CN201000489Y - Display apparatus protective screen of high-transmittance ratio glass and liquid crystal display using the same - Google Patents

Display apparatus protective screen of high-transmittance ratio glass and liquid crystal display using the same Download PDF

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Publication number
CN201000489Y
CN201000489Y CNU2007200783844U CN200720078384U CN201000489Y CN 201000489 Y CN201000489 Y CN 201000489Y CN U2007200783844 U CNU2007200783844 U CN U2007200783844U CN 200720078384 U CN200720078384 U CN 200720078384U CN 201000489 Y CN201000489 Y CN 201000489Y
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甘国工
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Abstract

The utility mode provides a display protection screen with a high transmission rate glass, which comprises a transparent glass substrate. The both sides of the substrate is adopted the method of the vacuum magnetron sputtering, compounds TiO <2> and SiO <2>, or a two-layer antireflection reflected film layers of Nb <2> O <5> and SiO <2> in order, or compounds TiO <2> and SiO <2>, or multilayer antireflection reflected film layers of Nb <2> O <5> and SiO <2> in an overlapping way, which form two-layer film layers of TiO <2> layer and SiO <2> layer, or a two-layer film layers of Nb <2> O <5> layer and SiO <2> layer, or a multi-layer film layers of TiO <2> layer and SiO <2> layer, or a multi-layer film layer of Nb <2> O <5> layer and SiO <2> layer from the substrate to outside. The protection screen of the utility model can decrease the reflectivity, improve the light transmission rate and the effect of the optical images, greatly reduce the cost, and fully improve the impact resistance damage capability, thus making the protection screen become a secure protection screen. The utility model also provides a liquid crystal display of the display protection screen using the glass.

Description

The display protection of high light transmittance ratio glass and use the LCD of this screen
Technical field:
The utility model is relevant with LCD (LCD) protection screen, pastes before special and the panel of LCD and the display protection of the high light transmittance ratio glass that prevents the reflection of display screen panel light, raising LCDs light transmission rate and display screen is shielded of assembling and use the LCD of this protection screen relevant.
Background technology:
Learn from the principle of work of LCD (to call LCD in the following text), the LCD device is with the light that sends during by polaroid and liquid crystal cell by backlight, the device of control projection intensity recognition image, the brightness of LCD just depend on the brightness by liquid crystal cell (transmittance of LCD screen) and color film CF light (transmittance of CF) and backlight.Therefore, raising LCD surface brightness and save on backlight source power improve back light source brightness simultaneously and mainly set about from following several respects: the one, improve back light source brightness, the 2nd, improve the TFT aperture ratio of pixels, the 3rd, the brightness that improves all material, also promptly increase the transmittance of material as far as possible, improve the main at present prismatic brightness film that adopts of back light source brightness and increase emission brightness with adopting the novel lamp light source and improving reflection potential; The brightness that improves all material improves the raising that the LCD surface brightness also is the transmittance of a top protection screen of important channel, particularly display screen or diaphragm.Main at present acrylic sheet (PMMA resin sheet) or the polyester film sheet (BOPET diaphragm) of adopting of top protection screen of LCD display or diaphragm.Because though resin sheet material transmittance can be up to 90% and surface-brightening, but the reflectivity single face reaches more than 4%, two-sided stack can reach more than 8%, and damage resistant not, so all do non-glare treated at present on the surface of resin sheet, light reflectivity can be dropped to below 1%, and the surface can the above scuffing of anti-pencil test hardness 2H.Because non-glare treated is resin light reflecting surface to be treated to the light scattering surface reduce light reflectivity; therefore protection screen and the actual visible light transmissivity of diaphragm that obtains no longer is more than 90%; majority all drops to about 80% even lower; the brightness of backlight emission is improved by various measures and cost expenditure; the last a few percent to percent ten that overall transmitance is only arranged that before display screen, presents, but because of protection screen or diaphragm for anti-dazzle antireflection again this transmittance has been beaten nearly 20% in addition more discount (because of its material only have 80% in addition lower see through filter).Therefore, at the reflectivity that reduces panel and protection screen, increase the skin hardness scratch resistance but improve the transmittance of protection screen or diaphragm again and be everybody pursuit always the physics and the mechanical protection performance of display screen.The surface reflectivity that particularly adopts which kind of technical scheme to reduce the protection screen material has multiple scheme to continue to bring out all the time, has at resin layer surface and utilizes colloidal sol---gel method depositing Ti O 2Or Nb 2O 5/ SiO 2Anti-reflection anti-reflection rete; also have and utilize surperficial dip-coating organosilicon anti-reflection layer; but because thickness is wayward; transmittance only can reach about 92%; and yield rate is not high; the surface is prone to rainbow, so far protection screen or diaphragm also do not take place basic change, particularly reflectivity less than 1%, transmittance greater than 93%, more optimize low practical technique and the protection screen material of industrialization cost that reaches 97% or more and also do not have appearance.
