WO2015030404A1

WO2015030404A1 - Touch sensing electrode and touch screen panel having same

Info

Publication number: WO2015030404A1
Application number: PCT/KR2014/007629
Authority: WO
Inventors: 하경수; 김상수
Original assignee: 동우화인켐 주식회사
Priority date: 2013-08-30
Filing date: 2014-08-18
Publication date: 2015-03-05
Also published as: KR101401052B1; TWI628563B; TW201510819A

Abstract

The present invention relates to a touch sensing electrode and a touch screen panel having the same. More specifically, the present invention relates to a touch sensing electrode which has excellent electrical conductivity, and a touch screen panel having the same, the touch sensing electrode comprising: a first sensing pattern formed on the lower surface of an insulating layer; and a second sensing pattern formed on the upper surface of the insulating layer, wherein at least one of the first sensing pattern and the second sensing pattern has a metal mesh pattern and has a metal plating layer on the upper part thereof.

Description

Touch sensing electrode and touch screen panel having the same

The present invention relates to a touch sensing electrode and a touch screen panel having the same, and more particularly, to a touch sensing electrode having excellent electrical conductivity and visibility and a touch screen panel having the same.

In general, the touch screen panel is a screen panel equipped with a special input device to receive the position when touched by hand. The touch screen panel receives input data directly from the screen so that when a person's hand or an object touches a character or a specific location displayed on the screen without using a keyboard, the touch screen panel can identify the location and perform specific processing by the stored software. It is made possible by being laminated | stacked in multiple layers.

In order to recognize the touched portion without degrading the visibility of the image displayed on the screen, the use of a transparent touch sensing electrode is essential, and typically, a sensing pattern formed in a predetermined pattern is used.

Various transparent sensing electrode structures used in the touch screen panel have been introduced. For example, glass-ITO film-ITO film (GFF), glass-ITO film (G1F), glass-only (G2) structures, etc. may be mentioned. have.

For example, a structure shown in FIG. 1 may be cited as a conventional transparent sensing electrode structure.

The transparent sensing electrode may be formed of the first sensing pattern 10 and the second sensing pattern 20. The first sensing pattern 10 and the second sensing pattern 20 are disposed in different directions to provide information about the X and Y coordinates of the touched point. Specifically, when a human hand or an object contacts the transparent substrate, the capacitance according to the contact position toward the driving circuit side via the first sensing pattern 10, the second sensing pattern 20, and the metal wiring which is the position detecting line. The change is conveyed. Then, the contact position is grasped by the change of the capacitance converted into an electrical signal by the X and Y input processing circuit (not shown) or the like.

In this regard, the first sensing pattern 10 and the second sensing pattern 20 are formed on the same substrate, and each pattern must be electrically connected to sense a touched point. However, since the first sensing patterns 10 are connected to each other, but the second sensing patterns 20 are separated from each other in an island form, a separate connection is required to electrically connect the second sensing patterns 20. An electrode (bridge electrode) 50 is required.

However, since the bridge electrode 50 should not be electrically connected to the first sensing pattern 10, the bridge electrode 50 should be formed on a different layer from the first sensing pattern 10. To show this structure, an enlarged view of a portion where the bridge electrode 50 is formed in the A-A 'cross section of FIG. 1 is shown in FIG.

Referring to FIG. 2,

sensing patterns

10 and 20 are formed on a substrate 100, and an insulating layer 30 and a bridge electrode 50 are formed thereon. The first sensing pattern 10 and the second sensing pattern 20 are spaced apart from each other, and are separated from the bridge electrode 50 by the insulating layer 30 formed thereon. The first sensing pattern 10 is electrically insulated from the bridge electrode 50, and as described above, since the second sensing pattern 20 needs to be electrically connected, the bridge electrode 50 is used. Is electrically connected. In order to connect the second sensing pattern 20 separated in an island form to the bridge electrode 50 while being electrically disconnected from the first sensing pattern 10, a contact hole 40 may be formed on the insulating layer 30. There is a need.

