TWI628563B - Touch-sensing electrode and touch screen panel including the same - Google Patents
Touch-sensing electrode and touch screen panel including the same Download PDFInfo
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
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- H—ELECTRICITY
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- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
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- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material
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Abstract
本發明關於一種觸碰感測電極以及含有該觸碰感測電極的觸控螢幕面板,更具體而言,本發明關於一種具有優異導電性的觸碰感測電極,以及含有該觸碰感測電極的觸控螢幕面板。該觸碰感測電極包含形成在絕緣層的下表面上的第一感測圖案,以及形成在絕緣層的上表面上的第二感測圖案。至少該第一感測圖案和該第二感測圖案其中之一包括金屬網格圖案和其上的一金屬鍍層。 The present invention relates to a touch sensing electrode and a touch screen panel including the touch sensing electrode, and more particularly, to a touch sensing electrode having excellent conductivity and including the touch sensing The touch screen panel of the electrode. The touch sensing electrode includes a first sensing pattern formed on a lower surface of the insulating layer, and a second sensing pattern formed on an upper surface of the insulating layer. At least one of the first sensing pattern and the second sensing pattern includes a metal mesh pattern and a metal plating layer thereon.
Description
相關申請案件的交互參考 Cross-references for related applications
本案主張2013年8月30日申請之韓國專利申請號2013-0103605的優先權及權益,其揭露全併入供作本案內容的參考。 The priority and the rights of Korean Patent Application No. 2013-0103605, filed on Aug. 30, 2013, are hereby incorporated by reference.
發明領域 Field of invention
本發明關於一種觸碰感測電極以及含有觸碰感測電極的觸控螢幕面板。更具體而言本發明關於一種具有一種高導電性和極佳可見性的觸碰感測電極,以及含有該觸碰感測電極的觸控螢幕面板。 The invention relates to a touch sensing electrode and a touch screen panel comprising a touch sensing electrode. More specifically, the present invention relates to a touch sensing electrode having a high conductivity and excellent visibility, and a touch screen panel including the touch sensing electrode.
相關技術討論 Related technical discussion
一般而言,觸控螢幕面板是一種配備了特殊輸入裝置的螢幕面板,當螢幕面板被一隻手觸碰時,觸碰點透過該特殊輸入裝置被輸入。這種觸控螢幕面板是一種輸入資料不用鍵盤而直接從螢幕接收所經由的裝置,以使得當一個人的手或一物體觸碰一字母或在螢幕上所顯示一個特定位置時,其觸碰點因而被辨識,且按照所儲存軟體的特定程序被執行。觸控螢幕面板由積層結構所形成。 In general, the touch screen panel is a screen panel equipped with a special input device. When the screen panel is touched by one hand, the touch point is input through the special input device. The touch screen panel is a device through which input data is directly received from a screen without using a keyboard, so that when a person's hand or an object touches a letter or displays a specific position on the screen, the touch point thereof It is thus recognized and executed in accordance with the specific program of the stored software. The touch screen panel is formed by a laminated structure.
為了辨別觸碰點而不降低螢幕上影像的可見度,透明觸碰感測電極的使用是很基本的,而且通常使用以預定的圖案所形成的感測圖案。 In order to discern the touch point without reducing the visibility of the image on the screen, the use of the transparent touch sensing electrode is very basic, and a sensing pattern formed in a predetermined pattern is generally used.
用於觸控螢幕面板的透明觸碰感測電極結構有多種不同的型式,例如,玻璃-氧化銦鍚膜(ITO film)-ITO film(GFF)結構,玻璃-ITO film(GIF)結構,及只有玻璃(Glass only,G2)結構。 The transparent touch sensing electrode structure for the touch screen panel has various types, such as a glass-ITO film-ITO film (GFF) structure, a glass-ITO film (GIF) structure, and Only glass (Glass only, G2) structure.
舉例來說,第1圖顯示現有的一種透明感測電極結構。 For example, Figure 1 shows a prior art transparent sensing electrode structure.
該透明觸碰感測電極結構可由第一感測圖案10和第二感測圖案20所構成。第一感測圖案10和第二感測圖案20可配置於一觸碰點X和Y座標上的不同方向並且提供觸碰點之X及Y座標資訊。更具體而言,當人的手或是物體觸碰到透明基板,依據觸碰點的電容改變可透過第一感測圖案10、第二感測圖案20以及一位置偵測線,亦即一金屬互連,傳送到一驅動電路。此外,電容的改變可以用一X和Y輸入處理電路(未顯示)或類似電路加以轉換成為一電子信號,而因此該觸碰點可被辨識。 The transparent touch sensing electrode structure may be composed of the first sensing pattern 10 and the second sensing pattern 20. The first sensing pattern 10 and the second sensing pattern 20 may be disposed in different directions on a touch point X and a Y coordinate and provide X and Y coordinate information of the touch point. More specifically, when a human hand or an object touches the transparent substrate, the first sensing pattern 10, the second sensing pattern 20, and a position detecting line are transmitted according to the capacitance change of the touch point, that is, The metal interconnects are transferred to a drive circuit. In addition, the change in capacitance can be converted to an electronic signal by an X and Y input processing circuit (not shown) or the like, and thus the touch point can be identified.
在這方面,第一感測圖案10和第二感測圖案20是配置於同一基板上,並且需要相互電連接,以偵測一觸碰點。在此,因為第一感測圖案10係相互連接,而第二感測圖案20以島的形式隔離,額外的連接電極(橋型電極50)會需要被用來電連接第二感測圖案20。 In this regard, the first sensing pattern 10 and the second sensing pattern 20 are disposed on the same substrate and need to be electrically connected to each other to detect a touch point. Here, since the first sensing patterns 10 are connected to each other and the second sensing patterns 20 are isolated in the form of islands, an additional connection electrode (bridge electrode 50) may need to be used to electrically connect the second sensing patterns 20.
