CN105891914B - A kind of windows be protected panel with AG+AR+AF plated films - Google Patents
A kind of windows be protected panel with AG+AR+AF plated films Download PDFInfo
- Publication number
- CN105891914B CN105891914B CN201610393815.XA CN201610393815A CN105891914B CN 105891914 B CN105891914 B CN 105891914B CN 201610393815 A CN201610393815 A CN 201610393815A CN 105891914 B CN105891914 B CN 105891914B
- Authority
- CN
- China
- Prior art keywords
- film
- sio
- thickness
- zro
- antireflective coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 65
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 64
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 64
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 64
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 64
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 64
- 239000006117 anti-reflective coating Substances 0.000 claims abstract description 52
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 39
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 33
- 230000003666 anti-fingerprint Effects 0.000 claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 238000007747 plating Methods 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 8
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 50
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 9
- 229910052593 corundum Inorganic materials 0.000 claims description 9
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 9
- 239000012994 photoredox catalyst Substances 0.000 claims description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 4
- 239000004417 polycarbonate Substances 0.000 claims description 4
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 4
- 239000005336 safety glass Substances 0.000 claims description 3
- 229910052594 sapphire Inorganic materials 0.000 claims 1
- 239000010980 sapphire Substances 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 32
- 230000004075 alteration Effects 0.000 abstract description 21
- 230000005540 biological transmission Effects 0.000 abstract description 17
- 239000011248 coating agent Substances 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 abstract description 2
- 238000005299 abrasion Methods 0.000 abstract 1
- 239000000047 product Substances 0.000 description 12
- 238000002834 transmittance Methods 0.000 description 12
- 239000011521 glass Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- XZWYZXLIPXDOLR-UHFFFAOYSA-N metformin Chemical compound CN(C)C(=N)NC(N)=N XZWYZXLIPXDOLR-UHFFFAOYSA-N 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 241001062009 Indigofera Species 0.000 description 2
- 239000010437 gem Substances 0.000 description 2
- 229910001751 gemstone Inorganic materials 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 230000001795 light effect Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000004549 pulsed laser deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The present invention relates to a kind of windows be protected panel with AG+AR+AF plated films, belong to Coating Materials technical field.In order to solve the problems, such as existing can not to have high abrasion and low aberration concurrently simultaneously; a kind of windows be protected panel with AG+AR+AF plated films is provided; the panel includes transparent substrates; the upper surface of the transparent substrates is followed successively by ZrO from the inside to surface covered with anti-dazzle film layer, antireflective coating and anti-fingerprint film layer, the antireflective coating successively from the inside to surface2Film, Si3N4Film and SiO2Film, which is alternately repeated plating and set, to be formed, and the outermost layer of the antireflective coating is SiO2Film;Al is also coated between the antireflective coating and anti-fingerprint film layer2O3Film.There is windows be protected panel of AG+AR+AF plated films can realize and has anti-dazzle, high transmission rate, low reflection and anti-fingerprint effects concurrently for this, meanwhile, there is the effect of high-wearing feature and low aberration value again.
Description
Technical field
The present invention relates to a kind of windows be protected panel with AG+AR+AF plated films, belong to Coating Materials technical field.
Background technology
With the rapid development of science and technology, in electricity such as mobile phone, palm PC, automatic navigator, notebook computers
Touch-screen (windows be protected panel) is widely applied on sub- product, various windows be protected screens it is also proposed spy to the performance of plated film
Different optical demands.Some glass are used as existing protection panels (such as display protection, handset viewing window protection screen etc.)
Make that there are some special effects after the re-surface that the substrate surface such as glass or PMMA is carried out.Specifically, glare proof glass
Windows be protected screen has with the effect of anti-dazzle light effect, anti reflection glass with high transmission rate and low reflection and anti-fingerprint glass
There are anti-fingerprint, anti-dirty effect.Also there is the windows be protected screen by making to have above-mentioned several effects concurrently simultaneously.Such as Chinese patent
(publication number:CN103950248A a kind of anti-dazzle antireflective anti-fingerprint glass disclosed in), it includes being provided with the glass substrate
Anti-dazzle film layers, AR antireflection film layers are provided with anti-dazzle film layer and anti-fingerprint film layer is provided with AR antireflection film layers,
Make to have anti-dazzle, high transmission rate, low reflection, anti-fingerprint and the effect for resisting dirty characteristic concurrently simultaneously.But it is in wearability and aberration
Aspect of performance is relatively poor.
