201115680 六、發明說明： 【發明所屬之技術領域】 M斤本發明係關於一種在製造半導體裝置、印刷基板或液晶顯示 器等產品時作為防塵器使用的防塵薄膜組件。 【先前技術】 在LSI、超LSI等半導體裝置或是液晶顯示器等產品的製造過 ，中1會用光照射半導體晶圓或液晶用原板以製作形成圖案，惟 :此B才戶斤使用的初縮遮罩等的光罩有灰塵附著的話，由於該灰塵 ㈢^收，使光反射，除了會讓轉印的圖案變形、使邊緣變粗才造 之外’還會使基底污黑’損壞尺寸、品質、外觀等。 ，此’這些作業通f是在無塵室内進行，然而即使如此，想 #困難。於S ’在光罩表面貼附防塵 於#置本；為防塵益之後再進行曝光。此時’異物並非直接附著 罩表面上’喊瞒於防麟膜組件上，故只要在微影 景^對準光罩_案’防塵薄藤件上的異物就不會對轉印造成 維辛Hi唯件系將由具備良好透光性的靖化纖 ‘:=====明防塵薄膜，貼 桓架的上端面 '然後，在防靡壤n貝:斤構成的防塵潯膜組件 到光罩上而由聚丁烯樹脂、聚醋酸^下端設置用來裝設 二接層為目的的脫模層(隔離部）。 調整獅塵i膜裝置其基本動作都是共通的，在 膜組件框架與光罩平行，加壓位系之後，讓防塵薄 貼附到光罩後的防塵薄膜电附防塵薄膜組件。 須將其剝離。以往，如圖3所 右有理由需要更換的話就必 的剩離用央具從外側插f防靡f將前端設有很薄之突起部 間番入防塵賴組件框架32與 201115680 層33的分’以槓桿原理將防塵薄膜組件框架32橇起 Γ以=㈣爽具插入設置在防塵薄臈組件框架』 孔，以將防塵溥膜組件框架32撬起剝離。 由於很容易地就能將防塵薄膜組件剝離，然而 臈組;it罩 渣會變多，後續的洗淨步驟會很麻煩。另； 二型件時’便無法一口氣將其全==須屬 ^，故^效^很須考彭彳如何防錢被㈣的部分再度 法，能夠採用，但是僅限於拉伸時不容疋很好的方 此外最後在剝離難層時防塵=== 移動’故防塵薄膜組 架都=在，防=膜組件框 膜組件，-邊要將其固定使其位置；;會塵薄 的。在用手壓住的情況下作業效率也會降低，信賴下^目^困難 因此，亦有文獻揭示一種進行該剝離作業 ^ 碭。 2)。用強力的夹持構件固定防塵薄膜組件框^^ ^利文獻 =下，然而’該裝置會趨向大型化。因此，至二工,光罩 但光罩受職傷·紐健减，而;主流’ [先行_文獻] 玍屋放羊非“。 [專利文獻] [專利文獻1]曰本特開平〇9_068792號公報 201115680 號公報 [專利文獻2]日本特開2〇〇9_1513〇6 【發明内容】 [發明所欲解決的問題] 剝離問ΐ，在於提供一種簡便的防塵薄膜組件 作業時剛艮短2能夠以不傷及圖案面、安全、簡易且 離。 、式將貼附於光罩上的防塵薄膜組件從光罩剝 [解決問題之技術手段] 來將組件剝離用夾具’包含··固定構件，其用 其用來將夾具固下稱「夾具_」）， 臂部所;冓:夹罩上的固定構件，宜由第1臂部與第2 形成央魏接層用螺紋構件。 塵薄用上述本發明之防 組件的方^ 的遮祕接層拉級去，_離防塵薄膜 罩-=i發:剝離用夹具將防塵薄膜組件與光 在該狀態定。 塵賴組件在貼附於夾具粘接層上況、I，防 [對照先前技術之功效] 九罩上被取下。 若利用本發明，則由於防塵薄膜組 除去作業_仍保持在光罩上，故不會接 接層的 圖案面。另外，可在除去逆::勺圖案面而傷及 去‘罩枯接層之後，解除光罩與防塵薄膜 201115680 離用夾具之間的固定，將防塵薄膜組件在仍貼附 不會與光罩的圖案面接觸。因此^ 膜組件仍 簡易的方式除去防塵薄膜組件，；：安全且 間内完成作業。 …、颂心加人手，而能夠在短時 使防ίί 魏樹脂作為形成夾具_層_接劑時，即 使防塵賴是I樹脂，也能枯接固^ τ ’即 防塵薄膜組件剝_夹具的夹具枯接層時， 的殘渣（黏著劑殘渣）。 不曰殘留剝離後 【實施方式】 以下，説明本發明的實施形態，惟本發明並非以奸或阴^ 外，士發明對使用於液晶製造用途，一邊』度月μ匕為^另 牛而/特別有效果’然而應用‘用於半S用途型 特=定 小型防塵薄膜組件也很有效，故其用途並無 及其本發明之防賴驗侧_夾具的—個實施形態 薄膜ΪΓ12(==，Λ塵馳組件剝離用夾具10配置在防塵 固丄在==置尸1臂部14續第2臂部14b作為用來將么 ，疋在先罩上的固定構件’該第！臂部14a具有盘 g 面^第2臂部14b具有作為推屋構件的螺紋構i 4推光罩狀位基準，第2臂部⑽的螺紋構件 i固第1臂部14a的該抵接面，如是便可將夾 具固疋在先罩上，並將光罩定位好。 ’係用螺紋構件i4c構成鍾構件，惟只要 推昼光罩的構件，無論是什麼樣的機構，都能用來當作推 基部13 _向防塵薄膜組件12 _上隔著基底構件17設置 201115680 了夾具粘接層16，基部13的上部設置了手把15。 基部I3可用工程塑谬、金屬等具備剛性的材料 施形態中，基部13如圖1 (a)所示的係呈^狀，惟口 件义及先罩11 ’基。I5疋什麼樣的形狀都可以。例如 的構件作為基部，或是以在框狀構件之 ^ 件作為基部都可以。 表十扳狀構件的構 底面ί具祕層16亦可不隔著基底構件17而直接設置在基部的 該實施形態巾鮮㈣固定構件細只_光罩短 軸方向的方式配置’惟亦可只固定具灿 罩 兩個方向。 ㈣J/、a疋長軸方向’或固定互相垂直的 構成夾難接層16 _接舰鱗職定 接對象的防塵薄膜l2a _接性決定 氧樹脂、石夕氧樹脂等，其中宜使用石夕氧樹^伽丙席酸樹脂、環 外，防f薄膜是氣樹脂的情況下也能枯接固定。另 上附著防塵薄膜的碎片等，故必須將接層 層，惟由於石夕氧樹脂在被拉伸時不易破具枯接 殘渣（黏著劑殘渣），作案性極佳。 < 離後幾乎沒有 ^ 13 層，並將該兩面片材顧 用，則作業效率會比較好。 M m的大小再將其貼附利 基底構件Π係以調整基部與防塵薄 度、P方止光罩u _件損傷以 接力^ ^之間的高 寺的軟質樹脂作為板狀#件1@古 接f很是時，使用橡膠 近的光罩造成4破ί基底構件17宜具備防靜電性，以防止對接 7 201115680 性用所問，惟為了具備充分_彳 儘可能減少異物附著，並具宜使用樹脂，另外，宜 造成靜電破壞，故宜使用導電性以f止對光罩的圖案面 HDPE等材質。 电改MC耐倫、導電性PEEK、導電性 具的其=牛吏^^^成防塵薄膜組件剝離用夾 成靜電破壞，或防止作材料’以防顿光罩造 膜組^離Z。2説明使用該^塵薄膜組件剝離用夾具的防塵薄 握持手ί 15如第 第2 :部14b的螺紋構件He後退， 置於防塵薄膜纽件12之上。光罩11的—端-邊將其載 在基部13的底面的夹具枯接後上°52⑻所示的，設置 亦即防塵薄膜12a拯餹、而古"、防塵薄膜組件12的最上部， 部⑽觸^接雜住。在該狀態下，鎖緊第2臂 固定住。’、 e防塵賴組件剝離用夾具1G便將光罩η 29，將宜鹿者姑接性物質2%以製作出枯接層拉出夾具 附菩Γί 件框架⑵外側插入，讓遮罩枯接声12c 亚拉出到外側的方法也很有效。再者，$ 法拉出時，亦可一邊使用熱氣搶 示、等】c 軍招接^2C軟化-邊應用圖2⑽、⑽d核具讓遮 如疋’即使將整個遮罩枯接層12c完全除去，防 而不乃組件_用夾具】Ό的夾具細1 16雜保持住 如ί I C ::、被保持在從光罩U上被抬離而懸空的狀態。之後， 圖2⑷所示的，讓第2臂部⑽的螺紋構件…後退以解除 201115680 固定，抓住手把15將防塵薄膜組件剝離用夹且比 “完全 ί會接觸光罩11，故_底防止光 1G的夾具雜層16所枯 剝下，貼換新的失細妾層16，準備應付下 [實施例] =記述本發_實施例，惟本發日月並相此為限。 