JP5586828B2 - Pigment dispersion composition, curable composition, color filter and method for producing the same - Google Patents

Description

  The present invention relates to an image material such as a color filter and a color proof, a pigment dispersion composition that can be used to constitute a photocurable material such as ink and paint, a liquid crystal display element (LCD), and a solid-state imaging element. The present invention relates to a curable composition suitable for forming a colored region such as a color filter used in (CCD, CMOS, etc.), a color filter using the curable composition, and a method for producing the same.

  Conventionally, pigments exhibit a clear color tone and high coloring power, and are widely used in many fields. Among these pigments, those that are practically important are generally those of fine particles, and by virtue of preventing the pigment from agglomerating and miniaturizing, a clear color tone and high coloring power are obtained. However, when the pigment is made finer, its surface area increases and aggregation is promoted, and the dispersion of the pigment often shows high viscosity. For this reason, when this pigment dispersion is prepared on an industrial scale, it is difficult to take out the pigment dispersion from the disperser, it cannot be transported by pipeline, and it cannot be used due to gelation during storage. There are problems such as.

Therefore, conventionally, it is known to use various dispersants in order to obtain a pigment dispersion or a colored photosensitive composition having excellent fluidity and dispersibility. This dispersant is roughly classified into a polymer dispersant and a low molecular compound dispersant.
Examples of the polymer dispersant include polyacrylate, sodium maleate olefin copolymer, terminal carboxyl group-containing polyester (see, for example, Patent Document 1), acidic groups starting from tetrakis (2-hydroxyalkyl) ethylenediamine, and Polyester having a basic group (see, for example, Patent Document 2), macromonomer (an oligomer having an ethylenically unsaturated group at the terminal), a monomer having a hydroxyl group, a carboxy group-containing monomer, and other monomers. Such a copolymer (see, for example, Patent Document 3) is known.
Moreover, as low molecular weight compound dispersants, sorbitan fatty acid esters, polyoxyethylene alkylamines, alkyldiamines, alkanolamine derivatives, and the like are known (for example, see Patent Document 4), and dispersions in which pigment mother nuclei are introduced. There are examples of agents (for example, see Patent Documents 5 to 6).

  By the way, a colored photosensitive composition containing a pigment is useful as a material for a color filter used for a solid-state imaging device, a liquid crystal display, and the like. When a color filter is produced using the colored photosensitive composition, the quality, A pigment dispersion method that is excellent in terms of production stability and the like is widely adopted.

  In particular, when a color filter using a pigment is used as a color filter for a liquid crystal display, a finer particle size is required for the colorant (organic pigment, etc.) used to improve contrast (for example, patents). Reference 7). This is due to a factor that the polarization axis rotates due to light scattering, birefringence, and the like by the pigment. If the pigment is not sufficiently refined, light is scattered and absorbed by the pigment, resulting in a decrease in light transmittance, resulting in a low contrast and, furthermore, a curing sensitivity when patterning by exposure. It falls (for example, refer nonpatent literature 1). For this reason, in a colored photosensitive composition containing a pigment dispersed therein, it is necessary to disperse the pigment in a highly refined state.

  When the pigment is refined as described above, the surface area of the pigment is increased. Therefore, the use of the refined pigment tends to increase the amount of the dispersant added for dispersing the pigment in the curable composition. Moreover, in the curable composition for color filter use, in order to improve color purity, a higher content of the colorant (organic pigment) in the solid content is required. However, if a dispersant or a colorant is contained at a high concentration in the curable composition, the content of the photopolymerization initiator and the photopolymerizable monomer in the curable composition will be relatively reduced. The curable composition is desired to have low energy curability for improving the yield by shortening the exposure time, but there is a problem that it is difficult to obtain the curability of the exposed portion.

In addition, curing with low energy is also desired for curable compositions for color filters for solid-state imaging devices. As for color filters for solid-state imaging devices, the color patterns are becoming thinner to improve the image quality due to high light condensing properties and light color separation properties, and accordingly, the pigment concentration in the composition tends to be improved.
Furthermore, in a pigment-based color filter, color unevenness is likely to occur due to the relatively coarse particles of the pigment. Therefore, along with the finer pigment for reducing this color unevenness, The content of the pigment dispersant tends to increase. Therefore, there is a problem that it is difficult to obtain curability.

  In order to cope with problems such as color unevenness in the formed coloring pattern, a technique using an organic solvent-soluble dye instead of a pigment as a colorant has been proposed (for example, see Patent Document 8). In such a dye-based color filter, with the increase in the dye concentration, problems such as a polymerization-inhibiting effect derived from the dye and a decrease in temporal stability such as dye precipitation have become prominent.

  As described above, the curable composition for color filter use is a component necessary for curing the curable composition in any application for liquid crystal displays and solid-state imaging devices, and a photopolymerization initiator and The content of the photopolymerizable monomer is limited, and since the colorant concentration is high, there are problems such as low sensitivity and insufficient curing and insufficient adhesion to the substrate. It was.

In order to solve these problems, conventionally, a technique for improving the sensitivity by imparting polymerizability to a resin introduced mainly for imparting film formability and developability has been studied (for example, Patent Document 7). -8, refer nonpatent literature 2-3).
Japanese Patent Publication No.54-34009 JP-A-2-245231 JP-A-8-259876 US Pat. No. 3,536,510 Japanese Patent Publication No. 5-72943 JP-A-8-48890 JP 2000-321863 A JP 2003-029018 A 512 color display 10.4 "size color filter for TFT-LCD, Ueki, Koseki, Fukunaga, Yamanaka, 7th Color Optic Conference (1990) Latest Color Filter Technology Trends (85-87, Information Technology Publishing) State-of-the-art color filter process technology and chemicals (129-150, CM Publishing)

  However, satisfactory photosensitivity has not been obtained even with the above resins. Therefore, the actual situation is that problems such as a decrease in the thickness of the cured portion and a decrease in color density (color loss) associated with the diffusion of the fine pigment in the cured portion into the developer have not been solved.

