TW201509594A - 半導體晶圓硏削裝置、半導體晶圓製造方法、及半導體晶圓硏削方法 - Google Patents
半導體晶圓硏削裝置、半導體晶圓製造方法、及半導體晶圓硏削方法 Download PDFInfo
- Publication number
- TW201509594A TW201509594A TW103117535A TW103117535A TW201509594A TW 201509594 A TW201509594 A TW 201509594A TW 103117535 A TW103117535 A TW 103117535A TW 103117535 A TW103117535 A TW 103117535A TW 201509594 A TW201509594 A TW 201509594A
- Authority
- TW
- Taiwan
- Prior art keywords
- semiconductor wafer
- grinding
- wafer
- grinding wheel
- ground surface
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
- B24B37/105—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement
- B24B37/107—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement in a rotary movement only, about an axis being stationary during lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
- B24B37/245—Pads with fixed abrasives
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013114286 | 2013-05-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW201509594A true TW201509594A (zh) | 2015-03-16 |
Family
ID=51988623
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW103117535A TW201509594A (zh) | 2013-05-30 | 2014-05-19 | 半導體晶圓硏削裝置、半導體晶圓製造方法、及半導體晶圓硏削方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5944581B2 (ja) |
TW (1) | TW201509594A (ja) |
WO (1) | WO2014192590A1 (ja) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0677187A (ja) * | 1992-08-25 | 1994-03-18 | Sumitomo Metal Ind Ltd | ラッピング装置 |
JPH10244449A (ja) * | 1997-02-28 | 1998-09-14 | Hitachi Cable Ltd | GaAsウェハの加工方法 |
JP2001244240A (ja) * | 2000-02-25 | 2001-09-07 | Speedfam Co Ltd | 半導体ウエハの製造方法 |
JP2002079464A (ja) * | 2000-09-06 | 2002-03-19 | Nagase Integrex Co Ltd | 研削方法及び研削盤 |
JP2005238413A (ja) * | 2004-02-27 | 2005-09-08 | Yachiyo Microscience Inc | ラップ盤用回転定盤 |
JP2010045262A (ja) * | 2008-08-15 | 2010-02-25 | Showa Denko Kk | 半導体発光素子の製造方法 |
JP5793341B2 (ja) * | 2011-05-12 | 2015-10-14 | 株式会社ディスコ | ウェーハの加工方法 |
-
2014
- 2014-05-19 TW TW103117535A patent/TW201509594A/zh unknown
- 2014-05-20 WO PCT/JP2014/063327 patent/WO2014192590A1/ja active Application Filing
- 2014-05-20 JP JP2015519800A patent/JP5944581B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JPWO2014192590A1 (ja) | 2017-02-23 |
WO2014192590A1 (ja) | 2014-12-04 |
JP5944581B2 (ja) | 2016-07-05 |
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