以且ϋ如圖L所不之構造的防塵薄膜組件剝離用夹具。基部13 』狀細63銘合金的壓製中空材製作成 部:高分子聚乙稀所製作的第1臂 。在第2臂部14b上安裝以防靜電MC耐 嫩構件14c。另外，在基部13上安裝防靜電樹脂 射^基部13之下設置防靜電PVC製的基底構件17。然 ^化後將/裁切成基底構件Π的形狀，於 面，以形成粘接層16。 將如是製作之防塵薄敵件__夾具1()，職在貼附著防 ^膜組^的光罩11上，形成圖1的狀態。在此，光罩11為 ^ . mmXl7mm的石英玻璃製的構件，防塵薄膜組件12 的卜寸為10j8mmxl526mm，内寸為1〇31_149〇臟，高度為 防塵薄膜的材料為氣樹脂’防塵薄膜組雜架為A5052鋁 a金製，構件，遮罩_層係由魏,赌綱構成的。 圖2 (a)所示的，從讓第2臂部14b的螺紋構件14c f的狀㈣始。在確認夾具轉層16與防塵薄膜⑵已確實枯 =將防塵薄，組件固定住之後，將第2臂部撕的螺紋構件* ’負緊’以防塵薄膜組件剝離用夹具1〇將光罩u固定。接著，如 201115680201115680 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a pellicle for use as a dustproof device in the manufacture of a semiconductor device, a printed substrate, or a liquid crystal display. [Prior Art] In the manufacture of semiconductor devices such as LSI and super LSI, or liquid crystal displays, the semiconductor wafer or the liquid crystal panel is used to form a pattern. However, this B is used. If the mask of the mask or the like is attached with dust, the dust is reflected by the dust (three), and the light is reflected. In addition to deforming the transferred pattern and making the edge thicker, it will also cause the substrate to become dirty. , quality, appearance, etc. This is the operation of the f in the clean room, but even so, I think #难. Apply a dust-proof to the surface of the reticle at S ’; then expose it to dust. At this time, 'foreign matter is not directly attached to the surface of the cover', screaming on the anti-lin film assembly, so as long as the foreign object on the micro-shadow ^ 对准 光 案 案 防尘 防尘 防尘 防尘 防尘 防尘 防尘 防尘 防尘 防尘 防尘 防尘 防尘 防尘 就 就 就 就The Hi-only part will be made of Jinghua fiber with good light transmission::=====Ming dustproof film, attached to the upper end surface of the truss', then, in the anti-soily soil On the other hand, a release layer (separation portion) for the purpose of mounting a two-layer layer is provided from the lower ends of the polybutene resin and the polyacetic acid. The basic actions of the lion dust i-film device are common. After the film assembly frame is parallel to the reticle and the pressure is applied, the dust-proof film attached to the reticle is attached to the dust-proof film assembly. It must be stripped. In the past, if there is a reason to replace it as shown in Fig. 3, it is necessary to remove the centering device from the outside to insert the f-proof 靡f. The front end is provided with a thin protrusion between the dust-proof component frame 32 and the 201115680 layer 33. 'The pellicle frame 32 is slid up by the principle of leverage to insert the squeegee frame into the squeegee frame frame to smash the squeegee assembly frame 32. Since the pellicle assembly can be easily peeled off, the slag can be increased, and the subsequent washing step can be troublesome. In addition, when the second type is used, it is impossible to make all of it == must be ^, so ^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^ The good side is also dust-proof when the hard layer is peeled off. === Moves, so the dust-proof film frame is =, the anti-film module frame film assembly, the side should be fixed to make it