TW201014811A - Glass manufacturing apparatus and method - Google Patents

Glass manufacturing apparatus and method Download PDF

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Publication number
TW201014811A
TW201014811A TW97139557A TW97139557A TW201014811A TW 201014811 A TW201014811 A TW 201014811A TW 97139557 A TW97139557 A TW 97139557A TW 97139557 A TW97139557 A TW 97139557A TW 201014811 A TW201014811 A TW 201014811A
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Taiwan
Prior art keywords
glass
manufacturing apparatus
molten glass
alumina
platinum
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TW97139557A
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Chinese (zh)
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TWI389862B (en
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Shuji Kabashima
Eiji Yanagisawa
Osamu Sakamoto
Kazuo Hamashima
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Asahi Glass Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/42Details of construction of furnace walls, e.g. to prevent corrosion; Use of materials for furnace walls
    • C03B5/43Use of materials for furnace walls, e.g. fire-bricks

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Compositions (AREA)

Abstract

To provide a glass manufacturing apparatus preventing the generation of bubbles during the glass manufacture and preventing the bubbles from remaining in a manufactured glass product, and a glass manufacturing method. The glass manufacturing apparatus has a platinum-made or platinum alloy-made member which comes in contact with molten glass, wherein a layer formed from an alumina-based ceramic particle containing 0.2-5 wt.% Fe expressed in terms of Fe2O3 based on total quantity of the alumina-based ceramic particle and having a changing point where Fe redox (Fe<SP>2+</SP>/Fe<SP>2+</SP>+Fe<SP>3+</SP>) is increased in the molten glass temperature region, is formed on the rear side surface of the surface of the member being in contact with the molten glass.

Description

201014811 九、發明說明 【發明所屬之技術領域】 本發明係關於玻璃製造裝置、及 璃製造方法。 【先前技術】 作爲玻璃製造裝置(熔解槽、澄 φ 之聯絡通路)之構成材料,使用鉑、 素、例如與姥(Rh)、金(Au)、錢 合金(以下,在本說明書中,將鈾及 )。可用作此等之構成材料之鉑材料 高’因在大氣中不形成氧化物層,故 動時,不易變形、損傷之外,化學安 熔融狀態之玻璃。 玻璃製造步驟之裝置溫度雖依其 φ 900 Ό以上之高溫環境下。鈾材料因 此之高溫環境下亦不污染裝置内部之 維持充分之耐久性。 然而,使用鉛材料之玻璃製造裝 ,有熔融玻璃中因水分而起之氣泡在 問題。此爲因熔融玻璃所含之水分與 生成了氫與氧。認爲氫雖透過鉑材料 法透過鉑材料,於熔融玻璃殘留之氧 ,則於鉑材料之界面產生氣泡(專利 使用該製造裝置之玻 清槽、攪拌槽及此等 或鉑與其他貴金屬元 :(ΙΟ或釕(Ru)之 鉑合金統稱爲鉑材料 者’該鉑材料爲融點 不劣化,除了裝置移 定性亦優,不易污染 處理内容而異,在約 上述特性,就算在如 熔融玻璃,可長期間 置中,於玻璃製造時 鉑材料之界面產生的 鉑材料接觸而解離, 釋出至外部,而氧無 濃度超過溶解度界限 文獻1〜4作參考) -5- 201014811 。如此一來產生之氣泡於所製造之玻璃製品中殘留,則玻 璃製品之品質降低。 特別係,爲實質上不含液晶顯示器(LCD )、有機電 致發光•顯示器(OLED )、無機電致發光·顯示器等所 使用之鹼金屬氧化物的無鹼玻璃基板時,無鹼玻璃爲高融 點,與含鹼玻璃相比爲高黏性,故熔融玻璃中氣泡難以浮 起,氣泡抑制爲困難。 爲解決此問題,提案於鉑材料之外側表面設置緻密的 氫不透過性被膜(專利文獻1〜4作參考)。緻密的氫不 透過性被膜之材料方面,可例舉玻璃、陶瓷、金屬等。 [專利文獻1]特表2004 — 523449號公報 [專利文獻2]國際公開W02006/030738號文獻 [專利文獻3]國際公開W02005/063634號文獻 [專利文獻4]特表2006— 522001號公報 【發明內容】 鲁 [發明所欲解決之課題] 先前技術提案之氫不透過性之緻密的被膜,雖爲著眼 於氫的分子徑或離子徑,以氫不透過性材料經塗佈等設置 緻密的被膜,通過被膜,防止氫釋放至外部者,但在玻璃 製造時,無法充分減低氣泡產生。認爲於鈿材料之外側表 面設置之被膜,因不一定能成爲所期望之緻密的膜、或高 溫環境下使用而造成被膜劣化、或鉑材料與被膜之熱膨脹 係數差造成被膜剝離等之原因,氫透過被膜而釋放到外部 -6- 201014811 玻泡 止氣 防之 定品 安製。 且璃 β 率玻目 效之爲 有造法 供製方 提所造 以在製 明止璃 發防玻 本可及 , , 置 題生裝 問產造 述泡製 上氣璃 決之玻 解時的 爲造留 製殘 璃的 [解決課題之手段] 爲達成上述目的,本發明爲一種玻璃製造裝置,其具 Φ 有與熔融玻璃接觸之鉑製或鉑合金製之構件, 提供在該構件的與熔融玻璃接觸之面的背面側,形成 有含有相對於氧化鋁系陶瓷粒子之總量含以Fe203換算爲 〇.2〜5質量%之Fe,且在熔融玻璃溫度域具有Fe氧化還 原(Fe2 + /Fe2 + + Fe3+ )上昇之變化點之氧化鋁系陶瓷粒子 的層爲特徵之玻璃製造裝置。 本發明之玻璃製造裝置中,以前述鉑製或鉑合金製之 構件係收容熔融玻璃之容器爲佳。 φ 本發明之玻璃製造裝置中,前述熔融玻璃溫度域係在 1250 〜1650 °C 爲佳。 本發明之玻璃製造裝置中,前述氧化鋁系陶瓷粒子含 莫來石10質量%以上爲佳。 又,本發明係提供使用本發明之玻璃製造裝置的玻璃 製造方法。 本發明之玻璃製造方法中,所製造之玻璃,以氧化物 爲基準、以質量百分率表示(Si02、Al2〇3、B2〇3、MgO 、CaO、SrO及BaO之合計爲100% ),以含有: 201014811201014811 IX. Description of the Invention [Technical Field of the Invention] The present invention relates to a glass manufacturing apparatus and a glass manufacturing method. [Prior Art] As a constituent material of a glass manufacturing apparatus (a communication path of a melting tank and a φ φ), platinum, a metal, for example, rhodium (Rh), gold (Au), or a carbon alloy is used (hereinafter, in the present specification, Uranium and). A platinum material which can be used as a constituent material of such a material is a glass which is chemically dissolved in a molten state because it does not form an oxide layer in the atmosphere and is not easily deformed or damaged during the movement. The temperature of the glass manufacturing step is based on the high temperature environment of φ 900 Ό or more. Uranium materials also do not contaminate the interior of the unit to maintain adequate durability in the high temperature environment. However, glass manufacturing equipment using lead materials has problems in the molten glass due to moisture. This is due to the moisture contained in the molten glass and the formation of hydrogen and oxygen. It is considered that although hydrogen passes through the platinum material through the platinum material method and oxygen remaining in the molten glass, bubbles are generated at the interface of the platinum material (the patent uses the glass clearing tank, the stirring tank and the platinum or other precious metal elements of the manufacturing apparatus: (A platinum alloy of ruthenium or rhodium (Ru) is collectively referred to as a platinum material.] The platinum material is not degraded at the melting point, and is excellent in the displacement property of the device, and is not easily contaminated with the treatment content, and is in the above characteristics, even in molten glass. It can be centered for a long period of time, and the platinum material produced at the interface of the platinum material is dissociated and released to the outside during the glass manufacturing process, and the oxygen-free concentration exceeds the solubility limit in the literature 1 to 4 for reference) -5 - 201014811. When the bubbles remain in the glass product to be produced, the quality of the glass product is lowered. In particular, the liquid crystal display (LCD), the organic electroluminescence/display (OLED), the inorganic electroluminescence, the display, etc. are substantially not contained. When the alkali-free glass substrate of the alkali metal oxide is used, the alkali-free glass has a high melting point and is highly viscous compared with the alkali-containing glass, so that bubbles in the molten glass are difficult to float. In order to solve this problem, it is proposed to provide a dense hydrogen-impermeable film on the outer surface of the platinum material (refer to Patent Documents 1 to 4). The material of the dense hydrogen-impermeable film can be exemplified. [Patent Document 1] Japanese Patent Publication No. 2004- 523449 (Patent Document 2) International Publication No. WO2006/030738 (Patent Document 3) International Publication No. WO2005/063634 (Patent Document 4) [Problems to be Solved by the Invention] The hydrogen-impermeable dense film of the prior art proposes a hydrogen-impermeable material by focusing on the molecular diameter or ion diameter of hydrogen. A dense film is applied by coating or the like, and the film is prevented from being released to the outside by the film. However, when the glass is produced, the generation of bubbles cannot be sufficiently reduced. It is considered that the film provided on the outer surface of the enamel material may not necessarily be desired. Hydrogen permeates the film due to a dense film or a high-temperature environment, which causes deterioration of the film or a difference in thermal expansion coefficient between the platinum material and the film. Put it on the outside -6- 201014811 The glass bubble is controlled by the product. And the glass beta rate is made by the manufacturer of the method, and it can be made in the glass. In order to achieve the above object, the present invention is a glass manufacturing apparatus having a Φ presence and the like in order to achieve the above object. The member made of platinum or platinum alloy in contact with the molten glass is provided on the back side of the surface of the member in contact with the molten glass, and is formed to contain the total amount of the alumina-based ceramic particles in terms of Fe 203. A glass manufacturing apparatus characterized by a layer of alumina-based ceramic particles having a change point of Fe redox (Fe2 + /Fe2+ + Fe3+ ) in a molten glass temperature range of 5 mass%. In the glass manufacturing apparatus of the present invention, it is preferable that the member made of platinum or a platinum alloy is a container for accommodating molten glass. φ In the glass manufacturing apparatus of the present invention, the molten glass temperature range is preferably from 1,250 to 1,650 °C. In the glass production apparatus of the present invention, the alumina-based ceramic particles preferably contain 10% by mass or more of mullite. Further, the present invention provides a glass manufacturing method using the glass manufacturing apparatus of the present invention. In the glass manufacturing method of the present invention, the glass produced is represented by mass percentage (the total of SiO 2 , Al 2 〇 3, B 2 〇 3, MgO, CaO, SrO, and BaO is 100%) based on the oxide. : 201014811

Si02 5 0 ~ 7 0 % A 1 2 0 3 5〜 25% ' B 2 Ο 3 1〜 20% ' Μ gO 0〜 10%、 CaO 0〜 17%、 SrO 0〜 17%、 BaO 0〜 2 0%、Si02 5 0 ~ 7 0 % A 1 2 0 3 5~ 25% ' B 2 Ο 3 1~ 20% ' Μ gO 0~ 10%, CaO 0~ 17%, SrO 0~ 17%, BaO 0~ 2 0 %,

MgO + CaO + SrO + BaO 8 〜30〇/o 響 之無鹼玻璃爲佳。 [發明之效果] 根據本發明之玻璃製造裝置及玻璃製造方法,於玻璃 製造時,可有效且安定地防止在與熔融玻璃接觸之鉛界面 或鉛合金界面的氣泡產生。此結果,可製造氣泡殘留受抑 制之良好品質的玻璃。MgO + CaO + SrO + BaO 8 ~ 30 〇 / o is preferably an alkali-free glass. [Effect of the Invention] According to the glass manufacturing apparatus and the glass manufacturing method of the present invention, generation of bubbles at the lead interface or the lead alloy interface in contact with the molten glass can be effectively and stably prevented during the production of the glass. As a result, it is possible to produce a glass of good quality in which bubble residue is suppressed.

特別係,以本發明之玻璃製造裝置及玻璃製造方法所 G 製造之無鹼玻璃,適用於平面面板顯示器用基板玻璃,特 別係,液晶顯示器(LCD )、有機電致發光·顯示器( OLED )、無機電致發光•顯示器等之平面面板顯示器用 之基板玻璃。 [實施發明之最佳形態] 以下,說明關於本發明之玻璃製造裝置。 圖1爲玻璃製造裝置之一構成例的模式圖。圖1所示 -8- 201014811 之玻璃製造裝置1,具有熔解槽2、設置於該熔解槽2下 游側之澄清槽3、設置於澄清槽3下游側之攪拌槽4、設 置於攪拌槽4下游側之成形裝置5,熔解槽2、澄清槽3、 攪拌槽4及成形裝置5分別經由使熔融玻璃流通用的導管 (聯絡通路)6,7,8而連接。 溶解槽2,設有燃燒器、電極等,可使玻璃原料熔解 。於熔解槽2之下游側,形成有熔融玻璃之流出口,經由 φ 使該流出口爲上游端的導管6連通熔解槽2與澄清槽3。 澄清槽3,爲主要進行玻璃澄清之部位,熔融玻璃中 所含之微細的泡藉由從澄清劑放出之澄清氣體而浮上,由 熔融玻璃除去。於澄清槽3之下游側形成有熔融玻璃之流 出口,經由以該流出口爲上游端的導管7而連通澄清槽3 與攪拌槽4。 攪拌槽4,爲主要經由攪拌機等使熔融玻璃進行攪拌 、均質化之部位。於攪拌槽4下游側形成有流出口,經由 φ 令流出口爲上游端的導管8連通攪拌槽4與成形裝置5。 成形裝置5爲主要使玻璃成形爲所期望之形狀的部位 ,因應欲製造玻璃製品之形狀而適宜選擇。例如玻璃製品 爲平面面板顯示器用之玻璃基板時,使用浮法成形裝置、 下拉成形裝置等。 圖1所示之玻璃製造裝置1中,與熔解槽2〜導管8 之熔融玻璃接觸部分因要求有耐高溫環境之耐熱性、及對 熔融玻璃之耐腐蝕性,以使用鈾材料(亦即鉑或鈾合金) 爲佳。 -9 - 201014811 本發明之玻璃製造裝置,具有與熔融玻璃接觸之鉑製 或鉛合金製之構件,在該構件的與熔融玻璃接觸之面的背 面側,形成有含有相對於氧化鋁系陶瓷粒子之總量含以 Fe203換算爲0.2〜5質量%之Fe,且在熔融玻璃溫度域具 有Fe氧化還原(Fe2 + /Fe2 + + Fe3+)上昇之變化點的氧化鋁 系陶瓷粒子之層爲其特徵。 在此,與熔融玻璃接觸之鉑製或鉑合金製之構件的具 體例方面,可例舉如收納熔融玻璃之鉑製或鉑合金製的容 器。但,不限於此,廣泛包含使用玻璃製造裝置時,與熔 融玻璃接觸之鉑製或鉑合金製之構件。以下,在本說明書 中,與熔融玻璃接觸之鉑製或鉑合金製之構件的具體例, 雖例舉收納熔融玻璃之鉑製或鈾合金製的容器來説明,但 關於收納熔融玻璃之容器以外的鉑製或鉑合金製之構件, 將收納熔融玻璃之容器的部分解釋爲作爲鉑製或鉑合金製 之構件。 收納熔融玻璃之容器係廣泛指在玻璃製造步驟,暫時 維持或收納熔融玻璃的容器,圖1所示之玻璃製造裝置1 的一構成例,爲熔解槽2、澄清槽3、攪拌槽4、及導管6 ,7,8 〇 而,本發明之玻璃製造裝置,上述收納熔融玻璃之容 器中至少一個爲鉑材料製,且該鉑材料製的容器之與熔融 玻璃接觸之面的背面側、亦即圖1所示之玻璃製造裝置的 一構成例,於鉑材料製的容器壁面外側形成有上述之氧化 鋁系陶瓷粒子層。 -10- 201014811 以往著眼於氫的分子徑或離子徑,認爲以不透過氫之 材料經塗佈等形成緻密的被膜即可。然而,本發明者努力 硏究結果,發現並非不透過氫之材料所形成之緻密的被膜 ’而係氧化鋁系陶瓷粒子所含之Fe之價數變化(Fe3 + e Fe2+)對氣泡殘留的抑制有效。In particular, the alkali-free glass produced by the glass manufacturing apparatus and the glass manufacturing method of the present invention is applied to a substrate glass for a flat panel display, in particular, a liquid crystal display (LCD), an organic electroluminescence/display (OLED), Substrate glass for flat panel displays such as electromechanical illumination and displays. BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, a glass manufacturing apparatus according to the present invention will be described. Fig. 1 is a schematic view showing an example of the configuration of a glass manufacturing apparatus. The glass manufacturing apparatus 1 of -8-201014811 shown in Fig. 1 has a melting tank 2, a clarification tank 3 provided on the downstream side of the melting tank 2, a stirring tank 4 provided on the downstream side of the clarification tank 3, and a downstream of the stirring tank 4. The side forming apparatus 5, the melting tank 2, the clarification tank 3, the stirring tank 4, and the molding apparatus 5 are connected via the ducts (contact passages) 6, 7, 8 which flow the molten glass respectively. The dissolution tank 2 is provided with a burner, an electrode, etc., and the glass raw material can be melted. On the downstream side of the melting tank 2, an outlet port for molten glass is formed, and the conduit 6 having the outlet port at the upstream end is connected to the melting tank 2 and the clarification tank 3 via φ. The clarification tank 3 is a portion where the glass is mainly clarified, and the fine bubbles contained in the molten glass are floated by the clarified gas discharged from the clarifying agent, and are removed by the molten glass. A flow outlet for molten glass is formed on the downstream side of the clarification tank 3, and the clarification tank 3 and the stirring tank 4 are connected via a conduit 7 whose upstream end is the outlet. The agitation tank 4 is a portion where the molten glass is stirred and homogenized mainly via a stirrer or the like. An outlet port is formed on the downstream side of the agitation vessel 4, and the agitation vessel 4 and the forming device 5 are communicated via a conduit 8 whose upstream end is φ such that the outlet port is φ. The molding device 5 is a portion that mainly shapes the glass into a desired shape, and is appropriately selected in accordance with the shape of the glass product to be produced. For example, when the glass product is a glass substrate for a flat panel display, a float forming apparatus, a pull-down forming apparatus, or the like is used. In the glass manufacturing apparatus 1 shown in Fig. 1, the contact portion with the molten glass of the melting tank 2 to the conduit 8 is required to have a heat resistance to a high temperature environment and corrosion resistance to molten glass, and a uranium material (i.e., platinum) is used. Or uranium alloy) is preferred. -9 - 201014811 The glass manufacturing apparatus of the present invention has a member made of platinum or a lead alloy which is in contact with the molten glass, and is formed on the back side of the surface of the member which is in contact with the molten glass with respect to the alumina-based ceramic particles. The total amount of Fe-containing oxide is 0.2 to 5% by mass of Fe, and the layer of alumina-based ceramic particles having a point of change in Fe redox (Fe2 + /Fe2+ + Fe3+) rise in the molten glass temperature range is characterized. . Here, as a specific example of a member made of platinum or a platinum alloy which is in contact with the molten glass, a container made of platinum or a platinum alloy containing the molten glass may be mentioned. However, the present invention is not limited thereto, and includes a member made of platinum or a platinum alloy which is in contact with the molten glass when the glass manufacturing apparatus is used. In the present specification, a specific example of a member made of platinum or a platinum alloy which is in contact with the molten glass is exemplified by a container made of platinum or a uranium alloy containing molten glass, but a container for accommodating the molten glass is used. The member made of platinum or a platinum alloy is explained as a member made of platinum or a platinum alloy. The container for accommodating the molten glass is generally a container for temporarily holding or accommodating the molten glass in the glass manufacturing step. One configuration example of the glass manufacturing apparatus 1 shown in FIG. 1 is the melting tank 2, the clarification tank 3, the stirring tank 4, and In the glass manufacturing apparatus of the present invention, at least one of the containers for accommodating the molten glass is made of a platinum material, and the back side of the surface of the container made of the platinum material in contact with the molten glass, that is, In a configuration example of the glass manufacturing apparatus shown in Fig. 1, the above-described alumina-based ceramic particle layer is formed on the outside of the container wall surface made of a platinum material. -10-201014811 In the past, it has been considered that a molecular diameter or an ion diameter of hydrogen is applied to form a dense film by coating or the like. However, the inventors of the present invention have diligently studied the results and found that the valence of Fe (Fe3 + e Fe 2+ ) contained in the alumina-based ceramic particles is not inhibited by the dense film formed by the material of hydrogen. effective.

Fe之價數變化雖爲伴隨因熔融玻璃溫度上昇導致鉑材 料之溫度上昇而產生者(假設鉑材料製的容器外側之溫度 φ 幾乎與熔融玻璃溫度相同),認爲Fe產生價數變化後, 之後,在鈾材料之溫度維持一定的期間,氣泡之殘留抑制 效果幾乎維持一定者。 本發明中,氧化鋁系陶瓷粒子層爲了發揮氣泡之殘留 抑制效果,氧化鋁系陶瓷粒子需含充分量的Fe。具體上, 氧化鋁系陶瓷粒子需含相對於氧化鋁系陶瓷粒子之總量以 Fe203換算爲0.2〜5質量%之Fe,以含0.5質量%以上爲 佳。但,Fe之量多,則不混入氧化鋁系陶瓷之結晶構造中 φ ,保持Fe203以赤鐵礦(Hematite)殘存,所以後述Fe氧化 還原上昇之變化點降低。因此,Fe之含量以Fe203換算爲 5質量%以下爲佳。 另外,氧化鋁系陶瓷粒子所含之Fe,使用玻璃製造裝 置時,需要易產生從Fe3 +至Fe2 +之價數變化之狀態。因此 ,氧化鋁系陶瓷粒子所含之Fe需要在熔融玻璃溫度域具 有Fe氧化還原(Fe2 + /Fe2 + + Fe3+)上昇之變化點。以溫度 爲横軸、Fe氧化還原(Fe2 + /Fe2 + + Fe3+ )爲縱軸作圖時, 在特定溫度,Fe氧化還原(Fe2 + /Fe2 + + Fe3+ )急遽上升。 -11 - 201014811 本說明書中,將此溫度稱爲Fe氧化還原(Fe2 + /Fe2 + + Fe3H )上昇之變化點。更具體上,將上述作圖之近似曲線的一 次微分値伴隨溫度上昇而開始增加之點稱爲變化點。 又,氧化鋁系陶瓷粒子之 Fe 氧化還原( Fe2 + /Fe2 + + Fe3+ ),可藉由氧化還原滴定法而求得。具體 上,使氧化鋁系陶瓷粒子之試料以每小時300°C之速度升 溫至特定溫度,在特定溫度維持1小時後,冷卻至室溫, 於測定試料以氟酸溶解的溶解液中加入Fe2 +指示劑,經分 光測定測定Fe2 +量。又,使測定試料進行氟酸溶解後,將 溶解液中Fe3 +進行還原爲Fe2 +之還原處理,以與前述之方 法相同地測定Fe2 +量而求出Fe3 + + Fe2 +量。The change in the valence of Fe is caused by an increase in the temperature of the platinum material due to an increase in the temperature of the molten glass (assuming that the temperature φ outside the container made of platinum material is almost the same as the temperature of the molten glass), and it is considered that the valence of Fe is changed. After that, while the temperature of the uranium material is maintained constant, the effect of suppressing the residual bubbles is almost constant. In the present invention, the alumina-based ceramic particle layer needs to contain a sufficient amount of Fe in order to exhibit the residual suppressing effect of the bubbles. Specifically, the alumina-based ceramic particles are preferably contained in an amount of 0.2 to 5% by mass in terms of Fe203 based on the total amount of the alumina-based ceramic particles, and more preferably 0.5% by mass or more. However, when the amount of Fe is large, φ is not mixed into the crystal structure of the alumina-based ceramic, and Fe203 remains in Hematite. Therefore, the change point of the Fe oxidation-reduction rise described later is lowered. Therefore, the content of Fe is preferably 5% by mass or less in terms of Fe203. Further, when the Fe contained in the alumina-based ceramic particles is used in a glass manufacturing apparatus, it is necessary to easily change the valence from Fe3 + to Fe2+. Therefore, the Fe contained in the alumina-based ceramic particles needs to have a change point of Fe redox (Fe2 + /Fe2+ + Fe3+) rise in the molten glass temperature range. When the temperature is plotted on the horizontal axis and Fe redox (Fe2 + /Fe2 + + Fe3+ ) is plotted on the vertical axis, Fe redox (Fe2 + /Fe2 + + Fe3+ ) rises sharply at a specific temperature. -11 - 201014811 In this specification, this temperature is called the point of change in Fe redox (Fe2 + /Fe2+ + Fe3H) rise. More specifically, the point at which the first differential 値 of the approximation curve of the above graph starts to increase with an increase in temperature is referred to as a change point. Further, Fe redox (Fe2 + /Fe2 + + Fe3+ ) of the alumina-based ceramic particles can be obtained by a redox titration method. Specifically, the sample of the alumina-based ceramic particles is heated to a specific temperature at a rate of 300 ° C per hour, and maintained at a specific temperature for 1 hour, and then cooled to room temperature, and Fe 2 is added to the solution in which the sample is dissolved in hydrofluoric acid. + indicator, the amount of Fe2+ was determined by spectrometry. Further, after the measurement sample was dissolved in fluoric acid, the Fe 3 + in the solution was reduced to Fe 2 +, and the amount of Fe 2 + was measured in the same manner as described above to determine the amount of Fe 3 + + Fe 2 + .

Fe氧化還原(Fe2 + /Fe2 + + Fe3+)上昇之變化點在熔融 玻璃溫度域時,則使用玻璃製造裝置時,更具體上,在收 納熔融玻璃之容器的鉑材料製之壁面爲與熔融玻璃接觸狀 態,成爲易產生氧化鋁系陶瓷粒子所含之Fe之價數變化 (Fe3 + — Fe2+)之狀態。 熔融玻璃溫度域係指在從熔解至成形前之玻璃製造步 驟中,熔融玻璃經歷的溫度域。圖1所示之玻璃製造裝置 1中,係指由熔解槽2至導管8爲止,熔融玻璃經歷的溫 度域。溶融玻璃溫度域,因玻璃種類或玻璃製造裝置之構 成要素而異,但爲無鹼玻璃時,通常爲1 25 0〜1 65 0°C。較 佳爲構成後述玻璃製造裝置容器整體之熔融玻璃溫度域。 本發明所使用之氧化鋁系陶瓷粒子,因在熔融玻璃溫 度域具有Fe氧化還原上昇的變化點,熔融玻璃溫度域爲 -12- 201014811 1250〜165(TC時,以含莫來石10質量%以上爲佳。莫來石 含有量以20質量%以上更佳,30質量%以上又更佳,40 質量%以上特佳。 氧化鋁系陶瓷粒子可爲僅含莫來石作爲結晶相者,但 莫來石含有量滿足上述範圍時,亦可含其他結晶相,具體 上,可含斜鉻石、鋼玉。又,作爲其他成分,可含銷石、 矽線石等。 φ 氧化鋁系陶瓷粒子中的玻璃相之含量以50質量%以下 爲佳,30質量%以下更佳,20質量%以下又更佳,10質量 %以下特別佳。玻璃相之含量超過50質量%,則莫來石相 表面以玻璃相覆蓋,有無法發揮Fe之價數變化引起的氣 泡之殘留抑制效果的傾向。 本發明之玻璃製造裝置中,相對鉑材料製的容器的與 熔融玻璃接觸之面的背面側,亦即於容器的壁面(例如爲 坩鍋狀容器時,爲側面及底面)外側形成氧化鋁系陶瓷粒 φ 子層時,在容器的壁面外側以所期望之厚度充塡氧化鋁系 陶瓷粒子。厚度考量發揮氣泡之殘留抑制效果,以1mm 以上爲佳,2mm以上更佳。又,過厚,則變得需要必要以 上的陶瓷粒子,故以40mm以下爲佳。具體上,在容器的 壁面外側,與容器維持特定間隔設置耐火性塊,在容器與 該耐火性塊的隙間塡充氧化鋁系陶瓷粒子。耐火性塊爲耐 火性,可保有氧化鋁系陶瓷粒子者即可,無特別限制,例 如燒成耐火物,具體上,如氧化鋁銷石質、鉻石質、矽線 石質、燒粉質、氧化鋁質、氧化鎂質之煉瓦等。但,由耐 -13- 201014811 火性塊的製造容易性(成形性、加工性等)及成本點考慮 以氧化鋁質煉瓦爲佳。 又,本發明使用粒子之氧化鋁系陶瓷,係因於鉑材料 製的容器的壁面外側充塡方便。而,可粉碎爲粒徑2mm 以下左右者即可,並未指可調整爲特定粒度分佈者。 本發明中粒徑係指可通過該大小開孔之篩的粒子之大 小。例如爲粒徑2mm以下粒子時,係指通過2mm開孔之 篩之粒子。而,陶瓷粒子之形狀可爲球形、方形、不定形 @ 等。考量具有與容器周圍充分接觸點以塡充陶瓷粒子,以 粒徑2mm以下爲佳。又,考量防止塡充時之飛濺,以粒 徑lOym以上爲佳。 本發明中,於鉑材料製的容器的壁面外側塡充之氧化 鋁系陶瓷粒子,可因應容器所收納的熔融玻璃溫度而適宜 選擇。玻璃製造裝置之熔融玻璃溫度,因鉑材料製的容器 整體,亦即鉑材料製的玻璃製造裝置之構成要素(收納熔 融玻璃之容器)整體而異。例如爲無鹼玻璃時,圖1所示 @ 之玻璃製造裝置1中,熔解槽2中熔融玻璃溫度爲1 400〜 1650 °C左右,澄清槽3中熔融玻璃溫度爲1300〜1550 °C左 右,攪拌槽4中熔融玻璃溫度爲1250〜140 0 °C左右,導管 6中熔融玻璃溫度爲1400〜1600 °C左右,導管7中熔融玻 璃溫度爲1 300〜150(TC左右,導管8中熔融玻璃溫度爲 1250 〜1350 °C 左右。 而,本發明,於構成玻璃製造裝置之鉑材料製的容器 的壁面外側,塡充於該容器所收納的熔融玻璃溫度域具有 -14- 201014811When the change in the Fe redox (Fe2 + /Fe2 + + Fe3+) rise is in the molten glass temperature range, when a glass manufacturing apparatus is used, more specifically, the wall surface made of the platinum material in the container for accommodating the molten glass is the molten glass. In the contact state, the valence change (Fe3 + -Fe2+) of Fe contained in the alumina-based ceramic particles is likely to occur. The molten glass temperature domain refers to the temperature domain experienced by the molten glass in the glass manufacturing step from melting to forming. The glass manufacturing apparatus 1 shown in Fig. 1 refers to a temperature range experienced by the molten glass from the melting tank 2 to the duct 8. The temperature range of the molten glass varies depending on the type of glass or the constituent elements of the glass manufacturing apparatus, but in the case of an alkali-free glass, it is usually 1 260 0 to 1 65 0 °C. It is preferable to constitute a molten glass temperature range of the entire glass manufacturing apparatus container which will be described later. The alumina-based ceramic particles used in the present invention have a change point of Fe redox increase in the molten glass temperature range, and the molten glass temperature range is -12-201014811 1250 to 165 (when TC, 10% by mass of mullite is contained) The content of the mullite is preferably 20% by mass or more, more preferably 30% by mass or more, and most preferably 40% by mass or more. The alumina-based ceramic particles may be a crystal phase containing only mullite, but When the mullite content satisfies the above range, it may contain other crystal phases, and specifically, it may contain smectite or steel jade. Further, as other components, it may contain pin stone, sillimanite, etc. φ Alumina ceramic particles The content of the glass phase is preferably 50% by mass or less, more preferably 30% by mass or less, still more preferably 20% by mass or less, and particularly preferably 10% by mass or less. When the content of the glass phase exceeds 50% by mass, the mullite phase The surface of the glass manufacturing apparatus of the present invention tends to exhibit a residual effect of suppressing the bubbles caused by the change in the valence of Fe. The glass manufacturing apparatus of the present invention also faces the back side of the surface of the container made of platinum material that is in contact with the molten glass. When the alumina-based ceramic particle φ sub-layer is formed on the outer side of the wall surface of the container (for example, the side surface and the bottom surface of the crucible container), the alumina-based ceramic particles are filled with a desired thickness on the outer side of the wall surface of the container. In order to exhibit the effect of suppressing the residual of the air bubbles, it is preferably 1 mm or more, more preferably 2 mm or more. Further, if the thickness is too large, it is necessary to use ceramic particles or more, and therefore it is preferably 40 mm or less. Specifically, on the outer side of the wall surface of the container, The container is provided with a fire-resistant block at a predetermined interval, and the alumina-based ceramic particles are filled between the container and the gap of the fire-resistant block. The fire-resistant block is fire-resistant and can retain alumina-based ceramic particles, and is not particularly limited, for example, burned. Into refractory, specifically, such as alumina stone, chrome, sillimanite, burned powder, alumina, magnesia, etc.. However, by the resistance of -13 - 201014811 fire block In view of ease of production (formability, workability, etc.) and cost, it is preferable to use alumina-based smelting. Further, the alumina-based ceramic using particles of the present invention is based on the wall surface of a container made of platinum material. It is convenient to charge, and it can be pulverized to a particle diameter of about 2 mm or less, and does not mean that it can be adjusted to a specific particle size distribution. In the present invention, the particle diameter refers to the size of particles which can be sieved through the size. When the particle diameter is 2 mm or less, it means particles passing through a sieve of 2 mm opening. However, the shape of the ceramic particle may be spherical, square, amorphous @, etc. It is considered to have sufficient contact points with the periphery of the container to fill the ceramic particles. In addition, it is preferable to use a particle size of 2 mm or less, and it is preferable to use a particle size of 10 μm or more in the case of preventing splashing during charging. In the present invention, the alumina-based ceramic particles which are filled on the outer side of the wall surface of the container made of platinum material can be used. The temperature of the molten glass to be accommodated in the container is appropriately selected. The temperature of the molten glass of the glass manufacturing apparatus varies depending on the entire container made of a platinum material, that is, the constituent elements of the glass manufacturing apparatus made of platinum material (the container containing the molten glass). For example, in the case of an alkali-free glass, in the glass manufacturing apparatus 1 shown in Fig. 1, the molten glass temperature in the melting tank 2 is about 1,400 to 1,650 ° C, and the molten glass temperature in the clarification tank 3 is about 1300 to 1550 ° C. The temperature of the molten glass in the stirring tank 4 is about 1250 to 140 ° C, the temperature of the molten glass in the duct 6 is about 1400 to 1600 ° C, and the temperature of the molten glass in the duct 7 is about 1,300 to 150 (about TC, the molten glass in the duct 8) The temperature is about 1250 to 1350 ° C. However, the present invention has a wall surface of a container made of a platinum material constituting the glass manufacturing apparatus, and has a molten glass temperature range accommodated in the container - 14 - 201014811

Fe氧化還原(Fe2 + /Fe2 + + Fe3+)上昇之變化點的氧化鋁系 陶瓷粒子。 本發明之玻璃之製造方法,除使用上述説明的本發明 之玻璃製造裝置以外與以往相同。而,於圖1所示之玻璃 製造裝置的熔解槽2投入調和成爲所期望之玻璃組成的原 料,使進行加熱熔解所得之熔融玻璃依序通過導管6、澄 清槽3、導管7、攪拌槽4、導管8及成形裝置5,得到所 φ 期望之形狀的玻璃製品。 本發明,可製作各種玻璃。在本發明製造合適的玻璃 方面,無鹼玻璃的一例如下示。以下所示之無鹼玻璃適用 作爲液晶顯示器(LCD )用之基板玻璃。 此無鹼玻璃爲以氧化物爲基準,以質量百分率表示, 含有:Alumina ceramic particles in which the point of change in Fe redox (Fe2 + /Fe2 + + Fe3+) rises. The method for producing a glass of the present invention is the same as that of the prior art except that the glass manufacturing apparatus of the present invention described above is used. Further, the melting tank 2 of the glass manufacturing apparatus shown in Fig. 1 is put into a raw material which is adjusted to have a desired glass composition, and the molten glass obtained by heating and melting is sequentially passed through the conduit 6, the clarification tank 3, the conduit 7, and the stirring tank 4. The duct 8 and the forming device 5 obtain a glass product having a desired shape of φ. According to the present invention, various glasses can be produced. An example of the alkali-free glass in the production of a suitable glass of the present invention is shown below. The alkali-free glass shown below is suitable as a substrate glass for a liquid crystal display (LCD). The alkali-free glass is expressed by mass percentage based on oxides and contains:

Si02 50 〜70% Al2〇3 5 - ^ 2 5% ' B 2 0 3 1〜 ,2 0%、 MgO 0〜10%、 CaO 0〜 '17%、 SrO 0〜 '17%' BaO 0〜 '2 0%、Si02 50 ~70% Al2〇3 5 - ^ 2 5% ' B 2 0 3 1~ , 2 0%, MgO 0~10%, CaO 0~ '17%, SrO 0~ '17%' BaO 0~ ' 20%,

MgO+CaO+SrO+BaO 8〜30%。 又’上述之質量百分率表示係以Si02、A1203、B2〇3 、]^£〇、€&amp;0、81:0及8还0之合計爲1〇〇%者。 S i Ο 2爲必須成分,超過7 0 %則玻璃之熔解性降低,或 201014811 變得易失透。較佳爲6 4 %以下。未達5 0 %,則產生比重增 加、張力點(Strain Point)降低,熱膨脹係數增加、耐藥品 性之降低。較佳爲55%以上。MgO+CaO+SrO+BaO 8~30%. Further, the above-mentioned mass percentages are expressed as SiO 2 , A 1203 , B 2 〇 3 , ^ 〇 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , S i Ο 2 is an essential component, and if it exceeds 70%, the meltability of the glass is lowered, or 201014811 becomes easily devitrified. It is preferably 64% or less. When it is less than 50%, the specific gravity increases, the strain point decreases, the coefficient of thermal expansion increases, and the chemical resistance decreases. It is preferably 55% or more.

Al2〇3爲抑制玻璃之分相,或提高張力點(Strain Point)之成分,爲必須的。超過25%,則變得易失透,引 起耐藥品性降低。較佳爲2 2 %以下。未達5 %,則玻璃變 得易分相’或張力點(Strain Point)降低。較佳爲10%以上 〇 B2〇3爲使比重變小,提高玻璃之熔解性,使難以失透 的成分,係爲必要。超過20%,則張力點(strain Point)降 低、耐藥品性降低、或玻璃熔解時之揮散變明顯,玻璃之 不均質性增加。較佳爲1 2%以下。未達1 %,則比重增加 ’且玻璃之熔解性降低,且變得易失透。較佳爲6%以上 〇Al2〇3 is necessary to suppress the phase separation of the glass or to increase the composition of the strain point (Strain Point). When it exceeds 25%, it becomes devitrified and causes a decrease in chemical resistance. It is preferably 2 2 % or less. If it is less than 5%, the glass becomes easy to separate into phases or the strain point is lowered. It is preferably 10% or more. 〇 B2〇3 is a component which makes the specific gravity small, improves the meltability of the glass, and makes it difficult to devitrify. When it exceeds 20%, the strain point is lowered, the chemical resistance is lowered, or the volatilization is remarkable when the glass is melted, and the glass heterogeneity is increased. It is preferably 12% or less. If it is less than 1%, the specific gravity increases' and the meltability of the glass decreases, and it becomes easy to devitrify. More preferably 6% or more 〇

MgO爲使比重小、提升玻璃之熔解性的成分。超過 1 〇 %,則玻璃變得易分相,變得易失透、或耐藥品性降低 。較佳爲7%以下。MgO以含1 %以上爲佳。MgO is a component which has a small specific gravity and improves the meltability of the glass. When it exceeds 1%, the glass becomes easily phase-separated, and it becomes easy to devitrify or the chemical resistance is lowered. It is preferably 7% or less. MgO is preferably 1% or more.

CaO爲提高玻璃之熔解性、使不易失透可含有至】7% 。超過1 7% ’則比重增加,且熱膨脹係數變大,又,反而 變得易失透。較佳爲14%以下。CaO以含2%以上爲佳。CaO is used to increase the melting property of glass and to make it difficult to devitrify to 7%. More than 1 7% ′, the specific gravity increases, and the coefficient of thermal expansion becomes larger, and on the contrary, it becomes devitrified. It is preferably 14% or less. CaO is preferably 2% or more.

SrO爲了抑制玻璃分相、使不易失透,可含至17 %爲 止。超過1 7%,則比重增加,且熱膨脹係數變大,又,反 而變得易失透。較佳爲1 4%以下。SrO以含3%以上爲佳。 BaO爲了抑制玻璃分相、使不易失透,可含有至20% 201014811 爲止。超過20%,則比重增加,且熱膨脹係數變大。較佳 爲1 %以下,實質上不含有更佳。 鹼土類金屬氧化物(RO )之含量之總量,亦即( MgO + CaO + SrO + BaO )過少,則使玻璃之熔解變困難,故 在8%以上。相反地因過多,則玻璃之密度變大,故在 3 0 %以下。較佳爲1 0〜3 0 %。 而,無鹼玻璃以氧化物爲基準,以質量百分率表示, 以含有: Si〇2 55 - -64% ' Al203 1 0 〜2 2 %、 B 2 0 3 6〜 1 2 % ' MgO 1〜 7% ' CaO 2〜 14% ' SrO 3〜 1 4 % ' BaO 0〜 1%、In order to suppress the phase separation of the glass, SrO can be contained up to 17%. When it exceeds 7%, the specific gravity increases, and the coefficient of thermal expansion becomes large, and on the contrary, it becomes devitrified. It is preferably 14% or less. SrO is preferably 3% or more. BaO can be contained up to 20% 201014811 in order to suppress glass phase separation and make it difficult to devitrify. When it exceeds 20%, the specific gravity increases and the coefficient of thermal expansion becomes large. It is preferably 1% or less, and substantially does not contain it more preferably. When the total amount of the alkaline earth metal oxide (RO), that is, (MgO + CaO + SrO + BaO) is too small, the melting of the glass is difficult, so that it is 8% or more. On the other hand, if the amount is too large, the density of the glass becomes large, so it is at most 30%. It is preferably 1 0 to 3 0 %. On the other hand, the alkali-free glass is expressed by mass percentage based on the oxide, and contains: Si〇2 55 - -64% 'Al203 1 0 to 2 2 %, B 2 0 3 6 to 1 2 % 'MgO 1~ 7 % ' CaO 2~ 14% ' SrO 3~ 1 4 % ' BaO 0~ 1%,

MgO + CaO + SrO + BaO 10 〜30% 更佳。 又,上述之質量百分率表示,爲Si02、ai2o3、b2o3 、Mg〇、CaO、SrO 及 BaO 之合計爲 100%者。 另外,爲更抑制熔融玻璃中的氣泡,可添加相對於玻 璃原料1 0 0質量%,總量爲5質量%以下的作爲澄清劑之F 、Cl、S03、Sn02、Fe203 等。 【實施方式】 [實施例] -17- 201014811 以下,使用實施例進一步說明本發明,但本發明不 限於此等。 在本實施例,使用圖2(a)所示之鉑合金製(鉑鍺合 金 '铑10質量%)之坩鍋(JIS H6201 ( 1986.11.1)爲依 據)、與圖2(b)所示之氧化锆煉瓦製的基台(耐火性塊 )評估在鉑合金界面氣泡之產生狀況。圖2(a)所示之坩 鍋、及圖2(b)所示之基台之尺寸分別如以下。 坩鍋 高度:27mm 上部徑:2 5 mm 底部徑:1 5 mm 容量:1Occ 質量:8.0g 基台 外部尺寸:48mmx48mmx48mm 凹部深度:26mm 凹部徑:3 5 mm 又,實施例所使用之氧化鋁系陶瓷粒子如表1。粒子 徑爲1 〇 M m〜2mm。表1中,氧化鋁系陶瓷粒子中之結晶 相與玻璃相之比例(質量%基準)係藉由粉末X線繞射( XRD )法測定各結晶相之比例而求出。具體上,由各結晶 相之純物質(斜锆石、锆石、莫來石、鋼玉等)與試料之 XRD強度比求出結晶相之比例,由試料與各結晶相之比例 的合計之差求出玻璃相之比例。又,氧化鋁系陶瓷粒子之 -18- 201014811 組成比(質量%基準)係由螢光χ線分析求出。又,組成 比之EROx爲A!2〇3、Si〇2、Ζγ02、Fei〇3以外的氧化雜質 之合計,R爲金屬元素、Ο爲氧、X爲化學計量比。 表 1 例1 例2 例3 例4 例5 例6 例7 結晶相 斜锆石 12 锆石 莫來石 48 31 40 100 29 97 100 鋼玉 44 41 15 10 石英 16 赤鐵礦 3 m 每相 8 16 45 45 組成 AI2O3 85.5 75 64 69 52 67 71 Si02 12 11 30 27 42 26 28 Zr02 13 Fe2〇3 0.4 0.3 3 3 2 6 0.1 EROx 2.1 0.7 3 1 4 1 0.9 氧化還原變化點 (°C) 1350 1350 1250- 1300 1350 950 950 1350 氣泡佔有率(%) 0% 0.2% 2.8% 0% 36% 17% 15% 關於例1、例3及例5之氧化鋁系陶瓷粒子,將Fe氧 化還原與溫度之關係作圖的圖表如圖3» 將圖2(a)之坩鍋設置於圖2(b)基台之凹部,使 如圖2 ( c )般於間隙(基台凹部與坩鍋底面之間隙爲3〜 5mm)塡充如表1所示之氧化鋁系陶瓷粒子者設置於加熱 爐内’加熱至140(TC爲止。接著以維持140(TC之狀態於 圖2之坩鍋内投入無鹼玻璃,使熔解。無鹼玻璃之組成以 -19- 201014811 氧化物爲基準,以質量百分率表示,爲Si02 59.4%、MgO + CaO + SrO + BaO 10 〜30% is more preferable. Further, the above mass percentage means that the total of SiO 2 , ai 2 o 3 , b 2 o 3 , Mg 〇, CaO, SrO and BaO is 100%. In addition, in order to further suppress the bubbles in the molten glass, F, Cl, S03, Sn02, Fe203 or the like as a clarifying agent with respect to 100% by mass of the glass raw material and a total amount of 5% by mass or less may be added. [Embodiment] [Embodiment] -17- 201014811 Hereinafter, the present invention will be further described by way of Examples, but the present invention is not limited thereto. In the present embodiment, a crucible (made of JIS H6201 (1986.11.1)) made of a platinum alloy (platinum-niobium alloy '铑10% by mass) shown in Fig. 2(a) is used, and as shown in Fig. 2(b) The zirconia-made base (fire-resistant block) evaluates the generation of bubbles at the platinum alloy interface. The dimensions of the crucible shown in Fig. 2(a) and the base shown in Fig. 2(b) are as follows. Shabu pot height: 27mm Upper diameter: 2 5 mm Bottom diameter: 1 5 mm Capacity: 1Occ Mass: 8.0g Abutment outer dimension: 48mmx48mmx48mm Concave depth: 26mm Recessed diameter: 3 5 mm Also, the alumina system used in the examples Ceramic particles are shown in Table 1. The particle diameter is 1 〇 M m~2 mm. In Table 1, the ratio of the crystal phase to the glass phase (% by mass) in the alumina-based ceramic particles was determined by measuring the ratio of each crystal phase by a powder X-ray diffraction (XRD) method. Specifically, the ratio of the crystal phase is determined from the ratio of the XRD intensity of the pure substance (oblique zircon, zircon, mullite, steel jade, etc.) of each crystal phase to the sample, and the difference between the ratio of the sample and each crystal phase Find the ratio of the glass phase. Further, the composition ratio (mass% basis) of the alumina-based ceramic particles -18 to 201014811 was determined by fluorescent ray line analysis. Further, the composition ratio EROx is a total of oxidizing impurities other than A!2〇3, Si〇2, Ζγ02, and Fei〇3, and R is a metal element, lanthanum is oxygen, and X is a stoichiometric ratio. Table 1 Example 1 Example 2 Case 3 Case 4 Case 5 Case 6 Case 7 Crystalline phase zircon 12 Zircon mullite 48 31 40 100 29 97 100 Steel jade 44 41 15 10 Quartz 16 Hematite 3 m Each phase 8 16 45 45 Composition AI2O3 85.5 75 64 69 52 67 71 Si02 12 11 30 27 42 26 28 Zr02 13 Fe2〇3 0.4 0.3 3 3 2 6 0.1 EROx 2.1 0.7 3 1 4 1 0.9 Redox change point (°C) 1350 1350 1250 - 1300 1350 950 950 1350 Bubble occupancy (%) 0% 0.2% 2.8% 0% 36% 17% 15% Regarding the alumina ceramic particles of Examples 1, 3 and 5, the relationship between Fe redox and temperature The graph of the diagram is shown in Fig. 3» The crucible of Fig. 2(a) is placed in the recess of the base of Fig. 2(b) so that the gap is as shown in Fig. 2(c) (the gap between the recess of the abutment and the bottom of the crucible is 3 to 5 mm) The alumina-based ceramic particles shown in Table 1 are placed in a heating furnace and heated to 140 (TC). Then, in the state of TC, the alkali-free glass is placed in the crucible of Fig. 2. To make the melting. The composition of the alkali-free glass is based on the oxide of -19-201014811, expressed as mass percentage, which is SiO 2 59.4%,

Al2〇3 17.6% &gt; B2O37.9% ' MgO 3.3% &gt; CaO 3.8% ' SrO 8.0%' MgO + CaO + SrO 15.1%。 無鹼玻璃熔解後,再於1400 °C維持1小時,觀察在鉑 合金界面,亦即坩鍋壁面的氣泡之產生。結果如表1。表 i中,例1〜例4爲實施例、例5〜例7爲比較例。表1中 ,氣泡佔有率爲圖2(a)之坩鍋底面中,氣泡佔有面積之 比例,0%爲測定界限以下。 由表1之結果可知,例1〜例4之氧化鋁系陶瓷粒子 可有效果且安定的抑制氣泡之殘留。另外,認爲例5、例 6之氧化鋁系陶瓷粒子因氧化還原變化點爲950°C,在實 施例之熔融玻璃溫度(1400 °C ),爲無法發揮Fe之價數 變化(Fe3 + — Fe2+ )導致的氣泡之殘留抑制效果者。又, 認爲例7之氧化鋁系陶瓷粒子雖然氧化還原變化點爲1350 °C,因Fe203含有量未達0.2質量%,爲無法充分發揮Fe 之價數變化(Fe3 + — Fe2+)導致的氣泡之殘留抑制效果者 ❺ [產業上之利用性] 本發明之玻璃製造裝置及玻璃製造方法所製造的無驗 玻璃適用作爲平面面板顯示器用之基板玻璃、特別係’液 晶顯示器(LCD )、有機電致發光·顯示器(〇LED )、 無機電致發光.顯示器等之平面面板顯示器用之基板玻璃 -20- 201014811 【圖式簡單說明】 [圖1]圖1係表示玻璃製造裝置之一構成例的模式圖 〇 [圖2]圖2(a)爲表示實施例所用之鉑合金製坩鍋之 圖,圖2(b)爲表示實施例所用之氧化鉻煉瓦製之基台的 圖,圖2(c)表示將圖2(a)坩鍋設置於圖2(b)基台 φ 之凹部的狀態之圖。 [圖3]圖3係關於例1、例3及例5之氧化鋁系陶瓷粒 子,將Fe氧化還原與溫度之關係作圖之圖表。 t主要元件符號說明】 1 :玻璃製造裝置 2 :熔解槽 3 :澄清槽 ® 4 :攪拌槽 5 :成形裝置 6,7,8 :導管 -21 -Al2〇3 17.6% &gt; B2O37.9% 'MgO 3.3% &gt; CaO 3.8% 'SrO 8.0%' MgO + CaO + SrO 15.1%. After the alkali-free glass was melted, it was further maintained at 1400 ° C for 1 hour, and the generation of bubbles at the platinum alloy interface, that is, the wall surface of the crucible was observed. The results are shown in Table 1. In Table i, Examples 1 to 4 are Examples, and Examples 5 to 7 are Comparative Examples. In Table 1, the bubble occupancy ratio is the ratio of the area occupied by the bubble in the bottom surface of the crucible of Fig. 2(a), and 0% is below the measurement limit. As is clear from the results of Table 1, the alumina-based ceramic particles of Examples 1 to 4 were effective and stable in suppressing the remaining of the bubbles. Further, it is considered that the alumina-based ceramic particles of Examples 5 and 6 have a redox change point of 950 ° C, and in the molten glass temperature (1400 ° C) of the example, the valence change of Fe cannot be exhibited (Fe3 + - The residual suppression effect of bubbles caused by Fe2+). In addition, it is considered that the alumina-based ceramic particles of Example 7 have a redox change point of 1,350 ° C, and the Fe203 content is less than 0.2% by mass, so that bubbles of the valence of Fe (Fe3 + —Fe2+) cannot be sufficiently exhibited. Residual effect of the residue ❺ [Industrial Applicability] The glass-free device and the glass-manufacturing method of the present invention are used as a substrate glass for a flat panel display, particularly a liquid crystal display (LCD) or an organic battery. A substrate glass for a flat panel display such as a light-emitting display (〇LED), a non-electroluminescence, a display, etc. - 201014811 [Simplified description of the drawings] [Fig. 1] Fig. 1 shows an example of a configuration of a glass manufacturing apparatus Fig. 2(a) is a view showing a crucible made of a platinum alloy used in the embodiment, and Fig. 2(b) is a view showing a base of a chrome oxide smelting system used in the embodiment, Fig. 2 (Fig. 2 (Fig. 2) c) is a view showing a state in which the crucible of Fig. 2(a) is placed in the concave portion of the base φ of Fig. 2(b). Fig. 3 is a graph showing the relationship between the oxidation of Fe and the temperature of alumina-based ceramic particles of Examples 1, 3 and 5. t Main component symbol description] 1 : Glass manufacturing equipment 2 : Melting tank 3 : Clarification tank ® 4 : Stirring tank 5 : Forming device 6,7,8 : Catheter -21 -

Claims (1)

201014811 十、申請專利範圍 1· 一種玻璃製造裝置,其係具有與熔融玻璃接觸之鉑 製或鈾合金製之構件,其特徵係在該構件的與熔融玻璃接 觸之面的背面側’形成有含有相對於氧化鋁系陶瓷粒子之 總量含以Fe;i〇3換算爲〇.2〜5質量%之Fe,且在熔融玻璃 溫度域具有Fe氧化還原(Fe2 + /Fe2 + + Fe3+)上昇之變化點 的氧化鋁系陶瓷粒子之層。 2. 如申請專利範圍第丨項之玻璃製造裝置,其中該鉑 製或鈾合金製之構件係收容熔融玻璃之容器。 3. 如申請專利範圍第1或2項之玻璃製造裝置,其中 該熔融玻璃溫度域係在1250〜1650 °C。 4. 如申請專利範圍第1〜3項中任一項之玻璃製造裝 置,其中該氧化鋁系陶瓷粒子係含莫來石10質量%以上。 5. —種玻璃製造方法,其特徵係使用申請專利範圍第 1〜4項中任一項之玻璃製造裝置。 6. 如申請專利範圍第5項中任一項之玻璃製造方法, 其中所製造之玻璃以氧化物爲基準、以質量百分率表示( Si02、Al2〇3、B2〇3、MgO、CaO、SrO 及 BaO 之合計爲 100%)係爲含有: Si02 50 〜70% A 1 2 0 3 5〜 ^ 25% ' B2 〇3 1〜 ,2 0%、 MgO 0〜 M0%、 201014811 SrO 0 〜1 7%、 B a Ο 0 〜2 0 %、 8 〜3 0 % MgO+CaO+SrO+BaO 之無鹼玻璃。201014811 X. Patent Application No. 1 A glass manufacturing apparatus having a member made of platinum or a uranium alloy in contact with molten glass, characterized in that it is formed on the back side of the surface of the member in contact with the molten glass. The total amount of the alumina-based ceramic particles is Fe in an amount of ;.2 to 5% by mass in terms of Fe; i〇3, and has a Fe redox (Fe2 + /Fe2+ + Fe3+) rise in the molten glass temperature range. A layer of alumina ceramic particles that changes point. 2. The glass manufacturing apparatus of claim </ RTI> wherein the platinum or uranium alloy member is a container for containing molten glass. 3. The glass manufacturing apparatus of claim 1 or 2, wherein the molten glass temperature range is from 1250 to 1650 °C. 4. The glass manufacturing apparatus according to any one of claims 1 to 3, wherein the alumina-based ceramic particles contain 10% by mass or more of mullite. A glass manufacturing method characterized by using the glass manufacturing apparatus according to any one of claims 1 to 4. 6. The glass manufacturing method according to any one of claims 5, wherein the glass produced is expressed by mass percentage based on oxides (SiO 2 , Al 2 〇 3, B 2 〇 3, MgO, CaO, SrO, and The total of BaO is 100%) containing: Si02 50 〜70% A 1 2 0 3 5~ ^ 25% ' B2 〇3 1~ , 2 0%, MgO 0~ M0%, 201014811 SrO 0 〜1 7% , B a Ο 0 ~ 2 0 %, 8 〜3 0 % MgO+CaO+SrO+BaO alkali-free glass. -23--twenty three-
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