The content of the invention
The present invention is for defect present in above prior art, there is provided a kind of windows be protected with AG+AR+AF plated films
Panel, solve the problems, such as it is that also there is high-wearing feature while how making to have concurrently anti-dazzle, high transmission rate, low reflection and anti-fingerprint
With low aberration value.
The purpose of the present invention technical scheme is that, a kind of form with AG+AR+AF plated films is protected
Protection slab, the panel include transparent substrates, and the upper surface of the transparent substrates is from the inside to surface successively covered with anti-dazzle film layer, increasing
Permeable membrane layer and anti-fingerprint film layer, the antireflective coating are followed successively by ZrO from the inside to surface2Film, Si3N4Film and SiO2Film is alternately repeated plating
If form, and the outermost layer of the antireflective coating is SiO2Film;Al is also coated between the antireflective coating and anti-fingerprint film layer2O3
Film.
This has the windows be protected panel of AG+AR+AF plated films, by making antireflective coating use ZrO2Film and SiO2Film replaces
Plating is set, that is, making ZrO2Film and SiO2If film alternating intersection resets plating and sets dried layer, make that not only there is high transmission rate and low reflection
The effect of performance;However, only use ZrO2Film and SiO2The poor-performing that film is arranged alternately for aberration is easy to occur some color
The color spot of color, the inventors discovered that by ZrO2Film and SiO2One layer of Si is plated between film again3N4Anti-reflection film can not only be ensured
Light transmission, chromatic aberration performance can also be improved on the contrary, make the effect with relatively low value of chromatism;On the other hand, by making ZrO2Film
With SiO2Increase Si between film3N4The wearability of antireflective coating can also be improved, improves the wearability of anti-reflection film in itself;Meanwhile tie
Close the plating between antireflective coating and anti-fingerprint film layer and set Al2O3Film improves the wearability on anti-reflection film surface, so that antireflective coating
The effect of its light transmittance and low aberration value will not be ensure that easily by damage tolerant;And due to anti-dazzle film layer and anti-fingerprint film layer
Presence, realizing can make product have anti-dazzle, anti-fingerprint and anti-dirty effect concurrently.
In the above-mentioned windows be protected panel with AG+AR+AF plated films, as a kind of embodiment, the antireflective coating from
In to being followed successively by ZrO outside2Film, Si3N4Film, SiO2Film, ZrO2Film, Si3N4Film, SiO2Film, ZrO2Film, Si3N4Film and SiO2Film.It is logical
Crossing can make product have low aberration value and the effect of high transmission rate using the antireflective coating of the structure.As further excellent
Choosing, the antireflective coating from the inside to surface successively by thickness be 10.5nm ZrO2Film layer, the Si that thickness is 12.2nm3N4Film, thickness
For 15.1nm SiO2Film, the ZrO that thickness is 20nm2Film layer, the Si that thickness is 30.87nm3N4Film, the SiO that thickness is 10nm2
Film, the ZrO that thickness is 11.5nm2Film layer, the Si that thickness is 18.6nm3N4Film and the SiO that thickness is 85.4nm2Film is formed.Energy
Enough make product that there is more preferable light transmittance, product its to reflectivity≤0.5% that wavelength is 400nm-700nm wave-length coverage sections,
Namely realize that light transmittance reaches more than 99.5%, realize the effect of high transmission rate, value of chromatism can ensure in -1≤La*≤
1, -2≤Lb*≤ 2 high request.
In the above-mentioned windows be protected panel with AG+AR+AF plated films, as another embodiment, the antireflective coating
From the inside to surface successively by ZrO2Film, Si3N4Film, SiO2Film, ZrO2Film, Si3N4Film, SiO2Film, ZrO2Film, Si3N4Film, SiO2Film,
ZrO2Film, Si3N4Film, SiO2Film, ZrO2Film, Si3N4Film, SiO2Film, ZrO2Film, Si3N4Film and SiO2Film is formed.Using the structure
Antireflective coating equally can make product that there is low aberration value and the effect of high transmission rate.It is described anti-reflection as further preferred
Film layer from the inside to surface successively by thickness be 10.5nm ZrO2Film layer, the Si that thickness is 7.2nm3N4Film, thickness are 30.5nm's
SiO2The ZrO of film, 14.1nm2Film layer, the Si that thickness is 36.5nm3N4Film, the SiO that thickness is 11.6nm2The ZrO of film, 15.1nm2
Film layer, the Si that thickness is 28.9nm3N4Film, the SiO that thickness is 175.3nm2The ZrO of film, 7.1nm2Film layer, thickness 99.5nm
Si3N4Film, the SiO that thickness is 155.3nm2The ZrO of film, 16.4nm2Film layer, the Si that thickness is 89.7nm3N4Film and thickness are
78.9nm SiO2Film is formed.Equally, can make product that there is preferable light transmittance, product its be 400nm-700nm to wavelength
Reflectivity≤0.5% of wave-length coverage section, that is, realize that light transmittance reaches more than 99.5%, the effect of high transmission rate is realized,
Value of chromatism can ensure in -1≤La*≤ 1, -2≤Lb*≤ 2 high request, there is high-precision effect.
