TW200846095A - Cleaning and drying device - Google Patents

Cleaning and drying device Download PDF

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Publication number
TW200846095A
TW200846095A TW097119340A TW97119340A TW200846095A TW 200846095 A TW200846095 A TW 200846095A TW 097119340 A TW097119340 A TW 097119340A TW 97119340 A TW97119340 A TW 97119340A TW 200846095 A TW200846095 A TW 200846095A
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TW
Taiwan
Prior art keywords
cleaning
cleaning liquid
cleaned
chamber
inner container
Prior art date
Application number
TW097119340A
Other languages
Chinese (zh)
Inventor
Kenji Mikamo
Kazushige Iyanagi
Original Assignee
Espec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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Publication of TW200846095A publication Critical patent/TW200846095A/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706Mechanical details, e.g. roller, belt
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations

Abstract

The present invention provides a cleaning and drying device that can subject an article to be cleaned for cleaning and drying with omissible pure water rinsing step and that eliminates the need for wash over extended period of time and also extends the life of the cleaning liquid. The cleaning and drying device (10) comprises: an external tub (14); and internal tub (38), which is arranged inside the external tub and has an opening for loading and unloading the article to be cleaned, the internal tube containing therein the cleaning liquid; a vacuum pump (20b), which depressurizes the interior of the external tub for vaporizing the cleaning liquid attached to the article to be cleaned; a sieving and inspecting process (58), which purifies the cleaning liquid; and a lid (52), which forms an airtight seal at the opening of the internal tub (38).

Description

200846095 九、發明說明: 【發明所屬之技術領域】 本發明有關一種清洗乾燥裝置。 【先前技術】 乂在已知有例如日本專利公開公報特開平7 — 1 〇 g $ g 〇 號所公開那樣的雙槽型的真空去脂清洗裝置。如圖2所 示,該清洗裝置,在清洗室1〇1的上方設有乾燥室1〇2, _具有上下兩層結構。在該清洗裝置中,用儲存在清洗室1〇1 内的清洗液清洗被清洗物W,然後用升降裝置 洗物w送到乾燥室102,並使乾燥室1〇2内成為 來對被清洗物W進行乾燥。此外,考慮到清洗液中的髒汙 成分會附著在被清洗物界上,該清洗裝置在乾燥室102中 設有噴淋頭104,用於在對被清洗物w進行乾燥前將清洗 液喷淋到被清洗物ψ上。 另一方面,已知有例如日本專利公開公報特開平 6 —84872號所公開那樣的單槽型的清洗裝置。如圖3所示, 在該清洗裝置的清洗槽U1中,不僅用清洗液清洗被清洗 物W還用純水進行清洗(純水清洗),然後對被清洗物界 進行乾燥。此外,在清洗槽ill中設有使清洗液迴圈、用 師檢程式112去除髒汙成分的迴圈過濾裝置113。在用清 洗液進行清洗時啟動迴圈過濾裝置113,以維持清洗液的 清潔度。此外在清洗後,通過排水管114排出髒汙的清洗 液’並且通過純水供給線115向清洗槽111供給純水,一200846095 IX. Description of the invention: [Technical field to which the invention pertains] The present invention relates to a cleaning and drying device. [Prior Art] A double-slot type vacuum degreasing cleaning device disclosed in, for example, Japanese Laid-Open Patent Publication No. Hei No. Hei. As shown in Fig. 2, the cleaning device is provided with a drying chamber 1〇2 above the cleaning chamber 1〇1, which has a structure of two layers. In the cleaning device, the object to be cleaned W is washed with the cleaning liquid stored in the cleaning chamber 1〇1, and then sent to the drying chamber 102 by the lifting device w, and the inside of the drying chamber 1〇2 is cleaned. The material W is dried. Further, in consideration of the fact that the dirty component in the cleaning liquid adheres to the object to be cleaned, the cleaning device is provided with a shower head 104 in the drying chamber 102 for spraying the cleaning liquid before drying the object to be cleaned w Drain onto the object to be cleaned. On the other hand, a single-slot type cleaning device as disclosed in Japanese Laid-Open Patent Publication No. Hei 6-84872 is known. As shown in Fig. 3, in the cleaning tank U1 of the cleaning apparatus, not only the cleaning material W but also the pure material is washed with pure water (clean water), and then the object to be cleaned is dried. Further, the cleaning tank ill is provided with a loop filter device 113 for circulating the cleaning liquid and removing the dirty components by the inspection program 112. The loop filter unit 113 is activated during washing with the cleaning liquid to maintain the cleanliness of the cleaning liquid. Further, after the cleaning, the dirty cleaning liquid is discharged through the drain pipe 114, and the pure water is supplied to the washing tank 111 through the pure water supply line 115.

2014-9694-PF 6 200846095 =啟,n縣置113 —邊用純水對被清洗㈣進行清 处取後排出純水,並通過空氣供給管⑴向清洗槽⑴ ^給㈣W氣,對被清洗物1進行錢,2014-9694-PF 6 200846095 = Start, n county set 113 - while cleaning with clean water (four), remove the pure water, and pass the air supply pipe (1) to the cleaning tank (1) ^ (four) W gas, the cleaning is Money 1 carries money,

清洗步驟。 j WCleaning step. j W

該日本專利公開公報特開平6—84872號的清洗裝置, 由於為單槽型,可實現裝置的小型化,但在該裝置中,為 二進灯、、4水/月洗’必須排出(廢棄)清洗槽⑴内的所有 ' 忒’月洗裝置的清洗物件是在用清洗液清洗後必須 進行純水清洗的被清洗# ff,存在每次清洗都要廢棄所有 /月洗液,需要大量清洗液的問題。 生另方面,上述日本專利公開公報特開平7-109590號 的巧洗裝置,由於沒有純水清洗步驟,無須每次廢棄清洗 液’但因清洗液-錢存在清洗t 1G1内,清洗液會逐漸 變辦H存在不得不使用髒汙的清洗液來清洗被清洗 物W的問題。此外,在該清洗裝置中,用喷淋帛104洗掉 附著在被清洗物W上的髒汙,因該清洗步驟, 額外耗費時間的問題。 要 【發明内容】 本發明的目的在於,提供一種對可省略純水清洗步驟 的被清洗物進行清洗、乾燥的清洗乾燥裝置,可以防止清 洗時間變長,並可延長清洗液的壽命。 本發明提供一種清洗乾燥裝置,利用清洗液清洗被清 洗物’並對附著在該被清洗物上的清洗液進行乾燥,包括·In the cleaning device of Japanese Laid-Open Patent Publication No. Hei 6-84872, since the device is of a single-slot type, the size of the device can be reduced. However, in this device, the two-in-one lamp and the four-water/month-washing must be discharged (discarded). The cleaning items of all the '忒' monthly washing devices in the cleaning tank (1) are cleaned after cleaning with the cleaning liquid, and must be cleaned with pure water. ff, all the monthly washing liquids must be discarded for each cleaning, and a large amount of cleaning is required. Liquid problem. In the other aspect, the above-mentioned Japanese Patent Laid-Open No. 7-109090 is a delicate washing device. Since there is no pure water washing step, it is not necessary to discard the cleaning liquid every time. However, since the cleaning liquid-money is cleaned in the t 1G1, the cleaning liquid gradually The change H has a problem that the dirty cleaning liquid has to be used to clean the object W to be cleaned. Further, in the cleaning device, the dirt adhering to the object to be cleaned W is washed away by the shower bowl 104, which is an additional time consuming problem. SUMMARY OF THE INVENTION An object of the present invention is to provide a cleaning and drying apparatus for cleaning and drying an object to be cleaned which can omit a pure water washing step, which can prevent a long cleaning time and prolong the life of the cleaning liquid. The present invention provides a cleaning and drying device for cleaning a cleaning object by a cleaning liquid and drying the cleaning liquid attached to the object to be cleaned, including

