TWI389862B - Glass manufacturing apparatus and manufacturing method thereof - Google Patents

Glass manufacturing apparatus and manufacturing method thereof Download PDF

Info

Publication number
TWI389862B
TWI389862B TW97139557A TW97139557A TWI389862B TW I389862 B TWI389862 B TW I389862B TW 97139557 A TW97139557 A TW 97139557A TW 97139557 A TW97139557 A TW 97139557A TW I389862 B TWI389862 B TW I389862B
Authority
TW
Taiwan
Prior art keywords
glass
molten glass
platinum
alumina
manufacturing apparatus
Prior art date
Application number
TW97139557A
Other languages
Chinese (zh)
Other versions
TW201014811A (en
Inventor
Shuji Kabashima
Eiji Yanagisawa
Osamu Sakamoto
Kazuo Hamashima
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of TW201014811A publication Critical patent/TW201014811A/en
Application granted granted Critical
Publication of TWI389862B publication Critical patent/TWI389862B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/42Details of construction of furnace walls, e.g. to prevent corrosion; Use of materials for furnace walls
    • C03B5/43Use of materials for furnace walls, e.g. fire-bricks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Compositions (AREA)

Description

玻璃製造裝置及製造方法 Glass manufacturing device and manufacturing method

本發明係關於玻璃製造裝置、及使用該製造裝置之玻璃製造方法。 The present invention relates to a glass manufacturing apparatus and a glass manufacturing method using the same.

作為玻璃製造裝置(熔解槽、澄清槽、攪拌槽及此等之聯絡通路)之構成材料,使用鉑、或鉑與其他貴金屬元素、例如與銠(Rh)、金(Au)、銥(Ir)或釕(Ru)之合金(以下,在本說明書中,將鉑及鉑合金統稱為鉑材料)。可用作此等之構成材料之鉑材料者,該鉑材料為融點高,因在大氣中不形成氧化物層,故不劣化,除了裝置運轉時,不易變形、損傷之外,化學安定性亦優,不易污染熔融狀態之玻璃。 As a constituent material of the glass manufacturing apparatus (melting tank, clarification tank, stirring tank, and the like), platinum, or platinum and other precious metal elements, for example, rhodium (Rh), gold (Au), or iridium (Ir) are used. Or an alloy of ruthenium (Ru) (hereinafter, in the present specification, platinum and a platinum alloy are collectively referred to as a platinum material). As a platinum material which can be used as a constituent material of the material, the platinum material has a high melting point, and does not deteriorate due to the formation of an oxide layer in the atmosphere, and is not easily deformed or damaged except for the operation of the device, and chemical stability. It is also excellent, and it is not easy to contaminate the molten glass.

玻璃製造步驟之裝置溫度雖依其處理內容而異,在約900℃以上之高溫環境下。鉑材料因上述特性,就算在如此之高溫環境下亦不污染裝置內部之熔融玻璃,可長期間維持充分之耐久性。 The device temperature of the glass manufacturing step varies depending on the processing content, and is in a high temperature environment of about 900 ° C or higher. Due to the above characteristics, the platinum material does not contaminate the molten glass inside the device even in such a high temperature environment, and can maintain sufficient durability for a long period of time.

然而,使用鉑材料之玻璃製造裝置中,於玻璃製造時,有熔融玻璃中因水分而起之氣泡在鉑材料之界面產生的問題。此為因熔融玻璃所含之水分與鉑材料接觸而解離,生成了氫與氧。認為氫雖透過鉑材料釋出至外部,而氧無法透過鉑材料,於熔融玻璃殘留之氧濃度超過溶解度界限,則於鉑材料之界面產生氣泡(專利文獻1~4作參考) 。如此一來產生之氣泡於所製造之玻璃製品中殘留,則玻璃製品之品質降低。 However, in a glass manufacturing apparatus using a platinum material, there is a problem that air bubbles due to moisture in the molten glass are generated at the interface of the platinum material at the time of glass production. This is because hydrogen contained in the molten glass is dissociated by contact with the platinum material, and hydrogen and oxygen are generated. It is considered that hydrogen is released to the outside through the platinum material, and oxygen cannot pass through the platinum material. When the oxygen concentration remaining in the molten glass exceeds the solubility limit, bubbles are generated at the interface of the platinum material (Patent Documents 1 to 4 for reference). . When the bubbles generated in this way remain in the glass product to be produced, the quality of the glass product is lowered.

特別係,為實質上不含液晶顯示器(LCD)、有機電致發光‧顯示器(OLED)、無機電致發光‧顯示器等所使用之鹼金屬氧化物的無鹼玻璃基板時,無鹼玻璃為高融點,與含鹼玻璃相比為高黏性,故熔融玻璃中氣泡難以浮起,氣泡抑制為困難。 In particular, in the case of an alkali-free glass substrate which does not substantially contain an alkali metal oxide used for a liquid crystal display (LCD), an organic electroluminescence, an OLED, an inorganic electroluminescence, a display, or the like, the alkali-free glass is high. The melting point is highly viscous compared to the alkali-containing glass, so that bubbles in the molten glass are hard to float, and it is difficult to suppress the bubbles.

為解決此問題,提案於鉑材料之外側表面設置緻密的氫不透過性被膜(專利文獻1~4作參考)。緻密的氫不透過性被膜之材料方面,可例舉玻璃、陶瓷、金屬等。 In order to solve this problem, it is proposed to provide a dense hydrogen-impermeable film on the outer surface of the platinum material (see Patent Documents 1 to 4 for reference). Examples of the material of the dense hydrogen-impermeable coating film include glass, ceramics, and metal.

[專利文獻1]特表2004-523449號公報 [Patent Document 1] Japanese Patent Publication No. 2004-523449

[專利文獻2]國際公開WO2006/030738號文獻 [Patent Document 2] International Publication No. WO2006/030738

[專利文獻3]國際公開WO2005/063634號文獻 [Patent Document 3] International Publication No. WO2005/063634

[專利文獻4]特表2006-522001號公報 [Patent Document 4] Special Table 2006-522001

先前技術提案之氫不透過性之緻密的被膜,雖為著眼於氫的分子徑或離子徑,以氫不透過性材料經塗佈等設置緻密的被膜,通過被膜,防止氫釋放至外部者,但在玻璃製造時,無法充分減低氣泡產生。認為於鉑材料之外側表面設置之被膜,因不一定能成為所期望之緻密的膜、或高溫環境下使用而造成被膜劣化、或鉑材料與被膜之熱膨脹係數差造成被膜剝離等之原因,氫透過被膜而釋放到外部 。 In the dense film of hydrogen impermeability proposed in the prior art, a dense film is formed by coating a hydrogen impermeable material with a molecular diameter or an ion diameter, and a hydrogen-impermeable material is passed through the film to prevent hydrogen from being released to the outside. However, in the manufacture of glass, the generation of bubbles cannot be sufficiently reduced. It is considered that the film provided on the outer surface of the platinum material may not be able to be a desired dense film or a film used in a high-temperature environment, or the film may be peeled off due to a difference in thermal expansion coefficient between the platinum material and the film. Released to the outside through the membrane .

為解決上述問題,本發明以提供有效率且安定防止玻璃製造時之氣泡產生,可防止在所製造之玻璃製品之氣泡的殘留的玻璃製造裝置及玻璃製造方法為目的。 In order to solve the above problems, the present invention has an object of providing a glass manufacturing apparatus and a glass manufacturing method which are effective in preventing the generation of bubbles during the production of glass and preventing the remaining bubbles of the glass product to be produced.

