TWI645324B - Touch panel - Google Patents

Abstract

The present invention provides a touch panel of electrostatic capacitance type. The touch panel is arranged on a display panel and is operated by touching an operation surface. The touch panel has a transparent substrate formed on the back side of the operation surface of the transparent substrate in the X direction. A plurality of X electrodes, and a plurality of Y electrodes formed in a Y direction orthogonal to the X direction. The plurality of X electrodes and the plurality of Y electrodes have: a plurality of transparent electrodes formed on the same surface of the back surface side; and an intersection portion where the X electrode and the Y electrode cross each other via an insulating portion, and three-dimensionally connect adjacent ones. A jumper of any one of the transparent electrode of the X electrode or the transparent electrode of the adjacent Y electrode. The jumper has a first layer connected to the transparent electrode and a second layer laminated on the first layer. The first layer includes a first metal oxide film, and the second layer includes a second metal oxide film. The refractive index of the first layer is lower than the refractive index of the second layer.

Description

Touch panel

The present invention relates to a touch panel formed integrally with a cover sheet and a technology which is preferably used for a touch panel manufacturing method.

The touch panel is a constituent element of an input device in which an operator touches a transparent surface on a display screen with a finger or a pen to detect a contacted position and can input data. It can directly and intuitively input through a keyboard. . Therefore, in recent years, mobile phones, portable information terminals, and car navigation systems are representative, and they are often used in operation units of various electronic devices.

The touch panel described above can be used as an input device by being bonded to a display screen of a flat display device such as a liquid crystal panel. Touch panel detection methods include resistive, electrostatic, ultrasonic, and optical, with various structures.

The electrostatic capacitance type touch panel can be roughly classified into a surface type and a projection type. Surface-type capacitive touch panels are difficult to sense more than two points of contact at the same time. The projection type capacitive touch panel can simultaneously sense two or more contact points. The projection type capacitive touch panel has a first transparent electrode pattern layer, a first insulating layer, a second transparent electrode pattern layer, a metal electrode pattern layer serving as a terminal electrode, and a second insulating layer generally formed on a transparent substrate in this order. The laminated structure of each layer is used as an electrode plate for a capacitive touch panel.

In addition, a projection type capacitive touch panel is superimposed on a flat display device. The form used on the display screen is different from the touch panel independent type in that it can reduce the overall thickness of the protective glass integrated type.

That is, in the touch panel independent type, the independent touch panel is bonded to the display surface side of the flat-type display device through an air gap, and a protective glass having a decorative pattern such as a frame for protecting the surface (front Panel) is a representative transparent cover sheet (refer to Japanese Patent Laid-Open No. 2012-084025).

On the other hand, in the protective glass integrated type, the protective glass integrated touch panel is bonded to the display surface side of the flat display device through the same air gap. In addition, regarding the direction of the patterns of electrodes, terminals, wirings, etc. constituting the touch panel, the position of the substrate directly supporting the pattern becomes the opposite relationship between the touch panel independent type and the protective glass integrated type. The direction is opposite.

Regarding the electrode structure of a projection type capacitive touch panel, if the transparent cover sheet integrated type represented by the protective glass integrated type is used as an example, a plurality of sensor electrodes including a two-dimensional arrangement on the same plane of the transparent cover sheet is a plurality of sensor electrodes. The transparent conductive film pattern, the jumper part electrically connecting the transparent conductive film pattern, the insulation part to prevent the electric short circuit between the layers in the jumper part, and the wiring part leading from the sensor electrode to the terminal part. The sensor electrode uses a transparent conductive film such as ITO (indium tin oxide). On the other hand, the jumper portion uses a metal material having better conductivity than ITO (see Japanese Patent Laid-Open No. 2013-020347).

