JP2011095661A - Pellicle - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a pellicle separable from a photo mask by easily removing an adhesive layer from between the photo mask and a pellicle frame. <P>SOLUTION: In this pellicle, the adhesive layer 16 for sticking to the photo mask is formed only in an area having 80% or less of the width of pellicle frame 11 from the inside of the pellicle frame 11 on one surface 12 of the pellicle frame 11, and an inclined surface 15 inclined toward the other surface 13 of the pellicle frame 11 to which a pellicle film 20 is bonded is provided on the pellicle frame 11 outside the area where the adhesive layer 16 is formed. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a pellicle used as a dust-proof cover when manufacturing a semiconductor device, a printed circuit board, a liquid crystal display, or the like, and more particularly to a pellicle that can be easily attached.

  In manufacturing a semiconductor device such as an LSI or a VLSI or a liquid crystal display, a semiconductor wafer or a liquid crystal master plate is exposed to light via a photomask or a reticle (hereinafter collectively referred to as a photomask). Light is irradiated to transfer the pattern of the photomask.

  Therefore, in this case, if foreign matter such as dust adheres to the photomask, the exposure light is reflected or absorbed by the foreign matter, so the pattern transferred to the semiconductor wafer or the liquid crystal master plate Or the edge of the pattern becomes unclear, the photomask pattern cannot be transferred to the semiconductor wafer or the liquid crystal master as desired, and the performance of the semiconductor device or the liquid crystal display is reduced. There was a problem that the yield deteriorated.

  In order to prevent such a problem, the exposure of the semiconductor wafer or the liquid crystal master plate is performed in a clean room, but it is still difficult to completely prevent foreign matter from adhering to the surface of the photomask. Is configured such that a dust-proof cover called a pellicle having a high transmittance with respect to light for exposure is attached to the surface of a photomask to expose a semiconductor wafer or a liquid crystal master.

  The pellicle is generally formed of aluminum, stainless steel, polyethylene, etc. by producing a pellicle film having a high transmittance with respect to light for exposure using a cellulose-based resin such as nitrocellulose or cellulose acetate or a fluorinated resin. A pellicle film is adhered to one surface of the pellicle frame, and an adhesive layer made of polybutene resin, polyvinyl acetate resin, acrylic resin, silicone resin, etc. is formed on the other end surface of the pellicle frame. Further, the protective sheet (separator) for protecting the pressure-sensitive adhesive layer is attached to the surface of the pressure-sensitive adhesive layer.

  When a pellicle configured in this way is attached to the surface of a photomask and a semiconductor wafer or liquid crystal master is exposed, foreign substances such as dust adhere to the surface of the pellicle and directly adhere to the surface of the photomask. Therefore, if the exposure light is irradiated so that the focal point is positioned on the pattern formed on the photomask, the influence of foreign matters such as dust can be removed.

  When a pellicle manufactured in this way is attached to a photomask, first, after adjusting the positional relationship between the pellicle and the photomask, the pellicle frame is pressed in parallel with the photomask for a certain period of time, whereby the photomask is applied. The pellicle is pasted.

  In this way, when a semiconductor wafer or a liquid crystal master is exposed through a pellicle affixed to a photomask, the pellicle film becomes contaminated with a region that cannot be ignored or scratched as it is used. When the pellicle film is damaged, such as sticking, it is required to peel the pellicle from the photomask.

  FIG. 10 is a schematic front view showing a conventional peeling method when peeling a pellicle from a photomask.

  As shown in FIG. 10, conventionally, a peeling jig 40 having a thin protrusion formed at the tip is inserted between the photomask 25 and the pellicle frame 11, and the pellicle frame 11 is lifted by the lever principle. Then, the pressure-sensitive adhesive layer 16 is peeled off from the mask 25, or a pin-shaped jig is inserted into a round hole formed on the outer surface of the frame, and the pellicle frame 11 is lifted by the principle of the lever, and the pressure-sensitive adhesive layer 16 The method of peeling off from the mask 25 was common.

