TW200835944A - Black matrix high sensitive photoresist composition for liquid crystal display and black matrix prepared by using the same - Google Patents

Black matrix high sensitive photoresist composition for liquid crystal display and black matrix prepared by using the same Download PDF

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TW200835944A
TW200835944A TW96150009A TW96150009A TW200835944A TW 200835944 A TW200835944 A TW 200835944A TW 96150009 A TW96150009 A TW 96150009A TW 96150009 A TW96150009 A TW 96150009A TW 200835944 A TW200835944 A TW 200835944A
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meth
acrylate
raven
group
black matrix
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TW96150009A
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TWI380058B (en
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Dong-Chang Choi
Ho-Chan Ji
Geun-Young Cha
Dae-Hyun Kim
Kyung-Soo Choi
Han-Soo Kim
Sung-Hyun Kim
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Lg Chemical Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Inorganic Chemistry (AREA)
  • Optical Filters (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

The present invention relates to a black matrix photoresist composition for a liquid crystal display and a black matrix manufactured by using the same. In particular, in a photoresist composition that includes a coloring agent containing a black pigment, an alkali-soluble resin binder, a multifunctional monomer having an ethylenically unsaturated double bond, a photopolymerization initiator, and a solvent, a high-resolution pattern can be obtained by controlling a characteristic of a binder used, that is, a ratio of a reactive group and an acid value, and a margin with respect to a process characteristic is improved, and an excellent pattern characteristic is obtained without causing a pattern to be omitted or a residue to be generated.

Description

200835944 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種液晶顯示器用之黑色矩陣光阻組成 物及一種使用其製備之黑色矩陣。本發明尤其關於一種液 5晶顯不器用之黑色矩陣，其在確保具有較廣之製程限度 下，能具有高光敏感度且僅以輕微的曝光量即可穩定形成 圖案，因而能減少製程時間並提升產量，且能確保其具有 極佳遮光特性，進而較容易應用在使用較亮背光之大尺寸 電視上。 0 本發明之優先權為韓國專利申請第10-2006-133555 號，於2006年12月26日向韓國智慧財產局申請，而其所有 的内容皆可併入本發明以供參考。 【先前技術】 5 一般而言，使用含有顏料之光阻組成物形成圖案，容 易因顯影或水洗而產生缺陷，且若提升圖案附著力，非影 像部分的溶解度則在曝光時會劣化並易產生污染。而發生 的原因為父聯密度以及光敏感度低，亦即在透過顯影形成 圖案時其顯影限度較狹小。 0 為了要提升對比度，一般是將一種稱為黑色矩陣之黑 色晶格圖案置於彩色濾、光片之彩色4素間。在本技術領域 中，於黑色矩陣中使用鉻。其製作過程中，鉻沉積於玻璃 基板的全部表面，且透過蝕刻製成形成圖案，而這樣的製 程成本高且會導致一些問題，如鉻之高反射率以及含絡廢 5 200835944 水所產生的環境污_ 之海料八&士 因此，各方已利用可執行精密製程 之顏枓刀政方法積極研究樹脂黑色矩陣。 或各光阻組成物的製備，是利用不同顏色的顏料 .此合以具有黑、色。纟於光阻組成物是用來遮住 /其包合大量之不會受顯影溶液溶解之顏料。因此， ΐ間光阻組成物具有下列的問題：顯影性不佳、需長 心:r、或不能取得所f之解析度。因此，在製備彩色 思、包3黑色矩陣之每一顏色都必須提升其顯影性。 10 15 =以研究出-種方法其使用非碳黑之著色顏料來製 …、組成物，然而非碳黑之著色顏料其遮光性不佳。因 …、色矩陣光阻組成物必須包含具有高混合比例之著色 ”料、、士此會造成組成物的黏度增加，使得組成物難以處 里或、成所形成薄膜的強度或薄膜與基板的黏著性減弱。 因此，需料多研究發展出一種液晶顯示器用之黑色 ，陣光阻組成物，其具有極佳之著色強度、遮蓋力、以及 、、巴緣性與顯影性。在此’已研究出此類的黑色矩陣光阻組 成物。 因此，已有許多光阻組成物的研究，而研究結果如下 列_露。例如，日本專利申請公開第2005-156930揭露-20種彩色滤，片組成物，其為了提升感光度而使用一種新發 ^出的黏著劑，·而日本專财請公開第·5_338328號揭露 一種黑色樹脂組成物，其藉由制高感光聚合起始劑來提 升感光度。再者，日本專利申請公開第2〇〇4_347916號揭露 一種黑色矩P車組成4勿’其透過使用％聚合起始劑與有機磷 200835944 ^ 化合物來提升感光度。其他的例子，如日本專利公開申請 第 2005-215378號、第 2005—227797號、第 2005-275218號、 ‘ 第 2000-227654號、第 1999-326606號、以及第 1999-143056 . 號，美國專利第5,866,298號，以及韓國專利申請公開第 5 2006-0076413號及第2002-0031093號皆揭露黑色矩陣之顯 影製程。 近年來，液晶顯示器（LCD)在平面顯示器的領域中扮演 重大的角色。著重於小型及中型行動設備用顯示器或螢幕 # 之LCD領域，已朝大尺寸顯示器或電視發展。隨著玻璃的 10 尺寸加大，必須確保高感光度以減少反應時間。既然因為 螢幕尺寸的增加而必須提升亮度，則已經採用能提升亮度 之背光光源。隨著背光光源的亮度提升，已經需要有黑色 矩陣以提供相較於本技術領域中更佳優異的遮光特性。由 於為了提升遮光特性，從而提高組成物中碳黑之含量，常 15 會造成黑色組成物之製程限度劣化。由於碳黑能有效吸收 紫外光以及可見光，因而難以於照射紫外光形成圖案時， φ 傳送光線至阻膜的底端。因此，底端難以硬化，附著力劣 化，且在顯影時會產生一部分光阻移除或下端凹陷而形成T 頂型圖案（T-top-typed pattern)。此外，照射的能量會持續的 20 減少以節省製程時間，因此難以形成穩固的圖案。 因此，必須進行許多研究，以能改善黑色矩陣光阻組 成物與基板之附著力、較廣泛的顯影製程限度、並改善光 感度。 7 200835944 【發明内容】 • 為了解決上述相關技術領域中之問題，本案發明人發 • 現纟製備液晶顯不器用之黑色矩陣光阻組成物期間，藉由 控制各成分中具特定結構之黏著劑的酸值與不飽和雙鍵的 5比例，可於製備黑色矩陣的同時確保高感光度及廣泛之製 程限度，且所得到的圖案具有極佳特性。 本發明提供一種液晶顯示器用之黑色矩陣光阻組成 • 物，其使用一具有特定結構之黏著劑，並控制黏著劑酸值 與不飽和雙鍵比例；且本發明提供一種液晶顯示器用之黑 10色矩陣，其採用液晶顯示器用之黑色矩陣光阻組成物所製 備而成。 抑再者，本發明提供一種液晶顯示器，其包含液晶顯示 器用之黑色矩陣。 為達成上述目的’本發明提供一種液晶顯示器用之黑 5色矩陣光阻組成物，在1〇〇重量份之黑色矩陣光阻組成物 φ 中包括· U 1至40重量份之一含黑色顏料之著色劑；2) 1 至20,量份之一如下式丨所示之鹼溶性樹脂黏著劑；3) i至 20重ϊ份之一具有乙烯性不飽和雙鍵之多官能基單體；句 1至20重里伤之一光聚合起始劑；以及5) 30至90重量份之 20 一溶劑； [式1] 8 200835944200835944 IX. Description of the Invention: [Technical Field] The present invention relates to a black matrix photoresist composition for a liquid crystal display and a black matrix prepared using the same. The invention relates in particular to a black matrix for a liquid crystal display, which can have high light sensitivity and can form a pattern stably with only a slight exposure amount while ensuring a wide process limit, thereby reducing process time and improving The output is guaranteed to have excellent light-shielding properties, making it easier to apply to large-size TVs that use brighter backlights. The priority of the present invention is Korean Patent Application No. 10-2006-133555, filed on Jan. 26, 2006, to the Korean Intellectual Property Office, the entire contents of which are hereby incorporated by reference. [Prior Art] 5 In general, a pattern is formed using a photoresist composition containing a pigment, which is liable to cause defects due to development or water washing, and if the pattern adhesion is promoted, the solubility of the non-image portion is deteriorated and easily generated upon exposure. Pollution. The reason for this is that the density of the paternity is low and the light sensitivity is low, that is, the development limit is narrow when the pattern is formed by development. 0 In order to improve the contrast, a black crystal lattice pattern called a black matrix is generally placed between the color filter and the color of the light film. In the art, chromium is used in the black matrix. During the production process, chromium is deposited on the entire surface of the glass substrate and patterned by etching, and such a process is costly and causes problems such as high reflectivity of chromium and the formation of water containing 200835944 Environmental pollution _ The sea material eight & Therefore, all parties have actively studied the resin black matrix using the method of performing the precision process. Or the preparation of each photoresist composition is to use pigments of different colors. This combination has black and color. The photoresist composition is used to cover/contain a large amount of pigment which is not dissolved by the developing solution. Therefore, the inter-turn photoresist composition has the following problems: poor developability, need to be long-term: r, or the resolution of f cannot be obtained. Therefore, it is necessary to improve the developability of each color of the color matrix and the package 3 black matrix. 10 15 = In the method of research, it uses a non-carbon black colored pigment to make a composition, but a non-carbon black colored pigment has poor light-shielding properties. Because the color matrix photoresist composition must contain a coloring material with a high mixing ratio, it may cause an increase in the viscosity of the composition, making it difficult for the composition to be in or into the strength of the formed film or the film and the substrate. Adhesiveness is weakened. Therefore, it is necessary to develop a black, array photoresist composition for liquid crystal displays, which has excellent color strength, hiding power, and, edge and developability. A black matrix resist composition of this type has been studied. Therefore, there have been many studies on photoresist compositions, and the results of the research are as follows. For example, Japanese Patent Application Laid-Open No. 2005-156930 discloses -20 kinds of color filters, A composition which uses a newly-developed adhesive for the purpose of improving the sensitivity, and Japanese Patent No. 5_338328 discloses a black resin composition which is improved by a high-sensitivity polymerization initiator. Further, Japanese Patent Application Laid-Open No. Hei. No. Hei. No. Hei. No. Hei. No. 4-347916 discloses a black moment P composition 4 which does not pass through the use of a % polymerization initiator and an organophosphorus 200835944 ^ compound. The sensitivity is increased. Other examples are, for example, Japanese Patent Application Laid-Open No. 2005-215378, No. 2005-227797, No. 2005-275218, No. 2000-227654, No. 1999-326606, and No. 1999-143056. No. 5,866,298, and Korean Patent Application Publication Nos. 5 2006-0076413 and 2002-0031093 disclose a black matrix development process. In recent years, liquid crystal displays (LCDs) have played a major role in the field of flat panel displays. The role of the LCD field, which focuses on small or medium-sized mobile devices for displays or screens, has evolved toward large-size displays or televisions. As the size of the glass increases, high sensitivity must be ensured to reduce reaction time. In order to increase the brightness, a backlight source capable of increasing the brightness has been used. As the brightness of the backlight source is increased, a black matrix is required to provide better shading characteristics than in the prior art. Characteristics, thereby increasing the content of carbon black in the composition, often 15 will cause the process limit of the black composition to deteriorate Since carbon black can effectively absorb ultraviolet light and visible light, it is difficult to form a pattern when irradiated with ultraviolet light, and φ transmits light to the bottom end of the resist film. Therefore, the bottom end is hard to be hardened, the adhesion is deteriorated, and a part is generated during development. The photoresist is removed or the lower end is recessed to form a T-top-typed pattern. In addition, the energy of the illumination is continuously reduced by 20 to save process time, so it is difficult to form a stable pattern. Therefore, many studies must be conducted. In order to improve the adhesion of the black matrix photoresist composition to the substrate, a wider range of development process, and improve the light sensitivity. 7 200835944 SUMMARY OF THE INVENTION In order to solve the above problems in the related art, the inventors of the present invention have made it possible to control an adhesive having a specific structure in each component during the preparation of a black matrix photoresist composition for a liquid crystal display. The ratio of the acid value to the unsaturated double bond 5 can be used to prepare a black matrix while ensuring high sensitivity and a wide range of process limits, and the resulting pattern has excellent characteristics. The present invention provides a black matrix photoresist composition for a liquid crystal display, which uses an adhesive having a specific structure and controls the ratio of the acid value of the adhesive to the unsaturated double bond; and the present invention provides a black for a liquid crystal display. A color matrix prepared using a black matrix photoresist composition for a liquid crystal display. Still further, the present invention provides a liquid crystal display comprising a black matrix for a liquid crystal display. In order to achieve the above object, the present invention provides a black 5-color matrix photoresist composition for a liquid crystal display, comprising: 1 to 1 part by weight of a black pigment in 1 part by weight of the black matrix photoresist composition φ a coloring agent; 2) 1 to 20, an alkali-soluble resin adhesive of the following formula: 3) i to 20 parts by weight of a polyfunctional monomer having an ethylenically unsaturated double bond; a photopolymerization initiator of 1 to 20 heavy injuries; and 5) 30 to 90 parts by weight of 20 a solvent; [Formula 1] 8 200835944

五元環羧酸酐之自由基，如丁二醯亞胺（succinimide)或丁二 酸酐（succinic anhydride)， R2係選自由氫、曱基、以及羥甲基所組成之群組， R3及R4可彼此相同或不同且獨立為氫或甲基， 10a free radical of a five-membered cyclic carboxylic anhydride, such as succinimide or succinic anhydride, R2 is selected from the group consisting of hydrogen, sulfhydryl, and hydroxymethyl, R3 and R4 are Same or different from each other and independently hydrogen or methyl, 10

15 X係選自由(^至。!2之烷基酯、（：2至(^6之經1或2個羥基 取代之烷基酯、C2至C6之經(^至(：3之烷氧基取代之烷基 酯、（：！至（：6之經鹵素取代之烷基酯、（^至（：3之烷氧聚（n=2 至30)亞烷、C2及C3之二醇酯、（^至（：6之經苯基取代之烷基 酯、經(^至匕之烷基取代之苯基、經(^至!^之烷氧基取代 之苯基、經_素取代之苯基、（^至^之烷氧基曱基基團、 縮水甘油醚氧（glycidoxy)甲基基團、以及一形成醯亞胺結構 或與R1—同形成五元環羧酸酐之自由基所組成之群組，如 順丁稀二酿亞胺（maleimide)或順丁烯二酸酐（maieic anhydride)， Y係選自由CG至C12之亞烷基、及€：3至€：6〇之包含1至10 酯類基團亞烧基酯所組成之群組， 9 200835944 Z係選自由亞乙基、亞丙基、亞丁基、1，2-亞苯基、ι，215 X is selected from the group consisting of alkyl esters of (^ to .. 2, (2: to 6 alkyl esters substituted by 1 or 2 hydroxyl groups, C2 to C6 (^ to (3) alkoxy Alkyl-substituted alkyl esters, (:! to (6) halogen-substituted alkyl esters, (^ to (: 3 alkoxy poly(n=2 to 30) alkylene, C2 and C3 glycol esters) , (^ to (: 6 phenyl substituted alkyl ester, phenyl substituted by ^ to 烷基 alkyl, phenyl substituted by (^ to ! ^ alkoxy, substituted by _ a phenyl group, an alkoxyalkyl group of (^ to ^, a glycidoxymethyl group, and a radical which forms a quinone imine structure or forms a five-membered cyclic carboxylic anhydride with R1. a group consisting of, for example, maleimide or maleic anhydride, Y is selected from the group consisting of alkylenes from CG to C12, and from €:3 to €:6. Group of 1 to 10 ester group alkylene esters, 9 200835944 Z series selected from ethylene, propylene, butylene, 1,2-phenylene, ι, 2

組成之群組（其中*表示連接部分），以及a group of groups (where * indicates the connection part), and

1010

a、b、c、以及d分別表示A、B、C、以及D之莫耳數比， 且a的範圍為10至90、b的範圍為0至60、c的範圍為〇至4〇、 而d的範圍為〇至4〇)。 再者，本發明提供一種液晶顯示器用之黑色矩陣，其 製備方法之步驟包含： 1)於一面板上，塗覆本發明之液晶顯示器用之黑色矩 陣光阻組成物；以及 2)曝光及顯影此塗覆之黑色矩陣光組成物。 另外，本發明提供一種液晶顯示器，丨包含液晶顯示 器用之黑色矩陣。 本發明之液晶顯示器用之黑色矩陣之優點，在於有極 佳的顯影性、遮光性、以及絕緣性，而無殘基生成，且避 免因熱處理而有顯示缺陷產生。 亦即在本發明中’當藉由控制具有特定結構之黏著劑 的酸值與不飽和雙鍵比例製備黑色矩陣時，則可能利用少 量曝光達到高光密度進行圖案化步驟’因而能形成具有二 佳強度及膜特性之圖案。 20 200835944 接下來，透過本發明光阻組成物之示例來加以說明本 發明。然而，應了解的是本發明所述之實施例並不用來限 制本發明，而僅用來說明實施態樣。 本發明之含黑色顏料之著色劑可為一碳黑及至少一著 5 色顏料之混合物。a, b, c, and d represent the molar ratios of A, B, C, and D, respectively, and a ranges from 10 to 90, b ranges from 0 to 60, and c ranges from 〇 to 4, And the range of d is 〇 to 4〇). Furthermore, the present invention provides a black matrix for a liquid crystal display, the steps of which the method comprises the steps of: 1) coating a black matrix photoresist composition for a liquid crystal display of the present invention on one side panel; and 2) exposing and developing This coated black matrix light composition. Further, the present invention provides a liquid crystal display comprising a black matrix for a liquid crystal display. The black matrix for a liquid crystal display of the present invention has the advantages of excellent developability, light-shielding property, and insulating property without residue generation, and avoids display defects due to heat treatment. That is, in the present invention, when a black matrix is prepared by controlling the ratio of an acid value to an unsaturated double bond of an adhesive having a specific structure, it is possible to perform a patterning step by using a small amount of exposure to achieve a high optical density. Pattern of strength and film properties. 20 200835944 Next, the present invention will be described by way of an example of the photoresist composition of the present invention. However, it should be understood that the embodiments of the invention are not to be construed as limiting the invention. The black pigment-containing coloring agent of the present invention may be a mixture of carbon black and at least one color pigment.

