TW201437435A - Electrolytic copper foil and method for manufacturing the same and surface-treated copper foil using the electrolytic copper foil - Google Patents
Electrolytic copper foil and method for manufacturing the same and surface-treated copper foil using the electrolytic copper foil Download PDFInfo
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- C25D1/00—Electroforming
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Abstract
Description
本申請案係關於電解銅箔、該電解銅箔之製造方法及使用該電解銅箔而得之表面處理銅箔。尤其,關於承受高溫加熱時之高溫耐熱特性優異之電解銅箔。 The present application relates to an electrolytic copper foil, a method for producing the electrolytic copper foil, and a surface-treated copper foil obtained by using the electrolytic copper foil. In particular, it is an electrolytic copper foil which is excellent in high-temperature heat resistance when subjected to high-temperature heating.
電解銅箔已廣泛使用於印刷配線板領域、鋰離子二次電池之負極集電體等之各種領域中。而且,印刷配線板中,有採用超過250℃之非常高的溫度作為貼合銅箔與絕緣層構成材料時之加工溫度之情況,由於承受高溫負荷之電解銅箔會軟化而使物理強度下降,故而產生各種問題。此外,使用電解銅箔作為鋰離子二次電池之負極集電體時,在電解銅箔表面形成含有負極活性物質之合劑層時會有負荷300℃左右之高溫之情況。此時負極集電體中所用之電解銅箔若軟化,則對於進行充電.放電時之膨脹.收縮之抵抗力下降,而有導致鋰離子二次電池之壽命短化之情況。因此,持續地進行在高溫加熱下高溫耐熱特性優異的電解銅箔相關研究至今。 Electrolytic copper foil has been widely used in various fields such as a printed wiring board field, a negative electrode current collector of a lithium ion secondary battery, and the like. Further, in the printed wiring board, a very high temperature exceeding 250 ° C is used as a processing temperature when the copper foil and the insulating layer are laminated, and the electrolytic copper foil subjected to a high temperature load is softened to deteriorate the physical strength. Therefore, various problems arise. Further, when an electrolytic copper foil is used as the negative electrode current collector of the lithium ion secondary battery, when a mixture layer containing a negative electrode active material is formed on the surface of the electrolytic copper foil, a high temperature of about 300 ° C may be applied. At this time, if the electrolytic copper foil used in the anode current collector is softened, it is charged. Expansion during discharge. The resistance to shrinkage is lowered, and the life of the lithium ion secondary battery is shortened. Therefore, research on electrolytic copper foil excellent in high-temperature heat resistance under high-temperature heating has been continuously performed.
例如,專利文獻1(日本專利申請案:特開2012-140660號公報)中,目的係提供一種長時間保存後仍維持高強度,加熱後亦 為高強度,且電傳導性優異之電解銅箔,其揭示「藉由電解含有(A)二硫代胺基甲酸衍生物或其鹽、(B)硫脲、(C)具有巰基之水溶性硫化合物或其衍生物或其等之鹽、(D)聚烷二醇及(E)氯離子作為添加劑之硫酸酸性銅鍍敷液而製造電解銅箔」。而且,檢視專利文獻1之請求項1時,則揭示獲得了「於電沉積結束後120分鐘以內,在240℃加熱10分鐘後,測定20℃下之拉伸強度及電傳導性時,拉伸強度為650MPa以上,電傳導性為80% IACS以上,電沉積結束後於168小時後測定之20℃下之拉伸強度為電沉積結束後120分鐘以內測定之20℃下之拉伸強度的90%以上,電沉積結束後120分鐘以內測定之20℃下之伸長率為3%以上之電解銅箔」。 For example, in the patent document 1 (Japanese Patent Application Laid-Open No. 2012-140660), the object is to provide a high strength after long-term storage, and also after heating. It is an electrolytic copper foil which is high in strength and excellent in electrical conductivity, and discloses "water solubility by (A) dithiocarbamic acid derivative or its salt, (B) thiourea, (C) having a mercapto group by electrolysis. An electrolytic copper foil is produced by a sulfur compound or a derivative thereof or a salt thereof, (D) a polyalkylene glycol, and (E) a chloride acid plating solution of an acid chloride as an additive. Further, when the request 1 of Patent Document 1 is examined, it is revealed that "the tensile strength and electrical conductivity at 20 ° C are measured after heating at 240 ° C for 10 minutes within 120 minutes after the completion of electrodeposition, and stretching is performed. The strength is 650 MPa or more, the electrical conductivity is 80% IACS or more, and the tensile strength at 20 ° C measured after 168 hours after the end of electrodeposition is 90% of the tensile strength measured at 20 ° C within 120 minutes after the end of electrodeposition. % or more, an electrolytic copper foil having an elongation at 20 ° C of 3% or more measured within 120 minutes after completion of electrodeposition.
專利文獻2(日本專利申請案:特開2011-174146號公報)中,目的係提供具有適合作為捲帶式自動接合(Tape Automated Bonding)製程中所用之電解銅箔材料之低粗糙面,且具備高抗張力,不會發生錫敷剝離之電解銅箔,且揭示「以硫酸-硫酸銅水溶液作為電解液,且使用以鉑族元素或其氧化物被覆之鈦所成之不溶性陽極及與該陽極成對向之鈦製陰極滾筒,使直流電流通過該兩極間之電解銅箔之製造方法中,藉由於前述電解液中存在非離子性水溶性高分子、活性有機硫化合物之磺酸鹽、硫脲系化合物及氯離子,而獲得粗糙面粗糙度為2.0μm以下,且粗糙面側之利用X射線繞射測定之自220銅繞射線相對強度求出之定向指數(orientation index)為5.0以上之結晶組織,且在180℃.1小時加熱後之抗張力為500MPa之電解銅箔」。 In the patent document 2 (Japanese Patent Application Laid-Open No. 2011-174146), the object is to provide a low-rough surface having an electrolytic copper foil material suitable for use in a Tape Automated Bonding process, and High-resistance, no electrolytic copper foil peeled off by tin coating, and reveals that an insoluble anode made of a sulfuric acid-copper sulfate aqueous solution as an electrolyte and titanium coated with a platinum group element or an oxide thereof is formed and formed with the anode. In the method for manufacturing a copper cathode foil, the direct current is passed through the electrolytic copper foil between the two electrodes, because the non-ionic water-soluble polymer, the sulfonate of the active organic sulfur compound, and the thiourea are present in the electrolyte. A compound having a roughness of 2.0 μm or less and a crystal having an orientation index of 5.0 or more obtained from the relative intensity of 220 copper rays by X-ray diffraction measured on the rough surface side. The structure and the electrolytic copper foil with a tensile strength of 500 MPa after heating at 180 ° C for 1 hour.
專利文獻3(日本專利申請案:特開2004-339558號公報) 中,目的係提供一種粗糙面經低粗糙度化,隨著時間經過或加熱處理之抗張力之下降率低,而且高溫下之伸長率優異之低粗糙面電解銅箔及其製造方法,且揭示「藉由使羥基乙基纖維素、聚乙烯亞胺、乙炔二醇、活性有機硫化合物之磺酸鹽及氯離子之五種添加劑存在於由硫酸-硫酸銅水溶液所組成之電解液中,而獲得電解銅箔之粗糙面粗糙度Rz為2.5μm以下,自電沉積結束之時點後20分鐘以內測定之25℃下之抗張力為500MPa以上,並且自電沉積結束之時點後經過300分鐘時測定之25℃下之抗張力之下降率為10%以下,或自電沉積結束之時點後到施加在100℃加熱處理10分鐘後所測定之25℃下之抗張力下降率為10%以下,且在180℃下之伸長率為6%以上之低粗糙面電解銅箔」。 Patent Document 3 (Japanese Patent Application Laid-Open No. 2004-339558) The purpose of the present invention is to provide a low-rough surface electrolytic copper foil having a low roughness, a low roughness reduction rate over time or a heat treatment, and an excellent elongation at a high temperature, and a method for producing the same, and revealing By adding five additives of hydroxyethyl cellulose, polyethyleneimine, acetylene glycol, sulfonate of active organic sulfur compound and chloride ion to an electrolyte composed of a sulfuric acid-copper sulfate aqueous solution, The rough surface roughness Rz of the electrolytic copper foil is 2.5 μm or less, and the tensile strength at 25 ° C measured within 20 minutes from the end of the electrodeposition is 500 MPa or more, and is determined after 300 minutes from the end of electrodeposition. The rate of decrease in the tensile strength at ° C is 10% or less, or the rate of decrease in the tensile strength at 25 ° C measured from the time point after the end of electrodeposition to the application of heat treatment at 100 ° C for 10 minutes is 10% or less, and at 180 ° C. The low-rough surface electrolytic copper foil having an elongation of 6% or more.
專利文獻4(日本專利申請案:特開2008-285727號公報)中,目的係提供自銅箔製箔完成時至移送到後續製造步驟為止之常溫保管,或者藉由在後續步驟中之200~300℃左右之加熱處理,銅箔皆不會軟化,且維持了高抗張力之電解銅箔、以及其製造方法,且採用「自銅箔製箔完成時至該銅箔之特性安定時以後之於25℃測定之抗張力為400N/mm2以上之高抗張力電解銅箔」。並且,如該專利文獻4之請求項3所揭示,揭示有「完成銅箔之製箔,且該銅箔之特性安定後,使該銅箔在300℃加熱處理1小時,於該加熱處理後在25℃測定之抗張力為400N/mm2以上之高抗張力電解銅箔」。 In the patent document 4 (Japanese Patent Application Laid-Open No. 2008-285727), the object is to provide a normal temperature storage from the completion of the copper foil foil to the subsequent manufacturing step, or by the subsequent step 200~ Heat treatment at about 300 ° C, copper foil will not soften, and maintain high tensile strength electrolytic copper foil, and its manufacturing method, and use "from the completion of the copper foil foil to the characteristics of the copper foil after the timing The high tensile strength electrolytic copper foil having a tensile strength of 400 N/mm 2 or more as measured at 25 ° C. Further, as disclosed in claim 3 of Patent Document 4, it is disclosed that "the foil of the copper foil is completed, and after the characteristics of the copper foil are stabilized, the copper foil is heat-treated at 300 ° C for 1 hour, after the heat treatment. The high tensile strength electrolytic copper foil having a tensile strength of 400 N/mm 2 or more as measured at 25 ° C.
