JPH11314063A - Rotating type coating device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To carry out the coating efficiently for exhausting air in a case effectively, preventing effectively the adhesion of atomized coating liquid on a base and not generating pollution at all. SOLUTION: An upper space of an upper supporting plate 16 is communicated with a lower space thereof through the side section of the upper supporting plate 16a except a section closed by a vertical member 16d. An air flow passage represented by an arrow mark is formed by a fixed supporting member 16 between a space in which a rotating stand 2 is formed on the inner side of a cylindrical cover 15 and a waste liquid recovering case 5 and on the lower side of the fixed supporting member 16 and an upper space of the fixed supporting member 16, namely the space outside the waste liquid recovering case 5. An air flow represented by the arrow mark can be formed even in the state of closing the cylindrical cover 15 and the waste liquid case 5 by the fixed supporting member 16 at the time of coating by the arrangement, and coating liquid mist formed by the atomized coating liquid in the cylindrical cover 5 and the waste liquid recovering case 5 can be exhausted smoothly out of an exhaust opening 14.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for applying a coating solution such as a photoresist solution to a surface of a substrate such as a glass substrate for a liquid crystal display panel, a semiconductor wafer, and a mask substrate for a semiconductor manufacturing apparatus by utilizing centrifugal force. Rotary coating apparatus having a rotating table for rotating the substrate while horizontally supporting the substrate for coating in a thin film form, and a coating liquid supply means for supplying a coating liquid to the upper surface of the substrate supported on the rotating table. About.

[0002]

2. Description of the Related Art As a rotary coating apparatus of this kind, there has been known a rotary coating apparatus disclosed in Japanese Patent Application Laid-Open No. 3-293066.

According to this conventional example, a turntable for horizontally supporting and rotating a substrate, a lid for closing the turntable, a case with an upper opening surrounding the turntable, and a lid for closing the upper opening of the case And a lid that closes the case is fixedly supported so as not to rotate, and a lid that closes the turntable is rotatably supported by bearings.

[0004]

In the case of the above-mentioned prior art, in order to prevent the coating liquid recovered from the coating processing space by the turntable and collected in the case from being mist-like and scattered outside. The lid that closes the top opening of the case is configured to maintain airtightness inside the case. However, in such a configuration, the mist-like coating solution is confined in the case, and when the case lid or the turntable lid is opened in order to take out or take in the substrate, the mist-like coating liquid is used. May cause a problem that the coating liquid of the above adheres to the substrate. In the above prior art, even if the inside of the case is evacuated from the exhaust port, the mist-like application liquid cannot be effectively discharged from the case because the case is hermetically closed by the lid.

[0005] The present invention has been made in view of such circumstances, and can effectively exhaust the inside of the case, and can effectively prevent the mist-like coating solution from adhering to the substrate. An object of the present invention is to provide a rotary coating apparatus capable of performing coating processing without contamination efficiently.

[0006]

According to a first aspect of the present invention, there is provided a rotary coating apparatus for applying a coating liquid onto a surface of a substrate by rotating the substrate, wherein the substrate supporting member rotatably supports the substrate; A coating processing space forming member that forms a coating processing space in combination with the substrate support member, an exhaust port having an opening at an upper portion and for exhausting the inside is formed, and a case surrounding the periphery of the substrate support member; A closing member that is detachably provided in the case and closes the opening of the case when the case is attached to the case, wherein the closing member includes a case in which the opening of the case is closed by the closing member. And an airflow passage communicating the outside with the outside is formed.

According to a second aspect of the present invention, in the rotary coating apparatus according to the first aspect, the air flow passage formed in the closing member is located above the substrate supporting member from the rotation center side of the substrate supporting member. It is provided near the center of the closing member so as to form an airflow flowing toward the side.

According to a third aspect of the present invention, in the rotary coating apparatus according to the first or second aspect, the exhaust port formed in the case forms a downward airflow at a peripheral end of the substrate supporting member. It is provided below the substrate support member.

According to a fourth aspect of the present invention, in the rotary coating apparatus according to any one of the first to third aspects, the coating processing space forming member is rotatable together with the substrate supporting member at the time of coupling with the substrate supporting member. Characterized in that it is coupled to the closing member so that

[0010]

Next, embodiments of the present invention will be described in detail with reference to the drawings.

