201009946 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種用以加熱處理被加熱物之熱處理裝 置。 . 【先前技術】 自先前以來，下述專利文獻1所揭示之熱處理裝置係用 於製作液晶顯示器（LCD，Liquid Crystal Display)、電漿顯 示器（PDP，Plasma Display)、有機 EL(Electroluminescence， • 電致發光）顯示器等之平板顯示器（FPD，Flat Panel Display) 之製作。熱處理裝置係將預先對玻璃板等之基板（被加熱 物）塗佈特定之溶液並加以加熱乾燥而成者收容於加熱室 内，繼而使其曝露於導入至加熱室内之特定溫度之熱風中 而進行熱處理（煅燒）者。 [專利文獻1]日本專利第2971771號說明書 【發明内容】 [發明所欲解決之問題] Φ 先前技術之熱處理裝置存在用以取出或放入被加熱物之 開口或缝隙等，不會呈完全密閉狀態，且於上述開口或縫 _ 隙之附近容易變為相對較低溫度。因此，伴隨著熱處理、 塗佈於基板上之特定溶液等經氣化而產生之生成氣體將於 m 開口或缝隙之附近冷卻而固化，變為所謂昇華物。昇華物 呈粒子狀或焦油狀，故而存在不僅污染熱處理裝置内部而 使被加熱物之品質下降，而且於被加熱物之取出或放入時 會漏出至熱處理裝置之外部之問題。 139516.doc 201009946 通常，熱處理裝置係設置於潔淨度相對較高之無塵室等 之中。因此，如先前技術之熱處理裝置般昇華物自熱處理 裝置漏出時，存在甚至導致無塵室之潔淨度亦降低之問 題。 鑒於上述問題，於上述專利文獻1中所揭示之熱處理裝 置中，為了防止熱處理裝置内之空氣或生成氣體漏出至外 部’而設為自熱處理裝置之内側向外側排氣，以降低熱處 理裝置内之靜Μ之構成。當設為該構成時，對於昇華物會 自熱處理裝置排出至外部之問題具有一定效果。然而，於 先前技術之熱處理裝置中，熱處理裝置内之靜壓因場所而 不同，因此當設於靜壓未充分降低之位置之開口打開以將 被加熱物取出或放入時，存在可能包含有生成氣體或昇華 物之空氣會自該開口洩漏之問題。 又，當假設存在如上所述靜壓未充分降低之場所，對篇 了抽吸而排出熱處理裝置内之空氣等而設置之排氣機構言《 定較高之排氣能力時，雖可防止由於為了進行被加熱物之 取出或放人而打開開口而導致生成氣體等發线漏，但售 產生熱處理室内之靜㈣度變低之部分的問題。因此，當 設為該構成時’若設於靜壓過度低之部分之開口打開，： 存在外部氣體將藉由該開口而流人至 處理裝置内之溫度分布變得不均勻之問題。 ¥致，、、、 ^ *本發明之目的在於提供一種熱處理裝置，其係不 易，隨著出人α之打開或關閉’而伴隨著熱處理產生之生 成乳體或昇華物等茂漏，或者產生熱處理室内之溫度分布 139516.doc 201009946 不均。 [解決問題之技術手段]201009946 VI. Description of the Invention: [Technical Field] The present invention relates to a heat treatment apparatus for heat-treating an object to be heated. [Prior Art] Since the prior art, the heat treatment apparatus disclosed in Patent Document 1 is used for producing a liquid crystal display (LCD), a plasma display (PDP, Plasma Display), and an organic EL (Electroluminescence). Manufacture of a flat panel display (FPD) such as a display. In the heat treatment apparatus, a specific solution is applied to a substrate (heated material) such as a glass plate and heated and dried, and then stored in a heating chamber, and then exposed to hot air introduced to a specific temperature in the heating chamber. Heat treatment (calcination). [Patent Document 1] Japanese Patent No. 2917771 [Invention] [Problems to be Solved by the Invention] Φ The heat treatment device of the prior art has openings or slits for taking out or putting in the object to be heated, and is not completely sealed. The state is likely to become a relatively low temperature in the vicinity of the above opening or slit. Therefore, the generated gas generated by vaporization accompanying the heat treatment or the specific solution applied to the substrate is cooled and solidified in the vicinity of the m opening or the slit, and becomes a so-called sublimate. Since the sublimate is in the form of particles or tar, there is a problem in that not only the inside of the heat treatment apparatus is contaminated, but also the quality of the object to be heated is lowered, and the object to be heated is leaked to the outside of the heat treatment apparatus when it is taken out or placed. 139516.doc 201009946 Usually, the heat treatment device is installed in a clean room or the like with relatively high cleanliness. Therefore, when the sublimate material leaks from the heat treatment apparatus as in the heat treatment apparatus of the prior art, there is a problem that the cleanliness of the clean room is also lowered. In view of the above problems, in the heat treatment apparatus disclosed in Patent Document 1, in order to prevent air or generated gas in the heat treatment device from leaking to the outside, the gas is exhausted from the inside to the outside of the heat treatment device to reduce the heat treatment device. The composition of silence. When this configuration is adopted, there is a certain effect that the sublimate is discharged from the heat treatment apparatus to the outside. However, in the heat treatment apparatus of the prior art, the static pressure in the heat treatment apparatus differs depending on the place, and therefore, when the opening provided at a position where the static pressure is not sufficiently lowered is opened to take out or put the object to be heated, there may be The problem of air that generates gas or sublimate will leak from the opening. In addition, when there is a place where the static pressure is not sufficiently lowered as described above, the exhaust mechanism provided for pumping and discharging the air in the heat treatment apparatus, etc., can be prevented from being In order to remove the opening of the object to be heated or to open the opening, a line leak such as a generated gas is generated, but the problem that the static (four) degree in the heat treatment chamber becomes low is generated. Therefore, when it is set as the configuration, if the opening provided in the portion where the static pressure is excessively low is opened, there is a problem that the temperature distribution of the outside air flowing into the processing device by the opening becomes uneven. ¥,,,, ^ * The object of the present invention is to provide a heat treatment apparatus which is not easy to be formed, or which is caused by the heat treatment to form a milk or a sublimate or the like, which is generated by the opening or closing of the person α. Temperature distribution in the heat treatment chamber 139516.doc 201009946 Uneven. [Technical means to solve the problem]
為了解決上述問題而提供之本發明之熱處理裝置之特徵 在於包含：熱處理室’其係可收容被加熱物；複數個出入 其係可對該熱處理室取出放入被加熱物；及排氣機 構八係可變更用以自上述熱處理室之内側向外側抽吸而 排出氣體之排氣能力；於上述出入σ中之任-者變為打開 狀I時’ 上述排氣機構之排氣能力，以便與變為該打 二之出入口相鄰之位置上之上述熱處理室内之靜壓較 使上述出入口成》打開狀態之前低壓（請纟項1)。 本發明之熱處理裝置t，於與設有複數個之出入口之中 變為打開狀態者相鄰之位置，調節排氣機構之排氣能力， 乂便與良為打開狀態之出入口相鄰之位置上的熱處理室内 靜堅較使出人口成為打開狀態之前低I，故而即使進行 被加熱物之取出放入，亦可防止生成氣體或昇華物等洩 漏0 又，上述本發明之熱處理裝置理想的是，於出入口尹之 任一者變為打開狀態時，調節上述排氣機構之排氣能力， 以便與該出入口相鄰之位置上之上述熱處理室内之㈣成 為該熱處理室外側之氣壓以下（請求項2)。 形成該構成之情形時，可更進—步確實地防止生成氣體 或昇華物等因出入口打開而經由出入口洩漏。 上述本發明之熱處理裝置理想的是，含有用以自熱處理 室内向外側排除氣體之排氣口 ’根據變為打開狀態之出入 139516.doc 201009946 口與上述排氣口之距離’來調節排氣機構之排氣能力（請 求項3) » 藉由該構成，可將與設有複數個之出 狀態者相鄰之位置上之熱處理室内之靜麼調節== -步確實地於被加熱物之取出放人時防止生成氣體等泡漏 之壓力。 上述本發明之熱處理裝置理想的是，含有用以自熱處理 室内向外側排出氣體之排氣口，在靠近上述排氣口之區域 A、以及對上述排氣口較上述區域人更遠離之區域b排列設 置有複數個出入口 ’设於該區域A、B之上述出入口係以 特定之順序而打開或關閉者，以配置於上述區域B之出入 口變為打開狀態之時序作為基準，於特定期間之上述排氣 機構之排乳能力高於以配置於上述區域A之出入口變為打 開狀態之時序作為基準，於特定期間内之上述排氣機構之 排氣能力（請求項4)。 