專利文獻5(日本專利申請案:特開2012-151106號公報)中,目的係提供一種可製作即使重複充放電循環亦不會引起電容保持 率下降之高壽命、不使負極集電體變形之鋰離子二次電池之鋰離子二次電池負極用電解銅箔,且揭示「在200~400℃加熱處理後之0.2%耐力為250N/mm2以上,伸長率為2.5%以上,該電解銅箔之設置活性物質層之表面施以防銹處理,或施以經粗化處理之防銹處理。且本發明係揭示以前述電解銅箔作為集電體之鋰離子二次電池用電極」。亦即,使用電解銅箔作為鋰離子二次電池之負極集電體,且規定此時電解銅箔在240℃×10分鐘之加熱後之「0.2%耐力」。 In the patent document 5 (Japanese Patent Application Laid-Open No. Hei No. 2012-151106), the object is to provide a capacitor that can be produced without repeating the charge and discharge cycle. An electrolytic copper foil for a lithium ion secondary battery negative electrode of a lithium ion secondary battery in which the life of the negative electrode current collector is not deteriorated, and the "0.2% proof endurance after heating at 200 to 400 ° C is 250 N/mm 2 In the above, the elongation of the electrolytic copper foil is rust-proofing or the rust-preventing treatment is performed on the surface of the active material layer, and the present invention discloses the use of the electrolytic copper foil as a set. Electrode for lithium ion secondary battery". That is, an electrolytic copper foil was used as a negative electrode current collector of a lithium ion secondary battery, and "0.2% proof stress" of the electrolytic copper foil at 240 ° C for 10 minutes was prescribed.
專利文獻6(日本專利申請案:特開2009-221592號公報)中,目的係提供微細間距電路之形成用的電解銅箔,且可代替柯爾森(Corson)合金箔而使用之高強度電解銅箔,且揭示「一種電解銅箔,其係於銅電解液電解所得之電解銅箔,其中該電解銅箔之特徵係含有110ppm~400ppm之硫、150ppm~650ppm之氯,且導電率為48% IACS以上,常態拉伸強度之值為70kgf/cm2以上」。 In the patent document 6 (Japanese Patent Application Laid-Open No. 2009-221592), the object of the present invention is to provide an electrolytic copper foil for forming a fine pitch circuit and to replace the Corson alloy foil for high-strength electrolysis. Copper foil, and discloses "an electrolytic copper foil which is obtained by electrolysis of copper electrolytic solution, wherein the electrolytic copper foil is characterized by containing 110 ppm to 400 ppm of sulfur, 150 ppm to 650 ppm of chlorine, and a conductivity of 48. % IACS or more, the value of the normal tensile strength is 70 kgf/cm2 or more."
專利文獻7(日本專利申請案:特開2008-101267號公報)中,目的係提供一種具備與過去之低凹凸(profile)電解銅箔同等的低凹凸表面,且具備極大機械強度之電解銅箔及其製造方法,且揭示「銅之析出結晶粒子微細,且為將其粒徑之偏差縮小為為過去從來沒有之程度的電解銅箔,具備低凹凸且有光澤之表面,且具有常態拉伸強度之值為70kgf/mm2~100kgf/mm2之極大機械強度,且加熱(180℃×60分鐘)後,亦具備常態拉伸強度值之85%以上之拉伸強度值之電解銅箔」。 In the patent document 7 (Japanese Laid-Open Patent Publication No. 2008-101267), it is an object of the invention to provide an electrolytic copper foil having a low uneven surface equivalent to a conventional low profile copper foil and having a great mechanical strength. And a method for producing the same, and revealing that "the precipitated crystal particles of copper are fine, and the electrodeposited copper foil is reduced to a degree that has never been the same in the past, and has a low unevenness and a glossy surface, and has a normal stretching. The strength is a mechanical strength of 70 kgf/mm2 to 100 kgf/mm2, and after heating (180 ° C × 60 minutes), it also has an electrolytic copper foil having a tensile strength value of 85% or more of the normal tensile strength value.
專利文獻8(國際申請案:WO2012/002526號公報)中,目 的係提供即使氯含量產生變動,仍顯示安定之諸特性之電解銅箔,且採用「一種電解銅箔,其係藉由於銅電解液中電解所得之電解銅箔,其特徵為電解銅箔中之碘含量為0.003質量%以上,更好該碘含量為0.003質量%~0.03質量%之範圍」。又,該電解銅箔發揮常態拉伸強度為48kgf/mm2~72kgf/mm2,350℃×60分鐘加熱後之拉伸強度為27.5kgf/mm2~46.3kgf/mm2之物理特性,且適於鋰離子二次電池之負極集電體用途。 Patent Document 8 (International Application: WO2012/002526) The system provides an electrolytic copper foil which exhibits stable characteristics even if the chlorine content changes, and employs an electrolytic copper foil which is characterized by electrolytic copper foil obtained by electrolysis in a copper electrolyte, which is characterized by electrolytic copper foil. The iodine content is 0.003% by mass or more, and more preferably the iodine content is in the range of 0.003% by mass to 0.03% by mass. Further, the electrolytic copper foil exhibits a normal tensile strength of 48 kgf/mm 2 to 72 kgf/mm 2 , and a tensile strength of 27.5 kgf/mm 2 to 46.3 kgf/mm 2 after heating at 350 ° C for 60 minutes, and is suitable for lithium ion. The use of the negative electrode current collector of the secondary battery.
然而,對於鋰離子二次電池之負極集電體中所使用之電解銅箔,對於可防止充放電時發生之負極集電體變形之性能的要求較高。尤其,近年之鋰離子二次電池之負極之情況,有時使用伴隨充放電而體積變化較大之合金系負極活性物質。為了將該合金系負極活性物質支撐於負極集電體上,而藉由使用強固之黏結劑形成合劑層,以防止因充放電時之大的體積變化造成之活性物質之崩落。而且,引起該黏結劑之聚合反應時,係負荷300℃以上之高溫。據此,負極集電體中所使用之電解銅箔若無法具備在承受300℃以上之加熱後仍可維持高強度之高溫耐熱特性,則無法實現鋰離子二次電池之長壽命化。 However, the electrolytic copper foil used in the negative electrode current collector of the lithium ion secondary battery has high requirements for preventing the deformation of the negative electrode current collector which occurs at the time of charge and discharge. In particular, in the case of the negative electrode of a lithium ion secondary battery in recent years, an alloy-based negative electrode active material having a large volume change accompanying charge and discharge may be used. In order to support the alloy-based negative electrode active material on the negative electrode current collector, a mixture layer is formed by using a strong binder to prevent collapse of the active material due to a large volume change upon charge and discharge. Further, when the polymerization reaction of the binder is caused, the temperature is 300 ° C or higher. As a result, the electrolytic copper foil used in the negative electrode current collector cannot have a high-temperature heat-resistant property capable of maintaining high strength after being heated at 300 ° C or higher, and thus the life of the lithium ion secondary battery cannot be extended.
依據上述專利文獻4中揭示之電解銅箔,具有具備充份之高溫耐熱特性之可能性。不過,該文獻中之電解銅箔之高溫耐熱特性雖設為「在300℃下加熱處理1小時後之抗張力為400N/mm2以上」,但若詳細確認其實施例記載之內容,則自製箔完成時起之72小時後在300℃×1小時加熱後之抗張力(拉伸強度)為430MPa~500MPa之範圍,無法獲得該抗張力超過500MPa者。 According to the electrolytic copper foil disclosed in the above Patent Document 4, it is possible to have sufficient high-temperature heat resistance characteristics. However, the high-temperature heat-resistant property of the electrolytic copper foil in this document is "the tensile strength after heat treatment at 300 ° C for 1 hour is 400 N/mm 2 or more", but if the contents described in the examples are confirmed in detail, the self-made foil is completed. The tensile strength (tensile strength) after heating at 300 ° C for 1 hour after 72 hours from the time was in the range of 430 MPa to 500 MPa, and the tensile strength exceeding 500 MPa could not be obtained.
此外,近年來之電解銅箔不僅於印刷配線板領域,薄層化狀況顯著。電解銅箔愈薄,則處理時愈容易產生皺摺。就防止上述之處理時之皺折發生之觀點而言,較好不僅電解銅箔之高溫加熱後具備高的物理特性,而且在常態下亦具備高的物理特性。 In addition, in recent years, electrolytic copper foil has not only been in the field of printed wiring boards, but also has a thin layer. The thinner the electrolytic copper foil, the easier it is to wrinkle during handling. From the viewpoint of preventing occurrence of wrinkles in the above-described treatment, it is preferred that not only the electrolytic copper foil has high physical properties after high-temperature heating, but also has high physical properties under normal conditions.
據此,本申請案之目的係提供一種電解銅箔,其具備良好的高溫耐熱特性,且可使用於印刷配線板及鋰離子二次電池之負極集電體中。 Accordingly, the object of the present application is to provide an electrolytic copper foil which is excellent in high-temperature heat resistance and which can be used in a negative electrode current collector for a printed wiring board and a lithium ion secondary battery.
因此,在本案發明人等積極研究之結果下,想到相較於過去之電解銅箔,「常態物理特性」與「高溫加熱後之物理特性」二者均優異之電解銅箔。並且,可知本申請案之電解銅箔適用於鋰離子二次電池之負極集電體用途。以下,針對本申請案之概要加以敘述。 Therefore, as a result of active research by the inventors of the present invention, an electrolytic copper foil which is excellent in both "normal physical properties" and "physical properties after high-temperature heating" is considered in comparison with the conventional electrolytic copper foil. Further, it is understood that the electrolytic copper foil of the present application is suitable for use as a negative electrode current collector of a lithium ion secondary battery. Hereinafter, the outline of the present application will be described.
