CN103926743A - Color film substrate, manufacturing method thereof, and display device - Google Patents

Color film substrate, manufacturing method thereof, and display device Download PDF

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Publication number
CN103926743A
CN103926743A CN201410112809.3A CN201410112809A CN103926743A CN 103926743 A CN103926743 A CN 103926743A CN 201410112809 A CN201410112809 A CN 201410112809A CN 103926743 A CN103926743 A CN 103926743A
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Prior art keywords
dielectric layer
membrane substrates
thickness
color membrane
layer
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CN201410112809.3A
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Chinese (zh)
Inventor
谷新
铃木照晃
秦广奎
金起满
鹿岛美纪
杨亚锋
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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Priority to CN201410112809.3A priority Critical patent/CN103926743A/en
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Abstract

An embodiment of the invention discloses a color film substrate, a manufacturing method thereof, and a display device, and relates to the field of display. The color film substrate comprises a substrate body, and a black matrix and a transparent conductive layer which are disposed on the substrate body. The color film substrate satisfies at least one of the following conditions: a transparent medium layer is disposed above the transparent conductive layer, the refractive index of the transparent medium layer is 1.5-2.0, and the thickness of the transparent medium layer is 600-1000 angstroms; or the transparent medium layer is disposed below the transparent conductive layer, the refractive index of the transparent medium layer is 1.5-2.0, and the thickness of the transparent medium layer is 600-1000 angstroms; or the medium layer is disposed on one side, away from the color film substrate facing a box surface, of the black matrix, the refractive index of the transparent medium layer is 1.5-2.0, and the thickness of the transparent medium layer is 600-1000 angstroms. The color film substrate is capable of weakening reflecting light and increasing outdoor visuality of the liquid crystal display device.

Description

Color membrane substrates and preparation method thereof, display device
Technical field
The present invention relates to demonstration field, relate in particular to a kind of color membrane substrates and preparation method thereof, display device.
Background technology
It is little that liquid crystal display (being called for short LCD) has volume, the feature such as low in energy consumption, radiationless, has occupied leading position in demonstration field, yet out of doors or have under the environment of strong ambient light, tradition transmissive liquid crystal display screen does not have visuality, cannot meet normal use.The visual problem in open air that solves at present screen has three kinds of modes, and the one, increase screen intensity, the 2nd, reduce reflection, the 3rd, adopt semi-transparent semi-reflecting technology (or the changeable pattern of Transflective).Increase screen intensity power consumption is increased greatly, can shorten battery or increase energy consumption; Antireflection technique, as increased antireflection film or adopting quarter wave plate etc.; Semi-transparent semi-reflecting technology out of doors or have under the environment of strong ambient light, adopts reflection display mode, utilizes sunshine reflection to show, can effectively reduce power consumption; Under indoor or low light environment, adopt transmissive display mode, utilize backlight to show.
As shown in Figure 1, be a kind of structural representation of available liquid crystal display.This liquid crystal display is poured into liquid crystal 30 by array base palte 10 box relative to color membrane substrates 20 is middle, then attaches polaroid 40 formation.Wherein, the substrate 21 of color membrane substrates 20 is provided with black matrix 22 in positive (one side of box relatively), the back side of substrate 21 (away from the another side to box face) is provided with the transparency conducting layer 23 of electrostatic prevention, in the time of out of doors, there is stronger surround lighting as sunshine, the reflected light that black matrix 12 and transparency conducting layer 23 places produce enters human eye, and the open air that can affect display device is visual.
Summary of the invention
Embodiments of the invention provide a kind of array base palte and preparation method thereof, display device, can diminished reflex light, and the open air of improving liquid crystal indicator is visual.