本發明之熱處理裝置中，於靠近排氣口之區域A以及遠 離排氣口之區域B分別部古山、 刀另j *又有出入口，因此使排氣機構以相 同之排氣能力動作眛，^The heat treatment apparatus of the present invention provided to solve the above problems is characterized by comprising: a heat treatment chamber 'which can accommodate an object to be heated; a plurality of inlet and outlet units can take out the object to be heated in the heat treatment chamber; and an exhaust mechanism The exhaust capability for exhausting gas from the inside to the outside of the heat treatment chamber can be changed; when any of the above-mentioned inlet and outlet σ becomes the open shape I, the exhaust capability of the exhaust mechanism can be The static pressure in the heat treatment chamber at the position adjacent to the inlet and outlet of the second is lower than the low pressure before the inlet and outlet are opened (please refer to item 1). The heat treatment device t of the present invention adjusts the exhaust capability of the exhaust mechanism at a position adjacent to the one in which the plurality of inlets and outlets are opened, and the sputum is adjacent to the inlet and outlet of the open state. The heat treatment chamber is lower than I before the population is opened. Therefore, even if the object to be heated is taken out, it is possible to prevent leakage of the generated gas or sublimate, and the heat treatment apparatus of the present invention is preferably When any one of the entrance and exit Yin is turned on, the exhaust capability of the exhaust mechanism is adjusted so that (4) in the heat treatment chamber at a position adjacent to the inlet and outlet becomes below the pressure of the outdoor side of the heat treatment (Request 2 ). In the case where this configuration is formed, it is possible to more reliably prevent the generation of gas or sublimate or the like from leaking through the inlet and outlet due to the opening of the inlet and outlet. The heat treatment apparatus of the present invention described above preferably includes an exhaust port for removing gas from the inside of the heat treatment chamber to adjust the exhaust mechanism according to the distance 139516.doc 201009946 from the opening to the exhaust port. Exhaust capability (Requirement 3) » With this configuration, it is possible to adjust the static temperature in the heat treatment chamber at a position adjacent to a plurality of out-of-state persons == - Step is surely taken out of the object to be heated Prevents the generation of bubbles such as gas bubbles when released. Preferably, the heat treatment apparatus according to the present invention includes an exhaust port for exhausting gas from the inside of the heat treatment chamber, a region A close to the exhaust port, and a region farther away from the region than the region. The plurality of entrances and exits are arranged in the area A and B. The above-mentioned entrances and exits are opened or closed in a specific order, and the time period in which the entrance and exit of the area B is opened is used as a reference, and the above-mentioned period is specified. The exhaust capacity of the exhaust mechanism is higher than the exhaust capability of the above-described exhaust mechanism in a specific period based on the timing at which the inlet and outlet disposed in the region A is turned on (request item 4). In the heat treatment apparatus of the present invention, the area A near the exhaust port and the area B far from the exhaust port are respectively provided with an entrance and exit, so that the exhaust mechanism operates with the same exhaust capability, ^
寻存在區域B附近之靜壓高於區域A 附近之靜壓之傾向0妙 …、而，本發明之熱處理裝置係以配置 ;品域之出入口變為打開狀態之時序作為基帛，於特定 』1内之排氣機構之排氣能力高於以配置於區域A之出入 口變為打開狀態之時序作為基準，於特定期間内之排氣機 構之排孔犯力之方式動作。因此即使設於區域B之出入 變為打開狀態之情形時，亦可使出入口附近之靜壓降低 139516.doc 201009946 至與設於區域A之出入口變為打開狀態時同等程度。因 此’藉由本發明之熱處理装置，即使經由設於區域a、b 中之任纟内之出入口而取出放入被力口熱物，亦可防止生 成氣體或昇華物等洩漏。 •又’於本發明之熱處理裝置中，以配置於區域B之出入 • η變為打開狀態之時序作為基準，於特定期間内排氣機構 之排氣能力增高，因此可防止配置於區域Α内之出入口變 為打開狀態時區域Α附近之靜壓過度降低。因此，於本發 明之熱處理裝置中，可防止於使出入口成為打開狀態時， 外部氣體流入熱處ί里室内而產生熱處理室内之溫度分布不 均。 此處，通常而言，經加熱而變為高溫之氣體存在流向上 方側之傾向。因此，於上述本發明之熱處理裝置中，當形 成區域Β對於區域Α而位於上方之構成時’係假設熱處理 室内變為咼溫之氣體處於容易自區域B侧漏出之傾向。然 • 而，如上所述，本發明之熱處理裝置係以配置於區域B之 出入口變為打開狀態之時序作為基準，於特定期間内，排 氣機構之排氣能力設定得高於以配置於區域A之出入口變 為打開狀態之時序作為基準，於特定期間内之排氣能力。 因此，本發明之熱處理裝置即使形成區域3對於區域八而 位於上方’且排氣口設於熱處理室下方侧之位置之構成， 亦可確實地防止生成氣體等之洩漏（請求項5)。 上述本發明之熱處理裝置更理想的是，排氣機構之排氣 能力之調節係在複數個出入口中之任一者變為打開狀態之 139516.doc 201009946 前完成（請求項6)。 藉由該構成，在久φ λ . 〇α , 啦谷出入口變為打開狀態之前，使與該出 相鄰之位置之靜壓降低，可確實地防止生成氣體或昇 華物等經由出入口而茂漏。 f述本發明之熱處理褒置理想的是，於對構成熱處理室 且設有出入口之壁面鄰接之位置設置有排氣口，藉由排氣 機構，可經由上述排氣σ而使上述熱處理室内之氣體排出 至熱處理室之外部（請求項7)。 藉由該構成，可更進一步確實地防止生成氣體等經由出 入口而茂漏。 上述本發明之熱處理裝置理想的是，於出入口與熱處理 至之間°又有較熱處理室之内側以及外侧之氣壓更低壓之 低壓區域（請求項8)。 藉由該構成，可更進一步確實地防止於為了被加熱物之 取出放入而打開出入口時，氣體自熱處理室之内側向外侧 洩漏。因此，藉由上述構成，可更進一步確實地防止包含 生成氣體之氣體汽漏至熱處理室之外部。 又，根據上述構成，亦可防止外部氣體因出入口打開而 經由該出入口流入熱處理室内。因此，藉由上述構成可 更進一步確實地防止因低溫之空氣等自熱處理室之外側流 入内側而熱處理室内之溫度分布紊亂。 此處’於上述熱處理裝置中’當設有複數個之出入口均 為關閉狀態時’會使排氣機構處於停止狀態，或者即便使 其以必要最小限度之排氣能力排氣’生成氣體或昇華物等 139516.doc 201009946 亦不會自出入口浅漏。X，若如上所述調節排氣機構 作狀態，則可將因排氣機構之動作而消耗之能量 要最小限度。The tendency of the static pressure in the vicinity of the region B is higher than the static pressure in the vicinity of the region A. However, the heat treatment device of the present invention is configured; the timing of the entry and exit of the article is turned on as the basis, and the specific The exhaust capability of the exhaust mechanism in 1 is higher than the timing at which the inlet and outlet of the region A is turned on as a reference, and the exhaust mechanism of the exhaust mechanism operates in a specific period. Therefore, even when the entry and exit of the area B is turned on, the static pressure near the entrance and exit can be lowered by 139516.doc 201009946 to the same level as when the entrance and exit of the area A is turned on. Therefore, by the heat treatment apparatus of the present invention, it is possible to prevent leakage of a generated gas or a sublimate or the like even if the heat-received material is taken out through the inlet and outlet in any of the regions a and b. Further, in the heat treatment apparatus according to the present invention, the exhaust gas capacity of the exhaust mechanism is increased during a specific period of time based on the timing at which the inlet and outlet η of the region B are turned on, thereby preventing the arrangement in the region Α When the entrance and exit are turned on, the static pressure near the area Α is excessively lowered. Therefore, in the heat treatment apparatus of the present invention, it is possible to prevent the outside air from flowing into the heat