碳黑的例子包括：SEAST 5HIISAF-HS、SEAST KH、 SEAST 3HHAF-HS、SEAST NH、SEAST 3M、SEAST 300HAF-LS、SEAST 116HMMAF-HS、SEAST 116MAF、 SEAST FMFEF-HS、SEAST SOFEF、SEAST VGPF、SEAST 1〇 SVHSRF-HS、以及 SEAST SSRF (由 Tokai Carbon Co·，Ltd. 購得）；DIAGRAM BLACK II、DIAGRAM BLACK N339、 DIAGRAM BLACK SH、DIAGRAM BLACK H、DIAGRAM LH、DIAGRAM HA、DIAGRAM SF、DIAGRAM N550M、 DIAGRAM M、DIAGRAM E、DIAGRAM G、DIAGRAM R、 15 DIAGRAM N760M、DIAGRAM LR、#2700、#2600、#2400、 #2350、#2300、#2200、#1000、#980、#900、MCF88、#52、 #50、#47、#45、#45L、#25、#CF9、#95、#3030、#3050、 MA7、MA77、MA8、MA11、OIL7B、OIL9B、OIL11B、 OIL30B、以及 OIL31B (由 Mitsubishi Chemical Corporation 2〇 購得）；PRINTEX-U、PRINTEX-V、PRINTEX_140U、 PRINTEX-140V 、 PRINTEX-95 、 PRINTEX-85 、 PRINTEX-75、PRINTEX-55、PRINTEX-45、PRINTEX-300、 PRINTEX-35、PRINTEX-25、PRINTEX-200、PRINTEX-40、 PRINTEX-30 、 PRINTEX-3 、 PRINTEX-A 、 SPECIAL 11 200835944 BLACK-550 、 SPECIAL BLACK-350 、 SPECIAL BLACK-250 、 SPECIAL BLACK-100 、以及 LAMP BLACK-101 (由 Degussa Japan Company 購得）；以及 RAVEN-1100ULTRA 、 RAVEN-1080ULTRA 、 5 RAVEN-1060ULTRA、RAVEN-1040、RAVEN-1035、 RAVEN-1020、RAVEN-1000、RAVEN- 890H、RAVEN-890、 RAVEN-880ULTRA、RAVEN-860ULTRA、RAVEN_850、 RAVEN-820、RAVEN_790ULTRA、RAVEN-780ULTRA、 RAVEN-760ULTRA 、 RAVEN-520 、 RAVEN-500 、 10 RAVEN-460 、 RAVEN-450 、 RAVEN-43 OULTRA 、 RAVEN-420 、 RAVEN-410 、 RAVEN-2500ULTRA 、 RAVEN-2000、RAVEN-1500、RAVEN-1255、RAVEN-1250、 RAVEN-1200、RAVEN-1190ULTRA、以及RAVEN-1170 (由Examples of carbon black include: SEAST 5HIISAF-HS, SEAST KH, SEAST 3HHAF-HS, SEAST NH, SEAST 3M, SEAST 300HAF-LS, SEAST 116HMMAF-HS, SEAST 116MAF, SEAST FMFEF-HS, SEAST SOFEF, SEAST VGPF, SEAST 1〇SVHSRF-HS, and SEAST SSRF (available from Tokai Carbon Co., Ltd.); DIAGRAM BLACK II, DIAGRAM BLACK N339, DIAGRAM BLACK SH, DIAGRAM BLACK H, DIAGRAM LH, DIAGRAM HA, DIAGRAM SF, DIAGRAM N550M, DIAGRAM M, DIAGRAM E, DIAGRAM G, DIAGRAM R, 15 DIAGRAM N760M, DIAGRAM LR, #2700, #2600, #2400, #2350, #2300, #2200, #1000, #980, #900, MCF88, #52 , #50, #47, #45, #45L, #25, #CF9, #95, #3030, #3050, MA7, MA77, MA8, MA11, OIL7B, OIL9B, OIL11B, OIL30B, and OIL31B (by Mitsubishi Chemical Corporation 2〇); PRINTEX-U, PRINTEX-V, PRINTEX_140U, PRINTEX-140V, PRINTEX-95, PRINTEX-85, PRINTEX-75, PRINTEX-55, PRINTEX-45, PRINTEX-300, PRINTEX-35, PRINTEX -25, PRINTEX-200, PRINTEX-40, PRINTEX-30, PRINTEX-3, PRINTEX-A , SPECIAL 11 200835944 BLACK-550, SPECIAL BLACK-350, SPECIAL BLACK-250, SPECIAL BLACK-100, and LAMP BLACK-101 (available from Degussa Japan Company); and RAVEN-1100ULTRA, RAVEN-1080ULTRA, 5 RAVEN-1060ULTRA , RAVEN-1040, RAVEN-1035, RAVEN-1020, RAVEN-1000, RAVEN- 890H, RAVEN-890, RAVEN-880ULTRA, RAVEN-860ULTRA, RAVEN_850, RAVEN-820, RAVEN_790ULTRA, RAVEN-780ULTRA, RAVEN-760ULTRA, RAVEN -520, RAVEN-500, 10 RAVEN-460, RAVEN-450, RAVEN-43 OULTRA, RAVEN-420, RAVEN-410, RAVEN-2500ULTRA, RAVEN-2000, RAVEN-1500, RAVEN-1255, RAVEN-1250, RAVEN -1200, RAVEN-1190ULTRA, and RAVEN-1170 (by

Columbia Carbon Co·購得）。 15Columbia Carbon Co· purchased). 15

20 可與碳黑混合之著色顏料包含：寶紅（Carmine 6B，C.I· 12490)、酞菁綠（Phthalocyanine Green，C.I· 74260)、酞菁藍 (Phthalocyanine Blue, C.I. 74160)、三菱碳黑20 Color pigments that can be mixed with carbon black include: Carmine 6B (C.I. 12490), Phthalocyanine Green (C.I. 74260), Phthalocyanine Blue (C.I. 74160), Mitsubishi Carbon Black

MA100(Mitsubishi Carbon Black MA100)、花黑（Perylene Black，BASF K0084及 K0086)、青藍黑（Cyanine Black)、雷 奥諾爾黃（Lionol Yellow，C.I· 21090)、雷奥諾爾黃 GRO(Lionol Yellow GRO，C.I.21090)、聯苯胺黃 4T-564D(Benzidine Yellow 4T-564D)、三菱碳黑 MA-40(Mitsubishi Carbon Black MA-40)、維多利亞 Ιέ 藍 (Vi0toria Pure Blue，C.L 42595)、C.I·顏料紅（PIGMENT 12 200835944 RED)97，122，149，168，177，180，192，215 ; C.L顏料綠 (Pigment Green)7, 36 ; C.I·顏料（PIGMENT)15:1，15:4, 15:6, 22，60，64; C.I.顏料（PIGMENT)83，139;以及 C.I·顏料紫 (PIGMENT VIOLET)23。此外，可使用白色顏料以及螢光顏 5 料。再者，著色顏料可由一種或以上之著色顏料混合而得 到黑色。MA100 (Mitsubishi Carbon Black MA100), Flower Black (Perylene Black, BASF K0084 and K0086), Cyanine Black, Lionol Yellow (CI 21090), Leonor Yellow GRO (Lionol Yellow GRO) , CI21090), benzidine yellow 4T-564D (Benzidine Yellow 4T-564D), Mitsubishi carbon black MA-40 (Mitsubishi Carbon Black MA-40), Victoria Indigo (Vi0toria Pure Blue, CL 42595), CI·Pigment Red (PIGMENT 12 200835944 RED) 97,122,149,168,177,180,192,215 ; CL Pigment Green 7,36 ; CI·Pigment 15:1,15:4, 15:6 , 22, 60, 64; CI pigment (PIGMENT) 83, 139; and CI · Pigment Violet (PIGMENT VIOLET) 23. In addition, white pigments and fluorescent pigments can be used. Further, the coloring pigment may be obtained by mixing one or more coloring pigments to obtain black.

10 1510 15

20 本發明之如式1所示之鹼溶性樹脂黏著劑可包含下列 之單體。用以形成A部分之單體例子可包含選自由下列其中 至少一者：不飽和碳酸i旨類（imsaturated carboxylic acid esters)，如甲基丙稀酸苯酉旨（benzyl (meth)acrylate)、甲基丙 稀酸曱酯（methyl(meth)acrylate)、甲基丙稀酸乙酯 (ethyl(meth)acrylate)、甲基丙稀酸丁酉I (butyl (meth)acrylate)、甲基丙浠酸二曱基胺基乙酯 (dimethylaminoethyl(meth)acrylate)、甲基丙烯酸異丁醋 (isobutyl(meth)acrylate)、曱基丙浠酸第三丁醋 (t-butyl(meth)acrylate)、 甲基丙烯酸環己酉旨 (cyclohexyl(meth)acrylate)、 甲基丙烯酸異冰片醋 (isobornyl(meth)acrylate)、 甲基丙烯酸乙基己酯 (ethylliexyl(meth)acrylate)、曱基丙烯酸（2_ 苯氧乙基）醋 (2-phenoxyethyl(meth)acrylate)、曱基丙烯酸四氫吱ϋ南基酯 (tetrahydrofurfuryl (meth)acrylate)、甲基丙浠酸經乙醋 (liydroxyethyl(metli)acrylate)、曱基丙烯酸（2-經丙基）醋 (2-hydroxypropyl(meth)acrylate)、甲基丙烯酸（2-經基-3-氯 丙基）酯（2-hydroxy-3-chloropropyl(meth)acrylate)、甲基丙 13 200835944The alkali-soluble resin adhesive of the present invention as shown in Formula 1 may contain the following monomers. Examples of the monomer used to form the A moiety may comprise at least one selected from the group consisting of: unsaturated carboxylic acid esters, such as benzyl (meth)acrylate, Methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, methyl propyl acrylate Dimethylaminoethyl (meth)acrylate, isobutyl(meth)acrylate, t-butyl(meth)acrylate, methacrylic acid Cyclohexyl(meth)acrylate, isobornyl(meth)acrylate,ethylliexyl(meth)acrylate,methacrylic acid (2-phenoxyethyl) (2-phenoxyethyl (meth)acrylate), tetrahydrofurfuryl (meth)acrylate, methacrylic acid (liydroxyethyl (metli)acrylate), methacrylic acid ( 2-hydroxypropyl (meth)acrylate, methacrylic acid (2-amino-3-) Propyl) ester (2-hydroxy-3-chloropropyl (meth) acrylate), methyl propyl 13200835944

烯酸（4-經丁基）酯（4-hydroxybutyl(meth)acrylate)、甲基丙稀 酸（醢基辛氧基-2·經基丙基）酯（acyloctyloxy-2-hydroxypropyl(meth)acrylate)、甲基丙稀酸甘油 Μ 醋 (glycerol(meth)acrylate)、甲基丙烯酸（2-甲氧基乙基）酉旨 (2-methoxyethyl(meth)acrylate)、甲基丙稀酸（3_ 曱氧基 丁基） 酯（3-methoxybutyl(meth)acrylate)、甲基丙烯酸乙氧基二乙 二醇醋（ethoxydiethylene glycol(meth)acrylate)、曱基丙烯酸 甲氧基三乙二醇酉旨（methoxytrietliyleneglycol(meth)-acrylate)、 曱基丙烯酸曱氧基三丙二醇酯 10 (methoxy-tripropyleneglycol(meth)acrylate)、甲基丙烯酸聚 (乙二醇）曱醚酉旨（poly(ethyleneglycol)methylether (meth)acrylate)、甲基丙晞酸苯氧基二乙二醇醋 (phenoxydiethyleneglycol(meth)acrylate)、甲基丙稀酸（對-壬基苯 氧基聚 乙二醇 ） 酯 15 (p-nonylphenoxypolyethyleneglycol(meth)acrylate)、甲基丙 烯酸（對-壬基苯氧基聚丙二醇）酯 (p-nonylphenoxypolypropylene glycol(meth)acrylate) ' 曱基 丙烯酸縮水甘油醋（glycidyl(meth)acrylate)、曱基丙烯酸四 氟丙醋（tetrafluoropropyl (meth)acrylate)、曱基丙浠酸 (1，1，1，3,3,3- 六氟異 丙基） 酯 (1,1,1,3,3,3-hexafluoroisopropyl(meth)aerylate) ' 甲基丙烯 酸八 II 戊醋（octafluoropentyl(meth)acrylate)、曱基丙稀酸十 七氟葵醋（heptadecafluorodecyl(meth)acrylate)、甲基丙浠酸 三漠苯 6旨（tribromophenyl(meth)acrylate)、曱基丙稀酸二環 20 2008359444-hydroxybutyl(meth)acrylate, acyloctyloxy-2-hydroxypropyl(meth)acrylate ), glycerol (meth)acrylate, 2-methoxyethyl (meth)acrylate, methyl acrylate (3_ 曱) 3-methoxybutyl(meth)acrylate, ethoxydiethylene glycol (meth)acrylate, methoxytrietliyleneglycol (meth)-acrylate), methoxy-tripropyleneglycol (meth)acrylate, poly(ethyleneglycol)methylether (meth)acrylate ), phenoxydiethyleneglycol (meth) acrylate, methyl acrylate (p-nonylphenoxypolyethylene glycol) ester 15 (p-nonylphenoxypolyethyleneglycol (meth) Acrylate), p-nonyl methacrylate (p-nonylphenoxy polypropylene glycol) ester Phenoxypolypropylene glycol(meth)acrylate) 'glycidyl(meth)acrylate, tetrafluoropropyl (meth)acrylate, mercaptopropionate (1,1,1,3 ,3,3-hexafluoroisopropyl(meth)acrylate (1,1,1,3,3,3-hexafluoroisopropyl(meth)aerylate) 'octafluoropentyl(meth)acrylate, thiol-propyl Heptadecafluorodecyl (meth)acrylate, tribromophenyl(meth)acrylate, mercaptopropionic acid bicyclic 20 200835944

10 1510 15

戊酯（dicyclopentanylmetliacrylate)、甲基丙烯酸二環戊稀酉旨 (dicyclopentenyl methacrylate)、丙稀酸二環戊烯氧基乙醋 (dicyclopentenyloxyethylacrylate)、甲基丙烯酸異冰片醋 (isobornylmethacrylate)、甲基乙烯酸金剛烧酉旨 (adamantylmethacrylate)、丙稀酸（甲基-α·經基甲基）g旨 (methyl α-hydroxymethylacrylate)、丙稀酸（乙基-α經基甲基） 酯（ethyl α-hydroxymethylacrylate)、丙烯酸（丙基經基甲 基)酯（propyl (x-hydroxymethylacrylate)、以及丙烯酸（丁基 -α-經基甲基）酯（butyl a_hydroxymethylacrylate);芳香族乙 烯類（aromatic vinyls)，如苯乙烯（styrene)、α-甲基苯乙烯 (α-methylstyrene)、（鄰，間，對）_乙浠基曱苯 ((o，m，p)-vinyltoluene)、（鄰，間，對）-曱氧基苯乙烯 ((o，m，p)-methoxystyrene)、以及（鄰，間，對）-氣苯乙烯 ((o，m，p)-chlorostyrene);不飽和鱗類（unsaturated ethers)， 如乙烯基甲醚（vinyl methy lether)、乙稀基乙醚（vinyl ethyl ether)、以及丙烯基縮水甘油醚（allyl glycidyl ether);不飽 和醯亞胺類（unsaturated imides)，如N-苯基順丁稀二醯亞胺 (N-phenylmaleimide)、N-(4-氯苯基）順 丁稀二醯亞胺 (N-(4-chlorophenyl)maleimide)、N-(4-經苯基）順丁稀二醯亞 20 胺（N-(4-hydroxyphenyl)maleimide)、以及 N-環己基順 丁稀二 醢亞胺（N-cyclohexylmaleimide);以及順丁浠二酐類（maleic anhydrides)，如順丁 稀二酐（maleic anhydride)以及曱基順丁 稀二酐（methyl maleic anhydride)。然而，本發明並不只限 於此。 15 200835944 用以形成如式1所示之B部分之單體可包含選自由甲基 丙烯酸（(metli)acrylic acid)、丁烯酸（crotonic acid)、亞甲基 丁二酸（itaconic acid)、順丁 烯二酸(maleic acid)、反 丁稀二 酸（fumaric acid)、單曱基順丁 稀二酸(monomethyl maleic 5 acid)、5_ 降冰片烯-2-碳酸（5，norbomene-2-carboxylic acid)、單-2-(甲基丙烯醯氧基）乙基鄰苯二曱酸酯 (mono-2-((meth)acryloyloxy)ethyl phthalate)、單-2-(曱基丙 稀醯氧基）乙基 丁二酸 δ旨（mono-2-((meth)acryloyloxy)ethyl succinate)、以及ω-竣基聚己内醋單甲基丙浠酸酯 10 (ω-carboxy polycaprolactone mono(meth)acrylate)戶斤組成之 群組之其中一者。然而，本發明並不只限於此。 式1之C部分的製程如下所述。將一形成A部分之單體 與一形成B部分之單體進行聚合，以製備由A部分與B部分 所組成之聚合物，而C部分則由聚合物之B部分衍伸而成。 15 至於將C部分導入於由A部分與B部分所組成之聚合物的方 法，可採用將一聚合物B部分之酸性自由基、以及一甲基丙 烯酸縮水甘油酯之環氧自由基，進行一開環縮合反應。進 行此縮合反應的方法可採用熟知本技術領域者已知之方 法。 20 再者，於式1中，D部分是從由A、B、以及C部分所組 成之聚合物之C部分衍伸而成。至於將D部分導入於由a、 B、以及C所組成之聚合物之方法，可採用將C部分之羥基 與碳酸酐(carboxylic anhydride)，進行一開環縮合反應。具 體而言，可使用在導入D部分之酸酐的例子包括：丁二酸酐 200835944 (succinic anhydride)、戊二酸酐（§11^&1^&1111；/(11^(16)、己二酸 酐（adipic anhydride)、鄰苯二甲酐（phthalic anhydride)、六 氫苯酐（hexahydrophthalic anhydride)、順式-1，2,3,6-四氫苯 - 酐（cis-l，2,3,6-tetrahydrophthalic anhydride)、3，4,5,6·四氫苯 5 酐（3,4,5,6-tetrahydrophtlialic anhydride)、伊康酸酐(^&〇〇1^〇 anhydride)、三聚酐（trimellic anhydride)、以及順式-5-降冰 片烯-2，3-二碳酸酐（cis-5-norbornene-endo-2,3-dicarboxylic anhydride)。然而，本發明並不只限於此。 • 於本發明之如式1所示之鹼溶性樹脂黏著劑中，當d的 10 範圍為〇至小於5時，b的範圍為5至60，且當d的範圍為5至 40時，b的範圍為0至10。Dicyclopentanylmetliacrylate, dicyclopentenyl methacrylate, dicyclopentenyloxyethylacrylate, isobornylmethacrylate, methyl vinyl methacrylate Acamantylmethacrylate, methyl α-hydroxymethylacrylate, ethyl α-hydroxymethylacrylate , propyl (x-hydroxymethylacrylate), and butyl a-hydroxymethylacrylate; aromatic vinyls, such as styrene (styrene), α-methylstyrene, (o-, m-, p-) _ acetyl benzene ((o, m, p)-vinyltoluene), (o, m, p)-曱Oxystyrene ((o, m, p)-methoxystyrene), and (o, m, p)-chlorostyrene; unsaturated ethers, such as Vinyl methyl ether (vinyl methy lether), Vinyl ethyl ether, and allyl glycidyl ether; unsaturated imides, such as N-phenylmaleimide, N-(4-chlorophenyl) cis-butyl bis-imine (N-(4-chlorophenyl)maleimide), N-(4-phenyl-phenyl)-butane diazide 20-amine (N-(4-) Hydroxyphenyl)maleimide), and N-cyclohexylmaleimide; and maleic anhydrides such as maleic anhydride and decyl cis-butane Methyl maleic anhydride. However, the present invention is not limited thereto. 15 200835944 The monomer for forming the portion B as shown in Formula 1 may comprise a monomer selected from the group consisting of methacrylic acid (meth) Crotonic acid, itaconic acid, maleic acid, fumaric acid, monomethyl maleic 5 Acid), 5_ norbornene-2-carbonic acid (5, norbomene-2-carboxylic acid), mono-2-(methacryloxy)oxyl Mono-2-((meth)acryloyloxyethyl phthalate), mono-2-(mercaptopropyloxy)ethyl succinic acid δ (mono-2-((meth)) One of the groups consisting of acryloyloxy)ethyl succinate) and ω-carboxypolycaprolactone mono(meth)acrylate. However, the invention is not limited to this. The process of Part C of Formula 1 is as follows. A monomer forming Part A is polymerized with a monomer forming Part B to prepare a polymer composed of Part A and Part B, and Part C is derived from Part B of the polymer. 15 As a method of introducing the C moiety into the polymer composed of the A portion and the B portion, an acidic radical of a polymer B portion and an epoxy radical of glycidyl methacrylate may be used. Ring-opening condensation reaction. The method of carrying out this condensation reaction can be carried out by a method known to those skilled in the art. Further, in the formula 1, the D portion is derived from the C portion of the polymer composed of the A, B, and C portions. As a method of introducing the D moiety into a polymer composed of a, B, and C, a ring-opening condensation reaction can be carried out by using a hydroxyl group of the C moiety with a carboxylic anhydride. Specifically, examples of the acid anhydride which can be used in the introduction of the D portion include: succinic anhydride 200835944 (succinic anhydride), glutaric anhydride (§11^&1^&1111;/(11^(16), hexa Adipic anhydride, phthalic anhydride, hexahydrophthalic anhydride, cis-1,2,3,6-tetrahydrobenzene-anhydride (cis-l, 2, 3, 6) -tetrahydrophthalic anhydride), 3,4,5,6-tetrahydrophtlialic anhydride, Ikonic anhydride (^&〇〇1^〇anhydride), trimer anhydride Trimellic anhydride), and cis-5-norbornene-endo-2,3-dicarboxylic anhydride. However, the invention is not limited thereto. In the alkali-soluble resin adhesive of the invention as shown in Formula 1, when the range of 10 of d is from 〇 to less than 5, the range of b is from 5 to 60, and when the range of d is from 5 to 40, the range of b is 0 to 10.