2014-9694-PF 7 200846095 =側容器;内侧容器,s置在上述外側容器内,具有用於 使上述被清洗物出入的開口部,該内 ' 、土、六.a r D 例各器内儲存上述清 冼液,減壓皁元,使上述外侧容器的内部減壓,以使附著 在上述被清洗物上的清洗液蒸發;淨化單元,淨化上述青 洗液;以及蓋體’ 4密密封上述内側容器的上述開口部:月 由此,可以防止清洗時間變長,並可延長清洗液的壽命。 【實施方式】 * 以下,參照附圖對本發明的較佳實施例進行詳細說明。 圖1是表示本發明清洗乾燥裝置的一實施例的概略 圖。本實施例的清洗乾燥裝置10是用於對半導體或精密機 械部件等進行清洗、乾燥的裝置。如圖丨所示,清洗乾燥 裝置10包括外殼12,該外殼12内容納有外侧容器14。 外侧容器14是上側開放的容器,該外側容器14具有 外盍1 5。通過該外蓋15,可以開閉形成於外側容器14上 _ 側的外側開口 16,並且,利用該外蓋15,可以氣密密封外 侧開口 1 6。該外側開口 16用於將被清洗物w搬入外側容 器14内。 外側容器14設有用於使外侧容器14的内部減壓的減 壓單元20。該減壓單元20包括吸引路20a和真空泵20b。 吸引路20a的一端部與設置於外侧容器14的真空口 22相 連。吸引路20a設有第一止回閥23、上述真空泵2〇b和第 二止回閥24。通過驅動真空泵2〇b,可以使外側容器14内 部減壓。2014-9694-PF 7 200846095 = side container; the inner container s is placed in the outer container, and has an opening for allowing the object to be washed in and out, and the inner ', the earth, and the six ar D are stored in each of the containers. The cleaning liquid, the decompression soap element, depressurizes the inside of the outer container to evaporate the cleaning liquid adhering to the object to be cleaned; the purifying unit purifies the cyan washing liquid; and the lid body 4 seals the above The opening portion of the inner container: by this, it is possible to prevent the cleaning time from becoming long and to extend the life of the cleaning liquid. [Embodiment] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing an embodiment of a washing and drying apparatus of the present invention. The cleaning and drying device 10 of the present embodiment is a device for cleaning and drying a semiconductor or a precision mechanical component or the like. As shown in Figure ,, the cleaning and drying device 10 includes a housing 12 that houses an outer container 14. The outer container 14 is an open container on the upper side, and the outer container 14 has an outer rim 15 . The outer cover 15 can open and close the outer opening 16 formed on the upper side of the outer container 14, and the outer cover 15 can hermetically seal the outer opening 16 by the outer cover 15. The outer opening 16 is for carrying the object to be cleaned w into the outer container 14. The outer container 14 is provided with a pressure reducing unit 20 for decompressing the inside of the outer container 14. The decompression unit 20 includes a suction path 20a and a vacuum pump 20b. One end of the suction path 20a is connected to the vacuum port 22 provided in the outer container 14. The suction path 20a is provided with a first check valve 23, the above-described vacuum pump 2〇b, and a second check valve 24. By driving the vacuum pump 2〇b, the inner portion of the outer container 14 can be decompressed.

20I4-9694-PF 200846095 · 吸引路20a的另一端部與氣液分離器26相連。該氣液 分離器26,用於從通過吸引路2〇a吸引的空氣t分離出該 空氣所含的氣化清洗液。氣液分離器26設有作為冷凝單元 的加壓泵28。加壓泵28與氣液分離器26相連,通過驅動 該加壓泵28,可對處於減壓狀態的氣液分離器内進行 加壓。通過對氣液分離器26的内部進行加壓,可使氣化的 清洗液液化。液化後的清洗液被回收到清洗夜〜回收槽3〇 中。 ’ ® 氣液分離器26與排氣路32相連。該排氣路32用於將 氣液分離器26内的空氣排出到外殼12外。排氣路32設有 止回閥3 3。此外’氣液分離器2 6設有液面感測器3 5。 外側容器14内容納有内側容器38。在該外侧容器j 4 内的除内側容器38以外的空間是乾燥用空間S1,用於對 被清洗物W進行乾燥。内側容器38是上侧開放並具有側壁 (外壁)38a的容器,該容器38内儲存有清洗液(藥劑)。 藝内側容器38的内部,由隔板38b分隔為第一室39和第二 至40。第一室39具有可以放入被清洗物w的大小,第二 室40隔著隔板38b位於第一室39的外側。由於隔板3讣 的南度低於内側容器38的側壁38a,因此在供給到第一室 39内的清洗液達到一定的量時,第一室39内的清洗液就 越過隔板38b儲存到第二室4〇内。 第二室40設有液面感測器42和排出口 44。液面感測 器42可以檢測第二室40内的液面,用於將第二室4〇内的 液量控制在規定範圍内。液面感測器42與控制器4M目連,20I4-9694-PF 200846095 • The other end of the suction path 20a is connected to the gas-liquid separator 26. The gas-liquid separator 26 is for separating the vaporized cleaning liquid contained in the air from the air t sucked by the suction path 2A. The gas-liquid separator 26 is provided with a pressurizing pump 28 as a condensing unit. The pressurizing pump 28 is connected to the gas-liquid separator 26, and by driving the pressurizing pump 28, the gas-liquid separator in a reduced pressure state can be pressurized. The gasified cleaning liquid can be liquefied by pressurizing the inside of the gas-liquid separator 26. The liquefied cleaning solution is recovered into the cleaning night ~ recovery tank 3 。. The '' gas-liquid separator 26 is connected to the exhaust passage 32. The exhaust passage 32 serves to discharge the air in the gas-liquid separator 26 to the outside of the casing 12. The exhaust passage 32 is provided with a check valve 33. Further, the gas-liquid separator 26 is provided with a liquid level sensor 35. The outer container 14 houses an inner container 38 therein. The space other than the inner container 38 in the outer container j 4 is a drying space S1 for drying the object W to be washed. The inner container 38 is a container whose upper side is open and has a side wall (outer wall) 38a in which a cleaning liquid (medicine) is stored. The inside of the inner container 38 is partitioned into a first chamber 39 and second to 40 by a partition 38b. The first chamber 39 has a size in which the object to be cleaned w can be placed, and the second chamber 40 is located outside the first chamber 39 via the partition plate 38b. Since the south side of the partition 3 is lower than the side wall 38a of the inner container 38, when the cleaning liquid supplied into the first chamber 39 reaches a certain amount, the cleaning liquid in the first chamber 39 is stored over the partition 38b. The second room is within 4 inches. The second chamber 40 is provided with a level sensor 42 and a discharge port 44. The level sensor 42 can detect the liquid level in the second chamber 40 for controlling the amount of liquid in the second chamber 4 within a prescribed range. The liquid level sensor 42 is connected to the controller 4M.