chamber when the inlet and outlet are opened, and the temperature distribution in the heat treatment chamber is uneven. Here, in general, a gas which is heated to a high temperature tends to flow to the upper side. Therefore, in the heat treatment apparatus of the present invention described above, when the formation region Β is located above the region ’, it is assumed that the gas which becomes the temperature in the heat treatment chamber tends to leak from the region B side. However, as described above, the heat treatment apparatus of the present invention is based on the timing at which the inlet and outlet of the region B are turned on, and the exhaust capability of the exhaust mechanism is set higher than that for the predetermined period. The timing at which the entrance and exit of A becomes the open state is used as a reference, and the exhaust capability is within a specific period. Therefore, in the heat treatment apparatus of the present invention, even if the formation region 3 is located above the region VIII and the exhaust port is located at the lower side of the heat treatment chamber, leakage of generated gas or the like can be reliably prevented (claim 5). Preferably, the heat treatment apparatus of the present invention is further characterized in that the adjustment of the exhaust capability of the exhaust mechanism is completed before the 139516.doc 201009946 of any of the plurality of inlets and outlets is opened (claim 6). According to this configuration, the static pressure at the position adjacent to the exit is lowered before the long-term φ λ . 〇 α and the Lag Valley entrance and exit are opened, and it is possible to reliably prevent the generation of gas or sublimate from leaking through the entrance and exit. . In the heat treatment apparatus of the present invention, it is preferable that an exhaust port is provided at a position adjacent to a wall surface constituting the heat treatment chamber and having an inlet and an outlet, and the exhaust chamber can be used to pass the exhaust gas σ to the heat treatment chamber. The gas is discharged to the outside of the heat treatment chamber (claim 7). According to this configuration, it is possible to more reliably prevent the generation of gas or the like from leaking through the inlet and outlet. The above-described heat treatment apparatus of the present invention desirably has a low pressure region which is lower than the gas pressure inside and outside the heat treatment chamber between the inlet and the outlet and the heat treatment (claim 8). According to this configuration, it is possible to more reliably prevent the gas from leaking from the inside to the outside of the heat treatment chamber when the inlet and outlet are opened for taking out the object to be heated. Therefore, with the above configuration, it is possible to more reliably prevent the gas containing the generated gas from leaking to the outside of the heat treatment chamber. Further, according to the above configuration, it is possible to prevent the outside air from flowing into the heat treatment chamber through the inlet and outlet due to the opening and exit of the inlet and outlet. Therefore, according to the above configuration, it is possible to more reliably prevent the temperature distribution in the heat treatment chamber from being disturbed by the low temperature air or the like flowing into the inside from the outside of the heat treatment chamber. Here, 'in the above heat treatment apparatus', when a plurality of inlets and outlets are all closed, the exhaust mechanism is stopped, or even if it is exhausted with a minimum necessary exhaust capacity, gas is generated or sublimated. Things such as 139516.doc 201009946 will not leak from the entrance and exit. X. If the state of the exhaust mechanism is adjusted as described above, the energy consumed by the operation of the exhaust mechanism can be minimized.
基於上述觀點，上述本發明之熱處理裝置理想的是，於 所有出入Π均為_狀態時，調節排氣機構之動作狀態，、 以便排氣機構變為排氣流量為特定最小流量之狀態、：揮 各出入口打開時可調節之排氣能力中之最小排氣能力：狀 癌、或者停止狀態令之任一狀態（請求項9)。 上述本發明之熱處理裝置理想的是，排氣機構包含鼓風 機及變流n(invener)，可藉由變流器控制來調節排氣能力 (請求項10)。 本發明之熱處理裝置中，排氣機構包含鼓錢，藉此可 向熱處理室之外❹吸存在於熱處理室内之空氣等而進行 排氣。X，排氣機構包含變流器，藉此控制變流器，並可 適當採用可調節排氣能力者。 [發明之效果] 根據本發明，可提供—種不易伴隨著出人口之打開或關 閉’而伴隨著熱處理產生之生成氣體或昇華物等產生洩漏 之熱處理裝置。 【實施方式】 繼而，一面參照圖式，一面對本發明之一實施形態之熱 處理裝置1進行詳細說明。再者，於以下說明中，關於上 下或別後之位置關係’凡未作特別聲明，均係以本實施形 態之熱處理裝置的通常之使用狀態作為基準來進行說明。 139516.doc 201009946 亦即，於以下說明中，上下係指高度方向之位置關係。 又，於以下說明中，所謂「近前」以及「前面」，係指將 被加熱物即基板w(板狀體）取出或放入至熱處理裝置或支 架（rack)上時所使用之移載裝置側之位置，即熱處理裝置 或支架之正面侧。又’將「近前」以及「前面」之相反侧 (熱處理裝置或支架之背面侧）之位置稱為「裏面」或「後 面」。又’於以下說明中，「左右」之位置關係係以自正面 側觀察熱處理裝置或支架之姿勢作為基準。 如圖1所示，熱處理裝置1係藉由熱處理裝置本體1〇而構 成主要部分。又，如圖2所示，熱處理裝置丨包含用以自熱 處理裝置本體10排氣之排氣裝(排氣機構”如圖2或圖 3所示，熱處理裝置本體1〇設為如下構成：包含由具有隔 熱挫之壁面所圍成之空間，且於該空間之内部設有調溫部 (溫度調節部）12、熱處理室13。 調皿邛1 2於内部包含加熱器丨6及鼓風機丨7 ^調溫部12經 由過濾器14而與熱處理室13相_，並與熱處理室13連通。 調溫部12藉由使加熱器16與鼓風機17作動，而將加熱後之 空乳經由過濾器14送入至熱處理室13，從而可將熱處理室 13之室内溫度加熱至特定溫度為止。 處理室13係可配置被加熱物即基板w之空間。熱處理 室13於正面13b(壁面）側、即圖2中之左侧、圖3中之下侧， 具有用以將基板w取出或放人之出人口18。出人_位於 =迷調溫部12對向之位置，且設於自調溫部12吹出之空 氣々_<·之下游側之位置。 139516.doc 201009946 出入口 18如圖1或圖2所示，相對於熱處理室13而朝上下 方向以相等間隔設有複數個（本實施形態中為四個）。更詳 細而言’假定一個虛擬平面p，該虛擬平面p於熱處理室13 之内部空間，如圖2中以兩點鏈線所示，相對於熱處理室 13之底面13a大致平行地通過熱處理室13之高度之大致一 半之位置。並且，以該虛擬平面p為分界，於上下假定有 區域XI、X2(分別相當於區域a、B)時，在位於底面13 a側 之區域XI内，於上下排列而存在兩個出入口 18(以下亦分 別稱為出入口 18a、18b)。又’在相對於區域X1而位於上 方之區域X2内，亦於上下排列而存在兩個出入口 18(以下 亦分別稱為出入口 1 8c、18d)。 於上述出入口 18a〜18d上’以能夠各自單獨作動之方式而 安裝有擋閘（shutter)Sn(n=l〜4之自然數;）。出入口 i8a~18d 呈如下狀態.藉由打開播閘§n，而可使用先前公知之包含 機械手（robot hand)等之移載裝置（未圖示）將基板賈自熱處 理室13取出或放入至熱處理室13。 於熱處理室13之大致中央部，設有用以配置基板w之支 架30。支架3 0設為於上下方向上以每隔特定間隔而排列之 方式配置有多個搁板40之構成。於支架3〇之底部，安裝有 昇降裝置（未圖示）之昇降轴36’藉由昇降軸36之伸縮，支 架30於熱處理室13内上下移動，從而可調節各出入口丨8與 各擱板40之位置關係。 於熱處理室13之底面13a設有排氣口 21。排氣口21設於 熱處理室13之正面13b側，即與出入口丨8側相鄰之位置。 139516.doc -11· 201009946 °排氣裝置 於排氣口 21上經由配管22而連接有排氣裝置i i 11包含先前公知之鼓風機或泵與變流器等，可向熱處理室 13之外側抽吸存在於熱處理室13内之空氣等而進行排氣。 於配管22之中途設有閥23。