CN104163577A - ITO (indium tin oxide) conducting glass and preparation method thereof - Google Patents

ITO (indium tin oxide) conducting glass and preparation method thereof Download PDF

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Publication number
CN104163577A
CN104163577A CN201410386196.2A CN201410386196A CN104163577A CN 104163577 A CN104163577 A CN 104163577A CN 201410386196 A CN201410386196 A CN 201410386196A CN 104163577 A CN104163577 A CN 104163577A
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index layer
low
thickness
high refractive
layer
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CN104163577B (en
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刘玉华
方凤军
陈立
谭伟
杜晓峰
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YICHANG NANBO DISPLAY DEVICES Co Ltd
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YICHANG NANBO DISPLAY DEVICES Co Ltd
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Abstract

The invention discloses an semireflective semipermeable ITO (indium tin oxide) conducting glass with the reflectivity of 27-55%, which comprises glass, a first low-refractivity layer, a first high-refractivity layer, a second low-refractivity layer, a second high-refractivity layer, a third low-refractivity layer and an ITO layer, wherein the first low-refractivity layer is made from SiO2 or MgF2; the first high-refractivity layer is made from Nb2O5, TiO2, ZrO2 or Si3N4; the second low-refractivity layer is made from SiO2 or MgF2; the second high-refractivity layer is made from Nb2O5, TiO2, ZrO2 or Si3N4; and the third low-refractivity layer is made from SiO2 or MgF2. By using the structure of combining the layers with high and low refractivities, the ITO conducting glass is semireflective and semipermeable, does not need to additionally attach any semireflective semipermeable optical film when being used as a touch-function sheet or vehicle-mounted rearview mirror, and has favorable visual effect when in use. The invention also discloses a preparation method of the ITO conducting glass.

Description

ITO conductive glass and preparation method thereof
Technical field
The present invention relates to a kind of ITO conductive glass that self possesses half-reflection and half-transmission performance and preparation method thereof.
Background technology
ITO conductive glass is on the basis of sodium calcium substrate or silicon boryl sheet glass, utilizes the method deposition of silica (SiO successively of magnetron sputtering 2) and tin indium oxide (common name ITO) processing film be made into.
ITO is a kind of metallic compound with good clear conductivity, have that forbidden band is wide, visible range optical transmittance is high and the characteristic such as resistivity is low, ITO conductive glass is widely used in flat-panel display device, solar cell, specific function window coating and other field of photoelectric devices, is the transparency conductive electrode material that the various types of flat panel display devices such as current LCD, PDP, OLED, touch-screen extensively adopt.As the key foundation material of flat-panel display device, its continuous renewal along with flat-panel display device of ITO conductive glass and upgrading and there is the more wide market space.
The intelligent touch electronic products such as existing panel computer, touch-screen mobile phone, some need to paste half-reflection and half-transmission blooming at product surface, to realize the optical property of half-reflection and half-transmission, in the time of the standby of the product such as mobile phone, flat board, specular reflection effect be can play, can dressing or combing hair be used for arranging as mirror.
ITO conductive glass during as touch controllable function sheet, often need to be pasted on surface half-reflection and half-transmission blooming, to obtain the optical property of half-reflection and half-transmission.Traditional half-reflection and half-transmission blooming is to be plated on PET flexible parent metal, to be attached to mobile phone, panel computer surface again, and PET rete exists certain photoabsorption, and mobile phone, panel computer need backlight brightlyer just can operate while use, and visual effect is poor.
Also have the vehicle-mounted inside rear-view mirror of part automobile to there is half-reflection and half-transmission function, on rear vision mirror, the window of the information such as display direction, time, weather is reserved in subregion, thereby can clear view to traffic conditions below, to avoid irradiating the light of coming when vehicle long sight lamp is opened be below not whole emergency light reflexs through rear vision mirror reflex time, but part reflection, part see through, thereby while avoiding emergency light reflex, enter in driver's eyes and disturb driver's normal driving; Simultaneously can display direction, the information such as time or weather.This rear vision mirror way that has half-reflection and half-transmission and Presentation Function concurrently is on display module, to paste half-reflection and half-transmission blooming at present, reaches half-reflection and half-transmission effect when realizing demonstration.
Summary of the invention
Based on this, be necessary to provide a kind of resistance between 30～120 ohm, while using visual effect preferably, can be for ITO conductive glass capacitance plate or vehicular rear mirror, that self possess half-reflection and half-transmission performance etc. and preparation method thereof.
