201028631 六、發明說明： » 【發明所屬之技術領域】 本發明係關於一種對基板等被加熱物藉由熱風進行熱處 理之熱處理裝置。 【先前技術】201028631 VI. Description of the Invention: The present invention relates to a heat treatment apparatus for heat-treating an object to be heated such as a substrate by hot air. [Prior Art]
W 向來’如下述專利文獻1所揭示之熱處理裝置被用於如 液晶顯示器（LCD : Liquid Crystal Display)或電漿顯示器 (PDP : Plasma Display)、有機EL顯示器等平面顯示器 ❹ （FPD · Flat Panel Display)之製作。 熱處理裝置大多如專利文獻1中所示，具有於加熱室内 配置載置棚之構造。又熱處理裝置係預先對玻璃板等基板 (被加熱物）塗佈特定之溶液並使其加熱乾燥，將該加熱乾 燥後之基板使用機械手臂搬進搬出段部之間隔，將基板曝 於被導入加熱室内之特定溫度之熱風以進行熱處理（燒成） 之裝置。 φ 此處之載置棚係於上下方向設有複數個支持基板之段部 之籠狀形狀者。即先前技術之載置棚具有複數之柱。又以 平面觀察該柱時，該載置棚配置於4角形之4個角與邊之位 为—方面 ^ 杈。丨韁由樑或板構成，形成一個平面。即 部係將樑配置為格子狀或平行狀者。又於先 技術之#又部中，樑之格子 定。即先前技術中，段部之’5 、之間之間隔為 部位均大致其狹Γ者隔或樑之間隔於任 144676.doc 201028631 [先前技術文獻] [專利文獻] [專利文獻1]日本特開2006-46894號公報 【發明内容】 [發明所欲解決之問題] 如前所述，熱處理裝置係將玻璃板等基板插入加熱室内 燒成之裝置’但在燒成作業中或使基板進出加熱室時，有 時會發生基板破裂之情形。 此時’必須從載置棚之段部除去基板之碎片。 但’先前技術之熱處理裝置’難以進行從段部除去基板 之碎片之作業。 即因要求減小熱處理裝置所佔之面積，而有必要於熱處 理裝置内插入大量基板，因此載置棚其段部之間隔極小。 因此作業者無法進入段部彼此之間。 因此作業者無法於水平方向進入載置棚之内部。 又如前所述’先前技術之段部係將樑等配置為格子狀或 平行狀者，格子之間隙或樑彼此之間隔為固定域小。即 於先前技術中，段部之格子之間隔或樑之間隔於任何部位 均大致-定。又先前技術之段部中，格子之間 隔於任何部料極則、，故作㈣無衫秘 ^ 樑之間隙。 〜Ν丨糸虱 =先前技術之熱處理裳置中，作業者無法實 入載置棚之内部。 < 因此例如當基板於載置棚上破裂之情形時，除從載置棚 144676.doc 201028631 之外侧插入棒等掏出基板之碎片外，無其他可從載置棚取 出碎片之方法。 此外於載置棚中，為防止基板損傷，雖有於段部設置樹 件等情形’但該樹脂構件存在因長期使用而劣化磨損 - <情：。於如此之情形下，雖有必要更換樹脂構件等，但 於先則技術中，基於與前述同樣之理由，而不便進行樹脂 構件等之更換。 因此本發明係著眼於先前技術之前述問題點，以可易於 進打維護之熱處理裝置之開發為課題者。 [解決問題之技術手段] 因此為解決前述問題而提供之本發明之熱處理裝置，係 具有加熱被加熱物之加熱室，及位於該加熱室之中、載置 被加熱物之載置棚者，其特徵在於：前述載置棚具有複數 之段部，該段部藉由樑或台面而形成，於—部分的段部或 全部的段部，具有欠缺樑及台面之缺欠部，且藉由該缺欠 〇 冑設置挑空部’該挑空部具有具備足以讓作業者可進入的 大小之空間。（請求項” 此處所謂「具備足以讓作業者可進入的大小之空間」係 檢查用之空間’通常係具有35 em左右以上之寬度之間 隙’就常識而言係40 cm〜6〇 cm左右之寬度。 本發明之熱處理裝置，於一部分的段部或全部的段部之 例如中央部分，具有欠缺樑及台面之缺欠部，藉由該缺欠 部設置挑空冑。因此該挑空部具有具備足以讓作業者可進 入的大小之空間。 144676.doc 201028631 本發明之熱處理裝置中，因於栽置棚之内部具有挑空 郎’使作業者可進入載置棚之内部，故即使例如於載置棚 之内部發生基板破裂之情形’亦可容易地排除基板之碎 片。 本發明之減理裝置較佳為，前述段部包含並列配置之 至少4根主樑’及由前述主樑予以支撐之複數小樑各小 樑由至少2根以上之主樑予以支持，力兩外側之主標以外 之任一主樑與兩外側之主樑以外之其他任一主樑之間設置 前述缺欠部，而於前述載置棚形成挑空部。（請求項2) 根據前述構成，因缺欠部之開口端或其附近有主樑，故 開口端之剛性高。因此挑空部之内面之剛性高。故作業者 於挑空部之中作業時，不會破壞挑空部之内面。又亦可為 於挑空部内設置梯子而於挑空部内攀爬之構造，或將手足 搭在載置棚之段部而於挑空部内攀爬之構造。 又本發明之熱處理裝置，係具有加熱被加熱物之加熱室 及位於5亥加熱室之中、載置被加熱物之載置棚者，其特徵 在於：前述載置棚被分割成2個以上之區塊，各區塊均具 有複數之段部，前述2個以上之區塊以空出間隔之狀態並 列配置，以可跨該並列配置之區塊之段部彼此之方式載置 被加熱物，於前述載置棚藉由前述間隔形成挑空部，該挑 空部具備作業者可進入般大小之空間。（請求項3)。 根據則述構成’載置棚被分割成例如前側棚部與後側棚 邛之複數個區塊。而藉由各區塊彼此間之間隔形成挑空 部。因本發明之熱處理裝置亦由於在區塊之間存在挑空 144676.doc 201028631 ，使作業者可進入載置棚之内部，故即使例如於載置棚 之内部發生基板破裂之情形，亦可容易地排除基板之碎 片。 . 又各區塊彼此間，宜以某種構件予以接合。例如上邊側 ^ 與下邊附近雖宜以輔助樑等接合，但若要確保各區塊之獨 立性之情形時，則不必接合各區塊。 本發明之熱處理裝置較佳為，加熱室具有頂面壁與側面 參 壁，且於前述侧面壁具有通達挑空部之開閉門。（請求項4) 根據前述構成，於加熱室具有開閉門，作業員可打開開 閉門進入加熱室，再進入載置棚内之挑空部。 本發明之熱處理裝置，載置棚宜具有支撐樑或台面之複 數之柱，於一部分的柱或全部的柱設置柱移動機構，設有 前述柱移動機構之各柱可獨立於其他柱而昇降。（請求項5) 根據前述構成，可藉由柱移動機構，將載置於段部之被 加熱物之姿態修正為水平姿態。 # 即基板等被加熱物段部應以水平姿態載 •一計為水平姿態，且以成為水平姿態之方:予= 工。即抵接於基板之背面狀構件，均以與地表面距離同 一高度之方式設計、施工。 但，伴隨近年來顯示器之大型化，進行熱處理之基板亦 走向大型化-途，其重量變得相當地重。因此，將基板載 於段部時，將產生因基板之重量造成段部彎曲，而無法水 平保持基板之情形。 此處亦可從基板之重量運算段部之彎曲量，而將段部之 144676.doc 201028631 形狀設計成於載置基板時能夠以其重量使段部成為水平之 形狀。但，基板之重量亦會因批次（製品）而不同，難以正 確算出彎曲量，故事實上不可能將段部設計成預先預估彎 曲量之形狀。 因此本發明係於施工現場微調柱之高度，將段部之姿熊 或形狀修正為使被加熱物之姿態成為水平姿態。 即本發明之熱處理裝置，於一部分的柱或全部的柱上設 置柱移動機構，設有柱移動機構之柱可獨立於其他柱而昇 降。因此於施工現場，藉由實際載置基板，或於段部載置 具有相當於基板之重量之虛設板，並以柱移動機構昇降柱 而使段部成為水平姿態。其結果，調整後之熱處理裝置之 載置棚在載置著基板等被加熱物時，便會呈現基板等成為 水平姿態之形狀。又，作為柱移動機構，可舉例如千斤頂 裝置等。 本發明之熱處理裝置較佳為，前述柱移動機構係千斤頂 裝置，且前述千斤頂裝置可使各柱之下端位置相對改變。 (請求項6) 例如大型（例如3x2 m)之玻璃基板為被加熱物時，被加 熱物會因自重而造成其兩端侧向下彎曲。因此於段部中， 若可使兩端部侧之柱與挑空部附近之柱相對移動，則可將 段部之形狀設為於載置基板等被加熱物時使基板等成為水 平姿態之形狀。 本發明之熱處理裝置，於被加熱物未載置於載置棚之狀 下，各段部之載置棚之樑或台面之高度係位於内側者比 144676.doc 201028631 載置棚之兩端侧為低。（請求項7) 態 根據前述構成，載置棚之段部因其兩端側之高度… 部高，故於載置基板等被加熱物時，基板等會成為水^ 本發明之熱處理裝置較佳為，載置棚具有複數之柱，段 部至少具有平行配置之4根主襟，前述各主樑係至少以2根 柱為-組予以接合者，未與主樑接合之柱彼此以輔助樑予 以接合，輔助樑之數量比主襟少4請求項8)W. The heat treatment apparatus disclosed in Patent Document 1 below is used for a flat panel display such as a liquid crystal display (LCD: Liquid Crystal Display) or a plasma display (PDP: Plasma Display), an organic EL display, etc. (FPD · Flat Panel Display ) Production. Most of the heat treatment apparatuses are as shown in Patent Document 1, and have a structure in which a mounting shed is disposed in a heating chamber. In the heat treatment apparatus, a specific solution is applied to a substrate (heated material) such as a glass plate and heated and dried, and the substrate after the heat drying is used to move the substrate into and out of the segment, and the substrate is exposed to be introduced. A device that heats hot air at a specific temperature in the chamber to perform heat treatment (baking). φ The mounting shed here is a cage shape in which a plurality of segments supporting the substrate are provided in the vertical direction. That is, the prior art loading shed has a plurality of columns. When the column is viewed in a plane, the mounting shed is disposed at four corners of the four-corner shape and the side is in the aspect of 杈.丨缰 is made up of beams or plates to form a plane. That is, the beam is arranged in a lattice shape or a parallel shape. Also in the first technology of the #又部, the beam of the beam. That is, in the prior art, the interval between the segments of the segments is substantially equal to the spacing of the segments or the spacing of the beams is 144676.doc 201028631 [Prior Art Document] [Patent Document] [Patent Document 1] JP-A-2006-46894 SUMMARY OF INVENTION [Problems to be Solved by the Invention] As described above, the heat treatment apparatus is a device in which a substrate such as a glass plate is inserted into a heating chamber to be fired, but in the firing operation or the substrate is heated in and out. In the case of a chamber, sometimes the substrate is broken. At this time, it is necessary to remove the fragments of the substrate from the section of the mounting shed. However, the "heat treatment apparatus of the prior art" is difficult to perform the work of removing the fragments of the substrate from the segments. That is, since it is required to reduce the area occupied by the