然而,橋型電極50可形成於和第一感測圖案10不同所在的另一層,以免和第一感測圖案10電連接。第2圖是一張沿著第1圖中A-A’線的剖面之橋型電極50形成所在的部位的放大圖。 However, the bridge electrode 50 may be formed in another layer different from the first sensing pattern 10 to avoid electrical connection with the first sensing pattern 10. Fig. 2 is an enlarged view of a portion where the bridge electrode 50 of the cross section taken along the line A-A' in Fig. 1 is formed.
參閱第2圖,第一感測圖案10和第二感測圖案20形成於基板100,而且絕緣層30和橋型電極50形成於其上。第一感測圖案10和第二感測圖案20彼此分開,而且由形成其上的絕緣層30而與橋型電極50隔開。其中,第一感測圖案10是處於與橋型電極50電性絕緣的狀態。另如上所述,由於 第二感測圖案20需要電連接到另一個第二感測圖案20,其使用橋型電極50而被電連接。為了利用橋型電極50連接以島型式分離的第二感測圖案20,同時讓第二感測圖案20與第一感測圖案10電性隔絕,會需要在絕緣層30中形成接觸孔40。 Referring to FIG. 2, the first sensing pattern 10 and the second sensing pattern 20 are formed on the substrate 100, and the insulating layer 30 and the bridge electrode 50 are formed thereon. The first sensing pattern 10 and the second sensing pattern 20 are separated from each other, and are separated from the bridge electrode 50 by the insulating layer 30 formed thereon. The first sensing pattern 10 is in a state of being electrically insulated from the bridge electrode 50. As mentioned above, because The second sensing pattern 20 needs to be electrically connected to another second sensing pattern 20 that is electrically connected using the bridge electrode 50. In order to connect the second sensing pattern 20 separated by the island type using the bridge electrode 50 while electrically isolating the second sensing pattern 20 from the first sensing pattern 10, it is necessary to form the contact hole 40 in the insulating layer 30.
然而,因為橋型電極50通常是以一金屬形成以提高導電性,由於感測圖案10和20之間反射率的差異,會有讓橋型電極50成為可見的問題。 However, since the bridge electrode 50 is usually formed of a metal to improve conductivity, there is a problem that the bridge electrode 50 becomes visible due to the difference in reflectance between the sensing patterns 10 and 20.
為了解決可見性這個問題,橋型電極50可以用寬度非常小的一金屬來製作。在此例中,由於橋型電極50可與一金屬互連同時形成,該可見性問題可被改善而且製程可以簡化。但是,具有微小寬度的橋型電極50的形成需要高精密度的製造裝置,而且高精密度圖案的形成是一個耗時的製程。此外,因為電阻增加,導電性可能會降低,且因此感測速度可能會變慢。因此,可見性問題的解決和適當的導電性是很難同時達成的。 In order to solve the problem of visibility, the bridge electrode 50 can be made of a metal having a very small width. In this case, since the bridge electrode 50 can be formed simultaneously with a metal interconnection, the visibility problem can be improved and the process can be simplified. However, the formation of the bridge electrode 50 having a minute width requires a high-precision manufacturing apparatus, and the formation of a high-precision pattern is a time-consuming process. In addition, since the resistance is increased, the conductivity may be lowered, and thus the sensing speed may be slow. Therefore, the resolution of visibility problems and proper conductivity are difficult to achieve at the same time.
除此之外,最近具有窄寬度的顯示裝置已經被製作並就此的研究也在進行中。然而問題是,邊框越窄,隱藏在邊框的金屬互連的電阻越大。 In addition to this, recently, display devices having a narrow width have been produced and research on this is also underway. The problem, however, is that the narrower the border, the greater the resistance of the metal interconnect hidden in the bezel.
日本專利公開號2008-98169揭露了一種透明導電薄膜,其中具有不同折射係數的兩層所構成的底塗層是形成於透明基板和透明導電層之間。 Japanese Patent Publication No. 2008-98169 discloses a transparent conductive film in which an undercoat layer composed of two layers having different refractive indices is formed between a transparent substrate and a transparent conductive layer.
〔引證文件列表〕 [list of cited documents]
〔專利文獻〕 [Patent Document]
1.日本專利公開號2008-98169 1. Japanese Patent Publication No. 2008-98169
本發明關於一種具有高導電性的觸碰感測電極,以及含有該觸碰感測電極的觸控螢幕面板。 The invention relates to a touch sensing electrode with high conductivity and a touch screen panel comprising the touch sensing electrode.
本發明也關於一種取決於位置所致的反射率差異而具有低可見性的觸碰感測電極,以及含有該觸碰感測電極的觸控螢幕面板。 The present invention also relates to a touch sensing electrode having low visibility depending on a difference in reflectance due to a position, and a touch screen panel including the touch sensing electrode.
本發明也關於一種具有窄邊框的觸碰感測電極,以及含有該觸碰感測電極的觸控螢幕面板。 The invention also relates to a touch sensing electrode having a narrow bezel, and a touch screen panel including the touch sensing electrode.
依據本發明的一種觀點,提供一種觸碰感測電極,該觸碰感測電極包含形成在絕緣層的下表面的第一感測圖案,以及形成在絕緣層的上表面的第二感測圖案。至少該第一感測圖案和該第二感測圖案其中之一包括金屬網格圖案和其上的一金屬鍍層。 According to an aspect of the present invention, a touch sensing electrode is provided, the touch sensing electrode including a first sensing pattern formed on a lower surface of the insulating layer, and a second sensing pattern formed on an upper surface of the insulating layer . At least one of the first sensing pattern and the second sensing pattern includes a metal mesh pattern and a metal plating layer thereon.
