CN103270477B

CN103270477B - Contact panel

Info

Publication number: CN103270477B
Application number: CN201180062501.7A
Authority: CN
Inventors: 江口和辉; 村梶庆太; 元山贤; 元山贤一
Original assignee: Nissan Chemical Corp
Current assignee: Nissan Chemical Corp
Priority date: 2010-10-26
Filing date: 2011-10-25
Publication date: 2016-11-09
Anticipated expiration: 2031-10-25
Also published as: KR101871527B1; WO2012057165A1; TW201231632A; JPWO2012057165A1; JP5920220B2; TWI535830B; CN103270477A; KR20140009193A

Abstract

The present invention provides the capacitance type touch-control panel that the display performance that can reduce the display device caused because transparent electrode pattern is observed declines.In contact panel (1), metal oxide layer (5) is set in the first transparency electrode (3) and the second transparency electrode (4).Metal oxide layer (5) is by by formula M (OR)_nMetal alkoxide in formula M₂(X)_mSlaine in the presence of in Water in Organic Solvents solution, be condensed and add obtained by anti-precipitation agent application composition and formed；M represents the alkyl that metal, R represent C1～C5, and n represents the valence mumber of M, M₂Representing metal, X represents chlorine, nitric acid, sulphuric acid, acetic acid, ethanedioic acid, sulfamic acid, sulfonic acid, acetoacetic acid, acetylacetonate or their basic salt, and m represents M₂Valence mumber.Preferably metal alkoxide is the mixture of alkoxyl silicone or its partial condensate and alkoxytitanium.

Description

Contact panel

Technical field

The present invention relates to contact panel, be more particularly to capacitance type touch-control panel.

Background technology

In recent years, along with popularizing of smart mobile phone, the display picture of mobile phone constantly maximizes.Therewith, carried out in a large number may be used The display utilizing display screen carries out the exploitation of the contact panel of input operation.If employing contact panel, then need not pressing type The input mediums such as switch, therefore can realize showing the maximization of picture.

Contact panel detects the contact position of the operating surface that finger or pen etc. touch.Utilizing this function, contact panel can As input equipment.As the detection mode of contact device, such as, there are resistance membrane type and condenser type etc..

In resistance membrane type, surface is provided with 2 pieces of substrate separate configuration in the way of transparency electrode is relative of transparency electrode. That is, due to 2 pieces of substrates of needs, the problem that therefore there is slimming difficulty.Additionally, in which, by one piece of substrate of extruding, make The transparency electrode being located at this substrate and the transparency electrode short circuit being located at another block substrate, detect pressing position.Therefore, finger is used The substrate of the side of pressing easily produces abrasion etc., there is also the problem making the durability of contact panel decline.

On the other hand, condenser type can make substrate be 1 piece and realize slimming, it can be said that be suitable for mobile device Mode.

Patent documentation 1 discloses capacitance type touch-control panel.In this contact panel, for detecting the of the coordinate of X-direction One transparency electrode is situated between with the second transparency electrode of the coordinate for detecting Y-direction using as dielectric configurations of glass.Concrete next Saying, the one side separate configuration of 1 piece of glass substrate has the electrode of multiple coordinate for detecting X-direction, and another side separate configuration has The electrode of multiple coordinates for detecting Y-direction.That is, in the composition arranging each transparency electrode on 1 piece of substrate.

Additionally, patent documentation 2 discloses the capacitance type touch-control panel of another kind of composition.In this contact panel, transparent The first transparency electrode that the one side of substrate is configured to detect the coordinate of X-direction is saturating with second of the coordinate for detecting Y-direction Prescribed electrode, and make each cross part Jie have insulating barrier to be not turned on.If using described structure, then need not enter on the two sides of substrate Row electrode is formed.

Prior art literature

Patent documentation

Patent documentation 1: Japanese Patent Laid-Open 2003-173238 publication

Patent documentation 2: Japanese Patent Laid-Open 2010-28115 publication

The summary of invention

Invent technical problem to be solved

Contact panel is assembled into the display devices such as liquid crystal indicator, is used as can detect that the band touch surface of touch location The display device of plate function.Display device is observed by the people of operation contact panel through contact panel, therefore transparency electrode Make the component that the transmissison characteristic used up is good.Such as, the inorganic material such as ITO (tin indium oxide, Indium Tin Oxide) are used.

But, in capacitance type touch-control panel, the transparency electrode of ITO etc. form region and the region not forming transparency electrode Produce the difference of reflectance.The pattern that accordingly, there exist transparency electrode is observed and the problem that makes display performance decline.

Additionally, for conventional contact panel, it is known that arrange in the transparency electrode of ITO etc. and formed by acryhic material The technology of acrylate layer.The purpose of this acrylate layer is protection transparency electrode, and refractive index characteristic does not carries out any consideration.Cause This, it is impossible to expect that acrylate layer has the effect making electrode pattern not highlight.

Additionally, acrylate layer is organic material film, so the hardness as protecting film is not enough.Transparent electrical with ITO etc. The adaptation of pole is the most weak, becomes one of reason of making the reliability of contact panel reduce.It addition, use the situation of acrylate layer Under, it is difficult to utilize the printing technologies such as hectographic printing to form film.Therefore, when forming film, it is necessary to use the photoetching technique of complex procedures.

The present invention is the invention completed in view of these aspects.That is, it is an object of the invention to provide and can reduce because of transparent The capacitance type touch-control panel that the display performance of the display device that electrode pattern is observed and causes declines.

Additionally, further object is that to provide and form high close with transparency electrode of hardness on the transparent electrodes Conjunction property is high, can use the film of printing technology film forming and the capacitance type touch-control panel that constitutes.

Other objects and advantages of the present invention is from following record.

Solve the technical scheme that technical problem is used

The contact panel of the present invention is the capacitive touch of pattern being formed with transparency electrode at the operating area of transparency carrier Control panel, it is characterised in that

Will be with following formula (I)

M₁(OR)_n (Ⅰ)

The metal alkoxide represented

With following formula (II)

M₂(X)_m (Ⅱ)

In Water in Organic Solvents solution, condensation in the presence of the slaine represented, then add anti-precipitation agent, by by the painting of gained The layer of the metal-oxide covering compositions formation is configured in transparency electrode and prepares；

In formula I, M₁Representing metal, R represents the alkyl of C1～C5, and n represents the valence mumber of M；

In formula II, M₂Representing metal, X represents chlorine, nitric acid, sulphuric acid, acetic acid, ethanedioic acid, sulfamic acid, sulfonic acid, acetyl Acetic acid, acetylacetonate or their basic salt, m represents M₂Valence mumber.

Additionally, the contact panel of the present invention is the electric capacity of pattern being formed with transparency electrode at the operating area of transparency carrier Formula contact panel, it is characterised in that

Will be with following formula (I)

M₁(OR)_n (Ⅰ)

The metal alkoxide represented

With following formula (II-1)

M₂(X)_m (Ⅱ-1)

With in the presence of the slaine represented with the oxalate of metal used in formula (II-1) in organic solvent Hydrolysis, condensation, then add anti-precipitation agent, the application composition of gained the layer of the metal-oxide formed is configured at transparent electrical Extremely go up and prepare；

In formula I, M₁Representing metal, R represents the alkyl of C1～C5, and n represents M₁Valence mumber；

In formula II, M₂Representing metal, X represents chlorine, nitric acid, sulphuric acid, acetic acid, sulfamic acid, sulfonic acid, acetoacetic acid, second Acyl acetone solvate or their basic salt, m represents M₂Valence mumber.

Metal M in the present invention, in the most described logical formula I₁For selected from silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), at least one of boron (B), aluminum (Al), magnesium (Mg), stannum (Sn) and zinc (Zn).

Additionally, the metal M in the present invention, in the most described logical formula II and (II-1)₂For selected from aluminum (Al), indium (In), at least one of zinc (Zn), zirconium (Zr), bismuth (Bi), lanthanum (La), tantalum (Ta), yttrium (Y) and cerium (Ce).

In the present invention, the refractive index of the layer of the most described metal-oxide is 1.50～1.70, this metal-oxide The thickness (the most also the thickness of layer being referred to as thickness) of layer is 40nm～170nm.The layer of the most described metal-oxide Refractive index is 1.54～1.68.

In the present invention, the most described metal alkoxide is the mixing of alkoxy silane or its partial condensate and alkoxytitanium Thing.

In the present invention, the most described anti-precipitation agent be selected from N-Methyl pyrrolidone, ethylene glycol, dimethylformamide, At least one of dimethyl acetylamide, diethylene glycol, propylene glycol, hexanediol and their derivant.

In the present invention, the metallic atom (M of the metal alkoxide contained by the most described application composition₁) and described slaine Metallic atom (M₂) mol ratio meet

0.01≤M₂/(M₁+M₂)≤0.7。

In the present invention, the most described slaine is selected from metal nitrate, metal sulfate, metal acetate, metal Chloride, metal oxalate, metal aminosulfonate, metal sulfonate, metal acetyl acetate, metal acetylacetonates And at least one of their basic salt.

In the present invention, the most described organic solvent includes aklylene glycol or its monoether derivant.

In the present invention, it is first saturating that the most described transparency electrode has for the position of at least 2 different directions of detection Prescribed electrode and the second transparency electrode.

In the present invention, described first transparency electrode and described second transparency electrode are configured in the same face of transparency carrier.

In the present invention, described first transparency electrode and described second transparency electrode can be respectively arranged at the difference of transparency carrier Face.

The effect of invention

If the employing present invention, then can provide and can reduce the display device caused because transparent electrode pattern is observed Display performance decline capacitance type touch-control panel.

The simple declaration of accompanying drawing

Fig. 1 is the top view of the contact panel of the 1st example as present embodiment.

Fig. 2 is the sectional view of the A1-A1 ' line along Fig. 1.

Fig. 3 (a)～(d) are the operations of the manufacture method of the contact panel of the 1st example being denoted as present embodiment Sectional view.

Fig. 4 is the top view of the contact panel of the 2nd example being denoted as present embodiment.

Fig. 5 is the sectional view of the B1-B1 ' line along Fig. 4.

Fig. 6 is the sectional view of the general configuration of the contact panel of the 3rd example being denoted as present embodiment.

Fig. 7 is the sectional view of the general configuration of the contact panel of the 4th example being denoted as present embodiment.

Fig. 8 is the sectional view of the general configuration of the contact panel of the 5th example being denoted as present embodiment.

The mode carried out an invention

The display performance of the display device caused because transparent electrode pattern is observed declines due to transparency electrode Refractive index is different from the refractive index of substrate caused.

Transparency electrode is generally by ITO (tin indium oxide (Indium Tin the Oxide)) shape as inorganic, metal oxide Become.The refractive index of ITO is 1.8～about 2.1.On the other hand, the refractive index of glass substrate is about 1.5, thus with the folding of ITO The rate of penetrating has larger difference.The difference of described refractive index be formed transparency electrode region and do not formed transparency electrode region it Between produce the difference of reflective character.That is, it is being formed with the region of transparency electrode and non-shape with the interface reflection characteristic interfered The region becoming transparency electrode is different, thus produces the result making electrode pattern prominent in picture shows.