In the above-mentioned windows be protected panel with AG+AR+AF plated films, also have between the anti-dazzle film layer and antireflective coating
There is cohesive film layer.The adhesion between antireflective coating and anti-dazzle film layer can be improved, so as to improve the stability of antireflective coating,
It is not susceptible to come off or shifting phenomena, so that the effect with stable high transmission rate and antiradar reflectivity, also makes have stabilization
Low aberration value effect.
In the above-mentioned windows be protected panel with AG+AR+AF plated films, the transparent substrates are the safety glass of printing opacity, indigo plant
Jewel, PMMA or PC materials are made.Substrate made of these materials has the advantages of high light transmittance.
In the above-mentioned windows be protected panel with AG+AR+AF plated films, the thickness of the anti-dazzle film layer is 3 μm~5 μm.
The effect of anti-dazzle is improved by controlling thickness.
In the above-mentioned windows be protected panel with AG+AR+AF plated films, the Al2O3The thickness of film is 1 μm~3 μm, is ensured
The wearability on surface is worn to ensure the effect of high transmission rate and low aberration value to prevent antireflective coating to be not easy.
In summary, the present invention compared with prior art, has advantages below:
This has the windows be protected panel of AG+AR+AF plated films, by using ZrO2Film, Si3N4Film and SiO2Film alternately plates
And if plating sets Al between antireflective coating and anti-fingerprint film layer2O3Film, to improve and ensure that product has anti-dazzle, high printing opacity concurrently
Rate, low reflection and anti-fingerprint effects, meanwhile, there is the effect of high-wearing feature and low aberration value again.
Brief description of the drawings
Fig. 1 is the cross section structure diagram for the windows be protected panel that the present invention has AG+AR+AF plated films.
Fig. 2 is the cross section structure diagram that the another kind of the present invention has the windows be protected panel of AG+AR+AF plated films.
Fig. 3 is the cross section structure diagram of the corresponding windows be protected panel with AG+AR+AF plated films in comparative example 1.
In figure, 1, transparent substrates;2nd, anti-dazzle film layer;3rd, antireflective coating;31、ZrO2Film;32、Si3N4Film;33、SiO2
Film;4、Al2O3Film;5th, anti-fingerprint film layer;6th, film layer is bonded.
Embodiment
Below by specific embodiments and the drawings, technical scheme is described in further detail, but this
Invention is not limited to these embodiments.