  Insufficient exposure sensitivity, curing is insufficient in the deep part of the film using the curable composition, such as near the substrate interface, and therefore the adhesion to the substrate is poor, the pattern shape becomes a reverse taper type, etc. There are also challenges. Further, in applications such as a color filter having a plurality of color patterns, when the coating liquid for forming the second color pattern is applied after the first color pattern is formed, the first color pigment is contained in the second color coating liquid. The problem that the color density is lowered (color loss) is not solved.

An object of the present invention is to solve the above-described conventional problems and achieve the following objects. That is ,
The present invention has high photosensitivity, excellent storage stability, coloring power, and support adhesion, and can suppress film loss at the cured portion and color density (color loss), and develop with good developability. An object of the present invention is to provide a colored curable composition with little residue and capable of forming a colored pattern having a tapered or rectangular cross section. further,
An object of the present invention is to provide a color filter having excellent support adhesion and a colored pattern having a tapered or rectangular cross section and a method for producing a color filter excellent in productivity of the color filter.

  The present invention has been achieved based on the following effects presumed by using a specific dispersion resin as a pigment dispersant. However, the operation of the present invention is not necessarily clear, and is estimated as follows.

That is, when a specific dispersion resin having an unsaturated bond is added at the time of pigment dispersion, the pigment is efficiently dispersed between the dispersion resins, and this is cured by including the pigment by a crosslinking reaction. And diffusion in the coating solution is suppressed. In addition, when the unsaturated equivalent of the dispersion resin is small, the amount of double bonds in the film when the film is formed increases, and the exposure sensitivity can be greatly improved. Curing is good even in the deep part of the film when the composition is formed on the support to form a film, the support is excellent in adhesiveness, and the pattern shape can be prevented from becoming a reverse taper type. Furthermore, since pigment aggregation is suppressed, the developer penetration proceeds rapidly in the uncured unexposed area, resulting in improved removability of the unexposed area and sufficient curability in the cured exposed area. And the influence of the developer or the like is suppressed.
As described above, in the pattern formation using the curable composition of the present invention, both excellent curability in the exposed area and excellent removability in the unexposed area are compatible, and a desired cross-sectional shape (particularly, a layered pattern can be obtained). It is considered that a good pattern giving a shape in which the pattern profile of the cut surface when cut along a plane perpendicular to the layer surface is a taper type or a rectangle is obtained.

Specific means for achieving the above object are as follows .

<1> (A) represented by the following general formula (1) or polymer compound having at least one selected from structural units represented by any one of (2) and (B) a pigment and (C) a solvent and (D) It is a curable composition containing an oxime compound as a photopolymerization initiator.

In the general formula (1) or (2), R ¹ , R ² , R ³ , R ⁴ , R ⁵ , R ⁶ , R ⁷ , R ⁸ , R ⁹ , R ¹⁰ , R ¹¹ , and R ¹² are: Each independently represents a hydrogen atom or a monovalent organic group. A ¹ and A ² each independently represent an oxygen atom, a sulfur atom, or —N (R ²¹ ) —, and R ²¹ represents an alkyl group that may have a substituent. G ¹ and G ² each independently represent an alkylene group having no substituent . X represents an oxygen atom, a sulfur atom, or —N (R ²² ) —, and R ²² represents an alkyl group which may have a substituent. Y represents an oxygen atom, a sulfur atom, a phenylene group which may have a substituent, or —N (R ²³ ) —, and R ²³ represents an alkyl group which may have a substituent.

< 2 > The curable composition according to < 1 >, wherein the (A) polymer compound has an unsaturated equivalent of less than 600.

< 3 > (E) The curable composition according to < 1 > or < 2 >, further including a photopolymerizable compound.
<4> The curable composition according to any one of <1> to <3>, wherein the oxime compound is 2-benzoyloxyimino-4 ′-(phenylthio) octanophenone.

< 5 > A color filter having a colored pattern formed on the support by the curable composition according to any one of < 1 > to < 4 >.

< 6 > A colored layer forming step of forming a colored layer by applying the curable composition according to any one of < 1 > to < 4 > on a support, and the colored layer as a mask. And a developing process for developing the colored layer after exposure to form a colored pattern, and a method for producing a color filter.

According to the present invention, the photosensitivity is high, the storage stability, the coloring power, and the support adhesion are excellent, the film loss of the cured portion and the decrease in color density (color loss) are suppressed, and the developability is good. Thus, it is possible to provide a colored curable composition with little development residue and capable of forming a colored pattern having a tapered or rectangular cross section. The colored curable composition of the present invention can be suitably used for forming a color image on a substrate such as a color proof, and for producing a color filter used for a solid-state imaging device, a liquid crystal color display, and the like.
Furthermore, according to the present invention, it is possible to provide a color filter having excellent support adhesion and a colored pattern having a tapered or rectangular cross section and a method for producing a color filter excellent in productivity of the color filter. it can.

  Hereinafter, the pigment dispersion composition of the present invention, a curable composition using the same, a color filter using the curable composition, and a method for producing the same will be described in detail.

<Pigment dispersion composition>
The pigment dispersion composition of the present invention comprises (A) a polymer compound having at least one selected from structural units represented by any one of the following general formulas (1) to (3), and (B) a pigment. And (C) at least a solvent, and if necessary, can be constituted using other components.
Hereinafter, each component which comprises the pigment dispersion composition of this invention is explained in full detail.

(A) Polymer Compound The pigment dispersion composition of the present invention is at least one polymer compound having at least one selected from structural units represented by any one of the following general formulas (1) to (3) (hereinafter referred to as “the polymer compound”). , Sometimes referred to as “dispersed resin in the present invention”). By containing a polymer compound represented by any one of the general formulas (1) to (3) and having a structural unit having an unsaturated double bond portion, aggregation of the pigment is suppressed regardless of the amount of the pigment. In addition, the fine dispersibility of the pigment and the storage stability after dispersion are improved, and the coloring power is improved.