Then, the present inventor finds after the most conscientiously studying to make electrode pattern prominent, is being configured on substrate Transparency electrode on arrange refractive index and film thickness be controlled in required in the range of layer be effective.By arranging such layer, The phenomenon that in undesirable contact panel, electrode pattern is observed can be suppressed.

It addition, in contact panel, as mentioned above, it is known that the technology of acrylate layer is set on the transparent electrodes.This acrylic acid The purpose of layer is protection transparency electrode, and refractive index characteristic does not carries out any consideration.Therefore, it is impossible to expect that acrylate layer has Make the effect that electrode pattern does not highlights.Additionally, acrylate layer is organic material film, so hardness is low, with the adaptation of ITO also Weak, thus mechanical strength is not enough.Further, since the wiring portion in the frame portion of contact panel dielectric film can not be configured, therefore Pattern formation must be carried out, but be difficult by the printing technologies such as hectographic printing and form film.Therefore, when forming film, it is necessary to use work The photoetching technique that sequence is complicated.

Due to such situation, preferably with above-mentioned refractive index and film thickness be controlled in required in the range of layer substitute propylene Acid layer.I.e., it is generally desirable to there is the function of protection transparency electrode, specifically mechanical strength good, can protect transparency electrode not because of The repeatedly pressing of finger etc. and be destroyed.Additionally, the printing technologies such as hectographic printing easy landform on substrate preferably can be used Become transparent electrode pattern.

The inventors discovered that, when forming the layer meeting above-mentioned performance, preferably use metal alkoxide depositing at slaine In Water in Organic Solvents solution under, it is condensed and adds application composition obtained by anti-precipitation agent.By on the transparent electrodes (i.e., Covering transparent electrode) it is set using the metal oxide layer that this application composition is formed, transparent electrical can be protected in contact panel Pole, and make electrode pattern not highlight.

Hereinafter, first the contact panel of present embodiment is illustrated.Then, to the burning for this contact panel Nitride layer and the application composition for forming this metal oxide layer illustrate.

Fig. 1 and Fig. 2 is the structure chart of the contact panel of the 1st example as present embodiment, and Fig. 1 is top view, Fig. 2 Sectional view for the A1-A1 ' line along Fig. 1.

As it is shown in figure 1, contact panel 1 has transparent substrate 2, for detecting the first transparency electrode of the coordinate of X-direction 3, for detecting the second transparency electrode 4 of the coordinate of Y-direction.First transparency electrode 3 and the second transparency electrode 4 are by being located at substrate 2 The same face same layer formed.

Substrate 2 uses glass, acrylic resin, polyester resin, pet resin, polycarbonate resin Fat, polyvinylidene chloride resin, plexiglass, tri acetyl cellulose resin and PEN The transparent materials such as resin are constituted.Particularly preferably select be suitable for forming metal oxide layer 5,6 described later possess thermostability and The material of chemical resistance.About the thickness of substrate 2, in the case of using glass, for example, about 0.1mm～2mm, use In the case of resin molding, about for example, 10 μm～2000 μm.

First transparency electrode 3 is formed at the position corresponding with the operating surface of contact panel 1 with the second transparency electrode 4.It addition, First transparency electrode 3 is arranged at multiple region disconnectings along the X direction, and the second transparency electrode 4 is in multiple regions along the Y direction Separately positioned.By using such structure, the precision of touch position detection can be improved.

In Fig. 1, multiple bothridiums (pad) portion 21 is wanted by the first transparency electrode 3 and the second transparency electrode 4 respectively as composition Element, configures in the way of gap by between separation the most in the plane and each bothridium portion 21, each bothridium portion 21 is less.That is, in X-axis side Join in the way of they cross one another regions are the least to bothridium portion 21 in column with in Y direction bothridium portion 21 in column It is placed in whole operating surface.Bothridium portion 21 can use the such as polygonal shape such as rhombus, rectangle and hexagon, and they are in the most staggered Or array shape configuration.Additionally, the number of the electrode separated is also not limited to the example of Fig. 1, according to size and the institute of operating surface The precision of the detection position required determines.

First transparency electrode 3 and the second transparency electrode 4 use at least high to the absorbance of visible ray and have electric conductivity Transparent electrode material is formed.As such transparent electrode material with electric conductivity, can enumerate such as ITO (tin indium oxide, Indium Tin Oxide), IZO (indium zinc oxide, Indium Zinc Oxide) or ZnO (zinc oxide) etc..Use the feelings of ITO Under condition, in order to guarantee enough electric conductivity, preferably making thickness is 10～200nm.

First transparency electrode 3 and the second transparency electrode 4 are formed the most as follows.

First, by from sputtering method, vacuum vapour deposition, ion plating method, nebulization, infusion process or CVD, (chemical gaseous phase is sunk Long-pending, Chemical Vapor Deposition) method that selects of the material of substrate 2 that is considered as substrate in method etc. formed Bright conducting film.Then, use photoetching technique that above-mentioned nesa coating is carried out pattern formation.Or, can use by above-mentioned material The electroconductive stuffing etc. that material is formed is scattered in coating obtained by organic solvent and forms required pattern by print process.

It is important that whether thickness can be controlled accurately in the formation process of transparency electrode.Therefore, during formation, especially It is well to be selected to be formed can reach required film thickness and the method for transparent good low resistance film.

As depicted in figs. 1 and 2, the first transparency electrode 3 and the second transparency electrode 4 are formed on the same face of substrate 2, are formed Same layer.Therefore, the first transparency electrode 3 and the second transparency electrode 4 are intersected in many places, form cross part 18.

In present embodiment, either one in cross part, the first transparency electrode and the second transparency electrode with not with another The mode of side's contact is truncated.That is, as in figure 2 it is shown, at multiple cross parts 18, the second transparency electrode 4 is the most connected, but first is transparent Electrode 3 is truncated.Further, in order to make the truncated position of the first transparency electrode 3 connect, it is provided with bridging electrode 20, at bridging electrode 20 And it is provided with between the second transparency electrode 4 and is formed interlayer dielectric 19 by insulating properties material.Hereinafter, see figures.1.and.2 and enter further Row illustrates.

As in figure 2 it is shown, be formed with the interlayer dielectric 19 of light transmission in the second transparency electrode 4 in cross part 18.Interlayer Dielectric film 19 can use SiO₂Etc. the organic material such as inorganic material or photosensitive acrylics.Use SiO₂In the case of, such as Can use and be formed with SiO in sputtering method only the second transparency electrode 4 in cross part 18 by use mask₂The structure of film. Additionally, in the case of using photosensitive acrylics, it is possible to use photoetching process forms same structure.

The upper strata of interlayer dielectric 19 is provided with bridging electrode 20.Bridging electrode 20 is first saturating by be truncated at cross part 18 Prescribed electrode 3 is electrically connected to each other, the material of light transmission formed.By arranging bridging electrode 20, can be by the first transparency electrode 3 at Y Direction electrically connects.

As it is shown in figure 1, the first transparency electrode 3 and the second transparency electrode 4 are in by vertical or horizontal for the bothridium 21 of multiple rhombuses The shape of arrangement.In second transparency electrode 4, the coupling part being positioned at cross part 18 is width ratio the second transparency electrode 4 The shape that rhombus bothridium portion 21 is little.Additionally, bridging electrode 20 is also configured to strip with the form that width ratio rhombus bothridium portion 21 is little Shape.

As depicted in figs. 1 and 2, in the contact panel 1 of present embodiment, in the first transparency electrode 3 and the second transparency electrode 4 Upper (that is, covering the first transparency electrode 3 and the second transparency electrode 4) is formed with metal oxide layer 5.Further, coating and touch surface The formation region of the transparency electrode in the part that the operating surface of plate 1 is corresponding and non-formation region.The hardness of metal oxide layer 5 Height is good with the adaptation of the first transparency electrode 3 and the second transparency electrode 4.

The formation of metal oxide layer 5 use by metal alkoxide in the presence of slaine (such as, aluminium salt) in organic molten Agent hydrolyzes, is condensed and adds application composition obtained by anti-precipitation agent.Hereinafter the details of this application composition is entered Row explanation.

In contact panel 1, the result of study described in embodiment hurdle based on this specification, according to the first transparency electrode 3 He The condition that each electrode pattern of the second transparency electrode 4 does not highlights selects the refractive index and film thickness of metal oxide layer 5.Concrete next Say, the refractive index of metal oxide layer 5 be preferably in the range of 1.50～1.70, more preferably 1.54～1.68 scope In.Thickness is preferably in the range of 40nm～170nm.It addition, the refractive index of metal oxide layer 5 1.54 less than In the case of 1.60, thickness is more preferably in the range of 60nm～150nm.Additionally, the refractive index of metal oxide layer 5 is 1.60 In the case of in the scope of above less than 1.68, thickness is more preferably in the range of 40nm～170nm.Metal oxide layer 5 selects From making the first transparency electrode 3 and the second metal-oxide that transparency electrode 4 is not turned on and visible light transmission is high in insulating properties Layer.

In contact panel 1, such as metal oxide layer 5 is by the application composition shape comprising alkoxyl silicone and alkoxytitanium Becoming, refractive index is 1.60, and thickness is 80nm.

As in figure 2 it is shown, contact panel 1 can the sight in face Yu display floater 10 by will be formed with the first transparency electrode 3 grade The superiors Jie examining side forms a display device to use the adhesive linkage 9 of acrylic compounds light-cured resin etc. to overlap.? Here, adhesive linkage 9 is located on metal oxide layer 5.

Above-mentioned display device has contact panel 1 and display floater 10, can have backlight as required.Display floater 10 can use the structure as known display device, omit expression in detail in Fig. 2.Such as, the situation of liquid crystal indicator Under, display floater 10 can use the structure accompanying liquid crystal layer between 2 pieces of transparency carriers.In connecting with liquid crystal layer of each transparency carrier The opposition side of side can be respectively equipped with polaroid.Additionally, segmented electrode can be formed on each transparency carrier or common electrode is controlled The state of liquid crystal processed.It addition, liquid crystal layer is sealed by each transparency carrier and encapsulant.

As it is shown in figure 1, in contact panel 1, be respectively equipped with end in the end of the first transparency electrode 3 and the second transparency electrode 4 Son (not shown), draws a plurality of lead-out wiring 11 from this terminal.Lead-out wiring 11 can use use silver, aluminum, chromium, copper, molybdenum and The opaque metal line of the alloy etc. containing these metals such as Mo-Nb (molybdenum-niobium) alloy.Lead-out wiring 11 is transparent with to first Electrode 3 and the second transparency electrode 4 apply the control circuit (not shown) of voltage or detection touch location and connect.

Have in the contact panel 1 of said structure, multiple first transparency electrodes 3 and the second transparency electrode 4 are applied successively Voltage and give electric charge.If any one place in the finger touch operation face as electric conductor, then by finger tip and the first transparent electrical Capacitance Coupled between pole 3 and the second transparency electrode 4 forms capacitor.Therefore, by catching the electric charge of the contact position of finger tip Change, can detect that finger touches where.

