CN101585665A

CN101585665A - Heat treatment equipment

Info

Publication number: CN101585665A
Application number: CNA2009102034533A
Authority: CN
Inventors: 神田敏朗
Original assignee: Espec Corp
Current assignee: Espec Corp
Priority date: 2008-05-21
Filing date: 2009-05-21
Publication date: 2009-11-25
Anticipated expiration: 2029-05-21
Also published as: JP5518303B2; KR101572012B1; TWI531002B; KR20090121242A; TW201009946A; CN101585665B; JP2009281653A

Abstract

Provided is a heat treatment equipment, in which the produced gas, sublimate and the like in the heat treating can not leakage along with the open and close of a passageway, or the uneven temperature distribution in a heat treating chamber can not be produced. Four top and bottom passageways (18a, 18b, 18c, 18d) are arranged side by side at the front side (13a) of the heat treating chamber (13) of the heat treatment equipment (1). In addition, an exhaust outlet (21) connected with an exhausting equipment (11) is mounted at the bottom face (13a) of the heat treating chamber (13). When the passageways (18c, 18d) arranged at the upper region ( X2) of the exhausting equipment (11) are in the open state, the output thereof is higher than that when the passageways (18a, 18b) arranged at the bottom (13a) side region ( X2) of the heat treating chamber (13) are in the open state. Thereby, when the passageways (18c, 18d) are in the open state, the static pressure of the region (X2) is equal to or less than the external atmosphere pressure (Po), thus preventing the leakage of the air containing the produced gas from.

Description

Thermal treatment unit

Technical field

The present invention relates to be used for the thermal treatment unit of heat treated heating object.

Background technology

At present, disclosed thermal treatment unit is used for the making of the flat-panel monitor (FPD:Flat Panel Display) as liquid-crystal display (LCD:Liquid Crystal Display) and plasma display (PDP:Plasma Display), OLED display etc. in the following patent documentation 1.Thermal treatment unit is to take in the heating object that in advance substrates such as sheet glass (heating object) is applied specific solution and make it heat drying in heating chamber, and is exposed to the device of heat-treating (firing) in the hot blast that imports to the specified temperature in the heating chamber.

Patent documentation 1: No. 2971771 specification sheets of Japanese Patent

The thermal treatment unit of prior art has the opening that is used to pick and place heating object and gap etc., can not become what is called air-tight state completely, thus near the low temperature that more easily forms in described opening and gap.Therefore, follow thermal treatment, near vaporization such as the specific solution that applies on the substrate and the generation gas that produces is cooled opening and gap and solidify forms so-called sublimate.Sublimate is microgranular or tarry, not only has in the thermal treatment unit of pollution to make the problem of the downgrade of heating object, but also has this class problem of external leaks of heat treated device when heating object picks and places.

Usually, thermal treatment unit is set at the higher Clean room of degree of purification etc.Therefore, exist sublimate as the thermal treatment unit of prior art when thermal treatment unit leaks, the degree of purification of Clean room also reduces this class problem.

In view of the above problems, in the above-mentioned patent documentation 1 in the disclosed thermal treatment unit, in order to prevent the air in the thermal treatment unit or to generate gas, and make inboard exhaust laterally, the formation that the static pressure in the thermal treatment unit is reduced from thermal treatment unit to external leaks.In the situation of this structure, this class problem of discharging to the outside from thermal treatment unit for sublimate has certain effect.But, in the thermal treatment unit of prior art, static pressure in the thermal treatment unit there are differences because of the position is different, when therefore the opening that does not have the position of fully reduction to be provided with at static pressure was opened because of picking and placeing of heating object, existence may comprise the air that generates gas or sublimate and leak this class problem from this opening.

In addition, suppose to exist and do not have the fully position of reduction as above-mentioned static pressure, being set at than the highland that air in the thermal treatment unit etc. is discharged in suction during the exhaust capacity of the gas barrier that is provided with, though can prevent to produce the part that the interior static pressure of thermal chamber exceedingly reduces owing to pick and place heating object and open opening and will generate leakage such as gas.Therefore, under the situation that constitutes this structure, when the opening of the exceedingly low part setting of static pressure is opened, exist extraneous air to flow in the thermal chamber, even this class problem of the temperature distributing disproportionation in the thermal treatment unit via this opening.

