CN109100823B - Subtract reflection configuration and display panel - Google Patents
Subtract reflection configuration and display panel Download PDFInfo
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- CN109100823B CN109100823B CN201810928928.4A CN201810928928A CN109100823B CN 109100823 B CN109100823 B CN 109100823B CN 201810928928 A CN201810928928 A CN 201810928928A CN 109100823 B CN109100823 B CN 109100823B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
- G02B1/116—Multilayers including electrically conducting layers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133382—Heating or cooling of liquid crystal cells other than for activation, e.g. circuits or arrangements for temperature control, stabilisation or uniform distribution over the cell
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133504—Diffusing, scattering, diffracting elements
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
- G02F1/133334—Electromagnetic shields
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133504—Diffusing, scattering, diffracting elements
- G02F1/133507—Films for enhancing the luminance
Abstract
The invention provides an antireflection structure and a display panel. The antireflection structure comprises a substrate, a first film layer and a second film layer, wherein the first film layer and the second film layer are arranged on one side of the substrate and are sequentially far away from the substrate; the first film layer comprises a plurality of first structures arranged at intervals along a first direction, and each first structure comprises a first sub-layer and a second sub-layer which are sequentially far away from the substrate; the refractive index of the first sublayer is smaller than that of the second sublayer, the refractive index of the second film layer is smaller than that of the first sublayer, the refractive index of the substrate is smaller than that of the second film layer, the refractive index of a medium in a spacing region between the first structures is smaller than that of the second film layer, and the refractive index of the medium in the spacing region is smaller than that of the substrate. The antireflection structure can ensure that most of light rays emitted from the inside of the second sublayer to the interface of the second sublayer and other layers are totally reflected, and the totally reflected light rays and the light rays transmitted into the second sublayer are destructively weakened after being mutually superposed, so that the reflection of the antireflection structure to the light rays is reduced.
Description
Technical Field
The invention relates to the technical field of display, in particular to an antireflection structure and a display panel.
Background
The reflectivity of the display product is always an important index, and because the high reflectivity seriously affects the display effect of the display product, an antireflection layer is attached or plated on the surface of the display product to reduce the reflectivity, but part of light still penetrates through the surface of the display product to enter the display product, and the reflection is generated at the junctions of all film layers in the display product.
The reflection of the ITO film layer in the display product is the most serious, the refractive index of ITO is commonly about 2.0 and is greatly different from that of other materials, so that the reflection rate is positively influenced when the ITO film layer exists, but many functions in the display product, such as shielding (for example, shielding an external electromagnetic field), heating (for example, heating a liquid crystal screen when the liquid crystal screen is started at a lower environmental temperature), electric conduction and the like, need to be realized by the ITO film layer. At present, the reflectivity of the ITO film is generally reduced by the thickness of the specific ITO film, but the effect is not ideal, and the ITO film is made to be very thin and has very high resistance, so that the conductivity and the shielding capability of the ITO film are not good.
Therefore, how to reduce the reflectivity increased by the ITO film layer inside the display product is a problem to be solved.
Disclosure of Invention
The present invention provides an anti-reflective structure and a display panel, aiming at the above technical problems in the prior art. The antireflection structure can ensure that most of light rays emitted from the inside of the second sublayer to the interface between the second sublayer and the first sublayer, the interface between the second sublayer and the second film layer and the interface between the second sublayer and the interval area medium are totally reflected, and the totally reflected light rays and the light rays transmitted into the second sublayer are destructively weakened after being mutually superposed, so that the reflection of the antireflection structure on the light rays is greatly reduced.
The invention provides an antireflection structure, which comprises a substrate, a first film layer and a second film layer, wherein the first film layer and the second film layer are arranged on one side of the substrate and are sequentially far away from the substrate;
the first film layer comprises a plurality of first structures arranged at intervals along a first direction, and each first structure comprises a first sub-layer and a second sub-layer which are sequentially far away from the substrate;
the refractive index of the first sublayer is smaller than that of the second sublayer, the refractive index of the second film layer is smaller than that of the first sublayer, the refractive index of the substrate is smaller than that of the second film layer, the refractive index of a medium in a spacing region between the first structures is smaller than that of the second film layer, and the refractive index of the medium in the spacing region is smaller than that of the substrate.