為達成上述目的,本發明為一種玻璃製造裝置,其具有與熔融玻璃接觸之鉑製或鉑合金製之構件,提供在該構件的與熔融玻璃接觸之面的背面側,形成有含有相對於氧化鋁系陶瓷粒子之總量含以Fe2O3換算為0.2~5質量%之Fe,且在熔融玻璃溫度域具有Fe氧化還原(Fe2+/Fe2++Fe3+)上昇之變化點之氧化鋁系陶瓷粒子的層為特徵之玻璃製造裝置。 In order to achieve the above object, the present invention is a glass manufacturing apparatus having a member made of platinum or a platinum alloy in contact with molten glass, provided on the back side of the surface of the member in contact with the molten glass, formed with oxidation relative to oxidation The total amount of the aluminum-based ceramic particles contains Fe in an amount of 0.2 to 5% by mass in terms of Fe 2 O 3 , and has a change point of Fe redox (Fe 2+ /Fe 2+ +Fe 3+ ) in the molten glass temperature range. The layer of alumina-based ceramic particles is a glass manufacturing apparatus characterized by the following.

本發明之玻璃製造裝置中,以前述鉑製或鉑合金製之構件係收容熔融玻璃之容器為佳。 In the glass manufacturing apparatus of the present invention, it is preferable that the member made of platinum or a platinum alloy is a container for accommodating molten glass.

本發明之玻璃製造裝置中,前述熔融玻璃溫度域係在1250~1650℃為佳。 In the glass manufacturing apparatus of the present invention, the molten glass temperature range is preferably from 1,250 to 1,650 °C.

本發明之玻璃製造裝置中,前述氧化鋁系陶瓷粒子含莫來石10質量%以上為佳。 In the glass manufacturing apparatus of the present invention, the alumina-based ceramic particles preferably contain 10% by mass or more of mullite.

又,本發明係提供使用本發明之玻璃製造裝置的玻璃製造方法。 Further, the present invention provides a glass manufacturing method using the glass manufacturing apparatus of the present invention.

本發明之玻璃製造方法中,所製造之玻璃,以氧化物為基準、以質量百分率表示(SiO2、Al2O3、B2O3、MgO、CaO、SrO及BaO之合計為100%),以含有: SiO2 50~70%、Al2O3 5~25%、B2O3 1~20%、MgO 0~10%、CaO 0~17%、SrO 0~17%、BaO 0~20%、MgO+CaO+SrO+BaO 8~30%之無鹼玻璃為佳。 In the glass production method of the present invention, the glass produced is represented by mass percentage based on the oxide (the total of SiO 2 , Al 2 O 3 , B 2 O 3 , MgO, CaO, SrO, and BaO is 100%) To contain: SiO 2 50~70%, Al 2 O 3 5~25%, B 2 O 3 1~20%, MgO 0~10%, CaO 0~17%, SrO 0~17%, BaO 0~ 20%, MgO + CaO + SrO + BaO 8 ~ 30% of alkali-free glass is preferred.

根據本發明之玻璃製造裝置及玻璃製造方法,於玻璃製造時,可有效且安定地防止在與熔融玻璃接觸之鉑界面或鉑合金界面的氣泡產生。此結果,可製造氣泡殘留受抑制之良好品質的玻璃。 According to the glass manufacturing apparatus and the glass manufacturing method of the present invention, generation of bubbles at the platinum interface or the platinum alloy interface in contact with the molten glass can be effectively and stably prevented during the production of the glass. As a result, it is possible to produce a glass of good quality in which bubble residue is suppressed.

特別係,以本發明之玻璃製造裝置及玻璃製造方法所製造之無鹼玻璃,適用於平面面板顯示器用基板玻璃,特別係,液晶顯示器(LCD)、有機電致發光‧顯示器(OLED)、無機電致發光‧顯示器等之平面面板顯示器用之基板玻璃。 In particular, the alkali-free glass produced by the glass manufacturing apparatus and the glass manufacturing method of the present invention is suitable for substrate glass for flat panel display, in particular, liquid crystal display (LCD), organic electroluminescence, display (OLED), and Substrate glass for flat panel displays such as electroluminescence and display.

[實施發明之最佳形態] [Best Mode for Carrying Out the Invention]

以下,說明關於本發明之玻璃製造裝置。 Hereinafter, a glass manufacturing apparatus according to the present invention will be described.

圖1為玻璃製造裝置之一構成例的模式圖。圖1所示 之玻璃製造裝置1,具有熔解槽2、設置於該熔解槽2下游側之澄清槽3、設置於澄清槽3下游側之攪拌槽4、設置於攪拌槽4下游側之成形裝置5,熔解槽2、澄清槽3、攪拌槽4及成形裝置5分別經由使熔融玻璃流通用的導管(聯絡通路)6,7,8而連接。 Fig. 1 is a schematic view showing an example of the configuration of a glass manufacturing apparatus. Figure 1 shows The glass manufacturing apparatus 1 has a melting tank 2, a clarification tank 3 provided on the downstream side of the melting tank 2, a stirring tank 4 provided on the downstream side of the clarification tank 3, and a forming device 5 provided on the downstream side of the stirring tank 4, and a melting tank 2. The clarification tank 3, the agitation tank 4, and the forming apparatus 5 are connected via conduits (contact passages) 6, 7 and 8 which are common to the flow of the molten glass.

熔解槽2,設有燃燒器、電極等,可使玻璃原料熔解。於熔解槽2之下游側,形成有熔融玻璃之流出口,經由使該流出口為上游端的導管6連通熔解槽2與澄清槽3。 The melting tank 2 is provided with a burner, an electrode, etc., and the glass raw material can be melted. On the downstream side of the melting tank 2, an outlet of molten glass is formed, and the melting tank 2 and the clarification tank 3 are connected via a conduit 6 having the outlet end as an upstream end.

澄清槽3,為主要進行玻璃澄清之部位,熔融玻璃中所含之微細的泡藉由從澄清劑放出之澄清氣體而浮上,由熔融玻璃除去。於澄清槽3之下游側形成有熔融玻璃之流出口,經由以該流出口為上游端的導管7而連通澄清槽3與攪拌槽4。 The clarification tank 3 is a portion where the glass is mainly clarified, and the fine bubbles contained in the molten glass are floated by the clarified gas discharged from the clarifying agent, and are removed by the molten glass. An outlet of molten glass is formed on the downstream side of the clarification tank 3, and the clarification tank 3 and the stirring tank 4 are connected via the duct 7 which is the upstream end of this outlet.

攪拌槽4,為主要經由攪拌機等使熔融玻璃進行攪拌、均質化之部位。於攪拌槽4下游側形成有流出口,經由令流出口為上游端的導管8連通攪拌槽4與成形裝置5。 The agitation tank 4 is a portion where the molten glass is mainly stirred and homogenized via a stirrer or the like. An outflow port is formed on the downstream side of the agitation vessel 4, and the agitation vessel 4 and the forming device 5 are connected via a conduit 8 that makes the outlet port an upstream end.

成形裝置5為主要使玻璃成形為所期望之形狀的部位,因應欲製造玻璃製品之形狀而適宜選擇。例如玻璃製品為平面面板顯示器用之玻璃基板時,使用浮法成形裝置、下拉成形裝置等。 The molding device 5 is a portion that mainly shapes the glass into a desired shape, and is appropriately selected in accordance with the shape of the glass product to be produced. For example, when the glass product is a glass substrate for a flat panel display, a float forming apparatus, a pull-down forming apparatus, or the like is used.