In the general formulas (1) to (3), A ¹ , A ² , and A ³ each independently represent an oxygen atom, a sulfur atom, or —N (R ²¹ ) —, and R ²¹ represents a substituent. It represents an alkyl group that may have. G ¹ , G ² , and G ³ each independently represent a divalent organic group. X and Z each independently represent an oxygen atom, a sulfur atom, or —N (R ²² ) —, and R ²² represents an alkyl group which may have a substituent. Y represents an oxygen atom, a sulfur atom, a phenylene group which may have a substituent, or —N (R ²³ ) —, and R ²³ represents an alkyl group which may have a substituent. R ^{1 to} R ²⁰ each independently represents a hydrogen atom or a monovalent organic group.

In the general formula (1), R ^{1 to} R ³ each independently represents a hydrogen atom or a monovalent organic group. Specific examples include a hydrogen atom and an alkyl group which may have a substituent. Among them, R ¹ and R ² are preferably a hydrogen atom, and R ³ is preferably a hydrogen atom or a methyl group.
R ^{4 to} R ⁶ each independently represents a hydrogen atom or a monovalent organic group, and examples of R ⁴ include a hydrogen atom or an alkyl group which may have a substituent. Among them, a hydrogen atom, A methyl group and an ethyl group are preferred. R ⁵ and R ⁶ may each independently have a hydrogen atom, a halogen atom, an alkoxycarbonyl group, a sulfo group, a nitro group, a cyano group, an alkyl group that may have a substituent, or a substituent. A good aryl group, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, an alkylsulfonyl group which may have a substituent, an arylsulfonyl group which may have a substituent Among them, a hydrogen atom, an alkoxycarbonyl group, an alkyl group which may have a substituent, and an aryl group which may have a substituent are preferable.
Here, examples of the substituent that can be introduced include a methoxycarbonyl group, an ethoxycarbonyl group, an isopropyloxycarbonyl group, a methyl group, an ethyl group, and a phenyl group.

A ¹ represents an oxygen atom, a sulfur atom, or —N (R ²¹ ) —, and X represents an oxygen atom, a sulfur atom, or —N (R ²² ) —. Here, examples of R ²¹ and R ²² include an alkyl group which may have a substituent.
G ¹ represents a divalent organic group, but an alkylene group which may have a substituent is preferable. More preferably, it has an alkylene group which may have a substituent having 1 to 20 carbon atoms, a cycloalkylene group which may have a substituent having 3 to 20 carbon atoms, or a substituent having 6 to 20 carbon atoms. An aromatic group that may be present may be mentioned. Among them, a linear or branched alkylene group having 1 to 10 carbon atoms that may have a substituent, or cyclo that may have a substituent having 3 to 10 carbon atoms. An alkylene group and an aromatic group which may have a substituent having 6 to 12 carbon atoms are preferable in terms of performance such as strength and developability.

Preferable examples of the substituent in G ^1, which except for the hydroxyl group hydrogen atoms among the groups bonded to a hetero atom, for example, an amino group, a thiol group, those containing no carboxyl group.

In the general formula (2), R ^{7 to} R ⁹ each independently represent a hydrogen atom or a monovalent organic group, and examples thereof include a hydrogen atom and an alkyl group which may have a substituent. R ⁷ and R ⁸ are preferably a hydrogen atom, and R ⁹ is preferably a hydrogen atom or a methyl group.
R ^{10 to} R ¹² each independently represents a hydrogen atom or a monovalent organic group. Specific examples of the organic group include a halogen atom, a dialkylamino group, an alkoxycarbonyl group, a sulfo group, and a nitro group. , A cyano group, an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, substituted An alkylsulfonyl group which may have a group, an arylsulfonyl group which may have a substituent, and the like. Among them, a hydrogen atom, an alkoxycarbonyl group, an alkyl group which may have a substituent, a substituent The aryl group which may have is preferable.
Here, examples of the substituent that can be introduced include those exemplified in the general formula (1).

A ² each independently represents an oxygen atom, a sulfur atom, or —N (R ²¹ ) —, where R ²¹ is a hydrogen atom, an alkyl group that may have a substituent, or the like. Can be mentioned.
G ² represents a divalent organic group, but an alkylene group which may have a substituent is preferable. Preferably, it has an alkylene group which may have a substituent having 1 to 20 carbon atoms, a cycloalkylene group which may have a substituent having 3 to 20 carbon atoms, and a substituent which has 6 to 20 carbon atoms. Aromatic group, etc. may be mentioned. Among them, a linear or branched alkylene group having 1 to 10 carbon atoms which may have a substituent, or a cycloalkylene which may have a substituent having 3 to 10 carbon atoms. Group, and an aromatic group which may have a substituent having 6 to 12 carbon atoms is preferable in terms of performance such as strength and developability.
Here, the substituent for G ^2, those except the hydroxyl group hydrogen atoms among the groups bonded to a hetero atom, for example, an amino group, a thiol group, those containing no carboxyl group.
Y is oxygen atom, sulfur atom, -N ^{(R 23)} - represents a or phenylene group which may have a substituent. Here, examples of R ²³ include a hydrogen atom and an alkyl group which may have a substituent.

In the general formula (3), R ^{13 to} R ¹⁵ each independently represents a hydrogen atom or a monovalent organic group, and examples thereof include a hydrogen atom and an alkyl group which may have a substituent. R ¹³ and R ¹⁴ are preferably a hydrogen atom, and R ¹⁵ is preferably a hydrogen atom or a methyl group.
R ^{16 to} R ²⁰ each independently represents a hydrogen atom or a monovalent organic group. R ^{16 to} R ²⁰ may have, for example, a hydrogen atom, a halogen atom, a dialkylamino group, an alkoxycarbonyl group, a sulfo group, a nitro group, a cyano group, an alkyl group that may have a substituent, or a substituent. A good aryl group, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, an alkylsulfonyl group which may have a substituent, an arylsulfonyl group which may have a substituent Among them, a hydrogen atom, an alkoxycarbonyl group, an alkyl group which may have a substituent, and an aryl group which may have a substituent are preferable. Examples of the substituent that can be introduced include those listed in the general formula (1).
A ³ represents an oxygen atom, a sulfur atom, or —N (R ²¹ ) —, and Z represents an oxygen atom, a sulfur atom, or —N (R ²² ) —. Examples of R ²¹ and R ²² include the same as those in general formula (1).

