TW201333065A - Reactive carboxylate compound, active-energy-ray-curable resin composition utilizing the same and use of the same - Google Patents

Reactive carboxylate compound, active-energy-ray-curable resin composition utilizing the same and use of the same Download PDF

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TW201333065A
TW201333065A TW102115567A TW102115567A TW201333065A TW 201333065 A TW201333065 A TW 201333065A TW 102115567 A TW102115567 A TW 102115567A TW 102115567 A TW102115567 A TW 102115567A TW 201333065 A TW201333065 A TW 201333065A
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compound
resin composition
reactive
active energy
energy ray
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TWI468430B (en
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Kazuyoshi Yamamoto
Toru Kurihashi
Naofumi Horiguchi
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Nippon Kayaku Kk
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • C08G59/1433Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1438Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
    • C08G59/1455Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
    • C08G59/1461Unsaturated monoacids
    • C08G59/1466Acrylic or methacrylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14Polymers provided for in subclass C08G
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/182Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing using pre-adducts of epoxy compounds with curing agents
    • C08G59/186Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing using pre-adducts of epoxy compounds with curing agents with acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings

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  • General Chemical & Material Sciences (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)

Abstract

To provide a resin composition which can be cured with an active energy ray such as ultraviolet ray or the like and enables to produce a rigid film or a molding material. Disclosed is a reactive compound derived from a phenolic epoxy resin containing a specific structure in the molecule, a compound having both of at least one polymerizable ethylenically unsaturated group and at least one carboxyl group in the molecule, and a compound having both of at least one hydroxyl group and at least one carboxyl group in the molecule. Also disclosed is a curable resin composition utilizing the reactive compound. A rigid cured article can be produced from the curable resin composition. The reactive compound has a good pigment-dispersing property.

Description

反應性羧酸酯化合物、使用其之活性能量線硬化型樹脂組合物、及其用途 Reactive carboxylic acid ester compound, active energy ray-curable resin composition using the same, and use thereof

本發明係關於一種反應性環氧羧酸酯化合物(A)、以及作為其酸改質物之反應性多羧酸化合物(B),該反應性環氧羧酸酯化合物(A)係使分子中包含特定結構之酚型環氧樹脂(a),與以丙烯酸等為代表的分子中兼具一個以上之可聚合之乙烯性不飽和基及一個以上之羧基的化合物(b)、以及分子中兼具一個以上之羥基及一個以上之羧基的化合物(c)反應而獲得者。該等反應性環氧羧酸酯化合物(A)及反應性多羧酸化合物(B)具有對顏料良好之親和性,且可由包含該等之樹脂組合物獲得強韌之硬化物。 The present invention relates to a reactive epoxy carboxylate compound (A) and a reactive polycarboxylic acid compound (B) as an acid modifier thereof, which is in a molecule a phenol type epoxy resin (a) having a specific structure, and a compound (b) having one or more polymerizable ethylenically unsaturated groups and one or more carboxyl groups in a molecule typified by acrylic acid or the like, and a molecule A compound obtained by reacting a compound (c) having one or more hydroxyl groups and one or more carboxyl groups. The reactive epoxy carboxylate compound (A) and the reactive polycarboxylic acid compound (B) have a good affinity for the pigment, and a toughened cured product can be obtained from the resin composition containing the above.

為了使行動裝置小型輕質化或提昇其通訊速度,要求印刷電路板高精度、高密度化。隨之對該被覆電路自身之阻焊劑的要求亦不斷提高,較之先前之要求,要求印刷電路板進一步具備可保持耐熱性、熱穩定性且可加強基板密著性、高絕緣性、無電鍍金性的性能,謀求一種具有更強韌之硬化物性的被膜形成用材料。 In order to make the mobile device compact and lighter or to increase the communication speed, the printed circuit board is required to have high precision and high density. Accordingly, the requirements for the solder resist of the coated circuit itself are also continuously improved. Compared with the previous requirements, the printed circuit board is required to further maintain heat resistance, thermal stability, and can enhance substrate adhesion, high insulation, and electroless plating. For the performance of gold, a material for forming a film having a tougher cured property is sought.

為了應對阻焊劑之高性能化之要求,業界開發出分子中包含特定結構之環氧樹脂,且包含其等之樹脂、或其酸改質環氧羧酸酯樹脂之硬化物已眾所周知。 In order to cope with the demand for high performance of a solder resist, the industry has developed an epoxy resin containing a specific structure in a molecule, and a cured resin containing the resin or the like, or an acid-modified epoxy carboxylate resin thereof, is known.

於專利文獻1或專利文獻2中,揭示有例如以苯酚芳烷基型環氧樹脂(例如日本化藥製造之NC-3000系列、NC-2000系列等)作為基本骨架 的酸改質環氧丙烯酸酯,普遍公知其係硬化後顯示出較高之強韌性的材料。又,亦對使用其作為阻焊劑之用途展開研究。 Patent Document 1 or Patent Document 2 discloses, for example, a phenol aralkyl type epoxy resin (for example, NC-3000 series manufactured by Nippon Kasei Co., Ltd., NC-2000 series, etc.) as a basic skeleton. The acid-modified epoxy acrylate is generally known as a material which exhibits high toughness after hardening. Also, research has been conducted on the use of it as a solder resist.

於專利文獻3中,揭示有以具有多環式烴基之環氧樹脂作為基本骨架的酸改質環氧丙烯酸酯化合物及其硬化物,且記述了其於硬化後具有相對較高的強韌性。另外,對使用其之阻焊劑亦作出揭示。但是,儘管該阻焊劑具有相對較高之可靠性,但並不滿足隨著近年來傳輸設備等之電子化所要求之可滿足更高之可靠性的性能。 Patent Document 3 discloses an acid-modified epoxy acrylate compound having a polycyclic hydrocarbon group-containing epoxy resin as a basic skeleton and a cured product thereof, and has a relatively high toughness after curing. In addition, the use of the solder resist is also disclosed. However, although the solder resist has relatively high reliability, it does not satisfy the performance that can satisfy higher reliability as required by the electronicization of transmission equipment and the like in recent years.

又,作為該等環氧樹脂之酸改質環氧丙烯酸酯的用途,嘗試於其等中分散碳黑等著色顏料,而應用於在液晶顯示面板等中使用的黑色矩陣光阻。 In addition, as an application of the acid-modified epoxy acrylate of the epoxy resin, it is attempted to disperse a coloring pigment such as carbon black in the like, and to apply it to a black matrix resist used in a liquid crystal display panel or the like.

於專利文獻4、專利文獻5中,揭示有於上述以苯酚芳烷基型環氧樹脂為基本骨架之酸改質環氧丙烯酸酯中分散碳黑等著色顏料,而應用為黑色矩陣光阻中的應用例。 Patent Document 4 and Patent Document 5 disclose that a coloring pigment such as carbon black is dispersed in an acid-modified epoxy acrylate having a phenol aralkyl type epoxy resin as a basic skeleton, and is used as a black matrix photoresist. Application examples.

又,亦已知有如下之嘗試:於以具有多環式烴基之環氧樹脂為基本骨架之酸改質環氧丙烯酸酯化合物中分散碳黑等著色顏料,而應用為黑色矩陣光阻。(專利文獻6) Further, an attempt has been made to disperse a coloring pigment such as carbon black in an acid-modified epoxy acrylate compound having an epoxy resin having a polycyclic hydrocarbon group as a basic skeleton, and to apply it as a black matrix resist. (Patent Document 6)

但是,於液晶顯示面板等中使用之黑色矩陣光阻用途中,於高濃度地調配碳黑等著色顏料之情形時,由於顏料與樹脂親和而良好地分散於樹脂中,故而即便顏料高濃度存在亦顯示出良好之顯影性,可實現無顏料殘渣之顯影。於此情形時,謀求更高顏料濃度下之顯影性,即更高之顏料分散性。雖然先前之酸改質環氧丙烯酸酯類表現出相對良好之顏料分散性,但存在顏料分散液會出現假凝聚現象而導致穩定性不良的缺點。 However, in the case of a black matrix resist used in a liquid crystal display panel or the like, when a coloring pigment such as carbon black is blended at a high concentration, since the pigment is well dispersed in the resin by affinity with the resin, even if a high concentration of the pigment exists, It also shows good developability, and development of a pigment-free residue can be achieved. In this case, developability at a higher pigment concentration, that is, higher pigment dispersibility is sought. Although the prior acid-modified epoxy acrylates exhibit relatively good pigment dispersibility, there is a disadvantage that the pigment dispersion exhibits a pseudo-coagulation phenomenon resulting in poor stability.

另一方面,已知將丙烯酸及具有羥基之羧酸化合物一併與普通環氧樹脂反應而獲得之羧酸酯化合物,係酸值低、且具有優異之顯影性的材料,進而於專利文獻7中揭示有該化合物具有光阻油墨適應性。 On the other hand, a carboxylate compound obtained by reacting acrylic acid and a carboxylic acid compound having a hydroxyl group with a common epoxy resin is known, and is a material having a low acid value and excellent developability, and further Patent Document 7 It is disclosed that the compound has photoresist ink compatibility.

[專利文獻1]日本專利特開平11-140144號公報 [Patent Document 1] Japanese Patent Laid-Open No. Hei 11-140144

[專利文獻2]日本專利特開平5-194708號公報 [Patent Document 2] Japanese Patent Laid-Open No. Hei 5-194708

[專利文獻3]日本專利特開平5-214048號公報 [Patent Document 3] Japanese Patent Laid-Open No. Hei 5-214048

[專利文獻4]日本專利特開2005-55814號公報 [Patent Document 4] Japanese Patent Laid-Open Publication No. 2005-55814

[專利文獻5]日本專利特開2003-183354號公報 [Patent Document 5] Japanese Patent Laid-Open Publication No. 2003-183354

[專利文獻6]日本專利特開2004-295084號公報 [Patent Document 6] Japanese Patent Laid-Open Publication No. 2004-295084

[專利文獻7]日本專利特開平6-324490號公報 [Patent Document 7] Japanese Patent Laid-Open No. Hei 6-324490

上述使用分子中包含特定結構之環氧樹脂的硬化型樹脂組合物雖然可獲得相對強韌之硬化物,但是作為用於傳輸設備之要求極高之可靠性之用途的材料,要求其具有亦可耐受基板彎折等更強韌之硬化物性。 The above-mentioned hardened resin composition containing an epoxy resin having a specific structure in the molecule can obtain a relatively tough cured product, but it is required as a material for use in applications requiring extremely high reliability of a transmission device. Resistant to hardened physical properties such as substrate bending.

進而,於作為著色系之光阻材料之用途中,於其組合物之情形時,需要對著色顏料、尤其是碳黑等之分散性更高,且即便於高顏料濃度下亦具有良好之顯影特性的酸改質環氧丙烯酸酯。此時,需要具有相對較高之分子量、且具有適度之顯影性的材料。且需要於顏料分散液中觀察不到凝聚,顯示出長期保存穩定性的著色顏料分散樹脂組合物。 Further, in the use as a photoresist of a coloring system, in the case of a composition, it is required to have higher dispersibility to a coloring pigment, especially carbon black, and the like, and have good development even at a high pigment concentration. A characteristic acid-modified epoxy acrylate. At this time, a material having a relatively high molecular weight and having moderate developability is required. Further, it is necessary to obtain a color pigment dispersion resin composition which exhibits long-term storage stability without being observed in the pigment dispersion.

本發明者等人為了解決上述課題,發現使分子中包含特定結構之環氧樹脂,與分子中兼具一個以上之可聚合之乙烯性不飽和基及一個以上之羧基的化合物(b)、以及一分子中兼具一個以上之羥基及一個以上之羧基的化合物(c)反應而獲得的反應性環氧羧酸酯化合物,進而使該反應性環氧羧酸酯化合物與多元酸酐(d)反應而獲得的反應性多羧酸化合物具有特別優異之樹脂物性及作為其硬化物之樹脂物性。 In order to solve the above problems, the inventors of the present invention have found that an epoxy resin having a specific structure in a molecule and a compound (b) having one or more polymerizable ethylenically unsaturated groups and one or more carboxyl groups in the molecule, and a reactive epoxy carboxylate compound obtained by reacting a compound (c) having one or more hydroxyl groups and one or more carboxyl groups in one molecule, and further reacting the reactive epoxy carboxylate compound with a polybasic acid anhydride (d) The obtained reactive polycarboxylic acid compound has particularly excellent resin physical properties and resin physical properties as a cured product thereof.

進而發現該樹脂組合物具有與著色顏料特別良好之親和性,可成為即便於高顏料濃度下亦具有良好之顯影性的光阻材料。 Further, it has been found that the resin composition has particularly good affinity with the coloring pigment, and can be a photoresist material which has good developability even at a high pigment concentration.

即,本發明係關於一種反應性環氧羧酸酯化合物(A),其係使以下述通式(1)所表示之環氧樹脂(a)、一分子中兼具一個以上之可聚合之乙烯性不飽和基及一個以上之羧基的化合物(b)、以及一分子中兼具一個以上之羥基及一個以上之羧基的化合物(c)反應而獲得者: (式中,R1相互相同或不同,表示氫原子、鹵素原子或碳數為1~4之烴基;R2表示碳數7~16之2價多環式烴基或碳數為7~18之伸芳烷基;m表示1~4之整數,且n為平均值、表示1~10之正數)。 In other words, the present invention relates to a reactive epoxy carboxylate compound (A) which is an epoxy resin (a) represented by the following formula (1) and which has one or more polymerizable one molecule. A compound (b) having an ethylenically unsaturated group and one or more carboxyl groups, and a compound (c) having one or more hydroxyl groups and one or more carboxyl groups in one molecule are obtained by reacting: (wherein R 1 is the same or different from each other, and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms; and R 2 represents a divalent polycyclic hydrocarbon group having 7 to 16 carbon atoms or a carbon number of 7 to 18; Aralkyl group; m represents an integer from 1 to 4, and n is an average value, indicating a positive number from 1 to 10.

本發明進而關於一種環氧樹脂(a)為通式(2)的反應性環氧羧酸酯化合物(A): (式中,R3相互相同或不同,表示氫原子、鹵素原子或碳數為1~4之烴基;o表示1~4之整數,且p為平均值、表示1~10之正數)。 The present invention further relates to an epoxy resin (a) which is a reactive epoxy carboxylate compound (A) of the formula (2): (wherein R 3 is the same or different from each other, and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms; o represents an integer of 1 to 4, and p is an average value, and represents a positive number of 1 to 10).

本發明進而關於一種環氧樹脂(a)為通式(3)的反應性環氧羧酸酯化合物(A): (式中,R4相互相同或不同,表示氫原子、鹵素原子或碳數為1~4之烴基;q表示1~4之整數,且r為平均值、表示1~10之正數)。 The present invention further relates to an epoxy resin (a) which is a reactive epoxy carboxylate compound (A) of the formula (3): (wherein R 4 is the same or different from each other, and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms; q represents an integer of 1 to 4, and r is an average value, and represents a positive number of 1 to 10).

本發明進而關於一種環氧樹脂(a)為通式(4)的反應性環氧羧酸酯化合物(A): (式中,R5相互相同或不同,表示氫原子、鹵素原子或碳數1~4之烴基;s表示1~4之整數,且t為平均值、表示1~10之正數)。 The present invention further relates to an epoxy resin (a) which is a reactive epoxy carboxylate compound (A) of the formula (4): (wherein R 5 is the same or different from each other, and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms; s represents an integer of 1 to 4, and t is an average value, indicating a positive number of 1 to 10).

本發明進而關於一種反應性多羧酸化合物(B),其係使上述所獲得之反應性羧酸酯化合物(A)與多元酸酐(d)反應而獲得者。 The present invention further relates to a reactive polycarboxylic acid compound (B) obtained by reacting the above-obtained reactive carboxylic acid ester compound (A) with a polybasic acid anhydride (d).

本發明進而關於一種活性能量線硬化型樹脂組合物,其特徵在於含有上述反應性羧酸酯化合物(A)、及/或反應性多羧酸化合物(B)。 Further, the present invention relates to an active energy ray-curable resin composition comprising the reactive carboxylic acid ester compound (A) and/or a reactive polycarboxylic acid compound (B).

本發明進而關於一種活性能量線硬化型樹脂組合物,其含有除 (A)、(B)以外之反應性化合物(C)。 The present invention further relates to an active energy ray-curable resin composition containing The reactive compound (C) other than (A) and (B).

本發明進而關於一種活性能量線硬化型樹脂組合物,其含有著色顏料。 The present invention further relates to an active energy ray-curable resin composition containing a coloring pigment.

本發明進而關於一種活性能量線硬化型樹脂組合物,其含有光聚合起始劑。 The present invention further relates to an active energy ray-curable resin composition containing a photopolymerization initiator.

本發明進而關於上述活性能量線硬化型樹脂組合物,其係成形用材料。 Further, the present invention relates to the active energy ray-curable resin composition which is a material for molding.

本發明進而關於上述活性能量線硬化型樹脂組合物,其係被膜形成用材料。 Further, the present invention relates to the active energy ray-curable resin composition which is a material for forming a film.

本發明進而關於上述活性能量線硬化型樹脂組合物,其係光阻材料組合物。 The present invention further relates to the above active energy ray-curable resin composition, which is a photoresist material composition.

本發明進而關於一種上述活性能量線硬化型樹脂組合物之硬化物。 The present invention further relates to a cured product of the above active energy ray-curable resin composition.

本發明進而關於一種由上述活性能量線硬化型樹脂組合物外覆之物品。 The present invention further relates to an article which is covered by the above active energy ray-curable resin composition.

