TW200931560A - Normal pressure drying device, substrate processing apparatus and substrate processing method - Google Patents

Abstract

The substrate where the resist liquid is coated with the resist coating unit in the next of the upstream side is possessed on the roller transportation path, and enters in the housing of normal pressure drying unit (VD) by the roller transportation. The substrate that moves on the roller transportation path in the housing is put more greatly than the atmosphere of the normal temperature in the heating atmosphere of the high temperature (60 DEG C for instance). As a result, the thermal energy of the heating atmosphere enters directly into the surface of the resist coating film on the substrate.

Description

200931560 IX. Description of the Invention: The present invention relates to a substrate processing apparatus and a substrate processing method, which are coating films for forming a solvent-containing treatment liquid on a substrate to be processed, and more particularly to use for coating a coating film. A drying device that is moderately dry before the baking step. [Prior Art] Ο

In the manufacture of a liquid crystal display (LCD), if the anti-surname agent is applied to the substrate to be processed (glass substrate) in the lithography step, the residual solvent in the resist is immediately evaporated = heat treatment, that is, pre-bake- When adding the secret unit, the residual solvent in the anti-surname agent on the substrate is fixed from the disk in the environment to reduce the hardened layer on the surface of the anti-coating layer (the seed layer)敎 鳞 scaly, only the surface, touch = top, the heat of the wire is caused by the heat effect, the hair is uneven, there is an anti-film thickness, the problem is not caused, in front, ^ f Under reduced pressure drying method, not only can suppress the main body anti- 2 2 spot, but also make the resist non-solvent 显影 or the thickness of the resist during processing; 厚 y, the piece to the resist The effect of the resolution is improved. The opening = the profit = the load, and the top surface is closed by the top surface of the U-shaped (2) cover which is formed by airtight adhesion or fitting (the upper cavity plate = mounting, ==in; chamber time 'use the upper chamber to use i to open again' in order to load/unload the substrate, so that μ will be protruded: 5 200931560 [Invention] (Invention Solution to the problem) Like the above-mentioned vacuum drying device, in order to increase the degree of decompression to almost absolute, it is necessary to increase the strength of the chamber, increase the size, and the cost is very high. Moreover, since the soil plate is carried out into the cavity In the room, the upper chamber is lifted up and down (opening and closing), so there is various inconveniences in the enlargement of the large size. If the substrate size is such as a glass substrate for LCD, the chamber is significantly larger than 2, and only the chamber is enlarged. The upper chamber is required to have a weight on the two rails, which requires a large amount of damage, which is a dust problem or a safety problem for the operator. / Moreover, the transport robot is also becoming larger and larger, but = level and transport becomes _ After the substrate is transported in the same state as the state, the substrate is carried out into the chamber of the vacuum drying device or loaded/unloaded, and the position of the Nikon is deviated or collided, damaged, etc. It is because the Wei-Wo's substrate is in the form of a film that is transferred from the pedestal, and there is a pin transfer ugly. This is also the point. The more the anti-study agent of Qiu Chun's anti-synthesis agent becomes bigger, the harder it is to keep it. Pressing the environment to be uniform, ^ It is difficult to coat the coated film with a spot-free drying. The invention is based on the problems of the above-mentioned prior art, a ten-pressure drying device, a substrate processing device, and a Futuo; provided on the substrate to be processed. The film of the treatment liquid is not made; the main body of the coating film is coated with a hardened layer to prevent the formation of dry spots on the surface of the liquid film (the problem is solved). In the atmospheric drying apparatus of the present invention, the substrate to be treated having the solvent-containing treatment liquid is transported in the above-mentioned flat flow in the dry processing section, and the processing liquid coating film on the substrate is provided to make the surface layer Energy, the coating film is dried. ... is the lower part of the rut, and the temperature is 6 200931560. The substrate treatment of the present invention occurs, in the direction of transport of the substrate, Su, the atmospheric drying device; coating unit , the adjacent side, the surface of the substrate is flushed with H in the upstream side of the atmospheric pressure dry county; the baking unit is coated on the downstream side of the substrate on the substrate 2 of the substrate; 'Configure the coating liquid containing the solvent on the substrate under normal pressure drying. The f ^ 2 step: the cloth step 'is transported, and in the above-mentioned advection transport, then, the coating film is formed on the road. It is provided that the surface layer portion is heated to be dried on the substrate on the substrate. π flat layer.