G ³ represents a divalent organic group, and an alkylene group which may have a substituent is preferable. Preferably, it has an alkylene group which may have a substituent having 1 to 20 carbon atoms, a cycloalkylene group which may have a substituent having 3 to 20 carbon atoms, and a substituent which has 6 to 20 carbon atoms. Aromatic group, etc. may be mentioned. Among them, a linear or branched alkylene group having 1 to 10 carbon atoms which may have a substituent, or a cycloalkylene which may have a substituent having 3 to 10 carbon atoms. Group, and an aromatic group which may have a substituent having 6 to 12 carbon atoms is preferable in terms of performance such as strength and developability.
Here, the substituent in G ³ is preferably a group in which a hydrogen atom is bonded to a heteroatom, excluding a hydroxyl group, for example, a group not containing an amino group, a thiol group, or a carboxyl group.

  The structural unit represented by the general formulas (1) to (3) is preferably a compound contained in one molecule in a range of 20 mol% or more and less than 95 mol% from the viewpoint of improving curability and reducing development residue. More preferably, it is 25-90 mol%. More preferably, it is the range of 30 mol% or more and less than 85 mol%.

  The synthesis of the polymer compound having the structural unit represented by the general formulas (1) to (3) is based on the synthesis method described in paragraph numbers [0027] to [0057] of JP-A-2003-262958. Can be done. Among them, the synthesis method 1) in the same publication is preferable, and this is shown in the following (1).

  Specific examples of the polymer compound having the structural units represented by the general formulas (1) to (3) include the following polymer compounds 1 to 17.

The dispersion resin in the present invention is preferably a polymer compound having an unsaturated equivalent of less than 600. Here, the unsaturated equivalent means the molecular weight of the resin per unsaturated bond.
When the unsaturated equivalent of the dispersion resin contained in the present invention is less than 600, the photopolymerizability is improved by introducing an unsaturated group, the photosensitivity can be secured, and the lowering of the polymerizability is suppressed and the support adhesion is suppressed. And a tapered or rectangular pattern can be obtained.

The unsaturated equivalent is preferably 580 or less, and preferably 550 or less, from the viewpoint of securing photosensitivity necessary for photopolymerization and obtaining support adhesion and taper-shaped or rectangular pattern-forming properties. Is more preferable. Furthermore, 500 or less is more preferable. Further, 150 is desirable as the lower limit of the unsaturated equivalent. When the unsaturated equivalent is suppressed to 150 or more, an increase in viscosity at the time of dispersing the pigment is suppressed, and a composition having better dispersion stability during storage can be obtained.
The unsaturated equivalent can be obtained by calculation based on the molecular weight of the target resin.

  As the dispersion resin, in addition to the polymer compound having at least one selected from the structural units represented by any one of the above general formulas (1) to (3), for example, a carboxyl group-containing resin may be added to glycidyl (meth). Glycidyl group-containing unsaturated compounds such as acrylate and allyl glycidyl ether, resins obtained by reacting unsaturated alcohols such as allyl alcohol, 2-hydroxy acrylate and 2-hydroxy methacrylate, and carboxyl group-containing resins having hydroxyl groups Saturated compound, resin reacted with unsaturated acid anhydride, resin obtained by reacting polybasic acid anhydride with addition reaction product of epoxy resin and unsaturated carboxylic acid, conjugated diene copolymer and unsaturated dicarboxylic acid anhydride A resin obtained by reacting a hydroxyl group-containing polymerizable monomer with an addition reaction product of The reaction is occurring and synthetic resin having a specific functional group to give an unsaturated group, such as a resin that generated an unsaturated group by performing base treatment on the resin can be cited as typical resins.

  Among the above, a resin obtained by reacting a carboxyl group-containing resin with a glycidyl group-containing unsaturated compound such as glycidyl (meth) acrylate or allyl glycidyl ether, or a resin obtained by polymerizing a hydroxyl group-containing (meth) acrylic acid ester compound ( Synthesizing resins made by reacting (meth) acrylic acid esters with free isocyanate groups such as (meth) acrylic acid-2-isocyanatoethyl, and resins having specific functional groups that give rise to unsaturated groups by base treatment. And the resin etc. which produced | generated the unsaturated group by giving a base process to this resin are more preferable.

Furthermore, a resin obtained by the following synthesis method (1) or (2) can be preferably mentioned.
(1) A structure in which a compound represented by the following general formula (4) is used as a copolymerization component, a proton is extracted using a base, L is eliminated, and the structure represented by the general formula (1) A method for obtaining a desired polymer compound having
In general formula (4), L represents an anionic leaving group, and preferred examples include a halogen atom and a sulfonic acid ester. R 3 ^{to R} 6, A ^{1, G 1,} and for X has the same meaning as in the general formula (1), as the base used in order to rise to elimination reaction, inorganic compounds, either organic compounds May be used. Details and preferred embodiments of this method are described in paragraphs [0028] to [0033] of JP-A No. 2003-262958.

  Preferred inorganic compound bases include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogen carbonate, potassium carbonate, potassium hydrogen carbonate and the like, and organic compound bases include sodium methoxide, sodium ethoxide, potassium t- Examples thereof include metal alkoxides such as butoxide, organic amine compounds such as triethylamine, pyridine and diisopropylethylamine.