本發明之含有分子中具有特定結構之環氧樹脂的活性能量線硬化型樹脂組合物不僅可提供強韌之硬化物,並且即使於使溶劑乾燥後之狀態下亦具有優異之樹脂物性。由本發明之活性能量線硬化型樹脂組合物獲得之硬化物,可較好地用作要求熱及機械強韌性的被膜形成用材料。作為特佳之用途,可列舉印刷電路板用阻焊劑、多層印刷電路板用層間絕緣材料、可撓性印刷電路板用阻焊劑、電鍍阻劑、感光性光波導管等,尤其是可用於要求較高特牲的用途中。 The active energy ray-curable resin composition containing the epoxy resin having a specific structure in the molecule of the present invention not only provides a toughened cured product, but also has excellent resin physical properties even in a state where the solvent is dried. The cured product obtained from the active energy ray-curable resin composition of the present invention can be suitably used as a material for forming a film which requires heat and mechanical toughness. As a particularly preferable use, a solder resist for a printed circuit board, an interlayer insulating material for a multilayer printed circuit board, a solder resist for a flexible printed circuit board, a plating resist, a photosensitive optical waveguide, etc., can be cited, and in particular, it can be used for higher requirements. In the use of special animals.

進而,所獲得之活性能量線硬化型樹脂組合物具有與碳黑等著色顏料之高親和性,因此即便於高顏料濃度下亦可表現出良好之顏料分散性,發揮出高顯影性。且可長期維持該著色顏料分散液之顏料分散 狀態,從而可提供一種能夠確保高分散狀態保存穩定性的樹脂組合物。因此,作為特佳之用途,可適用作彩色光阻、彩色濾光片用之光阻材料,尤其是黑色矩陣材料等。 Further, since the active energy ray-curable resin composition obtained has high affinity with a coloring pigment such as carbon black, it exhibits good pigment dispersibility even at a high pigment concentration, and exhibits high developability. And can maintain the pigment dispersion of the color pigment dispersion for a long period of time The state thus provides a resin composition capable of ensuring storage stability in a highly dispersed state. Therefore, as a particularly good use, it can be suitably used as a photoresist for color resists and color filters, especially a black matrix material.

本發明之反應性環氧羧酸酯化合物(A),係為賦予反應性而使以特定結構之烴基連結苯酚環氧基而成的下述式(1)所示的特徵性骨架之酚型環氧樹脂(a),與分子中兼具一個以上之可聚合之乙烯性不飽和基及一個以上之羧基的化合物(b)、以及一分子中兼具一個以上之羥基及一個以上之羧基的化合物(c)反應而獲得。即,藉由環氧羧酸酯化而將乙烯性不飽和基及羥基同時導入至分子鏈中而發揮本發明之特徵: The reactive epoxy carboxylic acid ester compound (A) of the present invention is a phenolic type having a characteristic skeleton represented by the following formula (1) in which a phenol epoxy group is bonded to a hydrocarbon group having a specific structure by imparting reactivity. The epoxy resin (a), the compound (b) having one or more polymerizable ethylenically unsaturated groups and one or more carboxyl groups in the molecule, and one or more hydroxyl groups and one or more carboxyl groups in one molecule Compound (c) is obtained by reaction. That is, the ethylenically unsaturated group and the hydroxyl group are simultaneously introduced into the molecular chain by esterification of the epoxy carboxylic acid to exhibit the characteristics of the present invention:

於本發明中使用的以通式(1)所表示之環氧樹脂(a)之特徵在於:其係包含酚型環氧基、與R2所表示之碳數為7~16的2價多環式烴基或碳數為7~18之伸芳烷基之烴基的重複骨架的酚型環氧樹脂。 The epoxy resin (a) represented by the formula (1) used in the present invention is characterized in that it contains a phenolic epoxy group and has a carbon number of 7 to 16 represented by R 2 . A phenolic epoxy resin having a cyclic hydrocarbon group or a repeating skeleton of a hydrocarbon group having a carbon number of 7 to 18 and an aralkyl group.

上述式中,R1相互相同或不同,表示氫原子、鹵素原子或碳數為1~4之烴基。此處,所謂鹵素原子,表示氟原子、氯原子、溴原子、碘原子。另外,所謂碳數為1~4之烴基,表示甲基、乙基、乙烯基、正丙基、異丙基、丙烯基、正丁基、異丁基、第二丁基、第三丁基、丁烯基等飽和及不飽和烴基。 In the above formula, R 1 is the same or different from each other, and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms. Here, the halogen atom means a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom. Further, the hydrocarbon group having a carbon number of 1 to 4 represents a methyl group, an ethyl group, a vinyl group, a n-propyl group, an isopropyl group, a propenyl group, a n-butyl group, an isobutyl group, a second butyl group, and a t-butyl group. a saturated and unsaturated hydrocarbon group such as a butenyl group.

R2表示碳數為7~16之2價多環式烴基、或碳數為7~18之伸芳烷基。作為碳數為7~16之2價多環式烴基,可列舉:二環[2,2,1]庚二基、二環[2,2,2]辛二基、八氫並環戊二烯二基、十氫萘二基、四氫二環戊二烯二基、四氫二環己二烯二基。該等中,可較好地使用四氫二環戊二烯二基。 R 2 represents a divalent polycyclic hydrocarbon group having a carbon number of 7 to 16, or a aralkyl group having a carbon number of 7 to 18. Examples of the divalent polycyclic hydrocarbon group having a carbon number of 7 to 16 include a bicyclo[2,2,1]heptyl group, a bicyclo[2,2,2]octyl group, and an octahydrocyclopentylene group. Alkenediyl, decahydronaphthalenediyl, tetrahydrodicyclopentadienyldiyl, tetrahydrodicyclohexadienyldiyl. Among these, tetrahydrodicyclopentadienyldiyl can be preferably used.

又,作為碳數為7~18之伸芳烷基,可列舉:伸苯基雙亞甲基、伸苯基雙伸乙基、伸聯苯基雙亞甲基、伸聯苯基雙伸乙基、伸萘基雙亞甲基、蒽雙亞甲基、菲雙亞甲基、芘雙亞甲基等。該等中,可較好地使用伸苯基雙亞甲基、伸聯苯基雙亞甲基。 Further, examples of the exoaralkyl group having a carbon number of 7 to 18 include a phenylene bismethylene group, a phenylene extended methyl group, a bisphenylene methylene group, and a phenyl diphenyl group. A group, a naphthyl bismethylene group, a bis-methylene group, a phenymethylene group, a bis-methylene group, and the like. Among these, phenylene bismethylene and phenylbismethylene may be preferably used.

進而,於通式(1)中,m表示1~4之整數,表示所導入之官能基數。n為平均值,分別表示1~10之正數,較好的是1~6。於n之值小於10,較好的是小於6之情形時,環氧樹脂(a)在合適之黏度範圍內。再者,所謂n之平均值,係指平均重複數,可根據利用凝膠滲透層析儀(GPC)而得出之測定值計算出。 Further, in the formula (1), m represents an integer of 1 to 4, and represents the number of functional groups introduced. n is an average value, which represents a positive number of 1 to 10, preferably 1 to 6. When the value of n is less than 10, preferably less than 6, the epoxy resin (a) is in a suitable viscosity range. In addition, the average value of n means the average repetition number, and can be calculated based on the measured value obtained by the gel permeation chromatography (GPC).

作為於本發明中使用之環氧樹脂(a),較好的是可使用以下述通式(2)所表示之具有特徵性聯苯骨架的環氧樹脂: As the epoxy resin (a) used in the present invention, it is preferred to use an epoxy resin having a characteristic biphenyl skeleton represented by the following general formula (2):

於上述式中,R3相互相同或不同,表示氫原子、鹵素原子或碳數為1~4之烴基。所謂鹵素原子,表示氟原子、氯原子、溴原子、碘原子。 進而,o表示1~4之整數,p為平均值,分別表示1~10之正數,較好的是1~6。於p之值小於10,較好的是小於6之情形時,環氧樹脂(a)在合適之黏度範圍內。 In the above formula, R 3 is the same or different from each other, and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms. The halogen atom means a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom. Further, o represents an integer of 1 to 4, and p is an average value, and represents a positive number of 1 to 10, preferably 1 to 6. When the value of p is less than 10, preferably less than 6, the epoxy resin (a) is in a suitable viscosity range.

以通式(2)所表示之環氧樹脂(a)中,R3全部為氫原子者可廉價地獲得而較佳。通常,可自日本化藥獲得作為NC-3000系列之市售品。NC-3000系列係上述式中的R3全部為氫原子,且p為平均值,分別表示1~10之正數者。於本發明中,可於系列之等級中適當選擇合適者。 In the epoxy resin (a) represented by the formula (2), all of R 3 is a hydrogen atom, and it is preferably obtained at low cost. Usually, it is commercially available as a NC-3000 series from Nippon Kayaku. In the NC-3000 series, all of R 3 in the above formula are hydrogen atoms, and p is an average value, and each represents a positive number of 1 to 10. In the present invention, a suitable one can be appropriately selected among the grades of the series.

又,作為於本發明中使用之環氧樹脂(a),較好的是使用以通式(3)所表示之苯酚芳烷基型環氧樹脂: Further, as the epoxy resin (a) used in the present invention, it is preferred to use a phenol aralkyl type epoxy resin represented by the formula (3):

上述式中,R4相互相同或不同,表示氫原子、鹵素原子或碳數為1~4之烴基。進而,q為取代數,表示1~4之整數,且r為平均值,分別表示1~10之正數。 In the above formula, R 4 is the same or different from each other, and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms. Further, q is a substitution number and represents an integer of 1 to 4, and r is an average value, and represents a positive number of 1 to 10, respectively.

以通式(3)所表示之環氧樹脂中,較好的是R4全部為氫原子或者甲基者。以通式(3)所表示之環氧樹脂通常可自日本化藥作為NC-2000系列而獲得。NC-2000系列係上述式中之R4全部為氫原子,且r為平均值,係1~10之正數。於本發明中,可於系列之等級中適當選擇合適者。 In the epoxy resin represented by the formula (3), it is preferred that all of R 4 is a hydrogen atom or a methyl group. The epoxy resin represented by the general formula (3) can be usually obtained as a NC-2000 series from a Japanese chemical. In the NC-2000 series, all of R 4 in the above formula are hydrogen atoms, and r is an average value and is a positive number of 1 to 10. In the present invention, a suitable one can be appropriately selected among the grades of the series.

又,作為於本發明中使用之環氧樹脂(a),較好的是以通式(4)所表示之具有多環式烴基之環氧樹脂: Further, as the epoxy resin (a) used in the present invention, an epoxy resin having a polycyclic hydrocarbon group represented by the general formula (4) is preferred:

上述式中,R5相互相同或不同,表示氫原子、鹵素原子或碳數為1~4之烴基,s為取代數,表示1~4之整數,且t為平均值,表示1~10之正數。 In the above formula, R 5 is the same or different from each other, and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms, s is a substitution number, and represents an integer of 1 to 4, and t is an average value, and represents 1 to 10 A positive number.

其中,R5全部為氫原子之化合物或者全部為甲基之化合物可廉價地獲得而較佳。R5全部為氫原子,且t為平均值,表示1~10之正數的化合物可自日本化藥(股)作為XD-1000系列而獲得。於本發明中,可於系列之等級中適當選擇合適之化合物。 Among them, a compound in which all of R 5 is a hydrogen atom or a compound in which all are a methyl group can be preferably obtained at low cost. R 5 is all a hydrogen atom, and t is an average value, and a compound representing a positive number of 1 to 10 can be obtained as a XD-1000 series from Nippon Chemical Co., Ltd. In the present invention, a suitable compound can be appropriately selected from the series of grades.

於本發明中使用之一分子中兼具一個以上可聚合之乙烯性不飽和基及一個以上羧基的化合物(b),係為賦予對活性能量線之反應性而進行反應者。其等可列舉單羧酸化合物、多羧酸化合物。 In the present invention, a compound (b) having one or more polymerizable ethylenically unsaturated groups and one or more carboxyl groups in one molecule is used to cause a reaction to react with an active energy ray. These may, for example, be a monocarboxylic acid compound or a polycarboxylic acid compound.

作為一分子中含有一個羧基之單羧酸化合物,例如可列舉:(甲基)丙烯酸類或丁烯酸、α-氰基肉桂酸、肉桂酸、或者飽和或不飽和之二元酸與含有不飽和基之單縮水甘油基化合物的反應物。於上述中,作為丙烯酸類,例如可列舉:(甲基)丙烯酸、β-苯乙烯基丙烯酸、β-糠基丙烯酸、(甲基)丙烯酸二聚物、為飽和或不飽和二元酸酐與1分子中具有1個羥基之(甲基)丙烯酸酯衍生物之等莫耳反應物的半酯類、為飽和或不飽和二元酸與(甲基)丙烯酸單縮水甘油酯衍生物類之等莫耳反應物的半酯類等。 Examples of the monocarboxylic acid compound having one carboxyl group in one molecule include (meth)acrylic acid or crotonic acid, α-cyanocinnamic acid, cinnamic acid, or a saturated or unsaturated dibasic acid and a non-containing compound. A reactant of a saturated mono-glycidyl compound. In the above, examples of the acrylic acid include (meth)acrylic acid, β-styrylacrylic acid, β-mercaptoacrylic acid, (meth)acrylic acid dimer, and a saturated or unsaturated dibasic acid anhydride. a half ester of a molar reactant such as a hydroxyl group (meth) acrylate derivative in the molecule, which is a saturated or unsaturated dibasic acid and a (meth)acrylic acid monoglycidyl ester derivative. Semi-esters of the ear reactants, and the like.

進而,作為一分子中具有複數個羧基的多羧酸化合物,可列舉:為一分子中具有複數個羥基之(甲基)丙烯酸酯衍生物與二元酸酐之等 莫耳反應物的半酯類、為飽和或不飽和之二元酸與具有複數個環氧基之(甲基)丙烯酸縮水甘油酯衍生物類之等莫耳反應物的半酯類等。 Further, examples of the polycarboxylic acid compound having a plurality of carboxyl groups in one molecule include (meth)acrylate derivatives having a plurality of hydroxyl groups in one molecule, and dibasic acid anhydrides. A half ester of a molar reactant, a half ester of a saturated or unsaturated dibasic acid, and a molar reactant such as a glycidyl (meth)acrylate derivative having a plurality of epoxy groups.

就製成活性能量線硬化型樹脂組合物時之感度方面而言,該等中最好的是:(甲基)丙烯酸、(甲基)丙烯酸與ε-己內酯之反應產物、或者肉桂酸。 In terms of sensitivity in the preparation of the active energy ray-curable resin composition, the most preferable ones are: (meth)acrylic acid, a reaction product of (meth)acrylic acid and ε-caprolactone, or cinnamic acid. .

作為一分子中兼具一個以上可聚合之乙烯性不飽和基及一個以上羧基的化合物(b),較好的是化合物中不具有羥基者。 As the compound (b) having one or more polymerizable ethylenically unsaturated groups and one or more carboxyl groups in one molecule, it is preferred that the compound does not have a hydroxyl group.

於本發明中使用之一分子中兼具一個以上羥基及一個以上羧基的化合物(c),係為了於羧酸酯化合物中導入羥基而進行反應者。其等有:一分子中兼具一個羥基及一個羧基的化合物、一分子中兼具兩個以上羥基及一個羧基的化合物、一分子中兼具一個以上羥基及兩個以上羧基的化合物。 In the present invention, the compound (c) having one or more hydroxyl groups and one or more carboxyl groups in one molecule is used for the reaction in which a hydroxyl group is introduced into the carboxylate compound. These include a compound having one hydroxyl group and one carboxyl group in one molecule, a compound having two or more hydroxyl groups and one carboxyl group in one molecule, and a compound having one or more hydroxyl groups and two or more carboxyl groups in one molecule.

作為一分子中兼具一個羥基及一個羧基的化合物,例如可列舉:羥基丙酸、羥基丁酸、羥基硬脂酸等。 Examples of the compound having one hydroxyl group and one carboxyl group in one molecule include hydroxypropionic acid, hydroxybutyric acid, and hydroxystearic acid.

又,作為一分子中兼具兩個以上羥基及一個羧基的化合物,可列舉:二羥甲基乙酸、二羥甲基丙酸、二羥甲基丁酸等。 Further, examples of the compound having two or more hydroxyl groups and one carboxyl group in one molecule include dihydroxymethylacetic acid, dimethylolpropionic acid, and dimethylolbutanoic acid.

作為一分子中兼具一個以上羥基及兩個以上羧基的化合物,可列舉羥基鄰苯二甲酸等。 Examples of the compound having one or more hydroxyl groups and two or more carboxyl groups in one molecule include hydroxyphthalic acid and the like.

該等中,考慮到本發明之效果,較好的是一分子中含有兩個以上羥基者。進而,考慮到羧酸酯化反應之穩定性,較好的是一分子中含有一個羧基者。最好的是,一分子中具有兩個羥基及一個羧基者。考慮到原料之獲得,特別好的是二羥甲基丙酸及二羥甲基丁酸。 Among these, in view of the effects of the present invention, those having two or more hydroxyl groups in one molecule are preferred. Further, in view of the stability of the carboxylic acid esterification reaction, it is preferred that one molecule contains one carboxyl group. Most preferably, one molecule has two hydroxyl groups and one carboxyl group. Particularly preferred are dimethylolpropionic acid and dimethylolbutanoic acid in view of the availability of raw materials.

作為一分子中兼具一個以上羥基及一個以上羧基的化合物(c),較好的是化合物中不具有可聚合之乙烯性不飽和基者。 As the compound (c) having one or more hydroxyl groups and one or more carboxyl groups in one molecule, it is preferred that the compound does not have a polymerizable ethylenically unsaturated group.

該等中,考慮到上述環氧樹脂(a)與兩種羧酸化合物(b)及(c)之反應穩定性,較好的是(b)及(c)為單羧酸,且較好的是即便併用單羧酸與 多羧酸之情形時,單羧酸之總計莫耳量/多羧酸之總計莫耳量所表示之值亦為15以上。 In the above, in view of the reaction stability of the above epoxy resin (a) and the two carboxylic acid compounds (b) and (c), it is preferred that (b) and (c) are monocarboxylic acids, and preferably. Even if the monocarboxylic acid is used together In the case of a polycarboxylic acid, the total mole amount of the monocarboxylic acid/the total mole amount of the polycarboxylic acid is also 15 or more.