Preferably, the medium in the spaced area includes a second structure, the first structure and the second structure are both strip-shaped, and the length directions of the first structure and the second structure are both perpendicular to the first direction.
Preferably, the thickness of the first sublayer satisfies the fresnel formula: n1 × d1 ═ λ/4(2 k)1+ 1); the thickness of the second sublayer satisfies the Fresnel formula: n2 × d2 ═ λ/4(2 k)2+ 1); the thickness of the second film layer satisfies the Fresnel formula: n3 × d3 ═ λ/4(2 k)3+ 1); wherein n1 is the refractive index of the first sublayer; n2 is the refractive index of the second sublayer; n3 is the refractive index of the second film layer; d1 is the thickness of the first sublayer; d2 is the thickness of the second sublayer; d3 is the thickness of the second film layer; λ is the wavelength of light incident on the side of the substrate facing away from the first film layer; k is a radical of1、k2And k3Are all integers, and k2＝2k1，k2＝3k3。
Preferably, the refractive index of the second sub-layer is more than or equal to 2.01, and the refractive index of the first sub-layer and the refractive index of the second sub-layer meet (n1)2Nt × n2, where n1 is the refractive index of the first sublayer, n2 is the refractive index of the second sublayer, and nt is the refractive index of the substrate.
Preferably, the width of the second structure along the first direction is 1/3-1/2 of the width of the first structure along the first direction.
Preferably, the refractive index of the second structure and the refractive index of the second film layer satisfy (n4)2And nt × n3, wherein n4 is the refractive index of the second structure, n3 is the refractive index of the second film layer, and nt is the refractive index of the substrate.
Preferably, the refractive index of the substrate is 1.4-1.52.
Preferably, the material of the substrate comprises glass.
The invention also provides a display panel, which comprises a display substrate and the antireflection structure, wherein the antireflection structure is arranged on the display side of the display substrate, and the second film layer of the antireflection structure faces the display substrate.
Preferably, the first sub-layer and the second film layer of the anti-reflection structure both adopt conductive materials, the second sub-layer of the anti-reflection structure adopts insulating materials, and the second structure of the anti-reflection structure adopts insulating materials;
the first sublayer is of a grid-like structure.
Preferably, the display substrate is a liquid crystal cell; the second film layer is reused as a heating layer of the display panel and used for heating the display substrate when power is applied.
Preferably, the first sublayer and the second film layer are made of an ITO material, nano silver or copper;
the second sublayer adopts niobium pentoxide; the second structure adopts an organic optical glue material.
Preferably, the antireflection structure is bonded to the display substrate through an organic optical adhesive, and an AR protection film is further disposed on a side of the antireflection structure facing away from the display substrate.
The invention has the beneficial effects that: according to the antireflection structure provided by the invention, the first structure is arranged on the substrate at intervals, and the refractive index of the second sublayer in the first structure is set to be larger than that of the first sublayer, the second film layer and the interval area medium adjacent to the first structure, so that most of light rays transmitted into the second sublayer from the substrate side can be totally reflected when being emitted from the inside of the second sublayer to the interface between the second sublayer and the first sublayer, the interface between the second sublayer and the second film layer and the interface between the second sublayer and the interval area medium, and the totally reflected light rays and the light rays transmitted into the second sublayer can be weakened in a destructive mode after being mutually superposed, and further, the reflection of the antireflection structure on the light rays is greatly reduced.
According to the display panel provided by the invention, by adopting the antireflection structure, the reflection of incident light on the display side of the display panel can be reduced, so that the light transmittance of the display side of the display panel is improved, and the display effect of the display panel is further improved.