2014-9694-PF 9 200846095 由此可以在第二室40内的液面低於下限高度時,驅動供給 泵48,供給清洗液供給槽49内的清洗液,而在第二室= 内的液面超過上限高度時,停止供給清洗液供給槽^至内的 清洗液。排出口 44用於將第二室4〇内的清洗液全部排出、。 内側容器38具有頂部38c。頂部38c設置在側辟μ 上,蓋住内侧容器38的一部分開口。該頂部38c上^定有3 與清洗液供給槽49相連的供給管5〇的出口端。 ^此外,内側容器38設有用於開閉上侧開口的蓋體52。 蓋體52可轉動地設置在内侧容器38的側壁咖上,該苔 體52可以在水平橫放的狀態即關閉位置和自該關閉= 立起的縱向豎立狀態即打開位置之間進行轉動。蓋體Μ在 位於關閉位置時’可以氣密密封上侧開口。在關閉位置上 蓋體52的面與頂部38c的面相接合,以確保氣密性。在圖 1中’用實線表示位於關閉位置的蓋體52,用虛線表示位 於打開位置的蓋體52。 内侧容器38與用於使清洗液迴圈的迴圈路55相連。 迴圈路55的一端部55a(上游側端部)與第二室4〇的底 部相連,另一端部55b(下游側端部)與第-室39的底部 相連。該另一端部55b,例如呈沿水平方向延伸的管狀, 其管壁上設有多個貫穿孔(圖中未示出),在迴圈路巧内 的清洗液通過該貫穿孔流出到内側容器38内。 迴圈路55設有迴圈果57和作為淨化單元的筛檢程式 58。迴圈栗57用於強制性地使清洗液流動,該迴圈系π 使清洗液從與第二室40相連的一端部55a向與第一室392014-9694-PF 9 200846095 Thereby, when the liquid level in the second chamber 40 is lower than the lower limit height, the supply pump 48 can be driven to supply the cleaning liquid in the cleaning liquid supply tank 49, and the liquid in the second chamber = When the surface exceeds the upper limit height, the supply of the cleaning liquid to the cleaning liquid supply tank is stopped. The discharge port 44 is for discharging all of the cleaning liquid in the second chamber. The inner container 38 has a top portion 38c. The top portion 38c is disposed on the side opening μ to cover a portion of the opening of the inner container 38. The top portion 38c defines an outlet end of the supply pipe 5A connected to the cleaning liquid supply tank 49. Further, the inner container 38 is provided with a lid body 52 for opening and closing the upper side opening. The lid body 52 is rotatably disposed on the side wall of the inner container 38, and the moss body 52 is rotatable between a horizontally horizontally closed state, that is, a closed position, and a longitudinally erected state, that is, an open position, from which the closing = standing. The lid body can be hermetically sealed to the upper side opening when in the closed position. In the closed position, the face of the cover 52 engages the face of the top 38c to ensure airtightness. In Fig. 1, the cover 52 in the closed position is indicated by a solid line, and the cover 52 in the open position is indicated by a broken line. The inner container 38 is connected to a loop 55 for circulating the cleaning liquid. One end portion 55a (upstream side end portion) of the loop path 55 is connected to the bottom portion of the second chamber 4A, and the other end portion 55b (downstream side end portion) is connected to the bottom portion of the first chamber 39. The other end portion 55b is, for example, a tubular shape extending in a horizontal direction, and a plurality of through holes (not shown) are disposed in the tube wall, and the cleaning liquid in the loop path flows out through the through hole to the inner container. 38 inside. The loop 55 is provided with a loop fruit 57 and a screening program 58 as a purifying unit. The looper 57 is used to forcibly flow the cleaning liquid, and the loop π causes the washing liquid to pass from the one end portion 55a connected to the second chamber 40 to the first chamber 39.

2014-9694-PF 10 200846095 相連的另一端部55b流動。通過驅動迴圈泵57,第二室40 内的清洗液被吸引,並且迴圈路55内的清洗液被送出到第 一室39内。由此,使清洗液在内側容器38和迴圈路55之 間迴圈。篩檢程式58用於淨化清洗液,可以捕捉清洗液中 所含的髒汙成分。2014-9694-PF 10 200846095 The other end 55b connected is flowing. By driving the loop pump 57, the washing liquid in the second chamber 40 is sucked, and the washing liquid in the loop 55 is sent out into the first chamber 39. Thereby, the cleaning liquid is circulated between the inner container 38 and the return path 55. The screening program 58 is used to purify the cleaning liquid and capture the dirt contained in the cleaning liquid.

内側谷器3 8設有超聲波清洗單元6 〇。該超聲波清洗 單元60向内側容器38内的清洗液施加超聲波振動來提高 清洗液的清洗能力。 迴圈路55設有可加熱清洗液的加熱器62。控制器46 可以控制該加熱器62。此外,内側容器38設有用於檢測 清洗液溫度的液溫計64。該液溫計64也與控制器㈣相連。 之所以用加熱器62加熱清洗液,是為了防止在外侧容器 14内的乾燥用空間S1減壓使外側容器14内的清洗液蒸發 時,因隨之產生的吸熱作用而使内側容器38内的清洗液冷 卻凝固。另一方面,通過監測清洗液的溫度,可以防止清 洗:被加熱至沸騰。另外,迴圈纟57、筛檢程式58和二 熱裔62均設置在外側容器14外侧的外殼12内。 迴圈路55上連接有:加熱器侧排出管65,用於排出 留在加熱器62内的清洗液;以及篩檢程式側排出管66, 用於排出留在篩檢程式58内的清洗液。上述排出管65、 6 6句與排水槽6 8相連。此外,加熱器側排出管π設有止 回閥69’筛檢程式側排出f 66設有㈣7〇。另外a = =外側容器内的清洗液,通過排水管72回收到排水槽貝=The inner granulator 38 is provided with an ultrasonic cleaning unit 6 〇. The ultrasonic cleaning unit 60 applies ultrasonic vibration to the cleaning liquid in the inner container 38 to improve the cleaning ability of the cleaning liquid. The return path 55 is provided with a heater 62 that can heat the cleaning liquid. Controller 46 can control the heater 62. Further, the inner container 38 is provided with a liquid temperature gauge 64 for detecting the temperature of the cleaning liquid. The liquid temperature meter 64 is also connected to the controller (4). The reason why the cleaning liquid is heated by the heater 62 is to prevent the inside of the inner container 38 from being caused by the heat absorbing action generated when the drying space S1 in the outer container 14 is decompressed and the cleaning liquid in the outer container 14 is evaporated. The cleaning solution is cooled and solidified. On the other hand, by monitoring the temperature of the cleaning liquid, it is possible to prevent cleaning: it is heated to boiling. Further, the loop 纟 57, the screening program 58 and the second heater 62 are disposed in the outer casing 12 outside the outer container 14. The circulation path 55 is connected to a heater side discharge pipe 65 for discharging the cleaning liquid remaining in the heater 62, and a screening program side discharge pipe 66 for discharging the cleaning liquid remaining in the screening program 58. . The discharge pipes 65 and 66 are connected to the drain groove 68. Further, the heater side discharge pipe π is provided with a check valve 69', and the screening program side discharge f 66 is provided with (four) 7 turns. In addition, a = = the cleaning liquid in the outer container is recovered through the drain pipe 72 to the drain tank.