(2) with respect to the following general formula (5) using the compound represented by as a copolymer component in the polymer, by base treatment to rise to elimination reaction to a specific functional group to remove X ^10, radical reactive groups How to get.
In General Formula (5), A ⁵ represents an oxygen atom, a sulfur atom, or —N (R ⁵⁴ ) —, A ⁶ represents an oxygen atom, a sulfur atom, or —NR ⁵⁸ —, and R ⁵¹ , R ⁵² , R ⁵³ , R ⁵⁴ , R ⁵⁵ , R ⁵⁶ , R ⁵⁷ , and R ⁵⁸ each independently represent hydrogen or a monovalent organic group, X ¹⁰ represents a group to be removed by elimination reaction, and G ⁵ represents an organic linking group. n represents an integer of 1 to 10. Details and preferred embodiments of this method are described in detail in JP-A No. 2003-335814.

  Examples of the resin obtained by the synthesis method (2) include the polymer compounds described in JP-A No. 2003-335814, specifically, for example, (i) a polyvinyl polymer compound, and (ii) a polyurethane polymer. Compound, (iii) polyurea polymer compound, (iv) poly (urethane-urea) polymer compound, (v) polyester polymer compound, (vi) polyamide polymer compound, (vii) acetal-modified polyvinyl alcohol Preferred examples include high-molecular compounds of the system and specific compounds obtained from the respective descriptions.

  Examples of the compound represented by the general formula (4) include the following compounds (M-1) to (M-12), but are not limited thereto.

  Next, examples (i-1 to i-52) of the compound represented by the general formula (5) are listed below.

The dispersion resin in the present invention needs to have a photopolymerizable unsaturated bond from the viewpoint of improving photosensitivity, and COOH, SO ₃ H, PO ₃ H ₂ from the viewpoint of enabling alkali development. , OSO ₃ H, OPO ₂ H ₂ are preferable. The dispersion resin in the present invention preferably has an acid value in the range of 20 to 300, preferably 40 to 200, more preferably 60 to 150 from the viewpoint of dispersion stability, balance between developability and sensitivity. .

The weight average molecular weight of the polymer compound used as the dispersion resin is preferably 1,000 to 100,000, and preferably 2,000 to 50,000, from the viewpoints of dispersion stability, coatability, and developability. More preferably, it is more preferably 3,000 to 20,000.
In particular, the weight average molecular weight (Mw) of the polymer compound (dispersion resin in the present invention) having the structural unit represented by any one of the general formulas (1) to (3) is 3000 to 20000. It is preferable. When the weight average molecular weight of the dispersion resin in the present invention is 3000 or more, the mechanical strength of the resist pattern and the heat resistance and the resolution (rectangularity) of the resist are improved, and when it is 20000 or less, the resolution of the resist is improved. Property (rectangularity) is good, and residues after unexposed area development can be avoided.
The weight average molecular weight means the molecular weight when the polymer compound, which is the dispersion resin, has a single structure, and when the polymer compound has a molecular weight distribution such as a polymer or an oligomer, the weight average average value. Means.

  The total amount of the dispersion resin in the present invention may be used together with the pigment during dispersion, or a part of the dispersion resin may be added after dispersion. The dispersion resin of the present invention is preferably used in an amount of at least 20 parts by mass at the time of dispersion with respect to 100 parts by mass of the pigment.

  As content in the pigment dispersion composition of the dispersion resin in this invention, 1-200 mass% is preferable with respect to a pigment, and 5-100 mass% is more preferable. Furthermore, 5-80 are more preferable. When the content is within the above range, the pigment can be dispersed more efficiently, effectively preventing color loss, exposure sensitivity, support adhesion, and pattern formability (desired taper type or rectangular cross section formability). Can be improved.

(B) Pigment The pigment dispersion composition of the present invention contains at least one pigment. Use of a pigment as the colorant is preferable in terms of durability such as heat resistance and light resistance.

  As the pigment that can be contained in the pigment dispersion composition of the present invention, conventionally known various inorganic pigments or organic pigments can be used, and high transmittance is preferable.

  Examples of inorganic pigments include metal compounds represented by metal oxides, metal complex salts, and the like. Specifically, iron, cobalt, aluminum, cadmium, lead, copper, titanium, magnesium, chromium, zinc, antimony, etc. And metal oxides of the above metals.

As an organic pigment, for example,
C. I. Pigment yellow 11,24,31,53,83,93,99,108,109,110,138,139,147,150,151,154,155,167,180,185,199;
C. I. Pigment orange 36, 38, 43, 71;
C. I. Pigment red 81,105,122,149,150,155,171,175,176,177,209,220,224,242,254,255,264,270;
C. I. Pigment violet 19, 23, 32, 39;
C. I. Pigment Blue 1, 2, 15, 15: 1, 15: 3, 15: 6, 16, 22, 60, 66;
C. I. Pigment green 7, 36, 37;
C. I. Pigment brown 25, 28;
C. I. Pigment black 1, 7;
Examples thereof include carbon black.

  In the present invention, those having a basic N atom in the structural formula of the pigment can be preferably used. These pigments having a basic N atom exhibit good dispersibility in the pigment dispersion composition of the present invention. Although the cause is not fully elucidated, it is presumed that the good affinity between the polymerization component and the pigment has an effect.

  Examples of the pigment that can be preferably used in the present invention include the following. However, the present invention is not limited to these.

C. I. Pigment Yellow 11, 24, 108, 109, 110, 138, 139, 150, 151, 154, 167, 180, 185
C. I. Pigment orange 36, 71,
C. I. Pigment Red 122, 150, 171, 175, 177, 209, 224, 242, 254, 255, 264
C. I. Pigment violet 19, 23, 32,
C. I. Pigment Blue 15: 1, 15: 3, 15: 6, 16, 22, 60, 66,
C. I. Pigment Black 1

These organic pigments can be used alone or in various combinations in order to increase color purity. For example, when the pigment dispersion composition of the present invention is used for forming a color pattern of a color filter, it is preferably used in combination in order to increase the color purity of the color pattern.
Specific examples of combinations of pigments are shown below. For example, as red pigments, anthraquinone pigments, perylene pigments, diketopyrrolopyrrole pigments alone or at least one of them, disazo yellow pigments, isoindoline yellow pigments, quinophthalone yellow pigments or perylene red pigments And the like can be used. For example, as an anthraquinone pigment, C.I. I. Pigment red 177, and perylene pigments include C.I. I. Pigment red 155, C.I. I. Pigment Red 224, and diketopyrrolopyrrole pigments include C.I. I. Pigment red 254, and C.I. I. Mixing with Pigment Yellow 139 is preferred. The mass ratio of the red pigment to the yellow pigment is preferably 100: 5 to 100: 50. If it is less than 100: 5, it may be difficult to suppress the light transmittance from 400 nm to 500 nm, and the color purity may not be increased. On the other hand, when the ratio exceeds 100: 50, the dominant wavelength becomes shorter than the short wavelength, and the deviation from the NTSC target hue may increase. In particular, the mass ratio is optimally in the range of 100: 10 to 100: 30. In addition, in the case of the combination of red pigments, it can adjust according to chromaticity.