heat treatment apparatus, it is necessary to insert a large number of substrates into the heat treatment apparatus, so that the interval between the sections of the placement shed is extremely small. Therefore, the operator cannot enter the segments between each other. Therefore, the operator cannot enter the inside of the storage shed in the horizontal direction. Further, as described above, the section of the prior art has a beam or the like arranged in a lattice shape or a parallel shape, and the gap between the lattices or the beams is spaced apart from each other by a fixed domain. That is, in the prior art, the spacing of the grids of the segments or the spacing of the beams are substantially constant. In the section of the prior art, the grids are separated by any part of the material, so that (4) there is no gap between the shirts and the beams. ~Ν丨糸虱 = In the prior art heat treatment, the operator could not enter the inside of the storage shed. <Thus, for example, when the substrate is broken on the mounting shelf, there is no other method for removing the debris from the mounting shelf except for inserting a chip or the like from the outside of the mounting shelf 144676.doc 201028631. Further, in the mounting shed, in order to prevent damage to the substrate, there is a case where a tree member is provided in the segment portion, but the resin member is deteriorated and worn due to long-term use - < In such a case, it is necessary to replace the resin member or the like. However, in the prior art, the replacement of the resin member or the like is inconvenient for the same reason as described above. Therefore, the present invention has been made in view of the aforementioned problems of the prior art, and has been developed for a heat treatment apparatus which can be easily maintained. [Means for Solving the Problems] Therefore, the heat treatment apparatus of the present invention provided to solve the above problems includes a heating chamber for heating an object to be heated, and a holder for placing the object to be heated in the heating chamber. The utility model is characterized in that: the loading shed has a plurality of sections formed by a beam or a mesa, and the section or all the sections of the section have a missing section of the beam and the mesa, and Defects 〇胄 Setting the picking section' The picking section has a space of sufficient size for the operator to enter. (Request item) Here, "the space of a size that is sufficient for the operator to enter" is a space for inspection "usually a gap having a width of about 35 em or more", which is 40 cm to 6 cm in terms of common sense. The heat treatment device of the present invention has a missing portion of the beam and the mesa at a portion of the segment or all of the segment, for example, a central portion, and the cutout portion is provided with an empty space. A space of sufficient size for the operator to enter. 144676.doc 201028631 In the heat treatment apparatus of the present invention, since the inside of the planting shed has an empty stalk, the operator can enter the inside of the storage shed, even if it is for example Preferably, the substrate of the present invention can easily exclude debris of the substrate. The reduction device of the present invention preferably includes at least four main beams 'arranged in parallel and supported by the main beam Each of the trabecular beams of the trabecular beam is supported by at least two main beams, and any one of the main girder except the main one of the two sides of the force is disposed between the main girder other than the main girder of the two outer sides. According to the above configuration, the hollow portion is formed in the mounting portion. (Requirement 2) According to the above configuration, since the main end of the opening end of the cutout portion or the vicinity thereof is provided, the rigidity of the opening end is high. The rigidity of the inner surface is high. Therefore, the operator does not damage the inner surface of the picking part when working in the picking section, or the structure of climbing in the picking part by setting a ladder in the picking part, or arranging the hand and foot A structure for climbing a hollow portion in a section of the shed. The heat treatment device of the present invention has a heating chamber for heating the object to be heated and a heating chamber placed in the heating chamber. The shedper is characterized in that the storage shed is divided into two or more blocks, each of which has a plurality of sections, and the two or more blocks are arranged side by side in a vacant interval so as to be cross- The segmented portion of the block arranged in parallel is placed on the object to be heated, and the space is formed in the mounting shelf by the space, and the picking portion has a space in which the operator can enter the same size. According to the description, the 'station shed is divided into For example, a plurality of blocks on the front side shed and the rear side shed, and the gaps are formed by the interval between the blocks. The heat treatment device of the present invention also has a pick-up between the blocks 144676.doc 201028631 Therefore, the operator can enter the inside of the loading shed, so that even if the substrate is broken inside the loading shed, for example, the fragments of the substrate can be easily removed. For example, it is preferable that the upper side and the lower side are joined by an auxiliary beam or the like. However, if it is necessary to ensure the independence of each block, it is not necessary to join the blocks. The heat treatment apparatus of the present invention preferably has a heating chamber having The top wall and the side wall are provided with an opening and closing door that leads to the picking portion. (Requirement 4) According to the above configuration, the heating chamber