TW201432393A - 形成包含紫外光可固化有機矽氧烷樹脂之平坦化層之方法以及藉其所形成的平坦化層 - Google Patents
形成包含紫外光可固化有機矽氧烷樹脂之平坦化層之方法以及藉其所形成的平坦化層 Download PDFInfo
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- TW201432393A TW201432393A TW102139496A TW102139496A TW201432393A TW 201432393 A TW201432393 A TW 201432393A TW 102139496 A TW102139496 A TW 102139496A TW 102139496 A TW102139496 A TW 102139496A TW 201432393 A TW201432393 A TW 201432393A
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- Prior art keywords
- organic siloxane
- gate
- resin layer
- layer
- weight
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- 239000011347 resin Substances 0.000 title claims abstract description 57
- 229920005989 resin Polymers 0.000 title claims abstract description 57
- 238000000034 method Methods 0.000 title claims abstract description 44
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 title claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 238000005530 etching Methods 0.000 claims abstract description 7
- 230000001678 irradiating effect Effects 0.000 claims abstract description 5
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 30
- PXRMLPZQBFWPCV-UHFFFAOYSA-N dioxasilirane Chemical compound O1O[SiH2]1 PXRMLPZQBFWPCV-UHFFFAOYSA-N 0.000 claims description 23
- 150000001875 compounds Chemical class 0.000 claims description 8
- 125000000524 functional group Chemical group 0.000 claims description 6
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- 239000000178 monomer Substances 0.000 claims description 4
- 238000006116 polymerization reaction Methods 0.000 claims description 4
- 230000003301 hydrolyzing effect Effects 0.000 claims description 3
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 claims description 3
- YNEHCIJMLGCQIS-UHFFFAOYSA-N 2-methylprop-2-enoic acid;trimethoxy(propyl)silane Chemical compound CC(=C)C(O)=O.CCC[Si](OC)(OC)OC YNEHCIJMLGCQIS-UHFFFAOYSA-N 0.000 claims description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 2
