CN105468184B - Transparent electrode laminate and touch screen panel including the same - Google Patents
Transparent electrode laminate and touch screen panel including the same Download PDFInfo
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- CN105468184B CN105468184B CN201410464999.5A CN201410464999A CN105468184B CN 105468184 B CN105468184 B CN 105468184B CN 201410464999 A CN201410464999 A CN 201410464999A CN 105468184 B CN105468184 B CN 105468184B
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Abstract
The invention discloses a transparent electrode laminate and a touch screen panel including the same. The transparent electrode laminate includes: a sensing electrode including a first pattern formed in a first direction and a second pattern formed in a second direction; a bridge electrode configured to electrically connect the individual cell patterns of the second pattern; and an insulating layer disposed between the sensing electrode and the bridge electrode, wherein a metal pattern is formed on the insulating layer exposed between the first pattern and the second pattern, thereby obtaining high transparency by minimizing a difference in reflectivity at each location and reducing pattern visual recognition.
Description
Technical Field
The present invention relates to a transparent electrode laminate and a touch screen panel including the same, and more particularly, to a transparent electrode laminate having a low pattern visibility and a touch screen panel having the same.
Background
Generally, a touch screen is a screen equipped with a dedicated input device to receive a position input by a user's finger or a stylus pen touching the screen. Such a touch screen does not use a keypad but has a configuration of a multi-layered laminate in which, when a finger of a user or an object such as a stylus or a writing pen touches a specific character or position displayed on the screen, the touch screen recognizes the position and directly receives data from the screen so as to actually process information at the specific position through software stored therein.
In order to recognize the touched position without reducing the visibility of an image displayed on the screen, it is necessary to use a transparent electrode in which a sensing pattern is generally formed in a predetermined pattern.
Various structures are known in the related art as transparent sensing electrodes used in a touch screen panel. For example, a glass-ITO film (GFF) structure, a glass-ITO film (G1F) structure, or a glass only (G2) structure may be used in the touch screen panel.
Among these structures, GFF is the most commonly used structure and comprises two transparent electrodes (indium tin oxide, ITO) formed by two films required to achieve the X and Y axes. G1F included a first ITO thin film disposed on the back surface of the glass and the film was used as the second ITO similar to the conventional method. G2 is a structure formed by the following method: depositing and patterning an X-axis ITO thin film on a rear surface of one of the reinforcing glasses, forming an insulating layer thereon, and patterning another Y-axis ITO thin film. Light transmittance increases in GFF, G1F, and G2, and power consumption decreases in this order, and therefore, research on the structure of G2 is actively being conducted.
However, in the G2 structure using the patterned transparent electrode, the patterned portion and the non-patterned portion (pattern opening) of the transparent electrode can be visually distinguished from each other. Therefore, the larger the difference in reflectance between the patterned portion and the non-patterned portion is, the more clearly the reflectance difference appears, thereby reducing the visibility of the appearance as a display element. In particular, in the capacitive touch panel, since the patterned transparent electrode is formed on the entire surface of the display unit of the display, the display device is required to have a good appearance even if the transparent electrode layer is patterned.
In order to solve such a problem, for example, japanese laid-open patent No.2008-98169 discloses a transparent conductive film in which an undercoat layer including two layers having different refractive indices is formed between a transparent substrate and a transparent conductive layer. Further, as an embodiment thereof, the above patent also discloses a transparent conductive film in which a silicon tin oxide layer having a refractive index of 1.7 (the thickness thereof is 10nm or more), a silicon oxide layer having a refractive index of 1.43 (the thickness thereof is 30nm) as a low refractive index layer, and an ITO film having a refractive index of 1.95 (the thickness thereof is 15nm) are formed in this order.
However, since the difference in reflectance between the patterned portion and the non-patterned portion is clearly exhibited in the transparent conductive film disclosed in the above patent, it is still insufficient to improve the appearance of the display device.
Disclosure of Invention
Accordingly, it is an object of the present invention to provide a transparent electrode laminate having a low pattern visibility due to a small difference in reflectance at each position.
Further, another object of the present invention is to provide a touch screen panel having the transparent electrode laminate.