position; In the case of pressing by hand, the work efficiency is also lowered, and it is difficult to rely on the following. Therefore, there is also a literature revealing a kind of peeling operation ^ 砀. 2). Fixing the pellicle frame with a strong gripping member ^^^利文文=下, however, the device tends to be larger. Therefore, to the second work, the mask but the mask is injured by the injury, and the new mainstream '[progress_documentation] 玍屋放羊非". [Patent Literature] [Patent Document 1] 曰本特开平〇9_068792号[Patent Document 2] Japanese Patent Laid-Open Publication No. 2 〇〇 9_1 513 〇 6 [Disclosed] [Problems to be Solved by the Invention] The peeling problem is to provide a simple dustproof film assembly that can be short-circuited 2 The pellicle that is attached to the reticle is peeled off from the reticle, and the jig for detaching the component is included in the reticle, and the fixing member is included. It is used to fix the clamp to the "fixture _", the arm portion; 冓: the fixing member on the nipple is preferably formed by the first arm portion and the second thread forming member. The dust is thinned by the above-mentioned viscous layer of the anti-assembly of the present invention, and the detachment of the pellicle is made in this state. The dust-repellent component is attached to the bonding layer of the fixture, I, and is protected against the effect of the prior art. According to the present invention, since the pellicle removing operation _ remains on the reticle, the pattern surface of the layer is not connected. In addition, after removing the reverse::spoon pattern surface and hurting the 'cover layer, the fixing between the mask and the dustproof film 201115680 is removed, and the dustproof film assembly is still attached without the mask. The pattern is in contact with the surface. Therefore, the membrane module still removes the pellicle assembly in a simple manner; the work is completed safely and in between. ..., you can add a hand, and you can use the anti- ί 魏 树脂 作为 形成 形成 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , Residue (adhesive residue) when the jig is layered. [Embodiment] Hereinafter, the embodiment of the present invention will be described. However, the present invention is not intended to be used for liquid crystal manufacturing purposes, and the invention is used for liquid crystal production. Particularly effective 'however' is also effective for the semi-S use type of small-sized pellicle module, so its use is not the same as the anti-sliding side of the present invention - the embodiment of the film ΪΓ 12 (== The dust-carrying component peeling jig 10 is disposed in the dustproof solid body at the == corpse 1 arm portion 14 and the second arm portion 14b is used as a fixing member for the first cover, the first arm portion 14a The second arm portion 14b having the disk g surface has a threaded configuration of the second arm portion (10), and the screw member i of the second arm portion (10) is fixed to the abutting surface of the first arm portion 14a. The clamp can be fixed on the first cover and the photomask can be positioned. 'The threaded member i4c constitutes the clock member, but as long as the member of the light cover is pushed, no matter what kind of mechanism, it can be used as a push. Base 13 _ to the pellicle assembly 12 _ above the base member 17 set 201115680 fixture bonding 16, the handle portion 15 is provided on the upper portion of the base portion 13. The base portion I3 can be formed by a rigid material such as engineering plastic or metal, and the base portion 13 is formed as shown in Fig. 1 (a), but the mouthpiece is First cover 11 ' base. I5 疋 what kind of shape can be. For example, the member can be used as the base, or the frame member can be used as the base. Table 10 is the bottom of the structure of the member. The embodiment in which the base member 17 is directly disposed on the base portion is not disposed in a manner similar to the short-axis direction of the reticle, but may be fixed only in two directions. (4) J/, a 疋 long The axial direction ' or the fixed perpendicular to each other constitutes a difficult-to-connect layer 16 _ the dust-proof film l2a _ the connection of the ship's scales to determine the oxygen resin, the stone oxide resin, etc., which should use the stone oxime tree ^ gamma When the acid resin and the anti-f film are made of a gas-resin, they can be fixed and fixed. The other is attached with a chip of the pellicle film, etc., so it is necessary to connect the layer, but it is not easy to break when it is stretched. With dead residue (adhesive residue), it is excellent in case of crime. < There is almost no 13 layers after the separation, and the two-sided sheet is used, the work efficiency will be better. The size of the M m will be attached to the base member to adjust the base and the dust thinness, and the P square stop light. Cover u _ piece damage to the high-soft soft resin between the relay ^ ^ as a plate shape #件1@古接f is very, when using a rubber near the mask to cause 4 broken 基底 base member 17 should have anti-static properties, Prevent the docking 7 201115680 Sexual use, but in order to have sufficient _ 彳 to minimize the adhesion of foreign matter, and the use of resin, and should cause electrostatic damage, it is advisable to use conductivity to stop the mask surface of the mask Material: Electrically modified MC Nylon, conductive PEEK, conductive material = burdock ^^^ into a pellicle module peeling with a clip to form electrostatic damage, or to prevent the material from being used to prevent the reticle film forming group ^Z . (2) The dust-proof thin gripper using the jig film assembly peeling jig is explained. The thread member He of the second portion 14b is retracted and placed on the pellicle blank member 12. The end-side of the photomask 11 is mounted on the bottom surface of the base portion 13 and is attached to the upper portion 52 (8). The dust-proof film 12a is provided, that is, the uppermost portion of the pellicle 12 is disposed. Department (10) touches and mixes. In this state, the locking arm 2 is fixed. ', e dust-proof component peeling jig 1G will be the mask η 29, 2% of the Yilu people's auspicious material to make a dry layer pull out the fixture attached to the Γ Γ 件 frame (2) outside, let the mask dry The method of sub-pulling the acoustic 12c to the outside is also very effective. In addition, when the law is pulled out, you can also use the hot air to grab the display, etc.] c army recruits ^2C softening - while applying the Figure 2 (10), (10) d nuclear fixture to make the cover such as "even remove the entire mask dead layer 12c completely , prevention and not components _ with the fixture Ό 夹具 细 1 16 16 16 16 16 16 16 16 16 IC IC IC IC IC IC IC IC IC IC IC IC IC IC IC IC IC IC IC IC IC IC Then, as shown in Fig. 2 (4), the threaded member of the second arm portion (10) is retracted to release the fixing of 201115680, and the gripper 15 is grasped to peel the pellicle assembly and the contact lens is completely "contacted with the photomask 11," The pick-up impurity layer 16 of the light 1G is prevented from being peeled off, and the new fine-grained layer 16 is replaced and prepared for handling. [Embodiment] = Description of the present invention - the present embodiment is limited to the date of the present invention. Further, a pellicle for peeling off the pellicle film structure, which is not shown in Fig. L. The base portion 13 is a sintered hollow material of a 63-shaped alloy, and the first arm made of a polymer polyethylene is used in the second arm. An antistatic MC anti-tender member 14c is mounted on the 14b. Further, an antistatic resin base member 17 is disposed on the base portion 13 and an antistatic PVC base member 17 is disposed under the base portion 13. After that, the substrate member 17 is cut/cut into a base member. The shape is formed on the surface to form the adhesive layer 16. The viscous thin member __clamp 1 () which is produced is placed on the reticle 11 to which the tamper-proof film group is attached, and the state of Fig. 1 is formed. Therefore, the reticle 11 is a member made of quartz glass of mm×l7 mm, and the size of the pellicle assembly 12 is 10j8 mm×l 526 mm. It is 1〇31_149 dirty, the material of the dust-proof film is made of a gas-permeable resin. The dust-proof film group is made of A5052 aluminum a gold, and the component and the mask _ layer are composed of Wei and gambling. Figure 2 (a) Starting from the shape (4) of the screw member 14c f of the second arm portion 14b, it is confirmed that the jig transfer layer 16 and the pellicle film (2) are indeed dry. The dust is thin and the assembly is fixed, and then the second arm portion is torn. Threaded member * 'negatively tight' to fix the mask u with the pellicle assembly peeling jig 1 Next, as in 201115680
