TW201427775A - Electronic component rinsing device and operational equipment applying the same - Google Patents
Electronic component rinsing device and operational equipment applying the same Download PDFInfo
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- TW201427775A TW201427775A TW102100247A TW102100247A TW201427775A TW 201427775 A TW201427775 A TW 201427775A TW 102100247 A TW102100247 A TW 102100247A TW 102100247 A TW102100247 A TW 102100247A TW 201427775 A TW201427775 A TW 201427775A
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本發明係提供一種可使承置電子元件之承置台擺置呈非朝上方向,以供噴灑機構對電子元件噴灑清洗流體時,可使流體及雜質直接向下掉落,進而提升清洗使用效能及縮減作業時間之電子元件清洗裝置。 The invention provides a mounting table for placing an electronic component in a non-upward direction, so that when the spraying mechanism sprays the cleaning fluid on the electronic component, the fluid and the impurities can be directly dropped downward, thereby improving the cleaning performance. And an electronic component cleaning device that reduces the operating time.
在現今,電子元件(例如晶圓)於製作過程中,電子元件之表面均會附著有雜質、污垢等,而影響電子元件之潔淨度及品質,為避免影響電子元件之製作良率及品質,業者係以清洗裝置清洗附著於電子元件表面之雜質等,以晶圓為例,係必須歷經多道製程,導致晶圓之表面會附著雜質、微粒或化合物等,因此,晶圓於不同製程之前後,必須執行清洗表面作業,例如將整片晶圓切割成複數個晶片後,亦或晶圓在進入熱爐管以進行擴散或氧化製程前,均需以清洗裝置清洗晶圓,以去除晶圓表面之雜質、微粒或化合物等,再將晶圓除濕乾燥,使得晶圓之表面具有高潔淨度,以提升晶圓製作品質。 In today's electronic components (such as wafers), impurities, dirt, etc. are attached to the surface of electronic components during the manufacturing process, which affects the cleanliness and quality of electronic components. To avoid affecting the yield and quality of electronic components, The cleaning device cleans the impurities attached to the surface of the electronic component. For example, in the case of a wafer, it is necessary to carry out a plurality of processes, which may cause impurities, particles or compounds to adhere to the surface of the wafer. Therefore, the wafer is processed in different processes. Before and after the cleaning surface must be performed, for example, after cutting the entire wafer into a plurality of wafers, or before the wafer enters the hot furnace tube for diffusion or oxidation, the wafer needs to be cleaned by a cleaning device to remove the crystal. The surface of the wafer, such as impurities, particles or compounds, is dehumidified and dried to make the surface of the wafer highly clean to improve the quality of wafer fabrication.
請參閱第1圖,係為一種晶圓清洗裝置,其係於機台11上設有一上方具開口121之清洗槽12,該清洗槽12之底面一側設有排放管13,用以排出清洗流體,一裝配固設於機台11上之承載機構14,其係設有一由馬達141驅動之旋轉軸142,旋轉軸142之一端係穿伸於清洗槽12內,並裝配有可承置待清洗晶圓15之承置台143,一位於承載機構14上方之噴管16,係用以噴灑清洗流體(如離子水或氣體等);於執行清洗晶圓15作業時,可將待清洗之晶圓15置放於承置台 143上,該承置台143即真空吸附待清洗之晶圓15定位,承載機構14之馬達141係驅動旋轉軸142旋轉,令旋轉軸142帶動承置台143及待清洗之晶圓15同步轉動,該噴管16係對承置台143上之待清洗晶圓15噴灑清洗流體,以清洗附著於晶圓15表面之雜質、微粒或化合物等,再利用承置台143旋轉之離心力將晶圓15表面之清洗流體及雜質向外甩出,清洗流體則經由排放管13排出;惟,由於承載待清洗晶圓15之承置台143係朝向上方,易使噴管16噴灑之清洗流體滯留於待清洗之晶圓15上,該清洗裝置僅利用承置台143旋轉之離心力將附著於晶圓15上之流體及雜質甩出,其旋乾效率有限,並增加作業時間,再者,承置台143帶動晶圓15旋轉時,自晶圓15上被旋轉甩出之清洗流體會撞擊到清洗槽12之內壁面,而又噴濺回晶圓15之表面,致使晶圓15無法迅速旋乾表面,不僅乾燥效率不佳,亦增加乾燥作業時間,造成降低生產效能之缺失。 Please refer to FIG. 1 , which is a wafer cleaning device, which is provided with a cleaning tank 12 with an opening 121 on the machine table 11 , and a discharge pipe 13 is arranged on the bottom surface of the cleaning tank 12 for discharging and cleaning. The fluid, a mounting mechanism 14 fixed to the machine table 11, is provided with a rotating shaft 142 driven by a motor 141. One end of the rotating shaft 142 extends through the cleaning tank 12 and is assembled to be mounted. The mounting table 143 of the cleaning wafer 