卩 is the energy of the same temperature, so that the liquid phase diffusion speed of the coating film of the treatment liquid at the normal temperature: the normal dryness is due to ❿. As a result, even if the pressure was dried, the coating film of (4) in the drying method was changed. Further, by the formula, it is possible to achieve a simplified device configuration, miniaturization, cost reduction, etc., and in a preferred embodiment, the drying treatment portion 'has a === on the conveying path. The road moves in a flat flow and uses the above environment to provide heat. Preferably, the housing is provided with a housing that surrounds a predetermined area _ conveying path of the known radiant heat. Further, the guiding person σ' guides the outside air; the exhausting portion is used to discharge oxygen into the casing; and the solvent evaporated from the coating on the substrate is sent to the exhaust portion. In this way, in order to prevent the air from flowing through the solvent venting from the substrate of the substrate I, the coating film on the substrate can be made to prevent the gas from being reduced. It is preferable that the coating film caused by the wind and the film has a temperature higher than the temperature of the heating environment on the road, and the coating film on the substrate is dried with good efficiency, and it is better to listen to the above. Preferably, the substrate is easily absorbed by the substrate and is not absorbed by the material. The wind is blown from above on the coating film on the substrate which is flushed on the surface. ❹ For the heating, the drying portion may have a gas nozzle. , send -= „ good condition, with a temperature adjustment unit, the temperature of the substrate with the advection conveying path is adjusted to a predetermined temperature. For example, the advection conveying path uses the rolling roller to adjust the temperature of the roller. In this case, The temperature is higher than the normal temperature and lower than the temperature of the heating environment. The atmospheric pressure drying device, the substrate processing device, and the substrate processing device of the present invention are processed by the above-mentioned composition and function. The main part of the coating film is kept in a semi-dry state of a moderate liquid t, and the dry plaque is generated or the film quality of the coating film is efficiently improved in the liquid state. BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. Fig. 1 shows a coating and developing treatment system in which one of the atmospheric pressure drying apparatus, the substrate processing apparatus, and the substrate processing method of the present invention can be applied. The coating and developing treatment system 10 is provided in a clean room, for example, a glass substrate as a substrate to be processed, and a series of processes such as cleaning, resist coating, prebaking, development, and post-baking in the lithography step in the LCD manufacturing process. The exposure process is implemented in an external exposure 200931560 optical device 12 adjacent to the system. In the coating and developing treatment system 10, E-box stations (C/S, 14 and interface 20 ΪΐΪ, 14' are placed in the center of the longitudinal direction (X-direction) at the center 3 = 18, and 14' is the system 1埠, with: 盒 台 会 ί ί 至 方向 方向 至 至 至 至 至 至 至 至 至 至 至 至 至 至 至 至 至 至 ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® ® The transport mechanism 22 has a transport arm 22a that can hold the substrate G in an early position, and can operate the substrate G on the X-axis of X, γ, z, and 0, and the adjacent processing station (P/S) 16 The side is delivered. The multi-f=(P/S)16' is a pair of lines A that are arranged in the horizontal system according to the processing flow or the step, and the side f extends in the (X direction) and is reversed in the opposite direction. , B. State, from the E box station (C / S) 14 side to the interface station (I / F) 18 side of the upstream H from the upstream side, along the 帛 1 advection transport path 34, will be moved into the single 224, The processing unit 26, the first heat treatment unit 28, the coating processing unit 30, and the second heat treatment unit 32 are arranged in a line. The M moving unit (10) PASS) 24 is connected to the conveyor of the cassette station (C/S) 14 Substrate G, in the established # Inputs for the first time advected Ϊ portion 26 'conveyance path 34 from the upstream side sequentially quasi sub UV irradiation units 77 (E_UV) 36 and rubbing freshener element (SCR) 38 along first advection. The i-th heat treatment unit 28 is provided with a shaft unit (AD) 4G and a cooling unit (COL) 42 from the upper scale. The coating treatment unit 3 is provided with an anti-(four) coating element (COT) 44 and a normal-pressure drying unit (ν〇) 46 from the top. The second heat treatment unit 32 sequentially sets the rhyme unit (PRB_BAKE) 48 and the cooling unit (C〇L) 5〇 from the upstream side. The end of the meandering flow path 34 located below the first heat treatment crucible 32 is provided with a PASS 52. in. The substrate enthalpy conveyed from the first advancing transport path % is delivered from the end point transfer unit (I > ASS) 52 to the interface station (I/F) i8. On the other hand, the downstream processing line B' from the interface station (I/F) 18 side to the cassette station (c/s) 14 side is arranged in a row from the upstream side along the second advancing conveying path 64. : 200931560 Development unit (DEV) 54, post-drying unit (p〇st_bake) 56, cooling unit ¢01^58, inspection unit (ap) 60, and carry-out unit (〇UT pASS) 62. Here, the flooding unit (POST-BAKE) 56 and the cooling unit (c〇L) 58 constitute the third processing = 66. The carry-out unit (OUT PASS) 62 picks up the processed substrate G from the second advancing transport path 64 one by one, and delivers it to the transport mechanism 22 of the g-cart station (c/s) 14.