Summary of the invention

Therefore, the objective of the invention is to, a kind of thermal treatment unit is provided, generation gas that produces along with thermal treatment and sublimate etc. can not produce along with the switching of gangway and leak, or inhomogeneous being difficult to of the temperature distribution in the thermal chamber takes place.

In order to address the above problem, the invention provides a kind of thermal treatment unit, it is characterized in that possessing: the thermal chamber that can take in heating object; Can pick and place a plurality of gangways of heating object with respect to this thermal chamber; Can change the gas barrier that is used for gas is aspirated laterally from the inboard of described thermal chamber the exhaust capacity of discharge, regulate the exhaust capacity of described gas barrier, so that described any one gangway is when being open mode, with the described gangway of static pressure ratio in the described thermal chamber of the gangway adjoining position of this open mode be pressure low (claim 1) before the open mode.

In thermal treatment unit of the present invention, regulate the exhaust capacity of gas barrier, so that with a plurality of gangways that are provided with in the gangway adjoining position that is in open mode, with static pressure ratio in the thermal chamber of the gangway adjoining position that becomes open mode that the static pressure that the gangway is made as before the open mode is low, therefore, even carry out picking and placeing of heating object, also can prevent to generate leakages such as gas and sublimate.

In addition, in the thermal treatment unit of the invention described above, it is desirable to, regulate the exhaust capacity of described gas barrier, so that any one gangway is when being open mode, with static pressure in the described thermal chamber of the gangway adjoining position of this open mode be below the normal atmosphere in the outside of this thermal chamber (claim 2).

Making under the situation of this structure, can further prevent reliably, generating gas and sublimate etc. and leak via the gangway because open the gangway.

In the thermal treatment unit of the invention described above, it is desirable to, have and be used for venting port that gas is discharged to the outside in the thermal chamber, according to the exhaust capacity of the distance adjustment gas barrier of gangway that is in open mode and described venting port.

According to this structure, can with a plurality of gangways that are provided with in the static pressure in the thermal chamber of the gangway adjoining position of open mode be adjusted to and be suitable for further preventing exactly when heating object picks and places, generating the pressure that gas etc. leaks.

In the thermal treatment unit of the invention described above, it is desirable to, have and be used for venting port that gas is discharged to the outside in the thermal chamber, at the near regional A of the described venting port of distance, and described relatively venting port than described regional A away from area B be set side by side with a plurality of gangways, be located at this zone A, the described gangway of B opens and closes with the order of regulation, is that be the exhaust capacity height (claim 4) of the opportunity of open mode as the described gas barrier in the specified time limit of benchmark as the exhaust capacity of the described gas barrier in the specified time limit of benchmark than with the gangway that is disposed at described regional A the opportunity of open mode with the gangway that is disposed at described area B.

In thermal treatment unit of the present invention, because the area B that reaches away from venting port apart from the near regional A of venting port is respectively arranged with the gangway, when gas barrier is moved with identical exhaust capacity, be near static pressure one side of area B and have the trend that becomes higher than near the static pressure the regional A.But, thermal treatment unit of the present invention moves, so that be opportunity of open mode to be that the exhaust capacity of the gas barrier in specified time limit of benchmark becomes than the exhaust capacity height that is the gas barrier in specified time limit of benchmark the opportunity that is open mode with the gangway that is disposed at regional A with the gangway that is disposed at area B.Therefore, even when being open mode in the gangway of area B setting, identical degree in the time of near the gangway static pressure being dropped to be open mode with the gangway that is arranged at regional A.Therefore, according to thermal treatment unit of the present invention,, also can prevent to generate leakages such as gas and sublimate even carry out picking and placeing of heating object via the gangway that is provided with in any one zone of regional A, B.

In addition, in thermal treatment unit of the present invention, because with the gangway that is disposed at area B is opportunity of open mode to be that the exhaust capacity of the gas barrier in specified time limit of benchmark uprises, so can prevent to be disposed at the gangway of regional A when being open mode, near the static pressure the regional A exceedingly forms low pressure.Therefore, in the thermal treatment unit of the present invention, in the time of can preventing to be open mode in the gangway, extraneous air flows in the thermal chamber, produces the inequality of the temperature distribution in the thermal chamber.