再者’如式1所示之驗溶性樹脂黏著劑之酸值與不飽和 雙鍵當量如下所述。於d的範圍為〇至小於5時，較佳為鹼溶 性樹脂黏著劑之酸值範圍大約50至150 KOH mg/g，而不飽 15 和雙鍵當量範圍為1000至2500，且（酸值xio)與不飽和雙鍵 當量之總和範圍為1500至4000。於d的範圍為5至40時，較 φ 佳為鹼溶性樹脂黏著劑之酸值範圍大約20至80 KOH mg/g，而不飽和雙鍵當量範圍為4〇〇至1〇〇〇，且（酸值xlO) 與不飽和雙鍵當量之總和範圍為5〇〇至1500。在此，不飽和 20 雙鍵當量可如下面方程式1所示。 [方程式1] 雙鍵當量=(重複單元之分子量）/(重複單元之雙鍵數） 假設鹼溶性樹脂黏著劑之酸值為p(K〇H mg/g)，而雙鍵 當量為Q，當d的範圍為0至小於5時則符合50<P<150、 17 200835944 1000<Q<2500、以及 i5〇〇<(l〇xp)+Q<4000之條件，而於d的 範圍為5至40時則符合2〇<p<8〇、400<Q<1000、以及500<(10 xP)+Q<1500之條件，如此便可達到高感光度及高光密度。 當驗溶性樹脂黏著劑之酸值為15〇或以上，且（酸值xl0) 5 與不飽和雙鍵當量之總和小於1500(其中d的範圍為0至小 於5) ’則酸值太高而因此顯影限度範圍較窄。再者，所得 到的圖案會具有過多的雙鍵而真直度（straightness)較差，會 導致所得到的圖案不能用來作為黑色矩陣。當（酸值χ1〇)與 不飽和雙鍵當量之總和為4〇〇〇或以上，由於較差的感光 10 度’故需要較大量照射已形成圖案。此外，當酸值為5〇或 以下，無法碟實的進行顯影，而難以取得圖案。而且，會 造成顯影時間的加長與製程特性的劣化。 當d的範圍為5至4〇，可用鹼性顯影溶液顯影之緩酸基 團不在主鏈上，反而突出在支鏈。因此，即使酸值报小， 15顯影性仍然良好。當酸值為80或以上，容易有過度顯影的 情形發生，圖案可能會輕易刪除，而難以達到高感光度之 目的。 又 驗溶性樹腊黏著劑之重量平均分子量之較佳範圍為 1000至200000，且更佳範圍為5〇〇〇至1〇〇〇〇〇。 20 鹼溶性樹脂黏著劑可獨立的使用。然而，較佳為兩 或以上之鹼溶性樹脂黏著劑混合使用。鹼溶性樹脂黏#添 的含量範圍較佳係佔光阻組成物總重量之1至2S重量份考j 鹼溶性樹脂組成物的含量少於丨重量份，形成的薄膜黏著: 18 200835944 較低，且當其含量超過25重量份，形成圖像之強度與感光 度較低。 本發明之具有乙烯性不飽和雙鍵之多官能基單體可使 用具有至少一不飽和自由基之化合物，其中此不飽和自由 5 基能額外與沸點100°c或以上之單體、或為一導入有己内醋 之官能基單體進行聚合。 此具有至少一不飽和自由基之化合物，其中此不飽和 自由基能額外與沸點100°C或以上之單體進行聚合，且該化 合物可為：單一官能基單體，如聚乙二醇單官能基甲基丙 10 稀酸醋（polyethylene glycolmono(meth)acrylate)、聚丙二醇 單官能基曱基丙浠酸甲酯（polypropylene glycol mono(meth)acrylate)、 或甲基丙烯酸苯氧乙酯 15Further, the acid value and the unsaturated double bond equivalent of the test resin adhesive as shown in Formula 1 are as follows. When the range of d is from 〇 to less than 5, it is preferred that the alkali-soluble resin adhesive has an acid value ranging from about 50 to 150 KOH mg/g, and that the unsaturated 15 and double bond equivalents are in the range of from 1,000 to 2,500, and (acid value) The sum of the xio) and unsaturated double bond equivalents ranges from 1500 to 4,000. When d is in the range of 5 to 40, the acid value of the alkali-soluble resin adhesive is preferably about 20 to 80 KOH mg/g, and the unsaturated double bond equivalent is in the range of 4 to 1 Torr. The sum of the (acid value xlO) and the unsaturated double bond equivalent ranges from 5 〇〇 to 1500. Here, the unsaturated 20 double bond equivalent can be as shown in the following Equation 1. [Equation 1] Double bond equivalent = (molecular weight of repeating unit) / (number of double bonds of repeating unit) Assuming that the acid value of the alkali-soluble resin adhesive is p (K 〇 H mg / g), and the double bond equivalent is Q, When d ranges from 0 to less than 5, it satisfies the conditions of 50 < P < 150, 17 200835944 1000 < Q < 2500, and i5 〇〇 < (l 〇 xp) + Q < 4000, and the range of d is From 5 to 40 o'clock, the conditions of 2 〇 < p < 8 〇, 400 < Q < 1000, and 500 < (10 x P) + Q < 1500 are met, so that high sensitivity and high optical density can be achieved. When the acid value of the solvent-soluble resin adhesive is 15 〇 or more, and the sum of the (acid value xl0) 5 and the unsaturated double bond equivalent is less than 1500 (where d ranges from 0 to less than 5), the acid value is too high. Therefore, the development limit range is narrow. Furthermore, the resulting pattern will have too many double bonds and poor straightness, which will result in the resulting pattern not being used as a black matrix. When the sum of the (acid value χ1〇) and the unsaturated double bond equivalent is 4 Å or more, a relatively large amount of irradiation is required to form a pattern due to poor photosensitive 10 degree'. Further, when the acid value is 5 Å or less, development cannot be performed in a disc, and it is difficult to obtain a pattern. Moreover, the development time is lengthened and the process characteristics are deteriorated. When d is in the range of 5 to 4 Å, the acid-suppressing group which can be developed with an alkaline developing solution is not on the main chain, but instead protrudes in the branch. Therefore, even if the acid value is small, the developability is still good. When the acid value is 80 or more, it is easy to have an excessive development, and the pattern may be easily deleted, and it is difficult to achieve high sensitivity. Further, the weight average molecular weight of the soluble wax adhesive is preferably in the range of 1,000 to 200,000, and more preferably in the range of 5 to 1 Torr. 20 Alkali-soluble resin adhesives can be used independently. However, it is preferred to use two or more alkali-soluble resin adhesives in combination. The content of the alkali-soluble resin is preferably in the range of 1 to 2 s by weight based on the total weight of the photoresist composition. The content of the alkali-soluble resin composition is less than 丨 by weight, and the film adhesion is formed: 18 200835944 is lower, And when the content exceeds 25 parts by weight, the intensity and sensitivity of the formed image are low. The polyfunctional monomer having an ethylenically unsaturated double bond of the present invention may use a compound having at least one unsaturated radical, wherein the unsaturated free 5 group can additionally be a monomer having a boiling point of 100 ° C or more, or A functional monomer having a vinegar introduced therein is used for polymerization. The compound having at least one unsaturated radical, wherein the unsaturated radical can additionally be polymerized with a monomer having a boiling point of 100 ° C or higher, and the compound can be: a single functional monomer such as polyethylene glycol Polyethylene glycol mono(meth)acrylate, polypropylene glycol mono(meth)acrylate, or phenoxyethyl methacrylate 15

(phenoxyethyl(ifteth)acrylate);以及一多官能基單體，如聚 乙二醇曱基丙烯酸酉旨（polyethylene glycol(meth)acrylate)、 聚 丙二醇 甲基丙 浠酸酯 （polypropylene glycol(meth)acryatle)、三經曱基乙烧三丙婦酸醋 (trimethylol ethane triacrylate)、三經甲基丙烧三丙烯酸酉旨 (trimethylol propane triacrylate)、新戊基乙二醇曱基丙稀酸 酉旨（neopentyl glycol (meth)acrylate)、新戊四醇四丙稀酸酉旨 (pentaerythritol tetraacrylate)、新戊四醇三丙烯酸酉旨 (pentaerythritol triacrylate)、二新戊四醇五丙稀酸酉旨 (dipentaerythritol pentaacrylate)、或二新戊四醇六丙稀酸醋 (dipentaerythritol hexaacrylate) 〇 20 200835944 泰 ‘ 再者，導入有己内酯之多官能基單體可為導入有二新 戊四醇之KAYARAD DPCA-20, 30, 60, 120、導入有新戊四 ^ 醇丙烯酸酯之KAYARAD TC-110S、或導入有羥基特戍酸新(phenoxyethyl(ifteth)acrylate); and a polyfunctional monomer such as polyethylene glycol (meth)acrylate, polypropylene glycol (meth) acryatle ), trimethylol ethane triacrylate, trimethylol propane triacrylate, neopentyl glycol thioglycolate (neopentyl) Glycol (meth)acrylate), pentaerythritol tetraacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate , or dipentaerythritol hexaacrylate 〇20 200835944 泰' Further, the polyfunctional monomer introduced with caprolactone may be KAYARAD DPCA-20, 30 with dipentaerythritol introduced. , 60, 120, KAYARAD TC-110S introduced with neopentyl alcohol acrylate, or introduced with new hydroxyl hydroxy acid

• 戊二醇酉旨（neopentylglycol hydroxypivalate)之 KAYARAD 5 HX-220及KAYARADHK-620。除上述之例子外，多官能基 單體還可為雙紛A (bisphenol A)衍伸物之環氧丙浠酸 (epoxyacrylate)、酴酸環氧丙烯酸（novolac-epoxyacrylate)、 及以胺甲酸乙酯（urethane)為主之多官能基丙烯酸ί旨之 • U-324A、U15HA、與U-4HA。 10 具乙烯性不飽和雙鍵之多官能基單體可為一單體或至 少兩種單體之混合物。 具乙烯性不飽和雙鍵之多官能基單體之含量較佳範圍 為佔光阻姐成物總重量之1至20重量份（佔固態樹脂組成物 之5至50重量份）。當多官能基單體之含量少於1重量份，塗 15 膜之光感度或強度會降低。當其含量超過20重量份’光感 樹脂層之附著力會過強’而導致在顯影的過程中塗膜強度 φ 不足且圖案消失等問題。 本發明之光聚合起始劑是一種能透過光產生自由基且 開始交聯反應之材料，且較佳是由一種或以上之下列化合 20 物混合而得，而這些化合物是選自由苯乙酮（acetophenone ) 化合物、二咪°坐（biimidaz〇le)化合物、三讲（triazine)化合 物、以及將類（oxime)化合物所組成之群組。 可使用作為光聚合起始劑之苯乙酮化合物之例子包 括 ： 2 - 經 基 -2 - 甲 基 -1 - 本 丙 -1 - 嗣 20 200835944 (2-hydroxy-2-methyl-l-phenylpropan-l-on)、1-(4-異丙基苯 基 ）-2- 羥基 -2- 曱基丙 -1- 酮 (l-(4-isopropylphenyl)-2-hydroxy-2-methylpropan-l-on) 、 4-(2-經基乙氧基）-苯基-(2-經基-2-丙基）闕 (4-(2-hydroxyethoxy)-phenyl-(2-hydroxy-2-propyl)ketone)• KAYARAD 5 HX-220 and KAYARADHK-620 for neopentylglycol hydroxypivalate. In addition to the above examples, the polyfunctional monomer may also be an epoxy acrylate of a bisphenol A derivative, a novolac-epoxyacrylate, and a urethane Urethane-based polyfunctional acrylic acid • U-324A, U15HA, and U-4HA. The polyfunctional monomer having an ethylenically unsaturated double bond may be a monomer or a mixture of at least two monomers. The content of the polyfunctional monomer having an ethylenically unsaturated double bond is preferably in the range of 1 to 20 parts by weight based on the total weight of the photoresist (5 to 50 parts by weight of the solid resin composition). When the content of the polyfunctional monomer is less than 1 part by weight, the light sensitivity or strength of the coating film may be lowered. When the content exceeds 20 parts by weight, the adhesion of the photosensitive resin layer is too strong, which causes a problem that the coating film strength φ is insufficient and the pattern disappears during development. The photopolymerization initiator of the present invention is a material capable of generating a radical by light and starting a crosslinking reaction, and is preferably obtained by mixing one or more of the following compounds 20 selected from the group consisting of acetophenone (acetophenone) A compound, a biimidaz〇le compound, a triazine compound, and a group of oxime compounds. Examples of the acetophenone compound which can be used as a photopolymerization initiator include: 2 - thiol-2 -methyl-1 - propyl-1 - 嗣20 200835944 (2-hydroxy-2-methyl-l-phenylpropan- L-on), 1-(4-isopropylphenyl)-2-hydroxy-2-mercaptopropan-1-one (1-(4-isopropylphenyl)-2-hydroxy-2-methylpropan-l-on , 4-(2-Phenylethoxy)-phenyl-(2-(2-hydroxyethoxy)-phenyl-(2-hydroxy-2-propyl)ketone )