FIG. 1 shows a first embodiment of a rotary coating apparatus according to the present invention.
FIG. 1 is a longitudinal sectional front view showing a schematic configuration of the entire embodiment, in which a turntable 2 on which a rectangular substrate 1 is mounted is provided so as to be horizontally rotatable around a vertical axis P, and above the turntable 2, An upper rotating plate 3 is provided in parallel with the rotating table 2, and the upper rotating plate 3 is integrally rotatably attached to the rotating table 2 via an upper supporting plate 4, and a lower portion and a peripheral portion of these rotating members are rotated. A waste liquid recovery case 5 is provided so as to surround it from the outside, and an electric motor 7 as a drive source is connected to the turntable 2 via an output shaft 6 as a vertical rotation shaft.

The turntable 2 is configured as a disk having an outer shape sufficiently larger than the outer shape of the rectangular substrate 1, and the rectangular substrate 1 is horizontally mounted on a large number of substrate support pins 8. To be mounted and supported. Although not shown, a pair of positioning pins are provided on each of the four corners of the rectangular substrate 1 on the turntable 2, and the rectangular substrate 1 is horizontally rotated integrally with the turntable 2 by these positioning pins. It is supposed to be.

Further, on the outer peripheral upper surface of the turntable 2,
Spacer ring 9 and ring plate 10 having the same outer diameter as
Are connected at multiple locations to concentric circles,
The upper support plate 4 is provided on the ring plate 10 with the knob bolt 1.
The substrate 1 is detachably attached via the base plate 1, and the substrate 1 can be taken in and out from the central opening of the ring plate 10 by removing the upper support plate 4.

The upper rotating plate 3 is formed as a disk having a larger diameter than the outer shape of the substrate 1, and a collar 1 is provided on the lower surface of the upper supporting plate 4.
2 are connected by bolts. The bottom of the waste liquid recovery case 5 is narrowed down, and a waste liquid discharge port 13 is formed at the lower end thereof, and an exhaust port 14 for discharging a solvent gas or a coating liquid mist evaporated from the coating liquid is formed at a plurality of locations in the circumferential direction. ing.

A cylindrical cover 15 is mounted on the upper part of the waste liquid collecting case 5, and a fixed support member 16 is detachably mounted on the cylindrical cover 15.

As shown in a partially cutaway enlarged front view of the main part of FIG. 2, a plan view of the main part of FIGS. 3 and 4, and a side view of the main part of FIG. A first air cylinder 20 as a drive opening / closing mechanism is attached to an upper support plate 16a of the fixed support member 16 at a position vertically above the opening 19, and a cylinder rod of the first air cylinder 20 is formed. A block 21 is attached to the tip of 20a, and a bottomed cylindrical lid 17 is suspended and held on the block 21 so as to be able to move up and down and relatively rotate.

The first magnet 2 is provided on the lower surface of the block 21.
On the other hand, a second magnet 23 having the same polarity as the first magnet 22 is provided on the bottom surface of the lid 17, and the block 21 is disengaged from the lid 17 while the lid 17 is displaced to the closed position. When in the contact state, the lid 17 can be maintained in the closed position by the repulsive force.

Therefore, the shortening of the first air cylinder 20 causes the lid 17 to be displaced upward to the open position above the opening 19, while the extension of the first air cylinder 20 causes
The lid 17 is displaced to a closed position in which the lid 17 is lowered to fit into the opening 19, and only the lid 17 can rotate integrally with the upper rotating plate 3 while closing the opening 19.

A second air cylinder 24 rotatable within a range of 90 ° around a vertical axis is provided on the upper support plate 16a on the side of the first air cylinder 20. A spline shaft 25 is connected to a cylinder rod 24a of the air cylinder 24. A spline cylinder 26 is attached to the spline shaft 25 so that it can only move up and down, and a rotating cylinder 27 is attached to the spline cylinder 26 so that it can rotate only. The washing nozzle 18 is integrally attached to the rotating cylinder 27, and the rotating cylinder 27 is attached to a cylinder rod 28a of a third air cylinder 28 provided on the upper support plate 16a on the lower side of the second air cylinder 24. Are connected. Although not shown, the cleaning nozzle 18 is connected to a pipe connected to the cleaning liquid pumping mechanism. With the above-described configuration, a turntable cleaning unit that jets the cleaning liquid toward the upper surface of the turntable 2 is configured.