A kind of ITO conductive glass, comprises the glass, the first low-index layer, the first high refractive index layer, the second low-index layer, the second high refractive index layer and the ITO layer that stack gradually;
The material of described the first low-index layer is SiO 2or MgF 2;
The material of described the first high refractive index layer is Nb 2o 5, TiO 2, ZrO 2or Si 3n 4;
The material of described the second low-index layer is SiO 2or MgF 2;
The material of described the second high refractive index layer is Nb 2o 5, TiO 2, ZrO 2or Si 3n 4;
The material of described the 3rd low-index layer is SiO 2or MgF 2;
The thickness of described the first low-index layer is
The thickness of described the first high refractive index layer is
The thickness of described the second low-index layer is
The thickness of described the second high refractive index layer is
The thickness of described the 3rd low-index layer is
In one embodiment, the thickness of described the first low-index layer is
In one embodiment, the thickness of described the first high refractive index layer is
In one embodiment, the thickness of described the second low-index layer is
In one embodiment, the thickness of described the second high refractive index layer is
In one embodiment, the thickness of described third high index layer is
In one embodiment, the thickness of described ITO layer is
A preparation method for ITO conductive glass, comprises the steps:
Glass is provided, dry after cleaning;
Described glass surface after cleaning is magnetron sputtering deposition the first low-index layer, the first high refractive index layer, the second low-index layer, the second high refractive index layer, the 3rd low-index layer and ITO layer successively, obtain described ITO conductive glass, wherein, the material of described the first low-index layer is SiO 2or MgF 2, the material of described the first high refractive index layer is Nb 2o 5, TiO 2, ZrO 2or Si 3n 4, the material of described the second low-index layer is SiO 2or MgF 2, the material of described the second high refractive index layer is Nb 2o 5, TiO 2, ZrO 2or Si 3n 4, the material of described the 3rd low-index layer is SiO 2or MgF 2, the thickness of described the first low-index layer is the thickness of described the first high refractive index layer is the thickness of described the second low-index layer is the thickness of described the second high refractive index layer is the thickness of described the 3rd low-index layer is
In one embodiment, the thickness of described the first low-index layer is the thickness of described the first high refractive index layer is the thickness of described the second low-index layer is the thickness of described the second high refractive index layer is the thickness of described third high index layer is
In one embodiment, the thickness of described ITO layer is
This ITO conductive glass, comprise the first low-index layer, the first high refractive index layer, the second low-index layer, the second high refractive index layer and the 3rd low-index layer, the film layer structure of the suitable thickness of specific refractory power height combination, make ITO conductive glass self there is the performance of half-reflection and half-transmission, in the time of the touch controllable function sheet as intelligent and portable equipment or vehicular rear mirror, do not need additionally to paste half-reflection and half-transmission blooming, with respect to traditional touch controllable function sheet, avoid the photoabsorption of PET rete, visual effect is better in use, simultaneously in weather resistance, the aspects such as rub resistance have more advantage.
Concrete, this ITO conductive glass is applied in mobile phone, panel computer, vehicular rear mirror or other side.While being used on mobile phone, panel computer, can be used as mirror use when mobile phone, panel computer standby, and backlight also just can operate to mobile phone, panel computer without too bright while lighting; As vehicular rear mirror can partly reflect, the high beam of vehicle irradiates the high light of coming after Journalistic, avoids strong reflected light reflection to enter driver's eyes and affect driving, the while also can display direction, the information of time, weather.
Brief description of the drawings
Fig. 1 is the structural representation of the ITO conductive glass of an embodiment;
Fig. 2 is the preparation method's of ITO conductive glass as shown in Figure 1 schema.
Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in detail.A lot of details are set forth in the following description so that fully understand the present invention.But the present invention can implement to be much different from alternate manner described here, and those skilled in the art can do similar improvement without prejudice to intension of the present invention in the situation that, and therefore the present invention is not subject to the restriction of following public concrete enforcement.
An embodiment ITO conductive glass as shown in Figure 1, comprises the glass 10, the first low-index layer 20, the first high refractive index layer 30, the second low-index layer 40, the second high refractive index layer 50, the 3rd low-index layer 60 and the ITO layer 70 that stack gradually.
Glass 10 can be selected the glass of float glass or other this area routines.
The material of the first low-index layer 20 is SiO 2or MgF 2.SiO 2specific refractory power be 1.48, MgF 2specific refractory power be 1.38.Adopt SiO 2or MgF 2as the material of the first low-index layer 20, make the specific refractory power of the first low-index layer 20 relatively high.
The thickness of the first low-index layer 20 is generally speaking,, when less demanding to half-reflection and half-transmission conducting film color, the thickness of the first low-index layer 20 can be 0, in a special embodiment, the thickness of the first low-index layer 20 can be 0, that is to say, the first low-index layer 20 can omit.
At one, preferably in embodiment, the thickness of the first low-index layer 20 is
The material of the first high refractive index layer 30 is Nb 2o 5, TiO 2, ZrO 2or Si 3n 4.Nb 2o 5specific refractory power be 2.3, TiO 2specific refractory power be 2.3, ZrO 2specific refractory power be 2.17, Si 3n 4specific refractory power be 2.0.Adopt Nb 2o 5, TiO 2, ZrO 2or Si 3n 4as the material of the first high refractive index layer 30, make the specific refractory power of the first high refractive index layer 30 relatively low.
The thickness of the first high refractive index layer 30 can be when less demanding to the color of half-reflection and half-transmission conducting film, the thickness of the first high refractive index layer 30 can be 0, that is to say, in a special embodiment, the first high refractive index layer 30 can omit.
At one, preferably in embodiment, the thickness of the first high refractive index layer 30 can be
The material of the second low-index layer 40 is SiO 2or MgF 2.SiO 2specific refractory power be 1.48, MgF 2specific refractory power be 1.38.Adopt SiO 2or MgF 2as the material of the second low-index layer 40, make the specific refractory power of the second low-index layer 40 relatively high.
The thickness of the second low-index layer 40 is in a special embodiment, the thickness of the second low-index layer 40 can be 0, that is to say, the second low-index layer 40 can omit.
At one, preferably in embodiment, the thickness of the second low-index layer 40 can be
The material of the second high refractive index layer 50 is Nb 2o 5, TiO 2, ZrO 2or Si 3n 4.Nb 2o 5specific refractory power be 2.3, TiO 2specific refractory power be 2.3, ZrO 2specific refractory power be 2.17, Si 3n 4specific refractory power be 2.0.Adopt Nb 2o 5, TiO 2, ZrO 2or Si 3n 4as the material of the second high refractive index layer 50, make the specific refractory power of the second high refractive index layer 50 relatively low.
The thickness of the second high refractive index layer 50 is
At one, preferably in embodiment, the thickness of the second high refractive index layer 50 can be
The thickness of the 3rd low-index layer 60 is in a special embodiment, the thickness of the 3rd low-index layer 60 can be 0, that is to say, the 3rd low-index layer 60 can omit.
At one, preferably in embodiment, the thickness of the 3rd low-index layer 60 can be
In present embodiment, the thickness of ITO layer 70 is
This ITO conductive glass, comprise the first low-index layer 20, the first high refractive index layer 30, the second low-index layer 40, the second high refractive index layer 50 and the 3rd low-index layer 60, the film layer structure of the suitable thickness of specific refractory power height combination, make ITO conductive glass self there is the performance of half-reflection and half-transmission, when as touch controllable function sheet, do not need additionally to paste half-reflection and half-transmission blooming, with respect to traditional touch controllable function sheet, avoid the photoabsorption of PET rete, visual effect is better in use, has more advantage at the aspect such as weather resistance, rub resistance simultaneously.
Concrete, this ITO conductive glass is applied in mobile phone, panel computer, vehicular rear mirror or other side.While being used on mobile phone, panel computer, can be used as mirror use when mobile phone, panel computer standby, and backlight also just can operate to mobile phone, panel computer without too bright while lighting; As vehicular rear mirror can partly reflect, the high beam of vehicle irradiates the high light of coming after Journalistic, avoids strong reflected light reflection to enter driver's eyes and affect driving, the while also can display direction, the information of time, weather.
The preparation method of above-mentioned ITO conductive glass as shown in Figure 2, comprises the steps:
S10, provide glass 10, dry after cleaning.
Glass 10 can be selected the glass of float glass or other this area routines.
S20, glass 10 surfaces magnetron sputtering deposition the first low-index layer 20, the first high refractive index layer 30, the second low-index layer 40, the second high refractive index layer 50, the 3rd low-index layer 60 and ITO layer 70 successively after cleaning, obtain ITO conductive glass.
The material of the first low-index layer 20 is SiO 2or MgF 2.SiO 2specific refractory power be 1.48, MgF 2specific refractory power be 1.38.Adopt SiO 2or MgF 2as the material of the first low-index layer 20, make the specific refractory power of the first low-index layer 20 relatively high.
The thickness of the first low-index layer 20 is when less demanding to half-reflection and half-transmission conducting film color, the thickness of the first low-index layer 20 can be 0, and, in a special embodiment, the thickness of the first low-index layer 20 can be 0, that is to say, the first low-index layer 20 can omit.
At one, preferably in embodiment, the thickness of the first low-index layer 20 is
The material of the first high refractive index layer 30 is Nb 2o 5, TiO 2, ZrO 2or Si 3n 4.Nb 2o 5specific refractory power be 2.3, TiO 2specific refractory power be 2.3, ZrO 2specific refractory power be 2.17, Si 3n 4specific refractory power be 2.0.Adopt Nb 2o 5, TiO 2, ZrO 2or Si 3n 4as the material of the first high refractive index layer 30, make the specific refractory power of the first high refractive index layer 30 relatively low.
The thickness of the first high refractive index layer 30 can be when less demanding to the color of half-reflection and half-transmission conducting film, the thickness of the first high refractive index layer 30 can be 0, that is to say, in a special embodiment, the first high refractive index layer 30 can omit.
At one, preferably in embodiment, the thickness of the first high refractive index layer 30 can be
The material of the second low-index layer 40 is SiO 2or MgF 2.SiO 2specific refractory power be 1.48, MgF 2specific refractory power be 1.38.Adopt SiO 2or MgF 2as the material of the second low-index layer 40, make the specific refractory power of the second low-index layer 40 relatively high.
The thickness of the second low-index layer 40 is in a special embodiment, the thickness of the second low-index layer 40 can be 0, that is to say, the second low-index layer 40 can omit.
At one, preferably in embodiment, the thickness of the second low-index layer 40 can be
The material of the second high refractive index layer 50 is Nb 2o 5, TiO 2, ZrO 2or Si 3n 4.Nb 2o 5specific refractory power be 2.3, TiO 2specific refractory power be 2.3, ZrO 2specific refractory power be 2.17, Si 3n 4specific refractory power be 2.0.Adopt Nb 2o 5, TiO 2, ZrO 2or Si 3n 4as the material of the second high refractive index layer 50, make the specific refractory power of the second high refractive index layer 50 relatively low.
The thickness of the second high refractive index layer 50 is
At one, preferably in embodiment, the thickness of the second high refractive index layer 50 can be
The thickness of the 3rd low-index layer 60 is in a special embodiment, the thickness of the 3rd low-index layer 60 can be 0, that is to say, the 3rd low-index layer 60 can omit.
At one, preferably in embodiment, the thickness of the 3rd low-index layer 60 can be
In present embodiment, the thickness of ITO layer 70 is
The ITO conductive glass that this method makes, comprise the first low-index layer 20, the first high refractive index layer 30, the second low-index layer 40, the second high refractive index layer 50 and the 3rd low-index layer 60, the film layer structure of the suitable thickness of specific refractory power height combination, make ITO conductive glass self there is the performance of half-reflection and half-transmission, when as touch controllable function sheet, do not need additionally to paste half-reflection and half-transmission blooming, with respect to traditional touch controllable function sheet, avoid the photoabsorption of PET rete, visual effect is better in use, simultaneously in weather resistance, the aspects such as rub resistance have more advantage.
Concrete, this ITO conductive glass is applied in mobile phone, panel computer, vehicular rear mirror or other side.While being used on mobile phone, panel computer, can be used as mirror use when mobile phone, panel computer standby, and backlight also just can operate to mobile phone, panel computer without too bright while lighting; As vehicular rear mirror can partly reflect, the high beam of vehicle irradiates the high light of coming after Journalistic, avoids strong reflected light reflection to enter driver's eyes and affect driving, the while also can display direction, the information of time, weather.
Be specific embodiment below.
Embodiment 1
It is dry after float glass is cleaned.
Be 2 × 10 in operating pressure -3under the condition of mbar, at Float Glass Surface successively deposit thickness be siO 2layer, thickness are nb 2o 5layer, thickness are siO 2layer, thickness are nb 2o 5layer and thickness are iTO layer, obtain required reflectivity for the half-reflection and half-transmission ITO conductive glass of (30 ± 3) %.
Embodiment 2
It is dry after float glass is cleaned.
Be 3 × 10 in operating pressure -3under the condition of mbar, at Float Glass Surface successively deposit thickness be tiO 2layer, thickness are siO 2layer, thickness are tiO 2layer and thickness are iTO layer, obtain required reflectivity for the ITO conductive glass of (40 ± 4) %.
The SD-6000 of the electric look of ITO conductive glass utilization Japan that embodiment 1 and embodiment 2 are made carries out reflectance test test, and the 550nm place reflectivity of the ITO conductive glass that embodiment 1 makes is 42.7%, and reflection a* is 0.65, and reflecting b* is 3.18; The peak reflectivity of the ITO conductive glass that embodiment 2 makes is 28.8%, and reflection a* is-7.8, and reflection b* is-0.36.
Embodiment 3
It is dry after float glass is cleaned.
Be 8 × 10 in operating pressure -4under the condition of mbar, at Float Glass Surface successively deposit thickness be nb 2o 5layer, thickness are siO 2layer, thickness are nb 2o 5layer and thickness are iTO layer, obtain required reflectivity for the ITO conductive glass of (50 ± 5) %.
Embodiment 4
It is dry after float glass is cleaned.
Be 1 × 10 in operating pressure -3under the condition of mbar, at Float Glass Surface successively deposit thickness be siO 2layer, thickness are zrO 2layer, thickness are mgF 2layer, thickness are si 3n 4layer and thickness are iTO layer, obtain required reflectivity for the ITO conductive glass of (30 ± 3) %.
Embodiment 5
It is dry after float glass is cleaned.
Be 1 × 10 in operating pressure -3under the condition of mbar, at Float Glass Surface successively deposit thickness be siO 2layer, thickness are tiO 2layer, thickness are siO 2layer, thickness are zrO 2layer and thickness are iTO layer, obtain required reflectivity for the ITO conductive glass of (40 ± 4) %.
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.

Claims (10)

1. an ITO conductive glass, is characterized in that, comprises the glass, the first low-index layer, the first high refractive index layer, the second low-index layer, the second high refractive index layer, the 3rd low-index layer and the ITO layer that stack gradually;
The material of described the first low-index layer is SiO 2or MgF 2;
The material of described the first high refractive index layer is Nb 2o 5, TiO 2, ZrO 2or Si 3n 4;
The material of described the second low-index layer is SiO 2or MgF 2;
The material of described the second high refractive index layer is Nb 2o 5, TiO 2, ZrO 2or Si 3n 4;
The material of described the 3rd low-index layer is SiO 2or MgF 2;
The thickness of described the first low-index layer is
The thickness of described the first high refractive index layer is
The thickness of described the second low-index layer is
The thickness of described the second high refractive index layer is
The thickness of described the 3rd low-index layer is
2. ITO conductive glass according to claim 1, is characterized in that, the thickness of described the first low-index layer is
3. ITO conductive glass according to claim 1, is characterized in that, the thickness of described the first high refractive index layer is
4. ITO conductive glass according to claim 1, is characterized in that, the thickness of described the second low-index layer is
5. ITO conductive glass according to claim 1, is characterized in that, the thickness of described the second high refractive index layer is
6. ITO conductive glass according to claim 1, is characterized in that, the thickness of described the 3rd low-index layer is
7. according to the ITO conductive glass described in any one in claim 1～6, it is characterized in that, the thickness of described ITO layer is
8. a preparation method for ITO conductive glass, is characterized in that, comprises the steps:
Glass is provided, dry after cleaning;
Described glass surface after cleaning is magnetron sputtering deposition the first low-index layer, the first high refractive index layer, the second low-index layer, the second high refractive index layer, the 3rd low-index layer and ITO layer successively, obtain described ITO conductive glass, wherein, the material of described the first low-index layer is SiO 2or MgF 2, the material of described the first high refractive index layer is Nb 2o 5, TiO 2, ZrO 2or Si 3n 4, the material of described the second low-index layer is SiO 2or MgF 2, the material of described the second high refractive index layer is Nb 2o 5, TiO 2, ZrO 2or Si 3n 4, the thickness of described the first low-index layer is the thickness of described the first high refractive index layer is the thickness of described the second low-index layer is the thickness of described the second high refractive index layer is the thickness of described the 3rd low-index layer is
9. the preparation method of ITO conductive glass according to claim 8, is characterized in that, the thickness of described the first low-index layer is the thickness of described the first high refractive index layer is the thickness of described the second low-index layer is the thickness of described the second high refractive index layer is the thickness of described third high index layer is
10. ITO conductive glass according to claim 8 or claim 9, is characterized in that, the thickness of described ITO layer is
CN201410386196.2A 2014-08-07 2014-08-07 ITO electro-conductive glass and preparation method thereof Active CN104163577B (en)

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CN106291782A (en) * 2016-10-27 2017-01-04 宜昌南玻显示器件有限公司 A kind of automobile half-reflection and half-transmission type electrochromism inside rear-view mirror is with the 3rd conducting film
CN106324719A (en) * 2016-10-27 2017-01-11 宜昌南玻显示器件有限公司 Conduction film of second face of electrochromism inside rear-view mirror and production method thereof
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