Based on the above, it is preferable that the heat treatment apparatus of the present invention adjusts the operating state of the exhaust mechanism when all the inlet and outlet ports are in the state of _, so that the exhaust mechanism becomes a state in which the exhaust gas flow rate is a specific minimum flow rate, The minimum exhaust capacity of the adjustable exhaust capability when the entrances and exits are opened: the state of cancer, or the state of the stop state (request item 9). Preferably, the heat treatment apparatus of the present invention described above includes an air blower including a blower and an invener, and the exhaust capability can be adjusted by the converter control (claim item 10). In the heat treatment apparatus of the present invention, the exhaust mechanism includes the money, whereby the air or the like existing in the heat treatment chamber can be sucked outside the heat treatment chamber to be exhausted. X, the exhaust mechanism includes a current transformer, thereby controlling the converter, and an appropriate adjustable exhaust capability can be used. [Effect of the Invention] According to the present invention, it is possible to provide a heat treatment apparatus which is less likely to cause leakage of a generated gas or a sublimate generated by heat treatment accompanying the opening or closing of a population. [Embodiment] Hereinafter, a heat treatment apparatus 1 according to an embodiment of the present invention will be described in detail with reference to the drawings. In the following description, the positional relationship between the upper and lower or the other is not described in detail, and the description will be made based on the normal use state of the heat treatment apparatus of the present embodiment. 139516.doc 201009946 That is, in the following description, the upper and lower sides refer to the positional relationship in the height direction. In the following description, the term "near front" and "front side" refer to a transfer device used when the substrate w (plate-like body) to be heated is taken out or placed on a heat treatment device or a rack. The position of the side, ie the front side of the heat treatment device or bracket. The position of the "near side" and the "front side" (the back side of the heat treatment device or the holder) is referred to as "inside" or "back". Further, in the following description, the positional relationship of "left and right" is based on the posture of the heat treatment device or the holder viewed from the front side. As shown in Fig. 1, the heat treatment apparatus 1 is constituted by a main portion of the heat treatment apparatus body 1〇. Further, as shown in Fig. 2, the heat treatment apparatus 丨 includes an exhaust device (exhaust mechanism) for exhausting from the heat treatment device body 10, as shown in Fig. 2 or Fig. 3, and the heat treatment device body 1 is configured as follows: The space surrounded by the wall surface having the heat insulation is provided, and the temperature adjustment unit (temperature adjustment unit) 12 and the heat treatment chamber 13 are provided inside the space. The container 邛1 2 contains the heater 丨6 and the blower inside. 7 ^ The temperature control unit 12 is in phase with the heat treatment chamber 13 via the filter 14, and communicates with the heat treatment chamber 13. The temperature adjustment unit 12 moves the heated empty milk through the filter by actuating the heater 16 and the blower 17. 14 is sent to the heat treatment chamber 13 to heat the indoor temperature of the heat treatment chamber 13 to a specific temperature. The processing chamber 13 is capable of arranging a space of the substrate w to be heated. The heat treatment chamber 13 is on the front surface 13b (wall surface) side, that is, The left side in FIG. 2 and the lower side in FIG. 3 have a population 18 for taking out or releasing the substrate w. The person _ is located at the position opposite to the fan temperature adjusting unit 12, and is set at the self-tempering temperature. The position of the downstream side of the air 々_<· blown out by the part 12. 139516.doc 201009946 As shown in FIG. 1 or FIG. 2, the inlet 18 is provided at a plurality of equal intervals in the vertical direction with respect to the heat treatment chamber 13 (four in the present embodiment). More specifically, 'assuming a virtual plane p, the virtual The plane p is in the inner space of the heat treatment chamber 13, as shown by the two-dot chain line in Fig. 2, and passes through substantially the half of the height of the heat treatment chamber 13 with respect to the bottom surface 13a of the heat treatment chamber 13 in parallel. The plane p is a boundary, and when the areas XI and X2 (corresponding to the areas a and B, respectively) are assumed above and below, in the area XI located on the side of the bottom surface 13 a, there are two entrances and exits 18 (hereinafter also referred to as The entrances and exits 18a, 18b) are further arranged in the upper portion X2 with respect to the area X1, and there are two entrances and exits 18 (hereinafter also referred to as entrances and exits 18c, 18d, respectively). The above-mentioned entrances and exits 18a to 18d The upper part is equipped with a shutter Sn (n=l~4 natural number;). The entrances and exits i8a~18d are in the following state. By opening the broadcast gate §n, the previous use can be used. It is known to include a robot ( A transfer device (not shown) such as a robot hand is taken out from the heat treatment chamber 13 or placed in the heat treatment chamber 13. At a substantially central portion of the heat treatment chamber 13, a holder 30 for arranging the substrate w is provided. 0 is a configuration in which a plurality of shelves 40 are arranged at predetermined intervals in the vertical direction. At the bottom of the bracket 3, an elevating shaft 36' to which a lifting device (not shown) is attached is lifted and lowered. The shaft 36 is telescoped, and the bracket 30 is moved up and down in the heat treatment chamber 13, so that the positional relationship between each of the inlet and outlet ports 8 and each shelf 40 can be adjusted. An exhaust port 21 is provided in the bottom surface 13a of the heat treatment chamber 13. The exhaust port 21 is provided on the front surface 13b side of the heat treatment chamber 13, i.e., at a position adjacent to the port 丨8 side. 139516.doc -11· 201009946 ° The exhaust device is connected to the exhaust port 21 via a pipe 22 with an exhaust device ii 11 including a previously known blower or pump and a converter, etc., and can be sucked to the outside of the heat treatment chamber 13 The air or the like existing in the heat treatment chamber 13 is exhausted. A valve 23 is provided in the middle of the pipe 22.