has an opening and closing door, and the operator can open the opening and closing door to enter the heating chamber, and then enter the loading The picking section in the shed. In the heat treatment apparatus of the present invention, the mounting shed preferably has a plurality of columns supporting the beam or the mesa, and a column moving mechanism is provided in a part of the columns or all the columns, and the columns provided with the column moving mechanism can be raised and lowered independently of the other columns. (Requirement 5) According to the above configuration, the posture of the object to be heated placed on the segment can be corrected to the horizontal posture by the column moving mechanism. # That is, the heated object section such as the substrate should be placed in a horizontal position. • The horizontal posture is set to the horizontal posture: That is, the back-shaped members that abut against the substrate are designed and constructed in such a manner as to be at the same height from the ground surface. However, with the increase in the size of displays in recent years, the substrate subjected to heat treatment has also become larger, and its weight has become considerably heavy. Therefore, when the substrate is placed on the segment portion, the segment portion is bent due to the weight of the substrate, and the substrate cannot be horizontally held. Here, the amount of bending of the segment portion can be calculated from the weight of the substrate, and the shape of the segment portion 144676.doc 201028631 can be designed such that the segment portion can be horizontally formed with its weight when the substrate is placed. However, the weight of the substrate varies depending on the lot (product), and it is difficult to accurately calculate the amount of bending. Therefore, it is practically impossible to design the segment to have a shape in which the amount of bending is estimated in advance. Therefore, the present invention is to adjust the height of the column at the construction site, and correct the posture bear or shape of the segment so that the posture of the object to be heated becomes a horizontal posture. That is, in the heat treatment apparatus of the present invention, the column moving mechanism is provided on a part of the column or all of the columns, and the column provided with the column moving mechanism can be raised independently of the other columns. Therefore, at the construction site, the substrate is placed on the stage, or a dummy plate having a weight corresponding to the substrate is placed on the segment, and the column is moved to the column to move the column to a horizontal posture. As a result, when the object to be heated such as a substrate is placed on the mounting shelf of the heat treatment apparatus after the adjustment, the substrate or the like has a horizontal posture. Further, as the column moving mechanism, for example, a jack device or the like can be mentioned. Preferably, in the heat treatment apparatus of the present invention, the column moving mechanism is a jack device, and the jack device can relatively change the position of the lower end of each column. (Requirement 6) For example, when a large (for example, 3 x 2 m) glass substrate is an object to be heated, the heated object may be bent downward at both ends due to its own weight. Therefore, when the column on the both end sides and the column in the vicinity of the picking portion can be moved relative to each other in the segment, the shape of the segment can be set to a horizontal posture when the object to be heated such as a substrate is placed. shape. In the heat treatment device of the present invention, when the object to be heated is not placed on the mounting shed, the height of the beam or the table top of each of the sections is located on the inner side of the 144676.doc 201028631 It is low. (Requirement 7) According to the above configuration, since the height of the both ends of the stage is high, when the object to be heated such as a substrate is placed, the substrate or the like becomes water. Preferably, the loading shed has a plurality of columns, and the segments have at least four main rafts arranged in parallel, and each of the foregoing main beams is joined by at least two columns, and the columns not joined to the main beams are mutually assisted. The beams are joined, and the number of auxiliary beams is less than the number of main items. 4 Request item 8)
根據前述構成，載置棚之柱雖以主襟與輔助襟予以接 合’但輔助樑之數量比主樑少。因此載置棚之柱之接人 力，比以輔助樑接合之柱間小，以主樑接合之枉間其接： 力比較高。因此以主樑接合之柱彼此相對移動之自由度 小，以辅助樑接合之柱彼此相對移動之自由度較大。 此處本發明中，以主樑接合之柱之組合之—種係開口 附近之柱彼此之組合，其他組合係遠離開口位置之柱彼此 之組合。 又以輔助樑接合之柱之組合，係開口附近之柱與遠離開 口位置之柱之組合。 因此本發明所採用之載置棚中，開口附近之柱彼此之接 合力強，開口附近之柱與遠離開口位置之柱之接合力弱。 因此開口附近之柱彼此難以上下相對移動，而開口附近之 柱與遠離開口位置之柱之間易上下相對移動。因此本發明 之熱處理裝置，易將載置於段部之被加熱物之姿態修正為 水平姿態》 144676.doc 201028631 本發明之熱處理裝置較佳為，具備使載置棚整體昇降之 昇降裝置者。（請求項9) 根據前述構成，藉由具備昇降裝置，可減少用於將被加 熱物搬進搬出之開口部之數量。 本發明之熱處理裝置較佳$，具有使加熱室内成為通風 氣氛之通風機構，前述挑空部係於平行於藉由通風機構使 通風向加熱室流動之方向上，從載置棚之一邊側至另—邊 侧貫通設置，前述通風係通過前述挑空部而從載置棚之一 邊側流至另一邊側。（請求項1 〇) 根據前述構成，因通風機構之通風會通過前述挑空部從 加熱室之一邊侧向加熱室之另一邊側流動，故藉由通風將 被加熱物之中央部分予以加熱。因此藉由本發明之熱處理 裝置’可使被加熱物之溫度分布平滑化。 即藉由先前技術之熱處理裝置，熱風是從載置棚之邊部 向中央部侧流動，使被加熱物之中央部昇溫。即將熱風從 載置棚之邊部導入段部彼此之間，使熱風到達被加熱物之 中央部’與被加熱物接觸而使被加熱物之中央部昇溫。 但’因段部彼此之間隔通常狹小，故進入各段部之間之 熱風不多’被加熱物之中央難以昇溫，而於被加熱物產生 溫度偏差。 有鑒於此’本發明中於載置棚之中央具有挑空部，於該 挑空部流動熱風（通風）。因此被加熱物其中央部分會直接 接觸通風而被昇溫。因此藉由本發明之熱處理裝置，被加 熱物之溫度偏差小。 144676.doc -10- 201028631 [發明之效果] 本發明之熱處理裝置，因作業者可進入載置棚之内部， 故維護容易。此外，因增加被加熱物之中央之通風量，故 可改善熱處理性能。 【實施方式】 以下對本發明之具體實施形態進行說明。