TW201031581A - Simplified powder feeding and vaporization apparatus - Google Patents

Simplified powder feeding and vaporization apparatus Download PDF

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Publication number
TW201031581A
TW201031581A TW099104586A TW99104586A TW201031581A TW 201031581 A TW201031581 A TW 201031581A TW 099104586 A TW099104586 A TW 099104586A TW 99104586 A TW99104586 A TW 99104586A TW 201031581 A TW201031581 A TW 201031581A
Authority
TW
Taiwan
Prior art keywords
particulate material
reservoir
evaporation
opening
wheel brush
Prior art date
Application number
TW099104586A
Other languages
English (en)
Chinese (zh)
Inventor
Michael Long
Original Assignee
Global Oled Technology Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Global Oled Technology Llc filed Critical Global Oled Technology Llc
Publication of TW201031581A publication Critical patent/TW201031581A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
TW099104586A 2009-02-17 2010-02-12 Simplified powder feeding and vaporization apparatus TW201031581A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12/371,940 US20100206234A1 (en) 2009-02-17 2009-02-17 Simplified powder feeding and vaporization apparatus

Publications (1)

Publication Number Publication Date
TW201031581A true TW201031581A (en) 2010-09-01

Family

ID=42185291

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099104586A TW201031581A (en) 2009-02-17 2010-02-12 Simplified powder feeding and vaporization apparatus

Country Status (7)

Country Link
US (1) US20100206234A1 (ja)
EP (1) EP2398932B1 (ja)
JP (1) JP2012518092A (ja)
KR (1) KR20110122740A (ja)
CN (1) CN102317497A (ja)
TW (1) TW201031581A (ja)
WO (1) WO2010096340A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106119781B (zh) * 2016-07-27 2018-10-30 京东方科技集团股份有限公司 蒸发装置、蒸镀设备和蒸镀方法
WO2024000569A1 (en) * 2022-07-01 2024-01-04 China Triumph International Engineering Co., Ltd. Device for evaporating of a coating material and use of it

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* Cited by examiner, † Cited by third party
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US2447789A (en) 1945-03-23 1948-08-24 Polaroid Corp Evaporating crucible for coating apparatus
US3578814A (en) * 1968-09-03 1971-05-18 Percy Todd Mfg Co Method and apparatus for conveying dust
US3641718A (en) * 1969-07-31 1972-02-15 Gen Motors Corp Abrasive cutting tool
US3754529A (en) * 1970-06-08 1973-08-28 Nat Beryllia Corp Apparatus for continuously depositing beryllia through vaporization of a basic formate
JPS4942351B1 (ja) * 1970-08-12 1974-11-14
US3874900A (en) * 1973-08-13 1975-04-01 Materials Technology Corp Article coated with titanium carbide and titanium nitride
JPS50105844U (ja) * 1974-02-07 1975-08-30
DE2658371C2 (de) * 1976-12-23 1983-03-03 Carl Robert Eckelmann AG, 2000 Hamburg Verfahren zum Pyrolysieren von Altreifen
US4291074A (en) * 1978-11-09 1981-09-22 Laminoirs De Strasbourg Process for producing a sheet or strip which is lightly galvanized on one or both sides and products obtained by said process
JPS55157258U (ja) * 1979-04-26 1980-11-12
US4662044A (en) * 1982-09-04 1987-05-05 Tohken Co., Ltd. Descaler and wire brush for use in the same
JPH0784002B2 (ja) * 1985-12-09 1995-09-13 トヨタ自動車株式会社 木質系成形体
US4885211A (en) * 1987-02-11 1989-12-05 Eastman Kodak Company Electroluminescent device with improved cathode
US4769292A (en) * 1987-03-02 1988-09-06 Eastman Kodak Company Electroluminescent device with modified thin film luminescent zone
US5332133A (en) * 1991-11-01 1994-07-26 Nisshin Flour Milling Co., Ltd. Powder supplying apparatus and powder spraying apparatus
JP3738869B2 (ja) * 1997-06-05 2006-01-25 松下電器産業株式会社 蒸着方法および蒸着装置
JP2000068055A (ja) 1998-08-26 2000-03-03 Tdk Corp 有機ｅｌ素子用蒸発源、この有機ｅｌ素子用蒸発源を用いた有機ｅｌ素子の製造装置および製造方法
US6270841B1 (en) * 1999-07-02 2001-08-07 Sigma Technologies International, Inc. Thin coating manufactured by vapor deposition of solid oligomers
US6660328B1 (en) * 2000-03-31 2003-12-09 Florida State University Research Foundation Powder precursor delivery system for chemical vapor deposition
WO2002006747A1 (en) * 2000-07-14 2002-01-24 University Of Virginia Patent Foundation Heat exchange foam
US6749700B2 (en) * 2001-02-14 2004-06-15 Hitachi Metals Ltd. Method for producing amorphous alloy ribbon, and method for producing nano-crystalline alloy ribbon with same
DE50206223D1 (de) * 2001-10-22 2006-05-18 Sulzer Pumpen Ag Wellenabdichtungsanordnung für eine Pumpe zur Förderung heisser Fluide
US7044288B2 (en) * 2002-04-09 2006-05-16 K-Tron Technologies, Inc. Bulk material pump feeder with reduced disk jamming
US6832887B2 (en) * 2002-04-09 2004-12-21 K-Tron Technologies, Inc. Bulk material pump feeder
US6789789B2 (en) * 2002-05-29 2004-09-14 Veeco Instruments Inc. High throughput vaporizer
WO2005089107A2 (en) * 2004-01-08 2005-09-29 University Of Virginia Patent Foundation Apparatus and method for applying coatings onto the interior surfaces of components and related structures produced therefrom
US7288285B2 (en) * 2004-09-21 2007-10-30 Eastman Kodak Company Delivering organic powder to a vaporization zone
US7288286B2 (en) * 2004-09-21 2007-10-30 Eastman Kodak Company Delivering organic powder to a vaporization zone
US7501152B2 (en) * 2004-09-21 2009-03-10 Eastman Kodak Company Delivering particulate material to a vaporization zone
KR100685431B1 (ko) * 2004-11-26 2007-02-22 삼성에스디아이 주식회사 유기물 증착원
US7625601B2 (en) * 2005-02-04 2009-12-01 Eastman Kodak Company Controllably feeding organic material in making OLEDs
KR101057639B1 (ko) * 2005-10-12 2011-08-18 케이-트론 테크놀로지즈 인코포레이티드 디스크 막힘을 감소시키는 유연성 디스크를 구비한 벌크재료 펌프 피더
US7627933B2 (en) * 2005-12-07 2009-12-08 Sellars Absorbent Materials, Inc. Forming head with features to produce a uniform web of fibers
US7951421B2 (en) * 2006-04-20 2011-05-31 Global Oled Technology Llc Vapor deposition of a layer

Also Published As

Publication number Publication date
EP2398932B1 (en) 2012-11-14
KR20110122740A (ko) 2011-11-10
JP2012518092A (ja) 2012-08-09
EP2398932A1 (en) 2011-12-28
US20100206234A1 (en) 2010-08-19
CN102317497A (zh) 2012-01-11
WO2010096340A1 (en) 2010-08-26

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