CN203366304U - Glass capacitive touch screen - Google Patents

Glass capacitive touch screen Download PDF

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Publication number
CN203366304U
CN203366304U CN 201320335108 CN201320335108U CN203366304U CN 203366304 U CN203366304 U CN 203366304U CN 201320335108 CN201320335108 CN 201320335108 CN 201320335108 U CN201320335108 U CN 201320335108U CN 203366304 U CN203366304 U CN 203366304U
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CN
China
Prior art keywords
layer
described
glass
index matching
refractive index
Prior art date
Application number
CN 201320335108
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Chinese (zh)
Inventor
唐根初
盛晨
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南昌欧菲光学技术有限公司
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Priority to CN 201320335108 priority Critical patent/CN203366304U/en
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Publication of CN203366304U publication Critical patent/CN203366304U/en

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Abstract

The utility model discloses a glass capacitive touch screen which comprises a conducting glass module, a transparent glue layer and panel glass. The conducting glass module comprises a substrate, a transparent conducting layer arranged on the substrate, a light resistance insulating layer locally covering the transparent conducting layer, a metal covering the light resistance insulating layer, and a refractive index matching layer wholly covering the metal layer and the transparent conducting layer. The edge of the refractive index matching layer is in contact with the edge of the substrate, and the difference between the refractive index of the refractive index matching layer and the refractive index of the transparent conducting layer is smaller than 15% of the refractive index of the transparent conducting layer. The transparent glue layer is arranged on the conducting glass module, the panel glass covers the transparent glue layer, and the transparent flue layer glues the conducting glass module and the panel glass. According to the glass capacitive touch screen, due to the fact that the refractive index of the refractive index matching layer is similar to the refractive index of the transparent conducting layer, light cannot produce refraction effects on the interface between the refractive index matching layer and the transparent conducting layer easily, and visibility of patterns of the transparent conducting layer is low.

Description

Glass capacitive formula touch-screen

Technical field

The utility model relates to capacitive touch screen, particularly relates to a kind of glass capacitive formula touch-screen.

Background technology

Touch-screen is a kind of remarkable input equipment that improves man machine operation interface, have intuitively, simply, advantage efficiently.Touch-screen obtains a wide range of applications in many electronic products, such as mobile phone, PDA(personal digital assistant), multimedia, public information inquiry system etc.Wherein, capacitive touch screen has two large types, and the one, glass capacitive formula touch-screen, another kind of is the thin film capacitor type touch-screen.

Glass capacitive formula touch-screen is formed by the transparent optical glue laminating and is formed by face glass and electro-conductive glass.Electro-conductive glass assembly one side on glass substrate is coated with transparency conducting layer, and transparency conducting layer has the pattern of various shapes.Because the refractive index of transparency conducting layer and the refractive index of glass differ larger, significantly reflection and refraction occur in light between the two interface, cause the pattern of transparency conducting layer can be comparatively obvious, affect visual experience.

The utility model content

Based on this, be necessary to affect for transparency conducting layer the visual effect problem of touch-screen, a kind of glass capacitive formula touch-screen that reduces the conductive pattern observability is provided.

A kind of glass capacitive formula touch-screen comprises:

The electro-conductive glass assembly comprises:

Substrate;

Transparency conducting layer, be located on described substrate;

The photoresistance insulation course, part covers described transparency conducting layer;

Metal level, cover described photoresistance insulation course, and the edge of described metal level contacts with described transparency conducting layer; And

The index matching layer, cover described metal level and described transparency conducting layer fully, and the edge of described index matching layer and the edge contact of described substrate, the refractive index of described index matching layer and the refractive index of described transparency conducting layer differ and are less than 15% of described transparency conducting layer refractive index;

Substratum transparent, be located on described electro-conductive glass assembly; And

Face glass, cover on described substratum transparent, the bonding described electro-conductive glass assembly of described substratum transparent and described face glass.

In embodiment, described index matching layer is the single layer optical film therein.

In embodiment, described index matching layer is columbium oxide film or zirconia film or thin film of titanium oxide or tantalum oxide films therein.

In embodiment, the thickness of described index matching layer is 100~111nm therein.

In embodiment, described index matching layer is coating therein, and described coating is that niobium oxide particle or zirconia particles or titan oxide particles or tantalum oxide particles are uniformly distributed in and form in organic solvent.

In embodiment, the thickness of described index matching layer is less than 3 microns therein.