圖1所示之玻璃製造裝置1中,與熔解槽2~導管8之熔融玻璃接觸部分因要求有耐高溫環境之耐熱性、及對熔融玻璃之耐腐蝕性,以使用鉑材料(亦即鉑或鉑合金)為佳。 In the glass manufacturing apparatus 1 shown in Fig. 1, the contact with the molten glass of the melting tank 2 to the conduit 8 is required to have a heat resistance to a high temperature environment and corrosion resistance to molten glass, and a platinum material (i.e., platinum) is used. Or platinum alloy) is preferred.

本發明之玻璃製造裝置,具有與熔融玻璃接觸之鉑製或鉑合金製之構件,在該構件的與熔融玻璃接觸之面的背面側,形成有含有相對於氧化鋁系陶瓷粒子之總量含以Fe2O3換算為0.2~5質量%之Fe,且在熔融玻璃溫度域具有Fe氧化還原(Fe2+/Fe2++Fe3+)上昇之變化點的氧化鋁系陶瓷粒子之層為其特徵。 The glass manufacturing apparatus of the present invention has a member made of platinum or a platinum alloy which is in contact with the molten glass, and is formed on the back side of the surface of the member which is in contact with the molten glass, and contains a total amount with respect to the alumina-based ceramic particles. a layer of alumina-based ceramic particles having a Fe 2 O 3 conversion of 0.2 to 5% by mass of Fe and having a point of change in Fe redox (Fe 2+ /Fe 2+ +Fe 3+ ) in the molten glass temperature range It is characterized by it.

在此,與熔融玻璃接觸之鉑製或鉑合金製之構件的具體例方面,可例舉如收納熔融玻璃之鉑製或鉑合金製的容器。但,不限於此,廣泛包含使用玻璃製造裝置時,與熔融玻璃接觸之鉑製或鉑合金製之構件。以下,在本說明書中,與熔融玻璃接觸之鉑製或鉑合金製之構件的具體例,雖例舉收納熔融玻璃之鉑製或鉑合金製的容器來說明,但關於收納熔融玻璃之容器以外的鉑製或鉑合金製之構件,將記載為收納熔融玻璃之容器的部分解釋為作為鉑製或鉑合金製之構件。 Here, as a specific example of the member made of platinum or a platinum alloy which is in contact with the molten glass, a container made of platinum or a platinum alloy containing the molten glass may be mentioned. However, the present invention is not limited thereto, and includes a member made of platinum or a platinum alloy which is in contact with the molten glass when the glass manufacturing apparatus is used. In the present specification, a specific example of a member made of platinum or a platinum alloy that is in contact with the molten glass is exemplified by a container made of platinum or a platinum alloy in which molten glass is housed, and the container containing the molten glass is used. The member made of a platinum or platinum alloy is described as a member made of a platinum or platinum alloy.

收納熔融玻璃之容器係廣泛指在玻璃製造步驟,暫時維持或收納熔融玻璃的容器,圖1所示之玻璃製造裝置1的一構成例,為熔解槽2、澄清槽3、攪拌槽4、及導管6,7,8。 The container for accommodating the molten glass is a container that temporarily holds or stores the molten glass in the glass manufacturing step. One configuration example of the glass manufacturing apparatus 1 shown in FIG. 1 is a melting tank 2, a clarification tank 3, a stirring tank 4, and Catheters 6, 7, 8.

而,本發明之玻璃製造裝置,上述收納熔融玻璃之容器中至少一個為鉑材料製,且該鉑材料製的容器之與熔融玻璃接觸之面的背面側、亦即圖1所示之玻璃製造裝置的一構成例,於鉑材料製的容器壁面外側形成有上述之氧化鋁系陶瓷粒子層。 Further, in the glass manufacturing apparatus of the present invention, at least one of the containers for accommodating the molten glass is made of a platinum material, and the back side of the surface of the container made of the platinum material in contact with the molten glass, that is, the glass shown in Fig. 1 is used. In one configuration example of the apparatus, the above-described alumina-based ceramic particle layer is formed on the outside of the container wall surface made of a platinum material.

以往著眼於氫的分子徑或離子徑,認為以不透過氫之材料經塗佈等形成緻密的被膜即可。然而,本發明者努力研究結果,發現並非不透過氫之材料所形成之緻密的被膜,而係氧化鋁系陶瓷粒子所含之Fe之價數變化(Fe3+→Fe2+)對氣泡殘留的抑制有效。 In the past, focusing on the molecular diameter or ion diameter of hydrogen, it is considered that a dense film is formed by coating or the like with a material that does not permeate hydrogen. However, the inventors of the present invention have diligently studied the results and found that the dense film formed by the material which does not permeate hydrogen, and the change in the valence of Fe (Fe 3+ →Fe 2+ ) contained in the alumina-based ceramic particles to the bubble residue The inhibition is effective.

Fe之價數變化雖為伴隨因熔融玻璃溫度上昇導致鉑材料之溫度上昇而產生者(假設鉑材料製的容器外側之溫度幾乎與熔融玻璃溫度相同),認為Fe產生價數變化後,之後,在鉑材料之溫度維持一定的期間,氣泡之殘留抑制效果幾乎維持一定者。 The change in the valence of Fe is caused by an increase in the temperature of the platinum material due to an increase in the temperature of the molten glass (assuming that the temperature outside the container made of platinum material is almost the same as the temperature of the molten glass), and it is considered that the valence of Fe is changed, and then While the temperature of the platinum material is maintained constant, the residual effect of suppressing the bubbles is almost constant.

本發明中,氧化鋁系陶瓷粒子層為了發揮氣泡之殘留抑制效果,氧化鋁系陶瓷粒子需含充分量的Fe。具體上,氧化鋁系陶瓷粒子需含相對於氧化鋁系陶瓷粒子之總量以Fe2O3換算為0.2~5質量%之Fe,以含0.5質量%以上為佳。但,Fe之量多,則不混入氧化鋁系陶瓷之結晶構造中,保持Fe2O3以赤鐵礦(Hematite)殘存,所以後述Fe氧化還原上昇之變化點降低。因此,Fe之含量以Fe2O3換算為5質量%以下為佳。 In the present invention, the alumina-based ceramic particle layer needs to contain a sufficient amount of Fe in order to exhibit the residual effect of suppressing the bubbles. Specifically, the alumina-based ceramic particles are preferably contained in an amount of 0.2 to 5% by mass in terms of Fe 2 O 3 based on the total amount of the alumina-based ceramic particles, and more preferably 0.5% by mass or more. However, when the amount of Fe is large, it does not mix into the crystal structure of the alumina-based ceramics, and the Fe 2 O 3 remains in hematite, so that the change point of the Fe redox increase described later is lowered. Therefore, the content of Fe is preferably 5% by mass or less in terms of Fe 2 O 3 .