The above object of the present invention is achieved by the following features:
(1) a transparent electrode laminate comprising: a sensing electrode including a first pattern formed in a first direction and a second pattern formed in a second direction; a bridge electrode configured to electrically connect the individual cell patterns of the second pattern; and an insulating layer disposed between the sensing electrode and the bridge electrode, wherein the metal pattern is formed on the insulating layer exposed between the first pattern and the second pattern.
(2) The transparent electrode laminate according to the above (1), wherein the metal pattern satisfies the following formula 1:
[ formula 1]
0.99. ltoreq [ (area ratio of metal pattern on insulating layer) × (total reflectance of metal pattern) + (1- (area ratio of metal pattern on insulating layer)) × (total reflectance of portion without metal pattern on insulating layer)/(total reflectance of sensor electrode and bridge electrode) ]. ltoreq.1.01
(wherein the total reflectance is a value that adds the interface (surface) reflectance to the respective reflectances).
(3) The transparent electrode laminate according to the above (1), wherein the metal pattern is formed of at least one metal selected from molybdenum, silver, aluminum, and copper.
(4) The transparent electrode laminate according to the above (1), wherein the metal pattern has a thickness of 20nm to 300 nm.
(5) The transparent electrode laminate according to the above (1), wherein the bridge electrode electrically connects the second patterns through a contact hole formed in the insulating layer.
(6) The transparent electrode laminate according to the above (1), wherein the unit bridge electrode comprises at least one bridge.
(7) The transparent electrode laminate according to the above (1), wherein the bridges of the unit bridge electrodes have a width of 2 μm to 200 μm.
(8) The transparent electrode laminate according to the above (1), wherein the bridge electrode is formed of a material having a higher electrical conductivity than that of the sensor electrode.
(9) The transparent electrode laminate according to the above (1), wherein the bridge electrode has a thickness of 20nm to 200 nm.
(10) The transparent electrode laminate according to the above (1), wherein the bridge electrode is formed of the same material as that of the metal pattern.
(11) The transparent electrode laminate according to the above (10), wherein the bridges of the unit bridge electrodes have a width of 2 μm to 20 μm.
(12) The transparent electrode laminate according to the above (1), wherein the sensor electrode and the bridge electrode are connected to a drive circuit through a position detection line formed of the same material as that of the metal pattern.
(13) The transparent electrode laminate according to the above (1), further comprising a passivation layer on a surface opposite to the surface of the transparent electrode laminate to which the transparent substrate is adhered.
(14) The transparent electrode laminate according to the above (13), wherein the transparent substrate further comprises at least one optically functional layer on a side opposite to a surface on which the transparent electrode is formed.
(15) The transparent electrode laminate according to the above (14), wherein the optically functional layer is at least one of an antireflection layer and an anti-contamination layer.
(16) A touch screen panel comprising the transparent electrode laminate according to any one of the above (1) to (15).
According to the transparent electrode laminate of the present invention, the thickness of each layer included in the transparent electrode laminate is controlled to a predetermined range, thereby obtaining high transparency by minimizing the difference in reflectance at each position and reducing the pattern visibility.
Due to the above-described aspects, when the transparent electrode laminate is applied to the touch screen panel of the G2 structure, it can be effectively used by exhibiting high light transmittance and low reflectance.
Drawings
The above and other objects, features and other advantages of the present invention will be more clearly understood from the following detailed description taken in conjunction with the accompanying drawings, in which:
fig. 1 is a schematic plan view showing a transparent electrode laminate according to an embodiment of the present invention;
fig. 2 is a schematic plan view showing a unit cell of a transparent electrode laminate according to an embodiment of the present invention; and
fig. 3 is a schematic sectional view illustrating a laminated structure of respective positions of a transparent electrode laminate according to an embodiment of the present invention.
Detailed Description
The invention discloses a transparent electrode laminate, comprising: a sensing electrode including a first pattern formed in a first direction and a second pattern formed in a second direction; a bridge electrode configured to electrically connect the individual cell patterns of the second pattern; and an insulating layer disposed between the sensing electrode and the bridge electrode, wherein a metal pattern is formed on the insulating layer exposed between the first pattern and the second pattern, thereby obtaining high transparency by minimizing a difference in reflectivity at each location and reducing pattern visual recognition.