Additionally, contact panel 1 also can come the first transparency electrode 3 and second saturating by the control of control circuit (not shown) Either one in prescribed electrode 4 optionally applies voltage.In the case of Gai, it be applied with in the transparency electrode of voltage formation electric field, as Really finger etc. touch in this condition, then contact position is situated between the ground connection with the electric capacity of human body.As a result of which it is, as the of object The change of resistance value is produced between one transparency electrode 3 or terminal (not shown) and the contact position of the second transparency electrode 4.This resistance Value is directly proportional with the distance of contact position to the terminal as the first transparency electrode 3 of object or the second transparency electrode 4, therefore controls Electric circuit inspection processed goes out at contact position and flows through as between the first transparency electrode 3 or the terminal of the second transparency electrode 4 of object Current value, so that it may obtain the coordinate of contact position.

In the contact panel 1 of present embodiment, based on metal set in the first transparency electrode 3 and the second transparency electrode 4 The effect of oxide skin(coating) 5, in operating surface, the prominent of electrode pattern is inhibited.

Below, the manufacture method of the contact panel 1 of present embodiment is illustrated.

First, the transparent substrates 2 such as glass substrate are prepared.Substrate 2 cuts into required shape as required, carries out clear Wash.Additionally, the most also form the intermediate layer of SiOx, SiNx, SiON etc. between substrate 2 and nesa coating.Then, at substrate The one side of 2 forms nesa coating.Nesa coating for example, ITO, uses sputtering method or vacuum vapour deposition etc. with 10～200nm Thickness film forming.Then, the upper layer side at nesa coating is formed with the state of the etching mask formed by photoresist etc. Under, etch nesa coating, the first transparency electrode 3 and the second transparency electrode 4 are carried out pattern formation.Cover by removing etching Mould, can obtain the transparent conductive film substrate 14 as shown in Fig. 3 (a).

Here, in the cross part 18 of transparent conductive film substrate 14, the second transparency electrode 4 is situated between and is connected with coupling part, but Second transparency electrode 3 is truncated.

Then, by carrying out after being provided with the side photosensitive resin coating of the first transparency electrode 3 and the second transparency electrode 4 Exposure imaging, forms interlayer dielectric 19 (Fig. 3 (b)) in the coupling part of the second transparency electrode 4.Exhausted as being used for forming interlayer The photoresist of velum 19, uses the photoresist with the transparency and thermostability.Such as, acrylic resin can be used Deng.Use SiO₂In the case of forming interlayer dielectric 19, same structure can be formed by using the sputtering method of mask.

Then, after interlayer dielectric 19 forms nesa coating, it is formed by feeling on the surface of this nesa coating Nesa coating is etched under the state of the etching mask of photosensitiveness resin formation.Then, etching mask is removed, at interlayer dielectric 19 Upper strata by by the truncation part of the first transparency electrode 3 be connected in the way of form bridging electrode 20.Thus, Fig. 3 (c) institute can be obtained The structure shown.As the nesa coating being formed on interlayer dielectric 19, such as ito film can be enumerated, in the case of being somebody's turn to do, preferably bridge Even electrode 20 is formed also by ITO.

For aforesaid lead-out wiring 11, operation behind use silver ink etc. formed.But, in above-mentioned operation During etching nesa coating, it is possible to the outer peripheral edge respectively along the first transparency electrode 3 and the second transparency electrode 4 remains electrically conducting transparent Film forms lead-out wiring 11.

Then, by hectographic printing coating metal in first transparency electrode the 3, second transparency electrode 4 and bridging electrode 20 Oxide skin(coating) formation application composition.Here, application composition is by metal alkoxide depositing in slaine (such as, aluminium salt) In Water in Organic Solvents solution under, it is condensed and adds compositions obtained by anti-precipitation agent.Then, will be formed with application composition The substrate 2 of film is dried in the such as heating plate of 40～150 DEG C (such as 60 DEG C).Then, at 100～300 DEG C (such as 200 DEG C) such as baking oven in heat, in first transparency electrode the 3, second transparency electrode 4 and bridging electrode 20 formed gold Belong to oxide skin(coating) 5.Thus, the contact panel substrate 30 shown in Fig. 3 (d) can be obtained.Film on substrate 2 such as can heated Carry out dried on plate, to this film irradiation ultraviolet radiation, then heat in baking oven.

Then, the terminal (not shown) from the first transparency electrode 3 and the end of the second transparency electrode 4 is formed with silver ink etc. Lead-out wiring 11 and form contact panel 1.Contact panel 1 is situated between the control circuit (not shown) with lead-out wiring 11 with contact panel Connect.

The contact panel 1 prepared is situated between and is installed in display floater 10 with the adhesive linkage 9 of acrylic compounds transparent adhesive etc. Front surface.At this moment, calibration labelling is set as required on the angle of substrate 2 or display floater 10 and carries out para-position.

It is installed in the contact panel 1 of display floater 10, by arranging metal oxide layer 5, is formed at contact panel 1 The state of the electrode pattern of the first transparency electrode 3 and the second transparency electrode 4 it is difficult to see that on operating surface.

Below, the contact panel 101 of another example as present embodiment is illustrated.

Fig. 4 and Fig. 5 is denoted as the contact panel of the 2nd example of present embodiment, and Fig. 4 is top view, and Fig. 5 is along figure The sectional view of the B1-B1 ' line of 4.

As shown in Figure 4, contact panel 101 have transparent substrate 102, be formed at substrate 102 one side for detecting X First transparency electrode 103 of the coordinate in direction, be formed at the another side of substrate 102 the coordinate for detecting Y-direction second Transparency electrode 104.In the description below, the one side of substrate 102 is top, and the another side of substrate 102 is lower section.It addition, this situation Under, the another side of substrate 102 is the face of the side being installed on display floater 110.

Substrate 102 is dielectric base plate.As the material of substrate 102, use glass, acrylic resin, polyester resin, gather Ethylene glycol terephthalate resin, polycarbonate resin, polyvinylidene chloride resin, plexiglass and poly-naphthalene The transparent materials such as naphthalate resin.Particularly preferably select to be suitable for forming metal oxide layer 105,106 described later The material possessing thermostability and chemical resistance.About the thickness of substrate 102, if glass, can be set to about 0.1mm～ 2mm, if resin molding, then can be set to 10 μm～2000 μm.

As shown in Figure 4, the first transparency electrode 103 and the second transparency electrode 104 are respectively by elongated rectangular electrode shape Become.First transparency electrode 103 extends in X direction, and the second transparency electrode 104 extends along Y-direction, respectively in strip at certain intervals Arrange.Additionally, the first transparency electrode 103 is arranged in the way of mutually orthogonal with the second transparency electrode 104, overall in clathrate.

First transparency electrode 103 and the second transparency electrode 104 use at least high to the absorbance of visible ray and have conduction Property transparent electrode material formed.As such transparent electrode material with electric conductivity, such as ITO or ZnO etc. can be used. In the case of using ITO, in order to guarantee enough electric conductivity, preferably making thickness is 5～100nm.

First transparency electrode 103 and the second transparency electrode 104 are by from sputtering method, vacuum vapour deposition, ion plating method, spraying The substrate 102 being considered as substrate in method, infusion process or CVD etc. selects most suitable method to be formed.

Such as, there is the method utilizing photoetching technique to carry out pattern formation with etching method the transparency electrode formed in planar, Or use and disperse coating obtained by the electroconductive stuffing that formed by above-mentioned material etc. direct by print process in organic solvent The method etc. of the pattern needed for formation.It is important that whether thickness can be controlled accurately in the formation process of transparency electrode. Therefore, during formation, particularly preferably it is selected to be formed and can reach required film thickness and the method for the good low resistance film of the transparency.

As shown in Figure 4 and Figure 5, the first transparency electrode 103 is formed with metal oxide layer 105.Metal oxide layer The formation region of the first transparency electrode of the 105 coating parts corresponding with the operating surface of contact panel 101 and non-formation region.This Outward, as it is shown in figure 5, be also formed with metal oxide layer 106 (for downside in figure) in the second transparency electrode 104.Burning The formation region of the transparency electrode of the coating part corresponding with the operating surface of contact panel 101 of nitride layer 106 and non-formation region.Gold The hardness belonging to oxide skin(coating) 105,106 is high, good with the adaptation of the first transparency electrode 103 and the second transparency electrode 104.

The formation of metal oxide layer 105,106 use by metal alkoxide in the presence of slaine (such as, aluminium salt) in Water in Organic Solvents solution, it is condensed and adds application composition obtained by anti-precipitation agent.Hereinafter detailed to this application composition Situation illustrates.

In contact panel 101, the result of study described in embodiment hurdle based on this specification, according to the first transparency electrode 103 and second the condition that do not highlights of each electrode pattern of transparency electrode 104 select metal oxide layer 105,106 refractive index and Thickness.Specifically, the refractive index of metal oxide layer 105,106 is preferably in the range of 1.50～1.70 respectively, more preferably It is in the range of 1.54～1.68.Thickness is preferably in the range of 40nm～170nm respectively.It addition, metal oxide layer 105, the refractive index of 106 is 1.54 less than in the case of 1.60, and thickness is more preferably in the range of 60nm～150nm. Additionally, the refractive index of metal oxide layer 105,106 more than 1.60 in the scope of less than 1.68 in the case of, thickness is more preferably In the range of 40nm～170nm.

In the case of Gai, metal oxide layer 105 and 106 be also selected from insulating properties respectively with the first transparency electrode 103 and Second metal oxide layer that transparency electrode 104 is not turned on and visible light transmission is high.

In contact panel 101, it is 10 that the such as first transparency electrode 103 and the second transparency electrode 104 are preferably thickness respectively ～the ito film of 200nm.In this contact panel 101, the such as first transparency electrode 103 and the second transparency electrode 104 are respectively by thickness The ito film of 28nm is formed, and metal oxide layer 105,106 is respectively by the coating combination using alkoxyl silicone and alkoxytitanium to make Thing is formed, and refractive index is 1.6, and thickness is 80nm.

As it is shown in figure 5, the one side at substrate 102 is provided with the adhesive linkage 108 formed by acrylic compounds transparent adhesive.This Outward, adhesive linkage 108 is bonded with the coverlay 107 being made up of transparent resin.In Fig. 4, omit coverlay 107.

Coverlay 107 plays the effect of the protecting film of the first transparency electrode 103 and metal oxide layer 105.Can coat Ming tree fat replaces coverlay 107.In the case of Gai, it may be unnecessary to adhesive linkage 108.

Another side at substrate 102 is situated between and is provided with display surface with the adhesive linkage 109 formed by acrylic compounds transparent adhesive Plate 110.

Display floater 110 can use the structure as known display device, omits expression in detail in Fig. 5.Such as, liquid In the case of crystal device, display floater 110 can use the structure accompanying liquid crystal layer between 2 pieces of transparency carriers.Each transparent The opposition side of the side connected with liquid crystal layer of substrate can be respectively equipped with polaroid.Additionally, segmentation can be formed on each transparency carrier Electrode or common electrode control the state of liquid crystal.It addition, liquid crystal layer is sealed by each transparency carrier and encapsulant.