These conventional methods are simple and easy to peel the pellicle from the photomask 25, but forcefully apply a force more than the adhesive force between the pressure-sensitive adhesive layer 16 and the photomask 25, Since the pellicle frame 11 is peeled off from the surface of the photomask 25, the amount of the adhesive remaining on the surface of the photomask 25 increases after peeling, and a lot of time and labor are required to clean the photomask 25. There was a problem that it took. In addition, in the conventional peeling method, when the pellicle frame 11 is peeled off from the photomask 25, the adhesive layer 16 adheres to the pattern of the photomask 25, and the pattern is damaged or contaminated. There was a problem. In addition, in the case of a large pellicle, since the side length is long, the pellicle frame 11 must be peeled off from the photomask 25 one by one, but the portion of the pellicle frame 11 peeled off from the photomask 25 However, the pellicle frame 11 needs to be peeled off so that it does not adhere to the photomask 25 again.

  For this reason, Japanese Patent Application Laid-Open No. 2006-146085 (Patent Document 1) proposes a method of peeling the pellicle frame from the photomask by dragging and removing the adhesive layer as it is between the photomask and the pellicle frame. is doing.

JP 2006-146085 A

This method has an advantage that the amount of the adhesive remaining on the photomask surface after peeling the pellicle frame is reduced, but there is a problem that it is difficult to first drag out the adhesive layer from between the photomask and the pellicle frame. It was. That is, as a method of dragging the adhesive layer as it is from between the photomask and the pellicle frame, as shown in FIG. 11A, the tweezers 50 are used to attach the adhesive layer from between the photomask 25 and the pellicle frame 11. The adhesive layer 16 is made sticky by using a method for grasping the adhesive layer 16 or using an adhesive layer drawing tool 33 made of a thin metal plate 31 to which an adhesive substance 32 is attached as shown in FIG. A method of attaching to the substance 32 and dragging it from between the photomask 25 and the pellicle frame 11 is known, but when the adhesive layer 16 is not exposed between the photomask 25 and the pellicle frame 11, In the method shown in FIG. 11 (a), it is difficult to grasp the adhesive layer 16 with the tweezers 50, while the method shown in FIG. 11 (b). In this case, it is difficult to insert the adhesive layer drawer 33 between the photomask 25 and the pellicle frame 11 to securely adhere the adhesive layer 16 to the adhesive substance 32, and workability is improved. In addition, the pattern surface of the photomask 25 may be damaged. In particular, in the case of a large pellicle with a wide width of the pellicle frame 11, the adhesive layer 16 is not provided over the entire width and is often provided only on the inner side, and therefore the adhesive layer 16 is provided on the outer surface of the pellicle. Since it is not exposed, it is extremely difficult to drag the adhesive layer 16 from between the photomask 25 and the pellicle frame 11 as desired.

For this reason, the method proposed by Patent Document 1 has not been put into practical use in spite of the advantage that the amount of the adhesive remaining on the photomask surface after peeling the pellicle frame is reduced.

Accordingly, an object of the present invention is to provide a pellicle capable of easily removing an adhesive layer from between a photomask and a pellicle frame and peeling it from the photomask.

An object of the present invention is to form an adhesive layer on one surface of the pellicle frame only from the inside of the pellicle frame in an area of 80% or less of the width of the pellicle frame, and the adhesive layer is formed. This is achieved by a pellicle having an inclined surface that is inclined toward the other surface of the pellicle frame on the pellicle frame outside the region.

According to the present invention, even when an adhesive layer is formed on one surface of the pellicle frame only from the inside of the pellicle frame to an area of 80% or less of the width of the pellicle frame, Since the inclined surface is inclined toward the surface, the adhesive layer can be easily visually recognized from the outside, and not only the visibility is greatly improved, but also a tool for dragging out the adhesive layer. In the part where the pellicle frame is inserted, the gap between the pellicle frame and the photomask is wide, and the adhesive layer can be easily grasped and dragged, so the workability is greatly improved. While taking advantage of the reduced amount of adhesive remaining in the adhesive layer, the adhesive layer can be easily dragged to remove the pellicle frame as desired. It is possible to peel the click surface.