With the above configuration, in the non-cleaning state in which the lid 17 is in the closed position, the cleaning nozzle 18 is positioned at the non-cleaning position which is displaced from above the opening 19.
Is in the open position, the second air cylinder 2
After rotating by 4 to position the cleaning nozzle 18 above the opening 19, the third air cylinder 28 is extended to lower the cleaning nozzle 18, and from the outlet 18 a toward the upper surface of the turntable 2. The cleaning liquid can be displaced to a cleaning position where the cleaning liquid is ejected. A structure including second and third air cylinders 24 and 28 for drivingly displacing the cleaning nozzle 18 between a cleaning position and a non-cleaning position is referred to as a driving mechanism.

Lower supporting plate 1 of fixed supporting member 16
6b is formed in an annular shape, and at each of four predetermined circumferential positions on the upper surface close to the inner peripheral surface side, a mountain-shaped engaging projection 29 is provided, while being located above the lower support plate 18b. As shown in FIG.
The annular plate 31 is attached via
At each of four predetermined positions in the circumferential direction of the annular plate 31, there are provided cylindrical bodies 32 into which the engaging projections 29 are fitted. When the upper rotary plate 3 is attached or detached, the engaging projections 29. Are fixed to the fixed support member 16.
It is configured to be able to hang.

With the above structure, first, at the time of the coating treatment, the fixed support member 16 is removed from the cylindrical cover 15 and the upper support plate 4 is removed from the turntable 2, and the upper support plate 4 is suspended by the fixed support member 16. Is removed upward, and the rectangular substrate 1 is mounted on the substrate support pins 8... Of the turntable 2 in a predetermined posture.

Next, a coating liquid supply nozzle (not shown) serving as a coating liquid supply means is moved above the center of the rectangular substrate 1, and
A predetermined amount of the coating liquid is supplied dropwise. Then, the upper support plate 4 is carried in by being hung by the fixed support member 16 and
On the ring plate 10 and the fixed support member 16
Are respectively mounted on the cylindrical cover 15, and as shown in the front view of the main part in FIG. 6, the first air cylinder 20 is extended to drive and displace the lid 17, and the opening 19 of the upper rotary plate a is closed. At the same time, the cleaning nozzle 18 is displaced to the non-cleaning position.

Thereafter, the electric motor 7 is started to rotate the turntable 2, the upper support plate 4, the upper turn plate 3 and the rectangular substrate 1 horizontally horizontally. Due to this rotation, the coating liquid on the square substrate 1 diffuses and flows outward due to centrifugal force, and the square substrate 1
Thinly applied on top. In this case, the air layer of the flat coating processing space S formed between the turntable 2 and the upper rotary plate 3 also rotates integrally, and the diffusion flow of the coating liquid does not occur on the square substrate 1. Is performed.

The surplus coating liquid that has flowed over the rectangular substrate 1 and has reached the outer periphery flows out from the peripheral edge of the rectangular substrate 1 and scatters from the entire outer periphery of the coating processing space S. The scattered application liquid flows into the waste liquid recovery case 5 through gaps formed above and below the spacer ring 9 and is collected.

After the spin coating process has been performed a predetermined number of times, the fixed support member 16 is removed from the cylindrical cover 15 and the upper support plate 4 is removed from the turntable 2.
6, the upper rotating plate 3 is removed upward, and the rectangular substrate 1 is removed.
After taking out, the upper support plate 4 is attached to the ring plate 10.
And the fixed support member 16 is mounted on the cylindrical cover 15, respectively.
And the cover 17 is driven and displaced to the open position.

Thereafter, the second air cylinder 24 is actuated to rotationally displace the cleaning nozzle 18 to a position above the opening 19, and from that state the third air cylinder 28 is extended to lower the cleaning nozzle 18, Through opening 19, as shown in FIG. 5, it is displaced to a washing position below upper rotating plate 3. In this state, while the electric motor 7 is started and the turntable 2, the upper support plate 4, and the upper turntable 3 are horizontally rotated integrally, a cleaning liquid is spouted out from the cleaning nozzle 18 to the upper surface of the turntable 2 to supply centrifugal force. The mist of the coating liquid adhering to the upper surface of the turntable 2 is removed by washing.

FIG. 7 is an overall schematic front view showing a second embodiment of the rotary coating apparatus according to the present invention. The difference from the first embodiment is as follows.