At this, be in the trend of side flow upward through being heated as pyritous gas usually.Therefore, in the thermal treatment unit of the invention described above, under the situation that makes the formation of area B opposed area A above being positioned at, suppose in thermal chamber, to become pyritous gas and be in the trend of easily leaking from the area B side.But, as mentioned above, in the thermal treatment unit of the present invention, be that the exhaust capacity of the gas barrier in specified time limit of benchmark is set at than the exhaust capacity height that is the described gas barrier in specified time limit of benchmark the opportunity that is open mode the opportunity that will be open mode with the gangway that is disposed at area B with the gangway that is disposed at described regional A.Therefore, in the thermal treatment unit of the present invention, be positioned at the top even make area B opposed area A, and venting port be arranged on the structure of position of the lower side of thermal treatment unit, also can prevent to generate the leakage of gas etc. reliably.(claim item 5)

In the thermal treatment unit of the invention described above, better is, the exhaust capacity of gas barrier be adjusted in a plurality of gangways any one finish for before the open mode.

According to this structure, be open mode to each gangway before, the static pressure with this gangway adjoining position is reduced, thereby can prevent to generate leakages such as gas and sublimate reliably via the gangway.

In the thermal treatment unit of the invention described above, it is desirable to, be provided with venting port with the wall adjoining position that constitutes thermal chamber and be provided with the gangway, by gas barrier, the gas heat treated outdoor in the described thermal chamber can be discharged (claim item 7) via described venting port.

According to this structure, can further prevent via leakages such as gangway generation gases.

In the thermal treatment unit of the invention described above, it is desirable to, between gangway and thermal chamber, be provided with than the inboard of thermal chamber and the lower area of low pressure (claim 8) of air pressure in the outside.

According to this structure, in the time of can further preventing to open the gangway for heating object picks and places reliably, gas leaks laterally from the thermal chamber inboard.Therefore, according to said structure, can further prevent to comprise the external leaks of the gas heat treated chamber that generates gas reliably.

In addition, according to said structure, can prevent to open because of the gangway, extraneous air flows in the thermal chamber via this gangway.Therefore, according to said structure, can further prevent from reliably to make temperature distribution disorder in the thermal chamber because of side inflow in the thermal chamber lateral such as cryogenic air.

At this, in above-mentioned thermal treatment unit, be under the situation of closing condition, even gas barrier is set at halted state a plurality of gangways that are provided with whole, or, generate gas and sublimate etc. and also can not leak from the gangway with the minimal exhaust capacity exhaust of needs.In addition, if regulate the working order of gas barrier like this, then the energy that the action because of gas barrier can be consumed is suppressed at and needs irreducible minimum.

According to this opinion, in the thermal treatment unit of the invention described above, it is desirable to, regulate the working order of gas barrier, so that whole gangways is when being closing condition, gas barrier becomes extraction flow and is the state of the minimum flow rate of regulation, the state of bringing into play the minimum exhaust capacity in the middle of the exhaust capacity of regulating when open each gangway or any one state (claim item 9) of halted state.

In the thermal treatment unit of the invention described above, it is desirable to, gas barrier is made of fan and umformer, can regulate exhaust capacity by convertor controls.

In thermal treatment unit of the present invention,, thereby can and carry out exhaust with the outside suction of the heat treated chambers such as air that exist in the thermal chamber because gas barrier is made of fan.In addition,, thereby can adopt the umformer that to regulate exhaust capacity aptly, carry out convertor controls owing to gas barrier is made of umformer.

According to the present invention, a kind of thermal treatment unit is provided, be difficult to cause along with the gangway opens and closes, follow the leakage of generation gas that thermal treatment produces and sublimate etc.

Description of drawings

Fig. 1 is the stereographic map of the thermal treatment unit of expression an embodiment of the present invention;

Fig. 2 is the A-A sectional view of Fig. 1;

Fig. 3 is the B-B sectional view of Fig. 1;

Fig. 4 is the time diagram of the work of expression thermal treatment unit shown in Figure 1;

Fig. 5 is the coordinate diagram of the relation of interior position of expression thermal chamber and static pressure;

Fig. 6 is near the amplification profile of the structure the gangway of variation of expression thermal treatment unit shown in Figure 1.