該金屬鍍層可以進一步形成於配置以分別連接該第一感測圖案及該第二感測圖案至一驅動電路的金屬互連的至少其中之一。 The metal plating layer may be further formed on at least one of the metal interconnections configured to respectively connect the first sensing pattern and the second sensing pattern to a driving circuit.
該第一感測圖案和該第二感測圖案其中之一是由金屬網格圖案所形成,而另一感測圖案是由金屬氧化物形成的透明電極圖案。 One of the first sensing pattern and the second sensing pattern is formed of a metal mesh pattern, and the other sensing pattern is a transparent electrode pattern formed of a metal oxide.
該金屬鍍層可以用一電鍍法來形成。 The metal plating layer can be formed by an electroplating method.
該金屬鍍層可以用銅來形成。 The metal plating layer can be formed using copper.
該金屬鍍層的一厚度可以在500~1000奈米的範圍之中。 A thickness of the metal plating layer may be in the range of 500 to 1000 nm.
該觸碰感測電極可以形成在一觸控螢幕面板的一覆蓋窗基板或一顯示面板的一表面上。 The touch sensing electrode can be formed on a surface of a cover window substrate or a display panel of the touch screen panel.
依據本發明的另一觀點,提出一種製造一觸碰感測電極的方法,該方法包括:分別在一絕緣層的上方與下方,形成安排在不同方向的 感測圖案。感測圖案至少其中之一是以形成金屬網格圖案,及然後在該金屬網格圖案的一上表面形成一金屬鍍層而被形成。 According to another aspect of the present invention, a method of fabricating a touch sensing electrode is provided, the method comprising: forming an arrangement in different directions above and below an insulating layer, respectively Sensing pattern. At least one of the sensing patterns is formed by forming a metal mesh pattern and then forming a metal plating on an upper surface of the metal mesh pattern.
該製造一觸碰感測電極的方法還可以包括在形成金屬網格圖案的同時,形成一金屬互連。 The method of fabricating a touch sensing electrode can further include forming a metal interconnect while forming a metal mesh pattern.
該金屬鍍層更可以形成在該金屬互連的一上表面上。 The metal plating layer may be formed on an upper surface of the metal interconnection.
該第一感測圖案和該第二感測圖案其中之一是由一金屬網格圖案所形成,而另一個感測圖案是由一金屬氧化物所形成的一透明電極圖案。 One of the first sensing pattern and the second sensing pattern is formed by a metal mesh pattern, and the other sensing pattern is a transparent electrode pattern formed of a metal oxide.
依據本發明的又一觀點,提出包括上述觸碰感測電極中任一種的一種觸控螢幕面板。 According to still another aspect of the present invention, a touch screen panel including any of the above-described touch sensing electrodes is proposed.
依據本發明的再一觀點,提出包括上述觸控螢幕面板的一種顯示裝置。 According to still another aspect of the present invention, a display device including the above touch screen panel is proposed.
依據本發明的示範性實施例之觸碰感測電極包括在一金屬網格電極上的一金屬鍍層來增加金屬網格電極的導電性,且因而具有一高感測速度。 A touch sensing electrode in accordance with an exemplary embodiment of the present invention includes a metal plating on a metal grid electrode to increase the conductivity of the metal grid electrode and thus have a high sensing speed.
此外,在依據本發明的示範性實施例之觸碰感測電極中,可以使用具有低反射率的材料形成金屬鍍層而降低金屬網電極的可見性。 Further, in the touch sensing electrode according to an exemplary embodiment of the present invention, a metal plating layer may be formed using a material having a low reflectance to reduce the visibility of the metal mesh electrode.
此外,依據本發明的示範性實施例之觸碰感測電極包含連接一感測圖案到一驅動電路的一金屬互連上的金屬鍍層。因此,當該金屬互連的寬度減小時,仍可維持高導電率,並因此具有窄邊框的顯示設備可以被實施。 Moreover, the touch sensing electrode in accordance with an exemplary embodiment of the present invention includes a metal plating that connects a sensing pattern to a metal interconnect of a driver circuit. Therefore, when the width of the metal interconnection is reduced, high conductivity can be maintained, and thus a display device having a narrow bezel can be implemented.
進一步地,根據本發明的示範性實施例中,由於第一感測圖 案和第二感測圖案分別配置在觸碰傳感電極中的不同的平面(該絕緣層的上表面和下表面),接觸孔是沒有必要的。所以,接觸電阻可能不是一個問題,而且其製造程序可被簡化。 Further, according to an exemplary embodiment of the present invention, due to the first sensing map The case and the second sensing pattern are respectively disposed on different planes (the upper surface and the lower surface of the insulating layer) in the touch sensing electrodes, and the contact holes are unnecessary. Therefore, contact resistance may not be a problem, and its manufacturing process can be simplified.
10‧‧‧第一感測圖案 10‧‧‧First sensing pattern
20‧‧‧第二感測圖案 20‧‧‧Second sensing pattern
30‧‧‧絕緣層 30‧‧‧Insulation
40‧‧‧接觸孔 40‧‧‧Contact hole
50‧‧‧橋型電極 50‧‧‧ Bridge electrode
70‧‧‧金屬互連 70‧‧‧Metal interconnection
100‧‧‧基板 100‧‧‧Substrate
200‧‧‧金屬鍍層 200‧‧‧Metal plating
藉由參閱附圖而詳細描述本案的示範性實施例後,本發明上述和其他目的、特徵和優點對於本領域具有通常技術人士對於將變得更加明顯,其中:第1圖是一個顯示現有觸碰感測電極的平面示意圖;第2圖是一個顯示現有觸碰感測電極的觸碰感測電極的剖面示意圖;第3圖是一個顯示依據本發明一示範性實施例的觸碰感測電極平面示意圖;第4圖是一個顯示第3圖所示的觸碰感測電極一部分的剖面示意圖;第5圖是一個顯示依據本發明另一示範性實施例的觸碰感測電極的剖面示意圖;第6圖是一顯示第5圖所示的觸碰感測電極一部分的剖面示意圖;以及第7圖是一個顯示依據本發明一示範性實施例用以製造一觸碰感測電極的方法的示意圖。 The above and other objects, features and advantages of the present invention will become more apparent to those skilled in the <RTIgt FIG. 2 is a schematic cross-sectional view of a touch sensing electrode showing an existing touch sensing electrode; and FIG. 3 is a view showing a touch sensing electrode according to an exemplary embodiment of the present invention. FIG. 4 is a schematic cross-sectional view showing a portion of the touch sensing electrode shown in FIG. 3; and FIG. 5 is a cross-sectional view showing the touch sensing electrode according to another exemplary embodiment of the present invention; 6 is a schematic cross-sectional view showing a portion of the touch sensing electrode shown in FIG. 5; and FIG. 7 is a schematic view showing a method for manufacturing a touch sensing electrode according to an exemplary embodiment of the present invention. .