In a preferred embodiment of the present invention, the pellicle frame has four or more sides, and the inclined surface is formed at at least one corner of the pellicle frame.

According to a preferred embodiment of the present invention, since the inclined surface is only formed at at least one corner of the pellicle frame, the decrease in rigidity of the pellicle frame is minimized, and the tension of the pellicle film causes the pellicle frame to On the other hand, since the inclined surface is formed in at least one corner of the pellicle frame, the adhesive layer is pulled out from the corner where the inclined surface is formed. The pressure-sensitive adhesive layer can be easily pulled out by inserting the tool, and the pellicle can be peeled off from the photomask surface as desired.

  In a further preferred aspect of the present invention, the inclined surface is formed at an angle of 10 degrees to 30 degrees with respect to the one surface of the pellicle frame.

According to a further preferred embodiment of the present invention, since the inclined surface is formed at an angle of 10 degrees to 30 degrees, the decrease in rigidity of the pellicle frame is minimized, and the pellicle frame is deformed by the tension of the pellicle film. While preventing this, the visibility of the pressure-sensitive adhesive layer and the workability when dragging the pressure-sensitive adhesive layer can be greatly improved.

In a further preferred embodiment of the present invention, a pellicle film is bonded to the other surface of the pellicle frame via an adhesive layer.

In a more preferred embodiment of the present invention, the adhesive layer contains a silicone resin.

In a further preferred embodiment of the present invention, the pressure-sensitive adhesive layer is formed of a silicone resin.

ADVANTAGE OF THE INVENTION According to this invention, it becomes possible to provide the pellicle which can remove an adhesive layer easily from between a photomask and a pellicle frame, and can peel from a photomask.

FIG. 1 is a schematic plan view of a pellicle frame used in a pellicle according to a preferred embodiment of the present invention. FIG. 2 is a schematic longitudinal sectional view of each side of the pellicle frame shown in FIG. 3 is a schematic vertical sectional view of each corner of the pellicle frame shown in FIG. FIG. 4 is a schematic perspective view of a pellicle in which an adhesive layer is formed on the pellicle frame shown in FIG. FIG. 5 is a schematic perspective view showing a method of removing the pressure-sensitive adhesive layer from the pellicle, and is a view of the pellicle as viewed from the side opposite to FIG. FIG. 6 is a schematic perspective view showing a method of removing the adhesive layer from the pellicle, and is a view of the pellicle as viewed from the side opposite to FIG. 7 (a), (b), (c), (d), (e), and (f) are process diagrams showing a process of dragging the adhesive layer from between the inclined surface of the pellicle frame and the photomask. is there. FIG. 8 shows a pellicle according to another preferred embodiment of the present invention, in which an inclined surface is formed in a linear portion of the pellicle frame, and an adhesive layer is formed in a gap between the inclined surface of the pellicle frame and the photomask. The drawing which shows the contact surface with the photomask of a pellicle in the case of inserting a drawer and sticking the adhesive substance and adhesive layer adhering to the front-end | tip part of an adhesive layer drawer, and dragging out the adhesive layer 16 is there. FIG. 9 shows a pellicle according to a preferred embodiment of the present invention, in which an inclined surface is formed at a corner of the pellicle frame, and an adhesive layer drawer is provided in the gap between the inclined surface of the pellicle frame and the photomask. It is drawing which shows the contact surface with the photomask of a pellicle in the case of inserting and sticking the adhesive substance and adhesive layer which adhered to the front-end | tip part of an adhesive layer extraction tool, and dragging out an adhesive layer. FIG. 10 is a schematic front view showing a conventional peeling method when peeling a pellicle from a photomask. FIG. 11 is a schematic front view showing a conventional peeling method different from that in FIG. 10, which is a conventional peeling method when peeling a pellicle from a photomask.