該反應中之環氧樹脂(a)與羧酸化合物(b)及(c)之羧酸總計的投入比例,應當根據用途而適宜變更。即,於將所有環氧基羧酸酯化之情形時,由於不會殘存未反應之環氧基,故而作為反應性羧酸酯化合物之保存穩定性較高。於此情形時,將僅利用由所導入之雙鍵所帶來之反應性。 The ratio of the total amount of the epoxy resin (a) to the carboxylic acid of the carboxylic acid compounds (b) and (c) in the reaction should be appropriately changed depending on the use. That is, in the case of esterifying all of the epoxy carboxylic acids, since the unreacted epoxy group does not remain, the storage stability of the reactive carboxylic acid ester compound is high. In this case, only the reactivity brought about by the introduced double bond will be utilized.

另一方面,亦可藉由減少羧酸化合物(b)及(c)之投入量而故意殘留未反應之殘存環氧基,而複合利用由所導入之不飽和鍵所帶來之反應性、以及殘存之環氧基所引起之反應,例如由光陽離子觸媒所引起之聚合反應或熱聚合反應。但是,於此情形時,於保存反應性羧酸酯化合物、以及研究製造條件時必須小心謹慎。 On the other hand, by reducing the amount of the carboxylic acid compounds (b) and (c), the unreacted remaining epoxy group is intentionally left, and the reactivity by the introduced unsaturated bond is utilized in combination. And a reaction caused by the remaining epoxy group, such as a polymerization reaction or a thermal polymerization reaction caused by a photocationic catalyst. However, in this case, care must be taken in preserving the reactive carboxylic acid ester compound and in studying the manufacturing conditions.

於製造不殘存反應性環氧基之反應性環氧羧酸酯化合物(A)之情形,較好的是相對於1當量之上述環氧樹脂(a)之環氧基,羧酸化合物(b)及(c)之總計為90~120當量%。若在該範圍內,則可於相對穩定之條件進行製造。於羧酸化合物之投入量多於此之情形時,會殘存過剩之羧酸化合物(b)而欠佳。 In the case of producing a reactive epoxy carboxylate compound (A) which does not have a reactive epoxy group, it is preferred that the carboxylic acid compound (b) is equivalent to 1 equivalent of the epoxy group of the above epoxy resin (a). The sum of (c) and (c) is 90 to 120 equivalent%. If it is within this range, it can be manufactured under relatively stable conditions. When the amount of the carboxylic acid compound to be added is more than this, the excess carboxylic acid compound (b) remains and is unsatisfactory.

又,於故意殘留環氧基之情形時,較好的是羧酸化合物(b)及(c)之總計相對於1當量之上述環氧樹脂(a)為20~90當量%。於脫離該範圍之情形時,複合硬化之效果減弱。當然,於此情形時,必須對反應中之凝膠化、羧酸酯化合物(A)之經時穩定性給予充分之關注。 Further, in the case where the epoxy group is intentionally left, it is preferred that the total of the carboxylic acid compounds (b) and (c) is 20 to 90 equivalent % based on 1 equivalent of the epoxy resin (a). When it is out of this range, the effect of the composite hardening is weakened. Of course, in this case, it is necessary to give sufficient attention to the gelation in the reaction and the stability over time of the carboxylate compound (A).

就羧基之莫耳比而言,兼具一個以上可聚合之乙烯性不飽和基及一個以上羧基的化合物(b)、與兼具一個以上羥基及一個以上羧基的化合物(c)之使用比例(b):(c)較好的是9:1~1:9之範圍,更好的是4:6~8:2之範圍。若在該範圍內,則可防止於(b)過少之情形時感度降低,且可防止於(c)過少之情形時(c)之效果減弱。 The ratio of the compound (b) having one or more polymerizable ethylenically unsaturated groups and one or more carboxyl groups to the compound (c) having one or more hydroxyl groups and one or more carboxyl groups in terms of the molar ratio of the carboxyl group ( b): (c) is preferably in the range of 9:1 to 1:9, more preferably in the range of 4:6 to 8:2. If it is within this range, it is possible to prevent the sensitivity from being lowered when (b) is too small, and it is possible to prevent the effect of (c) from being weakened when (c) is too small.

本羧酸酯化反應既可於無溶劑之條件下進行反應,或者亦可使用溶劑加以稀釋後進行反應。作為此處可使用之溶劑,若為相對於羧酸酯化反應為惰性之溶劑,則並無特別限定。 The carboxylic acid esterification reaction can be carried out in the absence of a solvent, or can be carried out by diluting with a solvent. The solvent which can be used herein is not particularly limited as long as it is a solvent inert to the carboxylic acid esterification reaction.

較佳之溶劑之使用量需根據所得之樹脂之黏度或用途而適當調整,較好的是以使固形物為90~30質量%,更好的是80~50質量%之方式使用溶劑。 The amount of the solvent to be used is preferably adjusted depending on the viscosity or use of the obtained resin, and it is preferred to use a solvent in such a manner that the solid content is 90 to 30% by mass, more preferably 80 to 50% by mass.

若具體例示可用作上述溶劑者,則可列舉例如:甲苯、二甲苯、乙基苯、四甲基苯等芳香族系烴溶劑,己烷、辛烷、癸烷等脂肪族系烴溶劑,以及作為其等之混合物的石油醚、白汽油、溶劑石油腦等。 Specific examples of the solvent that can be used as the solvent include aromatic hydrocarbon solvents such as toluene, xylene, ethylbenzene, and tetramethylbenzene, and aliphatic hydrocarbon solvents such as hexane, octane, and decane. And petroleum ether, white gasoline, solvent petroleum brain, etc. as a mixture thereof.

又,作為酯系溶劑,可列舉:乙酸乙酯、乙酸丙酯、乙酸丁酯等乙酸烷基酯類;γ-丁內酯等環狀酯類;乙二醇單甲醚乙酸酯、二乙二醇單甲醚單乙酸酯、二乙二醇單乙醚單乙酸酯、三乙二醇單乙醚單乙酸酯、二乙二醇單丁醚單乙酸酯、丙二醇單甲醚乙酸酯、丁二醇單甲醚乙酸酯等單或聚烷二醇單烷基醚單乙酸酯類;戊二酸二烷基酯、琥珀酸二烷基酯、己二酸二烷基酯等多羧酸烷基酯類等。 Further, examples of the ester solvent include alkyl acetates such as ethyl acetate, propyl acetate, and butyl acetate; cyclic esters such as γ-butyrolactone; and ethylene glycol monomethyl ether acetate; Ethylene glycol monomethyl ether monoacetate, diethylene glycol monoethyl ether monoacetate, triethylene glycol monoethyl ether monoacetate, diethylene glycol monobutyl ether monoacetate, propylene glycol monomethyl ether Mono or polyalkylene glycol monoalkyl ether monoacetate such as acid ester, butanediol monomethyl ether acetate; dialkyl glutarate, dialkyl succinate, dialkyl adipate And other polycarboxylic acid alkyl esters and the like.

又,作為醚系溶劑,可列舉:二乙醚、乙基丁醚等烷基醚類;乙二醇二甲醚、乙二醇二乙醚、二丙二醇二甲醚、二丙二醇二乙醚、三乙二醇二甲醚、三乙二醇二乙醚等二醇醚類;四氫呋喃等環狀醚類等。 Further, examples of the ether solvent include alkyl ethers such as diethyl ether and ethylbutyl ether; ethylene glycol dimethyl ether, ethylene glycol diethyl ether, dipropylene glycol dimethyl ether, dipropylene glycol diethyl ether, and triethylene glycol. a glycol ether such as glyceryl ether or triethylene glycol diethyl ether; or a cyclic ether such as tetrahydrofuran.

又,作為酮系溶劑,可列舉:丙酮、甲基乙基酮、環己酮、異佛爾酮等。 Further, examples of the ketone solvent include acetone, methyl ethyl ketone, cyclohexanone, and isophorone.

除此以外,可於後述之(A)、(B)以外之反應性化合物(C)等之單獨或混合有機溶劑中進行反應。於此情形時,於用作硬化型組合物之情形時可直接將其用作組合物而較佳。 In addition, the reaction can be carried out in a single or mixed organic solvent such as the reactive compound (C) other than (A) or (B) described later. In this case, it is preferred to use it as a composition when it is used as a hardening type composition.

於反應時,較好的是為促進反應而使用觸媒,該觸媒之使用量相對於反應物之總量,即上述環氧化合物(a)、化合物(b)、化合物(c)以及視需要添加之有溶劑等的反應物之總量為0.1~10質量%。此時之反應溫 度為60~150℃,且反應時間較好的是5~60小時。作為可使用之觸媒之具體例,例如可列舉:三乙胺、二甲基苄胺、三乙基氯化銨、苄基三甲基溴化胺、苄基三甲基碘化胺、三苯基膦、三苯基銻、甲基三苯基銻、辛酸鉻、辛酸鋯等已知的普通鹼性觸媒等。 In the reaction, it is preferred to use a catalyst for promoting the reaction, and the amount of the catalyst used is relative to the total amount of the reactants, that is, the above epoxy compound (a), compound (b), compound (c), and The total amount of the reactants to be added with a solvent or the like is 0.1 to 10% by mass. Reaction temperature at this time The degree is 60 to 150 ° C, and the reaction time is preferably 5 to 60 hours. Specific examples of the catalyst that can be used include triethylamine, dimethylbenzylamine, triethylammonium chloride, benzyltrimethylammonium bromide, benzyltrimethyliodideamine, and the like. A known general alkaline catalyst such as phenylphosphine, triphenylsulfonium, methyltriphenylphosphonium, chromium octylate or zirconium octylate.

又,作為熱聚合抑制劑,較好的是使用對苯二酚單甲醚、2-甲基對苯二酚、對苯二酚、二苯基苦味肼、二苯基胺、3,5-二-第三丁基-4-羥基甲苯等。 Further, as the thermal polymerization inhibitor, it is preferred to use hydroquinone monomethyl ether, 2-methylhydroquinone, hydroquinone, diphenyl bitter, diphenylamine, 3,5- Di-tert-butyl-4-hydroxytoluene and the like.

於本反應中,適當地進行取樣,將樣品之酸值達到5 mgKOH/g以下,較好的是達到2 mgKOH/g以下的時刻作為終點。 In the present reaction, sampling is suitably carried out, and the acid value of the sample is 5 mgKOH/g or less, preferably 2 mgKOH/g or less, as an end point.

作為以此種方式而獲得的反應性羧酸酯化合物(A)之較佳分子量範圍,GPC之聚苯乙烯換算重量平均分子量為1,000至30,000之範圍,更好的是1,500至20,000。 As a preferable molecular weight range of the reactive carboxylic acid ester compound (A) obtained in this manner, the polystyrene-equivalent weight average molecular weight of GPC is in the range of 1,000 to 30,000, more preferably 1,500 to 20,000.

於小於該分子量之情形時,無法充分發揮出硬化物之強韌性,且於大於該分子量之情形時,黏度增高而難以進行塗布等。 When the molecular weight is less than the molecular weight, the toughness of the cured product cannot be sufficiently exhibited. When the molecular weight is larger than the molecular weight, the viscosity is increased and coating or the like is difficult.

以下,就藉由酸加成步驟而獲得的本發明之反應性多羧酸化合物(B)加以說明。進行酸加成步驟之目的在於:視需要於上一步驟中所獲得之反應性羧酸酯化合物(A)中導入羧基,以獲得反應性多羧酸化合物(B)。羧基係為了以下目的而導入:例如於必須使光阻圖案化等之用途中,賦予活性能量線非照射部在鹼性水中之可溶性,且賦予對金屬、無機物等之密著性。 Hereinafter, the reactive polycarboxylic acid compound (B) of the present invention obtained by an acid addition step will be described. The acid addition step is carried out to introduce a carboxyl group into the reactive carboxylic acid ester compound (A) obtained in the previous step as necessary to obtain a reactive polycarboxylic acid compound (B). The carboxyl group is introduced for the purpose of, for example, a pattern in which a photoresist is to be patterned, and the active energy ray non-irradiated portion is rendered soluble in alkaline water, and imparts adhesion to a metal or an inorganic material.

具體而言,藉由對由環氧羧酸酯化反應所生成之羥基進行多元酸酐(d)的加成反應,而經由酯鍵導入羧基。 Specifically, a carboxyl group is introduced via an ester bond by subjecting a hydroxyl group formed by an epoxy carboxylic acid esterification reaction to an addition reaction of a polybasic acid anhydride (d).

作為多元酸酐(d)之具體例,例如若為一分子中具有酸酐結構的化合物則均可加以使用,特別好的是鹼性水溶液顯影性、耐熱性、耐水解性等優異的琥珀酸酐、鄰苯二甲酸酐、四氫鄰苯二甲酸酐、六氫鄰苯二甲酸酐、伊康酸酐、3-甲基四氫鄰苯二甲酸酐、4-甲基六氫鄰苯 二甲酸酐、偏苯三甲酸酐、或順丁烯二酸酐。 As a specific example of the polybasic acid anhydride (d), for example, a compound having an acid anhydride structure in one molecule can be used, and particularly preferred are succinic anhydrides and neighboring resins which are excellent in alkaline aqueous solution developability, heat resistance and hydrolysis resistance. Phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, itaconic anhydride, 3-methyltetrahydrophthalic anhydride, 4-methylhexahydroortylene Dicarboxylic anhydride, trimellitic anhydride, or maleic anhydride.

加成多元酸酐(d)之反應可藉由於上述羧酸酯化反應液中添加多元酸酐(d)而進行。添加量需根據用途而適當變更。 The addition of the polybasic acid anhydride (d) can be carried out by adding the polybasic acid anhydride (d) to the above carboxylic acid esterification reaction liquid. The amount of addition needs to be changed as appropriate depending on the application.

但是,於欲將本發明之多羧酸化合物(B)用作鹼顯影型之光阻之情形時,較好的是投入下述計算值之量的多元酸酐(d),即,使最終所獲得之反應性多羧酸化合物(B)之固形物酸值(依據JIS K5601-2-1:1999)為30~120 mg.KOH/g,更好的是40~105 mg.KOH/g的計算值。於此時之固形物酸值為該範圍之情形時,本發明之活性能量線硬化型樹脂組合物的鹼性水溶液顯影性表現為良好之顯影性。即,圖案化性良好且對過顯影之管理範圍亦較寬,而且亦不會殘留過剩之酸酐。 However, when the polycarboxylic acid compound (B) of the present invention is to be used as an alkali-developing type photoresist, it is preferred to introduce a polybasic acid anhydride (d) in an amount calculated as follows, i.e., to make the final The solid acid value (according to JIS K5601-2-1:1999) of the obtained reactive polycarboxylic acid compound (B) is 30 to 120 mg. KOH / g, more preferably 40 ~ 105 mg. Calculated value of KOH/g. When the acid value of the solid matter at this time is in this range, the alkaline aqueous solution developability of the active energy ray-curable resin composition of the present invention exhibits good developability. That is, the patterning property is good and the management range for overdevelopment is also wide, and no excess acid anhydride remains.

於反應時,較好的是使用觸媒以促進反應,該觸媒之使用量相對於反應物之總量,即相對於由上述環氧化合物(a)、羧酸化合物(b)及(c)所得之羧酸酯化合物(A),以及多元酸酐(d)、視需要添加有溶劑等的反應物之總量為0.1~10質量%。此時之反應溫度為60~150℃,且反應時間較好的是5~60小時。作為可使用之觸媒之具體例,例如可列舉:三乙胺、二甲基苄胺、三乙基氯化銨、苄基三甲基溴化胺、苄基三甲基碘化胺、三苯基膦、三苯基銻、甲基三苯基銻、辛酸鉻、辛酸鋯等。 In the reaction, it is preferred to use a catalyst to promote the reaction. The amount of the catalyst used is relative to the total amount of the reactants, that is, relative to the epoxy compound (a), the carboxylic acid compound (b) and (c). The total amount of the obtained carboxylate compound (A), the polybasic acid anhydride (d), and a solvent or the like to be added as needed is 0.1 to 10% by mass. The reaction temperature at this time is 60 to 150 ° C, and the reaction time is preferably 5 to 60 hours. Specific examples of the catalyst that can be used include triethylamine, dimethylbenzylamine, triethylammonium chloride, benzyltrimethylammonium bromide, benzyltrimethyliodideamine, and the like. Phenylphosphine, triphenylsulfonium, methyltriphenylphosphonium, chromium octoate, zirconium octoate, and the like.

本酸加成反應既可於無溶劑之條件下進行反應,或者亦可使用溶劑加以稀釋後進行反應。作為此處可使用之溶劑,若為相對於酸加成反應為惰性之溶劑則並無特別限定。具體而言,可使用與上一步驟之羧酸酯化反應中所例示之溶劑相同者。當於上一步驟之羧酸酯化反應中係使用溶劑進行製造時,亦可以相對於該兩反應為惰性作為條件,並不除去溶劑而將其直接提供給下一步驟即酸加成反應中。 The acid addition reaction can be carried out in the absence of a solvent, or can be carried out by diluting with a solvent. The solvent which can be used herein is not particularly limited as long as it is inert to the acid addition reaction. Specifically, the same ones as those exemplified in the carboxylic acid esterification reaction of the previous step can be used. When the carboxylic acid esterification reaction in the previous step is carried out using a solvent, it may be inert with respect to the two reactions, and the solvent may be directly removed to the next step, that is, the acid addition reaction. .