Drawings
Fig. 1 is a cross-sectional view of an antireflective structure according to the present invention;
fig. 2 is a structural cross-sectional view of a display panel according to the present invention.
Wherein the reference numbers indicate:
1. a substrate; 21. a first film layer; 210. a first structure; 2101. a first sublayer; 2102. a second sublayer; 211. a second structure; 22. a second film layer; 3. a display substrate; 4. an antireflection structure; AR protective film.
Detailed Description
In order to make those skilled in the art better understand the technical solution of the present invention, the following describes an antireflection structure and a display panel provided by the present invention in further detail with reference to the accompanying drawings and the detailed description.
The embodiment of the invention provides an antireflection structure, which comprises a substrate, a first film layer and a second film layer, wherein the first film layer and the second film layer are arranged on one side of the substrate and are sequentially far away from the substrate. The first film layer comprises a plurality of first structures arranged at intervals along a first direction, and each first structure comprises a first sub-layer and a second sub-layer which are sequentially far away from the substrate; the refractive index of the first sublayer is smaller than that of the second sublayer, the refractive index of the second film layer is smaller than that of the first sublayer, the refractive index of the substrate is smaller than that of the second film layer, the refractive index of a medium in a spacing region between the first structures is smaller than that of the second film layer, and the refractive index of the medium in the spacing region is smaller than that of the substrate.
In the antireflection structure provided by this embodiment, the first structures are arranged on the substrate at intervals, and the refractive index of the second sublayer in the first structure is set to be greater than the refractive indexes of the first sublayer, the second film layer and the spacing region medium adjacent to the first sublayer, so that most of light rays transmitted from the substrate side into the second sublayer can be totally reflected when being emitted from the inside of the second sublayer to the interface between the second sublayer and the first sublayer, the interface between the second sublayer and the second film layer and the interface between the second sublayer and the spacing region medium, and the totally reflected light rays and the light rays transmitted into the second sublayer can be destructively weakened after being mutually superposed, thereby greatly reducing the reflection of the antireflection structure on the light rays.
An embodiment of the present invention provides an anti-reflection structure, as shown in fig. 1, including a substrate 1, and further including a first film layer 21 and a second film layer 22, which are disposed on one side of the substrate 1 and sequentially away from the substrate 1; the first film layer 21 includes a plurality of first structures 210 arranged at intervals along the first direction L, the first structures 210 including a first sub-layer 2101 and a second sub-layer 2102 arranged sequentially away from the substrate 1; the refractive index of the first sublayer 2101 is less than the refractive index of the second sublayer 2102, the refractive index of the second film layer 22 is less than the refractive index of the first sublayer 2101, the refractive index of the substrate 1 is less than the refractive index of the second film layer 22, the refractive index of the medium in the spaced-apart regions between the first structures 210 is less than the refractive index of the second film layer 22, and the refractive index of the medium in the spaced-apart regions is less than the refractive index of the substrate 1.
The refractive indexes of the second film layer 22 and the first film layer 21 are set so that a part of light rays incident from the substrate 1 side and transmitted into the substrate 1 are refracted, a part of light rays transmitted into the first film layer 2101 from the substrate 1 side are further refracted, a part of light rays transmitted into the second film layer 2102 from the first film layer 2101 are further refracted, when light rays inside the second film layer 2102 reach the interface between the second film layer 2102 and the second film layer 22, since the refractive index of the second film layer 2102 is larger than that of the second film layer 22, and the incident angles of most of the light rays are larger than the critical angle (in the present embodiment, the critical angle is 50 °) for total reflection, most of the light rays will be totally reflected at the interface between the second film layer 2102 and the second film layer 22, that is, most of the light rays inside the second film layer 2102 will be reflected back into the layer, and the light rays reflected back into the layer and other light rays incident into the layer (for example, the optical path difference between the light rays reflected back into the layer) Exactly pi, namely the vibration directions of the two beams are opposite) can destructively weaken a part of total reflection light rays after superposition; in addition, the light totally reflected at the interface between the second sublayer 2102 and the second film layer 22 enters the interface between the second sublayer 2102 and the first sublayer 2101, or the light totally reflected enters the interface between the second sublayer 2102 and the spacing region, and similarly, the total reflected light can continue to weaken a part of the total reflected light after being superimposed with other light entering the second sublayer 2102 (for example, the optical path difference between the light reflected back to the second sublayer is exactly pi, that is, the vibration directions of the two light beams are opposite) in the same way; thereby greatly reducing the light rays incident to and reflected from the anti-reflection structure; finally, when a small amount of residual light in the second sublayer 2102 is emitted through the interface between the second sublayer 2102 and the first sublayer 2101 and the interface between the first sublayer 2101 and the substrate 1, the light continuously passes through the film layer with the lower refractive index to gradually smooth the light path, and therefore, only a small amount of light is emitted out of the surface of the substrate 1 to form reflected light.
