KR101389876B1 - Touch sensing electrode and touch screen panel - Google Patents

Abstract

The present invention relates to a touch detection electrode with high electrical conductivity and a touch screen including the same. The touch detection electrode includes: a first detection pattern formed in a first direction and a second detection pattern formed in a second direction; a bridge electrode which electrically connects a unit pattern spaced apart from the second detection pattern to the upper part of the first detection pattern; an insulating layer interposed between the first detection pattern and the bridge electrode in an area where the first detection pattern and the bridge electrode intersect; and a metal plating layer formed on the upper surface of the bridge electrode.

Description

TECHNICAL FIELD [0001] The present invention relates to a touch sensing electrode and a touch screen panel having the touch sensing electrode.

The present invention relates to a touch sensing electrode and a touch screen panel having the same, and more particularly, to a touch sensing electrode having excellent electrical conductivity and a touch screen panel having the same.

Typically, the touch screen panel is a screen panel equipped with a special input device for inputting its position when touching by hand. Such a touch screen panel can receive input data directly from the screen so that the user can grasp the position of the touch screen or touch a specific position of the displayed character on the screen without using a keyboard, Which are stacked in layers.

In order to recognize the touched portion without lowering the visibility of the image displayed on the screen, it is necessary to use a transparent touch sensing electrode. Normally, a sensing pattern formed in a predetermined pattern is used.

There are various kinds of transparent electrode structures used for touch screen panels. For example, GFF (Glass-ITO film-ITO film), G1F (Glass-ITO film) have.

For example, the structure shown in FIG. 1 is a conventional transparent sensing electrode structure.

The transparent sensing electrode may be formed of a first sensing pattern 10 and a second sensing pattern 20. The first sensing pattern 10 and the second sensing pattern 20 are arranged in different directions to provide information on the X and Y coordinates of the touched point. Specifically, when a human hand or an object touches the transparent substrate, the first sensing pattern 10, the second sensing pattern 20, and the metal wiring, which is the position detecting line, Is transmitted. Then, the contact position is grasped by the change of the electrostatic capacitance by the X and Y input processing circuit (not shown) or the like and converted into an electrical signal.

In this regard, the first sensing pattern 10 and the second sensing pattern 20 are formed on the same substrate, and the respective patterns must be electrically connected to detect a touched point. Since the first sensing patterns 10 are connected to each other but the second sensing patterns 20 are separated into island shapes, in order to electrically connect the second sensing patterns 20, An electrode (bridge electrode) 50 is required.

However, since the bridge electrode 50 should not be electrically connected to the first sensing pattern 10, it should be formed in a different layer from the first sensing pattern 10. In order to show such a structure, FIG. 2 shows an enlarged view of a portion where the bridge electrode 50 is formed in the section A-A 'of FIG.

2, sensing patterns 10 and 20 are formed on a substrate 100, and an insulating layer 30 and a bridge electrode 50 are formed thereon. The first sensing pattern 10 and the second sensing pattern 20 are spaced apart from each other and are separated from the bridge electrode 50 by the insulating layer 30 formed thereon. Since the first sensing pattern 10 is electrically insulated from the bridge electrode 50 and the second sensing pattern 20 needs to be electrically connected as described above, the bridge electrode 50 is used And are electrically connected. In order to connect the second sensing pattern 20 separated in island shape to the bridge electrode 50 while being electrically disconnected from the first sensing pattern 10, a contact hole 40 is formed on the insulating film 30 There is a need.

However, the bridge electrode 50 is typically formed of metal in order to increase the electrical conductivity. However, there is a problem that the pattern can be visually recognized due to the difference in reflectivity with the sensing pattern.

In order to solve this visibility problem, when the bridge electrode 50 is formed with a very narrow width of metal, the visibility can be improved and the process can be simplified by forming the bridge electrode 50 together with the metal wiring. However, It is difficult to attain visibility and electrical conductivity at the same time because of the problem of slowing the detection speed because the electric conductivity is lowered due to the increase of the electric resistance in addition to the time-consuming problem to form a precise pattern. there is a problem.