Hereinafter, preferred embodiments will be described to more specifically understand the present invention with reference to examples and comparative examples. However, those skilled in the art will appreciate that such embodiments are provided to further understand the spirit of the present invention and not to limit the subject matter disclosed in the detailed description and the claims that follow.
Fig. 1 is a schematic plan view illustrating a transparent electrode laminate according to an embodiment of the present invention.
Referring to fig. 1, the transparent electrode laminate of the present invention includes: a sensing electrode 100, a bridge electrode 200, an insulating layer 300, and a metal pattern 400. In addition, the transparent electrode laminate of the present invention may further include a contact hole 500, and may be formed on a transparent substrate (see fig. 3). Further, a passivation layer (see fig. 3) may be provided on a surface opposite to the surface of the transparent electrode laminate to which the transparent substrate is adhered.
As shown in fig. 1, the sensing electrodes 100 included in the transparent electrode laminate of the present invention are formed in a predetermined pattern to provide position information on a point touched by a user using the bridge electrode 200. An insulating layer 300 is disposed between the sense electrode 100 and the bridge electrode 200 to electrically isolate them from each other. The metal pattern 400 is formed on the insulating layer 300 between the first pattern 110 of the sensing electrode 100 and the second pattern 120 of the sensing electrode 100 to reduce the visibility of the transparent electrode laminate of the present invention. A contact hole 500 may be formed in the insulating layer 300 to electrically connect the sensing electrode 100 and the bridge electrode 200.
As shown in fig. 3, since the transparent electrode laminate of the present invention may have different layered structures, differences in reflectance, luminance, chromaticity, etc. of respective positions may occur due to the different layered structures according to their positions, thereby disadvantageously increasing the visibility of the pattern. Therefore, there is a functional limitation of the transparent electrode in the conventional transparent electrode laminate due to increased visibility of the pattern.
Therefore, in order to solve the above-mentioned problems, the transparent electrode laminate of the present invention includes a metal pattern formed on a region corresponding to between the sensing electrodes in the insulating layer. Thereby, a difference in reflectivity between the pattern portion and the non-pattern portion of the sensing electrode can be minimized. Hereinafter, the transparent electrode laminate according to the present invention will be described more specifically.
(transparent electrode)
In the present invention, the transparent electrode includes not only an electrode formed of a substantially transparent material but also an electrode that cannot be visually recognized due to its narrowly formed structure (even if the material itself is opaque).
As shown in fig. 1 to 3, the transparent electrode laminate according to the embodiment of the present invention includes a sensing electrode 100 and a bridge electrode 200.
The sensing electrode 100 may include a first pattern 110 and a second pattern 120. The first and second patterns 110 and 120 are disposed in mutually different directions to provide information of X and Y coordinates of a position touched by a user. For example, the patterns are arranged in the same row direction or column direction, but are not limited thereto. Specifically, when a finger or an object of a user touches the transparent substrate, a change in capacitance depending on a contact position is detected through the first and second patterns 110 and 120, the bridge electrode 200, the metal wiring as a position detection line, and forwarded to the driving circuit. Then, the change in capacitance is converted into an electrical signal by an X input processing circuit and a Y input processing circuit (not shown) to identify the contact position.
In this regard, the first and second patterns 110 and 120 must be formed in the same layer of the transparent substrate, and the respective patterns must be electrically connected to each other to detect the touched position. However, the first patterns 110 are connected to each other, and the second patterns 120 are spaced apart from each other in the form of islands, thereby requiring additional connection lines to electrically connect the second patterns 120 to each other.
However, the connection line should not be electrically connected to the first pattern 110, and thus, the connection line must be formed in a different layer from the sensing electrode 100. Accordingly, the bridge electrode 200 is formed in a separate layer from the sensing electrode 100 to electrically connect the second patterns 120 to each other. That is, the bridge electrode 200 has a function of electrically connecting the respective second patterns 120 of the sensing electrode 100.
Accordingly, in fig. 2 and 3, the positions of ①, ③, and ④ respectively represent portions in which the sensing electrodes 100 are formed in a predetermined pattern to detect the touched region, and the positions of ③, ④, and ⑤ respectively represent portions in which the bridge electrodes 200 are arranged to electrically connect the second patterns 120 spaced apart in the form of islands.
