CN103270477A

CN103270477A - Touch panel

Info

Publication number: CN103270477A
Application number: CN2011800625017A
Authority: CN
Inventors: 江口和辉; 村梶庆太; 元山贤一
Original assignee: Nissan Chemical Corp
Current assignee: Nissan Chemical Corp
Priority date: 2010-10-26
Filing date: 2011-10-25
Publication date: 2013-08-28
Anticipated expiration: 2031-10-25
Also published as: WO2012057165A1; JPWO2012057165A1; KR101871527B1; KR20140009193A; TWI535830B; TW201231632A; JP5920220B2; CN103270477B

Abstract

Provided is a capacitance type touch panel in which the decrease in display quality that occurs in a display device when the transparent electrode pattern is visually recognized can be mitigated. The touch panel (1) includes a metal oxide layer (5) disposed over first transparent electrodes (3) and second transparent electrodes (4). The metal oxide layer (5) is formed from a coating composition obtained by hydrolyzing and condensing one or more metal alkoxides of the formula M(OR)n (M represents a metal, R represents a C1-5 alkyl, and n indicates the valence of the M) in an organic solvent in the presence of a metal salt of the formula M2(X)m (M2 represents a metal, X represents a chlorine atom, nitric acid, sulfuric acid, acetic acid, oxalic acid, a sufamic acid, a sulfonic acid, acetoacetic acid, acetylacetonato, or a basic salt of any of these, and m indicates the valence of the M2) and adding a precipitation inhibitor thereto. The metal alkoxides preferably are a mixture of a titanium alkoxide and either a silicon alkoxide or a partial condensate thereof.

Description

Contact panel

Technical field

The present invention relates to contact panel, more specifically relate to capacitance type touch-control panel.

Background technology

In recent years, along with popularizing of smart mobile phone, the display frame of mobile phone is constantly maximized.Thereupon, carried out to utilize the demonstration of display screen to carry out the exploitation of the contact panel of input operation in a large number.If the employing contact panel does not then need input mediums such as push switch, therefore can realize the maximization of display frame.

Contact panel detects the contact position of the operating surface of touchings such as finger or pen.Utilize this function, contact panel can be used as input media.As the detection mode of contact device, resistance membrane type and condenser type etc. are for example arranged.

In the resistance membrane type, the surface is provided with 2 substrates of transparency electrode with the relative mode separate configuration of transparency electrode.That is, owing to need 2 substrates, therefore there is the problem of slimming difficulty.In addition, in this mode, by pushing a substrate, make the transparency electrode of being located at this substrate and the transparency electrode short circuit of being located at another piece substrate, detect pressing position.Therefore, the substrate of a side of the pressure that press...withes one's finger is easy to generate wearing and tearing etc., also has the problem of the permanance decline that makes contact panel.

On the other hand, condenser type can make substrate be 1 and realize slimming, therefore can be described as the mode that is suitable for mobile device.

Disclosed capacitance type touch-control panel in the patent documentation 1.In this contact panel, be situated between with as dielectric configurations of glass for detection of first transparency electrode of the coordinate of directions X and second transparency electrode for detection of the coordinate of Y-direction.Specifically, the one side separate configuration of 1 glass substrate has the electrode of a plurality of coordinates for detection of directions X, and the another side separate configuration has the electrode of a plurality of coordinates for detection of Y-direction.That is, be the formation that each transparency electrode is set at 1 substrate.

In addition, disclosed the capacitance type touch-control panel of another kind of formation in the patent documentation 2.In this contact panel,, and each cross part is situated between insulation course is arranged and not conducting for detection of first transparency electrode of the coordinate of directions X and second transparency electrode for detection of the coordinate of Y-direction in the configuration of the one side of transparency carrier.If adopt described structure, then need not carry out electrode on the two sides of substrate and form.

The prior art document

Patent documentation

Patent documentation 1: the Jap.P. spy opens the 2003-173238 communique

Patent documentation 2: the Jap.P. spy opens the 2010-28115 communique

The summary of invention

Invent technical matters to be solved

Contact panel is assembled into display device such as liquid crystal indicator, as the display device of the band contact panel function that can detect touch location.The people of operation contact panel sees through contact panel display device is observed, so transparency electrode is used the good member of optical transmission characteristic.For example, use ITO inorganic material such as (tin indium oxide, Indium Tin Oxide).

Yet in the capacitance type touch-control panel, the formation of the transparency electrode of ITO etc. zone and the zone that does not form transparency electrode produce the difference of reflectivity.Therefore, exist the pattern of transparency electrode to be observed and problem that display performance is descended.

In addition, for contact panel in the past, the known technology that the acrylate layer that is formed by acryhic material is set in the transparency electrode of ITO etc.The purpose of this acrylate layer is the protection transparency electrode, and the refractive index characteristic is not carried out any consideration.Therefore, can't expect that acrylate layer has the effect that makes electrode pattern not outstanding.

In addition, acrylate layer is organic material film, so as the hardness deficiency of diaphragm.With the adaptation of the transparency electrode of ITO etc. also a little less than, become one of reason that the reliability that makes contact panel reduces.In addition, adopt under the situation of acrylate layer, be difficult to utilize printing technology formation films such as hectographic printing.Therefore, when forming film, must adopt the photoetching technique of complex procedures.

The present invention is the invention of finishing in view of these aspects.That is, the object of the present invention is to provide to reduce because of transparent electrode pattern and be observed the capacitance type touch-control panel that the display performance of the display device that causes descends.

In addition, another object of the present invention be to be provided on the transparency electrode and form the hardness height, with the adaptation height of transparency electrode, can adopt the film of printing technology film forming and the capacitance type touch-control panel that constitutes.

Other purpose of the present invention and advantage are by following record as can be known.

The technical scheme that the technical solution problem adopts

Contact panel of the present invention is the capacitance type touch-control panel that is formed with the pattern of transparency electrode at the operating area of transparency carrier, it is characterized in that,

Will be with following general formula (I)

M ₁(OR) _n (Ⅰ)

The metal alkoxide of expression

With following general formula (II)

M ₂(X) _m (Ⅱ)

Anti-precipitation agent is added in hydrolysis in organic solvent under the existence of the slaine of expression, condensation again, and the layer of the metal oxide that will be formed by the application composition of gained is disposed on the transparency electrode and makes;

In the formula (I), M ₁The expression metal, R represents the alkyl of C1～C5, n represents the valence mumber of M;

In the formula (II), M ₂The expression metal, X represents chlorine, nitric acid, sulfuric acid, acetic acid, ethane diacid, sulfaminic acid, sulfonic acid, acetoacetate, acetylacetonate or their basic salt, m represents M ₂Valence mumber.

In addition, contact panel of the present invention is the capacitance type touch-control panel that is formed with the pattern of transparency electrode at the operating area of transparency carrier, it is characterized in that,

Will be with following general formula (I)

M ₁(OR) _n (Ⅰ)

The metal alkoxide of expression

With following general formula (II-1)

M ₂(X) _m (Ⅱ-1)

With hydrolysis in organic solvent under the existence of the slaine of representing with the oxalate of metal used in the general formula (II-1), condensation, add anti-precipitation agent again, the layer of the metal oxide that will be formed by the application composition of gained is disposed on the transparency electrode and makes;

In the formula (I), M ₁The expression metal, R represents the alkyl of C1～C5, n represents M ₁Valence mumber;

In the formula (II), M ₂The expression metal, X represents chlorine, nitric acid, sulfuric acid, acetic acid, sulfaminic acid, sulfonic acid, acetoacetate, acetylacetonate or their basic salt, m represents M ₂Valence mumber.

Among the present invention, it better is the metal M in the described general formula (I) ₁For being selected from least a of silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminium (Al), magnesium (Mg), tin (Sn) and zinc (Zn).

In addition, among the present invention, better be the metal M in described general formula (II) and (II-1) ₂For being selected from least a of aluminium (Al), indium (In), zinc (Zn), zirconium (Zr), bismuth (Bi), lanthanum (La), tantalum (Ta), yttrium (Y) and cerium (Ce).

Among the present invention, better be that the refractive index of the layer of described metal oxide is 1.50～1.70, the thickness of the layer of this metal oxide (following also the thickness of layer is called thickness) is 40nm～170nm.Good especially be described metal oxide the layer refractive index be 1.54～1.68.

Among the present invention, better be that described metal alkoxide is the potpourri of alkoxy silane or its partial condensate and alkoxytitanium.

Among the present invention, better be that described anti-precipitation agent is be selected from N-methyl pyrrolidone, ethylene glycol, dimethyl formamide, dimethyl acetamide, diethylene glycol, propylene glycol, hexanediol and their derivant at least a.

Among the present invention, better be the metallic atom (M of the contained metal alkoxide of described application composition ₁) with the metallic atom (M of described slaine ₂) mol ratio satisfy

0.01≤M ₂/(M ₁+M ₂)≤0.7。

Among the present invention, better be that described slaine is be selected from metal nitrate, metal sulfate, metal acetate, metal chloride, metal oxalate, metal amino sulfonate, metal sulfonate, metal acetyl acetate, metal acetylacetonates and their basic salt at least a.

Among the present invention, better be that described organic solvent comprises aklylene glycol or its monoether derivant.

Among the present invention, better be that described transparency electrode has first transparency electrode and second transparency electrode for detection of the position of at least 2 different directions.

Among the present invention, described first transparency electrode and described second transparency electrode are configurable in the same one side of transparency carrier.

Among the present invention, described first transparency electrode and described second transparency electrode can be disposed at the not coplanar of transparency carrier respectively.

The effect of invention

If employing the present invention then can provide and can reduce the capacitance type touch-control panel that is observed the display performance decline of the display device that causes because of transparent electrode pattern.

The simple declaration of accompanying drawing

Fig. 1 is the vertical view as the contact panel of the 1st example of present embodiment.

Fig. 2 is the cut-open view along the A1-A1 ' line of Fig. 1.

Fig. 3 (a)～(d) is that expression is as the operation cut-open view of the manufacture method of the contact panel of the 1st example of present embodiment.

Fig. 4 is that expression is as the vertical view of the contact panel of the 2nd example of present embodiment.

Fig. 5 is the cut-open view along the B1-B1 ' line of Fig. 4.

Fig. 6 is that expression is as the cut-open view of the general configuration of the contact panel of the 3rd example of present embodiment.

Fig. 7 is that expression is as the cut-open view of the general configuration of the contact panel of the 4th example of present embodiment.

Fig. 8 is that expression is as the cut-open view of the general configuration of the contact panel of the 5th example of present embodiment.

The mode that carries out an invention

The display performance that is observed the display device that causes because of transparent electrode pattern descend be since the refractive index of the refractive index of transparency electrode and substrate different due to.