電解銅箔:本申請案之電解銅箔之特徵係常態拉伸強度為600MPa以上,350℃×1小時加熱後之拉伸強度為470MPa以上。 Electrolytic copper foil: The electrolytic copper foil of the present application is characterized by a normal tensile strength of 600 MPa or more, and a tensile strength of 470 MPa or more after heating at 350 ° C for 1 hour.
該本申請案之電解銅箔具備有在350℃×1小時加熱後之0.2%耐力為370MPa以上之高物理特性。 The electrolytic copper foil of the present application has high physical properties of 0.2% or more with a resistance of 370 MPa or more after heating at 350 ° C for 1 hour.
而且,本申請案之電解銅箔之常態伸長率為2.5%以上,具備實用上無礙之伸長率。 Further, the electrolytic copper foil of the present application has a normal elongation of 2.5% or more and has an elongation which is practically unsuitable.
此外,本申請案之電解銅箔中,作為微量成分,含有C含量為100μg/g~450μg/g,N含量為50μg/g~620μg/g,O含量為400μg/g~3200μg/g,S含量為110μg/g~720μg/g,Cl含量為20μg/g~115μg/g,且滿足{Cl/(C+N+O+S+Cl)}×100≦5質量%之關係時,基於顯示 安定之高溫耐熱特性之觀點而言係較佳。 Further, in the electrolytic copper foil of the present application, as a trace component, the C content is 100 μg/g to 450 μg/g, the N content is 50 μg/g to 620 μg/g, and the O content is 400 μg/g to 3200 μg/g, S. When the content is 110 μg/g to 720 μg/g, the Cl content is 20 μg/g to 115 μg/g, and the relationship of {Cl/(C+N+O+S+Cl)}×100≦5 mass% is satisfied, based on the display It is preferred from the viewpoint of stability of high temperature heat resistance.
電解銅箔之製造方法:本申請案之電解銅箔之製造方法係上述電解銅箔之製造方法,其特徵係使用以20mg/L~100mg/L之濃度含分子量10000~70000之聚乙烯亞胺,且氯濃度為0.5mg/L~2.5mg/L之硫酸酸性銅電解液作為銅電解液。 Method for producing electrolytic copper foil: The method for producing an electrolytic copper foil according to the present application is a method for producing the above-mentioned electrolytic copper foil, which is characterized by using a polyethyleneimine having a molecular weight of 10,000 to 70,000 at a concentration of 20 mg/L to 100 mg/L. And a sulfuric acid acidic copper electrolyte having a chlorine concentration of 0.5 mg/L to 2.5 mg/L is used as the copper electrolyte.
表面處理銅箔:本申請案之表面處理銅箔之特徵係使用上述電解銅箔而得。 Surface-treated copper foil: The surface-treated copper foil of this application is characterized by using the above-mentioned electrolytic copper foil.
本申請案之電解銅箔係同時具備「常態拉伸強度為600MPa以上」,且「350℃×1小時加熱後之拉伸強度為470MPa以上」之物理特性。亦即,本申請案之電解銅箔之「常態物理特性」及「高溫加熱後之物理特性」均優異。據此,即使是薄的電解銅箔,皺摺之發生亦少,具備良好的操作特性。此外,該電解銅箔即使使用作為鋰離子二次電池之負極集電體,在支撐負極活性物質時之拉伸強度的降低亦少,故對於進行充電.放電時之膨脹.收縮之抵抗力高,可使電池壽命變長。 The electrolytic copper foil of the present application has physical properties of "normal tensile strength of 600 MPa or more" and "tensile strength after heating at 350 ° C for 1 hour" of 470 MPa or more. That is, the "normal physical properties" of the electrolytic copper foil of the present application and the "physical properties after high-temperature heating" are excellent. Accordingly, even in the case of a thin electrolytic copper foil, wrinkles occur less and have excellent handling characteristics. Further, even if the electrolytic copper foil is used as a negative electrode current collector of a lithium ion secondary battery, the tensile strength is less reduced when the negative electrode active material is supported, so that charging is performed. Expansion during discharge. High resistance to shrinkage can make battery life longer.
因此,該電解銅箔可成為依據用途被施以粗化處理、防銹處理之表面處理銅箔,可廣泛地使用於印刷配線板、鋰離子二次電池等領域中。 Therefore, the electrodeposited copper foil can be a surface-treated copper foil which is subjected to roughening treatment and rust-preventing treatment depending on the application, and can be widely used in the fields of printed wiring boards, lithium ion secondary batteries, and the like.
此外,本申請案之電解銅箔之製造方法中,相較於過去製造電解銅箔時使用之硫酸酸性銅電解液,可採用單純之浴組成,故溶液安定性優異,可減輕廢液處理之負荷,故使電解銅箔製造時之浴 管理及管理成本之削減變得較容易。 In addition, in the method for producing an electrolytic copper foil of the present application, a simple bath composition can be used as compared with the sulfuric acid acidic copper electrolyte used in the production of the electrolytic copper foil in the past, so that the solution has excellent stability and can reduce the waste liquid treatment. Load, so the bath when making electrolytic copper foil Reductions in management and management costs have become easier.
以下,針對本申請案之「電解銅箔之形態」、「電解銅箔之製造形態」、「使用電解銅箔所得之表面處理銅箔之形態」依序加以描述。 Hereinafter, the "form of electrolytic copper foil", "the form of production of electrolytic copper foil", and "the form of surface-treated copper foil obtained by using electrolytic copper foil" will be described in order.
電解銅箔之形態:本申請案之電解銅箔係未施以防銹處理、粗化處理等之表面處理的銅箔,關於其厚度並無特別限制。又,此處預先清楚地表明,以下所述之本申請案之電解銅箔係由物理特性予以特定。該物理特性之值在「電解銅箔」與後述之施以表面處理之「表面處理銅箔」之間幾乎顯示相同之值。 The form of the electrolytic copper foil is a copper foil which is not subjected to surface treatment such as rustproof treatment or roughening treatment, and the thickness thereof is not particularly limited. Further, it is clearly shown here in advance that the electrolytic copper foil of the present application described below is specified by physical properties. The value of the physical property shows almost the same value between the "electrolytic copper foil" and the "surface-treated copper foil" subjected to surface treatment described later.
本申請案之電解銅箔之特徵係同時具備「常態拉伸強度為600MPa以上」、「350℃×1小時加熱後之拉伸強度為470MPa以上」之物理特性。此種「常態拉伸強度為600MPa以上」之電解銅箔在過去即已存在。然而,同時顯示「350℃×1小時加熱後之拉伸強度為470MPa以上」之物理特性之電解銅箔並不存在。為獲得該具備「350℃×1小時加熱後之拉伸強度為470MPa以上」之物理特性之電解銅箔,係使用具備「常態拉伸強度為600MPa以上」之物理特性之電解銅箔。 The electrolytic copper foil of the present application is characterized by the physical properties of "normal tensile strength of 600 MPa or more" and "tensile strength after heating at 350 ° C for 1 hour" of 470 MPa or more. Such an electrolytic copper foil having a "normal tensile strength of 600 MPa or more" has existed in the past. However, the electrolytic copper foil which exhibits the physical properties of "350 ° C × 1 hour heating and tensile strength of 470 MPa or more" does not exist. In order to obtain the electrolytic copper foil having the physical properties of "350 ° C × 1 hour heating and tensile strength of 470 MPa or more", an electrolytic copper foil having a physical property of "normal tensile strength of 600 MPa or more" is used.
電解銅箔只要是「常態拉伸強度為600MPa以上」,則即使厚度為9μm以下之電解銅箔,處理時亦不易產生皺摺,並提高作 業性故較佳。因此,使用同時具備「350℃×1小時加熱後之拉伸強度為470MPa以上」之物理特性之電解銅箔作為鋰離子二次電池之負極集電體時,可提供電池壽命長之高品質鋰離子二次電池故而較佳。其理由為負極集電體使用具備上述物理特性之電解銅箔時,即使為了支撐合金系負極活性物質,而在300℃以上之溫度進行黏結劑之聚合反應,該電解銅箔之強度降低仍少。再者,若關於「350℃×1小時加熱後之拉伸強度」來說,更好為「350℃×1小時加熱後之拉伸強度超過500MPa」。係因為即使熱處理時間花費更長時間,亦可具備安定之高拉伸強度之故。此外,若為具備上述高溫耐熱特性之電解銅箔,則亦可設計出厚度較薄的負極集電體。 When the electrolytic copper foil is "normal tensile strength of 600 MPa or more", even if the thickness of the electrolytic copper foil having a thickness of 9 μm or less, wrinkles are less likely to occur during the treatment, and the work is improved. Industry is better. Therefore, when an electrolytic copper foil having a physical property of "350 ° C × 1 hour heating and a tensile strength of 470 MPa or more" is used as a negative electrode current collector of a lithium ion secondary battery, high-quality lithium having a long battery life can be provided. Ion secondary batteries are therefore preferred. When the electrodeposited copper foil having the above physical properties is used for the negative electrode current collector, the polymerization reaction of the binder is carried out at a temperature of 300 ° C or higher in order to support the alloy-based negative electrode active material, and the strength of the electrolytic copper foil is reduced. . Further, the "tensile strength after heating at 350 ° C for 1 hour" is more preferably "the tensile strength after heating at 350 ° C for 1 hour exceeds 500 MPa". This is because even if the heat treatment time takes a long time, it can have a stable high tensile strength. Further, in the case of the electrolytic copper foil having the above-described high-temperature heat-resistant property, a negative electrode current collector having a small thickness can be designed.