For achieving the above object, embodiments of the invention adopt following technical scheme:
The embodiment of the present invention provides a kind of color membrane substrates, comprising: substrate, be arranged on black matrix and transparency conducting layer on described substrate, described color membrane substrates meets at least one in following:
The top of described transparency conducting layer is provided with transparent dielectric layer, and the refractive index of described transparent dielectric layer is 1.5~2.0, and thickness is 600~1000 dusts; Or,
The below of described transparency conducting layer is provided with transparent dielectric layer, and the refractive index of described transparent dielectric layer is 1.5~2.0, and thickness is 600~1000 dusts; Or,
Described black matrix is provided with dielectric layer away from color membrane substrates to a side of box face, and the refractive index of described dielectric layer is 1.5~2.0, and thickness is 600~1000 dusts.
Alternatively, the thickness of described transparent dielectric layer, the value of refractive index, and the thickness of described dielectric layer is, the value of refractive index, all through optimizing, makes away from color membrane substrates minimum to the reflectivity of the incident light of box face one side.
Preferably, described transparent dielectric layer and/or dielectric layer are: silicon nitride layer.
Preferably, the material of described transparency conducting layer is tin indium oxide, and thickness is 400 dusts; The material of described transparent dielectric layer is silicon nitride, and thickness is 800 dusts.
Preferably, the material of described dielectric layer is silicon nitride, and thickness is 800 dusts.
Preferably, described dielectric layer is formed with the pattern identical with described black matrix.
Alternatively, described transparency conducting layer is arranged on described substrate away from the side to box face, and described black arranged in matrix is in the close side to box face of described substrate.
The embodiment of the present invention also provides a kind of display device, comprising: the color membrane substrates described in any one.
The embodiment of the present invention also provides a kind of method for making of color membrane substrates, comprising:
On substrate, form successively the first transparent dielectric layer, transparency conducting layer and the second transparent dielectric layer;
At described substrate, do not exist the opposite side of rete to form dielectric layer, then on described dielectric layer, form black matrix;
Carry out etching, at described dielectric layer, form the pattern identical with described black matrix.
Alternatively, described the first transparent dielectric layer, described the second transparent dielectric layer are silicon nitride layer, and thickness is 800 dusts; Described dielectric layer is silicon nitride layer, and thickness is 800 dusts.
The embodiment of the present invention provides a kind of color membrane substrates and preparation method thereof, display device, above the transparency conducting layer of color membrane substrates and/or below transparent dielectric layer is set, or near color membrane substrates, one side of box face is arranged to dielectric layer at black matrix, the refractive index of described transparent dielectric layer and described dielectric layer is 1.5~2.0, the thickness of described transparent dielectric layer and described dielectric layer is 600~1000 dusts, can be so that the incident light of box face one side (from watching the light of face incident) be reduced at the reflectivity of transparent dielectric layer and black matrix away from color membrane substrates, reflected light weakens, thereby the open air that can improve display device is visual.
Accompanying drawing explanation
In order to be illustrated more clearly in the technical scheme in the embodiment of the present invention, to the accompanying drawing of required use in embodiment be briefly described below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skills, do not paying under the prerequisite of creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 is the structural representation of available liquid crystal display;
Fig. 2 is the structural representation that is provided with the liquid crystal display of the embodiment of the present invention one color membrane substrates;
Fig. 3 is for transparency conducting layer is upper and lower while all transparent dielectric layer arranges/not being set, the reflectivity of color membrane substrates in visible region contrasts schematic diagram;
Fig. 4 be black matrix place when dielectric layer arrange/is not set color membrane substrates at the reflectivity contrast schematic diagram of visible region;
Fig. 5 be with respectively with Fig. 4 in light corresponding to curve reflection simulation schematic diagram;
The color membrane substrates preparation method process flow diagram that Fig. 6 provides for the embodiment of the present invention two;
Fig. 7 is that the embodiment of the present invention two forms the schematic diagram of the first transparent dielectric layer, transparency conducting layer and the second transparent dielectric layer at substrate;
Fig. 8 is that the embodiment of the present invention two forms the schematic diagram of dielectric layer and black matrix at substrate back.
