TW201231632A - Touch panel - Google Patents

Abstract

Provided is a capacitance type touch panel in which the decrease in display quality that occurs in a display device when the transparent electrode pattern is visually recognized can be mitigated. The touch panel (1) includes a metal oxide layer (5) disposed over first transparent electrodes (3) and second transparent electrodes (4). The metal oxide layer (5) is formed from a coating composition obtained by hydrolyzing and condensing one or more metal alkoxides of the formula M(OR)n (M represents a metal, R represents a C1-5 alkyl, and n indicates the valence of the M) in an organic solvent in the presence of a metal salt of the formula M2(X)m (M2 represents a metal, X represents a chlorine atom, nitric acid, sulfuric acid, acetic acid, oxalic acid, a sufamic acid, a sulfonic acid, acetoacetic acid, acetylacetonato, or a basic salt of any of these, and m indicates the valence of the M2) and adding a precipitation inhibitor thereto. The metal alkoxides preferably are a mixture of a titanium alkoxide and either a silicon alkoxide or a partial condensate thereof.

Description

201231632 VI. Description of the Invention: [Technical Field] The present invention relates to a touch panel in detail, and relates to a capacitive touch panel. [Prior Art] In recent years, with the popularization of smart phones, the display screen of mobile phones has also been gradually enlarged. Along with this, a touch panel that can perform an input operation by applying a display of a display is actively developed. According to the touch panel, since the input means such as a push switch is not required, the display screen can be enlarged. The touch panel detects the contact position of the operation surface that is contacted by a finger or a pen. With this function, the touch panel can be used as an input device. The detection method of the contact position is, for example, a resistive film method and an electrostatic capacitance method. In the resistive film method, two substrates having transparent electrodes on their surfaces are disposed apart from each other such that the transparent electrodes face each other. That is, since two substrates are used, it is difficult to achieve a problem of thinning. Further, in this method, by pressing one of the substrates, the transparent electrode provided on the substrate and the transparent electrode provided on the other substrate are short-circuited to detect the pressing position. Therefore, the substrate on one side of the finger pressing is likely to be worn out, and the durability of the touch panel is lowered. On the other hand, since the electrostatic capacitance method can be made thinner by using only one substrate, it is a suitable method for a portable device. -5- • Si* 201231632 Patent Document 1 discloses a capacitive touch panel. In the touch panel, a glass sandwiching a dielectric medium is provided with a first transparent electrode for detecting a coordinate in the X direction and a second transparent electrode for detecting a coordinate in the Y direction. Specifically, at! On one side of the glass substrate, a plurality of electrodes for detecting the coordinates of the X direction are disposed apart from each other, and on the other surface, a plurality of coordinates for detecting the Y direction are disposed apart from each other. electrode. That is, each of the transparent electrodes is provided on one substrate. Further, Patent Document 2 discloses a touch panel of another electrostatic capacitance type. In the touch panel, a first transparent electrode for detecting a coordinate in the X direction and a second transparent electrode for detecting a coordinate in the Y direction are disposed on one side of the transparent substrate, and The insulating layer is interposed on the intersection to make it non-conductive. According to this configuration, it is not necessary to perform electrode formation on both sides of the substrate. PRIOR ART DOCUMENT PATENT DOCUMENT PATENT DOCUMENT 1 Patent Publication No. JP-A-2002-A. Patent Publication No. 2: Japanese Patent Application Publication No. JP-A No. 2 0 1 0 - 2 8 1 1 5 The problem to be solved is that the touch panel is incorporated in a display device such as a liquid crystal display device, and is used as a display device with a touch panel function capable of detecting a touch position. In order to allow the person who operates the touch panel to view the display device through the touch panel, the transparent electrode is a member with good light transmission characteristics. For example, an inorganic material such as IT ο (Indium Tin Oxide) is used. However, in the capacitive touch panel, the difference in reflectance occurs in a region where the transparent electrode of ITO or the like is formed and a region where the transparent electrode is not formed. Therefore, there is a problem that the pattern of the transparent electrode is observed to lower the display property. Further, among conventional touch panels, there is a technique in which an acrylic layer made of an acrylic material is provided on a transparent electrode such as ITO. The acrylic layer is intended to protect the transparent electrode, and the refractive index characteristics are not considered. Therefore, the effect of making the electrode pattern unobtrusive to the acrylic layer cannot be expected. Further, since the acrylic layer is an organic material film, the hardness as a protective film is not sufficient. The adhesion to a transparent electrode such as ITO is also weak, which is one of the causes of the reliability reduction of the touch panel. Further, when an acrylic layer is used, it is difficult to form a film by a printing technique such as fast drying printing. Therefore, in the formation of a film, it is necessary to apply a cumbersome lithography technique. The present invention has been made in view of this problem. That is, an object of the present invention is to provide a capacitive touch panel which can alleviate a decrease in displayability of a display device caused by viewing a transparent electrode pattern. Further, another object of the present invention is to provide a capacitive touch panel which can be formed on a transparent electrode and which has a high hardness and a high adhesion to a transparent electrode and can be formed into a film by a printing technique. Other objects and advantages of the present invention will be apparent from the following description. 201231632 (Means for Solving the Problem) The present invention relates to a touch panel which is a capacitive touch panel of a pattern in which a transparent electrode is formed on an operation area of a transparent substrate, and is characterized by the following In the presence of a metal salt represented by the formula (II), the metal alkoxide represented by the following general formula (I) is hydrolyzed and condensed in an organic solvent, and a precipitation preventing agent is further added to obtain a coating film composition, which is obtained from the coating film. A layer of a metal oxide formed by the composition is disposed on the transparent electrode; M, (OR) n (I) (wherein 1 Μι is not a metal 'R is not a base of Cl~C5' π is not awkward! The valence of )2 ( X ) m ( II ) (wherein M 2 represents a metal and X represents chlorine, nitric acid, sulfuric acid, acetic acid, oxalic acid, sulfamic acid, sulfonic acid, acetoacetic acid, acetylpyruvate or the like The basic salt, m represents the valence of M2). In addition, the present invention is a touch panel which is a capacitive touch panel of a pattern in which a transparent electrode is formed on an operation area of a transparent substrate, and is characterized by the following general formula (Π-1) and The metal alkoxide represented by the following general formula (I) is hydrolyzed and condensed in an organic solvent in the presence of a metal salt represented by the oxalate of the metal used in the formula (Π-1), and then a precipitation preventing agent is added. To obtain a coating composition, a layer of a metal oxide formed by the coating composition is disposed on the transparent electrode: -8 - 201231632 Μι (OR) „ (I) (wherein M! represents a metal, R An alkyl group of C1 to C5, n represents a valence of M); Μ2 ( X ) m ( II-1 ) (wherein Μ 2 represents a metal, and χ represents chlorine, nitric acid, sulfuric acid, acetic acid, sulfamic acid, sulfonic acid Ethylacetic acid, acetoacetic acid or the basic salt 'm represents the valence of ruthenium 2). In the present invention, the metal M1 in the above general formula (I) is preferably selected from ruthenium (Si), Titanium (Ti), molybdenum (Ta), chromium (Zr), boron (B), aluminum (A1), magnesium (Mg), tin (Sn) and zinc (Zn) Further, in the present invention, the metal M2 in the above general formulas (II) and (II-1) is preferably selected from the group consisting of aluminum (A1), indium (ln), and zinc ( At least one of the group consisting of Zn), zirconium (Zr), bismuth (Bi), lanthanum (La), lanthanum (Ta), yttrium (Y), and cerium (C e ). The layer of the material preferably has a refractive index of from 1.50 to 1.70'. The thickness of the layer of the metal oxide (hereinafter, the thickness of the layer is also referred to as a film thickness) is from 40 nm to 170 nm. In the present invention, the metal alkoxide is a mixture of alkoxide or a partial condensate thereof and a titanium alkoxide. In the present invention, the precipitation inhibitor is preferably selected from the group consisting of Groups of N-methyl-pyrrolidone, ethylene glycol, dimethylformamide, dimethylacetamide, diethylene glycol, propylene glycol, hexanediol, and the like -9 - 201231632 One less. In the present invention, the metal atom (JVh) of the metal alkoxide contained in the coating film composition and the metal atom (m2) of the metal salt are in the form of a metal atom (m2). The ratio is preferably 0.01SM2/(Mi + M2) $0_7. In the present invention, the metal salt is preferably selected from the group consisting of metal nitrates, metal sulfates, metal acetates, metal chlorides, metal oxalates, At least one of the group consisting of a metal sulfonate, a metal sulfonate, a metal acetoacetate, a metal acetoacetate, and a basic salt thereof. In the present invention, the organic solvent is preferably contained. In the present invention, the transparent electrode preferably has a first transparent electrode and a second transparent electrode for detecting at least two positions in different directions. In the present invention, the first transparent electrode and the second transparent electrode are preferably disposed on the same surface as the transparent substrate. In the present invention, the first transparent electrode and the second transparent electrode are preferably disposed on different surfaces of the transparent substrate. Advantageous Effects of Invention According to the present invention, there is provided an electrostatic capacitance type touch panel which can alleviate a decrease in displayability of a display device caused by viewing a transparent electrode pattern. [Embodiment] The display performance of the display device is lowered by viewing the transparent electrode pattern -10 - 201231632 because the refractive index of the transparent electrode is different from the refractive index of the substrate. The transparent electrode is usually composed of ITO (Indium Tin Oxide) of an inorganic metal oxide. The refractive index of ruthenium is about 1.8 to 2.1. On the other hand, the refractive index of the glass substrate is about 1.5, which is greatly different from the refractive index of ITO. The difference in refractive index causes a difference in light reflection characteristics between a region where the transparent electrode is formed and an unformed region. That is, the interface reflection characteristic with interference differs between the region where the transparent electrode is formed and the region where the transparent electrode is formed, and the electrode pattern is made conspicuous on the screen display. Therefore, the present inventors have intensively studied how to make the electrode pattern unobtrusive, and as a result, it has been found that a layer having a refractive index and a film thickness controlled within a predetermined range is formed on the transparent electrode disposed on the substrate. It is effective. By providing the layer, it is possible to suppress the phenomenon that an undesired electrode pattern is viewed on the touch panel. In the touch panel, as described above, there is a technique of providing an acrylic layer on a transparent electrode. The acrylic layer is intended to protect the transparent electrode, and the refractive index characteristics are not considered. Therefore, the effect of the electrode pattern on the acrylic layer cannot be expected to be unobtrusive. Further, since the acrylic layer is an organic material film, the hardness is low and the adhesion to ITO is also weak, so the mechanical strength is also insufficient. Further, since the insulating film is not disposed on the wiring portion of the frame edge portion of the touch panel, pattern formation is required, and it is difficult to form the film by a printing technique such as quick-drying printing. Therefore, in the formation of a film, it is necessary to apply a cumbersome lithography technique. From the above, it is understood that the acrylic layer is preferably replaced by a layer having a refractive index and a film thickness controlled by -11 - 201231632 within a predetermined range. That is, it is preferable to have a function of protecting a transparent electrode, specifically, a mechanical strength, which protects the transparent electrode from damage caused by a majority of pressing of a finger or the like. Further, it is preferable to form a transparent electrode pattern on the substrate simply by using a printing technique such as fast drying printing. The present inventors have found that a layer which satisfies the above properties can be suitably used: in the presence of a metal salt, a metal alkoxide is hydrolyzed and condensed in an organic solvent, and then a precipitation preventing agent is added. Coating film composition. By forming a metal oxide layer formed using the coating film composition on the transparent electrode (i.e., covering the transparent electrode), the transparent electrode can be protected on the touch panel and the electrode pattern can be made inconspicuous. Hereinafter, the touch panel of this embodiment will be described first. Next, the metal oxide layer applied to the touch panel and the coating film composition used in the formation of the metal oxide layer will be described. <Touch Panel> Figs. 1 and 2 are a configuration diagram of a touch panel according to a first example of the present embodiment, and Fig. 1 is a plan view, and Fig. 2 is a view along the line A1-A1' of Fig. 1 Sectional view of the line. As shown in Fig. 1, the touch panel 1 has a transparent substrate 2, a first transparent electrode 3 for detecting a coordinate in the X direction, and a second transparent electrode 4 for detecting a coordinate in the Y direction. The first transparent