CN101585665B

CN101585665B - Heat treatment equipment

Info

Publication number: CN101585665B
Application number: CN2009102034533A
Authority: CN
Inventors: 神田敏朗
Original assignee: Espec Corp
Current assignee: Espec Corp
Priority date: 2008-05-21
Filing date: 2009-05-21
Publication date: 2013-12-04
Anticipated expiration: 2029-05-21
Also published as: TWI531002B; JP5518303B2; CN101585665A; JP2009281653A; KR20090121242A; TW201009946A; KR101572012B1

Abstract

Provided is a heat treatment equipment, in which the produced gas, sublimate and the like in the heat treating can not leakage along with the open and close of a passageway, or the uneven temperature distribution in a heat treating chamber can not be produced. Four top and bottom passageways (18a, 18b, 18c, 18d) are arranged side by side at the front side (13a) of the heat treating chamber (13) ofthe heat treatment equipment (1). In addition, an exhaust outlet (21) connected with an exhausting equipment (11) is mounted at the bottom face (13a) of the heat treating chamber (13). When the passa geways (18c, 18d) arranged at the upper region ( X2) of the exhausting equipment (11) are in the open state, the output thereof is higher than that when the passageways (18a, 18b) arranged at the bottom (13a) side region ( X2) of the heat treating chamber (13) are in the open state. Thereby, when the passageways (18c, 18d) are in the open state, the static pressure of the region (X2) is equal to or less than the external atmosphere pressure (Po), thus preventing the leakage of the air containing the produced gas from.

Description

Thermal treatment unit

Technical field

The present invention relates to the thermal treatment unit for the heat treated heating object.

Background technology

At present, in following patent documentation 1 disclosed thermal treatment unit for the making of the flat-panel monitor (FPD:Flat Panel Display) as liquid-crystal display (LCD:Liquid Crystal Display) and plasma display (PDP:Plasma Display), OLED display etc.Thermal treatment unit is for to take in the heating object that in advance substrates such as sheet glass (heating object) is applied to specific solution and make it heat drying in heating chamber, and is exposed to the device of heat-treating (firing) in the hot blast that imports to the specified temperature in heating chamber.

Patent documentation 1: No. 2971771 specification sheets of Japanese Patent

The thermal treatment unit of prior art has opening for picking and placeing heating object and gap etc., can not become what is called air-tight state completely, thus near the low temperature that more easily forms in described opening and gap.Therefore, follow thermal treatment, near the vaporization such as the specific solution applied on substrate and the generation gas that produces is cooled and solidifies opening and gap, form so-called sublimate.Sublimate is microgranular or tarry, not only have to pollute in thermal treatment unit to make the problem of the Quality Down of heating object, but also this class problem is leaked in the outside with heat treated device when heating object picks and places.

Usually, thermal treatment unit is arranged on Clean room that degree of purification is higher etc.Therefore, while existing sublimate to leak from thermal treatment unit as the thermal treatment unit of prior art, the degree of purification of Clean room also reduces this class problem.

In view of the above problems, in above-mentioned patent documentation 1 in disclosed thermal treatment unit, leak to outside in order to prevent the air in thermal treatment unit or to generate gas, and make the inboard exhaust laterally from thermal treatment unit, the formation that the static pressure in thermal treatment unit is reduced.In the situation of this structure, this class problem of discharging from thermal treatment unit to outside for sublimate has certain effect.But, in the thermal treatment unit of prior art, static pressure in thermal treatment unit there are differences because position is different, when the opening that therefore at static pressure, does not have the position of fully reduction to arrange is opened because of picking and placeing of heating object, existence may comprise the air that generates gas or sublimate and leak this class problem from this opening.

In addition, suppose and exist static pressure described above there is no the position fully reduced, when setting the exhaust capacity of the gas barrier arranged in order to aspirate the air of discharging in thermal treatment unit etc. than highland, although can prevent from opening opening and generating the leakage such as gas owing to picking and placeing heating object, can produce the part that the static pressure in thermal chamber exceedingly reduces.Therefore, in the situation that form this structure, at static pressure, when exceedingly the opening of low part setting is opened, exist extraneous air to flow in thermal chamber via this opening, even this class problem of temperature distributing disproportionation in thermal treatment unit.