15 and a nozzle 16 above the carrying mechanism 14 are used for spraying a cleaning fluid (such as ionized water or gas). When the cleaning of the wafer 15 is performed, the crystal to be cleaned can be used. Round 15 placed on the mounting table 143, the mounting table 143 is vacuum-adsorbed to the wafer 15 to be cleaned, and the motor 141 of the carrier mechanism 14 drives the rotating shaft 142 to rotate, so that the rotating shaft 142 drives the mounting table 143 and the wafer 15 to be cleaned to rotate synchronously. The nozzle 16 sprays the cleaning fluid on the wafer 15 to be cleaned on the mounting table 143 to clean the impurities, particles or compounds attached to the surface of the wafer 15, and then cleans the surface of the wafer 15 by the centrifugal force of the rotation of the mounting table 143. The fluid and the impurities are discharged outward, and the cleaning fluid is discharged through the discharge pipe 13; however, since the mounting table 143 carrying the wafer 15 to be cleaned is oriented upward, the cleaning fluid sprayed by the nozzle 16 is easily retained in the wafer to be cleaned. In the 15th, the cleaning device only uses the centrifugal force of the rotation of the mounting table 143 to extract the fluid and impurities adhering to the wafer 15, the spin-drying efficiency is limited, and the working time is increased. Moreover, the mounting table 143 drives the wafer 15 to rotate. At this time, the cleaning fluid that has been rotated from the wafer 15 hits the inner wall surface of the cleaning tank 12 and is splashed back onto the surface of the wafer 15, so that the wafer 15 cannot be quickly dried and dried, which is not only poor in drying efficiency. Also increased Adding drying time, resulting in a lack of production efficiency.
本發明之目的一,係提供一種電子元件清洗裝置,其係於清洗槽配置有轉向機構、承載機構及噴灑機構,該轉向機構係具有至少一基座,並設有可驅動基座翻轉變換方向之第一驅動源,該承載機構係設有至少一供承置電子元件之承置台,該承置台並裝配於轉向機構之基座上,另該承置台連結有驅動旋轉之第二驅動源,該噴灑機構係位於承載機構之下方,並設有至少一可噴灑流體之噴灑器,用以對承置台上之電子元件噴灑流體;藉此,於清洗作業時,可利用轉向機構帶動承置台翻轉呈非朝上方向,供噴灑機構對承置台上之電子元件噴灑清洗流體,不僅可以承置台自身旋轉之離心力將附著於電子元件上的流體及雜質向外甩出,並可利用承置台之擺置角度,使流體及雜質直接向下掉落,達到提升清洗使用效能及 縮減作業時間之實用效益。 An object of the present invention is to provide an electronic component cleaning device which is provided with a steering mechanism, a bearing mechanism and a spraying mechanism in a cleaning tank. The steering mechanism has at least one base and is provided with a drive base to reverse the direction of rotation. The first driving source is provided with at least one mounting platform for receiving electronic components, the mounting platform is mounted on the base of the steering mechanism, and the mounting platform is coupled with a second driving source for driving rotation. The spraying mechanism is located below the carrying mechanism, and is provided with at least one sprayable fluid sprayer for spraying fluid on the electronic components on the mounting table; thereby, the steering mechanism can be used to drive the mounting table to be turned over during the cleaning operation. In the non-upward direction, the spraying mechanism sprays the cleaning fluid on the electronic components on the mounting table, and not only can the centrifugal force of the rotating body of the table be used to pull out the fluid and impurities attached to the electronic components, and the pendulum of the mounting platform can be utilized. Set the angle so that the fluid and impurities fall directly downwards, which improves the cleaning performance and Reduce the practical benefits of working hours.