electrode 3 and the second transparent electrode 4 are formed by the same layer provided on the same surface of the substrate 2. -12- 201231632 Substrate 2, using glass, acrylic resin, polyester resin, polyethylene terephthalate resin, polycarbonate resin, polyvinylidene chloride resin, polymethyl methacrylate resin, triacetic acid It is composed of a transparent material such as cellulose resin or polyethylene naphthalate resin. It is particularly preferable to select a material having heat resistance and chemical resistance suitable for formation of the metal oxide layers 5 and 6 to be described later. The thickness of the substrate 2 is, for example, 0.1 mm to 2 mm when glass is used, and ΙΟμηη to 2000 μιη when the resin film is used. The first transparent electrode 3 and the second transparent electrode 4 are formed at positions corresponding to the operation surface of the touch panel 1. The first transparent electrode 3 is provided separately in a plurality of regions along the X direction, and the second transparent electrode 4 is provided separately in a plurality of regions along the x direction. By constructing such a structure, the accuracy of touch position detection can be improved. In the first embodiment, the first transparent electrode 3 and the second transparent electrode 4 have a plurality of electrode pad portions 21 as constituent elements, and the electrode pad portions 21 are spaced apart from each other in plane, and are arranged such that the electrode pad portions 2 are arranged. The gap between 1 is small. In other words, the electrode pad portion 21 which is formed in the X-axis direction and the electrode pad portion 21 which is arranged in the γ-axis direction are arranged such that the mutually intersecting regions are reduced as much as possible and disposed on the entire operation surface. The electrode pad portion 21 can be formed, for example, in a polygonal shape such as a rhombus, a rectangle, or a hexagon, and the like, for example, may be different from each other or arranged in a series. Further, the number of separated (phase-to-phase) electrodes is not limited to the example of Fig. 1, and can be determined in accordance with the size of the operation surface and the accuracy of the required detection position. The first transparent electrode 3 and the second transparent electrode 4 are formed using a transparent electrode material having a high transmittance and a conductivity at least for visible light. -13- 201231632 Such a transparent electrode material having conductivity, for example, ITO (Indium Tin Oxide) ' IZO (Indium Zinc)

Oxide) or ZnO (zinc oxide). When ITO is used, it is preferred to set the thickness to 10 to 20 nm to ensure sufficient conductivity. The first transparent electrode 3 and the second transparent electrode 4 are formed, for example, in the following manner. First, from the sputtering method, the vacuum evaporation method, the ion evaporation method, the spray method, the immersion method, or the CVD (Chemical Vapor Deposition) method, a method of considering the material of the substrate 2 as the underlayer is selected so that the transparent conductive film is formed. membrane. The above transparent conductive film is then patterned using lithography. Alternatively, a coating material obtained by dispersing a conductive chelating agent or the like composed of the above materials in an organic solvent is used, and a desired pattern is formed by a printing method. It is important in the step of forming the transparent electrode, whether or not the film thickness can be controlled with high precision. Therefore, in the formation of a transparent electrode, it is particularly preferable to select a method which can form a film having a desired film thickness and which can form a low-resistance film having good transparency. As shown in Figs. 1 and 2, the first transparent electrode 3 and the second transparent electrode 4 are formed on the same surface of the substrate 2 to constitute the same layer. Therefore, the first transparent electrode 3 and the second transparent electrode 4 intersect at a plurality of places to form the intersection portion 18. In the present embodiment, the intersection portion is separated such that one of the first transparent electrode 3 and the second transparent electrode 4 does not contact the other. That is, as shown in Fig. 2, the second transparent electrode 4 is connected to any one of the plurality of intersecting portions 18, but the first transparent electrode 3 is divided by -14 to 201231632. In order to connect the first transparent electrode 3, a bridge electrode 20 is provided, and an interlayer insulating film 19 made of an insulating material is provided between the bridge electrode 20 and the second transparent electrode 4. The following description will be described in detail with reference to Figs. 1 and 2 . As shown in Fig. 2, a light-transmitting interlayer insulating film 19 is formed on the second transparent electrode 4 of the intersection portion 18. As the interlayer insulating film 19, an inorganic material such as SiO 2 or an organic material such as a photosensitive acrylic resin can be used. When SiO 2 is used, for example, a structure in which a SiO 2 film is formed only on the second transparent electrode 4 of the intersection portion 18 can be formed by a sputtering method using a mask. Further, when a photosensitive acrylic resin is used, a lithography technique can also be applied to form the same structure. A bridge electrode 20 is provided on the upper layer of the interlayer insulating film 19. The bridge electrode 20 is formed by electrically connecting the first transparent electrodes 3 separated on the intersection portion 18 to each other by a light-transmitting material. By providing the bridge electrode 20, the first transparent electrode 3 can be electrically connected in the Y direction. As shown in Fig. 1, the first transparent electrode 3 and the second transparent electrode 4 are formed in a shape in which a plurality of rhombic electrode pad portions 2 1 are arranged in the longitudinal direction or the lateral direction. The connection portion of the second transparent electrode 4 at the intersection portion 18 has a shape narrower than the rhombic electrode pad portion 21 of the second transparent electrode 4. Further, the bridge electrode 20 is also formed in a strip shape having a narrower width than the rhombic electrode pad portion 21. As shown in FIGS. 1 and 2, in the touch panel 1 of the present embodiment, the first transparent electrode 3 and the second transparent electrode 4 (that is, the first transparent electrode 3 and the second transparent electrode 4 are covered) A metal oxide layer 5 is formed. -15- 201231632 and covering a formation region and a non-formation region of the transparent electrode on the portion corresponding to the operation surface of the touch panel 1. The metal oxide layer 5 has a high hardness and is excellent in adhesion to the first transparent electrode 3 and the second transparent electrode 4. In the formation of the metal oxide layer 5, a coating film composition obtained by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of a metal salt (for example, an aluminum salt) and then adding a precipitation preventing agent is used. The details of the coating composition will be described later. In the touch panel 1, the refractive index and the film thickness of the metal oxide layer 5 are selected so that the respective electrodes of the first transparent electrode 3 and the second transparent electrode 4 are selected according to the results of the discussion described in the column of the embodiment of the present specification. The type has become unobtrusive. Specifically, the refractive index of the metal oxide layer 5 is preferably in the range of 1.50 to 1.70, and particularly preferably in the range of 1.54 to 1.68. The film thickness is preferably in the range of 40 nm to 170 nm. When the refractive index of the metal oxide layer 5 is 1.54 or more and less than 1.60, the film thickness is more preferably in the range of 60 nm to 150 nm. Further, when the refractive index of the metal oxide layer 5 is 1.60 or more and less than 1.68, the film thickness is more preferably in the range of 40 nm to 170 nm. In order to prevent the first transparent electrode 3 and the second transparent electrode 4 from being turned on, the metal oxide layer 5 is selected from a metal oxide layer having insulating properties and high visible light transparency. In the touch panel 1, the metal oxide layer 5 is formed, for example, of a coating film composition containing a lanthanum alkoxide and a titanium alkoxide, and has a refractive index of 1.60 and a film thickness of 80 nm. As shown in FIG. 2, the touch panel 1 is formed by laminating an adhesive layer 9 such as an acrylic photocurable resin to form a first transparent electrode 3, 16-201231632, etc., and a display panel. The uppermost layer on the viewing side can thereby constitute one display device. Here, the adhesive layer 9 is provided on the metal oxide layer 5°. The above display device has the touch panel 1 and the display panel 10, and may have a backlight as necessary. Although the details are omitted in Fig. 2, the display panel 10 may have the same configuration as a generally known display device. For example, in the case of a liquid crystal display device, the display panel 10 may have a structure in which a liquid crystal layer is sandwiched between two transparent substrates. A polarizing plate may be separately provided on a side of the transparent substrate opposite to one side of the liquid crystal layer. Further, on each of the transparent substrates, a segment electrode or a common electrode may be formed in order to control the state of the liquid crystal. The liquid crystal layer is sealed by each transparent substrate and a sealing material. As shown in FIG. 1 , in the touch panel 1 , terminals (not shown) are respectively provided on the ends of the first transparent electrode 3 and the second transparent electrode 4 , and a plurality of strips are pulled out from the terminals. Pull out the wiring 11. In addition to silver, aluminum, chromium, copper, and molybdenum, an opaque metal wiring may be formed by using an alloy containing such a metal such as a Mo-Nb (molybdenum-niobium) alloy. The pull-out wiring 1 1 is connected to a control circuit (not shown) for applying voltage to the first transparent electrode 3 and the second transparent electrode 4 or detecting a touch position. In the touch panel 1 having the above configuration, a voltage is applied to the plurality of first transparent electrodes 3 and the second transparent electrodes 4 in order to impart electric charges. When a finger as a conductor touches any of the operation faces, the capacitor can be formed by capacitive coupling between the fingertip and the first transparent electrode 3 and the second transparent electrode 4. Therefore, it is possible to detect which position the finger touches by grasping the change of the electric charge at the contact position of the fingertip. Further, the touch panel 1 can selectively apply a voltage to either of the first transparent electrode 3 and the second transparent electrode 4 by control of a control circuit (not shown). At this time, an electric field is formed on the transparent electrode to which the voltage is applied, and when it is touched by a finger or the like in this state, the contact position is grounded via the electrostatic capacitance of the human body. As a result, a change in the resistance 产生 occurs between the terminal (not shown) of the target first transparent electrode 3 or the second transparent electrode 4 and the contact position. Since the resistance 呈 is proportional to the distance between the contact position and the terminal of the first transparent electrode 3 or the second transparent electrode 4 to be targeted, the control circuit can detect the contact position and become the first target. The current flowing between the terminals of the transparent electrode 3 or the second transparent electrode 4 is determined to obtain the coordinates of the contact position. In the touch panel 1 of the present embodiment, the effect of the metal oxide layer 5 provided on the first and second transparent electrodes 3 and 4 can suppress the electrode pattern from becoming conspicuous on the operation surface. Next, a method of manufacturing the touch panel 1 of the present embodiment will be described. Fig. 3 (a) to (d) are cross-sectional views showing the steps of a method of manufacturing the touch panel of the first example of the embodiment. First, a transparent substrate 2 such as a glass substrate is prepared. The substrate 2 can be cut into a desired shape and washed as necessary. Further, an intermediate layer of SiOx, SiNx, SiON or the like may be formed between the substrate 2 and the transparent conductive film. A transparent conductive film is then formed on one surface of the substrate 2. The transparent conductive film is, for example, ITO, and can be formed into a film at a thickness of from 1 Å to 200 nm by a sputtering method or a vacuum deposition method. Then, the transparent conductive film is contact-etched to form the first transparent electrode 3 and the second transparent electrode 4 in a state in which the etching mask shape -18-201231632 composed of a photosensitive resin or the like is formed on the upper layer side of the transparent conductive film. The pattern. The transparent conductive film substrate 14 shown in Fig. 3(a) can be obtained by removing the etching mask. Here, the second transparent electrode 4 is connected to the intersection portion 18 of the transparent conductive film substrate 14 via the connection portion, but the first transparent electrode 3 is separated. Next, on one side of the first transparent electrode 3 and the second transparent electrode 4, a photosensitive resin is applied, and then exposure development is performed to form an interlayer insulating film 19 on the connection portion of the second transparent electrode 4 (third Figure (b)). The photosensitive resin for forming the interlayer insulating film 19 is used to have transparency and heat resistance. For example, an acrylic resin or the like can be used. Further, when Si 2 is used to form the interlayer insulating film 19, the same structure can be formed by sputtering using a mask. After the transparent conductive film is formed on the interlayer insulating film 19, the transparent conductive film is uranium-etched while an etching mask made of a photosensitive resin or the like is formed on the surface of the transparent conductive film. Then, the etching mask is removed, and a bridge electrode 20 connecting the separated portions of the first transparent electrode 3 is formed on the upper layer of the interlayer insulating film 19. Thereby, the configuration shown in Fig. 3(c) can be obtained. The transparent conductive film formed on the interlayer insulating film 19 is, for example, an ITO film. In this case, the bridge electrode 20 is preferably formed of ITO. The aforementioned pull-out wiring 1 1 can be formed using silver ink or the like in