Summary of the invention

Therefore, the object of the invention is to, a kind of thermal treatment unit is provided, the generation gas produced along with thermal treatment and sublimate etc. can not produce along with the switching of gangway and leak, or inhomogeneous being difficult to of the temperature distribution in thermal chamber occurs.

In order to address the above problem, the invention provides a kind of thermal treatment unit, it is characterized in that possessing: the thermal chamber that can take in heating object; Can pick and place with respect to this thermal chamber a plurality of gangways of heating object; Can change for gas is aspirated laterally to the gas barrier of the exhaust capacity of discharge from the inboard of described thermal chamber, regulate the exhaust capacity of described gas barrier, so that described any one gangway is while being open mode, with the described gangway of static pressure ratio in the described thermal chamber of the gangway adjoining position of this open mode be the pressure low (claim 1) before open mode.

In thermal treatment unit of the present invention, regulate the exhaust capacity of gas barrier, so that the adjoining position of the gangway in open mode in a plurality of gangways with arranging, static pressure gangway is made as before open mode with static pressure ratio in the thermal chamber of the gangway adjoining position that becomes open mode is low, therefore, even carry out picking and placeing of heating object, also can prevent from generating the leakages such as gas and sublimate.

In addition, in the thermal treatment unit of the invention described above, it is desirable to, regulate the exhaust capacity of described gas barrier, so that any one gangway is while being open mode, with below the normal atmosphere in static pressure in the described thermal chamber of the gangway adjoining position of this open mode outside that is this thermal chamber (claim 2).

In the situation that make this structure, can further prevent reliably because open gangway, generate gas and sublimate etc. and leak via gangway.

In the thermal treatment unit of the invention described above, it is desirable to, have for the venting port from discharging to the outside in thermal chamber by gas, according to the exhaust capacity of the distance adjustment gas barrier of the gangway in open mode and described venting port.

According to this structure, the static pressure in the thermal chamber of the gangway adjoining position for open mode in a plurality of gangways with arranging can be adjusted to and be suitable for further preventing exactly generating the pressure that gas etc. leaks when heating object picks and places.

In the thermal treatment unit of the invention described above, it is desirable to, have for the venting port from discharging to the outside in thermal chamber by gas, at the near regional A of the described venting port of distance, and relatively described venting port than described regional A away from regional B be set side by side with a plurality of gangways, be located at this zone A, the described gangway of B is opened and closed with the order of regulation, using opportunity that the gangway that is disposed at described regional B is open mode as the exhaust capacity of the described gas barrier in the specified time limit of benchmark than usining the exhaust capacity high (claim 4) as the described gas barrier in the specified time limit of benchmark on opportunity that the gangway that is disposed at described regional A is open mode.

In thermal treatment unit of the present invention, the regional B reached away from venting port due to the near regional A of distance venting port is respectively arranged with gangway, therefore, while making gas barrier with identical exhaust capacity action, near static pressure one side regional B, have the higher trend than near the static pressure regional A that becomes.But, thermal treatment unit of the present invention is moved, so that take the exhaust capacity of the gas barrier in the specified time limit that opportunity that the gangway that is disposed at regional B is open mode is benchmark, becomes higher than take the exhaust capacity of the gas barrier in the specified time limit that opportunity that the gangway that is disposed at regional A is open mode is benchmark.Therefore, even when the gangway arranged at regional B is open mode, also can make near the static pressure in gangway drop to degree identical while with the gangway that is arranged at regional A, being open mode.Therefore, according to thermal treatment unit of the present invention, even carry out picking and placeing of heating object via the gangway at regional A, any one region division of B, also can prevent from generating the leakages such as gas and sublimate.

In addition, in thermal treatment unit of the present invention, owing to take the exhaust capacity of the gas barrier in the specified time limit that opportunity that the gangway that is disposed at regional B is open mode is benchmark, uprise, so can prevent from being disposed at the gangway of regional A while being open mode, near the static pressure regional A exceedingly forms low pressure.Therefore, in thermal treatment unit of the present invention, in the time of can preventing from being open mode in gangway, extraneous air flows in thermal chamber, produces the inequality of the temperature distribution in thermal chamber.