本發明關於一種觸碰感測電極,本發明關於一種具有較高導 電性的觸碰感測電極,以及含有該觸碰感測電極的一觸控螢幕面板。該觸碰感測電極包含形成於一絕緣層的一下表面的一第一感測圖案,以及形成於該絕緣層的一上表面的一第二感測圖案。至少該第一感測圖案和該第二感測圖案其中之一包括金屬網格圖案和其上的一金屬鍍層。 The present invention relates to a touch sensing electrode, and the present invention relates to a method having a higher conductivity An electrical touch sensing electrode and a touch screen panel including the touch sensing electrode. The touch sensing electrode includes a first sensing pattern formed on a lower surface of an insulating layer, and a second sensing pattern formed on an upper surface of the insulating layer. At least one of the first sensing pattern and the second sensing pattern includes a metal mesh pattern and a metal plating layer thereon.
以參考附圖而下詳述本發明的示範性實施例。圖式僅供作顯示本發明典型或示範性的實施例,並助於了解本發明。需了解本發明的範圍並不限於所附的圖式。 Exemplary embodiments of the present invention are described in detail below with reference to the accompanying drawings. The drawings are intended to be illustrative of typical or exemplary embodiments of the invention It is to be understood that the scope of the invention is not limited by the accompanying drawings.
第3圖和第4圖示意顯示依據本發明一示範性實施例的觸碰感測電極。 3 and 4 schematically illustrate touch sensing electrodes in accordance with an exemplary embodiment of the present invention.
依據本示範性實施例的觸碰感測電極,包含形成在絕緣層30的下表面的第一感測圖案10,以及形成在絕緣層的上表面的第二感測圖案20。至少第一感測圖案10和第二感測圖案20的其中之是由一金屬網格圖案所形成,且一金屬鍍層200形成於該金屬網格圖案之上。第3圖顯示一結構,其中第一感測圖案10和第二感測圖案20都是由金屬網格圖案所形成。 The touch sensing electrode according to the present exemplary embodiment includes a first sensing pattern 10 formed on a lower surface of the insulating layer 30, and a second sensing pattern 20 formed on an upper surface of the insulating layer. At least one of the first sensing pattern 10 and the second sensing pattern 20 is formed by a metal mesh pattern, and a metal plating layer 200 is formed on the metal grid pattern. Fig. 3 shows a structure in which the first sensing pattern 10 and the second sensing pattern 20 are both formed by a metal mesh pattern.
第一感測圖案10和第二感測圖案20可配置於不同方向並且提供一觸碰點X和Y座標上的資訊。更具體而言,當一個人的手或是物體觸碰到透明基板,依據觸碰點的電容改變可透過第一感測圖案10、第二感測圖案20以及金屬互連70而傳送到一驅動電路。此外,電容的改變可以用X和Y輸入處理電路(未顯示)或類似電路加以轉換成為一電子信號,而因此該觸碰點可被辨識。 The first sensing pattern 10 and the second sensing pattern 20 may be arranged in different directions and provide information on a touch point X and a Y coordinate. More specifically, when a person's hand or object touches the transparent substrate, the capacitance change according to the touch point can be transmitted to the driver through the first sensing pattern 10, the second sensing pattern 20, and the metal interconnection 70. Circuit. In addition, the change in capacitance can be converted to an electronic signal using X and Y input processing circuitry (not shown) or the like, and thus the touch point can be identified.
由此觀點,第一感測圖案10和第二感測圖案20可形成於一基板100,並且會需要相互電連接,以偵測一觸碰點。當第一感測圖案10和第 二感測圖案20形成於如第1圖、第2圖所示的相同平面上時,因為第一感測圖案10係相互連接,而第二感測圖案20以島的形式隔離,額外的連接電極(橋型電極50)會需要被用來電連接第二感測圖案20。 From this point of view, the first sensing pattern 10 and the second sensing pattern 20 may be formed on a substrate 100 and may need to be electrically connected to each other to detect a touch point. When the first sensing pattern 10 and the The second sensing patterns 20 are formed on the same plane as shown in FIGS. 1 and 2, because the first sensing patterns 10 are connected to each other, and the second sensing patterns 20 are isolated in the form of islands, and additional connections are made. The electrode (bridge electrode 50) may need to be used to electrically connect the second sensing pattern 20.
不過由於依據本發明示範性實施例的觸碰感測電極中,第一感測圖案10和第二感測圖案20分別形成於絕緣層30的不同表面,所以可以不需要形成橋型電極或接觸孔的製程。因此,由於橋型電極的接觸電阻或是形成接觸孔製程的問題不會發生。 However, in the touch sensing electrode according to an exemplary embodiment of the present invention, the first sensing pattern 10 and the second sensing pattern 20 are respectively formed on different surfaces of the insulating layer 30, so that it is not necessary to form a bridge electrode or contact. The process of the hole. Therefore, the problem of the contact resistance of the bridge electrode or the process of forming the contact hole does not occur.