In addition, production and research on a display having a narrow width of a bezel have been progressing recently. As the width of the bezel is narrowed, there is a problem that the electric resistance of the metal wiring hidden in the bezel portion increases.

Japanese Patent Application Laid-Open No. 2008-98169 proposes a transparent conductive film in which an undercoat layer composed of two layers having different refractive indices is formed between a transparent substrate and a transparent conductive layer.

Patent Document 1: JP-A-2008-98169

An object of the present invention is to provide a touch sensing electrode and a touch screen panel having the same, which shows high electrical conductivity but does not degrade visibility.

It is another object of the present invention to provide a touch sensing electrode having a narrow bezel and a touch screen panel having the touch sensing electrode.

1. a first sensing pattern formed in a first direction and a second sensing pattern formed in a second direction; A bridge electrode electrically connecting the spaced unit pattern of the second sensing pattern to an upper portion of the first sensing pattern; An insulating layer interposed between the first sensing pattern and the bridge electrode at an intersection point of the first sensing pattern and the bridge electrode; And a metal plating layer formed on an upper surface of the bridge electrode.

2. In the above 1, wherein the metal wiring connecting the first sensing pattern and the second sensing pattern with a driving circuit further comprises a metal plating layer on the upper surface, the touch sensing electrode.

3. The touch sensing electrode of claim 1, wherein the first sensing pattern and the second sensing pattern include a metal mesh on the top or bottom thereof.

4. In the above 3, wherein the metal mesh formed on the first sensing pattern and the second sensing pattern further comprises a metal plating layer on the upper surface, the touch sensing electrode.

5. In the above 1, wherein the metal plating layer is formed by electroplating, touch sensing electrode.

6. In the above 1, wherein the metal plating layer is formed of copper, touch sensing electrode.

7. In the above 1, wherein the thickness of the metal plating layer is 500 to 1,000nm, the touch sensing electrode.

8. The touch sensing electrode of 1 above, which is formed on one surface of the cover window substrate or the display panel of the touch screen panel.

9. A first sensing pattern formed in a first direction and a second sensing pattern formed in a second direction are formed on a substrate, and an insulating layer is formed on the first sensing pattern at a point where the first sensing pattern and the bridge electrode intersect. Forming a; Forming a bridge electrode on the insulating layer to electrically connect the second sensing pattern; And forming a metal plating layer on the bridge electrode.

10. The method of 9 above, wherein the forming of the bridge electrode includes: forming a bridge electrode forming metal layer on the substrate formed up to the insulating layer; Forming a photoresist pattern on the upper surface of the metal layer for forming bridge electrodes to expose only a portion where a metal plating layer is to be formed; Forming a metal plating layer on the exposed portion; And removing the metal layer for forming bridge electrodes on which the photoresist pattern and the metal plating layer are not formed.

11. In the above 10, wherein the photoresist pattern further comprises an exposed portion to form a metal mesh pattern on the first sensing pattern or the second sensing pattern, the metal plating layer is also formed on the metal mesh pattern That is, the manufacturing method of the touch sensing electrode.

12. In the above 10, the bridge electrode forming metal layer is formed to a metal wiring portion, the photoresist pattern further includes an exposed portion to include the metal wiring portion, the metal plating layer is also formed on the upper metal wiring That is, the manufacturing method of the touch sensing electrode.

13. The touch screen panel including the touch sensing electrode of any one of the above 1 to 8.

14. Display device including the touch screen panel of 13 above.

The touch sensing electrode of the present invention has a metal plating layer on the bridge electrode to increase the electrical conductivity of the bridge electrode, thereby exhibiting an excellent sensing speed.