At this, the gas through being heated as high temperature is in the trend of side flow upward usually.Therefore, in the thermal treatment unit of the invention described above, in the situation that make the formation of regional B opposed area A above being positioned at, suppose to become the trend of gas in easily leaking from regional B side of high temperature in thermal chamber.But, as mentioned above, in thermal treatment unit of the present invention, the exhaust capacity of the gas barrier in the specified time limit that opportunity that the gangway that is disposed at regional B is open mode is benchmark of take is set as higher than take the exhaust capacity of the described gas barrier in the specified time limit that opportunity that the gangway that is disposed at described regional A is open mode is benchmark.Therefore, in thermal treatment unit of the present invention, be positioned at top even make regional B opposed area A, and venting port be arranged on to the structure of position of the lower side of thermal treatment unit, also can prevent from reliably generating the leakage of gas etc.(claim 5)

In the thermal treatment unit of the invention described above, more preferably, the exhaust capacity of gas barrier be adjusted in a plurality of gangways any one for before open mode, complete.

According to this structure, before being open mode to each gangway, make to reduce with the static pressure of this gangway adjoining position, thereby can prevent from reliably generating via gangway the leakages such as gas and sublimate.

In the thermal treatment unit of the invention described above, it is desirable to, be provided with venting port at the wall adjoining position with forming thermal chamber and being provided with gangway, by gas barrier, via described venting port, the gas heat treated outdoor in described thermal chamber can be discharged to (claim 7).

According to this structure, can further prevent from generating via gangway the leakages such as gas.

In the thermal treatment unit of the invention described above, it is desirable to, be provided with the area of low pressure (claim 8) lower than the air pressure in the inboard of thermal chamber and the outside between gangway and thermal chamber.

According to this structure, in the time of can further preventing from reliably opening gangway for heating object picks and places, gas leaks laterally from the thermal chamber inboard.Therefore, according to said structure, leak the outside that can further prevent from reliably comprising the gas heat treated chamber that generates gas.

In addition, according to said structure, can prevent from opening because of gangway, extraneous air flows in thermal chamber via this gangway.Therefore, according to said structure, can further prevent reliably that air because of low temperature etc. from making the temperature distribution disorder in thermal chamber from side inflow in the thermal chamber lateral.

At this, in above-mentioned thermal treatment unit, in the situation that the whole of a plurality of gangways that arrange are closing condition, even gas barrier is set as to halted state, or, with the minimal exhaust capacity exhaust of needs, generate gas and sublimate etc. and also can not leak from gangway.In addition, if regulate like this working order of gas barrier, the Energy suppression that action because of gas barrier can be consumed is in needs irreducible minimum.

According to this opinion, in the thermal treatment unit of the invention described above, it is desirable to, regulate the working order of gas barrier, so that whole gangways is while being closing condition, gas barrier becomes state that extraction flow is the minimum flow rate of regulation, bring into play the state of the minimum exhaust capacity in the middle of the exhaust capacity of regulating when open each gangway or any one state (claim 9) of halted state.

In the thermal treatment unit of the invention described above, it is desirable to, gas barrier consists of fan and umformer, by convertor controls, can regulate exhaust capacity.

In thermal treatment unit of the present invention, because gas barrier consists of fan, thereby the outside of the heat treated chambers such as air that exist in thermal chamber can be aspirated and carries out exhaust.In addition, because gas barrier consists of umformer, thereby can adopt aptly the umformer that can regulate exhaust capacity, carry out convertor controls.

According to the present invention, a kind of thermal treatment unit is provided, be difficult to cause along with gangway opens and closes the leakage of the generation gas of following thermal treatment to produce and sublimate etc.

The accompanying drawing explanation

Fig. 1 means the stereographic map of the thermal treatment unit of an embodiment of the present invention;

Fig. 2 is the A-A sectional view of Fig. 1;

Fig. 3 is the B-B sectional view of Fig. 1;

Fig. 4 means the time diagram of the work of the thermal treatment unit shown in Fig. 1;

Fig. 5 means the coordinate diagram of the relation of position in thermal chamber and static pressure;

Fig. 6 means near the amplification profile of the structure gangway of variation of the thermal treatment unit shown in Fig. 1.