Between the two processing lines A and B, an auxiliary transport space 68 is provided, and the substrate G=slice can be placed horizontally by the shuttle mechanism 7G, and the drive mechanism (not shown) moves bidirectionally in the processing line direction (X direction). . Surface station (I/F) 18 having the substrate G on the jth and second advection transport paths

输送 ^ or a transport device 72 that is transported between the adjacent exposure devices 12, and a rotating pedestal _74 and peripheral device % are disposed around the Ϊ ΐΐ 72. The rotation = 4 ' is a pedestal that corrects the rotation in the horizontal plane, and is used to change the orientation of the rectangular substrate G when it is delivered. The peripheral device, such as a printing exposure machine (and the single or weekly light device _ etc. is connected to the second ten-pass conveying path 64. 2 shows the coating development processing system towel 'for all the steps of one substrate G' in the g box In the station (c/s) 14, the transport mechanism 22 removes one substrate G' from the pedestal into the dummy, and removes the substrate 0' from the pedestal and moves the removed substrate 0 to the transfer unit on the processing line A side (IN PASS). 24 (step board G is transferred from the loading unit (m PASS) 24 or put into the first leveling conveyance, and the substrate G' which is buried into the eight-wheel feeding path 34 is initially in the cleaning processing unit 26 depending on the unit (Ε_υν) 36 and wiping cleaning unit (default) 38, cleaning and cleaning cleaning process (steps S2, S3). After rubbing: early morning tl (SCR) 38, for horizontal washing on the advection conveying path 34, The particle-like dirt on the surface of the 板 plate is removed, and the slab is smashed, and the substrate G is dried by a _, ^^ knife 4. The scrub cleaning unit (SCR) 38 is sent to the road 34 G-axis 1 flat flow transmission 200931560 1st heat treatment In Part 28,

The treated surface is hydrophobized by the adhesion treatment of the helium-like HMDS (step S4). After the end of the process, the substrate G is cooled to a predetermined substrate temperature by the cooling unit (c〇L) 42 (step S5). Thereafter, the substrate 下来 is taken down from the first advancing conveying path 34, and is carried into the coating processing unit 30. In the coating treatment unit 30, 'the substrate g is initially maintained in a flat flow on the resist coating sheet'. The resist liquid is applied to the top surface (the surface to be processed) of the substrate by a non-rotation method using a slit nozzle, and is immediately adjacent to the downstream side. The pressure drying unit (VD) 46 receives a resist drying process in a normal pressure environment to be described later (step S6). The substrate G that has left the coating processing unit is removed from the first advancing conveying path 34 and passes through the second heat treatment unit 32. In the second heat treatment unit 32, the substrate G is first subjected to prebaking at the surface = (PRE-BAKE) 48 as a heat treatment after application of the anti-surplus agent or heat treatment before exposure (step S7). By this prebaking, the solvent remaining in the secret film on the substrate G is evaporated to remove the adhesion of the anti-tanning film to the substrate. Next, the base, G is cooled to a predetermined substrate temperature in the cooling unit (C〇L) 5 (step S8). Then, the substrate G is transferred from the first smoothing wheel 34 to the final transfer unit (pA %, returned to the transport unit 72 of the interface station (I/F) 18. ❿ Interface station (I/F) 18 in the 'substrate (3 Accepting, for example, 9 之 in the rotating pedestal 74

11 200931560 Delivery period 1 is applied to a series of developments, such as washing, drying and drying. State = in the second advection conveying path 64, sequentially passing through the third heat treatment jAP) 6G. In the third heat treatment unit 66, the substrate G is initially used as a post-baking for the heat treatment after the development treatment (step S12). This cooling to a predetermined substrate temperature (step is called; = two early 〇 yuan = ί (=: Γ 案 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ 6 The substrate G with the step processing is delivered to the cassette station (c/s) 14 and the delivery is sent to the Lin 22 (four) unit _ paSS) 62 ° where the substrate G is stored in the room - usually The present invention can be applied to the coating, =; 智理部(44, 二48)^^