本實施形態之熱處理裝置1係採用所謂流水作業 system)者，即，使用機械手等之移載裝置（未圖示），更換 配置在設於熱處理室13内之支架30之擱板40上且煅燒結束 後之基板W、與位於熱處理室13之外部之未煅燒狀態之基 板W ’藉此來連續地實施基板w之煅燒。以下，—昭 圖式，一面對本實施形態之熱處理裝置丨之動作進行詳細 說明。 熱處理裝置1在基板W之煅燒（熱處理）前，藉由未圖示之 控制裝置使加熱器16或鼓風機17作動而將熱風送入至熱處 理室13,以將熱處理室13内之溫度調節為特定之熱處理溫 度。當熱處理室13内之環境溫度達到特定之熱處理溫度 (本實施形態中為230。(：〜250。〔:）時，熱處理裝置！變為可煅 燒基板W之狀態。 ❹ 當如上所述熱處理室13之環境溫度達到熱處理溫度時， 如圖4所示，熱處理裝置丨之控制裝置（未圖示）為了基板| 之取出或放入，而自位於下方者開始依次打開或關閉“ 口 18a〜l8d之擋閘_=1〜4之自然數）。又，控制機構在_ · 閉最上方之擋閘S4之後，以與上述同樣之方式自最下方之 擋閘S1開始依次打開或關閉各擋閘Sn。又，控制裝置於至 各擔間％進行作動之時序之前，使支架30上下移動，以使 139516.doc -12- 201009946 應取出或放入基板W之搁板40到達相當於出入口 18a〜18d 之中變為打開狀態之出入口的位置。 熱處理裝置1可經由出入口 18a〜18d之中藉由擋閘Sn之作 動而變為打開狀態之出入口取出或放入基板1。出入口 18a 18d於為了基板w之取出或放入而分配之時間經過 時，擋閘Sn再次進行作動而變為關閉狀態。其後，下一個 撞閉Sn進打作動，而變為能夠以與上述同樣之方式於整個 特定時間内取出或放入基板贾之狀態。 此處如上所述，於本實施形態之熱處理裝置丨中，各 出入口 18a〜18d係自位於下方者開始依次打開或關閉。因 此，以各出入口 18a〜18d之中存在於區域幻之出入口18&、 ⑽變為打開狀態之時序作為基準而狀之期間a、與以存 在於區域X2之出入〇18c、18d變為打開狀態之時序作為基 準而設;t之期間b係隨著時間之經過而交替到來。於熱處 理裝置1中’係於上述期間a與期間b，切換排氣裝置^之 輸出。 具體而言，於本實施形態中，如圖4所示，於各出入口 中之個變為打開狀態之時序、與於該時序之緊 接著j面其他出人α i 8d變為關閉狀態之時序之間， 設有短暫的待機時間t。又，於本實施形態巾，熱處理裝 置1啟動後，將自相斟於θ曰， 對於取早出入口 18a打開之時序僅提前 上述待機時間t之時鬼扭 s& 序起、至區域XI之出入口 18b變為關閉 狀態為止之期間設宗氐 足為/月間a。同樣地，將自相對於設於 區域X1之出入口 1 g & 8a變為打開狀態之時序僅提前上述待機 139516.doc -13- 201009946 時間t之時序、即設於區域X2之出入口 18d已變為關閉狀態 之時序起、至區域XI之出入口 l8b變為關閉狀態為止之期 間亦設定為期間a。又，相對於設於區域又2之出入口丨8c變 為打開狀態之時序僅提前上述待機時間t之時序、即設於 區域XI之出入口 18b已變為關閉狀態之時序起、至區域幻 之出入口 18d變為關閉狀態為止之期間設定為期間卜。The heat treatment apparatus 1 of the present embodiment is a so-called flow-through system, that is, a transfer device (not shown) such as a robot is used, and is placed on the shelf 40 of the holder 30 provided in the heat treatment chamber 13 and The substrate W after completion of the calcination and the substrate W' in an uncalcined state outside the heat treatment chamber 13 are continuously subjected to calcination of the substrate w. Hereinafter, the operation of the heat treatment apparatus according to the present embodiment will be described in detail. Before the calcination (heat treatment) of the substrate W, the heater 16 or the blower 17 is actuated by a control device (not shown) to supply hot air to the heat treatment chamber 13 to adjust the temperature in the heat treatment chamber 13 to a specific temperature. Heat treatment temperature. When the ambient temperature in the heat treatment chamber 13 reaches a specific heat treatment temperature (230 in the present embodiment (:: 250 to 250), the heat treatment device becomes a state in which the substrate W can be calcined. ❹ When the heat treatment chamber is as described above When the ambient temperature of 13 reaches the heat treatment temperature, as shown in FIG. 4, the control device (not shown) of the heat treatment device is opened or closed for the substrate | from the bottom, and the mouths 18a to l8d are sequentially opened or closed for the substrate. The gate _=1~4 is a natural number. Further, after the control mechanism closes the uppermost gate S4, the shutters are opened or closed in sequence from the lowermost gate S1 in the same manner as described above. In addition, the control device moves the holder 30 up and down until the timing of the actuation of each of the dynamometers, so that 139516.doc -12- 201009946 should be taken out or placed in the shelf 40 of the substrate W to reach the corresponding entrance 18a~ The position of the inlet and outlet of the open state is 18d. The heat treatment apparatus 1 can take out or insert the substrate 1 through the inlet and outlet of the opening and closing ports 18a to 18d which are opened by the operation of the shutter Sn. The inlet and outlet 18a 18d When the time when the substrate w is taken out or placed and dispensed, the shutter Sn is again actuated to be in a closed state. Thereafter, the next collision and closing Sn is actuated, and the entire operation can be performed in the same manner as described above. In the heat treatment apparatus according to the present embodiment, each of the inlets and outlets 18a to 18d is sequentially opened or closed from the lower side as described above. Therefore, each of the inlets and outlets 18a is used. In the period from 18 to 18d, the period a in which the regional magical entrances and exits 18 & (10) are in the open state is used as a reference, and the timing in which the entrances and exits 18c and 18d existing in the region X2 are turned on is used as a reference. During the period t, the b is alternately with the passage of time. In the heat treatment apparatus 1, 'the output of the exhaust device is switched between the period a and the period b. Specifically, in the present embodiment, as shown in the figure As shown in FIG. 4, a short standby time t is provided between the timing at which each of the entrances and exits is turned on, and the timing at which the other persons α i 8d are turned off immediately after the timing. Further, in the towel of the present embodiment, after the heat treatment device 1 is started, the self-phase is set to θ 曰, and the timing at which the early exit port 18a is opened is advanced only when the standby time t is advanced, and the erection is shifted to the entrance and exit of the area XI. The period from when 18b is turned off is set to / month a. Similarly, the above-mentioned standby 139516.doc -13 is advanced only from the timing at which the entrance 1 g & 8a provided in the area X1 is turned on. - 201009946 The period of time t, that is, the period from when the entry/exit 18d of the area X2 has been turned off, and the period until the entrance/exit 18b of the area XI is turned off is also set to the period a. Further, the timing at which the entrance/exit port 8c provided in the area 2 is turned on is only the timing of the standby time t, that is, the timing at which the entrance/exit 18b of the area XI has been turned off, and the entrance to the area is illusory. The period until 18d is turned off is set as the period.
