TWI670562B - Photomask protection component structure - Google Patents

Abstract

A reticle protection component structure is coupled to a reticle surface, and the reticle protection component structure includes a frame and a protective film attached to a top surface of the frame, wherein the frame has a top surface and a bottom surface, the frame further has a surrounding inner side wall surface and a surrounding outer side wall surface, and the bottom surface of the frame has a notch, and the notch is internally provided with an adhesive, wherein the adhesive is used for the adhesive The bottom surface of the frame can be adhered to the surface of the reticle. Since the bonding strength of the adhesive to the frame is greater than the bonding strength between the adhesive and the reticle surface, the frame and the light are When the cover is separated, the amount of residual glue on the surface of the mask can be reduced, and since most of the glue is shielded by the side walls of the recess, the amount of gas overflow can be reduced, and the haze can be reduced. generate.

Description

Photomask protection component structure

The invention relates to a reticle protection component structure, in particular to a recess provided on the bottom surface of the frame, so that the bonding strength between the notch and the adhesive is greater than the bonding strength between the adhesive and the reticle surface. When the photomask is separated from the frame in this way, the amount of residual glue on the surface of the photomask can be reduced, and since most of the glue is shielded by the side walls of the recess, the amount of gas overflow can be reduced, and the mist can be reduced. (haze) generation.

In the current semiconductor device manufacturing technology, the circuit pattern of the semiconductor device is to transfer the circuit pattern to the surface of the germanium wafer through a lithography process, specifically, using a light source of a specific wavelength to project through a photomask. Transfer the circuit pattern on the photomask to the surface of the germanium wafer.

Generally, the surface of the reticle 6 is a circuit pattern for protecting the surface, and a reticle protective film assembly 5 is usually disposed. As shown in FIG. 1, the reticle protective film assembly 5 includes a frame 51, and the bottom surface of the frame 51 is provided with a frame 51. The adhesive 52 is between 0.2 mm and 1 mm in height, and the top surface of the frame 51 is covered with a protective film 53. The bottom surface of the frame 51 is bonded to the surface of a photomask 6 by the adhesive 52. In order to protect the surface circuit pattern of the reticle 6, the dust is prevented from falling into the surface of the reticle, causing the circuit to fail to be exposed.

However, the adhesive 52 is usually a source of releasing contaminants. Therefore, after a period of use, the surface of the reticle 6 is inevitably contaminated, and the reticle 6 must be cleaned, and the premise of cleaning the reticle 6 is The frame 1 is removed from the surface of the reticle 2, however, since the surface of the reticle 2 and the frame 1 have an adhesive 3, when separated, a lot of residual glue remains on the surface of the reticle 2. Therefore, the manufacturer often has to repeatedly clean the solvent through the solvent, so that it is possible to remove the residual component on the surface of the mask, and if the residual glue is difficult to remove, it must first be coated with the syrup or cotton swab in the residue area, and After dissolving, it is cleaned. Therefore, if the amount of residual glue is larger, it will be impossible to avoid the difficulty of cleaning.

Furthermore, the height of the adhesive 3 is usually 0.2 mm to 1 mm, and such height is usually completely exposed to the outside of the frame, which represents the release of contaminants (for example, haze) by the adhesive 3. The interval causes a large amount of pollutants to be released, causing contamination of the surface of the reticle.

Therefore, if the bonding strength between the bottom of the frame and the adhesive can be increased, when the reticle is to be separated from the frame, it is easier to separate the frame from the surface of the reticle, and the amount of residual glue on the surface of the reticle is also The invention will be substantially reduced and the overall pollutant generation will be reduced, so the invention should be an optimal solution.

The reticle protection component structure of the present invention is coupled to a reticle surface, and the reticle protection component structure comprises: a frame having a top surface and a bottom surface, the frame further having a surrounding inner wall surface and a a surrounding outer wall surface, and a bottom surface of the frame has a notch, the adhesive is bonded with an adhesive, the adhesive is exposed to the bottom surface of the frame, and the exposed height is less than 0.1 mm, so that the bottom surface of the frame is The adhesive is adhered to a surface of the mask, and the depth of the recess is greater than 0.1 mm; and a protective film is attached to the top surface of the frame for closing the top surface of the frame.

More specifically, the adhesive is acrylic or silicone.

More specifically, the cross section of the notch is slightly triangular, U-shaped or U-shaped.

More specifically, the recess has a depth of 0.2 mm to 0.9 mm.

More specifically, the total height of the adhesive is from 0.3 mm to 1 mm.

Conventional symbol description

5‧‧‧Photomask protective film assembly

51‧‧‧Frame

52‧‧‧Adhesive

53‧‧‧Protective film

6‧‧‧Photomask

Description of this creative symbol

1‧‧‧Frame

11‧‧‧ top surface

12‧‧‧ bottom

121‧‧‧ notch

13‧‧‧ inner wall surface

14‧‧‧Outer side wall surface

2‧‧‧Photomask

3‧‧‧Adhesive

4‧‧‧Protective film

H1‧‧‧ notch depth

H2‧‧‧ total height of adhesive

[Fig. 1] is a schematic view showing a combination of a conventional mask and a frame.

[Fig. 2A] is a schematic view showing the first embodiment of the structure of the reticle protection unit of the present invention.