As depicted in figs. 1 and 2, there is the windows be protected panel of AG+AR+AF plated films to include transparent substrates 1, transparent substrates for this
1 upper surface from the inside to surface successively covered with anti-dazzle film layer 2, antireflective coating 3 and anti-fingerprint film layer 5, wherein, antireflective coating 3
ZrO is followed successively by from the inside to surface2Film 31, Si3N4Film 32 and SiO2Film 33, which is alternately repeated plating and set, to be formed, that is, equivalent to arrangement
Mode is " ZrO2Film 31-Si3N4Film 32-SiO2The structural order alternating plating of film 33 " sets repeated several times, is advantageous to improve printing opacity
There is the performance of low aberration value again, and the outermost layer of antireflective coating 3 is SiO while rate2Film 33;Antireflective coating 3 and anti-fingerprint
Al is also coated between film layer 52O3Film 4.By using ZrO2Film 31, Si3N4Film 32 and SiO2Film 33 alternately plating set to be formed it is anti-reflection
Film layer 3 improves the effect of light transmittance and low aberration value, to be set 3-5 times it is generally advisable to repeat plating;Additionally by making antireflective coating 3
Outermost layer is SiO2Film 33 can make antireflective coating 3 and Al2O3Adhesion between film 4 is more preferable, makes have preferable stability,
From without coming off or hole phenomenon, the requirement of low aberration value ensure that.If cause hole occur because adhesion is bad
Gap phenomenon, the refraction effect to light is easily influenceed, aberration is influenceed, so as to occur existing the excessively obvious phenomenon of aberration.Wherein,
ZrO2Film 31, Si3N4Film 32 and SiO2Film 33 and Al2O3Film 4 can be plated to set and formed using conventional vacuum coating mode, may be used also
Realized in a manner of using magnetron sputtering, chemical vapor deposition and pulsed laser deposition etc..Anti-dazzle film layer 2 therein can lead to
Cross and the film to be formed is etched on the surface of transparent substrates 1 as anti-dazzle film layer 2, the table in transparent substrates 1 can also be passed through
Face is using anti-dazzle film layer 2 made of conventional AG materials.Transparent substrates 1 therein can use safety glass, the indigo plant of printing opacity
Transparent substrates 1 made of jewel, PMMA or PC materials, there is the advantages of translucency is good.This has the form of AG+AR+AF plated films
Protection panels can be handset viewing window protection screen, computer monitor windows be protected screen or tablet personal computer windows be protected screen etc. electronics
The window screen of product.
In particular, it is arranged in order from the inside to surface by ZrO as a kind of embodiment, wherein antireflective coating 32Film 31,
Si3N4Film 32, SiO2Film 33, ZrO2Film 31, Si3N4Film 32, SiO2Film 33, ZrO2Film 31, Si3N4Film 32 and SiO2Film 33 is formed.
Each film is formed using conventional plated film mode, such as by the way of vacuum coating.Set by using alternately plating is repeated, make to be formed
Antireflective coating there is the effect of high transmission rate and low aberration value.It is preferred that the thickness of each film in antireflective coating 3 is adjusted,
Specially antireflective coating 3 is arranged in order the ZrO for 10.5nm by thickness from the inside to surface2Film layer 31, the Si that thickness is 12.2nm3N4
Film 32, the SiO that thickness is 15.1nm2Film 33, the ZrO that thickness is 20nm2Film layer 31, the Si that thickness is 30.87nm3N4Film 32, thickness
Spend the SiO for 10nm2Film 33, the ZrO that thickness is 11.5nm2Film layer 31, the Si that thickness is 18.6nm3N4Film 32 and thickness are
85.4nm SiO2Film 33 is formed.It can be made to light light transmittance >=99.5% that wavelength is 400nm-700nm range sections, and
The overall value of chromatism of product is in -1≤La*≤ 1, -2≤Lb*≤ 2, there is high-precision performance, realize high transmission rate and low color
The effect of difference.As another embodiment, antireflective coating 3 can also be made to be arranged in order from the inside to surface by ZrO2Film 31,
Si3N4Film 32, SiO2Film 33, ZrO2Film 31, Si3N4Film 32, SiO2Film 33, ZrO2Film 31, Si3N4Film 32, SiO2Film 33, ZrO2Film
31、Si3N4Film 32, SiO2Film 33, ZrO2Film 31, Si3N4Film 32, SiO2Film 33, ZrO2Film 31, Si3N4Film 32 and SiO2The structure of film 33
Into.It is further preferred that antireflective coating 3 is set to be arranged in order the ZrO by thickness for 10.5nm from the inside to surface2Film layer 31, thickness are 7.2nm's
Si3N4Film 32, the SiO that thickness is 30.5nm2The ZrO of film 33,14.1nm2Film layer 31, the Si that thickness is 36.5nm3N4Film 32, thickness
Spend the SiO for 11.6nm2The ZrO of film 33,15.1nm2Film layer 31, the Si that thickness is 28.9nm3N4Film 32, thickness 175.3nm
SiO2The ZrO of film 33,7.1nm2Film layer 31, the Si that thickness is 99.5nm3N4Film 32, the SiO that thickness is 155.3nm2Film 33,
16.4nm ZrO2Film layer 31, the Si that thickness is 89.7nm3N4Film 32 and the SiO that thickness is 78.9nm2Film 33 is formed.Equally, energy
Enough make its light light transmittance >=99.5% to wavelength for 400nm-700nm range sections, realize the effect of high transmission rate, additionally it is possible to
Make value of chromatism in -1≤La*≤ 1, -2≤Lb*≤2.There is the windows be protected panel of AG+AR+AF plated films to have anti-fingerprint concurrently and resist for this
Dirty effect, more than 120 degree, highest can reach more than 130 degree at its initial water droplet angle, have anti-fingerprint and anti-dirty characteristic.