本發明之目的二,係提供一種電子元件清洗裝置,其係於清洗槽配置有轉向機構、承載機構及噴灑機構,該轉向機構之第一驅動源係帶動承置電子元件之承置台翻轉呈非朝上方向,於承置台帶動電子元件旋轉時,自電子元件上被旋轉甩出之清洗流體撞擊到清洗槽之內壁面,並不會噴濺回電子元件之表面,而會直接掉落於清洗槽之內底面,進而可使電子元件迅速旋乾表面,以縮減乾燥作業時間,達到提升乾燥使用效能之實用效益。 An object of the present invention is to provide an electronic component cleaning device, which is provided with a steering mechanism, a bearing mechanism and a spraying mechanism in a cleaning tank, wherein the first driving source of the steering mechanism drives the mounting platform for mounting electronic components to be inverted. In the upward direction, when the mounting unit drives the electronic component to rotate, the cleaning fluid that is rotated from the electronic component hits the inner wall surface of the cleaning tank, and does not splash back to the surface of the electronic component, but falls directly to the cleaning. The inner surface of the groove enables the electronic component to quickly spin dry the surface to reduce the drying time and achieve the practical benefit of improving the drying performance.
本發明之目的三,係提供一種電子元件清洗裝置,其係於清洗槽配置有轉向機構、承載機構及噴灑機構,當轉向機構之第一驅動源帶動承置電子元件之承置台翻轉呈非朝上方向時,可使附著於電子元件上之部份粉塵雜質直接向下掉落,以減少電子元件上之雜質,進而縮減清洗作業時間,達到提升清洗使用效能之實用效益。 The third object of the present invention is to provide an electronic component cleaning device, which is provided with a steering mechanism, a bearing mechanism and a spraying mechanism in the cleaning tank. When the first driving source of the steering mechanism drives the mounting platform for mounting the electronic component, the mounting platform is reversed. In the upper direction, some of the dust impurities attached to the electronic components can be directly dropped downward to reduce impurities on the electronic components, thereby reducing the cleaning operation time and achieving the practical benefit of improving the cleaning performance.
本發明之目的四,係提供一種應用電子元件清洗裝置之作業設備,包含機台、至少一置料裝置、作業裝置、清洗裝置、移料裝置,以及用以控制整合各裝置作動而執行自動化作業之中央控制裝置,該置料裝置係裝配於機台上,用以容置電子元件,該作業裝置係裝配於機台上,用以對電子元件執行預設作業,該移料裝置係裝配於機台上,用以移載電子元件,該清洗裝置係於清洗槽配置有轉向機構、承載機構及噴灑機構,用以清洗電子元件,達到提升清洗使用效能及縮減作業時間之實用效益。 A fourth object of the present invention is to provide a working device for applying an electronic component cleaning device, comprising a machine table, at least one loading device, a working device, a cleaning device, a material moving device, and an automation operation for controlling the integration of each device operation. a central control device mounted on the machine table for accommodating electronic components, the working device being mounted on the machine table for performing preset operations on the electronic components, the loading device being assembled The machine is used for transferring electronic components. The cleaning device is provided with a steering mechanism, a supporting mechanism and a spraying mechanism in the cleaning tank for cleaning the electronic components, thereby achieving the practical benefit of improving the cleaning performance and reducing the working time.