a subsequent step. However, when the transparent conductive film is etched in the above step, the transparent conductive film may be left along the peripheral edges -19 to 201231632 of the outer periphery of the first transparent electrode 3 and the second transparent electrode 4 to form the pull-out wiring 1 1 . . Then, a coating film composition for forming a metal oxide layer is applied onto the first transparent electrode 3, the second transparent electrode 4, and the bridge electrode 20 by rapid dry printing. Here, the coating film composition is obtained by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of a metal salt (e.g., an aluminum salt), and then adding a precipitation preventing agent. Next, the substrate 2 on which the coating film of the coating film composition is formed is dried on, for example, a hot plate at 40 to 150 ° C (e.g., 60 ° C). Next, heating is performed in, for example, an oven at 100 to 300 ° C (e.g., 200 ° C), and a metal oxide layer 5 is formed on the first transparent electrode 3, the second transparent electrode 4, and the bridge electrode 20. Thereby, the touch panel substrate 30 shown in Fig. 3(d) can be obtained. Alternatively, the coating film on the substrate 2 may be dried on, for example, a hot plate, and then the coating film may be irradiated with ultraviolet rays and then heated in an oven. The touch panel 1 is formed by forming a pull-out wiring raft by silver ink or the like from a terminal (not shown) at the end portions of the first transparent electrode 3 and the second transparent electrode 4. The touch panel 1 is connected to a control circuit (not shown) of the touch panel via the pull-out wiring 11. The completed touch panel 1 is attached to the front surface of the display panel 10 by an adhesive layer 9 such as an acrylic transparent adhesive. At this time, alignment marks may be provided on the substrate 2 or the corners of the display panel 10 to perform alignment as necessary. In the touch panel 1 mounted on the display panel 10, by providing the metal oxide layer 5, the electrode patterns of the first transparent electrode 3 and the second transparent electrode 4 can be made difficult on the operation surface of the touch panel 1. The state being viewed. -20- 201231632 Next, a touch panel 丨〇 1 of another example of the present embodiment will be described. 4 and 5 are views showing a configuration of a touch panel according to a second example of the present embodiment, Fig. 4 is a plan view, and Fig. 5 is a cross-sectional view taken along line Β1-Β1· of Fig. 4. As shown in FIG. 4, the touch panel 101 has a transparent substrate 1 and 2, and a first transparent electrode 103 for detecting an X-direction coordinate formed on one side of the substrate 102, and for detecting The second transparent electrode 104 formed on the other surface of the substrate 丨02 in the Υ direction is formed. In the following description, one of the faces of the substrate 102 is above, and the other of the faces of the substrate 1〇2 is downward. Further, at this time, the other surface of the substrate 102 is a surface mounted on one side of the display panel 1 1 . The substrate 102 is a dielectric substrate. As the material of the substrate 102, glass 'acrylic resin, polyester resin, polyethylene terephthalate resin, polycarbonate resin, polyvinylidene chloride resin, polymethyl methacrylate resin, and polynaphthalene dicarboxylic acid can be used. A transparent material such as an ethylene glycol resin. It is particularly preferable to select a material having heat resistance and chemical resistance suitable for formation of the metal oxide layers 156 and 106 which will be described later. The thickness of the substrate 102 can be 0.1 mm to 2 mm when glass is used, and ΙΟμπι to 2000 μιτι when using a resin film. As shown in Fig. 4, the first transparent electrode 103 and the second transparent electrode 104 are each formed of a thin rectangular electrode. The first transparent electrode 1〇3 extends in the X direction, and the second transparent electrode 104 extends in the x direction, and is arranged in a strip shape at regular intervals. Further, the first transparent electrode 1 0 3 and the second transparent electrode 104 are arranged to be orthogonal to each other, and the entire shape is a checkered shape. The first transparent electrode 103 and the second transparent electrode 104 are formed using a transparent electrode material having a high transmittance and conductivity for at least -21 - 201231632. As the conductive electrode material having conductivity, for example, IT 0 or ZnO or the like can be used. When ITO is used, it is preferred to set the thickness to 5 to 100 nm to ensure sufficient conductivity. The first transparent electrode 103 and the second transparent electrode 104 can be selected from the material of the substrate 102 as the underlayer from the sputtering method, the vacuum deposition method, the ion deposition method, the spray method, the immersion method, or the CVD method. The most suitable method is formed. For example, there is a method in which a transparent electrode formed into a planar shape is formed by etching using a lithography technique, or a conductive sputum composed of the above material is dispersed in an organic solvent. And a method of directly forming a desired pattern by a printing method or the like. Therefore, in the step of forming the transparent electrode, it is important to control the film thickness with high precision. Therefore, in the formation, it is particularly preferable to select a method which can form a film having a desired film thickness and which can form a low-resistance film having good transparency. As shown in Figs. 4 and 5, a metal oxide layer 1〇5 is formed on the first transparent electrode 1〇3. The metal oxide layer 105 covers a formation region and a non-formation region of the first transparent electrode corresponding to a portion of the operation surface of the touch panel 101. Further, as shown in Fig. 5, a metal oxide layer 106 is also formed on the second transparent electrode 104 (lower side in the drawing). The metal oxide layer 106 covers a formation region and a non-formation region of the transparent electrode corresponding to a portion of the operation surface of the touch panel 101. The metal oxide layers 105 and 106 have high hardness and good adhesion to the first transparent electrode 103 and the second transparent electrode 104. -22- 201231632 The metal oxide layers 105 and 106 are formed by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of a metal salt (for example, an aluminum salt), and then adding a precipitation preventing agent. Coating film composition. The details of the coating composition will be described later. In the touch panel 101, according to the results of the discussion described in the column of the embodiment of the present specification, the refractive indices and film thicknesses of the metal oxide layers 105 and 106 are selected so that the first transparent electrode 103 and the second transparent electrode 104 are each The electrode pattern became unobtrusive. Specifically, the refractive indices of the metal oxide layers 105, 106 are preferably in the range of 1.5 Å to 1.7 Å, and particularly preferably in the range of 1.54 to 1.68. The film thickness is preferably in the range of 40 nm to 170 nm, respectively. When the refractive index of the metal oxide layers 105, 106 is 1.54 or more and less than 1.60, the film thickness is more preferably in the range of 60 nm to 150 nm. Further, when the refractive index of the metal oxide layers 1 0 5 and 1 0 6 is in the range of 1.60 or more and less than 1.68, the film thickness is more preferably in the range of 40 nm to 170 nm. At this time, in order to prevent conduction between the first transparent electrode 103 and the second transparent electrode 104, the metal oxide layers 105 and 106 are selected from a metal oxide layer having insulating properties and high visible light transparency. In the touch panel 101, the first transparent electrode 103 and the second transparent electrode 104 are, for example, ITO films having a thickness of 10 to 200 nm. In the touch panel 1A, the first transparent electrode 103 and the second transparent electrode 104 are each formed of, for example, an ITO film having a thickness of 28 nm, and the metal oxide layers 105 and 106 are made of aluminoxane and titanium alkoxide, respectively. The formed coating film composition was formed to have a refractive index of 1.6 and a film thickness of 80 nm. -23- 201231632 As shown in Fig. 5, an adhesive layer 1〇8 made of an acrylic transparent adhesive is provided on one surface of the substrate 102. Further, a cover film 1?7 composed of a transparent resin is adhered to the adhesive layer 108. In Fig. 4, the cover film 107 is omitted. The cover film 107 has a function as a protective film of the first transparent electrode 103 and the metal oxide layer 156. Instead of the cover film 107, a transparent resin may be applied. The adhesive layer 108 can be omitted at this time. On the other surface of the substrate 102, a display panel 110 is attached to the adhesive layer 109 made of an acrylic transparent adhesive. Although the details are omitted in Fig. 5, the display panel 110 may have the same configuration as a generally known display device. For example, in the case of a liquid crystal display device, the display panel 110 may have a structure in which a liquid crystal layer is sandwiched between two transparent substrates. A polarizing plate may be separately provided on a side of the transparent substrate opposite to one side of the liquid crystal layer. Further, on each of the transparent substrates, a segment electrode or a common electrode may be formed in order to control the state of the liquid crystal. The liquid crystal layer is sealed by the respective transparent substrates and the sealing material. In the touch panel 101, terminals (not shown) are respectively provided at the ends of the first transparent electrode 103 and the second transparent electrode 104, and a plurality of pull-out wirings are pulled out from the terminals (not shown) display). Pulling out the wiring can be an opaque metal wiring using silver, aluminum, chromium, copper, or an alloy containing the metals. The pull-out wiring is connected to a control circuit (not shown) for applying voltage to the first transparent electrode 103 and the second transparent electrode 104 or detecting a touch position. In the touch panel 101 having the above configuration, when the hand-24 - 201231632 as a conductor touches any one of the operation faces, the fingertip and the first 03 and the second transparent electrode 104 can be used. Electrostatic capacitive coupler. Therefore, it is possible to detect which place the finger touches by grasping the electric power at the contact position of the fingertip. In the touch panel 101, the electrode patterns on the metal oxide layers 105 and 106 provided on the first transparent electrode 103 electrode 104 can be prevented from becoming conspicuous. Fig. 6 is a cross-sectional view showing a touch panel of a third example of the embodiment. As shown in Fig. 6, the touch panel 201 is regarded as a first substrate, and a pole 203 is provided on the surface of the display panel 210. Further, a second transparent electrode 204 is provided on the second substrate 212 which is separately prepared. In the following description, the first surface is the upper side and the other side is the lower side. The other surface of the three-plate 212 is attached to the display panel 21. Although the details are omitted in the sixth drawing, the display panel has the same configuration as a generally known display device. For example, when the liquid is used, the display panel 210 may be configured to sandwich between two transparent substrates. A polarizing plate may be separately provided on one side of each of the transparent substrates in contact with the liquid crystal layer. Further, a state of liquid crystal on each of the transparent substrates can form a segment electrode or a common electrode. Liquid Each transparent substrate is sealed with a sealing material. The metal oxide layer oxide layer 205 is formed on the first transparent electrode 203 to cover the transparent electrode corresponding to the touch panel 201 to form a capacitance change, and the second transparent effect is applied to the display panel. 2 1 0 The surface of the first transparent electric circuit is on the side of one of the two substrates 212 and 第, the second base. 210 may have a crystal display device holding the opposite side of the liquid crystal layer, in order to control the crystal layer by 205. Part of the metal surface -25- 201231632 The formation area and non-formation area of the transparent electrode. Similarly, a metal oxide layer 206 is also formed on the second transparent electrode 204. The metal oxide layer 060 covers a formation region and a non-formation region of the transparent electrode on the portion corresponding to the operation surface of the touch panel 201. The metal oxide layers 205 and 206' have high hardness and are excellent in adhesion to the first transparent electrode 203 and the second transparent electrode 204. When the metal oxide layers 2 05 and 206 are formed, a metal alkoxide is hydrolyzed and condensed in an organic solvent in the presence of a metal salt (for example, an aluminum salt), and then a precipitation preventing agent is added to obtain a coating film. Composition. The details of the coating composition will be described later. In the touch panel 201, the refractive index and the film thickness of the metal oxide layers 205 and 206 are selected so that the first transparent electrode 203 and the second transparent electrode 204 are each selected according to the results of the discussion in the column of the embodiment of the present specification. The electrode pattern becomes inconspicuous. Specifically, the refractive indices of the metal oxide layers 205 and 206 are preferably in the range of 1.50 to 70, and particularly preferably in the range of 1.54 to 1.68. The film thickness is preferably in the range of 40 nm to 170 nm, respectively. When the refractive index of the metal oxide layers 205, 206 is 1.54 or more and less than 1.60, the film thickness is more preferably in the range of 60 nm to 150 nm. Further, when the refractive index of the metal oxide layers 205, 206 is in the range of 1.60 or more and less than 1.68, the film thickness is more preferably in the range of 40 nm to 170 nm. At this time, in order to prevent conduction between the first transparent electrode 203 and the second transparent electrode 204, the metal oxide layers 205 and 206 are selected from a metal oxide layer having insulating properties and high visible light transparency. In the touch panel 201, the first transparent electrode 203 and the second transparent electrode -26-201231632 204 are, for example, ITO films each having a film thickness of 10 to 200 nm. In the touch panel 201, the first transparent electrode 2〇3 and the second transparent electrode 204 are each formed of, for example, a ruthenium film having a thickness of 28 nm, and