2014-9694-PF 11 200846095 清洗乾燥裝置10設有用於在内侧容器38的内部和外 4之間搬送被清洗物W的搬送單元74。搬送單元74具有 升降構件74a,該升降構件74a被電動機(圖中未示出) 驅動,並可以沿上下延伸的導向構件74b向上下方向移 動。搬运單元74,在清洗步驟之前將放在升降構件7切上 的被清洗物ff從内侧容器38的外部向内部搬送,並在清洗 結束後將被清洗物W從内侧容器38的内部向外部(乾燥用 _ 空間S1 )搬送。另外,在外側容器14的壁面上形成有向 與上下方向垂直的方向貫穿的槽(圖中未示出),升降構 件的支撐部件(圖示省略)貫穿該槽,當升降構件74a上 下移動時在該槽的内侧上下移動。該槽被波紋管(beU〇ws) 密封’由此確保外侧容器14的密封性。 在清洗被清洗物W時,升降構件74a可以搖動被清洗 物W。例如,升降構件74a可以沿導向構件74b向上下方 向搖動,也可以相對於導向構件74b向左右方向搖動。 鲁 下面,對本實施例的清洗乾燥裝置10的工作進行說 明。該清洗乾燥裝置10的工作中,包含清洗被清洗物f的 清洗步驟和對浸濕的被清洗物w進行乾燥的乾燥步驟。在 清洗步驟中,由搬送單元74將被清洗物?搬送至内側容器 38内,並浸泡在清洗液中。在搬送時,打開外蓋丨5,通過 外側谷器14的外側開口 1 6將被清洗物w送入外側容器14 内’然後打開蓋體52,使升降構件74a向下移動,將被清 洗物W搬入内侧容器38内。 通過驅動迴圈泵57,内側容器38的第二室4〇内的清 2014-9694-PF 12 200846095 洗液被吸入迴圈路5 5中,該清洗液流過迴圈路5 5後,通 過另一端部55b (下游側端部)供給到第一室39内。由於 迴圈路55的另一端部55b設置在第一室39的底部,在内 側容器38的第一室39内,產生自下方供給的清洗液越過 板3 8 b的向上流動現象。由此’清洗液在内側容零3 8和 迴圈路55之間迴圈,通過該迴圈,清洗液所含的髒汙成分 被篩檢程式58去除。 此外’在清洗步驟中,超聲波清洗單元6 〇使清洗液產 生超聲波振動,並伴隨升降構件74a的搖動,被清洗物w 也搖動。因此,除利用清洗液的流動外,還利用超聲波振 動和被清洗物W本身的搖動來進行清洗。在清洗結束後, 升降構件74a上升,將被清洗物f搬送至内側容器㈣的外 側,即乾燥用空間si内。另外,在清洗時蓋體52可以打 開也可以關閉。 在乾燥步驟中,關閉内侧容器38的蓋體52,驅動真 玉泵\〇b。由此,使内側容器38的外侧空間(乾燥用空間) S1減壓巧洗/夜隨減壓而蒸發,由此對被清洗物^進行乾 燥0 另方面氣化的清洗液被真空泵20七吸引,經吸引 路20a導入氣液分離 刀離is 26中。在氣液分離器26中,通過 加壓泵28的驅動,裔鹏 礼體狀的清洗液冷凝,與空氣分離。空 氣經排氣路32排出$1丨政* OA ^ 〗外°卩,清洗液被回收到清洗液回收槽 30中。 〜乾燥〆驟中’隨著在乾燥用空間S1中清洗液氣化,2014-9694-PF 11 200846095 The cleaning and drying device 10 is provided with a transport unit 74 for transporting the object W to be washed between the inside and the outside of the inner container 38. The transport unit 74 has a lifting member 74a that is driven by a motor (not shown) and that is movable in the vertical direction along the guide member 74b extending upward and downward. The conveyance unit 74 conveys the object to be cleaned ff which is placed on the elevating member 7 to the inside from the inside of the inner container 38 before the washing step, and conveys the object W from the inside of the inner container 38 to the outside after the washing is completed ( Drying is carried out with _ space S1). Further, a groove (not shown) penetrating in a direction perpendicular to the vertical direction is formed on the wall surface of the outer container 14, and a supporting member (not shown) of the elevating member penetrates the groove, and when the elevating member 74a moves up and down Move up and down on the inside of the slot. The groove is sealed by a bellows (be U〇ws) thereby ensuring the tightness of the outer container 14. When the object W to be cleaned is cleaned, the lifting member 74a can shake the object W to be washed. For example, the elevating member 74a may be rocked upward and downward along the guide member 74b, or may be swung in the left-right direction with respect to the guide member 74b. Next, the operation of the cleaning and drying device 10 of the present embodiment will be described. The operation of the cleaning and drying device 10 includes a washing step of washing the object to be cleaned and a drying step of drying the wetted object w. In the cleaning step, the object to be cleaned is transported by the transport unit 74? It is transferred to the inner container 38 and immersed in the cleaning liquid. At the time of conveyance, the outer lid 丨 5 is opened, and the object to be cleaned w is fed into the outer container 14 through the outer opening 16 of the outer damper 14 and then the lid body 52 is opened to move the lifting member 74a downward, and the object to be cleaned is to be washed. W is carried into the inner container 38. By driving the loop pump 57, the cleaning liquid in the second chamber 4 of the inner container 38 is sucked into the loop 5 5, and the cleaning liquid flows through the loop 5 5 and passes through The other end portion 55b (downstream side end portion) is supplied into the first chamber 39. Since the other end portion 55b of the loop path 55 is provided at the bottom of the first chamber 39, in the first chamber 39 of the inner side container 38, an upward flow phenomenon of the cleaning liquid supplied from below through the plate 38b is generated. Thus, the cleaning liquid is looped between the inner side of the capacitor 3 8 and the loop path 55, and the dirt contained in the cleaning liquid is removed by the screening program 58 by the loop. Further, in the cleaning step, the ultrasonic cleaning unit 6 causes ultrasonic vibration to be generated in the cleaning liquid, and the object w is also shaken by the shaking of the elevating member 74a. Therefore, in addition to the flow of the cleaning liquid, the ultrasonic vibration and the shaking of the object W itself are used for cleaning. After the cleaning is completed, the elevating member 74a is raised, and the object to be cleaned f is transported to the outside of the inner container (4), that is, in the drying space si. In addition, the cover 52 can be opened or closed during cleaning. In the drying step, the lid 52 of the inner container 38 is closed to drive the jade pump \〇b. As a result, the outer space (drying space) S1 of the inner container 38 is decompressed, and the liquid is evaporated by decompression, and the object to be cleaned is dried. 0 The cleaning liquid which is vaporized by another is attracted by the vacuum pump 20 The gas-liquid separation knife is introduced into the is 26 through the suction path 20a. In the gas-liquid separator 26, the washing liquid of the prince is condensed by the driving of the pressurizing pump 28, and is separated from the air. The air is discharged through the exhaust passage 32 by $1 ** OA ^ 〗 外, and the cleaning liquid is recovered into the cleaning liquid recovery tank 30. ~ Drying step" As the cleaning liquid is vaporized in the drying space S1,