The refractive index of the medium in the spacing region is smaller than that of the second film layer 22, and the refractive index of the medium in the spacing region is smaller than that of the substrate 1, so that most of light rays incident from the region corresponding to the spacing region on the substrate 1 side are incident into the second sub-layer 2102 after being refracted at the interface between the substrate 1 and the medium in the spacing region, and only a small part of light rays are incident into the first sub-layer 2101 and the second film layer 22, so that most of light rays can be subjected to total reflection and superposition destructive attenuation in the second sub-layer 2102, and light reflection of the antireflection structure is reduced.
Preferably, in this embodiment, the medium in the spaced area includes the second structure 211, the first structure 210 and the second structure 211 are both stripe-shaped, and the length directions of the first structure 210 and the second structure 211 are both perpendicular to the first direction L.
It should be noted that the medium in the spaced-apart regions between the first structures 210 may also be air.
In this embodiment, the thickness of the first sublayer 2101 satisfies the fresnel formula: n1 × d1 ═ λ/4(2 k)1+ 1); the thickness of the second sublayer 2102 satisfies the fresnel formula: n2 × d2 ═ λ/4(2 k)2+ 1); the thickness of the second film layer 22 satisfies the fresnel formula: n3 × d3 ═ λ/4(2 k)3+ 1); where n1 is the refractive index of the first sublayer 2101; n2 being the second sublayer 2102A refractive index; n3 is the refractive index of the second film layer 22; d1 is the thickness of the first sublayer 2101; d2 is the thickness of the second sub-layer 2102; d3 is the thickness of the second film layer 22; λ is the wavelength of the light incident on the side of the substrate 1 facing away from the first film layer 21; k is a radical of1、k2And k3Are all integers, and k2＝2k1，k2＝3k3. According to the principle of antireflection, the thicknesses of the first sub-layer 2101, the second sub-layer 2102 and the second film layer 22 are set so that light transmitted into the first film layer 21 from the substrate 1 side is mostly eliminated by destructive attenuation after total reflection and light superposition when passing through the interface between the second sub-layer 2102 and the second film layer 22, the interface between the second sub-layer 2102 and the first sub-layer 2101, and the interfaces between the second sub-layer 2102 and the first sub-layer 2101 and the second structure 211 respectively, thereby reducing light reflection of the antireflection structure.
It should be noted that the thicknesses of the first sub-layer 2101, the second sub-layer 2102 and the second film layer 22 should be as thick as possible under the condition of satisfying the above fresnel formula requirements, the preparation process requirements and the transmittance requirements, so that the energy of the incident light after propagating through a longer light path is further consumed and weakened, thereby reducing the light reflection of the antireflection structure. The transmittances of the first sublayer 2101, the second sublayer 2102, the second film layer 22 and the second structure 211 can reach more than 90%.