the metal oxide layers 205 and 206 are made of a lanthanum alkoxide and a titanium alkoxide, respectively. The formed coating film composition was formed to have a refractive index of 1.6 and a film thickness of 80 nm. As shown in Fig. 6, an adhesive layer 208 made of an acrylic transparent adhesive is provided on one of the surfaces of the second substrate 212. Further, a cover film 207 made of a transparent resin is adhered to the adhesive layer 208. The cover film 207 has a function as a protective film. A cover film 207 may be replaced by a transparent resin. The adhesive layer 208 can be omitted at this time. The first transparent electrode 203, the second transparent electrode 204, and the like are the same as those described in Figs. 4 and 5. In the touch panel 201, the effect of the metal oxide layers 205 and 206 provided on the first transparent electrode 203 and the second transparent electrode 204 can suppress the electrode pattern from becoming conspicuous on the operation surface. Fig. 7 is a cross-sectional view showing the schematic configuration of a touch panel of a fourth example of the embodiment. As shown in Fig. 7, in the touch panel 301, the display panel 310 is regarded as a first substrate, and the first transparent electrode 303 is provided on the surface of the display panel 310. Further, a second transparent electrode 304 is provided on one of the surfaces of the second substrate 312 which is separately prepared. In the following description, one of the surfaces of the second substrate 312 is below and the other surface is upward. Further, the other surface of the second substrate 312 is one surface of the touch panel 301. -27- 201231632 Although the details are omitted in Fig. 7, the display panel 310 may have the same configuration as a generally known display device. For example, in the case of a liquid crystal display device, the display panel 310 may have a structure in which a liquid crystal layer is sandwiched between two transparent substrates. A polarizing plate may be separately provided on a side of the transparent substrate opposite to one side of the liquid crystal layer. Further, on each of the transparent substrates, a segment electrode or a common electrode may be formed in order to control the state of the liquid crystal. The liquid crystal layer is sealed by the respective transparent substrates and the sealing material. A metal oxide layer 305 is provided on the first transparent electrode 303. The metal oxide layer 305 covers a formation region and a non-formation region of the transparent electrode on a portion corresponding to the operation surface of the touch panel 301. Similarly, a metal oxide layer 306 is also formed on the second transparent electrode 3〇4 (shown as a lower side in Fig. 7). The metal oxide layer 306 covers a formation region and a non-formation region of the transparent electrode on the portion corresponding to the operation surface of the touch panel 301. The metal oxide layers 305 and 306 have high hardness and are excellent in adhesion to the first transparent electrode 303 and the second transparent electrode 304. When the metal oxide layers 305 and 306 are formed, the metal alkoxide is hydrolyzed and condensed in an organic solvent in the presence of a metal salt (for example, an aluminum salt), and then a precipitation inhibitor is added thereto. Membrane composition. The details of the coating composition will be described later. Between the metal oxide layer 305 and the metal oxide layer 306, an adhesive layer 308 composed of an acrylic transparent adhesive is provided. The second substrate 312 is attached to the display panel 310 by the adhesive layer 308'. In the touch panel 310, according to the results of the discussion in the column of the embodiment of the present specification, the refractive indices of the metal oxide layers 305 and 306 and the film thickness of -28-201231632 are selected to make the first transparent electrode 303 and the first transparent electrode 303 2 The electrode patterns of the transparent electrodes 3〇4 become inconspicuous. Specifically, the refractive indices of the metal oxide layers 305 and 306 are preferably in the range of 1.5 to 1 · 70, and particularly preferably in the range of 1.54 to 1.68. The film thickness is preferably in the range of 40 nm to 170 nm, respectively. When the refractive index of the metal oxide layers 305, 306 is 1.54 or more and less than 1.60, the film thickness is more preferably in the range of 60 nm to 150 nm. Further, when the refractive index of the metal oxide layers 305, 306 is in the range of 1.60 or more and less than 1.68, the film thickness is more preferably in the range of 40 nm to 170 nm. At this time, in order to prevent conduction between the first transparent electrode 303 and the second transparent electrode 309, the metal oxide layers 305 and 306 are also selected from a metal oxide layer having insulating properties and high visible light transparency. In the touch panel 301, the first transparent electrode 303 and the second transparent electrode 304 are, for example, ITO films each having a film thickness of 10 to 200 nm. In the touch panel 301, the first transparent electrode 303 and the second transparent electrode 304 are each formed of, for example, an ITO film having a thickness of 28 nm, and the metal oxide layers 305 and 306 are respectively prepared by using an alkoxyus oxide and a titanium alkoxide. The film composition was formed to have a refractive index of 1.6 and a film thickness of 80 nm. In the touch panel 301, the effect of the metal oxide layers 305 and 306 provided on the first transparent electrode 303 and the second transparent electrode 308 can suppress the electrode pattern from becoming conspicuous on the operation surface. Fig. 8 is a cross-sectional view showing the schematic configuration of a touch panel of a fifth example of the embodiment. As shown in FIG. 8, the touch panel 401 has a transparent substrate 402. The first transparent electrode 403 and the second transparent electrode 404 are provided on the upper layer of the substrate 402 to detect the positions -29 - 201231632 of the two different directions. The first transparent electrode 403 and the second transparent electrode 404 are formed using a transparent electrode material having a high transmittance and a conductivity at least for visible light. As the transparent electrode material having conductivity, for example, IT Ο or ZnO can be used. When ITO is used, it is preferable to set the thickness to 5 to 100 nm to ensure sufficient conductivity. The first transparent electrode 403 and the second transparent electrode 404 can be considered from a sputtering method, a vacuum deposition method, an ion deposition method, a spray method, a immersion method, a CVD method, or the like, to a transparent substrate 402 as a bottom layer or a protection described later. Layer 407 is formed by selecting the optimum method. For example, there is a method in which a transparent electrode formed into a planar shape is formed by etching using a lithography technique, or a conductive sputum composed of the above material is dispersed in an organic solvent. And a method of directly forming a desired pattern by a printing method or the like. In the step of forming the transparent electrode, it is important that the film thickness is controlled with high precision. Therefore, in the formation of the transparent electrode, it is particularly preferable to select a method of forming a film having a desired film thickness and forming a low-resistance film having good transparency. As shown in FIG. 8, the first transparent electrode 403 is disposed on the substrate 402. A metal oxide layer 405 is formed on the first transparent electrode 403. The metal oxide layer 405 covers a formation region and a non-formation region of the first transparent electrode 403 on a portion corresponding to the operation surface of the touch panel 401. A protective layer 407 is disposed on the metal oxide layer 405. The protective layer 407 is made of an acrylic resin having high transparency. As shown in Fig. 8, the second transparent electrode 404 is disposed on the protective layer 407 -30-201231632. A metal oxide layer 406 is formed on the second transparent electrode 404. The metal oxide layer 406 covers a formation region and a non-formation region of the transparent electrode on a portion corresponding to the operation surface of the touch panel 401. The metal oxide layers 40 5 and 406 have high hardness and good adhesion to the first transparent electrode 403 and the second transparent electrode 404. When the metal oxide layers 405 and 406 are formed, a composition of a coating film obtained by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of a metal salt (for example, an aluminum salt) and then adding a precipitation preventing agent is used. Things. The details of the coating composition will be described later. In the touch panel 401, according to the results of the discussion described in the column of the embodiment of the present specification, the refractive indices and film thicknesses of the metal oxide layers 405 and 406 are selected such that the first transparent electrode 403 and the second transparent electrode 404 are each The electrode pattern became unobtrusive. Specifically, the refractive indices of the metal oxide layers 405 and 406 are preferably in the range of 1.50 to 1.70, and particularly preferably in the range of 1.54 to 1.68. The film thickness is preferably in the range of 40 nm to 170 nm, respectively. When the refractive index of the metal oxide layers 405, 406 is 1.54 or more and less than 1.60, the film thickness is more preferably in the range of 60 nm to 15 nm. Further, when the refractive index of the metal oxide layers 405, 406 is in the range of 1.60 or more and less than 1.68, the film thickness is more preferably in the range of 40 nm to 170 nm. At this time, in order to prevent conduction between the first transparent electrode 403 and the second transparent electrode 404, the metal oxide layers 4〇5 and 4〇6 are also selected from a metal oxide layer having insulating properties and high visible light transparency. In the touch panel 401, the first transparent electrode 403 and the second transparent electrode 404 are, for example, ITO films each having a film thickness of 10 to 200 nm. In the touch panel-31 - 201231632, the first transparent electrode 403 and the second transparent electrode 4〇4 are respectively formed of an ITO film having a film thickness of 28 nm, and the metal oxide layers 405 and 406 are respectively made of an alkane. The composition of the coating film prepared by cerium oxide and titanium alkoxide was 1.60, and the film thickness was 80 nm. As shown in Fig. 8, an adhesive layer 408 made of an acrylic transparent adhesive is provided on the surface of the metal oxide layer 406. The touch panel 401 is provided with the display panel 110 with the adhesive layer 40 8 interposed therebetween. In the touch panel 401 having the above configuration, when a finger as a conductor touches any of the operation surfaces, electrostatic coupling between the fingertip and the first transparent electrode 403 and the second transparent electrode 404 can be performed. To form a capacitor. Therefore, it is possible to detect which position the finger touches by grasping the change in the charge at the contact position of the fingertip. In the touch panel 401, the effect of the metal oxide layers 405 and 406 provided on the first transparent electrode 403 and the second transparent electrode 404 can suppress the electrode pattern from becoming conspicuous on the operation surface. The touch panel of this embodiment will be described above, but the present invention is not limited to the above embodiment. For various types of touch panels using transparent electrodes such as ITO, the above effects can be obtained by providing a metal oxide layer having a refractive index and a film thickness which are strategically selected on the transparent electrode. Next, a coating film composition for forming a metal oxide layer will be described. <Coating film composition> The coating film composition for forming a metal oxide layer is obtained by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of a metal salt, and then adding -32-201231632 to prevent precipitation The coating composition obtained by the agent. Examples of the metal alkoxide used in the coating composition include bismuth (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (A1), and magnesium (Mg). Alkoxides of metals such as tin (Sn) and zinc (Zn). In view of the ease of storage and the storage stability of the coating film composition, at least one selected from the group consisting of alkoxides, partial condensates of alkoxides, and titanium alkoxides is preferred. The coating film composition is a coating film composition obtained by hydrolyzing and condensing these metal alkoxides in an organic solvent in the presence of a metal salt as described above. This coating film composition contains an addition precipitation inhibitor. The precipitation preventing agent has an effect of preventing metal salt from being precipitated in the coating film when the coating film is formed. When the titanium oxide component is contained in the coating film composition, it is preferred to contain an alkylene glycol or a monoether thereof which has an effect of stabilizing the titanium alkoxide component in an organic solvent. When a coating film composition containing a titanium alkoxide component is produced, in order to stabilize the titanium alkoxide component and improve the storage stability of the coating film composition, the titanium alkoxide and the alkylene glycol or its monoether are mixed. After the stabilization is achieved, the titanium alkoxide is used alone or mixed with an alkane oxyhydroxide and hydrolyzed and condensed in the presence of a metal salt. When the coating composition contains two components of a titanium alkoxide and an alkoxylated cerium oxide, it is preferred to hydrolyze the alkoxylated cerium in the presence of a metal salt, and then mix the previously mixed alkanediol or its monoether to achieve Stabilized titanium alkoxide. The metal alkoxide used in the coating film composition is represented by the general formula (I). -33- 201231632 Μ( 〇R ) η ") (wherein Μ represents a metal, R represents an alkyl group of C1 to C 5 , and η represents a valence of ruthenium). In particular, an alkoxylated ruthenium or a partial condensate thereof, At least one or two or more kinds of the compounds represented by the general formula (III) and at least a partial condensate (pentamer or less) are used! Species

Si (OR,)4 ( ΙΠ ) (wherein R' represents an alkyl group of C1 to C5), and the titanium alkoxide or a partial condensate thereof is one selected from the group consisting of a compound represented by the general formula (IV) or At least one of two or more kinds of partial condensates (pentamer or less). T i ( 〇 R " ) 4 (IV) (wherein R" represents an alkyl group of C1 to C5) The metal salt used in the coating film composition is exemplified by a compound represented by the general formula (II). At least one.