In Fig. 3, the resist coating unit (COT) 44, and the right wp ^ A ^ block length 3 direction of the substrate G to the back of the secret bond 80 of the base, the dirty chute 84 to re-clear 86 'In the coating process, a predetermined gas (for example, air) is sprayed upward to the injection hole 88, and the gas is ejected from the gas injection holes 88, and the substrate G is floated from the top surface of the pedestal. height. The substrate transport mechanism 82 includes a pair of guide rails 9〇a, _ ΐ movement = a structure 92' along which the guide rails 9a, 雠; a nozzle ( ( nozzle (4) a nozzle 84' can hold the nozzle with the nozzle at the above coating The position of the nozzle can be lifted and lowered, and the nozzle refining unit 86 can be placed in the predetermined position above the floating pedestal 80 to the processing unit 98 to prepare for the coating process. 84 Mouth 84 sprays the anti-surname liquid; The nozzle bath 100 prevents the anti-noise agent nozzle L from being dried and makes the environmental towel mixed with the sputum gas; the nozzle clear ί = 脱 will adhere to the anti- _ _ _ _ _ _ _ _ _ _ _ _ _ _ A resist coating unit (COT) 44 is held by the sigh on the front end side of the floating pedestal 80 and picks up the substrate G. On the floating pedestal 80, bear. The pressure of the gas (air) injected by the hole 88 is maintained in a substantially horizontal posture to maintain the floating sliding mechanism 92 - the surface holding substrate - the surface is oriented toward the normal pressure drying unit) = moving in the conveying direction (X direction), when the substrate G passes the anti-side nozzle The material of the 触 边 边 边 边 边 G G G G G G G G G G G G G G G G 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 2009 RM (Figure 5). Thus, after the substrate G' coated with the resist is also lifted and transported on the floating pedestal 80 by the sliding mechanism 92, if it passes beyond the rear end of the floating pedestal 80, the j-105 is delivered by the delivery and the floating state. The advection is carried into the atmospheric pressure drying unit (VD) 46 in the rear row. The substrate G which has been subjected to the coating treatment is sent to the side of the normal drying unit (VD) 46 as described above, and is returned to the end side of the floating pedestal 80 in order to receive the next substrate G ′ sliding mechanism 92. Further, when the anti-money agent nozzle 84 is subjected to the coating treatment one or more times, it is moved from the application position (the anti-surname discharge position) to the nozzle re-cleaning portion, where the nozzle cleaning or the preliminary injection processing is performed. After clearing or pre-setting, return to the coating position. As shown in FIG. 3, on the extension line (downstream side) of the resist coating unit (c〇T) 44 on the pedestal 8〇, a roll or a section constituting one of the first advection conveying paths 34 (Fig. The conveying path 104. The rolling conveyance path is a roller I for conveying the substrate G in a flat manner. 5 is arranged in the direction of the processing line A (χ direction) at a fixed interval, or through the atmospheric pressure lion (tl) (VD) 46, and continues the heat treatment unit 32 (Fig. 1). As shown in Fig. 4, In the atmospheric drying unit (VD) 46, in the rolling conveyance path 1〇4=set-piece or arrangement of a plurality of sheets for the anti-coating film salt on the rolling conveyance path iG4 on the flat==substrate G The heating/radiation heater for drying of the present invention, for example, a flat-shaped sheathed heater lion. The sheath is provided with two sides (bottom surface), for example, with a ceramic coating, and is energized and heated by a heater power source (10) t. The high-temperature surface radiation = heating around the ▲, forming a relatively normal temperature on the rolling conveyance path 1 〇 4 (usually 干 2 ΐ (preferably 6 吖 or more) of the dry outline like ^ 112. The direction of the transport direction of 112) 3⁄4 U4 'also serves as the entrance and exit of the rolling conveyance path 104. In addition, the two J-directions of the opposite side of the wall of the Fukji sago ancient double body 112 or the σ) are provided for Housing 112 200931560 = indoor exhaust, exhaust port 116. Each of the exhaust ports 116 communicates with the exhaust unit 12B of the exhaust pump or the exhaust fan through the exhaust pipe 118. In this manner, the inside of the casing 112 is introduced into the outside air and the inside of the casing is exhausted, so that the solvent evaporated from the resist coating film RM on the substrate during the drying process is discharged to the outside, and therefore, on the substrate G. The anti-residue coating film RM does not actively impart wind. ❹