  FIG. 1 is a schematic plan view of a pellicle frame according to a preferred embodiment of the present invention.

  As shown in FIG. 1, the pellicle frame 11 has a quadrilateral shape having four sides that form an angle of about 90 degrees with each other, and an adhesive that attaches a photomask (not shown) to the flat upper surface thereof. A layer (not shown) is formed, and an adhesive layer (not shown) for adhering a pellicle film (not shown) is formed on the flat lower surface.

  2 is a schematic longitudinal sectional view of each side of the pellicle frame 11 shown in FIG. 1, and FIG. 3 is a schematic longitudinal sectional view of each corner of the pellicle frame 11 shown in FIG.

  As shown in FIGS. 2 and 3, the pellicle frame 11 has an upper surface 12 and a lower surface 13 that are parallel to each other except for each corner, that is, a surface 12 on the side on which an adhesive layer is to be formed (hereinafter referred to as “adhesive”). And a surface 13 on which the pellicle film is to be bonded (hereinafter referred to as “pellicle film bonding side surface”), and has a pellicle frame 11 at each corner. An inclined surface 15 is formed from the adhesive layer forming side surface 12 toward the pellicle film adhesion side surface 13, and the inclined surface 15 forms an angle α with the adhesive layer forming side surface 12 of the pellicle frame 10.

  FIG. 4 is a schematic perspective view of a pellicle in which an adhesive layer is formed on the pellicle frame 11.

  As shown in FIGS. 3 and 4, a step 14 is formed at each corner of the pellicle frame 11, and an adhesive containing silicone resin is applied on the step 14 to form an adhesive layer 16. Has been. Further, an inclined surface 15 is formed at each corner of the pellicle frame 11 from the adhesive layer forming side surface 12 of the pellicle frame 11 toward the pellicle film bonding side surface 13.

  In the present embodiment, the pressure-sensitive adhesive layer 16 is formed on an area of 80% or less of the width of the pellicle frame 11 from the inside to the outside of the pellicle frame 11, and the surface of the pressure-sensitive adhesive layer 16 is a photomask (see FIG. (Not shown).

  As shown in FIG. 3, the inclined surface 15 forms an angle α with the adhesive layer forming side surface 12 of the pellicle frame 11.

  In this embodiment, the angle α formed by the inclined surface 15 and the adhesive layer forming side surface 12 of the pellicle frame 11 is preferably 10 degrees to 30 degrees. When the angle α exceeds 30 degrees, the thickness of the pellicle frame 11 at the outer end of the inclined surface 15 becomes too thin, making it difficult to handle the pellicle frame 11, while the angle α is 10 degrees. In the case of less than the above, when a photomask (not shown) is formed on the pressure-sensitive adhesive layer 16, the gap between the pellicle frame 11 and the photomask is too narrow and the pressure-sensitive adhesive layer 16 can be visually recognized. Not only is this difficult, but an adhesive layer drawer (not shown) is inserted into the gap between the pellicle frame 11 and the photomask so that the adhesive layer 16 is not easily pulled out, and the workability can be sufficiently improved. Can not.

  5 and 6 are schematic perspective views showing a method of removing the pressure-sensitive adhesive layer from the pellicle, and the pellicle is viewed from the side opposite to FIG.

  As shown in FIGS. 5 and 6, the pellicle 10 includes an adhesive layer 21 that adheres the pellicle film 20 to the pellicle frame 11 and an adhesive layer 16 that adheres to the photomask 25. Here, since the inclined surface 15 is provided below the pellicle frame 11, it is not shown in FIGS.

  In removing the pressure-sensitive adhesive layer 16 from the photomask 25, as shown in FIG. 5, a pressure-sensitive adhesive layer drawing tool 33 in which a pressure-sensitive adhesive material 32 is attached to the surface of the tip portion of a thin metal plate 31 such as stainless steel, It is inserted between an inclined surface 15 (not shown in FIGS. 5 and 6) formed at the corner of the pellicle frame 11 and the photomask 25.