1010

20 、1-經基環己基苯基酮（1-hydroxycyclohexylphenyl ketone)、苯甲酸甲基醚（benzoin methyl ether)、苯甲酸乙基 醚（benzoin ethyl ether)、苯甲酸異 丁基醚（benzoin isobuthyl ether)、苯甲酸 丁基醚（benzoin butyl ether)、2,2-二甲氧基-2-苯基苯乙酮（2,2-dimethoxy-2-phenylacetophenone)、2-甲基 -(4-甲硫基）苯基-2-嗎琳基-1-丙-1-酉同 (2-methyl-(4-methylthio)phenyl-2-morpholino-l-propan-1-〇 η)、2-苯基-2-二甲基胺基-1-(4-嗎啉基苯基）-丁 -1-酮 (2-benzyl-2-dimethylamino-l-(4-morpholinophenyl)-butan-l-on)、2_(4->臭-苯基-2-二甲基胺基，1 - (4-嗎淋基苯基）-丁 -1 -酉同 (2-(4-bromo-benzyl-2-dimethylamino-l-(4-morpholinopheny l)-butan-l-on)、以及2-甲基-l-[4_(甲硫基）苯基]-2-嗎琳基丙 -1- 酮 （2-methyl· l-[4-(methy lthio)phenyl]-2- morpholinopropane-1-on)。二咪 σ坐化合物的例子包括：2,2-雙 （2- 氯苯基 ）_4,4’，5,5’_四苯基二咪唑 (2,2-bis(2-chlorophenyl)-4,4’，5,5’-tetraphenyl biimidazole)、2,2，-雙（鄰·氯苯基）-4,4*，5,5*-四（3,4,5-三甲氧 基苯基）-1，2’-二 ϋi^^(2,2’-bis(o-chlorophenyl)-4,4’，5,5*-tetrakis(3,4,5_trimethoxyplienyl)-l，2’_biimidazole)、2,2*_ 雙 (2,3-二氯苯基 ）-4,4’，5,5’·四苯基二咪唑 21 25 200835944 ‘ (232f-bis(2,3-dichlorophenyl)-4,4f,5,5f-tetraphenyl biimidazole)、以及2,2，·雙（對-氯苯基）-4,4，，5,5，-四苯基 _1，2*-_ 二味吐 pJ’-bisCo-chlorophenylh^^JJ’-tetraphenyl-l，〗’· . biimidazole)。三讲化合物之例子包括：3·{4·[2,4-雙（三氯 5 甲基）-s-二口井-6-基]苯硫基}丙酸（3-{4-[2,4_ bis(trichloromethyl)-s_triazin-6-yl]phenylthio} propionic add)、1，1，1，3,3,3-六氟異丙基-3-{4-[2,4-雙（三氯甲基）-s-三 口井-6-基]苯硫基}丙酸酯（l，l，l，3,3,3-hexafΊuoroisoρropyl-· 3-{4-[254-bis(trichloromethyl)-s-triazin-6-yl]phenylthio} 10 propionate)、乙基-2·{4-[2,4-雙（三氯甲基）-s-三讲-6-基]苯 硫基}乙酸醋01;]171-2-{4-[2,4-1318(1：1^111〇1：〇11^1：]1)4)-8-1：1^2111-6-71]卩1^11}^111〇}汪〇6{&16)、2_環氧乙基-2-{4-[2,4-雙（三氣甲 基）-s -二 -6 -基]苯硫基}乙酸醋（2_epoxyethyl-2 - {4 -[2,4_ bis(trichloromethyl)-s-triazin-6-yl]phenylthio}acetate)、環己 15 基·2-{4-[2,4-雙（二氣甲基）-s-二-6-基]本硫基}乙酸酉旨 (cyclohexyl-2-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl] phenylthio}acetate)、苯基·2-{4-[2,4-雙（三氣曱基）-s-三耕 -6-基]本硫基}乙酸 S 旨(benzyl-2- {4-[2,4-bis(tri chloromethy 1)-s-triazin-6-yl]phenylthio} acetate) 、 20 3_{氣-4-[2,4-雙（二亂甲基）-8-二访|1-6-基]苯硫基}丙酸（3- {chloro-4-[2,4-bis(trichloromethyl)-s-triazin-6-yl] phenylthio}propionic acid)、3-{4-[2,4-雙（三氯曱基）-s-三胡· -6- 基]苯硫基 } 丙醯胺 （3-{4-[2,4-bis-(trichloromethyl)-s-triazin-6-yl]phenylthio}propionamide) ^ 25 2,4-雙（三氣甲基）_6-p-甲氧基苯乙烯基-s-三口井（2,4- 22 200835944 bis(trichloromethyl)-6-p-methoxystyryl-s-triazin)、2,4·雙（三 氯曱基）-6-( 1 _ρ·二甲基胺基苯基)-1，3，- 丁二稀基二口井 (2,4-bis(trichloromethyl)-6-(l-p-dimethylaminophenyl)-1,3,-butadieny 1-s-triazin)、以及2 -二氣甲基_4-胺基-6·ρ·甲氧基苯 5 乙稀基-S-三口井（2-tTichloromethyl-4-amino-6-p-methoxy- styryl-s-triazin)。將類化合物的例子包括：1，2-辛二酮，-1-(4-苯硫基）苯基，-2-(o- 苯 氧基肟 基)(1,2-octadione5-l-(4-phenylthio)phenyl?-2-(o-benzoyloxi me))(CGI_124由 Ciba-Geigy Corp•製造）、以及乙酮，-1-(9-乙 10 基 ）-6-(2-曱基苯曱醯 -3· 基 ）-，1-(〇- 乙醯 ^ )(ethanon5-l-(9-ethyl)-6-(2-methylbenzoyl-3-yl)-, 1 -(o-ace tyloxime))(CGI242) 〇 在光阻組成物中，於100重量份之3)具有乙烯化不飽和 雙鍵之.多官能基單體與包含在黏著劑之不飽和雙鍵中，聚 15 合起始劑較佳的使用範圍為1至300重量份。特別是，光聚 合起始劑較佳為1至30重量份之苯乙酮化合物、1至30重量 份之二咪唑化合物、1至30重量份之三#化合物、以及1至 30重量份之肟類化合物。 光聚合起始劑可更包含0.01至10重量份之光交聯促進 20 劑（作為輔助成分來加速自由基的生成）、或0.01至10重量份 之硬化劑（加速硬化反應）。 光交聯起始劑包含：二苯基酮（benzophenone)化合物， 如二苯基酮（benzophenone)、4,4-雙（二曱基胺基）二苯基酮 (4,4-bis(dimethylamino)benzophenone)、4,4-雙（二乙基胺基） 25 二苯基酮（4,4-bis(diethylamino)benzophenone)、2,4,6-三甲 23 200835944 基胺基二苯基酮（2,4,6-trimethylaminobenzophenone)、甲基· 鄰-苯基苯甲酸酉| (methyl-o-benzoylbenzoate)、3,3_二甲基 -4- 甲 氧基二 苯基酮 (3,3-dimethyl-4-methoxybenzophenone)、以及3,3,4,4-四（第 5 三丁 基過氡 羰基）二 苯基酮 (3,3,4,4-tetra(t-biitylperoxycarboiiyl)benzophenone);第酮 (fluorenone)化合物，如 9-苐酮（9_fluorenone)、2_氯-9-苐酮20, 1-hydroxycyclohexylphenyl ketone, benzoin methyl ether, benzoin ethyl ether, benzoin isobuthyl ether ), benzoin butyl ether, 2,2-dimethoxy-2-phenylacetophenone, 2-methyl-(4-methyl) Thiophenyl)-2-methylthiophenyl-2-morpholino-l-propan-1-〇η, 2-phenyl 2-benzyl-2-dimethylamino-l-(4-morpholinophenyl)-butan-l-on, 2_(4->odoro-phenyl-2-dimethylamino, 1-(4-norlinylphenyl)-but-1-indole (2-(4-bromo-benzyl-2-dimethylamino) -l-(4-morpholinopheny l)-butan-l-on), and 2-methyl-l-[4-(methylthio)phenyl]-2-morphinylpropan-1-one (2-methyl) · l-[4-(methy lthio)phenyl]-2- morpholinopropane-1-on). Examples of dim sigma compound include: 2,2-bis(2-chlorophenyl)_4,4',5, 5'_Tetraphenyldiimidazole (2,2-bis(2-chlorophenyl)-4,4 ,5,5'-tetraphenyl biimidazole), 2,2,-bis(o-chlorophenyl)-4,4*,5,5*-tetrakis(3,4,5-trimethoxyphenyl)-1 , 2'- ϋi^^(2,2'-bis(o-chlorophenyl)-4,4',5,5*-tetrakis(3,4,5_trimethoxyplienyl)-l,2'_biimidazole), 2,2 *_ bis(2,3-dichlorophenyl)-4,4',5,5'·tetraphenyldiimidazole 21 25 200835944 ' (232f-bis(2,3-dichlorophenyl)-4,4f,5 ,5f-tetraphenyl biimidazole), and 2,2,·bis(p-chlorophenyl)-4,4,5,5,-tetraphenyl_1,2*-_ digestive pJ'-bisCo- Chlorophenylh^^JJ'-tetraphenyl-l, 〗 '. . biimidazole). Examples of three compounds include: 3·{4·[2,4-bis(trichloro-5-methyl)-s-two-well-6-yl]phenylthio}propionic acid (3-{4-[2 , 4_ bis(trichloromethyl)-s_triazin-6-yl]phenylthio} propionic add), 1,1,1,3,3,3-hexafluoroisopropyl-3-{4-[2,4-double (three Chloromethyl)-s-three well-6-yl]phenylthio}propionate (l,l,l,3,3,3-hexafΊuoroisoρropyl-· 3-{4-[254-bis(trichloromethyl)- S-triazin-6-yl]phenylthio} 10 propionate), ethyl-2·{4-[2,4-bis(trichloromethyl)-s-tris-6-yl]phenylthio}acetic acid vinegar 01;]171-2-{4-[2,4-1318(1:1^111〇1:〇11^1:]1)4)-8-1:1^2111-6-71]卩1 ^11}^111〇}Wang〇6{&16), 2_epoxyethyl-2-{4-[2,4-bis(trismethyl)-s-di-6-yl]benzene 2_epoxyethyl-2 - {4 -[2,4_ bis(trichloromethyl)-s-triazin-6-yl]phenylthio}acetate), cyclohexyl 15 -2-{4-[2,4- Bis(dimethylmethyl)-s-di-6-yl]benylthio}acetate (cyclohexyl-2-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl] phenylthio }acetate), phenyl·2-{4-[2,4-bis(trimethylsulfonyl)-s-trin-6-yl]thiol}acetic acid S (benzyl-2- {4-[2,4-bis(tri chloromethy 1)-s-triazin-6-yl]phenylthio} acetate), 20 3_{ gas-4-[2,4-double (two chaotic )--8-II visit|1-6-yl]phenylthio}propionic acid (3- {chloro-4-[2,4-bis(trichloromethyl)-s-triazin-6-yl] phenylthio}propionic acid ), 3-{4-[2,4-bis(trichloroindenyl)-s-trihu·-6-yl]phenylthio}propanamine (3-{4-[2,4-bis-) (trichloromethyl)-s-triazin-6-yl]phenylthio}propionamide) ^ 25 2,4-bis(trimethyl)-6-p-methoxystyryl-s-three wells (2,4- 22 200835944 bis(trichloromethyl)-6-p-methoxystyryl-s-triazin), 2,4·bis(trichloroindenyl)-6-( 1 _ρ·dimethylaminophenyl)-1,3,-butyl 2,4-bis(trichloromethyl)-6-(lp-dimethylaminophenyl-1,3,-butadieny 1-s-triazin), and 2 -dimethylmethyl-4-amine- 6·ρ·methoxybenzene 5 -tTichloromethyl-4-amino-6-p-methoxy- styryl-s-triazin. Examples of the class of compounds include: 1,2-octanedione,-1-(4-phenylthio)phenyl,-2-(o-phenoxyindenyl) (1,2-octadione 5-l-( 4-phenylthio)phenyl?-2-(o-benzoyloxi me)) (CGI_124 manufactured by Ciba-Geigy Corp.), and ethyl ketone,-1-(9-ethyl-10-yl)-6-(2-mercaptobenzene)曱醯-3·基)-,1-(〇-乙醯^ )(ethanon5-l-(9-ethyl)-6-(2-methylbenzoyl-3-yl)-, 1 -(o-ace tyloxime) (CGI242) 〇In the photoresist composition, 100 parts by weight of 3) polyfunctional monomers having ethylenically unsaturated double bonds and unsaturated double bonds contained in the adhesive, starting at 15 The preferred use range of the agent is from 1 to 300 parts by weight. In particular, the photopolymerization initiator is preferably from 1 to 30 parts by weight of the acetophenone compound, from 1 to 30 parts by weight of the diimidazole compound, from 1 to 30 parts by weight of the three compound, and from 1 to 30 parts by weight. Class of compounds. The photopolymerization initiator may further contain 0.01 to 10 parts by weight of photocrosslinking promoting 20 agents (as an auxiliary component to accelerate the formation of radicals), or 0.01 to 10 parts by weight of a hardener (accelerated hardening reaction). The photocrosslinking initiator comprises: a benzophenone compound such as benzophenone or 4,4-bis(didecylamino)diphenyl ketone (4,4-bis(dimethylamino) Benzophenone), 4,4-bis(diethylamino)benzophenone, 2,4,6-trimethyl 23 200835944 Aminodiphenyl ketone 2,4,6-trimethylaminobenzophenone), methyl-o-benzoylbenzoate, 3,3-dimethyl-4-methoxydiphenyl ketone (3,3- Dimethyl-4-methoxybenzophenone), and 3,3,4,4-tetra(t-biitylperoxycarboiiyl)benzophenone; Fluorone compounds, such as 9-fluorenone, 2-chloro-9-fluorenone

10 1510 15

20 (2-chloro-9-fluorenone)、以及 2-甲基-9-苐酮 (2-methyl-9-fluorenone); 口塞順酮（thioxanthone)化合物，如 口塞嘲酮（thioxanthone)、2,4-二乙基 σ塞領酮（2,4_diethyl thioxanthone)、2-氣嗟嘲酮（2-chloro thioxanthone)、1-氣-4-丙氧基°塞0頓酮（l_chloro-4-propyloxy thioxanthone)、異丙基 σ塞ϋ镇酮（isopropylthioxanthone)、以及二異丙基嗔領酮 (diisopropylthioxanthone);氧葱酮（xanthone)化合物，如氧 葱酮（xanthone)及 2_ 甲基氧葱 S同（2-methylxanthone);蒽醌 (anthraquinone)化合物，如蒽醌（anthraquinone)、2-曱基蒽 酉昆（2-methyl anthraquinone)、2-乙基蒽西昆（2-ethyl anthraquinone)、第三 丁基蒽 S昆（t-butyL anthraquinone)、以 及 2,6-二氯-9，10-蒽酉昆（2,6-dichloro-9，10-anthraquinone) ; σ丫 咬（纹〇1^(1丨1^)化合物，如9-苯基11丫唆（9-卩]^1171&(：11(11116)、1，7-雙（9-°丫 唆基）庚烧（l，7-bis(9-acridinyl)heptane)、1,5-雙（9-口丫 唆庚烧）（l，5_bis(9-acridinylpentane)、以及 1，3_雙（9-σ丫咬） 丙烧（1，3-bis(9-acridinyl)propane);二羧基（dicarbonyl)化合 物，如苄基〇^1^71)、1，7,7-三甲基_二環[2,2，1]庚烷-2,3-二 24 20083594420 (2-chloro-9-fluorenone), and 2-methyl-9-fluorenone; thioxanthone compounds such as thioxanthone, 2 ,2-diethyl thioxanthone, 2-chloro thioxanthone, 1-ox-4-propoxy ketone (l_chloro-4-propyloxy) Thioxanthone), isopropylthioxanthone, and diisopropylthioxanthone; xanthone compounds such as xanthone and 2_methyloxonium S (2-methylxanthone); anthraquinone compounds such as anthraquinone, 2-methyl anthraquinone, 2-ethyl anthraquinone, third Butyl 蒽S Kun (t-butyL anthraquinone), and 2,6-dichloro-9,10-anthraquinone (2,6-dichloro-9,10-anthraquinone); σ丫 bite (grain 〇1^( 1丨1^) compound, such as 9-phenyl 11丫唆(9-卩]^1171&(:11(11116), 1,7-bis(9-°丫唆)g, (l,7- Bis(9-acridinyl)heptane), 1,5-double (9-mouth gypsum) (l,5_bis(9-acridinylpentane), and 1,3_bis(9-σridone) propane); dicarbonyl compounds such as benzyl 〇^1^71), 1,7,7-trimethyl-bicyclo[2,2,1]heptane-2,3-di 24 200835944

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20 酮（l，7,7-trimethyl-bicyclo[2,2，l]heptane-2,3-dione)、以及 9，10-菲酿i (9，10-phenanthrenequinone);氧化膦（phosphine oxide)化合物，如2,4,6-三曱基苯氧基二苯基氧化膦 (2,4,6-trimethybenzoyl diphenyl phosphine oxide)、以及雙 (2,6-二曱氧基苯氧基）-2,4,4-三甲基戊烯氧化膦 (bis(2,6-dimethoxybenzoyl)-2,4,4-trimethylpentene phosphine oxide);二苯基酮（benzophenone)化合物，如曱基 -4-( 二曱 基胺基）-苯 曱酸酯 (methyl-4-(dimethylamino)-benzoate)、乙基-4-(二甲基胺 基）-苯曱酸醋（ethyl-4-(dimethylamino)-benzoate)、以及2-n-丁氧基乙基-4(二曱基胺基）-苯曱酸酯 (2-n-butoxyethyl-4(dimetliylamino)-benzoate);胺基增效劑 (amino synergists)，如2,5-雙（4-二曱基胺基苯曱基）環戊酮 (2,5-bis(4-dimetliylaminobenzal)cyclopentanone)、2,6-雙（4-二 乙基胺 基苯 曱 基）環 己 酮 (2,6-bis(4_diethylaminobenzal)cyclohexanon)、以及2,6-雙（4-二乙基胺基苯曱基）4-曱基-環戊酮 (2?6-bis(4-diethylaminobenzal)-4-methyl-cyclopentanone); 香豆素（coumarin)化合物，如3,3-羰基乙烯基-7-(二乙基胺基） 香豆素（3,3-carbonylvinyl-7-(diethylamino)coumarin)、3-(2-苯並噻唑 ）-7-(二乙基胺基）香豆素 (3-(2-benzothiazolyl)-7-(diethylamino)coumarin)、3-苯甲基 -7-( 二乙基 胺基） 香豆素 (3-benzoyl-7-(diethylamino)coumarin)、3-苯曱基-7-甲氧基-香豆素（3-^112〇；71-7-11161:11〇又7_〇〇\1111&1411)、以及10，10-幾基雙 25 25 200835944 •丨.20 ketone (1,7,7-trimethyl-bicyclo[2,2,l]heptane-2,3-dione), and 9,10-phenanthrenequinone; phosphine oxide a compound such as 2,4,6-trimethybenzoyl diphenyl phosphine oxide, and bis(2,6-dimethoxyphenoxy)-2 , 4,4-trimethoxybenzoyl-2,4,4-trimethylpentene phosphine oxide; benzophenone compound, such as thiol-4-(II) Methyl-4-(dimethylamino)-benzoate, ethyl-4-(dimethylamino)-benzoate And 2-n-butoxyethyl-4(dimetliylamino)-benzoate; amino synergists, Such as 2,5-bis(4-dimetylaminobenzyl)cyclopentanone, 2,6-bis(4-diethylaminophenylhydrazine) Cyclohexanone (2,6-bis(4_diethylaminobenzal)cyclohexanon), and 2,6-bis(4-diethylaminophenylphenyl) 4-indolyl-ring Butyl ketone (2?6-bis(4-diethylaminobenzal)-4-methyl-cyclopentanone); coumarin compound, such as 3,3-carbonylvinyl-7-(diethylamino)coumarin (3,3-carbonylvinyl-7-(diethylamino)coumarin), 3-(2-benzothiazolyl)-7-(diethylamino)coumarin (3-(2-benzothiazolyl)-7-(diethylamino) Coumarin), 3-benzoyl-7-(diethylamino)coumarin, 3-phenylhydrazin-7-methoxy-coumarin (3-^112〇; 71-7-11161: 11〇 and 7_〇〇\1111&1411), and 10,10-several double 25 25 200835944 •丨.

