KR102077548B1 - Transparent electrode pattern structure and touch screen panel having the same - Google Patents

Abstract

The present invention relates to a transparent electrode laminate, more specifically, a first electrode formed in a first direction and a sensing electrode formed in a second direction and formed in a second pattern; A bridge electrode electrically connecting the spaced unit patterns of the second pattern; And an insulating layer interposed between the sensing electrode and the bridge electrode, by providing a metal pattern on the insulating layer exposed between the first pattern and the second pattern, thereby minimizing the difference in reflectance for each location, thereby providing It relates to a transparent electrode laminate exhibiting high transparency by reducing visibility.

Description

Transparent electrode pattern laminate and touch screen panel provided with the same {TRANSPARENT ELECTRODE PATTERN STRUCTURE AND TOUCH SCREEN PANEL HAVING THE SAME}

The present invention relates to a transparent electrode laminate and a touch screen panel having the same, and more particularly, to a transparent electrode laminate having a low visibility to a user and a touch screen panel having the same.

Typically, a touch screen panel is a screen panel equipped with a special input device that receives a position when touched by hand. These touch screen panels receive input data directly from the screen so that if a person's hand or object touches a character or a specific location on the screen without using a keyboard, the location can be identified and processed by the stored software. It is made possible by being stacked in multiple layers.

The use of a transparent electrode is essential in order to recognize a touched part without deteriorating the visibility of an image displayed on the screen, and a transparent electrode formed in a predetermined pattern is usually used.

A variety of transparent electrode structures used for touch screen panels are introduced, for example, GFF (Glass-ITO film-ITO film), G1F (Glass-ITO film), and G2 (Glass only) structures. have.

GFF is the most common structure, and consists of two films of transparent electrodes (ITO) required to implement the X and Y axes. G1F deposits a thin film of ITO on the back of the glass, and the second ITO film as in the conventional method. Use G2 is a method of forming a thin layer by depositing and patterning ITO for the X-axis on the back side using one piece of tempered glass, and then forming an insulating layer on it and patterning the ITO for the Y-axis again. As GFF-> G1F-> G2 increases, the transmittance increases and the power consumption decreases, so research on the G2 structure has been actively conducted.

However, in the case of a G2 structure using a patterned transparent electrode, the pattern portion and the non-pattern portion (pattern opening) of the transparent electrode may be visually distinguished. As the reflectance difference between the pattern portion and the non-pattern portion increases, the difference becomes larger. Since it becomes clear, there is a problem that the visibility of the appearance as a display element decreases. In particular, in the capacitive touch panel, since the patterned transparent electrode layer is formed on the entire surface of the display unit, it is required to have a good appearance as a display element even when the transparent electrode layer is patterned.

To improve this problem, for example, Japanese Patent Application Publication No. 2008-98169 in Patent Document 1 discloses a transparent conductive film formed of an undercoat layer composed of two layers having different refractive indices between a transparent substrate and a transparent conductive layer. Is proposed. Further, as an example, a silicon tin oxide layer having a refractive index of 1.7 as a high refractive index layer (10 nm or more in thickness), a silicon oxide layer having a refractive index of 1.43 as a low refractive index layer (thickness of 30 nm), and an ITO film having a refractive index of 1.95 as a transparent conductive layer. A transparent conductive film having (thickness 15 nm) formed in this order is described.

However, in the transparent conductive film described in Patent Document 1, there is a problem that the difference between the pattern portion and the pattern opening is clearly revealed, and it is still insufficient to improve the appearance.

Japanese Patent Publication No. 2008-98169

An object of the present invention is to provide a transparent electrode laminate having low visibility due to a small difference in reflectance at each position of the pattern.

In addition, an object of the present invention is to provide a touch screen panel provided with the transparent electrode laminate.

1. A first pattern formed in a first direction and a sensing electrode formed in a second direction and formed in a second pattern; A bridge electrode electrically connecting the spaced unit patterns of the second pattern; And an insulating layer interposed between the sensing electrode and the bridge electrode. A transparent electrode laminate having a metal pattern formed on the insulating layer exposed between the first pattern and the second pattern.