In contact panel 101, it is respectively equipped with terminal (not in the end of the first transparency electrode 103 and the second transparency electrode 104 Diagram), draw a plurality of lead-out wiring (not shown) from this terminal.Lead-out wiring can use use silver, aluminum, chromium, copper or contain these The opaque metal line of the alloy etc. of metal.Lead-out wiring is executed with to the first transparency electrode 103 and the second transparency electrode 104 The control circuit (not shown) of making alive or detection touch location connects.

Have in the contact panel 101 of said structure, if any one place in the finger touch operation face as electric conductor, Then formed capacitor by the Capacitance Coupled between finger tip and the first transparency electrode 103 and the second transparency electrode 104.Therefore, pass through Catch the change in electrical charge of the contact position of finger tip, can detect that finger touches where.

In contact panel 101, based on metal-oxide set in the first transparency electrode 103 and the second transparency electrode 104 The effect of layer 105,106, in operating surface, the prominent of electrode pattern is inhibited.

As shown in Figure 6, in contact panel 201, display floater 210 is regarded as first substrate, on the surface of display floater 210 It is provided with the first transparency electrode 203.Additionally, the one side at the second substrate 212 additionally prepared is provided with the second transparency electrode 204.With Under explanation in, the one side of second substrate 212 is top, and another side is lower section.It addition, the another side of second substrate 212 is peace It is loaded on the side of display floater 210.

Display floater 210 can use the structure as known display device, omits expression in detail in Fig. 6.Such as, liquid In the case of crystal device, display floater 210 can use the structure accompanying liquid crystal layer between 2 pieces of transparency carriers.Each transparent The opposition side of the side connected with liquid crystal layer of substrate can be respectively equipped with polaroid.Additionally, segmentation can be formed on each transparency carrier Electrode or common electrode control the state of liquid crystal.It addition, liquid crystal layer is sealed by each transparency carrier and encapsulant.

First transparency electrode 203 is provided with metal oxide layer 205.Metal oxide layer 205 is coated to and contact panel 201 The formation region of transparency electrode of part corresponding to operating surface and non-formation region.Similarly, in the second transparency electrode 204 also It is formed with metal oxide layer 206.Metal oxide layer 206 is coated to the saturating of the part corresponding with the operating surface of contact panel 201 The formation region of prescribed electrode and non-formation region.The hardness of metal oxide layer 205,206 is high, with the first transparency electrode 203 and The adaptation of the second transparency electrode 204 is good.

The formation of metal oxide layer 205,206 use by metal alkoxide in the presence of slaine (such as, aluminium salt) in Water in Organic Solvents solution, it is condensed and adds application composition obtained by anti-precipitation agent.Hereinafter detailed to this application composition Situation illustrates.

In contact panel 201, the result of study described in embodiment hurdle based on this specification, according to the first transparency electrode 203 and second the condition that do not highlights of each electrode pattern of transparency electrode 204 select metal oxide layer 205,206 refractive index and Thickness.Specifically, the refractive index of metal oxide layer 205,206 is preferably in the range of 1.50～1.70 respectively, more preferably It is in the range of 1.54～1.68.Thickness is preferably in the range of 40nm～170nm respectively.It addition, metal oxide layer 205, the refractive index of 206 is 1.54 less than in the case of 1.60, and thickness is more preferably in the range of 60nm～150nm. Additionally, the refractive index of metal oxide layer 205,206 more than 1.60 in the scope of less than 1.68 in the case of, thickness is more preferably In the range of 40nm～170nm.In the case of Gai, metal oxide layer 205 and 206 be also selected from insulating properties respectively with first Transparency electrode 203 and the second metal oxide layer that transparency electrode 204 is not turned on and visible light transmission is high.

In contact panel 201, it is 10 that the such as first transparency electrode 203 and the second transparency electrode 204 are preferably thickness respectively ～the ito film of 200nm.In this contact panel 201, the such as first transparency electrode 203 and the second transparency electrode 204 are respectively by thickness The ito film of 28nm is formed, and metal oxide layer 205,206 is respectively by the application composition shape comprising alkoxyl silicone and alkoxytitanium Becoming, refractive index is 1.6, and thickness is 80nm.

As shown in Figure 6, the one side at second substrate 212 is provided with the adhesive linkage 208 formed by acrylic compounds transparent adhesive. Additionally, be bonded with the coverlay 207 being made up of transparent resin on adhesive linkage 208.Coverlay 207 plays the effect of protecting film. Transparent resin can be coated to replace coverlay 207.In the case of Gai, it may be unnecessary to adhesive linkage 208.First transparency electrode 203 and Two transparency electrode 204 grades are identical with the electrode being illustrated with Fig. 4 and Fig. 5 etc..

In contact panel 201, based on metal-oxide set in the first transparency electrode 203 and the second transparency electrode 204 The effect of layer 205,206, in operating surface, the prominent of electrode pattern is inhibited.

As it is shown in fig. 7, in contact panel 301, display floater 310 is regarded as first substrate, on the surface of display floater 310 It is provided with the first transparency electrode 303.Additionally, the one side at the second substrate 312 additionally prepared is provided with the second transparency electrode 304.With Under explanation in, the one side of second substrate 312 is lower section, and another side is top.It addition, the another side of second substrate 312 is right Contact panel 301 carries out the face of touch control operation.

Display floater 310 can use the structure as known display device, omits expression in detail in Fig. 7.Such as, liquid In the case of crystal device, display floater 310 can use the structure accompanying liquid crystal layer between 2 pieces of transparency carriers.Each transparent The opposition side of the side connected with liquid crystal layer of substrate can be respectively equipped with polaroid.Additionally, segmentation can be formed on each transparency carrier Electrode or common electrode control the state of liquid crystal.It addition, liquid crystal layer is sealed by each transparency carrier and encapsulant.

First transparency electrode 303 is provided with metal oxide layer 305.Metal oxide layer 305 is coated to and contact panel 301 The formation region of transparency electrode of part corresponding to operating surface and non-formation region.Similarly, in the second transparency electrode 304 (being illustrated in lower side in Fig. 7) is also formed with metal oxide layer 306.Metal oxide layer 306 is coating and contact panel 301 The formation region of the transparency electrode of the part that operating surface is corresponding and non-formation region.The hardness of metal oxide layer 305,306 is high, Good with the adaptation of the first transparency electrode 303 and the second transparency electrode 304.

The formation of metal oxide layer 305,306 use by metal alkoxide in the presence of slaine (such as, aluminium salt) in Water in Organic Solvents solution, it is condensed and adds application composition obtained by anti-precipitation agent.Hereinafter detailed to this application composition Situation illustrates.

It is provided with between metal oxide layer 305 and metal oxide layer 306 and to be formed by acrylic compounds transparent adhesive Adhesive linkage 308.Second substrate 312 is installed in display floater 310 by this adhesive linkage 308.

In contact panel 301, the result of study described in embodiment hurdle based on this specification, according to the first transparency electrode 303 and second the condition that do not highlights of each electrode pattern of transparency electrode 304 select metal oxide layer 305,306 refractive index and Thickness.Specifically, the refractive index of metal oxide layer 305,306 is preferably in the range of 1.50～1.70 respectively, more preferably It is in the range of 1.54～1.68.Thickness is preferably in the range of 40nm～170nm respectively.It addition, metal oxide layer 305, the refractive index of 306 is 1.54 less than in the case of 1.60, and thickness is more preferably in the range of 60nm～150nm. Additionally, the refractive index of metal oxide layer 305,306 more than 1.60 in the scope of less than 1.68 in the case of, thickness is more preferably In the range of 40nm～170nm.In the case of Gai, metal oxide layer 305 and 306 be also selected from insulating properties respectively with first Transparency electrode 303 and the second metal oxide layer that transparency electrode 304 is not turned on and visible light transmission is high.

In contact panel 301, it is 10 that the such as first transparency electrode 303 and the second transparency electrode 304 are preferably thickness respectively ～the ito film of 200nm.In this contact panel 301, the such as first transparency electrode 303 and the second transparency electrode 304 are respectively by thickness The ito film of 28nm is formed, and metal oxide layer 305,306 is respectively by the application composition shape comprising alkoxyl silicone and alkoxytitanium Becoming, refractive index is 1.6, and thickness is 80nm.

In contact panel 301, based on metal-oxide set in the first transparency electrode 303 and the second transparency electrode 304 The effect of layer 305,306, in operating surface, the prominent of electrode pattern is inhibited.

As shown in Figure 8, contact panel 401 has transparent substrate 402.It is provided with for examining respectively on the upper strata of substrate 402 Survey the first transparency electrode 403 and the second transparency electrode 404 of the position of 2 different directions.

First transparency electrode 403 and the second transparency electrode 404 use at least high to the absorbance of visible ray and have conduction Property transparent electrode material formed.As such transparent electrode material with electric conductivity, such as ITO or ZnO etc. can be used. In the case of using ITO, in order to guarantee enough electric conductivity, preferably making thickness is 5～100nm.

First transparency electrode 403 and the second transparency electrode 404 are by from sputtering method, vacuum vapour deposition, ion plating method, spraying Method, infusion process or CVD etc. are considered as the substrate 102 of substrate and the coating 407 that is cladded with described later selects most suitable method Formed.

As shown in Figure 8, the first transparency electrode 403 is configured on substrate 402.Further, the first transparency electrode 403 is formed There is metal oxide layer 405.The first of the coating part corresponding with the operating surface of contact panel 401 of metal oxide layer 405 is saturating The formation region of prescribed electrode 403 and non-formation region.

Metal oxide layer 405 is provided with and is cladded with coating 407.It is cladded with coating 407 and uses the acrylic acid tree that the transparency is high Fat.

As shown in Figure 8, the second transparency electrode 404 is configured at and is cladded with in coating 407.Second transparency electrode 404 is formed There is metal oxide layer 406.The transparent electrical of the coating part corresponding with the operating surface of contact panel 401 of metal oxide layer 406 The formation region of pole and non-formation region.The hardness of metal oxide layer 405,406 is high, with the first transparency electrode 403 and second The adaptation of transparency electrode 404 is good.

The formation of metal oxide layer 405,406 use by metal alkoxide in the presence of slaine (such as, aluminium salt) in Water in Organic Solvents solution, it is condensed and adds application composition obtained by anti-precipitation agent.Hereinafter detailed to this application composition Situation illustrates.

In contact panel 401, the result of study described in embodiment hurdle based on this specification, according to the first transparency electrode 403 and second the condition that do not highlights of each electrode pattern of transparency electrode 404 select metal oxide layer 405,406 refractive index and Thickness.Specifically, the refractive index of metal oxide layer 405,406 is preferably in the range of 1.50～1.70 respectively, more preferably It is in the range of 1.54～1.68.Thickness is preferably in the range of 40nm～170nm respectively.It addition, metal oxide layer 405, the refractive index of 406 is 1.54 less than in the case of 1.60, and thickness is more preferably in the range of 60nm～150nm. Additionally, the refractive index of metal oxide layer 405,406 more than 1.60 in the scope of less than 1.68 in the case of, thickness is more preferably In the range of 40nm～170nm.In the case of Gai, metal oxide layer 305 and 306 be also selected from insulating properties respectively with first Transparency electrode 303 and the second metal oxide layer that transparency electrode 304 is not turned on and visible light transmission is high.