Transparency electrode is formed by the ITO (tin indium oxide (Indium Tin Oxide)) as inorganic, metal oxide usually.The refractive index of ITO is about 1.8～2.1.On the other hand, the refractive index of glass substrate is about 1.5, so with the refractive index of ITO larger difference is arranged.The difference of described refractive index is in the zone that is formed with transparency electrode and do not form the difference that produces reflective character between the zone of transparency electrode.That is, the boundary reflection characteristic of following interference the zone that is formed with transparency electrode with do not form the regional different of transparency electrode, make electrode pattern outstanding result in picture shows thereby produce.

So, the inventor for make electrode pattern outstanding and repeatedly conscientiously the research back find that it is effective that the transparency electrode on being disposed at substrate arranges the layer that refractive index and thickness be controlled in the required scope.By such layer, the phenomenon that electrode pattern is observed in the contact panel that can suppress not wish to take place are set.

In addition, in the contact panel, as mentioned above, the known technology that acrylate layer is set in transparency electrode.The purpose of this acrylate layer is the protection transparency electrode, and the refractive index characteristic is not carried out any consideration.Therefore, can't expect that acrylate layer has the effect that makes electrode pattern not outstanding.In addition, acrylate layer is organic material film, so hardness is low, with the adaptation of ITO also a little less than, thereby physical strength deficiency.In addition, owing to can not therefore must carry out pattern and form at the wiring portion configuration dielectric film of the frame portion of contact panel, but be difficult to utilize printing technology such as hectographic printing to form film.Therefore, when forming film, must adopt the photoetching technique of complex procedures.

Because such situation preferably is controlled in the interior layer instead of propylene acid layer of required scope with above-mentioned refractive index and thickness.That is, it is desirable to have the function of protection transparency electrode, specifically is that physical strength is good, can protect transparency electrode not destroyed because of repeatedly pressing of finger etc.In addition, better be to use printing technologies such as hectographic printing on substrate, to form transparent electrode pattern easily.

The inventor finds, when forming the layer that satisfies above-mentioned performance, better be to use with metal alkoxide in the presence of slaine in organic solvent hydrolysis, condensation and add anti-precipitation agent and application composition.By on transparency electrode (that is, covering transparent electrode) metal oxide layer that uses this application composition to form is set, can in contact panel, protect transparency electrode, and make electrode pattern outstanding.

Below, the contact panel to present embodiment describes earlier.Then, the metal oxide layer that is used for this contact panel and the application composition that is used to form this metal oxide layer are described.

＜contact panel 〉

Fig. 1 and Fig. 2 are that Fig. 1 is vertical view as the structural drawing of the contact panel of the 1st example of present embodiment, and Fig. 2 is the cut-open view along the A1-A1 ' line of Fig. 1.

As shown in Figure 1, contact panel 1 have transparent substrate 2, for detection of first transparency electrode 3 of the coordinate of directions X, for detection of second transparency electrode 4 of the coordinate of Y-direction.First transparency electrode 3 and second transparency electrode 4 are formed by same one deck of the same one side of being located at substrate 2.

Substrate 2 uses transparent materials such as glass, acryl resin, vibrin, pet resin, polycarbonate resin, polyvinylidene chloride resin, plexiglass, tri acetyl cellulose resin and PEN resin to constitute.Good especially is to select to be suitable for to form metal oxide layer 5 described later, 6 the material that possesses thermotolerance and chemical resistance.About the thickness of substrate 2, use under the situation of glass, for example be about 0.1mm～2mm, use under the situation of resin molding, for example be about 10 μ m～2000 μ m.

First transparency electrode 3 and second transparency electrode 4 are formed at the position corresponding with the operating surface of contact panel 1.In addition, first transparency electrode 3 is separated setting in a plurality of zones along directions X, and second transparency electrode 4 arranges in a plurality of zones separation along Y-direction.By adopting such structure, can improve the precision that touch position detects.

Among Fig. 1, first transparency electrode 3 and second transparency electrode 4 respectively with a plurality of bothridiums (pad) portion 21 as inscape, each bothridium portion 21 is to separate in the plane respectively and the less mode in gap of 21 in each bothridium portion disposes.That is, become the bothridium portion 21 of row to be disposed at the whole operation face with the bothridium portion 21 that becomes to be listed as in Y direction in their as far as possible little modes in cross one another zone in X-direction.Bothridium portion 21 can adopt for example polygonal shapes such as rhombus, rectangle and hexagon, and they are for example shape configuration staggered or in upright arrangement.In addition, the number of the electrode of separation also is not limited in the example of Fig. 1, determines according to the size of operating surface and the precision of desired detection position.

First transparency electrode 3 and second transparency electrode 4 are used transparent electrode material formation high to visible light transmittance at least and that have electric conductivity.As such transparent electrode material with electric conductivity, can exemplify for example ITO (tin indium oxide, Indium Tin Oxide), IZO (indium zinc oxide, Indium Zinc Oxide) or ZnO (zinc paste) etc.Using under the situation of ITO, in order to guarantee enough electric conductivity, better is that to make thickness be 10～200nm.

First transparency electrode 3 and for example following formation of second transparency electrode 4.

At first, the method selected of the material of the substrate 2 by being considered as substrate from sputtering method, vacuum vapour deposition, ion plating method, spray-on process, infusion process or CVD (chemical vapor deposition, Chemical Vapor Deposition) method etc. forms nesa coating.Then, using photoetching technique that above-mentioned nesa coating is carried out pattern forms.Perhaps, can use the electroconductive stuffing that formed by above-mentioned material etc. to be scattered in organic solvent and coating form required pattern by print process.

Importantly whether can control thickness accurately in the formation operation of transparency electrode.Therefore, during formation, good especially is to select to form the method that can reach the good low resistance film of required film thickness and the transparency.

As depicted in figs. 1 and 2, first transparency electrode 3 and second transparency electrode 4 are formed on the same one side of substrate 2, form same one deck.Therefore, first transparency electrode 3 and second transparency electrode 4 are intersected in many places, form cross part 18.

In the present embodiment, at cross part, first transparency electrode is blocked in the mode that does not contact with the opposing party with either party in second transparency electrode.That is, as shown in Figure 2, all link to each other in a plurality of cross part 18, the second transparency electrodes 4, but first transparency electrode 3 is blocked.And, for the truncated position that makes first transparency electrode 3 connects, be provided with bridging electrode 20, between bridging electrode 20 and second transparency electrode 4, be provided with by the insulativity material and form interlayer dielectric 19.Below, seeing figures.1.and.2 further is specifically described.

As shown in Figure 2, be formed with the interlayer dielectric 19 of light transmission on second transparency electrode 4 in the cross part 18.Interlayer dielectric 19 can use SiO ₂Etc. organic materials such as inorganic material or photonasty acryl resins.Use SiO ₂Situation under, for example can adopt by using mask sputtering method only second transparency electrode 4 in cross part 18 be formed with SiO ₂The structure of film.In addition, use under the situation of photonasty acryl resin, also can use photoetching process to form same structure.

The upper strata of interlayer dielectric 19 is provided with bridging electrode 20.Bridging electrode 20 will be electrically connected mutually in cross part 18 intercepted first transparency electrodes 3, be formed by the material of light transmission.By bridging electrode 20 is set, first transparency electrode 3 can be electrically connected in Y-direction.

As shown in Figure 1, first transparency electrode 3 and second transparency electrode 4 are the shape that the bothridium 21 vertical or horizontal arrangements with a plurality of rhombuses form.In second transparency electrode 4, the coupling part that is positioned at cross part 18 is the width shape littler than the rhombus bothridium portion 21 of second transparency electrode 4.In addition, bridging electrode 20 also is configured as strip with width than rhombus bothridium portion 21 little forms.

As depicted in figs. 1 and 2, in the contact panel 1 of present embodiment, on first transparency electrode 3 and second transparency electrode 4, (that is, cover first transparency electrode 3 and second transparency electrode 4) and be formed with metal oxide layer 5.And, the formation zone of the transparency electrode in the part corresponding with the operating surface of contact panel 1 that be covered and non-formation zone.The hardness height of metal oxide layer 5 is good with the adaptation of first transparency electrode 3 and second transparency electrode 4.

The formation of metal oxide layer 5 use with metal alkoxide under the existence of slaine (for example, aluminium salt) in organic solvent hydrolysis, condensation and add anti-precipitation agent and application composition.Details to this application composition describes hereinafter.

In the contact panel 1, based on the described result of study in embodiment hurdle of this instructions, select refractive index and the thickness of metal oxide layer 5 according to the not outstanding condition of each electrode pattern of first transparency electrode 3 and second transparency electrode 4.Specifically, the refractive index of metal oxide layer 5 better is in 1.50～1.70 scope, is more preferably in 1.54～1.68 scope.Thickness better is in the scope of 40nm～170nm.In addition, the refractive index of metal oxide layer 5 is more than 1.54 and under less than 1.60 situation, and thickness is more preferably in the scope of 60nm～150nm.In addition, under the situation of the refractive index of metal oxide layer 5 in the scope below 1.68 more than 1.60, thickness is more preferably in the scope of 40nm～170nm.Metal oxide layer 5 is selected from and is insulativity and makes the high metal oxide layer of first transparency electrode 3 and the 4 not conductings of second transparency electrode and visible light transmission.

In the contact panel 1, for example metal oxide layer 5 is formed by the application composition that comprises alkoxyl silicone and alkoxytitanium, and refractive index is 1.60, and thickness is 80nm.

As shown in Figure 2, the face that contact panel 1 can be by will being formed with first transparency electrode, 3 grades and the superiors of the observation side of display panel 10 are situated between to adopt the adhesive linkage 9 of acrylic compounds light-cured resin etc. to overlap to form a display device.Here, adhesive linkage 9 is located on the metal oxide layer 5.

Above-mentioned display device has contact panel 1 and display panel 10, can have backlight as required.Display panel 10 can adopt the structure same with known display device, omits detailed expression among Fig. 2.For example, under the situation of liquid crystal indicator, display panel 10 can adopt the structure that accompanies liquid crystal layer between 2 transparency carriers.Opposition side in the side of joining with liquid crystal layer of each transparency carrier can be respectively equipped with polaroid.In addition, can form the state that segmented electrode or common electrode are controlled liquid crystal on each transparency carrier.In addition, liquid crystal layer is by each transparency carrier and encapsulant sealing.

As shown in Figure 1, in the contact panel 1, be respectively equipped with terminal (not shown) in the end of first transparency electrode 3 and second transparency electrode 4, draw many lead-out wirings 11 from this terminal.Lead-out wiring 11 can adopt the opaque metal line of the alloy that uses silver, aluminium, chromium, copper, molybdenum and Mo-Nb (molybdenum-niobium) alloy etc. to contain these metals etc.Lead-out wiring 11 is connected with the control circuit (not shown) that first transparency electrode 3 and second transparency electrode 4 is applied voltage or detection touch location.