In the vertical casing lj2, the rolling conveyance path 1〇4 is preferably a temperature which is adjusted to a temperature lower than the temperature of the drying ring. In the illustrated example, for example, the rolling temperature adjustment unit 122 including the cooling device circulates the inside of each of the rollers 1〇5 in the casing 112 through the pipe 124, and the cooling water is supplied to maintain the temperature of the roller 1〇5. Set the temperature (for example, 3 〇 < t 〜 40 C). In order to flow the cooling water through the roller 105, although the illustration is omitted, the shaft of the roller 105 is hollow to form a fluid passage therein, and the cooling water is introduced into the internal fluid passage from one end of the rolling shaft, and One end is discharged. Further, in comparison with the axis of the roller 105 being directly in contact with the substrate G, it is preferable that a plurality of disc-shaped rollers made of a material having a small thermal conductivity such as a resin are integrally attached to the shaft of the roller, and the outer peripheral surface of the roller is brought into contact. Rolling is performed on the back surface of the substrate G. In Fig. 4, a pre-bake unit (pre-BAKE) 48 is disposed adjacent to the rolling conveyance path 1〇4 and adjacent between the roller 105 and the roller 105, and arranged in the transport direction (χ direction) 1 = or arranged A plurality of sheets, for example, a flat-plate sheathed heater 13G, which is a heater for heat treatment, are disposed. Each sheathed heater 13G' is coated on its surface (lion), and the heat source 132 is energized and heated by the electric power supplied from the cable 134, and the heat radiated from the high temperature surface is supplied to the conveying path at a very close distance. 1'4 on the ^' board G. Further, in the pre-supply unit (PRE-ΒΑΚΕ) 48, the suction top plate (porous plate) 136 is exhausted along the rolling conveyance path 1〇4, for example, by the grille. The row-receiving suction top plate 136' is disposed horizontally from the conveying surface of the rolling conveyance path 104, and is disposed horizontally, and a buffer weir 138 is formed on the back side thereof. The buffer chamber 138, ^ through the exhaust pipe secret (10), to the exhaust pipe of the exhaust or exhaust air = H delivery path 104 from the substrate G on the anti-surname coating film, the strip of agent It is sucked into the exhaust gas together with the surrounding air, and sent to the exhaust portion 142. _ 15 200931560 Further, the roller 105 of the rolling conveyance path 104 is not shown to be attached to a bearing such as a frame such as a frame, and is connected to a conveyance drive source such as an electric motor by a transmission mechanism such as a gear mechanism ===. The k-role mechanism is not only the controller of each of the above-mentioned units (VD) 46 and the pre-supply unit (PRE-BAKE) 48 in the above-mentioned resist coating unit (c〇T) 44, and the control of the controller is shown. . When the controller is composed of a microcomputer, it can be controlled by the whole process of t. The second reading shows the role of the atmospheric drying unit (VD) 46 and BAKE) 48. Early 疋 (PRE — ❹ ❹ As mentioned above, the resist coating unit adjacent to the upstream side (C (xr is the substrate G of the surname liquid, at normal temperature and normal pressure, from the pedestal 8 (^ road to transfer) The load is carried to the rolling conveyance path 104' in the casing 112 of the advection rolling conveyance (VD) 46. The damper is pressed and dried in the casing 112, and is moved on the rolling conveyance path 104 by an advection. The environment is much higher than the temperature of the high temperature, such as _ access, for the anti-coating film on the substrate G, the surface of the heat, the direct heat of the HA. The direct human radiation of the heat, as shown in 0 5, will greatly promote the resist The solvent in the surface layer portion of the coating film RM is mixed from the stage G to the surrounding air, and is sent from the exhaust port 116 to the exhaust portion 12A. On the other hand, the substrate is separated from the bottom surface, that is, the back side. There is also an anti-coating film RM that is added to the substrate G. However, the thermal conductivity of the material is low. Therefore, even if the heating environment is required, the heat can be applied to the inside of the substrate.顶 of the top surface of the substrate = roller 1 () 5 in contact with the back surface of the substrate G is similar to the heating ring g. "Low phase is better than saying that the temperature is close to the normal temperature ( For example, 3〇.〇, therefore, the heat is also small. Thereby, as shown in Fig. 5, in the anti-coating film or the main portion of the intermediate layer, the liquid phase of the solvent diffuses, especially in the direction of volatilization (tens of thousands). The liquid phase is diffused, and the state before being carried into the casing 112 is placed in a normal temperature environment, and there is no major change in the 16 200931560, or only slightly increased in the surface layer of the surface of the surface. Vu, between the velocity vL of the liquid phase diffusion in the main portion of the intermediate layer of the second I j , because vu > Vl === the difference between the growth and the difference, thereby maintaining the liquid to semi-dry state of the main body portion, only The surface layer portion is first dried and hardened. As a result, in the environment of normal pressure, the drying method is a homogenous anti-kneading treatment film. Ο The internal pressure is dried in the hot brother, so that the coating film can be unevenly formed. Dry spots on the abdomen.

