TW200940652A - Resin composition for lens and cured product thereof - Google Patents

Resin composition for lens and cured product thereof Download PDF

Info

Publication number
TW200940652A
TW200940652A TW097148249A TW97148249A TW200940652A TW 200940652 A TW200940652 A TW 200940652A TW 097148249 A TW097148249 A TW 097148249A TW 97148249 A TW97148249 A TW 97148249A TW 200940652 A TW200940652 A TW 200940652A
Authority
TW
Taiwan
Prior art keywords
component
resin composition
lens
molecule
resin
Prior art date
Application number
TW097148249A
Other languages
English (en)
Inventor
Keiichi Hayashi
Toshihiro Kawatani
Original Assignee
Nippon Steel Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Chemical Co filed Critical Nippon Steel Chemical Co
Publication of TW200940652A publication Critical patent/TW200940652A/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/062—Copolymers with monomers not covered by C08L33/06
    • C08L33/064—Copolymers with monomers not covered by C08L33/06 containing anhydride, COOH or COOM groups, with M being metal or onium-cation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Silicon Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW097148249A 2007-12-26 2008-12-11 Resin composition for lens and cured product thereof TW200940652A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007334601A JP2009155442A (ja) 2007-12-26 2007-12-26 レンズ用樹脂組成物及びその硬化物

Publications (1)

Publication Number Publication Date
TW200940652A true TW200940652A (en) 2009-10-01

Family

ID=40826948

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097148249A TW200940652A (en) 2007-12-26 2008-12-11 Resin composition for lens and cured product thereof

Country Status (4)

Country Link
JP (1) JP2009155442A (zh)
KR (1) KR20090071394A (zh)
CN (1) CN101469135B (zh)
TW (1) TW200940652A (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2479209A1 (en) 2009-09-18 2012-07-25 Nippon Shokubai Co., Ltd. Process for production of cured molded article, and cured molded article
CN102971383B (zh) * 2010-06-11 2014-11-12 株式会社艾迪科 含硅固化性组合物、该含硅固化性组合物的固化物及由该含硅固化性组合物形成的引线框基板
CN104136943A (zh) * 2012-02-24 2014-11-05 松下电器产业株式会社 透镜、复合透镜、更换镜头以及摄像装置
US9346954B2 (en) 2012-09-14 2016-05-24 The Yokohama Rubber Co., Ltd. Curable resin composition
CN105814155A (zh) * 2013-12-09 2016-07-27 3M创新有限公司 可固化倍半硅氧烷聚合物、组合物、制品和方法
CN105646458A (zh) * 2014-11-13 2016-06-08 上海和辉光电有限公司 一种化合物及其制备方法和应用
JP6622171B2 (ja) * 2016-11-08 2019-12-18 信越化学工業株式会社 加熱硬化型シリコーン組成物、ダイボンド材及び光半導体装置
WO2021261133A1 (ja) * 2020-06-22 2021-12-30 東亞合成株式会社 光硬化性組成物、その硬化物、及び硬化物の製造方法
EP4251402B1 (en) * 2020-11-30 2024-06-19 Dow Silicones Corporation Hydrosilylation cure inhibitors and use thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1196499B1 (en) * 1999-07-27 2003-08-27 Bausch & Lomb Incorporated Contact lens material
US6730767B2 (en) * 2001-11-02 2004-05-04 Bausch & Lomb Incorporated High refractive index aromatic-based siloxane monofunctional macromonomers
JP4801320B2 (ja) * 2003-12-19 2011-10-26 東レ・ダウコーニング株式会社 付加反応硬化型オルガノポリシロキサン樹脂組成物

Also Published As

Publication number Publication date
JP2009155442A (ja) 2009-07-16
CN101469135A (zh) 2009-07-01
CN101469135B (zh) 2011-11-16
KR20090071394A (ko) 2009-07-01

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