Nomenclature

1 thermal treatment unit

11 gas barrier

12 thermal chambers

The 13a bottom surface

13b front (wall)

21 venting ports

X1 zone (regional A)

X2 zone (area B)

Xn zone (regional A, B)

During a, the b

Embodiment

Below, be elaborated with reference to the thermal treatment unit 1 of accompanying drawing to an embodiment of the present invention.In addition, in the following description, reach the short of explanation especially of front-back direction relation up and down, just the common user mode with the thermal treatment unit of present embodiment is that benchmark describes.That is, in the following description, be meant the position relation of short transverse up and down.In addition, in the following describes, the position of the shifting apparatus side of use, the i.e. face side of thermal treatment unit or shelf when so-called " in front " reach " preceding " be meant the substrate W (tabular body) that picks and places as heating object on thermal treatment unit or shelf (rack).In addition, the position that will " in front " reaches the opposition side (rear side of thermal treatment unit and shelf) of " preceding " is called " lining " or " back ".In addition, in the following explanation, " about " position relation be benchmark with the attitude of observing thermal treatment unit or shelf from face side.

As shown in Figure 1, the main portion of thermal treatment unit 1 is made of thermal treatment unit main body 10.In addition, as shown in Figure 2, thermal treatment unit 1 possesses and is used for carrying out deflated gas barrier 11 from thermal treatment unit main body 10.As shown in Figures 2 and 3, it constitutes thermal treatment unit main body 10: have the space that is surrounded by the wall that thermal insulation is arranged, portion is provided with temperature adjustment portion (temperature regulation section) 12 and thermal chamber 13 within it.

Temperature adjustment portion 12 possesses well heater 16 and fan 17 in inside.Temperature adjustment portion 12 is via strainer 14 and thermal chamber 13 adjacency, and is communicated with thermal chamber 13.Temperature adjustment portion 12 will send into thermal chamber 13 via strainer 14 through the air of heating by making well heater 16 and fan 17 runnings, the room temp of thermal chamber 13 can be heated to specified temperature.

Thermal chamber 13 is the spaces that can be provided as the substrate W of heating object.Thermal chamber 13 in positive 13b (wall) side, be that the left side among Fig. 2, the downside among Fig. 3 have the gangway 18 that is used to pick and place substrate W.Gangway 18 is in the 12 opposed positions with above-mentioned temperature adjustment portion, is arranged on the position, downstream side of the flow direction of the air that blows out from temperature adjustment portion 12.

As shown in Figures 1 and 2, equally spaced be provided with a plurality of (in the present embodiment being 4) gangway 18 with respect to thermal chamber 13 at above-below direction.Illustrate in greater detail, shown in two dot chain line among Fig. 2, the internal space of thermal chamber 13 is assumed to be the bottom surface 13a almost parallel of relatively hot treatment chamber 13, and pass half the imaginary plane P of position of pact of the height of thermal chamber 13, and, be the boundary with this imaginary plane P, be assumed to be regional X1, X2 up and down when (being equivalent to regional A, B respectively), at the regional X1 that is positioned at bottom surface 13a side up and down and have two gangways 18 (below, also be called

gangway

18a, 18b).In addition, the regional X2 above opposed area X1 is positioned at also up and down and have two gangways 18 (below, also be called

gangway

18c, 18d).

On above-mentioned gangway 18a～18d, be separately installed with baffle plate Sn (natural numbers of n=1～4) in the mode that can move independently.Gangway 18a～18d is for by opening baffle plate Sn, uses the shifting apparatus (not shown) that is made of existing known mechanical manipulator etc. can pick and place the state of substrate W to thermal chamber 13.

Substantial middle portion at thermal chamber 13 is provided with the shelf 30 that is used to be provided with substrate W.Shelf 30 constitutes at above-below direction and disposes a plurality of shelves 40 in the mode every parallel at prescribed intervals.The lifting shaft 36 of lifting device (not shown) is installed in the bottom of shelf 30, and by stretching of lifting shaft 36, shelf 30 moves up and down in thermal chamber 13, can regulate the position relation of each gangway 18 and each shelf 40.

13a is provided with venting port 21 in the bottom surface of thermal chamber 13.The positive 13b side that venting port 21 is arranged on thermal chamber 13 is gangway 18 side adjoining positions.Gas barrier 11 is connected with venting port 21 via pipe arrangement 22.Gas barrier 11 can be with outside suction the carrying out exhaust of the heat treated chambers 13 such as air of existence in thermal chamber 13 by existing known fan and pump and transmodulator formations such as (イ Application バ one ).Be provided with valve 23 midway at pipe arrangement 22.