〔習知〕 [study]
11‧‧‧機台 11‧‧‧ machine
12‧‧‧清洗槽 12‧‧‧cleaning tank
121‧‧‧開口 121‧‧‧ openings
13‧‧‧排放管 13‧‧‧Drainage tube
14‧‧‧承載機構 14‧‧‧Loading mechanism
141‧‧‧馬達 141‧‧ ‧motor
142‧‧‧旋轉軸 142‧‧‧Rotary axis
143‧‧‧承置台 143‧‧‧Holding table
15‧‧‧晶圓 15‧‧‧ wafer
16‧‧‧噴管 16‧‧‧ nozzle
〔本發明〕 〔this invention〕
20‧‧‧清洗裝置 20‧‧‧cleaning device
21‧‧‧清洗槽 21‧‧‧cleaning tank
211‧‧‧排放口 211‧‧‧Drainage
22‧‧‧轉向機構 22‧‧‧ steering mechanism
221‧‧‧支撐架 221‧‧‧Support frame
222‧‧‧馬達 222‧‧‧ motor
223‧‧‧軸承座 223‧‧‧ bearing housing
224‧‧‧旋轉軸 224‧‧‧Rotary axis
225‧‧‧基座 225‧‧‧Base
23‧‧‧承載機構 23‧‧‧Loading mechanism
231‧‧‧馬達 231‧‧‧Motor
232‧‧‧皮帶輪組 232‧‧‧ Pulley set
233‧‧‧轉軸 233‧‧‧ shaft
234‧‧‧承置台 234‧‧‧Holding table
235‧‧‧吸附件 235‧‧‧Adsorbed parts
236‧‧‧扣具 236‧‧‧ buckle
24‧‧‧噴灑機構 24‧‧‧Spray mechanism
241‧‧‧第一噴灑器 241‧‧‧First sprinkler
242‧‧‧第二噴灑器 242‧‧‧Second sprinkler
30‧‧‧晶圓 30‧‧‧ Wafer
40‧‧‧機台 40‧‧‧ machine
50‧‧‧作業裝置 50‧‧‧Working device
60‧‧‧第一置料裝置 60‧‧‧First loading device
70‧‧‧第二置料裝置 70‧‧‧Second loading device
80‧‧‧移料裝置 80‧‧‧Transfer device
第1圖:習式晶圓清洗裝置之示意圖。 Figure 1: Schematic diagram of a conventional wafer cleaning device.
第2圖:本發明電子元件清洗裝置之示意圖。 Fig. 2 is a schematic view of the electronic component cleaning apparatus of the present invention.
第3圖:本發明電子元件清洗裝置之使用示意圖(一)。 Fig. 3 is a schematic view showing the use of the electronic component cleaning device of the present invention (1).
第4圖:本發明電子元件清洗裝置之使用示意圖(二)。 Fig. 4 is a schematic view showing the use of the electronic component cleaning device of the present invention (2).
第5圖:本發明電子元件清洗裝置之使用示意圖(三)。 Fig. 5 is a schematic view showing the use of the electronic component cleaning device of the present invention (3).
第6圖:本發明電子元件清洗裝置之使用示意圖(四)。 Figure 6 is a schematic view showing the use of the electronic component cleaning device of the present invention (4).
第7圖:本發明電子元件清洗裝置之使用示意圖(四)。 Figure 7 is a schematic view showing the use of the electronic component cleaning device of the present invention (4).
第8圖:本發明電子元件清洗裝置應用於作業設備之示意圖。 Fig. 8 is a schematic view showing the application of the electronic component cleaning device of the present invention to a working device.
為使 貴審查委員對本發明作更進一步之瞭解,茲舉一較佳實施例並配合圖式,詳述如后:請參閱第2圖,本發明電子元件清洗裝置20包含清洗槽21、轉向機構22、承載機構23及噴灑機構24,該清洗槽21係為一內部具容置空間之容器,並於側板或底板設有至少一排放口,用以排放清洗用之流體,於本實施例中,該清洗槽21係為一上開口式之中空容器,並開設有排放口211,用以排出清洗用之流體;該轉向機構22係具有至少一基座,並設有可驅動基座翻轉變換方向之第一驅動源,於本實施例中,第一驅動源係於清洗槽21之外部以支撐架221架設有馬達222,馬達222係以傳動結構驅動至少一位於清洗槽21內部之基座旋轉,於本實施例中,該傳動結構係於清洗槽21之內部兩側以軸承座223架設有旋轉軸224,並於旋轉軸224上裝設有至少一基座225,另該旋轉軸224之一端係連結馬達222,使馬達222可經由旋轉軸224而帶動基座225旋轉;該承載機構23係設有至少一供承置電子元件之承置台,該承置台並裝配於轉向機構22之基座225上,以於清洗作業時,由轉向機構22之基座225帶動翻轉呈非朝上方向,另該承置台連結有驅動旋轉之第二驅動源,於本實施例中,第二驅動源係於轉向 機構22之基座225底部設有馬達231,馬達231以一為皮帶輪組232之傳動組連結驅動一穿伸出基座225之轉軸233旋轉作動,轉軸233之一端則裝配有承置台234,承置台234係設有定位結構,用以定位待清洗之電子元件,更進一步,該定位結構可於承置台234設有吸附件,而以真空吸附方式定位待清洗之電子元件,亦或於承置台234之周側裝設有夾扣件,用以夾持定位待清洗之電子元件,於本實施例中,定位結構係於承置台234設有吸附件235,用以真空吸附待清洗之電子元件定位,並於頂面之周側設有複數個為扣具236之夾扣件,用以夾掣待清洗之電子元件定位;該噴灑機構24係位於承載機構23之下方,並設有至少一可噴灑流體之噴灑器,用以對承置台234上之電子元件噴灑流體,於本實施例中,係於清洗槽21之內部且位於承載機構23之下方處設有第一噴灑器241及第二噴灑器242,第一噴灑器241係對承置台234上之待清洗電子元件噴灑清洗流體(如離子水),用以清洗電子元件,第二噴灑器242係對承置台234上之待清洗電子元件噴灑乾燥流體(如乾燥用之氣體),用以乾燥電子元件。 In order to make the present invention further understand the present invention, a preferred embodiment will be described in conjunction with the drawings, which will be described in detail later. Referring to FIG. 2, the electronic component cleaning device 20 of the present invention includes a cleaning tank 21 and a steering mechanism. 