The utility model content:
The purpose of this utility model is in order to overcome above deficiency, provides a kind of and can improve display brightness, reduces and watch face light reflectivity, protection display not to be scratched and resist damages, adopt the coating technique of low-cost high-efficiency and glass protection that film is the high transmission rate of production to shield simultaneously.Another purpose of the present utility model is for a kind of LCD of using this protection screen is provided.
The purpose of this utility model is achieved in that
The display protection of the utility model high light transmittance ratio glass comprises transparent glass substrate, the composite Ti O successively on the substrate two sides 2And SiO 2, or Nb 2O 5And SiO 2Two layers of anti-reflection antireflecting rete, or overlapping successively composite Ti O 2And SiO 2, or Nb 2O 5And SiO 2Multilayer is anti-reflection antireflecting rete, they outwards form TiO successively by substrate 2Layer and SiO 2Layer two tunic layer or Nb 2O 5Layer and SiO 2Layer two tunic layer or TiO 2Layer and SiO 2The overlapping rete of multilayer or the Nb of layer 2O 5Layer and SiO 2The overlapping rete of multilayer of layer.The LCD of high transmission rate (LCD) protection screen adopts transparent glass substrate, and particularly the tempered glass substrate has increased the luminance brightness of display, makes image more glittering and translucent, adopts vacuum magnetic-control sputtering method plating TiO 2Or Nb 2O 5And SiO 2, more especially with the twin reaction magnetocontrol sputtering plasma monitoring of intermediate frequency line closed loop control device (PEM system) sputtered with Ti O 2Or Nb 2O 5And SiO 2Rate of sedimentation than high several times of general magnetron sputtering is arranged, obtain the film system or the membrane stack of the high index of refraction/low-index material of coatings and optimization cheaply, make on the substrate and to obtain that anti-reflection anti-reflection effect is obvious, deposition efficiency is high, quality good, strong adhesion, scratch resistant rete, owing to select this film system and membrane stack for use, make the device fabrication specialization and can make four layers or six layers of TiO easily 2Or Nb 2O 2And SiO 2Antireflective coating.Can more not finishing four to six layers membrane stack plated film under conversion materials and the target position situation with the mode that repeats or come and go, is that production efficiency is higher more economically than other anti-reflection antireflecting film accordingly, and cost is lower.Make protection screen be able on LCD display, use in a large number by lower production cost.
The glass protection screen of above-mentioned high transmission rate, substrate two face mask layers are respectively two layers, and its thickness range is TiO 2Or Nb 2O 5Be 5nm to 20nm, SiO 2For 70nm to 140nm.Adopt this thickness at substrate two sides plating TiO 2Or Nb 2O 5/ SiO 2, can obtain transmittance greater than 94% (better can reach 95%), two-sided superposition reflective rate less than 2% protection screen.