另外,氧化鋁系陶瓷粒子所含之Fe,在使用玻璃製造裝置時,需要易產生從Fe3+至Fe2+之價數變化之狀態。因此,氧化鋁系陶瓷粒子所含之Fe需要在熔融玻璃溫度域具有Fe氧化還原(Fe2+/Fe2++Fe3+)上昇之變化點。以溫度為横軸、Fe氧化還原(Fe2+/Fe2++Fe3+)為縱軸作圖時,在特定溫度,Fe氧化還原(Fe2+/Fe2++Fe3+)急遽上升 。本說明書中,將此溫度稱為Fe氧化還原(Fe2+/Fe2++Fe3+)上昇之變化點。更具體上,將上述作圖之近似曲線的一次微分值伴隨溫度上昇而開始增加之點稱為變化點。 Further, when Fe is contained in the alumina-based ceramic particles, it is necessary to easily change the valence from Fe 3+ to Fe 2+ when a glass manufacturing apparatus is used. Therefore, Fe contained in the alumina-based ceramic particles needs to have a change point of Fe redox (Fe 2+ /Fe 2+ +Fe 3+ ) rise in the molten glass temperature range. Temperature as the horizontal axis, Fe redox (Fe 2+ / Fe 2+ + Fe 3+) is plotted against the vertical axis, at a specific temperature, Fe redox (Fe 2+ / Fe 2+ + Fe 3+) abruptly rise. In this specification, this temperature is referred to as a point of change in Fe redox (Fe 2+ /Fe 2+ +Fe 3+ ) rise. More specifically, the point at which the first differential value of the approximate curve of the above graph starts to increase with an increase in temperature is referred to as a change point.

又,氧化鋁系陶瓷粒子之Fe氧化還原(Fe2+/Fe2++Fe3+),可藉由氧化還原滴定法而求得。具體上,使氧化鋁系陶瓷粒子之試料以每小時300℃之速度升溫至特定溫度,在特定溫度維持1小時後,冷卻至室溫,於測定試料以氟酸溶解的溶解液中加入Fe2+指示劑,經分光測定測定Fe2+量。又,使測定試料進行氟酸溶解後,將溶解液中Fe3+進行還原為Fe2+之還原處理,以與前述之方法相同地測定Fe2+量而求出Fe3++Fe2+量。 Further, Fe redox (Fe 2+ /Fe 2+ + Fe 3+ ) of the alumina-based ceramic particles can be obtained by a redox titration method. Specifically, the sample of the alumina-based ceramic particles is heated to a specific temperature at a rate of 300 ° C per hour, and maintained at a specific temperature for 1 hour, and then cooled to room temperature, and Fe 2 is added to the solution in which the sample is dissolved in hydrofluoric acid. + indicator, the amount of Fe 2+ was determined by spectrometry. Further, after the measurement sample is dissolved in hydrofluoric acid, the Fe 3+ in the solution is reduced to Fe 2+ , and the amount of Fe 2+ is measured in the same manner as the above method to obtain Fe 3+ +Fe 2+ . the amount.

Fe氧化還原(Fe2+/Fe2++Fe3+)上昇之變化點在熔融玻璃溫度域時,則使用玻璃製造裝置時,更具體上,在收納熔融玻璃之容器的鉑材料製之壁面為與熔融玻璃接觸狀態,成為易產生氧化鋁系陶瓷粒子所含之Fe之價數變化(Fe3+→Fe2+)之狀態。 When the change in the Fe redox (Fe 2+ /Fe 2+ +Fe 3+ ) rise is in the molten glass temperature range, when a glass manufacturing apparatus is used, more specifically, the wall made of platinum material in the container for accommodating the molten glass In the state of being in contact with the molten glass, the valence change (Fe 3+ → Fe 2+ ) of Fe contained in the alumina-based ceramic particles is likely to occur.

熔融玻璃溫度域係指在從熔解至成形前之玻璃製造步驟中,熔融玻璃經歷的溫度域。圖1所示之玻璃製造裝置1中,係指由熔解槽2至導管8為止,熔融玻璃經歷的溫度域。熔融玻璃溫度域,因玻璃種類或玻璃製造裝置之構成要素而異,但為無鹼玻璃時,通常為1250~1650℃。較佳為構成後述玻璃製造裝置容器各自之熔融玻璃溫度域。 The molten glass temperature domain refers to the temperature domain experienced by the molten glass in the glass manufacturing step from melting to forming. The glass manufacturing apparatus 1 shown in Fig. 1 refers to a temperature range experienced by the molten glass from the melting tank 2 to the duct 8. The molten glass temperature range varies depending on the type of glass or the components of the glass manufacturing apparatus, but in the case of alkali-free glass, it is usually 1250 to 1650 °C. It is preferable to form the molten glass temperature range of each of the glass manufacturing apparatus containers mentioned later.

本發明所使用之氧化鋁系陶瓷粒子,因在熔融玻璃溫 度域具有Fe氧化還原上昇的變化點,熔融玻璃溫度域為1250~1650℃時,以含莫來石10質量%以上為佳。莫來石含有量以20質量%以上更佳,30質量%以上又更佳,40質量%以上特佳。 The alumina-based ceramic particles used in the present invention are heated in molten glass The degree range has a change point of Fe redox increase, and when the molten glass temperature range is 1250 to 1650 ° C, it is preferable to contain 10% by mass or more of mullite. The mullite content is more preferably 20% by mass or more, more preferably 30% by mass or more, and particularly preferably 40% by mass or more.

氧化鋁系陶瓷粒子可為僅含莫來石作為結晶相者,但莫來石含有量滿足上述範圍時,亦可含其他結晶相,具體上,可含斜鋯石、鋼玉。又,作為其他成分,可含鋯石、矽線石等。 The alumina-based ceramic particles may be a crystal phase containing only mullite. However, when the mullite content satisfies the above range, the crystal phase may contain other crystal phases, and specifically, it may contain oblique zircon and steel jade. Further, as other components, zircon, sillimanite or the like may be contained.

氧化鋁系陶瓷粒子中的玻璃相之含量以50質量%以下為佳,30質量%以下更佳,20質量%以下又更佳,10質量%以下特別佳。玻璃相之含量超過50質量%,則莫來石相表面以玻璃相覆蓋,有無法發揮Fe之價數變化引起的氣泡之殘留抑制效果的傾向。 The content of the glass phase in the alumina-based ceramic particles is preferably 50% by mass or less, more preferably 30% by mass or less, still more preferably 20% by mass or less, and particularly preferably 10% by mass or less. When the content of the glass phase exceeds 50% by mass, the surface of the mullite phase is covered with a glass phase, and there is a tendency that the residual effect of suppressing the bubbles due to the change in the valence of Fe is not exhibited.