順便一提,銦錫氧化物(ITO)通常用於形成具有高的透明度的感測圖案,但具有比金屬較低的導電性。另一方面,金屬具有高的導電性,但差的可見性(由於當它被應用於觸控螢幕面板時的高反射率)。 Incidentally, indium tin oxide (ITO) is generally used to form a sensing pattern having high transparency, but has lower conductivity than metal. Metals, on the other hand, have high electrical conductivity, but poor visibility (due to the high reflectivity when applied to touch screen panels).
依據本發明的一示範性實施例,由於感測圖案是由一金屬形成並具有一網格圖案,可以同時達到高導電度以及優良的可見性。 According to an exemplary embodiment of the present invention, since the sensing pattern is formed of a metal and has a grid pattern, high conductivity and excellent visibility can be achieved at the same time.
依據本發明示範性的實施例,形成該金屬網格圖案的金屬沒有特別的限制,只要它具有導電性,例如銀(Ag),金(Au),鋁(Al)或鉬(Mo)也可以使用。較佳地,可以用於形成金屬互連70的材料(,例如,鉬(Mo))可以被使用。 According to an exemplary embodiment of the present invention, the metal forming the metal mesh pattern is not particularly limited as long as it has conductivity, such as silver (Ag), gold (Au), aluminum (Al) or molybdenum (Mo). use. Preferably, a material (e.g., molybdenum (Mo)) that can be used to form the metal interconnect 70 can be used.
依據本發明的一示範性實施例,該金屬網格圖案的形狀沒有特別的限制。例如,該金屬網格圖案的形狀可以是矩形的網格結構、菱形網眼結構、六邊形網狀結構等等之類的形狀,但不限於此。 According to an exemplary embodiment of the present invention, the shape of the metal mesh pattern is not particularly limited. For example, the shape of the metal mesh pattern may be a rectangular mesh structure, a diamond mesh structure, a hexagonal mesh structure, or the like, but is not limited thereto.
該金屬網格圖案的厚度(高度)沒有特別限制,並且可以是,例如20至300奈米。當金屬網格圖案的厚度小於20奈米,則導電性可能會增加而降低觸碰敏感性。當金屬網格圖案的厚度大於300奈米時,製造可能並 不容易。 The thickness (height) of the metal mesh pattern is not particularly limited, and may be, for example, 20 to 300 nm. When the thickness of the metal mesh pattern is less than 20 nm, the conductivity may increase to lower the touch sensitivity. When the thickness of the metal mesh pattern is greater than 300 nm, it is possible to manufacture not easy.
該金屬網格圖案的寬度並沒有特別的限制,而可以是,例如在2至30微米,且較佳為2至20微米。當金屬網格圖案的厚度為2~30微米的範圍內,金屬網格圖案的可見性會降低,且金屬網格圖案可具有適當的電阻值。 The width of the metal mesh pattern is not particularly limited, and may be, for example, 2 to 30 μm, and preferably 2 to 20 μm. When the thickness of the metal mesh pattern is in the range of 2 to 30 μm, the visibility of the metal mesh pattern may be lowered, and the metal mesh pattern may have an appropriate resistance value.
由於可見度的問題,該金屬網格圖案不可以形成為具有大的寬度。由於電阻值與電荷轉移路徑的截面積成反比,寬度較小的金屬網格圖案導致電荷轉移路徑的小截面積,這最終限制了導電性。為了解決這個問題,如果簡單地增加金屬網格圖案的高度,則存在圖案精確度降低並且基板100被扭曲的問題。 The metal mesh pattern may not be formed to have a large width due to the problem of visibility. Since the resistance value is inversely proportional to the cross-sectional area of the charge transfer path, the metal grid pattern having a smaller width results in a small cross-sectional area of the charge transfer path, which ultimately limits the conductivity. In order to solve this problem, if the height of the metal mesh pattern is simply increased, there is a problem that the pattern accuracy is lowered and the substrate 100 is twisted.
依據本發明的一示範性實施例,這樣的問題可以透過在被型成為具有金屬網格圖案的感測圖案10和20之上,另外形成金屬鍍層200而解決。由於金屬鍍層200形成於感測圖案10和20之上來增加電荷傳送路徑的截面積,感測圖案10和20的導電性可被顯著的改善。 According to an exemplary embodiment of the present invention, such a problem can be solved by additionally forming a metal plating layer 200 on the sensing patterns 10 and 20 which are patterned to have a metal mesh pattern. Since the metal plating layer 200 is formed over the sensing patterns 10 and 20 to increase the cross-sectional area of the charge transport path, the conductivity of the sensing patterns 10 and 20 can be remarkably improved.
該金屬鍍層200並沒有特別的限制,可以使用任何材料(只要它具有導電性),並且可以被電鍍在金屬網格圖案上。例如,金屬鍍層200可以是銀(Ag),金(Au),銅(Cu),但不限於此。 The metal plating layer 200 is not particularly limited, any material may be used as long as it has electrical conductivity, and may be plated on a metal mesh pattern. For example, the metal plating layer 200 may be silver (Ag), gold (Au), or copper (Cu), but is not limited thereto.
較佳地,由於金屬鍍層200形成在金屬網格圖案上,從可視性方面而言,它可能最好是使用具有低反射率的材料。在可視性方面,銅(Cu)可較佳地被使用。 Preferably, since the metal plating layer 200 is formed on the metal mesh pattern, it may be preferable to use a material having a low reflectance from the viewpoint of visibility. Copper (Cu) can be preferably used in terms of visibility.
金屬鍍層200的厚度沒有特別限定,但較佳地在500至1000奈米的範圍內,以便不影響觸碰感測電極的整體結構,同時提高了導電性。 The thickness of the metal plating layer 200 is not particularly limited, but is preferably in the range of 500 to 1000 nm so as not to affect the overall structure of the touch sensing electrode while improving conductivity.