In addition, the touch sensing electrode of the present invention may maintain the visibility of the bridge electrode similar to the conventional or even lower when the metal plating layer is used as a material having a low reflectance.

Further, the touch sensing electrode of the present invention includes a metal plating layer for connecting a sensing pattern to a circuit, thereby maintaining a high electrical conductivity even if the width of the metal wiring is narrowed, thereby realizing a narrow bezel display device.

In addition, since the touch sensing electrode of the present invention includes the metal mesh in the sensing pattern, the sensing speed can be further improved by improving the electrical conductivity of the sensing pattern.

1 is a schematic plan view of a conventional touch sensing electrode.
2 is a schematic vertical cross-sectional view of a conventional touch sensing electrode.
3 is a schematic vertical cross-sectional view of a touch sensing electrode according to an embodiment of the present invention.
4 is a view schematically showing a touch sensing electrode manufacturing method according to the present invention.

The present invention includes a first sensing pattern formed in a first direction and a second sensing pattern formed in a second direction; A bridge electrode electrically connecting the spaced unit pattern of the second sensing pattern to an upper portion of the first sensing pattern; An insulating layer interposed between the first sensing pattern and the bridge electrode at an intersection point of the first sensing pattern and the bridge electrode; And a metal plating layer formed on an upper surface of the bridge electrode, and relates to a touch sensing electrode having excellent electrical conductivity and a touch screen panel having the same.

Hereinafter, the present invention will be described in more detail with reference to the drawings. It is to be understood that both the foregoing general description and the following detailed description of the present invention are exemplary and explanatory and are intended to provide further explanation of the invention as claimed. And shall not be construed as limited to such matters.

FIG. 3 schematically shows an embodiment of the touch sensing electrode of the present invention.

The touch sensing electrode of the present invention includes an insulating layer 30 interposed between the first sensing pattern 10 and the bridge electrode 50 at the intersection of the first sensing pattern 10 and the bridge electrode 50. The bridge electrode 50 has a metal plating layer 200 thereon.

The bridge electrode 50 electrically connects the second sensing patterns 20 formed by separating the unit patterns, but the bridge electrodes 50 are not formed to have a wide width due to the visibility of the patterns. Since the electrical resistance is inversely proportional to the cross-sectional area of the movement path of the electric charge, the narrow width of the bridge electrode 50 causes a decrease in the cross-sectional area of the electric charge transfer path, resulting in a restriction on the electric conductivity. In order to solve such a problem, if the bridge electrode 50 is simply formed to have a high height, the accuracy of the pattern is lowered and the substrate 100 is bent.

Accordingly, the present invention solves the above-mentioned problem by providing a separate metal plating layer 200 on the bridge electrode 50. [ The metal plating layer 200 is formed on the bridge electrode 50 to widen the cross-sectional area of the path of the electric charge, thereby greatly improving the electrical conductivity of the bridge electrode 50.

The metal plating layer 200 is electrically conductive and can be used without any particular limitation as long as it is a material that can be plated on the bridge electrode 50. For example, silver (Ag), gold (Au), copper (Cu), and the like can be cited.

Preferably, since the metal plating layer 200 is formed on the bridge electrode 50, it is preferable to use a material having a low reflectance in terms of visibility. In this respect, it is preferable to use copper (Cu).

The thickness of the metal plating layer 200 is not particularly limited, but it is preferable that the thickness of the metal plating layer 200 is 500 to 1,000 nm from the viewpoint of improving the electrical conductivity and not affecting the overall structure of the touch sensing electrode.

The bridge electrode 50 electrically connects the spaced unit pattern of the second sensing pattern 20 to the upper portion of the first sensing pattern 10.

The bridge electrode 50 according to the present invention may be formed of a metal material, and preferably, the bridge electrode 50 may be formed of the same material as the metal wire 70. In such a case, the bridge electrodes 50 may be formed together at the time of forming the metal wiring 70, thereby simplifying the process.