In addition, in friction resistant experiment, adding 500g pressure to rub back and forth by using a diameter of 20mm 000# steel wool can reach
More than 2500 times, frequency reaches 50 beats/min.
Further, film layer is bonded as shown in Fig. 2 also having between anti-dazzle film layer 2 therein and antireflective coating 3
6.Adhesion between the two is improved, makes to be less prone to and comes off and misplace or occur hole phenomenon, ensures the stabilization of antireflective coating
Property, so as to also be equivalent to ensure that the requirement of high transmission rate and low aberration value.Certainly, bonding film layer 5 here can use
SiO2Material is made.
Further, the thickness of anti-dazzle film layer 2 therein is 3 μm~5 μm.The effect of anti-dazzle can be improved.
Wherein Al2O3The thickness of film 4 is 1 μm~3 μm.By adjusting Al2O3The thickness of film 4 improves wearability, so that antireflective coating
It is not easy to be worn and ensures the light transmittance of product and the performance of low colour to realize, the sheet also ensured that has AG+AR+AF plated films
Windows be protected panel has the advantages of anti-dazzle, high transmission rate, low reflection and anti-fingerprint, high-wearing feature and low aberration value concurrently simultaneously.
Comparative example 1
This comparative example is primarily to illustrate only with ZrO2Film 31 and SiO2Film 33 alternately plates the antireflective coating for setting and being formed
The 3 effect situations reached.Specifically as shown in figure 3, the windows be protected panel with AG+AR+AF plated films includes printing opacity base in Fig. 3
Plate 1, the upper surfaces of transparent substrates 1 from the inside to surface successively covered with anti-dazzle film layer 2, antireflective coating 3 and anti-fingerprint film layer 5, its
In, antireflective coating 3 is followed successively by ZrO from the inside to surface2Film 31 and SiO2Film 33, which is alternately repeated plating and set, to be formed, that is, equivalent to some
By using arrangement mode as " ZrO2Film 31-SiO2The structure alternating plating of film 33 " sets repeated several times, and the outermost layer of antireflective coating 3
For SiO2Film 33;Al is also coated between antireflective coating 3 and anti-fingerprint film layer 52O3Film 4, specially anti-reflection film 3 are from the inside to surface successively
For ZrO2Film 31, SiO2Film 33, ZrO2Film 31, SiO2Film 33, ZrO2Film 31 and SiO2Film 33;The anti-reflection film it is specific from the inside to surface according to
The secondary ZrO by thickness for 9.8nm2Film layer 31, the SiO that thickness is 35.1nm2Film 33, the ZrO that thickness is 39.5nm2Film layer 31, thickness
Spend the SiO for 12.2nm2Film 33, the ZrO that thickness is 42.4nm2Film layer 31 and the SiO that thickness is 80.3nm2Film 33 is formed.Can
Making it, value of chromatism is in -3≤La to light transmittance >=98.4% that wavelength is 400nm-700nm range sections*≤ 3, -4≤Lb*≤4.Can
See, individually using ZrO2Film 31 and SiO2Film 33 replaces plating and is provided as antireflective coating, although having preferable light transmittance, in color
Difference aspect of performance or relatively poor, precision is poor, also illustrate that the present invention by adding Si3N4Film 32 is to value of chromatism
There can be large effect, low aberration and high-precision effect can be realized.
Specific embodiment described in the present invention is only to spirit explanation for example of the invention.Technology belonging to the present invention is led
The technical staff in domain can be made various modifications or supplement to described specific embodiment or be replaced using similar mode
Generation, but without departing from the spiritual of the present invention or surmount scope defined in appended claims.
It is skilled to this area although having been made a detailed description to the present invention and being cited some specific embodiments
For technical staff, as long as it is obvious that can make various changes or correct without departing from the spirit and scope of the present invention.
Claims (9)
1. a kind of windows be protected panel with AG+AR+AF plated films, the panel includes transparent substrates (1), the transparent substrates
(1) upper surface is from the inside to surface successively covered with anti-dazzle film layer (2), antireflective coating (3) and anti-fingerprint film layer (5), its feature
It is, the antireflective coating (3) is followed successively by ZrO from the inside to surface2Film (31), Si3N4Film (32) and SiO2Film (33) is alternately repeated plating
If form, and the outermost layer of the antireflective coating (3) is SiO2Film (33);The antireflective coating (3) and anti-fingerprint film layer (5) it
Between be also coated with Al2O3Film (4).