[1，1，7,7-四甲基-2,3,6,7-四氫-111，511，1111-(：1]-苯甲基吼喃基 [6,7,8-ij]- 喹 嗪 -11- 酮[1,1,7,7-tetramethyl-2,3,6,7-tetrahydro-111,511,1111-(:1]-benzylmethylpyranyl [6,7,8-ij] - Quinazine-11-one

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20 (10510-carbornylbis[l3157,7-tetramethyl-2,356,7-tetrahydro-l H，5H，llH-Cl]-benzopyrano[6,7,8-ij]_quinolizin-ll-on);查酮 (chalcone)化合物，如4-二乙基胺基查酮（4-diethylamino chalcone)、 以及4-疊氮苯基苯乙烯基酮 (4-azidebenzalacetophenone);以及 2-苯曱基亞曱基 (2-benzoylmethylene)、或 3-甲基-b-萘基 °惡 °坐 (3-methyl-b-naphthothiazoline) 〇 再者，硬化劑可為2·硫醇基苯並咪唑 (2-mercaptobenzoimidazole)、2-硫醇基苯並嘆 β坐硫 _ (2-mercaptobenzothiazole) 、2-硫醇基苯並喔 σ坐 (2-mercaptobenzoxazole)、2,5-二硫醇基-1，3,4- β塞二 口坐 (2,5-dimercapto-l，3,4-thiadiazole)、2-硫醇基-4,6-二甲基胺 基石比唆（2，mercapto-4,6-dimethylaminopyridine)、新戊四醇-四 （3- 硫 醇 基 丙 酸 S旨）(pentaerytliritol-tetrakis(3-mercaptopropionate))、新戊四 醇-三 （3- 硫醇 基丙酸 S旨）(pentaerythritol，tris(3-mercaptopropionate))、新戊四醇-四 （2_ 硫醇 基丙酸 醋）(pentaerythritol-tetrakis(2-mercaptoacetate))、新戊四醇-三 （2_ 硫 醇 基 丙 酸 酯）(pentaerythritol-tris(2-mercaptoacetate))、三羥甲基-三 (2- 硫 醇 基 丙 酸 酉旨）(trimethylolpropane-tris(2-mercaptoacetate))、或三經甲 26 25 200835944 基-三 （3- 硫 醇 基 丙 酸 I旨）(trimethylolpropane-tris(3-mercaptopropionate)) 〇20 (10510-carbornylbis[l3157,7-tetramethyl-2,356,7-tetrahydro-l H,5H,llH-Cl]-benzopyrano[6,7,8-ij]_quinolizin-ll-on); chalcone a compound such as 4-diethylamino chalcone, and 4-azidebenzalacetophenone; and 2-benzoylmethylene Or 3-methyl-b-naphthothiazoline. Further, the hardener may be 2-mercaptobenzoimidazole, 2-thiol. 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2,5-dithiol-1,3,4-β (2,5-dimercapto-l,3,4-thiadiazole), 2-mercapto-4,6-dimethylaminopyridinium (2,mercapto-4,6-dimethylaminopyridine), pentaerythritol- Pentaerytliritol-tetrakis (3-mercaptopropionate), pentaerythritol, tris (3-mercaptopropionate) , pentaerythritol-tetrakis (2_thiol propionic acid vinegar) Aerythritol-tetrakis (2-mercaptoacetate), pentaerythritol-tris (2-mercaptoacetate), trimethylol-tris(2-thiol propionic acid) Trimethylolpropane-tris (2-mercaptoacetate), or trimethylolpropane-tris (3-mercaptopropionate) 〇26 25 200835944 --3-(3-mercaptopropionate) 〇

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20 考慮到溶解度、顏料分散度、及塗覆程度的話，本發 明所使用的溶劑可為：丙二醇甲醚（propyleneglycol monomethyl ether)、乙二醇甲醚酷酸酉旨（ethyleneglycol monomethyl ether acetate)、丙二醇甲醚醋酸醋（propylene glycol monomethyl ether acetate)、丙二醇曱醚醋酸醋 (propyleneglycol monoethyl ether acetate)、二乙二醇二曱 _ (diethyleneglycol dimethyl ether)、環己酮（cyclohexanon)、 2-庚酮（2-heptanon)、3_庚酮（3-heptanon)、丙酸 _2-經基乙 S旨 (2-hydroxyethylpropionate)、丙酸-3-甲基-3 甲氧基丁酯 (3-methyl-3-methoxybutylpropionate)、3-甲氧基丙酸乙 S旨 (ethyl-3-methoxypropionate) 、 3-乙氧基丙酸曱醋 (methyl-3-ethoxypropionate) 、3-乙氧基丙酸乙酯 (ethyl-3-ethoxypropionate)、醋酸丁醋（butylacetate)、戊酸 戊 S旨（amylpermate)、醋酸異戊酯（isoamylacetate)、醋酸異 丁酯（isobutylacetate)、丙酸丁醋（butylpropionate)、丁酸異 丙酯（isopropylbutyrate)、丁 酸乙酯（ethylbutyrate)、丁酸丁 酉旨（butylbutyrate)、丙蒙I 酸乙醋（ethylpyruvate)、或醋酸-γ· 丁酸酯（γ-butyrolacetate)。本發明之溶劑可單獨使用，或可 使用將兩種或以上之溶劑混合而成之混合物。 本發明所使用之光阻組成物更可採用6) —第一添加 劑，其選自由分散劑、附著促進劑、抗氧化劑、紫外光吸 27 200835944 收劑、熱聚合防止劑、以及均化劑所組成之群組之至少一 者。 分散劑之使用方法，可採用對顏料進行事先表面處理 之形式將分散劑添加在顏料内，或可採用外在添加的方式 5 將分散劑添加至顏料中。分散既可為聚合式分散劑、非離 子分散劑、陰離子分散劑或陽離子分散劑。分散劑的例子20 In view of solubility, pigment dispersion, and degree of coating, the solvent used in the present invention may be: propyleneglycol monomethyl ether, ethyleneglycol monomethyl ether acetate, propylene glycol Propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, diethyleneglycol dimethyl ether, cyclohexanon, 2-heptanone (2) -heptanon), 3-heptanon, propionic acid _2- 2-hydroxyethylpropionate, 3-methyl-3-methoxybutyl propionate (3-methyl-3) -methoxybutylpropionate), 3-methoxypropionate, methyl-3-ethoxypropionate, 3-ethoxypropionate -3-ethoxypropionate), butylacetate, amylpermate, isoamylacetate, isobutylacetate, butylpropionate, isopropyl butyrate Ester (isopropylb) Utyrate), ethylbutyrate, butybutyrate, ethylpyruvate, or gamma-butyrolacetate. The solvent of the present invention may be used singly or as a mixture of two or more solvents. The photoresist composition used in the present invention may further adopt 6) a first additive selected from the group consisting of a dispersant, an adhesion promoter, an antioxidant, an ultraviolet light absorber, a heat polymerization inhibitor, and a leveling agent. At least one of the group consisting of. The dispersing agent may be used by adding a dispersing agent to the pigment in the form of a prior surface treatment of the pigment, or by adding the dispersing agent to the pigment by external addition. The dispersion may be either a polymeric dispersant, a nonionic dispersant, an anionic dispersant or a cationic dispersant. Example of dispersant

10 1510 15

20 可包括：聚亞院基乙二醇（polyalkyleneglycol)及其醋類、聚 氧化烯多元醇（polyoxyalkylene polyhydric alcohol)、6旨烯氧 化物添加劑（esteralkylene oxide additive)、醇烯氧化物添劑 (alcohol alkylene oxide additive)、石黃酸醋（sulfonate ester)、 石黃酸鹽（sulphonate)、碳酸醋（carboxylic ester)、碳酸鹽 (carboxylate)、烧基驢胺基亞烧基氧化物添加劑 (alkylamidalkyleneoxide additive) 以及烧基胺 (alkylamine)。這些物質可以單獨添加，或是在混合兩種或 以上之物質後添加。 附著促進劑可包含乙烯基甲氧基矽烷 (vinyltrimethoxy silane)、 乙稀基三乙氧基石夕烧 (vinyltriethoxysilane)、乙烯基三（2-甲氧基乙氧基）-石夕烧 (vinyl tris(2-methoxyethoxy)-silane)、N-(2-胺基乙基）-3-胺 基丙 基 甲基 二曱氧 基矽烷 (N_(2-aminoethyl)-3-aminopropylmethyldimethoxy silane)、 N-(2-胺基乙基）-3·胺基丙基乙基三甲氧基矽烷 (N-(2-aminoethyl)-3-aminopropylmethyltrimethoxysilane)、 3-胺基丙基三乙氧基石夕烧（3-aminopropyltriethoxysilane)、 28 200835944 3-縮水甘油醚基丙基三乙氧基矽烷 (3-glycidoxypropyltriethoxysilane)、3-縮水甘油醚丙基甲基 二甲氧基石夕烧（3-glycidoxypropylmethyldimethoxysilane)、 2-(3,4-乙氧基環己基）乙基三甲氧基矽烷 (2-(3,4，ethoxycyclohexyl)ethyltrimethoxysilane)、3-氯本基 甲基 二曱氧 基矽烷20 may include: polyalkyleneglycol and its vinegar, polyoxyalkylene polyhydric alcohol, esteralkylene oxide additive, alkenyl oxide additive (alcohol) Alkene oxide additive), sulfonate ester, sulphonate, carboxylic ester, carboxylate, alkylamidalkylene oxide additive And an alkylamine. These materials may be added singly or after mixing two or more substances. The adhesion promoter may comprise vinyltrimethoxy silane, vinyltriethoxysilane, vinyl tris(2-methoxyethoxy)-vinyl tris (vinyl tris) 2-methoxyethoxy)-silane), N-(2-aminoethyl)-3-aminoethyl-3-methylpropylmethyldimethoxy silane, N-(2) -aminoethyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-aminopropyltriethoxysilane , 28 200835944 3-glycidoxypropyltriethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2-(3,4- 2-(3,4,ethoxycyclohexyl)ethyltrimethoxysilane, 3-chlorobenzylmethyldimethoxydecane

10 (3-chloropropylmethyldimethoxysilane)、3-氯丙基三甲氧基 石夕烧（3-chloropropyltrimethoxysilane)、3-甲基丙烯醯氧基丙 基三甲氧基石夕烧（3_methacryloxypropyltrimethoxysilane)、或 3- 硫 醇基丙 基三甲 氧 基矽烷 (3-mercaptopropyltrimethoxysilane) ° 至於抗氧化劑，可使用2,2-硫代雙（4-曱基-6-t-丁基苯 齡（2,2_tMobis(4-methyl-6-t-butylphenol))、或 2,6_g，t-丁基苯 紛（2,6-g，1>butylphenol);而至於子外光吸收劑，可使用 15 2-(3_t- 丁基·5-甲基-2-羥基苯基）-5-氯-苯并三唑 (2-(3-t-butyl-5-methyl-2-hydroxyphenyl)-5-chloro-benzotria zol)、或烧氧基二苯基酮（alkoxy benzophenone) 〇 光阻組成物可更包括7) —第二添加劑，其選自由碳黑 分散劑、具官能基之樹脂黏著劑、單體、輻射敏感化合物、 20 及其他添加物所組成之群組之至少一者。 本發明提供一種液晶顯示器用之黑色矩陣，其製備方 法之步驟包含·· 1)於一面板上，塗覆本發明之液晶顯示器 用之黑色矩陣光阻組成物；以及2)曝光及顯影此塗覆之黑 色矩陣光組成物。 29 200835944 液晶顯示器用之黑色矩陣的優點，在於其具有極佳之 顯影性、遮光性、以及絕緣性，且不會有殘基生成，同時 可避免因熱處理而導致之顯示缺陷產生。 再者，本發明提供一種液晶顯示器，其包含液晶顯示 5 器用之黑色矩陣。此液晶顯示器可使用一般本技術領域者 輕易了解之製作方法製造，除了此液晶顯示器包含本發明 之液晶顯示器用之黑色矩陣。 【實施方式】 10 接下來，為說明本發明之目的，將揭露本發明之較佳 實施例。然而，這些實施例僅為說明用，本發明不應侷限 於這裡所述之實施例中。. <實施例> 實施例110 (3-chloropropylmethyldimethoxysilane), 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, or 3-thiolpropyl 3-mercaptopropyltrimethoxysilane ° As for the antioxidant, 2,2-thiobis(4-mercapto-6-t-butylbenzene (2,2_tMobis(4-methyl-6-t-) can be used. Butylphenol)), or 2,6_g, t-butylbenzene (2,6-g,1>butylphenol); and for the exo-light absorber, 15 2-(3_t-butyl·5-methyl can be used. 2-(3-t-butyl-5-methyl-2-hydroxyphenyl)-5-chloro-benzotria zol, or alkoxydiphenyl The alkoxy benzophenone iridium resist composition may further comprise 7) a second additive selected from the group consisting of a carbon black dispersant, a functional resin binder, a monomer, a radiation sensitive compound, 20 and other additives. At least one of the groups. The invention provides a black matrix for a liquid crystal display, the steps of the preparation method comprising: 1) coating a black matrix photoresist composition for a liquid crystal display of the invention on one side plate; and 2) exposing and developing the coating A black matrix light composition overlaid. 29 200835944 The advantage of the black matrix for liquid crystal displays is that it has excellent developability, opacity, and insulation without residue generation and avoids display defects caused by heat treatment. Furthermore, the present invention provides a liquid crystal display comprising a black matrix for a liquid crystal display device. The liquid crystal display can be fabricated using a fabrication method generally known to those skilled in the art, except that the liquid crystal display comprises the black matrix for the liquid crystal display of the present invention. [Embodiment] Next, a preferred embodiment of the present invention will be disclosed for the purpose of illustrating the present invention. However, these examples are for illustrative purposes only, and the invention should not be limited to the embodiments described herein. <Embodiment> Example 1