較佳之溶劑之使用量需根據所獲得之樹脂之黏度或用途而適當調整,較好的是以使固形物為90~30質量%,更好的是為80~50質量%的方式使用溶劑。 The amount of the solvent to be used is preferably adjusted depending on the viscosity or use of the obtained resin, and it is preferred to use the solvent in such a manner that the solid content is 90 to 30% by mass, and more preferably 80 to 50% by mass.

除此以外,可於下述之反應性化合物(C)等之單獨或混合有機溶劑中進行。於此情形時,於用作硬化型組合物之情形時可直接將其用作組合物而較佳。 Other than this, it can be carried out in a single or mixed organic solvent such as the following reactive compound (C). In this case, it is preferred to use it as a composition when it is used as a hardening type composition.

又,熱聚合抑制劑等較好的是使用與上述羧酸酯化反應之示例相同者。 Further, it is preferred that the thermal polymerization inhibitor or the like be the same as the above-described example of the above-mentioned carboxylic acid esterification reaction.

於本反應中,適當地進行取樣,並且將反應物之酸值到達設定之酸值±10%之範圍內之點作為終點。 In the present reaction, sampling is appropriately performed, and the point at which the acid value of the reactant reaches a range of ±10% of the set acid value is taken as an end point.

本發明之活性能量線硬化型樹脂組合物包含環氧羧酸酯化合物(A)及/或多羧酸化合物(B)。環氧羧酸酯化合物(A)及/或多羧酸化合物(B)係根據其用途而適當分開使用。例如,於阻焊劑用途中,於不顯影而利用印刷法使圖案成形之情形、或利用溶劑等沖洗除去未反應部位即所謂之溶劑顯影型之情形時,可使用環氧羧酸酯化合物(A),於利用鹼性水進行顯影之情形時,可使用多羧酸化合物(B)。通常,就為鹼性水顯影型時容易製作出微細之圖案之觀點而言,該用途中多使用多羧酸化合物(B)。當然,將環氧羧酸酯化合物(A)與多羧酸化合物(B)併用時亦不會產生任何問題。 The active energy ray-curable resin composition of the present invention contains an epoxy carboxylic acid ester compound (A) and/or a polycarboxylic acid compound (B). The epoxy carboxylic acid ester compound (A) and/or the polycarboxylic acid compound (B) are appropriately used in accordance with the use thereof. For example, in the case of a solder resist application, when a pattern is formed by a printing method without developing, or when a solvent-developing type such as a so-called solvent developing type is removed by a solvent or the like, an epoxy carboxylate compound (A) can be used. In the case of developing with alkaline water, the polycarboxylic acid compound (B) can be used. In general, a polycarboxylic acid compound (B) is often used in this application from the viewpoint of easily producing a fine pattern in an alkaline water developing type. Of course, the epoxy carboxylate compound (A) and the polycarboxylic acid compound (B) are not used in any case.

本發明之活性能量線硬化型樹脂組合物可進一步含有除環氧羧酸酯化合物(A)及多羧酸化合物(B)以外之反應性化合物(C)。 The active energy ray-curable resin composition of the present invention may further contain a reactive compound (C) other than the epoxy carboxylic acid ester compound (A) and the polycarboxylic acid compound (B).

於本發明中,作為可使用之反應性化合物(C)之具體例,可列舉:自由基反應型之丙烯酸酯類、陽離子反應型之其他環氧化合物類、感應該兩者之乙烯化合物類等所謂反應性寡聚物類。 In the present invention, specific examples of the reactive compound (C) which can be used include a radical reaction type acrylate, a cationic reaction type other epoxy compound, and an ethylene compound which induces the two. Reactive oligomers.

作為可使用之丙烯酸酯類,可列舉單官能(甲基)丙烯酸酯類、多官能(甲基)丙烯酸酯,除此以外,可列舉環氧丙烯酸酯、聚酯丙烯酸酯、丙烯酸胺基甲酸酯等。 Examples of the acrylates which can be used include monofunctional (meth)acrylates and polyfunctional (meth)acrylates, and examples thereof include epoxy acrylates, polyester acrylates, and urethane acrylates. Ester and the like.

作為單官能(甲基)丙烯酸酯類,可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸月桂酯、聚乙二醇(甲 基)丙烯酸酯、聚乙二醇(甲基)丙烯酸酯單甲醚、(甲基)丙烯酸苯基乙酯、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸四氫糠酯等。 Examples of the monofunctional (meth)acrylates include methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, lauryl (meth)acrylate, and polyethylene glycol. (A Acrylate, polyethylene glycol (meth) acrylate monomethyl ether, phenyl ethyl (meth) acrylate, isobornyl (meth) acrylate, cyclohexyl (meth) acrylate, (methyl) Benzyl acrylate, tetrahydrofurfuryl (meth) acrylate, and the like.

作為多官能(甲基)丙烯酸酯類,可列舉:丁二醇二(甲基)丙烯酸酯、己二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、壬二醇二(甲基)丙烯酸酯、乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、三(甲基)丙烯醯氧基乙基異三聚氰酸酯、聚丙二醇二(甲基)丙烯酸酯、己二酸環氧二(甲基)丙烯酸酯、雙酚氧化乙烯二(甲基)丙烯酸酯、氫化雙酚氧化乙烯(甲基)丙烯酸酯、雙酚二(甲基)丙烯酸酯、羥基特戊酸新戊二醇之ε-己內酯加成物之二(甲基)丙烯酸酯、二季戊四醇與ε-己內酯之反應物之聚(甲基)丙烯酸酯、二季戊四醇聚(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、三羥乙基丙烷三(甲基)丙烯酸酯及其氧化乙烯加成物、季戊四醇三(甲基)丙烯酸酯及其氧化乙烯加成物、季戊四醇四(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯及其氧化乙烯加成物等。 Examples of the polyfunctional (meth) acrylate include butanediol di(meth)acrylate, hexanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, and ruthenium. Alcohol di(meth)acrylate, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, tris(meth)propene Ethoxyethyl isomeric cyanurate, polypropylene glycol di(meth)acrylate, adipic acid epoxy di(meth)acrylate, bisphenol ethylene oxide di(meth)acrylate, hydrogenated bisphenol Ethylene oxide (meth) acrylate, bisphenol di(meth) acrylate, ε-caprolactone adduct of hydroxypivalic acid neopentyl glycol, di(meth) acrylate, dipentaerythritol and ε- Poly(meth)acrylate, dipentaerythritol poly(meth)acrylate, trimethylolpropane tri(meth)acrylate, trishydroxyethylpropane tri(meth)acrylate And its ethylene oxide adduct, pentaerythritol tri(meth)acrylate and its ethylene oxide adduct, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(methyl) Acrylate and ethylene oxide adducts.

作為可使用之乙烯化合物類,可列舉乙烯醚類、苯乙烯類、以及其他乙烯化合物。作為乙烯醚類,可列舉:乙基乙烯醚、丙基乙烯醚、羥基乙基乙烯醚、乙二醇二乙烯醚等。作為苯乙烯類,可列舉:苯乙烯、甲基苯乙烯、乙基苯乙烯等。作為其他乙烯化合物,可列舉:三烯丙基異三聚氰酸酯、三甲基烯丙基異三聚氰酸酯等。 Examples of the vinyl compound which can be used include vinyl ethers, styrenes, and other vinyl compounds. Examples of the vinyl ethers include ethyl vinyl ether, propyl vinyl ether, hydroxyethyl vinyl ether, and ethylene glycol divinyl ether. Examples of the styrenes include styrene, methylstyrene, and ethylstyrene. Examples of the other vinyl compound include triallyl isocyanurate and trimethylallyl isocyanurate.

進而,作為所謂之反應性寡聚物,可列舉:於同一分子內兼具可感應活性能量線之官能基與胺基甲酸酯鍵的丙烯酸胺基甲酸酯;同樣於同一分子內兼具可感應活性能量線之官能基與酯鍵的聚酯丙烯酸酯;除此以外之自環氧樹脂衍生出,且於同一分子內兼具可感應活性能量線之官能基的環氧丙烯酸酯;以及複合使用該等鍵的反應性寡聚物等。 Further, examples of the reactive oligomer include an urethane amide having a functional group capable of inducing an active energy ray and a urethane bond in the same molecule; a polyester acrylate capable of sensing a functional group and an ester bond of an active energy ray; and an epoxy acrylate derived from an epoxy resin and having a functional group capable of inducing an active energy ray in the same molecule; A reactive oligomer or the like using these bonds is used in combination.

又,作為陽離子反應型單體,通常只要為具有環氧基之化合物則並無特別限定。例如可列舉:(甲基)丙烯酸縮水甘油酯、甲基縮水甘油醚、乙基縮水甘油醚、丁基縮水甘油醚、雙酚A二縮水甘油醚、3,4-環氧環己基甲基-3,4-環氧環己基甲酸酯(聯合碳化物(Union Carbide)公司製造之「Cyracure UVR-6110」等)、3,4-環氧環己基乙基-3,4-環氧環己基甲酸酯、二氧化環己烯乙烯(聯合碳化物公司製造之「ELR-4206」等)、二氧化檸檬烯(大賽璐(Daicel)化學工業公司製造之「Celloxide 3000」等)、二氧化烯丙基環己烯、3,4-環氧-4-甲基環己基-2-氧化丙烯、2-(3,4-環氧環己基-5,5-螺-3,4-環氧)環己基-間二烷、己二酸雙(3,4-環氧環己基)酯(聯合碳化物公司製造之「Cyracure UVR-6128」等)、己二酸雙(3,4-環氧環己基甲基)酯、雙(3,4-環氧環己基)醚、雙(3,4-環氧環己基甲基)醚、雙(3,4-環氧環己基)二乙基矽氧烷等。 Further, the cationically reactive monomer is usually not particularly limited as long as it is a compound having an epoxy group. For example, glycidyl (meth)acrylate, methyl glycidyl ether, ethyl glycidyl ether, butyl glycidyl ether, bisphenol A diglycidyl ether, 3,4-epoxycyclohexylmethyl- 3,4-epoxycyclohexylformate ("Cyracure UVR-6110", manufactured by Union Carbide, etc.), 3,4-epoxycyclohexylethyl-3,4-epoxycyclohexyl Formate, cyclohexene ethylene dioxide ("ELR-4206" manufactured by Union Carbide, etc.), limonene dioxide ("Celloxide 3000" manufactured by Daicel Chemical Industry Co., Ltd., etc.), propylene oxide Cyclohexene, 3,4-epoxy-4-methylcyclohexyl-2-propene oxide, 2-(3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy) ring Hexyl-intermediate Alkane, bis(3,4-epoxycyclohexyl) adipate ("Cyracure UVR-6128" by Union Carbide, etc.), bis(3,4-epoxycyclohexylmethyl) adipate And bis(3,4-epoxycyclohexyl)ether, bis(3,4-epoxycyclohexylmethyl)ether, bis(3,4-epoxycyclohexyl)diethyloxane, and the like.

該等中,作為反應性化合物(C),最好的是自由基硬化型之丙烯酸酯類。於為陽離子型之情形時,由於羧酸與環氧基會產生反應,故而必須製成2液混合型。 Among these, as the reactive compound (C), a radical-curable acrylate is preferable. In the case of a cationic type, since a carboxylic acid reacts with an epoxy group, it is necessary to prepare a two-liquid mixing type.

藉由將本發明之羧酸酯化合物(A)及/或反應性多羧酸化合物(B)、以及視需要之除(A)、(B)以外之反應性化合物(C)混合,可獲得本發明之活性能量線硬化型樹脂組合物。此時,亦可根據用途而適當添加其他成分。 By mixing the carboxylic acid ester compound (A) of the present invention and/or the reactive polycarboxylic acid compound (B) and, if necessary, the reactive compound (C) other than (A) and (B), The active energy ray-curable resin composition of the present invention. In this case, other components may be appropriately added depending on the application.

對於本發明之活性能量線硬化型樹脂組合物,於組合物中含有97~5質量%、較好的是87~10質量%之羧酸酯化合物(A)及/或反應性多羧酸化合物(B),且含有3~95質量%、更好的是3~90質量%之(A)、(B)以外之反應性化合物(C)。亦可視需要而含有以70質量%左右為上限之其他成分。 The active energy ray-curable resin composition of the present invention contains 97 to 5% by mass, preferably 87 to 10% by mass, of the carboxylic acid ester compound (A) and/or the reactive polycarboxylic acid compound in the composition. (B), and contains 3 to 95% by mass, more preferably 3 to 90% by mass of the reactive compound (C) other than (A) and (B). Other components having an upper limit of about 70% by mass may be contained as needed.

所謂本發明中可使用之著色顏料,係指為了將本發明之活性能量線硬化型樹脂組合物製成著色材料而使用者。業者推測如下,由於本 發明中所使用之羧酸酯化合物(A)、反應性多羧酸化合物(B)之羥基之平衡在特定之範圍內,故而可發揮出特別優異之對顏料之親和性即分散性。儘管關於該機構並不明確,但是由於可良好地進行分散,結果可使顏料濃度較濃,並且於必須進行顯影之組合物中,由於分散之狀態更佳而可發揮出良好之圖案化特性,且顯影溶解部之顯影殘渣亦較少,因此較佳。 The colored pigment which can be used in the present invention means a user who has made the active energy ray-curable resin composition of the present invention into a colored material. The industry speculates as follows, due to this Since the balance of the hydroxy group of the carboxylic acid ester compound (A) and the reactive polycarboxylic acid compound (B) used in the invention is within a specific range, it is possible to exhibit particularly excellent affinity for a pigment, that is, dispersibility. Although it is not clear about the mechanism, since the dispersion can be performed well, the pigment concentration can be made rich, and in the composition which must be developed, a good patterning property can be exhibited due to a better dispersion state. Further, since the developing residue of the developing and dissolving portion is also small, it is preferable.

作為著色顏料,可列舉:酞菁系、偶氮系、喹吖啶酮系等有機顏料,碳黑等、氧化鈦等無機顏料。該等中碳黑之分散性較高而更佳。 Examples of the coloring pigment include organic pigments such as phthalocyanine, azo, and quinacridone, and inorganic pigments such as carbon black and titanium oxide. The dispersibility of these medium carbon blacks is higher and better.

為高效率且充分地進行硬化,可於本發明之活性能量線硬化型樹脂組合物中添加光聚合起始劑。作為光聚合起始劑,可列舉自由基型光聚合起始劑、陽離子系光聚合起始劑、其他聚合起始劑。 In order to efficiently and sufficiently harden, a photopolymerization initiator may be added to the active energy ray-curable resin composition of the present invention. Examples of the photopolymerization initiator include a radical photopolymerization initiator, a cationic photopolymerization initiator, and other polymerization initiators.

作為自由基型光聚合起始劑,例如可列舉:安息香、安息香甲醚、安息香乙醚、安息香丙醚、安息香異丁醚等安息香類;苯乙酮、2,2-二乙氧基-2-苯基苯乙酮、2,2-二乙氧基-2-苯基苯乙酮、1,1-二氯苯乙酮、2-羥基-2-甲基苯基-1-丙酮、二乙氧基苯乙酮、1-羥基環己基苯基酮、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基-1-丙烷等苯乙酮類;2-乙基蒽醌、2-第三丁基蒽醌、2-氯蒽醌、2-戊基蒽醌等蒽醌類;2,4-二乙基-9-氧硫、2-異丙基-9-氧硫、2-氯-9-氧硫等-9-氧硫類;苯乙酮二甲基縮酮、苄基二甲基縮酮等縮酮類;二苯甲酮、4-苯甲醯基-4'-甲基二苯基硫醚、4,4'-雙甲基胺基二苯甲酮等二苯甲酮類;2,4,6-三甲基苯甲醯基二苯基氧化膦、雙(2,4,6-三甲基苯甲醯基)苯基氧化膦等氧化膦類等公知之普通自由基型光反應起始劑。 Examples of the radical photopolymerization initiator include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, benzoin isobutyl ether, and the like; acetophenone, 2,2-diethoxy-2- Phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 1,1-dichloroacetophenone, 2-hydroxy-2-methylphenyl-1-propanone, diethyl Acetophenones such as oxyacetophenone, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinyl-1-propane; - anthracene such as ethyl hydrazine, 2-tert-butyl fluorene, 2-chloroindole, 2-pentyl hydrazine; 2,4-diethyl-9-oxygen sulphide 2-isopropyl-9-oxosulfur 2-chloro-9-oxosulfur Et--9-oxygen a ketal such as acetophenone dimethyl ketal or benzyl dimethyl ketal; benzophenone, 4-benzylidene-4'-methyldiphenyl sulfide, 4,4' - benzophenones such as bismethylaminobenzophenone; 2,4,6-trimethylbenzimidyldiphenylphosphine oxide, bis(2,4,6-trimethylbenzhydrazide) A conventional radical type photoreaction initiator such as a phosphine oxide such as phenylphosphine oxide.

又,作為陽離子系光聚合起始劑,可列舉:路易斯酸之重氮鹽、路易斯酸之錪鹽、路易斯酸之鋶鹽、路易斯酸之鏻鹽、其他鹵化物、三系起始劑、硼酸酯系起始劑、以及其他光酸產生劑等。 Further, examples of the cationic photopolymerization initiator include a diazonium salt of a Lewis acid, a phosphonium salt of a Lewis acid, a phosphonium salt of a Lewis acid, a phosphonium salt of a Lewis acid, and other halides. An initiator, a borate initiator, and other photoacid generators.