- YRLNNQCGDRKCBZ-UHFFFAOYSA-N benzhydryloxy(dimethoxy)silane Chemical compound C1(=CC=CC=C1)C(O[SiH](OC)OC)C1=CC=CC=C1 YRLNNQCGDRKCBZ-UHFFFAOYSA-N 0.000 claims description 2
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 claims description 2
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 claims description 2
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- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 claims description 2
- FJKCDSVHCNEOOS-UHFFFAOYSA-N ethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[SiH](OCC)C1=CC=CC=C1 FJKCDSVHCNEOOS-UHFFFAOYSA-N 0.000 claims description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 claims description 2
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 claims description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 claims description 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 claims 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78636—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device with supplementary region or layer for improving the flatness of the device
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- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Nonlinear Science (AREA)
- Formation Of Insulating Films (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
本發明提供一種形成包含有紫外光可固化有機矽氧烷樹脂之平坦化層之方法,以及藉其所形成之平坦化層。該方法包括於一有閘極之基材上形成一紫外光可固化有機矽氧烷樹脂層;透過由基材朝上方照射紫外光以形成一固化有機矽氧烷樹脂層,但其條件為該閘極上方部分未曝露於紫外光,藉此保留一未固化有機矽氧烷樹脂層;使用顯影液移除未固化有機矽氧烷樹脂層;且使用顯影液蝕刻該固化有機矽氧烷樹脂層。根據該形成平坦化層之方法中,由厚金屬佈線產生的厚度步驟可較佳地平坦化,而實現低電阻的金屬佈線,可用於開發具大尺寸及高解析的超高速TFT。
Description
本發明主張韓國專利申請號第2012-0142217號,申請日為2012年12月7日之優先權,且該優先權案全文揭示內容以參考方式併入本文中。
本發明關於一種形成包含紫外光可固化有機矽氧烷樹脂之平坦化層之方法,以及藉其所形成之平坦化層;更具體而言,關於一種形成包含紫外光可固化有機矽氧烷樹脂之平坦化層之方法,其係用於光學裝置,例如LCD(液晶顯示器)和OLDE(有機發光二極管),以及藉其所形成之平坦化層。
為了製造大螢幕以及3D顯示所需的高速反應,因此傾向於降低佈線材料的電阻。
因為這個原因,已經努力開發具有大尺寸及高解析之超高速TFT(薄膜電晶體),其係透過使用厚的銅佈線材料作為閘極金屬佈線已實現低電阻。特別是已有嘗試使用厚度為1μm或以上之後銅箔佈線作為閘極金屬佈線。
