TWI628563B - Touch-sensing electrode and touch screen panel including the same - Google Patents

Abstract

The present invention relates to a touch sensing electrode and a touch screen panel including the touch sensing electrode, and more particularly, to a touch sensing electrode having excellent conductivity and including the touch sensing The touch screen panel of the electrode. The touch sensing electrode includes a first sensing pattern formed on a lower surface of the insulating layer, and a second sensing pattern formed on an upper surface of the insulating layer. At least one of the first sensing pattern and the second sensing pattern includes a metal mesh pattern and a metal plating layer thereon.

Description

Touch sensing electrode and touch screen panel containing the same

Cross-references for related applications

The priority and the rights of Korean Patent Application No. 2013-0103605, filed on Aug. 30, 2013, are hereby incorporated by reference.

Field of invention

The invention relates to a touch sensing electrode and a touch screen panel comprising a touch sensing electrode. More specifically, the present invention relates to a touch sensing electrode having a high conductivity and excellent visibility, and a touch screen panel including the touch sensing electrode.

Related technical discussion

In general, the touch screen panel is a screen panel equipped with a special input device. When the screen panel is touched by one hand, the touch point is input through the special input device. The touch screen panel is a device through which input data is directly received from a screen without using a keyboard, so that when a person's hand or an object touches a letter or displays a specific position on the screen, the touch point thereof It is thus recognized and executed in accordance with the specific program of the stored software. The touch screen panel is formed by a laminated structure.

In order to discern the touch point without reducing the visibility of the image on the screen, the use of the transparent touch sensing electrode is very basic, and a sensing pattern formed in a predetermined pattern is generally used.

The transparent touch sensing electrode structure for the touch screen panel has various types, such as a glass-ITO film-ITO film (GFF) structure, a glass-ITO film (GIF) structure, and Only glass (Glass only, G2) structure.

For example, Figure 1 shows a prior art transparent sensing electrode structure.

The transparent touch sensing electrode structure may be composed of the first sensing pattern 10 and the second sensing pattern 20. The first sensing pattern 10 and the second sensing pattern 20 may be disposed in different directions on a touch point X and a Y coordinate and provide X and Y coordinate information of the touch point. More specifically, when a human hand or an object touches the transparent substrate, the first sensing pattern 10, the second sensing pattern 20, and a position detecting line are transmitted according to the capacitance change of the touch point, that is, The metal interconnects are transferred to a drive circuit. In addition, the change in capacitance can be converted to an electronic signal by an X and Y input processing circuit (not shown) or the like, and thus the touch point can be identified.

In this regard, the first sensing pattern 10 and the second sensing pattern 20 are disposed on the same substrate and need to be electrically connected to each other to detect a touch point. Here, since the first sensing patterns 10 are connected to each other and the second sensing patterns 20 are isolated in the form of islands, an additional connection electrode (bridge electrode 50) may need to be used to electrically connect the second sensing patterns 20.

However, the bridge electrode 50 may be formed in another layer different from the first sensing pattern 10 to avoid electrical connection with the first sensing pattern 10. Fig. 2 is an enlarged view of a portion where the bridge electrode 50 of the cross section taken along the line A-A' in Fig. 1 is formed.

Referring to FIG. 2, the first sensing pattern 10 and the second sensing pattern 20 are formed on the substrate 100, and the insulating layer 30 and the bridge electrode 50 are formed thereon. The first sensing pattern 10 and the second sensing pattern 20 are separated from each other, and are separated from the bridge electrode 50 by the insulating layer 30 formed thereon. The first sensing pattern 10 is in a state of being electrically insulated from the bridge electrode 50. As mentioned above, because The second sensing pattern 20 needs to be electrically connected to another second sensing pattern 20 that is electrically connected using the bridge electrode 50. In order to connect the second sensing pattern 20 separated by the island type using the bridge electrode 50 while electrically isolating the second sensing pattern 20 from the first sensing pattern 10, it is necessary to form the contact hole 40 in the insulating layer 30.

However, since the bridge electrode 50 is usually formed of a metal to improve conductivity, there is a problem that the bridge electrode 50 becomes visible due to the difference in reflectance between the sensing patterns 10 and 20.