作為路易斯酸之重氮鹽,可列舉對甲氧基苯基重氮鎓氟膦酸鹽、 N,N-二乙基胺基苯基重氮鎓六氟膦酸鹽(三新化學工業公司製造之San-Aid SI-60L/SI-80L/SI-100L等)等;作為路易斯酸之錪鹽,可列舉二苯基錪六氟膦酸鹽、二苯基錪六氟銻酸鹽等;作為路易斯酸之鋶鹽,可列舉三苯基鋶六氟膦酸鹽(Union Carbide公司製造之Cyracure UVI-6990等)、三苯基鋶六氟銻酸鹽(Union Carbide公司製造之Cyracure UVI-6974等)等;作為路易斯酸之鏻鹽,可列舉三苯基鏻六氟銻酸鹽等。 Examples of the diazonium salt of the Lewis acid include p-methoxyphenyldiazonium fluorophosphonate. N,N-diethylaminophenyldiazonium hexafluorophosphonate (San-Aid SI-60L/SI-80L/SI-100L manufactured by Sanshin Chemical Industry Co., Ltd.), etc.; as a Lewis acid Examples of the salt include diphenylphosphonium hexafluorophosphonate and diphenylsulfonium hexafluoroantimonate; and examples of the phosphonium salt of the Lewis acid include triphenylsulfonium hexafluorophosphonate (Cyracure manufactured by Union Carbide Co., Ltd.). For example, UVI-6990 or the like, triphenylsulfonium hexafluoroantimonate (Cyracure UVI-6974, manufactured by Union Carbide Co., Ltd.), etc.; and a phosphonium salt of a Lewis acid include triphenylsulfonium hexafluoroantimonate.

作為其他鹵化物,可列舉:2,2,2-三氯-[1-4'-(二甲基乙基)苯基]乙酮(AKZO公司製造之Tiigonal PI等)、2,2-二氯-1-4-(苯氧基苯基)乙酮(Sandoz公司製造之Sandray 1000等)、α,α,α-三溴甲基苯基碸(製鐵化學公司製造之BMPS等)等。作為三系起始劑,可列舉:2,4,6-三(三氯甲基)-三、2,4-三氯甲基-(4'-甲氧基苯基)-6-三(Panchim公司製造之Triazine A等)、2,4-三氯甲基-(4'-甲氧基苯乙烯基)-6-三(Panchim公司製造之Triazine PMS等)、2,4-三氯甲基-(胡椒基)-6-三(Panchim公司製造之Triazine PP等)、2,4-三氯甲基-(4'-甲氧基萘基)-6-三(Panchim公司製造之Triazine B等)、2-[2'-(5"-甲基呋喃基)亞乙基]-4,6-雙(三氯甲基)-均三(三和化學公司製造等)、2-(2'-呋喃基亞乙基)-4,6-雙(三氯甲基)-均三(三和化學公司製造)等。 Examples of the other halides include 2,2,2-trichloro-[1-4'-(dimethylethyl)phenyl]ethanone (Tiigonal PI manufactured by AKZO Co., Ltd.), 2,2-two. Chloro-1-4-(phenoxyphenyl)ethanone (Sandray 1000 manufactured by Sandoz Co., Ltd.), α, α, α-tribromomethylphenyl hydrazine (BMPS manufactured by Seiko Chemical Co., Ltd., etc.), and the like. As three As an initiator, it can be exemplified by 2,4,6-tris(trichloromethyl)-three 2,4-trichloromethyl-(4'-methoxyphenyl)-6-three (Triazine A, etc. manufactured by Panchim, etc.), 2,4-trichloromethyl-(4'-methoxystyryl)-6-three (Triazine PMS manufactured by Panchim, etc.), 2,4-trichloromethyl-(piperidinyl)-6-three (Triazine PP manufactured by Panchim, etc.), 2,4-trichloromethyl-(4'-methoxynaphthyl)-6-three (Triazine B, etc. manufactured by Panchim), 2-[2'-(5"-methylfuranyl)ethylene]-4,6-bis(trichloromethyl)-all (made by Sanwa Chemical Co., etc.), 2-(2'-furylethylidene)-4,6-bis(trichloromethyl)-all three (made by Sanwa Chemical Co., Ltd.), etc.

作為硼酸酯系起始劑,可列舉日本感光色素製造之NK-3876以及NK-3881等;作為其他光酸產生劑等,可列舉:9-苯基吖啶、2,2'-雙(鄰氯苯基)-4,4',5,5'-四苯基-1,2-聯咪唑(黑金化成公司製造之聯咪唑等)、2,2-偶氮雙(2-胺基-丙烷)二鹽酸鹽(和光純藥公司製造之V50等)、2,2-偶氮雙[2-(咪唑啉-2-基)丙烷]二鹽酸鹽(和光純藥公司製造之VA044等)、[η-5-2-4-(環十五烷基)(1,2,3,4,5,6,η)-(甲基乙基)-苯]鐵(Ⅱ)六氟膦酸鹽(Ciba Geigy公司製造之Irgacure 261等)、雙(y5-環戊二烯基)雙[2,6-二氟-3-(1H-吡-1-基)苯基]鈦(Ciba Geigy公司製造之CGI-784等)等。 Examples of the boric acid ester-based initiator include NK-3876 and NK-3881 which are produced by Japanese photosensitive pigments, and examples of other photoacid generators include 9-phenylacridine and 2,2'-bis ( O-chlorophenyl)-4,4',5,5'-tetraphenyl-1,2-biimidazole (biimidazole manufactured by Heijin Chemical Co., Ltd.), 2,2-azobis(2-amino- Propane) dihydrochloride (V50, etc., manufactured by Wako Pure Chemical Industries, Ltd.), 2,2-azobis[2-(imidazolin-2-yl)propane] dihydrochloride (VA044, manufactured by Wako Pure Chemical Industries, Ltd.) ), [η-5-2-4-(cyclopentadecyl)(1,2,3,4,5,6,η)-(methylethyl)-benzene]iron(II)hexafluorophosphine Acid salt (Irgacure 261, manufactured by Ciba Geigy Co., Ltd.), bis(y5-cyclopentadienyl) bis[2,6-difluoro-3-(1H-pyrid-1-yl)phenyl]titanium (Ciba Geigy The company manufactures CGI-784, etc.).

除此以外,亦可併用偶氮雙異丁腈等偶氮系起始劑、過氧化苯甲 醯等感應熱之過氧化物系自由基型起始劑等。又,亦可併用自由基系與陽離子系兩種起始劑。起始劑可單獨使用1種,亦可將2種以上併用。 In addition, an azo initiator such as azobisisobutyronitrile or benzoyl peroxide may be used in combination. A peroxide-based radical initiator such as ruthenium. Further, a radical initiator or a cationic initiator may be used in combination. The initiator may be used singly or in combination of two or more.

除此以外,亦可為了將本發明之活性能量線硬化型樹脂組合物應用於各種用途,而於樹脂組合物中添加以70質量%為上限之其他成分。作為其他成分,可列舉:其他添加劑、顏料材料、著色材料、以及為調整黏度以賦予塗布適應性等而添加之揮發性溶劑等。以下例示可使用之其他成分。 In addition, in order to apply the active energy ray-curable resin composition of the present invention to various uses, an additional component having an upper limit of 70% by mass may be added to the resin composition. Examples of the other components include other additives, a pigment material, a coloring material, and a volatile solvent added to adjust the viscosity to impart coating suitability and the like. The other ingredients that can be used are exemplified below.

作為其他添加劑,例如可使用:三聚氰胺等熱硬化觸媒,Aerosil等觸變性賦予劑,聚矽氧系、氟系之均化劑或消泡劑,對苯二酚、對苯二酚單甲醚等聚合抑制劑,穩定劑,抗氧化劑等。 As other additives, for example, a thermosetting catalyst such as melamine, a thixotropic imparting agent such as Aerosil, a polyfluorene-based or fluorine-based leveling agent or an antifoaming agent, hydroquinone or hydroquinone monomethyl ether can be used. Such as polymerization inhibitors, stabilizers, antioxidants and the like.

又,作為其他顏料材料,例如亦可使用不以著色為目的者,即所謂填充顏料。例如可列舉:滑石、硫酸鋇、碳酸鈣、碳酸鎂、鈦酸鋇、氫氧化鋁、矽石、黏土等。 Further, as another pigment material, for example, a so-called filler pigment may be used without a purpose of coloring. For example, talc, barium sulfate, calcium carbonate, magnesium carbonate, barium titanate, aluminum hydroxide, vermiculite, clay, etc. are mentioned.

除此以外,亦可使用對活性能量線不顯示反應性之樹脂類(所謂惰性聚合物),例如其他環氧樹脂、酚樹脂、胺酯樹脂、聚酯樹脂、酮類甲醛樹脂、甲酚樹脂、二甲苯樹脂、鄰苯二甲酸二烯丙酯樹脂、苯乙烯樹脂、胍胺樹脂、天然及合成橡膠、丙烯酸系樹脂、聚烯烴樹脂、以及該等之改質物。該等樹脂較好的是在40質量%為止之範圍內使用。 In addition, resins which do not exhibit reactivity to active energy rays (so-called inert polymers), such as other epoxy resins, phenol resins, amine ester resins, polyester resins, ketone-based formaldehyde resins, cresol resins, may also be used. , xylene resin, diallyl phthalate resin, styrene resin, guanamine resin, natural and synthetic rubber, acrylic resin, polyolefin resin, and the like. These resins are preferably used in the range of 40% by mass.

尤其是於欲將反應性多羧酸化合物(B)用於阻焊劑用途之情形時,較好的是使用作為對活性能量線不顯示反應性之樹脂類而公知之普通環氧樹脂。其原因在於:於利用活性能量線進行反應、硬化後,亦會殘留有來自(B)之羧基,結果導致其硬化物之耐水性或水解性變差。因此,藉由使用環氧樹脂而使所殘留之羧基進一步羧酸酯化,從而形成更牢固之交聯結構。 In particular, when the reactive polycarboxylic acid compound (B) is to be used for a solder resist application, it is preferred to use a conventional epoxy resin which is known as a resin which does not exhibit reactivity to an active energy ray. This is because the carboxyl group derived from (B) remains after the reaction and hardening by the active energy ray, and as a result, the water resistance or the hydrolysis property of the cured product is deteriorated. Therefore, the remaining carboxyl group is further carboxylated by using an epoxy resin to form a stronger crosslinked structure.

又,亦可根據使用目的,以調整黏度為目的而於50質量%為止,更好的是35質量%為止之範圍內添加揮發性溶劑。 Further, a volatile solvent may be added to the range of 50% by mass, more preferably 35% by mass, for the purpose of adjusting the viscosity, depending on the purpose of use.

本發明係一種作為成形用材料、被膜形成用材料或光阻材料組合物之活性能量線硬化型樹脂組合物。 The present invention is an active energy ray-curable resin composition as a material for molding, a material for forming a film, or a composition for a photoresist.

於本發明中,所謂成形用材料,係指將未硬化之組合物置於模具中、或按壓模具而成形物體,然後利用活性能量線引起硬化反應而使其成形者;或者於對未硬化之組合物照射雷射等焦點光等,而引起硬化反應而使其成形之用途中使用的材料。 In the present invention, the material for molding refers to a member in which an uncured composition is placed in a mold, or a mold is pressed to form an object, and then an active energy ray is used to cause a hardening reaction to be formed; or in an unhardened combination. A material used for applications in which a material such as a laser is irradiated with a focus light such as a laser to cause a hardening reaction.

作為具體之用途,可列舉以下較佳用途:成形為平面狀之薄片、用以保護元件之密封材料、將經微細加工之「模具」壓抵至未硬化之組合物上從而進行微細成形的所謂奈米壓模材料、進而尤其是對熱方面之要求嚴格之發光二極體、光電轉換元件等之周邊密封材料等。 As a specific use, the following preferable uses are used: a sheet formed into a flat shape, a sealing material for protecting the element, and a micromolded "die" pressed against the uncured composition to perform fine molding. The nanocompression molding material, in particular, a peripheral sealing material such as a light-emitting diode or a photoelectric conversion element which is strict in terms of heat.

於本發明中,所謂被膜形成用材料,係為了被覆基材表面而利用者。作為具體用途,凹版油墨、凸版油墨、絲網油墨、套版油墨等油墨材料,硬塗層、外塗層、套印清漆、透明塗層等塗布材料,層壓用、光碟用等各種接著劑、黏著劑等接著材料,阻焊劑、蝕刻阻劑、微機械用光阻等抗蝕劑材料等與其相當。進而,將被膜形成用材料暫時塗布於剝離性基材上而膜化之後,與本來之目標基材相貼合,從而形成被膜的所謂亁膜,亦相當於被膜形成用材料。 In the present invention, the material for forming a film is used to cover the surface of the substrate. As specific applications, ink materials such as gravure ink, letterpress ink, screen ink, and plate ink, coating materials such as hard coat, overcoat, overprint varnish, and clear coat, various adhesives for lamination and optical disc, A resist material such as an adhesive, a resist material such as a solder resist, an etch resist, or a micro-mechanical photoresist is equivalent thereto. In addition, after the film formation material is temporarily applied to the release substrate, the film is bonded to the original target substrate, and the so-called ruthenium film which forms the film also corresponds to the film formation material.

由於導入反應性多羧酸化合物(B)之羧基而提高對基材之密著性,因此其等中較好的是用在用以被覆塑膠基材或金屬基材之用途中。 Since the carboxyl group of the reactive polycarboxylic acid compound (B) is introduced to improve the adhesion to the substrate, it is preferably used for coating a plastic substrate or a metal substrate.

進而,充分利用未反應之反應性多羧酸化合物(B)在鹼性水溶液中成為可溶性之特徵,用作鹼性水顯影型光阻材料組合物亦較佳。 Further, it is also preferable to use the unreacted reactive polycarboxylic acid compound (B) to be soluble in an alkaline aqueous solution, and to use it as an alkaline water developing type resist material composition.

於本發明中,所謂光阻材料組合物,係指於基材上形成該組合物之被膜層,然後局部照射紫外線等活性能量線,利用照射部與未照射部之間的物性差異而進行描繪的活性能量線感應型之組合物。具體而言,係指用於下述目的之組合物:利用某種方法,例如用溶劑等或鹼性溶液等加以溶解等而將照射部或未照射部除去,從而進行描繪。 In the present invention, the photoresist composition refers to a film layer on which a composition is formed on a substrate, and then partially irradiates an active energy ray such as an ultraviolet ray, and is characterized by a difference in physical properties between the illuminating portion and the non-irradiated portion. Active energy ray-sensitive composition. Specifically, it refers to a composition which is used for the purpose of removing the irradiated portion or the unirradiated portion by a method such as dissolution with a solvent or the like, an alkaline solution, or the like.

本發明之活性能量線硬化型樹脂組合物可藉由活性能量線而容易地硬化。此處,作為活性能量線之具體例,可列舉:紫外線、可見光、紅外線、X射線、γ射線、雷射線等電磁波,α射線、β射線、電子束等粒子射線等。若考慮本發明之較佳用途,則該等中較好的是紫外線、雷射線、可見光或電子束。 The active energy ray-curable resin composition of the present invention can be easily hardened by an active energy ray. Here, specific examples of the active energy ray include electromagnetic waves such as ultraviolet rays, visible rays, infrared rays, X-rays, gamma rays, and thunder rays, and particle beams such as α rays, β rays, and electron beams. Preferred light sources, such as ultraviolet light, lightning rays, visible light or electron beams, are preferred in view of the preferred use of the present invention.

本發明之活性能量線硬化型樹脂組合物可應用於能夠圖案化之各種材料中,例如尤其是用作阻焊劑材料、增層法用之層間絕緣材料,進而,亦可製成光波導管而用於印刷電路板、光電子基板或光基板等電氣、電子、光基材等中。 The active energy ray-curable resin composition of the present invention can be applied to various materials that can be patterned, for example, particularly used as a solder resist material, an interlayer insulating material for a build-up method, and further, can be used as an optical waveguide. In electrical, electronic, optical substrates, etc., such as printed circuit boards, optoelectronic substrates or optical substrates.

作為特別好之用途,可充分利用其可獲得強韌之硬化物之特性,而用於阻焊劑等永久光阻用途,以及充分利用其顏料分散性良好之特性,而用於印刷油墨、彩色濾光片等彩色光阻用途,特別好的是黑色矩陣用光阻之用途。 As a particularly good use, it can make full use of its properties to obtain tough and hardened materials, and it can be used for permanent photoresist applications such as solder resists, and to make full use of its pigment dispersibility characteristics for printing inks and color filters. For color resists such as light sheets, it is particularly preferable to use the photoresist for black matrices.

除此以外,亦可特別好地用於亁膜用途,該用途要求於利用活性能量線進行硬化反應之機械強度。即,由於本發明中所使用之上述環氧樹脂(a)之羥基、環氧基之平衡處於特定之範圍內,故儘管本發明之反應性羧酸酯化合物具有相對較高之分子量,亦可發揮出良好之顯影性。 In addition to this, it can also be used particularly preferably for decidual film applications which require mechanical strength for the hardening reaction using active energy ray. That is, since the balance of the hydroxyl group and the epoxy group of the above epoxy resin (a) used in the present invention is within a specific range, although the reactive carboxylate compound of the present invention has a relatively high molecular weight, Play a good developability.

對形成被膜之方法並無特別限制,可任意採用以下方式:凹版等凹版印刷方式、凸版等凸版印刷方式、絲網等孔版印刷方式、套版等平版印刷方式,輥塗、刀塗、模塗、簾塗、旋塗等各種塗布方式。 The method of forming the film is not particularly limited, and any of the following methods may be employed: a gravure printing method such as a gravure, a letterpress printing method such as a letterpress, a stencil printing method such as a screen, a lithographic printing method such as a plate, a roll coating, a knife coating, and a die coating. Various coating methods such as curtain coating and spin coating.

所謂本發明之活性能量線硬化型樹脂組合物之硬化物,係指為用於上述用途而對本發明之活性能量線硬化型樹脂組合物照射活性能量線從而使之硬化所得者。 The cured product of the active energy ray-curable resin composition of the present invention is obtained by irradiating the active energy ray-curable resin composition of the present invention with an active energy ray for use in the above-mentioned use.