The display protection of above-mentioned high light transmittance ratio glass, at least one face mask layer is four tunic layers in substrate two face mask layers, its thickness scope outwards is TiO by glass substrate successively 2Or Nb 2O 5Be 5nm to 18nm, SiO 2Be 20nm to 50nm, TiO 2Or Nb 2O 5Be 20nm to 50nm, SiO 2For 70nm to 140nm.Adopt this thickness four layers of substrate two sides platings, transmittance better can reach 98% greater than 97%, and two-sided superposition reflective rate better is lower than 1% less than 2%.
The display protection of above-mentioned high light transmittance ratio glass, at least one face mask layer is six layers in substrate two face mask layers, they are the ground floor TiO that are compounded on the transparent glass substrate 2Or Nb 2O 5, second layer SiO 2, the 3rd layer of TiO 2Or Nb 2O 5, the 4th layer of SiO 2, layer 5 TiO 2Or Nb 2O 5, layer 6 SiO 2, the thicknesses of layers scope outwards is TiO by glass substrate successively 2Or Nb 2O 5Be 1.5nm to 6nm, SiO 2Be 25nm to 45nm, TiO 2Or Nb 2O 5Be 8nm to 15nm, SiO 2Be 40nm to 60nm, TiO 2Or Nb 2O 5Be 12nm to 20nm, SiO 2For 80nm to 140nm.Adopt this thickness six layers of substrate two sides platings, transmittance better can reach 99% greater than 98%, and two-sided superposition reflective rate is less than 1%.
The display protection of above-mentioned high light transmittance ratio glass, at least one mask of protection screen has electrostatic-proof function, with the surface resistance testing tool in its surface resistance of its surface measurement less than 10 12Ω is at this TiO simultaneously of close glass substrate of electrostatic prevention one side 2Or Nb 2O 5And compound one deck tin ash (SnO between the glass substrate 2) or the antistatic semiconductor film of tin-doped indium oxide (ITO) or Al-Doped ZnO (AZO), rete is 5 layers, they are semiconductor film/TiO of electrostatic prevention 2Or Nb 2O 5/ SiO 2/ TiO 2Or Nb 2O 5/ SiO 2, thicknesses of layers is followed successively by: semiconductor film is 8nm to 28nm, TiO 2Or Nb 2O 5Be 5nm to 18nm, SiO 2Be 20nm to 50nm, TiO 2Or Nb 2O 5Be 20nm to 50nm, SiO 2For 70nm to 140nm.Adopt this film to tie up to substrate and simultaneously plate five layers, four layers of anti-reflection anti-reflection rete of another side plating, transmittance can reach 96%, and two-sided superposition reflective rate also can all be plated five layers as required less than 1.5% on the two sides, and an anti-static function is all had on the two sides.
The display protection of above-mentioned high light transmittance ratio glass, at least one mask of protection screen has electrostatic-proof function, with the surface resistance testing tool in its surface resistance of its surface measurement less than 10 12Ω is at this TiO simultaneously of close glass substrate of electrostatic prevention one side 2Or Nb 2O 5And compound one deck tin ash (SnO between the glass substrate 2) or the antistatic semiconductor film of tin-doped indium oxide (ITO) or Al-Doped ZnO (AZO), rete is 7 layers, they are semiconductor film/TiO of electrostatic prevention 2Or Nb 2O 5/ SiO 2/ TiO 2Or Nb 2O 5/ SiO 2/ TiO 2Or Nb 2O 5/ SiO 2, preferred thicknesses of layers is followed successively by: semiconductor film is 8nm to 28nm, TiO 2Or Nb 2O 5Be 2nm to 7nm, SiO 2Be 20nm to 30nm, TiO 2Or Nb 2O 5Be 40nm to 60nm, SiO 2Be 6nm to 12nm, TiO 2Or Nb 2O 5Be 25nm to 36nm, SiO 2For 70nm to 100nm.Adopt this film to tie up to substrate and simultaneously plate seven layers, six layers of anti-reflection anti-reflection rete of another side plating, transmittance can reach 98%, and two-sided superposition reflective rate also can all be plated seven layers as required less than 1% on the two sides, and an anti-static function is all had on the two sides.
