JP2003163147A - Substrate liquid treatment unit - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To prevent air containing mist from flowing to a substrate side while the substrate is made to spin in a high speed in a liquid treatment chamber. <P>SOLUTION: Since a spiral flow, which goes down from the vicinity of the disposed position of the substrate 20 toward a bottom wall 34B of a lower cup 34 in the liquid treatment chamber 33A, caused by high speed spin of the substrate 20 is formed while developer is supplied in the chamber, exhaust ducts 50 are provided in two positions above the bottom wall 34B of the lower cup 34 so as to have the positional relationship of 180 degrees in a circumference direction, exhaust pipes 51 are connected to insides of the exhaust ducts 50, and an intake unit 53 with a filter is installed on the upper end of an upper cup 35. Each exhaust duct 50 has the bottom wall 34B of a lower cup 34, an inner wall 34C and a circumference wall 34A as a part of its constitution, and further includes the tilt surface that continuously goes down in a range of 180 degrees from the position of an opening 50A in the circumference direction. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention supplies a treatment liquid to the surface of a substrate such as a TFT substrate of a liquid crystal panel, a color filter, or a semiconductor wafer while the substrate is rotationally driven, and the centrifugal force is generated by the rotation. The present invention relates to a substrate liquid processing apparatus that applies a processing liquid.

[0002]

2. Description of the Related Art For example, in a process of manufacturing a TFT substrate of a liquid crystal panel, a predetermined process treatment is performed by a wet process such as application of a developing solution, application of an etching solution, and supply of a stripping solution for stripping a resist film. Further, a washing step and a drying step are added between these processes. Such a wet treatment of a substrate is performed by mounting the substrate on a spindle and supplying the treatment liquid while rotating the spindle.
It has been widely used from the past, such as Japanese Patent No. 33357. Here, in the cleaning step, for example, a so-called megasonic shower is used in which pure water that has been ultrasonically excited is used as a cleaning liquid, and the pure water is jetted toward the substrate. This cleaning liquid is also a kind of processing liquid.

Therefore, a schematic configuration of a known substrate processing apparatus is shown in FIG. In the figure, reference numeral 1 denotes a substrate, and the substrate 1 is positioned and fixed at a predetermined position on a substrate supporting member 3 provided at the tip of a spindle 2 which is rotationally driven by a motor 2a. Reference numeral 4 denotes a spin cup, and this spin cup 4 is composed of a lower cup 4A and an upper cup 4B. One of the cups, in the configuration of FIG. 7, the upper cup 4B can be brought into contact with and separated from the lower cup 4A. Has become. The interior of the spin cup 4 with the upper and lower cups 4A and 4B connected to each other is a liquid processing chamber 5, and the entire substrate 1 mounted on the substrate supporting member 3 of the spindle 2 is covered. At the upper position of the substrate 1, as shown in FIG. 8, a spray nozzle 6 for developing solution or the like is provided. The injection nozzle 6 is located outside the spin cup 4 and is attached to the tip of a revolving arm 8 that is provided so as to be connected to the tip of the main shaft portion 7, so that the treatment liquid is ejected downward. Has become.

The injection nozzle 6 is retracted and the upper cup 4 is
In a state where B is separated from the lower cup 4A, the substrate 1 is held by the transfer handling means and mounted on the substrate support member 3 provided at the tip of the spindle 2. After that, the main shaft portion 7 is rotated about the axis by a predetermined angle, and the swing arm 8 is displaced to a position facing the substrate 1 in the lower cup 4A. In this state, the upper cup 4B is lowered to be joined to the lower cup 4A. At this time, a notch (not shown) is formed at the lower end of the upper cup 4B in order to allow the swivel arm 8 to pass between the cups 4A and 4B.