使用厚的銅佈線,則需要平坦化技術來解決閘極厚度差異的問題。具體而言,需要開發一種即使不同尺寸仍可均勻平坦化之材料以及形成方法。
現有閘極絕緣層係使用真空CVD(化學氣相沉積法)以氮化
矽(SiNx)或氧化矽(SiO2)薄膜形成。然而,如圖1所示,當一厚度為0.3μm或更低之閘極20形成於基材10時,閘極絕緣層30可適當地形成。另一方面,當施以一厚度為1μm或以上之閘極20時,該閘極絕緣層30無法形成,或是僅於截面面積上非常薄地形成。因此,其產生了問題如電路短路的發生以及難以形成其他薄膜層,如形成於上層的一半導體層。
再者,如圖2所示,即使在一具有厚度為1μm或以上之厚閘極20的基材10上,使用一有機材料或無機材料,以及一有機-無機混合材料形成一平坦化層40的此種方法,仍存在有問題,因為一在閘極的上端必然形成了一個階梯狀物,因此需要進行進一步平坦化的程序。
這種平坦化層應對基材或更低的層具有高黏附,且有一層狀物形成於該平坦化層的上部,並且有效地防止包含於材料內的化合物擴散至間層,從而阻斷不良影響。
特別是,需要防止作為閘極金屬佈線的銅佈線材料的擴散,銅氧化也應有效地阻絕,且對於形成在平坦化層上部的半導體材料或閘極絕緣層的影響也應盡量減少。
再者,該平坦化層本身應該是非常透明的,且不應該變性,如因長期暴露於高溫、高濕度、紫外線等等造成的黃化或風化。
因此,本發明人發現,當矽氧烷取代常規使用由碳化和物所組成的有機基組合物而進行水解聚合,然後一矽氧烷寡聚物進一步具有感光性官能基作為形成平坦化層的材料,這種作為平坦化層之材料塗覆並透過紫外光由基材底部往上方照射固化後,可實現一較佳的施加一厚金屬佈線的平坦化層,從而開發具有高解析的超高速TFT。
本發明關於一種形成包含有一紫外光可固化有機矽氧烷樹脂之平坦化層之方法。
此外,本發明係關於一包含有一紫外光可固化有機矽氧烷樹脂之平坦化層。
根據本發明之一方面,係提供一種形成一平坦化層之方法,
該方法包含:於一形成有閘極之基材上形成一紫外光可固化有機矽氧烷樹脂層;透過由基材的底部朝上方照射紫外光以形成一固化有機矽氧烷樹脂層,但其條件為該閘極上方部分未曝露於紫外光,藉此保留一未固化有機矽氧烷樹脂層;使用一顯影劑移除該未固化有機矽氧烷樹脂層;以及使用一顯影劑蝕刻該固化有機矽氧烷樹脂層。
根據本發明之形成閘極平坦化層之方法,較佳為透過塗覆該紫外光固化有機矽氧烷樹脂層之厚度大於或等於該閘極之厚度,而形成該紫外光固化有機矽氧烷樹脂層,且使用的紫外光強度為50至300mJ/cm2。
根據本發明之形成閘極平坦化層之方法,該紫外光可固化有機矽氧烷樹脂包含一具有聚苯乙烯換算之重量平均分子量為100至100,000之感光性有機矽氧烷寡聚物。再者,該感光性有機矽氧烷寡聚物係透過矽烷水解聚合以製備一矽烷寡聚物,且接著賦予該矽烷寡聚物一感光性官能基而形成。
於此方面,該矽烷較佳為為一或多個選自由苯基三甲氧基矽烷(phenyltrimethoxysilane)、苯基三乙氧基矽烷(phenyltriethoxysilane)、二苯基三甲氧基矽烷(diphenyltrimethoxysilane)、二苯基乙氧基矽烷(diphenylethoxysilane)、甲基三乙氧基矽烷(methyltriethoxysilane)、甲基三甲氧基矽烷(methyltrimethoxysilane)、四甲氧基矽烷(tetramethoxysilane)、四乙氧基矽烷(tetraethoxysilane)、乙烯基三甲氧基矽烷(vinyltrimethoxysilane)、乙烯基三乙氧基矽烷(vinyltriethoxysilane)、二甲基二甲氧基矽烷(dimethyldimethoxysilane),及二甲基二乙氧基矽烷(dimethyldiethoxysilane)所組成之群組。而關於賦予該感光性官能基之一化合物,則較佳係選自甲基丙烯醯基丙基三甲氧基矽烷(methacrylatepropyltrimethoxysilane)或甘油酸丙烷三甲氧矽烷(glycidyloxypropyltrimethoxysilane)。
根據本發明之形成閘極平坦化層之方法,該紫外光可固化有機矽氧烷樹脂包含:40至70wt%之感光性有機矽氧烷寡聚物;10至40wt%之有機溶劑;5至20wt%之多官能基甲基丙烯基單體;3至15wt%之光起始劑;以及0.1至2.0wt%之平整劑。
再者,較佳地,該閘極具有厚度為1μm或以上。
此外,根據本發明之形成閘極平坦化層之方法,在蝕刻後,較佳為該方法進一步包含於溫度150 to 250℃下處理15分鐘至1小時之陳化(aging)處理,以獲得表面硬度為5H或以上之鉛筆硬度。