The coating film RM causes an undesirable & _ 虞 r; f ^ A degree is, for example, thief or less), then the solvent ^ 细 Ι Ι Γ Γ Γ Γ Γ 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 On the top, production, (4) rf = roller 1G5 temperature adjustment in the vicinity of f temperature or normal temperature on the m send path 104 in a state of advection movement, from the shell drying treatment. After 4 = = = dry single Na 6 dry unit _-_) 48 plus = turn Wei 1L times the brain - lose; f1G4 to New G, if the vine unit _ received radiant heat. Because the rapid 13G causes the _ surface to be transported and moved during the period of the lift; to the degree of rolling on the transport path 104 - to the thief with the suction top plate (3) in the implementation of the service, the face of the _ section, that is, bribe In the sheath 17 200931560, the heat of the heater 130 causes the resist to coat the main portion of the film, but the hardened layer of the surface layer formed by the normal pressure drying treatment in the previous step has a tendency to be suppressed, so that it is not easy in this step. The substrate g which is subjected to the pre-baking treatment by the anti-side coating film generating unit (PRE-BAKE) 48 is subjected to the advection movement of the rolling conveyance path 104 and sent to the cold-side unit adjacent to the downstream side ( COL) 50 (Fig. 1) 〇 _ ❹ ❹ As described above, the flat flow resist processing unit (44, 46, 48) of this embodiment, coating, anti-(four) baking - a series of processing steps _ in the same "IL into the 仃. In this case, the device structure can be greatly simplified, miniaturized, and low-definition drying unit (4) 46 can be used for the anti-residue coating film on the substrate G. Therefore, when the surface of the agent is pre-baked in the step of depressing, not only the flow of the main body is suppressed, but also the occurrence of the spot is caused by the development treatment to reduce the anti-disinfection or

In it, the resist resolution can be improved. Moreover, there is no need to transport the robot, and there is no need for the US plate to deviate or collide with the bending load/unloading, and the J can be prevented from using the support pin. Therefore, in the atmospheric drying unit (VDH6) The inside of the substrate θ has a transfer mark on the resist on the substrate G. Further, the size can be uniformly dried in each part of the substrate, and the substrate can be easily enlarged in accordance with the quality surface. Applying the anti-side liquid on the substrate G in the anti-surname application coating unit (COT) 44, immediately starting the dissolution and diffusion of the natural drying in the anti-surname coating film RM' at normal temperature and normal pressure.雠 雠 ( (continued) In the vacuum drying method, since it takes time to carry the substrate into the vacuum drying apparatus, the anti-side coating film is excessively applied before the start of the drying process, and the drying effect is reduced. In the embodiment, since the substrate is transported from the resist coating (COT) 44 to the atmospheric pressure drying unit (ν〇) 46, the flat flow can be smoothly performed in a short period of time, and therefore, the atmospheric pressure drying unit (VD) is not delayed. 46 drying treatment starts at 200931560 points 'can be stable and sure The effect of modifying the coating film is ensured. This point can also be advantageously adapted to the size of the substrate. The above has been described in terms of preferred embodiments of the present invention, but the present invention is not limited to the above embodiment, and can be carried out within the scope of the technical idea thereof. For example, the mechanism for forming the heating environment HA on the rolling conveyance path 1〇4 in the atmospheric pressure drying unit (VD) 46 is not limited to the heater structure of the above embodiment, and any heater structure may be employed.