2014-9694-PF 13 200846095 w 偶爾導致周圍的熱量被吸收、溫度下降的現象。在此應該 避免内側容器38内的清洗液的溫度隨該溫度下降而下 降、清洗液凝固。為此,用加熱器62加熱清洗液,以防止 /月洗液的凝固。此外,用液溫計檢測内侧容器内的 清洗液的溫度,防止清洗液加熱到沸騰的溫度。在此,雖 在乾燥步驟中也驅動迴圈泵57來使清洗液迴圈,但在清洗 液不會凝固等的情況下,也可僅在清洗步驟中驅動迴圈泵 57 〇 _ &上所述,在本實施例中,由於設有用於淨化清洗液 的篩檢程式58,清洗液即使在内侧容器38内清洗被清洗 物W後變髒,也可得到淨化。因此,無需採取清洗後再進 行噴淋清洗等的措施,可以防止清洗步驟變長,也可以使 清洗液經久耐用。此外,由於使外側容器14的内部減壓來 對清洗後的被清洗物進行乾燥,因此可使被清洗物¥的 各個部分全面乾燥。此時,由於利用蓋體52氣密密封内側 ❿容器38,可以在保持内側容器38内儲存清洗液的狀態下, 使外側容器14内部減壓。因此,在對被清洗物ψ進行乾燥 時可以省去排出清洗液所需的時間,即可縮短乾燥步驟時 間’亚且’還可以防止不必要地廢棄、浪費清洗液。而且, 由於清洗用的内侧容器38容納在用於對被清洗物⑼進行乾 燥的外側容II 14内’因此可以抑制作為密封容器的外側容 器14的加工工時增加。並且,由於内側容器38設置在外 側容器14的内側,因此,例如在設置裝置的情況下要調整 内側容器38的水平度時,可以單獨移動内側容器38,避2014-9694-PF 13 200846095 w Occasionally, the surrounding heat is absorbed and the temperature is lowered. Here, it should be avoided that the temperature of the cleaning liquid in the inner container 38 drops as the temperature drops, and the cleaning liquid solidifies. To this end, the cleaning liquid is heated by the heater 62 to prevent solidification of the / month wash. In addition, the temperature of the cleaning liquid in the inner container is detected by a liquid thermometer to prevent the cleaning liquid from being heated to a boiling temperature. Here, although the loop pump 57 is driven to recirculate the washing liquid in the drying step, the loop pump 57 〇 _ & may be driven only in the washing step in the case where the washing liquid does not solidify or the like. As described above, in the present embodiment, since the screening program 58 for purifying the cleaning liquid is provided, the cleaning liquid can be purified even if it is dirty after cleaning the object W in the inside container 38. Therefore, it is not necessary to take measures such as spray cleaning after cleaning, and it is possible to prevent the cleaning step from becoming long and to make the cleaning liquid durable. Further, since the inside of the outer container 14 is decompressed to dry the object to be cleaned after washing, the respective portions of the object to be washed ¥ can be completely dried. At this time, since the inner crucible container 38 is hermetically sealed by the lid body 52, the inside of the outer container 14 can be decompressed while the cleaning liquid is stored in the inner container 38. Therefore, when the object to be cleaned is dried, the time required for discharging the cleaning liquid can be omitted, and the drying step time can be shortened, and the cleaning liquid can be prevented from being discarded and wasted unnecessarily. Moreover, since the inner container 38 for cleaning is accommodated in the outer container II 14 for drying the object to be cleaned (9), it is possible to suppress an increase in the processing time of the outer container 14 as the sealed container. Further, since the inner container 38 is provided inside the outer container 14, the inner container 38 can be individually moved, for example, when the level of the inner container 38 is adjusted in the case of the setting device.