所謂由本發明之活性能量線硬化型樹脂組合物外覆之物品,係指於適當之基材上形成本發明之活性能量線硬化型樹脂組合物之被膜 層,局部照射紫外線等活性能量線,從而獲得之形成有基材上之被膜硬化層者。此時,可為該樹脂組合物之硬化物於基材上均勻地形成被膜硬化層之物品,亦可為藉由光阻圖案用描繪而形成被膜硬化層之物品,並無特別限定。 The article covered by the active energy ray-curable resin composition of the present invention means that the active energy ray-curable resin composition of the present invention is formed on a suitable substrate. The layer is partially irradiated with an active energy ray such as an ultraviolet ray to obtain a hardened layer formed on the substrate. In this case, the cured product of the resin composition may be an article in which the film hardened layer is uniformly formed on the substrate, and the article may be formed by forming a film hardened layer by a resist pattern, and is not particularly limited.

[實施例] [Examples]

以下,藉由實施例來更詳細地說明本發明,但本發明並不限定於該等實施例。又,於實施例中若無特別說明,則份表示質量份。 Hereinafter, the present invention will be described in more detail by way of examples, but the invention is not limited to the examples. Further, in the examples, unless otherwise specified, the parts represent parts by mass.

以下述條件來測定軟化點、環氧當量等。 The softening point, epoxy equivalent, and the like were measured under the following conditions.

1)環氧當量:以依據JIS K 7236:2001之方法進行測定。 1) Epoxy equivalent: It was measured by the method according to JIS K 7236:2001.

2)軟化點:以依據JIS K 7234:1986之方法進行測定。 2) Softening point: Measurement was carried out in accordance with the method according to JIS K 7234:1986.

3)酸值:以依據JIS K 0070:1992之方法進行測定。 3) Acid value: It was measured in accordance with the method according to JIS K 0070:1992.

4)GPC之測定條件如下所述。 4) The measurement conditions of GPC are as follows.

設備種類:TOSOH HLC-8220GPC Equipment type: TOSOH HLC-8220GPC

管柱:TSKGEL Super HZM-N Column: TSKGEL Super HZM-N

溶離液:THF(四氫呋喃);0.35 ml每分鐘、40℃ Dissolved solution: THF (tetrahydrofuran); 0.35 ml per minute, 40 ° C

檢測器:示差折射計 Detector: differential refractometer

分子量標準:聚苯乙烯 Molecular weight standard: polystyrene

參考例1:以通式(2)所表示之環氧樹脂之羧酸酯化合物(A)之製備 Reference Example 1: Preparation of Carboxylate Compound (A) of Epoxy Resin represented by General Formula (2)

添加288 g之作為環氧樹脂(a)的NC-3000H(日本化藥製造,軟化點為70℃,環氧當量為288 g/eq,通式(2)中所示之R3全部為氫原子,p為平均值,係3)、表1中之記載量之作為分子中兼具一個以上可聚合之乙烯性不飽和基及一個以上羧基的化合物(b)的丙烯酸(簡稱AA,Mw=72)、表1中之記載量之作為分子中兼具一個以上羥基及一個以上羧基之化合物(c)的二羥甲基丙酸(簡稱DMPA,Mw=134)。以莫耳比記載各AA、DMPA相對於環氧基之投入當量比。 288 g of NC-3000H (manufactured by Nippon Kayaku Co., Ltd., softening point of 70 ° C, epoxy equivalent of 288 g/eq, and all of R 3 shown in the general formula (2) are hydrogen An atom, p is an average value, and is an acrylic acid (abbreviated as AA, Mw=) as a compound (b) having one or more polymerizable ethylenically unsaturated groups and one or more carboxyl groups in the molecule described in Table 1 72) The dimethylolpropionic acid (abbreviated as DMPA, Mw = 134) which is a compound (c) having one or more hydroxyl groups and one or more carboxyl groups in the molecule described in Table 1. The input equivalent ratio of each AA and DMPA to the epoxy group is described in terms of molar ratio.

添加3g作為觸媒之三苯基膦,並添加作為溶劑之丙二醇單甲醚單 乙酸酯以使使固形物成為80質量%,於100℃下反應24小時,獲得本發明之羧酸酯化合物(A)溶液。 Add 3 g of triphenylphosphine as a catalyst, and add propylene glycol monomethyl ether as a solvent The acetate was reacted at 100 ° C for 24 hours so that the solid content became 80% by mass to obtain a solution of the carboxylate compound (A) of the present invention.

利用固形物酸值(AV;mgKOH/g)來確定反應終點,將測定值記載於表1中。酸值測定係在反應溶液中進行測定,然後換算成固形物之酸值。 The reaction end point was determined by the solid acid value (AV; mgKOH/g), and the measured values are shown in Table 1. The acid value is measured in the reaction solution and then converted to the acid value of the solid.

參考例2:以通式(3)所表示之環氧樹脂之羧酸酯化合物(A)之製備 Reference Example 2: Preparation of Carboxylate Compound (A) of Epoxy Resin represented by General Formula (3)

添加230 g之作為環氧樹脂(a)的NC-2000(日本化藥製造,軟化點為60℃,環氧當量為230 g/eq,通式(3)中所示之R4全部為氫原子,r為平均值,係5)、表1中之記載量的作為化合物(b)之丙烯酸以及作為化合物(c)之二羥甲基丙酸。以莫耳比記載各AA、DMPA相對於環氧基之投入當量比。 230 g of NC-2000 (manufactured by Nippon Kayaku Co., Ltd., softening point of 60 ° C, epoxy equivalent of 230 g/eq, and all of R 4 shown in the general formula (3) are hydrogen. The atom and r are the average values, and the amount of the acrylic acid as the compound (b) and the dimethylolpropionic acid as the compound (c) in the amounts shown in Table 1 are shown in Table 1. The input equivalent ratio of each AA and DMPA to the epoxy group is described in terms of molar ratio.

添加3 g作為觸媒之三苯基膦,並添加作為溶劑之丙二醇單甲醚單乙酸酯以使固形物成為反應液之80質量%,於100℃下反應24小時,獲得羧酸酯化合物(A)溶液。 3 g of triphenylphosphine as a catalyst was added, and propylene glycol monomethyl ether monoacetate as a solvent was added to make the solid matter 80% by mass of the reaction liquid, and reacted at 100 ° C for 24 hours to obtain a carboxylate compound. (A) solution.

利用固形物酸值(AV;mgKOH/g)來確定反應終點,將測定值記載於表1中。酸值測定係在反應溶液中進行測定,然後換算成固形物之酸值。 The reaction end point was determined by the solid acid value (AV; mgKOH/g), and the measured values are shown in Table 1. The acid value is measured in the reaction solution and then converted to the acid value of the solid.

參考例3:以通式(4)所表示之環氧樹脂之環氧羧酸酯化合物(A)之製造 Reference Example 3: Production of epoxy carboxylic acid ester compound (A) of epoxy resin represented by general formula (4)

添加250 g之作為環氧樹脂(a)的XD-1000(日本化藥製造,軟化點為70℃,環氧當量為250 g/eq,通式(4)中所示之R5全部為氫原子,t為平均值,係3)、表1中之記載量的作為化合物(b)之丙烯酸以及作為化合物(c)之二羥甲基丙酸。以莫耳比記載各AA、DMPA相對於環氧基之投入當量比。 250 g of XD-1000 (manufactured by Nippon Chemical Co., Ltd., softening point of 70 ° C, epoxy equivalent of 250 g/eq, and all of R 5 shown in the general formula (4) are hydrogen. The atom, t is an average value, is 3), the acrylic acid as the compound (b) and the dimethylolpropionic acid as the compound (c) described in Table 1. The input equivalent ratio of each AA and DMPA to the epoxy group is described in terms of molar ratio.

使用3 g作為觸媒之三苯基膦,並添加作為溶劑之丙二醇單甲醚單乙酸酯以使固形物成為80質量%,於100℃下反應24小時,獲得環氧羧酸酯化合物(A)溶液。 Using 3 g of triphenylphosphine as a catalyst, and adding propylene glycol monomethyl ether monoacetate as a solvent to have a solid content of 80% by mass, and reacting at 100 ° C for 24 hours to obtain an epoxy carboxylate compound ( A) Solution.

利用固形物酸值(AV;mgKOH/g)來確定反應終點,將測定值記載於表1中。酸值測定係在反應溶液中進行測定,然後換算成固形物之酸值。 The reaction end point was determined by the solid acid value (AV; mgKOH/g), and the measured values are shown in Table 1. The acid value is measured in the reaction solution and then converted to the acid value of the solid.

實施例1:比較用羧酸酯化合物之製備 Example 1: Preparation of Comparative Carboxylate Compound

添加NC-3000H 288 g、作為化合物(b)之丙烯酸72 g(莫耳比:1.0)、作為觸媒之三苯基膦3 g,並添加作為溶劑之丙二醇單甲醚單乙酸酯以使固形物成為80質量%,於100℃下反應24小時,獲得羧酸酯化合物溶液。 Add NC-3000H 288 g, 72 g (mole ratio: 1.0) of acrylic acid as the compound (b), 3 g of triphenylphosphine as a catalyst, and add propylene glycol monomethyl ether monoacetate as a solvent to make The solid content was 80% by mass, and the reaction was carried out at 100 ° C for 24 hours to obtain a carboxylate compound solution.

利用固形物酸值(AV;mgKOH/g)來確定反應終點,將測定值記載於表1中。酸值測定係在反應溶液中進行測定,然後換算成固形物之酸值。 The reaction end point was determined by the solid acid value (AV; mgKOH/g), and the measured values are shown in Table 1. The acid value is measured in the reaction solution and then converted to the acid value of the solid.

實施例2:比較用羧酸酯化合物之製備 Example 2: Preparation of comparative carboxylic acid ester compound

添加NC-2000 230 g、作為化合物(b)之丙烯酸72 g(莫耳比:1.0)、作為觸媒之三苯基膦3 g,並添加作為溶劑之丙二醇單甲醚單乙酸酯以使固形物成為反應液之80質量%,於100℃下反應24小時,獲得羧酸酯化合物溶液。 230 g of NC-2000, 72 g of acrylic acid (mole ratio: 1.0) as the compound (b), 3 g of triphenylphosphine as a catalyst, and propylene glycol monomethyl ether monoacetate as a solvent were added thereto. The solid matter was 80% by mass of the reaction liquid, and reacted at 100 ° C for 24 hours to obtain a carboxylate compound solution.

利用固形物酸值(AV;mgKOH/g)來確定反應終點,將測定值記載於表1中。酸值測定係在反應溶液中進行測定,然後換算成固形物之酸值。 The reaction end point was determined by the solid acid value (AV; mgKOH/g), and the measured values are shown in Table 1. The acid value is measured in the reaction solution and then converted to the acid value of the solid.

實施例3:比較用環氧羧酸酯化合物之製備 Example 3: Preparation of comparative epoxy carboxylate compound

於XD-1000 250 g、作為化合物(b)之丙烯酸72 g(莫耳比:1.0)、作為觸媒之三苯基膦3 g中,添加作為溶劑之丙二醇單甲醚單乙酸酯以使固形物成為80質量%,於100℃下反應24小時,獲得環氧羧酸酯化合物溶液。 Addition of propylene glycol monomethyl ether monoacetate as a solvent to XD-1000 250 g, 72 g of acrylic acid as compound (b) (mole ratio: 1.0), and 3 g of triphenylphosphine as a catalyst The solid content was 80% by mass, and the reaction was carried out at 100 ° C for 24 hours to obtain a solution of an epoxy carboxylate compound.

利用固形物酸值(AV;mgKOH/g)來確定反應終點,將測定值記載於表1中。酸值測定係在反應溶液中進行測定,然後換算成固形物之酸 值。 The reaction end point was determined by the solid acid value (AV; mgKOH/g), and the measured values are shown in Table 1. The acid value is determined in the reaction solution and then converted into the acid of the solid. value.

比較例4-1:比較用羧酸酯化合物之製備 Comparative Example 4-1: Preparation of comparative carboxylic acid ester compound

添加甲酚酚醛清漆型環氧樹脂EOCN-103S(日本化藥製造,軟化點為80℃,環氧當量為200 g/eq)200 g、作為分子中兼具一個以上可聚合之乙烯性不飽和基及一個以上羧基之化合物(b)的丙烯酸36 g(莫耳比:0.5)、作為分子中兼具一個以上羥基及一個以上羧基之化合物(c)的二羥甲基丙酸67 g(莫耳比:0.5)。 Adding cresol novolac type epoxy resin EOCN-103S (manufactured by Nippon Kayaku Co., Ltd., softening point: 80 ° C, epoxy equivalent: 200 g / eq) 200 g, as one or more polymerizable ethylenic unsaturation in the molecule 36 g (molar ratio: 0.5) of acrylic acid having one or more carboxyl groups and (b), dimethylolpropionic acid (67 g) as a compound (c) having one or more hydroxyl groups and one or more carboxyl groups in the molecule Ear ratio: 0.5).

添加作為觸媒之三苯基膦3 g,並添加作為溶劑之丙二醇單甲醚單乙酸酯以使固形物成為80質量%,於100℃下反應24小時,獲得比較用羧酸酯化合物溶液。 3 g of triphenylphosphine as a catalyst was added, and propylene glycol monomethyl ether monoacetate as a solvent was added to make the solid content 80% by mass, and reacted at 100 ° C for 24 hours to obtain a comparative carboxylic acid ester compound solution. .

利用固形物酸值(AV;mgKOH/g)來確定反應終點,將測定值記載於表1中。酸值測定係在反應溶液中進行測定,然後換算成固形物之酸值。 The reaction end point was determined by the solid acid value (AV; mgKOH/g), and the measured values are shown in Table 1. The acid value is measured in the reaction solution and then converted to the acid value of the solid.

比較例4-2:比較用羧酸酯化合物之製備 Comparative Example 4-2: Preparation of comparative carboxylic acid ester compound

添加甲酚酚醛清漆型環氧樹脂jER-1002(日本環氧樹脂公司製造,環氧當量為400 g/eq)200 g、作為(b)之丙烯酸18 g(莫耳比:0.5)、作為化合物(c)之二羥甲基丙酸34 g(莫耳比:0.5)。 Adding cresol novolac type epoxy resin jER-1002 (manufactured by Nippon Epoxy Co., Ltd., epoxy equivalent: 400 g/eq) 200 g, as (b) acrylic acid 18 g (mole ratio: 0.5), as a compound (c) dimethylolpropionic acid 34 g (mole ratio: 0.5).

添加作為觸媒之三苯基膦3 g,並添加作為溶劑之丙二醇單甲醚單乙酸酯以使固形物成為反應液之80質量%,於100℃下反應24小時,獲得比較用羧酸酯化合物溶液。 3 g of triphenylphosphine as a catalyst was added, and propylene glycol monomethyl ether monoacetate as a solvent was added to make the solid matter 80% by mass of the reaction liquid, and reacted at 100 ° C for 24 hours to obtain a comparative carboxylic acid. Ester compound solution.

利用固形物酸值(AV;mgKOH/g)來確定反應終點,將測定值記載於表1中。酸值測定係在反應溶液中進行測定,然後換算成固形物之酸值。 The reaction end point was determined by the solid acid value (AV; mgKOH/g), and the measured values are shown in Table 1. The acid value is measured in the reaction solution and then converted to the acid value of the solid.

[表1]參考例1、2、3、實施例1、2、3及比較例4:環氧羧酸酯化合物(A)之製備 [Table 1] Reference Examples 1, 2, 3, Examples 1, 2, 3 and Comparative Example 4: Preparation of epoxy carboxylate compound (A)

試驗例1:環氧羧酸酯化合物(A)之保存穩定性 Test Example 1: Preservation stability of epoxy carboxylate compound (A)

於零下5℃之冷凍室中保管參考例1及實施例1中所得之環氧羧酸酯化合物溶液,比較產生晶體為止之時間並示於表2中。 The epoxy carboxylate compound solutions obtained in Reference Example 1 and Example 1 were stored in a freezer compartment at minus 5 ° C, and the time until crystals were produced was compared and shown in Table 2.

根據以上之結果可明確,隨著分子中兼具一個以上羥基及一個以上羧基的化合物(c)之導入,樹脂溶液之保存穩定性提昇。 From the above results, it is clear that the storage stability of the resin solution is improved as the compound (c) having one or more hydroxyl groups and one or more carboxyl groups in the molecule is introduced.

參考例4:以通式(2)所表示之環氧樹脂之反應性多羧酸化合物(B)之 製備 Reference Example 4: Reactive Polycarboxylic Compound (B) of Epoxy Resin represented by General Formula (2) preparation

於作為參考例1-1、1-2、1-3而分別獲得之羧酸酯化合物(A)溶液299 g中,添加表3中之記載量之作為多元酸酐(d)之四氫鄰苯二甲酸酐(簡稱THPA),並且添加作為溶劑之丙二醇單甲醚單乙酸酯以使固形物成為65質量%,加熱至100℃進行酸加成反應,獲得本發明之反應性多羧酸化合物(B)溶液(參考例4-1、4-2、4-3、4-4)。將固形物酸值(mgKOH/g)示於表3中。 To 299 g of the carboxylic acid ester compound (A) solution obtained as Reference Examples 1-1, 1-2, and 1-3, respectively, the tetrahydro-o-benzene as the polybasic acid anhydride (d) was added in the amount shown in Table 3. Diacetic anhydride (abbreviated as THPA), and propylene glycol monomethyl ether monoacetate as a solvent is added to make the solid matter 65% by mass, and heated to 100 ° C to carry out an acid addition reaction to obtain a reactive polycarboxylic acid compound of the present invention. (B) Solution (Reference Examples 4-1, 4-2, 4-3, 4-4). The solid acid value (mgKOH/g) is shown in Table 3.

