TW200844686A - Exposing device - Google Patents

Exposing device Download PDF

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Publication number
TW200844686A
TW200844686A TW097102600A TW97102600A TW200844686A TW 200844686 A TW200844686 A TW 200844686A TW 097102600 A TW097102600 A TW 097102600A TW 97102600 A TW97102600 A TW 97102600A TW 200844686 A TW200844686 A TW 200844686A
Authority
TW
Taiwan
Prior art keywords
substrate
roller
shaft
collar
dust
Prior art date
Application number
TW097102600A
Other languages
Chinese (zh)
Inventor
Yoshimitsu Watanabe
Original Assignee
Adtec Eng Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adtec Eng Co Ltd filed Critical Adtec Eng Co Ltd
Publication of TW200844686A publication Critical patent/TW200844686A/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274Photolithographic processes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Abstract

This invention provides an exposing device adapted to perform a high yield exposing by effectively conducting a removal of dust from a substrate B, a photomask M and a platen 5. During the moving-in and retracting operation of a moving-in hand 3, a first cleaning head 1 is caused to come in contact with an upper surface of the platen 5 to conduct the dust removal operation, and a second cleaning head 2 conducts the dust removal on the photomask M. During the dust removal operation a pressurizing device 16 applies a load through a bearing 17 to an axis 22, and the load is transmitted through a hard connecting collar 23, a soft connecting collar 24, a roller core 21 to a cleaning part 20 so as to press the cleaning part 20 against a cleaning surface 8. the axis 22 will deflect by the load of the pressurizing device 16, however, the deflection of the axis 22 will be absorbed by the soft connecting collar, and the roller core 21 will be kept in a flat state without deflection. By such an arrangement the pressure distribution over the cleaning surface becomes uniform and an efficient cleaning is possible.

Description

200844686 九、發明說明: 【發明所屬之技術領域】 本發明係有關一種曝光裝置。 【先前技術】 在塗布有光阻劑(photo resist)等感光材料的基板表面 藉由曝光褒置感光定影預定圖案’接著利用蝕刻步驟在基 板上形成圖案的光微影法(phot〇mhographic meth〇d)係被 廣泛地運用在各種領域巾,印刷配絲板等在近年也利用 曝光裝置來進行製造。 在印刷配線基板(print circuit b〇ard)之曝光裝置中,當200844686 IX. Description of the invention: [Technical field to which the invention pertains] The present invention relates to an exposure apparatus. [Prior Art] Photolithography (phot〇mhographic meth〇) which forms a pattern on a substrate by exposure to a photosensitive fixing predetermined pattern on a surface of a substrate coated with a photosensitive material such as a photo resist and then an etching step d) It is widely used in various fields, and printed wiring boards and the like have been manufactured by an exposure apparatus in recent years. In an exposure device of a printed circuit board,

光罩(Ph〇tomask)與基板之間存在有塵埃時,該部份會有Z 經曝光而導致製品不良的問題。 忒塵埃中’包含;t :如銅箱一般其本身+具有黏著性 的塵埃;以及如乾膜光阻劑(dry film ph〇t〇⑽以)或阻焊劑 resist)般本身具有黏著性的塵埃,為去除上述塵 埃’已提案有-種在曝光裝置中設置除塵裝置之構成,作 為該除塵裝置,已知有一種使用有黏著滾輪等之除 之構成。 [專利文獻1]曰本專利第3533380號 【發明内容】 (發明所欲解決之課題) 然而’在使用習知的除塵滾輪之除塵裝置之情形中, 由於該除塵裝置係為對滾輪軸的兩端施加較大的荷重 如對640_的滾輪⑽ler)施加16〇N的荷重)以進行清理 5 319886 200844686 2:冓成’故會將滾輪的端部作為支點而於滾輪上產生 ,=二因此,有對於滾輪的清理對象面之I力分布會變 • ^導致清理方向的中央部,滾輪與清理面不會接觸, 為除塵;於之:惡化之問題。此外’在使用黏著帶滾輪作 為除塵滾輪之情形中,容易因為壓 著帶滾輪產生敏摺,此亦為使清理性能惡^=而於部占 馨(解決系為解決上述習知技術的問題點。 為達成上述目的,本發明的曝光裝置係具備有. 以 及工作台’係載置應進行曝光之印刷配線用的基板 光罩,係描繪有應進行曝光之圖案; 其特徵為具備有: 作台 除塵滾輪,係-邊旋轉一邊接觸前述基板、工 以及光罩中之至少一個對象物,以進行除塵;以及 中 月ij述除塵滾輪係具備有··滾輪芯,· 輪芯;以及連結軸環(co〗lar), 輪芯(roller core); ,加壓裝置’係將前述除塵滾輪㈣至前述對象物,·其 轴’係插入至該滾 係配置於該軸上用以支撐滾 滾輪, 前述加㈣置係連接至帅,並經由該輛來按 壓除塵 環’係由安裝於該軸 前述連結轴環係具有··中央部軸 的中央部之硬細所構成;以及端购,係 319886 6 200844686 於5亥中央部轴環的兩 , 的軟質材料所構成。D ',且由比前述中央部軸環還軟 加墨而趣曲,^㈣置係連結至轴,雖然軸會因為 滾輪芯的鍾曲由來吸收崎曲,並抑制 化,而能有效地進行除塵:::的:理面之荷重會被均勾When there is dust between the photomask (Ph〇tomask) and the substrate, there is a problem that Z is exposed to cause a defect in the product.忒 dust contains 't; t: such as copper box itself + adhesive dust; and dry film photoresist (dry film ph〇t〇 (10) or solder resist) as its own adhesive dust In order to remove the above-mentioned dust, it is proposed to provide a dust removing device in the exposure apparatus. As the dust removing device, a configuration in which an adhesive roller or the like is used is known. [Patent Document 1] Japanese Patent No. 3533380 [Draft of the Invention] (Problems to be Solved by the Invention) However, in the case of using a dust removing device of a conventional dust removing roller, since the dust removing device is two for the roller shaft Apply a large load to the end, such as applying a load of 16〇N to the 640_wheel (10) ler) for cleaning. 5 319886 200844686 2: 冓成' will use the end of the roller as a fulcrum to produce on the roller, = two The distribution of the I force on the surface of the cleaning object for the roller will change. ^ The central portion of the cleaning direction will not contact the cleaning surface, which is dust removal; In addition, in the case of using the adhesive tape roller as the dust removing roller, it is easy to generate a sensitive fold due to the pressing of the roller, which is also to make the cleaning performance evil ^= and the part is occupied (the solution is to solve the problem of the above-mentioned conventional technology) In order to achieve the above object, the exposure apparatus of the present invention includes a substrate mask for mounting a printed wiring to be exposed, and a pattern to be exposed, and is characterized in that: a dust removing roller that rotates while contacting at least one of the substrate, the work, and the reticle to perform dust removal; and the shovel wheel has a roller core, a wheel core, and a connecting shaft a ring (co lar), a roller core; a pressurizing device 'connects the dust removing roller (4) to the object, and the shaft ' is inserted into the roller to be disposed on the shaft to support the roller And the above-mentioned addition (four) is connected to the handsome, and the dust-removing ring is pressed by the vehicle, and the dust-tight ring is attached to the central portion of the connecting shaft ring system having the central portion shaft; Department 319886 6 200844686 The soft material of the two central collars of the 5th sea is composed of D', and is softly inked by the central part of the collar, and the ^(4) is connected to the shaft, although the shaft will be The clock core of the roller core absorbs the smear and suppresses it, and can effectively perform dust removal::: The load of the surface will be uniformly hooked