  As the green pigment, a halogenated phthalocyanine pigment can be used alone, or a mixture thereof with a disazo yellow pigment, a quinophthalone yellow pigment, an azomethine yellow pigment or an isoindoline yellow pigment can be used. . For example, C.I. I. Pigment Green 7, 36, 37 and C.I. I. Pigment yellow 83, C.I. I. Pigment yellow 138, C.I. I. Pigment yellow 139, C.I. I. Pigment yellow 150, C.I. I. Pigment yellow 180 or C.I. I. Mixing with Pigment Yellow 185 is preferred. The mass ratio of the green pigment to the yellow pigment is preferably 100: 5 to 100: 150. The mass ratio is particularly preferably in the range of 100: 30 to 100: 120.

  As the blue pigment, a phthalocyanine pigment can be used alone, or a mixture of this and a dioxazine purple pigment can be used. For example, C.I. I. Pigment blue 15: 6 and C.I. I. Mixing with pigment violet 23 is preferred. The mass ratio of the blue pigment to the violet pigment is preferably 100: 0 to 100: 30, more preferably 100: 10 or less.

  Further, as a pigment used when the pigment dispersion composition of the present invention is used for forming a black matrix of a color filter, carbon, titanium carbon, iron oxide, titanium oxide alone or a mixture thereof is used. A combination is preferred. The mass ratio of carbon to titanium carbon is preferably in the range of 100: 0 to 100: 60.

When used for a color filter, the primary particle diameter of the pigment is preferably 100 nm or less from the viewpoint of color unevenness and contrast, and is preferably 5 nm or more from the viewpoint of dispersion stability. The primary particle diameter of the pigment is more preferably 5 to 75 nm, still more preferably 5 to 55 nm, and particularly preferably 5 to 35 nm.
The primary particle diameter of the pigment can be measured by a known method such as an electron microscope.

  Among these, the pigment is preferably a pigment selected from anthraquinone, azomethine, benzylidene, cyanine, diketopyrrolopyrrole, and phthalocyanine.

  As the content of the pigment in the pigment dispersion composition, from the viewpoint of ensuring high coloring power, for example, when producing a color filter, from the viewpoint of ensuring high color density and contrast, with respect to the total solid content of the composition, It is preferable that it is 30 mass% or more, More preferably, it is the range of 40-95 mass%.

In addition, in the pigment dispersion composition of this invention, you may use a dye together in the range which does not impair the effect of this invention. There is no restriction | limiting in particular as dye, A well-known dye can be used for conventional color filters. For example, Japanese Patent Application Laid-Open No. 64-90403, Japanese Patent Application Laid-Open No. 64-91102, Japanese Patent Application Laid-Open No. 1-94301, Japanese Patent Application Laid-Open No. 6-11614, No. 2592207, US Pat. No. 4,808,501. Specification, US Pat. No. 5,667,920, US Pat. No. 5,059,500, JP-A-5-333207, JP-A-6-35183, JP-A-6-51115 JP-A-6-194828, JP-A-8-21599, JP-A-4-249549, JP-A-10-123316, JP-A-11-302283, JP-A-7-286107, JP 2001-4823, JP-A-8-15522, JP-A-8-29771, JP-A-8-146215, JP-A-11-3434. 7, JP-A-8-62416, JP-A-2002-14220, JP-A-2002-14221, JP-A-2002-14222, JP-A-2002-14223, JP-A-8-302224 The dyes disclosed in JP-A-8-73758, JP-A-8-179120, JP-A-8-151531, and the like can be used.
The chemical structure of the dye includes pyrazole azo, anilino azo, triphenylmethane, anthraquinone, anthrapyridone, benzylidene, oxonol, pyrazolotriazole azo, pyridone azo, cyanine, phenothiazine, pyrrolopyrazole azomethine. , Xanthene, phthalocyanine, benzopyran, and indigo dyes can be used.

(C) Solvent The pigment dispersion composition of the present invention contains at least one solvent. By using a solvent together with the (A) polymer compound (dispersion resin in the present invention) having the structural unit represented by any one of the general formulas (1) to (3) and the (B) pigment, the pigment is improved. A dispersed pigment dispersion composition can be prepared.

The solvent used is not particularly limited as long as it satisfies the solubility of each component of the composition and the coating property of the coating liquid using the pigment dispersion composition, but is selected in consideration of safety. It is preferable.
Specific examples of the solvent include esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, and lactic acid. 3 such as ethyl, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, methyl 3-oxypropionate, ethyl 3-oxypropionate -Oxypropionic acid alkyl esters (for example, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate), methyl 2-oxypropionate, 2-oxypropion acid 2-oxypropionic acid alkyl esters such as til and propyl 2-oxypropionate (for example, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, 2 -Ethyl ethoxypropionate, methyl 2-oxy-2-methylpropionate, ethyl 2-oxy-2-methylpropionate, methyl 2-methoxy-2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate) Methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutanoate, ethyl 2-oxobutanoate and the like;

Ethers such as diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol methyl ether, propylene glycol methyl Ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, etc .;
Ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone;
Aromatic hydrocarbons such as toluene and xylene are preferred.

  Among these, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, ethyl carbitol acetate Butyl carbitol acetate, propylene glycol methyl ether, propylene glycol monomethyl ether acetate (PGMEA) and the like are more preferable.