In contact panel 401, it is 10 that the such as first transparency electrode 403 and the second transparency electrode 404 are preferably thickness respectively ～the ito film of 200nm.In this contact panel 301, the such as first transparency electrode 303 and the second transparency electrode 304 are respectively by thickness The ito film of 28nm is formed, and metal oxide layer 405,406 is respectively by the application composition shape comprising alkoxyl silicone and alkoxytitanium Becoming, refractive index is 1.60, and thickness is 80nm.

As shown in Figure 8, metal oxide layer 406 is provided with the adhesive linkage 408 formed by acrylic compounds transparent adhesive. Contact panel 401 is situated between and is installed in display floater 110 with this adhesive linkage 408.

Have in the contact panel 401 of said structure, if any one place in the finger touch operation face as electric conductor, Then formed capacitor by the Capacitance Coupled between finger tip and the first transparency electrode 403 and the second transparency electrode 404.Therefore, pass through Catch the change in electrical charge of the contact position of finger tip, can detect that finger touches where.

In contact panel 401, based on metal-oxide set in the first transparency electrode 403 and the second transparency electrode 404 The effect of layer 405,406, in operating surface, the prominent of electrode pattern is inhibited.

Above, the contact panel of present embodiment is illustrated, but the present invention is not limited in above-mentioned embodiment. For using polytype contact panel of the transparency electrode of ITO etc., by arranging according to refractive index in its transparency electrode With the metal oxide layer of the condition selection that thickness is suitable for, effect similar to the above can be obtained.

Below, the application composition being used for being formed metal oxide layer is illustrated.

For formed the application composition of metal oxide layer be by metal alkoxide in the presence of slaine in organic molten Agent hydrolyzes, is condensed and adds compositions obtained by anti-precipitation agent.

As the metal alkoxide for application composition, can enumerate silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), The alkoxide of the metals such as aluminum (Al), magnesium (Mg), stannum (Sn) and zinc (Zn).Wherein, from the difficulty obtained and the storage of application composition From the perspective of hiding stability, preferably selected from alkoxyl silicone, the partial condensate of alkoxyl silicone and at least the one of alkoxytitanium Kind.

As it has been described above, application composition be by these metal alkoxides in the presence of slaine in Water in Organic Solvents solution, Compositions obtained by condensation.This application composition comprises anti-precipitation agent.Anti-precipitation agent have formed coating tunicle time prevent be coated with The effect of precipitating metal salt in film.

In the case of application composition comprises alkoxytitanium composition, it is generally desirable to organic solvent comprises have and make alcoxyl The aklylene glycol class of the effect of base titanium stable components or its monoether.

In the case of manufacturing the application composition comprising alkoxytitanium composition, in order to make alkoxytitanium stablize and improve coating The storage-stable of compositions, after alkoxytitanium and aklylene glycol class or its monoether mixed stability, alkoxytitanium is independent Or mix with alkoxyl silicone, hydrolyze in the presence of slaine, be condensed.

In the case of application composition comprises alkoxytitanium and alkoxyl silicone both compositions, preferably by alkoxyl silicone In the presence of slaine after hydrolysis, mixing realizes stable alkoxytitanium beforehand through being mixed into glycols or its monoether class.

Metal alkoxide used by application composition represents with logical formula I.

M(OR)_n……(Ⅰ)

In formula, M represents the alkyl that metal, R represent C1～C5, and n represents the valence mumber of M.

Particularly alkoxyl silicone or its partial condensate uses selected from the one kind or two or more chemical combination represented with logical formula III At least one of thing and partial condensate (below pentamer).

Si(OR’)₄……(III)

In formula, R ' represents the alkyl of C1～C5.

Additionally, alkoxytitanium or its partial condensate use selected from the one kind or two or more compound represented with logical formula IV And at least one of partial condensate (below pentamer).

Ti(OR”)₄……(Ⅳ)

In formula, R " represent the alkyl of C1～C5.

Slaine used by application composition can enumerate at least one selected from the compound represented with logical formula II.

M₂(X)_m……(Ⅱ)

In formula, M₂Represent metal, X represent chlorine, nitric acid, sulphuric acid, acetic acid, ethanedioic acid, sulfamic acid, sulfonic acid, acetoacetic acid, Acetylacetonate or their basic salt, m represents M₂Valence mumber.

Slaine used in particularly preferred above-mentioned application composition can enumerate and comprise selected from representing with following (II-1) The slaine of oxalate of at least one and metal used in following (II-1) of compound.

M₂(X)_m……(Ⅱ-1)

Metal M as the above-mentioned slaine represented with logical formula II₂, preferably selected from aluminum (Al), indium (In), zinc (Zn), at least one of zirconium (Zr), bismuth (Bi), lanthanum (La), tantalum (Ta), yttrium (Y) and cerium (Ce).

In compound shown in above-mentioned, particularly preferably metal nitrate, metal chloride salt, metal oxalate and Basic salt.Wherein, from the perspective of the storage-stable of the difficulty obtained and application composition, preferably aluminum, indium, cerium etc. Metal nitrate.

As organic solvent used in application composition, can enumerate methanol, ethanol, normal propyl alcohol, isopropanol, n-butyl alcohol, The alcohols such as isobutanol and the tert-butyl alcohol, the esters such as ethyl acetate, glycols and the ester derivant thereof such as ethylene glycol, the ethers such as diethyl ether, The ketones such as acetone, methyl ethyl ketone and Ketohexamethylene, or benzene and toluene etc. are aromatic hydrocarbon etc.；They can make alone or in combination With.

In the case of application composition comprises alkoxytitanium composition, as aklylene glycol class contained in organic solvent Or its monoether, can enumerate such as ethylene glycol, diethylene glycol, propylene glycol, hexanediol and their monomethyl ether, single ether, single propyl ether, Monobutyl ether or monophenyl ether etc..

If the glycols contained by organic solvent used in application composition or its monoether mol ratio are relative to alkoxyl Titanium is less than 1, then the effect for the stability of alkoxytitanium is low, and the storage-stable of coating composition is deteriorated.On the other hand, A large amount of use glycolss or its monoether do not result in any problem.Such as, organic solvent used in application composition can be complete Portion is above-mentioned glycols or its monoether.But, application composition, without in the case of alkoxytitanium, does not need above-mentioned especially Glycol and/or its monoether.

Anti-precipitation agent contained in application composition prevents slaine from separating out to film when forming coating tunicle.As Anti-precipitation agent, can enumerate selected from N-Methyl pyrrolidone, dimethylformamide, dimethyl acetylamide, ethylene glycol, diethylene glycol, At least one of propylene glycol, hexanediol and their derivant, can use therein more than at least one.

Anti-precipitation agent when the metal of slaine being scaled metal-oxide with (anti-precipitation agent)/(metal-oxide) >= The ratio of 1 (weight ratio) uses.If weight ratio is less than 1, then the anti-precipitation effect of slaine when forming coating tunicle reduces. On the other hand, a large amount of anti-precipitation agent is used will not application composition to be had any impact.

Anti-precipitation agent can be at metal alkoxide, particularly alkoxyl silicone, alkoxytitanium or alkoxyl silicone and alkoxytitanium at gold Belong in the presence of salt be hydrolyzed, condensation reaction time add, it is possible to add after hydrolysis, condensation reaction terminate.

Metallic atom (the M of metal alkoxide contained in application composition₁) and the metallic atom (M of slaine₂) containing than Example preferably meets 0.01≤M with mol ratio conversion₂/(M₁+M₂The relation of)≤0.7.If this value is less than 0.01, then gained The mechanical strength of tunicle is not enough, the most undesirable.On the other hand, if it exceeds 0.7, then for glass substrate and transparency electrode etc. Base material metal oxide layer adaptation decline.It addition, in the case of burning till in a low temperature of below 450 DEG C, there is also The tendency that the chemical-resistant of the metal oxide layer of gained declines.The metallic atom of metal alkoxide contained in application composition Have multiple in the case of, above-mentioned metallic atom (M₁) refer to the summation of various metals atom, and gold contained in application composition Belong to salt metallic atom have multiple in the case of, above-mentioned metallic atom (M₂) refer to the summation of various metals atom

For the solid component concentration in application composition, metal alkoxide and slaine are converted as metal-oxide In the case of, it is preferably in the range of 0.5～20wt% with solid component meter.If solid constituent is more than 20wt%, not only it is coated with The storage-stable covering compositions is deteriorated, and the film thickness monitoring of metal oxide layer is difficult.On the other hand, solid constituent exists During below 0.5wt%, the lower thickness of the metal oxide layer of gained, in order to obtain the thickness of regulation, need repeatedly to be coated with Cloth.

Application composition is by with M (OR)_nRepresent metal alkoxide in the presence of slaine (such as, aluminium salt) in organic Solvent hydrolyzes, be condensed obtained by compositions.Used by the hydrolysis of alkoxyl silicone, alkoxytitanium or alkoxyl silicone and alkoxytitanium The water yield is preferably 2 relative to the total mole number of alkoxyl silicone, alkoxytitanium or alkoxyl silicone and alkoxytitanium with mol ratio conversion ～24.More preferably 2～20.In the case of mol ratio (water yield (mole)/(total mole number of metal alkoxide)) is below 2, metal The hydrolysis of alkoxide is not enough, makes film property decline or makes the intensity of metal oxide coating of gained decline, thus undesirable.This Outward, in the case of mol ratio is more than 24, polycondensation is persistently carried out, and therefore makes storage-stable decline, thus undesirable.

Use in the case of other metal alkoxide too.

In the case of using other metal alkoxide, for the addition of water, the most preferably select same condition.

In hydrolytic process when preparing application composition, in the case of the slaine (such as, aluminium salt) coexisted is aqueous salt, Its contained humidity participates in reaction, therefore for the water yield for hydrolysis, it is necessary to consider the water contained by slaine (such as, aluminium salt) Point.

Application composition is the compositions making metal alkoxide hydrolysis, condensation make, by selecting the composition of metal alkoxide, The refractive index of the metal oxide layer of gained can be adjusted to prescribed limit.Such as, metal alkoxide selects alkoxyl silicone and alkane In the case of epoxide titanium, by adjusting its mixed proportion, can be in prescribed limit described later, the scope of specially 1.45～2.1 The refractive index of the metal oxide layer of interior adjustment gained.

In other words, if can determine that the refractive index that the metal oxide layer after being coated with application composition and burning till is required, The constitutive molar ratio of alkoxyl silicone and alkoxytitanium then can be determined according to this refractive index.This constitutive molar ratio is arbitrary, such as The value that refractive index is about 1.45 of the metal oxide layer that application composition obtained by only being hydrolyzed by alkoxyl silicone obtains.Separately Outward, the value that refractive index is about 2.1 of the metal oxide layer that application composition obtained by only being hydrolyzed by alkoxytitanium obtains. Therefore, it is intended that in the case of the refractive index of metal oxide layer being set in the range of 1.45～2.1, may correspond to this scope Interior refractive index value uses alkoxyl silicone and alkoxytitanium to manufacture application composition with regulation ratio.

