TW200837221A - Metal strip, connector, and method for producing metal strip - Google Patents
Metal strip, connector, and method for producing metal strip Download PDFInfo
- Publication number
- TW200837221A TW200837221A TW096148941A TW96148941A TW200837221A TW 200837221 A TW200837221 A TW 200837221A TW 096148941 A TW096148941 A TW 096148941A TW 96148941 A TW96148941 A TW 96148941A TW 200837221 A TW200837221 A TW 200837221A
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- metal strip
- metal
- compound
- base metal
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/617—Crystalline layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006342073A JP2008150690A (ja) | 2006-12-20 | 2006-12-20 | 金属条、コネクタ、および金属条の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200837221A true TW200837221A (en) | 2008-09-16 |
Family
ID=39536350
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096148941A TW200837221A (en) | 2006-12-20 | 2007-12-20 | Metal strip, connector, and method for producing metal strip |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2008150690A (fr) |
TW (1) | TW200837221A (fr) |
WO (1) | WO2008075723A1 (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009097053A (ja) * | 2007-10-19 | 2009-05-07 | Hitachi Ltd | 金属条、コネクタ、および金属条の製造方法 |
US8653375B2 (en) | 2008-08-21 | 2014-02-18 | Agere Systems, Inc. | Mitigation of whiskers in Sn-films |
US9748683B2 (en) * | 2013-03-29 | 2017-08-29 | Kobe Steel, Ltd. | Electroconductive material superior in resistance to fretting corrosion for connection component |
JP6365182B2 (ja) * | 2014-09-26 | 2018-08-01 | 株式会社オートネットワーク技術研究所 | コネクタ用電気接点材料及びその製造方法 |
CN104453516A (zh) * | 2014-12-04 | 2015-03-25 | 常熟宝成五金制品有限公司 | 耐低温的合页 |
CN104963578A (zh) * | 2015-06-17 | 2015-10-07 | 苏州市大力电器有限公司 | 用于摩擦式定位合页的金属材料 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2851245B2 (ja) * | 1994-12-28 | 1999-01-27 | 古河電気工業株式会社 | Sn合金めっき材 |
JPH11350188A (ja) * | 1998-06-03 | 1999-12-21 | Furukawa Electric Co Ltd:The | 電気・電子部品用材料とその製造方法、およびその材料を用いた電気・電子部品 |
JP2002226982A (ja) * | 2001-01-31 | 2002-08-14 | Dowa Mining Co Ltd | 耐熱性皮膜、その製造方法および電気電子部品 |
JP2004300524A (ja) * | 2003-03-31 | 2004-10-28 | Dowa Mining Co Ltd | Sn被覆を施した銅または銅合金部材およびその製造方法 |
JP2006161127A (ja) * | 2004-12-09 | 2006-06-22 | Takamatsu Mekki:Kk | 嵌合型接続端子に適した電子材料とその製造方法 |
JP2006196323A (ja) * | 2005-01-14 | 2006-07-27 | Takamatsu Mekki:Kk | 接続端子およびその製造方法 |
-
2006
- 2006-12-20 JP JP2006342073A patent/JP2008150690A/ja active Pending
-
2007
- 2007-12-19 WO PCT/JP2007/074441 patent/WO2008075723A1/fr active Application Filing
- 2007-12-20 TW TW096148941A patent/TW200837221A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
WO2008075723A1 (fr) | 2008-06-26 |
JP2008150690A (ja) | 2008-07-03 |
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