Nomenclature

1 thermal treatment unit

11 gas barrier

12 thermal chambers

The 13a bottom surface

13b positive (wall)

21 venting ports

X1 zone (regional A)

X2 zone (regional B)

Xn zone (regional A, B)

During a, b

Embodiment

Below, the thermal treatment unit 1 with reference to accompanying drawing to an embodiment of the present invention is elaborated.In addition, in the following description, the position relationship before and after reaching up and down is as long as no explanation especially, and the common use state of thermal treatment unit of present embodiment of just take describes as benchmark.That is, in the following description, refer to up and down the position relationship of short transverse.In addition, in the following describes, the position of the shifting apparatus side of use, the i.e. face side of thermal treatment unit or shelf when so-called " in front " reach " front " refer to the substrate W (tabular body) picked and placeed as heating object on thermal treatment unit or shelf (rack).In addition, the position that will " in front " reaches the opposition side (rear side of thermal treatment unit and shelf) of " front " is called " inner " or " afterwards ".In addition, in following explanation, it is benchmark that the position relationship of " left and right " be take from the attitude of face side observation thermal treatment unit or shelf.

As shown in Figure 1, the main section of thermal treatment unit 1 consists of thermal treatment unit main body 10.In addition, as shown in Figure 2, thermal treatment unit 1 possesses for carry out the gas barrier 11 of exhaust from thermal treatment unit main body 10.As shown in Figures 2 and 3, it is configured to thermal treatment unit main body 10: have the space surrounded by the wall that thermal insulation is arranged, section is provided with temperature adjustment section (temperature regulation section) 12 and thermal chamber 13 within it.

Temperature adjustment section 12 possesses well heater 16 and fan 17 in inside.Temperature adjustment section 12 is via strainer 14 and thermal chamber 13 adjacency, and is communicated with thermal chamber 13.Temperature adjustment section 12, by making well heater 16 and fan 17 runnings, will send into thermal chamber 13 via strainer 14 through the air of heating, the room temp of thermal chamber 13 can be heated to specified temperature.

Thermal chamber 13 is the spaces that can be provided as the substrate W of heating object.Thermal chamber 13 in positive 13b (wall) side, be that the left side in Fig. 2, the downside in Fig. 3 have the gangway 18 for picking and placeing substrate W.Gangway 18, in the opposed position of temperature adjustment section 12 with above-mentioned, is arranged on the position, downstream side of the flow direction of the air blown out from temperature adjustment section 12.

As shown in Figures 1 and 2, equally spaced be provided with a plurality of (in present embodiment being 4) gangway 18 with respect to thermal chamber 13 at above-below direction.Illustrate in greater detail, as shown in two dot chain line in Fig. 2, the internal space of thermal chamber 13 is assumed to be to the bottom surface 13a almost parallel of relatively hot treatment chamber 13, and through half the imaginary plane P of position of the pact of the height of thermal chamber 13, and this imaginary plane P of take is boundary, be assumed to be up and down regional X1, X2 when (being equivalent to respectively regional A, B), at the regional X1 that is positioned at bottom surface 13a side up and down and have two gangways 18 (below, also be called

gangway

18a, 18b).In addition, the regional X2 above opposed area X1 is positioned at also up and down and have two gangways 18 (below, also be called

gangway

18c, 18d).

Be separately installed with baffle plate Sn (natural numbers of n=1～4) in the mode that can move independently on above-mentioned gangway 18a～18d.Gangway 18a～18d is for by opening baffle plate Sn, uses the shifting apparatus (not shown) consisted of existing known mechanical manipulator etc. can pick and place to thermal chamber 13 state of substrate W.

Substantial middle section at thermal chamber 13 is provided with the shelf 30 for substrate W is set.Shelf 30 is configured at above-below direction and configures a plurality of shelves 40 in the interval mode side by side every regulation.The lifting shaft 36 of lifting device (not shown) is installed in the bottom of shelf 30, and by stretching of lifting shaft 36, shelf 30 moves up and down in thermal chamber 13, can regulate the position relationship of each gangway 18 and each shelf 40.

In the bottom surface of

thermal chamber

13,13a is provided with venting port 21.It is gangway 18 side adjoining positions that venting port 21 is arranged on the positive 13b side of thermal chamber 13.Gas barrier 11 is connected with venting port 21 via pipe arrangement 22.Gas barrier 11, by formations such as existing known fan and pump and transmodulators (イ Application バ mono-タ), can carry out exhaust by the suction of the outside of the heat treated chambers 13 such as air in thermal chamber 13 interior existence.Be provided with valve 23 midway at pipe arrangement 22.