The lower end of the rotary shaft 2a of the turntable 2 and the upper end of the drive shaft 33a of the electric motor 33 are interlocked and connected via a belt-type transmission mechanism 34.
A through-hole 35 is formed through the axis of the rotary shaft, a cleaning liquid pipe 37 having a cleaning nozzle 36 attached to the upper end thereof is inserted into the through-hole 35, and the cleaning nozzle 36 is positioned above the turntable 2. The turntable cleaning means is provided in a fixed state, and ejects a cleaning liquid toward the upper surface of the turntable 2. Other configurations are the same as those of the first embodiment, and the description thereof will be omitted by retaining the same reference numerals.

FIG. 8 is an overall schematic front view showing a third embodiment of the rotary coating apparatus according to the present invention. The difference from the first embodiment is as follows.

At a predetermined position on the fixed frame 15 a around the turntable 2, the cleaning nozzle 3 is
The turntable cleaning means 9 is attached so that the cleaning liquid is jetted toward the upper surface of the turntable 2 with the upper turntable 3 removed. Other configurations are the same as those of the first embodiment, and the description thereof will be omitted by retaining the same reference numerals.

The present invention can be applied not only to the rectangular substrate 1 but also to a rotary coating device for a circular substrate.

As described in the above embodiment, during the coating process, the electric motor 7 is started to rotate the turntable 2, the upper support plate 4, the upper turn plate 3, and the rectangular substrate 1 horizontally horizontally. At this time, as is apparent from FIGS. 5 and 6, the turntable 2, the upper support plate 4, the upper rotary plate 3, the mounting member 30, and the annular plate 31 are in a non-contact state with the fixed support member 16. The rotary table 2, the upper support plate 4, and the upper rotary plate 3 can freely rotate regardless of the fixed support member 16. For this reason, compared with the case where the upper support plate 4 and the upper rotating plate 3 which are larger than the rectangular substrate 1 are rotatably supported using bearings, the number of sliding portions is reduced, which is advantageous in terms of the life of the apparatus and the amount of generated particles. There is no need for a large and highly accurate bearing, which is advantageous in cost. In the case of rotatably supported by bearings, smooth rotation is required unless the rotation centers of the bearings supporting the upper support plate 4 and the upper rotary plate 3 are exactly aligned with the rotation axis P of the turntable 2. However, such a strictness is not required in the present configuration, and spin coating by smooth rotation of the turntable 2 or the like can be realized at low cost.

When placing the rectangular substrate 1 on the turntable 2 serving as a substrate support member, the rectangular substrate 1 is suspended by the fixed support member 16 and the upper rotary plate 3 is removed upward. As is apparent from FIGS. 3, 5 and 6, etc., the upper support plate 4 to which the upper rotating plate 3 is connected has the mounting member 30 coupled to extend upward from the upper support plate 4. Through an annular plate 31 extending in the horizontal direction. Ring plate 3
1 is provided with a cylindrical body 32. On the other hand, a lower support plate 16b is provided on the fixed support member 16 which is an advancing / retreating member that moves up and down with respect to the turntable 2 by moving up and down, so that the lower support plate 16b is located below the annular plate 31. On the upper surface of the inner peripheral surface side portion 16c, the engagement protrusion 2 is provided.
9 are provided. The engagement protrusion 29 can be engaged with the cylindrical body 32. An engaging portion is constituted by the mounting member 30, the annular plate 31, the cylindrical body 32, the lower support plate 16b, the inner peripheral surface side portion 16c, and the engaging projection 29, and the concave and convex coupling is performed by the cylindrical body 32 and the engaging projection 29. , A positioning mechanism is configured.