One or two substitutions form a heating environment ha on the rolling conveyance path 1〇4, and as shown in FIG. 6, an infrared heater 144 may be disposed above the rolling conveyance path 1〇4, and the correction is performed by using the external line plus correction 144. The substrate G on the transport path 1G4 is irradiated with a predetermined wavelength 'i. That is, it is easily absorbed by the anti-coating film leg and is not easily absorbed by the substrate 波长 wavelength, infrared rays or far infrared rays. In this case, a reflector 146 may be provided for drying the infrared light above the 1=car f infrared heater 144 against the rolling conveyance path; expanding, the liquid to semi-dry state of the main body portion, only the surface layer The first fruit can be used in a normal pressure environment, and the use of decompression drying method: ;; 裒 and the agent coating film RM in a substantially windless state II. The surname of Yi Feng pressure on the road is heated to ^ hot branch and on the blush on the flat flow transport 1 L, can also be used: along the rolling transport Lai 4 above the forest with ί二r upper mouth), fine _ mouth from the top towards the substrate G gives dry _ (four) (10) such as air, gas 19 200931560 .St dry (four) temperature slave temperature heating temperature (for example, 50C or more), for warm air. Of course, the use of the wind: strong and weak is easy to dry on the surface of the anti-money agent coating film RM due to the management of wind speed or wind pressure uniformity. In the gas blowing method, the infrared heating method or the ambient heating method on the advection conveying path can be described as "14", and the illustration may be omitted in the normal pressure drying unit (VD) 46 (PRE-BAKE) 48. In the middle, the rolling conveyor 1G4 = seat. When the floating pedestal is installed in the atmospheric drying unit (10) 46, the heating environment HA of the corpse is taken. In general, it is preferable to adjust the temperature of the upper surface to a moderate temperature of the heating environment HA. Low temperature. ^Inventive miscellaneous test 'Generally applicable to positive side anti-side, but can also be used in negative resist, can also be used in color resist or organic resist, etc. ~ The present invention The substrate to be processed is not limited to the LCD thief substrate, and may be a flat substrate, or a semiconductor wafer, a CD substrate, a photomask, or a printed substrate processing liquid, and is not limited to a reduced ship, and may be, for example, an insulating material or a wiring material. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view showing a configuration of a coating and developing treatment system to which the present invention can be applied. Fig. 2 is a flow chart showing a processing procedure in the above coating and developing treatment system. Fig. 3 shows an embodiment of the present invention. Corrosion treatment department Fig. 4 shows a schematic side view of the normal pressure drying unit and the pre-drying unit in the embodiment. Fig. 5 is a schematic cross-sectional view showing the action of the atmospheric pressure drying method in the embodiment. Fig. 6 shows a modification of the embodiment. Example of the atmospheric drying unit constitutes a schematic side [Main component symbol description] A'B line 20 200931560 AD adhesion unit 'AP inspection unit C 匣 box COL cooling unit COT resist coating unit DEV development unit EE Peripheral exposure unit E-UV Excimer UV irradiation unit G Substrate HA heating environment Ό I/F interface station IN PASS Loading unit OUT PASS carrying out unit PASS Transfer unit POST-BAKE post-drying unit PRE-BAKE Pre-drying unit R/S rotating pedestal RM coating film SCR grinding Cleaning unit 〇TITLER Printing exposure machine VD Normal pressure drying unit 10 Coating development processing system 12 Exposure unit 14 匣 box station (C/S) 16 Processing station (P/S) 18 Interface station (I/F) 20 台 box pedestal 22 Transport mechanism 22a Transport arm 21 200931560 24 Carry-in unit (IN MSS) 26 Cleaning processing unit 28 First heat treatment unit 30 Coating processing unit 32 Second heat treatment unit 34 First advection transport path 36 Excimer UV Irradiation Unit (E-UV) 38 Abrasive Cleaning Unit (SCR) 40 Adhesion Unit (AD)