2014-9694-PF 14 200846095 免:整作業的複雜化。# ’如果採用圖2所示的上下兩槽 的結構’為了確保清洗室和乾燥室之間的密封性,乾燥室 堅口地固定在清洗室上,在要調整該清洗室的水平度時, 就不得不肩整與乾燥室成—體的裝置的傾斜度,調整作業 :複雜。與此相對,如本實施例這樣,在採用内侧容器38 谷納於外側容器14内的結構的情況下,由於無需確保外侧 容器14和内侧容器38的接合部的密封性,可以單獨進行 内側容器38的傾斜調整,不必為調整作業費力。特別是, 在本貝%例中,由於採用使清洗液溢出的結構,因此必需 對内側谷器38進行微調,但因只調整内側容器38即可, 可易於對内侧容器38進行微調作業。 此外,在本實施例中,由於設有用於加熱清洗液的加 熱器62,可以防止因乾燥用空間S1内的清洗液的蒸發引 起的溫度下降而使内侧容器38内的清洗液凝固。而且,通 過使清洗液的溫度上升,可以提高清洗能力,也可以使處 理溫度保持一定。 此外’在本實施例中,通過迴圈泵57的驅動,第二室 40内的清洗液經過迴圈路55流入第一室39。然後,第一 室39内的清洗液越過隔板38b流入第二室4〇内。如此可 以強制性地使清洗液迴圈。即,由於通過泵5 7,可以強制 性地使被清洗物W所浸泡的第一室39内的清洗液流動,可 以提高清洗被清洗物W的能力。 而且,在本實施例中,由於設有超聲波清洗單元, 可以進一步提高清洗被清洗物W的能力。 2014-9694-PF 15 200846095 此外,在本實施例中,通過真空泵2〇b的驅動,經吸 引路20a被吸引的空氣流入氣液分離器26中,該空氣中所 含的氣化清洗液被儲存在氣液分離器26中。由於氣液分離 器26設有冷凝單元,可使氣化清洗液液化分離。 此外,在本實施例+,由於在清洗時搖動被清洗 物W —邊清洗被清洗物w,可以進一步提高清洗能力。 本發明並不限定於上述實施例,在不脫離本發明主旨 _ 的範圍内可以進行各種變化、改良等。例^,在本實施例 中,將加熱器62設置在迴圈路55,但也可設置在内側容 器38内。 此外,在本實施例中,在清洗時搖動升降構件7切, 但按照清洗物W的種類,也可以不使升降構件搖動。 另外,也可以不設置超聲波清洗單元。 [實施例的概要] 上述實施例可以總結為如下。 • (1)在本實施例中,由於設有用於淨化清洗液的淨化 早π,清洗液即使在内側容器内清洗被清洗物後變髒,也 可得到淨化。因此,無需採取清洗後再進行喷淋清洗等的 措施,可以防止清洗步驟變長,而且可使清洗液經久耐用。 此外,由於使外侧容器的内部減壓來對清洗後的被清洗物 進打乾燥,可使被清洗物的各個部分全面乾燥。此時,由 t利用蓋體氣密密封内側容器,可在保持内側容器内儲存 清洗液的狀態況下,使外側容器内部減壓。因此,在對被 清洗物進行乾燥時可以省去排出清洗液所需的時間,即可2014-9694-PF 14 200846095 Free: The complexity of the whole operation. # 'If using the structure of the upper and lower slots shown in Figure 2, in order to ensure the tightness between the cleaning chamber and the drying chamber, the drying chamber is fixedly fixed to the cleaning chamber. When the level of the cleaning chamber is to be adjusted, It is necessary to shoulder the inclination of the device which is formed into a body with the drying chamber, and the adjustment work is complicated. On the other hand, in the case of the configuration in which the inner container 38 is accommodated in the outer container 14 as in the present embodiment, since it is not necessary to ensure the sealing property of the joint portion of the outer container 14 and the inner container 38, the inner container can be separately performed. The tilt adjustment of 38 does not have to be laborious for the adjustment work. In particular, in the example of the present invention, since the cleaning liquid is overflowed, it is necessary to finely adjust the inner damper 38. However, since only the inner container 38 is adjusted, the inner container 38 can be easily fine-tuned. Further, in the present embodiment, since the heater 62 for heating the cleaning liquid is provided, it is possible to prevent the cleaning liquid in the inner container 38 from being solidified by the temperature drop caused by the evaporation of the cleaning liquid in the drying space S1. Further, by raising the temperature of the cleaning liquid, the cleaning ability can be improved, and the processing temperature can be kept constant. Further, in the present embodiment, the cleaning liquid in the second chamber 40 flows into the first chamber 39 through the return path 55 by the driving of the loop pump 57. Then, the cleaning liquid in the first chamber 39 flows into the second chamber 4 through the partition 38b. This makes it possible to force the cleaning liquid to loop. That is, since the cleaning liquid in the first chamber 39 soaked by the object W can be forcibly flowed by the pump 57, the ability to clean the object W can be improved. Further, in the present embodiment, since the ultrasonic cleaning unit is provided, the ability to clean the object W can be further improved. 2014-9694-PF 15 200846095 Further, in the present embodiment, the air sucked through the suction path 20a flows into the gas-liquid separator 26 by the driving of the vacuum pump 2〇b, and the vaporized cleaning liquid contained in the air is It is stored in the gas-liquid separator 26. Since the gas-liquid separator 26 is provided with a condensing unit, the vaporized washing liquid can be liquefied and separated. Further, in the present embodiment +, since the object to be cleaned w is washed while shaking the object W during washing, the cleaning ability can be further improved. The present invention is not limited to the above embodiments, and various changes, improvements, and the like can be made without departing from the scope of the invention. In the present embodiment, the heater 62 is disposed in the loop path 55, but may be disposed in the inner container 38. Further, in the present embodiment, the elevating member 7 is swung while being cleaned, but the elevating member may not be shaken depending on the type of the washing W. In addition, the ultrasonic cleaning unit may not be provided. [Outline of Embodiments] The above embodiments can be summarized as follows. (1) In the present embodiment, since the cleaning liquid for purifying the cleaning liquid is provided earlier, the cleaning liquid can be purified even if it is dirty after washing the object to be cleaned in the inner container. Therefore, it is not necessary to take measures such as spray cleaning after cleaning, which can prevent the cleaning step from becoming long and the cleaning liquid to be durable. Further, since the inside of the outer container is depressurized to dry the object to be cleaned after washing, the respective portions of the object to be cleaned can be completely dried. At this time, the inner container is hermetically sealed by the lid body, and the inside of the outer container can be depressurized while the cleaning liquid is stored in the inner container. Therefore, when drying the object to be cleaned, the time required to discharge the cleaning solution can be eliminated.