Further preferably, in this embodiment, the refractive index of the second sub-layer 2102 is equal to or greater than 2.01, and the refractive index of the first sub-layer 2101 and the refractive index of the second sub-layer 2102 satisfy (n1)2Nt × n2, where n1 is the refractive index of the first sublayer 2101, n2 is the refractive index of the second sublayer 2102, and nt is the refractive index of the substrate 1, preferably the refractive index of the substrate 1 is 1.52. With such an arrangement, total reflection of light rays in the second sub-layer 2102 and destructive attenuation after light rays are superimposed when the light rays pass through the interface between the second sub-layer 2102 and the first sub-layer 2101 can be promoted, so that light ray reflection of the antireflection structure can be further reduced.
Preferably, in the present embodiment, the width of the second structure 211 along the first direction L is 1/3-1/2 of the width of the first structure 210 along the first direction L. With such an arrangement, the light transmitted into the second structure 211 from the substrate 1 side can be prevented from being incident to the interface between the second structure 211 and the second film layer 22 as much as possible, that is, most of the light transmitted into the second structure 211 from the substrate 1 side can be incident into the second sub-layer 2102, so that the light is subjected to total reflection in the second sub-layer 2102 and destructive attenuation after the light is superimposed, and the light reflection of the antireflection structure is further reduced.
In this embodiment, the refractive index of the second structure 211 and the refractive index of the second film 22 satisfy (n4)2Nt × n3, where n4 is the refractive index of the second structure 211, n3 is the refractive index of the second film layer 22, and nt is the refractive index of the substrate 1. Among them, nt is preferably 1.52. With such an arrangement, most of the light transmitted from the substrate 1 side into the second structure 211 can be incident into the second sub-layer 2102, only a small part of the light can be incident into the second film layer 22, and most of the light incident into the second film layer 22 can be incident into the second sub-layer 2102, so that total reflection of the light in the second sub-layer 2102 and destructive attenuation after superposition of the light are promoted, and light reflection of the antireflection structure is further reduced.
Preferably, the refractive index of the substrate 1 is 1.4 to 1.52. Since the refractive index of the second structure 211 is smaller than that of the substrate 1, the light transmitted from the substrate 1 side and entering the second structure 211 can be prevented from being incident on the second film layer 22 as much as possible, and the light enters the second sub-layer 2102 by being refracted greatly, so that the total reflection of the light in the second sub-layer 2102 and the destructive attenuation after the light is superimposed are promoted, and the light reflection of the antireflection structure is further reduced.
In the present embodiment, the material of the substrate 1 includes glass. Of course, other materials such as resin may be used for the substrate as long as the refractive index and the light transmittance are satisfactory.
In the antireflection structure provided by this embodiment, the first structures are arranged on the substrate at intervals, and the refractive index of the second sublayer in the first structure is set to be greater than the refractive indexes of the first sublayer, the second film layer and the spacing region medium adjacent to the first sublayer, so that most of light rays transmitted from the substrate side into the second sublayer can be totally reflected when being emitted from the inside of the second sublayer to the interface between the second sublayer and the first sublayer, the interface between the second sublayer and the second film layer and the interface between the second sublayer and the spacing region medium, and the totally reflected light rays and the light rays transmitted into the second sublayer can be destructively weakened after being mutually superposed, thereby greatly reducing the reflection of the antireflection structure on the light rays.
An embodiment of the present invention provides a display panel, as shown in fig. 2, including a display substrate 3, and further including an antireflection structure 4 in the foregoing embodiment, where the antireflection structure 4 is disposed on a display side of the display substrate 3, and a second film layer 22 of the antireflection structure 4 faces the display substrate 3.
This display panel can reduce its display side to the reflection of incident ray through adopting antireflection structure 4 in above-mentioned embodiment to the light transmittance of display panel display side has been improved, and then display panel's display effect has been promoted.
In this embodiment, the first sub-layer 2101 and the second film layer 22 of the anti-reflection structure 4 both adopt a conductive material, the second sub-layer 2102 of the anti-reflection structure 4 adopts an insulating material, and the second structure 211 of the anti-reflection structure 4 adopts an insulating material; the first sublayer 2101 is a grid-like structure. The first sublayer 2101 is reused as a shielding layer of the display panel for shielding external electromagnetic fields. The display substrate 3 is a liquid crystal cell. The liquid crystal box has a display function. The second film layer 22 is used as a heating layer of the display panel for heating the display substrate 3 when power is applied; therefore, the liquid crystal screen can be normally started in a lower temperature environment. The substrate 1 of the antireflection structure 4 is used as a protective cover plate of the display panel and is used for covering the display surface of the display substrate 3. The multiplexing of the first sublayer 2101, the second film layer 22 and the substrate 1 of the antireflection structure 4 in the display panel can reduce the overall thickness of the display panel, and at the same time, the display panel can have an antireflection function and an electromagnetic shielding function and can be normally started in a low-temperature environment.
Of course, the display substrate 3 may be an OLED display substrate having a display function.
In this embodiment, the first sublayer 2101 and the second film layer 22 are made of ITO; the second sublayer 2102 was formed using niobium pentoxide; the second structure 211 is made of an organic optical material, such as polyurethane, acrylic or silicone material. The first sublayer 2101 of ITO material can play a good role in electromagnetic shielding, and the second film layer 22 of ITO material can heat the liquid crystal cell when powered up, so that it can start up normally in a low temperature environment. Because the film layer of adopting the ITO material can produce more serious reflection to the light on it, so through adopting antireflection structure 4 in the above-mentioned embodiment, can significantly reduce the reflection of the film layer of adopting the ITO material to light to this display panel's display effect has been promoted.
It should be noted that the first sub-layer 2101 and the second film layer 22 may also be made of nano silver or copper material, the film layer made of nano silver or copper material has good electrical conductivity, and can also perform the electromagnetic shielding function and the conductive heating function, and by using the anti-reflection structure 4 in the above embodiment, the reflection of light rays can also be greatly reduced.
In this embodiment, the antireflection structure 4 and the display substrate 3 are bonded by an organic optical adhesive, and an AR protection film 5 is further disposed on a side of the antireflection structure 4 facing away from the display substrate 3. The AR protection film 5 can reduce the light reflection of the substrate 1 of the antireflection structure 4 back to the first film layer 21 and the second film layer 22, so as to further improve the antireflection effect of the display panel, and the transmittance of the AR protection film 5 is high (more than 95%), thereby further improving the display effect of the display panel.
The display panel that this embodiment provided, through adopting the reflection reduction structure in above-mentioned embodiment, can reduce the reflection of display panel display side to incident light to the light transmittance of display panel display side has been improved, and then display panel's display effect has been promoted, simultaneously through adopting the reflection reduction structure in above-mentioned embodiment, can also realize the electromagnetic shield and the heating under the low temperature environment to display panel, thereby make display panel also can normally start under the low temperature environment.
The display panel provided by the invention can be any product or component with a display function, such as an OLED panel, an OLED television, an LCD panel, an LCD television, a display, a mobile phone, a navigator and the like.
It will be understood that the above embodiments are merely exemplary embodiments taken to illustrate the principles of the present invention, which is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.
Claims (12)
1. An antireflection structure comprises a substrate and is characterized by further comprising a first film layer and a second film layer which are arranged on one side of the substrate and are sequentially far away from the substrate;
the first film layer comprises a plurality of first structures arranged at intervals along a first direction, and each first structure comprises a first sub-layer and a second sub-layer which are sequentially far away from the substrate;
the refractive index of the first sublayer is smaller than that of the second sublayer, the refractive index of the second film layer is smaller than that of the first sublayer, the refractive index of the substrate is smaller than that of the second film layer, the refractive index of a medium in a spacing region between the first structures is smaller than that of the second film layer, and the refractive index of a medium in the spacing region is smaller than that of the substrate;
the thickness of the first sublayer satisfies the Fresnel formula: n1 × d1 ═ λ/4(2 k)1+ 1); the thickness of the second sublayer satisfies the Fresnel formula: n2 × d2 ═ λ/4(2 k)2+ 1); the thickness of the second film layer satisfies the Fresnel formula: n3 × d3 ═ λ/4(2 k)3+ 1); wherein n1 is the refractive index of the first sublayer; n2 is the refractive index of the second sublayer; n3 is the refractive index of the second film layer; d1 is the thickness of the first sublayer; d2 is the thickness of the second sublayer; d3 is the thickness of the second film layer; λ is the wavelength of light incident on the side of the substrate facing away from the first film layer; k is a radical of1、k2And k3Are all integers, and k2＝2k1，k2＝3k3。
2. The reduction structure according to claim 1, wherein the spacer intra-region dielectric comprises a second structure, the first structure and the second structure are both stripe-shaped, and the length directions of the first structure and the second structure are both perpendicular to the first direction.