Reference numeral
10-array base palte, 20-color membrane substrates, 30-liquid crystal, 40-polaroid, 21-substrate, the black matrix of 22-, 23-transparency conducting layer, 24-transparent dielectric layer, 25-dielectric layer, 24a-the first transparent dielectric layer, 24b-the second transparent dielectric layer.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described, obviously, described embodiment is only the present invention's part embodiment, rather than whole embodiment.Embodiment based in the present invention, those of ordinary skills, not making all other embodiment that obtain under creative work prerequisite, belong to the scope of protection of the invention.
Embodiment mono-
The embodiment of the present invention provides a kind of color membrane substrates, and described color membrane substrates meets at least one in following scheme:
The top of described transparency conducting layer is provided with transparent dielectric layer, and the refractive index of described transparent dielectric layer is 1.5~2.0, and thickness is 600~1000 dusts; Or,
The below of described transparency conducting layer is provided with transparent dielectric layer, and the refractive index of described transparent dielectric layer is 1.5~2.0, and thickness is 600~1000 dusts; Or,
Described black matrix is provided with dielectric layer away from color membrane substrates to a side of box face, and the refractive index of described dielectric layer is 1.5~2.0, and thickness is 600~1000 dusts.
Described in the present embodiment color membrane substrates only need be above transparency conducting layer, transparency conducting layer below, black matrix arranges dielectric layer away from color membrane substrates at least one place in this position, three places of a side of box face, wherein, when dielectric layer being set above or below selection transparency conducting layer, it is transparent requiring dielectric layer; When being chosen in black matrix, away from color membrane substrates, one side of box face being arranged to dielectric layer, whether dielectric layer is transparent does not limit.
As shown in Figure 2, color membrane substrates 20 comprises a kind of embodiment of the present embodiment: substrate 21, be arranged on black matrix 22 and transparency conducting layer 23 on substrate 21, the above and below of transparency conducting layer 23 is provided with transparent dielectric layer 24; Black matrix 22 to a side of box face (being the top of black matrix 22 in Fig. 2), is provided with dielectric layer 25 away from color membrane substrates; The refractive index of transparent dielectric layer 24 and dielectric layer 25 is 1.5~2.0, and thickness is 600~1000 dusts.
When if display device is operated in open air, have stronger surround lighting as sunshine, at the transparency conducting layer 23(of color membrane substrates for electrostatic prevention), the reflected light at black matrix 22 places enters human eye, the open air that can affect display device is visual.For reducing those reflected light, the present embodiment above transparency conducting layer 23 and/or below transparent dielectric layer 24(is set or dielectric layer 25 is set above black matrix 22), then by experiment or thickness, the refractive index of simulation softward to transparent dielectric layer 24(or dielectric layer 25) value be optimized, make to watch the reflectivity of the incident light of a side to reduce, even if enter the reflected light of human eye after reflection, reduce as far as possible, thus the visuality of raising display device.Wherein, 25 of dielectric layers are distributed in the position of blocking of black matrix 22, so the present embodiment does not limit whether dielectric layer 25 is transparent.
First the material of transparent dielectric layer 24 and dielectric layer 25 will meet refractive index and be greater than substrate refractive index and be less than by decorative material refractive index.Wherein, because substrate is generally glass material, refractive index value is generally 1.5; The material of transparency conducting layer 23 is generally tin indium oxide, and refractive index is 2.0, and black matrix refractive index is generally 2.0~2.2, thus transparent dielectric layer 24 and dielectric layer 25 generally in 1.5~2.0 scopes.
The refractive index of transparent dielectric layer 24 and dielectric layer 25 is 1.5~2.0, when thickness is 600~1000 dust, can be so that the reflectivity of the incident light of watching a side at transparent dielectric layer and black matrix place reduce, thus it is visual to improve the open air of display device.
