TWM540300U - Dustproof frame structure for photomask - Google Patents

Description

Dust frame structure for reticle

The present invention relates to a dust-proof frame structure for a reticle, in particular to a pressure applied from a circular inner recess of a frame outer wall to a pressure applied from a top surface of the frame body to reduce the bottom surface of the frame body. The pressing pressure reduces the micro-deformation amplitude of the reticle to less than 1 nm for the dust-proof frame structure of the reticle.

Conventional lithography technology uses a reticle to illuminate ultraviolet light (using different light sources depending on different techniques) to transfer the circuit pattern to a semiconductor wafer or a liquid crystal panel. Most of the circuit patterns using this lithography technique are implemented in a clean room. However, even in a clean room, foreign matter such as fine dust remains. If foreign matter particles adhere to the mask, reflection, shielding, and scattering of light due to the foreign particles may occur, causing deformation of the formed circuit pattern, disconnection and edge roughness, or generation of a semiconductor wafer or the like. Floor dirt. Therefore, in order to prevent foreign matter particles from adhering to the reticle, a frame member to which a protective film has been attached is attached to the reticle;

The use of the frame member 1 as shown in FIGS. 1A and 1B, after being bonded to the surface 21 of a reticle 2, is transmitted through the colloids 31, 32 and the protective film 4 and the reticle 2, respectively. The surface 21 is adhered, and when the frame 1 is to be pressed against the surface 21 of the reticle 2, as shown in FIG. 1B, the surface 21 of the reticle 2 is slightly deformed by 2-3 nm (Pellicle induced). Distortion, PID), if double or multiple-patterning is used in the process, the pattern will run off due to the micro-deformation of the 2-3 nm surface of the mask, so it should be double or When multiple exposures are made, the pattern will run out and cannot be aligned, which will lead to failure of exposure;

Further, the frame member 1 is placed on the reticle 2, so that foreign matter can be prevented from adhering to the reticle 2, and the lens can be transferred without being attached by exposing the pattern on the reticle 2 to the focus. The effect of dust on the protective film 4. However, in order to maintain a certain tension in the protective film 4 attached to the frame member 1, a vent hole is formed in the side of the frame member 1, and the protective film 4 does not sink or bulge due to the change in air pressure by air circulation. However, the presence of vent holes tends to cause foreign matter particles such as dust to enter. Therefore, most of the current methods put a filter on the surface of the vent hole to prevent dust particles from entering the inner cavity formed by the reticle 2 and the frame member 1.

In order to solve the above problem, if the frame body itself has a structure capable of dispersing pressure, it will be able to absorb the pressing pressure and reduce the pressing pressure on the surface of the reticle, so that the design of the structure can be avoided. The micro-deformation of the surface of the mask, so if double or multiple exposure is performed, it will not be aligned because the pattern runs away, so the failure of exposure can be avoided, which should be an optimal solution.

The present invention provides a dust-proof frame structure for a reticle, which is a dust-proof frame structure for a reticle capable of blocking foreign matter particles from entering the inner cavity and avoiding micro-deformation of the reticle surface due to crushing pressure. .

A dust-proof frame structure for a reticle is disposed on a surface of a reticle, comprising: a frame body having a top surface, a bottom surface and four outer wall surface structures, the top surface being combined with a protective film Forming an inner cavity, and the four outer wall faces have a circumferential annular inner recess at the bottom, the annular inner recess for absorbing the pressing force from the top surface to reduce the bottom surface Under pressure.

In a preferred embodiment, one or more annular inner recesses are formed on the outer wall surface of the frame body.

In a preferred embodiment, the wall thickness of the frame body ranges from 1 to 2 mm.

In a preferred embodiment, the annular inner recess has a depth ranging from 0.5 to 1 mm.

In a preferred embodiment, the annular inner recess has a height ranging from 0.5 to 3 mm.

In a preferred embodiment, the annular inner recess has a wall height ranging from 1 to 2 mm.

In a preferred embodiment, the top surface of the frame body is adhered to the protective film through an organic glue, and the organic glue can be an acrylic organic polymer or an organic polymer (Silicon). Polymer) or epoxy resin, and the thickness of the organic glue is 0.02~0.05mm.