By the way, the bridge electrode 50 is typically formed of a metal in order to increase the electrical conductivity, there is a problem that the pattern is visible due to the difference in reflectance with the sensing pattern.

In order to solve this visibility problem, when the bridge electrode 50 is formed of a metal with a very narrow width, there is an advantage that the visibility can be improved and the process can be simplified by forming with the metal wiring, but to form a narrow width In addition to the high precision process equipment, and the time-consuming problem of forming a precise pattern, the electrical resistance is increased and the electrical conductivity is lowered, resulting in a slower detection speed. there is a problem.

In addition, the production and research of a display having a narrower bezel has been recently conducted. As the width of the bezel is narrowed, there is a problem in that electrical resistance of the metal wiring hidden in the bezel portion increases.

Japanese Patent Application Laid-Open No. 2008-98169 proposes a transparent conductive film in which an undercoat layer composed of two layers having different refractive indices is formed between a transparent substrate and a transparent conductive layer.

[Preceding technical literature]

[Patent Documents]

(Patent Document 1) Japanese Laid-Open Patent No. 2008-98169

An object of the present invention is to provide a touch sensing electrode having a high electrical conductivity and a touch screen panel having the same.

Another object of the present invention is to provide a touch sensing electrode having low visibility according to a difference in reflectance for each position, and a touch screen panel having the same.

In addition, another object of the present invention is to provide a touch sensing electrode having a narrow bezel and a touch screen panel having the same.

1. A first sensing pattern formed on a lower surface of an insulating layer and a second sensing pattern formed on an upper surface of an insulating layer, wherein at least one of the first sensing pattern and the second sensing pattern has a metal mesh pattern. Touch sensing electrode having a metal plating layer on top.

2. The touch sensing electrode of 1 above, wherein at least one of the metal wires connecting the first and second sensing patterns with the driving circuit further includes a metal plating layer on an upper surface thereof.

3. In the above 1, wherein the sensing pattern other than the metal mesh structure is a transparent electrode pattern formed of a metal oxide, touch sensing electrode.

4. In the above 1, wherein the metal plating layer is formed by electroplating, touch sensing electrode.

5. In the above 1, wherein the metal plating layer is formed of copper, touch sensing electrode.

6. In the above 1, the thickness of the metal plating layer is 500 to 1,000nm, touch sensing electrode.

7. The touch sensing electrode according to 1 above, formed on one surface of a cover window substrate or a display panel of the touch screen panel.

8. forming sensing patterns formed on the lower and upper portions of the insulating layer in different directions, respectively;

At least one of the sensing patterns are formed by forming a metal plating pattern on the upper surface of the metal mesh pattern after forming a metal mesh pattern, manufacturing method of the touch sensing electrode.

9. In the above 8, wherein the metal wiring pattern is formed at the same time when the metal mesh pattern is formed, the manufacturing method of the touch sensing electrode.

10. In the above 9, wherein the metal plating layer is further formed on the upper surface of the metal wiring, manufacturing method of the touch sensing electrode.

11. In the above 8, wherein the sensing pattern other than the metal mesh pattern is formed of a metal oxide, manufacturing method of the touch sensing electrode.

12. The touch screen panel including the touch sensing electrode of any one of the above 1 to 7.

13. A display device comprising the above touch screen panel.

The touch sensing electrode of the present invention has a metal plating layer on top of the metal mesh electrode to increase the electrical conductivity of the metal mesh electrode, thereby exhibiting an excellent sensing speed.

In addition, the touch sensing electrode of the present invention may lower the visibility of the metal mesh electrode when the metal plating layer is used as a material having a low reflectance.

In addition, the touch sensing electrode of the present invention may include a metal plating layer on the metal wiring connecting the sensing pattern to the circuit, thereby maintaining a high electric conductivity even when the metal wiring is narrowed, thereby implementing a narrow bezel display device.

In addition, the touch sensing electrode of the present invention is disposed on different planes (upper and lower surface of the insulating layer) where the first sensing pattern and the second sensing pattern are different, so that there is no need for contact holes, and thus, the manufacturing process is simpler. .

1 is a schematic plan view of a conventional touch sensing electrode.