Sim所示的從遮罩轉層12C的外側插入在厚度Mmm的 ίt 氧祕劑观的_拉出夾具29， 的枯接層除i。/+接拉出。之後，持續拉出動作，將整侧圍 理，罩枯接層的拉出長度太長的話會變得很難處 外，時就用剪刀切斷再繼續進行作業。另 e u局评電而對先罩造成靜電破壞。 5 1 Hb ^ 防塵薄膜組件12整個從f罩^ 把15緩緩向上方抬起，將 表面，遮罩’用照度3〇萬LX的齒素燈檢查光罩 損傷，靖賴W現 劑附T者的巧潰（點接劑的殘渣）可用擦拭布浸潤有機溶 “ t ’EXXGn MGbil公司製）輕輕擦拭便可輕易 即使是像但完全沒有對光罩造成損傷的疑慮，而且 ω tilt ㈣大喻㈣驗件，《時間也只有 防塵嶋健完成後，在遠離鮮的安全場所將 夾且钻接# 16 麵聽侧軸爽具ω取下，替換新的 叉/、拈接層16 ’該作業所花時間頂多5分左右。 [比較例] 的剝施同的防塵薄膜組件以及光罩，用圖3所示 組件ΐ架％的下==離fί。_離用夾具％插入防塵薄臈 ί ii 31咖嫌，細卿膜‘ 邊在已、__部分夹人樹脂板的小片—邊進行作業，並沿著、 10 201115680 件框架32 —邊進行作業。鈇 _ 邊魘著防塵薄膜組 =者全員同時將防塵薄剝離之 起，移到安全的地方去。 木％皱緩攸先罩31上抬 件人膜組 生產效率非常差_。另外 貝所而要的時間約為1小時間， 險，在件-直存在著接觸光罩的危 【圖式簡單說明】 實施:態T及之;膜組件剝離用夾具的-個 段的剖面圖心吏 圖。圖2(a)〜(d)係表示本發明之防塵薄膜組件的剝離方法的説明 明圖 圖3係表示f知防塵薄膜組件的剝離方法的一個實施例的説 【主要元件符號說明】 10〜防塵薄膜組件剝離用夾具 11、31〜光罩 一 12〜防塵薄膜組件 12a〜防塵薄膜 12b、32〜防塵薄膜組件框架 12c、33〜遮罩枯接層 13〜基部 14a〜第1臂部 201115680 14b〜第2臂部 14c〜螺紋構件 15〜手把 16〜夾具粘接層 17〜基底構件 2 8〜録子 29〜枯接層拉出夾具 29a〜薄板 29b〜粘接性物質 30〜剝離用夾具 A-A〜剖面線 # B〜部分The splicing layer 29 of the _ pull-out jig 29, which is inserted from the outer side of the mask layer 12C at the thickness of Mmm, is shown by Sim, except for i. /+ pull out. After that, the pull-out operation is continued, and the entire side is surrounded. If the pull-out length of the cover layer is too long, it becomes difficult to remove it, and the scissors are cut and the work is continued. In addition, the e-state evaluated the electricity and caused electrostatic damage to the first cover. 5 1 Hb ^ Pneumatic film assembly 12 is lifted from the f cover ^ 15 gradually upwards, and the surface, the mask is covered with a illuminance lamp of 30,000 LX illuminating the mask damage, Jing Lai W is now attached with T The smashing of the squeezing agent (the residue of the splicing agent) can be easily wiped with a wiping cloth infiltrated with organic solvent "t'EXXGn MGbil". Even if it is like but there is no doubt about damage to the reticle, and ω tilt (four) is large Yu (4) Inspection, "The time is only after the dust-proof and healthy, after the removal from the fresh and safe place, the clip will be removed and replaced with a new fork/, splicing layer 16' The time spent on the work is at most about 5 minutes. [Comparative example] The same ply-proof film assembly and reticle are used, and the truss of the assembly shown in Figure 3 is lower == from fί.臈ί ii 31 is too ridiculous, the fine film is working on the side of the __ part of the resin plate, and working along the side of the 10 201115680 frame 32. 鈇 _ 防尘 防尘 防尘 防尘 防尘Group = all the members at the same time will peel off the dust thin, move to a safe place. Wood% wrinkle 攸 first cover 3 1 The production efficiency of the upper lifting film group is very poor _. In addition, the time required for the shell is about 1 hour, and the risk is in the danger of touching the mask. [Simplified description of the diagram] Implementation: State T and FIG. 2(a) to (d) are views showing a method of peeling off the pellicle of the present invention. FIG. 3 is a view showing a pell film. [Embodiment of the main component symbol] of the embodiment of the peeling method of the component 10~ The pellicle assembly peeling jig 11, 31 to the mask 12 to the pellicle film 12a, the pellicle film 12b, 32 to the pellicle frame 12c, 33~mask dry layer 13 to base portion 14a to first arm portion 201115680 14b to second arm portion 14c to screw member 15 to handle 16 to clamp bonding layer 17 to base member 2 8 to record 29 to dry Layer drawing jig 29a to thin plate 29b to adhesive substance 30 to peeling jig AA to hatching # B to part
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