When the upper and lower cups 4A and 4B are joined and the liquid processing chamber 5 is defined inside the cups 4A and 4B, the motor 2
By operating a, the spindle 2 is rotationally driven, and when the spindle 2 reaches the set number of revolutions, the treatment liquid is ejected from the ejection nozzle 6. This processing liquid is supplied to the surface of the substrate 1 and the substrate 1 is rotating. Therefore, the processing liquid supplied to this substrate 1 diffuses outward along the surface of the substrate 1 by the action of centrifugal force. . As a result, the treatment liquid is applied over the entire surface of the substrate 1 in a substantially uniform film thickness, and the surplus treatment liquid is scattered outward from the periphery of the substrate 1.

The processing liquid supplied to the substrate 1 is
However, the scattered liquid flows down along the outer peripheral wall of the lower cup 4A of the spin cup 4 and collects on the bottom wall. A drainage pipe 10 is opened on the bottom wall of the spin cup 4, and a suction pump 11 is connected to the drainage pipe 10. Therefore, the scattered liquid is collected in the drainage tank 12 via the drainage pipe 10. Further, although a mist of the processing liquid is generated inside the processing liquid chamber 5, a plurality of exhaust pipes 13 are connected to the side wall of the lower cup 4A in the circumferential direction, and a suction pump is connected to each of the exhaust pipes 13. 14 is connected. Therefore, the air in the processing liquid chamber 5 including the mist flows out from the exhaust pipe 13. In this way, when forced evacuation is performed from the inside of the processing liquid chamber 5, the inside of the processing liquid chamber 5 has a negative pressure, so that the outside air intake port 15 is formed in the upper surface portion of the upper cup 4B.

When the substrate 1 rotates, the substrate 1
At a position in the vicinity of, an air flow outward from the center of rotation is formed. Since the outside air intake port 15 is opened at the upper position of the liquid processing chamber 5, on the front surface side of the substrate 1, the air flow descends from the upper side and flows outward along the front surface of the substrate 1. . On the other hand, on the back surface side of the substrate 1, an outward flow is formed, so that the pressure in the vicinity of the spindle 2 is reduced. As a result, an inward air flow toward the spindle 2 is formed below the substrate 1. Here, since the air below the substrate 1 contains mist, the mist of the processing liquid adheres to the back surface of the substrate 1. In consideration of this point, in order to prevent the above-mentioned inward airflow from being formed on the bottom wall of the lower cup 4A, a plurality of nozzles 16 for injecting clean air to a position near the spindle 2 are provided. Is provided,
By injecting air from the nozzle 16, the pressure in the vicinity of the spindle 2 is prevented from decreasing.

[0008]

As described above, when the substrate 1 rotates, an air flow outward from the center of rotation is formed in the liquid processing chamber 5, but the liquid processing chamber 5 spins. Because it is a small space in the cup 4,
The air flow formed outward is mainly directed to the outer peripheral walls of the upper and lower cups 4A and 4B that form the spin cup 4. Therefore, the exhaust pipe 13 is opened at the extended position of the substrate 1 mounted on the spindle 2. However, since the exhaust pipe 13 does not extend over the entire circumference, the air flow directed toward the outer peripheral side is not always complete. It cannot be excluded. For this purpose, the exhaust pipe 13
In the region where is not connected, the flow of air containing the mist of the treatment liquid hits the wall surface of the spin cup 4 and changes its direction in any direction such as upward and downward. The flow of the air thus redirected flows backward in the direction of the center of rotation of the substrate 1. For this reason, as described above, it is still unsatisfactory in that the provision of the nozzle 16 cannot completely prevent the air containing the mist from flowing back to the substrate 1 side.

The present invention has been made in view of the above points, and it is an object of the present invention that air containing mist circulates to the substrate side during high-speed rotation of the substrate in the liquid processing chamber. Is to prevent it more reliably.

[0010]

In order to achieve the above-mentioned object, the present invention comprises a lower cup and an upper cup, in which a liquid processing chamber for accommodating a substrate is formed, and a lower cup. The substrate supporting member comprises a spindle extending from the bottom of the cup into the liquid processing chamber and having a substrate supporting member at the tip of which a substrate is installed in a horizontal state, and a liquid ejecting nozzle for ejecting a processing liquid. A substrate liquid processing apparatus for injecting a processing liquid from the liquid injection nozzle toward the surface of the substrate while the substrate is installed and the spindle is rotationally driven, the substrate liquid processing device comprising: a bottom portion of the lower cup; A plurality of exhaust ports opening in the liquid processing chamber are formed at positions at regular intervals in the circumferential direction so as to reach the inner peripheral wall through which the spindle is inserted, and exhaust of each of these exhaust ports is formed. From an exhaust duct until reaching the formation of the next exhaust port with a continuously falling slope top plate toward the circumferential direction, open into said respective exhaust duct,
The feature is that each of these exhaust ducts is provided with an exhaust passage for applying a negative pressure suction force.

The liquid processing chamber inside the spin cup is a narrow closed space, and since the substrate rotates at a high speed in this liquid processing chamber, an air flow is formed from the rotation center side of the substrate toward the outer peripheral side. . This air flow is not a radial direction but a swirling flow having a rotational direction component. Therefore, at the bottom of the spin cup, an exhaust port is formed by bridging an upper plate between the outer peripheral wall and the inner peripheral wall of the spin cup. A plurality of exhaust ports are formed at equal intervals in the circumferential direction.
The upper plate is an inclined upper plate that continuously descends obliquely downward from the exhaust port formed by the upper plate toward the exhaust port that opens next. When the substrate rotates, an air flow is formed so as to swirl outward from the center of rotation of the substrate, that is, the position where the spindle is disposed. In order to direct this air flow downward, a negative pressure suction force is applied to the inside of each exhaust duct. As a result, an air flow that swirls from the inside toward the outside and downward is formed inside the liquid processing chamber. This air flow flows along the inclined upper plate and is reliably sucked into the exhaust port. That is, in the liquid processing chamber, all the air containing the mist of the processing liquid is exhausted from the exhaust port. As a result, it is possible to reliably prevent the mist from adhering to the substrate.

The bottom wall of the lower cup may be horizontal or may be inclined obliquely downward as it goes deeper into the exhaust duct. The exhaust port has a width dimension that extends from the inner peripheral wall to the outer peripheral wall of the lower cup, but the opening shape may be straight in the radial direction, or may be oblique or curved. The height of the uppermost plate of the inclined upper plate does not interfere with the substrate installed on the spindle, and does not interfere with the installation or removal of the substrate from the spindle by the handling means. It is desirable to place it near the back surface.

Since the inclined upper plate is for guiding the air flow, the rotation direction of the spindle is controlled by the motor so that it is rotated only in the direction corresponding to the direction in which the inclined upper plate faces downward. It is configured to rotate in the direction. Further, in the liquid processing chamber, the upper side of the substrate needs to be in a higher pressure state than the lower side. Therefore, it is desirable to attach an intake member with a filter for taking in outside air onto the upper cup. Further, it is also possible to forcibly suck air into the liquid processing chamber. At least two exhaust ports are formed in the circumferential direction. If two locations are provided,
The inclined upper plate of each exhaust duct is formed by an annular member having an angle of about 180 °. Further, when three exhaust ports are provided, each is an annular member of approximately 120 °, and when four exhaust ports are provided, each is an annular member of approximately 90 °. In order to further ensure the air flow that descends when the substrate rotates, a plurality of support arms that extend the substrate support member radially in a direction orthogonal to the rotation axis of the spindle, and the support arms of these support arms are provided. And a connecting member that bridges between the tip portions, and at least the front side surface of each of the support arms in the rotation direction of the spindle is inclined inward.

[0014]

DESCRIPTION OF THE PREFERRED EMBODIMENTS First, FIG. 1 shows the overall configuration of a processing apparatus of the present invention. Here, in the following description, an example of the substrate to be processed is a TFT substrate that constitutes a liquid crystal panel, and a process treatment such as application of a developing solution is performed on this substrate. However, it can also be used for performing various liquid treatments such as an etching liquid, a resist stripping liquid and the like when manufacturing a substrate such as a color filter of a liquid crystal panel or a semiconductor wafer which is another substrate.

First, in FIGS. 1 to 3, 20 is a substrate, and this substrate 20 is, as is clear from FIG.
It is composed of a rectangular thin glass substrate, and, for example, a developing solution is applied to the surface thereof as a liquid treatment. 21
Is a spindle, and this spindle 21 is a rotary shaft 2
2, the rotary shaft 22 is a hollow shaft 2 that stands on a base 23.
4 is rotatably supported by a bearing 25. Rotating shaft 22
A substrate support member 26 is provided at the upper end of the. The substrate support member 26 includes a plurality of support arms 26A extending from the rotation shaft 22 in a direction orthogonal to the rotation center axis.
And a connecting plate 26B formed in an annular shape so as to connect the tip portions of the respective support arms 26A, and a plurality of support rods 27 are erected on each of the support arms 26A. The tip of the support rod 27 has a spherical shape. In addition, the connecting plate 26B (or the substrate supporting member 26
At the tip end of each of the positioning rods 2
8 are erected. The substrate 20 can be placed on the plurality of support rods 27 in a substantially point contact state to provide horizontality, and the four corners are each a positioning rod 2 having a pair.
The position is regulated by 8 so that the position does not shift during rotation.

The rotary shaft 22 extends to a position below the base 23, and a pulley 29 is connected to the end of the rotary shaft 22. A motor 30 is provided at a lower position of the base 23, a drive pulley 31 is connected to an output shaft of the motor 30, and a transmission belt 32 is provided between the drive pulley 31 and the pulley 29 of the rotary shaft 22. It is provided by winding. Therefore, when the rotation shaft 22 is rotationally driven by the motor 30, the substrate 20 placed on the substrate support member 26 rotates.

In the liquid processing of the substrate 20, a developing liquid as a processing liquid is supplied to the substrate 20 while being driven to rotate at a high speed so that the processing liquid is diffused over the entire surface along the surface of the substrate 20 by the action of centrifugal force. Will be done. Therefore, since the excess processing liquid is scattered from the edge of the substrate 20 in a substantially horizontal direction, the liquid processing of the substrate 20 is performed in a closed space. For this purpose, a spin cup 33 is provided.
The spin cup 33 includes a lower cup 34 and an upper cup 35. The upper cup 35 is fixedly held, the lower cup 34 is movable in a direction of approaching and separating from the upper cup 35, and when the lower cup 34 is joined to the upper cup 35, the inside of the spin cup 33 is substantially. The liquid treatment chamber 33A that has been blocked is formed.

The lower cup 34 includes an outer peripheral wall 34A and a bottom wall 34.
And a rotary shaft 22 of the spindle 21.
In order to pass through the inner peripheral wall 34C, the inner peripheral wall 34C is formed of an annular rising portion upward. The lower cup 34 has an open upper end, and the upper cup 35 has a bell shape and an open lower end.

Next, as a means for supplying the developing solution to the substrate 20, a swinging arm 36 which is rotatable in a horizontal direction by a predetermined angle and which is also vertically movable is provided with an injection nozzle 37. Is made of. The swing arm 36 is provided so as to be connected to the tip of the operating shaft 38. The operating shaft 38 connected to the swing arm 36 is disposed outside the spin cup 33, and the swing arm 36 is positioned outside the spin cup 33 by reciprocally rotating the operating shaft 38 by a predetermined angle. Then, inside the spin cup 33, the injection nozzle 37 is displaced so as to face the approximate rotation center position of the substrate 20 installed on the substrate support member 26. Then, in order to hold the inside of the spin cup 33 in a substantially closed state with the swing arm 36 facing the inside of the spin cup 33,
For example, a notch 39 for inserting the swing arm 36 is formed at the upper end of the lower cup 34.