此外,本申請案之電解銅箔較好「350℃×1小時加熱後之0.2%耐力為370MPa以上」。以非鐵材料的銅作為主成分之銅箔時,應力-應變曲線中,不存在如鐵材中所見之降伏點。因此,進行作為非鐵材料之客觀評價時,使用「0.2%耐力」取代降伏點。又,該「0.2%耐力」與上述之「拉伸強度」並非表示完全相關者,但有0.2%耐力之值較高時,拉伸強度亦有變高之傾向。「350℃×1小時加熱後之0.2%耐力為370MPa以上」時,會有加熱後之電解銅箔之拉伸強度偏差變小之傾向,可安定地獲得上述之「350℃×1小時加熱後之拉伸強度為470MPa以上」之物理特性。據此,本申請案之電解銅箔之情況下,藉由將「加熱後之0.2%耐力」與「加熱後之拉伸強度」作為各別指標分別評價,可使對加熱之高溫耐熱特性之評價成為更確實者。以下,關於施加更嚴苛之高溫負荷時之本申請之電解銅箔所示之 高溫耐熱特性加以描述。又,本申請案之電解銅箔更好為「350℃×1小時加熱後之0.2%耐力為410MPa以上」。其理由為可安定地獲得上述之350℃×1小時加熱後之拉伸強度超過500MPa者。 Further, the electrolytic copper foil of the present application preferably has a "0.2% proof stress of 370 MPa or more after heating at 350 ° C for 1 hour". When a copper foil having copper as a main component of non-ferrous material is used as a main component, there is no drop point as seen in the iron material in the stress-strain curve. Therefore, when performing an objective evaluation as a non-ferrous material, "0.2% endurance" is used instead of the fall point. Further, the "0.2% proof endurance" and the above "tensile strength" are not completely related, but when the value of 0.2% stamina is high, the tensile strength tends to be high. When the 0.2% proof stress after heating at 350 ° C for 1 hour is 370 MPa or more, the variation in tensile strength of the electrodeposited copper foil after heating tends to be small, and the above-mentioned "350 ° C × 1 hour heating can be stably obtained. The tensile strength is 470 MPa or more. According to this, in the case of the electrolytic copper foil of the present application, the "heating resistance after 0.2%" and "tensile strength after heating" are separately evaluated as individual indexes, and the high-temperature heat-resistant property to heating can be obtained. Evaluation becomes more certain. Hereinafter, the electrolytic copper foil of the present application when a more severe high temperature load is applied is shown. High temperature heat resistance characteristics are described. Further, the electrolytic copper foil of the present application is more preferably "0.2% endurance after heating at 350 ° C for 1 hour is 410 MPa or more". The reason for this is that the above-mentioned tensile strength after heating at 350 ° C for 1 hour is more than 500 MPa.
另外,即使施加350℃×4小時之高溫負荷,本申請案之電解銅箔較好具備「350℃×4小時加熱後之拉伸強度為470MPa以上」之高的拉伸強度。並且,本申請案之電解銅箔之情況下,更好具備「350℃×4小時加熱後之拉伸強度為500MPa以上」之高的拉伸強度。此外,本申請案之電解銅箔較好具備「350℃×4小時加熱後之0.2%耐力為370MPa以上」之高的0.2%耐力。而且,本申請案之電解銅箔之情況下,更好具備「350℃×4小時加熱後之0.2%耐力為410MPa以上」之高的0.2%耐力。 Further, even if a high-temperature load of 350 ° C × 4 hours is applied, the electrolytic copper foil of the present application preferably has a tensile strength of "the tensile strength after heating at 350 ° C for 4 hours is 470 MPa or more". Further, in the case of the electrolytic copper foil of the present application, it is preferable to have a high tensile strength of "350 ° C × 4 hours of tensile strength after heating of 500 MPa or more". Further, the electrodeposited copper foil of the present application preferably has a high 0.2% proof resistance of "350% C × 0.2% after-heating of 370 MPa or more after heating for 4 hours". Further, in the case of the electrolytic copper foil of the present application, it is preferable to have a high 0.2% proof stress of "0.2% endurance after heating at 350 ° C for 4 hours" of 410 MPa or more.
此外,本申請案之電解銅箔之常態伸長率較好為2.5%以上。該常態伸長率未達2.5%時,會有於電解銅箔表面形成含負極活性物質之合劑層時電解銅箔破裂之情況。 Further, the normal elongation of the electrolytic copper foil of the present application is preferably 2.5% or more. When the normal elongation is less than 2.5%, the electrolytic copper foil may be broken when a mixture layer containing a negative electrode active material is formed on the surface of the electrolytic copper foil.
如上所述之本申請案之電解銅箔之物理性質認為係藉由電解銅箔中所含微量成分所得。並且,本申請案之電解銅箔之微量成分作為電解銅箔之每單位質量之含量,較好滿足以下所示條件。亦即,C含量為100μg/g~450μg/g(意指「100μg/g以上且450μg/g以下」,以下同),N含量為50μg/g~620μg/g,O含量為400μg/g~3200μg/g,S含量為110μg/g~720μg/g,Cl含量為20μg/g~115μg/g之範圍,且滿足{Cl/(C+N+O+S+Cl)}×100≦5質量%之關係。若未滿足該微量成分含量之條件,則因高溫負荷而使電解銅箔之結晶組織之再結晶 化顯著地進行,易於該結晶組織內發生孔洞。又,本發明中之微量成分含量由於表示為每1g銅箔之含有量,故使用「μg/g」之單位。而,{Cl/(C+N+O+S+Cl)}×100係電解銅箔中所含Cl含量(μg/g)之值除以電解銅箔中所含C(碳)含量、N(氮)含量、O(氧)含量、S(硫)含量、Cl(氯)含量之總量(μg/g)之值,再乘以100所得之百分率換算值(質量%)。 The physical properties of the electrolytic copper foil of the present application as described above are considered to be obtained by the trace components contained in the electrolytic copper foil. Further, the content of the trace component of the electrolytic copper foil of the present application as the content per unit mass of the electrolytic copper foil preferably satisfies the following conditions. That is, the C content is 100 μg/g to 450 μg/g (meaning "100 μg/g or more and 450 μg/g or less", the same applies hereinafter), the N content is 50 μg/g to 620 μg/g, and the O content is 400 μg/g. 3200μg/g, S content is 110μg/g~720μg/g, Cl content is in the range of 20μg/g~115μg/g, and it satisfies the quality of {Cl/(C+N+O+S+Cl)}×100≦5 The relationship between %. If the condition of the trace component content is not satisfied, the crystal structure of the electrolytic copper foil is recrystallized due to the high temperature load. The progress is remarkable, and it is easy to cause voids in the crystal structure. Moreover, since the content of the trace component in the present invention is expressed as the content per 1 g of the copper foil, the unit of "μg/g" is used. The value of Cl content (μg/g) contained in the {Cl/(C+N+O+S+Cl)}×100 electrolytic copper foil is divided by the C (carbon) content contained in the electrolytic copper foil, N The value of the total amount (μg/g) of the (nitrogen) content, the O (oxygen) content, the S (sulfur) content, and the Cl (chlorine) content, and multiplied by 100 to obtain a percentage conversion value (% by mass).
且,本申請案之電解銅箔中所含之N(氮)之微量成分比率較好滿足{N/(N+S+Cl)}×100≧20質量%之關係。未滿足該關係時,因高溫負荷使電解銅箔之結晶組織之再結晶化顯著地進行,而容易在結晶組織內發生孔洞。藉由350℃×1小時以上之加熱,而有拉伸強度及0.2%耐力之偏差變大之傾向。又,{N/(N+S+Cl)}×100係電解銅箔所含N含量(μg/g)之值除以電解銅箔所含之C含量、S含量、Cl含量之總量(μg/g)之值,再乘以100所得之百分率換算值(質量%)。 Further, the ratio of the minor component of N (nitrogen) contained in the electrolytic copper foil of the present application satisfies the relationship of {N/(N+S+Cl)}×100≧20% by mass. When this relationship is not satisfied, the recrystallization of the crystal structure of the electrolytic copper foil is remarkably progressed due to the high temperature load, and it is easy to cause voids in the crystal structure. By heating at 350 ° C for 1 hour or more, there is a tendency that the deviation between the tensile strength and the 0.2% endurance becomes large. Further, the value of the N content (μg/g) contained in the {N/(N+S+Cl)}×100 electrolytic copper foil is divided by the total amount of the C content, the S content, and the Cl content contained in the electrolytic copper foil ( The value of μg/g) is multiplied by the percentage conversion value (% by mass) obtained by 100.
此外,本申請案之電解銅箔中所含之Cl(氯)之微量成分比率更好滿足{Cl/(N+S+Cl)×100≦20質量%之關係。該值超過20質量%時,因高溫負荷使電解銅箔之結晶組織之再結晶化顯著地進行,而容易在該結晶組織內產生孔洞。關於該值並未特別設下限值,但認為下限為3.0質量%。未達3.0質量%時,會有拉伸強度及0.2%耐力之偏差變大之傾向。又,{Cl/(N+S+Cl)}×100為電解銅箔中所含之Cl含量(μg/g)之值除以電解銅箔所含之N含量、S含量、Cl含量之總量(μg/g)之值,再乘以100所得之百分率換算值(質量%)。 Further, the ratio of the trace component of Cl (chlorine) contained in the electrolytic copper foil of the present application satisfies the relationship of {Cl / (N + S + Cl) × 100 ≦ 20% by mass. When the value exceeds 20% by mass, the recrystallization of the crystal structure of the electrolytic copper foil is remarkably progressed due to the high temperature load, and pores are likely to be generated in the crystal structure. The value is not particularly limited, but the lower limit is considered to be 3.0% by mass. When it is less than 3.0% by mass, the deviation between the tensile strength and the 0.2% proof strength tends to increase. Further, {Cl/(N+S+Cl)}×100 is the value of the Cl content (μg/g) contained in the electrolytic copper foil divided by the total of the N content, the S content, and the Cl content contained in the electrolytic copper foil. The value of the amount (μg/g) is multiplied by 100 to obtain a percentage conversion value (% by mass).