The thermal treatment unit 1 of present embodiment adopt so-called operating line, the shifting apparatus (not shown) of operating line by using mechanical manipulator etc. on the shelf 40 that is configured in the shelfs 30 that are provided with in the thermal chamber 13 and the substrate W that finishes the state of not firing of substrate W that fires and the outside that is in thermal chamber 13 replace, implement firing of substrate W continuously.Below, the action to the thermal treatment unit 1 of present embodiment is described in detail with reference to accompanying drawing.

Thermal treatment unit 1 is fired (thermal treatment) before substrate W's, makes well heater 16 and fan 17 runnings by not shown control device, and hot blast is sent into thermal chamber 13, and with the thermal treatment temp of the temperature regulation in the thermal chamber 13 to regulation.When the atmosphere temperature in the thermal chamber 13 reached the thermal treatment temp (being 230 ℃～250 ℃ in the present embodiment) of regulation, thermal treatment unit 1 was for firing the state of substrate W.

As mentioned above, when the atmosphere temperature of thermal chamber 13 reaches thermal treatment temp, as shown in Figure 4, for picking and placeing of substrate W, the control device of thermal treatment unit 1 (not shown) begins to make the baffle plate Sn (natural numbers of n=1～4) of gangway 18a～18d to open and close from the gangway that is in the below in order.In addition, control device is after cutting out the baffle plate S4 that goes up most, and with described identical, the baffle plate S1 under begins to make each baffle plate Sn to open and close in order.In addition, control device made shelf 30 knee-actions before the opportunity of each baffle plate Sn action, delivered to the shelf 40 that will be used for picking and placeing substrate W to be equivalent to the position that gangway 18a～18d is the gangway of open mode.

Thermal treatment unit 1 via the gangway of the open mode among the 18a～18d of gangway, can pick and place substrate W by the action of baffle plate Sn.When gangway 18a～18d passed through the time of distributing in order to pick and place substrate W, baffle plate Sn moved again, becomes closing condition.Thereafter, next baffle plate Sn action, same as described above, become the state that can pick and place substrate W at specific time.

At this, as mentioned above, in the thermal treatment unit 1 of present embodiment, each gangway 18a～18d begins to open and close from the gangway that is in the below in order.Therefore, with gangway 18a, the 18b that is present in regional X1 among each gangway 18a～18b be open mode opportunity as benchmark set during a and gangway 18c, the 18d that will be present in regional X2 be open mode opportunity as benchmark set during b alternately arrive along with the process of time.In thermal treatment unit 1 by a during above-mentioned and during the output of b conversion gas barrier 11.

Specifically, in the present embodiment, as shown in Figure 4, among each gangway 18a～18d one is provided with few standby time t for the opportunity of open mode with at other gangway 18a～18d before this opportunity between the opportunity of closing condition.In addition, in the present embodiment, after thermal treatment unit 1 starts, will gangway 18b be from opportunity that shifts to an earlier date above-mentioned standby time t opportunity that relative gangway 18a opens at first to regional X1 closing condition during be set at during a.Similarly, for the gangway 18d that promptly is located at regional X2 the opportunity that shifts to an earlier date above-mentioned standby time t opportunity that from the gangway 18a that is relatively arranged on regional X1 is open mode be closing condition opportunity to the gangway 18b of regional X1 be closing condition during, a during also being set at.In addition, will be from the gangway 18c that is located at regional X2 relatively the gangway 18b that promptly is located at regional X1 the opportunity that shifts to an earlier date above-mentioned standby time t opportunity of open mode be closing condition opportunity to the gangway 18d of regional X2 be closing condition during be set at during b.

As shown in Figure 4, thermal treatment unit 1 during a the output of gas barrier 11 be set in p1 move.Thus, as shown in Figure 5, the regional X1 in thermal chamber 13 equates with the external pressure Po of thermal chamber 13 apart from the static pressure of the near position of

gangway

18a, 18b, or is lower than external pressure Po.Therefore, even for the picking and placeing of substrate W,

gangway

18a, 18b are open mode, and comprising the air that generates gas etc. can be from the inboard leakage laterally of thermal chamber 13 yet.In addition, during a, be provided with the static pressure ratio external pressure Po height of the regional X2 of

gangway

18c, 18d, but

gangway

18c, 18d are closing condition.Therefore, in

gangway

18c, 18d, can not cause to comprise the leakage of air that generates gas etc. and the inflow of extraneous gas.