In order to move the lower cup 34 up and down, a rod 40 is connected to the outer surface of the lower cup 34. The rod 40 extends downwardly through the base 23, and the rod 40 operates at its end. The plates 41 are connected. Therefore, by connecting an elevating and lowering driving means (not shown) to the operating plate 41 and operating the elevating and lowering driving means to elevate and lower the rod 40, the lower cup 34 is moved to the upper cup as shown in FIG. It is displaceable between a state of being positioned below 35 and a state of being joined to upper cup 35, as shown in FIG.

With the above structure, the swing arm 36 is first separated from the spin cup 33,
Further, by lowering the lower cup 34, the periphery of the substrate supporting member 26 is opened, and the substrate 20 is set at a predetermined position of the substrate supporting member 26 by an appropriate handling means. This is the state shown in FIG. From this state, the swing arm 36 is rotated so that the injection nozzle 37 attached to the tip of the swing arm 36 faces the rotation center position of the substrate 20. After that, the lower cup 34 is raised to the state of being joined to the upper cup 35 as shown in FIG. As a result, the liquid processing chamber 33A is formed inside the spin cup 33.

From the above, the conditions for starting the liquid processing of the substrate 20 are satisfied. Then, operate the motor 30 to
The substrate 20 is rotationally driven by driving the rotating shaft 22. When the substrate 20 starts to rotate at a predetermined speed, the processing liquid, that is, the developing liquid in this embodiment is jetted from the jet nozzle 37. The developing solution jetted from the jetting nozzle 37 is supplied to the vicinity of the center of rotation of the substrate 20, and the rotation of the substrate 20 causes the developing solution to flow toward the peripheral portion by the action of centrifugal force, so that the entire surface thereof is Spread evenly over. Then, when a predetermined amount of the developing solution is supplied to the substrate 20, the ejection of the developing solution from the ejection nozzle 37 is stopped, and then the rotation of the motor 30 is stopped. As a result, the step of applying the developing solution to the substrate 20 is completed, the substrate 20 moves to the next step, and a new substrate 20 is loaded.

By the way, the developing solution supplied to the substrate 20 is scattered by being shaken off by the edge of the substrate 20. The developer thus scattered is on the inner surface of the spin cup 33, specifically, on the outer peripheral wall 3 of the lower cup 34.
It hits 4A and flows down along the outer peripheral surface 34A. In addition, when the developer is scattered or the outer peripheral wall 3 of the lower cup 34
At the time of collision with 4A or the like, the developer is atomized to generate mist. Therefore, the bottom wall 3 of the lower cup 34
The excess developer is stored in 4B, but a means for discharging the excess developer to the outside is connected to the lower cup 34.
Further, if the mist generated in the liquid processing chamber 33A reattaches to the substrate 20, the substrate 20 is soiled and the quality is deteriorated. Therefore, in order to prevent such a situation, air containing mist is prevented. The liquid processing chamber 33
It is designed to be discharged from A.

Here, the mist is generated inside the liquid processing chamber 33A when the developing solution is supplied to the substrate 20. The substrate 20 is provided while the developing solution is being supplied.
Is spinning at high speed. Then, the liquid processing chamber 33A
An air flow is generated inside the substrate due to the rotation of the substrate 20. The direction of this air flow is a flow that swirls outward from the center of rotation of the substrate 20, and finally becomes a flow that rotates along the inner surface of the spin cup 33. Further, the inside of the liquid processing chamber 33A is vertically partitioned by the substrate 20 arranged horizontally. Therefore, normally, the substrate 20
An almost independent air flow is formed on the upper side and the lower side of the.

In consideration of the above points, the liquid processing chamber 33
A downward flow is formed throughout A. The substrate 20 faces the outer peripheral wall 34A of the lower cup 34, but there is a predetermined gap between them. Therefore, a differential pressure is generated above and below the substrate 20, so that the upper side has a high pressure and the lower side has a low pressure. Thereby, in the liquid processing chamber 33A,
Particularly from the vicinity of the position where the substrate 20 is disposed, the bottom wall 3 of the lower cup 34
A swirling flow that descends toward 4B is formed.
By sucking the air that descends while swirling at the bottom wall 34B, the air containing mist can be reliably discharged from the liquid processing chamber 33A, and there is no risk that the mist of the developer will reattach to the substrate 20. .

For this purpose, an exhaust duct 50 is provided on the bottom wall 34B of the lower cup 34. The exhaust duct 50 is
As shown in the perspective view of FIG. 4 and the development view of FIG.
Two positions are provided so that the positional relationship is 80 °. An exhaust pipe 51 is connected to the inside of these exhaust ducts 50. Further, the exhaust pipe 51 has a suction pump 52.
Is connected, and at least while rotating the substrate 20,
The suction pump 52 sucks the air in the exhaust duct 50 to the lower side. On the other hand, the intake device 53 with a filter is attached to the upper end of the upper cup 35 so that the outside air is always taken in from the upper side. Further, the intake device 53 with a filter may be provided with a forced air supply means. Since the lower cup 34 can be raised and lowered,
The exhaust pipe 51 is connected to the lower cup 34 by a movable-side pipe that can move up and down with respect to the fixed side. The exhaust pipe may be composed of a bellows pipe or the like.

As described above, the inside of the liquid processing chamber 33A has a high pressure on the upper side and a low pressure on the lower side, and a situation is created in which air is lowered as a whole. Moreover, this air flow is a flow that swirls from the upper side to the lower side, as indicated by the arrows in FIGS. 2, 4, and 5. By providing the exhaust duct 50 substantially in the extending direction of the swirling air flow, the air containing mist generated in the liquid processing chamber 33A can be smoothly and surely discharged.

That is, the exhaust duct 50 has a bottom wall 34B of the lower cup 34, an inner peripheral wall 34C and an outer peripheral wall 34A as a part of the construction, and further includes an inclined upper plate 54. The opening 50A of the exhaust duct 50 into the liquid processing chamber 33A has a width from the inner peripheral wall 34C to the outer peripheral wall 34A of the lower cup 34, and when the lower cup 34 is further joined to the upper cup 35. The height from the bottom wall 34B of the lower cup 34 to the position close to the lower portion of the substrate support member 26 (the line shown by a virtual line in FIG. 5). That is, the inclined upper plate 54 is at the highest position at the position of the opening 50A. The inclined upper plate 54 extends in the range of 180 ° in the circumferential direction from the position of the opening 50A, that is, one opening 50A to the other opening 50A.
To the position of, and becomes an inclined surface that continuously falls between them, and the end portion thereof is joined to the bottom wall 34B. Then, the exhaust pipe 51 is opened at a position in the vicinity of the end of the exhaust pipe 51 at the portion covered by the inclined upper plate 54.

By constructing the exhaust duct 50 as described above and setting the rotating direction of the spindle 21 to the falling direction of the inclined upper plate 54 in the exhaust duct 50, the swirling and descending air generated in the liquid processing chamber 33A is generated. The flow surely flows into the opening 50A of the exhaust duct 50, and is discharged by being sucked by the suction pipe 52 into the exhaust pipe 51 on which the suction force acts. Therefore, the turbulence of the air flow and the accumulation of air in the liquid processing chamber 33A are prevented. As a result, the mist of the developer generated while the substrate 20 is rotated at a high speed is immediately discharged, and clean air is always taken in from the air intake device 53 with a filter, so that the mist adheres to the substrate 20 and is soiled. There is no fear.

The excess developer is shaken off from the substrate 20, collides with the outer peripheral wall 34A of the lower cup 34, and flows down along the outer peripheral wall 34A. It will flow along the slope of the plate 54. Therefore, this excess developer is also discharged from the exhaust pipe 51 together with the air containing mist.

As described above, when the developing solution is applied to the substrate 20, it is necessary to form a descending flow of air in the liquid processing chamber 33A. To support this flow, the substrate supporting member 26 is formed. The support arm 26A can be used. That is, as shown in FIG.
The cross-sectional shape of 6A is substantially a trapezoidal shape. With the support arm 26A having such a shape, when the substrate support member 26 rotates, a downward flow is formed along the inclined surface S on the front side in the rotation direction of the support arm 26A. Therefore, it is possible to suppress the pressure drop in the rotation center portion on the back surface side of the substrate 20, and to further promote the swirling downward flow.