As a result, the adhesive substance 32 attached to the front end surface of the metal thin plate 31 of the adhesive layer drawing tool 33 and the adhesive layer 16 to which the photomask 25 is attached adhere.

At this time, since the inclined surface 15 is formed on the pellicle frame 11, the gap between the pellicle frame 11 and the photomask 25 is wide, and therefore the adhesive layer 16 can be easily visually recognized from the outside. Without inserting the adhesive layer drawer 33 between the pellicle frame 11 and the photomask 25, the adhesive substance 32 attached to the tip of the adhesive layer drawer 33 can be easily and reliably attached to the adhesive substance 32. The pressure-sensitive adhesive layer 16 can be attached.

  Therefore, when the pressure-sensitive adhesive layer lead-out tool 33 is slowly pulled out from between the inclined surface 15 and the photomask 25, as shown in FIG. The adhesive layer 16 adhering to the adhesive substance 32 is peeled off from the photomask 25, and the adhesive layer 16 is dragged out as if it were a string.

  Thus, since the adhesive layer 16 is dragged out like a string from between the inclined surface 15 and the photomask 25 by the adhesive layer drawer 33, the adhesive layer drawer 33 is attached to the pellicle frame 11. The pressure-sensitive adhesive layer 16 can be dragged out by being moved along the circumference.

  7 (a), (b), (c), (d), (e) and (f) are from between the inclined surface (not shown in FIG. 7) of the pellicle frame 11 and the photomask 25. FIG. 4 is a process diagram showing a process of dragging out the pressure-sensitive adhesive layer 16.

  As shown in FIG. 7A, the adhesive layer drawer 33 is attached to the adhesive layer 16 attached to the gap between the inclined surface 15 formed at the corner of the pellicle frame 11 and the photomask 25. Is inserted, and the adhesive substance 32 and the adhesive layer 16 attached to the tip of the adhesive layer drawing tool 33 are attached.

  Next, as shown in FIG. 7B, when the adhesive layer drawer 33 is slowly pulled out from between the inclined surface 15 and the photomask 25, the adhesive substance at the tip of the adhesive layer drawer 33 is shown. The adhesive layer 16 attached to 32 is dragged out together with the adhesive layer drawer 33 as if it were a string.

  At this time, when the pressure-sensitive adhesive layer 16 is dragged out in the form of two strings, it is difficult to work, so as shown in FIG. One side is cut with a cutting tool such as a grudge, and the string-like pressure-sensitive adhesive layer 16 separated from the pressure-sensitive adhesive layer drawing tool 33 is gripped with a gripping tool such as tweezers, and FIGS. As shown in f), the gripping tool that holds the string-like adhesive layer 16 is moved along the periphery of the pellicle frame 11, and the string-like adhesive layer 16 is sequentially dragged out.

  As described above, according to this embodiment, the inclined surface 15 that forms the angle α of 10 degrees to 30 degrees with respect to the adhesive layer forming side surface 12 of the pellicle frame 11 is formed at the corner of the pellicle frame 11. In addition, the gap between the pellicle frame 11 and the photomask 25 is wide so that the adhesive layer 16 can be easily visually recognized from the outside, and the adhesive layer drawing tool 33 is provided between the pellicle frame 11 and the photomask 25. The pressure-sensitive adhesive layer 16 is attached to the pressure-sensitive adhesive material 32 attached to the tip of the pressure-sensitive adhesive layer drawing tool 33, and dragged out and peeled off from the photomask 25. It becomes possible.

  FIG. 8 shows a pellicle according to another preferred embodiment of the present invention, in which an inclined surface is formed at a corner portion of the pellicle frame, and an adhesive layer is drawn into a gap between the inclined surface of the pellicle frame and the photomask. It is drawing which shows the contact surface with the photomask of a pellicle in the case of inserting a tool, making the adhesive substance and adhesive layer adhering to the front-end | tip part of an adhesive layer extraction tool adhere, and dragging out an adhesive layer.