本發明之玻璃製造裝置中,相對鉑材料製的容器的與熔融玻璃接觸之面的背面側,亦即於容器的壁面(例如為坩鍋狀容器時,為側面及底面)外側形成氧化鋁系陶瓷粒子層時,在容器的壁面外側以所期望之厚度充填氧化鋁系陶瓷粒子。厚度考量發揮氣泡之殘留抑制效果,以1mm以上為佳,2mm以上更佳。又,過厚,則變得需要必要以上的陶瓷粒子,故以40mm以下為佳。具體上,在容器的壁面外側,與容器維持特定間隔設置耐火性塊,在容器與該耐火性塊的間隙填充氧化鋁系陶瓷粒子。耐火性塊為耐火性,可保有氧化鋁系陶瓷粒子者即可,無特別限制,例如燒成耐火物,具體上,如氧化鋁鋯石質、鋯石質、矽線 石質、燒粉質、氧化鋁質、氧化鎂質之煉瓦等。但,由耐火性塊的製造容易性(成形性、加工性等)及成本點考慮以氧化鋁質煉瓦為佳。 In the glass manufacturing apparatus of the present invention, the alumina side is formed on the back side of the surface of the container made of platinum material in contact with the molten glass, that is, on the outer side of the wall surface of the container (for example, the side surface and the bottom surface in the case of a crucible container). In the case of the ceramic particle layer, alumina-based ceramic particles are filled to a desired thickness on the outer side of the wall surface of the container. The thickness measurement exerts a residual suppression effect of the bubbles, preferably 1 mm or more, more preferably 2 mm or more. Further, if it is too thick, it is necessary to use ceramic particles more than necessary, and therefore it is preferably 40 mm or less. Specifically, a fire-resistant block is provided on the outer side of the wall surface of the container at a predetermined interval from the container, and alumina ceramic particles are filled in the gap between the container and the fire-resistant block. The fire-resistant block is fire-resistant and can retain alumina-based ceramic particles, and is not particularly limited, and is, for example, a fired refractory, specifically, such as alumina zircon, zircon, and tantalum. Stone, burned powder, alumina, magnesia, etc. However, alumina smelting is preferred from the viewpoints of ease of production (formability, processability, etc.) and cost of the refractory block.

又,本發明使用粒子之氧化鋁系陶瓷,係因於鉑材料製的容器的壁面外側充填方便。而,可粉碎為粒徑2mm以下左右者即可,並未指可調整為特定粒度分佈者。 Further, in the present invention, alumina-based ceramics using particles are easily filled on the outer side of the wall surface of a container made of a platinum material. Further, it can be pulverized to a particle diameter of about 2 mm or less, and does not mean that it can be adjusted to a specific particle size distribution.

本發明中粒徑係指可通過該大小開孔之篩的粒子之大小。例如為粒徑2mm以下粒子時,係指通過2mm開孔之篩之粒子。而,陶瓷粒子之形狀可為球形、方形、不定形等。考量具有與容器周圍充分接觸點以填充陶瓷粒子,以粒徑2mm以下為佳。又,考量防止填充時之飛濺,以粒徑10μm以上為佳。 The particle size in the present invention means the size of particles which can be sieved through the size. For example, when the particle diameter is 2 mm or less, it means a particle which passes through a sieve having a diameter of 2 mm. However, the shape of the ceramic particles may be spherical, square, amorphous, or the like. It is preferable to have a sufficient contact point with the periphery of the container to fill the ceramic particles, and it is preferable that the particle diameter is 2 mm or less. Further, it is preferable to prevent the splash at the time of filling, and it is preferable that the particle diameter is 10 μm or more.

本發明中,於鉑材料製的容器的壁面外側填充之氧化鋁系陶瓷粒子,可因應容器所收納的熔融玻璃溫度而適宜選擇。玻璃製造裝置之熔融玻璃溫度,因各個鉑材料製的容器,亦即各個鉑材料製的玻璃製造裝置之構成要素(收納熔融玻璃之容器)而異。例如為無鹼玻璃時,圖1所示之玻璃製造裝置1中,熔解槽2中熔融玻璃溫度為1400~1650℃左右,澄清槽3中熔融玻璃溫度為1300~1550℃左右,攪拌槽4中熔融玻璃溫度為1250~1400℃左右,導管6中熔融玻璃溫度為1400~1600℃左右,導管7中熔融玻璃溫度為1300~1500℃左右,導管8中熔融玻璃溫度為1250~1350℃左右。 In the present invention, the alumina-based ceramic particles filled on the outer side of the wall surface of the container made of a platinum material can be appropriately selected depending on the temperature of the molten glass accommodated in the container. The molten glass temperature of the glass manufacturing apparatus differs depending on the container made of each platinum material, that is, the constituent elements of the glass manufacturing apparatus made of each platinum material (the container in which the molten glass is accommodated). For example, in the case of the alkali-free glass, in the glass manufacturing apparatus 1 shown in FIG. 1, the molten glass temperature in the melting tank 2 is about 1400 to 1650 ° C, and the molten glass temperature in the clarification tank 3 is about 1300 to 1550 ° C, and the stirring tank 4 is used. The temperature of the molten glass is about 1250~1400 °C, the temperature of the molten glass in the duct 6 is about 1400~1600 °C, the temperature of the molten glass in the duct 7 is about 1300~1500 °C, and the temperature of the molten glass in the duct 8 is about 1250~1350 °C.

而,本發明,於構成玻璃製造裝置之鉑材料製的容器 的壁面外側,填充於該容器所收納的熔融玻璃溫度域具有Fe氧化還原(Fe2+/Fe2++Fe3+)上昇之變化點的氧化鋁系陶瓷粒子。 Further, according to the present invention, the outer surface of the wall of the container made of the platinum material constituting the glass manufacturing apparatus is filled with the Fe redox (Fe 2+ /Fe 2+ +Fe 3+ ) in the temperature range of the molten glass accommodated in the container. Alumina ceramic particles with changing points.

本發明之玻璃之製造方法,除使用上述說明的本發明之玻璃製造裝置以外與以往相同。而,於圖1所示之玻璃製造裝置的熔解槽2投入調和成為所期望之玻璃組成的原料,使進行加熱熔解所得之熔融玻璃依序通過導管6、澄清槽3、導管7、攪拌槽4、導管8及成形裝置5,得到所期望之形狀的玻璃製品。 The method for producing the glass of the present invention is the same as the conventional method except that the glass manufacturing apparatus of the present invention described above is used. Further, the melting tank 2 of the glass manufacturing apparatus shown in Fig. 1 is put into a raw material which is adjusted to have a desired glass composition, and the molten glass obtained by heating and melting is sequentially passed through the conduit 6, the clarification tank 3, the conduit 7, and the stirring tank 4. The conduit 8 and the forming device 5 obtain a glass product of a desired shape.

本發明,可製作各種玻璃。在本發明製造合適的玻璃方面,無鹼玻璃的一例如下示。以下所示之無鹼玻璃適用作為液晶顯示器(LCD)用之基板玻璃。 According to the present invention, various glasses can be produced. An example of the alkali-free glass in the production of a suitable glass of the present invention is shown below. The alkali-free glass shown below is suitable as a substrate glass for a liquid crystal display (LCD).

此無鹼玻璃為以氧化物為基準,以質量百分率表示,含有:SiO2 50~70%、Al2O3 5~25%、B2O3 1~20%、MgO 0~10%、CaO 0~17%、SrO 0~17%、BaO 0~20%、MgO+CaO+SrO+BaO 8~30%。 The alkali-free glass is represented by mass percentage based on oxides, and contains: SiO 2 50 to 70%, Al 2 O 3 5 to 25%, B 2 O 3 1 to 20%, MgO 0 to 10%, and CaO. 0~17%, SrO 0~17%, BaO 0~20%, MgO+CaO+SrO+BaO 8~30%.

又,上述之質量百分率表示係以SiO2、Al2O3、B2O3、MgO、CaO、SrO及BaO之合計為100%者。 Further, the above mass percentage is represented by a total of SiO 2 , Al 2 O 3 , B 2 O 3 , MgO, CaO, SrO and BaO of 100%.

SiO2為必須成分,超過70%則玻璃之熔解性降低,或變得易失透。較佳為64%以下。未達50%,則產生比重增加、應變點(Strain Point)降低,熱膨脹係數增加、耐藥品性之降低。較佳為55%以上。 SiO 2 is an essential component, and when it exceeds 70%, the meltability of glass is lowered, or it becomes easy to devitrify. It is preferably 64% or less. If it is less than 50%, the specific gravity increases, the strain point decreases, the coefficient of thermal expansion increases, and the chemical resistance decreases. It is preferably 55% or more.