Have in the contact panel 1 of said structure, a plurality of first transparency electrodes 3 and second transparency electrode 4 are applied voltage successively and give electric charge.If any place as the finger touch operating surface of electric conductor then forms capacitor by the capacitive coupling between finger tip and first transparency electrode 3 and second transparency electrode 4.Therefore, where the charge variation of the contact position by catching finger tip can detect finger touch.

In addition, contact panel 1 also can come by the control of control circuit (not shown) either party in first transparency electrode 3 and second transparency electrode 4 is optionally applied voltage.Under this situation, applied on the transparency electrode of voltage and formed electric field, if fingers etc. touch under this state, the contact position ground connection that is situated between with the electric capacity of human body then.Consequently, the variation of the value of having a resistance between as the terminal (not shown) of first transparency electrode 3 of object or second transparency electrode 4 and contact position.This resistance value is directly proportional with distance as the terminal of first transparency electrode 3 of object or second transparency electrode 4 with contact position, therefore control circuit detects the current value that flows through between contact position and the terminal as first transparency electrode 3 of object or second transparency electrode 4, just can obtain the coordinate of contact position.

In the contact panel 1 of present embodiment, based on the effect of metal oxide layer 5 set on first transparency electrode 3 and second transparency electrode 4, the outstanding of electrode pattern is inhibited in the operating surface.

Below, the manufacture method of the contact panel 1 of present embodiment is described.

At first, prepare transparent substrate 2 such as glass substrate.Substrate 2 cuts into required shape as required, cleans.In addition, also between substrate 2 and nesa coating, form the middle layer of SiOx, SiNx, SiON etc. sometimes.Then, the one side at substrate 2 forms nesa coating.Nesa coating for example is ITO, uses sputtering method or vacuum vapour deposition etc. with the thickness film forming of 10～200nm.Then, be formed with in the upper layer side of nesa coating under the state of the etching mask that is formed by photoresist etc., the etching nesa coating carries out pattern to first transparency electrode 3 and second transparency electrode 4 and forms.By removing etching mask, can obtain the transparent conductive film substrate 14 shown in Fig. 3 (a).

Here, in the cross part 18 of transparent conductive film substrate 14, second transparency electrode 4 is situated between and links to each other with the coupling part, but second transparency electrode 3 is blocked.

Then, by behind a side photosensitive resin coating that is provided with first transparency electrode 3 and second transparency electrode 4, carrying out exposure imaging, form interlayer dielectric 19 (Fig. 3 (b)) in the coupling part of second transparency electrode 4.As the photoresist that is used to form interlayer dielectric 19, use to have the transparency and stable on heating photoresist.For example, can use acryl resin etc.Use SiO ₂Form under the situation of interlayer dielectric 19, can form same structure by the sputtering method that uses mask.

Then, after interlayer dielectric 19 forms nesa coatings, be formed with etching nesa coating under the state of the etching mask that is formed by photoresist on the surface of this nesa coating.Then, remove etching mask, form bridging electrode 20 on the upper strata of interlayer dielectric 19 in the mode that the truncation part with first transparency electrode 3 links to each other.Thus, can obtain the structure shown in Fig. 3 (c).As the nesa coating that is formed on the interlayer dielectric 19, can exemplify for example ITO film, under this situation, preferred bridging electrode 20 also forms by ITO.

For aforesaid lead-out wiring 11, in operation thereafter, use formation such as silver-colored printing ink.But, in above-mentioned operation during the etching nesa coating, also can be respectively form lead-out wiring 11 along the residual nesa coating of outer peripheral edges of first transparency electrode 3 and second transparency electrode 4.

Then, on first transparency electrode 3, second transparency electrode 4 and bridging electrode 20, form by hectographic printing coating metal oxide skin(coating) and use application composition.Here, application composition be with metal alkoxide under the existence of slaine (for example, aluminium salt) in organic solvent hydrolysis, condensation and add anti-precipitation agent and composition.Then, the substrate of filming 2 that will be formed with application composition carries out drying at for example heating plate of 40～150 ℃ (for example 60 ℃).Then, in for example baking oven of 100～300 ℃ (for example 200 ℃), heat, form metal oxide layer 5 at first transparency electrode 3, second transparency electrode 4 and bridging electrode 20.Thus, can obtain the contact panel substrate 30 shown in Fig. 3 (d).Filming after for example heating plate carries out drying on the substrate 2 to this irradiation ultraviolet radiation of filming, can be heated in baking oven again.

Then, form lead-out wiring 11 with silver-colored printing ink etc. and form contact panel 1 from the terminal (not shown) of the end of first transparency electrode 3 and second transparency electrode 4.Contact panel 1 is situated between and is connected with the control circuit (not shown) of contact panel with lead-out wiring 11.

The contact panel that makes 1 is situated between and is installed in the front surface of display panel 10 with the adhesive linkage 9 of acrylic compounds transparent adhesive etc.At this moment, at the angle of substrate 2 or display panel 10 collimating marks is set as required and carries out contraposition.

Be installed in the contact panel 1 of display panel 10, by metal oxide layer 5 is set, be formed on the state of the electrode pattern that is difficult to see first transparency electrode 3 and second transparency electrode 4 on the operating surface of contact panel 1.

Below, another the routine contact panel 101 as present embodiment is described.

Fig. 4 and Fig. 5 represent that Fig. 4 is vertical view as the contact panel of the 2nd example of present embodiment, and Fig. 5 is the cut-open view along the B1-B1 ' line of Fig. 4.

As shown in Figure 4, contact panel 101 have transparent substrate 102, be formed at the one side of substrate 102 first transparency electrode 103 for detection of the coordinate of directions X, be formed at second transparency electrode 104 for detection of the coordinate of Y-direction of the another side of substrate 102.In the following explanation, the one side of substrate 102 is the top, and the another side of substrate 102 is the below.In addition, under this situation, the another side of substrate 102 is the face that is installed on a side of display panel 110.

Substrate 102 is dielectric base plate.As the material of substrate 102, use transparent materials such as glass, acryl resin, vibrin, pet resin, polycarbonate resin, polyvinylidene chloride resin, plexiglass and PEN resin.Good especially is to select to be suitable for to form metal oxide layer 105 described later, 106 the material that possesses thermotolerance and chemical resistance.About the thickness of substrate 102, if glass can be made as about 0.1mm～2mm, if resin molding then can be made as 10 μ m～2000 μ m.

As shown in Figure 4, first transparency electrode 103 and second transparency electrode 104 are formed by elongated rectangular electrode respectively.First transparency electrode 103 is extended along directions X, and second transparency electrode 104 is extended along Y-direction, is strip respectively and arranges at certain intervals.In addition, first transparency electrode 103 and second transparency electrode 104 arrange in mutually orthogonal mode, and integral body is clathrate.

First transparency electrode 103 and second transparency electrode 104 are used transparent electrode material formation high to visible light transmittance at least and that have electric conductivity.Transparent electrode material with electric conductivity as such can use for example ITO or ZnO etc.Using under the situation of ITO, in order to guarantee enough electric conductivity, better is that to make thickness be 5～100nm.

First transparency electrode 103 and second transparency electrode 104 select only method to form by the substrate 102 that is considered as substrate from sputtering method, vacuum vapour deposition, ion plating method, spray-on process, infusion process or CVD method etc.

For example, have and utilize photoetching technique to carry out the method that pattern forms with etching method to the transparency electrode that is planar formation, perhaps use in organic solvent, disperse the electroconductive stuffing that formed by above-mentioned material etc. and coating by the direct required method of patterning etc. that forms of print process.Importantly whether can control thickness accurately in the formation operation of transparency electrode.Therefore, during formation, good especially is to select to form the method that can reach the good low resistance film of required film thickness and the transparency.

As shown in Figure 4 and Figure 5, be formed with metal oxide layer 105 in first transparency electrode 103.The formation zone of first transparency electrode of the part that metal oxide layer 105 linings are corresponding with the operating surface of contact panel 101 and non-formation zone.In addition, as shown in Figure 5, on second transparency electrode 104, (be downside among the figure) and also be formed with metal oxide layer 106.The formation zone of the transparency electrode of the part that metal oxide layer 106 linings are corresponding with the operating surface of contact panel 101 and non-formation zone.Metal oxide layer 105,106 hardness height are good with the adaptation of first transparency electrode 103 and second transparency electrode 104.

Metal oxide layer 105,106 formation use with metal alkoxide under the existence of slaine (for example, aluminium salt) in organic solvent hydrolysis, condensation and add anti-precipitation agent and application composition.Details to this application composition describes hereinafter.

In the contact panel 101, based on the described result of study in embodiment hurdle of this instructions, according to the outstanding condition selection metal oxide layer 105 of each electrode pattern of first transparency electrode 103 and second transparency electrode 104,106 refractive index and thickness.Specifically, metal oxide layer 105,106 refractive index better are respectively in 1.50～1.70 scope, are more preferably in 1.54～1.68 scope.Thickness better is respectively in the scope of 40nm～170nm.In addition, metal oxide layer 105,106 refractive index are more than 1.54 and under less than 1.60 situation, and thickness is more preferably in the scope of 60nm～150nm.In addition, under metal oxide layer 105,106 the situation of refractive index in the scope below 1.68 more than 1.60, thickness is more preferably in the scope of 40nm～170nm.

Under this situation,

metal oxide layer

105 and 106 also is selected from and is insulativity and the metal oxide layer high with first transparency electrode 103 and the 104 not conductings of second transparency electrode and visible light transmission respectively.

In the contact panel 101, for example first transparency electrode 103 and second transparency electrode 104 better are respectively that thickness is the ITO film of 10～200nm.In this contact panel 101, for example first transparency electrode 103 and second transparency electrode 104 are formed by the ITO film of thickness 28nm respectively, metal oxide layer 105,106 is formed by the application composition that uses alkoxyl silicone and alkoxytitanium to make respectively, and refractive index is 1.6, and thickness is 80nm.

As shown in Figure 5, the one side at substrate 102 is provided with the adhesive linkage 108 that is formed by the acrylic compounds transparent adhesive.In addition, be bonded with the coverlay 107 that is constituted by transparent resin on the adhesive linkage 108.Among Fig. 4, omit coverlay 107.

Coverlay 107 plays the effect of the diaphragm of first transparency electrode 103 and metal oxide layer 105.Can apply transparent resin and replace coverlay 107.Under this situation, can not need adhesive linkage 108.

Another side Jie at substrate 102 is equipped with display panel 110 with the adhesive linkage 109 that is formed by the acrylic compounds transparent adhesive.