2 is a schematic vertical cross-sectional view of a conventional touch sensing electrode.

3 is a schematic plan view according to an embodiment of a touch sensing electrode according to the present invention.

4 is a schematic vertical cross-sectional view of a portion of the touch sensing electrode of the present invention shown in FIG.

5 is a schematic vertical cross-sectional view according to another embodiment of the touch sensing electrode according to the present invention.

FIG. 6 is a schematic vertical cross-sectional view of a portion of the touch sensing electrode of the present invention shown in FIG.

7 is a view schematically showing an embodiment of a method of manufacturing a touch sensing electrode according to the present invention.

The present invention includes a first sensing pattern formed on a lower surface of an insulating layer and a second sensing pattern formed on an upper surface of an insulating layer, wherein at least one of the first sensing pattern and the second sensing pattern includes a metal mesh pattern. The present invention relates to a touch sensing electrode having an electrical conductivity and a touch screen panel having the same by providing a metal plating layer thereon.

Hereinafter, the present invention will be described in more detail with reference to the drawings. However, the following drawings attached to the present specification are intended to illustrate preferred embodiments of the present invention, and together with the contents of the present invention serves to further understand the technical spirit of the present invention, the present invention described in such drawings It should not be construed as limited to matters.

3 and 4 schematically show an embodiment of the touch sensing electrode of the present invention.

The touch sensing electrode of the present invention has a structure in which a first sensing pattern 10 is formed on a lower surface of the insulating layer 30 and a second sensing pattern 20 is formed on an upper surface of the touch sensing electrode, and the first sensing pattern 10 and the second sensing are detected. At least one of the patterns 20 is formed of a metal mesh pattern and has a metal plating layer 200 on an upper surface thereof. 3 illustrates a structure in which both the first sensing pattern and the second sensing pattern are formed of a metal mesh.

The first sensing pattern 10 and the second sensing pattern 20 are disposed in different directions to provide information about the X and Y coordinates of the touched point. Specifically, when a human hand or an object comes into contact with the transparent substrate, the capacitance of the capacitance according to the contact position is moved to the driving circuit via the first sensing pattern 10, the second sensing pattern 20, and the metal wiring 70. Change is communicated. Then, the contact position is grasped by the change of the capacitance converted into an electrical signal by the X and Y input processing circuit (not shown) or the like.

In this regard, the first sensing pattern 10 and the second sensing pattern 20 are formed on the substrate 100, and each pattern must be electrically connected to detect a touched point. When the sensing patterns are formed on the same plane as illustrated in FIGS. 1 and 2, the first sensing pattern 10 is connected to each other, but the second sensing pattern 20 has an island pattern. Inevitably, the structure is separated from each other, and thus, a separate bridge electrode 50 is required to electrically connect the second sensing pattern 20.

However, in the touch sensing electrode of the present invention, since the first sensing pattern 10 and the second sensing pattern 20 are formed on different planes of the insulating layer 30, there is no need for a conventional bridge electrode or contact hole forming process. . Therefore, the problem of the contact resistance and the process of generating the contact hole by the bridge electrode does not occur.

Meanwhile, indium tin oxide (ITO), which is used as a material of a conventional sensing pattern, has excellent transparency but lower electrical conductivity than metal. In addition, metal has excellent electrical conductivity but high reflectance, which causes a problem of poor visibility when applied to a touch screen.

Accordingly, the present invention forms a sensing pattern with a metal but has a mesh structure pattern, thereby simultaneously achieving excellent electrical conductivity and visibility.

In the present invention, the metal forming the metal mesh pattern is not particularly limited as long as it is a metal having electrical conductivity, and examples thereof include silver (Ag), gold (Au), aluminum (Al), and molybdenum (Mo). have. Preferably, a material that can be formed together with the metal wiring 70 can be used, for example, molybdenum.

In the present invention, the specific form of the mesh structure is not particularly limited. For example, a rectangular rectangular mesh structure, a rhombus mesh structure, a hexagonal mesh structure, etc. may be mentioned, but it is not limited to this.