15 混合750重量份之作為著色劑之碳黑分散劑（MIKUNI CORPORATION，碳黑含量為20%)、60重量份之作為鹼溶 性樹脂黏著劑之化合物[莫耳數比42(曱基丙烯酸苯酯）/8(苯 乙烯）/6(N-苯基順丁稀二醯亞胺）/20(縮水甘油基添加 物）/24(丁 二酸酐）、Mw = 12,000、酸值：62 KOH mg/g、以 20 及雙鍵當量：494](此化合物是透過一開環反應所生成，在 一部分之醇類自由基上使用丁二酸酐，其中醇類自由基是 透過添加甲基丙烯酸縮水甘油酯至一甲基丙烯酸苯酯/苯 乙烯/ N-苯基順丁稀二醯亞胺/甲基丙烯酸共聚物所形 成）、70重量份之作為官能基單體之二新戊四醇六丙烯酸 200835944 酯、10重量份之作為光聚合起始劑之乙酮乙基）·6_(2_ 甲基本甲醯-3-基）-，1_(〇-乙醯膀）、1〇重量份之2,2，_雙（對·氯 苯基）-4,4,5,5’-四苯基 二咪唑 (2,2’-bis(0-chl〇r〇Phenyl)-4,4,5,5Metraphenyl-l，2，-biimidazc&gt; 5〗e)、10重量份之4,4-雙（二乙基胺基）二苯基酮、5重量份之 硫醇基苯並噻唑硫酮、5重量份之作為附著促進劑之3-甲基 丙烯醯氧基丙基三曱氧基矽烷、丨重量份之均化劑、51〇重 里伤之丙二醇甲醚醋酸酯、以及51〇重量份之作為溶劑之乙 酸-3-曱氧基丁基酯（3-methoxybutyl acetate)。接著，將所得 10的混合物攪拌5小時，而製備得一黑色矩陣光阻組成物。 將上述方法製備之光阻組成物溶液利用旋轉式塗佈於 玻璃上，在大約l〇(TC的溫度下預烘2分鐘，然後形成一厚 度約為1·29 μηι之塗膜。接著，於室溫下冷卻基板，在高壓 汞燈能量為60 mJ/cm2下使用光罩曝光。於25ι下，將曝光 15基板使用噴塗法，在〇·〇4 %之KOH水溶液中進行顯影後， 使用乾淨的清水清洗之，經乾燥後，在22〇〇c之對流恆溫烤 箱後焙30分鐘。 利用上述方法製得之塗膜圖案，其厚度為丨· 1 pm，且 圖案並無遺漏，真直度極佳，且可得到不具有曝光部分污 20染物之乾淨的圖案特徵。光密度為4.0或以上，且可得到極 佳之遮光性。 &lt;敏感度測試&gt; 使用實施例1所得之光阻組成物測量曝光之厚度變 化，而曝光的變化量為20、30、40、5〇、60、7Ό ' 80、90、 31 200835944 或100 mJ/cm2，在曝光量為30 mJ/cm2或以上，可得到殘留 比例為90%或以上（參閱圖1)。 &lt;顯影性（製程限度）測試&gt; 實施例1所製得之光阻組成物，利用旋轉式塗佈於玻璃 5 上，在約l〇〇°C之溫度下預烘2分鐘，便能形成厚度為1.29μιη 之塗膜。接著，於室溫下冷卻基板，在高壓汞燈能量為60 mJ/cm2下使用光罩曝光。於25°C下，將曝光基板使用喷塗 法，在0.04 %之KOH水溶液中進行顯影。此時，當顯影的 時間控制在60至90秒的範圍内時，進行製程限度測試。如 10 實驗結果所示，在顯影時間範圍為50至90秒時，線寬幾乎 沒有改變，且維持圖案之穩定度（參閱圖2)。 實施例2 混合750重量份之作為著色劑之碳黑分散劑（MIKUNI CORPORATION，碳黑含量為20%)、30重量份之作為鹼溶 15 性樹脂黏著劑之化合物[莫耳數比4 2 (曱基丙烯酸苯酯）/ 8 (苯 乙烯）/6(N-苯基順丁稀二醯亞胺）/34(縮水甘油基添加 物）/10( 丁二酸酐）、Mw= 10,000、酸值：27 KOHmg/g、以 及雙鍵當量：462](此化合物是透過一開環反應所生成，在 一部分之醇類自由基上使用丁二酸酐，其中醇類自由基是 20 透過添加甲基丙烯酸縮水甘油酯至一甲基丙烯酸苯酯/苯 乙烯/ N-苯基順丁稀二醯亞胺/甲基丙烯酸共聚物所形 成）、30重量份之甲基丙烯酸苯酯/苯乙烯/N-苯基順丁稀二 醯亞胺/甲基丙烯酸/丙烯酸-曱基丙烯酸縮水甘油酯聚合物 [莫耳數比52(曱基丙烯酸苯酯）/8(苯乙烯）/6(N-苯基順丁稀 32 200835944 二醯亞胺）/28(曱基丙烯酸）/6(縮水甘油基添加物）、Mw = 18,000、酸值：1〇6 K〇H mg/g、以及雙鍵當量· 2 466]、7〇 重里伤之作為官能基單體之二新戊四醇六丙烯酸酯、1〇重 畺伤之作為光聚合起始劑之乙酮乙基）_6_(2_甲基苯甲 5 醯-3_基乙醯肟）、10重量份之2,2，-雙（對-氯苯 基）·4,4,5,5，-四苯基_1，2，_二咪唑、1〇重量份之4,4_雙（二乙基 胺基）一本基酮、5重量份之硫醇基苯並嗟唆硫嗣、5重量份 之作為附著促進劑之3-甲基丙烯醯氧基丙基三甲氧基矽 烷、1重量份之均化劑、510重量份之丙二醇曱醚醋酸酯、 10以及51〇重量份之作為溶劑之乙酸-3·甲氡基丁基酯。接著， 將所得的混合物攪拌5小時，而製備得一黑色矩陣光阻組成 物0 將上述所製備之光阻組成物利用與實施例1相同之方 法進行各種製程。最後，所得之塗膜圖案之厚度為hl ， 15且圖案並無遺漏，真直度極佳，且可得到不具有曝光部分 污染物之乾淨的圖案特徵。光密度為4 0或以上，且可得到 極佳之遮光性。 實施例3 製備一具有與實施例1相同的組成比例之光阻組成 20物，除了實施例3是使用60重量份之作為鹼溶性樹脂黏著劑 之化合物[莫耳數比5〇(曱基丙烯酸苯酯）/8(苯乙烯）/6(队笨 基順丁稀二醯亞胺）/24(甲基丙烯酸）/12(縮水甘油基添加 物）、Mw= 16,000、酸值：87KOHmg/g、以及雙鍵當量： 1，289](此化合物是透過添加甲基丙烯酸縮水甘油酯至一甲 33 200835944 基丙烯酸苯酯/苯乙烯/ N_苯基順丁稀二醯亞胺/甲基丙烯酸 共聚物所生成）。 將上述所製備.之光阻組成物利用與實施例1相同之方 法進仃各種製程。最後，所得之塗膜圖案之厚度為丨丨， 5且圖案並無遺漏，真直度極佳，且可得到不具有曝光部分 污染物之乾淨的圖案特徵。光密度為4 〇或以上，且可得到 極佳之遮光性。 實施例4 製備一具有與實施例i相同的組成比例之光阻組成 10物，除了實施例4是使用1〇重量份之1&gt;2_辛二酮，_1-(‘苯硫 基）本基，-2-(〇•本氧基躬·基）、重量份之2,2，_雙（對·氯苯 基）-4,4,5,5’-四苯基-u-二咪唑、1〇重量份之4,4-雙（二乙基 胺基）二苯基酮、以及5重量份之硫醇基苯並噻唑硫酮，作 為先聚合起始劑。 15 將上述方法製備之光阻組成物溶液利用旋轉式塗佈於 無鹼玻璃上，在大約！^^的溫度下預烘2分鐘，然後形成 一厚度約為1.3 μπι之塗膜。接著，於室溫下冷卻基板，在 高壓汞燈能量為80mJ/cm2下使用光罩曝光。於25。〇下，將 曝光基板使用噴塗法，在〇·〇4 %之KOH水溶液中進行顯影 20後’使用乾淨的清水清洗之，經乾燥後，在220°C之對流恆 溫烤箱後焙30分鐘。 將上述所製備之光阻組成物利用與實施例1相同之方 法進行各種製程。最後，所得之塗膜圖案之厚度為Μ μπι， 且圖案並無遺漏，真直度極佳，且可得到不具有曝光部分 34 200835944 污染物之乾淨的圖案特徵。光密度為4·0或以上，且可得到 極佳之遮光性。 實施例5 ^ 製備一具有與實施例1相同的組成比例之光阻組成 5 物’除了實施例5是使用30重量份之2-苯基-2-(二甲基胺 基H-(4-嗎啉基苯基）‘丁小酮、1〇重量份之2,2，_雙（對_氯苯 基）-4,4,5,5’-四苯基_l52，·二咪唑、1〇重量份之4,4_雙（二乙基 胺基）一本基_、以及5重量份之硫醇基苯並嗟峻硫sg，作 • A光聚合起始劑。 10 將上述方法製備之光阻組成物溶液利用旋轉式塗佈於 無驗玻璃上，在大約10(rc的溫度下預烘2分鐘，然後形成 一厚度約為1·37 μιη之塗膜。接著，於室溫下冷卻基板，在 冋壓汞燈能量為80 mJ/cm2下使用光罩曝光。於25°C下，將 曝光基板使用喷塗法，在0·04 %之尺〇11水溶液中進行顯影 15 後，使用乾淨的清水清洗之，經乾燥後，在220°C之對流恆 溫烤箱後培30分鐘。 瞻 將上述所製備之光阻組成物利用與實施例1相同之方 法進行各種製程。最後，所得之塗膜圖案之厚度為1.1 μιη， 且圖案並無遺漏，真直度極佳，且可得到不具有曝光部分 20巧染物之乾淨的圖案特徵。光密度為4.0或以上，且可得到 極佳之遮光性。 實施例6 製備—具有與實施例1相同的組成比例之光阻組成 物，除了實施例6是4吏用60重量份之作為黏著劑之化合物 35 200835944 [莫耳數比35(甲基丙烯酸苯酯）/10(苯乙烯）/1〇(甲基丙烯酸 二環戊_ )/20(縮水甘油基添加物）/25(丁二酸酐添加物）、 • Mw= AOOO、酸值：63 KOHmg/g、以及雙鍵當量：492](此 - 化合物是透過一開環反應所生成，在一部分之醇類自由基 5 上使用丁二酸酐，其中醇類自由基是透過添加甲基丙烯酸 縮水甘油醋至一曱基丙烯酸苯酯/苯乙烯/曱基丙烯酸二環 戊醋/甲基丙烯酸共聚物所形成）。 將上述所製備之光阻組成物利用與實施例1相同之方 ⑩ 法進行各種製程。最後，所得之塗膜圖案之厚度為1J μιη， 10 且圖案並無遺漏，真直度極佳，且可得到不具有曝光部分 污染物之乾淨的圖案特徵。光密度為4 0或以上，且可得到 極佳之遮光性。 比較例1 製備一具有與實施例1相同的組成比例之光阻組成 15物，除了比較例1是使用60重量份之化合物[莫耳數比35(甲 基丙烯酸苯酯）/25(縮水甘油基添加物）/4〇( 丁二酸酐添加 春物）、12,〇〇〇、酸值：89KOHmg/g、以及雙鍵當量： 386](此化合物是透過一開環反應所生成，在一部分之醇類 自由基上使用丁二酸酐，其中醇類自由基是透過添加甲基 2〇丙烯酸縮水甘油酯至一甲基丙烯酸苯酯/曱基丙烯酸共^ 物所形成），作為實施例1中之驗溶性樹脂黏著劑。 將上述所製備之光阻組成物利用與實施例〗相同之方 法2行各種製程。最後，所得之塗膜圖案因顯影而造成圖 案遺漏，且無法得到極佳的圖案特徵。 36 200835944 比較例2 製備一具有與實施例1相同的組成比例之光阻組成 物，除了比較例2是使用60重量份之化合物[莫耳數比55(甲 基丙烯酸苯酯）/20(甲基丙烯酸）/25(縮水甘油基添加物）、 5 Mw= 12,000、酸值：65 KOHmg/g、以及雙鍵當量：686](此 化合物是透過添加甲基丙烯酸縮水甘油酯至一甲基丙烯酸 苯酯/曱基丙烯酸共聚物所形成），作為實施例j中之鹼溶性 樹脂黏著劑。 將上述所製備之光阻組成物利用與實施例1相同之方 10法進行各種製程，然後進行顯影。最後，由於顯影時間過 長，而難以得到圖案。再者，顯影圖案之真直度與薄膜特 性皆不良。 比較例3 製備一具有與實施例1相同的組成比例之光阻組成 15物，除了比較例3是使用60重量份之化合物[莫耳數比55(曱 基丙烯酸苯酯）/40(甲基丙烯酸）/5(縮水甘油基添加物）、河以 =12,000、酸值：157K〇Hmg/g、以及雙鍵當量：μ〗叹此 化合物是透過添加曱基丙烯酸縮水甘油酯至一甲基丙烯酸 苯酯/甲基丙烯酸共聚物所形成），作為實施例丨中之鹼溶性 20 樹脂黏著劑。 將上述所製備之光阻組成物利用與實施例丨相同之方 法進行各種製程，然後進行顯影。最後，因顯影過快使得 圖案有所遺漏。 37 200835944 【圖式簡單說明】 圖1係本發明一較佳實施例之光阻組成物隨著曝光其厚度 變化圖。 圖2係本發明一較佳實施例之光阻組成物隨著顯影時間其 5 圖案變化圖。 【主要元件符號說明】 無0 3815 750 parts by weight of a carbon black dispersant (MIKUNI CORPORATION, carbon black content: 20%) as a coloring agent, and 60 parts by weight of a compound as an alkali-soluble resin adhesive [molar ratio 42 (phenyl methacrylate) ) / 8 (styrene) / 6 (N-phenyl cis-butyl diimide imine) / 20 (glycidyl additive) / 24 (succinic anhydride), Mw = 12,000, acid value: 62 KOH mg / g, with 20 and double bond equivalent: 494] (This compound is formed by a ring opening reaction, using succinic anhydride on a part of the alcohol radical, wherein the alcohol radical is added by adding glycidyl methacrylate 70 parts by weight of dipentaerythritol hexaacrylate as a functional monomer, to phenyl methacrylate/styrene/N-phenyl cis-butyl bis-imide/methacrylic acid copolymer, 200835944 Ester, 10 parts by weight of ethyl ketone ethyl) as a photopolymerization initiator, 6_(2-methylbenzhydryl-3-yl)-, 1_(〇-乙醯), 1〇 parts by weight, 2, 2 , _bis(p-chlorophenyl)-4,4,5,5'-tetraphenyldiimidazole (2,2'-bis(0-chl〇r〇Phenyl)-4,4,5,5Metraphenyl- l,2,-biimidazc&gt 5) e), 10 parts by weight of 4,4-bis(diethylamino)diphenyl ketone, 5 parts by weight of thiol benzothiazole thione, and 5 parts by weight of the adhesion promoter 3 - methacryloxypropyltrimethoxy decane, hydrazine partial weighting agent, 51 mil weight propylene glycol methyl ether acetate, and 51 liters by weight of acetic acid-3-methoxyl as a solvent 3-methoxybutyl acetate. Next, the resulting mixture of 10 was stirred for 5 hours to prepare a black matrix resist composition. The photoresist composition solution prepared by the above method is spin-coated on the glass, prebaked at a temperature of about 1 Torr for 2 minutes, and then a coating film having a thickness of about 1.29 μm is formed. The substrate was cooled at room temperature, and exposed to a reticle at a high pressure mercury lamp of 60 mJ/cm 2 . The exposed substrate was sprayed at 25 MPa and developed in a 〇·〇 4 % KOH aqueous solution. After washing with water, after drying, it is baked for 30 minutes in a convection oven at 22 ° C. The film pattern obtained by the above method has a thickness of 丨·1 pm, and the pattern is not missing, and the straightness is extremely extreme. Preferably, a clean pattern feature is obtained which does not have an exposed portion of the stain 20. The optical density is 4.0 or more, and excellent light blocking properties are obtained. <Sensitivity Test> The photoresist composition obtained in Example 1 was used. The thickness of the exposure is measured, and the amount of change in exposure is 20, 30, 40, 5 〇, 60, 7 Ό '80, 90, 31 200835944 or 100 mJ/cm 2 , and the exposure amount is 30 mJ/cm 2 or more. The residual ratio is 90% or more (see Figure 1). Lt; developability (process limit) test&gt; The photoresist composition obtained in Example 1 was spin-coated on the glass 5 and prebaked at a temperature of about 10 ° C for 2 minutes. A coating film having a thickness of 1.29 μm was formed. Then, the substrate was cooled at room temperature, and exposed to a photomask at a high pressure mercury lamp of 60 mJ/cm 2 . The exposed substrate was sprayed at 25 ° C at 0.04 The development is carried out in an aqueous solution of KOH. At this time, when the time of development is controlled within the range of 60 to 90 seconds, the process limit test is performed. As shown in the results of 10 experiments, when the development time ranges from 50 to 90 seconds, the line is The width was hardly changed, and the stability of the pattern was maintained (see Fig. 2). Example 2 750 parts by weight of a carbon black dispersant (MIKUNI CORPORATION, carbon black content of 20%) and 30 parts by weight were mixed as a coloring agent. Alkali-soluble 15 resin adhesive compound [molar ratio 4 2 (phenyl methacrylate) / 8 (styrene) / 6 (N-phenyl cis-butyl bis-imide) / 34 (glycidyl) Addition)/10 (succinic anhydride), Mw = 10,000, acid value: 27 KOHmg/g, and double bond equivalent 462] (This compound is formed by a ring opening reaction, using succinic anhydride on a part of the alcohol radical, wherein the alcohol radical is 20 by adding glycidyl methacrylate to phenyl monomethacrylate / 30 parts by weight of phenyl methacrylate / styrene / N-phenyl cis-butyl diimide / A formed by styrene / N-phenyl cis-butyl diimide / methacrylic acid copolymer) Acrylic acid/acrylic acid-glycidyl methacrylate polymer [molar ratio 52 (phenyl methacrylate) / 8 (styrene) / 6 (N-phenyl cis-butyl 32 200835944 diimine) / 28 (methacrylic acid) / 6 (glycidyl additive), Mw = 18,000, acid value: 1 〇 6 K 〇 H mg / g, and double bond equivalent · 2 466], 7 〇 heavy injury as a functional group Monomeric pentaerythritol hexaacrylate, ethyl ketone ethyl ester as a photopolymerization initiator, 〇6_(2_methylbenzamide 5 醯-3_yl acetamidine), 10 2,2,-bis(p-chlorophenyl)·4,4,5,5,-tetraphenyl-1,2,-diimidazole, 1 part by weight of 4,4_double (two parts by weight) Ethylamino)-based ketone, 5 parts by weight Thiol benzoxanthene thioindole, 5 parts by weight of 3-methylpropenyloxypropyltrimethoxydecane as an adhesion promoter, 1 part by weight of a leveling agent, and 510 parts by weight of propylene glycol oxime ether Acetate, 10 and 51 parts by weight of acetic acid-3·methylmercaptobutyl ester as a solvent. Next, the obtained mixture was stirred for 5 hours to prepare a black matrix resist composition 0. The photoresist composition prepared above was subjected to various processes in the same manner as in Example 1. Finally, the resulting coating film has a thickness of hl, 15 and the pattern is not missing, the straightness is excellent, and a clean pattern feature without the exposed portion of the contaminant can be obtained. The optical density is 40 or more, and excellent light blocking properties are obtained. Example 3 A photoresist composition 20 having the same composition ratio as that of Example 1 was prepared, except that Example 3 was used as a compound of 60 parts by weight as an alkali-soluble resin adhesive [molar ratio 5 〇 (methacrylic acid) Phenyl ester) / 8 (styrene) / 6 (team succinimide diimide imine) / 24 (methacrylic acid) / 12 (glycidyl additive), Mw = 16,000, acid value: 87 KOHmg / g And double bond equivalent: 1,289] (This compound is added by adding glycidyl methacrylate to a nail 33 200835944 phenyl acrylate / styrene / N_phenyl cis-butane diimide / methacrylic acid Copolymer produced). The photoresist composition prepared as described above was subjected to various processes in the same manner as in Example 1. Finally, the resulting coating film has a thickness of 丨丨, 5 and the pattern is not missing, and the straightness is excellent, and a clean pattern feature having no exposed portion of the contaminant can be obtained. The optical density is 4 〇 or more, and excellent light blocking properties are obtained. Example 4 A photoresist composition 10 having the same composition ratio as that of Example i was prepared, except that Example 4 was used in an amount of 1 part by weight of 2&gt;2-dienedione, 1 -('phenylthio)-based group. ,-2-(〇•本oxy躬·yl), 2,2,_bis(p-chlorophenyl)-4,4,5,5'-tetraphenyl-u-diimidazole, 1 part by weight of 4,4-bis(diethylamino)diphenyl ketone, and 5 parts by weight of thiol benzothiazole thione as a polymerization initiator. 15 The photoresist composition solution prepared by the above method is applied by rotary coating on an alkali-free glass at about! The film was prebaked at a temperature of ^^ for 2 minutes, and then a film having a thickness of about 1.3 μm was formed. Next, the substrate was cooled at room temperature, and exposed to light at a high pressure mercury lamp of 80 mJ/cm2. At 25. Under the armpit, the exposed substrate was subjected to development by a spray coating method in a 4% KOH aqueous solution of 20%, and then washed with clean water, dried, and then baked at a 220 ° C convection constant temperature oven for 30 minutes. The photoresist composition prepared above was subjected to various processes in the same manner as in Example 1. Finally, the resulting coating film has a thickness of Μ μπι, and the pattern is not missing, the straightness is excellent, and a clean pattern feature without the exposed portion 34 200835944 contaminant can be obtained. The optical density is 4.0 or more, and excellent light blocking properties are obtained. Example 5 ^ A photoresist composition having the same composition ratio as in Example 1 was prepared. 'In addition to Example 5, 30 parts by weight of 2-phenyl-2-(dimethylamino H-(4-) was used. Morpholinylphenyl) 'butanone, 1 part by weight of 2,2,_bis(p-chlorophenyl)-4,4,5,5'-tetraphenyl-l52,diimidazole, 1 4 parts by weight of 4,4_bis(diethylamino)-based _, and 5 parts by weight of thiol benzofluorene sulphur sg as a photopolymerization initiator. 10 Preparation by the above method The photoresist composition solution is spin-coated on the non-glass, prebaked at a temperature of about 10 (rc) for 2 minutes, and then a film having a thickness of about 1.37 μm is formed. Then, at room temperature The substrate was cooled, and exposed to a reticle at an energy of 80 mJ/cm 2 of the krypton mercury lamp. The exposed substrate was developed by a spray coating method at 25 ° C in an aqueous solution of 0. 04 % 〇 11 . After washing with clean water, it was dried and then incubated in a convection oven at 220 ° C for 30 minutes. The photoresist composition prepared above was subjected to various processes in the same manner as in Example 1. Finally, The obtained coating film pattern has a thickness of 1.1 μm, and the pattern is not missing, the straightness is excellent, and a clean pattern feature without the exposed portion 20 is obtained, and the optical density is 4.0 or more, and the image density is excellent. Example 6 Preparation - A photoresist composition having the same composition ratio as in Example 1, except that Example 6 is 60 parts by weight of a compound 35 as an adhesive. 200835944 [Mole Ratio 35 ( Phenyl methacrylate/10 (styrene) / 1 〇 (dicyclopentyl methacrylate _) / 20 (glycidyl additive) / 25 (succinic anhydride additive), • Mw = AOOO, acid value : 63 KOHmg / g, and double bond equivalent: 492] (This - the compound is formed by a ring opening reaction, using succinic anhydride on a part of the alcohol radical 5, wherein the alcohol radical is through the addition of methyl A glycidyl acrylate acrylate to a phenyl methacrylate/styrene/mercaptoacrylic acid dicyclopentanacetic acid/methacrylic acid copolymer.) The photoresist composition prepared above was used in the same manner as in Example 1. The law carries out various processes. Finally, the proceeds The thickness of the film pattern is 1J μm, 10 and the pattern is not missing, the straightness is excellent, and the clean pattern features without the exposed part of the contaminant can be obtained. The optical density is 40 or more, and excellent shading can be obtained. Comparative Example 1 A photoresist composition 15 having the same composition ratio as in Example 1 was prepared except that Comparative Example 1 used 60 parts by weight of a compound [molar ratio 35 (phenyl methacrylate) / 25 ( Glycidyl additive) / 4 〇 (succinic anhydride added spring), 12, hydrazine, acid value: 89 KOHmg / g, and double bond equivalent: 386] (this compound is formed by a ring opening reaction, in A part of the alcohol radicals are used with succinic anhydride, wherein the alcohol radicals are formed by adding methyl 2 hydrazine glycidyl acrylate to phenyl methacrylate / methacrylic acid conjugate, as Example 1 A solvent-soluble resin adhesive in the test. The photoresist composition prepared above was subjected to various processes in the same manner as in Example. Finally, the resulting coating film pattern was left out due to development, and excellent pattern characteristics could not be obtained. 36 200835944 Comparative Example 2 A photoresist composition having the same composition ratio as in Example 1 was prepared except that Comparative Example 2 was used in 60 parts by weight of the compound [molar ratio 55 (phenyl methacrylate) / 20 (A) Acrylic acid) / 25 (glycidyl additive), 5 Mw = 12,000, acid value: 65 KOHmg / g, and double bond equivalent: 686] (this compound is added by adding glycidyl methacrylate to monomethacrylic acid A phenyl ester/mercaptoacrylic acid copolymer was formed as the alkali-soluble resin adhesive in Example j. The photoresist composition prepared above was subjected to various processes by the same method as in Example 1, and then developed. Finally, it is difficult to obtain a pattern because the development time is too long. Furthermore, the trueness and film characteristics of the developed pattern are poor. Comparative Example 3 A photoresist composition 15 having the same composition ratio as in Example 1 was prepared, except that Comparative Example 3 was used in 60 parts by weight of a compound [molar ratio 55 (phenyl methacrylate) / 40 (methyl group). Acrylic acid)/5 (glycidyl additive), river to 12,000, acid value: 157 K〇Hmg/g, and double bond equivalent: μ sighs this compound by adding glycidyl methacrylate to monomethacrylic acid The phenyl ester/methacrylic acid copolymer was formed as an alkali-soluble 20 resin adhesive in the examples. The photoresist composition prepared above was subjected to various processes in the same manner as in Example ,, and then developed. Finally, the pattern is missing due to the rapid development. 37 200835944 BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a graph showing changes in thickness of a photoresist composition according to a preferred embodiment of the present invention as a function of exposure. Figure 2 is a graph showing the pattern change of the photoresist composition according to a preferred embodiment of the present invention as a function of development time. [Main component symbol description] None 0 38