Herein, the bridge electrode 200 must be electrically isolated from the first pattern 110 of the sensing electrode 100. therefore, the transparent electrode laminate of the present invention includes the insulating layer 300 and the contact hole 500 (see ③ in fig. 2), which will be described below.
The thicknesses of the sensing electrode 100 and the bridge electrode 200 are not particularly limited but may be, for example, in the range of 20nm to 200nm, respectively. If the thickness of the sensing electrode 100 and the thickness of the bridge electrode 200 are less than 20nm, the resistance may increase, thereby decreasing the touch sensitivity. When the thickness of the sensing electrode 100 and the thickness of the bridge electrode 200 exceed 200nm, the reflectivity may increase, thereby decreasing the visibility.
Further, the sensing electrode 100 and the bridge electrode 200 preferably have a refractive index of 1.8 to 1.98. When these layers have refractive indices within the above range, the reduction in reflectance can be more improved.
Any conventional conductive material known in the related art for forming a transparent electrode may be used for the sensing electrode 100 and the bridge electrode 200 without particular limitation. For example, the conductive material for forming the transparent electrode may include Indium Tin Oxide (ITO), Indium Zinc Oxide (IZO), zinc oxide (ZnO), Indium Zinc Tin Oxide (IZTO), Cadmium Tin Oxide (CTO), poly (3, 4-Polyethylenedioxythiophene) (PEDOT), Carbon Nanotubes (CNTs), metal wires, and the like, which are used alone or in combination of two or more. Preferably, Indium Tin Oxide (ITO) is used. The metal used in the metal wire is not particularly limited but may include, for example, silver (Ag), gold, aluminum, copper, iron, nickel, titanium, tellurium, chromium, etc., which are used alone or in combination of two or more.
In the present invention, a bridge means an electrode formed in the form of a single line of a unit bridge electrode, wherein the unit bridge electrode according to the present invention may include at least one bridge.
The width of the bridge of the unit bridge electrode is not particularly limited but may be, for example, in the range of 2 μm to 200 μm, and preferably in the range of 2 μm to 100 μm. If the width of the bridge electrode is in the range of 2 μm to 200 μm, the visibility of the pattern may be reduced when the transparent electrode laminate of the present invention is applied to a touch screen panel, thereby providing advantageous resistance.
The bridge electrode 200 may be more narrowly formed to be applied to the touch screen panel, thereby reducing the width of the shadow mask. In this regard, the bridge electrode 200 may be formed of a material having a higher conductivity than that of the sensing electrode 100. When the bridge electrode 200 is formed of a material having a higher conductivity than that of the sensing electrode 100, the second patterns 120 of the sensing electrode 100 may be electrically connected to each other in a smaller area.
If the width of the bridge is reduced, the resistance will increase. In this case, the bridge electrode according to the present invention may include at least two bridges as shown in fig. 2. In this case, an increase in resistance may be suppressed, and an area ratio per unit area of the bridge electrode 200 may be reduced, thereby reducing visibility of the pattern portion.
When the bridge electrode 200 is formed of a material having a higher conductivity than that of the sensing electrode 100, the width of the bridge of the cell bridge electrode may be, for example, 2 to 20 μm, preferably 2 to 5 μm, but is not limited thereto. When the width of the bridge is 2 μm to 20 μm, the visibility of the pattern may be reduced, thereby providing advantageous resistance.
According to another aspect of the present invention, the bridge electrode 200 may be formed of the same material as the metal pattern 400 to be described below.
When the bridge electrode 200 is formed of the same material as the metal pattern 400, an additional process for forming the metal pattern 400 need not be performed. In this case, the process may be more simplified by simultaneously forming the metal pattern 400 during the formation of the bridge electrode 200.
The sensing electrode 100 and the bridge electrode 200 may be formed by various thin film deposition techniques, for example, a Physical Vapor Deposition (PVD) method, a Chemical Vapor Deposition (CVD) method, and the like. The sensing electrode 100 and the bridge electrode 200 may be formed by a reactive sputtering method as an example of a PVD method.
In addition, the sensing electrode 100 and the bridge electrode 200 may be formed through a printing process. For printing the transparent electrode, various printing methods, for example, gravure offset printing, reverse offset printing, screen printing, gravure printing, etc., may be used during the printing process. Specifically, when the sensing electrode 100 and the bridge electrode 200 are formed through a printing process, the transparent electrode may be made of a printable paste material. For example, the electrodes may be formed of Carbon Nanotubes (CNTs), conductive polymers, and Ag nanowire inks.
In the present invention, the lamination order of the sensing electrode 100 and the bridge electrode 200 is not particularly limited. Therefore, in another embodiment of the present invention, the lamination order of the sensing electrode 100 and the bridge electrode 200 shown in fig. 3 may be changed. For example, the bridge electrode 200 is first formed on a transparent substrate instead of forming the sensing electrode 100, then the insulating layer 300 is formed on the bridge electrode 200, and then the sensing electrode 100 is formed on the insulating layer 300.
A method of forming the position detecting lines, which connect the first pattern 110, the second pattern 120, and the bridge electrodes 200 to the driving circuit, is not particularly limited. For example, the position detection line may be formed by the same method as the method of forming the sensing electrode 100 and the bridge electrode 200.
Preferably, the position detecting lines according to the present invention are formed of the same material as the metal pattern 400. In this case, an additional process for forming the metal pattern 400 need not be performed. Accordingly, the process may be more simplified by simultaneously forming the metal pattern 400 during the formation of the metal lines and the position detecting lines.
When all the bridge electrodes 200 and the position detecting lines are formed of the same material as the metal pattern 400, all the position detecting lines and the metal pattern 400 may be simultaneously formed during the formation of the bridge electrodes 200, so that the improvement of process efficiency may be greatly increased.
(insulating layer and contact hole)
However, as shown in fig. 2 and 3, when the bridge electrode 200 electrically connects the adjacent second patterns 120 of the sensing electrode 100, since the bridge electrode 200 should be electrically connected to the sensing electrode 100, a portion where the insulating layer 300 is not formed is required, as a rule, in a region of the insulating layer 300, a portion where the insulating layer 300 is not formed is referred to as a contact hole 500 (see ③ in fig. 2). therefore, the second patterns 120 and the bridge electrode 200 are electrically connected to each other in the contact hole 500.
Any conventional insulating material known in the related art may be used for the insulating layer 300 without particular limitation. For example, the insulating layer 300 may be formed in a desired pattern using a metal oxide such as silicon oxide, a transparent photosensitive resin composition including an acrylic resin, or a thermosetting resin composition.
For example, the insulating layer 300 may be formed on the sensing electrode 100 using a deposition method or a printing method.
In the present invention, the contact hole 500 may be formed in such a manner that the insulating layer 300 is integrally formed on the sensing electrode 100 and then a plurality of holes are formed in the insulating layer (hole method), or in such a manner that the insulating layer 300 is formed on the sensing electrode 100 except for a portion where the sensing electrode 100 and the bridge electrode 200 are electrically connected to each other (island method).
(Metal Pattern)
The metal pattern 400 is formed on the insulating layer 300 exposed between the first pattern 110 and the second pattern 120 to exert an effect of significantly reducing the visibility of the transparent electrode laminate by reducing the difference in reflectivity between the pattern portion and the non-pattern portion (pattern opening portion) of the transparent electrode.
Specifically, when the pattern is formed of a metal having a high reflectance on the non-pattern portion, a difference in reflectance from the pattern portion of the transparent electrode is reduced, and thus, an observer cannot recognize the difference in reflectance between the pattern portion and the non-pattern portion.
Preferably, the metal pattern 400 according to the present invention may be formed to satisfy the following formula 1.
[ formula 1]
0.99. ltoreq [ (area ratio of metal pattern on insulating layer) × (total reflectance of metal pattern) + (1- (area ratio of metal pattern on insulating layer)) × (total reflectance of portion without metal pattern on insulating layer)/(total reflectance of sensor electrode and bridge electrode) ]. ltoreq.1.01
(wherein the total reflectance is a value obtained by adding the interface (surface) reflectance to the respective reflectances.)