Display panel 110 can adopt the structure same with known display device, omits detailed expression among Fig. 5.For example, under the situation of liquid crystal indicator, display panel 110 can adopt the structure that accompanies liquid crystal layer between 2 transparency carriers.Opposition side in the side of joining with liquid crystal layer of each transparency carrier can be respectively equipped with polaroid.In addition, can form the state that segmented electrode or common electrode are controlled liquid crystal on each transparency carrier.In addition, liquid crystal layer is by each transparency carrier and encapsulant sealing.

In the contact panel 101, be respectively equipped with terminal (not shown) in the end of first transparency electrode 103 and second transparency electrode 104, draw many lead-out wirings (not shown) from this terminal.Lead-out wiring can adopt the opaque metal line of the alloy that uses silver, aluminium, chromium, copper or contain these metals etc.Lead-out wiring is connected with the control circuit (not shown) that first transparency electrode 103 and second transparency electrode 104 is applied voltage or detection touch location.

Have in the contact panel 101 of said structure, if as any place of the finger touch operating surface of electric conductor, then form capacitor by the capacitive coupling between finger tip and first transparency electrode 103 and second transparency electrode 104.Therefore, where the charge variation of the contact position by catching finger tip can detect finger touch.

In the contact panel 101, based on metal oxide layer 105 set on first transparency electrode 103 and second transparency electrode 104,106 effect, the outstanding of electrode pattern is inhibited in the operating surface.

As shown in Figure 6, in the contact panel 201, regard display panel 210 as first substrate, be provided with first transparency electrode 203 on the surface of display panel 210.In addition, the one side at second substrate of preparing in addition 212 is provided with second transparency electrode 204.In the following description, the one side of second substrate 212 is the top, and another side is the below.In addition, the another side of second substrate 212 is a side that is installed on display panel 210.

Display panel 210 can adopt the structure same with known display device, omits detailed expression among Fig. 6.For example, under the situation of liquid crystal indicator, display panel 210 can adopt the structure that accompanies liquid crystal layer between 2 transparency carriers.Opposition side in the side of joining with liquid crystal layer of each transparency carrier can be respectively equipped with polaroid.In addition, can form the state that segmented electrode or common electrode are controlled liquid crystal on each transparency carrier.In addition, liquid crystal layer is by each transparency carrier and encapsulant sealing.

First transparency electrode 203 is provided with metal oxide layer 205.The formation zone of the transparency electrode of the part that metal oxide layer 205 linings are corresponding with the operating surface of contact panel 201 and non-formation zone.Similarly, also be formed with metal oxide layer 206 on second transparency electrode 204.The formation zone of the transparency electrode of the part that metal oxide layer 206 linings are corresponding with the operating surface of contact panel 201 and non-formation zone.Metal oxide layer 205,206 hardness height are good with the adaptation of first transparency electrode 203 and second transparency electrode 204.

Metal oxide layer 205,206 formation use with metal alkoxide under the existence of slaine (for example, aluminium salt) in organic solvent hydrolysis, condensation and add anti-precipitation agent and application composition.Details to this application composition describes hereinafter.

In the contact panel 201, based on the described result of study in embodiment hurdle of this instructions, according to the outstanding condition selection metal oxide layer 205 of each electrode pattern of first transparency electrode 203 and second transparency electrode 204,206 refractive index and thickness.Specifically, metal oxide layer 205,206 refractive index better are respectively in 1.50～1.70 scope, are more preferably in 1.54～1.68 scope.Thickness better is respectively in the scope of 40nm～170nm.In addition, metal oxide layer 205,206 refractive index are more than 1.54 and under less than 1.60 situation, and thickness is more preferably in the scope of 60nm～150nm.In addition, under metal oxide layer 205,206 the situation of refractive index in the scope below 1.68 more than 1.60, thickness is more preferably in the scope of 40nm～170nm.Under this situation, metal oxide layer 205 and 206 also is selected from and is insulativity and the metal oxide layer high with first transparency electrode 203 and the 204 not conductings of second transparency electrode and visible light transmission respectively.

In the contact panel 201, for example first transparency electrode 203 and second transparency electrode 204 better are respectively that thickness is the ITO film of 10～200nm.In this contact panel 201, for example first transparency electrode 203 and second transparency electrode 204 are formed by the ITO film of thickness 28nm respectively, metal oxide layer 205,206 is formed by the application composition that comprises alkoxyl silicone and alkoxytitanium respectively, and refractive index is 1.6, and thickness is 80nm.

As shown in Figure 6, the one side at second substrate 212 is provided with the adhesive linkage 208 that is formed by the acrylic compounds transparent adhesive.In addition, be bonded with the coverlay 207 that is constituted by transparent resin on the adhesive linkage 208.Coverlay 207 plays the effect of diaphragm.Can apply transparent resin and replace coverlay 207.Under this situation, can not need adhesive linkage 208.First transparency electrode 203 is identical with electrode that is illustrated with Fig. 4 and Fig. 5 etc. with second transparency electrode, 204 grades.

In the contact panel 201, based on metal oxide layer 205 set on first transparency electrode 203 and second transparency electrode 204,206 effect, the outstanding of electrode pattern is inhibited in the operating surface.

As shown in Figure 7, in the contact panel 301, regard display panel 310 as first substrate, be provided with first transparency electrode 303 on the surface of display panel 310.In addition, the one side at second substrate of preparing in addition 312 is provided with second transparency electrode 304.In the following description, the one side of second substrate 312 is the below, and another side is the top.In addition, the another side of second substrate 312 is for carrying out the face of touch control operation to contact panel 301.

Display panel 310 can adopt the structure same with known display device, omits detailed expression among Fig. 7.For example, under the situation of liquid crystal indicator, display panel 310 can adopt the structure that accompanies liquid crystal layer between 2 transparency carriers.Opposition side in the side of joining with liquid crystal layer of each transparency carrier can be respectively equipped with polaroid.In addition, can form the state that segmented electrode or common electrode are controlled liquid crystal on each transparency carrier.In addition, liquid crystal layer is by each transparency carrier and encapsulant sealing.

First transparency electrode 303 is provided with metal oxide layer 305.The formation zone of the transparency electrode of the part that metal oxide layer 305 linings are corresponding with the operating surface of contact panel 301 and non-formation zone.Similarly, (being illustrated in lower side among Fig. 7) also is formed with metal oxide layer 306 on second transparency electrode 304.The formation zone of the transparency electrode of the part that metal oxide layer 306 linings are corresponding with the operating surface of contact panel 301 and non-formation zone.Metal oxide layer 305,306 hardness height are good with the adaptation of first transparency electrode 303 and second transparency electrode 304.

Metal oxide layer 305,306 formation use with metal alkoxide under the existence of slaine (for example, aluminium salt) in organic solvent hydrolysis, condensation and add anti-precipitation agent and application composition.Details to this application composition describes hereinafter.

Between metal oxide layer 305 and metal oxide layer 306, be provided with the adhesive linkage 308 that is formed by the acrylic compounds transparent adhesive.Second substrate 312 is installed in display panel 310 by this adhesive linkage 308.

In the contact panel 301, based on the described result of study in embodiment hurdle of this instructions, according to the outstanding condition selection metal oxide layer 305 of each electrode pattern of first transparency electrode 303 and second transparency electrode 304,306 refractive index and thickness.Specifically, metal oxide layer 305,306 refractive index better are respectively in 1.50～1.70 scope, are more preferably in 1.54～1.68 scope.Thickness better is respectively in the scope of 40nm～170nm.In addition, metal oxide layer 305,306 refractive index are more than 1.54 and under less than 1.60 situation, and thickness is more preferably in the scope of 60nm～150nm.In addition, under metal oxide layer 305,306 the situation of refractive index in the scope below 1.68 more than 1.60, thickness is more preferably in the scope of 40nm～170nm.Under this situation, metal oxide layer 305 and 306 also is selected from and is insulativity and the metal oxide layer high with first transparency electrode 303 and the 304 not conductings of second transparency electrode and visible light transmission respectively.

In the contact panel 301, for example first transparency electrode 303 and second transparency electrode 304 better are respectively that thickness is the ITO film of 10～200nm.In this contact panel 301, for example first transparency electrode 303 and second transparency electrode 304 are formed by the ITO film of thickness 28nm respectively, metal oxide layer 305,306 is formed by the application composition that comprises alkoxyl silicone and alkoxytitanium respectively, and refractive index is 1.6, and thickness is 80nm.

In the contact panel 301, based on metal oxide layer 305 set on first transparency electrode 303 and second transparency electrode 304,306 effect, the outstanding of electrode pattern is inhibited in the operating surface.

As shown in Figure 8, contact panel 401 has transparent substrate 402.Be provided with first transparency electrode 403 and second transparency electrode 404 for the position of detecting 2 different directions respectively on the upper strata of substrate 402.

First transparency electrode 403 and second transparency electrode 404 are used transparent electrode material formation high to visible light transmittance at least and that have electric conductivity.Transparent electrode material with electric conductivity as such can use for example ITO or ZnO etc.Using under the situation of ITO, in order to guarantee enough electric conductivity, better is that to make thickness be 5～100nm.

First transparency electrode 403 and second transparency electrode 404 by from sputtering method, vacuum vapour deposition, ion plating method, spray-on process, infusion process or CVD method etc., being considered as substrate substrate 102 and described later outside cover coating 407 and select only method to form.

As shown in Figure 8, first transparency electrode 403 is disposed on the substrate 402.And, be formed with metal oxide layer 405 in first transparency electrode 403.The formation zone of first transparency electrode 403 of the part that metal oxide layer 405 linings are corresponding with the operating surface of contact panel 401 and non-formation zone.

Outside being provided with, metal oxide layer 405 covers coating 407.Cover coating 407 outward and use the high acryl resin of the transparency.

As shown in Figure 8, second transparency electrode 404 is disposed at outer covering on the coating 407.Be formed with metal oxide layer 406 in second transparency electrode 404.The formation zone of the transparency electrode of the part that metal oxide layer 406 linings are corresponding with the operating surface of contact panel 401 and non-formation zone.Metal oxide layer 405,406 hardness height are good with the adaptation of first transparency electrode 403 and second transparency electrode 404.

Metal oxide layer 405,406 formation use with metal alkoxide under the existence of slaine (for example, aluminium salt) in organic solvent hydrolysis, condensation and add anti-precipitation agent and application composition.Details to this application composition describes hereinafter.

In the contact panel 401, based on the described result of study in embodiment hurdle of this instructions, according to the outstanding condition selection metal oxide layer 405 of each electrode pattern of first transparency electrode 403 and second transparency electrode 404,406 refractive index and thickness.Specifically, metal oxide layer 405,406 refractive index better are respectively in 1.50～1.70 scope, are more preferably in 1.54～1.68 scope.Thickness better is respectively in the scope of 40nm～170nm.In addition, metal oxide layer 405,406 refractive index are more than 1.54 and under less than 1.60 situation, and thickness is more preferably in the scope of 60nm～150nm.In addition, under metal oxide layer 405,406 the situation of refractive index in the scope below 1.68 more than 1.60, thickness is more preferably in the scope of 40nm～170nm.Under this situation, metal oxide layer 305 and 306 also is selected from and is insulativity and the metal oxide layer high with first transparency electrode 303 and the 304 not conductings of second transparency electrode and visible light transmission respectively.