依據本發明另一示範性實施例,只有第一感測圖案10和第二感測圖案其中之一個可被形成為金屬網格圖案。在這種情況下,另一感測圖案可形成為一個普通的觸碰感測圖案。依據本發明另一示範性實施例,第5圖和第6圖示意性地顯示第二感測圖案20被形成為金屬網格圖案所在的觸碰感測電極。 According to another exemplary embodiment of the present invention, only one of the first sensing pattern 10 and the second sensing pattern may be formed as a metal mesh pattern. In this case, another sensing pattern can be formed as a normal touch sensing pattern. According to another exemplary embodiment of the present invention, FIGS. 5 and 6 schematically show that the second sensing pattern 20 is formed as a touch sensing electrode where the metal mesh pattern is located.
在這種情況下,作為未形成有金屬網格圖案的另一感測圖案中,本領域中所使用的材料沒有任何限制。為了不抑制螢幕上所顯示的圖像的可見性,另一感測圖案可較佳地由透明材料形成,或者以微細圖案形成。具體實例有,金屬氧化物,如氧化銦錫(ITO)、氧化銦鋅(IZO)、氧化鋅(ZnO)、銦鋅錫氧化物(IZTO)和氧化鎘錫(CTO)。材料可以單獨或混合其兩種或更多種使用,較佳者可以使用ITO。 In this case, as another sensing pattern in which the metal mesh pattern is not formed, there is no limitation in the materials used in the art. In order not to suppress the visibility of the image displayed on the screen, the other sensing pattern may preferably be formed of a transparent material or formed in a fine pattern. Specific examples are metal oxides such as indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), and cadmium tin oxide (CTO). The materials may be used singly or in combination of two or more kinds thereof, and preferably ITO may be used.
絕緣層30可用以將第一感測圖案10和第二感測圖案20電性隔離。該絕緣層30可以使用在本領域中所使用的材料和方法來形成,沒有任何特別的限制。 The insulating layer 30 can be used to electrically isolate the first sensing pattern 10 and the second sensing pattern 20. The insulating layer 30 can be formed using materials and methods used in the art without any particular limitation.
金屬互連70可用來傳送感測圖案10和20所偵測的電容變化到一驅動電路。金屬互連70可用金屬網格圖案相同的材料製成,因此較佳地形成於金屬網格圖案所形成的同一時間。 The metal interconnect 70 can be used to transfer the capacitance changes detected by the sensing patterns 10 and 20 to a driver circuit. The metal interconnections 70 may be made of the same material as the metal mesh pattern, and thus are preferably formed at the same time that the metal mesh pattern is formed.
同時,金屬互連70可以配置在一顯示裝置的邊框部位,當邊框要做成窄形時,金屬互連70會被較佳的做成具有儘可能的最小寬度。然而,當金屬互連70要被做窄,導電性可能會降低且斷路的風險可能存在。 因此,依據本發明示範性實施例,按照需要在可進一步在金屬互連70上形成金屬鍍層200。 At the same time, the metal interconnection 70 can be disposed in the frame portion of a display device. When the frame is to be formed into a narrow shape, the metal interconnection 70 is preferably formed to have the smallest possible width. However, when the metal interconnect 70 is to be made narrow, the conductivity may be lowered and the risk of an open circuit may exist. Therefore, in accordance with an exemplary embodiment of the present invention, the metal plating layer 200 may be further formed on the metal interconnection 70 as needed.
配置於金屬互連70上的金屬鍍層200可以用與配置於金屬網格圖案上的金屬鍍層200相同的材料,並且較佳地可形成於同一時間。 The metal plating 200 disposed on the metal interconnection 70 may be made of the same material as the metal plating 200 disposed on the metal mesh pattern, and may preferably be formed at the same time.
按照本發明該示範性實施例的觸碰感測電極也可以形成在基板100上。 The touch sensing electrode according to this exemplary embodiment of the present invention may also be formed on the substrate 100.
基板100可以使用在本領域通常使用的材料,沒有任何特別的限制。例如,玻璃、聚醚碸(PES)、聚丙烯酸酯(PAR)、聚醚酰亞胺(PEI),聚萘二甲酸(PEN),聚對苯二甲酸乙酯(PET)、聚苯硫醚(PPS)、聚芳酯、聚酰亞胺、聚碳酸酯(PC)、纖維素三乙酸酯(三乙酰纖維素:TAC)和醋酸丙酸纖維素(CAP)可以被使用。 The substrate 100 can use materials commonly used in the art without any particular limitation. For example, glass, polyether oxime (PES), polyacrylate (PAR), polyetherimide (PEI), polynaphthalene dicarboxylic acid (PEN), polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyarylate, polyimide, polycarbonate (PC), cellulose triacetate (triacetyl cellulose: TAC), and cellulose acetate propionate (CAP) can be used.
基板100可以是形成於觸控螢幕面板最外表面的一覆蓋窗基板的一表面,或是一顯示面板的一表面。 The substrate 100 may be a surface of a cover window formed on the outermost surface of the touch screen panel or a surface of a display panel.
當基板100是覆蓋窗基板,根據本發明該示範性實施例的觸碰感測電極可進一步包括根據需要在基板100和感測圖案之間的透明介電層。透明介電層可以用以透過降低根據感測圖案結構的位置所致的結構差異而導致的光學性質的差異,來提高觸控螢幕面板的光學均勻性。 When the substrate 100 is a cover window substrate, the touch sensing electrode according to this exemplary embodiment of the present invention may further include a transparent dielectric layer between the substrate 100 and the sensing pattern as needed. The transparent dielectric layer can be used to improve the optical uniformity of the touch screen panel by reducing the difference in optical properties caused by structural differences caused by the position of the sensing pattern structure.