滾輪時,能抑難著^心,§使㈣㈣滾輪作為 進行除塵。 贡滾輪側產生皺摺,且同樣能有效地 (發明之效果) 塵 故且=光裝置,由於可有效率地進行除 八有了只現尚良率曝光的效果。 【實施方式】 以下根據圖示說明本發明之實施形態。 首先#明用卩製造印刷配線基板之曝光裝置的整體 構成。 在第1圖中,施加有光阻劑之印刷配線基板Β係被載 置於工作台(Piaten)5上,並可利用曝光台(exp_re啊印 而於XYZ以及0方向移動。在曝光部} 〇中,在基板B上 方仏配置有安裝在光罩架(mask folder)6的光罩 (imotomask)M,並在光罩M上方配設有光源9。來自光源 9的曝光會使描繪在光罩Μ的圖案曝光於基板Β。 在上述曝光部10的一方側設置搬入部3〇,在此係由 兩製私將基板Β搬送至此處。在搬入部3 〇設有搬入手3, 利用該搬入手3吸附固定基板β,並將基板Β搬運至工作 7 319886 200844686 台5上。 於曝光部1〇的另一方側配設有搬出部40,在曝光部 1〇經曝光之基板B被搬送至此處,並於後製程中進行搬 送。搬出部4G配設有搬出手4,搬出手4會移動至工作台 5上之^板B的位置’吸附μ基板B並移送至搬出部; 产在d述搬入手3文裝有第1清理頭(fim eieaning 第1仴理頭1係女裝於搬入手3的曝光部^ 〇側,且可 向上下方向㈣’並在搬人手3進行搬人與退避動作時, 進行工作台5與基板B上面的除塵。亦即,當搬入手3往 曝光部!〇方向移動時’第i清理頭!會在預 =或接近工作台5的上面,並隨著搬人手3的移動而一 工作台5上移動,-邊進行除塵。當搬入手3到達工 :台5上日H台5會上昇而接收基板b, 之後搬入手3會退避至搬入部3〇,但在退避二 理頭1也會下降’而接觸或接近基板B的上面,並 :者人手3的移動,一邊在基板B上移動,-邊進行除 壓。 ’丁、 、藉由以上動作,構成利用第1清理頭1進行工作台5 以及基板B的除塵的型態。 。 第2圖與第3圖係顯 笸9、主饰u 貝丁弟"月理頭1的構成。後述之 弟2 π理頭2亦形成相同之構成。 第1清理頭i與第2清理頭2係具備 吸塵機12、以及除雷别^ 艰私11、 卜…… 清理滾輪11係具黏著性的滾 季間’主要係猎由該點荖、、梦 狄 者滾輪捕集例如阻劑(resist)等具有黏 319886 8 200844686 著性的塵埃。清理滾輪11的詳細構成絲後述之。 吸塵機12主要係用以抽吸無黏著性的塵埃,來進行 除塵。如上所述’藉由具備清理滾輪11與吸塵機12雙方, Pa有Ait行‘著性塵埃以及無黏著性塵埃的除塵。 在搬入部30之曝光部1G側,係構成為1有可升降 =著帶滾輪部19 ’且當搬入手3返回搬入部%時,黏 C輪部19即上升並接觸清理滾輪n,使黏著帶滾輪 二,轉而將附著在清理滾輪丨1的塵埃轉印到黏著帶滾 在本貝%形恕中,復具備有兩個除電刷13,以去除工 或基板B表面(在第2清理頭2中為光罩咖 ^ 一*電刷13係配置在清理滾輪n與吸塵機η的前 < ’:方面係用以在除塵前去除靜電,以提昇除塵效果, 13則具有在除塵後去除靜電,以避免除塵 设壓i矢再度附著的功能。 1 ::說明搬出手4。在搬出手4安裝有第2清理頭:。 二=:2係安裝於搬出手4的曝光部1〇侧,並可移動 作方:,且在搬出手4朝曝光部1〇移動與進行搬出動 :,進仃光罩Μ的除塵。亦即,#搬出手 並隨著搬出手4的移動而—邊移動於光罩Μ 〜遠订除塵。當搬出手4到達基板Β上時,搬出 手ΓΓΓ定基板β,而工作台5則會下降。之後,搬出 手4移動至搬出部40並搬出基极δ,但在進行該搬出時出 319886 9 200844686 = 昇,而接觸或接近光罩Μ,且隨著搬 二於光罩Μ,-邊進行除塵。 根據以上動作’可利用第 的除塵。 頌2進仃兩次光罩ΜWhen the roller is used, it can suppress the heart. § Let the (4) (4) roller be used for dust removal. Wrinkles are generated on the side of the tributary roller, and it is also effective (the effect of the invention). Therefore, the optical device can effectively perform the effect of removing the exposure. [Embodiment] Hereinafter, embodiments of the present invention will be described with reference to the drawings. First, the overall configuration of the exposure apparatus for manufacturing a printed wiring board is used. In Fig. 1, a printed wiring board to which a photoresist is applied is placed on a table 5 and can be moved by an exposure stage (exp_re in XYZ and 0 direction. In the exposure section) In the crucible, an imoto mask M attached to the mask folder 6 is disposed above the substrate B, and a light source 9 is disposed above the mask M. Exposure from the light source 9 causes light to be drawn The pattern of the cover is exposed to the substrate Β. The loading unit 3 is provided on one side of the exposure unit 10, and the substrate is transported here by two systems. The loading unit 3 is provided with the carrying unit 3, and the loading unit 3 is used. The loading unit 3 adsorbs the fixed substrate β, and transports the substrate 至 to the working machine 7 319886 200844686. The carrying unit 40 is disposed on the other side of the exposure unit 1 , and is transported on the exposed substrate B in the exposure unit 1 . Here, the transport is carried out in the post-process. The carry-out unit 4G is provided with the carry-out hand 4, and the carry-out hand 4 is moved to the position of the board B on the table 5 to adsorb the μ-substrate B and transfer it to the carry-out unit; d The description of the move into the hand 3 is equipped with the first cleaning head (fim eieaning 1st head 1 1 women's clothing in the move 3 When the exposure unit is on