M2 ( X) m (ID (where m2 represents a metal, and X represents chlorine, nitric acid, sulfuric acid, acetic acid, oxalic acid, sulfamic acid, sulfonic acid, acetoacetic acid, acetylpyruvate or an alkaline salt thereof, m The metal salt used in the above-mentioned coating film composition is particularly preferably contained in at least one selected from the compounds represented by the following general formula (II-1) and in the following formula (Π-1). The oxalate salt of the metal used. M2 ( X ) m ( II-1 ) (wherein M2 represents metal, χ represents chlorine, nitric acid, sulfuric acid 'B-34- 201231632 acid, sulfamic acid, sulfonic acid, B Indole acetic acid, acetylpyruvate or such basic salt, m represents the valence of M2. The metal M2 of the metal salt represented by the above general formula (II) is preferably selected from aluminum (A1) 'indium ( At least one of the group consisting of In ), zinc (Zn ), zirconium (Zr ), bismuth (Bi ), lanthanum (La ), lanthanum (Ta ), yttrium (Y ), and cerium (Ce ). Among the compounds, metal nitrates, metal chloride salts, metal oxalates, and basic salts thereof are particularly preferred. Among them, ease of availability and storage stability of the coating composition are obtained. From the viewpoint of the above, metal nitrates such as aluminum, indium, and antimony are preferable. Examples of the organic solvent used in the coating composition include methanol, ethanol, n-propanol, isopropanol, n-butanol, and the like. Alcohols such as butanol and tertiary butanol; esters such as ethyl acetate; glycols such as ethylene glycol and ester derivatives thereof; ethers such as diethyl ether; acetone, methyl ethyl ketone and cyclohexanone a ketone or an aromatic hydrocarbon such as benzene or toluene, etc., which may be used singly or in combination. When the coating film composition contains a titanium alkoxide component, the alkylene glycol contained in the organic solvent or Examples of the monoether include ethylene glycol, diethylene glycol, propylene glycol, hexanediol, and the like monomethyl, monoethyl, monopropyl, monobutyl or monophenyl ether. The alkanediol or its monoether contained in the organic solvent used in the material, the molar ratio is less than 1 with respect to the titanium alkoxide, and the effect on the stability of the titanium alkoxide is low. The storage stability of the coating composition is deteriorated. On the other hand, there is no problem in using a large amount of an alkanediol or a monoether thereof. For example, all of the organic solvents used in the coating film composition may be the above-mentioned alkanediols or their monoethers. However, when the coating film composition does not contain the titanium alkoxide, it is not particularly required to contain the above. The alkanediol and/or its monoether. The precipitation preventive agent contained in the coating film composition prevents the metal salt from being deposited in the coating film when the coating film is formed. The precipitation preventing agent is selected from the group consisting of N- At least one of a group consisting of methyl-pyrrolidone, dimethylformamide, dimethylacetamide, ethylene glycol, diethylene glycol 'propylene glycol, hexanediol, and the like At least one of these may be used. When the metal of the metal salt is converted into a metal oxide, the precipitation preventive agent is used in a ratio of (precipitation preventing agent) / (metal oxide) 2 1 (weight ratio). When the weight ratio is less than 1, the effect of preventing the precipitation of the metal salt when the coating film is formed is small. On the other hand, when a large amount of the precipitation preventing agent is used, there is no influence on the coating film composition. a precipitating agent which can be added in the presence of a metal salt to hydrolyze and condense a metal alkoxide, particularly an alkoxide, a titanium alkoxide, or an alkoxide and a titanium alkoxide, or to terminate the hydrolysis and condensation reaction. After adding. The content ratio of the metal atom (Vh) of the metal alkoxide contained in the coating composition to the metal atom (m2) of the metal salt is preferably satisfied by the molar ratio of 0.7.ΟΙ^ΜίΜΜ, + Μζ) $0.7 relationship. When the enthalpy is less than 0.01, the mechanical strength of the obtained film is insufficient, which is not preferable. On the other hand, when the yttrium exceeds 0.7, the adhesion of the metal oxide layer to the substrate such as the glass substrate or the transparent electrode is lowered. Further, when sintering at a low temperature of 450 ° C or lower, the chemical resistance of the obtained metal oxide layer tends to decrease. When the metal atom of the metal alkoxide contained in the coating film composition has a plurality of kinds, the metal atom (M!) means a total of -36 - 201231632 metal atoms, and in addition, when the coating film composition When there are a plurality of metal atoms of the metal salt contained in the metal salt, the metal atom (M2) means a total of a plurality of metal atoms. When the metal alkoxide and the metal salt are converted into a metal oxide in terms of the solid content concentration in the coating film composition, the solid content is preferably in the range of 0.5 to 20% by weight. When the solid content exceeds 20% by weight, the storage stability of the coating film composition is deteriorated, and the film thickness control of the metal oxide layer becomes difficult. On the other hand, when the solid content is 0.5 wt% or less, the thickness of the obtained metal oxide layer becomes thin, and in order to obtain a predetermined film thickness, a plurality of coatings are required. The coating film composition is obtained by hydrolyzing and condensing a metal alkoxide represented by M(OR) in an organic solvent in the presence of a metal salt (for example, an aluminum salt). Alkylene oxide, titanium alkoxide, or Is the amount of water used in the hydrolysis of alkoxides and titanium alkoxides, in terms of molar ratios of alkoxides, titanium alkoxides, or total moles of alkoxides and titanium alkoxides. It is preferably 2 to 24. More preferably 2 to 20. When the molar ratio (the amount of water (mole) / (the total number of moles of metal alkoxide)) is 2 or less, the hydrolysis of the metal alkoxide If it is insufficient, the film formability is lowered or the strength of the obtained metal oxide film is lowered, which is not preferable. When the molar ratio is more than 24, the polycondensation continues and the storage stability is lowered, so that it is not satisfactory. The same applies to the use of other metal alkoxides. In addition, when other metal alkoxides are used, the same conditions are preferably selected for the addition of water. In the hydrolysis process during the preparation of the coating film composition, when coexisting metal salts - 37- 201231632 (eg aluminium salt) is an aqueous salt due to the water content Will participate in the reaction, so the amount of water used in the hydrolysis, it is necessary to consider the moisture content of the metal salt (such as aluminum salt). The coating film composition is made by hydrolyzing and condensing the metal alkoxide, so it can be The refractive index of the obtained metal oxide layer is adjusted within a predetermined range by selecting the composition of the metal alkoxide. For example, when alkoxide and titanium alkoxide are selected as the metal alkoxide, the mixing ratio is adjusted. The refractive index of the obtained metal oxide layer can be adjusted within a predetermined range to be described later, specifically, in the range of 1.45 to 2.1. In other words, the metal oxide layer after coating and sintering the coating film composition When the required refractive index is determined, the compositional molar ratio of the alkoxide and the titanium alkoxide can be determined according to the refractive index. The composition molar ratio can be any enthalpy, for example, by hydrolyzing only the alkoxylated cerium oxide. The refractive index of the metal oxide layer of the coating film composition is about 1.45. Further, the refractive index of the metal oxide layer of the coating film composition obtained by only hydrolyzing the titanium alkoxide is about Therefore, when the refractive index of the metal oxide layer is set to be between 1.45 and 2.1, the refractive index 该 in the range can be matched, and the alkoxide and the titanium alkoxide are used in a predetermined ratio. To produce a coating film composition. In addition, when other metal alkoxides are used, the refractive index of the obtained metal oxide layer can be adjusted. Further, for the refractive index of the metal oxide layer, in addition to the composition conditions, The film formation conditions are selected for adjustment, whereby the high hardness of the metal oxide layer can be achieved, and the desired refractive index 値 can be achieved. -38- 201231632 That is, the coating film of the composition of the coating film is used to produce a metal oxide. In the case of the layer, the refractive index of the metal oxide layer also fluctuates depending on the sintering temperature. At this time, the higher the sintering temperature, the higher the refractive index of the metal oxide layer. Therefore, by selecting the sintering temperature at The refractive index of the resulting metal oxide layer can be adjusted by appropriate enthalpy. Considering the heat resistance of the constituent members of other touch panels, the sintering temperature is preferably in the range of 100 ° C to 300 ° C, and particularly preferably in the range of 150 ° C to 250 ° C. Further, when the coating film composition contains the titanium alkoxide, the refractive index of the metal oxide layer also changes when ultraviolet rays (UV) are applied to the coating film before sintering. Specifically, the more the ultraviolet irradiation amount, the more the refractive index of the metal oxide layer can be increased. Therefore, in order to achieve a predetermined refractive index, it is possible to select whether or not the irradiation of ultraviolet rays is irradiated. In the metal oxide layer, when a desired refractive index can be achieved by selection of conditions such as composition, ultraviolet irradiation may not be performed. Further, when ultraviolet irradiation is performed, the refractive index of the metal oxide layer can be adjusted by selecting the irradiation amount. In the metal oxide layer, when ultraviolet irradiation is required in order to obtain a desired refractive index, for example, a high pressure mercury lamp can be used. When a high-pressure mercury lamp is used, it is preferable to irradiate all of the light with an irradiation amount of 100 mJ/cm2 or more in terms of 3 65 nm, and particularly preferably an irradiation amount of 3000 mJ/cm 2 to 1 μm J/cm 2 . In addition, the UV light source is not specified, and other UV light sources can be used. When using other UV light sources, it is only necessary to illuminate the same amount of light as when using the above-mentioned high-pressure mercury lamp. However, especially when the coating film composition contains a titanium alkoxide component, it has a property of gradually increasing viscosity at room temperature. Although there is no doubt about the problem of the large -39-201231632, it is necessary to strictly control the temperature and the like when precisely controlling the thickness of the metal oxide layer. The increase in the viscosity is remarkable as the composition ratio of the titanium alkoxide in the coating composition increases. This can be considered to be that the hydrolysis rate of the titanium alkoxide is larger than that of the alkoxide, and the condensation reaction is rapid. When the composition of the coating film contains a titanium alkoxide component, the following two methods are effective in order to reduce the change in viscosity. 1) When the alkoxide is hydrolyzed in the presence of a metal salt, the diol and the titanium alkoxide are sufficiently mixed in advance, and then it is necessary to carry out hydrolysis in the presence of an organic solvent in the presence of an organic solvent. Thereby, a coating composition having a small change in viscosity can be obtained. 