When the upper rotating plate 3 is to be removed upward, the fixed support member 16 rises, so that the lower support plate 1 is removed.
The annular plate 31 is supported from below by the inner peripheral surface side portion 16c of 6b. At this time, the engagement projection 29 provided on the inner peripheral surface side portion 16c of the lower support plate 16b of the fixed support member 16 is fitted into the cylindrical body 32 provided on the annular plate 31, whereby the two are combined. The annular plate 31 is supported from below. Thereby, the upper rotating plate 3
The upper support plate 4 is positioned at a predetermined position in the circumferential direction so as not to rotate with respect to the fixed support member 16, is suspended and supported so as not to rotate relatively, and separates from the turntable 2 and rises. When the upper rotating plate 3 and the upper supporting plate 4 are coupled to the rotating table 2, the fixed support member 16 is lowered, and the upper rotating plate 3 and the upper supporting plate 4 are mounted and coupled to the rotating table 2 by their own weight.
When the fixed support member 16 is further lowered, the support of the annular plate 31 by the lower support plate 16b is released, and the engagement projection 29 is disengaged from the cylindrical body 32 to release the uneven coupling therebetween, so that the annular plate 31 is released. 31 is released from below. Thus, the upper rotating plate 3,
The upper support plate 4 is rotatable integrally with the turntable 2.

As is known in the art, simply supporting the coating processing space forming member for forming the coating processing space in a rotatable manner by using a bearing requires the rectangular substrate 1 to be moved in and out of the turntable 2. When the coating processing space forming member is lifted to release the connection with the turntable 2, the coating processing space forming member rotates undesirably, and then the coating processing space forming member is connected to the turntable 2. When trying to do so, it may not be possible to connect to a certain position, and it may not be possible to reliably connect. However, in this configuration, when the coating processing space forming member composed of the upper rotating plate 3 and the upper supporting plate 4 is lifted and disengaged from the turntable 2, it is positioned in the circumferential direction and cannot rotate. Because it is supported, a fixed positional relationship can always be maintained with respect to the turntable 2, and it can be always connected to a fixed position, and can be reliably connected. Thus, in the present configuration, the detachable attachment between the ring plate 10 of the turntable 2 and the upper support plate 4 can always be reliably performed in a fixed positional relationship.

The lower support plate 16b of the fixed support member 16 is located at a height between the upper support plate 4 and the annular plate 31, which are connected to each other by the mounting member 30, and The fixed support member 16 and the upper support plate 4 that are not in contact with each other, and that close the opening for taking in and out the substrate above the cylindrical cover 15 attached to the upper portion of the waste liquid recovery case 5 They are connected so that they can move relative to each other in the vertical direction by contact. Thereby, when the upper support plate 4 and the upper rotating plate 3 are suspended and removed upward by the fixed support member 16, the lower support plate 16b of the fixed support member 16 is supported by the lower support plate 16b after the fixed support member 16 starts rising. Until the lower surface of the annular plate 31 of the plate 4 is lifted, the upper support plate 4 and the upper rotating plate 3 are in a state of being connected to the turntable 2. Then, the lower support plate 16b is brought into contact with the lower surface of the annular plate 31 of the upper support plate 4 and lifted, so that the upper support plate 4 and the upper rotating plate 3 are removed from the turntable 2. Conversely, the fixed support member 1
When the cylindrical cover 15 is closed at 6 and the upper support plate 4 and the upper rotary plate 3 are lowered to couple them to the turntable 2, the upper support plate 4 and the upper rotary plate 3 are suspended. When the fixed support member 16 is lowered, first, the upper support plate 4 and the upper rotating plate 3 are coupled to the turntable 2 by their own weight. After that, the fixed support member 16 continues to descend, and finally reaches a state shown in FIG. 1 before the lower support plate 16 b hits the upper support plate 4, and the fixed support member 16 rides on the upper surface of the cylindrical cover 15. The opening is closed, and the fixed support member 16 stops. At this time, the upper support plate 4
The mounting member 30 and the annular plate 31 are rotatable in a non-contact state with the lower support plate 16b.

As described above, by allowing the fixed support member 16 and the upper support plate 4 and the upper rotary plate 3 to be relatively movable in the vertical direction, one of them (in the above embodiment, the upper support plate 4 and the upper rotary plate 3). Even after 3) reaches the lowest position (that is, the state where it is connected to the turntable 2), the other (the fixed support member 16 in the above embodiment) can continue to descend, and the upper support plate 4 and the upper rotation The plate 3 is securely attached to the turntable 2 and the fixed support member 16 is securely attached to the cylindrical cover 15.

If the vertical positions of the upper support plate 4, the upper rotary plate, and the fixed support member 16 are fixed as in the prior art, the upper support plate 4, the upper rotary plate, and the fixed support member 16 are fixed. Distance and turntable 2, waste liquid recovery case 5,
When the dimensional accuracy and assembling accuracy of the members such as the cylindrical cover 15 need to be extremely high, the cost becomes extremely high, and the dimensions are slightly shifted due to various factors such as temperature change and aging. Has a turntable 2
One of the closed state of the cylindrical cover 15 and the waste liquid recovery case 5 is incomplete, and problems such as reduced airtightness due to play due to incomplete coupling, generation of vibration and particles, and the like occur. . In this configuration, even if the distance between the upper support plate 4 and the upper rotating plate and the fixed support member 16 and the dimensional accuracy of the turntable 2, the waste liquid collecting case 5, the cylindrical cover 15, and the like are not so high, the turntable 2 and the waste liquid can be used. Both the cylindrical cover 15 of the recovery case 5 and the cylindrical cover 15 can be securely closed, and the simple structure has a low cost, and even if a slight dimensional change occurs due to various factors such as temperature change and aging change, the turntable 2
There is no adverse effect on the closed state between the waste liquid collecting case 5 and the cylindrical cover 15.

This means that, as described above, when the upper support plate 4 is coupled to the turntable 2, the upper support plate 4, the upper rotary plate 3, the mounting member 30, and the annular plate 31 do not contact the fixed support member 16. In combination with the state, smooth and reliable operation of the device is realized at low cost.

Further, in the present configuration, the fixed support member 16 as a closing member for closing the opening for loading and unloading the substrate above the cylindrical cover 15 attached to the upper portion of the waste liquid collecting case 5.
Consists of an upper support plate 16a, a lower support plate 16b, a vertical member 16d, and a horizontal member 16e.
The upper support plate 16a has the shape shown in the plan view of FIG. 4, and the lower support plate 16b has the shape shown in the plan view of FIG. The vertical member 16d is shown in a cross section in FIG. 3 and has a shape shown in FIG. And
As shown in FIG. 5, the upper space and the lower space of the upper support plate 16a communicate with each other through the side of the upper support plate 16a, except for the space closed by the vertical member 16d. That is, the turntable 2 inside the cylindrical cover 15 and the waste liquid recovery case 5 and below the fixed support member 16
1 and the space above the fixed support member 16, that is, the space outside the waste liquid recovery case 5, an air flow path as shown by arrows in FIGS. 1 and 5 is formed by the fixed support member 16. It is formed.

With this configuration, even when the cylindrical cover 15 and the waste liquid collecting case 5 are closed by the fixed support member 16 during the coating process, an airflow as shown by arrows in FIGS. 1 and 5 can be formed. The application liquid mist in which the application liquid has been atomized into the cylindrical cover 15 and the waste liquid recovery case 5 can be smoothly discharged from the exhaust port 14. Therefore, the exhaust in the cylindrical cover 15 and the waste liquid collecting case 5 can be effectively performed, and the mist-like coating liquid can be effectively prevented from adhering to the substrate, and the coating processing without contamination can be efficiently performed. . Moreover, a member 5 a is provided between the exhaust port 14 and the turntable 2, so that the exhaust can be uniformly suctioned over the entire circumference of the turntable 2. The substantial exhaust port viewed from the turntable 2 is the gap 5b between the lower end of the member 5a and the waste liquid collecting case 5, but the exhaust port 14 and the gap 5b should be provided sufficiently below the turntable 2. Thus, the inside of the cylindrical cover 15 and the waste liquid collecting case 5 can be effectively exhausted. Further, the waste liquid collecting case 5 narrows the space between the rotating plate 2 and the ring plate 10 above the peripheral edge of the rotating table 2 by a member 5 c, and the mist of the coating liquid flowing out of the rotating table 2 into the waste liquid collecting case 5 While making it difficult to adhere to the upper surface of the square substrate 1 mounted on the upper surface,
The flow velocity of the airflow around the turntable 2 is increased, so that the mist of the coating liquid is discharged more smoothly, and the re-adhesion to the rectangular substrate 1 is reliably prevented. The air flow passage in the fixed support member 16 is provided near the rotation center of the turntable 2 so as to pass through the upper support plate 16a above the vicinity of the axis P of the rotation center of the turntable 2. Therefore, the air enters the space inside the cylindrical cover 15 from the rotation center side of the turntable 2, flows toward the peripheral side of the turntable 2, and forms a downward airflow directed downward from the peripheral end of the turntable 2. The entire space in the cylindrical cover 15 can be evacuated more smoothly and efficiently, and in particular, the space above the turntable 2 can be evacuated more smoothly.
It is particularly effective for preventing mist from adhering to the rectangular substrate 1 when the upper rotating plate 3 is lifted.