  The proportion of the solvent in the pigment dispersion composition is preferably 20 to 95% by mass, and more preferably 25 to 90% by mass. When the amount of the solvent is within the above range, the pigment can be uniformly dispersed, which is advantageous in terms of dispersion stability after dispersion.

The pigment dispersion composition using the dispersion resin (the polymer compound having the structural unit represented by any one of the general formulas (1) to (3)) in the present invention has a pigment particle size measured by a light scattering particle size distribution measurement method. It is preferable that the distribution satisfies both the following conditions (1) and (2).
(1) 0.03 μm <D90 <0.07 μm
(2) 0.01 μm <Fmax <0.03 μm

Here, the pigment particle size distribution means a value when measured by the following method.
That is, the pigment particle size distribution was prepared by gradually diluting the pigment dispersion composition with the solvent used in the pigment dispersion composition to be measured so that the pigment concentration becomes 2% ± 0.1%. Specified by the particle size measured by a particle size distribution measuring apparatus based on a dynamic light scattering method (frequency analysis method) [for example, Microtrac Nanotrac UPA-EX150 particle size analyzer (manufactured by Nikkiso Co., Ltd.)] It is what is done.
D90 is defined as a particle diameter (μm) corresponding to 90% of the cumulative amount when the cumulative amount is counted on a mass basis from the small size particles in the pigment dispersion composition and the entire particle is taken as 100%. . Fmax is defined as the particle diameter (μm) at which the particle abundance is maximum in the particle size distribution of the pigment dispersion composition.

In the present invention, in the pigment particle size distribution, D90 preferably satisfies the relationship of “0.03 μm <D90 <0.07 μm”. When D90 is larger than 0.03 μm, generation of coarse particles over time and destabilization of particles such as a gelation phenomenon can be avoided. For example, when D90 is used for producing a color filter for a solid-state image sensor, Roughness can be avoided. In addition, the rectangularity of the pattern can be maintained. When the D90 is less than 0.07 μm, the roughness of the image can be prevented.
Among them, D90 is preferably in the range of 0.035 μm <D90 <0.065 μm, and most preferably in the range of 0.04 μm <D90 <0.06 μm.
Furthermore, it is preferable that the particle diameter Fmax that maximizes the particle abundance under the condition of D90 is in the range of 0.01 μm <Fmax <0.03 μm. When Fmax is larger than 0.01 μm, it is possible to prevent the occurrence of image roughness due to the aging of the pigment dispersion composition, and it is possible to suppress the occurrence of residue and the like, and when it is less than 0.03 μm, the roughness of the image Occurrence can be suppressed.

<Curable composition>
The curable composition of the present invention comprises (A) a polymer compound having a structural unit represented by any one of the general formulas (1) to (3) (dispersion resin in the present invention), (B) a pigment, (C ) A solvent, and (D) a photopolymerization initiator, and preferably comprises the above-described pigment dispersion composition of the present invention and (D) a photopolymerization initiator. In addition, the curable composition of the present invention is preferably further composed of (E) a photopolymerizable compound, and can be composed of other components as necessary.

  In the curable composition of the present invention, by containing the dispersion resin in the present invention, as described above, the pigment is efficiently dispersed, and good storage stability can be obtained regardless of the amount of the pigment, and development. Diffusion of the pigment into the liquid or coating liquid can be suppressed, and color loss is prevented. In addition, when the unsaturated equivalent is small, the amount of double bonds in the film when the film is formed is large, the exposure sensitivity is greatly improved, and on the contrary, the developer penetration is good in the uncured unexposed area, Development removability can be improved. Thereby, it is considered that a good pattern giving a desired cross-sectional shape (in particular, a taper type or a rectangle) is obtained, and the support adhesion is improved.

  Among the components constituting the curable composition of the present invention, (A) a polymer compound having a structural unit represented by any one of the general formulas (1) to (3) (dispersion resin in the present invention), (B The details of the pigment) and the solvent (C) are the same as those in the above pigment dispersion composition, and the preferred embodiments are also the same.

As content in the curable composition of the high molecular compound (dispersion resin in this invention) which has a structural unit represented by said (A) general formula (1)-(3), with respect to a pigment 1 to 200 mass% is preferable, 5 to 100 mass% is more preferable, and 5 to 80 mass% is still more preferable. When the content is within the above range, the pigment can be dispersed more efficiently, effectively preventing color loss, exposure sensitivity, support adhesion, and pattern formability (desired taper type or rectangular cross section formability). Can be improved.
As content in the curable composition of a pigment, 20 mass% or more is preferable with respect to the total solid of a composition, More preferably, it is 30-90 mass%. When the content of the pigment is within the above range, it is effective for securing a high coloring power, for example, when producing a color filter.
Moreover, as a ratio which occupies in the curable composition of a solvent, 20-90 mass% is preferable, and 25-85 mass% is more preferable. When the amount of the solvent is within the above range, it is advantageous also in terms of coating properties and storage stability stability.

  Hereinafter, each component other than (A) to (C) which is a constituent component of the curable composition of the present invention will be specifically described.

(D) Photopolymerization initiator The curable composition of the present invention contains at least one photopolymerization initiator. The photopolymerization initiator is decomposed by light and (A) a polymer compound having a structural unit represented by any one of the general formulas (1) to (3) in the present invention (dispersion resin in the present invention) and will be described later. (E) It is a compound that initiates and accelerates the polymerization of a photopolymerizable compound, and preferably has absorption in a wavelength region of 300 to 500 nm.
Moreover, a photoinitiator may be used individually by 1 type and can also use 2 or more types together.

Examples of the photopolymerization initiator include organic halogenated compounds, oxydiazole compounds, carbonyl compounds, ketal compounds, benzoin compounds, acridine compounds, organic peroxide compounds, azo compounds, coumarin compounds, azide compounds, metallocene compounds, hexaaryls. Examples thereof include a rubiimidazole compound, an organic borate compound, a disulfone compound, an oxime compound, an onium salt compound, an acylphosphine compound, and an alkylamino compound.
Hereinafter, each of these compounds will be described in detail.