如圖4所示，熱處理裝置丨於期間a内將排氣裝置n之輸 出設定為…而進行作動。藉此，如圖5所示，於熱處理室 13内之區域乂丨内，靠近出入口 18a、18b之位置之靜壓與熱 處理室13之外部氣壓Po相等或者為外部氣壓p〇以下。'因 此，即使為了基板W之取出或放入而使出入口 i8a、工扑變 為打開狀態，含有生成氣體等之空氣亦不會自熱處理室i3 之内侧向外側汽漏。又，於期間3内，設有出入口…、 18d之區域X2之靜壓高於外部氣壓p〇，出人口心、⑻處 於關閉狀態。因此’於出入口 18c、18d内，不會產生含有 生成氣體等之空氣之洩漏或外部氣體之流入。 万面，熱處理裝置1在期間As shown in Fig. 4, the heat treatment apparatus operates by setting the output of the exhaust apparatus n to ... in the period a. Thereby, as shown in Fig. 5, in the region 内 in the heat treatment chamber 13, the static pressure at the position close to the inlets and outlets 18a, 18b is equal to or lower than the external pressure Po of the heat treatment chamber 13. Therefore, even if the inlet and outlet i8a and the worker are turned into an open state in order to take out or insert the substrate W, the air containing the generated gas or the like does not leak from the inside to the outside of the heat treatment chamber i3. Further, in the period 3, the static pressure in the region X2 where the entrance/exit..., 18d is provided is higher than the external air pressure p〇, and the population is out of the heart, and (8) is in the closed state. Therefore, in the inlets and outlets 18c and 18d, leakage of air containing a generated gas or the like or inflow of external air does not occur. Wan, heat treatment device 1 during
力 • 脾併虱哀置i i之 出設定為大於上述pl〇2而進行作動。藉此，如圖5 不僅於熱處理室13内之區咖，而且於區域X2内 靠近出入口 18c、 拉 8d之位置之靜壓亦與熱處理室13之外 ::P。相等或者為外部氣壓p〇以下。因此，即使在則 内為了基板W之取出或放人而使出人〇18。、咖變為打 狀態’含有生成氣體等之空氣亦不會自熱處理室13之内 °卜側以於期間b内’於區域XI内與出入口 18a 139516.doc -14- 201009946 18b相鄰之部分之靜壓低於熱處理室13之外部氣壓Po，出 入口 18a、18b呈關閉狀態。因此，於期間5内，外部氣體 不會自出入口 18a、18b流入至熱處理室13之内側，從而不 會產生熱處理室13内之溫度分布變得不均勻、或者在無法 • 預期之場所產生或附著昇華物等之不良狀況。 • 上述實施形態中，係以使設有變為打開狀態之出入口18 之區域XI、X2之靜壓與外部氣壓Po相等或者為外部氣壓 • Po以下之方式來調節排氣裝置11之輸出，但本發明並不限 定於此。具體而言，當除了區域XI、X2内之靜壓之調節 以外’亦實施有防止生成氣體洩漏之方法，即使區域χι、 X2内之靜壓為稍高於外部氣壓Po之氣壓P1，亦可防止含 有生成氣體等之空氣自熱處理室13洩漏之情形時，亦可以 使設有變為打開狀態之出入口 18之區域XI、幻之靜麼與 氣壓P1相等或者為氣壓？丨以下之方式，來調節排氣裝置u 之輸出。 φ 又’上述熱處理裝置1藉由根據變為打開狀態之出入口 18與排氣口 21之距離而調節排氣裝置^之排氣能力，來防 止含有生成氣體之空氣自熱處理室13洩漏、或者外部氣體 •經由出入口 1 8而流入至熱處理室丨3，除此以外，亦可採用 ，如圖6所不之構成’來作為防止生成氣體之洩漏或外部氣 體之流入之方法。具體而言，於圖6所示之示例中，於出 入口 18與熱處理室13之間，形成有靜壓低於熱處理室门之 内側以及外側之氣壓之低壓區域5〇。更詳細而言，於圖6 所示之示例中’在相對於出入口丨8於上方及下方相鄰之位 139516.doc 201009946 置上設有管狀之低壓區域5〇。在構成低壓區域5〇之壁面、 即與經由出入口〗8而出入之基板w對向之面51 ' 52^，設 有狹縫狀之開口 53、55。因此’當設為如圖6所示之構^ 時，即使為了基板w之取出或放入而打開出入口 18，欲自 熱處理室13向外側洩漏之氣體亦會經由開口 53、乃加以回 收，而不會茂漏至外部。又，自出入口 18向熱處理室⑶則 流動之氣體，亦係於到達至熱處理室13以前吸入至開口 5一3、55 ’而不會滲入至熱處理室13。因此，若除了如上述 實施形態中所說明之排氣機構"之排氣能力之調節以外，· 亦採用如圖6所示之構成，則可更進—步確實地防止含有 生成氣體之氣體自熱處理室13茂漏至外部、或者外部氣體 自外部流入至熱處理室13内而使熱處理室13内之溫度分布 發生紊亂等之不良狀況。 上述實施形態中，係根據自排氣口 21算起之距離而將熱 處理室13内之區域劃分為區域χι、χ2之兩個區域，並且 以設於各區域X1、乂2之出入口 18變為打開狀態之時序作 為基準而設定期間a、b，分別於各期間a、b内調節排氣裝 @ 置U之輸出，但本發明並不限定於此。具體而言，亦可將 熱處理室13内之區域進一步劃分為多個區域χη(η=3以上之 自然數），且對排氣裝置丨丨之輸出進行調節，以使設於多 _ 個區域Χη中之-個區域（區域Α)的出入口18打開時之排I . 裝置11之排氣能力，低於位於較該區域Χη(區域Α)更遠離 排氣口 21之位置的其他區域Χη(區域Β)之出入口 18打開時 之排氣裝置11之排氣能力。當設為該構成時，根據出入口 139516.doc -16- 201009946 18與排氣口 21之距離，排氣裝置丨丨之輸出將分更多階段來 進行切換’從而可對各區域χη之靜壓進行調節，以達到用 以防止含有生成氣體等之空氣自熱處理室13洩漏之最佳狀 態。 如上所述，於熱處理裝置1中，係於熱處理裝置本體1〇 之正面13b s又有出入口 18，且在相對於該出入口 a而相鄰 之位置設有排氣口 21之構成，因此可將欲經由出入口 18而 茂漏至外部之生成氣體等抽吸至排氣口 21侧，從而可確實 地防止生成氣體等之洩漏。再者，排氣口 21理想的是，如 上所述設於與正面13b相鄰之位置，但亦可設於例如熱處 理室13之底面13a之中央部、較其更稍偏靠正面13b側之位 置、調溫部I2内、或偏靠調溫部12側之位置、熱處理室13 之周壁等之適當位置。又，當將排氣口 21設於遠離正面 13b之位置時’亦可設為於靠近正面i3b之位置設置排氣取 入口’且藉由管等而將該排氣取入口與排氣口 21加以連接 之構成。 如上述實施形態中所揭示，於熱處理裝置1中，各出入 口 18以及區域XI、Χ2係於上下方向上排列，且於熱處理 室13之底面13a侧設有排氣口 21，因此存在上方侧之區域 X2内之靜壓高於下方侧之區域X1之傾向。於熱處理室13 内’空氣或生成氣體經加熱而變為高溫，故而處於流向上 方側之傾向，因此當區域X2之靜壓高於外部氣壓p〇時，有 可能防止出入口 18c、18d變為打開狀態時生成氣體產生浪 漏，或者熱能隨著高溫之空氣而洩漏。然而，於本實施形 139516.doc -17· 201009946 態之熱處理裝置1中’係設為位於上方側之區域A之出入口 18打開時，與區域B之出入口 18打開時相比，提高排氣裝 置11之排氣能力。因此，如上所述，可確實地防止含有生 成氣體之空氣自出入口18或區域χι、χ2洩漏。 再者，於上述實施形態中，例示有於左右方向（寬度方 向）上展開之各出入口 18在上下方向（高度方向）上排列之構 成，但本發明並不限定於此，亦可為例如將各出入口 18形 成為在上下方向（高度方向）上展開，且分別在左右方向（寬 度方向）上排列之構成。關於在寬度方向上排列而配置有 各出入口 18之情形時，亦可與上述實施形態中所說明者相 同，設為在各出入口 18排列之方向之一端侧設有排氣口Μ 之構成，並且設為根據自排氣口21算起之距離而假定區域 XI、Χ2，當區域Χ2之出入口 18打開時，與區域幻之出入 口 18打開時相比，提高排氣裝£11之排氣能力。藉由該構 成，於設有開口區域在高度方向上展開之各出入口Η時， 亦可防止含有生成氣體之空氣茂漏至熱處理室！ 3之外側。 上述實施形態中’當各出入口18依次打開或關閉時，於 自先呈打開狀態之出入口 18變為閉止狀態開始、至下一個 出入口㈣為打開狀態為止期間，設置特定之待機時間 卜並且，使成為用以切換排氣襄置u之排氣能力之基準 之期間a、b，相對於區域χι、χ2内出入〇i8a、…變為打 開狀態之時序，提前僅待機時間…時長。因&，於熱處 理裝置1中’可將區域X1、父2内最早打開之出入口…、 18c變為打開狀態為止之期間用於區域幻、χ2之靜壓調 139516.doc -18· 201009946 節。再者，於上述實施形態中，於出入口 j8a〜丨8d中之任 一者變為打開狀態時，待機時間t皆為均等，但本發明並 不限定於此，而亦可設為例如根據需要而適當加以變更， 或者不設置待機時間t之構成。 又，上述實施形態中，係將待機時間t用於進行靜壓調 節，但本發明並不限定於此，而亦可設為在區域 之靜壓達到特定值之前各出入口 18a〜18d不會變為打開狀Force • The spleen is set to be greater than the above pl〇2 and is activated. Thereby, as shown in Fig. 5, not only the area in the heat treatment chamber 13, but also the static pressure in the region X2 near the entrances and exits 18c and 8d is also outside the heat treatment chamber 13. Equivalent or below the external air pressure p〇. Therefore, even if it is taken out or released for the substrate W, the person 18 is made. The coffee becomes a state in which the air containing the generated gas or the like does not exist from the inside of the heat treatment chamber 13 in the period b, and is adjacent to the inlet and outlet 18a 139516.doc -14 - 201009946 18b in the region XI. The static pressure is lower than the external air pressure Po of the heat treatment chamber 13, and the inlet and outlet ports 18a, 18b are closed. Therefore, in the period 5, the outside air does not flow into the inside of the heat treatment chamber 13 from the inlets and outlets 18a, 18b, so that the temperature distribution in the heat treatment chamber 13 does not become uneven, or is generated or adhered in an unpredictable place. Bad conditions such as sublimation. In the above embodiment, the output of the exhaust device 11 is adjusted such that the static pressure of the regions XI and X2 in which the inlet and outlet ports 18 are opened and the external air pressure Po are equal to or lower than the external air pressure Po. The present invention is not limited to this. Specifically, in addition to the adjustment of the static pressure in the regions XI and X2, a method of preventing gas leakage is also performed, and even if the static pressure in the regions χ1, X2 is slightly higher than the pressure P1 of the external pressure Po, When the air containing the generated gas or the like is prevented from leaking from the heat treatment chamber 13, the region XI and the illusion of the inlet and outlet 18 which are in an open state may be equal to or equal to the air pressure P1.