To transparent dielectric layer 24(or dielectric layer 25) the value of thickness, refractive index while being optimized, generally first select the common transparent material that meets film-forming process to attempt one by one, particularly, for selected a certain transparent material, in the situation that refractive index is definite, utilize optical design software to simulate, the thickness of this transparent material is optimized.For example select silicon nitride as transparent dielectric layer 24(or dielectric layer 25), its refractive index value is 1.7; Substrate refractive index is 1.5; Transparency conducting layer 23 is tin indium oxide, and refractive index is 2.0, and thickness is 400 dusts; Black matrix refractive index 2.0, thickness is 1.1um.For example, by optical design software (LightTool software), carry out simulated experiment, the 3D realistic model of model color membrane substrates, then calculate the reflectivity of silicon nitride layer color membrane substrates under different-thickness, finally according to result of calculation, select the thickness of the silicon nitride layer that minimum reflectance is corresponding as optimum results.The result of simulation test shows: transparent dielectric layer 24(or dielectric layer 25) material while selecting silicon nitride, thickness is preferably 800 dusts.
Shown in Fig. 2, a kind of preferred embodiment in, the front of glass substrate (one side of box relatively) arranges the transparency conducting layer 23 that tin indium oxide forms, thickness is 400 dusts, in the above and below of transparency conducting layer 23, silicon nitride film layer is all set as transparent dielectric layer 24, the thickness of silicon nitride film layer is 800 dusts; The back side of glass substrate is provided with black matrix 22, and the top of black matrix 22 (black matrix 22 is near a side of glass) is provided with silicon nitride film layer that 800 dusts are thick as dielectric layer.This color membrane substrates is carried out to reflectance test at visible-range, and its result as shown in Figure 3 and Figure 4.
As shown in Figure 3, A curve is that while all transparent dielectric layer being set above or below transparency conducting layer 23, color membrane substrates is not at the reflectivity of visible region, and its average reflectance is 2.28%; A ' curve is the silicon nitride layer during as transparent dielectric layer that transparency conducting layer above and below arranges respectively 800 dusts, and color membrane substrates is at the reflectivity of visible region, and its average reflectance is down to below 0.3%.
As shown in Figure 4, B curve be black matrix place while dielectric layer not being set color membrane substrates at the reflectivity of visible region; B ' curve is the silicon nitride layer during as dielectric layer that black matrix top arranges 800 dusts, and color membrane substrates is at the reflectivity of visible region; C curve is that glass substrate is at the reflectivity of visible region; D curve is at the reflectivity of visible region when the silicon nitride layer of 800 dusts is only set on glass substrate.Figure 5 shows that and four light reflection simulation schematic diagram that test curve difference is corresponding in Fig. 4.While dielectric layer not being set, at (the being B curve) average reflectance at black matrix place more than 2.75%; If the silicon nitride layer that 800 dusts are set is during as dielectric layer, at the reflectance curve B ' at black matrix and silicon nitride layer place, roughly between curve C and curve D, in visible-range, average reflectance is between 0.5%~0.3%.
The embodiment of the present invention to the material of transparent dielectric layer 24 and dielectric layer 25 (being mainly refractive index), thickness does not limit, and can be any transparent material well-known to those skilled in the art, while specifically implementing, according to above-mentioned mode, be optimized.
Preferably, the thickness of transparent dielectric layer 24, the value of refractive index, and the thickness of dielectric layer 25 is, the value of refractive index all through optimizing, makes to watch the reflectivity of incident light of a side minimum.
Certainly, the present embodiment also can first be set the thickness of transparent dielectric layer 24 and dielectric layer 25, then according to the principle of minimum (or relatively little) reflectivity, the refractive index of transparent dielectric layer 24 and dielectric layer 25 is optimized; Still can to thickness and refractive index, be optimized simultaneously.The present embodiment can first be optimized the one deck in transparent dielectric layer 24 and dielectric layer 25; Also can to transparent dielectric layer 24 and dielectric layer 25, be optimized simultaneously.