1) The method of preparation is effective, and can be considered as follows: since the titanium alkoxide and the diol are exothermic when mixed, a transesterification reaction is caused between the alkoxy group of the titanium alkoxide and the diol, so that relative to Hydrolysis and condensation reactions can be stabilized. 2) The alkoxylated oxime is subjected to a hydrolysis reaction in the presence of a metal salt, and then mixed with a solution of a titanium alkoxide mixed with a diol to carry out a condensation reaction to obtain a coating film composition. Thereby, a coating composition having a small change in viscosity can be obtained. 2) The method of production is effective, and can be considered as follows. That is, although the hydrolysis reaction of ruthenium oxide is carried out at a relatively fast rate, the subsequent condensation reaction is relatively slow as compared with the titanium alkoxide. Therefore, when the titanium alkoxide is rapidly added after the completion of the hydrolysis reaction, the decyl group of the alkoxylated oxime after the hydrolysis reaction is uniformly reacted with the titanium alkoxide. Thereby, the condensation reactivity of the titanium alkoxide can be stabilized by the alkoxylated oxime after the hydrolysis reaction -40 - 201231632. Attempts have been made to develop a method of mixing pre-hydrolyzed alkoxylated hafnium with titanium alkoxide. However, when the organic solvent used in the reaction does not contain a diol, a coating film composition having storage stability cannot be obtained. Further, the method shown in 2) is also useful for obtaining a coating film composition from other metal alkoxides having a faster hydrolysis rate and acridine oxide. The coating film composition described above can be formed into a film by a coating method generally employed, and then a metal oxide layer can be formed. As the coating method, for example, a dip coating method, a spin coating method, a spray coating method, a brush coating method, a roll transfer method, a screen printing method, an inkjet method, or a quick-drying printing method can be used. Among them, the inkjet method and the quick-drying printing method suitable for pattern printing are particularly preferred. EXAMPLES Hereinafter, the present invention will be described in more detail based on the examples, but the present invention is not limited thereto. [Abbreviated as used in the examples] The abbreviations used in the following examples and the like are as follows. • TEOS: tetraethoxy decane • TIPT: titanium tetraisopropoxide • ZTB: tetra-n-butyl yttrium oxide • AN: aluminum nitrate nonahydrate • CeN: cerium nitrate hexahydrate • InN: indium nitrate trihydrate 201231632 • Eg : ethylene glycol. HG : 2-methyl-2,4-pentanediol (other name: hexanediol) • BCS : 2-butoxyethanol (other name: butyl cellosolve) <Synthesis Example 1 > ( Synthesis of Coating Film Composition K1) AN 12.8 g of AN and 3.0 g of water were placed in a 200 mL flask and stirred to obtain an aqueous AN solution. EG 13.7 g, HG 48.8 g, BCS 37.1 g, and TEOS 31.1 g as an alkoxylated hafnium were added to the aqueous AN solution, and stirred at room temperature for 30 minutes to obtain a liquid A. 4.7 g of TIPT as a titanium alkoxide was placed in a 300 mL-volume flask. 48.8 g of HG was added thereto, and stirred at room temperature for 30 minutes to obtain a solution B. Then, the above liquid A and liquid B were mixed, and stirred at room temperature for 30 minutes. Thereby, the coating film composition K 1 was obtained. <Synthesis Example 2 > (Synthesis of Coating Film Composition K2) 12.1 g of AN and 2.8 g of water were placed in a 200 mL flask and stirred to obtain an aqueous AN solution. 23.7 g of EG, 57.7 g of HG, 37.2 g of BCS, and 22.9 g of te〇S as acridine oxide were added to the aqueous solution of AN, and stirred at room temperature for 3 minutes to obtain a liquid C. 13.4 g of TIPT as a titanium alkoxide was placed in a 300 mL flask. 40.2 g of HG was added thereto, and stirred at room temperature for 30 minutes to obtain a D solution. Then, the above liquid C and liquid D were mixed, and stirred at room temperature for 30 minutes - 42 - 201231632 minutes. Thereby, the coating film composition K2 was obtained. <Synthesis Example 3 > (Synthesis of Coating Film Composition Κ3) 11.7 g of AN and 2.8 g of water were placed in a 200 mL flask and stirred to obtain an aqueous AN solution. EG 13.7 g, HG 46.0 g, BCS 37.3 g, and TEOS 19.1 g as an alkoxylated hafnium were added to the aqueous AN solution, and stirred at room temperature for 30 minutes to obtain an E liquid. 17.4 g of TIPT as a titanium alkoxide was placed in a 300 mL-volume flask, and 52.1 g of HG was added thereto, and stirred at room temperature for 30 minutes to obtain an F liquid. Then, the above E liquid and F liquid were mixed, and stirred at room temperature for 30 minutes. Thereby, the coating film composition K3 was obtained as a metal alkoxide. <Synthesis Example 4 > (Synthesis of Coating Film Composition K4) 1.5 g of AN 1 and 2.7 g of water were placed in a 200 mL flask and stirred to obtain an aqueous AN solution. EG 13.7 g, HG 34.5 g, BCS 37.3 g, and TEOS 15.6 g as an alkoxylated hafnium were added to the aqueous AN solution, and stirred at room temperature for 30 minutes to obtain a G liquid. 21.2 g of TIPT as a titanium alkoxide was placed in a 300 mL-volume flask, and 63.6 g of HG was added thereto, and stirred at room temperature for 30 minutes to obtain a mash. Then, the above G liquid and mash were mixed, and stirred at room temperature for 30 minutes. Thereby, the coating film composition Κ4 was obtained. -43-201231632 <Synthesis Example 5 > (Synthesis of Coating Film Composition K4-1) 9.2 g of InN and 2.3 g of water were placed in a flask of a volume of 20 mL to be stirred to obtain an aqueous solution of InN. EG 14.6 g, HG 41.6 g, BCS 39.5 g, and TEOS 15_9 g as an alkoxylated hafnium were added to the InN aqueous solution, and stirred at room temperature for 30 minutes to obtain a liquid I. TIPT M. 4g as a titanium alkoxide was placed in a 300 mL-volume flask, and 62.4 g of HG was added thereto, and stirred at room temperature for 30 minutes to obtain a liquid J. Then, the above I liquid and J liquid were mixed, and stirred at room temperature for 30 minutes. Thus, the coating film composition K4-1 was obtained as a metal alkoxide. <Synthesis Example 6> (Synthesis of Coating Film Composition K4-2) 10.3 g of CeN and 2.1 g of water were placed in a 200 mL flask and stirred to obtain a CeN aqueous solution. EG 14.7 g, HG 42.1 g, BCS 4 〇.〇g, and TEOS 14.5 g as an alkoxylated hafnium were added to the CeN aqueous solution, and stirred at room temperature for 30 minutes to obtain a K solution. 13.2 g of TIPT as a titanium alkoxide was placed in a flask having a capacity of 300 mL, and 62.4 g of HG was added thereto, and stirred at room temperature for 30 minutes to obtain an L solution. Then, the above K liquid and L liquid were mixed, and stirred at room temperature for 30 minutes. Thus, the coating film composition K4_2 was obtained as a metal alkoxide. <Synthesis Example 7> (Synthesis of Coating Film Composition Κ4-3) 8.5 g of AN and 2.0 g of water were placed in a 200 mL-volume flask and stirred at -44 to 201231632 to obtain an aqueous AN solution. EG 14.3 g, 40.8 g of HG, 38.7 g of BCS, and 9.2 g of TEOS as acridine oxide were added to the aqueous solution of AN, and stirred at room temperature for 30 minutes to obtain M solution. 25.4 g of ZTB as acridine oxide was placed in a 300 mL-volume flask, and 1.2 g of HG 6 was added thereto, and stirred at room temperature for 30 minutes to obtain N solution. Next, the above mash and N solution were mixed, and stirred at room temperature for 30 minutes. Thus, the coating film composition Κ4-3 was obtained as a metal alkoxide. <Synthesis Example 8 > (Synthesis of Coating Film Composition Κ5) 15.5 g of AN and 8.9 g of water were placed in a 300 mL flask and stirred to obtain an AN aqueous solution. EG 13.0 g, HG 93.0 g, BCS 35.3 g, and TEOS 34.3 g as a lanthanum alkoxide were added to the aqueous AN solution, and the mixture was stirred at room temperature for 30 minutes to obtain a coating film composition K5. <Synthesis Example 9 > (Synthesis of Coating Film Composition K6) 11.2 g of AN and 2.6 g of water were placed in a 200 mL-capacity flask and stirred to obtain an AN aqueous solution. EG 13.7 g, HG 23.9 g, BCS 3 7.4 g, and teOS 12.1 g as an alkoxylated hafnium were added to the aqueous AN solution, and stirred at room temperature for 30 minutes to obtain a liquid I. 24.8 g of TIPT as a titanium alkoxide was placed in a flask having a capacity of 300 mL. Here, H G 7 4.4 g was added thereto, and the mixture was stirred at room temperature for 30 minutes to obtain a liquid J. -45-201231632 Next, the above liquid I and liquid J were mixed, and stirred at room temperature for 30 minutes. Thereby, the coating film composition Κ6 was obtained. Next, an example of a film forming method in which a metal oxide layer is formed by using the above-mentioned coating film compositions Κ1 to Κ6 will be described. A method of forming an acrylic film as a comparative object of a metal oxide layer on a substrate will also be described. <Film formation method 1> Using the above-mentioned coating film composition, pressure filtration was carried out using a membrane filter having a pore size of 5 μm, and a coating film was formed on a substrate by a spin coating method. The substrate was heated on a hot plate set at 60 ° C for 3 minutes to dry. Then, it was transferred to a hot air circulating oven set at 200 °C for 30 minutes. Thus, the metal oxide film is formed on the substrate (i.e., the metal oxide layer is also referred to as a metal oxide film, the same applies hereinafter). <Film Forming Method II> Using the above coating film composition, a film filter having a pore diameter of 0.5 μm was subjected to pressure filtration, and a coating film was formed on a substrate by a spin coating method. The substrate was heated on a hot plate set at 60 ° C for 3 minutes to dry. Then, using a UV irradiation device (Model UB 011-3A, manufactured by Eye Graphics Co., Ltd.) and using a high-pressure mercury lamp (input power supply l〇〇〇W), the ultraviolet light was irradiated for 2 minutes at a light intensity of 50 mW/cm 2 (converted at a wavelength of 3 65 nm). . The amount of ultraviolet irradiation was 6000 mJ/cm2. After the ultraviolet irradiation, the mixture was transferred to a hot air circulating oven set at 200 ° C for 30 minutes of sintering. In this manner, the metal oxide film is formed on the substrate. -46-201231632 <Film formation method ΠΙ> The film formation method III is a method of forming an acrylic film to be compared as a metal oxide film on a substrate. The acrylic material composition (K 7 ) for forming an acrylic film was subjected to pressure filtration using a membrane filter having a pore size of 5 μm, and a coating film was formed on the substrate by a spin coating method. The substrate was heated on a hot plate set at 90 °C for 2 minutes to dry. Then, it was transferred to a hot air circulating oven set at 200 ° C for 30 minutes of sintering. Thus, the acrylic acid film was formed on the substrate. K ~ 11 K grouping> The upper rate of the film evaluation is evaluated by using the film-forming substrate as the substrate. The film forming method I, the film forming method, or the film forming method III are applied to make the metal oxide. Membranes (KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3, ΚΜ1 and ΚΜ2) were formed on the ruthenium substrate. Further, the acrylic material composition Κ7 was used, and the ruthenium substrate (100) was used as the substrate. The above-mentioned film formation method III was applied to form an acryl film (ΚΜ3) on the ruthenium substrate. Using these substrates, the refractive index at a wavelength of 633 nm was measured using an elliptical thickness gauge (DVA-FLVW manufactured by Gully Optical Co., Ltd.). The first table shows the evaluation results of the refractive indices of the metal oxide films (KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3, KM1, and KM2) and the acrylic film (KM3). From the table, it is found that -47 - 201231632 the refractive index of the acrylic film is 1.50. The film formation method in the first table is a film formation method (I to III) which is applied when film formation of each film. <Evaluation of Hardness> Regarding the hardness of the metal oxide film, the pencil hardness was evaluated. Using the above-mentioned coating film compositions K 1 to K6 and using a glass substrate with ITO as a substrate, the above-described film forming method I, film forming method II or film forming method ΠΙ is used to form metal oxide films (KL1, KL2, KL3). , KL4, KL5, KL5-1, KL5-2, KL5-3, ΚΜ1 and ΚΜ2) are formed on the substrate. Further, an acrylic material composition Κ7 was used, and a glass substrate with yttrium was used as a substrate, and an acrylic film (?3) was formed on the glass substrate with ruthenium attached thereto by applying the above-mentioned film formation method III. These substrates were used and the pencil hardness was evaluated according to the test method (JI S Κ 5 4 0 0). The first table shows the evaluation results of the pencil hardness of the metal oxide film (KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3 'ΚΜ1 and ΚΜ2) and the acrylic film (ΚΜ3). From the table, it can be seen that the pencil hardness of the acrylic film is 3 Η, and the metal oxide film (KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3, ΚΜ1 and Κ Μ 2 ) In comparison, the hardness is lower. -48 - 201231632