The display protection of above-mentioned high light transmittance ratio glass, what glass substrate adopted is the glass substrate of tempering or half tempered.
The utility model LCD is equipped with the display protection of the above-mentioned high light transmittance ratio glass of a slice before the LCDs.
There is air interface therebetween in above-mentioned LCD when protection screen and display screen installing.During installing, make between protection screen and the display screen to keep a determining deviation, can obviously play the preventing collision protection effect, because of the protection screen of high transmission rate and antiradar reflectivity makes image more clear liquid crystal cell.
There is not air interface therebetween in above-mentioned LCD during the installing of protection screen and display screen, is that to paste with cementing agent be one.Display screen and protection screen are bonded as one, can obviously improve the performance of falling destructive test of one meter high, 6 of display screens.
The display protection of the utility model high light transmittance ratio glass can improve display brightness, reduces and to watch the anti-reflectivity of face light, and the protection display is not scratched and resist damage, the picture quality that raising is watched, and the transmittance height, and also production efficiency height, cost are low.The utility model LCD can be saved cost, improves image quality.
Description of drawings:
Fig. 1 is the utility model structural representation.
Fig. 2 is another structural representation of the utility model.
Fig. 3 is the utility model structural representation again.
Fig. 4 is the utility model structural representation that is coated with antistatic layer.
Fig. 5 is another structural representation of the utility model that is coated with antistatic layer.
Fig. 6 is the utility model liquid crystal display device structure synoptic diagram.
Fig. 7 is another structural representation of the utility model LCD.
Embodiment:
Embodiment 1:
Fig. 1 has provided present embodiment 1 figure.Referring to Fig. 1, the display protection 1 of high light transmittance ratio glass is by transparent glass substrate 4 and two layers of anti-reflection antireflecting TiO adopting the vacuum magnetic-control sputtering method to deposit successively on the two sides of substrate 4 2 Rete 2 and SiO 2Rete 3 is SiO and form structure 2/ TiO 2/ glass substrate/TiO 2/ SiO 2The display protection 1 of high light transmittance ratio glass.Respectively plate two-layer anti-reflection antireflection coatings substrate 4 two-sided, light transmission rate is greater than 94%, and two-sided superposition reflective rate is less than 2%, and the thickness of plated film optimization is: TiO 2Be 10～16nm, SiO 2Be 90～120nm.
Embodiment 2:
Fig. 2 has provided present embodiment 2 structural drawing.Present embodiment 2 basic with embodiment 1 with, not existing together is respectively to plate four layers of anti-reflection antireflection coatings the two-sided of substrate 4, and the formation structure is SiO 2/ TiO 2/ SiO 2/ TiO 2/ glass substrate/TiO 2/ SiO 2/ TiO 2/ SiO 2The display protection 6 of high light transmittance ratio glass, two-sided each light transmission rate is greater than 97%, two-sided superposition reflective rate is less than 1.5%, the thickness of plated film optimization is followed successively by: SiO 2Be 100～115nm/TiO 2Be 30～36nm/SiO 2Be 36～45nm/TiO 2Be 8～12nm/ glass substrate/TiO 2Be 8～12nm/SiO 2Be 36～45nm/TiO 2Be 30～36nm/SiO 2Be 100～115nm.