the side of the side, and can be moved up and down (four)', and when the person 3 is moved and retracted, dust is removed from the upper surface of the table 5 and the substrate B. That is, when the hand 3 is moved to the exposure unit! When moving, the 'i-cleaning head! will be pre- or near the top of the workbench 5, and move along the workbench 5 as the moving hand 3 moves, while performing dust removal. When moving into the hand 3 arrives at the work: On the previous day, the H station 5 will rise and receive the substrate b, and then the hand 3 will be retracted to the loading unit 3〇, but will fall down while the second head 1 will be lowered to contact or approach the top surface of the substrate B, and the hand 3 The movement is performed while moving on the substrate B, and the pressure is removed. In the above operation, the first cleaning head 1 is configured to perform dust removal on the table 5 and the substrate B. Fig. 2 and 3 The figure shows the composition of the main body, the main decoration u Beidingdi " Yueli head 1. The latter 2 π head 2 also forms the same structure. The first cleaning head i and the second cleaning head 2 are equipped with vacuuming. Machine 12, and in addition to Lei Bie ^ hard private 11, Bu... Clean roller 11 is a sticky season between the two 'main line hunting' Dot, the Dream Wheel roller trap, such as a resist, has dust with a viscosity of 319886 8 200844686. The detailed composition of the cleaning roller 11 will be described later. The vacuum cleaner 12 is mainly used for suctioning non-adhesive As described above, by providing both the cleaning roller 11 and the vacuum cleaner 12, Pa has Ait's dust and non-adhesive dust removal. On the side of the exposure portion 1G of the loading unit 30, the system is configured. If there is a liftable/lower one with the roller portion 19' and when the carry-in hand 3 returns to the carry-in portion, the adhesive C-wheel portion 19 rises and contacts the cleaning roller n, so that the adhesive tape roller 2 is attached to the cleaning roller. The dust of 1 is transferred to the adhesive tape and rolled in the shape of the Benbe. The second cleaning brush has two removing brushes 13 to remove the surface of the workpiece or the substrate B (in the second cleaning head 2, the mask is a brush) The 13 series is arranged in front of the cleaning roller n and the vacuum cleaner η<': to remove static electricity before dust removal to enhance the dust removal effect, and 13 to remove static electricity after dust removal to prevent the dust from being attached again. The function. 1 :: Description moves out hand 4. A second cleaning head is installed in the carrying hand 4: Two =: The second system is attached to the side of the exposure unit 1 of the unloading hand 4, and is movable: and the moving hand 4 moves toward the exposure unit 1 and moves out: the dust is removed from the mask. That is, # Moved out and moved with the movement of the hand 4 - moving over the mask 〜 ~ far-end dust removal. When the carry-out hand 4 reaches the substrate stack, the substrate β is carried out, and the table 5 is lowered. After that, the unloading hand 4 moves to the unloading unit 40 and carries out the base δ. However, when the unloading is performed, 319886 9 200844686 = liter, and the contact or proximity to the mask Μ is performed, and the 光 于 于 搬 搬Dust removal. According to the above action, the first dust removal can be utilized.颂2Into two masksΜ