參考例5:以通式(3)所表示之環氧樹脂之反應性多羧酸化合物(B)之製備 Reference Example 5: Preparation of Reactive Polycarboxylic Compound (B) of Epoxy Resin represented by General Formula (3)

於作為參考例2-1、2-2、2-3、2-4而分別獲得之羧酸酯化合物(A)溶液299 g中,添加表3中記載之量之作為多元酸酐(d)之四氫鄰苯二甲酸酐,並且添加作為溶劑之丙二醇單甲醚單乙酸酯以使固形物成為反應液之65質量%,加熱至100℃,進行3小時酸加成反應,獲得本發明之反應性多羧酸化合物(B)溶液(參考例5-1、5-2、5-3、5-4、5-5)。將固形物酸值(mgKOH/g)示於表3中。 In the 299 g of the carboxylate compound (A) solution obtained as Reference Examples 2-1, 2-2, 2-3, and 2-4, the amount described in Table 3 was added as the polybasic acid anhydride (d). Tetrahydrophthalic anhydride, and adding propylene glycol monomethyl ether monoacetate as a solvent to make the solid matter 65% by mass of the reaction liquid, heating to 100 ° C, and performing an acid addition reaction for 3 hours to obtain the present invention A reactive polycarboxylic acid compound (B) solution (Reference Examples 5-1, 5-2, 5-3, 5-4, 5-5). The solid acid value (mgKOH/g) is shown in Table 3.

參考例6:以通式(4)所表示之環氧樹脂之多羧酸化合物(B)之製造 Reference Example 6: Production of Polycarboxylic Acid Compound (B) of Epoxy Resin represented by General Formula (4)

於作為參考例3-1、3-2、3-3而分別獲得之環氧羧酸酯化合物(A)溶液299 g中,添加表3中之記載量的作為多元酸酐(d)之四氫鄰苯二甲酸酐,並且添加作為溶劑之丙二醇單甲醚單乙酸酯以使固形物成為65質量%,加熱至100℃進行酸加成反應,獲得多羧酸化合物(B)溶液(參考例6-1、6-2、6-3、6-4)。將固形物酸值(mgKOH/g)示於表3中。 In 299 g of the epoxy carboxylic acid ester compound (A) solution obtained as Reference Examples 3-1, 3-2, and 3-3, the amount of tetrahydrogen as the polybasic acid anhydride (d) described in Table 3 was added. Phthalic anhydride, and propylene glycol monomethyl ether monoacetate as a solvent is added to make the solid content 65% by mass, and the acid addition reaction is carried out by heating to 100 ° C to obtain a polycarboxylic acid compound (B) solution (Reference example) 6-1, 6-2, 6-3, 6-4). The solid acid value (mgKOH/g) is shown in Table 3.

實施例5:比較用反應性多羧酸化合物之製備 Example 5: Preparation of comparative reactive polycarboxylic acid compound

於實施例1中所獲得之羧酸酯化合物溶液299 g中,添加表3中之記載量的作為多元酸酐(d)之四氫鄰苯二甲酸酐,並且添加作為溶劑之丙二醇單甲醚單乙酸酯以使固形物成為65質量%,加熱至100℃進行酸加成反應,獲得反應性多羧酸化合物溶液(實施例5-1、5-2)。將固形物酸 值(mgKOH/g)示於表3中。 To 299 g of the carboxylic acid ester compound solution obtained in Example 1, tetrahydrophthalic anhydride as a polybasic acid anhydride (d) was added in the amount described in Table 3, and propylene glycol monomethyl ether as a solvent was added. The acetate was subjected to an acid addition reaction by heating the solid content to 65% by mass to obtain a reactive polycarboxylic acid compound solution (Examples 5-1 and 5-2). Solid acid The value (mgKOH/g) is shown in Table 3.

實施例6:比較用反應性多羧酸化合物之製備 Example 6: Preparation of a comparative polycarboxylic acid compound for comparison

於實施例2中所獲得之羧酸酯化合物溶液299 g中,添加表3中記載之量的作為多元酸酐(d)之四氫鄰苯二甲酸酐,並且添加作為溶劑之丙二醇單甲醚單乙酸酯以使固形物成為反應液之65質量%,加熱至100℃,進行3小時酸加成反應,獲得反應性多羧酸化合物溶液(實施例6-1、6-2)。將固形物酸價(mgKOH/g)示於表3中。 To 299 g of the carboxylate compound solution obtained in Example 2, tetrahydrophthalic anhydride as a polybasic acid anhydride (d) was added in an amount described in Table 3, and propylene glycol monomethyl ether as a solvent was added. The acetate was heated to 100 ° C in a solid content of 65% by mass of the reaction liquid, and an acid addition reaction was carried out for 3 hours to obtain a reactive polycarboxylic acid compound solution (Examples 6-1 and 6-2). The solid acid value (mgKOH/g) is shown in Table 3.

實施例7:比較用反應性多羧酸化合物之製備 Example 7: Preparation of a comparative reactive polycarboxylic acid compound

於實施例3中所獲得之環氧羧酸酯化合物溶液299 g中,添加表3中之記載量的作為多元酸酐(d)之四氫鄰苯二甲酸酐,並添加作為溶劑之丙二醇單甲醚單乙酸酯以使固形物成為65質量%,加熱至100℃進行酸加成反應,獲得多羧酸化合物溶液(實施例7-1、7-2)。將固形物酸值(mgKOH/g)示於表3中。 To 299 g of the epoxy carboxylate compound solution obtained in Example 3, tetrahydrophthalic anhydride as a polybasic acid anhydride (d) was added in the amount shown in Table 3, and propylene glycol monomethyl as a solvent was added. The ether monoacetate was subjected to an acid addition reaction by heating the solid content to 65% by mass to obtain a polycarboxylic acid compound solution (Examples 7-1 and 7-2). The solid acid value (mgKOH/g) is shown in Table 3.

比較例8:比較用反應性多羧酸化合物之製備 Comparative Example 8: Preparation of comparative reactive polycarboxylic acid compound

於比較例4-1、4-2中所獲得之環氧羧酸酯化合物溶液299 g中,添加表3中之記載量的作為多元酸酐(d)之四氫鄰苯二甲酸酐,並且添加作為溶劑之丙二醇單甲醚單乙酸酯以使固形物成為65質量%,加熱至100℃進行酸加成反應,獲得多羧酸化合物溶液(比較例8-1、8-2、8-3)。將固形物酸值(mgKOH/g)示於表3中。 To 299 g of the epoxy carboxylic acid ester compound solution obtained in Comparative Examples 4-1 and 4-2, tetrahydrophthalic anhydride as a polybasic acid anhydride (d) described in Table 3 was added and added. The propylene glycol monomethyl ether monoacetate as a solvent was subjected to an acid addition reaction by heating to 100 ° C to obtain a polycarboxylic acid compound solution (Comparative Examples 8-1, 8-2, 8-3). ). The solid acid value (mgKOH/g) is shown in Table 3.

參考例7、8、9、實施例9、10、11及比較例12:硬塗用組合物及其硬化物之製備,以及其等之硬度評價試驗、衝擊性評價試驗 Reference Examples 7, 8, 9, Examples 9, 10, and 11 and Comparative Example 12: Preparation of a hard coating composition and a cured product thereof, and hardness evaluation test and impact evaluation test thereof

將參考例1、2、3以、實施例1、2、3及比較例4中所製備之反應性羧酸酯化合物(A)20 g、作為自由基硬化型之單體(C)之二季戊四醇六丙烯酸酯4 g、作為紫外線反應型起始劑之Irgacure 184 1.5 g加熱溶解。(於參考例7-4、8-4、9-4中,追加添加UVI-6990 1.0 g作為陽離子系起始劑。) 20 g of the reactive carboxylate compound (A) prepared in Reference Examples 1, 2, and 3, and Examples 1, 2, and 3 and Comparative Example 4, as the monomer of the radical hardening type (C) 4 g of pentaerythritol hexaacrylate and Irgacure 184 1.5 g as an ultraviolet reactive type initiator were dissolved by heating. (In Reference Examples 7-4, 8-4, and 9-4, UVI-6990 1.0 g was additionally added as a cationic initiator.)

進而,以乾燥時之膜厚為20微米之方式,用手動敷料器塗布於聚碳酸酯板上,於電烘箱中、80℃下實施30分鐘溶劑乾燥。乾燥後,使用具備高壓水銀燈之紫外線垂直曝光裝置(ORC製作所製造),進行照射線量為1000 mJ之紫外線照射,使之硬化而獲得多層材料。 Further, the film was applied to a polycarbonate plate by a manual applicator so as to have a film thickness of 20 μm at the time of drying, and dried in an electric oven at 80 ° C for 30 minutes. After drying, an ultraviolet ray vertical exposure apparatus (manufactured by ORC Manufacturing Co., Ltd.) equipped with a high-pressure mercury lamp was used, and ultraviolet rays having an irradiation line amount of 1000 mJ were irradiated and hardened to obtain a multilayer material.

根據JIS K 5600-5-4:1999來測定該多層材料之塗膜之硬度(試驗例2),進而根據ISO6272-1:2002來實施衝擊性試驗(試驗例3),且根據 JIS K 5600-7-4:1999來實施冷熱衝擊性試驗(試驗例4)。將所製備之各試驗樣品(參考例7~9、實施例9~11及比較例12)以及各評價試驗結果(試驗例2~4)示於表4中。 The hardness of the coating film of the multilayer material was measured in accordance with JIS K 5600-5-4:1999 (Test Example 2), and the impact test (Test Example 3) was carried out in accordance with ISO 6272-1:2002, and The thermal shock test (Test Example 4) was carried out in JIS K 5600-7-4:1999. Each of the prepared test samples (Reference Examples 7 to 9, Examples 9 to 11 and Comparative Example 12) and each evaluation test result (Test Examples 2 to 4) are shown in Table 4.

根據以上之結果可明確,與不使用一分子中兼具羥基及羧基之化合物(c),環氧基全部丙烯酸酯化之實施例9、10、11相比,參考例7、8、9中所製備之硬塗用材料的耐衝擊性提昇。業者認為該耐衝擊性提昇之理由在於:隨著化合物(c)之導入,雙鍵之密度適度降低,且隨著 羥基之導入,由氫鍵所形成的疏鬆之交聯結構帶來有利影響。 From the above results, it is clear that the reference examples 7, 8, and 9 are compared with the examples 9, 10, and 11 in which all of the epoxy groups are acrylated without using a compound (c) having both a hydroxyl group and a carboxyl group in one molecule. The prepared hard coating material has improved impact resistance. The reason that the impact resistance is improved is that the density of the double bond is moderately decreased with the introduction of the compound (c), and The introduction of a hydroxyl group brings about a favorable influence by the loose crosslinked structure formed by hydrogen bonding.

又,於由普通雙官能環氧樹脂衍生之比較例12-1、12-2中,硬化性大幅惡化,且耐衝擊性較低。 Further, in Comparative Examples 12-1 and 12-2 derived from a general difunctional epoxy resin, the hardenability was greatly deteriorated, and the impact resistance was low.

參考例10、11、12、實施例13、14、15及比較例16:亁膜型光阻組合物及其硬化物之製備 Reference Examples 10, 11, 12, Examples 13, 14, 15 and Comparative Example 16: Preparation of a ruthenium film type resist composition and a cured product thereof

添加參考例4、5、6、實施例5、6、7及比較例8中所得之反應性多羧酸化合物(B)54.44 g、作為其他反應性化合物(C)之HX-220(商品名;日本化藥(股)製造之二丙烯酸酯單體)3.54 g、作為光聚合起始劑之Irgacure-907(汽巴精化(Ciba Specialty Chemicals)製造)4.72 g及Kayacure DETX-S(日本化藥(股)製造)0.47 g、作為硬化成分之GTR-1800(日本化藥(股)製造)14.83 g、作為熱硬化觸媒之三聚氰胺1.05 g、以及作為濃度調整溶劑之甲基乙基酮20.95 g,使用珠磨機加以混練而使之均勻分散,獲得光阻樹脂組合物。 The reactive polycarboxylic acid compound (B) obtained in Reference Examples 4, 5, and 6, Examples 5, 6, and 7 and Comparative Example 8 (54.44 g) and HX-220 (trade name) as another reactive compound (C) were added. ; a bisacrylate monomer manufactured by Nippon Kayaku Co., Ltd.) 3.54 g, Irgacure-907 (manufactured by Ciba Specialty Chemicals) as a photopolymerization initiator, 4.72 g, and Kayacure DETX-S (Japanese) Manufactured by a drug (stock) 0.47 g, GTR-1800 (manufactured by Nippon Kayaku Co., Ltd.) 14.83 g as a hardening component, 1.05 g of melamine as a thermosetting catalyst, and methyl ethyl ketone 20.95 as a concentration adjusting solvent g, kneaded using a bead mill to uniformly disperse it to obtain a photoresist resin composition.

使用線棒塗布機#20,將所得之組合物均勻地塗布於作為支持膜之聚苯二甲酸乙二酯膜上,使之通過溫度為70℃之熱風乾燥爐,形成厚度為20 μm之樹脂層之後,於該樹脂層上貼附作為外覆膜之聚乙烯膜,獲得亁膜。使用溫度為80℃之加熱輥,一面將所得之亁膜的外覆膜剝離,一面將樹脂層貼附於聚醯亞胺印刷基板(銅電路厚度:12 μm;聚醯亞胺膜厚度:25 μm)的整個基板面上。 Using a bar coater #20, the resulting composition was uniformly coated on a polyethylene terephthalate film as a support film, and passed through a hot air drying oven at a temperature of 70 ° C to form a resin having a thickness of 20 μm. After the layer, a polyethylene film as an overcoat film was attached to the resin layer to obtain a ruthenium film. The outer layer of the obtained ruthenium film was peeled off while using the heating roll at a temperature of 80 ° C, and the resin layer was attached to the polyimide substrate (thickness of the copper circuit: 12 μm; thickness of the polyimide film: 25 Μm) on the entire substrate surface.

再者,參考例10-5、11-6、12-5中所使用之所謂(A)與(B)之混合物,係指以用溶液重量計為50:50之比例,而分別將參考例1-1、2-1、或3-1中所製備之酸改質羧酸酯化合物(A),與參考例4-1、5-1、或6-1中所製備之使用相當之環氧樹脂的多羧酸化合物(B)混合所得者。 Further, the mixture of the so-called (A) and (B) used in Reference Examples 10-5, 11-6, and 12-5 means a ratio of 50:50 by weight of the solution, and the reference examples are respectively used. The acid-modified carboxylic acid ester compound (A) prepared in 1-1, 2-1, or 3-1, which is equivalent to the one prepared in Reference Example 4-1, 5-1, or 6-1 The polycarboxylic acid compound (B) of the oxygen resin is mixed.

繼而,使用紫外線曝光裝置(ORC製作所(股);型號:HMW-680GW),通過描繪有電路圖案之光罩、以及為了評價感度而通過Kodak製造之階段式曝光表No.2照射500 mJ/cm2之紫外線。其後, 剝離亁膜上之膜,確認剝離狀態。其後,用1%碳酸鈉水溶液進行噴霧顯影,將紫外線未照射部之樹脂除去。水洗乾燥後,在150℃之熱風乾燥器中使印刷基板進行60分鐘加熱硬化反應而獲得硬化膜。 Then, an ultraviolet exposure apparatus (ORC Manufacturing Co., Ltd.; model: HMW-680GW) was used, and a photomask having a circuit pattern was drawn, and a stage exposure meter No. 2 manufactured by Kodak was used to irradiate 500 mJ/cm for evaluation of sensitivity. 2 ultraviolet rays. Thereafter, the film on the enamel film was peeled off, and the peeled state was confirmed. Thereafter, spray development was carried out using a 1% sodium carbonate aqueous solution to remove the resin in the ultraviolet non-irradiated portion. After washing with water, the printed substrate was subjected to a heat-hardening reaction for 60 minutes in a hot air dryer at 150 ° C to obtain a cured film.

以如下所示之評價方法進行試驗(試驗例5~10),藉此評價參考例10、11、12、實施例13、14、15及比較例16中所得之亁膜型光阻硬化膜的性能。將各硬化膜之評價試驗結果示於表5中。 The test was carried out by the evaluation method shown below (Test Examples 5 to 10), whereby the ruthenium film type resistive films obtained in Reference Examples 10, 11, 12, Examples 13, 14, 15 and Comparative Example 16 were evaluated. performance. The evaluation test results of the respective cured films are shown in Table 5.

試驗例5:耐折性評價 Test Example 5: Evaluation of folding endurance

將形成有光阻之硬化膜的聚醯亞胺印刷基板,以使硬化膜側位於上方之方式山摺(mountain fold),用手指充分捋彎折部。使彎折部復原,用放大鏡觀察光阻膜。 The polyimide printed circuit board on which the cured film of the photoresist is formed is mountain-folded so that the cured film side is positioned upward, and the bent portion is sufficiently folded by fingers. The bent portion was restored, and the photoresist film was observed with a magnifying glass.

評價基準:○:無龜裂;△:觀察到少許龜裂;×:產生剝離 Evaluation criteria: ○: no cracking; △: a few cracks were observed; ×: peeling occurred

試驗例6:耐冷熱衝擊性評價 Test Example 6: Evaluation of thermal shock resistance

於-65~120℃之範圍內,對形成有光阻之硬化膜的聚醯亞胺印刷基板實施冷熱衝擊試驗。試驗方法係依據JIS C5012-9.1:1993。試驗結束後,用cellophane tape(註冊商標)實施剝離試驗。 A thermal shock test was performed on the polyimide substrate on which the resistive cured film was formed in the range of -65 to 120 °C. The test method is based on JIS C5012-9.1:1993. After the test, the peeling test was carried out using a cellophane tape (registered trademark).

評價基準:○:無剝離;△:觀察到少許剝離;×:產生剝離 Evaluation criteria: ○: no peeling; △: slight peeling was observed; ×: peeling occurred

試驗例7:高溫耐濕性評價 Test Example 7: Evaluation of high temperature moisture resistance

將形成有光阻之硬化膜的聚醯亞胺印刷基板於120℃之高壓釜中放置1小時。取出基板,於室溫下風乾後,用cellophane tape(註冊商標)實施剝離試驗。 The polyimide substrate on which the photoresist of the photoresist was formed was placed in an autoclave at 120 ° C for 1 hour. The substrate was taken out, air-dried at room temperature, and then subjected to a peeling test using a cellophane tape (registered trademark).