On the other hand, thermal treatment unit 1 during b the output of gas barrier 11 be set in the p2 bigger than the above-mentioned p1 action of going forward side by side do.Thus, as shown in Figure 5, the regional X1 in the thermal chamber 13 not only, even at regional X2, also the external pressure Po with thermal chamber 13 is identical apart from the static pressure of the near position of

gangway

18c, 18d, or is below the external pressure Po.Therefore, though during b for the picking and placeing of substrate W, gangway 18c, 18d are open mode, comprise the air that generates gas etc. and also can not leak laterally from the inboard of thermal chamber 13.In addition, during b, the static pressure with the part of

gangway

18a, 18b adjacency among the regional X1 becomes lower than the external pressure Po of thermal chamber 13, but

gangway

18a, 18b are closing condition.Therefore, during b, extraneous air can be from the interior side inflow of

gangway

18a, 18b heat treated chamber 13, can not cause that the temperature distributing disproportionations in the thermal chamber 13 are even, or not have the position of expecting sublimate generation and adhere to this badness phenomenon.

In the above-described embodiment, regulate the output of gas barrier 11 so that be provided with the static pressure of regional X1, the X2 of the gangway 18 that is in open mode and equate, or be lower than external pressure Po, but the invention is not restricted to this with external pressure Po.Specifically, not only carrying out the static pressure of regional X1, X2 regulates, but also carry out the method for the leakage prevent to generate gas, even at the static pressure of regional X1, X2 is during than the high a little air pressure P1 of external pressure Po, also can prevent to comprise generate gas etc. air under the situation of the leakage of thermal chamber 13, can regulate the output of gas barrier 11 so that be provided with the static pressure of regional X1, the X2 of the gangway 18 that is in open mode and equate with air pressure P1, or lower than it.

In addition, above-mentioned thermal treatment unit 1 is by the exhaust capacity according to the distance adjustment gas barrier 11 that is in the gangway 18 of open mode and venting port 21, not only preventing to comprise the air that generates gas leaks from thermal chamber 13, or extraneous air is flowed in the thermal chamber 13 via gangway 18, and, also can adopt structure as shown in Figure 6 as the method that prevents to generate gas leakage and extraneous air inflow.Specifically, in example shown in Figure 6, be formed with area of low pressure 50 between gangway 18 and thermal chamber 13, the inboard of its static pressure ratio thermal chamber 13 and the air pressure in the outside are low.Illustrate in greater detail, in example shown in Figure 6, with respect to gangway 18 with above and below adjoining position be provided with duct-like area of low pressure 50.Constitute the wall of area of low pressure 50, promptly with opposed 51 of the substrate W that picks and places via gangway 18,52 on, be provided with the opening 53,55 of incision-like.Therefore, under the situation of as shown in Figure 6 structure,, also the gas that will leak laterally from thermal chamber 13 can be reclaimed via opening 53,55 even open gangway 18 for picking and placeing of substrate W, can be to external leaks.In addition,, before arriving thermal chamber 13, also be inhaled into opening 53,55, can not invade thermal chamber 13 for the gas of heat treated chambers 18 13 side inflows from the gangway.Therefore, if in the above-described embodiment on the basis of the adjusting of the exhaust capacity of the gas barrier 11 of explanation, also adopt structure as shown in Figure 6, then can further prevent from reliably to comprise generate gas gas from thermal chamber 13 to external leaks, or extraneous air flows into from the outside in the thermal chamber 13 and makes even this badness phenomenon of temperature distributing disproportionations in the thermal chamber 13.

In the above-described embodiment, distance according to distance venting port 21, zone in the thermal chamber 13 is divided into two zones of regional X1, X2, simultaneously with the gangway 18 that is arranged on each regional X1, X2 be set on opportunity of open mode as benchmark during a, b, a, b during each are regulated the output of gas barrier 11, but the invention is not restricted to this.Specifically, also the zone in the thermal chamber 13 further can be divided into a plurality of regional Xn (natural number that n=3 is above), regulate the output of gas barrier 11, so that the exhaust capacity ratio of the gas barrier 11 when being arranged on the gangway 18 of (regional A) among a plurality of regional Xn and opening is in is lower than the exhaust capacity of the gas barrier 11 of this zone Xn (regional A) when open the gangway 18 of other regional Xn (area B) of venting port 21 positions.Under the situation of this structure, the output of switching gas barrier 11 according to the distance of gangway 18 and venting port 21 more multistagely, and can regulate the static pressure of each regional Xn, leak optimal state to preventing to comprise the air that generates gas from thermal chamber 13 to become.