2014-9694-PF 16 200846095 以縮t乾燥步驟時間,並且,還可以防止不必要地廢棄、 浪費’月洗液。而且,由於清洗用的内側容器容納在用於對 被清洗物進行乾燥的外侧容器内,可以抑制作為密封容器 、卜側谷器的加工工時增加。並且,由於内側容器設置在 外侧谷器的内侧,因此,例如在設置裝置的情況下要調整 内側容器的水平度時,可以單獨移動内侧容器,避免調整 作業的複雜化。即,如果採用圖2所示的上下兩槽的結構, _ =了確保清洗室和乾燥室之間的密封性,乾燥室堅固地固 疋在清洗室上,在要調整該清洗室的水平度時,就不得不 凋整與乾燥室成一體的裝置的傾斜度,調整作業很複雜。 /、相對如本貝加例這樣在採用内側容器容納於外侧容 為内的結構的情況下,由於無需確保外側容器和内侧容器 的接合部的密封性,可以單獨進行内側容器的傾斜調整, 不必為調整作業費力。 (2 )上述清洗乾燥裝置包括用於加熱清洗液的加熱器 _ 較為理想。在外侧容器内,清洗液隨減壓而蒸發,產生氣 化熱導致的溫度下降,但在本實施例中,由於設有加熱器, 可以防止内側容器内的清洗液隨溫度下降而凝固。此外, 通過使清洗液的溫度上升,還可以提高清洗能力。另外還 可使處理溫度保持一定。 (3 )在上述清洗乾燥裝置中較為理想的是:上述内侧 谷器具有隔板,該隔板將内侧容器内部分隔為第一室和第 二室,被清洗物浸泡在上述第一室内;上述内側容器與迴 圈路相連,該迴圈路的一端部和另一端部分別與上述第一 2014-9694-PF 17 200846095 至和上述第二室相連;在上述迴圈路設有泵的情況下,通 過驅動該泵,使上述第一室内的清洗液越過上述隔板向上 述第二室内溢出。在本實施例中,通過驅動泵,第二室内 的清洗液就經過迴圈路流入第一室内。然後,第一室内的 清洗液越過隔板流入第二室内。如此可以強制性地使清洗 液迴圈。即,由於可以強制性地使被清洗物所浸泡的第一 室内的清洗液流動,可以提高清洗被清洗物的能力。 (4)在本實施例中較為理想的是,上述淨化單元具有 設置在上述迴圈路的篩檢程式。在該實施例中,通過驅動 泵,清洗液從内側容器流入迴圈路,該清洗液在迴圈路内 流動。然後’該清洗液被篩檢程式淨化。 (5 )在上述清洗乾燥裝置中較為理想的是,上述内側 容器設有超聲波清洗單元。在該實施例中,可以進一步提 高清洗被清洗物的能力。 (6 )在上述清洗乾燥裝置中較為理想的是:上述減壓 鲁單元具有與上述外側容器相連的吸引路和設置在該吸引路 的泵,上述吸引路與氣液分離器相連,上述氣液分離器設 有冷凝單元。在該實施例中,通過吸引路吸引的空氣流入 氣液分離器中,該氣液分離器儲存上述空氣中所含的氣化 清洗液。由於氣液分離器設有冷凝單元,可使氣化清洗液 液化分離。 (7)在上述 洗乾燦裝置包括搬送單元,用於在上述 内側容器的内部和外部之間搬送上述被清洗物的情況下, 上述搬送單元可以在上述内側容器内清洗被清洗物時,可 2014-9694-PF 18 200846095 以搖動該被清洗物。在該實施例中,由於一邊搖動被清洗 物一邊清洗被清洗物’可以進_步提高清洗能力。 如上所述,本實施例提供一種對可省略純水清洗步驟 的被清洗物進行清洗、乾燥的清洗乾燥裝置,可以防止清 洗時間變長,並且可以延長清洗液的壽命。 【圖式簡單說明】 圖1是表示本發明實施例的清洗乾燥 ⑩的概略圖。 、置的整體結構 圖2是表示以往清洗乾燥裝置的結構的圖 圖3是表示以往清洗乾燥裝置的結構的图 【主要元件符號說明】 10〜清洗乾燥裝置; 12〜外殼; 14〜外侧容器; 15〜外蓋; 16〜外侧開口; 20〜減壓單元; 20a〜吸引路; 20b〜真空泵; 22〜真空口; 23〜第一止回閥; 2 4〜第二止回閥; 2014-9694-PF 19 200846095 26〜氣液分離器; 26〜氣液分離器; 2 8〜加壓泵; 30〜清洗液回收槽; 32〜排氣路; 3 3〜止回閥; 3 5〜液面感測器; 38〜内侧容器; 3 8 a〜側壁; 38b〜隔板; 38c〜頂部; 39〜第一室; 40〜第二室; 42〜液面感測器; 44〜排出口; 46〜控制器; 48〜供給泵; 49〜清洗液供給槽; 50〜供給管; 52〜蓋體; 55〜迴圈路; 55a、55b〜端部; 57〜迴圈泵; 58〜篩檢程式;2014-9694-PF 16 200846095 The drying step time is reduced by t, and it is also possible to prevent unnecessary waste and waste of the monthly washing liquid. Further, since the inner container for cleaning is housed in the outer container for drying the object to be cleaned, it is possible to suppress an increase in the number of processing steps as the sealed container or the side bar. Further, since the inner container is disposed inside the outer damper, for example, when the level of the inner container is adjusted in the case of the setting device, the inner container can be separately moved to avoid the complication of the adjustment work. That is, if the structure of the upper and lower grooves shown in Fig. 2 is adopted, _ = ensuring the sealing property between the cleaning chamber and the drying chamber, the drying chamber is firmly fixed on the cleaning chamber, and the level of the cleaning chamber is adjusted. At this time, it is necessary to erode the inclination of the device integrated with the drying chamber, and the adjustment work is complicated. In the case of the structure in which the inner container is accommodated in the outer side as in the case of the bebething example, since it is not necessary to ensure the sealing property of the joint portion of the outer container and the inner container, the tilt adjustment of the inner container can be performed separately, without It is laborious to adjust the work. (2) The above cleaning and drying device includes a heater _ for heating the cleaning liquid. In the outer container, the cleaning liquid evaporates with the pressure reduction to cause a temperature drop due to the heat of vaporization. However, in the present embodiment, since the heater is provided, it is possible to prevent the cleaning liquid in the inner container from solidifying with a drop in temperature. Further, by increasing the temperature of the cleaning liquid, the cleaning ability can be improved. It also keeps the processing temperature constant. (3) In the above-described cleaning and drying device, it is preferable that the inner grain device has a partition plate that partitions the inner container inner portion into a first chamber and a second chamber, and the object to be cleaned is immersed in the first chamber; The inner container is connected to the loop road, and one end portion and the other end portion of the loop road are respectively connected to the first 2014-9694-PF 17 200846095 to the second chamber; in the case where the pump is provided in the loop road By driving the pump, the cleaning liquid in the first chamber overflows into the second chamber over the partition. In the present embodiment, by driving the pump, the cleaning liquid in the second chamber flows into the first chamber through the loop. Then, the cleaning liquid in the first chamber flows into the second chamber across the partition. This makes it possible to force the cleaning fluid to loop. That is, since the cleaning liquid in the first chamber immersed in the object to be cleaned can be forcibly flowed, the ability to clean the object to be cleaned can be improved. (4) In the present embodiment, it is preferable that the purification unit has a screening program provided on the loop. In this embodiment, by driving the pump, the cleaning liquid flows from the inner container into the return path, and the cleaning liquid flows in the circulation path. Then the cleaning solution is cleaned by a screening program. (5) In the above cleaning and drying apparatus, it is preferable that the inner container is provided with an ultrasonic cleaning unit. In this embodiment, the ability to clean the object to be cleaned can be further improved. (6) In the above cleaning and drying apparatus, it is preferable that the decompression unit has a suction path connected to the outer container and a pump provided in the suction path, and the suction path is connected to the gas-liquid separator, the gas-liquid The separator is provided with a condensing unit. In this embodiment, the air sucked by the suction path flows into the gas-liquid separator, and the gas-liquid separator stores the vaporized cleaning liquid contained in the air. Since the gas-liquid separator is provided with a condensing unit, the gasification washing liquid can be liquefied and separated. (7) When the washing and drying device includes a conveying unit for conveying the object to be cleaned between the inside and the outside of the inner container, the conveying unit may clean the object to be cleaned in the inner container. 2014-9694-PF 18 200846095 to shake the object to be washed. In this embodiment, the cleaning ability can be improved by cleaning the object to be cleaned while shaking the object to be cleaned. As described above, the present embodiment provides a cleaning and drying apparatus which can clean and dry the object to be cleaned which can omit the pure water washing step, can prevent the cleaning time from becoming long, and can prolong the life of the cleaning liquid. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing a cleaning and drying 10 according to an embodiment of the present invention. 2 is a view showing a configuration of a conventional cleaning and drying device. FIG. 3 is a view showing a configuration of a conventional cleaning and drying device. [Main component symbol description] 10 to a cleaning and drying device; 12 to a casing; 14 to an outer container; 15~outer cover; 16~outer opening; 20~decompression unit; 20a~ suction path; 20b~vacuum pump; 22~vacuum port; 23~first check valve; 2 4~second check valve; 2014-9694 -PF 19 200846095 26~ gas-liquid separator; 26~ gas-liquid separator; 2 8~ pressurizing pump; 30~ washing liquid recovery tank; 32~ exhaust road; 3 3~ check valve; 3 5~ liquid level Sensor; 38 ~ inner container; 3 8 a ~ side wall; 38b ~ partition; 38c ~ top; 39 ~ first chamber; 40 ~ second chamber; 42 ~ liquid level sensor; 44 ~ discharge; ~ controller; 48 ~ supply pump; 49 ~ cleaning solution supply tank; 50 ~ supply tube; 52 ~ cover body; 55 ~ loop circuit; 55a, 55b ~ end; 57 ~ loop pump; 58 ~ screening program ;