In such a touch panel, although the structure of the insulation part and the jumper part of the sensor electrodes regularly arranged on the same plane for three-dimensional connection is indispensable, because these insulation parts and the jumper part are located as a display In the area of the operation plane, it is required to reduce the reflectance of the part to improve the visibility of the display device. In Japanese Patent Laid-Open No. 2013-020347, as shown in FIG. 6, if a three-layer structure including a molybdenum film 71 / aluminum film 81 / molybdenum film 91 is sequentially formed on the surface of the transparent cover sheet 2 as shown in FIG. Compared with the case, it is shown that the reflectance is reduced when the three layers including the molybdenum oxide film 7 / aluminum film 8 / molybdenum film 9 are included.

However, as shown in FIG. 6 of Japanese Patent Laid-Open No. 2013-020347, the jumper In the case of three layers of molybdenum oxide film 7 / aluminum film 8 / molybdenum film 9, in the strict sense, the reflectance does not decrease over the entire visible light region. In particular, the increase in reflectance around 400nm affects the reflection characteristics, especially the hue of a touch panel as a display device. Therefore, it is strongly requested to improve the problem to achieve a substantially uniform reflectance in the visible light region.

Furthermore, there is a strong demand for the entire area of the visible light region to have a reflectance of 10% or less.

This invention is made | formed in view of the said situation, and intends to achieve the following objective.

1. Reduce the reflectance to less than 10% over the entire visible light region.

2. Reduce the wavelength dependence and make the reflectance uniform over the entire visible light region.

3. Regarding the etching characteristics, the sheet resistance value, and the adhesion to the bottom layer, the same characteristics as before were maintained.

A touch panel of one aspect of the present invention is an electrostatic capacitance method that is arranged on a display panel and is operated by touching an operation surface, and has: a transparent substrate; formed on the back side of the operation surface of the transparent substrate in the X direction A plurality of X electrodes; and a plurality of Y electrodes formed in a Y direction orthogonal to the X direction. The plurality of X electrodes and the plurality of Y electrodes have: a plurality of transparent electrodes formed on the same surface of the back surface side; and an intersection portion where the X electrode and the Y electrode cross each other via an insulating portion, and three-dimensionally connect adjacent ones. A jumper of any one of the transparent electrode of the X electrode or the transparent electrode of the adjacent Y electrode. The jumper has a first layer connected to the transparent electrode and a second layer laminated on the first layer. The first layer includes a first metal oxide film, and the second layer includes a second metal oxide film. The refractive index of the first layer is lower than the refractive index of the second layer.

According to the touch panel described above, when viewed from the viewing side, the reflectance of the crossing portion can be reduced with respect to the entire wavelength region of visible light, and the reflectance can be suppressed uniformly.

Preferably, the oxygen content in the first layer is higher than the oxygen content in the second layer.

In this case, a desired reflectance can be obtained at the intersection.

Preferably, the specific resistance in the first layer is higher than the specific resistance in the second layer.

In this case, a desired reflectance can be obtained at the intersection.

The first layer and the second layer are preferably oxides of the same metal.

In this case, a desired reflectance can be obtained at the intersection.

Preferably, the first layer and the second layer are oxides of a molybdenum alloy containing 1 to 15 atm% of niobium.

In this case, a desired reflectance can be obtained at the intersection.

Preferably, when the complex refractive index in the first metal oxide film and the second metal oxide film is defined as m = n-ik (n is the refractive index and k is the extinction coefficient), In the first metal oxide film, 2.0 ≦ n1 ≦ 2.2

0.015 ≦ k1 ≦ 0.1; in the second metal oxide film constituting the second layer, 2.5 ≦ n2 ≦ 3.8

0.3 ≦ k2 ≦ 3.0.

Preferably, the jumper has a third layer including a third metal film laminated on the second layer.

Preferably, the third layer includes aluminum or an aluminum alloy.

Preferably, the jumper has a fourth layer including a fourth metal film laminated on the third layer.

The fourth layer may also include molybdenum or a molybdenum alloy.