電解銅箔之製造形態:本申請案之電解銅箔之製造方法係上述電解銅箔之製造方法,其特徵係使用「以20mg/L~100mg/L之 濃度含分子量10000~70000之聚乙烯亞胺,且氯濃度為0.5mg/L~2.5mg/L之硫酸酸性銅電解液」作為銅電解液。又,關於「硫酸酸性銅電解液」之銅濃度及游離硫酸濃度並無特別限制,但一般銅濃度為70g/L~90g/L,游離硫酸濃度為100g/L~200g/L之範圍。 Production method of electrolytic copper foil: The method for producing an electrolytic copper foil according to the present application is a method for producing the above-mentioned electrolytic copper foil, which is characterized by using "from 20 mg/L to 100 mg/L. A copper acid electrolyte having a concentration of 10,000 to 70,000 polyethyleneimine and a chlorine concentration of 0.5 mg/L to 2.5 mg/L as a copper electrolyte. Further, the copper concentration and the free sulfuric acid concentration of the "sulfuric acid copper electrolytic solution" are not particularly limited, but generally, the copper concentration is 70 g/L to 90 g/L, and the free sulfuric acid concentration is in the range of 100 g/L to 200 g/L.
本申請案之電解銅箔之製造方法中使用之聚乙烯亞胺為含一級胺、二級胺、三級胺之分子量10000~70000(日本觸媒股份有限公司製造之商品名Epomin(料號SP-200、P-1000)等)者。而且,將該聚乙烯亞胺添加於電解銅箔之製造中使用之硫酸酸性銅電解液中使用。添加上述聚乙烯亞胺之硫酸酸性銅電解液由於溶液壽命長、電解時之溶液安定性優異,故適合需要長時間連續電解之電解銅箔之製造。而且,使用添加聚乙烯亞胺之硫酸酸性銅電解液所得之電解銅箔由於有高溫耐熱特性安定化之傾向故較佳。該聚乙烯亞胺之分子量未達10000時,即使增加聚乙烯亞胺之添加量,仍無法賦予所得電解銅箔足夠之高溫耐熱特性故欠佳。另一方面,即使使用聚乙烯亞胺之分子量超過70000者,仍有所得電解銅箔之高溫耐熱特性之偏差變大之傾向而不佳。該聚乙烯亞胺之構造式如以下化1所示。 The polyethyleneimine used in the method for producing an electrolytic copper foil of the present application is a molecular weight of a primary amine, a secondary amine, and a tertiary amine of 10,000 to 70,000 (trade name Epomin manufactured by Nippon Shokubai Co., Ltd.) -200, P-1000), etc.). Further, the polyethyleneimine is used by being added to a sulfuric acid copper electrolytic solution used for the production of an electrolytic copper foil. The sulfuric acid-based copper electrolytic solution containing the above polyethyleneimine is excellent in solution stability and excellent in solution stability during electrolysis, and is therefore suitable for the production of electrolytic copper foil which requires continuous electrolysis for a long period of time. Further, the electrolytic copper foil obtained by using a sulfuric acid-based copper electrolytic solution to which polyethyleneimine is added has a tendency to be stabilized by high-temperature heat-resistant characteristics. When the molecular weight of the polyethyleneimine is less than 10,000, even if the addition amount of the polyethyleneimine is increased, the obtained electrolytic copper foil cannot be provided with sufficient high-temperature heat resistance characteristics, which is not preferable. On the other hand, even if the molecular weight of the polyethyleneimine is more than 70,000, the tendency of the high-temperature heat resistance of the obtained electrolytic copper foil to become large is not preferable. The structural formula of the polyethyleneimine is shown in the following paragraph 1.
化1.
而且,該聚乙烯亞胺在硫酸酸性銅電解液中較好為20mg/L~100mg/L之濃度。該聚乙烯亞胺濃度未達20mg/L時,無法賦予所得電解銅箔充分之高溫耐熱特性故較不佳。另一方面。該聚乙烯亞胺濃度超過100mg/L時,會有電解銅箔中所含之上述微量成分含量過量之傾向,即使提高作為電解銅箔之拉伸強度及0.2%耐力,亦會硬化而使伸長率下降故不佳。 Further, the polyethyleneimine preferably has a concentration of from 20 mg/L to 100 mg/L in the sulfuric acid acidic copper electrolyte. When the polyethyleneimine concentration is less than 20 mg/L, the obtained electrolytic copper foil cannot be provided with sufficient high-temperature heat resistance characteristics, which is not preferable. on the other hand. When the polyethyleneimine concentration exceeds 100 mg/L, the content of the above-mentioned trace component contained in the electrolytic copper foil tends to be excessive, and even if the tensile strength and the 0.2% proof strength of the electrolytic copper foil are increased, the elongation is hardened and the elongation is increased. The rate is falling, so it is not good.
此外,本申請案之電解銅箔之製造方法中使用之硫酸酸性銅電解液之氯濃度較好為0.5mg/L~2.5mg/L。氯濃度未達0.5mg/L時,常態拉伸強度雖高,但高溫耐熱特性顯著下降故不佳。另一方面,氯濃度超過2.5mg/L時,常態拉伸強度及高溫耐熱特性均下降故不佳。 Further, the chlorine concentration of the sulfuric acid copper electrolytic solution used in the method for producing an electrolytic copper foil of the present application is preferably from 0.5 mg/L to 2.5 mg/L. When the chlorine concentration is less than 0.5 mg/L, the normal tensile strength is high, but the high-temperature heat resistance is remarkably lowered, which is not preferable. On the other hand, when the chlorine concentration exceeds 2.5 mg/L, the normal tensile strength and the high-temperature heat resistance are both lowered, which is not preferable.
至於其他製造條件,較好在電解銅箔製造時之電流密度40A/dm2~90A/dm2、液溫40℃~55℃之範圍進行電解。若在該電解條件之範圍內,則可進行安定地電解,或可製造高品質之電解銅箔。 As for other production conditions, it is preferred to carry out electrolysis in the range of a current density of 40 A/dm 2 to 90 A/dm 2 and a liquid temperature of 40 ° C to 55 ° C at the time of production of the electrolytic copper foil. If it is within the range of the electrolysis conditions, it can be stably electrolyzed or a high-quality electrolytic copper foil can be produced.
表面處理銅箔之形態:本申請案之表面處理銅箔之特徵 係使用上述本申請案之電解銅箔而得。此處所謂的表面處理係粗化處理、防銹處理、矽烷偶合劑處理等之化學密著性提高處理。關於此時之粗化處理方法及種類並無特別限制。可採用例如於銅箔表面附著銅、銅合金、鎳、鎳合金等微細粒子之方法,使銅箔表面進行蝕刻加工形成微細凹凸形狀之方法等。 Shape of surface treated copper foil: characteristics of surface treated copper foil of this application It is obtained by using the above-mentioned electrolytic copper foil of this application. Here, the surface treatment is a chemical adhesion improving treatment such as a roughening treatment, a rustproof treatment, or a decane coupling agent treatment. There is no particular limitation on the method and type of roughening treatment at this time. For example, a method in which fine particles such as copper, a copper alloy, nickel, or a nickel alloy are adhered to the surface of a copper foil, and a surface of the copper foil is etched to form a fine uneven shape can be used.
且,作為防銹處理,只要是利用塗佈、附著、析出等於電解銅箔之表面獲得防銹效果者,則使用任一種防銹處理均可。例如可使用有機防銹處理(使用苯并三唑、咪唑等之處理)、無機防銹處理(使用鋅、鋅合金、鎳合金等之處理)。該無機防銹處理之情況下,亦較好施以本申請案之申請人等提出申請之國際申請案(國際公開編號WO2012/070589、國際公開編號WO2012/070591)之說明書內所記載之防銹處理。其理由為採用該等中所記載之防銹處理時,可進一步提高電解銅箔時所示之高溫耐熱特性。另外,關於矽烷偶合劑處理等之化學密著性提高處理亦無特別限制,只要根據欲貼合本申請案之表面處理銅箔之基材之構成樹脂的性質、或鋰離子二次電池之負極活性物質及黏結劑之性質,由習知之矽烷偶合劑中選擇使用即可。 Further, as the rust-preventing treatment, any rust-preventing treatment may be used as long as the rust-preventing effect is obtained by coating, adhering, or depositing the surface of the electrolytic copper foil. For example, an organic rustproof treatment (treatment using benzotriazole, imidazole, etc.) or an inorganic rustproof treatment (treatment using zinc, a zinc alloy, a nickel alloy, or the like) can be used. In the case of the inorganic rust-preventing treatment, the rust prevention described in the specification of the international application (International Publication No. WO2012/070589, International Publication No. WO2012/070591) filed by the applicant of the present application is also preferably applied. deal with. The reason for this is that when the rust-preventing treatment described in the above is employed, the high-temperature heat-resistant property shown in the case of electrolytic copper foil can be further improved. In addition, the chemical adhesion improving treatment such as the treatment of the decane coupling agent is not particularly limited, and the properties of the constituent resin of the substrate to be surface-treated with the copper foil of the present application or the negative electrode of the lithium ion secondary battery are used. The properties of the active material and the binder may be selected from conventional decane coupling agents.
以下,例示實施例與比較例,一邊對比該等例,一邊針對本申請案之電解銅箔所具備之良好高溫耐熱特性加以描述。 Hereinafter, the examples and comparative examples will be exemplified, and the high-temperature heat-resistant characteristics of the electrolytic copper foil of the present application will be described while comparing the examples.