[Table 1] Film coating composition winding method refractive index pencil W KL 1 K 1 II 1. 5 2 9H KL 2 K2 II 1. 5 5 9H KL 3 K3 II 1. 6 0 8H KL 4 K4 I 1. 6 5 8H KL 5 K4 II 1. 70 8H KL5-1 K4 — 1 II 1. 6 0 9H KL 5 -2 K4-2 II 1. 6 0 8H KL 5 -3 K4-2 I 1. 6 0 7H KM1 K5 I 1. 48 9H KM2 K6 II 1. 75 7H KM3 K7 III 1. 5 0 3H &lt;Transparent Conductive Film Substrate&gt; First, a transparent conductive film substrate on which a transparent conductive film having a pattern is formed is formed on a substrate. A glass substrate is used for the substrate, and ITO is used for the transparent conductive film. As the transparent conductive film substrate, the transparent conductive film substrate 14 used in the touch panel 1 of the above-described embodiment can be used. Here, two kinds of transparent conductive film substrates having the same IT Ο pattern and having a film thickness of 28 nm and 75 nm are prepared. &lt;Example 1&gt; First, a substrate on which a metal oxide film KL1 was formed with a film thickness of 70 nm on a transparent conductive film substrate having an IT film thickness of 28 nm was produced. An optical adhesive was applied to the substrate and attached to a 7 mm soda lime glass substrate. Subsequently, an ultraviolet ray irradiation apparatus (Model UB 011-3A, manufactured by Eye Graphics Co., Ltd.) was used, and a high-pressure mercury lamp (input power supply of 1 000 W) was used, and ultraviolet rays were irradiated for 80 seconds at a light intensity of 50 mW/cm 2 (converted at a wavelength of 3 65 nm). Thereby, the optical adhesive is hardened to produce an evaluation touch surface -49-201231632. &lt;Examples 2 and 3&gt; In addition to the film thickness of the metal oxide film KL1 of 80 nm (Example 2) and 90 nm (Example 3), the evaluation touch was produced in the same manner as in Example 1. Control panel. &lt;Example 4&gt; A substrate in which a metal oxide film KL2 was formed on a transparent conductive film substrate having an ITO film thickness of 28 nm at a thickness of 7 Onm was produced. An optical adhesive was applied to the substrate and bonded to a 7. 7 mm plain glass substrate. Then, an ultraviolet ray irradiation apparatus (Model UB 011-3A, manufactured by Eye Graphics Co., Ltd.) was used, and a high-pressure mercury lamp (input power supply 1000 W) was used, and an ultraviolet ray of 80 seconds was irradiated with a light intensity of 50 mW/cm 2 (converted at a wavelength of 3 65 nm). Thereby, the optical adhesive is hardened to produce a touch panel for evaluation. &lt;Examples 5 and 6> In addition to the film thickness of the metal oxide film KL2 of 80 nm (Example 5) and 90 nm (Example 6), the evaluation touch was produced in the same manner as in Example 4. panel. &lt;Example 7&gt; A substrate in which a metal oxide film KL3 was formed on a transparent conductive film substrate having an ITO film thickness of 28 nm at a film thickness of 5 Onm was produced. An optical adhesive -50 - 201231632 primer was applied to the substrate and bonded to a 0.7 mm plain glass substrate. Then, using an ultraviolet irradiation device (UB 01 1-3 A type manufactured by Eye Graphics Co., Ltd.) and using a high-pressure mercury lamp (input power supply of 1 000 W), ultraviolet light was irradiated for 80 seconds at a light intensity of 5 〇 mW/cm 2 (converted at a wavelength of 365 nm). . Thereby, the optical adhesive is hardened to produce a touch panel for evaluation. &lt;Examples 8 to 1 1 &gt; Except that the film thickness of the metal oxide film KL3 was 70 nm (Example 8), 80 nm (Example 9), 120 nm (Example 10), and 150 nm (Example 1 1) Others, the evaluation touch panel was produced in the same manner as in the seventh embodiment. <Example 1 2> A substrate in which a metal oxide film KL4 was formed on a transparent conductive film substrate having an ITO film thickness of 28 nm at a film thickness of 80 nm was produced. An optical adhesive was applied to the substrate and bonded to a 7. 7 mm plain glass substrate. Next, an ultraviolet irradiation device (UB 01 1-3 A type manufactured by Eye Graphics Co., Ltd.) was used, and a high-pressure mercury lamp (input power supply of 1 000 W) was used, and light was irradiated for 80 seconds at a light intensity of 5 〇mW/cm 2 (converted at a wavelength of 3 65 nm). Ultraviolet light. Thereby, the optical adhesive is hardened to produce a touch panel for evaluation. &lt;Example 1 3&gt; An evaluation touch panel was produced in the same manner as in Example 12 except that the film thickness of the metal oxide film KL4 was 10 nm. -51 - 201231632 &lt;Example 1 4&gt; A substrate in which a metal oxide film KL4 was formed on a transparent conductive film substrate having an ITO film thickness of 75 nm at a film thickness of 100 nm was produced. An optical adhesive was applied to the substrate and bonded to a 0.7 mm plain glass substrate. Then, an ultraviolet ray irradiation device (Model UB 011-3A, manufactured by Eye Graphics Co., Ltd.) was used, and a high-pressure mercury lamp (input power supply of 1 000 W) was used, and ultraviolet rays were irradiated for 80 seconds at a light intensity of 50 mW/cm 2 (converted at a wavelength of 3 65 nm). Thereby, the optical adhesive is hardened to produce a touch panel for evaluation. &lt;Example 1 5&gt; A substrate in which a metal oxide film KL5 was formed on a transparent conductive film substrate having an ITO film thickness of 75 nm at a film thickness of 100 nm was produced. An optical adhesive was applied to the substrate and bonded to a 〇7 mm plain glass substrate. The receiver used an ultraviolet irradiation device (Model UB 011-3A, manufactured by Eye Graphics Co., Ltd.) and irradiated the ultraviolet ray for 80 seconds at a light intensity of 50 mW/cm 2 (converted at a wavelength of 365 nm using a high-pressure mercury lamp (input power supply of 1 000 W). Thereby, the optical adhesive is hardened to produce a touch panel for evaluation. &lt;Example 1 6 &gt; A substrate in which a metal oxide film KL5_i was formed on a transparent conductive film substrate having an ITO film thickness of 28 nm at a film thickness of 100 nm was produced. An optical adhesive was applied to the substrate and attached to a 坡 7 m m plain glass substrate. The receiver used an ultraviolet irradiation device (UB 011--52-201231632 3 A type manufactured by Eye Graphics Co., Ltd.) and used a high-pressure mercury lamp (input power supply 1 〇0 〇W) to measure the light intensity at 50 mW/cm2 (converted at 365 nm). Irradiation of 8 sec seconds of ultraviolet light. Thereby, the optical adhesive is hardened to produce a touch panel for evaluation. &lt;Example 1 7&gt; A substrate in which a metal oxide film KL5-2 was formed on a transparent conductive film substrate having an ITO film thickness of 28 nm at a film thickness of 100 nm was produced. An optical adhesive was applied to the substrate and bonded to a 0.7 mm plain glass substrate. Subsequently, an ultraviolet ray irradiation apparatus (Model UB 011-3A, manufactured by Eye Graphics Co., Ltd.) was used, and an ultraviolet ray of 80 seconds was irradiated with a light intensity of 50 mW/cm 2 (converted at a wavelength of 3 65 nm) using a high pressure mercury lamp (input power supply 1000 W). Thereby, the optical adhesive is hardened to produce a touch panel for evaluation. &lt;Example 1 8&gt; A substrate on which a metal oxide film KL5-3 was formed on a transparent conductive film substrate having an ITO film thickness of 28 nm at a film thickness of 100 nm was produced. An optical adhesive was applied to the substrate and attached to a 0.7 mm plain glass substrate. Subsequently, an ultraviolet ray irradiation apparatus (Model UB 011-3A, manufactured by Eye Graphics Co., Ltd.) was used, and an ultraviolet ray of 80 seconds was irradiated with a light intensity of 50 mW/cm 2 (converted at a wavelength of 365 nm) using a high pressure mercury lamp (input power supply of 1 000 W). Thereby, the optical adhesive is hardened to produce a touch panel for evaluation. &lt;Comparative Example 1 &gt; A metal-53-201231632 oxide film was not formed on a transparent conductive film substrate having a ruthenium film thickness of 28 nm, and an optical adhesive was directly applied thereto and bonded to a 0.7 mm plain glass substrate. Subsequently, an ultraviolet ray irradiation apparatus (Model UB 011-3A, manufactured by Eye Graphics Co., Ltd.) was used, and a high-pressure mercury lamp (input power supply of 1 000 W) was used, and ultraviolet rays of 80 seconds were irradiated at a light intensity of 50 mW/cm 2 (converted at a wavelength of 3 65 nm). Thereby, the optical adhesive was cured to produce a touch panel for evaluation without a metal oxide layer. <Comparative Example 2 &gt; A metal oxide film was not formed on a transparent conductive film substrate having an ITO film thickness of 75 nm. The optical adhesive was applied and bonded to a 0.7 mm plain glass substrate. Then, an ultraviolet ray irradiation apparatus (Model UB 011-3A, manufactured by Eye Graphics Co., Ltd.) was used, and a high-pressure mercury lamp (input power supply: 1000 W) was used to irradiate ultraviolet rays of 80 sec at a light intensity of 50 mW/cm 2 (converted at a wavelength of 365 nm). Thereby, the optical adhesive is cured to produce an evaluation touch panel having no metal oxide layer. &lt;Comparative Example 3&gt; An evaluation touch panel was produced in the same manner as in Example 12 except that the film thickness of the metal oxide film KL4 was 30 nm. &lt;Comparative Example 4> A substrate in which a metal oxide film KM1 was formed on a transparent conductive film substrate having an ITO film thickness of 28 nm at a film thickness of 10 nm was produced. An optical adhesive was applied to the substrate and bonded to a 0.7 mm plain glass substrate. -54- 201231632 Next, use an ultraviolet irradiation device (Model UB 011-3A, manufactured by Eye Graphics Co., Ltd.), and use a high-pressure mercury lamp (input power supply 1000 W) to irradiate ultraviolet rays for 80 seconds at a light intensity of 50 mW/cm 2 (converted at a wavelength of 3 65 nm). . Thereby, the optical adhesive is hardened to produce a touch panel for evaluation. &lt;Comparative Example 5&gt; A substrate in which a metal oxide film KM2 was formed on a transparent conductive film substrate having an ITO film thickness of 28 nm at a film thickness of 100 nm was produced. An optical adhesive was applied to the substrate and bonded to a 0.7 mm plain glass substrate. Subsequently, an ultraviolet ray irradiation apparatus (Model UB 01 1-3A, manufactured by Eye Graphics Co., Ltd.) was used, and an ultraviolet ray of 80 seconds was irradiated with a light intensity of 50 mW/cm 2 (converted at a wavelength of 3 65 nm) using a high pressure mercury lamp (input power supply 1000 W). Thereby, the optical adhesive is hardened to produce a touch panel for evaluation. &lt;Comparative Example 6&gt; A substrate in which a metal oxide film KM2 was formed on a transparent conductive film substrate having an ITO film thickness of 75 nm at a film thickness of 100 nm was produced. An optical adhesive was applied to the substrate and bonded to a 0.7 mm plain glass substrate. Subsequently, an ultraviolet ray irradiation apparatus (Model UB 011-3A, manufactured by Eye Graphics Co., Ltd.) was used, and a high-pressure mercury lamp (input power supply of 1 000 W) was used, and ultraviolet rays of 80 seconds were irradiated at a light intensity of 50 mW/cm 2 (converted at a wavelength of 365 nm). Thereby, the optical adhesive is hardened to produce a touch panel for evaluation. &lt;Comparative Example 7 &gt; -55-201231632 A substrate in which an acrylic film KM3 was formed in a film thickness of 2 μm of an ITO film having a thickness of 75 nm was produced. The optical coating was applied to the substrate and bonded to a 7. 