In the contact panel 401, for example first transparency electrode 403 and second transparency electrode 404 better are respectively that thickness is the ITO film of 10～200nm.In this contact panel 301, for example first transparency electrode 303 and second transparency electrode 304 are formed by the ITO film of thickness 28nm respectively, metal oxide layer 405,406 is formed by the application composition that comprises alkoxyl silicone and alkoxytitanium respectively, and refractive index is 1.60, and thickness is 80nm.

As shown in Figure 8, be provided with the adhesive linkage 408 that is formed by the acrylic compounds transparent adhesive at metal oxide layer 406.Contact panel 401 is situated between and is installed in display panel 110 with this adhesive linkage 408.

Have in the contact panel 401 of said structure, if as any place of the finger touch operating surface of electric conductor, then form capacitor by the capacitive coupling between finger tip and first transparency electrode 403 and second transparency electrode 404.Therefore, where the charge variation of the contact position by catching finger tip can detect finger touch.

In the contact panel 401, based on metal oxide layer 405 set on first transparency electrode 403 and second transparency electrode 404,406 effect, the outstanding of electrode pattern is inhibited in the operating surface.

More than, the contact panel of present embodiment is illustrated, but the present invention is not limited in above-mentioned embodiment.For polytype contact panel of the transparency electrode of using ITO etc., by the metal oxide layer that the condition that is fit to according to refractive index and thickness is selected is set in its transparency electrode, can obtain and above-mentioned same effect.

Below, the application composition that is used to form metal oxide layer is described.

＜application composition 〉

The application composition that is used to form metal oxide layer be with metal alkoxide in the presence of slaine in organic solvent hydrolysis, condensation and add anti-precipitation agent and composition.

As the metal alkoxide that is used for application composition, can exemplify the alkoxide of silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminium (Al), magnesium (Mg), tin (Sn) and zinc metals such as (Zn).Wherein, from the angle of the storage-stable of the difficulty that obtains and application composition, better be selected from the partial condensate of alkoxyl silicone, alkoxyl silicone and alkoxytitanium at least a.

As mentioned above, application composition be with the hydrolysis in organic solvent in the presence of slaine of these metal alkoxides, condensation and composition.This application composition comprises anti-precipitation agent.Anti-precipitation agent have when forming the coating tunicle, prevent from filming in the effect of precipitating metal salt.

Comprise in the application composition under the situation of alkoxytitanium composition, it is desirable to comprise in the organic solvent aklylene glycol class or its monoether with the effect that makes the alkoxytitanium stable components.

Manufacturing comprises under the situation of application composition of alkoxytitanium composition, stablize and improve the storage-stable of application composition in order to make alkoxytitanium, behind alkoxytitanium and aklylene glycol class or its monoether mixed stability, alkoxytitanium is mixed hydrolysis in the presence of slaine, condensation separately or with alkoxyl silicone.

Comprise in the application composition under the situation of these two kinds of compositions of alkoxytitanium and alkoxyl silicone, better be with alkoxyl silicone after hydrolysis in the presence of the slaine, mix in advance by sneaking into glycols or its monoether class realizes stable alkoxytitanium.

The used metal alkoxide of application composition is represented with general formula (I).

M(OR) _n……(Ⅰ)

In the formula, M represents metal, and R represents the alkyl of C1～C5, and n represents the valence mumber of M.

Particularly alkoxyl silicone or its partial condensate adopt and to be selected from more than a kind or 2 kinds at least a with the compound of general formula (III) expression and partial condensate (pentamer is following).

Si(OR’) ₄……(III)

In the formula, the alkyl of R ' expression C1～C5.

In addition, alkoxytitanium or its partial condensate adopt and to be selected from more than a kind or 2 kinds at least a with the compound of general formula (IV) expression and partial condensate (pentamer is following).

Ti(OR”) ₄……(Ⅳ)

In the formula, R " alkyl of expression C1～C5.

The used slaine of application composition can exemplify and be selected from least a with the compound of general formula (II) expression.

M ₂(X) _m……(Ⅱ)

In the formula, M ₂The expression metal, X represents chlorine, nitric acid, sulfuric acid, acetic acid, ethane diacid, sulfaminic acid, sulfonic acid, acetoacetate, acetylacetonate or their basic salt, m represents M ₂Valence mumber.

Used slaine can exemplify and comprise the slaine at least a and oxalate of used metal in following (II-1) that is selected from the compound of following (II-1) expression in the particularly preferred above-mentioned application composition.

M ₂(X) _m……(Ⅱ-1)

Metal M as above-mentioned slaine with general formula (II) expression ₂, better be selected from aluminium (Al), indium (In), zinc (Zn), zirconium (Zr), bismuth (Bi), lanthanum (La), tantalum (Ta), yttrium (Y) and cerium (Ce) at least a.

In the compound shown in above-mentioned, good especially is metal nitrate, metal chloride salt, metal oxalate and basic salt thereof.Wherein, from the angle of the storage-stable of the difficulty that obtains and application composition, better be the metal nitrate of aluminium, indium, cerium etc.

As organic solvent used in the application composition, can exemplify alcohols such as methyl alcohol, ethanol, n-propanol, isopropyl alcohol, normal butyl alcohol, isobutyl alcohol and the tert-butyl alcohol, ester classes such as ethyl acetate, glycols and ester derivants thereof such as ethylene glycol, ethers such as diethyl ether, ketones such as acetone, methyl ethyl ketone and cyclohexanone, perhaps benzene and toluene etc. are aromatic hydrocarbon based etc.; They can be used alone or in combination.

Comprise in the application composition under the situation of alkoxytitanium composition, as aklylene glycol class contained in the organic solvent or its monoether, can exemplify for example ethylene glycol, diethylene glycol, propylene glycol, hexanediol and their monomethyl ether, single ether, single propyl ether, monobutyl ether or monophenyl ether etc.

If contained glycols or its monoether mol ratio of organic solvent used in the application composition is lower than 1 with respect to alkoxytitanium, then the effect for the stability of alkoxytitanium is low, the storage-stable variation of coating composition.On the other hand, use glycols or its monoether can not cause any problem in a large number.For example, used organic solvent can all be above-mentioned glycols or its monoether in the application composition.Yet application composition does not contain under the situation of alkoxytitanium, does not need above-mentioned glycol and/or its monoether especially.

Contained anti-precipitation agent prevents that when forming the coating tunicle slaine from separating out in film in the application composition.As anti-precipitation agent, can exemplify and be selected from least a of N-methyl pyrrolidone, dimethyl formamide, dimethyl acetamide, ethylene glycol, diethylene glycol, propylene glycol, hexanediol and their derivant, can use more than wherein at least a.

Anti-precipitation agent ratio with (anti-precipitation agent)/(metal oxide) 〉=1 (weight ratio) when the metal with slaine is scaled metal oxide is used.If weight ratio is lower than 1, the anti-effect of separating out of the slaine when then forming the coating tunicle reduces.On the other hand, use a large amount of anti-precipitation agents can not have any impact to application composition.

Anti-precipitation agent can be hydrolyzed in the presence of slaine at metal alkoxide, particularly alkoxyl silicone, alkoxytitanium or alkoxyl silicone and alkoxytitanium, add during condensation reaction, also can finish the back in hydrolysis, condensation reaction and add.

Metallic atom (the M of contained metal alkoxide in the application composition ₁) with the metallic atom (M of slaine ₂) to contain proportional the conversion with mol ratio better be to satisfy 0.01≤M ₂/ (M ₁+ M ₂The relation of)≤0.7.If should be worth less than 0.01, then the physical strength deficiency of the tunicle of gained is therefore undesirable.On the other hand, if surpass 0.7, then the adaptation for the metal oxide layer of the base material of glass substrate and transparency electrode etc. descends.In addition, under the situation of burning till under the low temperature below 450 ℃, the tendency that also exists the chemical-resistant of the metal oxide layer of gained to descend.In the application composition there be under the multiple situation metallic atom of contained metal alkoxide, above-mentioned metallic atom (M ₁) refer to the summation of multiple metallic atom, and in the application composition there be under the multiple situation metallic atom of contained slaine, above-mentioned metallic atom (M ₂) refer to the summation of multiple metallic atom

For the solid component concentration in the application composition, under the situation as the metal oxide conversion, better be the scope of 0.5～20wt% in solid component meter with metal alkoxide and slaine.If solid constituent surpasses 20wt%, the film thickness monitoring difficulty of the not only storage-stable variation of application composition, and metal oxide layer.On the other hand, solid constituent is when 0.5wt% is following, and the thickness attenuation of the metal oxide layer of gained for the thickness that obtains to stipulate, need repeatedly be coated with.

Application composition is with M (OR) _nMetal alkoxide hydrolysis in organic solvent under the existence of slaine (for example, aluminium salt), condensation of expression and composition.It better is 2～24 that the used water yield of the hydrolysis of alkoxyl silicone, alkoxytitanium or alkoxyl silicone and alkoxytitanium converts with mol ratio with respect to the total mole number of alkoxyl silicone, alkoxytitanium or alkoxyl silicone and alkoxytitanium.Be more preferably 2～20.Mol ratio (water yield (mole)/(total mole number of metal alkoxide)) is under the situation below 2, and the hydrolysis deficiency of metal alkoxide makes film forming decline or the intensity of the metal oxide coating of gained is descended, so undesirable.In addition, mol ratio is greater than under 24 the situation, and polycondensation continues to carry out, and storage-stable is descended, so undesirable.

Use under the situation of other metal alkoxide too.

Using under the situation of other metal alkoxide, for the addition of water, also better is to select same condition.

In the hydrolytic process during preparation application composition, the slaine of coexistence (for example, aluminium salt) is under the situation of moisture salt, and its contained humidity participates in reaction, therefore for the water yield that is used for hydrolysis, must consider the contained moisture of slaine (for example, aluminium salt).

Application composition is the composition that metal alkoxide hydrolysis, condensation are made, and by selecting the composition of metal alkoxide, the refractive index of the metal oxide layer of gained can be adjusted in the specialized range.For example, metal alkoxide is selected under the situation of alkoxyl silicone and alkoxytitanium, by adjusting its blending ratio, and can be in specialized range described later, be specially the refractive index of adjusting the metal oxide layer of gained in 1.45～2.1 the scope.