丨 The following method is used to adjust the output of the exhaust unit u. φ "The above heat treatment device 1 prevents the gas containing the generated gas from leaking from the heat treatment chamber 13 or externally by adjusting the exhaust capacity of the exhaust device according to the distance between the inlet and outlet 18 and the exhaust port 21 which are in an open state. The gas may flow into the heat treatment chamber 3 through the inlet and outlet 18, and may be employed as a method for preventing leakage of generated gas or inflow of external gas, as shown in Fig. 6 . Specifically, in the example shown in Fig. 6, between the outlet 18 and the heat treatment chamber 13, a low pressure region 5〇 having a static pressure lower than the inside and outside of the heat treatment chamber door is formed. More specifically, in the example shown in Fig. 6, a tubular low-pressure region 5 is provided with a position 139516.doc 201009946 adjacent to the upper and lower sides of the port 8 . The slit-shaped openings 53 and 55 are provided in the wall surface constituting the low-pressure region 5〇, that is, the surface 51' 52 facing the substrate w which is introduced through the inlet and outlet 8. Therefore, when the configuration shown in Fig. 6 is set, even if the inlet and outlet 18 are opened for the removal or insertion of the substrate w, the gas to be leaked from the heat treatment chamber 13 to the outside is recovered through the opening 53, Will not leak to the outside. Further, the gas flowing from the inlet and outlet 18 to the heat treatment chamber (3) is also sucked into the openings 5 to 3, 55' before reaching the heat treatment chamber 13 without penetrating into the heat treatment chamber 13. Therefore, in addition to the adjustment of the exhaust gas capacity of the exhaust mechanism " as described in the above embodiment, the configuration shown in Fig. 6 is employed, and the gas containing the generated gas can be more reliably prevented. The heat treatment chamber 13 leaks to the outside or the outside air flows into the heat treatment chamber 13 from the outside, and the temperature distribution in the heat treatment chamber 13 is disturbed. In the above embodiment, the area in the heat treatment chamber 13 is divided into two areas of the areas χ1 and χ2 based on the distance from the exhaust port 21, and the entrances and exits 18 provided in the respective areas X1 and 乂2 become The timing of the open state is set as a reference, and the periods a and b are set, and the output of the exhaust device U is adjusted in each of the periods a and b, but the present invention is not limited thereto. Specifically, the region in the heat treatment chamber 13 may be further divided into a plurality of regions χη (a natural number of η=3 or more), and the output of the exhaust device 丨丨 may be adjusted so as to be disposed in a plurality of regions. When the inlet and outlet 18 of the area (region Α) in the Χn is opened, the discharge capacity of the device 11 is lower than that of the other region Χ (position farther away from the exhaust port 21 than the region Αη (region Α) The exhaust capability of the exhaust unit 11 when the inlet and outlet 18 of the zone 打开 is opened. When this configuration is set, according to the distance between the inlet and outlet 139516.doc -16- 201009946 18 and the exhaust port 21, the output of the exhaust unit 将 will be switched in more stages, so that the static pressure of each area can be χη Adjustment is made to achieve an optimum state for preventing leakage of air containing a generated gas or the like from the heat treatment chamber 13. As described above, in the heat treatment apparatus 1, the front surface 13b of the heat treatment apparatus main body 1b has an inlet and outlet 18, and the exhaust port 21 is provided at a position adjacent to the inlet and outlet a, so that it can be The generated gas or the like which is to be leaked to the outside through the inlet and outlet 18 is sucked to the side of the exhaust port 21, so that leakage of generated gas or the like can be surely prevented. Further, the exhaust port 21 is preferably provided at a position adjacent to the front surface 13b as described above, but may be provided, for example, at a central portion of the bottom surface 13a of the heat treatment chamber 13, and more slightly offset from the front surface 13b side. The position, the temperature adjustment unit I2, or the position on the temperature adjustment unit 12 side, and the peripheral wall of the heat treatment chamber 13 are at appropriate positions. Further, when the exhaust port 21 is provided at a position away from the front surface 13b, 'the exhaust gas intake port' may be provided at a position close to the front surface i3b, and the exhaust gas intake port and the exhaust port 21 may be formed by a tube or the like. Connected to form. As described in the above embodiment, in the heat treatment apparatus 1, each of the inlet and outlet ports 18 and the regions XI and Χ2 are arranged in the vertical direction, and the exhaust port 21 is provided on the bottom surface 13a side of the heat treatment chamber 13, so that the upper side is present. The static pressure in the region X2 is higher than the region X1 on the lower side. In the heat treatment chamber 13, the air or the generated gas is heated to become a high temperature, so that it tends to flow to the upper side. Therefore, when the static pressure of the region X2 is higher than the external air pressure p, it is possible to prevent the inlet and outlet 18c, 18d from opening. The gas generated in the state generates a leak, or the heat leaks with the high temperature air. However, in the heat treatment apparatus 1 of the present embodiment 139516.doc -17·201009946, when the inlet and outlet 18 of the region A located on the upper side are opened, the exhaust device is improved as compared with when the inlet and outlet 18 of the region B are opened. 