透明介電層可以用氧化鈮,氧化矽,氧化鈰,氧化銦等材料形成。材料可以單獨使用或經過混合其兩種或多種使用。透明介電層可以通過真空蒸氣沉積法,濺射法,離子鍍法等來形成,並且可以利用上述方法的容易地以薄膜的形式製造。 The transparent dielectric layer may be formed of a material such as ruthenium oxide, ruthenium oxide, ruthenium oxide or indium oxide. The materials may be used singly or in combination of two or more kinds thereof. The transparent dielectric layer can be formed by a vacuum vapor deposition method, a sputtering method, an ion plating method, or the like, and can be easily produced in the form of a film by the above method.
按照本發明該示範性實施例,根據需要透明介電層可以做成一種多層膜。在這種情況下,每一層可以由不同的材料形成,並且可以具有不同的折射係數與不同的厚度。 According to this exemplary embodiment of the invention, a transparent dielectric layer can be formed as a multilayer film as desired. In this case, each layer may be formed of a different material and may have different refractive indices and different thicknesses.
以下詳細說明製造一依據本發明示範性實施例的觸碰感測電極的方法。 A method of fabricating a touch sensing electrode in accordance with an exemplary embodiment of the present invention is described in detail below.
依據本發明示範性實施例的觸碰感測電極可以用以下做法製成:分別在一絕緣層的上方與下方,形成彼此在彼此不同之方向的感測圖案,感測圖案的至少其中之一是以形成金屬網格圖案,然後在該金屬網格圖案的上表面形成一金屬鍍層所形成。 The touch sensing electrodes according to an exemplary embodiment of the present invention may be fabricated by forming sensing patterns in mutually different directions from above and below an insulating layer, at least one of the sensing patterns. It is formed by forming a metal mesh pattern and then forming a metal plating layer on the upper surface of the metal mesh pattern.
第7圖是一個顯示依據本發明一示範性實施例用以製造一觸碰感測電極的方法的示意圖。參閱第7圖,第一感測圖案10和第二感測圖案20都形成為金屬網格圖案。以下,本發明之示範性實施例將依據第7圖來描述,然而本發明的範圍並不限於此。 Figure 7 is a schematic diagram showing a method for fabricating a touch sensing electrode in accordance with an exemplary embodiment of the present invention. Referring to FIG. 7, the first sensing pattern 10 and the second sensing pattern 20 are both formed in a metal mesh pattern. Hereinafter, an exemplary embodiment of the present invention will be described in accordance with FIG. 7, but the scope of the present invention is not limited thereto.
首先,第一感測圖案10在基板100上形成為金屬網格圖案。 第一感測圖案10形成於第一方向,並且在此情況下,金屬互連70可被同時形成。 First, the first sensing pattern 10 is formed on the substrate 100 as a metal mesh pattern. The first sensing patterns 10 are formed in the first direction, and in this case, the metal interconnections 70 may be simultaneously formed.
該金屬網格圖案可以用本領域熟知的方法,沒有任何特別限制地形成。例如,該金屬網格圖案可透過各種薄膜沉積方法,如物理氣相沉積(PVD)法和化學氣相沉積(CVD)方法來形成。例如在PVD法中的一個例子,該金屬網格圖案可通過反應式濺鍍來形成。此外,該金屬網格圖案可透過微影蝕刻製程來形成。 The metal mesh pattern can be formed by any method well known in the art without any particular limitation. For example, the metal mesh pattern can be formed by various thin film deposition methods such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). For example, in an example of the PVD method, the metal grid pattern can be formed by reactive sputtering. In addition, the metal grid pattern can be formed by a photolithography process.
在形成為金屬網格圖案之第一感測圖案10之後,在其上表面形成金屬鍍層200。 After forming the first sensing pattern 10 of the metal mesh pattern, a metal plating layer 200 is formed on the upper surface thereof.
金屬鍍層200可以用一般的金屬電鍍法形成。金屬電鍍的方法沒有限制,但以精確性的觀點而言電鍍方法可以是較佳的,因為金屬鍍 層200可以只需要在第一感測圖案10上面形成。 The metal plating 200 can be formed by a general metal plating method. The method of metal plating is not limited, but the plating method may be preferable from the viewpoint of accuracy because of metal plating Layer 200 may only need to be formed over first sensing pattern 10.
更具體而言,在設置形成作為陰極電極的該金屬網格之第一感測圖案10圖案以及形成作為陽極電極之金屬的金屬電鍍層後,基板被浸在含有該陽極電極的金屬離子的電解質溶液,然後將電源連接以通電。因此,金屬鍍層200可以形成在第一感測圖案10的上表面上。當金屬互連70被連接,金屬鍍層200可以進一步形成於金屬互連70上。 More specifically, after the first sensing pattern 10 pattern forming the metal grid as the cathode electrode and the metal plating layer forming the metal as the anode electrode are provided, the substrate is immersed in the electrolyte containing the metal ions of the anode electrode. Solution, then connect the power supply to power up. Therefore, the metal plating layer 200 may be formed on the upper surface of the first sensing pattern 10. When the metal interconnections 70 are connected, the metal plating 200 may be further formed on the metal interconnections 70.
在金屬鍍層200形成之後,形成絕緣層30。絕緣層30可以由本領域所使用的方法來形成,沒有任何特別限制。例如,絕緣層30可以經由塗佈包含金屬鍍層200的第一感測圖案10被形成所在的基板100的一表面,將光固化或熱固化性組合物用於形成絕緣層30,並固化該組合物而被形成。 After the metal plating layer 200 is formed, the insulating layer 30 is formed. The insulating layer 30 can be formed by a method used in the art without any particular limitation. For example, the insulating layer 30 may be used to form the insulating layer 30 by applying a photocurable or thermosetting composition to a surface of the substrate 100 on which the first sensing pattern 10 including the metal plating layer 200 is formed, and curing the combination. The object is formed.