Al2O3為抑制玻璃之分相,或提高應變點(Strain Point)之成分,為必須的。超過25%,則變得易失透,引起耐藥品性降低。較佳為22%以下。未達5%,則玻璃變得易分相,或應變點(Strain Point)降低。較佳為10%以上。 Al 2 O 3 is necessary to suppress the phase separation of the glass or to increase the composition of the strain point (Strain Point). When it exceeds 25%, it becomes easy to devitrify, causing a decrease in chemical resistance. It is preferably 22% or less. Below 5%, the glass becomes easy to phase, or the strain point (Strain Point) decreases. It is preferably 10% or more.

B2O3為使比重變小,提高玻璃之熔解性,使難以失透的成分,係為必要。超過20%,則應變點(Strain Point)降低、耐藥品性降低、或玻璃熔解時之揮散變明顯,玻璃之不均質性增加。較佳為12%以下。未達1%,則比重增加,且玻璃之熔解性降低,且變得易失透。較佳為6%以上。 B 2 O 3 is a component which makes the specific gravity small, improves the meltability of the glass, and makes it difficult to devitrify. When it exceeds 20%, the strain point (Strain Point) is lowered, the chemical resistance is lowered, or the volatilization is remarkable when the glass is melted, and the glass heterogeneity is increased. It is preferably 12% or less. When it is less than 1%, the specific gravity increases, and the meltability of the glass is lowered, and it becomes easy to devitrify. It is preferably 6% or more.

MgO為使比重小、提升玻璃之熔解性的成分。超過10%,則玻璃變得易分相,變得易失透、或耐藥品性降低。較佳為7%以下。MgO以含1%以上為佳。 MgO is a component which has a small specific gravity and improves the meltability of the glass. When it exceeds 10%, the glass becomes easy to separate, and it becomes easy to devitrify or the chemical resistance is lowered. It is preferably 7% or less. MgO is preferably contained in an amount of 1% or more.

CaO為提高玻璃之熔解性、使不易失透可含有至17%。超過17%,則比重增加,且熱膨脹係數變大,又,反而變得易失透。較佳為14%以下。CaO以含2%以上為佳。 CaO is used to increase the meltability of the glass, and it is difficult to devitrify to 17%. When it exceeds 17%, the specific gravity increases, and the coefficient of thermal expansion becomes large, and on the contrary, it becomes easy to devitrify. It is preferably 14% or less. CaO is preferably 2% or more.

SrO為了抑制玻璃分相、使不易失透,可含至17%為止。超過17%,則比重增加,且熱膨脹係數變大,又,反而變得易失透。較佳為14%以下。SrO以含3%以上為佳。 In order to suppress the phase separation of the glass, SrO can be contained up to 17%. When it exceeds 17%, the specific gravity increases, and the coefficient of thermal expansion becomes large, and on the contrary, it becomes easy to devitrify. It is preferably 14% or less. SrO is preferably 3% or more.

BaO為了抑制玻璃分相、使不易失透,可含有至20%為止。超過20%,則比重增加,且熱膨脹係數變大。較佳為1%以下,實質上不含有更佳。 BaO may be contained up to 20% in order to suppress phase separation of the glass and to prevent devitrification. When it exceeds 20%, the specific gravity increases and the coefficient of thermal expansion becomes large. It is preferably 1% or less, and is substantially not contained.

鹼土類金屬氧化物(RO)之含量之總量,亦即(MgO+CaO+SrO+BaO)過少,則使玻璃之熔解變困難,故在8%以上。相反地因過多,則玻璃之密度變大,故在30%以下。較佳為10~30%。 When the total amount of the alkaline earth metal oxide (RO), that is, (MgO + CaO + SrO + BaO) is too small, the melting of the glass is difficult, so it is 8% or more. On the other hand, if the amount is too large, the density of the glass becomes large, so it is 30% or less. It is preferably 10 to 30%.

而,無鹼玻璃以氧化物為基準,以質量百分率表示,以含有:SiO2 55~64%、Al2O3 10~22%、B2O3 6~12%、MgO 1~7%、CaO 2~14%、SrO 3~14%、BaO 0~1%、MgO+CaO+SrO+BaO 10~30%更佳。 On the other hand, the alkali-free glass is expressed by mass percentage based on oxides, and contains: SiO 2 55 to 64%, Al 2 O 3 10 to 22%, B 2 O 3 6 to 12%, and MgO 1 to 7%. CaO 2~14%, SrO 3~14%, BaO 0~1%, and MgO+CaO+SrO+BaO 10~30% are more preferable.

又,上述之質量百分率表示,為SiO2、Al2O3、B2O3、MgO、CaO、SrO及BaO之合計為100%者。 Further, the above-mentioned mass percentage means that the total of SiO 2 , Al 2 O 3 , B 2 O 3 , MgO, CaO, SrO and BaO is 100%.

另外,為更抑制熔融玻璃中的氣泡,可添加相對於玻璃原料100質量%,總量為5質量%以下的作為澄清劑之F、Cl、SO3、SnO2、Fe2O3等。 In addition, in order to further suppress the bubbles in the molten glass, F, Cl, SO 3 , SnO 2 , Fe 2 O 3 or the like as a clarifying agent with respect to 100% by mass of the glass raw material and a total amount of 5% by mass or less may be added.

[實施例] [Examples]

以下,使用實施例進一步說明本發明,但本發明不限於此等。 Hereinafter, the present invention will be further described by way of examples, but the invention is not limited thereto.

在本實施例,使用圖2(a)所示之鉑合金製(鉑銠合金、銠10質量%)之坩鍋(JIS H6201(1986.11.1)為依據)、與圖2(b)所示之氧化鋯煉瓦製的基台(耐火性塊)評估在鉑合金界面氣泡之產生狀況。圖2(a)所示之坩鍋、及圖2(b)所示之基台之尺寸分別如以下。 In the present embodiment, a crucible made of a platinum alloy (platinum-rhenium alloy, ruthenium 10% by mass) shown in Fig. 2(a) (based on JIS H6201 (1986.11.1)) and shown in Fig. 2(b) are used. The zirconia-made base (fire-resistant block) evaluates the generation of bubbles at the platinum alloy interface. The dimensions of the crucible shown in Fig. 2(a) and the base shown in Fig. 2(b) are as follows.