Preferably, above-mentioned dielectric layer 25 is formed with the pattern identical with black matrix 22, and the effect of doing is like this that the existence of dielectric layer 25 can not affect light transmitance herein.
Alternatively, transparency conducting layer 24 is arranged on substrate 21 away from the side to box face, and black matrix 25 is arranged on substrate 21 near the side to box face.
The embodiment of the present invention provides a kind of color membrane substrates, above the transparency conducting layer of color membrane substrates and/or below transparent dielectric layer is set, or near color membrane substrates, one side of box face is arranged to dielectric layer at black matrix, the refractive index of described transparent dielectric layer (or described dielectric layer), thickness are all by optimizing, can be so that the reflectivity of the incident light of watching a side at transparent dielectric layer and black matrix place reduces greatly, thereby diminished reflex light, the open air of improving display device is visual.
The embodiment of the present invention also provides a kind of display device, and it comprises above-mentioned any one color membrane substrates.The color membrane substrates of described display device because adopting the embodiment of the present invention to provide, outdoor visual good, display quality is higher.Described display device can be: any product or parts with Presentation Function such as liquid crystal panel, Electronic Paper, oled panel, mobile phone, panel computer, televisor, display, notebook computer, digital album (digital photo frame), navigating instrument.
Embodiment bis-
The embodiment of the present invention also provides a kind of method for making of color membrane substrates, and as shown in Figure 6, the method comprises:
101, on substrate, form successively the first transparent dielectric layer, transparency conducting layer and the second transparent dielectric layer;
As shown in Figure 7, the present embodiment at substrate 21(as glass substrate) on form successively the first transparent dielectric layer 24a, transparency conducting layer 23 and the second transparent dielectric layer 24b, the thickness of transparent dielectric layer 24, the value of refractive index are all optimized through simulated experiment in advance.For example concrete optimum results is as follows: the first transparent dielectric layer 24a, the second transparent dielectric layer 24b are a silicon nitride layer, and above-mentioned trilamellar membrane structure can be SiN x/ ITO/SiN x, corresponding thickness can be respectively 800 dusts, 400 dusts, 800 dusts.
The present embodiment does not limit the material of each rete and concrete thin film-forming method, can be any transparent material well-known to those skilled in the art and thin film-forming method, while specifically implementing, according to the above-mentioned mode of having described in detail, the thickness of first, second transparent dielectric layer and refractive index are optimized.
102, at substrate 21, do not exist the opposite side of rete to form dielectric layer 25, then on dielectric layer 25, form black matrix 22, as shown in Figure 8.
The opposite side that this step is got glass substrate forms dielectric layer 25 and black matrix 22.In a kind of embodiment, dielectric layer 25 is also silicon nitride layer, and thickness is 800 dusts, specific as follows: first on the opposite side of substrate, deposit thickness is the SiN of 800 dusts x, then forming on its basis thickness is the black matrix layer of 1.1 ± 0.5um, then carries out etching, formation width is 8 ± 1.0um, is spaced apart the black matrix structure of 30 ± 1.5um.
103, carry out etching, at dielectric layer 25, form the pattern identical with black matrix 22.
This step to dielectric layer 25(as SiNx rete) carry out pattern etch, pattern is consistent with black matrix 22.Then continue follow-up flow process and complete color membrane substrates processing procedure, comprising: red, green, blue color blocking is coated to respectively in the space between BM and to RGB color blocking and carries out etching, form chromatic filter layer, wherein the height of RGB color blocking is 2.2 ± 0.5um.
The present embodiment provides a kind of color membrane substrates preparation method, above the transparency conducting layer of color membrane substrates and/or below transparent dielectric layer is set, at black matrix, near color membrane substrates, one side of box face is arranged to dielectric layer simultaneously; Because when design is optimized for thickness, the refractive index of thickness, refractive index and the described dielectric layer of transparent dielectric layer and dielectric layer in advance, the reflectivity of the incident light that makes to watch a side at transparent dielectric layer and black matrix place reduces, thereby diminished reflex light, the open air of improving display panels is visual.