As shown in FIG. 8, in this embodiment, the inclined surface 15 is formed in a linear portion of the pellicle frame 11, and the inclined surface 15 of the pellicle frame 11 and a photomask (not shown in FIG. 8). The adhesive layer drawer 33 is inserted into the gap between the adhesive layer 32, the adhesive substance 32 and the adhesive layer 16 attached to the tip of the adhesive layer drawer 33 are adhered, and the adhesive layer 16 is dragged out. 9 is a drawing showing the contact surface between the pellicle and the photomask in the case, while FIG. 9 shows that the inclined surface 15 is formed at the corner of the pellicle frame 11 and the inclined surface 15 of the pellicle frame 11 is the same as in the above embodiment. An adhesive layer drawer 33 is inserted into a gap between the photomask and the photomask (not shown in FIG. 9), and the adhesive substance 32 and the adhesive adhered to the tip of the adhesive layer drawer 33 With layer 16 Attached is a diagram showing the contact surface of the pellicle and the photomask when Hikizuridasu the adhesive layer 16.

Comparing FIG. 8 and FIG. 9, the length when a portion at a predetermined distance from the point of application of the tensile force is projected on a plane perpendicular to the tensile force applied to the adhesive layer 16 is as shown in FIG. Since the length is longer and therefore the resistance is larger, it is more preferable to form the inclined surface 15 at the corner of the pellicle frame 11 as shown in FIG.

Examples are given below to clarify the operational effects of the present invention.

From a rolled plate of Example A5052 aluminum alloy, outer dimensions 1526 x 1748 mm, inner dimensions 1493 x 1711 mm, overall thickness 6.2 mm, along the inside of one surface on the side where the adhesive layer is formed, with a width of 6 mm, A quadrilateral pellicle frame provided with a step of 0.2 mm in height was manufactured by machining.

Further, the four corners of the pellicle frame are provided with inclined surfaces that form an angle of 15 degrees with one surface of the pellicle frame toward the other surface on the side where the pellicle film is bonded to the outside of the step. .

After finishing the machining, both surfaces of the pellicle frame were sandblasted and further black anodized.

A silicone adhesive (manufactured by Shin-Etsu Chemical Co., Ltd .; trade name “KR3700”) is diluted with toluene on the other surface of the pellicle frame and applied to a dry film thickness of about 100 μm to form an adhesive layer. did.

On the other hand, on one surface of the pellicle frame, a silicone adhesive (manufactured by Shin-Etsu Chemical Co., Ltd .; trade name “KR3700”) is diluted with toluene, and on the step of the pellicle frame, from the inside of the pellicle frame The pressure-sensitive adhesive layer was applied so as to have a width of 6 mm, and finished to a thickness of about 2 mm.

Thereafter, the pellicle frame was heated at a temperature of 130 ° C. to remove the solvent in the pressure-sensitive adhesive layer and the adhesive layer and to completely cross-link the silicone pressure-sensitive adhesive.

In this way, a pellicle frame 11 having a step 14, an adhesive layer 16, and an inclined surface 15 formed at each corner as shown in FIG. 4 was obtained.

  Next, a 1620 × 1780 mm quartz substrate whose surface was polished smoothly was washed and dried, and then a fluororesin (manufactured by Asahi Glass Co., Ltd .; trade name “Cytop”) was applied to one surface thereof using a die coating method. The film was applied so that the film thickness after drying was 6 μm.

  Thereafter, the quartz substrate coated with the fluororesin layer was heated to 200 ° C. in an oven to remove the solvent.

  After cooling, a frame-shaped film peeling jig was bonded to the fluororesin layer and slowly peeled off from the quartz substrate to obtain a pellicle film.

  Finally, the pellicle film thus obtained was bonded to the adhesive layer of the pellicle frame 11 and the excess part on the outside was cut off with a cutter.