Claims (1)

200835944 十、申請專利範圍： 1· 一種液晶顯示器用夕w 之黑色矩陣光阻組成物，在1 00 重量份之黑色矩陣光阻組成物中，包括： 1) 1至4Gi量份之—含黑色顏料之著色劑； 5 2) 1至2G44份之—如下式1所示之驗溶性樹脂黏著 劑； 3) 1至20重里份之—具有乙烯性不飽和雙鍵之多官能 基單體； 4) 0.1至20重I份之一光聚合起始劑；以及 10 5) 30至90重量份之一溶劑·， [式1] 義 i 0 0200835944 X. Patent application scope: 1. A black matrix photoresist composition for a liquid crystal display, in a black matrix photoresist composition of 100 parts by weight, comprising: 1) 1 to 4 Gi parts - containing black Pigment coloring agent; 5 2) 1 to 2G44 parts - a solvent-soluble resin adhesive as shown in the following formula 1; 3) 1 to 20 parts by weight - a polyfunctional monomer having an ethylenically unsaturated double bond; 0.1 to 20 parts by weight of one photopolymerization initiator; and 10 5) 30 to 90 parts by weight of one solvent·, [Formula 1] meaning i 0 0 (其中，R1為氫、或一形成醯亞胺結構或與X一同形成 五元環羧酸酐之自由基， 15 R2係選自由氫、甲基、以及羥甲基所組成之群組， R3及R4可彼此相同或不同且獨立為氫或甲基， X係選自由(^至(：12之烷基酯、（：2至06之經1或2個羥基 取代之烷基酯、C2至C6之經(^至^之烷氧基取代之烷基 39 200835944 ‘ 酯、〇^至C6之經鹵素取代之烧基酯、心至C3之烧氧聚（n=2 至30)亞烷、C2及C3之二醇酯、（^至^之經苯基取代之烷基 ’ 酯、經（^至匕之烷基取代之苯基、經（^至（:6之烷氧基取代 - 之苯基、經鹵素取代之苯基、（^至(:6之烷氧基曱基基團、 5 縮水甘油醚氧（glycidoxy)甲基基團、以及一形成醯亞胺結構 或與R1—同形成五元環羧酸酐之自由基所組成之群組， Y係選自由C〇至C12之亞烷基、及C3至C6〇之包含1至10 酯類基團亞烷基酯所組成之群組， 9 Z係選自由亞乙基、亞丙基、亞丁基、1，2-亞苯基、1,2- 環亞己基(wherein R1 is hydrogen or a radical which forms a quinone imine structure or forms a five-membered cyclic carboxylic anhydride together with X, and 15 R2 is selected from the group consisting of hydrogen, methyl, and hydroxymethyl, R3 and R4 may be the same or different from each other and independently hydrogen or methyl, and X is selected from the group consisting of (^12 alkyl esters, (2 to 06 alkyl ester substituted by 1 or 2 hydroxyl groups, C2 to C6) Alkyloxy-substituted alkyl group 39 200835944 ' ester, oxime to C6 halogen-substituted alkyl ester, heart to C3 burnt oxygen poly(n=2 to 30) alkylene, C2 And a diol ester of C3, a phenyl-substituted alkyl' ester of (^ to ^, a phenyl group substituted by an alkyl group, and a benzene substituted by an alkyl group. a phenyl group substituted with a halogen, (^ to an alkoxyalkyl group of 6 or a glycidoxymethyl group, and a quinone imine structure or formed together with R1) a group consisting of a radical of a five-membered cyclic carboxylic anhydride, Y group selected from the group consisting of an alkylene group of C〇 to C12, and an alkylene ester of a C1 to C6〇 group containing 1 to 10 ester groups. , 9 Z series is selected from ethylene, Propylene, butylene, 1,2-phenylene, 1,2-cyclohexylene 10 組成之群組（其中*表示連接部分），以及 a、b、c、以及d分別表示A、B、C、以及D之莫耳數比， 且a的範圍為10至90、b的範圍為0至60、c的範圍為0至40、 而d的範圍為0至40)。 • 15 2.如申請專利範圍第1項所述之黑色矩陣光阻組成 物，其中該含黑色顏料之著色劑係為一碳黑及至少一著色 顏料。 3.如申請專利範圍第2項所述之黑色矩陣光阻組成 物，其中該碳黑係選自由SEAST 5HIIS AF_HS、SEAST KH、 2〇 SEAST 3HHAF-HS、SEAST NH、SEAST 3M、SEAST 300HAF-LS、SEAST 116HMMAF-HS、SEAST 116MAF、 SEAST FMFEF-HS、SEAST SOFEF、SEAST VGPF、SEAST 20083594410 group of groups (where * represents the connecting portion), and a, b, c, and d represent the molar ratios of A, B, C, and D, respectively, and the range of a ranges from 10 to 90, b It ranges from 0 to 60, c ranges from 0 to 40, and d ranges from 0 to 40). 2. The black matrix photoresist composition of claim 1, wherein the black pigment-containing coloring agent is a carbon black and at least one coloring pigment. 3. The black matrix photoresist composition of claim 2, wherein the carbon black is selected from the group consisting of SEAST 5HIIS AF_HS, SEAST KH, 2〇SEAST 3HHAF-HS, SEAST NH, SEAST 3M, SEAST 300HAF-LS , SEAST 116HMMAF-HS, SEAST 116MAF, SEAST FMFEF-HS, SEAST SOFEF, SEAST VGPF, SEAST 200835944 10 1510 15 20 SVHSRF-HS、以及 SEAST SSRF (由 Tokai Carbon Co·，Ltd· 購得）；DIAGRAM BLACK II、DIAGRAM BLACK N339、 DIAGRAM BLACK SH、DIAGRAM BLACK H、DIAGRAM LH、DIAGRAM HA、DIAGRAM SF、DIAGRAM N550M、 DIAGRAM M、DIAGRAM E、DIAGRAM G、DIAGRAM R、 DIAGRAM N760M、DIAGRAM LR、#2700、#2600、#2400、 #2350、#2300、#2200、#1000、#_、_0、MCF88、#52、 #50、#47、#45、#45L、#25、#CF9、#95、#3030、#3050、 MA7、MA77、MA8、MA11、OIL7B、OIL9B、OIL11B、 OIL30B、以及 OIL31B (由 Mitsubishi Chemical Corporation 購得）；PRINTEX-U、PRINTEX-V、PRINTEX-140U、 PRINTEX-140V 、 PRINTEX-95 、 PRINTEX-85 、 PRINTEX-75、PRINTEX-55、PRINTEX-45、PRINTEX-300、 PRINTEX-35、PRINTEX-25、PRINTEX-200、PRINTEX-40、 PRINTEX-30、PRINTEX-3、PRINTEX-A、SPECIAL BLACK-550 、 SPECIAL BLACK-350 、 SPECIAL BLACK-250 、 SPECIAL BLACK-100 、以及 LAMP BLACK-101 (由 Degussa Japan Company 購得）；以及 RAVEN-1100ULTRA 、 RAVEN-10 80ULTRA 、 RAVEN-1060ULTRA、RAVEN-1040、RAVEN-103 5 、 RAVEN㈣ 1020、RAVEN-1000、RAVEN- 890H、RAVEN-890、 RAVEN-880ULTRA、RAVEN-860ULTRA、RAVEN-850、 RAVEN-820、RAVEN_790ULTRA、RAVEN-780ULTRA、 RAVEN-760ULTRA 、 RAVEN-520 、 RAVEN-500 、 41 200835944 * RAVEN-460 、RAVEN-450 、 RAVEN-43 OULTRA 、 RAVEN-420 、 RAVEN-410 、 RAVEN-2500ULTRA 、 * RAVEN-2000、RAVEN-1500、RAVEN-1255、RAVEN-1250、 ， RAVEN-1200、RAVEN-1190ULTRA、以及RAVEN· 1170 (由 5 Columbia Carbon Co·購得）。 4·如申請專利範圍第2項所述之黑色矩陣光阻組成 物，其中一與該碳黑混合之著色顏料係選自由寶紅（Carmine 6B，C.L 12490)、酜菁綠（Phthalocyanine Green，C.L ® 74260)、駄菁藍（Phthalocyanine Blue，C.I· 74160)、三菱碳 10 黑 MA100(Mitsubishi Carbon Black MA100)、黑（Perylene Black，BASF K0084及K0086)、青藍黑（Cyanine Black)、雷 奥諾爾黃（Lionol Yellow，C.I. 21090)、雷奥諾爾黃 GRQ(Lionol Yellow GRO，C.I.21090)、聯苯胺黃 4T-564D(Benzidine Yellow 4T-564D)、三菱碳黑 15 MA-40(Mitsubishi Carbon Black MA-40) ' 維多利亞飽藍 (Victoria Pure Blue，C.I· 42595)、C.I.顏料紅（PIGMENT _ RED)97，122，149，168，177, 180，192, 215 ; C.I·顏料綠 (Pigment Green)7, 36 ; C.I.顏料（PIGMENT)15:1，15:4, 15:6, 22，60，64; C.I·顏料（PIGMENT)83，139;以及 C.I.顏料紫 20 (PIGMENT VIOLET)23 〇 5 ·如申請專利範圍第1項所述之黑色矩陣光阻組成 物，其中用於形成該如式1所示之驗溶性樹脂黏著劑之A部 分之至少一单體係選自由：不飽和碳酸醋類（unsaturated carboxylic acid esters)，如曱基丙烯酸苯酯（benzyl 42 20083594420 SVHSRF-HS, and SEAST SSRF (available from Tokai Carbon Co., Ltd.); DIAGRAM BLACK II, DIAGRAM BLACK N339, DIAGRAM BLACK SH, DIAGRAM BLACK H, DIAGRAM LH, DIAGRAM HA, DIAGRAM SF, DIAGRAM N550M, DIAGRAM M, DIAGRAM E, DIAGRAM G, DIAGRAM R, DIAGRAM N760M, DIAGRAM LR, #2700, #2600, #2400, #2350, #2300, #2200, #1000, #_,_0, MCF88, #52, #50 , #47, #45, #45L, #25, #CF9, #95, #3030, #3050, MA7, MA77, MA8, MA11, OIL7B, OIL9B, OIL11B, OIL30B, and OIL31B (available from Mitsubishi Chemical Corporation) ); PRINTEX-U, PRINTEX-V, PRINTEX-140U, PRINTEX-140V, PRINTEX-95, PRINTEX-85, PRINTEX-75, PRINTEX-55, PRINTEX-45, PRINTEX-300, PRINTEX-35, PRINTEX-25, PRINTEX-200, PRINTEX-40, PRINTEX-30, PRINTEX-3, PRINTEX-A, SPECIAL BLACK-550, SPECIAL BLACK-350, SPECIAL BLACK-250, SPECIAL BLACK-100, and LAMP BLACK-101 (by Degussa Japan Company Purchased; and RAVEN-1100ULTRA, RAVEN-10 80ULTRA, RAVEN-1060ULTRA RAVEN-1040, RAVEN-103 5, RAVEN (4) 1020, RAVEN-1000, RAVEN-890H, RAVEN-890, RAVEN-880ULTRA, RAVEN-860ULTRA, RAVEN-850, RAVEN-820, RAVEN_790ULTRA, RAVEN-780ULTRA, RAVEN-760ULTRA, RAVEN-520, RAVEN-500, 41 200835944 * RAVEN-460, RAVEN-450, RAVEN-43 OULTRA, RAVEN-420, RAVEN-410, RAVEN-2500ULTRA, * RAVEN-2000, RAVEN-1500, RAVEN-1255, RAVEN -1250, , RAVEN-1200, RAVEN-1190ULTRA, and RAVEN·1170 (available from 5 Columbia Carbon Co.). 4. The black matrix photoresist composition according to claim 2, wherein a colored pigment mixed with the carbon black is selected from the group consisting of Carmine 6B (CL 12490) and Phthalocyanine Green (CL). ® 74260), Phthalocyanine Blue (CI 74160), Mitsubishi Carbon Black MA100, Black (Perylene Black, BASF K0084 and K0086), Cyanine Black, Leonor Yellow (Lionol Yellow, CI 21090), Leonol Yellow GRO (CI21090), benzidine yellow 4T-564D (Benzidine Yellow 4T-564D), Mitsubishi Carbon Black 15 MA-40 (Mitsubishi Carbon Black MA- 40) 'Victoria Pure Blue (CI·42595), CI Pigment Red (PIGMENT _ RED) 97, 122, 149, 168, 177, 180, 192, 215; CI·Pigment Green 7, 36; CI Pigment (PIGMENT) 15:1, 15:4, 15:6, 22,60,64; CI·Pigment 83,139; and CI Pigment Violet 20 (PIGMENT VIOLET) 23 〇5 ·If applied The black matrix photoresist composition of claim 1, wherein the formula 1 is formed At least one single system of the A portion of the test resin adhesive shown is selected from the group consisting of: unsaturated carboxylic acid esters such as phenyl methacrylate (benzyl 42 200835944). 10 1510 15 20 (meth)acrylate)、甲基丙烯酸甲酯（methyl(meth)acrylate)、 甲基丙浠酸乙酯（ethyl(meth)acrylate)、甲基丙烯酸丁酯 (butyl (meth)acrylate)、甲基丙烯酸二甲基胺基乙酯 (dimethylaminoethyl(meth)acrylate)-甲基丙烯酸異丁酯 (isobutyl(meth)acrylate)、甲基丙浠酸第三丁酯 (t-butyl(meth)acrylate)、 甲基丙稀酸環己酯 (cyclohexyl(meth)acrylate)、甲基丙烯酸異冰片酯 (isobornyl(meth)acrylate)、甲基丙浠酸乙基己酯 (ethylhexyl(meth)acrylate)、甲基丙浠酸（2-苯氧乙基）醋 (2-phenoxyethyl(meth)acrylate)、甲基丙稀酸四氫吱喃基酯 (tetrahydrofurfuryl (meth)acrylate)、曱基丙浠酸羥乙酯 (hydroxyethyl(meth)acrylate)、甲基丙烯酸（2_ 經丙基）酯 (2-hydroxypropyl(meth)acrylate)、甲基丙烯酸（2-經基-3-氯 丙基）酉旨（2-hydroxy-3-chloropropyl(meth)acrylate)、曱基丙 烯酸（4-羥丁基）酉旨（4-hydroxybutyl(meth)acrylate)、曱基丙烯 酸（醯基辛氧基 -2- 羥基丙基）酯 (acyloctyloxy-2，hydroxypropyl(meth)acrylate)、曱基丙烯酸 甘油醚醋（glycerol(meth)acrylate)、甲基丙稀酸（2-曱氧基乙 基）醋（2-methoxyethyl(meth)acrylate)、甲基丙稀酸（3-曱氧基 丁基）酯（3-methoxybutyl(meth)acrylate)、甲基丙稀酸乙氧基 二乙二醇 SI (ethoxydiethylene glycol(meth)acrylate)、甲基丙 烯 酸甲氧 基三乙 二醇酯 (methoxytriethyleneglycol(meth)acrylate)、曱基丙烯酸曱氧 基三丙二醇醋（methoxytripropyleneglycol(meth)acrylate)、 43 200835944 甲基丙烯酸聚（乙二醇）甲醚酯 (poly(ethyleneglycol)methylether (metli)acrylate)、甲基丙稀 酸苯氧 基二乙 二醇酯20 (meth)acrylate), methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, methyl Dimethylaminoethyl(meth)acrylate-isobutyl(meth)acrylate, t-butyl(meth)acrylate, A Cyclohexyl(meth)acrylate, isobornyl(meth)acrylate,ethylhexyl(meth)acrylate,methylpropionate 2-phenoxyethyl (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, hydroxyethyl(hydroxyethyl) Meth)acrylate), 2-hydroxypropyl(meth)acrylate, 2-hydroxy-3-chloropropyl methacrylate (2-hydroxy-3-chloropropyl) (meth)acrylate), 4-hydroxybutyl(meth)acrylate, methacrylic acid (mercaptooctyloxy-2-hydroxypropyl) ) (acyloctyloxy-2, hydroxypropyl (meth) acrylate), glycerol (meth) acrylate, 2-methoxyethyl (meth) Acrylate), 3-methoxybutyl (meth)acrylate, ethoxydiethylene glycol (meth)acrylate, Methoxytriethyleneglycol (meth)acrylate, methoxytripropyleneglycol (meth)acrylate, 43 200835944 Poly(ethylene glycol) methyl methacrylate (poly(ethyleneglycol)methylether (metli)acrylate), methacrylic acid phenoxy diethylene glycol ester 10 1510 15 20 (plienoxydiethyleneglycol(meth)acrylate)、曱基丙烯酸（對-壬基苯 氧基聚 乙二醇 ）酯 (p-nonylphenoxypolyethyleneglycol(meth)acrylate)、甲基丙 烯酸（對-壬基苯氧基聚丙二醇）酯 (p-nonylphenoxypolypropylene glycol(meth)acrylate) ' 甲基 丙烯酸縮水甘油S旨（glycidyl(meth)acrylate)、曱基丙烯酸四 氣丙酷（tetrafluoropropyl (meth)acrylate)、甲基丙浠酸 (1，1，1，3,3,3- 六氟異 丙基） 酯 (l，l，l，3,3,3-liexafliioroisopropyl(meth)acrylate)、曱基丙烯 酸八敗戊酉旨（octafluoropentyl(meth)acrylate)、甲基丙稀酸十 七敗葵醋（heptadecafluorodecyl(meth)acrylate)、甲基丙烯酸 三漠苯酯（tribromophenyl(meth)acrylate)、甲基丙浠酸二環 戊酯（dicyclopentanylmethacrylate)、曱基丙浠酸二環戊稀酯 (dicyclopentenyl methacrylate)、丙烯酸二環戊烯氧基乙酉旨 (dicyclopentenyloxyethylacrylate)、曱基丙浠酸異冰片醋 (isobornylmethacrylate)、 曱基乙烯酸金剛烧酯 (adamantylmethacrylate)、丙稀酸（甲基-α-經基甲基）酉旨 (methyl α-hydroxymethylacrylate)、丙稀酸（乙基-α-經基甲基） 酉旨（ethyl α-hydroxymethylacrylate)、丙稀酸（丙基 _α_羥基甲 基）酯（propyl α-hydroxymethylacrylate)、以及丙烯酸（丁基 -α-經基甲基）酯（butyl α-hydroxymethylacrylate);芳香族乙 44 200835944 烯類（aromatic vinyls)，如苯乙烯（styrene)、α-曱基苯乙浠 (α-methylstyrene)、（鄰，間，對）-乙烯基曱苯 ((o，m，p)-vinyltoluene)、（鄰，間，對）-甲氧基苯乙稀 ((o，m，p)-methoxystyrene)、以及（鄰，間，對）-氯苯乙烯20 (plienoxydiethyleneglycol(meth)acrylate), p-nonylphenoxypolyethyleneglycol (meth)acrylate, methacrylic acid (p-nonylphenoxypolypropylene glycol) P-nonylphenoxypolypropylene glycol (meth)acrylate 'glycidyl (meth)acrylate, tetrafluoropropyl (meth)acrylate, methylpropionic acid (1, 1,1,3,3,3-hexafluoroisopropyl) (l,l,l,3,3,3-liexafliioroisopropyl(meth)acrylate), acylfluoropentyl (meth) Acrylate), heptadecafluorodecyl (meth)acrylate, tribromophenyl(meth)acrylate, dicyclopentanylmethacrylate, hydrazine Dicyclopentenyl methacrylate, dicyclopentenyloxyethylacrylate, isobornylmethacrylate, methacrylic acid acetonide (a Damantylmethacrylate, methyl α-hydroxymethylacrylate, acrylic acid (ethyl-α-ylmethylmethyl), ethyl α-hydroxymethylacrylate, C Dipropyl alpha-hydroxymethylacrylate, and butyl alpha-hydroxymethylacrylate; aromatic ethyl 44 200835944 alkene Vinyls, such as styrene, α-methylstyrene, (o, m, p)-vinyl benzene ((o, m, p)-vinyltoluene), (o, ,, p-methoxybenzoic acid ((o, m, p)-methoxystyrene), and (o, m, p)-chlorostyrene 10 1510 15 20 ((o，m，p)-chlorostyrene);不飽和醚類（unsaturated ethers)， 如乙烯基甲醚（vinyl methy lether)、乙烯基乙醚（vinyl ethyl ether)、以及丙烯基縮水甘油醚（allyl glycidyl ether);不飽 和醢亞胺類（unsaturated imides)，如Ν·苯基順丁稀二醯亞胺 (N-phenylmaleimide)、Ν-(4-氯苯基）順 丁稀二醯亞胺 (N-(4-chlorophenyl)maleimide)、Ν-(4-經苯基）順丁稀二醯亞 胺（N-(4-hydroxyphenyl)maleimide)、以及Ν-環己基順 丁稀二 醯亞胺（N-cyclohexylmaleimide);以及順丁稀二酐類（maleic anhydrides)，如順 丁稀二 ff (maleic anhydride)以及甲基順丁 稀二酐（methyl maleic anhydride)所組成之群組。 6.如申請專利範圍第1項所述之黑色矩陣光阻組成 物，其中用於形成該如式1所示之鹼溶性樹脂黏著劑之B部 分之至少一單體係選自由曱基丙浠酸（(meth)acrylic acid)、 丁烯酸（crotonic acid)、亞甲基 丁二酸（itaconic acid)、順丁 烯二酸（maleic acid)、反丁 浠二酸（fumaric acid)、單曱基順 丁 稀二酸（monomethyl maleic acid)、5 -降冰片稀-2 碳酸 (5-norbornene-2-carboxylic acid)、單 _2·(甲基丙烯醯氧基） 乙基鄰苯二甲酸酯（mono-2-((meth)acryloyloxy)ethyl phthalate)、單-2-(甲基丙烯醯氧基）乙基丁二酸酯 (mono-2-((meth)acryloyloxy)ethyl succinate)、以及ω-緩基聚 45 200835944 己内醋單曱基丙稀酸醋（ω-carboxy polycaprolactone mono(meth)acrylate)所組成之群組0 7. 如申請專利範圍第1項所述之黑色矩陣光阻組成 物，其中該如式1所示之鹼溶性樹脂黏著劑之製作方法包含 5 步驟： i) 製備一由式1之A與B部分所組成之聚合物，藉由聚 合一用於形成式1之A部分之單體與一用於形成B 部分之單體； ii) 將一由步驟i)製備之聚合物B部分之部分酸性自由 10 基、以及一曱基丙烯酸縮水甘油酯之環氧自由基， 進行一縮合反應以製備式1之由A、B、以及C所組 成之聚合物；以及 iii) 將一由步驟ii)製備之聚合物C部分之部分羥基與碳 酸酐（carboxylic anhydride)反應，以形成式1之D部 15 分。 8. 如申請專利範圍第7項所述之黑色矩陣光阻組成 物，其中步驟iii)之碳酸酐係選自由丁二酸酐（succinic r anhydride)、戊二酸酐（glutaric anhydride)、己二酸酐（adipic anhydride)、鄰苯二曱酐（phthalic anhydride)、六氫苯 if 20 (hexahydrophthalic anhydride)、順式 _1，2,3,6-四氫苯 if (cis-l，2,3,6-tetrahydrophthalic anhydride)、3，4,5,6-四氫苯酐 (3,4,5,6-tetrahydrophthalic anhydride)、伊康酸酐（itaconic anhydride)、三聚酐（trimellic anhydride)、以及順式-5-降冰 46 200835944 片烯-2,3-二碳酸酐（cis_5-norbornene_endo-2,3-dicarboxylic anhydride) 0 * 9.如申請專利範圍第1項所述之黑色矩陣光阻組成 • 物，其中，在該如式1所示之驗溶性樹脂黏著劑中，當d的 5 範圍為0至小於5時，b的範圍為5至60，且當d的範圍為5至 40時，b的範圍為0至10。 10. 如申請專利範圍第1項所述之黑色矩陣光阻組成 物，其中該如式1所示之鹼溶性樹脂黏著劑，於d的範圍為0 ⑩ 至小於5時則符合50&lt;P&lt;150、1000&lt;Q&lt;2500、以及1500&lt;(10 10 xP)+Q&lt;4000之條件，而於d的範圍為5至40時則符合 20&lt;P&lt;80、400&lt;Q&lt;1000、以及 500&lt;(10xP)+Q&lt;1500 之條件(P 表示酸值（KOH mg/g)，而Q表示雙鍵當量（double bond equivalent)) 0 11. 如申請專利範圍第1項所述之黑色矩陣光阻組成 15 物，其中該如式1所示之驗溶性樹脂黏著劑之重量平均分子 量之範圍為1，〇〇〇至200,000。 φ 12.如申請專利範圍第1項所述之黑色矩陣光阻組成 物，其中該具有乙烯性不飽和雙鍵之多官能基單體包含一 具有至少一不飽和自由基之化合物，其中該不飽和自由基 20 能額外與沸點為100°C或以上之單體、或為一導入有己内酯 之官能基單體進行聚合。 13.如申請專利範圍第1項所述之黑色矩陣光阻組成 物，其中該光聚合起始劑包含至少一化合物，該至少一化 合物係選自由苯乙酮（acetophenone)化合物〜聯味唾 200835944 (biimidazole)化合物、三口井（triazine)化合物、以及两類 (oxime)化合物所組成之群組。 14, 如申請專利範圍第1項所述之黑色矩陣光阻組成 物，其中該光聚合起始劑更包含0.01至10重量份之光交聯促 進劑或0.01至10重量份之硬化劑。 15. 如申請專利範圍第1項所述之黑色矩陣光阻組成 物，其中該溶劑包含一種或以上之丙二醇甲醚20 ((o,m,p)-chlorostyrene); unsaturated ethers such as vinyl methy lether, vinyl ethyl ether, and propylene glycidyl ether (allyl) Glycidyl ether); unsaturated imide, such as N-phenylmaleimide, Ν-(4-chlorophenyl) cis-butyl diimide ( N-(4-chlorophenyl)maleimide), N-(4-hydroxyphenyl)maleimide, and Ν-cyclohexyl cis-butane diimide ( N-cyclohexylmaleimide); and a group of maleic anhydrides such as maleic anhydride and methyl maleic anhydride. 6. The black matrix resist composition according to claim 1, wherein at least one single system for forming the portion B of the alkali-soluble resin adhesive as shown in Formula 1 is selected from the group consisting of mercaptopropene Acid (meth) acrylic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, monoterpene Monomethyl maleic acid, 5-norbornene-2-carboxylic acid, mono-2-(methacryloxy)ethylphthalate Mono-2-((meth)acryloyloxy)ethyl phthalate), mono-2-((meth)acryloyloxy)ethyl succinate) Omega-stable polycondensation 45 200835944 Group consisting of ω-carboxy polycaprolactone mono(meth)acrylate 0 7. Black matrix photoresist as described in claim 1 The composition, wherein the method for producing an alkali-soluble resin adhesive as shown in Formula 1 comprises 5 steps: i) preparing a group consisting of parts A and B of formula 1 a polymer by polymerizing a monomer for forming part A of formula 1 with a monomer for forming part B; ii) a portion of the polymer B portion prepared by step i) is acidic free of 10 groups And an epoxy radical of glycidyl methacrylate, a condensation reaction to prepare a polymer of formula 1, consisting of A, B, and C; and iii) a polymer prepared by step ii) A portion of the hydroxyl groups of Part C are reacted with a carboxylic anhydride to form a D portion 15 of Formula 1. 8. The black matrix photoresist composition according to claim 7, wherein the carbonic acid anhydride of step iii) is selected from the group consisting of succinic anhydride, glutaric anhydride, and adipic anhydride. Adipic anhydride), phthalic anhydride, hexahydrophthalic anhydride, cis-1,2,3,6-tetrahydrobenzene if (cis-l,2,3,6- Tetrahydrophthalic anhydride), 3,4,5,6-tetrahydrophthalic anhydride, itaconic anhydride, trimelic anhydride, and cis-5-降冰46 200835944 cis_5-norbornene_endo-2,3-dicarboxylic anhydride 0 * 9. The black matrix photoresist composition according to claim 1, wherein In the solvent-soluble resin adhesive as shown in Formula 1, when the range of 5 of d is from 0 to less than 5, the range of b is from 5 to 60, and when the range of d is from 5 to 40, the range of b is 0 to 10. 10. The black matrix photoresist composition according to claim 1, wherein the alkali-soluble resin adhesive as shown in Formula 1 conforms to 50&lt;P&lt;&gt; when the range of d is from 0 10 to less than 5. 150, 1000 &lt; Q &lt; 2500, and 1500 &lt; (10 10 xP) + Q &lt; 4000 conditions, and when d ranges from 5 to 40, then 20 &lt; P &lt; 80, 400 &lt; Q &lt; 1000, and 500 &lt; (10xP) + Q &lt; 1500 conditions (P represents acid value (KOH mg / g), and Q represents double bond equivalent) 0 11. Black matrix resist as described in claim 1 A composition 15 in which the weight average molecular weight of the test resin adhesive as shown in Formula 1 ranges from 1 to 200,000. The black matrix photoresist composition according to claim 1, wherein the polyfunctional monomer having an ethylenically unsaturated double bond comprises a compound having at least one unsaturated radical, wherein the The saturated radical 20 can be additionally polymerized with a monomer having a boiling point of 100 ° C or higher or a functional group monomer having a caprolactone introduced therein. 13. The black matrix photoresist composition according to claim 1, wherein the photopolymerization initiator comprises at least one compound selected from the group consisting of acetophenone compound 〜 味 唾 200835944 (biimidazole) compound, a triazine compound, and a group of two oxime compounds. The black matrix photoresist composition according to claim 1, wherein the photopolymerization initiator further comprises 0.01 to 10 parts by weight of a photocrosslinking accelerator or 0.01 to 10 parts by weight of a hardener. 15. The black matrix photoresist composition of claim 1, wherein the solvent comprises one or more propylene glycol methyl ethers. 10 1510 15 20 (propyleneglycol monomethyl ether)、乙二醇曱醚醋酸 S旨 (ethyleneglycol monomethyl ether acetate)、丙二醇曱醚醋酸 酯（propylene glycol monomethyl ether acetate)、丙二醇曱鱗 醋酸醋（propyleneglycol monoethyl ether acetate)、二乙二醇 二甲醚（diethyleneglycol dimethyl ether)、環己酮 (cyclohexanon)、2-庚酮（2-heptanon)、3-庚酮（3-heptanon)、 丙酸-2-經基乙酉旨（2-hydroxyethylpropionate)、丙酸-3-甲基-3 甲氧基 丁酉旨（3_methyl-3-methoxybutylpropionate)、3-甲氧基 丙酸乙S旨（ethyl-3_methoxypropionate)、3-乙氧基丙酸曱醋 (methyl-3-ethoxypropionate) 、 3-乙氧基丙酸乙酯 (ethyl-3-ethoxypropionate)、醋酸丁酯（butylacetate)、戊酸 戊酯（amylpermate)、醋酸異戊 S旨（isoamylacetate)、醋酸異 丁醋（isobutylacetate)、丙酸丁醋（butylpropionate)、丁酸異 丙醋（isopropylbutyrate)、丁 酸乙醋（ethylbutyrate)、丁酸丁 酉旨（butylbutyrate)、丙酮酸乙 6旨（ethylpyruvate) '以及醋酸-γ-丁醯醋（Y_butyrolacetate)。 48 200835944 16.如申請專利範圍第1項所述之黑色矩陣光阻組成 物，其更包含： 6) —第一添加劑，其係選自由分散劑、附著促進劑、抗 氧化劑、紫外光吸收劑、熱聚合防止劑、以及均化劑所組 5 成之群組。 17·如申請專利範圍第1項所述之黑色矩陣光阻組成 物，其更包含： 7) —第二添加劑，其選自由碳黑分散劑、具官能基之樹 脂黏著劑、單體、以及輻射敏感化合物所組成之群組之至 10 少一者。 18· —種液晶顯示器用之黑色矩陣，其製備方法之步 驟包含：20 (propyleneglycol monomethyl ether), ethyleneglycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol Diethyleneglycol dimethyl ether, cyclohexanon, 2-heptanon, 3-heptanon, propionic acid-2-hydroxyethylpropionate ), 3-methyl-3-methoxybutylpropionate, 3-methoxypropionate, 3-ethoxypropionate Methyl-3-ethoxypropionate), ethyl-3-ethoxypropionate, butylacetate, amylpermate, isoamylacetate, acetic acid Isobutylacetate, butylpropionate, isopropylbutyrate, ethylbutyrate, butybutyrate, pyruvate Pyruvate) 'and acetic acid-γ-butyl vinegar (Y_butyrolacetate). The black matrix photoresist composition of claim 1, further comprising: 6) a first additive selected from the group consisting of a dispersant, an adhesion promoter, an antioxidant, and an ultraviolet light absorber. , a thermal polymerization inhibitor, and a homogenizing agent group of 50%. The black matrix photoresist composition according to claim 1, further comprising: 7) a second additive selected from the group consisting of a carbon black dispersant, a resin binder having a functional group, a monomer, and The group consisting of radiation-sensitive compounds is less than one. 18. A black matrix for a liquid crystal display, the steps of the preparation method comprising: I) 於一面板上，塗覆如申請專利範圍第1至17項中任何 一項所述之液晶顯示器用之黑色矩陣光阻組成物； 以及 II) 曝光及顯影該塗覆之黑色矩陣光組成物。 19· 一種液晶顯示器，其包含如申請專利範圍第丨8項 所述之該液晶顯示器用之黑色矩陣。 49I) coating a black matrix photoresist composition for a liquid crystal display according to any one of claims 1 to 17 on a side panel; and II) exposing and developing the coated black matrix light composition Things. A liquid crystal display comprising the black matrix for the liquid crystal display according to claim 8 of the patent application. 49
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