實施例1中使用銅濃度為80g/L、游離硫酸濃度為140g/L、分子量為70000之聚乙烯亞胺濃度為55mg/L、氯濃度為2.2mg/L之硫酸酸性銅電解液,以電流密度70A/dm2、液溫50℃之條件進行電 解,獲得15μm厚之電解銅箔。該電解銅箔之評價結果在隨後之表2~表4中以可與比較例對比之方式顯示。 In Example 1, a copper acid electrolyte having a copper concentration of 80 g/L, a free sulfuric acid concentration of 140 g/L, a molecular weight of 70,000 and a polyethylenimine concentration of 55 mg/L, and a chlorine concentration of 2.2 mg/L was used as a current. The density is 70A/dm2, and the liquid temperature is 50°C. Solution, a 15 μm thick electrolytic copper foil was obtained. The evaluation results of the electrolytic copper foil are shown in the following Tables 2 to 4 in a manner comparable to the comparative examples.
關於實施例2~實施例10,由於與實施例1僅硫酸酸性銅電解液之組成不同,故個別之硫酸酸性銅電解液之組成概括示於表1。而且,各實施例中所得之電解銅箔之評價結果在隨後之表2~表4中以可與比較例對比之方式示出。 With respect to Examples 2 to 10, since the composition of the sulfuric acid-only copper electrolyte was different from that of Example 1, the composition of the individual sulfuric acid-based copper electrolyte was summarized in Table 1. Further, the evaluation results of the electrolytic copper foil obtained in each of the examples are shown in the following Tables 2 to 4 in a manner comparable to the comparative examples.
比較例1~比較例7採用與實施例1相同之銅濃度與游離硫酸濃度,且使用表1所示組成之硫酸酸性銅電解液,以與實施例1相同之條件進行電解,獲得15μm厚之電解銅箔。 Comparative Example 1 to Comparative Example 7 Using the same copper concentration and free sulfuric acid concentration as in Example 1, electrolysis was carried out under the same conditions as in Example 1 using the sulfuric acid acidic copper electrolyte having the composition shown in Table 1, to obtain a 15 μm thick layer. Electrolytic copper foil.
比較例8中使用上述專利文獻1之實施例6所記載之硫酸酸性銅電解液,以電流密度40A/dm2、液溫50℃之條件進行電解,獲得15μm厚之電解銅箔。 In Comparative Example 8, the sulfuric acid copper electrolytic solution described in Example 6 of Patent Document 1 was used, and electrolysis was carried out under the conditions of a current density of 40 A/dm 2 and a liquid temperature of 50 ° C to obtain an electrolytic copper foil having a thickness of 15 μm.
比較例9中使用上述專利文獻3之實施例5所記載之硫酸酸性銅電解液,以電流密度40A/dm2、液溫40℃之條件進行電解,獲得15μm厚之電解銅箔。 In Comparative Example 9, the sulfuric acid-based copper electrolytic solution described in Example 5 of Patent Document 3 was used, and electrolysis was carried out under the conditions of a current density of 40 A/dm 2 and a liquid temperature of 40 ° C to obtain an electrolytic copper foil having a thickness of 15 μm.
比較例10中使用上述專利文獻6之實施例所記載之用以獲得試料8之硫酸酸性銅電解液,以電流密度60A/dm2、液溫50℃之 條件進行電解,獲得15μm厚之電解銅箔。 In Comparative Example 10, the sulfuric acid-based copper electrolytic solution for obtaining the sample 8 described in the Example of the above Patent Document 6 was used, and the current density was 60 A/dm 2 and the liquid temperature was 50 ° C. Electrolysis was carried out under conditions to obtain an electrolytic copper foil having a thickness of 15 μm.
比較例11中使用上述專利文獻8之實施例所記載之用以獲得試料1之硫酸酸性銅電解液,以溶液溫度50℃、電流密度75A/dm2之條件進行電解,獲得厚度15μm之電解銅箔。 In Comparative Example 11, the sulfuric acid-based copper electrolytic solution for obtaining the sample 1 described in the above-mentioned Patent Document 8 was used, and electrolysis was carried out under the conditions of a solution temperature of 50 ° C and a current density of 75 A/dm 2 to obtain an electrolytic copper foil having a thickness of 15 μm. .
比較例12中使用上述專利文獻8之實施例所記載之用以獲得試料4之硫酸酸性銅電解液,以溶液溫度50℃、電流密度75A/dm2之條件進行電解,獲得厚度15μm之電解銅箔。 In Comparative Example 12, the sulfuric acid copper electrolytic solution for obtaining the sample 4 described in the above Patent Document 8 was used, and electrolysis was carried out under the conditions of a solution temperature of 50 ° C and a current density of 75 A/dm 2 to obtain an electrolytic copper foil having a thickness of 15 μm. .
比較例13使用三井金屬鑛業股份有限公司製造之VLP銅箔之製造中所使用之厚度15μm之電解銅箔。 Comparative Example 13 used an electrolytic copper foil having a thickness of 15 μm used in the production of a VLP copper foil manufactured by Mitsui Mining Co., Ltd.
電解銅箔中之微量成分含量:電解銅箔中之O含量及N含量係以稀硝酸進行銅箔表面之氧化物去除後,使用堀場製作所股份有限公司之EMGA-620進行測定。此時,O含量係以「惰性氣體溶解-被分散型紅外線吸收法(NDIR)」進行測定,N含量係以「惰性氣體溶解-熱傳導法(TCD)」進行測定。而且,電解銅箔中之C含量及S含量係以稀硝酸進行銅箔表面之氧化物去除後,使用堀場製作所股份有限公司之EMIA-920V,以「氧氣流中之高頻加熱-紅外線吸收法」進行測定。 Content of trace components in the electrolytic copper foil: The O content and the N content in the electrolytic copper foil were measured by using EMGA-620 of Horiba Co., Ltd. after removing the oxide on the surface of the copper foil with dilute nitric acid. At this time, the O content was measured by "inert gas dissolution-dispersion type infrared absorption method (NDIR)", and the N content was measured by "inert gas dissolution-heat transfer method (TCD)". Further, in the electrolytic copper foil, the C content and the S content are obtained by removing the oxide on the surface of the copper foil with dilute nitric acid, and using the EMIA-920V of Horiba Co., Ltd. as "the high frequency heating in the oxygen flow - the infrared absorption method" Take the measurement.
且,電解銅箔中之Cl含量係以溴化銀共沉澱-離子層析 法進行測定。具體之測定方法如下。以硝酸將電解銅箔加溫溶解,添加一定量之硝酸銀。接著,添加一定量之KBr溶液,使氯化物離子與溴化銀一起共沉澱。隨後,於暗處靜置15分鐘後,過濾沉澱物,且洗淨該沉澱物。隨後,將該沉澱物放入燒杯中,以硫脲溶液使沉澱物溶解,且放置於暗處隔夜。隨後,稀釋該溶液並經定容,且使用Dionex公司製造之ICS-2000導電度檢測器(溶離液KOH、管柱AS-20),以離子層析分析法測定氯化物離子濃度,算出Cl含量。 Moreover, the Cl content in the electrolytic copper foil is coprecipitation-ion chromatography with silver bromide The method is measured. The specific measurement method is as follows. The electrolytic copper foil is dissolved by heating with nitric acid, and a certain amount of silver nitrate is added. Next, a certain amount of KBr solution was added to coprecipitate the chloride ions together with the silver bromide. Subsequently, after standing for 15 minutes in the dark, the precipitate was filtered, and the precipitate was washed. Subsequently, the precipitate was placed in a beaker, the precipitate was dissolved in a thiourea solution, and placed in the dark overnight. Subsequently, the solution was diluted and made up to volume, and the chloride ion concentration was determined by ion chromatography using an ICS-2000 conductivity detector (dissolved KOH, column AS-20) manufactured by Dionex Corporation to calculate the Cl content. .
拉伸強度、0.2%耐力及伸長率:將實施例及比較例中獲得之電解銅箔切成長度10cm、寬度1cm之短條狀,且將該等使用作為拉伸強度等測定用試料。接著,使用Instron型拉伸試驗裝置(英斯特強力試驗機),測定拉伸強度、0.2%耐力及伸長率。 Tensile strength, 0.2% proof stress, and elongation: The electrolytic copper foil obtained in the examples and the comparative examples was cut into a strip having a length of 10 cm and a width of 1 cm, and used as a sample for measurement such as tensile strength. Next, tensile strength, 0.2% proof stress, and elongation were measured using an Instron type tensile tester (Instron strength tester).
試料之加熱條件:在惰性氣體氛圍之加熱烘箱內,在300℃×1小時、350℃×1小時、350℃×4小時之各溫度下加熱拉伸強度等之測定中所使用之短條狀試料,使爐冷卻至爐內接近室溫獲得加熱後之試料。使用該加熱後之該短條狀試料,與上述同樣測定拉伸強度、0.2%耐力及伸長率。 Heating conditions of the sample: short strips used in the measurement of heating tensile strength at various temperatures of 300 ° C × 1 hour, 350 ° C × 1 hour, 350 ° C × 4 hours in a heating oven under an inert gas atmosphere The sample was cooled to a temperature close to room temperature to obtain a sample after heating. Using the thus-heated short strip sample, tensile strength, 0.2% proof stress, and elongation were measured in the same manner as above.
進行實施例與比較例之對比時,使實施例與比較例之硫酸酸性銅電解液中所含之添加劑之調配對比以成為容易對比之方式示於表1。 When the comparison between the examples and the comparative examples was carried out, the blending of the additives contained in the sulfuric acid-based copper electrolytes of the examples and the comparative examples was shown in Table 1 in such a manner as to be easily compared.