If make display device, need to continue to carry out following flow process:
Array base palte processing procedure; Identical with prior art array base palte.
Liquid crystal cell leading portion: at the array base palte preparing, on color membrane substrates, difference coating polyimide film toasts 80s, to remove moisture and the solvent in aligning agent for liquid crystal polyimide at 70 ℃; Then the polyimide film of precuring is heated to 230 ℃, maintains 20min; Finally the substrate being cured is orientated.
Liquid crystal becomes box: on array base palte, dropping liquid is brilliant, is coated with fluid sealant (or dropping liquid is brilliant on color membrane substrates, is coated with fluid sealant on array base palte) afterwards to box on color membrane substrates.By array base palte and color membrane substrates to box after, leveling sealing, and cleaning.
For the ease of clearly demonstrating; adopted in the present invention first, second printed words such as grade to carry out class discrimination to similar item; these first, second printed words quantitatively do not limit the invention; be illustrating a kind of preferred mode; those skilled in the art are according to content disclosed by the invention, and apparent similar distortion or the related expanding expected all belong in protection scope of the present invention.
Each embodiment in this instructions all adopts the mode of going forward one by one to describe, between each embodiment identical similar part mutually referring to, each embodiment stresses is the difference with other embodiment.Especially, for preparation method embodiment, because it relates to apparatus embodiments, so describe fairly simplely, relevant part is referring to the part explanation of apparatus embodiments.
The above; be only the specific embodiment of the present invention, but protection scope of the present invention is not limited to this, is anyly familiar with those skilled in the art in the technical scope that the present invention discloses; the variation that can expect easily or replacement, within all should being encompassed in protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of claim.

Claims (10)

1. a color membrane substrates, comprising: substrate, be arranged on black matrix and transparency conducting layer on described substrate, it is characterized in that, described color membrane substrates meets at least one in following:
The top of described transparency conducting layer is provided with transparent dielectric layer, and the refractive index of described transparent dielectric layer is 1.5~2.0, and thickness is 600~1000 dusts; Or,
The below of described transparency conducting layer is provided with transparent dielectric layer, and the refractive index of described transparent dielectric layer is 1.5~2.0, and thickness is 600~1000 dusts; Or,
Described black matrix is provided with dielectric layer away from color membrane substrates to a side of box face, and the refractive index of described dielectric layer is 1.5~2.0, and thickness is 600~1000 dusts.
2. color membrane substrates according to claim 1, is characterized in that,
The thickness of described transparent dielectric layer, the value of refractive index, or the thickness of described dielectric layer is, the value of refractive index, all through optimizing, makes away from color membrane substrates minimum to the reflectivity of the incident light of box face one side.
3. color membrane substrates according to claim 1, is characterized in that, described transparent dielectric layer and/or described dielectric layer are: silicon nitride layer.
4. color membrane substrates according to claim 1, is characterized in that,
The material of described transparency conducting layer is tin indium oxide, and thickness is 400 dusts;
The material of described transparent dielectric layer is silicon nitride, and thickness is 800 dusts.
5. according to the color membrane substrates described in claim 3 or 4, it is characterized in that,
The material of described dielectric layer is silicon nitride, and thickness is 800 dusts.
6. color membrane substrates according to claim 1, is characterized in that, described dielectric layer is formed with the pattern identical with described black matrix.
7. color membrane substrates according to claim 1, is characterized in that,
Described transparency conducting layer is arranged on described substrate away from the side to box face, and described black arranged in matrix is in the close side to box face of described substrate.
8. a display device, is characterized in that, comprising: the color membrane substrates described in claim 1-7 any one.