The thermal treatment unit 1 of present embodiment adopt so-called operating line, the shifting apparatus (not shown) of operating line by using mechanical manipulator etc. on the shelf 40 of the shelf 30 that is configured in thermal chamber 13 interior settings and the substrate W that completes the state of not firing of the substrate W that fires and the outside in thermal chamber 13 replace, implement continuously firing of substrate W.Below, the action with reference to accompanying drawing to the thermal treatment unit 1 of present embodiment is described in detail.

Thermal treatment unit 1 is fired (thermal treatment) before substrate W's, by not shown control device, makes well heater 16 and fan 17 runnings, and hot blast is sent into to thermal chamber 13, and the thermal treatment temp that the temperature regulation in thermal chamber 13 is extremely stipulated.When the atmosphere temperature in thermal chamber 13 reaches the thermal treatment temp (being 230 ℃～250 ℃ in present embodiment) of regulation, thermal treatment unit 1 is for firing the state of substrate W.

As mentioned above, when the atmosphere temperature of thermal chamber 13 reaches thermal treatment temp, as shown in Figure 4, for picking and placeing of substrate W, the control device of thermal treatment unit 1 (not shown) starts to make the baffle plate Sn (natural numbers of n=1～4) of gangway 18a～18d to be opened and closed in order from the gangway in below.In addition, control device is after cutting out the baffle plate S4 gone up most, and with described identical, the baffle plate S1 from starts to make each baffle plate Sn to be opened and closed in order.In addition, control device, before the opportunity of each baffle plate Sn action, makes shelf 30 knee-actions, take and will deliver to the position that is equivalent to the gangway that gangway 18a～18d is open mode for the shelf 40 that picks and places substrate W.

Thermal treatment unit 1, by the action of baffle plate Sn, via the gangway of the open mode in the 18a～18d of gangway, can pick and place substrate W.When gangway 18a～18d passes through the time of distributing in order to pick and place substrate W, baffle plate Sn moves again, becomes closing condition.Thereafter, next baffle plate Sn action, same as described above, become the state that can pick and place substrate W at specific time.

At this, as mentioned above, in the thermal treatment unit 1 of present embodiment, each gangway 18a～18d starts to be opened and closed from the gangway in below in order.Therefore, using in the 18a～18b of each gangway set as benchmark on opportunity that the gangway 18a, the 18b that are present in regional X1 be open mode during a and being present in set as benchmark on opportunity that gangway 18c, the 18d of regional X2 are open mode during b along with the process of time, alternately arrive.In thermal treatment unit 1 by a during above-mentioned and during the output of b conversion gas barrier 11.

Specifically, in the present embodiment, as shown in Figure 4, in the 18a～18d of each gangway one for arranging few standby time t between the opportunity of open mode and other gangway 18a～18d is closing condition before this opportunity opportunity.In addition, in the present embodiment, after thermal treatment unit 1 starts, the opportunity that shifts to an earlier date above-mentioned standby time t opportunity that will open at first from relative gangway 18a is to a during being set as during the gangway 18b of regional X1 is closing condition.Similarly, during be closing condition to the gangway 18b of regional X1 the opportunity that the gangway 18d that is located at regional X2 the opportunity that shifts to an earlier date above-mentioned standby time t opportunity that is open mode for the gangway 18a from being relatively arranged on regional X1 is closing condition, a during also being set as.The opportunity that the gangway 18b that is located at regional X1 the opportunity that shifts to an earlier date above-mentioned standby time t opportunity that will be open mode from the gangway 18c that relatively is located at regional X2 in addition, is closing condition is to b during being set as during the gangway 18d of regional X2 is closing condition.

As shown in Figure 4, thermal treatment unit 1 during a the output of gas barrier 11 be set in to p1 moved.Thus, as shown in Figure 5, the regional X1 in thermal chamber 13, apart from

gangway

18a, 18b, the static pressure of near position equates with the external pressure Po of thermal chamber 13, or lower than external pressure Po.Therefore, even for the picking and placeing of substrate W,

gangway

18a, 18b are open mode, and comprising the air that generates gas etc. can be from the inboard leakage laterally of thermal chamber 13 yet.In addition, during a, the static pressure ratio external pressure Po of regional X2 that is provided with

gangway

18c, 18d is high, but

gangway

18c, 18d are closing condition.Therefore, in

gangway

18c, 18d, can not cause the leakage that comprises the air that generates gas etc. and the inflow of extraneous gas.