坩鍋 Shabu-shabu

高度:27mm Height: 27mm

上部徑:25mm Upper diameter: 25mm

底部徑:15mm Bottom diameter: 15mm

容量:10cc Capacity: 10cc

質量:8.0g Quality: 8.0g

基台 Abutment

外部尺寸:48mm×48mm×48mm External dimensions: 48mm × 48mm × 48mm

凹部深度:26mm Concave depth: 26mm

凹部徑:35mm Concave diameter: 35mm

又,實施例所使用之氧化鋁系陶瓷粒子如表1。粒子徑為10μm~2mm。表1中,氧化鋁系陶瓷粒子中之結晶相與玻璃相之比例(質量%基準)係藉由粉末X線繞射(XRD)法測定各結晶相之比例而求出。具體上,由各結晶相之純物質(斜鋯石、鋯石、莫來石、鋼玉等)與試料之XRD強度比求出結晶相之比例,由試料與各結晶相之比例 的合計之差求出玻璃相之比例。又,氧化鋁系陶瓷粒子之組成比(質量%基準)係由螢光X線分析求出。又,組成比之Σ ROx為Al2O3、SiO2、ZrO2、Fe2O3以外的氧化雜質之合計,R為金屬元素、O為氧、x為化學計量比。 Further, the alumina-based ceramic particles used in the examples are shown in Table 1. The particle diameter is 10 μm to 2 mm. In Table 1, the ratio of the crystal phase to the glass phase (% by mass) in the alumina-based ceramic particles was determined by measuring the ratio of each crystal phase by a powder X-ray diffraction (XRD) method. Specifically, the ratio of the crystal phase is determined from the ratio of the XRD intensity of the pure substance (oblique zircon, zircon, mullite, steel jade, etc.) of each crystal phase to the sample, and the difference between the ratio of the sample and each crystal phase Find the ratio of the glass phase. Moreover, the composition ratio (mass % basis) of the alumina-based ceramic particles was determined by fluorescent X-ray analysis. Further, the composition ratio RO x is a total of oxidized impurities other than Al 2 O 3 , SiO 2 , ZrO 2 , and Fe 2 O 3 , and R is a metal element, O is oxygen, and x is a stoichiometric ratio.

關於例1、例3及例5之氧化鋁系陶瓷粒子,將Fe氧化還原與溫度之關係作圖的圖表如圖3。 The graphs showing the relationship between the oxidation of Fe and the temperature of the alumina-based ceramic particles of Examples 1, 3 and 5 are shown in Fig. 3 .

將圖2(a)之坩鍋設置於圖2(b)基台之凹部,使如圖2(c)般於間隙(基台凹部與坩鍋底面之間隙為3~5mm)填充如表1所示之氧化鋁系陶瓷粒子者設置於加熱爐內,加熱至1400℃為止。接著以維持1400℃之狀態於 圖2之坩鍋內投入無鹼玻璃,使熔解。無鹼玻璃之組成以氧化物為基準,以質量百分率表示,為SiO2 59.4%、Al2O3 17.6%、B2O37.9%、MgO 3.3%、CaO 3.8%、SrO 8.0%、MgO+CaO+SrO 15.1%。 The crucible of Fig. 2(a) is placed in the concave portion of the base of Fig. 2(b), and the gap (the gap between the abutment recess and the bottom surface of the crucible is 3~5 mm) is filled as shown in Fig. 2(c) as shown in Table 1. The alumina-based ceramic particles shown are placed in a heating furnace and heated up to 1400 °C. Next, the alkali-free glass was placed in the crucible of Fig. 2 while maintaining the temperature at 1400 ° C to melt. The composition of the alkali-free glass is represented by mass percentage, and is SiO 2 59.4%, Al 2 O 3 17.6%, B 2 O 3 7.9%, MgO 3.3%, CaO 3.8%, SrO 8.0%, MgO+. CaO+SrO 15.1%.

無鹼玻璃熔解後,再於1400℃維持1小時,觀察在鉑合金界面,亦即坩鍋壁面的氣泡之產生。結果如表1。表1中,例1~例4為實施例、例5~例7為比較例。表1中,氣泡佔有率為圖2(a)之坩鍋底面中,氣泡佔有面積之比例,0%為測定界限以下。 After the alkali-free glass was melted, it was further maintained at 1400 ° C for 1 hour, and the generation of bubbles at the platinum alloy interface, that is, the wall surface of the crucible was observed. The results are shown in Table 1. In Table 1, Examples 1 to 4 are Examples, and Examples 5 to 7 are Comparative Examples. In Table 1, the bubble occupancy ratio is the ratio of the area occupied by the bubble in the bottom surface of the crucible of Fig. 2(a), and 0% is below the measurement limit.

由表1之結果可知,例1~例4之氧化鋁系陶瓷粒子可有效果且安定的抑制氣泡之殘留。另外,認為例5、例6之氧化鋁系陶瓷粒子因氧化還原變化點為950℃,在實施例之熔融玻璃溫度(1400℃),為無法發揮Fe之價數變化(Fe3+→Fe2+)導致的氣泡之殘留抑制效果者。又,認為例7之氧化鋁系陶瓷粒子雖然氧化還原變化點為1350℃,因Fe2O3含有量未達0.2質量%,為無法充分發揮Fe之價數變化(Fe3+→Fe2+)導致的氣泡之殘留抑制效果者。 As is clear from the results of Table 1, the alumina-based ceramic particles of Examples 1 to 4 were effective and stable in suppressing the remaining of the bubbles. Further, it is considered that the alumina-based ceramic particles of Examples 5 and 6 have a redox change point of 950 ° C, and in the molten glass temperature (1400 ° C) of the example, the valence change of Fe is not exhibited (Fe 3+ →Fe 2 + ) The residual suppression effect of the resulting bubbles. In addition, it is considered that the alumina-based ceramic particles of Example 7 have a redox change point of 1,350 ° C, and the Fe 2 O 3 content is less than 0.2% by mass, so that the valence of Fe cannot be sufficiently exhibited (Fe 3+ →Fe 2+ ) The resulting residual suppression effect of the bubbles.

[產業上之利用性] [Industrial use]

本發明之玻璃製造裝置及玻璃製造方法所製造的無鹼玻璃適用作為平面面板顯示器用之基板玻璃、特別係,液晶顯示器(LCD)、有機電致發光‧顯示器(OLED)、無機電致發光‧顯示器等之平面面板顯示器用之基板玻璃 The alkali-free glass produced by the glass manufacturing apparatus and the glass manufacturing method of the present invention is suitable as a substrate glass for a flat panel display, in particular, a liquid crystal display (LCD), an organic electroluminescence, an OLED, and an inorganic electroluminescence. Substrate glass for flat panel display such as display

1‧‧‧玻璃製造裝置 1‧‧‧Glass manufacturing equipment

2‧‧‧熔解槽 2‧‧‧melting tank

3‧‧‧澄清槽 3‧‧‧Clarification tank

4‧‧‧攪拌槽 4‧‧‧Stirring tank

5‧‧‧成形裝置 5‧‧‧Forming device

6,7,8‧‧‧導管 6,7,8‧‧‧ catheter

[圖1]圖1係表示玻璃製造裝置之一構成例的模式圖。 Fig. 1 is a schematic view showing a configuration example of a glass manufacturing apparatus.

[圖2]圖2(a)為表示實施例所用之鉑合金製坩鍋之圖,圖2(b)為表示實施例所用之氧化鋯煉瓦製之基台的圖,圖2(c)表示將圖2(a)坩鍋設置於圖2(b)基台之凹部的狀態之圖。 Fig. 2 (a) is a view showing a crucible made of a platinum alloy used in the embodiment, Fig. 2 (b) is a view showing a base of a zirconia smelting system used in the embodiment, and Fig. 2 (c) is a view Fig. 2(a) is a view showing a state in which the crucible is placed in the concave portion of the base of Fig. 2(b).

[圖3]圖3係關於例1、例3及例5之氧化鋁系陶瓷粒子,將Fe氧化還原與溫度之關係作圖之圖表。 Fig. 3 is a graph showing the relationship between redox oxidation and temperature for alumina-based ceramic particles of Examples 1, 3 and 5.