3. The antireflection structure of claim 2 wherein the refractive index of said second sub-layer is greater than or equal to 2.01, and the refractive index of said first sub-layer and the refractive index of said second sub-layer satisfy (n1)2Nt × n2, where n1 is the refractive index of the first sublayer, n2 is the refractive index of the second sublayer, and nt is the refractive index of the substrate.
4. The antireflection structure of claim 3 wherein the width of the second structure along the first direction is 1/3 to 1/2 of the width of the first structure along the first direction.
5. The antireflection structure of claim 2 wherein the refractive index of the second structure and the refractive index of the second film layer satisfy (n4)2And nt × n3, wherein n4 is the refractive index of the second structure, n3 is the refractive index of the second film layer, and nt is the refractive index of the substrate.
6. The antireflection structure of claim 3 or 5 wherein the substrate has a refractive index of 1.4 to 1.52.
7. The antireflection structure of claim 1 wherein the material of the substrate comprises glass.
8. A display panel comprising a display substrate, further comprising the anti-reflective structure of any of claims 1-7, wherein the anti-reflective structure is disposed on a display side of the display substrate, and a second film layer of the anti-reflective structure faces the display substrate.
9. The display panel according to claim 8, wherein the first sub-layer and the second film layer of the anti-reflective structure are made of conductive materials, the second sub-layer of the anti-reflective structure is made of insulating materials, and the second structure of the anti-reflective structure is made of insulating materials;
the first sublayer is of a grid-like structure.
10. The display panel of claim 9, wherein the display substrate is a liquid crystal cell; the second film layer is reused as a heating layer of the display panel and used for heating the display substrate when power is applied.
11. The display panel according to claim 9, wherein the first sub-layer and the second film layer are made of ITO material, nano silver or copper;
the second sublayer adopts niobium pentoxide; the second structure adopts an organic optical glue material.
12. The display panel according to claim 9, wherein the antireflection structure is bonded to the display substrate by an organic optical adhesive, and an AR protection film is further disposed on a side of the antireflection structure facing away from the display substrate.
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| CN117374095A (en) * | 2023-12-08 | 2024-01-09 | 湖北江城芯片中试服务有限公司 | Image sensor and preparation method thereof |
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Address after: 100176 Building 1, No. 11, dize Road, Beijing Economic and Technological Development Zone, Daxing District, Beijing Patentee after: Beijing ruizhihang Display Technology Co.,Ltd. Patentee after: BOE TECHNOLOGY GROUP Co.,Ltd. Address before: 100015 no.811, yard 10, Jiuxianqiao, Chaoyang District, Beijing Patentee before: BEIJING BOE SPECIAL DISPLAY TECHNOLOGY Co.,Ltd. Patentee before: BOE TECHNOLOGY GROUP Co.,Ltd. |
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Effective date of registration: 20210823 Address after: 100176 Building 1, No. 11, dize Road, Beijing Economic and Technological Development Zone, Daxing District, Beijing Patentee after: Beijing ruizhihang Display Technology Co.,Ltd. Address before: 100176 Building 1, No. 11, dize Road, Beijing Economic and Technological Development Zone, Daxing District, Beijing Patentee before: Beijing ruizhihang Display Technology Co.,Ltd. Patentee before: BOE TECHNOLOGY GROUP Co.,Ltd. |