On the other hand, thermal treatment unit 1 during b the output of gas barrier 11 be set in to the p2 larger than the above-mentioned p1 action of going forward side by side do.Thus, as shown in Figure 5, the regional X1 in thermal chamber 13 not only, even at regional X2, apart from

gangway

18c, 18d, the static pressure of near position is also identical with the external pressure Po of thermal chamber 13, or is below external pressure Po.Therefore, though during b for the picking and placeing of substrate W, gangway 18c, 18d are open mode, comprise the air that generates gas etc. and also can not leak laterally from the inboard of thermal chamber 13.In addition, during b, become lower than the external pressure Po of thermal chamber 13 with the static pressure of the part of

gangway

18a, 18b adjacency in regional X1, but

gangway

18a, 18b are closing condition.Therefore, during b, extraneous air can be from the interior side inflow of

gangway

18a, 18b heat treated chamber 13, can not cause that the temperature distributing disproportionation in thermal chamber 13 is even, or not have the position of expecting sublimate generation and adhere to this badness phenomenon.

In the above-described embodiment, regulate the output of gas barrier 11 so that be provided with the static pressure of regional X1, the X2 of the gangway 18 in open mode and equate with external pressure Po, or lower than external pressure Po, but the invention is not restricted to this.Specifically, not only carrying out the static pressure of regional X1, X2 regulates, but also carry out the method for the leakage prevent from generating gas, when even the static pressure of regional X1, X2 is the air pressure P1 higher a little than external pressure Po, also can prevent from comprising generate gas etc. air from the situation of the leakage of thermal chamber 13, can regulate the output of gas barrier 11 so that be provided with the static pressure of regional X1, the X2 of the gangway 18 in open mode and equate with air pressure P1, or lower than it.

In addition, above-mentioned thermal treatment unit 1 is by the exhaust capacity of the distance adjustment gas barrier 11 of the gangway 18 according in open mode and venting port 21, not only preventing from comprising the air that generates gas leaks from thermal chamber 13, or via gangway 18, extraneous air is flowed in thermal chamber 13, and, as the method that prevents from generating gas leakage and extraneous air inflow, also can adopt structure as shown in Figure 6.Specifically, in the example shown in Fig. 6, between gangway 18 and thermal chamber 13, be formed with area of low pressure 50, the inboard of its static pressure ratio thermal chamber 13 and the air pressure in the outside are low.Illustrate in greater detail, in the example shown in Fig. 6, with respect to gangway 18 with above and below adjoining position be provided with duct-like area of low pressure 50.Form the wall of area of low pressure 50, with opposed 51 of the substrate W picked and placeed via gangway 18,52 on, be provided with the opening 53,55 of incision-like.Therefore, in the situation that structure as shown in Figure 6, even open gangway 18 for picking and placeing of substrate W, also can reclaim the gas that will leak laterally from thermal chamber 13 via opening 53,55, can not leak to outside.In addition, for the gas of 18 heat treated chamber 13 side inflows from gangway, before arriving thermal chamber 13, also be inhaled into opening 53,55, can not invade thermal chamber 13.Therefore, if in the above-described embodiment on the basis of the adjusting of the exhaust capacity of the gas barrier 11 of explanation, also adopt structure as shown in Figure 6, can further prevent from reliably comprising the gas that generates gas and leak from thermal chamber 13 to outside, or extraneous air flows into from outside in thermal chamber 13 and makes even this badness phenomenon of temperature distributing disproportionation in thermal chamber 13.

In the above-described embodiment, distance according to distance venting port 21, zone in thermal chamber 13 is divided into to regional X1, X2 Two Areas, using simultaneously set as benchmark on opportunity that the gangway 18 that is arranged on each regional X1, X2 is open mode during a, b, a, b during each are regulated to the output of gas barrier 11, but the invention is not restricted to this.Specifically, can be also a plurality of regional Xn (natural number that n=3 is above) by the regional Further Division in thermal chamber 13, regulate the output of gas barrier 11, so that the exhaust capacity of the gas barrier 11 when being arranged on the gangway 18 of (regional A) in a plurality of regional Xn and opening is lower than the exhaust capacity of the gas barrier 11 when opening further from the gangway 18 of other regional Xn (regional B) of venting port 21 positions than this zone Xn (regional A).In the situation that this structure, according to more multistage the output of switching gas barrier 11 of the distance of gangway 18 and venting port 21, and can regulate the static pressure of each regional Xn, to become, to preventing from comprising the air that generates gas, from thermal chamber 13, leak optimal state.

As mentioned above, at thermal treatment unit 1 at the positive 13b of thermal treatment unit main body 10, to be provided with gangway 18, be provided with the structure of venting port 21 at adjoining position with it, therefore, the generation gas that can will leak to outside via gangway 18 etc. is drawn into venting port 21 sides, can prevent from reliably generating the leakage of gas etc.In addition, venting port 21 as mentioned above, preferably be arranged on and positive 13b adjoining position, but can be arranged on such as the central part of the bottom surface 13a of thermal chamber 13 and more close slightly near in the position of positive 13b side, temperature adjustment section 12, and near the position of temperature adjustment section 12 sides, the suitable positions such as perisporium of thermal chamber 13 than it.In addition, when position venting port 21 is arranged on away from positive 13b, also can make, apart from the near position of positive 13b, the exhaust inlet mouth is being set, and connect the structure of this exhaust inlet mouth and venting port 21 by pipeline etc.

As shown in above-mentioned embodiment, in thermal treatment unit 1, each gangway 18 and regional X1, X2 are arranged side by side at above-below direction, and are provided with venting port 21 in the bottom surface of thermal chamber 13 13a side, therefore, the static pressure that is in the regional X2 of upper side has the trend higher than the static pressure of the regional X1 of lower side.In thermal chamber 13, because of air and generate gas and become high temperature through heating, therefore in tending to the trend of upper side, therefore, when the static pressure ratio external pressure Po of regional X2 is high, when

gangway

18c, 18d are open mode, likely produce to generate gas leakage, or with produce heat energy together with the air of high temperature and leak.But, in the thermal treatment unit 1 of present embodiment, when open the gangway 18 of the regional A in upper side, situation about opening compared with the gangway 18 of regional B, can make the exhaust capacity of gas barrier 11 improve.Therefore, as mentioned above, can prevent from reliably comprising generate gas air from gangway 18 and regional X1, X2 leak.

In addition, in the above-described embodiment example each gangway 18 structure arranged side by side at above-below direction of direction (width) expansion to the left and right, but the invention is not restricted to this, for example each gangway 18 also can form according to the mode in above-below direction (short transverse) expansion, is respectively the structure arranged side by side at left and right directions.For the situation that each gangway 18 is configured side by side at width, also can with in the above-described embodiment the explanation identical, make in each gangway the one distolateral structure that venting port 21 is set of 18 directions arranged side by side, and, according to distance venting port 21 apart from setting regions X1, X2, when open the gangway 18 of regional X2, with the situation that open the gangway 18 of regional X1, compare, can improve the exhaust capacity of gas barrier 11.According to such structure, for being provided with the situation of open area to each gangway 18 of short transverse expansion, leak in the outside that also can prevent from comprising the air heat treated chamber 13 that generates gas.

In the above-described embodiment, while opening and closing successively in each gangway 18, for becoming closing condition, the gangway 18 of open mode becomes between open mode to next gangway 18 the standby time t that is set with regulation afterwards at first.And, the opportunity that is relatively open mode at regional X1,

X2 gangway

18a, 18c, make to become the exhaust capacity for switching gas barrier 11 benchmark during a, b shift to an earlier date the amount of standby time t.Therefore, in thermal treatment unit 1, till the static pressure of regional X1, X2 is regulated and can be used the gangway 18a, the 18c that open at first in regional X1, X2 and be open mode.In addition, in the above-described embodiment, even in the situation that any one of gangway 18a～18d is open mode, standby time t is also consistent, but the invention is not restricted to this, for example can make the structure that changes or do not arrange aptly as required standby time t.

In addition, in the above-described embodiment, utilize standby time t for regulating static, but the invention is not restricted to this, till the static pressure that also can make regional X1, X2 becomes the value of regulation, each gangway 18a～18d is for opening the structure of state.According to such structure, can further prevent from reliably comprising the air that generates gas and leak via gangway 18.