When the area ratio and the reflectance of the metal pattern 400 satisfy the relationship defined by equation 1, the total reflected lights of the pattern portion and the non-pattern portion of the transparent electrode are identical to each other, and thus, an observer cannot recognize the difference in reflectance between the pattern portion and the non-pattern portion of the transparent electrode. Therefore, the reduction in visibility of the transparent electrode laminate can be greatly increased.
The reflectances of the sensor electrode 100 and the bridge electrode 200 can be adjusted by appropriately selecting the thicknesses, reflectances, electrode materials, and the like of the sensor electrode 100 and the bridge electrode 200. Similarly, by appropriately selecting the thickness, material, and the like of the metal pattern 400, the reflectivity of the metal pattern 400 can be adjusted.
Any conventional metal known in the related art may be used for the metal pattern 400 according to the present invention, for example, molybdenum, silver, aluminum, copper, etc., may be used, and molybdenum is preferably used. These metals may be used alone or in a combination of two or more.
The thickness of the metal pattern 400 is not particularly limited but may be, for example, in the range of 20nm to 300nm, preferably, in the range of 50nm to 150 nm. When the thickness of the metal pattern 400 is in the range of 20nm to 300nm, the reduction in visibility of the transparent electrode laminate may be greatly increased by providing an optimal level of reflectivity.
The method of forming the metal pattern 400 is not particularly limited, but may be, for example, by the same method as the method of forming the sensing electrode 100 and the bridge electrode 200.
(transparent substrate)
The transparent substrate is a portion that forms the outermost surface of the touch screen panel and is in contact with a finger or an object of a user. The transparent electrode laminate of the present invention is formed on the side opposite to the surface in contact with the finger or object of the user. As shown in fig. 3, the transparent electrode laminate of the present invention is sequentially formed on a transparent substrate on which sensing electrodes are formed.
The transparent electrode laminate of the present invention may further include a transparent dielectric layer between the transparent substrate and the sensing electrode 100, if necessary.
The transparent dielectric layer functions to reduce a difference in optical performance due to a difference in structure at an independent position, thereby improving optical uniformity of the touch screen panel.
The transparent dielectric layer may be formed of niobium oxide, silicon oxide, cerium oxide, indium oxide, or the like, which may be used alone or in combination of two or more. The transparent dielectric layer can be easily deposited in a thin film form by using a vapor deposition method, a sputtering method, an ion plating method, or the like.
In the present invention, a plurality of transparent dielectric layers are formed on a transparent substrate, if necessary. In this case, the respective dielectric layers of the plurality of transparent dielectric layers may be formed of different materials from each other, and may have different refractive indices and thicknesses from each other.
However, since the transparent electrode laminate of the present invention includes the metal pattern 400 formed therein, a difference in optical performance due to a difference in structure at an independent position may be reduced without forming a transparent dielectric layer, and thus the transparent dielectric layer may not be included.
If the transparent substrate has high durability enough to protect the touch screen panel from external force and allow a user to view the display well, the transparent substrate may be made of any material, and any material used in the related art for forming the transparent substrate may be employed without particular limitation. For example, glass, Polyethersulfone (PES), Polyacrylate (PAR), Polyetherimide (PEI), polyethylene naphthalate (PEN), polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyallylate, polyimide, Polycarbonate (PC), cellulose Triacetate (TAC), Cellulose Acetate Propionate (CAP), or the like can be used. Preferably, glass is used, and more preferably, reinforced glass is used.
The transparent substrate according to the present invention may have a suitable thickness, for example, 0.1mm to 0.7 mm. When the transparent substrate has a thickness within the above range, the decrease in reflectance of the transparent electrode laminate of the present invention can be more improved.
Preferably, the transparent substrate has a refractive index of 1.4 to 1.6. When the transparent substrate has a refractive index within the above range, the decrease in reflectance can be more improved.
In the present invention, the transparent substrate may further include at least one optically functional layer on a side opposite to a surface on which the transparent electrode is formed. The optically functional layer may be an anti-contamination layer, for example, an anti-reflection layer, an anti-fingerprint layer, or the like, which may be used alone or in combination of two or more.
(passivation layer)
In order to prevent the sensing electrode 100 and the bridge electrode 200 from being contaminated due to exposure to the external environment (water, air, etc.), the transparent electrode laminate of the present invention may further include a passivation layer on a surface opposite to the surface of the transparent electrode laminate to which the transparent substrate is adhered, if necessary.
The passivation layer may be formed of any one material selected from materials available in the insulating layer 300.
The passivation layer according to the present invention may have a suitable thickness, for example, 2,000nm or less, specifically 0 to 2,000 nm. When the passivation layer has a thickness within the above range, the reduction of the reflectance may be more improved.
Preferably, the refractive index of the passivation layer is 1.4 to 1.6. When the passivation layer has a refractive index within the above range, the reduction of the reflectivity can be more improved.
(adhesive layer)
The transparent electrode laminate of the present invention may include an adhesive layer for adhesion to the display panel part. The adhesive layer is prepared by coating a transparent hardening resin composition and curing it (OCR), or by pressing an adhesive (OCA) formed in advance in the shape of a film onto the transparent electrode laminate.
The adhesive layer may also affect the reflectivity of the transparent electrode laminate. Therefore, in order to reduce the reflectance of the transparent electrode laminate, it is preferable that the adhesive layer has an appropriate thickness and refractive index. For example, the adhesive layer may have a thickness of 0 to 250 μm and a refractive index of 1 to 1.6. When the thickness of the adhesive layer is 0 μm, the transparent electrode laminate does not have the adhesive layer, for example, the adhesive layer is not formed on a portion of the transparent electrode laminate to be actually displayed with the exception of an edge portion where the adhesive layer is formed. In this case, only an air gap is formed between the transparent electrode laminate and the display panel.
As described above, since the transparent electrode laminate of the present invention includes the metal pattern 400 formed on the region corresponding to between the sensing electrodes 100 in the insulating layer 300, it is possible to minimize the difference in reflectivity between the pattern portion and the non-pattern portion of the transparent electrode and to significantly improve the transparency thereof. Therefore, by bonding the transparent electrode laminate of the present invention to a display panel portion, the transparent electrode laminate of the present invention can be prepared into a touch screen panel having excellent transparency.
Hereinafter, preferred embodiments will be described with reference to examples to more clearly understand the present invention. It will be apparent, however, to those skilled in the art that these embodiments are provided for illustrative purposes, and that various modifications and changes may be made without departing from the scope and spirit of the invention, such modifications and changes being properly included in the invention as defined in the appended claims.
Examples and comparative examples
Transparent electrode laminates having thicknesses shown in table 1 below were manufactured in examples 1 to 7 and comparative examples 1 to 4, respectively, then, the average reflectance at each position and the difference in the average reflectance of the region ① and the region ② as shown in fig. 2 were measured, and the results thereof are shown in table 1.
The reflectance and extinction coefficient based on light having a wavelength of 550nm are shown in Table 1 using glass (refractive index: 1.51, extinction coefficient: 0) having a thickness of 0.7mm as a transparent substrate, an ITO film (refractive index: 1.8, extinction coefficient: 0.014) as a sensing electrode, and an acrylic insulating material (refractive index: 1.51, extinction coefficient: 0) as an insulating layer and a passivation layer, respectively.
The metal pattern is formed of molybdenum having a thickness of 50nm or 150 nm.
In example 1, example 3, example 7, comparative example 1, comparative example 2 and comparative example 4, the bridge electrode was formed of an ITO film (refractive index: 1.8, extinction coefficient: 0.014); in other and comparative examples, the bridge electrode was formed of molybdenum.
Then, a bridge electrode, an insulating layer, and a sensing electrode were sequentially formed in example 7, example 8, and comparative example 4; and the sensing electrode, the insulating layer and the bridge electrode are sequentially formed in other embodiments and comparative embodiments.
The air in the adhesive layer of table 1 means: the adhesive layer is not formed on a portion where an image is to be displayed, and the adhesive layer is formed only on an edge portion of the light-shielding plate.
[ Table 1]
To representatively describe example 1 in table 1, the reflectance of molybdenum and the reflectance of the outermost surface in the region ② were measured to be 57% and 4%, respectively, and thus the total reflectance of the metal pattern was 61% (the same for the case where the thickness was 50nm and 150 nm.) furthermore, the total reflectance of the portion without the metal pattern on the insulating layer was measured to be 8.1%. the average reflectance in the region ② was calculated by using the measured values and the area ratio of the metal pattern.
In each region, since the influence of the region ①, which is the widest region, on the visibility of the pattern is the largest and the influence of the other regions is the smallest, the visibility of the pattern is compared by the difference in reflectance between the region ① and the region ②.
Referring to table 1, since the transparent electrode laminates prepared in examples 1 to 7 have metal patterns formed thereon, the difference in reflectivity between the region ① and the region ② was only 0.1%, and thus the patterns were not exposed to the user.
However, with the transparent electrode laminates prepared in comparative examples 1 to 4, the difference in reflectance between the region ① and the region ② was significantly large, the difference in reflectance was 1.2% or 1.3%, and thus, the pattern was exposed to the user.
Claims (15)
1. A transparent electrode laminate comprising:
a sensing electrode including a first pattern formed in a first direction and a second pattern formed in a second direction;
a bridge electrode configured to electrically connect the individual cell patterns of the second pattern; and
an insulating layer disposed between the sensing electrode and the bridge electrode,
wherein, on the insulating layer, a metal pattern is formed at a pattern opening portion between the first pattern and the second pattern, and the metal pattern satisfies the following formula 1:
[ formula 1]
0.99. ltoreq [ (area ratio of metal patterns on the insulating layer) × (total reflectance of metal patterns) + (1- (area ratio of metal patterns on the insulating layer)) × (total reflectance of portions without metal patterns on the insulating layer)/(total reflectance of sensor electrodes and bridge electrodes) ]. ltoreq.1.01,
wherein the total reflectance is a value obtained by adding the interface reflectance to the respective reflectances.
2. The transparent electrode laminate according to claim 1, wherein the metal pattern is formed of at least one metal selected from molybdenum, silver, aluminum, and copper.
3. The transparent electrode laminate according to claim 1, wherein the metal pattern has a thickness of 20nm to 300 nm.
4. The transparent electrode laminate according to claim 1, wherein the bridge electrode electrically connects the second pattern through a contact hole formed in the insulating layer.
5. The transparent electrode laminate according to claim 1, wherein the cell bridge electrode comprises at least one bridge.
6. The transparent electrode laminate according to claim 1, wherein the bridges of the cell bridge electrodes have a width of 2 to 200 μm.
7. The transparent electrode laminate according to claim 1, wherein the bridge electrode is formed of a material having a higher electrical conductivity than that of the sensing electrode.
8. The transparent electrode laminate according to claim 1, wherein the bridge electrode has a thickness of 20nm to 200 nm.
9. The transparent electrode laminate according to claim 1, wherein the bridge electrode is formed of the same material as that of the metal pattern.
10. The transparent electrode laminate according to claim 9, wherein the bridges of the cell bridge electrodes have a width of 2 to 20 μm.
11. The transparent electrode laminate according to claim 1, wherein the sensor electrode and the bridge electrode are connected to a driving circuit through a position detection line formed of the same material as that of the metal pattern.
12. The transparent electrode laminate according to claim 1, further comprising a passivation layer on a surface opposite to a surface of the transparent electrode laminate to which the transparent substrate is adhered.
13. The transparent electrode laminate according to claim 12, wherein the transparent substrate further comprises at least one optically functional layer on a side opposite to a surface on which the transparent electrode is formed.
14. The transparent electrode laminate of claim 13, wherein the optically functional layer is at least one of an anti-reflective layer and an anti-contamination layer.
15. A touch screen panel comprising the transparent electrode laminate according to claim 1.
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| CN108491108A (en) * | 2018-03-26 | 2018-09-04 | 业成科技（成都）有限公司 | Tool improves the touch control electrode bridging structure of visual effect |
| CN108646939A (en) * | 2018-04-20 | 2018-10-12 | 武汉华星光电半导体显示技术有限公司 | A kind of touch electrode structure and touch panel |
| US10739922B2 (en) | 2018-04-20 | 2020-08-11 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Touch control electrode structure and touch control panel |
| CN108984041A (en) * | 2018-09-04 | 2018-12-11 | 信利光电股份有限公司 | A kind of production method and OGS touch screen of OGS touch screen |
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