TW201324597A - 圖案形成方法 - Google Patents

圖案形成方法 Download PDF

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Publication number
TW201324597A
TW201324597A TW101141020A TW101141020A TW201324597A TW 201324597 A TW201324597 A TW 201324597A TW 101141020 A TW101141020 A TW 101141020A TW 101141020 A TW101141020 A TW 101141020A TW 201324597 A TW201324597 A TW 201324597A
Authority
TW
Taiwan
Prior art keywords
film
pattern
pattern forming
inter
substrate
Prior art date
Application number
TW101141020A
Other languages
English (en)
Chinese (zh)
Inventor
Kimiaki Miyamoto
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW201324597A publication Critical patent/TW201324597A/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1259Multistep manufacturing methods
    • H01L27/1292Multistep manufacturing methods using liquid deposition, e.g. printing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/02Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a matt or rough surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/08Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1208Pretreatment of the circuit board, e.g. modifying wetting properties; Patterning by using affinity patterns

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Thin Film Transistor (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Electrodes Of Semiconductors (AREA)
TW101141020A 2011-11-11 2012-11-05 圖案形成方法 TW201324597A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011247100A JP2013105797A (ja) 2011-11-11 2011-11-11 パターン形成方法

Publications (1)

Publication Number Publication Date
TW201324597A true TW201324597A (zh) 2013-06-16

Family

ID=48289848

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101141020A TW201324597A (zh) 2011-11-11 2012-11-05 圖案形成方法

Country Status (3)

Country Link
JP (1) JP2013105797A (ja)
TW (1) TW201324597A (ja)
WO (1) WO2013069466A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6067605B2 (ja) * 2014-02-26 2017-01-25 富士フイルム株式会社 パターン形成方法
TWI664066B (zh) 2014-09-30 2019-07-01 日商富士軟片股份有限公司 多孔質體的製造方法、元件的製造方法、配線結構的製造方法
CN112517355A (zh) * 2020-11-20 2021-03-19 榆林学院 一种换热管表面超双疏涂层及其制备工艺和在甲醇制烯烃装置中的应用

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003059940A (ja) * 2001-08-08 2003-02-28 Fuji Photo Film Co Ltd ミクロファブリケーション用基板、その製造方法および像状薄膜形成方法
JP2003222972A (ja) * 2001-11-21 2003-08-08 Fuji Photo Film Co Ltd パターン形成材料及び画像形成材料
JP4557755B2 (ja) * 2004-03-11 2010-10-06 キヤノン株式会社 基板、導電性基板および有機電界効果型トランジスタの各々の製造方法
JP4700484B2 (ja) * 2004-12-17 2011-06-15 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP5332145B2 (ja) * 2007-07-18 2013-11-06 株式会社リコー 積層構造体、電子素子、電子素子アレイ及び表示装置
JP2009075252A (ja) * 2007-09-19 2009-04-09 Ricoh Co Ltd 積層構造体およびその形成方法、配線基板、マトリクス基板、電子表示装置
JP5095650B2 (ja) * 2008-09-30 2012-12-12 シャープ株式会社 膜パターンとその膜パターン形成方法、及び導電膜配線、並びに電気光学装置

Also Published As

Publication number Publication date
WO2013069466A1 (ja) 2013-05-16
JP2013105797A (ja) 2013-05-30

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