In other words, if can determine the coating application composition and the refractive index that requires of metal oxide layer after burning till, then can determine the constitutive molar ratio of alkoxyl silicone and alkoxytitanium according to this refractive index.This constitutive molar ratio is arbitrarily, for example by only with the alkoxyl silicone hydrolysis and the refractive index of the metal oxide layer that obtains of application composition be about 1.45 value.In addition, by only with the alkoxytitanium hydrolysis and the refractive index of the metal oxide layer that obtains of application composition be about 2.1 value.Therefore, wish that refractive index with metal oxide layer is set under the situation in 1.45～2.1 the scope, can adopt alkoxyl silicone and alkoxytitanium make application composition with the regulation ratio corresponding to the refractive index value in this scope.

In addition, by using other metal alkoxide, also can realize the adjustment of refractive index of the metal oxide layer of gained.

In addition, for the refractive index of metal oxide layer, except the composition condition, also may be selected to the film condition and adjust.By such adjustment, can in the high rigidity that realizes metal oxide layer, realize required refractive index value.

That is, filming of application composition burnt till to make under the situation of metal oxide layer, the refractive index of metal oxide layer changes according to its firing temperature.Under this situation, firing temperature is more high, and then the refractive index of metal oxide layer is more high.Therefore, by firing temperature being chosen as suitable value, can realize the adjustment of refractive index of the metal oxide layer of gained.In addition, consider under the stable on heating situation of other contact panel member of formation that firing temperature better is in 100 ℃～300 ℃ scope, is more preferably in 150 ℃～250 ℃ scope.

In addition, application composition comprises under the situation of alkoxytitanium, if burn till before to the irradiation ultraviolet radiation of filming (UV), then the refractive index of the metal oxide layer of gained can change.Specifically, ultraviolet irradiation amount is more big, and then the refractive index of metal oxide layer is more high.Therefore, can realize required refractive index by selecting whether carry out the ultraviolet ray irradiation.In the metal oxide layer, can realize by the selection of conditions such as composition can not carrying out the ultraviolet ray irradiation under the situation of required refractive index.In addition, carry out to adjust the refractive index of metal oxide layer by selecting its exposure under the situation of ultraviolet ray irradiation.In the metal oxide layer, need the ultraviolet ray irradiation to obtain for example can use high-pressure sodium lamp under the situation of required refractive index.In addition, use under the situation of high-pressure sodium lamp, converting with 365nm better is that total illumination is at 1000mJ/cm ²Above exposure is more preferably 3000mJ/cm ²～10000mJ/cm ²Exposure.In addition, the UV light source does not have and specifies, and can use other UV light source yet.Use under the situation of other light source, irradiation accumulative total light quantity of same amount when using above-mentioned high-pressure sodium lamp gets final product.

Yet particularly application composition comprises under the situation of alkoxytitanium composition, has the character that viscosity rises gradually under room temperature preservation.Though actual use aspect is not worried causing serious problem, under the situation of accurate control metal oxide layer thickness, must manage cautiously temperature etc.The increase of the above-mentioned proportion of composing along with the alkoxytitanium in the application composition of such viscosity and become remarkable.This is considered to because with respect to alkoxyl silicone, the hydrolysis rate of alkoxytitanium is faster, and condensation reaction is cause faster.

Application composition comprises under the situation of alkoxytitanium composition, changes in order to reduce viscosity, and 2 kinds of following method for makings are effective.

1) alkoxytitanium is fully mixed glycols and alkoxytitanium during hydrolysis in advance in the presence of slaine after, mix with alkoxyl silicone as required, in the presence of organic solvent, be hydrolyzed.Thus, can obtain viscosity and change little application composition.

1) method for making is considered to effective reason: can generate heat when alkoxytitanium is mixed with glycols, thereby between the alkoxy of alkoxytitanium and the glycols ester exchange reaction take place, hydrolysis, condensation reaction trend are stablized.

2) alkoxyl silicone is hydrolyzed after the reaction in the presence of slaine, it is mixed in the alkoxytitanium solution that has mixed with glycols carries out condensation reaction, obtain application composition.Thus, can obtain viscosity and change little application composition.

2) method for making is considered to effective reason: the hydrolysis reaction of alkoxyl silicone carries out fast, but condensation reaction thereafter is slower than alkoxytitanium.Therefore, if add alkoxytitanium rapidly after finishing hydrolysis reaction, the silanol group and the alkoxytitanium that have then carried out the alkoxyl silicone of hydrolysis reaction react equably.Thus, hydrolysis alkoxyl silicone make the condensation reaction trend of alkoxytitanium stable.

Attempted the method that the alkoxyl silicone with hydrolysis in advance mixes with alkoxytitanium.But the organic solvent that is used for reaction does not contain under the situation of glycols, can't obtain the good application composition of storage-stable.In addition, the method 2) is also useful under the situation that is obtained application composition by other metal alkoxide with hydrolysis rate fast and alkoxyl silicone.

More than Shuo Ming application composition can adopt the rubbing method formation of general enforcement to film, and makes metal oxide layer then.As rubbing method, can use for example dip coating, spin-coating method, spraying process, spread coating, roller transfer method, silk screen print method, ink-jet method or hectographic printing method etc.Wherein, good especially is ink-jet method and the hectographic printing method that is suitable for the pattern printing.

Embodiment

Below, the present invention will be described in more detail according to embodiment, but the present invention is not limited in these embodiment.

[abbreviation of using among the embodiment]

The implication of the abbreviation of using among the following embodiment etc. is as follows.

TEOS: tetraethoxysilane

TIPT: tetraisopropoxy titanium

ZTB: four n-butoxy zirconiums

AN: aluminium nitrate nonahydrate

CeN: cerous nitrate hexahydrate

InN: indium nitrate trihydrate

EG: ethylene glycol

HG:2-methyl-2,4-pentanediol (another name: hexanediol)

BCS:2-butyl cellosolve (another name: butyl cellosolve)

＜synthesis example 1〉(application composition K1's is synthetic)

Add AN12.8g in the flask of 200mL capacity, water 3.0g stirs, and obtains the aqueous solution of AN.Add EG13.7g, HG48.8g, BCS37.1g in the aqueous solution of this AN and as the TEOS31.1g of alkoxyl silicone, stirred at ambient temperature 30 minutes, obtain A liquid.

Add the TIPT4.7g as alkoxytitanium in the flask of 300mL capacity, to wherein adding HG48.8g, stirred at ambient temperature 30 minutes, obtain B liquid.

Then, above-mentioned A liquid is mixed with B liquid, stirred at ambient temperature 30 minutes.Thus, obtain application composition K1.

＜synthesis example 2〉(application composition K2's is synthetic)

Add AN12.1g in the flask of 200mL capacity, water 2.8g stirs, and obtains the aqueous solution of AN.Add EG13.7g, HG57.7g, BCS37.2g in the aqueous solution of this AN and as the TEOS22.9g of alkoxyl silicone, stirred at ambient temperature 30 minutes, obtain C liquid.

Add the TIPT13.4g as alkoxytitanium in the flask of 300mL capacity, to wherein adding HG40.2g, stirred at ambient temperature 30 minutes, obtain D liquid.

Then, above-mentioned C liquid is mixed with D liquid, stirred at ambient temperature 30 minutes.Thus, obtain application composition K2.

＜synthesis example 3〉(application composition K3's is synthetic)

Add AN11.7g in the flask of 200mL capacity, water 2.8g stirs, and obtains the aqueous solution of AN.Add EG13.7g, HG46.0g, BCS37.3g in the aqueous solution of this AN and as the TEOS19.1g of alkoxyl silicone, stirred at ambient temperature 30 minutes, obtain E liquid.

Add the TIPT17.4g as alkoxytitanium in the flask of 300mL capacity, to wherein adding HG52.1g, stirred at ambient temperature 30 minutes, obtain F liquid.

Then, above-mentioned E liquid is mixed with F liquid, stirred at ambient temperature 30 minutes.Thus, as metal alkoxide, obtain application composition K3.

＜synthesis example 4〉(application composition K4's is synthetic)

Add AN11.5g in the flask of 200mL capacity, water 2.7g stirs, and obtains the aqueous solution of AN.Add EG13.7g, HG34.5g, BCS37.3g in the aqueous solution of this AN and as the TEOS15.6g of alkoxyl silicone, stirred at ambient temperature 30 minutes, obtain G liquid.

Add the TIPT21.2g as alkoxytitanium in the flask of 300mL capacity, to wherein adding HG63.6g, stirred at ambient temperature 30 minutes, obtain H liquid.

Then, above-mentioned G liquid is mixed with H liquid, stirred at ambient temperature 30 minutes.Thus, obtain application composition K4.

＜synthesis example 5〉(application composition K4-1's is synthetic)

Add InN9.2g in the flask of 200mL capacity, water 2.3g stirs, and obtains the aqueous solution of InN.Add EG14.6g, HG41.6g, BCS39.5g in the aqueous solution of this InN and as the TEOS15.9g of alkoxyl silicone, stirred at ambient temperature 30 minutes, obtain I liquid.

Add the TIPT14.4g as alkoxytitanium in the flask of 300mL capacity, to wherein adding HG62.4g, stirred at ambient temperature 30 minutes, obtain J liquid.

Then, above-mentioned I liquid is mixed with J liquid, stirred at ambient temperature 30 minutes.Thus, as metal alkoxide, obtain application composition K-1.

＜synthesis example 6〉(application composition K4-2's is synthetic)

Add CeN10.3g in the flask of 200mL capacity, water 2.1g stirs, and obtains the aqueous solution of CeN.Add EG14.7g, HG42.1g, BCS40.0g in the aqueous solution of this CeN and as the TEOS14.5g of alkoxyl silicone, stirred at ambient temperature 30 minutes, obtain K liquid.

Add the TIPT13.2g as alkoxytitanium in the flask of 300mL capacity, to wherein adding HG62.4g, stirred at ambient temperature 30 minutes, obtain L liquid.

Then, above-mentioned K liquid is mixed with L liquid, stirred at ambient temperature 30 minutes.Thus, as metal alkoxide, obtain application composition K-2.

＜synthesis example 7〉(application composition K4-3's is synthetic)

Add AN8.5g in the flask of 200mL capacity, water 2.0g stirs, and obtains the aqueous solution of AN.Add EG14.3g, HG40.8g, BCS38.7g in the aqueous solution of this AN and as the TEOS9.2g of alkoxyl silicone, stirred at ambient temperature 30 minutes, obtain M liquid.

Add the ZTB25.4g as zirconium alkoxide in the flask of 300mL capacity, to wherein adding HG61.2g, stirred at ambient temperature 30 minutes, obtain N liquid.

Then, above-mentioned M liquid is mixed with N liquid, stirred at ambient temperature 30 minutes.Thus, as metal alkoxide, obtain application composition K-3.

＜synthesis example 8〉(application composition K5's is synthetic)

Add AN15.5g in the flask of 300mL capacity, water 8.9g stirs, and obtains the aqueous solution of AN.Add EG13.0g, HG93.0g, BCS35.3g in the aqueous solution of this AN and as the TEOS34.3g of alkoxyl silicone, stirred at ambient temperature 30 minutes.Thus, obtain application composition K5.