In this way, the pellicle 10 was produced.

  Next, the pressure-sensitive adhesive layer 16 of the pellicle 10 was attached to a quartz film photomask 25 with a Cr film with a size of 1620 mm × 1780 mm and a thickness of 17 mm with a load of 400 kgf.

  Thereafter, as shown in FIG. 5 and FIG. 6, an adhesive layer drawing tool 33 is inserted into the gap between the inclined surface 15 at the corner of the pellicle 10 and the photomask 25, and the corner of the pellicle 10 is The pressure-sensitive adhesive layer 16 was dragged out from between the inclined surface 15 and the photomask 25.

  That is, a silicone adhesive tape 32 made by Shin-Etsu Chemical Co., Ltd. was attached to the tip of a stainless steel thin plate 31 having a thickness of 0.8 mm to produce an adhesive layer drawer 33, and the obtained adhesive The layer drawer 33 is inserted into the gap between the inclined surface 15 at the corner of the pellicle 10 and the photomask 25, and the silicone adhesive tape 32 and the adhesive layer 16 attached to the tip of the thin plate 31 are attached. 6, the pressure-sensitive adhesive layer drawer 33 is pulled out, and the pressure-sensitive adhesive layer 16 attached to the silicone pressure-sensitive adhesive tape 32 is moved between the inclined surface 15 at the corner of the pellicle 10 and the photomask 25. The adhesive layer 16 is dragged out as shown in FIG. 7 (a), (b), (c), (d) and (e), and as shown in FIG. All the adhesive layer It was removed.

  The time required for these operations was 5 minutes, and even an unskilled worker could easily drag the adhesive layer from between the inclined surface 15 at the corner of the pellicle 10 and the photomask 25.

  Thus, after removing the adhesive layer 16 and visually observing the surface of the photomask 25, the adhesive layer 16 remaining on the surface of the photomask 25 is hardly observed and the adhesive remaining on the surface of the photomask 25. The layer 16 could also be completely removed by lightly rubbing with a wiper infiltrated with toluene.

Comparative Example A pellicle 10 was produced in exactly the same manner as in the above example except that the inclined surface 15 was not formed.

Next, the adhesive layer 16 of the pellicle 10 was attached to a quartz substrate photomask 25 with a size of 1620 mm × 1780 mm and a thickness of 17 mm with a load of 400 kgf in exactly the same manner as in the above example.

Thereafter, in the same manner as in the above embodiment, the prepared adhesive layer drawer 33 was inserted into the gap between the pellicle frame 11 and the photomask 25 to try to drag out the adhesive layer 16. The pressure-sensitive adhesive layer 16 cannot be attached to the adhesive material attached to the tip of the thin plate 31 of the pressure-sensitive adhesive layer drawer 33 as desired, and the pressure-sensitive adhesive layer 16 is attached to the pellicle frame 11 and the photomask 25. Could not be dragged out of the space.

The same operation was repeated, but the adhesive layer 16 could not be dragged out between the pellicle frame 11 and the photomask 25.

From the above examples and comparative examples, in the comparative example in which the inclined surface 15 is not formed on the pellicle frame 11, the adhesive layer 16 between the pellicle frame 11 and the photomask 25 can be visually recognized from the outside. Even if the adhesive layer drawer 33 is inserted into the gap between the pellicle frame 11 and the photomask 25, the adhesive layer 16 adheres to the tip of the thin plate 31 of the adhesive layer drawer 33. The adhesive layer 21 is formed on the corner of the pellicle frame 11 from the surface on which the adhesive layer 16 is to be formed, while the adhesive layer 21 is not adhered to the adhesive material as desired. In the case of the embodiment of the present invention in which the inclined surface 15 is formed, the adhesive layer 16 between the pellicle frame 11 and the photomask 25 can be easily visually recognized from the outside. Therefore, the pressure-sensitive adhesive layer 16 is inserted into the gap between the pellicle frame 11 and the photomask 25, and the pressure-sensitive adhesive material attached to the tip of the thin plate 31 of the pressure-sensitive adhesive layer drawer 33 is easily and It was found that the adhesive layer 16 can be easily pulled out from between the pellicle frame 11 and the photomask 25 and can be peeled off from the photomask 25 because it can be reliably attached.