2014-9694-PF 200846095 6 0〜超聲波清洗單元; 62〜加熱器; 65〜加熱器侧排出管; 66〜篩檢程式側排出管; 6 8〜排水槽; 6 9〜止回閥; 70〜針閥; 72〜排水管; • 74〜搬送單元; 74a〜升降構件; 74b〜導向構件; S卜乾燥用空間; W〜被清洗物。 212014-9694-PF 200846095 6 0~ ultrasonic cleaning unit; 62~heater; 65~ heater side discharge pipe; 66~ screening program side discharge pipe; 6 8~ drainage groove; 6 9~ check valve; Needle valve; 72~ drain pipe; • 74~ conveying unit; 74a~ lifting member; 74b~ guiding member; S-drying space; W~ to be cleaned. twenty one

2014-9694-PF2014-9694-PF

Claims (1)

200846095 % 十、申請專利範圍: 1. 一種清洗乾燥裝置,利用清洗液清洗被清洗物,並 對附著在該被清洗物上的清洗液進行乾燥, 其特徵在於包括: 外侧容器; 内侧容器,設置在上述外侧容器β,具有用於使上述 被清洗物出入的開口部,該内側容器内儲存上述清洗液; ' 減壓單元,使上述外側容器的内部減壓,以使附著在 鲁 上述被清洗物上的清洗液蒸發; 淨化單元,淨化上述清洗液;以及 蓋體,氣密密封上述内侧容器的上述開口部。 2·如申請專利範圍第1項所述的清洗乾燥裝置,其 中,包括加熱器,加熱上述清洗液。 3.如申請專利範圍第丨項所述的清洗乾燥裝置,其 中,上述内侧容器具有隔板,該隔板將上述内側容器内部 分隔為第-室和第二室,上述被清洗物浸泡到上述第—室 ^ 内, 上述内側容器設有迴圈路,該迴圈路的一端部與上述 第一室相連,該迴圈路的另一端部與上述第二室相連, 上述迴圈路設有栗,通過驅動該系,使上述第一室内 的清洗液越過上述隔板向上述第二室内溢出。 4·如申凊專利範圍第3項所述的清洗乾燥裝置,其 中,上述淨化單兀具有設置在上述迴圈路的筛檢程式。 5·如申請專利範圍第丨項所述的清洗乾燥裝置,其 2014-9694-PF 22 200846095 % 中上述内侧容器設有超聲波清洗單元。 6·如申請專利範圍第1至5項中任/項所述的清洗乾 衣置,其中,上述減壓單元具有與上述外側容器相連的 吸引路和設置在該吸引路的泵, 上述吸引路與氣液分離器相連, 上述氣液分離器設有冷凝單元。 口 7·如巾4專利範圍第丨至5項中任一項所述的清洗乾 &衣置’其中’包括搬送單元,該搬送單元在上述内側容 曝器的内部和外部之間搬送上述被清洗物,上述搬送單元, 在上述内側容器内清洗被清洗物時,可以搖動該被清洗物。200846095 % X. Patent application scope: 1. A cleaning and drying device for cleaning the object to be cleaned by the cleaning liquid and drying the cleaning liquid attached to the object to be cleaned, characterized in that: the outer container; the inner container, the setting The outer container β has an opening for allowing the object to be washed out, and the cleaning liquid is stored in the inner container; the decompression unit decompresses the inside of the outer container to be attached to the cleaning device. The cleaning liquid on the object evaporates; the purifying unit purifies the cleaning liquid; and the lid body hermetically seals the opening portion of the inner container. 2. The cleaning and drying device according to claim 1, wherein the heater is heated to heat the cleaning liquid. 3. The washing and drying device according to claim 2, wherein the inner container has a partition that partitions the inner container inner portion into a first chamber and a second chamber, and the object to be cleaned is immersed in the above In the first chamber, the inner container is provided with a loop, and one end of the loop is connected to the first chamber, and the other end of the loop is connected to the second chamber, and the loop is provided The pump, by driving the system, causes the cleaning liquid in the first chamber to overflow the second chamber over the partition. 4. The cleaning and drying device according to claim 3, wherein the purification unit has a screening program provided on the loop. 5. The cleaning and drying device according to the above-mentioned patent application scope, wherein the inner container is provided with an ultrasonic cleaning unit in 2014-9694-PF 22 200846095 %. The cleaning and drying device according to any one of claims 1 to 5, wherein the decompression unit has a suction path connected to the outer container and a pump provided in the suction path, the suction path Connected to a gas-liquid separator, the gas-liquid separator is provided with a condensing unit. The cleaning and drying device according to any one of the preceding claims, wherein the cleaning unit comprises: a transport unit that transports the inside and the outside between the inside and the outside of the inner container The object to be cleaned, the conveyance unit, can shake the object to be cleaned when the object to be cleaned is washed in the inner container. 2014-9694-PF 232014-9694-PF 23
TW097119340A 2007-05-28 2008-05-26 Cleaning and drying device TW200846095A (en)

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DE102010038799A1 (en) * 2010-08-02 2012-02-02 Dürr Ecoclean GmbH Device for drying workpieces after a cleaning process
AT509587B1 (en) * 2010-10-11 2011-10-15 Tms Transport Und Montagesysteme Gmbh METHOD AND A CLEANING APPARATUS FOR CLEANING INDUSTRIALLY PREPARED COMPONENTS
CN102059231B (en) * 2011-01-07 2012-10-03 浙江宝纳钢管有限公司 Ultrasonic cleaning equipment
JP5977572B2 (en) 2012-04-25 2016-08-24 株式会社Ihi Vacuum cleaning device
CN103350079B (en) * 2013-07-26 2015-10-14 浙江皓鸿超声波科技有限公司 Supersonic wave cleaning machine
JP6473656B2 (en) * 2015-05-07 2019-02-20 ソマックス株式会社 Metal object cleaning apparatus and metal object cleaning method
DE102015215728A1 (en) * 2015-08-18 2017-02-23 Dürr Ecoclean GmbH Plant for treating a workpiece with a process fluid
CN108838179A (en) * 2018-06-20 2018-11-20 袁静 A kind of cleaning device for chemistry teaching instrument
CN116013804A (en) * 2021-10-22 2023-04-25 长鑫存储技术有限公司 Cleaning device and cleaning method thereof
CN117672926A (en) * 2024-01-29 2024-03-08 东领科技装备有限公司 Single-blade type semiconductor substrate cleaning device and cleaning method

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