TW201364B - - Google Patents
Download PDFInfo
- Publication number
- TW201364B TW201364B TW081102437A TW81102437A TW201364B TW 201364 B TW201364 B TW 201364B TW 081102437 A TW081102437 A TW 081102437A TW 81102437 A TW81102437 A TW 81102437A TW 201364 B TW201364 B TW 201364B
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer
- station
- crystal
- center
- transfer
- Prior art date
Links
- 238000012546 transfer Methods 0.000 claims description 63
- 238000012545 processing Methods 0.000 claims description 57
- 239000013078 crystal Substances 0.000 claims description 52
- 239000013598 vector Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 7
- 238000009434 installation Methods 0.000 claims description 5
- 239000007787 solid Substances 0.000 claims 1
- 230000009466 transformation Effects 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 136
- 210000003128 head Anatomy 0.000 description 11
- 230000007935 neutral effect Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 240000002853 Nelumbo nucifera Species 0.000 description 2
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 2
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000002079 cooperative effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 241000270295 Serpentes Species 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000006210 lotion Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000035935 pregnancy Effects 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67796—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations with angular orientation of workpieces
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US68228591A | 1991-04-09 | 1991-04-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201364B true TW201364B (enExample) | 1993-03-01 |
Family
ID=24739028
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW081102437A TW201364B (enExample) | 1991-04-09 | 1992-03-31 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0508748A3 (enExample) |
| JP (1) | JPH05144924A (enExample) |
| KR (1) | KR920020667A (enExample) |
| TW (1) | TW201364B (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69329269T2 (de) * | 1992-11-12 | 2000-12-28 | Applied Materials, Inc. | System und Verfahren für automatische Positionierung eines Substrats in einem Prozessraum |
| US5768125A (en) * | 1995-12-08 | 1998-06-16 | Asm International N.V. | Apparatus for transferring a substantially circular article |
| US6502054B1 (en) | 1999-11-22 | 2002-12-31 | Lam Research Corporation | Method of and apparatus for dynamic alignment of substrates |
| US6629053B1 (en) | 1999-11-22 | 2003-09-30 | Lam Research Corporation | Method and apparatus for determining substrate offset using optimization techniques |
| CN115360132B (zh) * | 2022-07-22 | 2025-10-21 | 中国电子科技集团公司第十一研究所 | 一种芯片及叠层芯片的找中方法及装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4603897A (en) * | 1983-05-20 | 1986-08-05 | Poconics International, Inc. | Vacuum pickup apparatus |
| US4752898A (en) * | 1987-01-28 | 1988-06-21 | Tencor Instruments | Edge finding in wafers |
| US4819167A (en) * | 1987-04-20 | 1989-04-04 | Applied Materials, Inc. | System and method for detecting the center of an integrated circuit wafer |
| US4833790A (en) * | 1987-05-11 | 1989-05-30 | Lam Research | Method and system for locating and positioning circular workpieces |
| JPH0620097B2 (ja) * | 1987-10-20 | 1994-03-16 | 富士通株式会社 | ウエハ位置決め装置 |
-
1992
- 1992-03-31 TW TW081102437A patent/TW201364B/zh active
- 1992-04-07 KR KR1019920005746A patent/KR920020667A/ko not_active Ceased
- 1992-04-08 EP EP19920303111 patent/EP0508748A3/en not_active Withdrawn
- 1992-04-08 JP JP4115436A patent/JPH05144924A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| EP0508748A2 (en) | 1992-10-14 |
| JPH05144924A (ja) | 1993-06-11 |
| EP0508748A3 (en) | 1993-02-03 |
| KR920020667A (ko) | 1992-11-21 |
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