In embodiment, described transparency conducting layer is indium tin oxide layer therein, and described index matching layer is the niobium oxide layer, and the thickness of described niobium oxide layer is 101nm.

In embodiment, described transparency conducting layer is indium tin oxide layer therein, and described index matching layer is zirconia layer, and the thickness of described zirconia layer is 111nm.

In embodiment, the thickness of described substrate is 0.2~0.55mm therein, and the thickness of described face glass is 0.55~1.5mm, and the thickness of described substratum transparent is about 0.175mm, and the thickness of described index matching layer is 105~115nm.

Therein in embodiment; described electro-conductive glass assembly also comprises electrically conducting transparent screen layer and silicon dioxide layer of protection; described electrically conducting transparent screen layer is located on the side of described substrate away from described transparency conducting layer, and described silicon dioxide layer of protection is covered on described electrically conducting transparent screen layer.

In above-mentioned glass capacitive formula touch-screen, the refractive index of index matching layer and transparency conducting layer differs and is less than 15% of transparency conducting layer refractive index.Because the refractive index of index matching layer and transparency conducting layer is very approaching, light is difficult for refraction effect occurs on the two interface, makes the design pattern observability of transparency conducting layer reduce.Simultaneously, according to the anti-reflection film principle, thickness that can the design refractive indices matching layer, make the reflected light at upper and lower two interfaces interfere mutually and disappear, and intensity of reflected light dropped to minimum, further reduces the pattern observability of transparency conducting layer.

And the index matching layer also has rete compactness, resistance to chemical corrosion, the characteristics such as visible light permeability is good, can well protect the induction line on electro-conductive glass.Simultaneously, the method does not need specific installation, and the technical transform cost is low.

The accompanying drawing explanation

The structural representation of the glass capacitive formula touch-screen figure that Fig. 1 is an embodiment.

Embodiment

A kind of glass capacitive formula touch-screen 100 comprises electro-conductive glass assembly 110, face glass 120 and optical clear glue-line 130.Electro-conductive glass assembly 110 is made glass capacitive formula touch-screen 100 with face glass 120 by 130 laminatings of optical clear glue-line.

Electro-conductive glass assembly 110 comprises substrate 111, transparency conducting layer 112, photoresistance insulation course 113, metal level 114, index matching layer 115, electrically conducting transparent screen layer 116 and silicon dioxide layer of protection 117.

Substrate 111 is glass substrate.The thickness of substrate is 0.2~0.55mm.

Transparency conducting layer 112 is located on substrate 111.Transparency conducting layer is made by transparent material.Transparency conducting layer can be indium tin oxide (ITO) transparent conductive semiconductor layer or antimony tin oxide transparency conducting layer.Utilize the method for magnetron sputtering, in the one side of substrate 111, be coated with transparent conductive film.Be coated with photoresist on transparent conductive film, expose under pre-fabricated patterns, by development, etching, stripping process, make the transparent conductive film design pattern.Photoresistance insulation course 113 parts cover transparency conducting layer 112.Then be coated with the OC photoresistance on the substrate 111 that has plated transparency conducting layer, exposure under the bridge formation pattern, development make photoresistance insulation course 113.

Metal level 114 covers photoresistance insulation course 113, and the edge of metal level 114 contacts with transparency conducting layer 112.Plate metal film with magnetron sputtering method on photoresistance insulation course 113, the coating photoresist completes metal through overexposure, development, etching, stripping process and builds bridge and the edge cabling under metal bridge formation pattern, forms metal level 114.

The complete covering metal layer 114 of index matching layer 115 and transparency conducting layer 112, and the edge contact of the edge of index matching layer 115 and substrate 111, the refractive index of index matching layer 115 and transparency conducting layer 112 differs and is less than 15% of transparency conducting layer 112 refractive indexes.Because index matching layer 115 is very approaching with the refractive index of transparency conducting layer 112, light is difficult for refraction effect occurs on the two interface, makes the design pattern observability of transparency conducting layer 112 reduce.Simultaneously, according to the anti-reflection film principle, thickness that can design refractive indices matching layer 115, make the reflected light at upper and lower two interfaces interfere mutually and disappear, and intensity of reflected light dropped to minimum, further reduces the pattern observability of transparency conducting layer 112.The thickness of index matching layer 115 need to be controlled at 100~115nm left and right.

Specifically in the present embodiment, when transparency conducting layer 112 is ito thin film, the ito thin film refractive index is 2.03.Typical case's visible wavelength is 550nm, and index matching layer 115 is selected the niobium oxide that refractive index is 2.3, and the optimum thickness of index matching layer 115 is about 101nm.In other embodiments, index matching layer 115 can also be selected the zirconia that refractive index is n=2.0, and the optimum thickness of index matching layer 115 is about 111nm.

Decapacitation reduces outside the pattern observability, and this index matching layer 115 also has the rete densification, resist chemical, and the characteristics such as visible light permeability is good, can well protect the induction line on electro-conductive glass.Simultaneously, the method does not need specific installation, and the technical transform cost is low.

Index matching layer 115 is the single layer optical film.Index matching layer 115 is columbium oxide film or zirconia film or thin film of titanium oxide or tantalum oxide films.The thickness of index matching layer 115 is 100~111nm.Transparency conducting layer 112 is indium tin oxide layer, and index matching layer 115 is the niobium oxide layer, and the thickness of niobium oxide layer is 101nm.In other embodiments, transparency conducting layer 112 is indium tin oxide layer, and index matching layer 115 is zirconia layer, and the thickness of zirconia layer is 111nm.

Index matching layer 115 is coating.Index matching layer 115 is uniformly distributed in for niobium oxide particle or zirconia particles or titan oxide particles or tantalum oxide particles the coating formed in organic solvent.Concrete, niobium oxide particle or zirconia particles or titan oxide particles or tantalum oxide particles can be uniformly distributed in the organic solvent such as 2-butanone.The thickness of index matching layer 115 is less than 3 microns.

Electrically conducting transparent screen layer 116 is located on the side of substrate 111 away from transparency conducting layer 112.Electrically conducting transparent screen layer 116 is indium tin oxide electrically conducting transparent screen layer, and the whole face of electrically conducting transparent screen layer 116 is plated on the side of substrate 111.116 shieldings of electrically conducting transparent screen layer show the electromagnetic interference (EMI) of module, improve the reliability of glass capacitive formula touch-screen 100.

Silicon dioxide layer of protection 117 is covered on electrically conducting transparent screen layer 116.The whole face of silicon dioxide layer of protection 117 is plated on electrically conducting transparent screen layer 116.

Substratum transparent 130 is located on the electro-conductive glass assembly.Substratum transparent is the OCA optical cement.The thickness of substratum transparent is about 0.175mm.

Face glass 120 covers on electro-conductive glass assembly 110.Face glass 120 is bonded on electro-conductive glass assembly 110 by substratum transparent 130.The thickness of face glass 120 is 0.55~1.5mm.Face glass 120 is the surperficial tempered glass that is printed on decorative ink.

In above-mentioned glass capacitive formula touch-screen 100, the refractive index of index matching layer 115 and transparency conducting layer 112 differs and is less than 15% of transparency conducting layer 112 refractive indexes.Because index matching layer 115 is very approaching with the refractive index of transparency conducting layer 112, light is difficult for refraction effect occurs on the two interface, makes the design pattern observability of transparency conducting layer 112 reduce.Simultaneously, according to the anti-reflection film principle, thickness that can design refractive indices matching layer 115, make the reflected light at upper and lower two interfaces interfere mutually and disappear, and intensity of reflected light dropped to minimum, further reduces the pattern observability of transparency conducting layer 112.

And index matching layer 115 also has rete compactness, resistance to chemical corrosion, the characteristics such as visible light permeability is good, can well protect the induction line on electro-conductive glass 110.Simultaneously, the method does not need specific installation, and the technical transform cost is low.

The above embodiment has only expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.

Claims (10)