此外’搬出手4除了朝卜忠壯 、主神1 4 朝上女衣外’其餘各點係盥第IIn addition, the move out of the hand 4 in addition to the Bu Zhongzhuang, the main god 1 4 up to the women's clothing, the rest of the points system I

清理頭1為同一構成 H、弟I 成。此外,且備_著嫌岁1弟圖以及弟3圖所示之構 、1薄有‘者常滾輪部19,同;Β胺〇哀u 的塵埃轉印於黏著帶滾輪部i9。 取疋:η ίο 接著’說明上述構Α中的曝光 首先,說明第!清理頭】的叙/正理的動作。 基板B搬入至搬入部3〇 ^動作。首先’由前製程將 + /+/ p 〇°於搬入部30待機的搬入手3合 夾住(吸附固定)基板B,並在 入手3會 T44r^ . 在該狀怨下使搬入手3移動(去 #王)至工作台5上之基板受授 動(去 手3移動中的預定位置下^ #生弟1π理頭1會在搬入 的上面。搬」Λ 吏滾輪11接觸工作台5 轉動,而# 績移動,藉由移動帶動清理滾輪11The cleaning head 1 is the same composition H, and the younger brother I. In addition, the dust is transferred to the adhesive tape roller portion i9, and the dust is transferred to the adhesive tape roller portion i9. Take 疋: η ίο Then 'Describe the exposure in the above structure. First, explain the first! Clean up the head of the narrative / righteous action. The substrate B is carried into the loading unit 3〇. First, the front loading process is performed by clamping the bottom plate 3 of the loading unit 30 by the front side process (adsorption fixing) of the substrate B, and at the start 3, T44r^. In this case, the moving hand 3 is moved. (Go #王) to the substrate on the workbench 5 is authorized (go to the predetermined position in the move 3) #生弟1π理头1 will be on the top of the loading. Move Λ 吏 Roller 11 touches the table 5 , while #绩移动, by moving to clean the wheel 11

轉動,而去除附著於工作台輪U 12之集塵以及除雷刷η #队+ 同蚪,進行吸塵機 夂除包刷13之除電。當搬 工作台5會上昇並接收基板β。二達= 輪Π係位於工作△ $的^ /月理滾 接益工^ 部置,並未接觸工作台5。 接4,作口 5會吸附固定基板3並下 搬入手3會回到掛i Λ都·^ Λ / ' κ接著’ 捣C入部30(回程)。此時 除已吸附固定在工作A 5 &其& β /袞輪11會去 σ 5的基板Β上面的鹿 用吸塵機12進行集塵並利用 面:塵埃。同時’利 第I清理頭^會在撕入年ΛΓ/進行除電。接著, 搬入手3移動中的預定位置上昇,而回 319886 10 200844686 到原點位置。搬入手3回至丨丨播人Q Λ /么 于口到搬入部3〇後,黏著帶滾輪部 θ上昇並與清理滾輪1接觸,且黏著帶滾輪部19會轉 動而:動清職輪U,使附著於清理滾輪u的塵埃轉印 在黏著帶滾輪部1 9。 在k期間,工作台5會上昇,基板B和光罩Μ會密 接’而光源9會亮燈而進行曝光。 接著’说明第2清理頭2的動作。Rotate to remove the dust collected from the table wheel U 12 and the de-sweeping brush η #队+同蚪, and carry out the vacuum cleaner to remove the power of the package brush 13. When the transfer table 5 rises and receives the substrate β. Erda = The rim system is located at the ^ / month of the work △ $, and is not in contact with the workbench 5. Connect 4, make the port 5 will adsorb the fixed substrate 3 and move it into the hand 3 will return to hang Λ · · ^ Λ / ' κ then ' 捣 C into the 30 (return). At this time, in addition to the dew-fixed work A 5 & the & β / 衮 wheel 11 will go to the Β 5 of the substrate 的 above the deer dust collector 12 to collect dust and use the surface: dust. At the same time, the 'Lei I cleaning head ^ will be torn into the year / to remove electricity. Next, the predetermined position in the moving hand 3 moves up, and returns to 319886 10 200844686 to the origin position. After moving the hand 3 back to the squadron Q Λ / after the mouth to the loading part 3 ,, the adhesive belt roller portion θ rises and comes into contact with the cleaning roller 1 , and the adhesive belt roller portion 19 rotates: The dust adhering to the cleaning roller u is transferred to the adhesive tape roller portion 19. During k, the table 5 will rise, the substrate B and the mask Μ will be in close contact with each other, and the light source 9 will be illuminated for exposure. Next, the operation of the second cleaning head 2 will be described.