22, the carrying mechanism 23 and the spraying mechanism 24, the cleaning tank 21 is a container with an internal accommodating space, and at least one discharge port is provided on the side plate or the bottom plate for discharging the fluid for cleaning, in this embodiment The cleaning tank 21 is an open-ended hollow container, and is provided with a discharge port 211 for discharging the cleaning fluid; the steering mechanism 22 has at least one base and is provided with a driveable base flipping conversion In the embodiment, the first driving source is external to the cleaning tank 21, and the supporting frame 221 is provided with a motor 222. The motor 222 drives at least one base located inside the cleaning tank 21 with a transmission structure. Rotating, in the embodiment, the transmission structure is disposed on the inner side of the cleaning tank 21, and the bearing shaft 223 is provided with a rotating shaft 224, and the rotating shaft 224 is provided with at least one base 225, and the rotating shaft 224 is further disposed. One end link horse 222, the motor 222 can drive the base 225 to rotate via the rotating shaft 224; the supporting mechanism 23 is provided with at least one mounting platform for receiving electronic components, and the mounting platform is mounted on the base 225 of the steering mechanism 22, In the cleaning operation, the base 225 of the steering mechanism 22 drives the reversal in a non-upward direction, and the mounting table is coupled to a second driving source that drives the rotation. In this embodiment, the second driving source is coupled to the steering. The bottom of the base 225 of the mechanism 22 is provided with a motor 231. The motor 231 is coupled to drive the rotating shaft 233 of the extending base 225 by a transmission group of the pulley set 232. One end of the rotating shaft 233 is equipped with a mounting base 234. The positioning platform 234 is provided with a positioning structure for positioning the electronic components to be cleaned. Further, the positioning structure can be provided with an adsorption member on the mounting base 234, and the electronic components to be cleaned can be positioned by vacuum adsorption, or on the mounting platform. The 234 is provided with a clamping member for clamping and positioning the electronic component to be cleaned. In this embodiment, the positioning structure is disposed on the mounting base 234 and is provided with an adsorption member 235 for vacuumly adsorbing the electronic component to be cleaned. Positioning, and a plurality of clips for the clips 236 are disposed on the peripheral side of the top surface for clamping the positioning of the electronic components to be cleaned; the spray mechanism 24 is located below the support mechanism 23 and is provided with at least one a fluid sprayer for spraying fluid on the electronic components on the mounting table 234. In this embodiment, the first sprinkler 241 is disposed inside the cleaning tank 21 and below the load-bearing mechanism 23. Two sprayers 242 The first sprinkler 241 sprays a cleaning fluid (such as ionized water) on the electronic components to be cleaned on the mounting table 234 for cleaning the electronic components, and the second sprinkler 242 sprays the electronic components to be cleaned on the mounting table 234. A fluid (such as a gas for drying) to dry electronic components.
請參閱第3圖,該清洗裝置20係應用於清洗晶圓30,由於承載機構23之承置台234係朝向上方,而可供移料裝置(圖未示出)將待清洗之晶圓30置放於承置台234之吸附件235上,承置台234係以吸附件235真空吸附待清洗之晶圓30,並以複數個扣具236將待清洗之晶圓30夾扣定位;請參閱第4圖,於待清洗之晶圓30定位於承置台234後,轉向機構22係以馬達222驅動旋轉軸224轉動,旋轉軸224即帶動基座225及承置台234翻轉作動,令承置待清洗晶圓30之承置台234翻轉呈朝向下方,使待清洗之晶圓30面對於噴灑機構24,由於待清洗之晶圓30係朝向下方,而可使附著於晶圓 30上之部份粉塵雜質利用重力作用而掉落於清洗槽21,以減少待清洗晶圓30上之雜質;請參閱第5圖,該承載機構23之馬達231係經由皮帶輪組232驅動轉軸233轉動,該轉軸233帶動承置台234及待清洗之晶圓30同步旋轉,該噴灑機構24係以第一噴灑器241對旋轉中之待清洗晶圓30噴灑清洗流體,以清洗附著於晶圓30表面上之雜質、微粒或化合物等,並使晶圓30利用旋轉之離心力將流體及雜質向外甩出,由於待清洗之晶圓30係朝向下方,當部份被甩出之清洗流體撞擊到清洗槽21之內壁面時,並不會噴濺回晶圓30上,而會直接向下流入至清洗槽21之內底面,再由清洗槽21之排放口211排出;請參閱第6圖,於清洗晶圓30完畢後,噴灑機構24之第一噴灑器241停止噴灑清洗流體,並以第二噴灑器242對晶圓30噴灑乾燥流體,用以吹乾晶圓30,由於承載機構23之轉軸233仍帶動承置台234及晶圓30旋轉,而可持續利用離心力將表面之清洗流體向外甩出,進而迅速將晶圓30上之清洗流體甩乾,以縮短乾燥作業時間,達到提升乾燥效能之實用效益;請參閱第7圖,於晶圓30乾燥後,該轉向機構22之馬達222係經由旋轉軸224帶動基座225及承置台234翻轉作動,令承置台234翻轉朝向上方,使已清洗之晶圓30朝向上方,以供取料。 Referring to FIG. 3, the cleaning device 20 is applied to the cleaning wafer 30. Since the mounting table 234 of the carrying mechanism 23 is oriented upward, the loading device (not shown) places the wafer 30 to be cleaned. The 234 is placed on the absorbing member 235 of the mounting table 234. The 234 is vacuum-adsorbed to the wafer 30 to be cleaned by the absorbing member 235, and the wafer 30 to be cleaned is clipped by a plurality of fasteners 236; After the wafer 30 to be cleaned is positioned on the mounting table 234, the steering mechanism 22 rotates the rotating shaft 224 by the motor 222, and the rotating shaft 224 drives the base 225 and the mounting table 234 to be reversed to actuate the crystal to be cleaned. The mounting table 234 of the circle 30 is turned downward, so that the wafer 30 to be cleaned faces the spraying mechanism 24, and the wafer 30 to be cleaned is directed downward, and can be attached to the wafer. Part of the dust impurities on the 30 drops into the cleaning tank 21 by gravity to reduce the impurities on the wafer 30 to be cleaned; referring to FIG. 5, the motor 231 of the carrier mechanism 23 drives the rotating shaft 233 via the pulley set 232. Rotating, the rotating shaft 233 drives the mounting table 234 and the wafer 30 to be cleaned to rotate synchronously. The spraying mechanism 24 sprays the cleaning fluid on the rotating wafer 30 to be cleaned by the first sprayer 241 to clean and attach to the wafer 30. Impurities, particles or compounds on the surface, and the wafer 30 uses a centrifugal force to rotate the fluid and impurities outward. Since the wafer 30 to be cleaned faces downward, when a portion of the cleaning fluid is struck by the cleaning fluid When the inner wall surface of the tank 21 is cleaned, it does not splash back onto the wafer 30, but flows directly downward into the inner bottom surface of the cleaning tank 21, and is discharged from the discharge port 211 of the cleaning tank 21; see Fig. 6, After the wafer 30 is cleaned, the first sprinkler 241 of the spray mechanism 24 stops spraying the cleaning fluid, and sprays the drying fluid on the wafer 30 with the second sprinkler 242 for drying the wafer 30, due to the carrier mechanism 23 The rotating shaft 233 still drives the mounting table 234 and the crystal The circle 30 rotates, and the centrifugal cleaning force can continuously pull out the cleaning fluid on the surface, thereby rapidly drying the cleaning fluid on the wafer 30, thereby shortening the drying operation time and achieving the practical benefit of improving the drying efficiency; After the wafer 30 is dried, the motor 222 of the steering mechanism 22 drives the susceptor 225 and the mounting table 234 to reverse the operation via the rotating shaft 224, so that the mounting table 234 is turned upward, and the cleaned wafer 30 faces upward. For reclaiming.
請參閱第8圖,本發明之清洗裝置20應用於作業設備,以切割設備為例,其係於機台40配置有作業裝置50、第一置料裝置60、第二置料裝置70、清洗裝置20、移料裝置80,以及用以控制整合各裝置作動而執行自動化作業之中央控制裝置,該移料裝置80係於第一置料裝置60處取出待切割之電子元件(如晶圓),並移載至作業裝置50處,作業裝置50係對電子元件執行切割作業,於切割完畢後,移料裝置80係將已切割之電子元件移載至清洗裝置20處,清洗裝置20清洗電 子元件完畢後,移料裝置80則將已清洗之電子元件移載至第二置料裝置70處收置,中央控制裝置係用以控制及整合各裝置作動,以執行自動化作業,達到提升作業效能之實用效益。 Referring to FIG. 8 , the cleaning device 20 of the present invention is applied to a working device. Taking a cutting device as an example, the machine 40 is equipped with a working device 50 , a first loading device 60 , a second loading device 70 , and cleaning. The device 20, the material transfer device 80, and a central control device for controlling the operation of integrating the devices to perform an automated operation, the material transfer device 80 is taken out at the first loading device 60 to take out electronic components (such as wafers) to be cut. And transferred to the working device 50, the working device 50 performs a cutting operation on the electronic component. After the cutting is completed, the loading device 80 transfers the cut electronic component to the cleaning device 20, and the cleaning device 20 cleans the electricity. After the sub-components are completed, the loading device 80 transfers the cleaned electronic components to the second loading device 70 for centralization, and the central control device is used to control and integrate the devices to perform automated operations to achieve lifting operations. Practical benefits of performance.
20‧‧‧清洗裝置 20‧‧‧cleaning device
21‧‧‧清洗槽 21‧‧‧cleaning tank
211‧‧‧排放口 211‧‧‧Drainage
22‧‧‧轉向機構 22‧‧‧ steering mechanism
221‧‧‧支撐架 221‧‧‧Support frame
222‧‧‧馬達 222‧‧‧ motor
223‧‧‧軸承座 223‧‧‧ bearing housing
224‧‧‧旋轉軸 224‧‧‧Rotary axis
225‧‧‧基座 225‧‧‧Base
23‧‧‧承載機構 23‧‧‧Loading mechanism
231‧‧‧馬達 231‧‧‧Motor
232‧‧‧皮帶輪組 232‧‧‧ Pulley set
233‧‧‧轉軸 233‧‧‧ shaft
234‧‧‧承置台 234‧‧‧Holding table
235‧‧‧吸附件 235‧‧‧Adsorbed parts
236‧‧‧扣具 236‧‧‧ buckle
24‧‧‧噴灑機構 24‧‧‧Spray mechanism
241‧‧‧第一噴灑器 241‧‧‧First sprinkler
242‧‧‧第二噴灑器 242‧‧‧Second sprinkler
Claims (10)
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TW102100247A TW201427775A (en) | 2013-01-04 | 2013-01-04 | Electronic component rinsing device and operational equipment applying the same |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN112547603A (en) * | 2020-11-13 | 2021-03-26 | 马鞍山锲恒精密组件科技有限公司 | Semiconductor wafer surface cleaning device |
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CN112547603A (en) * | 2020-11-13 | 2021-03-26 | 马鞍山锲恒精密组件科技有限公司 | Semiconductor wafer surface cleaning device |
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