根據本發明之另一方面,係提供一種閘極平坦化層,其包含一具有感光性有機矽氧烷寡聚物之紫外光可固化有機矽氧烷樹脂,其係透過根據形成該閘極平坦化層之方法而形成。
10‧‧‧基材
20‧‧‧閘極
30‧‧‧閘極絕緣層
40‧‧‧平坦化層
100‧‧‧基材
200‧‧‧閘極
300‧‧‧樹脂層
301‧‧‧未硬化樹脂層
302‧‧‧硬化樹脂層
400‧‧‧閘極絕緣層
本發明的上述目的、特徵和優點,經由本技術領域之通常知識者透過下列的實施方式並配合附圖,而顯而易見,其中:圖1為一現有TFT剖面圖顯示一閘極及絕緣層結構。
圖2為現有TFT剖面圖顯示閘極處液態類平坦化層以及絕緣層結構。
圖3為模擬圖,示意根據本發明一實施例之形成平坦化層之程序。
圖4為模擬圖,示意根據本發明之一實施例於TFT上形成平坦化層後,形成一閘極絕緣層之程序。
圖5為模擬圖,示意根據本發明之一實施例,於TFT上形成閘極絕緣層後,形成一平坦化層之程序。
本發明例式的實施例將由以下的實施方式並配合附圖作詳細說明。當本發明經由下方的實施方式所詳述,對技藝人士而言,可在不偏離本發明之範圍下,做明顯的修飾而仍包含於本發明之範疇。
於此,本發明將配合附圖進一步說明。
圖3為一模擬圖,示意根據本發明一實施例之形成平坦化層之程序。
參照圖3,本發明提供了一種形成閘極平坦化層之方法,其中該方法包含於一形成有紫外光閘極的基材上形成一紫外光可固化有機矽
氧烷樹脂層(S11);透過由基材的底部朝上方照射紫外光以形成一固化有機矽氧烷樹脂層,但其條件為該閘極上方部分未曝露於紫外光,藉此保留一未固化有機矽氧烷樹脂層(S12);使用一顯影劑移除該未固化有機矽氧烷樹脂層(S13);且使用一顯影劑蝕刻該固化之有機矽氧烷樹脂層(S14)。
在該形成有紫外光閘極的基材上形成一紫外光可固化有機矽氧烷樹脂層(S11)時,較佳地,一閘極200以一厚度為1μm或以上而形成於一基材100上,且接著,一紫外光可固化有機矽氧烷樹脂層矽形成於該形成有閘極200之基材100上。
於此方面,作為基材100,可使用的材料為相關領域中通用者,且例如,一玻璃基材、一塑膠基材等等均可使用。
再者,一金屬具有厚度為1μm或以上而可形成低電阻的金屬佈線者,可作為閘極200,較佳為銅。
當使用具有厚度為1μm或以上的閘極,該樹脂層300係用於平坦化該厚度的階層,且該樹脂層300較佳可使用包含有一感光性有機矽氧烷寡聚物之一紫外光可固化有機矽氧烷樹脂而形成。
於此方面,該感光性有機矽氧烷寡聚物的合成,係透過矽烷水解聚合乙製備一矽烷寡聚物,且接著賦予該矽烷寡聚物一感光性官能基而形成。
在此狀況下,較佳地,該感光性有機矽氧烷寡聚物具有一聚苯乙烯換算之重量平均分子量為100至100,000。當該分子量超出上述範圍,亦即,100或更小,該分子量過小而無法形成耐久塗層;另一方面,當該分子量為100,000或更大,礙於凝膠的形成,其難以儲存該寡聚物於一均勻及穩定的溶液中且能形成一均勻的塗覆層。
用於合成感光性有機矽氧烷寡聚物之矽烷,可為一或多個選自由苯基三甲氧基矽烷、苯基三乙氧基矽烷、二苯基三甲氧基矽烷、二苯基乙氧基矽烷、甲基三乙氧基矽烷、甲基三甲氧基矽烷、四甲氧基矽烷、四乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、二甲基二甲氧基矽烷,及二甲基二乙氧基矽烷所組成之群組,但本發明並不限至於此。
另外,一感光性基團係提供與該由矽烷水解聚合合成的矽氧烷寡聚物,使其帶有感光性官能。作為賦予感光性基團之化合物,可使用甲基丙烯醯基丙基三甲氧基矽烷或甘油酸丙烷三甲氧矽烷,但本發明並不限制於此。
除了上述的感光性有機矽氧烷寡聚物外,該紫外光可固化有機矽氧烷樹脂包含一有機溶劑、一多官能基甲基丙烯基單體、一光起始劑以及一平整劑。
具體而言,根據本發明之包含於閘極平坦化層之該紫外光可固化有機矽氧烷樹脂,包含40至70wt%之感光性有機矽氧烷寡聚物;10至40wt%之有機溶劑;5至20wt%之多官能基甲基丙烯基單體;3至15wt%之光起始劑;以及0.1至2.0wt%之表面改質劑(平整劑)。