如由該表1所瞭解,關於實施例,係滿足本申請案之電解銅箔之製造方法中為適當的硫酸酸性銅電解液為「以20mg/L~100mg/L之濃度含分子量10000~70000之聚乙烯亞胺」及「氯濃度為0.5mg/L~2.5mg/L」之2點要件。相對於此,可知比較例並未滿足本申請案之電解銅箔之製造方法中為適當的硫酸酸性銅電解液之添加劑要件,或使用含有完全不同之添加劑之硫酸酸性銅電解液。而且,實施例及比較例中所得之各電解銅箔中所含之微量成分含量示於下表2。 As understood from the Table 1, the examples are suitable for the method for producing an electrolytic copper foil according to the present application. The acidic copper acid electrolyte is "the molecular weight of 10,000 to 70,000 at a concentration of 20 mg/L to 100 mg/L. The two requirements of polyethyleneimine and "chlorine concentration is 0.5mg/L~2.5mg/L". On the other hand, it is understood that the comparative example does not satisfy the additive requirement of an appropriate sulfuric acid copper electrolytic solution in the method for producing an electrolytic copper foil of the present application, or the use of a sulfuric acid acidic copper electrolyte containing a completely different additive. Further, the contents of the trace components contained in each of the electrolytic copper foils obtained in the examples and the comparative examples are shown in Table 2 below.
由該表2,基於實施例與比較例之電解銅箔所含有之微量成分含量之觀點進行對比時,可理解如下。由表2可理解實施例之全部電解銅箔係滿足微量成分含量(C含量、N含量、O含量、S含量、Cl含量)之條件、及微量成分構成比率之條件。相對於此,可知比較例之電解銅箔未滿足該微量成分含量之條件或微量成分構成比率之條件之任一者。 From the viewpoint of the content of the trace component contained in the electrodeposited copper foil of the example and the comparative example, it can be understood as follows. It can be understood from Table 2 that all the electrolytic copper foils of the examples satisfy the conditions of the trace component contents (C content, N content, O content, S content, Cl content) and the composition ratio of the trace components. On the other hand, it is understood that the electrolytic copper foil of the comparative example does not satisfy any of the conditions of the content of the trace component or the composition ratio of the minor component.
此外,表2之比較例1未滿足微量成分含量之條件,但滿足氯構成比率之條件。又,檢視比較例3及比較例6時,可知雖滿足微量成分含量之條件,但未滿足氯構成比例之條件。該等比較例中所得之電解銅箔係如後述,為不具備良好之高溫耐熱特性者。由此可理解,若未滿足電解銅箔中所含之氯除外之微量成分構成比率、及氯構成比例之條件二者,則可知無法成為具備良好高溫耐熱特性之電解銅箔。 Further, Comparative Example 1 of Table 2 did not satisfy the conditions of the trace component content, but satisfied the conditions of the chlorine composition ratio. Further, when Comparative Example 3 and Comparative Example 6 were examined, it was found that the conditions of the trace component content were satisfied, but the conditions for the chlorine composition ratio were not satisfied. The electrolytic copper foil obtained in the above comparative examples is a product which does not have good high-temperature heat resistance as will be described later. From this, it can be understood that the electrolytic copper foil having excellent high-temperature heat resistance characteristics cannot be obtained if both the composition ratio of the minor component other than the chlorine contained in the electrolytic copper foil and the condition of the chlorine constituent ratio are not satisfied.
再者,以氮與硫與氯之合計含量為基準,著眼於作為微量成分的氮及氯之微量成分比率時,可知實施例與比較例之電解銅箔之差異更為明確。此時之氮之微量成分比率為{N/(N+S+Cl)}×100之值,氯之微量成分比率為{Cl/(N+S+Cl)}×100之值。實施例及比較例中獲得之各電解銅箔中所含之氮及氯之微量成分比率示於下表3。 In addition, when the ratio of nitrogen to chlorine as a trace component is considered as a reference, the difference between the electrolytic copper foils of the examples and the comparative examples is clear. The ratio of the trace component of nitrogen at this time is a value of {N/(N+S+Cl)}×100, and the ratio of the trace component of chlorine is a value of {Cl/(N+S+Cl)}×100. The ratios of the trace components of nitrogen and chlorine contained in each of the electrolytic copper foils obtained in the examples and the comparative examples are shown in Table 3 below.
由該表3所示之電解銅箔中之微量成分比率可理解如下。最初,檢視{N/(N+S+Cl)}×100之值時,實施例為20.3質量%~45.8質量%,比較例為6.2質量%~27.3質量%,雖有部分重複之範圍,但可理解實施例者有顯示較大值之傾向。並且,全部實施例均滿足{N/(N+S+Cl)}×100≧20值量%之關係,但比較例之情況見到大部分未滿足該關係。據此,為具備良好高溫耐熱特性之電解銅箔之情況較好 微量成分滿足{N/(N+S+Cl)}×100≧20質量%之關係。 The ratio of the trace components in the electrolytic copper foil shown in Table 3 can be understood as follows. First, when the value of {N/(N+S+Cl)}×100 is examined, the examples are from 20.3 mass% to 45.8% by mass, and the comparative examples are from 6.2 mass% to 27.3 mass%, although there are some overlapping ranges, It will be appreciated that embodiments have a tendency to display larger values. Further, all of the examples satisfy the relationship of {N/(N + S + Cl)} × 100 ≧ 20 value %, but the case of the comparative example sees that most of the relationship is not satisfied. Accordingly, it is better to have an electrolytic copper foil having good high temperature and heat resistance characteristics. The trace component satisfies the relationship of {N/(N+S+Cl)}×100≧20% by mass.
接著,檢視表3所示之{Cl/(N+S+Cl)}×100之值時,實施例為3.0值量%~15.9質量%,比較例為7.1質量%~86.2質量%,雖有部分重複之範圍,但可理解比較例者有顯示較大值之傾向。而且,全部實施例均滿足{Cl/(N+S+Cl)}×100≦20質量%之關係,但比較例之情況見到大部分均未滿足該關係。此處,氯濃度未達本申請案中較佳硫酸酸性銅電解液之組成範圍之下限值或超過上限值者之比較例1、比較例2、比較例7之電解銅箔係如後述,為不具備良好高溫耐熱特性者。因此,可理解電解銅箔滿足上述「{Cl/(C+N+S+Cl)}×100之值」及「{N/(N+S+Cl)}×100」之值,進而,「{Cl/(N+S+Cl)}×100」之值在適當範圍,係最安定、且具備良好高溫耐熱特性之條件。 Next, when the value of {Cl/(N+S+Cl)}×100 shown in Table 3 is examined, the examples are 3.0% by mass to 15.9% by mass, and the comparative examples are 7.1% by mass to 86.2% by mass, although there are The extent of partial repetition, but it is understood that the comparative example has a tendency to show larger values. Further, all of the examples satisfy the relationship of {Cl / (N + S + Cl)} × 100 ≦ 20% by mass, but in the case of the comparative example, most of the relationships are not satisfied. Here, the electrolytic copper foil of Comparative Example 1, Comparative Example 2, and Comparative Example 7 in which the chlorine concentration is less than the lower limit of the composition range of the preferred sulfuric acid-based copper electrolytic solution in the present application or the upper limit is as follows. , for those who do not have good high temperature heat resistance. Therefore, it can be understood that the electrolytic copper foil satisfies the above values of "{Cl/(C+N+S+Cl)}×100" and "{N/(N+S+Cl)}×100", and further, The value of {Cl/(N+S+Cl)}×100" is in the proper range and is the most stable and has high temperature and heat resistance characteristics.
以下,敘述關於實施例之電解銅箔與比較例之電解銅箔之物理特性。該物理特性以使實施例與比較例之對比更容易比對之方式示於表4。 Hereinafter, physical properties of the electrolytic copper foil of the examples and the electrolytic copper foil of the comparative example will be described. This physical property is shown in Table 4 in such a manner that the comparison of the examples and the comparative examples is easier.
針對表4所示之常態拉伸強度及0.2%耐力加以描述。實施例之電解銅箔之情況,顯示常態拉伸強度為610MPa~774MPa,常態0.2%耐力為442MPa~574MPa之值。相對於此,比較例之情況,顯示常態拉伸強度為395MPa~791MPa,常態0.2%耐力為358MPa~510MPa之值。據此,可理解實施例之電解銅箔滿足「常態拉伸強度為600MPa以上」之條件。 The normal tensile strength and 0.2% proof force shown in Table 4 are described. In the case of the electrolytic copper foil of the example, the normal tensile strength is 610 MPa to 774 MPa, and the normal 0.2% endurance is 442 MPa to 574 MPa. On the other hand, in the case of the comparative example, the normal tensile strength was 395 MPa to 791 MPa, and the normal 0.2% proof stress was 358 MPa to 510 MPa. Accordingly, it is understood that the electrolytic copper foil of the embodiment satisfies the condition of "normal tensile strength of 600 MPa or more".
接著,針對表4所示之300℃×1小時加熱後之拉伸強度及0.2%耐力加以描述。實施例之電解銅箔之情況,顯示300℃×1小時加熱後之拉伸強度為502MPa~613MPa,300℃×1小時加熱後之0.2%耐力為384MPa~460MPa之值。相對於此,比較例之情況,顯示300℃×1小時加熱後之拉伸強度為162MPa~538MPa,300℃×1小時加熱後之0.2%耐力為118MPa~396MPa之值。據此可知,即使300℃×1小時加熱後,相較於比較例,實施例者亦顯示較高之值。例如,比較例中,在常態下顯示最高物理特性之比較例10在300℃×1小時加熱後之拉伸強度急速降低至199MPa,且檢視300℃×1小時加熱後之0.2%耐力亦急遽降低至179MPa,故可理解不能說是可顯示良好高溫耐熱特性之電解銅箔。然而,更詳細來看時,比較例12之情況,顯示與「300℃×1小時加熱後之拉伸強度為500MPa以上」及「300℃×1小時加熱後之0.2%耐力為380MPa以上」之與實施例同等之高溫耐熱特性。 Next, the tensile strength after heating at 300 ° C × 1 hour shown in Table 4 and 0.2% proof stress are described. In the case of the electrolytic copper foil of the example, the tensile strength after heating at 300 ° C for 1 hour was 502 MPa to 613 MPa, and the 0.2% endurance after heating at 300 ° C for 1 hour was 384 MPa to 460 MPa. On the other hand, in the case of the comparative example, the tensile strength after heating at 300 ° C for 1 hour was 162 MPa to 538 MPa, and the 0.2% resistance after heating at 300 ° C for 1 hour was 118 MPa to 396 MPa. From this, it can be seen that even after heating at 300 ° C for 1 hour, the examples showed higher values than the comparative examples. For example, in the comparative example, Comparative Example 10 which showed the highest physical properties under normal conditions rapidly decreased the tensile strength after heating at 300 ° C for 1 hour to 199 MPa, and the 0.2% endurance after heating at 300 ° C × 1 hour was also sharply lowered. Up to 179 MPa, it can be understood that it cannot be said to be an electrolytic copper foil which exhibits good high-temperature heat resistance. However, in more detail, in the case of Comparative Example 12, it was shown that "the tensile strength after heating at 300 ° C for 1 hour was 500 MPa or more" and "0.2% withstand resistance after heating at 300 ° C for 1 hour was 380 MPa or more". High temperature heat resistance characteristics equivalent to those of the examples.
