TW200842503A - Exposure method and apparatus, and device manufacturing method - Google Patents

Exposure method and apparatus, and device manufacturing method Download PDF

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Publication number
TW200842503A
TW200842503A TW096146717A TW96146717A TW200842503A TW 200842503 A TW200842503 A TW 200842503A TW 096146717 A TW096146717 A TW 096146717A TW 96146717 A TW96146717 A TW 96146717A TW 200842503 A TW200842503 A TW 200842503A
Authority
TW
Taiwan
Prior art keywords
area
pattern
exposure
light
predetermined
Prior art date
Application number
TW096146717A
Other languages
English (en)
Chinese (zh)
Inventor
Dai Arai
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200842503A publication Critical patent/TW200842503A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
TW096146717A 2006-12-08 2007-12-07 Exposure method and apparatus, and device manufacturing method TW200842503A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006331653 2006-12-08

Publications (1)

Publication Number Publication Date
TW200842503A true TW200842503A (en) 2008-11-01

Family

ID=39511524

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096146717A TW200842503A (en) 2006-12-08 2007-12-07 Exposure method and apparatus, and device manufacturing method

Country Status (3)

Country Link
JP (1) JPWO2008072502A1 (fr)
TW (1) TW200842503A (fr)
WO (1) WO2008072502A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5507875B2 (ja) * 2009-04-14 2014-05-28 キヤノン株式会社 露光装置、露光方法およびデバイス製造方法
JP5771938B2 (ja) * 2010-10-14 2015-09-02 株式会社ニコン 露光方法、サーバ装置、露光装置及びデバイスの製造方法
CN103987249B (zh) 2011-12-12 2015-10-21 冈山县 用于提高植物的氨基酸含量的化合物及其应用
EP2920649B1 (fr) * 2012-11-19 2023-03-29 ASML Netherlands B.V. Système de mesure de position et réseau pour système de mesure de position

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4200395A (en) * 1977-05-03 1980-04-29 Massachusetts Institute Of Technology Alignment of diffraction gratings
JPH0616478B2 (ja) * 1983-12-19 1994-03-02 株式会社ニコン 投影露光装置の位置合せ装置
JPH06267828A (ja) * 1993-03-11 1994-09-22 Toshiba Corp 位置合せ装置
JP3369266B2 (ja) * 1993-09-24 2003-01-20 株式会社ニコン ステージの位置制御精度の測定方法
JPH07335529A (ja) * 1994-06-09 1995-12-22 Nikon Corp 投影露光装置
JPH09152309A (ja) * 1995-11-29 1997-06-10 Nikon Corp 位置検出装置および位置検出方法
EP1791169A4 (fr) * 2004-08-31 2011-03-02 Nikon Corp Procede d'alignement, systeme de traitement, procede de mesure de repetabilite de chargement de substrat, procede de mesure de position, procede d'exposition, appareil de traitement de substrat, procede de mesure et...
JP2007115758A (ja) * 2005-10-18 2007-05-10 Nikon Corp 露光方法及び露光装置
KR101356270B1 (ko) * 2006-02-21 2014-01-28 가부시키가이샤 니콘 패턴 형성 장치, 마크 검출 장치, 노광 장치, 패턴 형성 방법, 노광 방법 및 디바이스 제조 방법
JP2007324159A (ja) * 2006-05-30 2007-12-13 Nikon Corp マーク位置計測装置、露光装置、マーク位置計測方法、及びマイクロデバイスの製造方法

Also Published As

Publication number Publication date
WO2008072502A1 (fr) 2008-06-19
JPWO2008072502A1 (ja) 2010-03-25

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