9. a method for making for color membrane substrates, is characterized in that, comprising:
On substrate, form successively the first transparent dielectric layer, transparency conducting layer and the second transparent dielectric layer;
At described substrate, do not exist the opposite side of rete to form dielectric layer, then on described dielectric layer, form black matrix;
Carry out etching, at described dielectric layer, form the pattern identical with described black matrix.
10. method for making according to claim 9, is characterized in that,
Described the first transparent dielectric layer, described the second transparent dielectric layer are silicon nitride layer, and thickness is 800 dusts;
Described dielectric layer is silicon nitride layer, and thickness is 800 dusts.
CN201410112809.3A 2014-03-24 2014-03-24 Color film substrate, manufacturing method thereof, and display device Pending CN103926743A (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107728373A (en) * 2017-11-22 2018-02-23 深圳市华星光电技术有限公司 A kind of color membrane substrates and its manufacture method, liquid crystal panel
CN107783336A (en) * 2016-08-24 2018-03-09 京东方科技集团股份有限公司 Transparent display panel and display device
CN110221725A (en) * 2018-11-05 2019-09-10 友达光电股份有限公司 Touch control display apparatus
WO2020118937A1 (en) * 2018-12-15 2020-06-18 深圳市华星光电半导体显示技术有限公司 Preparation method for black matrix and display device
CN114355663A (en) * 2021-12-31 2022-04-15 惠科股份有限公司 Color film substrate, display panel and display

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1519618A (en) * 2003-01-22 2004-08-11 统宝光电股份有限公司 Liquid crystal display with reflection being reduced
CN1790633A (en) * 2004-12-16 2006-06-21 旺宏电子股份有限公司 Anti-reflection layer of sandwich structure and method for improving conductor layer coronary fault
CN101299106A (en) * 2006-12-21 2008-11-05 三星电子株式会社 Color filter substrate and liquid crystal display panel containing the same
JP4834939B2 (en) * 2001-08-28 2011-12-14 ソニー株式会社 Antireflection film
CN102879948A (en) * 2012-09-29 2013-01-16 京东方科技集团股份有限公司 Color filter substrate, liquid crystal display device and manufacturing method of color filter substrate
CN203745762U (en) * 2014-03-24 2014-07-30 京东方科技集团股份有限公司 Color film substrate and display device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4834939B2 (en) * 2001-08-28 2011-12-14 ソニー株式会社 Antireflection film
CN1519618A (en) * 2003-01-22 2004-08-11 统宝光电股份有限公司 Liquid crystal display with reflection being reduced
CN1790633A (en) * 2004-12-16 2006-06-21 旺宏电子股份有限公司 Anti-reflection layer of sandwich structure and method for improving conductor layer coronary fault
CN101299106A (en) * 2006-12-21 2008-11-05 三星电子株式会社 Color filter substrate and liquid crystal display panel containing the same
CN102879948A (en) * 2012-09-29 2013-01-16 京东方科技集团股份有限公司 Color filter substrate, liquid crystal display device and manufacturing method of color filter substrate
CN203745762U (en) * 2014-03-24 2014-07-30 京东方科技集团股份有限公司 Color film substrate and display device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107783336A (en) * 2016-08-24 2018-03-09 京东方科技集团股份有限公司 Transparent display panel and display device
US10606117B2 (en) 2016-08-24 2020-03-31 Boe Technology Group Co., Ltd. Transparent display panels and display devices
CN107728373A (en) * 2017-11-22 2018-02-23 深圳市华星光电技术有限公司 A kind of color membrane substrates and its manufacture method, liquid crystal panel
CN110221725A (en) * 2018-11-05 2019-09-10 友达光电股份有限公司 Touch control display apparatus
WO2020118937A1 (en) * 2018-12-15 2020-06-18 深圳市华星光电半导体显示技术有限公司 Preparation method for black matrix and display device
CN114355663A (en) * 2021-12-31 2022-04-15 惠科股份有限公司 Color film substrate, display panel and display

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