1. a glass capacitive formula touch-screen, is characterized in that, comprising:
The electro-conductive glass assembly comprises:
Substrate;
Transparency conducting layer, be located on described substrate;
The photoresistance insulation course, part covers described transparency conducting layer;
Metal level, cover described photoresistance insulation course, and the edge of described metal level contacts with described transparency conducting layer; And
The index matching layer, cover described metal level and described transparency conducting layer fully, and the edge of described index matching layer and the edge contact of described substrate, the refractive index of described index matching layer and the refractive index of described transparency conducting layer differ and are less than 15% of described transparency conducting layer refractive index;
Substratum transparent, be located on described electro-conductive glass assembly; And
Face glass, cover on described substratum transparent, the bonding described electro-conductive glass assembly of described substratum transparent and described face glass.
2. glass capacitive formula touch-screen according to claim 1, is characterized in that, described index matching layer is the single layer optical film.
3. glass capacitive formula touch-screen according to claim 2, is characterized in that, described index matching layer is columbium oxide film or zirconia film or thin film of titanium oxide or tantalum oxide films.
4. glass capacitive formula touch-screen according to claim 2, is characterized in that, the thickness of described index matching layer is 100~111nm.
5. glass capacitive formula touch-screen according to claim 1, is characterized in that, described index matching layer is coating.
6. glass capacitive formula touch-screen according to claim 5, is characterized in that, the thickness of described index matching layer is less than 3 microns.
7. glass capacitive formula touch-screen according to claim 1, is characterized in that, described transparency conducting layer is indium tin oxide layer, and described index matching layer is the niobium oxide layer, and the thickness of described niobium oxide layer is 101nm.
8. glass capacitive formula touch-screen according to claim 1, is characterized in that, described transparency conducting layer is indium tin oxide layer, and described index matching layer is zirconia layer, and the thickness of described zirconia layer is 111nm.
9. glass capacitive formula touch-screen according to claim 1, it is characterized in that, the thickness of described substrate is 0.2~0.55mm, and the thickness of described face glass is 0.55~1.5mm, the thickness of described substratum transparent is about 0.175mm, and the thickness of described index matching layer is 105~115nm.
10. glass capacitive formula touch-screen according to claim 1; it is characterized in that; described electro-conductive glass assembly also comprises electrically conducting transparent screen layer and silicon dioxide layer of protection; described electrically conducting transparent screen layer is located on the side of described substrate away from described transparency conducting layer, and described silicon dioxide layer of protection is covered on described electrically conducting transparent screen layer.
CN 201320335108 2013-06-09 2013-06-09 Glass capacitive touch screen CN203366304U (en)

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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103970390A (en) * 2014-04-10 2014-08-06 湖北仁齐科技有限公司 OGS capacitive touch screen of metal frame bridge, and machining technology of OGS capacitive touch screen
CN105335000A (en) * 2014-08-15 2016-02-17 群创光电股份有限公司 Touch display device
CN105487702A (en) * 2014-10-09 2016-04-13 南京瀚宇彩欣科技有限责任公司 Touch display panel and manufacturing method therefor
US9629271B1 (en) 2013-09-30 2017-04-18 Apple Inc. Laser texturing of a surface
US9727178B2 (en) 2013-09-05 2017-08-08 Apple Inc. Opaque white coating with non-conductive mirror
US9790126B2 (en) 2013-09-05 2017-10-17 Apple Inc. Opaque color stack for electronic device
US9844898B2 (en) 2011-09-30 2017-12-19 Apple Inc. Mirror feature in devices
CN108170326A (en) * 2018-01-19 2018-06-15 江苏迪佳电子有限公司 A kind of capacitance touch screen processing technology and its process equipment
US10099506B2 (en) 2016-09-06 2018-10-16 Apple Inc. Laser bleach marking of an anodized surface
US10328527B2 (en) 2013-06-09 2019-06-25 Apple Inc. Laser-formed features

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9844898B2 (en) 2011-09-30 2017-12-19 Apple Inc. Mirror feature in devices
US10328527B2 (en) 2013-06-09 2019-06-25 Apple Inc. Laser-formed features
US9727178B2 (en) 2013-09-05 2017-08-08 Apple Inc. Opaque white coating with non-conductive mirror
US9790126B2 (en) 2013-09-05 2017-10-17 Apple Inc. Opaque color stack for electronic device
US9629271B1 (en) 2013-09-30 2017-04-18 Apple Inc. Laser texturing of a surface
CN103970390A (en) * 2014-04-10 2014-08-06 湖北仁齐科技有限公司 OGS capacitive touch screen of metal frame bridge, and machining technology of OGS capacitive touch screen
CN105335000A (en) * 2014-08-15 2016-02-17 群创光电股份有限公司 Touch display device
CN105487702A (en) * 2014-10-09 2016-04-13 南京瀚宇彩欣科技有限责任公司 Touch display panel and manufacturing method therefor
US10099506B2 (en) 2016-09-06 2018-10-16 Apple Inc. Laser bleach marking of an anodized surface
CN108170326A (en) * 2018-01-19 2018-06-15 江苏迪佳电子有限公司 A kind of capacitance touch screen processing technology and its process equipment

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