[0032]

Since the present invention is configured as described above, it is possible to reliably prevent air containing mist from flowing around to the substrate side while rotating the substrate at a high speed in the liquid processing chamber. .

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram of a substrate liquid processing apparatus showing an embodiment of the present invention.

FIG. 2 is a configuration diagram similar to FIG. 1, showing a state in which a lower cup is connected to an upper cup and a liquid processing chamber is formed.

FIG. 3 is a plan view of a substrate support member.

FIG. 4 is an explanatory diagram of a configuration of an exhaust duct.

FIG. 5 is a development view of an exhaust duct.

FIG. 6 is a cross-sectional view of a support arm that constitutes a substrate support member.

FIG. 7 is a schematic configuration diagram of a substrate liquid processing apparatus according to a conventional technique.

8 is a structural explanatory view of a processing liquid supply unit including an injection nozzle used in the substrate liquid processing apparatus of FIG.

[Explanation of symbols]

20 substrates 21 spindle 26 Substrate support member 26A support arm 26B connecting member 33 spin cups 33A Liquid processing chamber 34 Lower cup 34A outer peripheral wall 34B bottom wall 34C inner wall 35 upper cup 37 injection nozzle 50 exhaust duct 50A opening 51 Exhaust pipe 52 Suction pump 53 Intake device with filter 54 inclined upper plate

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Yasuaki Ishizawa             Hitachi Electronics, 3-16-3 Higashi, Shibuya-ku, Tokyo             Engineering Co., Ltd. F-term (reference) 4F042 AA02 AA07 AA10 EB05 EB08                       EB17 EB24                 5F043 CC16 EE03 EE07 EE08 EE09                       EE25 EE37                 5F046 LA07 MA10

Claims (5)

[Claims] 1. A spin cup having a lower cup and an upper cup, in which a liquid processing chamber for housing a substrate is formed, and a spin cup extending from the bottom of the lower cup into the liquid processing chamber and having a substrate at the tip. Is composed of a spindle provided with a substrate supporting member installed horizontally and a liquid jet nozzle for jetting a processing liquid, the substrate is placed on the substrate supporting member, and the liquid is fed while the spindle is rotationally driven. In a substrate liquid processing apparatus that sprays a processing liquid from a spray nozzle toward the surface of a substrate, in the liquid processing chamber, the bottom portion of the lower cup is extended from the outer peripheral wall to the inner peripheral wall through which the spindle is inserted. A plurality of exhaust ports that open in the circumferential direction are formed at positions at regular intervals in the circumferential direction, and the distance from each of these exhaust ports to the part where the next exhaust port is formed faces in the circumferential direction. And an exhaust duct having an inclined upper plate that continuously falls, and an exhaust passage that opens in each of the exhaust ducts and applies a negative pressure suction force to each of the exhaust ducts. Substrate solution processing device. 2. The substrate according to claim 1, wherein the spindle is connected to a motor that rotates only in a direction coinciding with a direction in which the inclined upper plate of the exhaust duct faces downward. Liquid processing equipment. 3. The substrate liquid processing apparatus according to claim 1, wherein an intake member with a filter for taking in outside air is attached to the upper cup. 4. The exhaust ports are formed at two positions in the circumferential direction, and the inclined upper plates of the exhaust ducts are each approximately 180.
The substrate liquid processing apparatus according to claim 1, wherein the substrate liquid processing apparatus is formed of an annular member having an angle of °. 5. The substrate supporting member includes a plurality of supporting arms radially extending in a direction orthogonal to a rotation axis of the spindle, and a connecting member bridging between tip ends of the supporting arms. 2. The substrate liquid processing apparatus according to claim 1, wherein at least a side surface of each of the support arms on the front side in the rotation direction of the spindle is inclined inward.