  The present invention is not limited to the above embodiments and examples, and various modifications can be made within the scope of the invention described in the claims, and these are also included in the scope of the present invention. It goes without saying that it is a thing.

  For example, in the above embodiment, the pellicle frame 11 has a rectangular shape, but it is not always necessary that the pellicle frame 11 has a rectangular shape. The pellicle frame 11 may be a pentagon or a hexagon. For example, it may have a polygonal shape with more corners than a rectangle, and may have a shape without corners, such as a circle.

  Further, in the embodiment shown in FIGS. 1 to 7 and 9, the inclined surface 15 is formed only at the corner of the pellicle frame 11, but the inclined surface 15 is formed only at the corner of the pellicle frame 11. However, in addition to the corners of the pellicle frame 11, the inclined surface 15 may be formed in another part of the pellicle frame 11, and the inclined surface 15 may be formed over the entire periphery of the pellicle frame 11. Can also be formed. However, if the inclined surface 15 is formed over the entire circumference of the pellicle frame 11, the rigidity of the pellicle frame 11 is reduced, and the pellicle frame may be deformed by the tension of the pellicle film. In addition, when the inclined surface 15 is provided, it is preferable that the inclined surfaces 15 are only formed on the pellicle frame 11 other than the corners, not on the entire periphery of the pellicle frame 11.

  Moreover, in the said Example, although a fluororesin is apply | coated on a quartz substrate using the die coat method and the pellicle film is formed, a fluororesin is apply | coated on a quartz substrate using the die coat method. This is not always necessary, and the fluororesin may be applied onto the quartz substrate by a spin coating method, a slit and spin coating method, or the like.

  Further, in the present invention, the size of the pellicle frame and the pellicle is not particularly limited, and the length of one side of the pellicle used for liquid crystal manufacturing with a wide pellicle frame width is longer than 500 mm. Can be applied to a small pellicle used in a semiconductor application having a thickness of about 150 nm, and its size and use are not particularly limited.

  Moreover, in the said Example, the pellicle film | membrane is formed using a fluororesin, However, A pellicle film | membrane can also be formed with cellulose resin, such as a nitrocellulose and a cellulose acetate.

DESCRIPTION OF SYMBOLS 10 Pellicle 11 Pellicle frame 12 Surface on which the pressure-sensitive adhesive layer of the pellicle frame is to be formed 13 Surface 14 on which the pellicle film of the pellicle frame is to be bonded Step 15 Inclined surface 16 Adhesive layer 20 Pellicle film 21 Adhesive layer 25 Photomask 31 Metal thin plate 32 Adhesive substance 33 Adhesive layer drawer 40 Peeling jig 50 Tweezers

Claims (6)

An adhesive layer is formed on one surface of the pellicle frame only in an area of 80% or less of the width of the pellicle frame from the inside of the pellicle frame, and the pellicle outside the area where the adhesive layer is formed A pellicle characterized in that the frame includes an inclined surface that is inclined toward the other surface of the pellicle frame. 2. The pellicle according to claim 1, wherein the pellicle frame has four or more sides, and the inclined surface is formed at at least one corner of the pellicle frame. 3. The pellicle according to claim 1, wherein the inclined surface is formed at an angle of 10 degrees to 30 degrees with respect to the one surface of the pellicle frame. The pellicle according to any one of claims 1 to 3, wherein a pellicle film is bonded to the other surface of the pellicle frame via an adhesive layer. The pellicle according to any one of claims 1 to 4, wherein the pressure-sensitive adhesive layer contains a silicone resin. The pellicle according to claim 5, wherein the pressure-sensitive adhesive layer is formed of a silicone resin.

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