在這方面,有機溶液可包括醇類,如甲醇、乙醇、2-丙醇、1-丙醇、1-丁醇、2-丁醇、1-戊醇、3-甲基丁醇、2-甲基丁醇、2-戊醇、4-甲基-2-戊醇、環己醇、甲基環己醇、正己醇、糠醇、糠基甲醇、四氫糠醇及苯甲醇;酮類,如丙酮、甲基乙基酮、甲基異丁基酮、甲基正丁基酮、甲基第三丁基酮、甲基正戊醇、甲基正己醇、二乙基酮、二異丙基酮、二異丁基酮、環戊酮、環己酮、甲基環己酮、環庚酮、環辛酮、2,4-戊二酮、2,5-己二酮及苯乙酮;烴類,如正戊烷、異戊烷、正己烷、異己烷、正庚烷、異庚烷、辛烷、異辛烷、2,2,4-三乙基戊烷、環己烷、甲基環己烷、苯、甲苯、二甲苯、三乙基苯、乙基苯、甲基乙基苯、n-丙基苯、異丙基苯、戊基苯、二乙基苯、異丁基苯、三乙基苯、及二異丙基苯;醚類,如四氫呋喃、2-甲基四氫呋喃、二乙基醚、二-n-丙基醚、二-異丙基醚、二-n-丁基醚、二-異丁基醚、二-n-己基醚、苯甲醚、苯乙醚、二苯醚、乙基苄基醚、雙(2-乙基己基)醚、環氧乙烷、1,2-環氧丙烷、1,4-二噁烷、4-甲基二氧戊環、二甲基二氧戊環、二苄基醚、及丁基苯基醚;酯類,如乙酸甲酯、乙酸乙酯、n-乙酸丙酯、異乙酸丙酯、n-乙酸丁酯、乙酸異丁酯、乙酸第二丁酯、n-乙酸戊酯、乙酸第二戊酯、甲基戊基乙酸酯、乙酸-2-乙基丁酯、乙酸-2-乙基己酯、乙酸苄酯、乙酸環己酯、乙酸甲基環己酯、n-乙酸壬酯、乙醯醋酸甲
酯、乙醯醋酸乙酯、丙酸乙酯、n-丙酸丁酯、丙酸異戊酯、丙酮酸甲酯、丙酮酸乙酯、草酸二乙酯、二-n-草酸丁酯、乳酸甲酯、乳酸乙酯、乳酸丁酯、n-乳酸戊酯、甲氧基丙酸甲酯、乙氧基丙酸乙酯、丙二酸二乙酯、鄰苯二甲酸二甲酯、鄰苯二甲酸二乙酯、碳酸二乙酯、及碳酸丙烯酯;內酯類,如γ-丁內酯、γ-戊內酯、及δ-戊內酯;腈類,如乙腈、丙腈、及丙烯腈;乙二醇類,如乙二醇、丙二醇、1,2-丁二醇、1,3-丁二醇、1,2-戊二醇、2,4-戊二醇、2-甲基戊烷-2,4-二醇、2,5-己二醇、2,4-庚二醇、2-乙基己烷-1,3-二醇、二甘醇、二丙烯甘醇、三甘醇、及三丙二醇;羥基酮類,如羥基丙酮(丙酮醇)、3-羥基-3-甲基-2-丁酮、4-羥基-3-甲基-2-丁酮、5-羥基-2-戊酮、及4-羥基-4-甲基-2-戊酮;作為甘醇醚、乙二醇單醚(ethyleneglycolmonoethers),如乙二醇單甲基醚、乙二醇單乙基醚、乙二醇單丙基醚、乙二醇單n-丁基醚、乙二醇單n-戊基醚、乙二醇單n-己基醚、乙二醇單2-乙基丁基醚、乙二醇單2-乙基己基醚、及乙二醇單苯基醚;乙二醇二醚(ethyleneglycoldiethers),如乙二醇二甲基醚、乙二醇二乙基醚、乙二醇甲基乙基醚、及乙二醇二丁基醚;乙二醇乙酸酯類,如乙二醇單甲基醚乙酸酯、乙二醇單乙基醚乙酸酯、乙二醇單丙基醚乙酸酯、乙二醇單n-丁基醚乙酸酯、及乙二醇二乙酸酯;丙二醇單醚,如丙二醇單甲基醚、丙二醇單乙基醚、丙二醇單n-丙基醚、丙二醇單n-丁基醚、及丙二醇單t-丁基醚;丙二醇二醚,如丙二醇二甲基醚、丙二醇二乙基醚、及丙二醇甲基乙基醚;丙二醇乙酸酯,如丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯、丙二醇單n-丙基醚乙酸酯、丙二醇單n-丁基醚乙酸酯、及丙二醇二乙酸酯;丁二醇衍生物,如3-甲氧基-1-丁醇、3-甲氧基乙酸丁酯、3-甲基-3-甲氧基-1-丁醇、3-甲氧基-1-乙酸丁酯、及3-甲基-3-甲氧基-1-乙酸丁酯;二乙基甘醇單醚,如二乙基甘醇單甲基醚、二乙二醇單乙基醚、二乙二醇單丙基醚、二乙二醇單n-丁基醚、及二乙二醇單n-己基醚;二乙二醇二醚,如二乙二醇二甲基醚、二乙二醇甲基乙基醚、及二乙二醇二乙基醚;二乙二醇乙酸酯,如二乙二醇單甲基醚乙酸酯、二乙二醇單乙基醚乙酸酯、二乙二醇單丙基醚乙酸酯、及二乙二醇單n-丁基醚乙酸酯;二丙二醇單醚,
如二丙二醇單甲基醚、二丙二醇單乙基醚、及二丙二醇單丙基醚;二丙二醇二醚,如二丙二醇二甲基醚;乙二醇醚乙酸酯,如乙二醇單甲基醚乙酸酯、乙二醇單乙基醚乙酸酯、丙二醇單甲基醚乙酸酯、二乙二醇單甲基醚乙酸酯、及二乙二醇單丁基醚乙酸酯;或作為異質化合物,N-甲基吡咯烷酮、甲醯胺、N-甲基甲醯胺、N-乙基甲醯胺、N,N-二甲基甲醯胺、N,N-二乙基甲醯胺、N-甲基乙醯胺、N,N-二甲基乙醯胺、N,N-二乙基乙醯胺、N-甲基丙醯胺、N,N-二甲基亞碸、環丁碸、1,3-丙磺酸內酯、及類似物。
溶劑種類及溶劑用量係依據當形成層狀結構時的施加條件及乾燥條件而適當地選擇。較佳而言,固體含量係包含於組成物中的15至45wt%之濃度中。此係由於執行用以形成層狀結構的溶劑乾燥及烘烤處理係容易受到執行,且改善最終獲得的層狀結構之性質係有利的。
此外,溶劑可單一或結合二或更多溶劑加以使用。較佳而言,使用具有100℃或以下之沸點的溶劑混有具有120至160℃之沸點的溶劑(高溫沸騰溶劑)。由於高溫沸騰溶劑揮發的溫度低於用以當形成層狀結構時執行施加、乾燥、及硬化的溫度,故其預防孔洞。再者,高溫沸騰溶劑藉由以低速乾燥薄膜允許待改善的層狀結構之表面平滑度。作為溶劑之組合,選自由乙醇、2-丙醇、及2-丁醇所組成的群組之溶劑、及選自由丙二醇單甲基醚、丙二醇單甲基醚乙酸酯、甲基異丁基酮、及n-丙基乙酸鹽所組成的群組之溶劑可加以混合並使用。