Incidentally, this type of rotary coating apparatus includes:
Conventionally, JP-A-2-219213 and JP-A-4-199
One disclosed in Japanese Patent No. 61955 is known.

According to these conventional examples, the turntable for supporting and rotating the substrate horizontally, and the turntable, which is disposed parallel to the upper surface of the substrate supported by the turntable with a small interval and is integral with the turntable. An upper rotating plate that rotates, supplies the coating liquid to the center of the upper surface of the substrate while rotating the substrate together with the turntable and the upper rotating plate, and applies the coating liquid to the entire surface of the substrate using centrifugal force generated by the rotation of the substrate To form a thin film.

However, in the case of such a conventional example, during the spin coating, a part of the coating liquid scatters on the upper surface of the turntable, and adheres as a mist, and rotates with respect to a large number of substrates. As the coating operation is repeated, the coating liquid adhered to the upper surface of the turntable causes particles to be generated. No countermeasures have been taken against the generation of particles due to the adhesion of the coating liquid to the upper surface of the turntable, and there is a disadvantage that the quality is reduced. Furthermore, when the mist of the coating liquid adhering to the upper surface of the turntable is not solidified and the next substrate is spin-coated, the adhering mist scatters again and contaminates the substrate.

In view of such circumstances in the rotary coating apparatus, each of the above-described embodiments has a first feature that the generation of particles due to the adhesion of the coating liquid to the upper surface of the turntable can be prevented. For this purpose, in a rotary coating apparatus having a rotary table that rotates while horizontally supporting a substrate, and a coating liquid supply unit that supplies a coating liquid to the upper surface of the substrate supported on the rotary table, By comprising a rotary table cleaning means for spraying a cleaning liquid toward the upper surface of the table, after performing a predetermined spin coating on the substrate,
After the substrate is absent, the cleaning liquid is sprayed toward the upper surface of the turntable, and the coating liquid that has scattered and adhered to the upper surface of the turntable can be washed and removed, so that the predetermined rotation coating on the substrate can be performed. Since the coating liquid adhering to the upper surface of the turntable is washed away, the generation of particles due to the application liquid adhering to the upper surface of the turntable, and the contamination of the substrate due to the re-scattering of the adhering mist can be prevented. Deterioration of the processing quality of the substrate can be avoided.

Further, as a second feature, when cleaning the upper surface of the turntable, it can be performed easily in a short time without removing and cleaning the upper rotating plate.
For the purpose of avoiding an increase in inertia due to the cleaning configuration, in addition to the first feature, the turntable cleaning means has an opening in the center and is supported on the turntable. An upper rotating plate that is provided in parallel with the upper surface of the substrate at a predetermined interval and is rotated integrally with the turntable, a lid that opens and closes the opening, and an upper rotating plate that is opened and displaced to the open position. By disposing below the plate and comprising a cleaning nozzle provided on the fixed support member so as to spray the cleaning liquid toward the upper surface of the turntable, the application of the coating liquid performed while rotating the substrate, By displacing the lid to the closed position, it can be performed without causing a turbulence of the air layer above the substrate as before, and after performing a predetermined spin coating, the lid is displaced to the open position, Cleaning nose through opening It was displaced below the upper rotating plate,
By rotating the upper rotating plate together with the turntable while ejecting the washing liquid to the washing nozzle, the washing liquid ejected from the washing nozzle to the upper surface of the turntable is centrifugally flowed along the upper surface of the turntable, and during the previous spin coating process. By cleaning the coating liquid adhering to the upper surface of the turntable, the subsequent spin coating process can be performed uniformly and without contamination.
The cleaning nozzle is displaced below the upper rotary plate through the opening provided in the upper rotary plate, and the cleaning liquid is jetted from the cleaning nozzle to the upper surface of the turntable, thereby cleaning the application liquid attached to the upper surface of the turntable. The upper surface of the table can be cleaned easily and quickly in a short time without removing the upper rotating plate. In addition, since the cleaning nozzle is provided on the fixed support member and the cleaning nozzle is not rotated integrally with the upper rotating plate when applying the coating liquid to the substrate, the cleaning configuration for the upper surface of the turntable is caused. This can avoid the increase in the rotational inertia due to the increase in the weight, and the high speed rotation can be started early when applying the coating liquid to the substrate, which may hinder the coating process. There is no.