[Fig. 2B] is a schematic view showing the first embodiment of the structure of the reticle protection assembly of the present invention.

[Fig. 3] Fig. 3 is a schematic view showing the second embodiment of the structure of the reticle protection unit of the present invention.

[Fig. 4] Fig. 4 is a schematic view showing the third embodiment of the structure of the reticle protection unit of the present invention.

Other details, features, and advantages of the present invention will be apparent from the following description of the preferred embodiments.

2A and 2B are schematic views showing the first embodiment of the structure of the reticle protection assembly of the present invention and a first embodiment of the combined structure. As can be seen from the figure, the reticle protection component structure comprises a frame 1. The frame The 1 series has a top surface 11 and a bottom surface 12, and the frame further has a surrounding inner side wall surface 13 and a surrounding outer side wall surface 14, wherein the top surface 11 is bonded with a protective film 4; the bottom surface 12 of the frame 1 The system has a notch 121 having a depth H1 of 0.2 mm to 0.9 mm, preferably 0.2 mm, 0.3 mm, 0.4 mm, 0.5 mm, 0.6 mm, 0.7 mm, 0.8 mm or 0.9 mm. The adhesive system 3 is provided with an adhesive 3 (the adhesive 3 is acrylic or silicone), wherein the adhesive 3 is used to enable the bottom surface 12 of the frame 1 to be on the surface of a mask 2 Bonding, in addition, the total height H2 of the adhesive is in the range of 0.3 to 1 mm, including 0.3 mm, 0.4 mm, 0.5 mm, 0.6 mm, 0.7mm, 0.8mm, 0.9mm or 1mm, and the height of the horizontal line of the adhesive agent 3 exposed to the bottom surface 12 of the frame is less than 0.1mm, and may be 0.01mm, 0.02mm, 0.03mm, 0.04mm, 0.05mm, 0.06mm 0.07mm, 0.08mm, 0.09mm or 0.1mm, the exposed adhesive 3 is bonded to the surface of the reticle 2; as shown in FIG. 2A, the notch 121 has a slightly triangular cross section, The height of the adhesive 3 in the recess 121 is greater than the height outside the recess 121, so that the adhesive strength of the adhesive 3 inside the recess 121 is greater than the adhesion of the adhesive 3 outside the recess 121. When the frame 1 is separated from the surface of the reticle 2, since the bonding strength of the adhesive 3 inside the recess 121 is large, it is easier to separate the adhesive 3 from the surface of the reticle 2. And the amount of residual glue on the surface of the reticle 2 is reduced, even without residual glue, so that it is easier to clean the residual glue and save labor and cost.

The notch 121 can be designed to have a slightly U-shaped cross section as shown in FIG. 3 or a slightly U-shaped cross-section as shown in FIG. The style is not limited here. Regardless of the design of the notch 121, only most of the adhesive 3 can be shielded to reduce the release of contaminants and residual glue residue on the mask. The scope of the patented scope of the invention.

When the reticle protection component structure provided by the present invention is compared with other conventional technologies, the advantages are as follows:

1. The present invention increases the bonding strength between the bottom of the frame and the adhesive, so when the reticle is to be separated from the frame, it is easier to separate the frame from the reticle surface and cause the reticle surface to be The amount of residual glue will also be greatly reduced.

2. Since the present invention can change the design of the notch pattern according to requirements, the structure of different styles can enhance the bonding strength to a certain extent.

3. The overall height of the adhesive of the present invention is 0.3 mm to 1 mm, and the height outside the exposed frame is 0.1 mm. Hereinafter, in the case of an adhesive which is conventionally exposed to a height of 0.2 mm to 1 mm, the present invention can reduce at least 2 to 10 times of pollutants.

The present invention has been disclosed in the above embodiments, and is not intended to limit the present invention. Any of those skilled in the art can understand the foregoing technical features and embodiments of the present invention without departing from the invention. In the spirit and scope, the scope of patent protection of the present invention is subject to the definition of the claims attached to the present specification.

Claims (8)

A reticle protection component structure is coupled to a reticle surface, and the reticle protection component comprises: a frame having a top surface and a bottom surface, the frame further having a surrounding inner wall surface and a surrounding The outer side wall surface, and the bottom surface of the frame has a notch, the adhesive is combined with an adhesive, the adhesive is exposed to the bottom surface of the frame, and the exposed height is less than 0.1 mm, so that the bottom surface of the frame is adhered by the adhesive The bonding agent is adhered to a surface of the mask, and the recess has a depth of more than 0.1 mm; and a protective film is attached to the top surface of the frame for closing the top surface of the frame. The reticle protection component structure of claim 1, wherein the adhesive is an acrylic adhesive. The reticle protection component structure of claim 1, wherein the adhesive is a silicone. A reticle protection assembly structure according to claim 1, wherein the notch has a slightly triangular cross section. A reticle protection assembly structure according to claim 1, wherein the notch surface is slightly U-shaped. A reticle protection assembly structure according to claim 1, wherein the notch surface is slightly U-shaped. A reticle protection assembly structure according to claim 1, wherein the notch has a depth of 0.2 mm to 0.9 mm. The reticle protection component structure of claim 1, wherein the total height of the adhesive is 0.3 mm to 1 mm.