a mask, which is used in each film forming apparatus 100 and on which a film is deposited, to the mask stock chamber 1106 . By recovering the mask transported to the mask stock chamber 1106, the mask can be cleaned. Alternatively, a cleaned mask can be stored in the mask stock chamber 1106 and set in the film forming apparatus 100 by the robot 1120 .

A sealing glass material is supplied to the glass supply chamber 1108 from the outside. In the bonding chamber 1109, the organic EL panel is manufactured by bonding a sealing glass material to the film-formed substrate. The manufactured organic EL panel is taken out from the take-out chamber 1110 .

As described above, the film forming apparatus 100 described above can be suitably implemented in the manufacturing system 300 for manufacturing organic EL elements, but may be implemented in a manufacturing system for manufacturing other devices. When manufacturing an electronic device or the like, the mask can be adhered to the substrate to improve productivity.

[Other embodiments]
The present invention is not limited to the embodiments described above, and many modifications are possible within the technical concept of the present invention.

For example, in the first to seventh embodiments described above, the glass substrate 5 is used as an example of the substrate, but the material of the substrate to be vapor-deposited is not limited to glass. Any material may be used.

Further, in the first to third embodiments described above, the plurality of magnets in the magnet unit may include a plurality of second magnet pairs. Similarly, in the fourth to sixth embodiments described above, the plurality of magnets in the magnet unit may include a plurality of third magnet pairs and fourth magnet pairs.

Also, in the yoke 29 described in the first to third embodiments, a through hole may be provided between the two magnets of the second magnet pair.

In addition, in the above-described first to seventh embodiments, the first member is the yoke 29, which is preferable because the attractive force of the magnet can be effectively generated on the substrate side. It is not limited to certain cases. If the first member is a member other than the yoke 29, the magnet may be fixed to the first member with an adhesive or the like.

9 mask holder 29 yoke (first member) 30 magnet 31 magnetic pole surface 100 film forming apparatus 130 magnet group 131 magnet pair (first magnet pair) 132 magnet pair (Second magnet pair), 291... main surface

Claims (11)

a mask holder that holds a mask on which the substrate is placed;
a plurality of magnets for attracting the mask ;
It has a main surface to which the plurality of magnets are attached, is arranged above the position where the mask is held by the mask holding part, and rotates by lowering the main surface while the main surface is inclined and further lowering. a first member that is rotatable so as to be in a horizontal state with the
each of the plurality of magnets has a magnetic pole surface opposite to the surface attached to the main surface;
The plurality of magnets includes a magnet group arranged in a predetermined direction along the main surface,
The magnet group is arranged adjacent to each other with a first spacing, and a first magnet pair having different magnetic poles on the magnetic pole faces is arranged adjacent to each other with a second spacing wider than the first spacing. and a second magnet pair having magnetic poles different from each other. 2. The film forming apparatus according to claim 1, wherein the second magnet pair is located on the central side of the magnet group relative to the first magnet pair. 3. The film forming apparatus according to claim 1, wherein the second pair of magnets is positioned in the central portion of the arrangement pattern of the plurality of magnets. a mask holder that holds a mask on which the substrate is placed;
a plurality of magnets for attracting the mask ;
It has a main surface to which the plurality of magnets are attached, is arranged above the position where the mask is held by the mask holding part, and rotates by lowering the main surface while the main surface is inclined and further lowering. a first member that is rotatable so as to be in a horizontal state with the
each of the plurality of magnets has a magnetic pole surface opposite to the surface attached to the main surface;
The plurality of magnets includes a magnet group arranged in a predetermined direction along the main surface,
The magnet group is arranged adjacent to a position sandwiched between a third magnet pair having a first magnetic force and the third magnet pair having different magnetic poles on the magnetic pole faces, and the magnetic poles on the magnetic pole faces are different from each other. and a fourth magnet pair having a second magnetic force weaker than the first magnetic force. 5. The film forming apparatus according to claim 4, wherein the fourth magnet pair is positioned in the central portion of the arrangement pattern of the plurality of magnets. 6. The film forming apparatus according to claim 1, wherein said first member is a yoke. A magnetic material that is not a ferromagnetic material is arranged so as to be positioned between the plurality of magnets and the substrate on the mask held by the mask holding portion when the main surface is in the horizontal state. 7. The film forming apparatus according to any one of claims 1 to 6, further comprising a second member. The first member is rotatable around an axis,
8. The film forming apparatus according to any one of claims 1 to 7, wherein the predetermined direction is a direction perpendicular to the axis. The first member is rotatable around an axis,
8. The film forming apparatus according to any one of claims 1 to 7, wherein the predetermined direction is a direction parallel to the axis. A plurality of film forming apparatuses according to any one of claims 1 to 9,
1. A manufacturing system for an organic EL panel, wherein at least one of said film forming apparatuses deposits an organic material on said substrate to form an organic thin film. A film forming method for forming a film on the substrate using the film forming apparatus according to any one of claims 1 to 9.

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