As mentioned above, at thermal treatment unit 1 for to be provided with gangway 18 at the positive 13b of thermal treatment unit main body 10, be provided with the structure of venting port 21 at adjoining position with it, therefore, can will be drawn into venting port 21 sides to generation gas of external leaks etc. via gangway 18, and can prevent to generate the leakage of gas etc. reliably.In addition, venting port 21 as mentioned above, preferably be arranged on and positive 13b adjoining position, but can be arranged on the central part of the bottom surface 13a of thermal chamber 13 for example and more close slightly near in the position of positive 13b side, the temperature adjustment portion 12, and near suitable position such as the position of temperature adjustment portion 12 sides, the perisporium of thermal chamber 13 than it.In addition, when the position that venting port 21 is arranged on away from positive 13b, also can make and the exhaust inlet mouth is being set, and connect the structure of this exhaust inlet mouth and venting port 21 by pipeline etc. apart from the near position of positive 13b.

Shown in above-mentioned embodiment, in the thermal treatment unit 1, each gangway 18 and regional X1, X2 are arranged side by side at above-below direction, and are provided with venting port 21 in the bottom surface of thermal chamber 13 13a side, therefore, the static pressure that is in the regional X2 of upper side has the higher trend of static pressure than the regional X1 of lower side.In thermal chamber 13, because of air and generate gas and become high temperature through heating, therefore be in the trend of trend upper side, therefore, when the static pressure ratio external pressure Po of regional X2 is high, when

gangway

18c, 18d are open mode, might produce the generation gas leakage, or produce the heat energy leakage with the pyritous air.But, in the thermal treatment unit 1 of present embodiment, when open the gangway 18 that is in the regional A of upper side,, the exhaust capacity of gas barrier 11 is improved compared with the situation that open the gangway 18 of area B.Therefore, as mentioned above, can prevent from reliably to comprise generate gas air from the gangway 18 and regional X1, X2 leak.

In addition, in the above-described embodiment example each gangway 18 of direction (width) expansion to the left and right in above-below direction structure arranged side by side, but the invention is not restricted to this, for example each gangway 18 also can form according to the mode in above-below direction (short transverse) expansion, is respectively in left and right directions structure arranged side by side.For the situation that each gangway 18 is disposed side by side at width, also can with in the above-described embodiment the explanation identical, make in each gangway the one distolateral structure that venting port 21 is set of 18 directions arranged side by side, and, distance setting zone X1, X2 according to distance venting port 21, when open the gangway 18 of regional X2, compare with the situation that open the gangway 18 of regional X1, can improve the exhaust capacity of gas barrier 11.According to such structure, for being provided with the situation of open area to each gangway 18 of short transverse expansion, leak in the outside that also can prevent to comprise the air heat treated chamber 13 that generates gas.

In the above-described embodiment, when opening and closing successively, for becoming closing condition, the gangway 18 of open mode becomes the standby time t that is set with regulation between the open mode to next gangway 18 afterwards at first in each gangway 18.And, is the opportunity of open mode relatively at regional X1,

X2 gangway

18a, 18c, make the benchmark that becomes the exhaust capacity that is used to switch gas barrier 11 during a, b shift to an earlier date the amount of standby time t.Therefore, in thermal treatment unit 1, the static pressure of regional X1, X2 is regulated and can be used till the gangway 18a, the 18c that open at first among regional X1, the X2 be open mode.In addition, in the above-described embodiment, even any one of gangway 18a～18d is under the situation of open mode, standby time t also is consistent, but the invention is not restricted to this, for example can make the structure that changes or be not provided with standby time t as required aptly.

In addition, in the above-described embodiment, utilize standby time t in order to regulate static pressure, but the invention is not restricted to this, each gangway 18a～18d was for opening the structure of state till the static pressure that also can make regional X1, X2 became the value of regulation.According to such structure, can further prevent to comprise the air that generates gas reliably and leak via gangway 18.