＜synthesis example 9〉(application composition K6's is synthetic)

Add AN11.2g in the flask of 200mL capacity, water 2.6g stirs, and obtains the aqueous solution of AN.Add EG13.7g, HG23.9g, BCS37.4g in the aqueous solution of this AN and as the TEOS12.1g of alkoxyl silicone, stirred at ambient temperature 30 minutes, obtain I liquid.

Add the TIPT24.8g as alkoxytitanium in the flask of 300mL capacity, to wherein adding HG74.4g, stirred at ambient temperature 30 minutes, obtain J liquid.

Then, above-mentioned I liquid is mixed with J liquid, stirred at ambient temperature 30 minutes.Thus, obtain application composition K6.

Below, the example that uses above-mentioned application composition K1～K6 to form the film build method of metal oxide layer is described.Simultaneously, also to describing in the method for substrate formation as the acrylic film of the comparison other of metal oxide layer.

＜film build method I 〉

Use above-mentioned application composition, with the membrane filter pressure filtration of aperture 0.5 μ m, on substrate, film by spin-coating method formation.This substrate was carried out drying in 3 minutes in the heating plate heating that is set at 60 ℃.Then, move in the heated air circulation type baking oven that is set at 200 ℃, burnt till 30 minutes.Thus, form the film (that is, also metal oxide layer being called the film of metal oxide, down together) of metal oxide at substrate.

＜film build method II 〉

Use above-mentioned application composition, with the membrane filter pressure filtration of aperture 0.5 μ m, on substrate, film by spin-coating method formation.This substrate was carried out drying in 3 minutes in the heating plate heating that is set at 60 ℃.Then, use ultraviolet lamp (Ai Yi figure Co., Ltd. (アイグラ Off ィッ Network society) system, UB011-3A type), use high-pressure sodium lamp (input power supply 1000W) with 50mW/cm ²The light intensity of (wavelength 365nm conversion) is carried out 2 minutes ultraviolet ray irradiation.Ultraviolet irradiation amount is 6000mJ/cm ²After the ultraviolet ray irradiation, move in the heated air circulation type baking oven that is set at 200 ℃, burnt till 30 minutes.Thus, form the film of metal oxide at substrate.

＜film build method III 〉

The film build method III is in the method for substrate formation as the acrylic film of the comparison other of the film of metal oxide.

Use is used to form the acryhic material composition (K7) of acrylic film, with the membrane filter pressure filtration of aperture 0.5 μ m, films by spin-coating method formation on substrate.This substrate was carried out drying in 2 minutes in the heating plate heating that is set at 90 ℃.Then, move in the heated air circulation type baking oven that is set at 200 ℃, burnt till 30 minutes.Thus, form acrylic film at substrate.

The evaluation of＜refractive index 〉

Use above-mentioned application composition K1～K6, substrate uses silicon substrate (100), adopt above-mentioned film build method I, film build method II or film build method III, form the film (KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3, KM1 and KM2) of metal oxide at silicon substrate.

In addition, use acryhic material composition K7, substrate uses silicon substrate (100), adopts above-mentioned film build method III, forms acrylic film (KM3) at silicon substrate.

Use these substrates, and the employing ellipsometer test (ditch buttocks optics industry institute of Co., Ltd. (society of Ditch buttocks optics industry institute) system, DVA-FLVW), the refractive index when measuring wavelength 633nm.

The evaluation result of the refractive index of the film of metal oxide (KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3, KM1 and KM2) and acrylic film (KM3) is shown in table 1.By this table as can be known, the refractive index of acrylic film is 1.50.

The film build method (I～III) that the film forming of each film adopts is represented in the record on the film build method hurdle in the table 1.

The evaluation of＜hardness 〉

For the hardness of the film of metal oxide, estimated pencil hardness.

Use above-mentioned application composition K1～K6, substrate uses the glass substrate of band ITO, adopt above-mentioned film build method I, film build method II or film build method III, form the film (KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3, KL5, KM1 and KM2) of metal oxide at substrate.

In addition, use acryhic material composition K7, substrate uses the glass substrate of band ITO, adopts above-mentioned film build method III, forms acrylic film (KM3) at the glass substrate of being with ITO.

Use these substrates, estimate pencil hardness based on test method(s) (JIS K5400).

The evaluation result of the pencil hardness of the film of metal oxide (KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3, KM1 and KM2) and acrylic film (KM3) is shown in table 1.By this table as can be known, the pencil hardness of acrylic film (KM3) is 3H, and (KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3, KM1 and KM2) is low for the film of hardness ratio metal oxide.

[table 1]

Film	Application composition	Film-forming method	Refractive index	Pencil hardness
					KL1	K1	II	1.52	9H
KL2	K2	II	1.55	9H
					KL3	K3	II	1.60	8H
KL4	K4	I	1.65	8H
					KL5	K4	II	1.70	8H
KL5-1	K4-1	II	1.60	9H
					KL5-2	K4-2	II	1.60	8H
KL5-3	K4-2	I	1.60	7H
					KM1	K5	I	1.48	9H
KM2	K6	II	1.75	7H
					KM3	K7	III	1.50	3H

＜transparent conductive film substrate 〉

Preparation is formed with the transparent conductive film substrate of the nesa coating that forms through pattern at substrate.Substrate uses glass substrate, and nesa coating uses ITO.As this transparent conductive film substrate, can use transparent conductive film substrate 14 used in the contact panel 1 of above-mentioned present embodiment.Preparing the identical and thickness of the pattern of ITO here, is 2 kinds of different transparent conductive film substrates of 28nm and 75nm.

＜embodiment 1 〉

The thickness that is formed in ITO is to form the substrate that the film KL1 of metal oxide gets with the thickness of 70nm on the transparent conductive film substrate of 28nm.Be coated with optical cement at this substrate, the soda-lime glass substrate of bonding 0.7mm.Then, use ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A type), use high-pressure sodium lamp (input power supply 1000W) with 50mW/cm ²The light intensity of (wavelength 365nm conversion) is carried out 80 seconds ultraviolet ray irradiation.Thus, optical cement is solidified, make the contact panel of estimating usefulness.

＜embodiment 2 and 3 〉

Except the thickness of the film KL1 of metal oxide is 80nm (embodiment 2) and 90nm (embodiment 3), make the contact panel of estimating usefulness by method similarly to Example 1.

＜embodiment 4 〉

Be formed on the transparent conductive film substrate that the ITO thickness is 28nm the substrate that film KL2 that thickness with 70nm forms metal oxide gets.Be coated with optical cement at this substrate, the glass blank of bonding 0.7mm (Japanese: plain ガラス).Then, use ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A type), use high-pressure sodium lamp (input power supply 1000W) with 50mW/cm ²The light intensity of (wavelength 365nm conversion) is carried out 80 seconds ultraviolet ray irradiation.Thus, optical cement is solidified, make the contact panel of estimating usefulness.

＜embodiment 5 and 6 〉

Except the thickness of the film KL2 of metal oxide is 80nm (embodiment 5) and 90nm (embodiment 6), make the contact panel of estimating usefulness by method similarly to Example 4.

＜embodiment 7 〉

Be formed on the transparent conductive film substrate that the ITO thickness is 28nm the substrate that film KL3 that thickness with 50nm forms metal oxide gets.Be coated with optical cement at this substrate, the glass blank of bonding 0.7mm.Then, use ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A type), use high-pressure sodium lamp (input power supply 1000W) with 50mW/cm ²The light intensity of (wavelength 365nm conversion) is carried out 80 seconds ultraviolet ray irradiation.Thus, optical cement is solidified, make the contact panel of estimating usefulness.

＜embodiment 8～11 〉

Except the thickness of the film KL3 of metal oxide is 70nm (embodiment 8), 80nm (embodiment 9), 120nm (embodiment 10) and 150nm (embodiment 11), make the contact panel of estimating usefulness by method similarly to Example 7.

＜embodiment 12 〉

Be formed on the transparent conductive film substrate that the ITO thickness is 28nm the substrate that film KL4 that thickness with 80nm forms metal oxide gets.Be coated with optical cement at this substrate, the glass blank of bonding 0.7mm.Then, use ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A type), use high-pressure sodium lamp (input power supply 1000W) with 50mW/cm ²The light intensity of (wavelength 365nm conversion) is carried out 80 seconds ultraviolet ray irradiation.Thus, optical cement is solidified, make the contact panel of estimating usefulness.

＜embodiment 13 〉

Except the thickness of the film KL4 of metal oxide is 100nm, make the contact panel of estimating usefulness by method similarly to Example 12.

＜embodiment 14 〉

Be formed on the transparent conductive film substrate that the ITO thickness is 75nm the substrate that film KL4 that thickness with 100nm forms metal oxide gets.Be coated with optical cement at this substrate, the glass blank of bonding 0.7mm.Then, use ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A type), use high-pressure sodium lamp (input power supply 1000W) with 50mW/cm ²The light intensity of (wavelength 365nm conversion) is carried out 80 seconds ultraviolet ray irradiation.Thus, optical cement is solidified, make the contact panel of estimating usefulness.

＜embodiment 15 〉

Be formed on the transparent conductive film substrate that the ITO thickness is 75nm the substrate that film KL5 that thickness with 100nm forms metal oxide gets.Be coated with optical cement at this substrate, the glass blank of bonding 0.7mm.Then, use ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A type), use high-pressure sodium lamp (input power supply 1000W) with 50mW/cm ²The light intensity of (wavelength 365nm conversion) is carried out 80 seconds ultraviolet ray irradiation.Thus, optical cement is solidified, make the contact panel of estimating usefulness.

＜embodiment 16 〉

Be formed on the transparent conductive film substrate that the ITO thickness is 28nm the substrate that film KL5-1 that thickness with 100nm forms metal oxide gets.Be coated with optical cement at this substrate, the glass blank of bonding 0.7mm.Then, use ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A type), use high-pressure sodium lamp (input power supply 1000W) with 50mW/cm ²The light intensity of (wavelength 365nm conversion) is carried out 80 seconds ultraviolet ray irradiation.Thus, optical cement is solidified, make the contact panel of estimating usefulness.

＜embodiment 17 〉

Be formed on the transparent conductive film substrate that the ITO thickness is 28nm the substrate that film KL5-2 that thickness with 100nm forms metal oxide gets.Be coated with optical cement at this substrate, the glass blank of bonding 0.7mm.Then, use ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A type), use high-pressure sodium lamp (input power supply 1000W) with 50mW/cm ²The light intensity of (wavelength 365nm conversion) is carried out 80 seconds ultraviolet ray irradiation.Thus, optical cement is solidified, make the contact panel of estimating usefulness.