2. there is the windows be protected panel of AG+AR+AF plated films according to claim 1, it is characterised in that the antireflective coating
(3) from the inside to surface successively by ZrO2Film (31), Si3N4Film (32), SiO2Film (33), ZrO2Film (31), Si3N4Film (32), SiO2Film
(33)、ZrO2Film (31), Si3N4Film (32) and SiO2Film (33) is formed.
3. there is the windows be protected panel of AG+AR+AF plated films according to claim 2, it is characterised in that the antireflective coating
(3) from the inside to surface successively by thickness be 10.5nm ZrO2Film layer (31), the Si that thickness is 12.2nm3N4Film (32), thickness are
15.1nm SiO2Film (33), the ZrO that thickness is 20nm2Film layer (31), the Si that thickness is 30.87nm3N4Film (32), thickness are
10nm SiO2Film (33), the ZrO that thickness is 11.5nm2Film layer (31), the Si that thickness is 18.6nm3N4Film (32) and thickness are
85.4nm SiO2Film (33) is formed.
4. there is the windows be protected panel of AG+AR+AF plated films according to claim 1, it is characterised in that the antireflective coating
(3) from the inside to surface successively by ZrO2Film (31), Si3N4Film (32), SiO2Film (33), ZrO2Film (31), Si3N4Film (32), SiO2Film
(33)、ZrO2Film (31), Si3N4Film (32), SiO2Film (33), ZrO2Film (31), Si3N4Film (32), SiO2Film (33), ZrO2Film
(31)、Si3N4Film (32), SiO2Film (33), ZrO2Film (31), Si3N4Film (32) and SiO2Film (33) is formed.
5. there is the windows be protected panel of AG+AR+AF plated films according to claim 4, it is characterised in that the antireflective coating
(3) from the inside to surface successively by thickness be 10.5nm ZrO2Film layer (31), the Si that thickness is 7.2nm3N4Film (32), thickness are
30.5nm SiO2Film (33), 14.1nm ZrO2Film layer (31), the Si that thickness is 36.5nm3N4Film (32), thickness 11.6nm
SiO2Film (33), 15.1nm ZrO2Film layer (31), the Si that thickness is 28.9nm3N4Film (32), the SiO that thickness is 175.3nm2
Film (33), 7.1nm ZrO2Film layer (31), the Si that thickness is 99.5nm3N4Film (32), the SiO that thickness is 155.3nm2Film
(33), 16.4nm ZrO2Film layer (31), the Si that thickness is 89.7nm3N4Film (32) and the SiO that thickness is 78.9nm2Film (33)
Form.
6. there is the windows be protected panel of AG+AR+AF plated films according to claim 1-5 any one, it is characterised in that institute
State also to have between anti-dazzle film layer (2) and antireflective coating (3) and bond film layer (6).
7. there is the windows be protected panel of AG+AR+AF plated films according to claim 1, it is characterised in that the transparent substrates
(1) it is transparent substrates (1) made of the safety glass, sapphire, PMMA or PC materials of printing opacity.
8. there is the windows be protected panel of AG+AR+AF plated films according to claim 1-5 any one, it is characterised in that institute
The thickness for stating anti-dazzle film layer (2) is 3 μm~5 μm.