在完成基板B的曝光後,工作台5與基板6會下降, 搬出手4由搬出部4〇移動(去程)至工作台5上之基板受授 :置。在搬出手4移動中的預定位置,第2清理頭2會上 m袞輪u接觸光罩M’而搬出手4繼續移ς, 並藉由移動帶動清理滾輪u囀動,以去除附著於光罩Μ 的塵埃。同時’進行吸塵機12之集塵以及除電刷Η的除 電。,出手4到達基板受授位置後,曝光台7與工作台$ 會上昇,並由搬出手4保持住(吸附固定)工作台5上:已 完成曝光的基板Β。接著,工作台5下降退後,使搬屮丰 4移動(回程)至搬出部40。此時與去程時相同,進行= 滾輪11與吸塵機12之光罩Μ的除塵集塵以及除電刷^ 依據上述所說明之構成,可進行基板Β與工作台5 除塵’、且每次對光罩Μ進行1次曝光時會進行兩次的^ 塵。尤其是具有可藉由工作台5的除塵,來避免在基板: 之曝光面的相反面附著乾膜光阻劑或阻焊劑等的效果。此 外,因具備有清理滾輪u以及吸塵機12兩者,故可有嗖 1 319886 200844686 去除具黏著性的塵埃以及不具黏著性的塵埃,而確實進行 除塵。此外,由於可利用除電刷13來去除靜電,故可提 除塵效果,並防止除塵後之塵埃的附著。 此外,由於第1清理頭!與第2清理頭2係安裝於搬 t 3與搬出手4,因此具有無須配置新的驅動機構等的 效果。 v 輪芯係具備有清理部“、滾 有加置的::預軸定承的!:二主且於此轴承17安裝 板B或先罩之清理面:力置將〉月理滚輪卩㈣至基 質連^的間隙我插於滾輪芯2 ^内,並藉由硬 22 Γ質連結轴環24來固定滾輪芯與軸 貝連結軸裱23與軟質連結軸環24 细 軸22的軸線方向移動,且 置係以可朝 之方式來槿成 小累釘等固定於任意位置 之方式X構成,而能調整軸線方向的位置。 硬質連結軸環23係於轴22的 個。硬質連結軸環23係由硬 :央#衣有兩 加麼裝置16所產生的荷重 貝 二使用藉由 之物者。例如在此每扩η 貝不會變形的硬度 在此男、轭形恶中,係使用不鏽鋼鋼材。 另一方面,軟質連結軸 於硬質連結軸。^預疋間隔距離設置 的軟質材料所_ ^ 由比硬質連結輛環23還軟 ㈣所構成,亚使用^加壓裝置 而具有會以預定量來變 產生的何重 又形的厚度之物者。例如,於此實施 319886 12 200844686 形1 ’係使用聚胺酉旨橡膠(咖“請^。 在上述實施形態中,以安裝有中央部 23以及兩側的軟質連結軸環24、25這三個連結輛環 式來構成的理由如下。會 、、辰之方 ‘PM Μ P,虽欲僅以中央部的硬質連έ士 二,使壓力分布予以均句化時,由於僅中央:: i力θ •交大,故為了將壓力:勺 環23的長;# n * 以加長硬質連結轴 長度然而,當加長中央部的硬質連結軸 長度卜隨著轴22_曲,硬f連 的 =:傳達至滚輪芯21,而有清理面8的心艾 不均勻之問題。 ’曰 在本只施形怨中,係以不加長硬質連結轴環U的 ^而於兩側設置軟質連結軸環24、24以謀求壓力的、 方式=,質一^ 於滾輪芯21的外側設置有清理部2〇,藉由清理部加 理面8的除塵。作為清理部2〇,可使用石夕膠滾輪 或黏者帶滾輪等。 接著,說明清理滾輪1 1的動作。 百先,S由加壓裝置16通過軸承17而施加荷重至軸 施加至軸22的荷重係傳達至軟f連結軸環24、滾輪 心21、以及清理部20 ’因此清理部2〇會被按壓至 8 〇 —第4圖係顯示施加荷重前的狀態。如第5圖所示,當 藉由加壓裝置16施加荷重時,轴22會輕曲、然而,由於 319886 200844686 ,22的翹曲會破軟質連結轴環吸 翹曲,而保持平面狀態。 文澴輪心2!不會 連結軸環23的長度。铁二予:::化一 ’需加長硬質 Μ认Η 當加長中央部的硬質連結鉦严 1#:度%,^者滾輪芯21的翹曲,硬質連結軸環23亦 .會翹曲。此外,硬質遠έ士 衣23亦After the exposure of the substrate B is completed, the stage 5 and the substrate 6 are lowered, and the substrate 4 is moved (outward) by the carry-out unit 4 to the substrate on the table 5. At the predetermined position in which the hand 4 is moved, the second cleaning head 2 contacts the mask M' with the m wheel, and moves the hand 4 to continue moving, and moves the cleaning roller u to move to remove the light. Cover the dust. At the same time, the dust collection of the vacuum cleaner 12 and the removal of the static brush are performed. After the shot 4 reaches the substrate-receiving position, the exposure table 7 and the table $ will rise, and the carry-out hand 4 will hold (adsorb the fixed) on the table 5: the exposed substrate Β. Then, after the table 5 is lowered, the moving machine 4 is moved (returned) to the carry-out unit 40. At this time, in the same manner as in the case of the departure, the dust removal and dust removal of the photoconductor 滚轮 of the roller 11 and the vacuum cleaner 12 are performed. According to the configuration described above, the substrate Β and the table 5 can be dedusted, and each time The mask 进行 will perform two times of dust when performing one exposure. In particular, it is possible to prevent the dry film photoresist or the solder resist from adhering to the opposite surface of the exposed surface of the substrate by dust removal by the table 5. In addition, since both the cleaning roller u and the vacuum cleaner 12 are provided, it is possible to remove dust with adhesive dust and non-adhesive dust by removing 1 319886 200844686. Further, since the static eliminating brush 13 can be used to remove static electricity, the dust removing effect can be removed and the adhesion of dust after dust removal can be prevented. In addition, due to the 1st cleaning head! Since