The thickness (height) of the bridge electrode 50 is not particularly limited, and may be, for example, 20 to 300 nm. If the thickness of the bridge electrode 30 is less than 20 nm, the electrical resistance may increase, and thus the touch sensitivity may be lowered.

The width of the metal mesh pattern is not particularly limited, and may be, for example, 2 to 30 μm, preferably 2 to 20 μm, but is not limited thereto. When the width of the metal mesh pattern is 2 to 30 mu m, the visibility of the pattern may be reduced and appropriate electrical resistance may be obtained.

On the other hand, due to the visibility of the pattern, it is preferable that the metal mesh pattern is not formed in a wide width. Since the electrical resistance is inversely proportional to the cross-sectional area of the charge travel path, the narrow width of the metal mesh pattern causes the cross-sectional area of the charge travel path to be small, which in turn limits the electrical conductivity. In order to solve this problem, simply forming the metal mesh pattern to have a high height, the accuracy of the pattern is lowered and the problem that the substrate 100 is bent occurs.

Accordingly, the present invention solves the above-described problem by providing a separate metal plating layer 200 on the

sensing patterns

10 and 20 formed of the metal mesh pattern. The metal plating layer 200 is formed on the

sensing patterns

10 and 20 to widen the cross-sectional area of the movement path of the charge, thereby greatly improving the electrical conductivity of the

sensing patterns

10 and 20.

The metal plating layer 200 is electrically conductive and may be used without particular limitation as long as it is a material capable of plating on the metal mesh pattern. For example, silver (Ag), gold (Au), copper (Cu), and the like, but are not limited thereto.

Preferably, since the metal plating layer 200 is formed on the metal mesh pattern, it is preferable to use a material having low reflectance in view of visibility. In that aspect, it is preferable to use copper (Cu).

The thickness of the metal plating layer 200 is not particularly limited, but is preferably 500 to 1,000 nm in terms of improving the electrical conductivity but not affecting the overall structure of the touch sensing electrode.

As another embodiment of the present invention, when only one of the first sensing pattern 10 and the second sensing pattern 20 is formed of a metal mesh pattern, the other may be formed of a conventional touch sensing pattern. 5 and 6 illustrate a schematic structure of a touch sensing electrode in which the second sensing pattern 20 is formed in a metal mesh pattern.

In this case, the sensing pattern other than the metal mesh may be used without limitation in the material used in the art, and in order not to impair visibility of the image displayed on the screen, it is preferable to use a transparent material or formed in a fine pattern. Specific examples thereof include metal oxides such as indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), and cadmium tin oxide (CTO). These may be used alone or in combination of two or more, preferably indium tin oxide (ITO) may be used.

The insulating layer 30 functions to electrically insulate the first sensing pattern 10 and the second sensing pattern 20. The insulating layer 30 may be formed using any material and method used in the art without particular limitation.

The metal line 70 transmits a change in capacitance sensed in the

sensing patterns

10 and 20 to the driving circuit side. The metal wire 70 may be formed of the same material as the metal mesh pattern, and therefore, the metal wire 70 may be formed at the same time when the metal mesh pattern is formed.

On the other hand, the metal wire 70 is disposed on the bezel portion of the display device. When the bezel is narrowly formed as described above, the metal wire 70 is preferably formed with the minimum width possible. However, when the metal wiring 70 is narrowly formed, electrical conductivity may be lowered, and there may be a risk of disconnection. Therefore, if necessary, the metal wiring 70 of the present invention may further include a metal plating layer 200 thereon.

The metal plating layer 200 on the upper portion of the metal wiring may be formed of the same material as the metal plating layer 200 formed on the bridge electrode 50, and may be formed at the same time.

The touch sensing electrode of the present invention is formed on the substrate 100.

The substrate 100 may be a material commonly used in the art without limitation, for example, glass, polyethersulphone (PES), polyacrylate (PAR, polyacrylate), polyether imide (PEI, polyetherimide, polyethylene naphthalate (PEN, polyethyelenen napthalate), polyethylene terephthalate (PET, polyethyelene terepthalate), polyphenylene sulfide (PPS), polyallylate, polyimide, polycarbonate ( PC, polycarbonate), cellulose tri acetate (TAC), cellulose acetate propionate (CAP), and the like.