The metal is not particularly limited as long as it has excellent electrical conductivity and low resistance. Examples of the metal include molybdenum, silver and aluminum, and molybdenum is preferably used.

The thickness (height) of the bridge electrode 50 is not particularly limited, and may be, for example, 10 to 300 nm. If the thickness of the bridge electrode 30 is less than 10 nm, the electrical resistance may increase and the touch sensitivity may be deteriorated.

The width of the bridge electrode 50 is not particularly limited, for example, may be 2 to 30㎛, preferably 2 to 20㎛, but is not limited thereto. When the width of the bridge electrode 50 is 2 to 30 占 퐉, the visibility of the pattern can be reduced and an appropriate electrical resistance can be obtained.

The insulating layer 30 functions to electrically insulate the first sensing pattern 10 from the bridge electrode 50. As shown in FIG. 2, the conventional insulating layer is formed entirely on top of the sensing pattern, but the insulating layer 30 according to the present invention has a first sensing pattern 10 and a bridge electrode as shown in FIG. 3. It is interposed between the first sensing pattern and the bridge electrode at the intersection of 50.

Since the insulating layer 30 according to the present invention only needs to insulate the first sensing pattern 10 and the bridge electrode 50, the insulating layer 30 does not need to be formed entirely on the substrate 100, and also requires a process of forming the contact hole 40. none.

The insulating layer 30 can be formed using materials and methods used in the art without any particular limitation.

The first sensing pattern 10 and the second sensing pattern 20 are arranged in different directions to provide information on the X and Y coordinates of the touched point. Specifically, when a human hand or an object touches the transparent substrate, the first sensing pattern 10, the second sensing pattern 20, and the metal wiring 70 are electrically connected to the driving circuit Change is delivered. Then, the contact position is grasped by the change of the electrostatic capacitance by the X and Y input processing circuit (not shown) or the like and converted into an electrical signal.

In this regard, the first sensing pattern 10 and the second sensing pattern 20 are formed on the substrate 100, and the respective patterns must be electrically connected to detect a touched point. Since the first sensing patterns 10 are connected to each other but the second sensing patterns 20 have a structure in which the unit patterns are separated into island shapes, in order to electrically connect the second sensing patterns 20 A separate bridge electrode 50 is required.

The thickness of the detection pattern is not particularly limited, and may be, for example, 20 to 200 nm, respectively. When the thickness of the sensing pattern is less than 20 nm, the electrical resistance increases and the touch sensitivity may be deteriorated. When the sensing pattern has a thickness exceeding 200 nm, the reflectance increases and visibility may be a problem.

The first sensing pattern 10 and the second sensing pattern 20 of the touch sensing electrode can be used without limitation in materials used in the art. In order not to impair the visibility of the image displayed on the screen, Or formed in a fine pattern. Specific examples thereof include indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), cadmium tin oxide (CTO), poly (3,4-ethylenedioxythiophene) ), Carbon nanotubes (CNTs), metal wires, and the like. These may be used singly or in combination of two or more, preferably indium tin oxide (ITO). The metal used for the metal wire is not particularly limited, and examples thereof include silver (Ag), gold, aluminum, copper, iron, nickel, titanium, tellurium, chromium and the like. These may be used alone or in combination of two or more.

Optionally, the touch sensing electrode of the present invention may further include a metal mesh 80 above or below the first sensing pattern 10 and the second sensing pattern 20, as necessary. For example, an appropriate shape may be provided above or below a unit pattern of a rhombus shape (see FIG. 1) of the first sensing pattern 10 and the second sensing pattern 20 to improve the electrical conductivity of the sensing pattern, thereby improving the sensing speed. Can be raised. In this case, the additionally provided metal mesh 80 does not need to be electrically connected between the unit patterns, and may be formed in a grid shape or the like within each unit pattern region.

Preferably, the metal mesh 80 may further include a metal conductive layer 200 thereon. In this case, the metal mesh 80 is preferably provided on the sensing patterns 10 and 20. The metal mesh 80 may include a metal conductive layer 200, whereby electrical conductivity may be significantly increased.

The metal wiring 70 has a function of transmitting a change in the capacitance sensed by the sensing patterns 10 and 20 to the driving circuit side. The metal wiring 70 may be formed of the same material as the bridge electrode 50 and is preferably formed at the same time when the bridge electrode 50 is formed.

Meanwhile, the metal wiring 70 is disposed on the bezel portion of the display device. When the bezel is narrow as described above, the metal wiring 70 is preferably formed to have a minimum width. However, if the metal wiring 70 is formed to be narrow, the electrical conductivity may be lowered, and there is a risk of disconnection. Therefore, if necessary, the metal wiring 70 of the present invention may further include a metal plating layer 200 on the upper portion thereof.

The metal plating layer 200 on the metal wiring may be formed of the same material as the metal plating layer 200 formed on the bridge electrode 50, and preferably may be formed at the same time.

A touch sensing electrode of the present invention is formed on a substrate (100).

The substrate 100 may be formed of any material that is commonly used in the art without limitation, and examples thereof include glass, polyethersulphone (PES), polyacrylate (PAR), polyether imide (PEI, polyetherimide, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetherimide, polyethylene naphthalate, PC, polycarbonate), cellulose triacetate (TAC), and cellulose acetate propionate (CAP).

The substrate 100 may be a cover window substrate that forms the outermost surface of the touch screen panel, or a surface of the display panel.

If the substrate 100 is a cover window substrate, the touch sensing electrode of the present invention may further include a transparent dielectric layer between the substrate 100 and the sensing pattern, if necessary. The transparent dielectric layer improves the optical uniformity of the touch screen panel by reducing the difference in optical properties due to structural differences in position according to the detection pattern structure.

The transparent dielectric layer may be formed of niobium oxide, silicon oxide, cerium oxide, indium oxide or the like, either singly or in combination. A vacuum deposition method, a sputtering method, an ion plating method, or the like can be used as the forming method, and they can be easily manufactured in the form of a thin film through the above-described method.

In the present invention, if necessary, the transparent dielectric layer may be formed of a plurality of layers. In this case, the respective layers may be formed of different materials and may have different refractive indices and thicknesses.

Hereinafter, a method of manufacturing the touch sensing electrode of the present invention will be described in detail.

First, a first sensing pattern formed in a first direction and a second sensing pattern formed in a second direction are formed on a substrate, and an insulating layer is formed on the first sensing pattern at a point where the first sensing pattern and the bridge electrode intersect. To form.

The sensing patterns 10 and 20 may be formed by various thin film deposition techniques such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). For example, it can be formed by reactive sputtering, which is an example of physical vapor deposition.

Further, the sensing pattern may be formed by a printing process. In such a printing process, various printing methods such as gravure off set, reverse off set, inkjet printing, screen printing and gravure printing can be used. In particular, when a sensing pattern is formed by a printing process, it can be formed of a printable paste material. For example, a carbon nano tube (CNT), a conductive polymer, and a silver nano wire ink (Ag nano wire ink) can be formed.

In addition, the sensing pattern may be formed by photolithography in addition to the above method.

After the sensing patterns 10 and 20 are formed, the insulating layer 30 is formed on the first sensing pattern 10 at the point where the first sensing pattern 10 and the bridge electrode 50 to be formed later intersect. . The insulating layer 30 can be formed using materials and methods used in the art without any particular limitation.

Next, a bridge electrode 50 is formed on the insulating layer 30 to electrically connect the second sensing pattern 20.

Hereinafter, the step of forming the bridge electrode 50 will be described in more detail.

First, a metal layer for forming bridge electrodes is formed on the substrate formed up to the insulating layer 30. The metal layer may be formed on the entire upper surface of the substrate.

The metal layer for forming the bridge electrode is formed of a metal to be used as the bridge electrode, and the forming method is not particularly limited. For example, various thin films such as physical vapor deposition (PVD) and chemical vapor deposition (CVD) are used. It may be formed by a deposition technique. For example, it may be formed by reactive sputtering, which is an example of physical vapor deposition, but is not limited thereto. As another example, a method of coating a coating solution containing metal particles may be applied.

After the bridge electrode forming metal layer is formed, a photoresist pattern is formed on the top surface of the bridge electrode forming metal layer to expose only a portion where the metal plating layer is to be formed.

The portion exposed by the photoresist pattern may be the bridge electrode 50. In addition, as described above, a portion of the metal mesh 80, a portion of the metal wiring 70, and the like may also be exposed. In this case, the metal mesh 80 and the metal wiring 70 are formed simultaneously with the bridge electrode 50.

If the metal mesh 80 is formed below the sensing patterns 10 and 20, the metal mesh 80 is first formed on the substrate 100 and then the sensing patterns 10 and 20 are formed thereon. do.

In addition, when the metal mesh 80 is formed on the sensing patterns 10 and 20, the photoresist pattern may be formed to cover the metal mesh 80 so as not to include the metal plating layer 200.

Next, a metal plating layer is formed on the exposed portion.

The metal plating layer 200 may be formed by a conventional metal plating method. Although there is no particular limitation on the plating method, an electroplating method is preferable from the viewpoint of precision that should be formed only on the bridge electrode 50.

More specifically, the bridge electrode forming metal layer is used as the cathode electrode and the metal to form the plating layer is used as the anode electrode, the substrate is immersed in an electrolyte solution in which the metal ions of the anode electrode are present, and then a power source is connected. When flowing, the metal plating layer 200 is formed on a portion exposed by the photoresist pattern.

Next, after removing the photoresist pattern, if the metal layer for bridge electrode formation of the portion where the metal plating layer is not formed is removed, the touch sensing electrode of the present invention can be obtained. Removing the metal layer for forming the bridge electrode in the portion where the metal plating layer is not formed may be easily performed by using an etchant capable of etching the bridge electrode forming metal layer without etching the metal plating layer.

The touch sensing electrode of the present invention may form a touch screen panel through additional processes known in the art. In this case, the display device may be a liquid crystal display, an OLED, a flexible display, or the like, but is not limited thereto.

It is to be understood that both the foregoing general description and the following detailed description of the present invention are exemplary and explanatory and are intended to be illustrative of the invention and are not intended to limit the scope of the claims. It will be apparent to those skilled in the art that such variations and modifications are within the scope of the appended claims.

Example  One

First and second sensing patterns having a thickness of 20 nm were formed of indium tin oxide (ITO) (refractive index: 1.8) on a glass substrate (refractive index: 1.51).

Thereafter, an insulating layer was formed on the first sensing pattern of the portion where the bridge pattern was to be formed, and then a molybdenum metal layer having a thickness of 10 nm was formed on the upper surface of the substrate on which the insulating layer was formed by sputtering.

Next, after the photoresist pattern is formed to expose only the portion where the bridge electrode is to be formed and the metal wiring portion, a power source is connected to the molybdenum metal layer, and the other side of the power source is connected to a copper electrode, and then the substrate and copper The electrode was immersed in a copper electrolyte solution and electroplated to form a copper plating layer on the exposed molybdenum metal layer.

Next, the photoresist pattern was removed, and the molybdenum metal layer on which the copper plating layer was not formed was removed to manufacture a touch sensing electrode.

For reference, the refractive index is described based on light of 550 nm wavelength.

Example  2

A touch sensing electrode was manufactured in the same manner as in Example 1, except that the metal mesh and the metal plating layer were further formed on the first sensing pattern and the second sensing pattern.

Example  3

A touch sensing electrode was manufactured in the same manner as in Example 1, except that a metal mesh was further formed below the first sensing pattern and the second sensing pattern.

Comparative Example  One

A touch sensing electrode was prepared in the same manner as in Example 1, except that a copper plating layer was not formed and molybdenum was formed to a thickness of 300 nm.

Experimental Example

The reflectance and electrical resistance of the manufactured touch sensing electrode were measured, and the results are shown in Table 2 below. The reflectance means an average of the reflectance at 400 nm to 700 nm.

Average reflectance 2nd sensing pattern (pattern connected by bridge electrode) resistance Example 1 12.2% 1.6 kΩ Example 2 12.8% 0.4 kΩ Example 3 12.8% 0.4 kΩ Comparative Example 1 12.0% 2.1 kΩ

Referring to Table 1, it can be seen that in the case of the embodiments, the electrical resistance is significantly smaller than that of the comparative example and the difference between the reflectivity and the comparative example without forming the metal plating layer.

100: substrate
10: first detection pattern 20: second detection pattern
30: insulating layer 40: contact hole
50: bridge electrode 200: metal plating layer
80: metal mesh 70: metal wiring

Claims (14)

A first sensing pattern formed in a first direction and a second sensing pattern formed in a second direction;
A bridge electrode electrically connecting the spaced unit pattern of the second sensing pattern to an upper portion of the first sensing pattern;
An insulating layer interposed between the first sensing pattern and the bridge electrode at an intersection point of the first sensing pattern and the bridge electrode; And
And a metal plating layer formed on the upper surface of the bridge electrode to a thickness of 500 to 1,000 nm.
The touch sensing electrode of claim 1, wherein the metal wiring connecting the first sensing pattern and the second sensing pattern to a driving circuit further comprises a metal plating layer on an upper surface thereof.
The touch sensing electrode of claim 1, wherein the first sensing pattern and the second sensing pattern include a metal mesh on the top or bottom thereof.
The touch sensing electrode of claim 3, wherein the metal mesh formed on the first sensing pattern and the second sensing pattern further includes a metal plating layer on an upper surface thereof.
The touch sensing electrode according to claim 1, wherein the metal plating layer is formed by electroplating.
The touch sensing electrode according to claim 1, wherein the metal plating layer is formed of copper.
delete The touch sensing electrode of claim 1, formed on one side of a cover window substrate or display panel of a touch screen panel.
A first sensing pattern formed in a first direction and a second sensing pattern formed in a second direction are formed on the substrate, and an insulating layer is formed on the first sensing pattern at the point where the first sensing pattern and the bridge electrode intersect. Making;
Forming a bridge electrode on the insulating layer to electrically connect the second sensing pattern; And
Forming a metal plating layer on the bridge electrode;
Method of manufacturing a touch sensing electrode comprising a.
The method of claim 9, wherein forming the bridge electrode,
Forming a metal layer for forming bridge electrodes on the substrate formed up to the insulating layer;
Forming a photoresist pattern on the top surface of the bridge electrode forming metal layer to expose only a portion where a metal plating layer is to be formed;
Forming a metal plating layer on the exposed portion; And
Removing the metal layer for forming bridge electrodes on which the photoresist pattern and the metal plating layer are not formed;
Method of manufacturing a touch sensing electrode comprising a.
The method of claim 10, wherein the photoresist pattern further comprises an exposed portion to form a metal mesh pattern on the first sensing pattern or the second sensing pattern, the metal plating layer is also formed on the metal mesh pattern, Method of manufacturing a touch sensing electrode.
The metal layer of claim 10, wherein the metal layer for forming bridge electrodes is formed to a metal wiring portion, the photoresist pattern further includes an exposed portion to include the metal wiring portion, and the metal plating layer is also formed on the metal wiring. Method of manufacturing a touch sensing electrode.
A touch screen panel comprising the touch sensing electrode of any one of claims 1 to 6 and 8.
Display device comprising the touch screen panel of claim 13.

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