42 Cooling unit (COL) 44 Resin coating unit (COT) 46 Atmospheric drying unit (VD) 48 Pre-bake unit (PRE-BAKE) 50 Cooling unit (COL) 52 Transfer unit (PASS) 54 Development unit (DEV) 56 Post-drying unit (POST-BAKE) 58 Cooling unit (COL) 60 Inspection unit (AP) 62 Carry-out unit (OUT-PASS) 64 Second advection conveying path 66 Third heat-treating unit 68 Auxiliary conveying space 70 Shuttle mechanism 72 Conveying device 74 Rotating pedestal (R/S) 76 Peripheral device 80 Floating pedestal 82 Substrate conveying mechanism 22 200931560 84 Resist nozzle 86 Nozzle refining part 88 Gas injection hole 90A, 90B Guide 92 Sliding mechanism 94 Nozzle support member 96 Pillar member 98 Preparation Injection processing unit 100 Nozzle bath 102 Nozzle cleaning mechanism ^ 104 Rolling conveyance path 105 Roller 106 Sheath heater 108 Heater power supply 110 Cable 112 Housing 114 Air introduction port 116 Exhaust port 118 Exhaust pipe Ο 120 Exhaust portion 122 rolling temperature control unit 124 piping 130 sheath heater 132 heater power supply 134 cable 136 exhaust suction top plate (multiwell plate) 138 the buffer chamber 140 exhaust pipe or exhaust passage 142 exhaust portion 23 200931560 144 infrared Heat reflecting plate 146

Claims (1)

200931560 X. Patent application scope: 1. An atmospheric pressure drying device comprising: an advection conveying unit for advancing the treated substrate coated with a solvent-containing treatment liquid; and arranging the drying treatment unit for the advection In the transporting towel, the coating film of the treatment liquid in the normal pressure environment τ, _ is supplied so that the surface layer portion is heated to a larger amount than the lower layer portion to dry the coating film. (4) The atmospheric drying apparatus of the patent range f1, wherein the dry welding processing portion has a heater heated by (10) the environment on the conveying path. - Process 3 The atmospheric pressure drying apparatus according to the second aspect of the patent application, wherein the housing of the conveying path of the heating zone of the heating element is in a predetermined section. 4. For the towel, please refer to the f-pressure drying device of the third item of the patent scope, wherein the t gas is used to introduce outside air into the casing; and the exhaust portion is used for the purpose of In the case of the Changli drying apparatus, the coating film on the substrate is substantially free of wind. The atmospheric pressure drying device of any one of the second to fifth aspects of the φ patent range, in the basin, the ambient temperature of the conveying road heated by the heat exchanger is Wc, the degree is = Na 6 (four) observation, needle, In the warmth of the environment, the fine first to fifth shot-like tilting device, the basin infrared heater will be easily absorbed by the board to read the Brown money and is not easy to be used in the base, any of the patent scopes 1 to 5 The atmospheric pressure drying device of the present invention is characterized in that the gas nozzle blows the warm air from above with respect to the coating on the wire of the wheel. Shen, the monthly patent range! The atmospheric pressure drying basin of any one of the five items, the eight temperature regulating portion, is in contact with the substrate of the conveying path, and the parts are adjusted to a predetermined temperature. u. For the postal adjustment of the atmospheric pressure dry welding dream road of the 10th item of the patent application, the normal temperature is pure (four) city ^ set the towel, the delivery is as in the scope of the patent application scope! The shaft wheel is fed by the wire conveying device. 13. The substrate processing device includes an atmospheric pressure drying device of any one of the five items; ❹ ❹ the side conveyor direction of the side is disposed in the atmospheric pressure county The upper base conveying direction is disposed adjacent to the downstream side of the atmospheric pressure drying device, and the substrate-surface is heated by the advection conveying surface. 14. A substrate processing method comprising the steps of: coating a treatment liquid containing a solvent; advancing the transport on a transport line of 4 3 pressure, and heating at the advection portion to a higher level than the lower layer portion, when the coating is ^^^ The method for processing a substrate in a surface layer, wherein, in the drying step, the dilemma on the transport path substantially maintains a windless state. 16. In the case of the substrate processing method of the invention of claim 14 or 15, in the drying step, the environment on the conveying path is heated by a heater. 17. For the substrate processing method of the 16th item of the special fiber, the temperature of the environment on the road is 4G°〇X_L. 18. If you apply for a patent, turn the substrate processing method on item 17. The ring money on the road is 60. (: 社. τ θ β shape 19. The substrate processing method of claim 14th, wherein the substrate is contacted or the portion of the substrate is tempered to a temperature at the ambient temperature. Φ1 U 20. The substrate processing method according to claim 14 or 15, wherein the 26 200931560 coating step towel--surface substrate is transported in parallel with the secret material, and the long-shaped treatment liquid is sprayed on the side] The substrate is sprayed on the substrate, and the substrate on which the treatment liquid is formed is ejected. The treatment is as described in claim 14 and has a baking step, which is in the base method of the New Zealand item, in which the substrate is provided. The surface is in contact with the substrate; the heating is performed on the I-side wheel, and the I-round is sent to the side of the wheel.