In the above-described embodiment example in the pipe arrangement 22 be connected with gas barrier 11, the example of valve 23 is set, but the invention is not restricted to this, also valve 23 can be set.In addition, above-mentioned gas barrier 11 also can be regulated exhaust capacity by any method, but can adopt aptly the method that can regulate exhaust capacity by so-called transmodulator control.

In above-mentioned thermal treatment unit 1, in the situation that a plurality of gangways 18 that arrange are all closing condition, even gas barrier 11 is set as to halted state, generates gas and sublimate etc. and also can not leak from each gangway 18.In addition, in the situation that each gangway 18 is the Close All state, even the exhaust capacity of gas barrier 11 is adjusted to for needed irreducible minimums such as cooling ventilations, generates gas and sublimate etc. and also can not leak from each gangway 18.Similarly, each gangway 18 is all in the situation of closing condition, also can regulate the exhaust capacity of gas barrier 11, make it to become exhaust capacity minimum in the exhaust capacity of the gas barrier 11 when each gangway 18 is set as to open mode (output p1 when in above-mentioned embodiment, the gangway 18 of regional X1 is for open mode) or with the exhaust capacity of its same degree.Like this, if carry out the output of gas barrier 11, regulate, the Energy suppression that action due to gas barrier can be consumed is in the inferior limit of needs.

Claims

1. a thermal treatment unit is characterized in that possessing:

Can take in the thermal chamber of heating object;

Can pick and place with respect to this thermal chamber a plurality of gangways of heating object;

Can change for gas is aspirated laterally to the gas barrier of the exhaust capacity of discharge from the inboard of described thermal chamber,

Described gas barrier is to improve exhaust capacity, so that described any one gangway is while being open mode, with the described gangway of static pressure ratio in the described thermal chamber of the gangway adjoining position of this open mode be the gas barrier that pressure before open mode is low.

2. thermal treatment unit as claimed in claim 1, it is characterized in that, regulate the exhaust capacity of described gas barrier, so that any one gangway is while being open mode, below the normal atmosphere in static pressure in the described thermal chamber of the gangway adjoining position of this open mode outside that is this thermal chamber.

3. thermal treatment unit as claimed in claim 1, is characterized in that,

Have for the venting port from discharging to the outside in thermal chamber by gas,

Exhaust capacity according to the distance adjustment gas barrier of the gangway in open mode and described venting port.

4. thermal treatment unit as claimed in claim 1, is characterized in that,

Apart from the near regional A of described venting port, and relatively described venting port than described regional A away from regional B be set side by side with a plurality of gangways, the described gangway of being located at this zone A, B is opened and closed with the order of regulation,

Adjusted, the opportunity that the gangway that makes to be disposed at described regional B is open mode is higher as the exhaust capacity of the described gas barrier in the specified time limit of benchmark than usining the opportunity that the gangway that is disposed at described regional A is open mode as the exhaust capacity of the described gas barrier in the specified time limit of benchmark.

5. thermal treatment unit as claimed in claim 4, is characterized in that,

Zone B is positioned at top with respect to regional A,

Position in the lower side of thermal chamber is provided with venting port.

6. thermal treatment unit as described as any one in claim 1～4, is characterized in that, the exhaust capacity of gas barrier be adjusted in a plurality of gangways any one for before open mode, complete.

7. thermal treatment unit as described as any one in claim 1～4, is characterized in that,

Be provided with venting port at the wall adjoining position with forming thermal chamber and being provided with gangway,

By gas barrier, via described venting port, the gas heat treated outdoor in described thermal chamber can be discharged.

8. thermal treatment unit as described as any one in claim 1～4, is characterized in that, is provided with the area of low pressure lower than the air pressure in the inboard of thermal chamber and the outside between gangway and thermal chamber.

9. thermal treatment unit as described as any one in claim 1～4, it is characterized in that, regulate the working order of gas barrier, so that whole gangways is while being closing condition, gas barrier becomes state that extraction flow is the minimum flow rate of regulation, bring into play the state of the minimum exhaust capacity in the middle of the exhaust capacity of regulating when open each gangway or any one state of halted state.

10. thermal treatment unit as described as any one in claim 1～4, is characterized in that, gas barrier consists of fan and umformer, by convertor controls, can regulate exhaust capacity.