According to the above configuration, the column of the shed is joined by the main raft and the auxiliary rafter, but the number of the auxiliary beams is smaller than that of the main beam. Therefore, the connection force of the column placed on the shed is smaller than that between the columns joined by the auxiliary beam, and the connection between the main beams is the same: the force is relatively high. Therefore, the degree of freedom in which the columns joined by the main beam are relatively moved relative to each other is small, and the degree of freedom in which the columns for assisting the beam joining are relatively moved relative to each other is large. Here, in the present invention, the combination of the pillars joined by the main beam and the column near the opening of the seed system are combined with each other, and the other combination is a combination of the pillars away from the opening position. In addition, the combination of the columns of the auxiliary beam joints is a combination of a column near the opening and a column at a position distant from the port. Therefore, in the mounting shed used in the present invention, the columns adjacent to the opening have a strong bonding force, and the joining force between the column near the opening and the column away from the opening position is weak. Therefore, the columns near the opening are difficult to move up and down relative to each other, and the column near the opening and the column away from the opening position are relatively movable up and down. Therefore, the heat treatment apparatus of the present invention can easily correct the posture of the object to be heated placed in the segment to a horizontal posture. 144676.doc 201028631 The heat treatment device of the present invention preferably includes a lifting device for lifting and lowering the entire storage booth. (Requirement 9) According to the above configuration, by providing the elevating device, the number of the openings for loading and unloading the object to be heated can be reduced. Preferably, the heat treatment apparatus of the present invention has a ventilating mechanism for making the heating chamber a ventilating atmosphere, and the vacating portion is parallel to the direction in which the ventilating means flows the ventilating chamber to the heating chamber, from one side of the mounting shed to Further, the side passage is provided so that the ventilation system flows from one side of the mounting booth to the other side through the hollow portion. (Requirement 1) According to the above configuration, since the ventilation of the ventilation means flows from the side of one of the heating chambers to the other side of the heating chamber through the above-described hollow portion, the central portion of the object to be heated is heated by ventilation. Therefore, the temperature distribution of the object to be heated can be smoothed by the heat treatment apparatus of the present invention. In other words, in the heat treatment apparatus of the prior art, hot air flows from the side portion of the mounting shed toward the center portion side, and the central portion of the object to be heated is heated. That is, the hot air is introduced into the side portions between the side portions of the mounting shed, and the hot air reaches the central portion of the object to be heated to contact the object to be heated, thereby heating the central portion of the object to be heated. However, since the interval between the segments is usually narrow, there is not much hot air entering between the segments. It is difficult to raise the temperature in the center of the object to be heated, and a temperature deviation occurs in the object to be heated. In view of the above, in the present invention, a hollow portion is provided in the center of the mounting shed, and hot air (ventilation) flows through the hollow portion. Therefore, the central portion of the object to be heated is heated by direct contact with ventilation. Therefore, with the heat treatment apparatus of the present invention, the temperature deviation of the object to be heated is small. 144676.doc -10- 201028631 [Effects of the Invention] The heat treatment apparatus of the present invention is easy to maintain because the operator can enter the inside of the storage shed. Further, since the amount of ventilation in the center of the object to be heated is increased, the heat treatment performance can be improved. [Embodiment] Hereinafter, specific embodiments of the present invention will be described.
圖1中’ 1係本實施形態之熱處理裝置。熱處理裂置i係 長、寬、高為7m、4m、6m左右之巨大裝置。 熱處理裝置1構成為具有金屬製之箱形外壁部2，且設有 機器收容部3 ’於其上方設置基板處理部5。機器收容部3 内藏向基板處理部5供給電力之電源裝置（未圖示）及控制基 板處理部5之動作之控制裝置（未圖示）等。 基板處理部5係大致直方體，如圖〗或圖3所示，於正面 側具有4個藉由未圖示之機械手臂等移載裝置用於搬進搬 出基板W之換裝口 6。又於與換裝口 6相同之面上，設置* 個進氣口 7。 送風機8之部分從基板處理部5之一方之側面（進氣口 側）突出。於另一方之側面設置門10。門10係用於維護時 開啟供作業者出入而設。 於前述換裝口 6， 擋板9。 安裝著與氣壓缸11之動作連動開閉之 進氣口7藉由馬達（未圖示）調節開度。 基板處理部5之内部，以平 一 十面觀察如圖2所不大體分為2 個&域。即基板處理部5 心門#刀為熱處理室12(加熱室）與 I44676.doc 201028631 熱風供給部14。 此處熱風供給部14係内藏使熱風於熱處理室12内循環之 裝置之部位。更具體而言熱風供給部14係用於加熱被導入 熱處理裝置1之内部之外氣，或從熱處理室12之下游端流 回之空氣等，並送入熱處理室12内者，且具備送風機8或 加熱器（未圖示）等。又於熱風供給部14之基板處理部5側之 面設置過濾器1 5。 熱處理室12(加熱室）係藉由安裝有過濾器15之上游壁2〇 及絕熱材所構成之周壁13包圍之艙室。 於熱處理室12(加熱室）之中央配置包含載置棚16之基板 換裝系統18。 熱處理室12介以構成上游壁20之過濾器15之開口與熱風 供給部14連通。 如圖3所示，於熱處理室12之大致中央部，配置基板換 裝系統18。基板換裝系統18包含用於積載基板貿之載置棚 16，與使該載置棚16整體昇降之昇降裝置21而構成。 此處，雖實物載置棚具有3〇段以上之段部23，但因製圖 之關係，圖示為具有8段之段部23者。因此圖示之載置棚 16其高度方向之比例與實際相比有所縮小。又，載置棚雖 具有多數之段部，但圖6中省略段部之大多數。 載置棚16係設置於昇降裝置21之昇 %之主襟3〇上設置小標31，於該小襟31上設置基板= 於圖中，將框架26之柱35描繪成四角柱狀，將主㈣與辅 助樑33以粗線描繪，將小樑31以細線描繪。 144676.doc -12* 201028631 載置棚16之框架26，如圖5所示，以8根柱35、36根主標 30及少數輔助樑33構成。 8根柱35如後所述’於下部有千斤頂裝置（柱移動機 構）36。又8根柱35如圖4、5所示，設置成長方形之佈局。 即8根柱35於長方形之各角分別設置一根，且於長邊（A 行、B行）上等間隔設置2根。 亦可視為8根柱於長邊（A行、B行）等間隔地設置4根。長 邊（A行、B行）上之柱之間隔係4〇 cm〜6〇 cm左右。 又A行上之柱35與B行上之柱35位於對向位置。即亦可 s胃於與長方形之短邊平行之4列，分別各配置2根柱3 5。即 亦可謂分別於a列、b列、c列、d列各配置2根。 