the second cleaning head 2 is attached to the transport t3 and the carry-out hand 4, there is no need to arrange a new drive mechanism or the like. v The wheel core system has a cleaning part ", the roller has a fixed:: the pre-shaft bearing!! Two main and the bearing plate B or the first cover cleaning surface of the bearing 17: force set will be > month handle roller 四 (four) The gap to the substrate is inserted into the roller core 2^, and the axial direction of the roller core and the shaft coupling shaft 23 and the soft coupling collar 24 thin shaft 22 is fixed by the hard 22 enamel coupling collar 24. And the structure is configured such that the small dead nails can be fixed to an arbitrary position, and the position in the axial direction can be adjusted. The rigid connecting collar 23 is attached to the shaft 22. The rigid connecting collar 23 It is made of hard: the central #衣 has two plus, the load generated by the device 16 is used by the borrower. For example, the hardness of the yoke that is not deformed here is in the male and yoke, and the stainless steel is used. On the other hand, the soft connecting shaft is connected to the hard connecting shaft. The soft material is set to be softer than the hard connecting ring 23, and is used by a predetermined amount. To change the weight of the shape and shape of the object. For example, here 319886 12 200844686 1' is a polyamine rubber (a coffee maker). In the above embodiment, the central portion 23 and the soft connecting collars 24 and 25 on both sides are attached to each other. The reason is as follows. The meeting, the party of the 'PM Μ P, although you want to use only the hard part of the central part of the gentleman to make the pressure distribution uniform, because only the central:: i force θ • Jiaoda, so in order to Pressure: the length of the scoop ring 23; # n * to lengthen the length of the hard connecting shaft. However, when the length of the hard connecting shaft at the center portion is lengthened, the shaft 22 is curved, and the hard f connecting = is transmitted to the roller core 21, and The problem of unevenness of the heart of the face 8 is cleaned. 'In this way, only the soft joints of the collar U are not added, and the soft joint collars 24 and 24 are provided on both sides to seek pressure. =, quality one ^ The cleaning portion 2 is provided on the outer side of the roller core 21, and the dust is removed by the cleaning portion 8 of the cleaning portion. As the cleaning portion 2, a Shishi rubber roller or a sticky roller can be used. Explain the action of cleaning the roller 1 1. First, S is applied by the pressing device 16 through the bearing 17 The load applied to the shaft 22 by the shaft is transmitted to the soft f-connecting collar 24, the roller core 21, and the cleaning portion 20' so that the cleaning portion 2〇 is pressed to 8 〇 - Figure 4 shows the state before the load is applied. As shown in Fig. 5, when the load is applied by the pressurizing device 16, the shaft 22 will be slightly bent, however, since the warpage of 319886 200844686, 22 will break the soft joint collar and warp, and maintain the flat state. Wheel center 2! Does not connect the length of the collar 23. Iron II:::Chemical one's need to lengthen the hard Μ Μ Η 加 加 Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η Η The curved, rigid connecting collar 23 also warps. In addition, the hard far έ 23 also