在絕緣層30形成之後,以用於形成第一感測圖案10相同的方法,形成第二感測圖案20以及其上的金屬鍍層200。於是,依據本發明一示範性實施例觸碰的感測電極可被製造。 After the insulating layer 30 is formed, the second sensing pattern 20 and the metal plating layer 200 thereon are formed in the same manner as for forming the first sensing pattern 10. Thus, a sensing electrode that is touched in accordance with an exemplary embodiment of the present invention can be fabricated.
當僅僅感測圖案10和20其中之一形成為金屬網格圖案,另一感測圖案可以使用普通的方法由金屬氧化物來形成。例如,另一感測圖案可以透過各種薄膜沉積方法,如PVD法和CVD法形成。例如,其他感測圖案可通過反應式濺鍍(在PVD法中的一例中),來形成,但不限於此。另一例是,另一感測圖案可透過微影蝕刻來形成。 When only one of the sensing patterns 10 and 20 is formed as a metal mesh pattern, the other sensing pattern can be formed of a metal oxide using an ordinary method. For example, another sensing pattern can be formed by various thin film deposition methods such as PVD and CVD. For example, other sensing patterns may be formed by reactive sputtering (in one example of the PVD method), but are not limited thereto. In another example, another sensing pattern can be formed by photolithography.
在下文中揭露本發明的各種示範性實施例,但本發明不應該被解釋為僅限於本文所闡述的本發明的示範性實施例。雖然本發明已被介紹並結合示例性實施例進行描述,但對於本領域技術人員而言,顯然可以 做出各種修改,而不脫離本發明的精神和範圍。 The various exemplary embodiments of the invention are disclosed below, but the invention should not be construed as being limited to the exemplary embodiments of the invention described herein. Although the invention has been described in connection with the exemplary embodiments, it will be apparent to those skilled in the art Various modifications may be made without departing from the spirit and scope of the invention.
範例1 Example 1
以鉬在玻璃基板(折射係數:1.51)上形成20奈厚米且5微米寬的金屬網格圖案以及一金屬互連,並且該金屬網格圖案電連接到該金屬互連。 A metal mesh pattern of 20 nanometers thick and 5 micrometers wide and a metal interconnection are formed on the glass substrate (refractive index: 1.51) with molybdenum, and the metal mesh pattern is electrically connected to the metal interconnection.
接著,將電源連接至該金屬互連以及電源的的另一端至一銅電極後,基板和該銅電極浸入一銅電解液中,及然後執行電鍍程序,使得在該金屬網格圖案(第一感測圖案)和該金屬互連之上形成一銅鍍層。 Next, after connecting the power source to the metal interconnection and the other end of the power source to a copper electrode, the substrate and the copper electrode are immersed in a copper electrolyte, and then an electroplating process is performed to make the metal grid pattern (first A sensing pattern) and a copper plating layer are formed over the metal interconnect.
然後,在基板的整個上表面形成絕緣層後,用相同的方法形成金屬網格圖案和金屬鍍層(第二感測圖案),除了金屬網格圖案的形成方向不同於先前所形成的金屬網格圖案(第一感測圖案)。因此,形成觸碰感測電極。 Then, after the insulating layer is formed on the entire upper surface of the substrate, the metal mesh pattern and the metal plating layer (second sensing pattern) are formed in the same manner except that the metal mesh pattern is formed in a different direction from the previously formed metal mesh. Pattern (first sensing pattern). Therefore, the touch sensing electrode is formed.
供作參考,所列的折射係數和消光係數是以具有550奈米波長的光為基準。 For reference, the listed refractive index and extinction coefficient are based on light having a wavelength of 550 nm.
範例2 Example 2
一觸碰感測電極以與範例1中所述相同的方法製作,除了在絕緣層下的感測圖案(第一感測圖案)是由ITO(折射係數:1.8)所形成。 A touch sensing electrode was fabricated in the same manner as described in Example 1, except that the sensing pattern (first sensing pattern) under the insulating layer was formed of ITO (refractive index: 1.8).
比較範例1 Comparative example 1
以與範例1中所述同樣的方法所製作的一種觸碰感測電極,除了不形成銅鍍層,而且所形成的鉬具有300奈米的厚度。 A touch sensing electrode fabricated in the same manner as described in Example 1 except that the copper plating layer was not formed, and the formed molybdenum had a thickness of 300 nm.
比較範例2 Comparative example 2
以與範例2中所述同樣的方法所製作的一種觸碰感測電極, 除了不形成銅鍍層,而且所形成的鉬具有300奈米的厚度。 a touch sensing electrode fabricated in the same manner as described in Example 2, Except that no copper plating was formed, the molybdenum formed had a thickness of 300 nm.
實驗範例 Experimental example
所製造的觸碰感測電極的反射率和電阻值經過量測,其結果分別列於下方表1中。該反射率可稱之為在400nm至700nm範圍內所測量的平均反射率。 The reflectance and resistance values of the manufactured touch sensing electrodes were measured, and the results are shown in Table 1 below. This reflectance can be referred to as the average reflectance measured in the range of 400 nm to 700 nm.
參閱表1,範例的反射率和比較範例幾乎是相似的,但範例的電氣電阻比起在未形成金屬鍍層的比較範例顯著地較小。 Referring to Table 1, the reflectances of the examples and the comparative examples are almost similar, but the electrical resistance of the examples is significantly smaller than the comparative example in which the metal plating is not formed.
對本領域技術人員而言,很明顯的可以對本發明的上述示範性實施例進行各種修改,而不脫離本發明的精神或範圍之中。因此,本發明涵蓋所有的修改,只要它們落在所附的申請專利範圍及其等同的範圍之內。 It will be apparent to those skilled in the art that various modifications of the above-described exemplary embodiments of the invention may be made without departing from the spirit or scope of the invention. Accordingly, the present invention is intended to cover all modifications and modifications
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