7 mm plain glass substrate. An ultraviolet ray irradiation apparatus (UB type manufactured by Eye Graphics Co., Ltd.) was used to irradiate the external light line with a high-pressure mercury lamp (input power supply of 1 000 W 50 mW/cm 2 (converted at a wavelength of 3 65 nm). Thereby, the optical adhesive was hardened to form a film. There is a touch panel for acryl evaluation. &lt;Evaluation of Adhesiveness&gt; In the examples 1 to 18, a metal oxide film (KL1) formed in the middle of the production of the evaluation plate was used. The substrate was subjected to a peeling test on each of the metal oxide films on the electric film substrate in accordance with the cross-cutting method of the adhesion of IS K5 6 00 to evaluate the properties. Similarly, in Comparative Example 3 to Comparative Example 7, The substrate formed with the metal oxide film (KM1 and KM2) and the acrylic film (KM3) which was formed in the middle of the production of the evaluation panel was evaluated. &lt;Evaluation of Electrode Pattern Viewability&gt; Using the touch panel of the evaluation example 18 and Comparative Example 1 to Comparative Example 7, the ITO electrode pattern was evaluated. The adhesive was then applied to the plate with an adhesive of 011 -3 A ) in seconds. Film touch surface - KL5) Transparent guide evaluation Estimate the use of touch KL4, estimate the nature of the system -56-201231632 Place each touch panel on a black cloth, and observe it visually from the upper illumination state. The observation results were as follows: the unviewed type was &lt;electrode pattern viewing evaluation ◎&gt;. Further, in the case of the polar pattern, the degree is improved as compared with the touch panel in which the metal oxide is not present on the ruthenium film, and the touch panel of Comparative Example 1 and Comparative Example 2 is &lt;view evaluation 〇&gt;. Further, the same as those of Comparative Example 1 and Comparative Example 2, &lt;electrode pattern viewing evaluation Δ&gt;, and the touch panel of the comparative example 1 and the comparative example 2 of the IT 〇 is more prominent &lt;χ&gt; The results of the electrode pattern visibility evaluation of the touch panels of Examples 1 to 18 and Comparative Examples 1 to 1 were summarized in the second table together with the evaluation results. The shape of the light to the electrode diagram is compared with the electrode pattern. The touch surface pattern of the electrode pattern is better than that of the evaluation of the 〇7-57-201231632 [Table 2] ITO film thickness of the touch panel (nm) Metal oxidation Film Thickness (nm) Electrode Pattern Viewability Evaluation Adhesion Evaluation Window Example 1 28 KL 1 7 0 〇0 啻 Example 2 28 KL 1 8 0 〇0 Window Example 3 28 KL 1 9 0 〇0 Example 4 28 KL 2 7 0 ◎ 0 Window Example 5 2 8 KL2 8 0 ◎ 0 Window Example 6 28 KL 2 9 0 ◎ 0 ΪΤ Example 7 2 8 KL 3 5 0 〇0 哲例例 8 28 KL 3 7 0 ◎ 0 宵 Example 9 28 KL 3 8 0 ◎ 0 宵 Example 1 〇28 KL 3 12 0 ◎ 0 Window Example 1 1 28 KL 3 15 0 〇0 Zhe Shi 1 2 28 KL4 8 0 ◎ 0 Official application 1 3 28 KL4 1 00 ◎ 0 啻 Example 1 4 7 5 KL4 10 0 ◎ 0 Zhe Shi 1 1 5 7 5 KL 5 10 0 ◎ 0 宵 Example 1 6 2 8 KL5-1 100 ◎ 0 Window Example 1 7 28 KL 5-2 1 00 ◎ 0 宵 Example ί 8 2 8 KL 5-2 10 0 ◎ 0 Comparative Example 1 2 8 _ A Δ A Comparative Example 2 7 5 _ _ Δ A Comparative Example 3 2 8 KL4 3 0 Δ 0 Comparative Example 4... 28 KM1 10 0 Δ 0 Comparative Example 5 2 8 KM2 10 0 X 0 Comparative Example 6 7 5 KM2 10 0 X 0 Hinge Example 7 7 5 KM3 2 0 0 0 Δ 5 In the touch panels of Embodiments 1 to 15, the results of the 'electrode pattern visibility evaluation are good', and it can be known that these are the electrode patterns not viewed' or Even if it was observed, it was improved in comparison with the comparative example having no metal oxide film. Therefore, by forming a metal oxide film having a refractive index and a film thickness adjusted on the transparent electrode, the electrode pattern visibility can be improved and the electrode can be made inconspicuous. Further, it was also found that the adhesion of each metal oxide film was higher than that of the acrylic film. From the results of the second table, it can be seen that according to the first to fifth embodiments, it is possible to obtain a touch panel capable of reducing the decrease in displayability -58 - 201231632 due to the conspicuous appearance of the transparent electrode pattern. Specifically, it is possible to suppress the transparent electrode pattern and become conspicuous, and provide the touch panel 本, 101, 201, 301, and 401 of the present embodiment. Industrial Applicability: The touch panel of the present invention can make an electrode The pattern becomes inconspicuous and the adhesion between the constituent members is also good. Therefore, there is a touch panel for use as a display device which requires an excellent appearance and high reliability. The entire contents of the specification, the scope of the application, the drawings and the abstract of the invention are hereby incorporated by reference. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view of a touch panel according to a first example of the present embodiment. Fig. 2 is a cross-sectional view taken along line A 1 - Α 第 of Fig. 1. Fig. 3 (a) to (d) are cross-sectional views showing the steps of a method of manufacturing the touch panel of the first example of the embodiment. Fig. 4 is a plan view showing a touch panel of a second example of the embodiment. Fig. 5 is a cross-sectional view taken along line B1-B of Fig. 4. Fig. 6 is a cross-sectional view showing a schematic configuration of a touch panel of a third example of the embodiment. Fig. 7 is a cross-sectional view showing a schematic configuration of a touch panel of a fourth example of the embodiment. -59-201231632 Fig. 8 is a cross-sectional view showing a schematic configuration of a touch panel of a fifth example of the embodiment. [Description of main component symbols] 1, 101, 201, 301, 401: touch panel 2, 102, 402: substrates 3, 103, 203, 303, 403: first transparent electrodes 4, 104, 204, 304, 404: Second transparent electrode 5, 6, 105, 106, 205, 206, 305, 306, 405, 406: metal oxide layer 7, 107, 207: cover film 9, 108, 109, 208, 209, 308, 408: Transparent adhesive material 10, 110, 210, 310, 410: display panel 1 1 : pull-out wiring 14: transparent conductive film substrate 18: intersection portion 19: interlayer insulating film 20: bridge electrode 2 1 : electrode pad portion 212, 312 : 2nd substrate 407 : Protective layer - 60-

Claims (1)

201231632 VII. Patent application scope: 1. A touch panel which is a capacitive touch panel formed with a transparent electrode on an operation area of a transparent substrate, and is characterized by the following general formula (II) In the presence of a metal salt, the metal alkoxide represented by the following general formula (I) is hydrolyzed and condensed in an organic solvent, and a precipitation preventing agent is further added to obtain a coating film composition, which is composed of the coating film composition. a layer of the formed metal oxide is disposed on the transparent electrode; (OR) n (I) (wherein, Μ represents a metal, R represents an alkyl group of C1 to C5, and η represents a valence of M i ); X) m ( II) (wherein M2 represents a metal, and X represents chlorine, nitric acid, sulfuric acid, acetic acid, oxalic acid, sulfamic acid, sulfonic acid, acetoacetic acid, acetylpyruvate or the like, and m represents The price of M2). 2. A touch panel, which is a capacitive touch panel of a pattern in which a transparent electrode is formed on an operation area of a transparent substrate, and is characterized by the following general formula (II-1) and In the presence of a metal salt of the metal salt used in Π-1), the metal alkoxide represented by the following general formula (I) is hydrolyzed and condensed in an organic solvent, and then a precipitation preventing agent is added. a coating film composition in which a layer of a metal oxide formed by the coating film composition is disposed on the transparent electrode; -61 - 201231632 Μ, (OR) „ (I) (wherein Mi represents a metal and R represents a Cl ~C5 alkyl, n represents the valence of Μ!); Μ2 ( X) m ( II-l ) (wherein m2 represents a metal, and X represents chlorine, nitric acid, sulfuric acid, acetic acid, sulfamic acid, sulfonic acid, B Indoleacetic acid, acetoacetic acid or such an alkaline salt, m represents the valence of M2. 3. The touch panel of claim 1 or 2, wherein the metal M in the above general formula (I) , selected from bismuth (Si), titanium (Ti), molybdenum (Ta), erbium (Zr), boron (B), aluminum (A1), magnesium (Mg), tin At least one of the group consisting of Sn) and (辞π). The touch panel of any one of claims 1 to 3, wherein the above general formula (II) and (ΙΙ-1) The metal ruthenium 2 is selected from the group consisting of aluminum (Α1) 'indium (In), zinc (Zn), pin (Zr), bismuth (Bi), lanthanum (La), molybdenum (Ta), yttrium (Y) and yttrium ( At least one of the group consisting of: Ce. The touch panel of any one of claims 1 to 4, wherein the layer of the aforementioned metal oxide has a refractive index of 1.50 to 1.70, the layer The touch panel of any one of the above-mentioned metal oxides, wherein the layer of the metal oxide has a refractive index of 1.54 to 1.68, the film of the layer is a film having a thickness of from 40 nm to 170 nm. The thickness is from 40 nm to 170 nm. 7. The touch panel according to any one of claims 1 to 6, the -62-201231632 metal alkoxide is a mixture of alkoxide or a partial condensate thereof and a titanium alkoxide. 8. The touch panel according to any one of claims 1 to 7, wherein the precipitating agent is selected from the group consisting of Ν-methyl-pyrrolidone, ethylene glycol, and dimethyl group. At least one of a group consisting of guanamine, dimethylacetamide, diethylene glycol, propylene glycol, hexanediol, and the like. 9. As in any of claims 1 to 8 The touch panel of the present invention, wherein the molar ratio of the metal atom of the metal alkoxide (Μ!) contained in the coating film composition to the metal atom of the metal salt (μ2) is 0.01$ M2 / ( MJM2 ) $ 0.7. The touch panel of any one of claims 1 to 9, wherein the metal salt is selected from the group consisting of metal nitrates, metal sulfates, metal acetates, metal chlorides, metal oxalates, At least one of the group consisting of a metal sulfonate, a metal sulfonate, a metal acetoacetate, a metal acetoacetate, and the like. The touch panel according to any one of claims 1 to 1, wherein the organic solvent contains an alkanediol or a monoether derivative thereof. The touch panel of any one of claims 1 to 11, wherein the transparent electrode has a first transparent electrode and a second transparent layer for detecting at least two positions in different directions. electrode. The touch panel of claim 12, wherein the first transparent electrode and the second transparent electrode are disposed on the same surface as the transparent substrate. 14. The touch panel of claim 12, wherein the transparent electrode of the -63-201231632 1 and the second transparent electrode are disposed on a surface different from the transparent substrate. -64-