2. In the above 1, the metal pattern is a transparent electrode laminate formed to satisfy the following equation (1):

[Equation 1]

0.99≤ ((area ratio of metal pattern on insulating layer) * (total reflectance of metal pattern on insulation layer) + (1- (total ratio of metal pattern on insulating layer)) * (total reflectance of areas without metal pattern on insulating layer)) / (Total reflectance of sensing electrode and bridge electrode) ≤1.01

(Wherein, the total reflectance is the value of each reflectivity plus the interfacial (surface) reflectance).

3. In the above 1, the metal pattern is a transparent electrode laminate formed of at least one selected from the group consisting of molybdenum, silver, aluminum and copper.

4. In the above 1, the thickness of the metal pattern is a transparent electrode laminate of 20 to 300nm.

5. In the above 1, the bridge electrode is a transparent electrode laminate to electrically connect the second pattern through a contact hole formed in an insulating layer.

6. In the above 1, the unit bridge electrode is a transparent electrode laminate formed of at least one bridge.

7. In the above 1, the width of the bridge of the unit bridge electrode is 2 to 200㎛ transparent electrode laminate.

8. In the above 1, the bridge electrode is a transparent electrode laminate formed of a material having a higher electrical conductivity than the sensing electrode.

9. In the above 1, the bridge electrode is a transparent electrode laminate having a thickness of 20 to 200nm.

10. In 1 above, the bridge electrode is a transparent electrode laminate formed of the same material as the metal pattern.

11. In the above 10, the bridge of the unit bridge electrode is a transparent electrode laminate having a width of 2 to 20㎛.

12. In the above 1, the sensing electrode and the bridge electrode is a transparent electrode laminate connected to the driving circuit through a position detection line formed of the same material as the metal pattern.

13. The transparent electrode laminate according to the above 1, further comprising a passivation layer on the opposite side of the transparent substrate based on the transparent electrode laminate.

14. In the above 1, the transparent substrate is a transparent electrode laminate further comprising at least one optical functional layer on the opposite surface of the surface on which the transparent electrode is formed.

15. The transparent electrode laminate according to the above 14, wherein the optical functional layer is at least one layer of an anti-reflection layer and an anti-pollution layer.

16. A touch screen panel having the transparent electrode laminate of any one of 1 to 15 above.

The transparent electrode laminate of the present invention is configured to control the thickness of each layer constituting the laminate to a specific range, thereby minimizing the difference in reflectance for each location caused by the patterned transparent electrode structure, thereby reducing visibility to the user. It shows transparency.

In this aspect, the transparent electrode laminate of the present invention can be very useful when applied to a G2 structured touch screen panel by exhibiting high transmittance and low reflectance.

1 is a schematic plan view of an embodiment of a transparent electrode laminate of the present invention.
2 is a schematic plan view of a unit structure in one embodiment of the transparent electrode laminate of the present invention.
3 is a schematic cross-sectional view showing a stacked structure for each position of the transparent electrode laminate of the present invention.

The present invention is a first electrode formed in a first direction and a sensing electrode formed in a second direction and formed in a second pattern; A bridge electrode electrically connecting the spaced unit patterns of the second pattern; And an insulating layer interposed between the sensing electrode and the bridge electrode, by providing a metal pattern on the insulating layer exposed between the first pattern and the second pattern, thereby minimizing the difference in reflectance for each location, thereby providing It relates to a transparent electrode laminate exhibiting high transparency by reducing visibility.

Hereinafter, the present invention will be described in detail with reference to the drawings. However, the following drawings attached to this specification are intended to illustrate preferred embodiments of the present invention, and serve to further understand the technical idea of the present invention together with the contents of the present invention, the present invention is described in such drawings It should not be interpreted as being limited to the matter.

1 is a schematic plan view of an embodiment of a transparent electrode laminate of the present invention.

Referring to FIG. 1, the transparent electrode laminate of the present invention includes a sensing electrode 100, a bridge electrode 200, an insulating layer 300 and a metal pattern 400. In addition, the transparent electrode laminate of the present invention may further include a contact hole 500, may be formed on a transparent substrate (not shown), the passivation layer (not shown) is further on the opposite side of the transparent substrate It may be provided.