評價基準:○:無剝離;△:觀察到少許剝離;×:產生剝離 Evaluation criteria: ○: no peeling; △: slight peeling was observed; ×: peeling occurred

試驗例8:感度評價 Test Example 8: Sensitivity evaluation

感度係根據在顯影時,透過階段式曝光表之曝光部中殘存有至第幾級為止之濃度部分來加以判定。當級數(值)較大時,判定為在曝光表之濃部中具有高感度(單位:級)。 The sensitivity is determined based on the concentration portion remaining in the exposure portion of the stage exposure meter at the time of development to the first stage. When the number of stages (value) is large, it is determined that there is a high sensitivity (unit: level) in the rich portion of the exposure table.

試驗例9:顯影性評價 Test Example 9: Developmentability evaluation

顯影性係根據對透過圖案光罩之曝光部進行顯影時,至圖案形狀部完全顯影為止之時間,即所謂出像時間進行顯影性之評價(單位:秒)。 The developability is evaluated based on the time until the pattern-shaped portion is completely developed when the exposure portion of the transmission pattern mask is developed, that is, the development time (unit: second).

試驗例10:硬化性評價 Test Example 10: Evaluation of hardenability

硬化性評價係利用150℃加熱結束後之硬化膜之鉛筆硬度來表示。評價方法係依據JIS K5600-5-4:1999。 The evaluation of the hardenability was expressed by the pencil hardness of the cured film after completion of heating at 150 °C. The evaluation method is based on JIS K5600-5-4:1999.

根據上述結果可明確,本發明之光阻組合物可獲得具有相對較高之硬度之硬化物,作為光阻具有良好之顯影性及感度。並且,於參考例10、11之情形時具有高耐折性。又,於參考例12中具有高耐冷熱衝擊性及高溫耐濕性。比較例之光阻組合物及其硬化物於耐折性、熱變化之耐衝擊性、顯影性以及感度方面並未顯示出良好之評價結果,不能滿足作為亁膜光阻材料之性能。 From the above results, it is clear that the photoresist composition of the present invention can obtain a cured product having a relatively high hardness and has good developability and sensitivity as a photoresist. Further, it has high folding endurance in the case of Reference Examples 10 and 11. Further, in Reference Example 12, it has high cold shock resistance and high temperature moisture resistance. The photoresist composition of the comparative example and the cured product thereof did not show good evaluation results in terms of folding endurance, thermal shock resistance, developability, and sensitivity, and could not satisfy the performance as a ruthenium film resist material.

參考例13、實施例17及比較例18:阻燃性樹脂、以及比較用樹脂之製備 Reference Example 13, Example 17 and Comparative Example 18: Preparation of Flame Retardant Resin and Comparative Resin

將參考例10-2、實施例13-1及比較例16-1中所製備之光阻組合物9.5 g、磷酸酯系阻燃劑(四國化成製造之SP-703H)0.5 g混合攪拌,獲得硬化型樹脂組合物。用線棒塗布機#20,將組合物塗布於膜厚為25微米之聚醯亞胺膜上,使之通過溫度為70℃之熱風乾燥爐,形成厚度大約為15 μm之樹脂層。使用紫外線曝光裝置(ORC製作所(股);型號:HMW-680GW),照射500 mJ/cm2之紫外線。照射後,在150℃之熱風乾燥器中使印刷基板進行60分鐘加熱硬化反應而獲得硬化膜(分別為參考例13、實施例17、比較例18)。 9.5 g of the photoresist composition prepared in Reference Example 10-2, Example 13-1 and Comparative Example 16-1, and 0.5 g of a phosphate ester flame retardant (SP-703H manufactured by Shikoku Chemicals Co., Ltd.) were mixed and stirred. A hardened resin composition was obtained. The composition was applied to a polyimide film having a film thickness of 25 μm by a bar coater #20, and passed through a hot air drying oven at a temperature of 70 ° C to form a resin layer having a thickness of about 15 μm. Ultraviolet rays of 500 mJ/cm 2 were irradiated using an ultraviolet exposure apparatus (ORC Manufacturing Co., Ltd.; model: HMW-680GW). After the irradiation, the printed substrate was subjected to a heat curing reaction for 60 minutes in a hot air dryer at 150 ° C to obtain a cured film (Reference Example 13, Example 17, and Comparative Example 18, respectively).

試驗例11:阻燃性之評價 Test Example 11: Evaluation of flame retardancy

將參考例13、實施例17、比較例18中所得之硬化膜與聚醯亞胺基材膜一起切割成長度為20 cm,寬度為2 cm之帶狀。將所切割出之膜豎 直懸掛,用點火器自下端點火,評價阻燃性。為對阻燃性與耐折性加以比較,將參考例10-2、實施例13-1及比較例16-1之耐折性試驗資料一併記載於下述表6中作為參考。 The cured film obtained in Reference Example 13, Example 17, and Comparative Example 18 was cut together with a polyimide film to form a strip having a length of 20 cm and a width of 2 cm. Vertically cut the film Straight suspension, ignited from the lower end with an igniter to evaluate flame retardancy. In order to compare the flame retardancy and the folding endurance, the folding endurance test data of Reference Example 10-2, Example 13-1, and Comparative Example 16-1 are collectively described in Table 6 below for reference.

根據以上之結果可明確,參考例之羧酸酯化合物係可同時具備阻燃性及耐折性的材料。 From the above results, it is clear that the carboxylic acid ester compound of the reference example is a material which can simultaneously have flame retardancy and folding resistance.

參考例14、15、16、實施例19、20、21及比較例22:著色顏料分散樹脂之製備 Reference Examples 14, 15, 16, Examples 19, 20, 21 and Comparative Example 22: Preparation of Colored Pigment Dispersion Resin

將參考例4、5、6、實施例5、6、7及比較例8中所得之反應性多羧酸化合物(B)20 g、作為其他反應性化合物(C)之DPHA(商品名;日本化藥(股)製造之丙烯酸酯單體)5.0 g、作為有機溶劑之丙二醇單甲醚乙酸酯10 g、作為著色顏料之三菱碳黑MA-100 10 g混合攪拌。於其中裝入35 g之玻璃珠,用塗料搖動器進行1小時分散。 20 g of the reactive polycarboxylic acid compound (B) obtained in Reference Examples 4, 5, 6, Examples 5, 6, and 9 and Comparative Example 8, DPHA (trade name; Japan) as another reactive compound (C) 5.0 g of an acrylate monomer manufactured by a chemical (stock), 10 g of propylene glycol monomethyl ether acetate as an organic solvent, and 10 g of Mitsubishi carbon black MA-100 as a coloring pigment were mixed and stirred. 35 g of glass beads were placed therein and dispersed by a paint shaker for 1 hour.

用線棒塗布機#2將分散結束後之分散液塗布於聚苯二甲酸乙二酯膜上,於80℃之暖風乾燥機中進行10分鐘乾燥,獲得各碳黑分散樹脂。 The dispersion after completion of the dispersion was applied onto a polyethylene terephthalate film by a bar coater #2, and dried in a warm air dryer at 80 ° C for 10 minutes to obtain each carbon black dispersion resin.

試驗例12:關於顏料分散性之評價 Test Example 12: Evaluation of pigment dispersibility

使用60°反射光澤計(堀場製作所製造之1G-331光澤計),對參考例14、15、16、實施例19、20、21及比較例22中所得之碳黑分散樹脂之 塗膜表面的光澤加以測定,評價碳黑之分散性。此時,光澤較高者表示顏料分散性良好。將結果示於表7中。 The carbon black dispersion resin obtained in Reference Examples 14, 15, 16, Examples 19, 20, 21 and Comparative Example 22 was used using a 60° reflection gloss meter (1G-331 gloss meter manufactured by Horiba, Ltd.). The gloss of the surface of the coating film was measured to evaluate the dispersibility of carbon black. At this time, the higher gloss indicates that the pigment dispersibility is good. The results are shown in Table 7.

根據上述結果可明確,參考例之反應性多羧酸化合物(B)之顏料之分散性提昇。業者根據與實施例之多羧酸之差異,而認為該顏料分散性作用係由於添加了分子中之基本骨架包含特定結構之環氧樹脂及化 合物(c)而產生之效果差異。 From the above results, it was confirmed that the dispersibility of the pigment of the reactive polycarboxylic acid compound (B) of the reference example was improved. According to the difference between the polycarboxylic acid and the example, the pigment dispersing action is considered to be due to the addition of an epoxy resin and a specific structure in the basic skeleton of the molecule. The difference in effect produced by the compound (c).

參考例17、實施例23及比較例24:著色顏料分散樹脂之製備 Reference Example 17, Example 23, and Comparative Example 24: Preparation of Colored Pigment Dispersion Resin

將參考例4-2、實施例5-1及比較例8-1中所獲得之反應性多羧酸化合物(B)20 g、作為其他反應性化合物(C)之DPHA(商品名;日本化藥(股)製造之丙烯酸酯單體)5.0 g,作為有機溶劑之丙二醇單甲醚乙酸酯10 g、作為著色顏料之三菱碳黑MA-100 10 g混合攪拌。於其中裝入35 g之玻璃珠,用塗料搖動器進行1小時分散。將所得之碳黑分散樹脂液採集於樣品瓶中,獲得著色顏料分散液。 20 g of the reactive polycarboxylic acid compound (B) obtained in Reference Example 4-2, Example 5-1 and Comparative Example 8-1, and DPHA (trade name; Nipponization) as another reactive compound (C) 5.0 g of acrylate monomer manufactured by the drug (stock), 10 g of propylene glycol monomethyl ether acetate as an organic solvent, and 10 g of Mitsubishi carbon black MA-100 as a coloring pigment were mixed and stirred. 35 g of glass beads were placed therein and dispersed by a paint shaker for 1 hour. The obtained carbon black dispersion resin liquid was collected in a sample bottle to obtain a color pigment dispersion liquid.

試驗例13:著色顏料分散液之保存穩定性評價 Test Example 13: Evaluation of storage stability of coloring pigment dispersion

將參考例17、實施例23及比較例24中所製備之著色顏料分散液於40℃下靜置保管2週,目視評價該分散液之狀態。將結果示於表8中。 The color pigment dispersion liquid prepared in Reference Example 17, Example 23, and Comparative Example 24 was allowed to stand at 40 ° C for 2 weeks, and the state of the dispersion liquid was visually evaluated. The results are shown in Table 8.

根據上述結果可明確,參考例之著色顏料分散液即便於40℃下經過2週,亦不會產生分散液分離而一直維持為均勻之狀態。另一方面,實施例23中,上層出現透明層(清漆漂浮物),分散狀態不穩定。於比較例24中,著色顏料產生沈澱,成為即使攪拌亦不會變得均勻之狀態。 According to the above results, it is clear that the color pigment dispersion liquid of the reference example does not cause separation of the dispersion liquid and remains uniform even after two weeks at 40 ° C. On the other hand, in Example 23, a transparent layer (varnish floating matter) appeared in the upper layer, and the dispersed state was unstable. In Comparative Example 24, the colored pigment was precipitated, and it did not become uniform even when stirred.

根據上述結果可明確,於本發明之反應性多羧酸化合物(B)中,藉由於以特定結構為基本骨架之環氧樹脂(a)中,導入分子中兼具一個以上可聚合之乙烯性不飽和基及一個以上羧基的化合物(b)、以及分子中 兼具一個以上羥基及一個以上羧基的化合物(c),可提昇顏料之分散性,並且可提昇其顏料分散液之保存穩定性。 According to the above results, it is clear that in the reactive polycarboxylic acid compound (B) of the present invention, one or more polymerizable vinyl groups are introduced into the molecule by the epoxy resin (a) having a specific structure as a basic skeleton. a compound (b) having an unsaturated group and one or more carboxyl groups, and a molecule The compound (c) having one or more hydroxyl groups and one or more carboxyl groups can enhance the dispersibility of the pigment and improve the storage stability of the pigment dispersion.

[產業上之可利用性] [Industrial availability]

對於本發明之活性能量線硬化型樹脂,作為一種兼具硬化性及柔軟性、強韌性、阻燃性之材料,而例示了將其用作硬塗材料、可鹼性顯影、且可撓性為必需之光阻材料,以及發揮出良好之顏料分散性之用途,本發明之活性能量線硬化型樹脂可作為例如活性能量線硬化型之印刷油墨、彩色光阻、尤其是作為兼具顏料分散性及顯影性等光阻適應性的材料而特別合適地用於LCD(liquid-crystal display,液晶顯示器)用彩色光阻,尤其是黑色矩陣等中。 The active energy ray-curable resin of the present invention is exemplified as a hard coat material, an alkali developable film, and a flexible material as a material having both curability, flexibility, toughness, and flame retardancy. The active energy ray-curable resin of the present invention can be used as, for example, an active energy ray-curable printing ink, a color resist, and especially as a pigment dispersion, in order to be a necessary photoresist material and to exert a good pigment dispersibility. It is particularly suitable for use in a color resist for LCD (liquid crystal display), especially a black matrix or the like, as a resistive material such as a property and developability.

Claims (14)

一種反應性環氧羧酸酯化合物,其係使以通式(1)所表示之環氧樹脂(a)及一分子中兼具一個以上之可聚合之乙烯性不飽和基及一個以上之羧基的化合物(b)進行反應而獲得者: (式中,R1相互相同或不同,表示氫原子、鹵素原子或碳數為1~4之烴基;R2表示碳數為7~16的2價多環式烴基或碳數為7~18之伸芳烷基;m表示1~4之整數,且n為平均值、表示1~10之正數)。 A reactive epoxy carboxylate compound obtained by using the epoxy resin (a) represented by the formula (1) and one or more polymerizable ethylenically unsaturated groups and one or more carboxyl groups in one molecule The compound (b) is reacted to obtain: (wherein R 1 is the same or different from each other, and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms; and R 2 represents a divalent polycyclic hydrocarbon group having 7 to 16 carbon atoms or a carbon number of 7 to 18; An aralkyl group; m represents an integer from 1 to 4, and n is an average value, indicating a positive number from 1 to 10. 如請求項1之反應性環氧羧酸酯化合物,其中環氧樹脂(a)為通式(2): (式中,R3相互相同或不同,表示氫原子、鹵素原子或碳數為1~4 之烴基;o表示1~4之整數,且p為平均值、表示1~10之正數)。 The reactive epoxy carboxylate compound of claim 1, wherein the epoxy resin (a) is of the formula (2): (wherein R 3 is the same or different from each other, and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms; o represents an integer of 1 to 4, and p is an average value, and represents a positive number of 1 to 10). 如請求項1之反應性環氧羧酸酯化合物,其中環氧樹脂(a)為通式(3): (式中,R4相互相同或不同,表示氫原子、鹵素原子或碳數為1~4之烴基;q表示1~4之整數,且r為平均值、表示1~10之正數)。 The reactive epoxy carboxylate compound of claim 1, wherein the epoxy resin (a) is of the formula (3): (wherein R 4 is the same or different from each other, and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms; q represents an integer of 1 to 4, and r is an average value, and represents a positive number of 1 to 10). 如請求項1之反應性環氧羧酸酯化合物,其中環氧樹脂(a)為通式(4): (式中,R5相互相同或不同,表示氫原子、鹵素原子或碳數為1~4之烴基;s表示1~4之整數,且t為平均值、表示1~10之正數)。 The reactive epoxy carboxylate compound of claim 1, wherein the epoxy resin (a) is of the formula (4): (wherein R 5 is the same or different from each other, and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms; s represents an integer of 1 to 4, and t is an average value, and represents a positive number of 1 to 10). 一種反應性多羧酸化合物,其係使如請求項1至4中任一項之反應性羧酸酯化合物(A)與多元酸酐(d)反應而獲得者。 A reactive polycarboxylic acid compound obtained by reacting the reactive carboxylic acid ester compound (A) according to any one of claims 1 to 4 with a polybasic acid anhydride (d). 一種活性能量線硬化型樹脂組合物,其特徵在於:其係含有如請求項1至4中任一項之反應性羧酸酯化合物(A)、及/或如請求項5之反應性多羧酸化合物(B)者。 An active energy ray-curable resin composition, which comprises the reactive carboxylate compound (A) according to any one of claims 1 to 4, and/or the reactive polycarboxylate according to claim 5 Acid compound (B). 如請求項6之活性能量線硬化型樹脂組合物,其進一步含有除(A)、(B)以外之反應性化合物(C)。 The active energy ray-curable resin composition of claim 6, which further contains a reactive compound (C) other than (A) and (B). 如請求項6之活性能量線硬化型樹脂組合物,其進一步含有著色顏料。 The active energy ray-curable resin composition of claim 6, which further contains a coloring pigment. 如請求項6之活性能量線硬化型樹脂組合物,其進一步含有光聚合起始劑。 The active energy ray-curable resin composition of claim 6, which further contains a photopolymerization initiator. 如請求項6之活性能量線硬化型樹脂組合物,其係成形用材料。 The active energy ray-curable resin composition of claim 6, which is a material for molding. 如請求項6之活性能量線硬化型樹脂組合物,其係被膜形成用材料。 The active energy ray-curable resin composition of claim 6, which is a material for forming a film. 如請求項6之活性能量線硬化型樹脂組合物,其係光阻材料組合物。 The active energy ray-curable resin composition of claim 6, which is a photoresist material composition. 一種硬化物,其係如請求項6之活性能量線硬化型樹脂組合物的硬化物。 A cured product which is a cured product of the active energy ray-curable resin composition of claim 6. 一種物品,其係由如請求項6之活性能量線硬化型樹脂組合物外覆者。 An article which is covered by an active energy ray-curable resin composition as claimed in claim 6.
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