以下，將8根柱之名稱稱為Aa、Ab、Ac、Ad、、In Fig. 1, '1 is a heat treatment apparatus of this embodiment. Heat treatment cracking i is a huge device with length, width and height of 7m, 4m and 6m. The heat treatment apparatus 1 is configured to have a box-shaped outer wall portion 2 made of metal, and is provided with a machine housing portion 3' on which a substrate processing portion 5 is provided. The machine accommodating unit 3 houses a power supply device (not shown) that supplies electric power to the substrate processing unit 5, and a control device (not shown) that controls the operation of the substrate processing unit 5. The substrate processing unit 5 is a substantially rectangular parallelepiped, and as shown in Fig. 3 or Fig. 3, four transfer ports 6 for loading and unloading the substrate W by a transfer device such as a robot arm (not shown) are provided on the front side. Further, * the air inlets 7 are provided on the same surface as the change port 6. A portion of the blower 8 protrudes from one side (inlet side) of the substrate processing unit 5. The door 10 is provided on the side of the other side. The door 10 is used for maintenance when it is opened for the operator to enter and exit. In the above replacement port 6, the baffle 9. The intake port 7 that is opened and closed in conjunction with the operation of the pneumatic cylinder 11 is adjusted by a motor (not shown) to adjust the opening degree. The inside of the substrate processing unit 5 is not generally divided into two & fields as viewed in Fig. 2. That is, the substrate processing unit 5 is in the heat treatment chamber 12 (heating chamber) and the hot air supply unit 14 is I44676.doc 201028631. Here, the hot air supply unit 14 houses a portion where the hot air is circulated in the heat treatment chamber 12. More specifically, the hot air supply unit 14 is for heating the air introduced into the heat treatment device 1 or the air flowing back from the downstream end of the heat treatment chamber 12, and is sent to the heat treatment chamber 12, and is provided with the blower 8 Or heater (not shown), etc. Further, a filter 15 is provided on the surface of the hot air supply unit 14 on the side of the substrate processing unit 5. The heat treatment chamber 12 (heating chamber) is a chamber surrounded by a peripheral wall 2 including a filter wall 15 and a peripheral wall 13 made of a heat insulating material. A substrate changing system 18 including a mounting shelf 16 is disposed in the center of the heat treatment chamber 12 (heating chamber). The heat treatment chamber 12 communicates with the hot air supply portion 14 via an opening of the filter 15 constituting the upstream wall 20. As shown in Fig. 3, a substrate replacement system 18 is disposed at a substantially central portion of the heat treatment chamber 12. The substrate changing system 18 includes a loading and unloading device 16 for stowing the substrate trade, and a lifting device 21 for lifting and lowering the loading shelf 16 as a whole. Here, although the physical loading shelf has the segment portion 23 of three or more segments, it is shown as having the segment portion 23 of eight segments due to the drawing relationship. Therefore, the ratio of the height direction of the mounting shed 16 is reduced as compared with the actual one. Further, although the mounting shed has a plurality of sections, most of the sections are omitted in FIG. The mounting shed 16 is provided on the main 襟 3 升 of the hoisting device 21 and is provided with a small mark 31. The substrate 31 is provided on the small cymbal 31. In the figure, the column 35 of the frame 26 is depicted as a quadrangular column. The main (four) and auxiliary beams 33 are depicted in thick lines, and the trabecular beams 31 are depicted in thin lines. 144676.doc -12* 201028631 The frame 26 of the loading shed 16, as shown in Fig. 5, is composed of eight columns 35, 36 main symbols 30 and a small number of auxiliary beams 33. The eight columns 35 have a jack device (column moving mechanism) 36 at the lower portion as will be described later. Further, as shown in Figs. 4 and 5, the eight columns 35 are arranged in a rectangular shape. That is, eight columns 35 are provided at each corner of the rectangle, and two are provided at equal intervals on the long sides (A row, B row). It can also be considered that four pillars are arranged at equal intervals on the long side (A row, B row). The spacing between the columns on the long sides (A rows, B rows) is about 4 cm cm to about 6 cm. Further, the column 35 on the A line and the column 35 on the B line are in the opposite position. That is, the stomach can be arranged in four columns parallel to the short sides of the rectangle, and two columns 35 are respectively arranged. In other words, it is also possible to arrange two of each of the a column, the b column, the c column, and the d column. Hereinafter, the names of the eight columns are called Aa, Ab, Ac, Ad,
Bb、Be、Bd。 主樑30於包含於同一列之柱35彼此之間各平行設置9 根即於柱Aa-Ba間、Ab-Bb間、Ac-Bc間、Ad-Bd間分別 於高度方向以相同間距各設置9根主樑。 因此，若端看主樑30之高度，則如圖6所示於同樣的高 度上分別存在4根主樑3〇。 又屬於同一行（A行、B行）之柱35彼此如圖5所示以輔助 襟33予以連接。輔助樑33之數量總計為10根左右，為主樑 數量之3分之1以下。 又於各段部23之主樑3〇(除最上段）上設置小標Μ。又本 實施形態中，各小樑31均設置為向外側伸出狀。 若如前所述端看主樑3〇之高度’於同一高度分別存在4 144676.doc 13 201028631 根主樑3 0 ’但於其中外側之2根主樑3 g上分別設有6根小襟 31。更具體地說明，如圖6所示，雖於各段沿a列、b列、。 列d列认有4根主樑30，但於其中外侧之2根之組合上設 置小樑3丨。即於a_b列間有6根小樑31，於c d列間有6根= 樑31。於中央之b_c列間無小樑，而成為缺欠部π。 因此，各段之缺欠部37於垂直方向相連，所有9段於上 下方向為通風狀態而形成挑空部38。又如前所述，雖因製 圖之關係’減少段部23之段數，但實際上係將中心部分於 上下方向跨3 0段以上挑空之狀態。 _ 從正面側看載置棚丨6，如圖3、4、7，正面側係呈9段之 主樑30以短間隔上下排列，且小樑31從其中8段之主樑π 向正面方向突出之形狀。又從背面侧看亦同樣，背面侧係 呈9段之主樑3〇以短間隔上下排列，且小樑31從其中8段之 主樑30向背面方向突出之形狀。 另一方面’若看載置棚16之側面侧，則如圖3、4、8所 不’於中央部有不存在主樑30或小樑3 1之空間（挑空 部）38。即如圖3、4、8所示，於柱Bb-Bc間、Ab-Ac間無小 Θ 樑’内部係空洞狀態。更準確地說明，以柱Bb_Bc、Ab_Bb, Be, Bd. The main beam 30 is disposed in parallel with each other between the columns 35 included in the same column, that is, between the columns Aa-Ba, Ab-Bb, Ac-Bc, and Ad-Bd at the same pitch in the height direction. 9 main beams. Therefore, if the height of the main beam 30 is viewed from the end, as shown in Fig. 6, there are four main beams 3 于 at the same height. The columns 35 belonging to the same row (A row, B row) are connected to each other by an auxiliary 襟 33 as shown in Fig. 5 . The number of auxiliary beams 33 is about 10 in total, and is less than one third of the number of main beams. Further, a small mark is placed on the main beam 3〇 (except the uppermost stage) of each of the sections 23. In still another embodiment, each of the trajectories 31 is provided to protrude outward. If we look at the height of the main beam 3〇 as described above, there are 4 144676.doc 13 201028631 root main beam 3 0 ', but there are 6 small rafts on the outer two main beams 3 g respectively. 31. More specifically, as shown in Fig. 6, the segments are along the a column and the b column. Columns d identify four main beams 30, but a combination of two of the outer ones is provided with trabeculae 3丨. That is, there are six trabeculae 31 between the a_b columns, and six = beam 31 between the cd columns. There is no trabecular between the b_c columns in the center, and it becomes the vacancy part π. Therefore, the cutout portions 37 of the respective segments are connected in the vertical direction, and all of the nine segments are ventilated in the up-and-down direction to form the pick-up portion 38. As described above, although the number of segments of the segment portion 23 is reduced by the relationship of the drawing, the central portion is in a state of being vacated in the vertical direction over more than 30 segments. _ From the front side, the shed 6 is placed, as shown in Figures 3, 4, and 7, the main beam 30 having the 9-segment side on the front side is arranged at a short interval, and the trabecular beam 31 is oriented from the main beam π of the 8 segments. Prominent shape. Similarly, as seen from the back side, the back side is a shape in which the main beams 3 of the nine stages are arranged up and down at short intervals, and the trabecular beams 31 protrude from the main beam 30 of the eight stages toward the back side. On the other hand, when the side surface side of the mounting shelf 16 is viewed, the space (the empty portion) 38 where the main beam 30 or the trabecular beam 31 does not exist in the center portion is not shown in Figs. 3, 4, and 8. That is, as shown in Figs. 3, 4, and 8, there is no void inside the column Bb-Bc and between the Ab-Ac. More accurately, with columns Bb_Bc, Ab_
Ac所包圍之立方體之空間完全不存在小樑3 i。 又該空間（挑空部）38，從一方之端部至另一方之端部連 通載置棚16之中央。再者如前所述，因柱35之間隔係4〇 · cm〜60 cm左右’故作業者可通行。 又若改變視角，載置棚16之構造亦可視為將兩個區塊 46、47以4根輔助樑50接合者，將基板W跨越兩個區塊 144676.doc • 14- 201028631 46、47之段部23載置。若基於圖4、5說明，職置棚咐 有前側棚部46與後側棚部47。前側棚部46具有4根柱， Ac、Ad、Be、Bd ’相對於前述柱間於高度方向設有2列主 ‘樑30。又於前述2列藉由主樑3〇而支持小樑31。 對於後側棚部47亦同樣，具有4根柱Aa、Ab、抑、β&， 相對於前述柱間於高度方向設有2列主樑3〇e又於前述2列 藉由主樑30而支持小樑3丄。 於前側棚部46與後側棚部47之間之柱Ab、Ac之間具有2 根輔助樑50，於柱Bb、Bc之間亦有2根輔助樑5〇。 以下對載置棚16之下部構造進行說明。 本實施形態中，如圖9所示，於各柱35之下部形成千斤 頂裝置（柱移動機構）36〇即如圖9、1〇所示於各柱之下部一 體化設有螺絲40。另-方面，於昇降裝置21之昇降台25上 有孔41，於該孔41中局部插通螺絲4〇。又兩個螺母、 45夾持昇降台25而扣合於前述螺絲4〇。因此若以鬆開下部 φ 側之螺母45之狀態使上部側之螺母43旋轉，則可藉由螺絲 40之推力使柱35昇降。 此處本實施形態中，因於所有的8根柱35形成千斤頂裝 置36，故可使各柱35與其他柱35獨立進行昇降。 但，因載置棚16之框架26以主樑30與輔助樑33接合，故 即使8根柱35可獨立地昇降，其自由度亦不大。但，各柱 35之相對自由度並非一樣，於行方向（Α行、Β行）排列之柱 35自由度較高。 即框架係於列方向（a列、b列、c列、d列）與行方向（Α 144676.doc -15- 201028631 行、B行）配置有柱35，於列方向（&列、b列、e列、d列）以 36根主樑30接合，與之相對，行方向只有以其3分之】以下 數量之輔助樑33予以接合。 因此於行方向（A行、8行）排列之柱35，相對而言易於改 變高度。 以下對本實施形態之熱處理裝置之使用方法進行說明。 本實施形態之熱處理裝置，在最初之使用之前，進行主 樑30之高度調整。圖U係表示進行高度調整時之程序之說 明圖，其中表示主樑與小樑之位置關係及姿態。又，圖^ 為易於理解，將高度方向之差異誇張圖示。 本實施形態之熱處理裝置丨中，於設置時如圖11(勾所 示’使各段部23之主樑30之高度設為一致。 但，使基板W載置於各段部23後，如圖n(b)所示，兩端 (a列和d列）之主樑30會因基板貿之重量而比中央之主樑 30(b列和c列）下沉，使基板w麵曲為上凸狀態。 口此本貫施形態中，在使基板w載置於各段部U之狀態 下，操作柱35下部之千斤頂裝置36，使柱35之下端之高度 上下移動以使基板W成為水平狀態。即如前所述，以鬆^ 下部側之螺母45之狀態使上部侧之螺母43旋轉，藉由螺絲 4〇之推力使柱35昇降。又如圖U(c)所示，調整螺母45使基 板W成為水平。 在基板w成為水平之狀態下，卸除基板w，如圖u(d)所 不，因柱35之翹曲，使兩端（a列和4列）之主樑3〇位於比中 央之主樑30(b列和c列）高之位置，小樑31成為上彈姿態。 144676.doc 201028631 本實施形態之熱處理裝置1，如同公知者，係於熱處理 室12内之載置棚16設置玻璃基板w並進行熱處理。 即使昇降裝置21動作而昇降昇降台25，使載置棚16之任 段部23之咼度與任—換裝口 6之高度一致。又以未圖示 之機械臂保持基板W，打開換裝口6，將玻璃基板w設置於 熱處理室I2内之載置棚16之前述段部23。 之後再··人使升降裝置21之昇降台25動作，使其他任一段The space of the cube surrounded by Ac has no girders 3 i at all. Further, the space (the empty portion) 38 is connected to the center of the loading shelf 16 from the end of one of the ends to the other end. Further, as described above, since the interval of the column 35 is about 4 〇 · cm to 60 cm, the operator can pass. If the viewing angle is changed, the structure of the loading shelf 16 can also be regarded as joining the two blocks 46, 47 with the four auxiliary beams 50, and the substrate W is spanned by two blocks 144676.doc • 14-201028631 46, 47 The segment portion 23 is placed. 4 and 5, the shed shed has a front side shed 46 and a rear side shed 47. The front side shed portion 46 has four columns, and Ac, Ad, Be, and Bd' are provided with two rows of main 'beams 30' in the height direction with respect to the column. The trabeculae 31 is supported by the main beam 3〇 in the above two columns. Similarly, the rear side shed portion 47 has four columns Aa, Ab, and β, and is provided with two rows of main beams 3〇e in the height direction and two columns in the second column by the main beam 30. Support trabecular 3丄. There are two auxiliary beams 50 between the pillars Ab and Ac between the front side shed portion 46 and the rear side shed portion 47, and two auxiliary beams 5 于 between the columns Bb and Bc. The structure of the lower portion of the loading shelf 16 will be described below. In the present embodiment, as shown in Fig. 9, a jack device (column moving mechanism) 36 is formed in a lower portion of each of the columns 35, i.e., screws 40 are integrally formed at the lower portions of the columns as shown in Figs. On the other hand, a hole 41 is formed in the lifting table 25 of the lifting device 21, and the screw 4 is partially inserted into the hole 41. Two other nuts, 45, hold the lifting table 25 and are fastened to the aforementioned screws 4A. Therefore, when the nut 43 on the upper side is rotated in a state where the nut 45 on the lower φ side is released, the column 35 can be raised and lowered by the thrust of the screw 40. In the present embodiment, since the jacks 36 are formed by all the eight columns 35, the columns 35 can be lifted and lowered independently of the other columns 35. However, since the frame 26 of the loading shelf 16 is joined to the auxiliary beam 33 by the main beam 30, even if the eight columns 35 can be lifted and lowered independently, the degree of freedom is not large. However, the relative degrees of freedom of the columns 35 are not the same, and the columns 35 arranged in the row direction (liming, limp) have a higher degree of freedom. That is, the frame is arranged in the column direction (a column, b column, c column, and d column) and the row direction (Α 144676.doc -15-201028631 row, B row) with the column 35 in the column direction (& column, b) The column, the e-column, and the d-column are joined by 36 main beams 30, and the row direction is joined by only the auxiliary beams 33 of the number of 3 or less. Therefore, the columns 35 arranged in the row direction (A row, 8 rows) are relatively easy to change in height. Hereinafter, a method of using the heat treatment apparatus of the present embodiment will be described. In the heat treatment apparatus of this embodiment, the height adjustment of the main beam 30 is performed before the first use. Figure U is an explanatory view showing a procedure for performing height adjustment, which shows the positional relationship and posture of the main beam and the trabecular beam. Moreover, the figure is an easy-to-understand, and the difference in the height direction is exaggerated. In the heat treatment apparatus according to the present embodiment, the height of the main beam 30 of each of the segments 23 is set to be the same as shown in Fig. 11 at the time of installation. However, after the substrate W is placed on each of the segments 23, As shown in Figure n(b), the main beam 30 at both ends (column a and column d) sinks from the central main beam 30 (column b and c) due to the weight of the substrate, so that the surface of the substrate w is curved. In the present embodiment, in the state in which the substrate w is placed on each of the segments U, the jack device 36 at the lower portion of the column 35 is operated to move the lower end of the column 35 up and down so that the substrate W becomes In the horizontal state, as described above, the nut 43 on the upper side is rotated in the state of the nut 45 on the lower side of the loose metal, and the column 35 is lifted and lowered by the thrust of the screw 4, and is adjusted as shown in Fig. U(c). The nut 45 makes the substrate W horizontal. When the substrate w is horizontal, the substrate w is removed, as shown in Fig. 51(d), and the ends of the columns (a column and the fourth column) are caused by the warpage of the column 35. The beam 3 is located higher than the center main beam 30 (column b and c), and the trabecular beam 31 is in the upward posture. 144676.doc 201028631 The heat treatment apparatus 1 of the present embodiment is as known. The glass substrate w is placed on the mounting shelf 16 in the heat treatment chamber 12 and heat-treated. Even if the lifting device 21 is operated, the lifting platform 25 is lifted and lowered, and the width and the mouth of the mounting portion 16 are adjusted. The height of 6 is the same. The substrate W is held by a robot arm (not shown), the changeover port 6 is opened, and the glass substrate w is placed in the above-mentioned segment portion 23 of the mounting shelf 16 in the heat treatment chamber I2. The lifting platform 25 of the lifting device 21 is operated to make any other segment
部23之高度與任一換裝口 6之高度一致，而插入另一基板 w。以下重覆該動作，將基板w安裝於載置棚16之所有段 部23。 另一方面，於熱處理裝置丨内，啟動熱風供給部14之送 風機8及加熱|§(未圖示），使熱處理室12内成為熱風之通風 氣氛。 即熱風雖如圖2之箭頭所示從熱風供給部14向熱處理室 12供給，但熱風之一部分易從開放之柱Ab_Ac間進入載置 棚16之中心，通過中心部之挑空部“從載置棚16之另一端 側逸出。於其間使各段部23之基板w之中央部昇溫。 又其餘之通風會於柱Aa_Ab間或柱Ac_Ad間或載置棚Μ 之周圍流動，昇溫基板W之端部侧。其結果，使基板以整 體昇溫，故溫度偏差小。 又當載置棚16上發生基板w破招梦> & 极W破知荨之突發故障之情形 時，使作業者進入挑空部38除去基板玫之碎片。 即發生突發故障之情形時，停止奘 it止裝置運作，排出内部之 土板W。之後，打開設於熱處理裝 衣11之側面之門ίο，使 144676.doc -17· 201028631 作業者進入熱處理室12内，然後從柱Bc_Bb間進入載置棚 16之中。此處柱Bc-Bb間寬約40 cm〜60 cm左右，具有作業 者足以通行之寬度。 ' 此外，因於構成挑空部38之各段部23之缺欠部”之開口 端，均如圖6所示架設著主樑3〇’故挑空部38之端面=性 高。因此可於熱處理室12内帶入梯子掃除上部側之段部 23，亦可將腳置於各段部23之開口端而攀爬挑空部38。° 又進行定期檢查之情形，或更換耗件之情形亦同樣，作 魯 業者可進入挑空部38進行作業。因此本實施形態 裝置1易於維護。 …乂 斤頂裝置36 頂裝置使柱 以上說明之實施形態中，雖利用螺絲式之千 使柱昇降，但亦可利用例如環式或油壓式千斤 昇降》 又前述實施形態中’雖於各柱35設置千斤頂裂置％，但 亦可考慮只於中央之柱35設置千斤頂裝置36，或只於外側 之柱35設置千斤頂裝置36。 複數之柱昇降。 個千斤頂裝置使 前述實施形態中，雖只於—處設置挑空部38，作於裝置 更大型化之情形時，亦可設置複數之挑空部38。 圖12表示設置2處挑空部38之例。 雖從施形態中，如圖2所示以平面觀察，挑空部38 載置棚16之-邊側連通至另—邊側，但未必—定要從 邊側連通至另一邊側。 例如圖U所^亦可於中央部存在連通小樑31之部分， 144676.doc -1S- 201028631 將挑空部38分隔成兩個區域。 又挑空部38亦可為如圖14所示，只於其中-邊開放者。 無論如何，挑空部38建議為以平面觀察靠—邊開口，且 延續至以柱35所包圍之區域内。 又前述實施形態巾’雖使挑空部38從最下段連通至最上 段’但亦可為半途隔開之挑空部。例如，亦可如從下起至 第1〇段止為第一挑空部’第11段以上為第二挑空部般，分 割挑空部。The height of the portion 23 coincides with the height of any of the changeover ports 6, and another substrate w is inserted. This operation is repeated as follows, and the substrate w is attached to all the segments 23 of the mounting shelf 16. On the other hand, in the heat treatment apparatus ,, the blower 8 of the hot air supply unit 14 and the heating § (not shown) are activated to make the inside of the heat treatment chamber 12 a hot air ventilating atmosphere. That is, although the hot air is supplied from the hot air supply unit 14 to the heat treatment chamber 12 as indicated by an arrow in FIG. 2, one part of the hot air easily enters the center of the mounting shelf 16 from the open column Ab_Ac, and the hollow portion of the center portion is "loaded". The other end side of the shed 16 escapes, during which the central portion of the substrate w of each segment 23 is heated. The remaining ventilation flows between the columns Aa_Ab or between the columns Ac_Ad or around the mounting shed, and the substrate W is heated. As a result, the temperature of the substrate is increased as a whole, so that the temperature deviation is small. When the substrate w is broken, the substrate w is broken and the fault is broken. The operator enters the pick-up portion 38 to remove the debris of the substrate rose. In the event of a sudden failure, the operation of the stop device is stopped, and the inner soil plate W is discharged. Thereafter, the door provided on the side of the heat treatment dressing 11 is opened. 144676.doc -17· 201028631 The operator enters the heat treatment chamber 12, and then enters the loading shed 16 from the column Bc_Bb. Here, the column Bc-Bb is about 40 cm~60 cm wide, which is enough for the operator. The width of the passage. ' In addition, due to the formation of each of the picks 38 The opening end of the notched portion of the segment portion 23 is provided with the main beam 3'' as shown in Fig. 6, so that the end surface of the hollow portion 38 is high. Therefore, the step portion 23 of the upper side can be removed by the ladder in the heat treatment chamber 12, or the foot can be placed at the open end of each of the segments 23 to climb the hollow portion 38. ° In the case of regular inspections, or in the case of replacement of consumables, the operator can enter the picking section 38 to perform the work. Therefore, the apparatus 1 of the present embodiment is easy to maintain. ... 乂 顶 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 36 The column 35 is provided with a jack split %, but it is also conceivable to provide the jack device 36 only for the central column 35 or the jack device 36 only for the outer column 35. The plural column is raised and lowered. In the above-described embodiment, in the above-described embodiment, the pick-up portion 38 is provided only at the same place, and when the device is made larger, a plurality of pick-up portions 38 may be provided. Fig. 12 shows an example in which two picking portions 38 are provided. In the embodiment, as shown in Fig. 2, the side portion of the pick-up portion 38 is connected to the other side, but it is not necessarily required to communicate from the side to the other side. For example, in the figure U, there may be a portion in the central portion where the trabecular beam 31 is connected, and 144676.doc -1S-201028631 divides the hollow portion 38 into two regions. Further, the empty portion 38 may be as shown in FIG. In any event, the pick 38 is suggested to be viewed in a plane-to-edge opening and continues into the area enclosed by the post 35. Further, in the above-described embodiment, the hollow portion 38 is connected to the uppermost portion from the lowermost portion, but may be a hollow portion that is separated halfway. For example, the picking portion may be divided into the first picking portion from the bottom to the first step, and the eleventh portion or more is the second picking portion.
前述實施形態中’雖係藉由小樑31支持基㈣之構造， 但亦可為於小㈣之上安裝板件而為板狀，藉由板件支持 基板之構造。 又前述實施形態之熱處理裝41中，採用具備昇降裝置 21使載置棚16藉由昇降裝置21而整體昇降之構成。但昇降 裝置21並非必要，亦可採用固定載置棚。採用固定載置棚 之情形時，需設置複數個用於配合載置棚之各段部使基板 W出入之換裝口 6。 【圖式簡單說明】 圖1係顯示本發明之—實施形態之熱處理裝置之立體 圖2係圖1所示之熱處理襞置之平面剖面圖。 圖3係圖1所示之熱處理襞置之分解立體圖。 圖4係載置棚之立體圖。 圖5係載置棚之框架之立體圖。 圖6係說明載置棚之各層構造之載置棚之分解立體圖。 144676.doc -19- 201028631 圖7係載置棚之正面圖。 圖8係載置棚之側面圖。 圖9係顯示载置棚之各 狂之下部之剖面立舻 圖1〇係與圖9同-部位之剖面圖。 圖11(a)〜(d)係顯示進行高 .Ηδ _ + 门度調整時之順序之說明圖，其 中，，《員不主樑與小樑之位置關係及姿態。 圖12係其他實施形態之熱處理裝置之平面剖面圖。 圖13係另一其他實施形態之熱處理裝置之平面剖面圖。 圖14係又一其他實施形態之熱處理裝置之平面剖面圖。 【主要元件符號說明】 1 熱處理裴置 10 門 12 熱處理室（加熱 13 周壁 14 熱風供給部 16 载置棚 21 昇降裝置 23 段部 30 主樑 31 小樑 33 輔助樑 35 杈 36 千斤頂裝置（档 缺欠部 37 144676.doc -20- 201028631 38 挑空部 46 前側棚部（區塊） 47 後側棚部（區塊） Aa、Ab、Ac、Ad、Ba、 柱 Bb、Be、BdIn the above-described embodiment, the structure of the base (4) is supported by the trabeculae 31. However, the plate member may be attached to the small (four) plate, and the structure of the substrate may be supported by the plate member. Further, in the heat treatment apparatus 41 of the above-described embodiment, the lifting device 21 is provided to move the mounting shed 16 as a whole by the lifting device 21. However, the lifting device 21 is not necessary, and a fixed loading shed can also be used. In the case of a fixed mounting shed, a plurality of changing ports 6 for engaging the respective sections of the loading shed to allow the substrate W to enter and exit are provided. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing a heat treatment apparatus according to an embodiment of the present invention. Fig. 2 is a plan sectional view showing a heat treatment apparatus shown in Fig. 1. Figure 3 is an exploded perspective view of the heat treatment device shown in Figure 1. Figure 4 is a perspective view of the loading shed. Figure 5 is a perspective view of the frame of the shed. Fig. 6 is an exploded perspective view showing the mounting shed of each layer structure of the mounting shed. 144676.doc -19- 201028631 Figure 7 is a front view of the loading shed. Figure 8 is a side view of the loading shed. Fig. 9 is a cross-sectional view showing the same portion of the lower portion of the mounting shed. Fig. 11 (a) to (d) are explanatory views showing the order in which the height Η δ _ + is adjusted, and the positional relationship and posture of the main beam and the trabecular beam are not described. Figure 12 is a plan sectional view showing a heat treatment apparatus of another embodiment. Figure 13 is a plan sectional view showing a heat treatment apparatus of still another embodiment. Figure 14 is a plan sectional view showing a heat treatment apparatus according to still another embodiment. [Main component symbol description] 1 Heat treatment device 10 Door 12 Heat treatment chamber (heating 13 Bay wall 14 Hot air supply unit 16 Shelving 21 Lifting device 23 Segment 30 Main beam 31 Beam 33 Auxiliary beam 35 杈36 Jack device Department 37 144676.doc -20- 201028631 38 Picking section 46 Front side shed (block) 47 Back side shed (block) Aa, Ab, Ac, Ad, Ba, Column Bb, Be, Bd
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