Additionally, by using other metal alkoxide, it is possible to realize the adjustment of the refractive index of the metal oxide layer of gained.

It addition, for the refractive index of metal oxide layer, in addition to composition condition, can also be selected to film condition and adjust Whole.By such adjustment, required refractive index value can be realized while realizing the high rigidity of metal oxide layer.

That is, in the case of the film to application composition burns till and manufactures metal oxide layer, metal oxide layer Refractive index change according to its firing temperature.In the case of Gai, firing temperature be the highest, then the refractive index of metal oxide layer is more High.Therefore, by firing temperature being chosen as suitable value, the adjustment of the refractive index of the metal oxide layer of gained can be realized. Furthermore, it is contemplated that in the case of the thermostability of other contact panel member of formation, firing temperature is preferably at 100 DEG C～300 DEG C In the range of, more preferably in the range of 150 DEG C～250 DEG C.

Additionally, in the case of application composition comprises alkoxytitanium, if to film irradiation ultraviolet radiation (UV) before burning till, then The refractive index of the metal oxide layer of gained can change.Specifically, ultraviolet irradiation amount is the biggest, then the folding of metal oxide layer Penetrate rate the highest.Therefore, can be by choosing whether that carrying out ultraviolet irradiation realizes required refractive index.In metal oxide layer, In the case of refractive index needed for can being realized by the selection of the conditions such as composition, ultraviolet irradiation can not be carried out.It addition, carry out purple In the case of outside line is irradiated, the refractive index of metal oxide layer can be adjusted by selecting its irradiation dose.In metal oxide layer, In the case of needing ultraviolet irradiation to obtain required refractive index, such as, can use high voltage mercury lamp.It addition, use high voltage mercury lamp In the case of, impinge upon 1000mJ/cm with 365nm conversion preferably total light²Above irradiation dose, more preferably 3000mJ/cm²~ 10000mJ/cm²Irradiation dose.Additionally, UV light source is without specifying, it is possible to use other UV light source.Use other light source In the case of, irradiate and same amount of accumulative light quantity when using above-mentioned high voltage mercury lamp.

But, in the case of particularly application composition comprises alkoxytitanium composition, have be stored at room temperature lower viscosity by The character gradually risen.Although actually used aspect does not worries causing serious problem, but precision controls metal oxide layer In the case of thickness, it is necessary to temperature etc. is managed cautiously.Such viscosity is above-mentioned along with the alkoxyl in application composition The increase of the proportion of composing of titanium and become notable.This is considered as due to relative to alkoxyl silicone, the hydrolysis rate of alkoxytitanium Faster, the faster reason of condensation reaction.

In the case of application composition comprises alkoxytitanium composition, in order to reduce viscosity B coefficent, 2 kinds of following preparation methods are to have Effect.

1) after being sufficiently mixed glycols and alkoxytitanium in advance when being hydrolyzed in the presence of slaine by alkoxytitanium, according to Need to mix with alkoxyl silicone, be hydrolyzed in presence of organic solvent.Thus, the coating combination that viscosity B coefficent is little can be obtained Thing.

1) preparation method can be generated heat when being considered effectively to reason is that and mixed with glycols by alkoxytitanium, thus alkoxyl Ester exchange reaction, hydrolysis, condensation reaction is occurred to tend to stable between alkoxyl and the glycols of titanium.

2) make in advance alkoxyl silicone be hydrolyzed in the presence of slaine reaction after, be mixed and mix to glycols Alkoxytitanium solution in carry out condensation reaction, it is thus achieved that application composition.Thus, the coating combination that viscosity B coefficent is little can be obtained Thing.

2) preparation method is considered effectively to reason is that the hydrolysis of alkoxyl silicone is quickly carried out, but condensation thereafter is anti- Should be slower than alkoxytitanium.Therefore, if being rapidly added alkoxytitanium after terminating hydrolysis, then the alkane of hydrolysis has been carried out The silanol group of epoxide silicon reacts equably with alkoxytitanium.Thus, the alkoxyl silicone hydrolyzed makes the condensation of alkoxytitanium anti- Answering property tends to stable.

The method having had attempted to mix the alkoxyl silicone hydrolyzed in advance with alkoxytitanium.But, for having of reaction Without in the case of glycols in machine solvent, it is impossible to obtain the application composition that storage-stable is good.Additionally, 2) shown in side Method is the most useful in the case of being obtained application composition by other metal alkoxide and alkoxyl silicone with quick hydrolysis rate.

Application composition described above can use the rubbing method of general enforcement to form film, then makes metal-oxide Layer.As rubbing method, such as dip coating, spin-coating method, spraying process, spread coating, roller transfer method, silk screen print method, ink-jet can be used Method or flexographic printing process etc..Wherein, ink-jet method and the flexographic printing process of pattern printing particularly preferably it are suitable for.

Embodiment

Hereinafter, according to embodiment, the present invention will be described in more detail, but the present invention is not limited in these enforcement Example.

[abbreviation used in embodiment]

The implication of the abbreviation used in below example etc. is as follows.

TEOS: tetraethoxysilane

TIPT: tetraisopropoxy titanium

ZTB: four n-butoxy zirconiums

AN: aluminum nitrate nonahydrate

CeN: cerous nitrate hexahydrate

InN: indium nitrate trihydrate

EG: ethylene glycol

HG:2-methyl-2,4-PD (another name: hexanediol)

BCS:2-butyl cellosolve (another name: butyl cellosolve)

<synthesis example 1>(synthesis of application composition K1)

In the flask of 200mL capacity, add AN12.8g, water 3.0g be stirred, it is thus achieved that the aqueous solution of AN.To this AN's Aqueous solution adds EG13.7g, HG48.8g, BCS37.1g and the TEOS31.1g as alkoxyl silicone, stirs at ambient temperature Mix 30 minutes, it is thus achieved that A liquid.

In the flask of 300mL capacity, add the TIPT4.7g as alkoxytitanium, be added thereto to HG48.8g, in room Stir 30 minutes under the conditions of temperature, it is thus achieved that B liquid.

Then, above-mentioned A liquid is mixed with B liquid, at ambient temperature stirring 30 minutes.Thus, it is thus achieved that application composition K1。

<synthesis example 2>(synthesis of application composition K2)

In the flask of 200mL capacity, add AN12.1g, water 2.8g be stirred, it is thus achieved that the aqueous solution of AN.To this AN's Aqueous solution adds EG13.7g, HG57.7g, BCS37.2g and the TEOS22.9g as alkoxyl silicone, stirs at ambient temperature Mix 30 minutes, it is thus achieved that C liquid.

In the flask of 300mL capacity, add the TIPT13.4g as alkoxytitanium, be added thereto to HG40.2g, in room Stir 30 minutes under the conditions of temperature, it is thus achieved that D liquid.

Then, above-mentioned C liquid is mixed with D liquid, at ambient temperature stirring 30 minutes.Thus, it is thus achieved that application composition K2。

<synthesis example 3>(synthesis of application composition K3)

In the flask of 200mL capacity, add AN11.7g, water 2.8g be stirred, it is thus achieved that the aqueous solution of AN.To this AN's Aqueous solution adds EG13.7g, HG46.0g, BCS37.3g and the TEOS19.1g as alkoxyl silicone, stirs at ambient temperature Mix 30 minutes, it is thus achieved that E liquid.

In the flask of 300mL capacity, add the TIPT17.4g as alkoxytitanium, be added thereto to HG52.1g, in room Stir 30 minutes under the conditions of temperature, it is thus achieved that F liquid.

Then, above-mentioned E liquid is mixed with F liquid, at ambient temperature stirring 30 minutes.Thus, as metal alkoxide, obtain Obtain application composition K3.

<synthesis example 4>(synthesis of application composition K4)

In the flask of 200mL capacity, add AN11.5g, water 2.7g be stirred, it is thus achieved that the aqueous solution of AN.To this AN's Aqueous solution adds EG13.7g, HG34.5g, BCS37.3g and the TEOS15.6g as alkoxyl silicone, stirs at ambient temperature Mix 30 minutes, it is thus achieved that G liquid.

In the flask of 300mL capacity, add the TIPT21.2g as alkoxytitanium, be added thereto to HG63.6g, in room Stir 30 minutes under the conditions of temperature, it is thus achieved that H liquid.

Then, above-mentioned G liquid is mixed with H liquid, at ambient temperature stirring 30 minutes.Thus, it is thus achieved that application composition K4。

<synthesis example 5>(synthesis of application composition K4-1)

In the flask of 200mL capacity, add InN9.2g, water 2.3g be stirred, it is thus achieved that the aqueous solution of InN.To this InN Aqueous solution in add EG14.6g, HG41.6g, BCS39.5g and the TEOS15.9g as alkoxyl silicone, at ambient temperature Stir 30 minutes, it is thus achieved that I liquid.

In the flask of 300mL capacity, add the TIPT14.4g as alkoxytitanium, be added thereto to HG62.4g, in room Stir 30 minutes under the conditions of temperature, it is thus achieved that J liquid.

Then, above-mentioned I liquid is mixed with J liquid, at ambient temperature stirring 30 minutes.Thus, as metal alkoxide, obtain Obtain application composition K-1.

<synthesis example 6>(synthesis of application composition K4-2)

In the flask of 200mL capacity, add CeN10.3g, water 2.1g be stirred, it is thus achieved that the aqueous solution of CeN.To this The aqueous solution of CeN adds EG14.7g, HG42.1g, BCS40.0g and the TEOS14.5g as alkoxyl silicone, at room temperature condition Lower stirring 30 minutes, it is thus achieved that K liquid.

In the flask of 300mL capacity, add the TIPT13.2g as alkoxytitanium, be added thereto to HG62.4g, in room Stir 30 minutes under the conditions of temperature, it is thus achieved that L liquid.

Then, above-mentioned K liquid is mixed with L liquid, at ambient temperature stirring 30 minutes.Thus, as metal alkoxide, obtain Obtain application composition K-2.

<synthesis example 7>(synthesis of application composition K4-3)

In the flask of 200mL capacity, add AN8.5g, water 2.0g be stirred, it is thus achieved that the aqueous solution of AN.To this AN's Aqueous solution adds EG14.3g, HG40.8g, BCS38.7g and the TEOS9.2g as alkoxyl silicone, stirs at ambient temperature 30 minutes, it is thus achieved that M liquid.

In the flask of 300mL capacity, add the ZTB25.4g as zirconium alkoxide, be added thereto to HG61.2g, in room Stir 30 minutes under the conditions of temperature, it is thus achieved that N liquid.

Then, above-mentioned M liquid is mixed with N liquid, at ambient temperature stirring 30 minutes.Thus, as metal alkoxide, obtain Obtain application composition K-3.

<synthesis example 8>(synthesis of application composition K5)

In the flask of 300mL capacity, add AN15.5g, water 8.9g be stirred, it is thus achieved that the aqueous solution of AN.To this AN's Aqueous solution adds EG13.0g, HG93.0g, BCS35.3g and the TEOS34.3g as alkoxyl silicone, stirs at ambient temperature Mix 30 minutes.Thus, it is thus achieved that application composition K5.

<synthesis example 9>(synthesis of application composition K6)

In the flask of 200mL capacity, add AN11.2g, water 2.6g be stirred, it is thus achieved that the aqueous solution of AN.To this AN's Aqueous solution adds EG13.7g, HG23.9g, BCS37.4g and the TEOS12.1g as alkoxyl silicone, stirs at ambient temperature Mix 30 minutes, it is thus achieved that I liquid.

In the flask of 300mL capacity, add the TIPT24.8g as alkoxytitanium, be added thereto to HG74.4g, in room Stir 30 minutes under the conditions of temperature, it is thus achieved that J liquid.

Then, above-mentioned I liquid is mixed with J liquid, at ambient temperature stirring 30 minutes.Thus, it is thus achieved that application composition K6。

Below, the example of the film build method using above-mentioned application composition K1～K6 to form metal oxide layer is carried out Explanation.Meanwhile, also the method for the acrylic film forming the comparison other as metal oxide layer on substrate is illustrated.

Use above-mentioned application composition, with the membrane filter pressure filtration of aperture 0.5 μm, by spin-coating method shape on substrate Become film.This substrate is heated 3 minutes in the heating plate be set as 60 DEG C and is dried.Then, move to be set as 200 DEG C In heated air circulation type baking oven, burn till 30 minutes.Thus, substrate is formed the film of metal-oxide (i.e., also by metal-oxide Layer is referred to as the film of metal-oxide, lower same).

Use above-mentioned application composition, with the membrane filter pressure filtration of aperture 0.5 μm, by spin-coating method shape on substrate Become film.This substrate is heated 3 minutes in the heating plate be set as 60 DEG C and is dried.Then, ultraviolet is used to irradiate dress Put (Ai Yi figure Co., Ltd. (アイグラフィック society) system, UB011-3A type), with high voltage mercury lamp (input power 1000W) With 50mW/cm²The ultraviolet that the light intensity of (wavelength 365nm conversion) is carried out 2 minutes irradiates.Ultraviolet irradiation amount is 6000mJ/ cm².After ultraviolet irradiates, in moving to be set as the heated air circulation type baking oven of 200 DEG C, burn till 30 minutes.Thus, shape on substrate Become the film of metal-oxide.

Film build method III is the method for the acrylic film of the comparison other forming the film as metal-oxide on substrate.

Use the acryhic material compositions (K7) for forming acrylic film, add with the membrane filter of aperture 0.5 μm and press through Filter, forms film by spin-coating method on substrate.This substrate is heated 2 minutes in the heating plate be set as 90 DEG C and does Dry.Then, in moving to be set as the heated air circulation type baking oven of 200 DEG C, 30 minutes are burnt till.Thus, substrate forms acrylic acid Film.

Using above-mentioned application composition K1～K6, substrate uses silicon substrate (100), uses above-mentioned film build method I, becomes Film method II or film build method III, formed on a silicon substrate metal-oxide film (KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3, KM1 and KM2).

Additionally, use acryhic material compositions K7, substrate uses silicon substrate (100), uses above-mentioned film build method III, Form acrylic film (KM3) on a silicon substrate.

Use these substrates, use ellipsometer test (ditch buttocks optics industry institute of Co., Ltd. (buttocks optics Gong Suo society) System, DVA-FLVW), measure refractive index during wavelength 633nm.

The film (KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3, KM1 and KM2) of metal-oxide and third The evaluation result of the refractive index of olefin(e) acid film (KM3) is shown in table 1.From this table, the refractive index of acrylic film is 1.50.

The film build method (I～III) that the film forming recording each film of expression on the film build method hurdle in table 1 is used.

For the hardness of the film of metal-oxide, have rated pencil hardness.

Using above-mentioned application composition K1～K6, substrate uses the glass substrate of band ITO, uses above-mentioned film build method I, film build method II or film build method III, forms film (KL1, KL2, KL3, KL4, KL5, KL5-of metal-oxide on substrate 1, KL5-2, KL5-3, KL5, KM1 and KM2).

Additionally, use acryhic material compositions K7, substrate uses the glass substrate of band ITO, uses above-mentioned film forming side Method III, forms acrylic film (KM3) on the glass substrate of band ITO.

Use these substrates, evaluate pencil hardness based on test method(s) (JIS K5400).

The film (KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3, KM1 and KM2) of metal-oxide and third The evaluation result of the pencil hardness of olefin(e) acid film (KM3) is shown in table 1.From this table, the pencil hardness of acrylic film (KM3) is 3H, the film (KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3, KM1 and KM2) of hardness ratio metal-oxide is low.

[table 1]

Film	Application composition	Film-forming method	Refractive index	Pencil hardness
					KL1	K1	II	1.52	9H
KL2	K2	II	1.55	9H
					KL3	K3	II	1.60	8H
KL4	K4	I	1.65	8H
					KL5	K4	II	1.70	8H
KL5-1	K4-1	II	1.60	9H
					KL5-2	K4-2	II	1.60	8H
KL5-3	K4-2	I	1.60	7H
					KM1	K5	I	1.48	9H
KM2	K6	II	1.75	7H
					KM3	K7	III	1.50	3H

Prepare to be formed with the transparent conductive film substrate of the nesa coating formed through pattern on substrate.Substrate uses glass Substrate, nesa coating uses ITO.As this transparent conductive film substrate, the contact panel 1 of above-mentioned present embodiment can be used Transparent conductive film substrate 14 used by.Here, different 2 that pattern is identical and thickness is 28nm and 75nm of ITO are prepared Plant transparent conductive film substrate.

It is formed on the transparent conductive film substrate that thickness is 28nm of ITO the film forming metal-oxide with the thickness of 70nm Substrate obtained by KL1.Coated optical bonding agent on the substrate, the soda-lime glass substrate of bonding 0.7mm.Then, ultraviolet is used Beam irradiating apparatus (Ai Yi figure Co., Ltd. system, UB011-3A type), with high voltage mercury lamp (input power 1000W) with 50mW/cm² The ultraviolet that the light intensity of (wavelength 365nm conversion) is carried out 80 seconds irradiates.Thus, make optical cement solidify, make evaluation and use Contact panel.

Except the thickness of the film KL1 of metal-oxide is 80nm (embodiment 2) and in addition to 90nm (embodiment 3), by with The same method of embodiment 1 makes the contact panel evaluated.

It is formed on the transparent conductive film substrate that ito film thickness is 28nm the film forming metal-oxide with the thickness of 70nm Substrate obtained by KL2.Coated optical bonding agent on the substrate, the glass blank (Japanese: element ガラス) of bonding 0.7mm.Connect , use ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A type), with high voltage mercury lamp (input power 1000W) with 50mW/cm²The ultraviolet that the light intensity of (wavelength 365nm conversion) is carried out 80 seconds irradiates.Thus, optical cement is made Solidification, makes the contact panel evaluated.

Except the thickness of the film KL2 of metal-oxide is 80nm (embodiment 5) and in addition to 90nm (embodiment 6), by with The same method of embodiment 4 makes the contact panel evaluated.

It is formed on the transparent conductive film substrate that ito film thickness is 28nm the film forming metal-oxide with the thickness of 50nm Substrate obtained by KL3.Coated optical bonding agent on the substrate, the glass blank of bonding 0.7mm.Then, ultraviolet is used to shine Injection device (Ai Yi figure Co., Ltd. system, UB011-3A type), with high voltage mercury lamp (input power 1000W) with 50mW/cm²(ripple Long 365nm convert) light intensity carry out 80 seconds ultraviolet irradiate.Thus, make optical cement solidify, make touching of evaluation Control panel.

Except the thickness of the film KL3 of metal-oxide be 70nm (embodiment 8), 80nm (embodiment 9), 120nm (embodiment 10) and beyond 150nm (embodiment 11), the contact panel evaluated is made by method similarly to Example 7.

It is formed on the transparent conductive film substrate that ito film thickness is 28nm the film forming metal-oxide with the thickness of 80nm Substrate obtained by KL4.Coated optical bonding agent on the substrate, the glass blank of bonding 0.7mm.Then, ultraviolet is used to shine Injection device (Ai Yi figure Co., Ltd. system, UB011-3A type), with high voltage mercury lamp (input power 1000W) with 50mW/cm²(ripple Long 365nm convert) light intensity carry out 80 seconds ultraviolet irradiate.Thus, make optical cement solidify, make touching of evaluation Control panel.

In addition to the thickness of the film KL4 of metal-oxide is 100nm, is made by method similarly to Example 12 and comment The contact panel of valency.

It is formed on the transparent conductive film substrate that ito film thickness is 75nm the film forming metal-oxide with the thickness of 100nm Substrate obtained by KL4.Coated optical bonding agent on the substrate, the glass blank of bonding 0.7mm.Then, ultraviolet is used to shine Injection device (Ai Yi figure Co., Ltd. system, UB011-3A type), with high voltage mercury lamp (input power 1000W) with 50mW/cm²(ripple Long 365nm convert) light intensity carry out 80 seconds ultraviolet irradiate.Thus, make optical cement solidify, make touching of evaluation Control panel.

It is formed on the transparent conductive film substrate that ito film thickness is 75nm the film forming metal-oxide with the thickness of 100nm Substrate obtained by KL5.Coated optical bonding agent on the substrate, the glass blank of bonding 0.7mm.Then, ultraviolet is used to shine Injection device (Ai Yi figure Co., Ltd. system, UB011-3A type), with high voltage mercury lamp (input power 1000W) with 50mW/cm²(ripple Long 365nm convert) light intensity carry out 80 seconds ultraviolet irradiate.Thus, make optical cement solidify, make touching of evaluation Control panel.

It is formed on the transparent conductive film substrate that ito film thickness is 28nm the film forming metal-oxide with the thickness of 100nm Substrate obtained by KL5-1.Coated optical bonding agent on the substrate, the glass blank of bonding 0.7mm.Then, ultraviolet is used Irradiation unit (Ai Yi figure Co., Ltd. system, UB011-3A type), with high voltage mercury lamp (input power 1000W) with 50mW/cm² The ultraviolet that the light intensity of (wavelength 365nm conversion) is carried out 80 seconds irradiates.Thus, make optical cement solidify, make evaluation and use Contact panel.

It is formed on the transparent conductive film substrate that ito film thickness is 28nm the film forming metal-oxide with the thickness of 100nm Substrate obtained by KL5-2.Coated optical bonding agent on the substrate, the glass blank of bonding 0.7mm.Then, ultraviolet is used Irradiation unit (Ai Yi figure Co., Ltd. system, UB011-3A type), with high voltage mercury lamp (input power 1000W) with 50mW/cm² The ultraviolet that the light intensity of (wavelength 365nm conversion) is carried out 80 seconds irradiates.Thus, make optical cement solidify, make evaluation and use Contact panel.