1, the transparent electrode laminate is formed in a predetermined pattern. The sensing electrode 100 and the bridge electrode 200 provide location information of a touched point, and the insulating layer 300 is interposed between the sensing electrode 100 and the bridge electrode 200 to electrically separate them, The metal pattern 400 is formed on the insulating layer 300 exposed between the first pattern 110 and the second pattern 120 to reduce visibility of the transparent electrode laminate of the present invention. In addition, the contact hole 500 is formed on the insulating layer 300 so that the sensing electrode 100 and the bridge electrode 200 can be electrically connected.

As illustrated in FIG. 3, the transparent electrode stacked body has various layer structures. Due to the various layer structures according to these positions, differences in reflectance, luminance, and color difference for each position occur, and accordingly, visibility to a pattern is increased, thereby making it transparent. Limitations in function as electrodes occur.

Accordingly, the present invention solves the above problems by minimizing the difference in reflectance between the transparent electrode pattern portion and the non-pattern portion by forming a metal pattern on the region corresponding to the sensing electrode in the insulating layer. Hereinafter, the present invention will be described in more detail.

<Transparent electrode>

In the present invention, the transparent electrode includes not only an electrode that is actually formed of a transparent material, but also an electrode that is formed with a narrow width and thus cannot be discerned by the naked eye.

1 to 3, the transparent electrode according to the present invention includes a sensing electrode 100 and a bridge electrode 200.

The sensing electrode 100 is formed of a first pattern 110 and a second pattern 120. The first pattern 110 and the second pattern 120 are arranged in different directions to provide information about the X and Y coordinates of the touched point. For example, each may be arranged in the same row or column, but is not limited thereto.

Specifically, when a human hand or an object touches the transparent substrate, the first pattern 110, the second pattern 120, the bridge electrode 200, and a power failure according to the contact position toward the driving circuit via the position detection line Changes in dose are communicated. Then, the contact position is grasped by the change of the electrostatic capacity to an electrical signal by the X and Y input processing circuit (not shown).

In this regard, the first pattern 110 and the second pattern 120 are formed on the same layer, and each pattern must be electrically connected to detect a touched point. By the way, the first pattern 110 is connected to each other, but the second pattern 120 is an island (island) in a structure separated from each other, so a separate connection line is required to electrically connect the second pattern 120 Do.

However, since the connection line should not be electrically connected to the first pattern 110, it must be formed on a different layer from the sensing electrode 100. Accordingly, the bridge electrode 200 is formed on a separate layer from the sensing electrode 100 to electrically connect the second pattern 120. That is, the bridge electrode 200 electrically connects the second pattern 120 of the sensing electrode 100.

Accordingly, in FIGS. 2 and 3, positions ①, ③, and ④ are parts in which a sensing electrode 100 is formed in a predetermined pattern to detect a touched part, and positions ③, ④, and ⑤ are second patterns formed in an island shape. The bridge electrode 200 formed to electrically connect 120 is present.

At this time, since the bridge electrode 200 must be electrically blocked from the first pattern 110 among the sensing electrodes 100, an insulating layer 300 is formed for this purpose, and a contact hole 500 (③ in FIG. 2) is formed. It can be further provided, which will be described later.

The thickness of the sensing electrode 100 and the bridge electrode 200 according to the present invention is not particularly limited, and may be, for example, 20 to 200 nm, respectively. When the thickness of the sensing electrodes and the bridge electrodes 100 and 200 is less than 20 nm, electrical resistance may be increased, and touch sensitivity may be reduced.

In addition, the sensing electrode 100 and the bridge electrode 200 preferably have a refractive index of 1.8 to 1.98, respectively. In the refractive index range, the effect of reducing the reflectance may be further enhanced.

The sensing electrode 100 and the bridge electrode 200 according to the present invention may be a transparent electrode material known in the art without limitation. For example, indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), cadmium tin oxide (CTO), PEDOT (poly (3,4-ethylenedioxythiophene)) , Carbon nanotubes (CNT), metal wires, and the like. These may be used alone or in combination of two or more. Indium tin oxide (ITO) may be preferably used. The metal used for the metal wire is not particularly limited, and examples thereof include silver (Ag), gold, aluminum, copper, iron, nickel, titanium, telenium, and chromium. These may be used alone or in combination of two or more.