＜embodiment 18 〉

Be formed on the transparent conductive film substrate that the ITO thickness is 28nm the substrate that film KL5-3 that thickness with 100nm forms metal oxide gets.Be coated with optical cement at this substrate, the glass blank of bonding 0.7mm.Then, use ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A type), use high-pressure sodium lamp (input power supply 1000W) with 50mW/cm ²The light intensity of (wavelength 365nm conversion) is carried out 80 seconds ultraviolet ray irradiation.Thus, optical cement is solidified, make the contact panel of estimating usefulness.

＜comparative example 1 〉

Be on the transparent conductive film substrate of 28nm at the ITO thickness, do not form the film of metal oxide, directly be coated with optical cement, the glass blank of bonding 0.7mm.Then, use ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A type), use high-pressure sodium lamp (input power supply 1000W) with 50mW/cm ²The light intensity of (wavelength 365nm conversion) is carried out 80 seconds ultraviolet ray irradiation.Thus, optical cement is solidified, make the evaluation contact panel of the layer with metal oxide.

＜comparative example 2 〉

Be on the transparent conductive film substrate of 75nm at the ITO thickness, do not form the film of metal oxide, directly be coated with optical cement, the glass blank of bonding 0.7mm.Then, use ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A type), use high-pressure sodium lamp (input power supply 1000W) with 50mW/cm ²The light intensity of (wavelength 365nm conversion) is carried out 80 seconds ultraviolet ray irradiation.Thus, optical cement is solidified, make the evaluation contact panel of the layer with metal oxide.

＜comparative example 3 〉

Except the thickness of the film KL4 of metal oxide is 30nm, make the contact panel of estimating usefulness by method similarly to Example 12.

＜comparative example 4 〉

Be formed on the transparent conductive film substrate that the ITO thickness is 28nm the substrate that film KM1 that thickness with 100nm forms metal oxide gets.Be coated with optical cement at this substrate, the glass blank of bonding 0.7mm.Then, use ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A type), use high-pressure sodium lamp (input power supply 1000W) with 50mW/cm ²The light intensity of (wavelength 365nm conversion) is carried out 80 seconds ultraviolet ray irradiation.Thus, optical cement is solidified, make the contact panel of estimating usefulness.

＜comparative example 5 〉

Be formed on the transparent conductive film substrate that the ITO thickness is 28nm the substrate that film KM2 that thickness with 100nm forms metal oxide gets.Be coated with optical cement at this substrate, the glass blank of bonding 0.7mm.Then, use ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A type), use high-pressure sodium lamp (input power supply 1000W) with 50mW/cm ²The light intensity of (wavelength 365nm conversion) is carried out 80 seconds ultraviolet ray irradiation.Thus, optical cement is solidified, make the contact panel of estimating usefulness.

＜comparative example 6 〉

Be formed on the transparent conductive film substrate that the ITO thickness is 75nm the substrate that film KM2 that thickness with 100nm forms metal oxide gets.Be coated with optical cement at this substrate, the glass blank of bonding 0.7mm.Then, use ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A type), use high-pressure sodium lamp (input power supply 1000W) with 50mW/cm ²The light intensity of (wavelength 365nm conversion) is carried out 80 seconds ultraviolet ray irradiation.Thus, optical cement is solidified, make the contact panel of estimating usefulness.

＜comparative example 7 〉

The thickness that is formed on the transparent conductive film substrate that the ITO thickness is 75nm with 2 μ m forms the substrate that acrylic film KM3 gets.Be coated with optical cement at this substrate, the glass blank of bonding 0.7mm.Then, use ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A type), use high-pressure sodium lamp (input power supply 1000W) with 50mW/cm ²The light intensity of (wavelength 365nm conversion) is carried out 80 seconds ultraviolet ray irradiation.Thus, optical cement is solidified, make the evaluation contact panel that is formed with acrylic film.

The evaluation of＜adaptation 〉

Among embodiment 1～embodiment 18, make to estimate when using contact panel, use the film that is formed with metal oxide made in its process (substrate of KL1～KL5).For the film of each metal oxide on this transparent conductive film substrate, carry out disbonded test according to the cross patterning method of the adaptation of JIS K5600, estimate adaptation.

Similarly, in comparative example 3～comparative example 7, make to estimate when use contact panel, use the film that is formed with metal oxide (KL4, KM1 and KM2) made in its process and the substrate of acrylic film (KM3), the evaluation adaptation.

The evaluation of＜electrode pattern visible level 〉

Use the evaluation contact panel of making in embodiment 1～embodiment 18 and the comparative example 1～comparative example 7, carry out the evaluation of visible level of the electrode pattern of ITO.

Each contact panel is placed on the black cloth, under the state of top irradiates light, is observing by naked eyes.Among the result who observes, the sightless contact panel of electrode pattern is estimated ◎ as＜electrode pattern visible level 〉.In addition, visible electrode pattern, but the comparative example 1 that does not have the film of metal oxide on its degree and the ITO film is compared improved contact panel conduct＜electrode pattern visible level and is estimated zero with the contact panel of comparative example 2 〉.In addition, estimate △ with the equal contact panel conduct of the contact panel of comparative example 1 and comparative example 2＜electrode pattern visible level 〉, be evaluated as with comparative example 1 is compared ITO with the contact panel of comparative example 2 the more obvious contact panel of electrode pattern＜*.

The result that the evaluation that gathers embodiment 1～embodiment 18 and comparative example 1～comparative example 7 is estimated with the electrode pattern visible level of contact panel is shown in table 2 with the evaluation result of above-mentioned adaptation.

[table 2]

As can be known in the contact panel of embodiment 1～embodiment 15, the result that the electrode pattern visible level is estimated is good, though electrode pattern is invisible or as seen its degree compare with the comparative example of the film that does not have metal oxide and improve.Therefore, by forming refractive index and thickness in transparency electrode through the film of the metal oxide of adjustment, the visible level of electrode pattern improves, and can make electrode outstanding.In addition, also as can be known the adaptation of the film of each metal oxide than acrylic film height.

As shown in Table 2, if adopt embodiment 1～embodiment 15, then can obtain to reduce outstanding and the contact panel that display performance that cause descends of transparent electrode pattern.The contact panel 1,101,201,301,401 of the present embodiment that the projecting degree of transparent electrode pattern is inhibited more particularly, can be provided.

The possibility of utilizing on the industry

The electrode pattern of contact panel of the present invention is not outstanding, and the adaptation between member of formation is also good.Therefore, can be used as the display device contact panel that requires good surface appearance and high reliability.

Quote all the elements of Japanese patent application 2010-240080 number instructions, claims, accompanying drawing and the summary of filing an application on October 26th, 2010 here as the announcement of instructions of the present invention.

The explanation of symbol

1,101,201,301,401 contact panels

2,102,402 substrates

3,103,203,303,403 first transparency electrodes

4,104,204,304,404 second transparency electrodes

5,6,105,106,205,206,305,306,405,406 metal oxide layers

7,107,207 coverlays

9,108,109,208,209,308,408 transparent adhesivess

10,110,210,310,410 display panels

11 lead-out wirings

14 transparent conductive film substrates

18 cross parts

19 interlayer dielectrics

20 bridging electrodes

21 bothridium portions

212,312 second substrates

The 407 outer coatings of covering.

Claims

1. contact panel, it is the capacitance type touch-control panel that is formed with the pattern of transparency electrode at the operating area of transparency carrier, it is characterized in that,

Will be with following general formula (I)

M ₁(OR) _n ……(Ⅰ)

The metal alkoxide of expression

With following general formula (II)

M ₂(X) _m ……(Ⅱ)

Anti-precipitation agent is added in hydrolysis in organic solvent under the existence of the slaine of expression, condensation again, and the layer of the metal oxide that will be formed by the application composition of gained is disposed on the described transparency electrode and makes;

2. contact panel, it is the capacitance type touch-control panel that is formed with the pattern of transparency electrode at the operating area of transparency carrier, it is characterized in that,

Will be with following general formula (I)

M ₁(OR) _n ……(Ⅰ)

The metal alkoxide of expression

With following general formula (II-1)

M ₂(X) _m ……(Ⅱ-1)

With hydrolysis in organic solvent under the existence of the slaine of representing with the oxalate of metal used in the formula (II-1), condensation, add anti-precipitation agent again, the layer of the metal oxide that will be formed by the application composition of gained is disposed on the described transparency electrode and makes;

3. contact panel as claimed in claim 1 or 2 is characterized in that, the metal M in the described general formula (I) ₁For being selected from least a of silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminium (Al), magnesium (Mg), tin (Sn) and zinc (Zn).

4. as each the described contact panel in the claim 1～3, it is characterized in that the metal M in described general formula (II) and (II-1) ₂For being selected from least a of aluminium (Al), indium (In), zinc (Zn), zirconium (Zr), bismuth (Bi), lanthanum (La), tantalum (Ta), yttrium (Y) and cerium (Ce).

5. as each the described contact panel in the claim 1～4, it is characterized in that the refractive index of the layer of described metal oxide is 1.50～1.70, the thickness of this layer is 40nm～170nm.

6. as each the described contact panel in the claim 1～5, it is characterized in that the refractive index of the layer of described metal oxide is 1.54～1.68, the thickness of this layer is 40nm～170nm.

7. as each the described contact panel in the claim 1～6, it is characterized in that described metal alkoxide is the potpourri of alkoxyl silicone or its partial condensate and alkoxytitanium.

8. as each the described contact panel in the claim 1～7, it is characterized in that described anti-precipitation agent is be selected from N-methyl pyrrolidone, ethylene glycol, dimethyl formamide, dimethyl acetamide, diethylene glycol, propylene glycol, hexanediol and their derivant at least a.

9. as each the described contact panel in the claim 1～8, it is characterized in that,

Metallic atom (the M of the metal alkoxide that described application composition is contained ₁) with the metallic atom (M of slaine ₂) mol ratio satisfy

0.01≤M ₂/(M ₁+M ₂)≤0.7。

10. as each the described contact panel in the claim 1～9, it is characterized in that described slaine is be selected from metal nitrate, metal sulfate, metal acetate, metal chloride, metal oxalate, metal amino sulfonate, metal sulfonate, metal acetyl acetate, metal acetylacetonates and their basic salt at least a.

11. each the described contact panel as in the claim 1～10 is characterized in that, described organic solvent comprises aklylene glycol or its monoether derivant.

12. each the described contact panel as in the claim 1～11 is characterized in that described transparency electrode has for detection of first transparency electrode of the position of 2 different directions and second transparency electrode at least.

13. contact panel as claimed in claim 12 is characterized in that, described first transparency electrode and described second transparency electrode are disposed at the same one side of described transparency carrier.

14. contact panel as claimed in claim 12 is characterized in that, described first transparency electrode and described second transparency electrode are disposed at the not coplanar of described transparency carrier respectively.