The substrate 100 may be one surface of a cover window substrate or a display panel forming an outermost surface of the touch screen panel.

When the substrate 100 is a cover window substrate, the touch sensing electrode of the present invention may further include a transparent dielectric layer between the substrate 100 and the sensing pattern as necessary. The transparent dielectric layer improves the optical uniformity of the touch screen panel by reducing the difference in optical characteristics due to positional structural differences according to the sensing pattern structure.

The transparent dielectric layer may be formed by mixing niobium oxide, silicon oxide, cerium oxide, indium oxide, or the like, alone or in combination of two or more thereof. The formation method may be a vacuum deposition method, a sputtering method, an ion plating method, and the like, and may be easily manufactured in the form of a thin film through the above method.

In the present invention, if necessary, the transparent dielectric layer may be formed of a plurality of layers. In this case, each layer may be formed of different materials, and may have different refractive indices and thicknesses.

Hereinafter, a method of manufacturing the touch sensing electrode of the present invention will be described in more detail.

The touch sensing electrode of the present invention forms a sensing pattern formed in different directions on the lower and upper portions of the insulating layer, and at least one of the sensing patterns forms a metal mesh pattern and then a metal plating layer on an upper surface of the metal mesh pattern. It is prepared by forming a.

FIG. 7 schematically illustrates an example in which the first sensing pattern 10 and the second sensing pattern 20 are all formed of a metal mesh pattern as an embodiment of a method of manufacturing a touch sensing electrode. Hereinafter, description will be made based on this, but the present invention is not limited thereto.

First, the first sensing pattern 10 is formed on the substrate 100 using a metal mesh pattern. The first sensing pattern is formed in the first direction, in which case the metal lines 70 may be formed together.

The metal mesh pattern may be applied without limitation by methods known in the art, and may be formed by various thin film deposition techniques such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). For example, it may be formed by reactive sputtering, which is an example of physical vapor deposition. Or by using a photolithography method.

After the first sensing pattern 10, which is a metal mesh pattern, is formed, the metal plating layer 200 is formed on the upper surface thereof.

The metal plating layer 200 may be formed by a conventional metal plating method. Although there is no particular limitation on the plating method, an electroplating method is preferable in view of precision to be formed only on the first sensing pattern 10.

More specifically, after the first sensing pattern 10, which is a metal mesh pattern, is used as a cathode and the metal for forming the plating layer is used as an anode, the substrate is immersed in an electrolyte solution in which metal ions of the anode are present. When the power is connected to the power source, the metal plating layer 200 is formed on the upper surface of the first sensing pattern 10. If the metal wiring 70 is connected, the metal plating layer 200 is formed on the metal wiring 70.

After the metal plating layer 200 is formed, the insulating layer 30 is formed. The insulating layer 30 may be formed by using a method used in the art without particular limitation, and for example, the first sensing pattern including the photocurable or thermosetting insulating layer forming composition and the metal plating layer 200. The substrate 10 may be formed by coating and curing the formed substrate 100.

After the insulating layer 30 is formed, a metal plating layer 200 is formed on the second sensing pattern 20 and the upper surface thereof in the same manner as the first sensing pattern 10 to form the touch sensing electrode of the present invention. It can manufacture.

As another embodiment of the manufacturing method of the present invention, when only one of the

sensing patterns

10 and 20 is made of a metal mesh pattern, the other sensing pattern may be manufactured by a conventional method using a metal oxide material. For example, it may be formed by various thin film deposition techniques such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). For example, it may be formed by reactive sputtering, which is one example of a physical vapor deposition method, but is not limited thereto. Another example is photolithography.

The touch sensing electrode of the present invention can form a touch screen panel through additional processes known in the art. In this case, a display device used may include a liquid crystal display, an OLED, a flexible display, but is not limited thereto.