It is formed on the transparent conductive film substrate that ito film thickness is 28nm the film forming metal-oxide with the thickness of 100nm Substrate obtained by KL5-3.Coated optical bonding agent on the substrate, the glass blank of bonding 0.7mm.Then, ultraviolet is used Irradiation unit (Ai Yi figure Co., Ltd. system, UB011-3A type), with high voltage mercury lamp (input power 1000W) with 50mW/cm² The ultraviolet that the light intensity of (wavelength 365nm conversion) is carried out 80 seconds irradiates.Thus, make optical cement solidify, make evaluation and use Contact panel.

On the transparent conductive film substrate that ito film thickness is 28nm, being formed without the film of metal-oxide, direct coated optical glues Connect agent, the glass blank of bonding 0.7mm.Then, ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A are used Type), with high voltage mercury lamp (input power 1000W) with 50mW/cm²The light intensity of (wavelength 365nm conversion) carries out the ultraviolet of 80 seconds Line irradiates.Thus, make optical cement solidify, make the evaluation contact panel of the layer without metal-oxide.

On the transparent conductive film substrate that ito film thickness is 75nm, being formed without the film of metal-oxide, direct coated optical glues Connect agent, the glass blank of bonding 0.7mm.Then, ultraviolet lamp (Ai Yi figure Co., Ltd. system, UB011-3A are used Type), with high voltage mercury lamp (input power 1000W) with 50mW/cm²The light intensity of (wavelength 365nm conversion) carries out the ultraviolet of 80 seconds Line irradiates.Thus, make optical cement solidify, make the evaluation contact panel of the layer without metal-oxide.

In addition to the thickness of the film KL4 of metal-oxide is 30nm, is made by method similarly to Example 12 and comment The contact panel of valency.

It is formed on the transparent conductive film substrate that ito film thickness is 28nm the film forming metal-oxide with the thickness of 100nm Substrate obtained by KM1.Coated optical bonding agent on the substrate, the glass blank of bonding 0.7mm.Then, ultraviolet is used to shine Injection device (Ai Yi figure Co., Ltd. system, UB011-3A type), with high voltage mercury lamp (input power 1000W) with 50mW/cm²(ripple Long 365nm convert) light intensity carry out 80 seconds ultraviolet irradiate.Thus, make optical cement solidify, make touching of evaluation Control panel.

It is formed on the transparent conductive film substrate that ito film thickness is 28nm the film forming metal-oxide with the thickness of 100nm Substrate obtained by KM2.Coated optical bonding agent on the substrate, the glass blank of bonding 0.7mm.Then, ultraviolet is used to shine Injection device (Ai Yi figure Co., Ltd. system, UB011-3A type), with high voltage mercury lamp (input power 1000W) with 50mW/cm²(ripple Long 365nm convert) light intensity carry out 80 seconds ultraviolet irradiate.Thus, make optical cement solidify, make touching of evaluation Control panel.

It is formed on the transparent conductive film substrate that ito film thickness is 75nm the film forming metal-oxide with the thickness of 100nm Substrate obtained by KM2.Coated optical bonding agent on the substrate, the glass blank of bonding 0.7mm.Then, ultraviolet is used to shine Injection device (Ai Yi figure Co., Ltd. system, UB011-3A type), with high voltage mercury lamp (input power 1000W) with 50mW/cm²(ripple Long 365nm convert) light intensity carry out 80 seconds ultraviolet irradiate.Thus, make optical cement solidify, make touching of evaluation Control panel.

It is formed on the transparent conductive film substrate that ito film thickness is 75nm and is formed obtained by acrylic film KM3 with the thickness of 2 μm Substrate.Coated optical bonding agent on the substrate, the glass blank of bonding 0.7mm.Then, ultraviolet lamp (Chinese mugwort is used Easily figure Co., Ltd. system, UB011-3A type), with high voltage mercury lamp (input power 1000W) with 50mW/cm²(wavelength 365nm changes Calculate) light intensity carry out 80 seconds ultraviolet irradiate.Thus, make optical cement solidify, make and be formed with commenting of acrylic film Valency contact panel.

In embodiment 1～embodiment 18, when making evaluation contact panel, make during using it is formed with metal The substrate of the film (KL1～KL5) of oxide.For the film of each metal-oxide on this transparent conductive film substrate, according to JIS The cross patterning method of the adaptation of K5600 carries out disbonded test, evaluates adaptation.

Similarly, in comparative example 3～comparative example 7, when making evaluation contact panel, the formation made during using it There are film (KL4, KM1 and KM2) and the substrate of acrylic film (KM3) of metal-oxide, evaluate adaptation.

Use the evaluation contact panel made in embodiment 1～embodiment 18 and comparative example 1～comparative example 7, carry out ITO The evaluation of visible level of electrode pattern.

Each contact panel is placed on black cloth, is observed by naked eyes when irradiating light from top.Observe Result in, using sightless for electrode pattern contact panel as<electrode pattern visible level evaluate ◎>.Additionally, visible electrode Pattern, but its degree is compared with the contact panel of the comparative example 1 of the film in ito film without metal-oxide and comparative example 2 To the contact panel improved as<electrode pattern visible level evaluates zero>.It addition, with comparative example 1 and the touch surface of comparative example 2 The equal contact panel of plate is as<electrode pattern visible level evaluates △>, compared with the contact panel of comparative example 1 and comparative example 2 The more obvious contact panel of electrode pattern of ITO be evaluated as<×>.

The electrode pattern of the evaluation contact panel collecting embodiment 1～embodiment 18 and comparative example 1～comparative example 7 is visible The result of degree evaluation, is shown in table 2 together with the evaluation result of above-mentioned adaptation.

[table 2]

Understanding in the contact panel of embodiment 1～embodiment 15, the result that electrode pattern visible level is evaluated is good, electrode Even if pattern is invisible or visible its degree is improved compared with the comparative example of the film without metal-oxide.Therefore, logical Crossing the film forming the metal-oxide that refractive index and film thickness is adjusted on the transparent electrodes, the visible level of electrode pattern obtains Improve, electrode can be made not highlight.Additionally, also know that the adaptation of the film of each metal-oxide is higher than acrylic film.

As shown in Table 2, if using embodiment 1～embodiment 15, then can obtain and can reduce transparent electrode pattern The contact panel that display performance that is prominent and that cause declines.More particularly, it is possible to provide the projecting degree of transparent electrode pattern obtains Contact panel 1,101,201,301,401 to the present embodiment of suppression.

The probability utilized in industry

The electrode pattern of the contact panel of the present invention does not highlights, and the adaptation between member of formation is the best.Therefore, available As the display device contact panel requiring good outward appearance and high reliability.

Here quote the Japanese patent application 2010-240080 that on October 26th, 2010 files an application description, All the elements of claims, accompanying drawing and summary are as the announcement of description of the invention.

The explanation of symbol

1,101,201,301,401 contact panel

2,102,402 substrate

3,103,203,303,403 first transparency electrode

4,104,204,304,404 second transparency electrode

5,6,105,106,205,206,305,306,405,406 metal oxide layer

7,107,207 coverlay

9,108,109,208,209,308,408 clear adhesive material

10,110,210,310,410 display floater

11 lead-out wirings

14 transparent conductive film substrates

18 cross parts

19 interlayer dielectrics

20 bridging electrodes

21 bothridium portions

212,312 second substrate

407 are cladded with coating

Claims

1. contact panel, it is the capacitance type touch-control panel of pattern being formed with transparency electrode at the operating area of transparency carrier, It is characterized in that,

Using as the first composition with following formula (I)

M₁(OR)_n……(Ⅰ)

The metal alkoxide represented

As the second composition selected from metal chloride, metal nitrate, metal sulfate, metal acetate, metal second two Hydrochlorate, metal aminosulfonate, metal sulfonate, metal acetyl acetate, metal acetylacetonates and their basic salt At least one in the presence of in Water in Organic Solvents solution, condensation, then add anti-precipitation agent, by by the application composition shape of gained The layer of the metal-oxide become is configured at and prepares in described transparency electrode；

In formula I, M₁Representing metal, R represents the alkyl of C1～C5, and n represents M₁Valence mumber.

2. contact panel, it is the capacitance type touch-control panel of pattern being formed with transparency electrode at the operating area of transparency carrier, It is characterized in that,

Using as the first composition with following formula (I)

M₁(OR)_n……(Ⅰ)

The metal alkoxide represented

As the second composition selected from metal chloride, metal nitrate, metal sulfate, metal acetate, metal amino At least one and institute of sulfonate, metal sulfonate, metal acetyl acetate, metal acetylacetonates and their basic salt In Water in Organic Solvents solution, condensation in the presence of the oxalate of the metal stating the second composition, then add anti-precipitation agent, will be by institute The layer of the metal-oxide that the application composition obtained is formed is configured at and prepares in described transparency electrode；

3. contact panel as claimed in claim 1 or 2, it is characterised in that the metal M in described logical formula I₁For selected from silicon (Si), at least one of titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg), stannum (Sn) and zinc (Zn).

4. contact panel as claimed in claim 1, it is characterised in that the metal of described second composition is selected from aluminum (Al), indium (In), at least one of zinc (Zn), zirconium (Zr), bismuth (Bi), lanthanum (La), tantalum (Ta), yttrium (Y) and cerium (Ce).

5. contact panel as claimed in claim 2, it is characterised in that the metal of described second composition is selected from aluminum (Al), indium (In), at least one of zinc (Zn), zirconium (Zr), bismuth (Bi), lanthanum (La), tantalum (Ta), yttrium (Y) and cerium (Ce).

6. contact panel as claimed in claim 1 or 2, it is characterised in that the refractive index of the layer of described metal-oxide is 1.50～1.70, the thickness of this layer is 40nm～170nm.

7. contact panel as claimed in claim 1 or 2, it is characterised in that the refractive index of the layer of described metal-oxide is 1.54～1.68, the thickness of this layer is 40nm～170nm.

8. contact panel as claimed in claim 1 or 2, it is characterised in that described metal alkoxide is alkoxyl silicone and alkoxyl The mixture of titanium, or the mixture of the partial condensate of alkoxyl silicone and alkoxytitanium.

9. contact panel as claimed in claim 1 or 2, it is characterised in that described anti-precipitation agent is selected from N-crassitude Ketone, ethylene glycol, dimethylformamide, dimethyl acetylamide, diethylene glycol, propylene glycol, hexanediol and their derivant are extremely Few one.

10. contact panel as claimed in claim 1 or 2, it is characterised in that

Metallic atom (the M of the metal alkoxide contained by described application composition₁) and the metallic atom (M of the second composition₂) mol ratio Meet

0.01≤M₂/(M₁+M₂)≤0.7。

11. contact panels as claimed in claim 1 or 2, it is characterised in that described organic solvent include aklylene glycol or its Monoether derivant.

12. contact panels as claimed in claim 1 or 2, it is characterised in that described transparency electrode has for detection at least 2 First transparency electrode of the position of individual different directions and the second transparency electrode.

13. contact panels as claimed in claim 12, it is characterised in that described first transparency electrode and described second transparent electrical Pole is configured at the same face of described transparency carrier.

14. contact panels as claimed in claim 12, it is characterised in that described first transparency electrode and described second transparent electrical Pole is respectively arranged at the not coplanar of described transparency carrier.