2卜-果,合上 的翹曲會傳達至滚輪芯 ';° ^ θ ¥致清理面8的壓力分布變得不均勻。 $ 了解決上述問題,如上所述,在本實施形態中,I 構w為係將硬質連結軸環23與軟質連 ㈣置 於中央部舆:側的端部,且分別使用不同的材質:。]配置 首先藉由分別咸中央部的硬質連结轴淨2 2伽 端部的軟質連結轴環24,…二23與兩側 衣4 故此縮紐硬質連結軸環23的真 又,而不易隨著軸22的翹曲而趣曲。 乂 …,外’硬質連結軸環23的材質係使用硬質的材 廷疋由於當❹軟質的材料時,軸22會過於陷人中央部 硬質連結軸環23中,而使軸22妨礙到滾輪芯21端部之 ^由於端部的軟質連結軸们i係使用軟質的材料,故如 :5圖所不’即使車由22翹曲變形亦不會影響到滾輪芯2卜 故滾輪芯21不會翹面,能保持平面狀態。 ^如上所述,硬質連結軸環23與軟質連結軸環24係可 «周正軸22上的軸線方向位置。藉由此位置調整,能將清理 部20的壓力分布予以均勻化。為了實際上達成壓力分布均 勻的配置’係一邊測量施加至清理面8的屋力分布,一邊 319886 14 200844686 使硬質連結軸戸 亦可將軟質連=3與軟質連結軸環24滑動來調整位置。 外,亦有因為Γ軸裱24接近中央,並缓緩移動至端部。此 加的方向等之t輪芯21的長度、全體的質量、以及荷重施 均勻之情形。紅,,而在標準的構成中壓力分布無法變得 24的數目炎1 了乓加硬質連結軸環23與軟質連結軸環 求進行調整即可。 【圖式簡單說明】 _ f 1圖係顯示本發明的實施形態的概略正面圖。 里碩2的構成之構略正面圖。 ,、生第3圖係顯示本發明的實施形態的第1清理頭1斑第 /月理碩2的構成之構略平面圖。 八 、第4圖係顯示本發明的實施形態的清理滚輪u 成之概略正面圖。 、 第5圖係本發明的實施形態的清理滾輪u的動作說 明圖。 【主要元件符號說明】 2 3 第1清理頭 第2清理頭 搬入手 搬出手 工作台 光罩架 曝光台 15 319886 2008446862 Bu-fruit, the closed warp will be transmitted to the roller core '; ° ^ θ ¥ The pressure distribution of the cleaning surface 8 becomes uneven. In order to solve the above problem, as described above, in the present embodiment, the I-structure w is a portion in which the rigid connecting collar 23 and the soft connecting member (four) are placed on the side of the center portion, and different materials are used. The configuration is firstly made by the soft connecting shafts of the hard joint shafts at the central part of the salt, and the soft joints 24, ... 23 and the two sides of the garments 4, so that the tightening of the collars is hard and easy to follow. The warp of the shaft 22 is interesting.乂..., the material of the outer hard connecting collar 23 is made of a hard material. Because of the soft material, the shaft 22 is too trapped in the central hard joint collar 23, and the shaft 22 is hindered to the roller core. The end of the 21th part of the soft connecting shaft i use soft material, so as shown in Figure 5, even if the car is warped by 22, it will not affect the roller core 2, so the roller core 21 will not The warping surface can maintain a flat state. ^ As described above, the rigid connecting collar 23 and the soft connecting collar 24 can be positioned in the axial direction on the circumferential positive shaft 22. By this position adjustment, the pressure distribution of the cleaning portion 20 can be made uniform. In order to actually achieve a uniform distribution of the pressure distribution, while measuring the distribution of the force applied to the cleaning surface 8, the 319886 14 200844686 can also be used to adjust the position by sliding the soft connection shaft 3 and the soft coupling collar 24 to the position. In addition, it is also because the cymbal cymbal 24 is close to the center and slowly moves to the end. The direction of the t-turn 21, the mass of the whole, and the load are uniformly applied. Red, and in the standard configuration, the pressure distribution cannot be changed to the number of 24. 1 Pong plus hard connecting collar 23 and soft connecting collar are required to be adjusted. BRIEF DESCRIPTION OF THE DRAWINGS The _f 1 diagram shows a schematic front view of an embodiment of the present invention. The structure of the structure of the Lishu 2 is a front view. Fig. 3 is a schematic plan view showing the configuration of the first cleaning head 1 and the moon 2 of the embodiment of the present invention. 8. Fig. 4 is a schematic front view showing the cleaning roller u according to the embodiment of the present invention. Fig. 5 is a view showing the operation of the cleaning roller u according to the embodiment of the present invention. [Main component symbol description] 2 3 1st cleaning head 2nd cleaning head Handed in Handed out Work table Work stand Mask stand Exposure stage 15 319886 200844686