In the present invention, the bridge means an electrode formed in one line form of a unit bridge electrode, and the unit bridge electrode according to the present invention may be formed of at least one bridge.

The width of the bridge of the unit bridge electrode according to the present invention is not particularly limited, and may be, for example, 2 to 200 μm, and preferably 2 to 100 μm. When the width of the bridge is 2 to 200 μm, when the transparent electrode laminate of the present invention is applied to a touch screen panel, it is possible to reduce the visibility of the pattern and have an appropriate electrical resistance.

The bridge electrode 200 may be formed of a material having higher electrical conductivity than the sensing electrode 100 in view of reducing the bezel width by being applied to the touch screen panel by forming the bridge electrode 200 with a narrower width. When the bridge electrode 200 is formed of a material having higher electrical conductivity than the sensing electrode, the second pattern 120 of the sensing electrode 100 may be electrically connected even with a smaller area.

Since the electrical resistance may increase when the width of the bridge is narrowed, in this case, the bridge electrode according to the present invention may be formed of at least two or more bridges as shown in FIG. 2. In such a case, an increase in resistance can be suppressed, and the area ratio of the bridge electrode 200 per unit area decreases, so that visibility of the pattern portion can be reduced.

When the bridge electrode 200 is formed of a material having higher electrical conductivity than the sensing electrode 100, the width of the bridge of the unit bridge electrode may be, for example, 2 to 20 μm, and preferably 2 to 5 μm. However, it is not limited thereto. When the width of the bridge is 2 to 20 μm, it is possible to reduce the visibility of the pattern and have adequate electrical resistance.

In another aspect of the present invention, the bridge electrode 200 may be formed of the same material as the metal pattern 400 to be described later.

When the bridge electrode 200 is formed of the same material as the metal pattern 400, the metal pattern 400 is formed when the bridge electrode 200 is formed without having to go through a separate process for forming the metal pattern 400. It can be formed together, there is an effect that the process efficiency is improved.

The sensing electrodes and the bridge electrodes 100 and 200 may be formed by various thin film deposition techniques such as physical vapor deposition (PVD) and chemical vapor deposition (Chemical VaporDeposition, CVD). For example, it may be formed by reactive sputtering, which is an example of a physical vapor deposition method.

Further, the sensing electrodes and the bridge electrodes 100 and 200 may be formed by a printing process. In this printing process, various printing methods such as gravure off set, reverse off set, screen printing, and gravure printing may be used. In particular, when the sensing electrodes and the bridge electrodes 100 and 200 are formed by a printing process, they may be formed of a printable paste material. For example, it may be formed of a carbon nano tube (CNT), a conductive polymer, and Ag nano wire ink.

In the present invention, the stacking order of the sensing electrode 100 and the bridge electrode 200 is not limited. Therefore, in another embodiment of the present invention, the stacking order of the sensing electrode 100 and the bridge electrode 200 of FIG. 3 may be changed. For example, instead of the sensing electrode 100 on the transparent substrate, the bridge electrode 200 is first formed, the insulating layer 300 is formed thereon, and then the sensing electrode 100 is formed on the insulating layer 300. It might be.

A method of forming a position detection line connecting the first pattern 110, the second pattern 120, and the bridge electrode 200 with the driving circuit is not particularly limited, and for example, the sensing electrode and the bridge electrode 100, 200 It may be formed in the same way as the method of forming.

Preferably, the position detection line according to the present invention may be formed of the same material as the metal pattern 400. In such a case, without having to go through a separate process for forming the metal pattern 400, the metal pattern 400 can be formed together when the metal wiring and the position detection line are formed, thereby improving the process efficiency. have.

When the bridge electrode 200 and the position detection line are both formed of the same material as the metal pattern 400, both the position detection line and the metal pattern 400 are formed together when the bridge electrode 200 is formed. It can maximize the effect of improving the process efficiency.

<Insulation layer and contact hall>

The insulating layer 300 is formed between the sensing electrode 100 and the bridge electrode 200 to prevent electrical connection between the sensing electrode 100 and the bridge electrode 200. However, as shown in FIGS. 2 and 3, when the bridge electrode 200 electrically connects the second pattern 120 of the adjacent sensing electrode 100, it must be electrically connected to the sensing electrode 100. , A portion in which the insulating layer 300 is not formed is required. As described above, a portion in which the insulating layer 300 is not formed in the insulating layer 300 region is referred to as a contact hole 500 (3 in FIG. 2). Therefore, the electrical contact between the second pattern 120 and the bridge electrode 200 is made in the contact hole 500.

The insulating layer 300 according to the present invention may be applied without limitation a transparent insulating material known in the art. For example, a metal oxide such as silicon oxide or a transparent photosensitive resin composition containing an acrylic resin or a thermosetting resin composition may be used to form a required pattern.

The insulating layer 300 may be formed on the sensing electrode 100 by a method such as deposition or printing.

In the present invention, the contact hole 500 may be formed by forming a hole after forming the insulating layer 300 as a whole (hole method), and detecting the insulating layer 300 by the sensing electrode 100 And the bridge electrode 200 may be formed in a manner that is formed except for the part to be electrically connected (island (island) method).

<Metal pattern>

The metal pattern 400 is formed on the insulating layer 300 exposed between the first pattern 110 and the second pattern 120, so that the reflectance difference between the pattern portion of the transparent electrode and the non-pattern portion (pattern opening) is To reduce the visibility of the transparent electrode laminate serves to significantly lower.

Specifically, by forming a pattern with a metal having high reflectivity on the non-patterned portion, the difference in reflectance with the patterned portion of the transparent electrode is reduced to prevent the observer from recognizing the difference in reflectance.

Preferably, the metal pattern 400 according to the present invention may be formed to satisfy Equation 1 below:

[Equation 1]

0.99≤ ((area ratio of metal pattern on insulating layer) * (total reflectance of metal pattern on insulation layer) + (1- (total ratio of metal pattern on insulating layer)) * (total reflectance of areas without metal pattern on insulating layer)) / (Total reflectance of sensing electrode and bridge electrode) ≤1.01

(Wherein, the total reflectance is the value of each reflectivity plus the interfacial (surface) reflectance).

When the area and reflectance of the metal pattern 400 satisfy the above relationship, the total reflected light of the pattern portion and the non-pattern portion of the transparent electrode is the same, so that the observer cannot recognize the difference in reflectance between the pattern portion and the non-pattern portion of the transparent electrode. The effect of lowering the visibility of the electrode laminate can be maximized.

The reflectivity of the sensing electrodes and the bridge electrodes 100 and 200 can be adjusted by appropriately selecting the thickness, refractive index, electrode material, etc. of the sensing electrode and the bridge electrodes 100 and 200, and the reflectivity of the metal pattern 400 is the thickness and material It can be adjusted by appropriately selecting the back.

The metal pattern 400 according to the present invention may be a metal commonly used in the art, for example, molybdenum, silver, aluminum and copper, and the like, preferably molybdenum. These may be used alone or in combination of two or more.

The thickness of the metal pattern 400 according to the present invention is not particularly limited, and may be, for example, 20 to 300 nm, and preferably 50 to 150 nm. When the thickness of the metal pattern 400 is 20 to 300 nm, it has an appropriate level of reflectance to maximize the effect of reducing visibility.

The method of forming the metal pattern 400 according to the present invention is not particularly limited, and may be formed, for example, by the same method as the method of forming the first and bridge electrodes 100 and 200.

<Transparent board>

The transparent substrate forms an outermost surface of the touch screen panel, and is a part in which a human hand or object comes into direct contact. A transparent electrode laminate of the present invention is formed on the opposite side where a human hand or object comes into direct contact. 3, the transparent electrode laminate of the present invention is formed by sequentially stacking the sensing electrodes on the transparent substrate.

If necessary, the transparent electrode laminate of the present invention may further include a transparent dielectric layer between the transparent substrate and the sensing electrode 100.

The transparent dielectric layer improves the optical uniformity of the touch screen panel by reducing the difference in optical characteristics due to structural differences for each position according to the pattern structure of the transparent electrode.

The transparent dielectric layer may be formed of niobium oxide, silicon oxide, cerium oxide, indium oxide, or the like individually or by mixing two or more kinds. As the forming method, a vacuum deposition method, a sputtering method, an ion plating method, or the like can be used, and it can be easily produced in the form of a thin film through the above method.

In the present invention, if necessary, the transparent dielectric layer may be formed of a plurality of layers. In this case, each layer may be formed of different materials, and may have different refractive indices and thicknesses.

However, the transparent electrode layered body of the present invention can reduce the difference in optical properties due to structural differences by position without forming a transparent dielectric layer by forming the metal pattern 500, so the transparent dielectric layer can be omitted.

The transparent substrate is large in durability to sufficiently protect the touch screen panel from external forces, and is not particularly limited as long as it is a material that allows the user to see the display well, and the material used in the field can be used without particular limitation. For example, glass, polyethersulphone (PES), polyacrylate (PAR), polyetherimide (PEI), polyethyelenen napthalate (PEN), polyethylene terephthalate (PET, polyethyelene terepthalate, polyphenylene sulfide (PPS), polyallylate, polyimide, polycarbonate, cellulose tri acetate (TAC), cellulose acetate propionate (cellulose acetate propionate, CAP) may be used, preferably glass may be used, and more preferably, tempered glass may be used.

The transparent substrate according to the present invention may have an appropriate thickness, for example, 0.1 to 0.7 mm. In the above range, the effect of reducing the reflectance of the transparent electrode laminate according to the present invention can be further improved.

In addition, the transparent substrate preferably has a refractive index of 1.4 to 1.6. In the refractive index range, the effect of reducing the reflectance in the case of having the aforementioned thickness range can be further enhanced.

In the present invention, the transparent substrate may further include at least one optical functional layer on the opposite side of the surface on which the transparent electrode is formed, if necessary. For example, an anti-reflection layer such as an anti-reflection layer or an anti-fingerprint layer may be formed alone or in combination of two or more of the optical functional layers.

<Passivation layer>

In order to prevent contamination of the sensing electrode and the bridge electrodes 100 and 200 by an external environment (moisture, air, etc.), the transparent electrode stack of the present invention is a transparent substrate based on the transparent electrode stack, if necessary. A passivation layer may be further provided on the side opposite to the bonded surface.

The passivation layer may be formed by adopting a material usable in the insulating layer 300.

The passivation layer according to the present invention may have an appropriate thickness, for example, 2,000 nm or less. Therefore, it may be, for example, 0 to 2,000 nm. In the above range, the effect of reducing the reflectance of the transparent electrode laminate according to the present invention can be further improved.

In addition, the passivation layer preferably has a refractive index of 1.4 to 1.6. In the refractive index range, the effect of reducing the reflectance in the case of having the aforementioned thickness range can be further enhanced.

<Adhesive layer>

The adhesive layer bonds the transparent electrode laminate of the present invention with the display panel portion. The adhesive layer may be formed by applying a transparent curable resin composition and then curing (OCR), or may be formed by pressing an already formed film (OCA).

The adhesive layer can also affect the reflectance of the transparent electrode laminate, and accordingly, it is preferable to have an appropriate thickness and refractive index to reduce the reflectance of the transparent electrode laminate. For example, the thickness may be 0 to 250 μm and the refractive index may be 1 to 1.6. When the thickness is 0 µm, when the adhesive layer is formed only on the edge portion of the transparent electrode stacked body, the adhesive layer is not formed on the inner portion where the actual image is displayed, which means that this is the case. Only the air layer exists between the display panel portions.

As described above, the transparent electrode laminate of the present invention is formed by forming a metal pattern 400 on a region corresponding to the sensing electrode 100 in the insulating layer 300, thereby making a difference in reflectivity between the transparent electrode pattern portion and the non-pattern portion. By minimizing, visibility can be significantly reduced. Therefore, the transparent electrode laminate of the present invention can be manufactured with an excellent touch screen panel by being bonded to a display panel unit.

Hereinafter, preferred embodiments are provided to help the understanding of the present invention, but these examples are merely illustrative of the present invention and do not limit the scope of the appended claims, and the embodiments are within the scope and technical scope of the present invention. It is apparent to those skilled in the art that various changes and modifications to the present invention are possible, and it is natural that such modifications and modifications belong to the appended claims.

Example  And Comparative example

A transparent electrode laminate was prepared with the thickness shown in Table 1 below, and the difference between the average reflectance for each position and the average reflectance between regions ① and ② shown in FIG. 2 was described. The average reflectance means an average of reflectance at 400 nm to 700 nm.

As a transparent substrate, glass having a thickness of 0.7 mm (refractive index: 1.51, extinction coefficient: 0),

As the sensing electrode, ITO (refractive index: 1.8, extinction coefficient: 0.014),

As the insulating layer and the passivation layer, an acrylic insulating material (refractive index: 1.51, extinction coefficient: 0) was used, and the refractive index and extinction coefficient were described based on light having a wavelength of 550 nm.

The metal pattern was formed of molybdenum with a thickness of 50 nm or 150 nm.

The bridge electrodes were formed of ITO (refractive index: 1.8, extinction coefficient: 0.014) for Examples 1, 3 and 7 and Comparative Examples 1, 2 and 4, and molybdenum for the remaining Examples and Comparative Examples.

And in the case of Examples 7, 8 and Comparative Example 4, it was formed in the order of the bridge electrode, the insulating layer and the sensing electrode, and in the case of the other Examples and Comparative Examples, it was formed in the order of the sensing electrode, the insulating layer and the bridge electrode.

When the adhesive layer is described as air, only the bezel portion is adhered to, so that an area where an image is displayed does not have an adhesive layer formed.

division Sensing electrode Insulation layer Bridge electrode Passivation layer Adhesive layer ② Area of metal pattern area
(%) Average reflectance
(%) ①, ② area reflectance difference
(%) thickness Unit bridge electrode
width Number of bridges in the unit bridge electrode Example 1 150nm 1,500nm 150nm 200㎛ One 1,500nm Air 2.3 ①: 9.3
②: 9.2
③: 9.6
④: 10.4
⑤: 9.8 0.1 Example 2 250nm 1,500nm 50nm 10㎛ 2 1,500nm Air 2.5 ①: 9.4
②: 9.3
③, ④, ⑤ Total average
: 12.0 0.1 Example 3 150nm 1,500nm 150nm 150㎛ One 1,500nm Air 2.3 ①: 9.3
②: 9.2
③: 9.6
④: 10.4
⑤: 9.8 0.1 Example 4 150nm 1,500nm 150nm 10㎛ 2 1,500nm Air 2.3 ①: 9.3
②: 9.2
③, ④, ⑤ Total average
: 11.8 0.1 Example 5 150nm 1,500nm 150nm 20㎛ 2 1,500nm Air 2.3 ①: 9.3
②: 9.2
③, ④, ⑤ Total average
: 14.9 0.1 Example 6 150nm 1,500nm 150nm 5㎛ One 1,500nm Air 2.3 ①: 9.3
②: 9.2
③, ④, ⑤ Total average
: 9.9 0.1 Example 7 250nm 1,500nm 50nm 200㎛ One 1,500nm Air 2.5 ①: 9.4
②: 9.3
③: 9.6
④: 12.3
⑤: 10.3 0.1 Comparative Example 1 150nm 1,500nm 150nm 200㎛ One 1,500nm Air - ①: 9.3
②: 8.1
③: 9.6
④: 10.4
⑤: 9.8 1.2 Comparative Example 2 250nm 1,500nm 50nm 200㎛ One 1,500nm Air - ①: 9.4
②: 8.1
③: 9.6
④: 12.3
⑤: 10.3 1.3 Comparative Example 3 150nm 1,500nm 150nm 200㎛ One 1,500nm Air - ①: 9.3
②: 8.1
③, ④, ⑤ Total average
: 61.0 1.2 Comparative Example 4 250nm 1,500nm 50nm 200㎛ One 1,500nm Air - ①: 9.4
②: 8.1
③: 9.6
④: 12.3
⑤: 10.3 1.3

In Table 1, Example 1 is representatively described, the reflectance of molybdenum is 57%, and the outermost surface reflectance in the region ② is measured as 4%, so that the total reflectance of the metal pattern is 61% (the same at 50nm and 150nm thickness). )to be. And the total reflectance of the region without the metal pattern on the insulating layer was measured to be 8.1%. Through this value and the area ratio of the metal pattern, the average reflectance of the area ② was obtained. For the rest of the cases, the reflectance was determined in the same manner.

Among each area, the area of ① is the widest, which has the greatest influence on the visibility of the pattern and the influence of the rest of the area is small.

Referring to Table 1, due to the formation of the metal pattern, the transparent electrode laminates of Examples 1 to 7 had a difference in reflectance between regions ① and ② of only 0.1%, so the pattern was not recognized.

However, in the transparent electrode laminates of Comparative Examples 1 to 4, the difference in reflectance between regions ① and ② was 1.2% or 1.3%, so a pattern was recognized.

100: sensing electrode, 110: first pattern, 120: second pattern,
200: bridge electrode, 300: insulating layer, 400: metal pattern,
500: contact hole

Claims (16)

Transparent substrates;
A sensing electrode formed on the transparent substrate, the first pattern formed in the first direction and the sensing electrode formed in the second direction and formed in the second pattern;
A bridge electrode electrically connecting the spaced unit patterns of the second pattern; And
And an insulating layer interposed between the sensing electrode and the bridge electrode.
A metal pattern is formed on the insulating layer exposed between the first pattern and the second pattern,
The metal pattern is formed to satisfy the following equation (1), a transparent electrode laminate:
[Equation 1]
0.99≤ ((area ratio of metal pattern on the insulating layer) * (total reflectance of the metal pattern on the insulating layer) + (1- (area ratio of metal pattern on the insulating layer)) * (total reflectance of the area without the metal pattern on the insulating layer)) / (Total reflectance of sensing electrode and bridge electrode) ≤1.01
(Wherein, the total reflectance is the value of each reflectivity plus the interfacial (surface) reflectance).
delete The method according to claim 1, The metal pattern is a transparent electrode laminate formed of at least one selected from the group consisting of molybdenum, silver, aluminum and copper.
The method according to claim 1, The thickness of the metal pattern is a transparent electrode laminate of 20 to 300nm.
The method according to claim 1, The bridge electrode is a transparent electrode laminate to electrically connect the second pattern through a contact hole formed in the insulating layer.
The method according to claim 1, The unit bridge electrode is a transparent electrode laminate formed of at least one bridge.
The method according to claim 1, The width of the bridge of the unit bridge electrode is a transparent electrode laminate of 2 to 200㎛.
The method according to claim 1, The bridge electrode is a transparent electrode laminate formed of a material having a higher electrical conductivity than the sensing electrode.
The method according to claim 1, The bridge electrode is a transparent electrode laminate having a thickness of 20 to 200nm.
The method according to claim 1, The bridge electrode is a transparent electrode laminate formed of the same material as the metal pattern.
The method according to claim 10, The bridge of the unit bridge electrode is a transparent electrode laminate having a width of 2 to 20㎛.
The method according to claim 1, The sensing electrode and the bridge electrode is a transparent electrode laminate connected to the driving circuit through a position detection line formed of the same material as the metal pattern.
The transparent electrode laminate according to claim 1, further comprising a passivation layer on the opposite side of the transparent substrate based on the transparent electrode laminate.
The method according to claim 1, The transparent substrate is a transparent electrode laminate further comprises at least one optical functional layer on the opposite surface of the surface on which the transparent electrode is formed.
The method according to claim 14, The optical functional layer is a transparent electrode laminate, which is at least one layer of the anti-reflection layer and anti-pollution layer.
The touch screen panel provided with the transparent electrode laminate of any one of claims 1 to 3 to 15.

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