作為多官能基丙烯酸甲酯,二官能基或更高官能基丙烯酸甲酯為較佳。二官能基丙烯酸甲酯之示例可包含乙二醇丙烯酸甲酯、1,6-己二醇丙烯酸甲酯、1,9-壬二醇丙烯酸甲酯、丙二醇丙烯酸甲酯、四乙二醇丙烯酸甲酯、雙苯氧基乙醇基茀基二丙烯酸酯、及類似物。三官能基或更高官能基丙烯酸甲酯之示例可包含三羥乙基異氰酸酯、三丙烯酸甲酯、三羥甲基丙烷三丙烯酸甲酯、季戊四醇三丙烯酸甲酯、季戊四醇四丙烯酸甲酯、二季戊四醇六丙烯酸甲酯、及類似物。
選自二官能基或三官能基或更高度丙烯酸甲酯之一者可單一或結合他者加以使用。
作為光起始劑,可使用相關領域中所熟悉的光聚合起始劑及光感光劑。作為示例,有三嗪化合物,如2,4-三氯甲基-(4’-甲氧苯基)-6-三嗪、2,4-三氯甲基-(4’-甲氧苯乙烯基)-6-三嗪、2,4-三氯甲基-(過芴基)-6-三嗪、2,4-三氯甲基-(3’,4’-二甲氧苯基)-6-三嗪、及3-{4-[2,4-雙(三氯甲基)-s-三嗪-6-基]苯硫基}丙酸;雙咪唑化合物,如2,2’-雙(2-氯苯基)-4,4’,5,5’-四苯基雙咪唑、及2,2’-雙(2,3-二氯苯基)-4,4’,5,5’-四苯基雙咪唑;苯乙酮類化合物,如2-羥基-2-甲基-1-苯基丙-1-酮、1-(4-異丙基苯基)-2-羥基-2-甲基丙烷-1-酮、4-(2-羥基乙氧基)-苯基(2-羥基)丙基酮、1-羥基環己基苯基酮、安息香甲基醚、安息香乙基醚、安息香異丁基醚、安息香丁基醚、2,2-二甲氧基-2-苯基苯乙酮、2-甲基-(4-甲基硫苯基)-2-嗎啉基-1-丙烷-1-酮、及2-芐基-2-二甲基胺基-1-(4-嗎啉基苯基)-1-丁酮;二苯基甲酮類化合物,如二苯基甲酮、4,4’-雙(二甲基胺基)二苯基甲酮、4,4’-雙(二乙基胺基)二苯基甲酮、2,4,6-三甲基胺基二苯基甲酮、甲基-o-苄醯基苯甲酸酯、3,3-二甲基-4-甲氧基二苯基甲酮、及3,3’,4,4’-四(t-丁基過氧基羰基)二苯基甲酮;芴酮類化合物,如9-芴酮、2-氯-9-芴酮、及2-甲基-9-芴酮;硫雜蒽酮(thioxanthone)類化合物,如硫雜蒽酮、2,4-二乙基硫雜蒽酮、2-氯硫雜蒽酮、1-氯-4-丙氧基硫雜蒽酮、異丙基硫雜蒽酮、及二異丙基硫雜蒽酮;氧葱酮類化合物,如氧葱酮及2-甲基氧葱酮;蒽醌類化合物,如蒽醌、2-甲基蒽醌、2-乙基蒽醌、t-丁基蒽醌、及2,6-二氯-9,10-蒽醌;吖啶類化合物,如9-苯基吖啶、1,7-雙(9-吖啶基)庚烷、1,5-雙(9-吖啶基)戊烷、及1,3-雙(9-吖啶基)丙烷;二羰基化合物,如芐基、1,7,7-三甲基-雙氯[2,2,1]庚烷-2,3-二酮、及9,10-菲醌;膦氧化物類化合物,如2,4,6-三甲基苄醯基二苯基膦氧化物、雙(2,6-二甲氧基苄醯基)-2,4,4-三甲基戊基膦氧化物、及雙(2,6-二氯基苄醯基)丙基膦氧化物;胺類增效劑,如甲基4-(二甲基胺基)苯甲酸酯、乙基-4-(二甲基胺基)苯甲酸酯、2-n-丁氧基乙基4-(二甲基胺基)苯甲酸酯、2,5-雙(4-二乙基胺基亞苄基)環戊酮、2,6-雙(4-二乙基胺基亞苄基)環己酮、及2,6-雙(4-二乙基胺基亞苄基)-4-甲基-環己酮;香豆素類化合物,如3,3’-羰基乙烯基-7-(二乙基胺基)香豆素、3-(2-苯並噻唑)-7-(二乙基胺基)香豆素、3-苄醯基-7-(二乙基胺基)
香豆素、3-苄醯基-7-甲氧基-香豆素、及10,10’-羰基雙[1,1,7,7-四甲基-2,3,6,7-四氫基-1H,5H,11H-Cl]-苯並吡喃[6,7,8-ij]-喹嗪-11-酮;查耳酮化合物,如4-二乙基胺基查耳酮及4-疊氮基亞苄基苯乙酮;2-苄醯基甲烯、3-甲基-β-萘酚噻唑啉、或其組合物,但本發明並不限於此。
此外,作為平整劑,使用表面改質劑、表面處理劑、塗覆改質劑、及類似物。例言之,選自由聚醚修飾的聚甲基烷基矽氧烷、聚酯修飾的聚甲基烷基矽氧烷、丙烯酸酯共聚物、及聚丙烯酸酯溶液所組成的群組之媒介可單一或結合二或更多加以使用,但本發明並不限於此。
為了移除溶劑,所形成的樹脂層300受到乾燥處理。此時,乾燥處理可藉由以90至120℃之溫度下加熱1分鐘至30分鐘而加以執行,但上述條件可依據所用的有機溶劑加以改變。
接著,硬化有機矽氧烷樹脂層302係藉由將UV自基板底部向上方照射而形成,而但書為閘極之上部並未受曝於UV,且藉此留存未硬化有機矽氧烷樹脂層301(S12)。