8 清理面 9 光源 10 曝光部 11 清理滾輪 12 吸塵機 13 除電刷 16 加壓裝置 17 轴承 19 黏著帶滾輪部 20 清理部 21 滾輪芯 22 軸 23 硬質連結轴環 24 軟質連結軸環 30 搬入部 40 搬出部 B 基板 Μ 光罩 16 3198868 Cleaning surface 9 Light source 10 Exposure part 11 Cleaning roller 12 Vacuum cleaner 13 Removing brush 16 Pressing device 17 Bearing 19 Adhesive belt roller 20 Cleaning part 21 Roller core 22 Shaft 23 Hard connecting collar 24 Soft connecting collar 30 Loading part 40 Carry out part B substrate Μ Photomask 16 319886

Claims (1)

200844686 十、申請專利範圍: .1 · 一種曝光裝置,係具備有: 工作台,係载置應進行曝光之印刷配線 板;以及 光罩,奋描緣有應進行曝光之圖案; 其特徵為具備有: 除塵滾輪,係一邊旋轉一邊接觸前述基板、 > ί、以及光罩中之至少—個對象物,以進行除塵;以 =裝置’係將前述除塵滾輪按壓於前述對象 鈾述除塵滾輪係具備有: 滾輪芯; 孕由,係插入至前述滾輪芯200844686 X. Patent application scope: .1 · An exposure device, comprising: a workbench, which is a printed wiring board on which exposure should be performed; and a photomask, which has a pattern to be exposed; There is: a dust removing roller that rotates while contacting at least one of the substrate, the gt, and the reticle to perform dust removal; and the device 系 presses the dust removing roller to the object uranium dust removing roller system Equipped with: roller core; pregnancy, inserted into the aforementioned roller core ,結軸環’係配置於該軸上㈣以切滚卜. 前述加壓裝置係連接至該轴,並經由二, 除塵滾輪; n堅 前述連結軸環係具有·· 央部之硬質材 中央部軸環,係由安裝於該軸的中 料所構成;以及 端部軸環,係分別安裝於該中央部 侧,日+ A、+、rb Α 衣的兩端部 且由比刖述中央部軸環還軟的軟質材料所Μ + -種曝光裝置,係具備有: 斤構成。 工作台’係載置應進行曝光之基板; 319886 17 200844686 係為了將該基板載置於工作台上 :板搬出I置’係將該基板從卫作台搬出;以及 光罩’係騎有應進行曝光之圖案; 其特徵為具備有: 第1除塵滾輪,係與前述基板搬人裝置連動而移 動’並於刖述基板搬入時將前述工作台予以除塵,且The knot ring is disposed on the shaft (four) to cut the roll. The pressurizing device is connected to the shaft and passes through the second dust removing roller; n the aforementioned connecting collar system has the central portion of the hard material of the central portion The shaft collar is composed of a middle material attached to the shaft; and the end collars are respectively attached to the central portion side, and the ends of the day + A, +, rb clothing are compared to the central portion The soft material of the collar is also soft. - The type of exposure device is equipped with: The workbench' is to mount the substrate to be exposed; 319886 17 200844686 is to place the substrate on the workbench: the board is carried out, the board is removed from the guard station; and the mask is mounted. a pattern for performing exposure, characterized in that: the first dust removing roller is moved in conjunction with the substrate carrying device, and the table is dusted when the substrate is carried in, and 於基板搬人後進彳了退避時,對已載置於前述工作台上 的基板進行除塵; 第1 2除塵滾輪,係與前述基板搬出裝置連動而移 動’且對前述光罩進行除塵;以及 加壓裝置,係將前述除塵滾輪按壓於前述基板或 光罩;其中, 如述除塵滾輪係具備有: 滾輪芯;When the substrate is moved and then retracted, the substrate that has been placed on the table is dedusted; the first and second dust removing rollers are moved in conjunction with the substrate carrying device and the dust is removed; and Pressing device, the dust removing roller is pressed against the substrate or the reticle; wherein, the dust removing roller is provided with: a roller core; 基板搬入裝置 而搬入基板; 軸’係插入至前述滾輪芯;以及 連、、、。軸環,係配置於該軸上而用以支撐滾弋· 除塵滾輪; 前述加壓裳置係連接至該軸,並經由該軸壓 前述連結軸環係具有: 中央部軸環,係由安裝於該轴的中央部之 料所構成;以及 、才才 ,端部軸€,係分別安裝於該中央部㈣的兩端部 側,且由比前述中央部軸環還軟的軟質材料所構成。 1 0 2 319886 200844686 •如申4專利範圍第1項或第2 j頁之曝光裝置,其中, 剛述連結軸環的數量係可增減。 4·如申請專利範圍第1、2或3項之曝光裝置,其中,前 述連結軸環係可於前述轴上移動。 如申:專利範圍第1項或第2項之曝光裝置,其中, 刖述中央部軸環係以不會因前述加壓裝置的按壓 而變形之方式來形成; 刚述端部轴環係以會因前述加壓裝置的按壓而變 形之方式來形成。 如申:專利粍圍第1項或第2項之曝光裝置,其中, ^ ^中央部軸環係由鋼材所構成; 月J述端部軸環係由聚胺酯橡膠材所構成。The substrate is loaded into the device and carried into the substrate; the shaft ' is inserted into the roller core; and the wires are connected. a collar disposed on the shaft for supporting the roller and the dust removing roller; the pressurizing skirt is coupled to the shaft, and the connecting collar is connected via the shaft: the central collar is installed The material is formed in the center of the shaft; and the end shafts are respectively attached to the both end portions of the center portion (four), and are made of a soft material softer than the central portion collar. 1 0 2 319886 200844686 • The exposure apparatus of the first or second page of the patent scope of claim 4, wherein the number of the joint collars can be increased or decreased. 4. The exposure apparatus of claim 1, 2 or 3, wherein the connecting collar is movable on the shaft. The exposure device of claim 1 or 2, wherein the central portion collar is formed so as not to be deformed by the pressing of the pressing device; It is formed in such a manner as to be deformed by the pressing of the pressurizing device. For example, the exposure apparatus of the first or the second item of the patent, wherein ^ ^ the central part of the collar is composed of steel; the end of the month is composed of polyurethane rubber. 319886 19319886 19
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