Claims (4)

一種玻璃製造裝置,其係具有與熔融玻璃接觸之鉑製或鉑合金製之構件,其特徵係在該構件的與熔融玻璃接觸之面的背面側,形成有含有相對於氧化鋁系陶瓷粒子之總量含以Fe2O3換算為0.2~5質量%之Fe,且在熔融玻璃溫度域具有Fe氧化還原(Fe2+/Fe2++Fe3+)上昇之變化點的氧化鋁系陶瓷粒子之層,而前述氧化鋁系陶瓷粒子含有10質量%以上之莫來石,前述熔融玻璃溫度域為1250℃~1650℃。 A glass manufacturing apparatus comprising a member made of platinum or a platinum alloy in contact with molten glass, characterized in that a back surface side of a surface of the member in contact with the molten glass is formed to be contained with respect to the alumina-based ceramic particles. Alumina ceramics containing Fe in an amount of 0.2 to 5% by mass in terms of Fe 2 O 3 and having a change point of Fe redox (Fe 2+ /Fe 2+ +Fe 3+ ) in the molten glass temperature range In the layer of the particles, the alumina-based ceramic particles contain 10% by mass or more of mullite, and the molten glass temperature range is 1,250 ° C to 1,650 ° C. 如申請專利範圍第1項之玻璃製造裝置,其中該鉑製或鉑合金製之構件係收容熔融玻璃之容器。 The glass manufacturing apparatus of claim 1, wherein the member made of platinum or platinum alloy is a container for containing molten glass. 一種玻璃製造方法,其特徵係使用申請專利範圍第1或2項之玻璃製造裝置。 A glass manufacturing method characterized by using the glass manufacturing apparatus of claim 1 or 2. 如申請專利範圍第3項之玻璃製造方法,其中所製造之玻璃以氧化物為基準、以質量百分率表示(SiO2、Al2O3、B2O3、MgO、CaO、SrO及BaO之合計為100%)係為含有:SiO2 50~70%、Al2O3 5~25%、B2O3 1~20%、MgO 0~10%、CaO 0~17%、 SrO 0~17%、BaO 0~20%、MgO+CaO+SrO+BaO 8~30%之無鹼玻璃。 The glass manufacturing method of claim 3, wherein the glass produced is expressed by mass percentage based on oxides (the total of SiO 2 , Al 2 O 3 , B 2 O 3 , MgO, CaO, SrO, and BaO). 100%) contains: SiO 2 50~70%, Al 2 O 3 5~25%, B 2 O 3 1~20%, MgO 0~10%, CaO 0~17%, SrO 0~17% , BaO 0~20%, MgO+CaO+SrO+BaO 8~30% alkali-free glass.
TW97139557A 2007-04-24 2008-10-15 Glass manufacturing apparatus and manufacturing method thereof TWI389862B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007114086A JP4720777B2 (en) 2007-04-24 2007-04-24 Glass manufacturing apparatus and manufacturing method

Publications (2)

Publication Number Publication Date
TW201014811A TW201014811A (en) 2010-04-16
TWI389862B true TWI389862B (en) 2013-03-21

Family

ID=40046116

Family Applications (1)

Application Number Title Priority Date Filing Date
TW97139557A TWI389862B (en) 2007-04-24 2008-10-15 Glass manufacturing apparatus and manufacturing method thereof

Country Status (2)

Country Link
JP (1) JP4720777B2 (en)
TW (1) TWI389862B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5458571B2 (en) * 2008-12-26 2014-04-02 日本電気硝子株式会社 Dry coating of platinum material container and method for forming the same
KR20120046708A (en) * 2009-08-26 2012-05-10 니폰 덴키 가라스 가부시키가이샤 Container for glass production, apparatus for producing glass comprising same, and method for producing glass using the apparatus
US8375748B2 (en) 2009-08-26 2013-02-19 Nippon Electric Glass Co., Ltd. Glass manufacturing container, glass manufacturing apparatus with the same and glass manufacturing method using glass manufacturing apparatus
TWI487675B (en) * 2009-11-25 2015-06-11 Corning Inc Fusion processes for producing sheet glass
TWI494283B (en) * 2010-02-25 2015-08-01 Corning Inc Apparatus for making a glass article and methods
JP2012184147A (en) * 2011-03-08 2012-09-27 Nippon Electric Glass Co Ltd Vessel for glass manufacture
JP5880043B2 (en) * 2011-12-28 2016-03-08 旭硝子株式会社 Sealing structure

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5122712A (en) * 1974-08-19 1976-02-23 Hoya Glass Works Ltd RINSANKEIGARASUNOSEIZOHO
JPS62212228A (en) * 1986-03-13 1987-09-18 Tanaka Kikinzoku Kogyo Kk Platinum container for high temperature
JPH01201033A (en) * 1988-02-04 1989-08-14 Canon Inc Melting device and melting vessel using same
WO2002044115A2 (en) * 2000-11-30 2002-06-06 Schott Glas Coated metal element used for producing glass
US20080090087A1 (en) * 2004-09-13 2008-04-17 Toru Shoji Coating Material For Platinum Material, Platinum Material Coated With Such Coating Material, And Glass Manufacturing Apparatus
JP2007077004A (en) * 2005-08-19 2007-03-29 Nippon Electric Glass Co Ltd Heat resistant material for glass melting, glass article producing apparatus and process for producing glass article

Also Published As

Publication number Publication date
TW201014811A (en) 2010-04-16
JP4720777B2 (en) 2011-07-13
JP2008266092A (en) 2008-11-06

Similar Documents

Publication Publication Date Title
TWI389862B (en) Glass manufacturing apparatus and manufacturing method thereof
KR102169675B1 (en) High volume production of display quality glass sheets having low zirconia levels
TWI406836B (en) Manufacture of alkali - free glass
KR101819747B1 (en) Alumina isopipes for use with tin-containing glasses
CN104136383A (en) Production method for non-alkali glass
JP6983377B2 (en) Glass
TWI392660B (en) High strain-point glass composition for substrate
JP5763538B2 (en) Method and apparatus for manufacturing glass plates
KR20180102543A (en) Glass
JP5234387B2 (en) Alkali-free glass, alkali-free glass substrate and method for producing the same
TWI400216B (en) High zirconia cast refractory
JP6563230B2 (en) Glass substrate manufacturing method and glass substrate manufacturing apparatus
JP4613635B2 (en) Glass and manufacturing method thereof
KR101798288B1 (en) Method and apparatus for making glass substrate
JP2008201617A (en) Method for production of glass
TWI655162B (en) Method of making glass sheets with gas pretreatment of refractory
KR101292854B1 (en) Apparatus and process for glassmaking
CN103476715A (en) Method for vacuum-degassing of molten glass, device for vacuum-degassing of molten glass, method for producing molten glass, device for producing molten glass, method for producing article made of glass, and device for producing article made of glass
JP2008019110A (en) Material for glass flow passage, apparatus for manufacturing glass and method for manufacturing glass articles
JP5347424B2 (en) Glass manufacturing apparatus and manufacturing method
JP2023538672A (en) Minimizing the formation of crystalline rhodium-platinum defects in glasses produced within noble metal systems
JP2011116596A (en) Fired film for glass production vessel, glass production vessel, glass production device, method for producing glass and method for producing glass production device
TW201542481A (en) Method for manufacturing silicate glass, silicate glass and silica material for silicate glass
CN102515476B (en) For producing the pressure pipes such as the aluminium oxide of stanniferous glass

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees