CN201266014Y - Sealing thermal treatment apparatus and its manipulator apparatus - Google Patents
Sealing thermal treatment apparatus and its manipulator apparatus Download PDFInfo
- Publication number
- CN201266014Y CN201266014Y CNU2008201527695U CN200820152769U CN201266014Y CN 201266014 Y CN201266014 Y CN 201266014Y CN U2008201527695 U CNU2008201527695 U CN U2008201527695U CN 200820152769 U CN200820152769 U CN 200820152769U CN 201266014 Y CN201266014 Y CN 201266014Y
- Authority
- CN
- China
- Prior art keywords
- heat treatment
- substrate
- treatment apparatus
- loaded layer
- framework
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Tunnel Furnaces (AREA)
Abstract
The utility model discloses a sealing heat treatment device and a robot arm device thereof. The heat treatment device comprises a plurality of loading layers used for placing base plates, a heater and a shell frame used for fixing the loading layers and the heater. The left side, the right side and the bottom of the loading layer are respectively provided with a metal clip. A corresponding controllable gate is arranged on the shell frame relative to each loading layer, the heater is arranged at the bottom of the shell frame, wherein the controllable gate is arranged at the top end of the shell frame, and the base plates and the loading layers are vertically arranged in the shell frame. The sealing heat treatment device and the robot arm device thereof can load heated objects which have high density, is convenient for the heat treatment device to be large, and can not lower the efficiency of heat treatment.
Description
Technical field
The utility model relates to a kind of annealing device and robot device thereof, relates in particular to a kind of seal heat treatment apparatus and robot device thereof.
Background technology
In the production process of most flat panel display equipment, all need to use annealing device basically.For these annealing devices, the structure of present existing sealing material annealing device as shown in Figure 1, be provided with heater 14 in the bottom of framework 11, on heater 14 successively at certain intervals placement of multiple layers place the loaded layer 12 that substrate is used, correspondingly, side at framework 11 is provided with and described loaded layer 12 corresponding controllable gates 13, described controllable gate 13 is for picking and placeing the slot-shaped opening that substrate is used, described substrate is put into and is taken out by robot device, substrate is horizontal positioned in annealing device, be prescribed the hot blast parcel of temperature, carry out corresponding heat treatment, be also referred to as and burn till by hot blast.Opposite side at framework 11 is provided with screen pack 10.
Because substrate is a horizontal positioned, when fetching substrate, robot device is subjected to the influence of himself weight, bending can appear in manipulator, so annealing device of most of prior art, predict the bending of robot device, spacing between substrate and the substrate generally can be very not little, usually at 70 millimeters to 150 millimeter.In recent years, be accompanied by the maximization of flat-panel display device, and as the substrate of heating object the trend of further maximization arranged also, this certainly will cause the weight of substrate heavier, and the length of manipulator is also longer, causes the amount of deflection of manipulator and thickness all to enlarge markedly.It is bigger that interval between substrate and the substrate also just must become, thus the problem of having brought annealing device to maximize.
Usually, flat-panel monitor is produced in purifying the room, so in case device maximizes, then corresponding meeting brings the increase that purifies the room height, causes that the operating cost that purifies room integral body rises.If it is constant to keep purifying the room height, then need to reduce the number of plies of loaded layer, enlarge the structure at the interval between the loaded layer, cause the heat treatment efficiency of annealing device to reduce.
In order to address the above problem, publication number is that the Chinese patent of CN1967118 discloses a kind of annealing device, can high density load heating object, heat-treat, but this device be in order to prevent base plate deformation, to bear big weight simultaneously, the slide mechanism quantity and the feet that need are many, increased equipment complexity, and the slide mechanism of substrate porch can have influence on putting into of substrate, can reduce beat, influence heat treatment efficiency; And be provided with in the substrate viewing area at feet place, because uneven phenomenon appears showing in the difference of thermal capacitance easily.
The utility model content
Technical problem to be solved in the utility model provides a kind of annealing device, can highdensity loading heating object, and simple in structure, be convenient to annealing device and maximize and do not reduce heat treatment efficiency.
Another technical problem to be solved in the utility model provides a kind of robot device, for above-mentioned annealing device loads heating object.
The utility model is to solve the problems of the technologies described above the technical scheme that adopts to provide a kind of seal heat treatment apparatus, comprise the loaded layer that multilayer placement substrate is used, heater, the framework that is used for fixing loaded layer and heater, the left and right sides and the bottom of described loaded layer are provided with metal clip, to each loaded layer, described framework is provided with corresponding controllable gate, described heater is arranged on base of frame, wherein, described controllable gate is arranged on the top of framework, and described substrate and loaded layer are vertically placed in framework.
In the above-mentioned seal heat treatment apparatus, the inboard of described metal clip can be lined with high-temperature resistant rubber.
In the above-mentioned seal heat treatment apparatus, the bottom side, the left and right sides of described seal heat treatment apparatus can be provided with the hot air circulation pump.
The utility model also provides a kind of robot device that is used for above-mentioned seal heat treatment apparatus for solving the problems of the technologies described above, wherein, described robot device comprises the closed slide of two horizontal positioned, described guide rail is positioned at the both sides, front and back of annealing device, erect on the described closed slide two transportable manipulators are arranged, the gripper shoe that described manipulator is provided with chute and can moves up and down along described chute, the end of described gripper shoe is provided with rotation drive motor, and described gripper shoe is provided with the vacuum suction hole.
The utility model contrast prior art has following beneficial effect: the annealing device that the utility model provides is by picking and placeing the controllable gate that substrate is used in its apical position setting, load multilager base plate accordingly at certain intervals at device interior, substrate and loaded layer adopt vertical modes of emplacement in annealing device, the support of substrate is mainly in the left and right sides, substantially do not bear substrate weight, quantity can be seldom, and therefore, annealing device structure of the present utility model is simple relatively; Secondly, the utility model controllable gate be positioned at apical position and the support of substrate mainly in the left and right sides, supporting mechanism does not influence putting into of substrate, does not influence heat treatment efficiency; At last, because no any supporting mechanism in the substrate viewing area is not easy to occur showing uneven phenomenon.In addition, because manipulator is vertically substrate to be put into loaded layer, so gravity direction and substrate to put into direction parallel, therefore, can not cause the warpage of manipulator because of the gravity of substrate,, help reducing the spacing distance of loaded layer so that the thickness of manipulator does not need yet is too thick, thereby can highdensity loading heating object, be convenient to annealing device and maximize and do not reduce heat treatment efficiency.
Description of drawings
Fig. 1 is the structural representation of existing seal heat treatment apparatus.
Fig. 2 is the structural representation of seal heat treatment apparatus of the present utility model.
Fig. 3 is the structural representation of seal heat treatment apparatus of the present utility model and robot device.
Fig. 4 is the loaded layer internal structure schematic diagram of the utility model embodiment.
Fig. 5 is that circulated air among the utility model embodiment is to schematic diagram.
Fig. 6 is the position views of photoetching bedding and padding on color membrane substrates.
Fig. 7 is the uneven principle key diagram of gravity.
Among the figure,
10 screen packs, 11 frameworks, 12 loaded layers
13 controllable gates, 14 heaters, 20 seal heat treatment apparatus
21 frameworks, 22 loaded layers, 23 controllable gates
24 heaters, 25 robot devices, 251 guide rails
252 manipulators, 253 chutes
26 gripper shoes, 261 vacuum suction holes, 27 CD-ROM drive motors
28 metal clips, 29 hot air circulation pumps, 30 substrates
31 light shield layers, 32 photoetching bedding and padding
The specific embodiment
The utility model will be further described below in conjunction with drawings and Examples.
Fig. 2 is the structural representation of seal heat treatment apparatus, and Fig. 3 is the structural representation of seal heat treatment apparatus of the present utility model and robot device.
Please refer to Fig. 2 and Fig. 3, seal heat treatment apparatus 20 comprises the loaded layer 22 of multilayer placement substrate 30 usefulness, heater 24, the framework 21 that is used for fixing loaded layer 22 and heater 24, and the robot device 25 that is used to pick and place substrate 30, be divided into a plurality of loaded layers 22 by metal grid in the described framework 21, described robot device 25 comprises the closed slide 251 of two horizontal positioned, described guide rail 251 is positioned at the both sides, front and back of annealing device 20, erect on the described closed slide 251 two transportable manipulators 252 are arranged, the gripper shoe 26 that can be provided with chute 253 on the described manipulator 252 and can move up and down along described chute 253, the end of described gripper shoe 26 is provided with rotation drive motor 27, can be provided with vacuum suction hole 261 on the described gripper shoe 26.To each loaded layer 22, described framework 21 is provided with corresponding controllable gate 23, and described heater 24 is arranged on framework 21 bottoms, and wherein said controllable gate 23 is arranged on the top of framework 21, and described substrate 30 and loaded layer 22 are vertically placed in framework 21.
Fig. 4 is the loaded layer internal structure schematic diagram of the utility model embodiment.
Please refer to Fig. 4, the left and right sides of described loaded layer 22 and bottom can be provided with metal clip 28.The inboard of described metal clip 28 can be lined with high-temperature resistant rubber.After substrate 30 was vertically put into this loaded layer 22, each metal clip 28 closures were because the inboard of metal clip 28 is lined with rubber, so be not easy to cause the fragmentation of substrate 30.Simultaneously because the position of metal clip 28 grippings is peripheries of substrate 30, so can not cause corresponding demonstration uneven in the viewing area of substrate 30.Because substrate 30 is vertical placements, so be not easy because gravity causes substrate 30 bendings.Vacuum on the robot device 25 is closed then, and manipulator 252 shifts out.Because manipulator 252 is vertically substrate 30 to be put into loaded layer 22, so gravity direction and substrate 30 to put into direction parallel, so can not cause the warpage of manipulator 252 because of the gravity of substrate 30, so it is too thick that the thickness of manipulator 252 does not need yet, these all are very beneficial for reducing the spacing distance of loaded layer 22.
The thickness of preresearch estimates loaded layer 22 can be reduced to:
The thickness of thickness of glass substrate+manipulator aligning accuracy+manipulator+running surplus degree own
Be approximately between 30 millimeters to 40 millimeters, that is to say that loading density of the present utility model approximately is more than 2 times of common equipment.Can highdensity loading heating thing.
Fig. 5 is that circulated air among the utility model embodiment is to schematic diagram.Please refer to Fig. 5, be provided with heater 24, be provided with hot air circulation pump 29 in the bottom side, the left and right sides of framework 21 in the bottom side of framework 21, finally obtain as shown in Figure 5 circulated air to.
In addition, please refer to Fig. 6, on the manufacturing process of LCD display spare, particularly large-scale liquid crystal display device, usually making photoetching bedding and padding 42 on the light shield layer 41 of color membrane substrates 40, to keep the box of liquid crystal cell thick, the display device contrast that obtains is higher, display effect is better, but the use of photoetching bedding and padding 42 has also brought other problem, the most normal appearance is the gravity uneven phenomenon, particularly on large-scale display device.The uneven principle that occurs of gravity please refer to Fig. 7: when display device is vertically placed, when particularly vertically placement is subjected to high-temperature process simultaneously, liquid crystal volume expands, under the gravity effect, liquid crystal moves to the below of display device, cause the bottom amount of liquid crystal on the high side, thereby the box of bottom is thick bigger than normal, to to a certain degree the time, this demonstration inequality will show when bigger than normal.At this problem, generally all be to measure down by accurate liquid crystal drop to prevent, but confirm whether amount is suitable under the liquid crystal drop, need other corresponding apparatus of configuration, cause the increase of equipment investment volume.And annealing device of the present utility model is because with substrate 30 vertically placement in annealing device, so when heat-treating, if amount of liquid crystal has problem, when substrate 30 takes out, find out very easily.So do not need the extra new equipment of buying.
According to the demand of vertically putting into seal heat treatment apparatus, can carry out certain transformation to robot device 25, please continue with reference to figure 7, at first be provided with the moving guide rail 251 of manipulator 252 in the left and right sides of framework 21, corresponding these two guide rails 251 be two manipulators 252, it can move along the guide rail 251 on framework 21 both sides, thereby substrate 30 is put in the middle of each loaded layer 22.In the middle of two manipulators 253 is the gripper shoe 26 of substrate 30, and its top is provided with vacuum suction hole 261, and it is connected with the vacuum power source, when getting substrate 30, the vacuum state in vacuum suction hole 261 is On, and during mounted board 30, the adsorbed state in vacuum suction hole 261 is Off putting down.Gripper shoe 26 can move up and down along the chute 253 between two manipulators 252, and changes its height; Simultaneously the end of gripper shoe 26 is provided with rotation drive motor 27, can make gripper shoe 26 become plumbness by level, thereby finish the requirement of substrate 30 vertically being put into sealing material thermmohardening device.
The practical work process of hardening heat treating apparatus of the present utility model can be briefly described as follows:
At first the gripper shoe 26 of robot device 25 is a level, and the guide rail 251 by framework 21 both sides moves near last one processing apparatus, by manipulator 252 substrate 30 is positioned on the gripper shoe 26; Gripper shoe 26 moves to target loaded layer 22 by guide rail 22, and gripper shoe 26 rises, and becomes vertical state by level simultaneously; The controllable gate 23 of corresponding then loaded layer 22 is opened, and gripper shoe 26 is carried substrate 30 and entered loaded layer 22; Metal fixture 29 in the loaded layer 22 is closed, and substrate 30 is fixed, and gripper shoe 26 shifts out, and the controllable gate 23 of loaded layer 22 is closed.
The above-mentioned flow process that circulates can be finished the production of goods.
Though the utility model discloses as above with preferred embodiment; right its is not in order to limit the utility model; any those skilled in the art; in not breaking away from spirit and scope of the present utility model; when doing a little modification and perfect, therefore protection domain of the present utility model is worked as with being as the criterion that claims were defined.
Claims (4)
1. seal heat treatment apparatus, comprise the loaded layer that multilayer placement substrate is used, heater is used for fixing the framework of loaded layer and heater, and the left and right sides and the bottom of described loaded layer are provided with metal clip, to each loaded layer, described framework is provided with corresponding controllable gate, and described heater is arranged on base of frame, it is characterized in that, described controllable gate is arranged on the top of framework, and described substrate and loaded layer are vertically placed in framework.
2. seal heat treatment apparatus according to claim 1 is characterized in that the inboard of described metal clip is lined with high-temperature resistant rubber.
3. seal heat treatment apparatus according to claim 1 is characterized in that, the bottom side, the left and right sides of described seal heat treatment apparatus is provided with the hot air circulation pump.
4. robot device that is used for seal heat treatment apparatus as claimed in claim 1, it is characterized in that, described robot device comprises the closed slide of two horizontal positioned, described guide rail is positioned at the both sides, front and back of annealing device, erect on the described closed slide two transportable manipulators are arranged, the gripper shoe that described manipulator is provided with chute and can moves up and down along described chute, the end of described gripper shoe is provided with rotation drive motor, and described gripper shoe is provided with the vacuum suction hole.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNU2008201527695U CN201266014Y (en) | 2008-09-05 | 2008-09-05 | Sealing thermal treatment apparatus and its manipulator apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNU2008201527695U CN201266014Y (en) | 2008-09-05 | 2008-09-05 | Sealing thermal treatment apparatus and its manipulator apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
CN201266014Y true CN201266014Y (en) | 2009-07-01 |
Family
ID=40832386
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNU2008201527695U Expired - Lifetime CN201266014Y (en) | 2008-09-05 | 2008-09-05 | Sealing thermal treatment apparatus and its manipulator apparatus |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN201266014Y (en) |
-
2008
- 2008-09-05 CN CNU2008201527695U patent/CN201266014Y/en not_active Expired - Lifetime
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN102730416B (en) | Panel convey apparatus and panel processing system using apparatus | |
CN202390535U (en) | Continuous vacuum plating facility with heating device | |
CN101472814A (en) | Multiple slot load lock chamber and method of operation | |
CN208254076U (en) | Intelligent transfer formula drying line | |
CN101349504B (en) | Seal heat treatment apparatus | |
CN201266014Y (en) | Sealing thermal treatment apparatus and its manipulator apparatus | |
CN101712154B (en) | Manipulator device for sealing heat treating device | |
CN103155119A (en) | Batch type substrate processing device | |
TW201222622A (en) | Apparatus for processing a substrate | |
CN1467058A (en) | Base plate supporting structure and loading device and mechanical arm | |
CN109782462B (en) | Display screen cavity type bubble removing machine | |
KR20110131560A (en) | Boat for processing a substrate | |
CN215102850U (en) | Crystallization furnace for producing microcrystalline glass | |
CN205718227U (en) | Battery carrying device | |
CN104078384A (en) | In-line type heat treatment apparatus | |
KR101659609B1 (en) | Chemical Reinforcement using Heater Assembly of Furnace | |
CN201933009U (en) | Continuous glass tempering equipment | |
KR20100137723A (en) | Apparatus to sputter | |
KR101129041B1 (en) | Holder Stage For Flexible Display And Its Substrate Loading Method | |
KR101297670B1 (en) | Apparatus for processing substrate | |
CN220245935U (en) | Tempering furnace with automatic blanking function | |
TWI823407B (en) | Three-axis arm automation equipment | |
KR101297666B1 (en) | Apparatus for processing substrate | |
KR101496444B1 (en) | Transportation Method of Glass Substrate and Heat Treatment Apparatus using the Same | |
CN218328998U (en) | Electrothermal blowing drying oven for high-temperature encapsulation and electrical aging |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
AV01 | Patent right actively abandoned |
Granted publication date: 20090701 Effective date of abandoning: 20080905 |