Embodiment 3
Fig. 3 has provided the figure of present embodiment 3, and this enforcement is basic identical with embodiment 2, and not existing together is respectively to plate six layers of anti-reflection antireflection coatings the two-sided of substrate 4, and the formation structure is SiO 2/ TiO 2/ SiO 2/ TiO 2/ SiO 2/ TiO 2/ glass substrate/TiO 2/ SiO 2/ TiO 2/ SiO 2/ TiO 2/ SiO 2The glass displays protection screen 7 of high transmission rate, light transmission rate is greater than 98.5%, two-sided superposition reflective rate is less than 1%, the thickness of plated film optimization is followed successively by: SiO 2Be 100～130nm/TiO 2Be 12～18nm/SiO 2Be 40～60nm/TiO 2Be 8～12nm/SiO 2Be 30～40nm/TiO 2Be 1～3nm/ glass substrate/TiO 2Be 1～3nm/SiO 2Be 30～40nm/TiO 2Be 8～12nm/SiO 2Be 40～60nm/TiO 2Be 12～18nm/SiO 2Be 100～130nm.
Embodiment 4
Fig. 4 has provided the figure of present embodiment 4, this enforcement is basic identical with embodiment 2, do not exist together is that one side at substrate 4 is coated with four layers of anti-reflection antireflection coatings, deposit one deck antistatic layer 5 with the vacuum magnetic-control sputtering method between the anti-reflection antireflection coatings of another side and the glass substrate, antistatic layer 5 is Al-Doped ZnO (AZO) semiconductor film, is SiO and form structure 2/ TiO 2/ SiO 2/ TiO 2/ AZO/ glass substrate/TiO 2/ SiO 2/ TiO 2/ SiO 2The display protection 8 of the high light transmittance ratio glass that anti-static function is arranged, transmittance is greater than 96%, antistatic surface resistance is less than 10 11Ω, two-sided superposition reflective rate is less than 1.5%, and the thickness of plated film optimization is followed successively by: SiO 2Be 80～90nm/TiO 2Be 40～50nm/SiO 2Be 30～40nm/TiO 2Be 4～8nm/ Al-Doped ZnO (AZO), 16～20nm/ glass substrate/TiO 2Be 8～10nm/SiO 2Be 36～45nm/TiO 2Be 30～36nm/SiO 2Be 100～115nm.
Embodiment 5:
Fig. 5 has provided the figure of present embodiment 5, this enforcement is basic identical with embodiment 4, do not exist together is that one side at substrate 4 is coated with six layers of anti-reflection antireflection coatings, deposit one deck antistatic layer 5 with the vacuum magnetic-control sputtering method between the anti-reflection antireflection coatings of another side and the glass substrate, antistatic layer 5 is Al-Doped ZnO (AZO) semiconductor film, is SiO and form structure 2/ TiO 2/ SiO 2/ TiO 2/ SiO 2/ TiO 2/ AZO/ glass substrate/TiO 2/ SiO 2/ TiO 2/ SiO 2/ TiO 2/ SiO 2The display protection 9 of the high light transmittance ratio glass that anti-static function is arranged, transmittance is greater than 98%, antistatic surface resistance is less than 10 11Ω, two-sided superposition reflective rate is less than 1%, and the thickness of plated film optimization is followed successively by: SiO 2Be 80～95nm/TiO 2Be 26～34nm/SiO 2Be that 6～9nm/TiO is 46～56nm/SiO 2Be 23～28nm/TiO 2Be 4～7nm/ Al-Doped ZnO (AZO), 18～23nm/ glass substrate/TiO 2Be 1～3nm/SiO 2Be 30～40nm/TiO 2Be 8～12nm/SiO 2Be 40～60nm/TiO 2Be 12～18nm/SiO 2Be 100～130nm.
Embodiment 6
Fig. 6 has provided the figure of present embodiment 6, and Fig. 6 is the utility model liquid crystal display device structure synoptic diagram, and LCD is SiO by display casing 10, display 11, structure 2/ TiO 2/ SiO 2/ TiO 2/ glass substrate/TiO 2/ SiO 2/ TiO 2/ SiO 2The glass protection screen 6 of high transmission rate form, there is air interface 13 therebetween in protection screen 6 during with display screen 12 installings, during installing, makes reservation one determining deviation between protection screen 6 and the display screen 12, can obviously play the preventing collision protection effect to liquid crystal cell.