11 exhaust capacity. Therefore, as described above, it is possible to surely prevent the air containing the generated gas from leaking from the inlet and outlet 18 or the areas χ, χ2. In the above-described embodiment, the respective inlets and outlets 18 that are developed in the left-right direction (width direction) are arranged in the vertical direction (height direction). However, the present invention is not limited thereto, and may be, for example, Each of the inlets and outlets 18 is formed to be developed in the vertical direction (height direction) and arranged in the left-right direction (width direction). In the case where the respective inlets and outlets 18 are arranged in the width direction, as in the above-described embodiment, the exhaust port 设有 may be provided at one end side in the direction in which the inlets and outlets 18 are arranged, and It is assumed that the regions XI and Χ2 are assumed based on the distance from the exhaust port 21, and when the inlet and outlet 18 of the region Χ2 is opened, the exhaust capability of the venting device 11 is improved as compared with when the region imaginary inlet and outlet 18 is opened. According to this configuration, it is possible to prevent the air containing the generated gas from leaking into the heat treatment chamber when the inlet and outlet ports are formed in the height direction in the opening region! 3 outside the side. In the above-described embodiment, when the respective inlets and outlets 18 are sequentially opened or closed, a specific waiting time is set during the period from the start of the opening and closing of the inlet and outlet 18 to the closed state and the opening of the next inlet and outlet (four). The period a and b which are the criteria for switching the exhaust capability of the exhaust gas shutoff u are the timings in which the inlet and outlet 〇i8a, ... are turned on in the regions χ1, χ2, and only the standby time...the length of time. In the heat treatment apparatus 1, the period of the area X1, the opening and closing of the earliest opening in the parent 2, and 18c can be used for the period illusion, χ2 static pressure adjustment 139516.doc -18· 201009946 section . Further, in the above-described embodiment, when any one of the entrances and exits j8a to 8d is in an open state, the standby time t is equal, but the present invention is not limited thereto, and may be, for example, as needed. And change it as appropriate, or do not set the standby time t. Further, in the above-described embodiment, the standby time t is used for the static pressure adjustment. However, the present invention is not limited thereto, and the inlet and outlet ports 18a to 18d may not be changed until the static pressure of the region reaches a specific value. Open
態之構成。藉由該構成，可更進一步確實地防止含有生成 氣體等之空氣經由出入口 18而洩漏。 上述實施形態中，係舉出在與排氣裝置丨丨連接之配管22 上設有閥23之示例，但本發明並不限定於此，而亦可不設 置閥23。又，上述排氣裝置^亦可為能夠以任一方法來調 節排氣能力者，可適當採用能夠藉由控制變流器來調節排 氣能力者。 於上述熱處理裝置1中，當設有複數個之出入口 18均為 關閉狀態時，即便使排氣裝置u為停止狀態，生成氣鱧或 昇華物等亦不會自各出入口 18洩漏。又，當各出入口 18均 為關閉狀態時，即使將排氣裝置丨丨之排氣能力調節為進行 冷卻換氣等所必需之最小限度之排氣能力，生成氣體或昇 華物等亦不會自各出入口 18洩漏。同樣地，當各出入口 18 均為關閉狀態時，亦可對排氣裝置丨丨之排氣能力進行調 節，以達到使各出入口 18為打開狀態時之排氣裝置丨丨之排 氣能力中之最小排氣能力（上述實施形態中，區域χι之出 入口 18變為打開狀態時之輸出？1)、或者與其同等程度之 139516.doc -19- 201009946 排氣能力。若如上所述來調節排氣裝置u之輸出，則可將 因排氣機構之動作而消耗 【圖式簡單說明】 量抑制在必要最小限度。 圖圖1係表示本發明之-實施形態之熱處理裝置的立體 圖2係圖1之a — a剖面圖； 圖3係圖1之B- B刮面圖； 圖4係表示圖1所示之熱處理裝置之動作之時序圖 圖5係表示熱處理室内之位置與靜壓 _ 關係之圖表；及 圖ό係表示圖丨所示之熱處理裝置 ^ ^ Λ 茭心例之出入口附近 之構造的放大剖面圖。 【主要元件符號說明】 1 熱處理裝置 11 排氣裝置（排氣機構） 13 熱處理室 13a 底面 13b 正面（壁面） 21 排氣口 a，b 期間 χ1 區域（區域A) χ2 區域（區域Β) Χη 區域（區域A、Β) 139536.doc -20·The composition of the state. According to this configuration, it is possible to more reliably prevent the air containing the generated gas or the like from leaking through the inlet and outlet 18. In the above embodiment, an example in which the valve 23 is provided in the pipe 22 connected to the exhaust device , is described. However, the present invention is not limited thereto, and the valve 23 may not be provided. Further, the exhaust device may be one that can adjust the exhaust capability by any method, and a person who can adjust the exhaust capability by controlling the converter can be suitably employed. In the above-described heat treatment apparatus 1, when a plurality of inlets and outlets 18 are provided in a closed state, even if the exhaust device u is in a stopped state, gas bubbles, sublimates, and the like are not leaked from the respective inlets and outlets 18. Further, when each of the inlets and outlets 18 is in a closed state, even if the exhaust gas capacity of the exhaust device is adjusted to the minimum exhaust capacity necessary for cooling and ventilation, gas generation or sublimation is not generated. The entrance and exit 18 leaks. Similarly, when each of the inlets and outlets 18 is in a closed state, the exhaust capability of the exhaust device can be adjusted to achieve the exhaust capability of the exhaust device when the inlets and outlets 18 are in an open state. The minimum exhaust capability (in the above embodiment, the output of the region 18 when the inlet and outlet 18 is in the open state? 1), or the equivalent of the 139516.doc -19-201009946 exhaust capability. When the output of the exhaust unit u is adjusted as described above, the amount of consumption of the exhaust unit can be reduced by the operation of the exhaust unit. Figure 1 is a perspective view of a heat treatment apparatus according to an embodiment of the present invention, and is a cross-sectional view taken along line a-a of Figure 1; Figure 3 is a B-B shave view of Figure 1; Fig. 5 is a diagram showing the relationship between the position of the heat treatment chamber and the static pressure _; and Fig. 5 is an enlarged cross-sectional view showing the structure of the vicinity of the inlet and outlet of the heat treatment apparatus shown in Fig. 。. [Main component symbol description] 1 Heat treatment device 11 Exhaust device (exhaust mechanism) 13 Heat treatment chamber 13a Bottom surface 13b Front surface (wall surface) 21 Exhaust port a, b Period χ1 Area (area A) χ2 Area (area Β) Χη area (Region A, Β) 139536.doc -20·