在本示例中,無需個別的遮罩,未硬化樹脂層301係使用閘極200作為遮罩而留存於閘極之上部上,而剩餘部分為UV所硬化的樹脂層302。
此時,UV可以常用於相關領域中的範圍加以照射,且例言之,以50至300mJ/cm2、且較佳以100至200mJ/cm2之輻射強度加以照射。當輻射強度小於50mJ/cm2時,硬化並未適當執行,使得物理性質可能劣化。在另一方面,輻射強度超過300mJ/cm2,能量於此過程中過度消耗。
以顯影劑移除未硬化樹脂層301(S13)及以顯影劑在恆定速率下蝕刻硬化樹脂層302(S14)係同時或依序執行。緊接在顯影之後,僅移除未硬化樹脂層301,且在完全顯影之後,硬化樹脂層302係以固定厚度加以蝕刻,且之後平坦化。在本示例中,所用之顯影劑的實施例可包含鹼性水溶液,如TMAH、KOH、及NaOH,但本發明並不限於此。依據材料性質,蝕刻速率可為不同,且例言之,0.2μm/min至1.2μm/min。
在依據本發明之形成平坦化層的方法中,該方法可更包含在
150至250℃之溫度下陳化15分鐘至1小時,以具有如同平坦化層在蝕刻之後的鉛筆硬度之5H或更多的表面硬度。
藉由如上述之形成方法所形成的平坦化層具有極佳的表面硬度及透明度,且使用厚金屬配線而產生實現金屬配線之低阻抗的厚度步驟,可被平坦化。
如圖4及5中所示,針對平坦化層,可形成用作平坦化層的樹脂層300,且之後可形成閘極絕緣層400,或可於形成樹脂層300之前形成閘極絕緣層400。
之後,本發明將參考實施例更加詳述,但本發明並不限於此。
合成實施例1
159重量份的苯基三甲氧矽烷、143重量份的甲基三乙氧矽烷、及167重量份的四乙氧矽烷係加入具有約2L容量的燒杯,其設有冷卻管及攪拌子,且藉由混合具有1當量濃度之硝酸及136重量份之純水所製備的溶液係緩慢地以設置於燒杯的滴液漏斗滴加入燒杯,同時激烈地攪拌燒杯中的內容物。因此,放熱反應係於燒杯之內容物中產生,且最初時燒杯中的溶液為白色混濁溶液,但由於持續攪拌,故其成為無色且透明溶液。
在如上述所合成之溶液的溫度冷卻至50℃或更少之後,溶液係於正常壓力下迴流3小時以冷卻至室溫。在室溫下,藉由混合233.5重量份之甲基丙烯醯基丙基三甲氧基矽烷及5.3重量份之甘油酸丙烷三甲氧矽烷所製備的溶液係緩慢地以設置於燒杯的滴液漏斗滴加入燒杯。無色且透明溶液係以正常壓力下加熱,且迴流2小時以獲得感光有機矽氧烷寡聚物a。
添加劑係以表1中所表列之比例加以混合,關於感光有機矽氧烷寡聚物a係因而獲得,以4℃之溫度下陳化12小時,且再以0.2μm-PTFE薄膜加以過濾,以製備組成物A。
[表1]
實施例1
組成物A係旋塗於設有具有2μm之厚度的銅導線的玻璃基材,並於120℃之溫度下烘乾1分鐘以形成具有3μm之厚度的塗覆薄膜。針對塗覆有組成物A的玻璃基材,使用UV曝露裝置(MA6,由SUSS Micro所製造),UV係以100mJ/cm2之照射強度照射至玻璃基材之底部,使得銅導線之上部未受到曝露,且僅有受曝平坦化部分受到硬化。因此,硬化的塗覆薄膜係於30℃下於2.38%的TMAH溶液中顯影1分鐘,以移除並未受曝之未硬化的部份,並蝕刻且因而平坦化硬化部分的上部之一部份。藉由以250℃之溫度下陳化薄膜30分鐘,形成具有5H之硬度及98%或更高之穿透率的平坦化層。
實施例2
組成物A係旋塗於設有具有2μm之厚度的銅導線的玻璃基材,並於120℃之溫度下烘乾1分鐘以形成具有3μm之厚度的塗覆薄膜。針對塗覆有組成物A的玻璃基材,使用UV曝露裝置(MA6,由SUSS Micro
所製造),UV係以200mJ/cm2之照射強度照射至玻璃基材之底部,使得銅導線之上部未受到曝露,且僅有受曝平坦化部分受到硬化。因此,硬化的塗覆薄膜係於30℃下於2.38%的TMAH溶液中顯影1分鐘,以移除並未受曝之未硬化的部份,並蝕刻且因而平坦化硬化部分的上部之一部份。藉由以250℃之溫度下陳化薄膜30分鐘,形成具有5H之硬度及98%或更高之穿透率的平坦化層。
依據形成包含依據本發明的UV可硬化有機矽氧烷樹脂之平坦化層之方法,由厚金屬配線所引起的厚度步驟可較佳地平坦化以實現金屬配線之低阻抗,以供顯影具有大尺寸及高解析度的超高速TFT。此外,因此形成的平坦化層具有極佳表面硬度且為透明的。
雖然本文中揭示了實施例,但應理解其包含其他變化的可能性,這些變化並不視為背離本發明之實施例的精神及範圍,且對技藝人士而言,所有這些明顯的修飾仍視為下方申請專利範圍之範疇內。
100‧‧‧基材
200‧‧‧閘極
300‧‧‧樹脂層
301‧‧‧未硬化樹脂層
302‧‧‧硬化樹脂層
Claims (11)
- 一種形成一平坦化層之方法,包含:於一形成有閘極之基材上形成一紫外光可固化有機矽氧烷樹脂層;透過由基材的底部朝上方照射紫外光以形成一固化有機矽氧烷樹脂層,但其條件為該閘極上方部分未曝露於紫外光,藉此保留一未固化有機矽氧烷樹脂層;移除該未固化有機矽氧烷樹脂層;以及蝕刻該固化有機矽氧烷樹脂層。
- 如請求項1之方法,其中該紫外光可固化有機矽氧烷樹脂層係透過塗覆厚度大於或等於該閘極之厚度而形成。
- 如請求項1之方法,其中該紫外光的照射強度為50至300mJ/cm2。
- 如請求項1之方法,其中該紫外光可固化有機矽氧烷樹脂包含一具有聚苯乙烯換算之重量平均分子量為100至100,000之感光性有機矽氧烷寡聚物。
- 如請求項4之方法,其中該感光性有機矽氧烷寡聚物係透過矽烷水解聚合以製備一矽烷寡聚物,且接著賦予該矽烷寡聚物一感光性官能基而形成。
- 如請求項5之方法,其中該矽烷係為一或多個選自由苯基三甲氧基矽烷(phenyltrimethoxysilane)、苯基三乙氧基矽烷(phenyltriethoxysilane)、二苯基三甲氧基矽烷(diphenyltrimethoxysilane)、二苯基乙氧基矽烷(diphenylethoxysilane)、甲基三乙氧基矽烷(methyltriethoxysilane)、甲基三甲氧基矽烷(methyltrimethoxysilane)、四甲氧基矽烷(tetramethoxysilane)、四乙氧基矽烷(tetraethoxysilane)、乙烯基三甲氧基矽烷(vinyltrimethoxysilane)、乙烯基三乙氧基矽烷(vinyltriethoxysilane)、二甲基二甲氧基矽烷(dimethyldimethoxysilane),及二甲基二乙氧基矽烷(dimethyldiethoxysilane) 所組成之群組。
- 如請求項5之方法,其中賦予該感光性官能基之一化合物係選自甲基丙烯醯基丙基三甲氧基矽烷(methacrylatepropyltrimethoxysilane)或甘油酸丙烷三甲氧矽烷(glycidyloxypropyltrimethoxysilane)。
- 如請求項1之方法,其中該紫外光可固化有機矽氧烷樹脂包含:40至70wt%之感光性有機矽氧烷寡聚物;10至40wt%之有機溶劑;5至20wt%之多官能基甲基丙烯基單體;3至15wt%之光起始劑;以及0.1至2.0wt%之平整劑。
- 如請求項1之方法,其中該閘極具有厚度為1μm或以上。
- 如請求項1之方法,該方法進一步包含於溫度150 to 250℃下處理15分鐘至1小時之陳化(aging)處理,以獲得蝕刻後表面硬度為5H或以上之鉛筆硬度。
- 一種平坦化層,其係透過如請求項1至10任一項之方法所形成者。
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KR101580854B1 (ko) * | 2008-09-05 | 2015-12-30 | 제이에스알 가부시끼가이샤 | 경화성 수지 조성물, 수지 경화막을 형성하기 위한 세트, 보호막 및 보호막의 형성 방법 |
-
2012
- 2012-12-07 KR KR1020120142217A patent/KR20140075046A/ko not_active Application Discontinuation
-
2013
- 2013-08-27 WO PCT/KR2013/007689 patent/WO2014088189A1/ko active Application Filing
- 2013-10-31 TW TW102139496A patent/TW201432393A/zh unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI720383B (zh) * | 2017-12-20 | 2021-03-01 | 美商羅門哈斯電子材料有限公司 | 在可撓性基材上形成硬塗料的方法及硬塗料組合物 |
Also Published As
Publication number | Publication date |
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KR20140075046A (ko) | 2014-06-19 |
WO2014088189A1 (ko) | 2014-06-12 |
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