Embodiment 7
Fig. 7 has provided the figure of present embodiment 7; this enforcement is basic identical with embodiment 6; do not exist together and do not have air interface when being protection screen 7 and display screen 12 installings therebetween; be display screen 12 and protection screen 7 to be bonded as one, can obviously improve the performance of falling destructive test of one meter high, 6 of display screens with cementing agent 14.
The various embodiments described above are that foregoing of the present utility model is further described, but this should be interpreted as that the scope of the above-mentioned theme of the utility model only limits to the foregoing description.All technology that realizes based on foregoing all belong to scope of the present utility model.

Claims (9)

1, the display protection of high light transmittance ratio glass comprises transparent glass substrate, it is characterized in that at substrate two sides composite Ti O 2And SiO 2, or Nb 2O 5And SiO 2Two layers of anti-reflection antireflecting rete, or overlapping successively depositing Ti O 2And SiO 2, or Nb 2O 5And SiO 2Multilayer is anti-reflection antireflecting rete, they outwards form TiO successively by substrate 2Layer and SiO 2Layer two tunic layer or Nb 2O 5Layer and SiO 2Layer two tunic layer or TiO 2Layer and SiO 2The overlapping rete of multilayer or the Nb of layer 2O 5Layer and SiO 2The overlapping rete of multilayer of layer.
2, the display protection of high light transmittance ratio glass as claimed in claim 1 is characterized in that substrate two face mask layers are two layers, and its thickness range is TiO 2Or Nb 2O 5Be 5nm to 20nm, SiO 2For 70nm to 140nm.
3, the display protection of high light transmittance ratio glass as claimed in claim 1 is characterized in that at least one face mask layer is four tunic layers in substrate two face mask layers, and its thickness scope outwards is TiO by glass substrate successively 2Or Nb 2O 5Be 5nm to 18nm, SiO 2Be 20nm to 50nm, TiO 2Or Nb 2O 5Be 20nm to 50nm, SiO 2For 70nm to 140nm.
4, the display protection of high light transmittance ratio glass as claimed in claim 1 is characterized in that at least one face mask layer is six layers in the coatings of substrate two sides, and they are the ground floor TiO that are compounded on the transparent glass substrate 2Or Nb 2O 5, second layer SiO 2, the 3rd layer of TiO 2Or Nb 2O 5, the 4th layer of SiO 2, layer 5 TiO 2Or Nb 2O 5, layer 6 SiO 2, the thicknesses of layers scope outwards is TiO by glass substrate successively 2Or Nb 2O 5Be 1.5nm to 6nm, SiO 2Be 25nm to 45nm, TiO 2Or Nb 2O 5Be 8nm to 15nm, SiO 2Be 40nm to 60nm, TiO 2Or Nb 2O 5Be 12nm to 20nm, SiO 2For 80nm to 140nm.
5, the display protection of high light transmittance ratio glass as claimed in claim 1 is characterized in that at least one mask of protection screen has electrostatic-proof function, with the surface resistance testing tool in its surface resistance of its surface measurement less than 10 12Ω is at this TiO simultaneously of close glass substrate of electrostatic prevention one side 2Or Nb 2O 5And the antistatic semiconductor film of compound one deck tin ash or tin-doped indium oxide or Al-Doped ZnO between the glass substrate, rete is 5 layers, they are semiconductor film/TiO of electrostatic prevention 2Or Nb 2O 5/ SiO 2/ TiO 2Or Nb 2O 5/ SiO 2, thicknesses of layers is followed successively by: semiconductor film is 8nm to 28nm, TiO 2Or Nb 2O 5Be 5nm to 18nm, SiO 2Be 20nm to 50nm, TiO 2Or Nb 2O 5Be 20nm to 50nm, SiO 2For 70nm to 140nm.