In the above-described embodiment example with pipe arrangement 22 that gas barrier 11 is connected in the example of valve 23 is set, but the invention is not restricted to this, also valve 23 can be set.In addition, above-mentioned gas barrier 11 also can be regulated exhaust capacity with any method, but can adopt the method that can regulate exhaust capacity by so-called transmodulator control aptly.

In above-mentioned thermal treatment unit 1, all be under the situation of closing condition in a plurality of gangways 18 that are provided with, even gas barrier 11 is set at halted state, generates gas and sublimate etc. and also can not leak from each gangway 18.In addition, each gangway 18 is under the situation of Close All state, even the exhaust capacity of gas barrier 11 is adjusted in order to cool off needed irreducible minimum such as ventilation, generates gas and sublimate etc. and also can not leak from each gangway 18.Similarly, each gangway 18 all is under the situation of closing condition, also can regulate the exhaust capacity of gas barrier 11, make it to become exhaust capacity minimum in the exhaust capacity of the gas barrier 11 when each gangway 18 is set at open mode (the output p1 the when gangway 18 of regional X1 is for open mode in the above-mentioned embodiment) or with the exhaust capacity of its same degree.Like this, regulate if carry out the output of gas barrier 11, then the energy that the action owing to gas barrier can be consumed is suppressed at the inferior limit that needs.

Claims

1, a kind of thermal treatment unit is characterized in that, possesses:

Can take in the thermal chamber of heating object;

Can pick and place a plurality of gangways of heating object with respect to this thermal chamber;

Can change the gas barrier that is used for gas is aspirated laterally from the inboard of described thermal chamber the exhaust capacity of discharge,

Regulate the exhaust capacity of described gas barrier so that described any one gangway is when being open mode, with the described gangway of static pressure ratio in the described thermal chamber of the gangway adjoining position of this open mode be that pressure before the open mode is low.

2, thermal treatment unit as claimed in claim 1, it is characterized in that, regulate the exhaust capacity of described gas barrier, so that any one gangway is when being open mode, with static pressure in the described thermal chamber of the gangway adjoining position of this open mode be below the normal atmosphere in the outside of this thermal chamber.

3, thermal treatment unit as claimed in claim 1 is characterized in that,

Have and be used for venting port that gas is discharged to the outside in the thermal chamber,

Exhaust capacity according to the distance adjustment gas barrier of gangway that is in open mode and described venting port.

4, thermal treatment unit as claimed in claim 1 is characterized in that,

Apart from the near regional A of described venting port, and described relatively venting port than described regional A away from area B be set side by side with a plurality of gangways, the described gangway of being located at this zone A, B opens and closes with the order of regulation,

Be the exhaust capacity height of the opportunity of open mode as the described gas barrier in the specified time limit of benchmark as the exhaust capacity of the described gas barrier in the specified time limit of benchmark than with the gangway that is disposed at described regional A the opportunity that with the gangway that is disposed at described area B is open mode.

5, thermal treatment unit as claimed in claim 4 is characterized in that,

Area B is positioned at the top with respect to regional A,

Position in the lower side of thermal chamber is provided with venting port.

6, as each described thermal treatment unit in the claim 1～4, it is characterized in that, the exhaust capacity of gas barrier be adjusted in a plurality of gangways any one finish for before the open mode.

7, as each described thermal treatment unit in the claim 1～4, it is characterized in that,

Be provided with venting port with the wall adjoining position that constitutes thermal chamber and be provided with the gangway,

By gas barrier, the gas heat treated outdoor in the described thermal chamber can be discharged via described venting port.

8, as each described thermal treatment unit in the claim 1～4, it is characterized in that, between gangway and thermal chamber, be provided with than the inboard of thermal chamber and the lower area of low pressure of air pressure in the outside.

9, as each described thermal treatment unit in the claim 1～4, it is characterized in that, regulate the working order of gas barrier, so that whole gangways is when being closing condition, gas barrier becomes extraction flow and is the state of the minimum flow rate of regulation, the state of bringing into play the minimum exhaust capacity in the middle of the exhaust capacity of regulating when open each gangway or any one state of halted state.

10, as each described thermal treatment unit in the claim 1～4, it is characterized in that gas barrier is made of fan and umformer, can regulate exhaust capacity by convertor controls.