In order to solve the problem of visibility, the bridge electrode 50 can be made of a metal having a very small width. In this case, since the bridge electrode 50 can be formed simultaneously with a metal interconnection, the visibility problem can be improved and the process can be simplified. However, the formation of the bridge electrode 50 having a minute width requires a high-precision manufacturing apparatus, and the formation of a high-precision pattern is a time-consuming process. In addition, since the resistance is increased, the conductivity may be lowered, and thus the sensing speed may be slow. Therefore, the resolution of visibility problems and proper conductivity are difficult to achieve at the same time.

In addition to this, recently, display devices having a narrow width have been produced and research on this is also underway. The problem, however, is that the narrower the border, the greater the resistance of the metal interconnect hidden in the bezel.

Japanese Patent Publication No. 2008-98169 discloses a transparent conductive film in which an undercoat layer composed of two layers having different refractive indices is formed between a transparent substrate and a transparent conductive layer.

[list of cited documents]

[Patent Document]

1. Japanese Patent Publication No. 2008-98169

The invention relates to a touch sensing electrode with high conductivity and a touch screen panel comprising the touch sensing electrode.

The present invention also relates to a touch sensing electrode having low visibility depending on a difference in reflectance due to a position, and a touch screen panel including the touch sensing electrode.

The invention also relates to a touch sensing electrode having a narrow bezel, and a touch screen panel including the touch sensing electrode.

According to an aspect of the present invention, a touch sensing electrode is provided, the touch sensing electrode including a first sensing pattern formed on a lower surface of the insulating layer, and a second sensing pattern formed on an upper surface of the insulating layer . At least one of the first sensing pattern and the second sensing pattern includes a metal mesh pattern and a metal plating layer thereon.

The metal plating layer may be further formed on at least one of the metal interconnections configured to respectively connect the first sensing pattern and the second sensing pattern to a driving circuit.

One of the first sensing pattern and the second sensing pattern is formed of a metal mesh pattern, and the other sensing pattern is a transparent electrode pattern formed of a metal oxide.

The metal plating layer can be formed by an electroplating method.

The metal plating layer can be formed using copper.

A thickness of the metal plating layer may be in the range of 500 to 1000 nm.

The touch sensing electrode can be formed on a surface of a cover window substrate or a display panel of the touch screen panel.

According to another aspect of the present invention, a method of fabricating a touch sensing electrode is provided, the method comprising: forming an arrangement in different directions above and below an insulating layer, respectively Sensing pattern. At least one of the sensing patterns is formed by forming a metal mesh pattern and then forming a metal plating on an upper surface of the metal mesh pattern.

The method of fabricating a touch sensing electrode can further include forming a metal interconnect while forming a metal mesh pattern.

The metal plating layer may be formed on an upper surface of the metal interconnection.

One of the first sensing pattern and the second sensing pattern is formed by a metal mesh pattern, and the other sensing pattern is a transparent electrode pattern formed of a metal oxide.

According to still another aspect of the present invention, a touch screen panel including any of the above-described touch sensing electrodes is proposed.

According to still another aspect of the present invention, a display device including the above touch screen panel is proposed.

A touch sensing electrode in accordance with an exemplary embodiment of the present invention includes a metal plating on a metal grid electrode to increase the conductivity of the metal grid electrode and thus have a high sensing speed.

Further, in the touch sensing electrode according to an exemplary embodiment of the present invention, a metal plating layer may be formed using a material having a low reflectance to reduce the visibility of the metal mesh electrode.

Moreover, the touch sensing electrode in accordance with an exemplary embodiment of the present invention includes a metal plating that connects a sensing pattern to a metal interconnect of a driver circuit. Therefore, when the width of the metal interconnection is reduced, high conductivity can be maintained, and thus a display device having a narrow bezel can be implemented.

Further, according to an exemplary embodiment of the present invention, due to the first sensing map The case and the second sensing pattern are respectively disposed on different planes (the upper surface and the lower surface of the insulating layer) in the touch sensing electrodes, and the contact holes are unnecessary. Therefore, contact resistance may not be a problem, and its manufacturing process can be simplified.

10‧‧‧First sensing pattern

20‧‧‧Second sensing pattern

30‧‧‧Insulation

40‧‧‧Contact hole

50‧‧‧ Bridge electrode

70‧‧‧Metal interconnection

100‧‧‧Substrate

200‧‧‧Metal plating

The above and other objects, features and advantages of the present invention will become more apparent to those skilled in the <RTIgt FIG. 2 is a schematic cross-sectional view of a touch sensing electrode showing an existing touch sensing electrode; and FIG. 3 is a view showing a touch sensing electrode according to an exemplary embodiment of the present invention. FIG. 4 is a schematic cross-sectional view showing a portion of the touch sensing electrode shown in FIG. 3; and FIG. 5 is a cross-sectional view showing the touch sensing electrode according to another exemplary embodiment of the present invention; 6 is a schematic cross-sectional view showing a portion of the touch sensing electrode shown in FIG. 5; and FIG. 7 is a schematic view showing a method for manufacturing a touch sensing electrode according to an exemplary embodiment of the present invention. .

The present invention relates to a touch sensing electrode, and the present invention relates to a method having a higher conductivity An electrical touch sensing electrode and a touch screen panel including the touch sensing electrode. The touch sensing electrode includes a first sensing pattern formed on a lower surface of an insulating layer, and a second sensing pattern formed on an upper surface of the insulating layer. At least one of the first sensing pattern and the second sensing pattern includes a metal mesh pattern and a metal plating layer thereon.

Exemplary embodiments of the present invention are described in detail below with reference to the accompanying drawings. The drawings are intended to be illustrative of typical or exemplary embodiments of the invention It is to be understood that the scope of the invention is not limited by the accompanying drawings.

3 and 4 schematically illustrate touch sensing electrodes in accordance with an exemplary embodiment of the present invention.

The touch sensing electrode according to the present exemplary embodiment includes a first sensing pattern 10 formed on a lower surface of the insulating layer 30, and a second sensing pattern 20 formed on an upper surface of the insulating layer. At least one of the first sensing pattern 10 and the second sensing pattern 20 is formed by a metal mesh pattern, and a metal plating layer 200 is formed on the metal grid pattern. Fig. 3 shows a structure in which the first sensing pattern 10 and the second sensing pattern 20 are both formed by a metal mesh pattern.

The first sensing pattern 10 and the second sensing pattern 20 may be arranged in different directions and provide information on a touch point X and a Y coordinate. More specifically, when a person's hand or object touches the transparent substrate, the capacitance change according to the touch point can be transmitted to the driver through the first sensing pattern 10, the second sensing pattern 20, and the metal interconnection 70. Circuit. In addition, the change in capacitance can be converted to an electronic signal using X and Y input processing circuitry (not shown) or the like, and thus the touch point can be identified.

From this point of view, the first sensing pattern 10 and the second sensing pattern 20 may be formed on a substrate 100 and may need to be electrically connected to each other to detect a touch point. When the first sensing pattern 10 and the The second sensing patterns 20 are formed on the same plane as shown in FIGS. 1 and 2, because the first sensing patterns 10 are connected to each other, and the second sensing patterns 20 are isolated in the form of islands, and additional connections are made. The electrode (bridge electrode 50) may need to be used to electrically connect the second sensing pattern 20.

However, in the touch sensing electrode according to an exemplary embodiment of the present invention, the first sensing pattern 10 and the second sensing pattern 20 are respectively formed on different surfaces of the insulating layer 30, so that it is not necessary to form a bridge electrode or contact. The process of the hole. Therefore, the problem of the contact resistance of the bridge electrode or the process of forming the contact hole does not occur.

Incidentally, indium tin oxide (ITO) is generally used to form a sensing pattern having high transparency, but has lower conductivity than metal. Metals, on the other hand, have high electrical conductivity, but poor visibility (due to the high reflectivity when applied to touch screen panels).

According to an exemplary embodiment of the present invention, since the sensing pattern is formed of a metal and has a grid pattern, high conductivity and excellent visibility can be achieved at the same time.

According to an exemplary embodiment of the present invention, the metal forming the metal mesh pattern is not particularly limited as long as it has conductivity, such as silver (Ag), gold (Au), aluminum (Al) or molybdenum (Mo). use. Preferably, a material (e.g., molybdenum (Mo)) that can be used to form the metal interconnect 70 can be used.

According to an exemplary embodiment of the present invention, the shape of the metal mesh pattern is not particularly limited. For example, the shape of the metal mesh pattern may be a rectangular mesh structure, a diamond mesh structure, a hexagonal mesh structure, or the like, but is not limited thereto.

The thickness (height) of the metal mesh pattern is not particularly limited, and may be, for example, 20 to 300 nm. When the thickness of the metal mesh pattern is less than 20 nm, the conductivity may increase to lower the touch sensitivity. When the thickness of the metal mesh pattern is greater than 300 nm, it is possible to manufacture not easy.

The width of the metal mesh pattern is not particularly limited, and may be, for example, 2 to 30 μm, and preferably 2 to 20 μm. When the thickness of the metal mesh pattern is in the range of 2 to 30 μm, the visibility of the metal mesh pattern may be lowered, and the metal mesh pattern may have an appropriate resistance value.

The metal mesh pattern may not be formed to have a large width due to the problem of visibility. Since the resistance value is inversely proportional to the cross-sectional area of the charge transfer path, the metal grid pattern having a smaller width results in a small cross-sectional area of the charge transfer path, which ultimately limits the conductivity. In order to solve this problem, if the height of the metal mesh pattern is simply increased, there is a problem that the pattern accuracy is lowered and the substrate 100 is twisted.

According to an exemplary embodiment of the present invention, such a problem can be solved by additionally forming a metal plating layer 200 on the sensing patterns 10 and 20 which are patterned to have a metal mesh pattern. Since the metal plating layer 200 is formed over the sensing patterns 10 and 20 to increase the cross-sectional area of the charge transport path, the conductivity of the sensing patterns 10 and 20 can be remarkably improved.

The metal plating layer 200 is not particularly limited, any material may be used as long as it has electrical conductivity, and may be plated on a metal mesh pattern. For example, the metal plating layer 200 may be silver (Ag), gold (Au), or copper (Cu), but is not limited thereto.

Preferably, since the metal plating layer 200 is formed on the metal mesh pattern, it may be preferable to use a material having a low reflectance from the viewpoint of visibility. Copper (Cu) can be preferably used in terms of visibility.

The thickness of the metal plating layer 200 is not particularly limited, but is preferably in the range of 500 to 1000 nm so as not to affect the overall structure of the touch sensing electrode while improving conductivity.

According to another exemplary embodiment of the present invention, only one of the first sensing pattern 10 and the second sensing pattern may be formed as a metal mesh pattern. In this case, another sensing pattern can be formed as a normal touch sensing pattern. According to another exemplary embodiment of the present invention, FIGS. 5 and 6 schematically show that the second sensing pattern 20 is formed as a touch sensing electrode where the metal mesh pattern is located.

In this case, as another sensing pattern in which the metal mesh pattern is not formed, there is no limitation in the materials used in the art. In order not to suppress the visibility of the image displayed on the screen, the other sensing pattern may preferably be formed of a transparent material or formed in a fine pattern. Specific examples are metal oxides such as indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), and cadmium tin oxide (CTO). The materials may be used singly or in combination of two or more kinds thereof, and preferably ITO may be used.

The insulating layer 30 can be used to electrically isolate the first sensing pattern 10 and the second sensing pattern 20. The insulating layer 30 can be formed using materials and methods used in the art without any particular limitation.

The metal interconnect 70 can be used to transfer the capacitance changes detected by the sensing patterns 10 and 20 to a driver circuit. The metal interconnections 70 may be made of the same material as the metal mesh pattern, and thus are preferably formed at the same time that the metal mesh pattern is formed.

At the same time, the metal interconnection 70 can be disposed in the frame portion of a display device. When the frame is to be formed into a narrow shape, the metal interconnection 70 is preferably formed to have the smallest possible width. However, when the metal interconnect 70 is to be made narrow, the conductivity may be lowered and the risk of an open circuit may exist. Therefore, in accordance with an exemplary embodiment of the present invention, the metal plating layer 200 may be further formed on the metal interconnection 70 as needed.

The metal plating 200 disposed on the metal interconnection 70 may be made of the same material as the metal plating 200 disposed on the metal mesh pattern, and may preferably be formed at the same time.

The touch sensing electrode according to this exemplary embodiment of the present invention may also be formed on the substrate 100.

The substrate 100 can use materials commonly used in the art without any particular limitation. For example, glass, polyether oxime (PES), polyacrylate (PAR), polyetherimide (PEI), polynaphthalene dicarboxylic acid (PEN), polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyarylate, polyimide, polycarbonate (PC), cellulose triacetate (triacetyl cellulose: TAC), and cellulose acetate propionate (CAP) can be used.

The substrate 100 may be a surface of a cover window formed on the outermost surface of the touch screen panel or a surface of a display panel.

When the substrate 100 is a cover window substrate, the touch sensing electrode according to this exemplary embodiment of the present invention may further include a transparent dielectric layer between the substrate 100 and the sensing pattern as needed. The transparent dielectric layer can be used to improve the optical uniformity of the touch screen panel by reducing the difference in optical properties caused by structural differences caused by the position of the sensing pattern structure.

The transparent dielectric layer may be formed of a material such as ruthenium oxide, ruthenium oxide, ruthenium oxide or indium oxide. The materials may be used singly or in combination of two or more kinds thereof. The transparent dielectric layer can be formed by a vacuum vapor deposition method, a sputtering method, an ion plating method, or the like, and can be easily produced in the form of a film by the above method.

According to this exemplary embodiment of the invention, a transparent dielectric layer can be formed as a multilayer film as desired. In this case, each layer may be formed of a different material and may have different refractive indices and different thicknesses.

A method of fabricating a touch sensing electrode in accordance with an exemplary embodiment of the present invention is described in detail below.

The touch sensing electrodes according to an exemplary embodiment of the present invention may be fabricated by forming sensing patterns in mutually different directions from above and below an insulating layer, at least one of the sensing patterns. It is formed by forming a metal mesh pattern and then forming a metal plating layer on the upper surface of the metal mesh pattern.

Figure 7 is a schematic diagram showing a method for fabricating a touch sensing electrode in accordance with an exemplary embodiment of the present invention. Referring to FIG. 7, the first sensing pattern 10 and the second sensing pattern 20 are both formed in a metal mesh pattern. Hereinafter, an exemplary embodiment of the present invention will be described in accordance with FIG. 7, but the scope of the present invention is not limited thereto.

First, the first sensing pattern 10 is formed on the substrate 100 as a metal mesh pattern. The first sensing patterns 10 are formed in the first direction, and in this case, the metal interconnections 70 may be simultaneously formed.

The metal mesh pattern can be formed by any method well known in the art without any particular limitation. For example, the metal mesh pattern can be formed by various thin film deposition methods such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). For example, in an example of the PVD method, the metal grid pattern can be formed by reactive sputtering. In addition, the metal grid pattern can be formed by a photolithography process.

After forming the first sensing pattern 10 of the metal mesh pattern, a metal plating layer 200 is formed on the upper surface thereof.

The metal plating 200 can be formed by a general metal plating method. The method of metal plating is not limited, but the plating method may be preferable from the viewpoint of accuracy because of metal plating Layer 200 may only need to be formed over first sensing pattern 10.

More specifically, after the first sensing pattern 10 pattern forming the metal grid as the cathode electrode and the metal plating layer forming the metal as the anode electrode are provided, the substrate is immersed in the electrolyte containing the metal ions of the anode electrode. Solution, then connect the power supply to power up. Therefore, the metal plating layer 200 may be formed on the upper surface of the first sensing pattern 10. When the metal interconnections 70 are connected, the metal plating 200 may be further formed on the metal interconnections 70.

After the metal plating layer 200 is formed, the insulating layer 30 is formed. The insulating layer 30 can be formed by a method used in the art without any particular limitation. For example, the insulating layer 30 may be used to form the insulating layer 30 by applying a photocurable or thermosetting composition to a surface of the substrate 100 on which the first sensing pattern 10 including the metal plating layer 200 is formed, and curing the combination. The object is formed.

After the insulating layer 30 is formed, the second sensing pattern 20 and the metal plating layer 200 thereon are formed in the same manner as for forming the first sensing pattern 10. Thus, a sensing electrode that is touched in accordance with an exemplary embodiment of the present invention can be fabricated.

When only one of the sensing patterns 10 and 20 is formed as a metal mesh pattern, the other sensing pattern can be formed of a metal oxide using an ordinary method. For example, another sensing pattern can be formed by various thin film deposition methods such as PVD and CVD. For example, other sensing patterns may be formed by reactive sputtering (in one example of the PVD method), but are not limited thereto. In another example, another sensing pattern can be formed by photolithography.

The various exemplary embodiments of the invention are disclosed below, but the invention should not be construed as being limited to the exemplary embodiments of the invention described herein. Although the invention has been described in connection with the exemplary embodiments, it will be apparent to those skilled in the art Various modifications may be made without departing from the spirit and scope of the invention.

Example 1

A metal mesh pattern of 20 nanometers thick and 5 micrometers wide and a metal interconnection are formed on the glass substrate (refractive index: 1.51) with molybdenum, and the metal mesh pattern is electrically connected to the metal interconnection.

Next, after connecting the power source to the metal interconnection and the other end of the power source to a copper electrode, the substrate and the copper electrode are immersed in a copper electrolyte, and then an electroplating process is performed to make the metal grid pattern (first A sensing pattern) and a copper plating layer are formed over the metal interconnect.

Then, after the insulating layer is formed on the entire upper surface of the substrate, the metal mesh pattern and the metal plating layer (second sensing pattern) are formed in the same manner except that the metal mesh pattern is formed in a different direction from the previously formed metal mesh. Pattern (first sensing pattern). Therefore, the touch sensing electrode is formed.

For reference, the listed refractive index and extinction coefficient are based on light having a wavelength of 550 nm.

Example 2

A touch sensing electrode was fabricated in the same manner as described in Example 1, except that the sensing pattern (first sensing pattern) under the insulating layer was formed of ITO (refractive index: 1.8).

Comparative example 1

A touch sensing electrode fabricated in the same manner as described in Example 1 except that the copper plating layer was not formed, and the formed molybdenum had a thickness of 300 nm.

Comparative example 2

a touch sensing electrode fabricated in the same manner as described in Example 2, Except that no copper plating was formed, the molybdenum formed had a thickness of 300 nm.

Experimental example

The reflectance and resistance values of the manufactured touch sensing electrodes were measured, and the results are shown in Table 1 below. This reflectance can be referred to as the average reflectance measured in the range of 400 nm to 700 nm.

Referring to Table 1, the reflectances of the examples and the comparative examples are almost similar, but the electrical resistance of the examples is significantly smaller than the comparative example in which the metal plating is not formed.

It will be apparent to those skilled in the art that various modifications of the above-described exemplary embodiments of the invention may be made without departing from the spirit or scope of the invention. Accordingly, the present invention is intended to cover all modifications and modifications

Claims (12)

a touch sensing electrode, the touch sensing electrode comprising: a first sensing pattern formed on a lower surface of an insulating layer; and a second sensing pattern formed on an upper surface of the insulating layer, wherein And at least one of the first sensing pattern and the second sensing pattern comprises a metal mesh pattern and a metal plating layer thereon, and a thickness of the metal plating layer is in a range of 500 to 1000 nm . The touch sensing electrode of claim 1, wherein the metal plating layer is further formed in a metal interconnection configured to connect at least the first sensing pattern and the second sensing pattern to a driving circuit, respectively. At least one of them. The touch sensing electrode of claim 1, wherein one of the first sensing pattern and the second sensing pattern is formed by a metal mesh pattern, and another sensing pattern It is a transparent electrode pattern formed of a metal oxide. The touch sensing electrode according to claim 1, wherein the metal plating layer is formed by an electroplating method. The touch sensing electrode according to claim 1, wherein the metal plating layer is formed of copper. The touch sensing electrode of claim 1, wherein the touch sensing electrode is formed on a surface of a cover window of a touch screen panel or a surface of a display panel. A method of manufacturing a touch sensing electrode, the method comprising the steps of: forming a sensing pattern arranged in different directions above and below an insulating layer, wherein at least one of the sensing patterns is at least one of Forming a metal mesh pattern, then forming a metal plating layer on an upper surface of the metal mesh pattern, and a thickness of the metal plating layer is In the range of 500 to 1000 nm. The method of claim 7, further comprising forming a metal interconnection while forming a metal mesh pattern. The method of claim 8, wherein the metal plating layer is formed on an upper surface of the metal interconnect. The method of claim 7, wherein the sensing pattern arranged in different directions is formed by a metal mesh pattern above and below an insulating layer, and the other sensing pattern is A transparent electrode pattern formed by a metal oxide. A touch screen panel comprising the touch sensing electrode according to any one of claims 1 to 6. A display device comprising the touch screen panel according to claim 11 of the patent application.