In a preferred embodiment, the bottom surface of the frame body is bonded to the surface of the mask through an organic glue, and the organic glue can be an acrylic organic polymer or an organic polymer (Silicon). Polymer) or hot melt adhesive or Styrene Ethylene Butylene Styrene (SEBS), and the organic rubber has a thickness of 0.1 to 0.8 mm.

Other technical contents, features, and effects of the present invention will be apparent from the following detailed description of the preferred embodiments.

Please refer to FIGS. 2A and 2B , which are schematic diagrams showing the three-dimensional structure and the cross-sectional structure of the dust-proof frame structure for the reticle. The dust-proof frame structure for the reticle is disposed on the surface of the reticle 2 . 21, mainly comprising a frame body 5 having a top surface 51, a bottom surface 52 and four outer wall surfaces 53, and the center of the frame body 5 has a top surface 51 and a bottom surface 52, the top surface is combined with a protective film 4 to form a cavity 54;

The four outer wall surfaces 53 have a circumferential annular recess 531 for absorbing the downward pressure from the top surface 51 to reduce the bottom surface 52. Pressing pressure;

The frame body 5 can be provided with a vent hole 512 on one of the wall surfaces, and the vent hole 512 is connected to the annular inner recess 531 for balancing the air pressure and the ambient air pressure of the inner cavity 54 of the frame body 51. The vent 512 is further provided with a filter 513 for preventing intrusion of pollutants or particles into the frame body 5.

As shown in Fig. 2B, the size of the annular inner recess 53 affects the effect of pressure dispersion, and the structural dimensions of the best effect are as follows: (1) B1: wall thickness of the frame body It is 1~2mm. (2) B2: The annular inner recess 531 has a depth ranging from 0.5 to 1 mm. (3) A1: The height of the annular inner recess 531 ranges from 0.5 to 3 mm. (4) A2: The height between the annular inner recess 531 and the top surface 51 ranges from 1 to 2 mm. (5) A3: The height between the annular inner recess 531 and the bottom surface 52 ranges from 1 to 2 mm.

As shown in FIG. 3A and FIG. 3B , the top surface 51 and the protective film 4 are adhered through an organic glue 55 , wherein the organic glue can be an acrylic organic polymer or an organic organic polymer. a polymer (Silicon polymer) and an epoxy resin, wherein the organic rubber has a thickness of 0.02 to 0.05 mm; and the bottom surface 52 and the surface 21 of the photomask 2 are adhered through an organic rubber 56, wherein the organic rubber can be Acrylic polymer or silicone polymer or hot melt adhesive or Styrene Ethylene Butylene Styrene (SEBS) , the thickness of the organic glue is 0.1~0.8mm;

When the frame body 5 is to be bonded to the surface 21 of the reticle 2, the pressure is applied to the top surface 51 of the frame body, so that the bottom surface 52 of the frame body 5 can be combined with the surface 21 of the reticle 2 by the organic glue 56. However, during the bonding process, the pressure applied by the top surface 51 is transmitted to the space formed by the annular inner recess 531 and the outer wall surface 53, and the pressure is released outward from the annular inner recess 531. Since the pressure transmitted to the bottom surface 52 is greatly reduced as described above, the amplitude of the micro-deformation of the surface 21 of the mask 2 can be reduced to 1 nm or less.

Please refer to FIG. 4A and FIG. 4B , which is another schematic diagram of the present invention. The annular inner recess 531 can be provided with a plurality of strips, and the rest of the structures are the same as the above description, and are not described herein. The dimensions of the plurality of annular inner recesses are as follows: (1) B1: The wall thickness of the frame body is 1 to 2 mm. (2) B2: The annular inner recess 531 has a depth ranging from 0.5 to 1 mm. (3) C1, C2, C3, C4: The wall height of the annular inner recess 531 ranges from 1 to 2 mm. (4) C5, C6, C7: The height of the annular inner recess 531 is 0.5 mm.

The wall surface forming the annular inner recess 531 may also be provided as a discontinuity, as shown in Fig. 4A, being broken at a section of the wall surface to increase the height of the annular inner recess 531 for the filter 513 to be combined. .

The dust-proof frame structure for the reticle provided by the present invention has the following advantages when compared with other conventional techniques: The present invention can be applied to the frame structure on the surface of the reticle, mainly capable of absorbing the pressing pressure and reducing the The pressing pressure on the surface of the reticle, so that the micro-deformation of the reticle surface can be reduced to less than 1 nm by the design of the structure (the reticle deformation range is 2-3 nm), so if double or multiple exposure is performed It will not be able to align because the pattern runs away, so it can avoid the failure of exposure.

The present invention has been disclosed above in the above embodiments, but it is not intended to limit the present invention. Anyone skilled in the art having ordinary knowledge will understand the foregoing technical features and embodiments of the present invention without departing from the present invention. In the spirit and scope, the scope of patent protection of this creation shall be subject to the definition of the requirements attached to this manual.

1‧‧‧Frame components
2‧‧‧Photomask
21‧‧‧ surface
31‧‧‧ colloid
32‧‧‧colloid
4‧‧‧Protective film
5‧‧‧Frame Ontology
51‧‧‧ top surface
52‧‧‧ bottom
53‧‧‧Outer side wall surface
531‧‧‧ annular notch
54‧‧‧ lumen
55‧‧‧Organic glue
56‧‧‧Organic glue

[Fig. 1A] is a schematic view showing the structure of a conventional dustproof frame structure. [Fig. 1B] Fig. 1 is a schematic view showing the structure of a conventional dustproof frame structure. [Fig. 2A] is a schematic view showing the three-dimensional structure of the dustproof frame structure for the photomask. [Fig. 2B] is a schematic cross-sectional view of the dust-proof frame structure used for the photomask. [Fig. 3A] is a schematic cross-sectional view of the dust-proof frame structure of the photomask combined with the surface of the reticle. [Fig. 3B] is a schematic cross-sectional view of the dust-proof frame structure of the photomask combined with the surface of the reticle. [Fig. 4A] is a front elevational view showing another embodiment of the dust-proof frame structure for the photomask. [Fig. 4B] is a schematic cross-sectional structural view showing another embodiment of the dust-proof frame structure for the photomask.

5‧‧‧Frame Ontology

51‧‧‧ top surface

52‧‧‧ bottom

53‧‧‧Outer side wall surface

531‧‧‧ annular notch

54‧‧‧ lumen

Claims (8)

A dust-proof frame structure for a reticle is disposed on a surface of a reticle, comprising: a frame body having a top surface, a bottom surface and four outer wall surface structures, the top surface being combined with a protective film Forming an inner cavity, and the four outer wall faces have a circumferential annular inner recess at the bottom, the annular inner recess for absorbing the pressing force from the top surface to reduce the bottom surface Under pressure. The dust-proof frame structure for a reticle according to claim 1, wherein one or more annular inner recesses are provided on an outer wall surface of the frame body. The dust-proof frame structure for a reticle according to claim 2, wherein the wall thickness of the frame body ranges from 1 to 2 mm. The dust-proof frame structure for a photomask according to claim 2, wherein the annular inner recess has a depth ranging from 0.5 to 1 mm. The dust-proof frame structure for a photomask according to claim 2, wherein the annular inner recess has a height ranging from 0.5 to 3 mm. The dust-proof frame structure for a reticle according to claim 2, wherein the annular inner recess has a wall height ranging from 1 to 2 mm. The dust-proof frame structure for a reticle according to claim 1, wherein the top surface of the frame body is adhered to the protective film through an organic glue, and the organic glue can be an acrylic organic polymer (Acrylic polymer). Or a silicone polymer or an epoxy resin, and the organic rubber has a thickness of 0.02 to 0.05 mm. The dust-proof frame structure for a reticle according to claim 1, wherein the bottom surface of the frame body is adhered to the surface of the reticle through an organic glue, and the organic glue can be an acrylic organic polymer (Acrylic polymer). Or a silicone polymer or a hot melt adhesive or a Styrene Ethylene Butylene Styrene (SEBS), and the thickness of the organic rubber is 0.1. ~0.8mm.