9. there is the windows be protected panel of AG+AR+AF plated films according to claim 1-5 any one, it is characterised in that institute
State Al2O3The thickness of film (4) is 1 μm~3 μm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610393815.XA CN105891914B (en) | 2016-06-04 | 2016-06-04 | A kind of windows be protected panel with AG+AR+AF plated films |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610393815.XA CN105891914B (en) | 2016-06-04 | 2016-06-04 | A kind of windows be protected panel with AG+AR+AF plated films |
Publications (2)
Publication Number | Publication Date |
---|---|
CN105891914A CN105891914A (en) | 2016-08-24 |
CN105891914B true CN105891914B (en) | 2017-12-15 |
Family
ID=56710052
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610393815.XA Active CN105891914B (en) | 2016-06-04 | 2016-06-04 | A kind of windows be protected panel with AG+AR+AF plated films |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN105891914B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN207958152U (en) * | 2017-12-28 | 2018-10-12 | 华为技术有限公司 | Mobile terminal shell and mobile terminal |
CN108983886B (en) * | 2018-08-15 | 2024-04-05 | 信利光电股份有限公司 | Cover plate and preparation method thereof |
CN110706609A (en) * | 2019-10-12 | 2020-01-17 | Oppo广东移动通信有限公司 | Display module and electronic device |
CN110937822A (en) * | 2019-12-27 | 2020-03-31 | 宜昌南玻显示器件有限公司 | Wear-resistant AG + AR + AF glass and preparation method thereof |
CN111522461A (en) * | 2020-04-07 | 2020-08-11 | 广东小天才科技有限公司 | Glass cover plate, display module, terminal equipment and display method |
CN113267925B (en) * | 2021-05-13 | 2023-02-17 | 杭州科汀光学技术有限公司 | Display panel with multiple anti-glare functions |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4688230B2 (en) * | 2008-10-09 | 2011-05-25 | 株式会社シンクロン | Deposition method |
JP2013156523A (en) * | 2012-01-31 | 2013-08-15 | Topcon Corp | Substrate |
CN103411335A (en) * | 2013-07-30 | 2013-11-27 | 中国科学院上海技术物理研究所 | Selective absorbing film set of radiation absorbing layer based on mixture |
CN103995303B (en) * | 2014-05-29 | 2015-07-22 | 苏州胜利精密制造科技股份有限公司 | Intelligent terminal permeability improvement protection sheet |
CN205691800U (en) * | 2016-06-04 | 2016-11-16 | 浙江星星科技股份有限公司 | A kind of windows be protected panel with AG+AR+AF plated film |
-
2016
- 2016-06-04 CN CN201610393815.XA patent/CN105891914B/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN105891914A (en) | 2016-08-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN105891914B (en) | A kind of windows be protected panel with AG+AR+AF plated films | |
TWI695184B (en) | Substrate with low reflection film | |
KR101800495B1 (en) | Transparent conductive film and touch panel | |
US20130087374A1 (en) | Conductive film with high transmittance having a number of anti reflection coatings, touch panel using the same and manufacturing method thereof | |
KR102392445B1 (en) | Scratch-resistant chemically tempered glass substrate and use thereof | |
WO2011040403A1 (en) | Transparent conducting film and touch panel | |
CN101236264A (en) | High light transmittance ratio transparent resin display protection panel and LCD device using same | |
CN101236263A (en) | High light transmittance ratio glass display protection panel and LCD device using same | |
TW201411178A (en) | Anti-glare/antireflection member and method for producing same | |
CN201305551Y (en) | Double-sided coated glass | |
JP5160329B2 (en) | Transparent conductive film and touch panel | |
TWM499602U (en) | Composite substrate structure and touch-sensitive device | |
CN106086791A (en) | A kind of manufacture method of the windows be protected panel with AG+AR+AF plated film | |
JP7188650B2 (en) | Transparent substrate with antireflection film and image display device | |
US20230144879A1 (en) | Transparent substrate with anti-reflective film | |
CN201035171Y (en) | Display protection screen of high light transmittance ratio transparent resin and LCD with the same | |
CN205691800U (en) | A kind of windows be protected panel with AG+AR+AF plated film | |
WO2023162999A1 (en) | Self-luminous display device | |
JP2011191338A (en) | Transparent coloring article | |
TW201338876A (en) | Black film structure and manufacturing method thereof | |
KR102186514B1 (en) | Nonconductive low-reflection plate | |
JP4320866B2 (en) | Antireflection laminate, optical functional laminate, and display device | |
JP2013037040A (en) | Colored product and manufacturing method thereof | |
JP2000052492A (en) | Anti-reflective laminate, optically functional laminate, and display device | |
JP2005294084A (en) | Transparent conductive film |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP03 | Change of name, title or address | ||
CP03 | Change of name, title or address |
Address after: Building B1, Zhoujiang Intelligent Manufacturing Industrial Park, Pingxiang Economic and Technological Development Zone, Pingxiang City, Jiangxi Province, 337099 Patentee after: Jiangxi Star Technology Co.,Ltd. Address before: 318015, Zhejiang, Taizhou province Jiaojiang District hung Star electronic industry base building No. 4 Patentee before: ZHEJIANG XINGXING TECHNOLOGY Co.,Ltd. |