A third feature is to make it easier and easier to clean the upper surface of the turntable. In addition to the second feature, a driving mechanism in which a lid is attached to a fixed support member is provided. By providing the opening and closing mechanism so as to be displaceable between a closed position and an open position, and providing the washing nozzle so as to be displaceable between a washing position and a non-washing position by a driving mechanism attached to a fixed support member, The lid is driven and displaced by the drive opening / closing mechanism, and the cleaning nozzle is driven and displaced by the drive mechanism, so that the upper surface of the turntable can be cleaned. Since the upper surface of the table is cleaned, cleaning of the turntable can be performed more easily and easily than when the lid and the cleaning nozzle are displaced by an artificial operation.

Further, as a fourth feature, in order to enable the upper surface of the turntable to be cleaned with a simple configuration, in addition to the first feature, a turntable cleaning means is provided.
By providing a cleaning nozzle in a fixed state so as to penetrate the rotation axis of the turntable and to be located above the turntable, by configured to eject the cleaning liquid toward the upper surface of the turntable by the wash nozzle, A cleaning nozzle extending from the lower side of the turntable and provided in a fixed state ejects a cleaning liquid onto the upper surface of the rotary table in a rotating state, and the cleaning liquid is centrifugally flowed along the upper surface of the rotary table to wash the upper surface of the rotary table. The cleaning nozzle is provided to extend from the lower side of the turntable by penetrating the rotation shaft of the turntable, and the cleaning liquid is ejected to the upper surface of the turntable for cleaning. Compared with the case where the cleaning liquid is provided above, there is an advantage that it is not necessary to consider the contamination of the substrate due to the leakage of the cleaning liquid, and the configuration can be simplified.

[0050]

As is apparent from the above description, according to the rotary coating apparatus of the present invention, the inside of the case can be effectively exhausted, and the mist-like coating liquid adheres to the substrate. This can be effectively prevented, and coating treatment without contamination can be efficiently performed.

[Brief description of the drawings]

FIG. 1 is a vertical sectional front view showing a schematic configuration of a whole of a first embodiment of a rotary coating apparatus according to the present invention.

FIG. 2 is an enlarged front view of a main part.

FIG. 3 is a plan view of a main part.

FIG. 4 is a plan view of a main part.

FIG. 5 is a side view of a main part.

FIG. 6 is a front view of a main part showing a spin coating state.

FIG. 7 is an overall schematic front view showing a second embodiment of the rotary coating apparatus according to the present invention.

FIG. 8 is an overall schematic front view showing a third embodiment of the rotary coating apparatus according to the present invention.

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 DESCRIPTION OF SYMBOLS 1 ... Square substrate 2 ... Rotating table 3 ... Upper rotating plate 4 ... Upper supporting plate 5 ... Waste liquid recovery case 15 ... Cylindrical cover 16 ... Fixed supporting member

Claims (4)

[Claims] 1. A rotary coating apparatus for coating a coating liquid on the surface of a substrate by rotating the substrate, a substrate support member rotatably supporting the substrate, and a coating processing space coupled to the substrate support member. A coating processing space forming member that forms an opening, and an exhaust port that has an opening at the top and that exhausts the inside is formed, and a case that surrounds the periphery of the substrate supporting member; And a closing member that closes the opening of the case when the case is mounted, wherein the closing member is formed with an air flow passage that communicates between the inside and the outside of the case in a state where the opening of the case is closed by the closing member. A rotary coating device. 2. The rotary coating device according to claim 1, wherein the air flow passage formed in the closing member flows from a rotation center side of the substrate support member to a peripheral side above the substrate support member. A rotary coating device, which is provided near the center of the closing member so as to form an air flow. 3. The rotary coating device according to claim 1, wherein the exhaust port formed in the case is formed by the substrate support member so as to form a downward airflow at a peripheral end of the substrate support member. A rotary coating device, wherein the rotary coating device is also provided at a lower position. 4. The rotary coating apparatus according to claim 1, wherein the coating processing space forming member is rotatable together with the substrate supporting member when the coating processing space forming member is coupled to the substrate supporting member. A rotary coating device, wherein the rotary coating device is connected to a member.