然而,針對表4所示之350℃×1小時加熱後之拉伸強度及0.2%耐力來看時,可理解相較於比較例,實施例之電解銅箔之高溫耐 熱特性大幅勝出。實施例之電解銅箔之情況,顯示350℃×1小時加熱後之拉伸強度為473MPa~583MPa,350℃×1小時加熱後之0.2%耐力為371MPa~446MPa之值。相對於此,比較例之情況,顯示350℃×1小時加熱後之拉伸強度為71MPa~455MPa,350℃×1小時加熱後之0.2%耐力為64MPa~359MPa之值。據此可知,350℃×1小時加熱後,拉伸強度及0.2%耐力相較於比較例,實施例者均顯示明顯較高之值。亦即,可理解實施例之電解銅箔相較於比較例,可耐受在更高溫度下之加熱,相對於過去之電解銅箔之優異性變顯著。300℃×1小時加熱後之拉伸強度及0.2%耐力,若觀察具備與實施例同等特性之比較例4、比較例5、比較例11及比較例12時,350℃×1小時加熱後,拉伸強度均降低至455MPa以下,0.2%耐力均降低至359MPa以下。亦即可明瞭,比較例之情況清楚並未滿足「350℃×1小時加熱後之拉伸強度為470MPa以上」之條件。 However, in view of the tensile strength after heating at 350 ° C for 1 hour shown in Table 4 and the 0.2% proof stress, it is understood that the high temperature resistance of the electrolytic copper foil of the example is compared with the comparative example. The thermal characteristics are greatly won. In the case of the electrolytic copper foil of the example, the tensile strength after heating at 350 ° C for 1 hour was 473 MPa to 583 MPa, and the 0.2% resistance after heating at 350 ° C for 1 hour was 371 MPa to 446 MPa. On the other hand, in the case of the comparative example, the tensile strength after heating at 350 ° C for 1 hour was 71 MPa to 455 MPa, and the 0.2% resistance after heating at 350 ° C for 1 hour was 64 MPa to 359 MPa. From this, it can be seen that the tensile strength and the 0.2% endurance after heating at 350 ° C for 1 hour were significantly higher than those of the comparative examples. That is, it can be understood that the electrolytic copper foil of the embodiment can withstand heating at a higher temperature than the comparative example, and the superiority with respect to the electrolytic copper foil of the past becomes remarkable. When the tensile strength and the 0.2% proof stress after heating at 300 ° C for 1 hour were observed, when Comparative Example 4, Comparative Example 5, Comparative Example 11 and Comparative Example 12 having the same characteristics as those of the Examples were observed, after heating at 350 ° C for 1 hour, The tensile strength was reduced to 455 MPa or less, and the 0.2% endurance was reduced to 359 MPa or less. It is also clear that the case of the comparative example does not satisfy the condition that "the tensile strength after heating at 350 ° C for 1 hour is 470 MPa or more".
以下,作為負荷更大熱量之例,關於350℃×4小時加熱後之拉伸強度及0.2%耐力簡單加以描述。該加熱試驗係使用實施例8與實施例10之電解銅箔。其結果,實施例8之電解銅箔之情況,350℃×4小時加熱後之拉伸強度為533MPa、350℃×4小時加熱後之0.2%耐力為416MPa、350℃×4小時加熱後之伸長率顯示2.2%之值。且,實施例10之電解銅箔之情況,350℃×4小時加熱後之拉伸強度為520MPa、350℃×4小時加熱後之0.2%耐力為423MPa、350℃×4小時加熱後之伸長率顯示1.7%之值。該等值認為是承受極度過於嚴苛之加熱後之值,係非常良好之值。據此,依據本申請案之電解銅箔,亦可 滿足「350℃×4小時加熱後之拉伸強度為470MPa以上」、「350℃×4小時加熱後之0.2%耐力為370MPa以上」之兩條件。 Hereinafter, as an example of the load of more heat, the tensile strength after heating at 350 ° C for 4 hours and the 0.2% proof stress will be briefly described. In the heating test, the electrolytic copper foils of Example 8 and Example 10 were used. As a result, in the case of the electrolytic copper foil of Example 8, the tensile strength after heating at 350 ° C for 4 hours was 533 MPa, and the 0.2% proof after heating at 350 ° C for 4 hours was 416 MPa, and the elongation after heating was 350 ° C × 4 hours. The rate shows a value of 2.2%. Further, in the case of the electrolytic copper foil of Example 10, the tensile strength after heating at 350 ° C for 4 hours was 520 MPa, the 0.2% endurance after heating at 350 ° C × 4 hours was 423 MPa, and the elongation after heating at 350 ° C × 4 hours Showing a value of 1.7%. This value is considered to be a very harsh value after being subjected to extremely severe heating. Accordingly, according to the electrolytic copper foil of the present application, It satisfies two conditions of "the tensile strength after heating at 350 ° C for 4 hours is 470 MPa or more" and "the 0.2% resistance after heating at 350 ° C for 4 hours is 370 MPa or more".
以上所述之本申請案之電解銅箔同時具備「常態拉伸強度為600MPa以上」、「350℃×1小時加熱後之拉伸強度為470MPa以上」之物理特性。據此,即使是薄的電解銅箔,亦具備皺褶之發生少、良好的操作特性。因此,上述電解銅箔即使承受高溫負荷仍具備良好的高溫耐熱性,作為依據必要施以各種表面處理之表面處理銅箔,可較好地使用於印刷配線板、鋰離子二次電池等領域中。此外,本申請案之電解銅箔之製造方法係僅變更電解銅箔之硫酸酸性銅電解液,由於可直接使用過去之電解銅箔之製造設備,故就不需新的設備投資方面而言係較佳。 The electrolytic copper foil of the present application described above has physical properties of "normal tensile strength of 600 MPa or more" and "tensile strength of 350 ° C for 1 hour and heating of 470 MPa or more". According to this, even a thin electrolytic copper foil has less wrinkles and good handling characteristics. Therefore, the above-mentioned electrodeposited copper foil has excellent high-temperature heat resistance even under high-temperature load, and can be preferably used in a field of printed wiring boards, lithium ion secondary batteries, and the like as a surface-treated copper foil which is subjected to various surface treatments as necessary. . Further, the method for producing an electrolytic copper foil of the present application is to change only the sulfuric acid-based copper electrolytic solution of the electrolytic copper foil, and since the manufacturing equipment of the electrolytic copper foil of the past can be directly used, it is not necessary to invest in new equipment. Preferably.
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-
2014
- 2014-01-29 TW TW103103410A patent/TWI518210B/en active
- 2014-01-30 JP JP2014559735A patent/JP6373764B2/en active Active
- 2014-01-30 MY MYPI2019003304A patent/MY174169A/en unknown
- 2014-01-30 MY MYPI2015702490A patent/MY173524A/en unknown
- 2014-01-30 CN CN201480006759.9A patent/CN104955988B/en active Active
- 2014-01-30 KR KR1020197000401A patent/KR102272695B1/en active IP Right Grant
- 2014-01-30 WO PCT/JP2014/052069 patent/WO2014119656A1/en active Application Filing
- 2014-01-30 KR KR1020157020495A patent/KR102227681B1/en active IP Right Grant
-
2015
- 2015-07-31 PH PH12015501706A patent/PH12015501706A1/en unknown
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN106663816A (en) * | 2015-06-18 | 2017-05-10 | Ls美创有限公司 | Electrolytic copper foil for lithium secondary battery and lithium secondary battery including same |
US10418635B2 (en) | 2015-06-18 | 2019-09-17 | Kcf Technologies Co., Ltd. | Electrolytic copper foil for lithium secondary battery and lithium secondary battery comprising the same |
CN106663816B (en) * | 2015-06-18 | 2020-02-11 | Kcf技术有限公司 | Electrolytic copper foil for lithium secondary battery and lithium secondary battery comprising the same |
Also Published As
Publication number | Publication date |
---|---|
KR20190006075A (en) | 2019-01-16 |
PH12015501706A1 (en) | 2015-10-12 |
KR102227681B1 (en) | 2021-03-15 |
MY173524A (en) | 2020-01-31 |
MY174169A (en) | 2020-03-12 |
JP6529646B2 (en) | 2019-06-12 |
CN104955988B (en) | 2018-01-30 |
KR20150114484A (en) | 2015-10-12 |
JP6373764B2 (en) | 2018-08-15 |
WO2014119656A1 (en) | 2014-08-07 |
CN104955988A (en) | 2015-09-30 |
JPWO2014119656A1 (en) | 2017-01-26 |
JP2018165411A (en) | 2018-10-25 |
KR102272695B1 (en) | 2021-07-05 |
TWI518210B (en) | 2016-01-21 |
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