6, the display protection of high light transmittance ratio glass as claimed in claim 1 is characterized in that at least one mask of protection screen has electrostatic-proof function, with the surface resistance testing tool in its surface resistance of its surface measurement less than 10 12Ω is at this TiO simultaneously of close glass substrate of electrostatic prevention one side 2Or Nb 2O 5And the antistatic semiconductor film of compound one deck tin ash or tin-doped indium oxide or Al-Doped ZnO between the glass substrate, rete is 7 layers, they are semiconductor film/TiO of electrostatic prevention 2Or Nb 2O 5/ SiO 2/ TiO 2Or Nb 2O 5/ SiO 2/ TiO 2Or Nb 2O 5/ SiO 2, preferred thicknesses of layers is followed successively by: semiconductor film is 8nm to 28nm, TiO 2Or Nb 2O 5Be 2nm to 7nm, SiO 2Be 20nm to 30nm, TiO 2Or Nb 2O 5Be 40nm to 60nm, SiO 2Be 6nm to 12nm, TiO 2Or Nb 2O 5Be 25nm to 36nm, SiO 2For 70nm to 100nm.
7, LCD is characterized in that being equipped with before the LCDs glass protection screen of any described high transmission rate of a slice claim 1 to 7.
8, there is air interface therebetween in LCD as claimed in claim 7 when it is characterized in that the installing of protection screen and display screen.
9, LCD as claimed in claim 7 is characterized in that the time there is not air interface therebetween in the installing of protection screen and display screen, is that to paste with cementing agent be one.
CNU2007200783844U 2007-02-01 2007-02-01 Display apparatus protective screen of high-transmittance ratio glass and liquid crystal display using the same Expired - Fee Related CN201000489Y (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102287759A (en) * 2010-06-15 2011-12-21 鸿富锦精密工业（深圳）有限公司 Light guide plate and backlight module
CN102360095A (en) * 2011-09-29 2012-02-22 中国航空工业第六一八研究所 Optical rotation sheet
CN105835465A (en) * 2015-01-13 2016-08-10 南昌欧菲光学技术有限公司 Antireflective anti-fingerprint laminate and manufacturing method thereof
CN106782118A (en) * 2016-12-22 2017-05-31 长沙信元电子科技有限公司 A kind of patch type LED display screen face shield
CN109100823A (en) * 2018-08-15 2018-12-28 北京京东方专用显示科技有限公司 A kind of anti-reflection structure and display panel
CN109853044A (en) * 2019-01-21 2019-06-07 南京航空航天大学 Monocrystalline silicon surface composite microstructure and preparation method thereof based on all band anti-reflection
CN114690306A (en) * 2022-02-21 2022-07-01 浙江彩丞科技有限公司 Luminescent glass, light inlet device and light guide prism manufacturing method

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102287759A (en) * 2010-06-15 2011-12-21 鸿富锦精密工业（深圳）有限公司 Light guide plate and backlight module
CN102360095A (en) * 2011-09-29 2012-02-22 中国航空工业第六一八研究所 Optical rotation sheet
CN102360095B (en) * 2011-09-29 2014-02-05 中国航空工业第六一八研究所 Optical rotation sheet
CN105835465A (en) * 2015-01-13 2016-08-10 南昌欧菲光学技术有限公司 Antireflective anti-fingerprint laminate and manufacturing method thereof
CN106782118A (en) * 2016-12-22 2017-05-31 长沙信元电子科技有限公司 A kind of patch type LED display screen face shield
CN109100823A (en) * 2018-08-15 2018-12-28 北京京东方专用显示科技有限公司 A kind of anti-reflection structure and display panel
CN109100823B (en) * 2018-08-15 2020-10-02 北京京东方专用显示科技有限公司 Subtract reflection configuration and display panel
CN109853044A (en) * 2019-01-21 2019-06-07 南京航空航天大学 Monocrystalline silicon surface composite microstructure and preparation method thereof based on all band anti-reflection
CN114690306A (en) * 2022-02-21 2022-07-01 浙江彩丞科技有限公司 Luminescent glass, light inlet device and light guide prism manufacturing method

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