According to the aspect of the present invention, by forming the crossing portion as described above, it is possible to achieve a substantially uniform reflectance in the visible light region to improve visibility, and to make the reflectance less than 10% in the entire visible light region, thereby ensuring color tone. Accuracy.

2‧‧‧ transparent cover

10‧‧‧Touch Panel

11‧‧‧ transparent substrate

11A‧‧‧Control surface

11b‧‧‧Back

12‧‧‧ transparent electrode

12X‧‧‧X electrode

12X-X, 12Y-Y‧‧‧ electrodes

12Xa, 12Ya‧‧‧Thin line section

12Xb, 12Yb ‧‧‧ Pad Department

12Y‧‧‧Y electrode

13‧‧‧Insulation Department

13A‧‧‧Protective film

14‧‧‧ Cross

15‧‧‧ Jumper

16‧‧‧ Effective touch area

17‧‧‧ Wiring Department

A3‧‧‧Aluminum-Neodymium film (third layer)

L1‧‧‧ Monochromator

LS‧‧‧Tester

M1‧‧‧molybdenum-niobium oxide laminated film (first layer)

M2‧‧‧Molybdenum-Niobium Oxide Laminated Film (Second Layer)

M4‧‧‧Molybdenum-Niobium film (fourth layer)

FIG. 1 is a plan view schematically showing a touch panel according to an embodiment of the present invention.

FIG. 2 is a cross-sectional view showing a touch panel according to an embodiment of the present invention.

FIG. 3 is an enlarged cross-sectional view showing the vicinity of an intersection in a touch panel according to an embodiment of the present invention.

4 is a configuration example of a film at a jumper line of a touch panel according to an embodiment of the present invention and a conceptual diagram showing sheet resistance evaluation and reflectance evaluation.

5 is a graph showing measurement results of a touch panel according to an embodiment of the present invention.

FIG. 6 is a graph showing an experimental example of a touch panel according to an embodiment of the present invention.

FIG. 7 is a graph showing a simulation result of a touch panel according to an embodiment of the present invention.

FIG. 8 is a graph showing a simulation result of a touch panel according to an embodiment of the present invention.

Hereinafter, a touch panel according to an embodiment of the present invention will be described based on the drawings.

FIG. 1 is a plan view schematically showing a touch panel according to this embodiment, FIG. 2 is a cross-sectional view of the touch panel, and FIG. 3 is an enlarged cross-sectional view near a crossing portion in the touch panel.

As shown in FIG. 1 and FIG. 2, the touch panel 10 of this embodiment is an electrostatic capacitance method arranged on a display panel 2 such as a liquid crystal or an organic EL and touching the operation surface 11A, and the touch panel has: A plurality of X electrodes 12X formed in the X direction on the back surface 11b side of the operation surface 11A of the transparent substrate 11; and a plurality of Y electrodes 12Y formed in the Y direction orthogonal to the X direction.

As shown in FIG. 1 to FIG. 3, the electrostatic capacitance type touch panel of this embodiment has a rear surface 11 b of the transparent substrate 11 on the side opposite to the viewing side. For example, the touch panel extends in the Y direction and crosses the Y direction in the X direction. A plurality of X electrodes arranged side by side at a specific arrangement pitch; And a plurality of Y electrodes that intersect with the plurality of X electrodes and extend in the X direction, and are arranged side by side at a specific arrangement pitch in the Y direction. As the transparent substrate 11, a transparent substrate such as glass or heat-resistant transparent plastic is used. The plurality of X electrodes 12X and the plurality of Y electrodes 12Y are formed of a material having high transmittance, such as a transparent conductive material such as ITO (Indium Tin Oxide).

The plurality of X electrodes 12X and the plurality of Y electrodes 12Y have: a plurality of transparent electrodes 12 formed on the same surface of the back surface 11b side; and an intersection 14 where the X electrodes 12X and the Y electrodes 12Y cross each other via the insulating portion 13 and are connected in three dimensions Jumper 15 of any one of the transparent electrode 12 of the adjacent X electrode 12X or the transparent electrode 12 of the adjacent Y electrode 12Y.

The area where the plurality of Y electrodes 12Y and the X electrodes 12X are arranged is the effective touch area 16, as shown in FIG. 1. Around the effective touch area 16, there are arranged a plurality of Y electrodes and a plurality of X electrodes to the vertical and horizontal directions, respectively. The peripheral portions in the direction lead out a plurality of wiring portions 17 to the terminal portion (not shown).

A thin line portion 12Xa and a pad portion 12Xb having a width wider than the width of the thin line portion 12Xa are formed in the plurality of X electrodes by alternately arranging a plurality of electrode patterns in the Y direction. A thin line portion 12Ya and a pad portion 12Yb having a width wider than the width of the thin line portion 12Ya are formed in the plurality of Y electrodes in a plurality of electrode patterns arranged alternately in the X direction.

In a plan view, the pad portion 12Yb of the Y electrode 12Y is disposed between the thin line portions 12Xa of the two adjacent X electrodes 12X, and the pad portion 12Xb of the X electrode 12X is disposed between the thin lines of the two adjacent Y electrodes 12Y. Department 12Ya.

The insulating portion 13 is made of, for example, a film including SiO, SiN, SiON, or a resin.

At the cross section 14, the jumper 15 and the wiring section (wiring) 17 as the thin wire section 12Ya of the Y electrode 12Y have a multilayer structure having the same structure as shown in FIG. 1 to FIG. The reflectance when viewed from the self-recognition side at the interface is to optimize the reflection characteristics and enhance the conductivity in the jumper 15 and the wiring portion 17.

As shown in FIG. 4, the jumper 15 becomes a molybdenum-niobium oxide product under the sequential stacking from the transparent substrate 11 side The structure of the layer film (first layer) M1, the upper molybdenum-niobium oxide laminated film (second layer) M2, the aluminum-neodymium film (third layer) A3, and the molybdenum-niobium film (fourth layer) M4.

The first layer M1 and the second layer M2 include, for example, an oxide of the same metal that becomes molybdenum, that is, a first metal oxide film and a second metal oxide film. The first layer M1 and the second layer M2 contain 1 to 15 atm% of niobium. In the first layer M1 and the second layer M2, the refractive index of the first layer M1 is lower than that of the second layer M2, and the oxygen content in the first layer M1 is higher than that in the second layer M2. The specific resistance in the first layer M1 is higher than that in the second layer M2.

In the first layer M1 and the second layer M2, when the complex refractive index is defined as m = n-ik (n is the refractive index and k is the extinction coefficient), in the first metal oxide film constituting the first layer M1 , 2.0 ≦ n1 ≦ 2.2

0.015 ≦ k1 ≦ 0.1; in the second metal oxide film constituting the second layer M2, 2.5 ≦ n2 ≦ 3.8

0.3 ≦ k2 ≦ 3.0.

The third layer A3 can include aluminum or an aluminum alloy containing neodymium.

The fourth layer M4 becomes a film of the same metal as the first layer M1 and the second layer M2, and includes molybdenum or a molybdenum alloy.

By setting the film configuration of the jumper 15 in this way, it is possible to reduce the reflectance when viewed from the self-recognition side by the interference effect of light.

Here, the characteristics such as the film thickness of each of the films M1, M2, A3, and M4 can be set as examples below. Here, as the electronic characteristics of the jumper 15 to be laminated, the sheet resistance Rs [Ω / □] is shown. The film thickness of each layer can be set within a range of ± 10% of the value described in FIG. 4. Furthermore, the first layer M1 can be set to 20 to 40 nm, and the second layer M2 can be set to 40 to 50 nm.

FIG. 4 shows an example of the actual film configuration of the jumper 15 in this embodiment, and is a conceptual diagram showing the sheet resistance evaluation and the reflectance evaluation.

In addition, in the jumper 15 of this embodiment, as the specific film used, the lower molybdenum-niobium oxide laminated film M1, the upper molybdenum-niobium oxide laminated film M2, the aluminum-neodymium film (conductive film) A3, and the molybdenum-niobium The film M4 is not limited to the composition of Table 1. The film thickness, but from the aspect of manufacturing, it is preferable to use a common metal on the substrate for the metal oxide films M1, M2 and the protective metal film M4.

In this example, in the case where these multilayer films are formed by the sputtering method, a sputtering target is prepared in a dual method of molybdenum-niobium and aluminum-neodymium. When the oxide film is formed, a specific amount of the film is introduced. Reactive sputtering of inert gases such as oxygen and argon eliminates the need to attach source power.

FIG. 5 is a graph showing changes in specific resistance and film formation speed with respect to changes in the oxygen flow rate ratio during the sputtering film formation process of the metal oxide films M1 and M2 in this embodiment.

In the jumper 15 of this embodiment, as shown in FIG. 5, the specific resistance in the lower molybdenum-niobium oxide multilayer film M1 is larger than that of the upper molybdenum-niobium oxide multilayer film M2. Specifically, when the lower molybdenum-niobium oxide multilayer film M1 is formed by sputtering, the lower molybdenum-niobium oxide multilayer film M1 is formed from the transparent substrate 11 side to a specific film thickness, as shown in FIG. 5. The flow rate of the supplied oxygen is reduced and the film forming speed is increased, and the upper molybdenum-niobium oxide multilayer film M2 is formed to a specific film thickness. Here, there is a threshold value SO for the flow rate ratio of the supplied oxygen, and the specific resistance and film formation speed of the film to be formed are changed around the threshold value SO.

． When the oxygen flow rate ratio is smaller than the threshold SO, the film formation speed is high and the specific resistance is small.

． When the oxygen flow ratio is larger than the threshold SO, the film formation speed is low and the specific resistance is very large.

Specifically, regarding the gas flow rate in the film formation conditions, it is preferable to set the argon: oxygen flow rate to 200: 120 (sccm) during the film formation of the lower molybdenum-niobium oxide multilayer film M1, and the upper molybdenum- During the formation of the niobium oxide multilayer film M2, the state was changed from 200: 80 (sccm).

In addition, in this embodiment, the specific resistance of the lower molybdenum-niobium oxide multilayer film (first layer) M1 and the upper molybdenum-niobium oxide multilayer film (second layer) M2 can also be configured from the side connected to the transparent electrode 12 The aluminum-neodymium film (third layer) is continuously lowered to the A3 side. In this case, it can also be configured such that the specific resistance continuously changes depending on the thickness even if there are no two different specific resistance values.

An example of the manufacturing method of the touch panel of this embodiment is demonstrated.

The manufacturing method of the touch panel in this embodiment includes: a step of forming a transparent electrode 12 as a sensor conductive film pattern on a transparent substrate 11; a step of forming an insulating portion 13; and a step of forming a jumper 15 and a wiring portion 17 at a time.

In addition, the manufacturing method of the touch panel in this embodiment can also sequentially perform the steps of forming the jumper 15 and the wiring portion 17, the step of forming the insulating portion 13, and the step of forming the transparent electrode 12 in this order.

Furthermore, as another example of the manufacturing method of the touch panel, it can also include: a step of patterning the wiring portion 17; a step of forming the transparent electrode 12; a step of forming the insulating portion 13; and a step of forming the jumper 15.

In these methods, as a final step, a protective film 13A that is uniform over the entire surface using a transparent resin or the like can be applied and formed.

If the manufacturing method of the touch panel of this embodiment is further described in detail, (a) after performing, for example, ITO film formation, the pattern position of the previous step is aligned to perform a photoresist pattern based on photolithography Forming, and then removing the remaining resist to form a pattern of the transparent electrode 12 as a sensor electrode. Then, (b) a photosensitive resin material for forming the insulating portion 13 is applied, and patterning is performed by aligning the photoresist with the crossing portion 14. Then, (c) the aforementioned same structure for constituting the jumper 15 and the wiring section 17 is performed The multilayer film can be formed at one time by a photolithography method including photoresist coating, exposure, and development, and subsequent etching and removal of residual resist.

FIG. 6 is a graph showing a measurement result of a spectral reflectance for comparing an effect of reducing a reflectance of a multilayer film of a touch panel according to an embodiment of the present invention with a previous example.

The measurement of the spectral reflectance can be performed using a commercially available spectrophotometer. Regarding the measurement, as shown in FIG. 4, the measurement sample film is irradiated with the irradiated light from the light source (monochromator) L1, and the light reflected by the specular surface is received by the measuring device LS to measure the intensity of the light. The wavelength of the spectrally irradiated light from the monochromator L1 is continuously changed to measure the spectral reflectance.

Here, the reference sample used in the measurement is a specific film having a known absolute reflectance. That is, the 100% standard in each subsequent measurement sample is set to a value obtained by dividing, for example, the intensity obtained in an aluminum single-layer film by a known absolute reflectance.

Next, as shown in FIG. 4, as an example of a multilayer film, a multilayer film including an aluminum-neodymium film and a molybdenum-niobium film is formed on a transparent substrate (glass) 11 from the opposite side of the transparent substrate 11 from the film-forming surface. The spectral reflectance of the multilayer film including the aluminum-neodymium film and the molybdenum-niobium film was measured on the front side. The result is shown by a one-dot chain line in FIG. 6.

Next, a multilayer film including a molybdenum oxide film, an aluminum film, and a molybdenum film was formed on the transparent substrate 11 in the same manner, and a multilayer film including a molybdenum oxide film, an aluminum film, and a molybdenum film was measured from the side of the transparent substrate 11 that was not filmed The spectral reflectance. The results are shown by dotted lines in FIG. 6.

Furthermore, as an example of a multilayer film of a touch panel according to an embodiment of the present invention, the film formed on the transparent substrate 11 includes a lower molybdenum-niobium oxide multilayer film M1, an upper molybdenum-niobium oxide multilayer film M2, and an aluminum-neodymium film A3 and The multilayer film of molybdenum-niobium film M4, measured from the surface of the transparent substrate 11 without film formation, includes a lower molybdenum-niobium oxide multilayer film M1, an upper molybdenum-niobium oxide multilayer film M2, an aluminum-neodymium film A3, and a molybdenum-niobium film Spectral reflectance of M4 multilayer film. The result is shown by a solid line in FIG. 6.

As shown in FIG. 6, when compared with the previous multilayer film, the multilayer film of this embodiment is constituted The reflectance can be suppressed to 10% or less in the entire visible light region with a measurement wavelength of 380nm to 780nm, and the reflectance can be made substantially uniform in the entire visible light region. In Japanese Patent Application Laid-Open No. 2013-020347, the measurement result of the ultraviolet region with a wavelength of less than 400 nm is not used as a reference because it does not show an accurate value in this measurement result. However, in this embodiment, the measurement wavelength can be measured. The reflectance is set to a range of 5 to 8% for substantially the entire region of visible light from 380 nm to 780 nm.

FIG. 7 and FIG. 8 are CIELAB colors showing simulation results for specifying the film thicknesses of the first layer and the second layer for achieving a desired reflectance in a multilayer film of a touch panel according to an embodiment of the present invention. Graph of space.

As a film thickness range that satisfies the reflectance (R%) at 550nm: 6% or less and the chromaticity coordinates a *: -5 to 5, b *: -5 to 5, the first layer can be set as shown in FIG. 7 The MoNbOx1 film thickness range is 20 to 40 nm (standard conditions: 35 nm), and the second layer is set to the MoNbOx2 film thickness range: 40 to 50 nm (standard conditions: 45 nm) as shown in FIG. 8. Here, regarding the CIELAB color space (accurately CIE1976L * a * b * color space), in the three axes of L *, a *, b *, L * represents lightness, a *, b * represents red-green, blue-yellow Color of direction.

On the other hand, in the previous example shown in FIG. 6, it becomes L *: 35, a *: 0.54, and b *:-13.5 (blue).

According to the results, it can be seen that in the previous example, the color and luster deviate from the chromaticity coordinates a *:-5 ~ 5, b *:-5 ~ 5, and in the multilayer film of the touch panel according to an embodiment of the present invention, the color tone is Unchanged.

Next, the results of a comprehensive comparison between the multilayer film of the touch panel according to one embodiment of the present invention and the previous multilayer film are shown in (Table 2). For each evaluation item, good (OK) / × (NG) is used in the table to indicate whether the judgment is good or not. Compared with the previous multilayer film, it can be seen that the reflectance of the multilayer film of a touch panel according to an embodiment of the present invention in the entire region of the wavelength range of 380 to 780 nm of visible light shows a significant improvement. On the other hand, regarding the etching time, The chip resistance value and various items of adhesion to the bottom layer are equivalent.

According to the embodiment of the present invention described above, the interface between the transparent substrate and the wiring pattern of the multilayer film can be reduced in reflectivity by a simple method, and the uniformity of the reflectance in the visible light region can be improved, thereby reducing the self-recognition side observation. Visibility with respect to wiring pattern. It is considered to improve the characteristic quality related to the display performance of other electronic parts and the like according to the same scheme. For example, the visibility of the auxiliary wiring pattern including the metal layer for further reducing the resistance of the transparent conductive film can be improved. In addition, as represented by wiring generally associated with display devices, the range of various wiring patterns in which metal layers can be applied to electronic parts can be expanded, and the degree of freedom in product design can be greatly improved.

Claims (10)

A touch panel is an electrostatic capacitance type touch panel which is arranged on a display panel and touches an operation surface to operate. The touch panel has a transparent substrate and a plurality of X-directions formed on the back side of the operation surface of the transparent substrate. X electrodes; and a plurality of Y electrodes formed in a Y direction orthogonal to the X direction; the plurality of X electrodes and the plurality of Y electrodes have: a plurality of transparent electrodes formed on the same surface of the back surface side; and A jumper that connects one of the transparent electrode of the adjacent X electrode or the transparent electrode of the adjacent Y electrode at an intersection where the X electrode and the Y electrode cross each other via an insulating portion; the jumper A first layer connected to the transparent electrode and a second layer laminated on the first layer, the first layer includes a first metal oxide film, the second layer includes a second metal oxide film, and the refraction of the first layer The rate is lower than the refractive index of the second layer. The touch panel of claim 1, wherein the oxygen content in the first layer is higher than the oxygen content in the second layer. For example, the touch panel of claim 1 or 2, wherein the specific resistance in the first layer is higher than the specific resistance in the second layer. For example, the touch panel of claim 1 or 2, wherein the first layer and the second layer are oxides of the same metal. The touch panel according to claim 4, wherein the first layer and the second layer are molybdenum alloy oxides containing 1-15 atm% of niobium. For example, the touch panel of claim 1 or 2, wherein when the complex refractive index in the first metal oxide film and the second metal oxide film is defined as m = n-ik (n is a refractive index, k is an extinction coefficient) In the first metal oxide film constituting the first layer, 2.0 ≦ n ≦ 2.2 0.015 ≦ k ≦ 0.1; in the second metal oxide film constituting the second layer, 2.5 ≦ n ≦ 3.8 0.3 ≦ k ≦ 3.0. For example, the touch panel of claim 1 or 2, wherein the jumper has a third layer including a third metal film laminated on the second layer. The touch panel of claim 7, wherein the third layer includes aluminum or an aluminum alloy. The touch panel of claim 7, wherein the jumper has a fourth layer including a fourth metal film laminated on the third layer. The touch panel of claim 9, wherein the fourth layer includes molybdenum or a molybdenum alloy.