Hereinafter, preferred examples are provided to aid the understanding of the present invention, but these examples are merely illustrative of the present invention and are not intended to limit the scope of the appended claims, which are within the scope and spirit of the present invention. It is apparent to those skilled in the art that various changes and modifications can be made to the present invention, and such modifications and changes belong to the appended claims.

실시예 1Example 1

A metal mesh pattern and a metal wire having a thickness of 20 nm and a width of 5 μm and a metal wire were formed of molybdenum on a glass substrate (refractive index: 1.51) to electrically connect the metal mesh pattern and the metal wire.

Next, a power supply is connected to the metal wiring, and the other side of the power supply is connected to a copper electrode, and then the substrate and the copper electrode are immersed in a copper electrolyte solution and electroplated to perform the metal mesh pattern and the metal wiring. A copper plating layer was formed on the surface (first sensing pattern).

Next, after the insulating layer is formed over the entire substrate, the metal mesh pattern and the metal plating layer are formed in the same manner except that the metal mesh pattern is formed in a different direction from the metal mesh pattern manufactured above (second sensing). Pattern) and a touch sensing electrode.

For reference, the refractive index and the extinction coefficient are described based on the light of 550nm wavelength.

실시예 2Example 2

A touch sensing electrode was manufactured in the same manner as in Example 1, except that the sensing pattern (first sensing pattern) under the insulating layer was formed of indium tin oxide (ITO) ( refractive index: 1.8).

비교예 1Comparative Example 1

A touch sensing electrode was manufactured in the same manner as in Example 1, except that the copper plating layer was not formed and molybdenum was formed to have a thickness of 300 nm.

비교예 2Comparative Example 2

A touch sensing electrode was manufactured in the same manner as in Example 2, except that the copper plating layer was not formed and molybdenum was formed to have a thickness of 300 nm.

실험예Experimental Example

The reflectance and electrical resistance of the manufactured touch sensing electrode were measured, and the results are shown in Table 2 below. Reflectance means the average of reflectance in 400 nm-700 nm.

Table 1

Referring to Table 1, it can be seen that in the case of the examples, the electrical resistance is significantly smaller than that of the comparative example and the comparative example, which is almost similar, but does not form the metal plating layer.

[Description of the code]

100: substrate

10: first sensing pattern 20: second sensing pattern

30: insulating layer 40: contact hole

50: bridge electrode 200: metal plating layer

70: metal wiring

Claims

And a first sensing pattern formed on a lower surface of the insulating layer and a second sensing pattern formed on an upper surface of the insulating layer, wherein at least one of the first sensing pattern and the second sensing pattern has a metal mesh pattern and is disposed on an upper portion thereof. A touch sensing electrode having a metal plating layer.
The touch sensing electrode of claim 1, wherein at least one of the metal wires connecting the first sensing pattern and the second sensing pattern to a driving circuit further comprises a metal plating layer on an upper surface thereof.
The touch sensing electrode of claim 1, wherein the sensing pattern other than the metal mesh structure is a transparent electrode pattern formed of a metal oxide.
The touch sensing electrode of claim 1, wherein the metal plating layer is formed by electroplating.
The touch sensing electrode of claim 1, wherein the metal plating layer is formed of copper.
The touch sensing electrode of claim 1, wherein the metal plating layer has a thickness of 500 nm to 1,000 nm.
The touch sensing electrode of claim 1, wherein the touch sensing electrode is formed on one surface of the cover window substrate or the display panel of the touch screen panel.
Forming sensing patterns respectively formed in different directions on the lower and upper portions of the insulating layer;

At least one of the sensing patterns are formed by forming a metal plating pattern on the upper surface of the metal mesh pattern after forming a metal mesh pattern, manufacturing method of the touch sensing electrode.
The method of claim 8, wherein metal wires are simultaneously formed at the time of forming the metal mesh pattern.
The method of claim 9, further comprising forming a metal plating layer on an upper surface of the metal wire.
The method of claim 8, wherein the sensing pattern other than the metal mesh pattern is formed of a metal oxide.
A touch screen panel comprising the touch sensing electrode of claim 1.
A display device comprising the touch screen panel of claim 12.