  Specific examples of the organic halogenated compound include Wakabayashi et al., “Bull Chem. Soc Japan” 42, 2924 (1969), US Pat. No. 3,905,815, Japanese Patent Publication No. 46-4605, JP 48-36281, JP 55-3070, JP 60-239736, JP 61-169835, JP 61-169837, JP 62-58241, JP 62 -212401, JP-A-63-70243, JP-A-63-298339, M.S. P. Hut "Journal of Heterocyclic Chemistry" 1 (No3), (1970) "The compound described in a brush is mentioned, Especially, the oxazole compound substituted by the trihalomethyl group and s-triazine compound are mentioned.

  As the s-triazine compound, more preferably, an s-triazine derivative in which at least one mono-, di-, or trihalogen-substituted methyl group is bonded to the s-triazine ring, specifically, for example, 2,4,6- Tris (monochloromethyl) -s-triazine, 2,4,6-tris (dichloromethyl) -s-triazine, 2,4,6-tris (trichloromethyl) -s-triazine, 2-methyl-4,6- Bis (trichloromethyl) -s-triazine, 2-n-propyl-4,6-bis (trichloromethyl) -s-triazine, 2- (α, α, β-trichloroethyl) -4,6-bis (trichloro Methyl) -s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloro) Til) -s-triazine, 2- (3,4-epoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (p-chlorophenyl) -4,6-bis (trichloromethyl)- s-triazine, 2- [1- (p-methoxyphenyl) -2,4-butadienyl] -4,6-bis (trichloromethyl) -s-triazine, 2-styryl-4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (pi-propyloxystyryl) -4,6-bis (trichloromethyl)- s-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-natoxynaphthyl) -4,6-bis (trichloromethyl)- -Triazine, 2-phenylthio-4,6-bis (trichloromethyl) -s-triazine, 2-benzylthio-4,6-bis (trichloromethyl) -s-triazine, 2,4,6-tris (dibromomethyl) -S-triazine, 2,4,6-tris (tribromomethyl) -s-triazine, 2-methyl-4,6-bis (tribromomethyl) -s-triazine, 2-methoxy-4,6-bis (Tribromomethyl) -s-triazine and the like.

  Examples of the oxydiazole compound include 2-trichloromethyl-5-styryl-1,3,4-oxodiazole, 2-trichloromethyl-5- (cyanostyryl) -1,3,4-oxodiazole, 2- And trichloromethyl-5- (naphth-1-yl) -1,3,4-oxodiazole, 2-trichloromethyl-5- (4-styryl) styryl-1,3,4-oxodiazole, and the like. .

  Examples of the carbonyl compound include benzophenone, Michler ketone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methylbenzophenone, 2-chlorobenzophenone, 4-bromobenzophenone, 2-carboxybenzophenone and other benzophenone derivatives, 2,2-dimethoxy-2 -Phenylacetophenone, 2,2-diethoxyacetophenone, 1-hydroxycyclohexyl phenylketone, α-hydroxy-2-methylphenylpropanone, 1-hydroxy-1-methylethyl- (p-isopropylphenyl) ketone, 1-hydroxy -1- (p-dodecylphenyl) ketone, 2-methyl- (4 ′-(methylthio) phenyl) -2-morpholino-1-propanone, 1,1,1-trichloromethyl- (p-butylphenyl) , Acetophenone derivatives such as 2-benzyl-2-dimethylamino-4-morpholinobutyrophenone, thioxanthone, 2-ethylthioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone Thioxanthone derivatives such as 2,4-diisopropylthioxanthone, and benzoic acid ester derivatives such as ethyl p-dimethylaminobenzoate and ethyl p-diethylaminobenzoate.

  Examples of the ketal compound include benzyl methyl ketal and benzyl-β-methoxyethyl ethyl acetal.

  Examples of the benzoin compound include m-benzoin isopropyl ether, benzoin isobutyl ether, benzoin methyl ether, and methyl-o-benzoylbenzoate.

  Examples of the acridine compound include 9-phenylacridine, 1,7-bis (9-acridinyl) heptane, and the like.

  Examples of the organic peroxide compound include trimethylcyclohexanone peroxide, acetylacetone peroxide, 1,1-bis (tert-butylperoxy) -3,3,5-trimethylcyclohexane, 1,1-bis (tert-butylperoxide). Oxy) cyclohexane, 2,2-bis (tert-butylperoxy) butane, tert-butyl hydroperoxide, cumene hydroperoxide, diisopropylbenzene hydroperoxide, 2,5-dimethylhexane-2,5-dihydroper Oxide, 1,1,3,3-tetramethylbutyl hydroperoxide, tert-butylcumyl peroxide, dicumyl peroxide, 2,5-dimethyl-2,5-di (tert-butylperoxy) hexane, 2 , -Oxanoyl peroxide, succinic peroxide, benzoyl peroxide, 2,4-dichlorobenzoyl peroxide, diisopropyl peroxydicarbonate, di-2-ethylhexyl peroxydicarbonate, di-2-ethoxyethyl peroxydicarbonate , Dimethoxyisopropyl peroxycarbonate, di (3-methyl-3-methoxybutyl) peroxydicarbonate, tert-butyl peroxyacetate, tert-butyl peroxypivalate, tert-butyl peroxyneodecanoate, tert- Butyl peroxyoctanoate, tert-butyl peroxylaurate, tersyl carbonate, 3,3 ′, 4,4′-tetra- (t-butylperoxycarbonyl) benzophenone, 3,3 ′, 4 '-Tetra- (t-hexylperoxycarbonyl) benzophenone, 3,3', 4,4'-tetra- (p-isopropylcumylperoxycarbonyl) benzophenone, carbonyldi (t-butylperoxydihydrogen diphthalate) , Carbonyldi (t-hexylperoxydihydrogen diphthalate) and the like.

  Examples of the azo compound include azo compounds described in JP-A-8-108621.

  Examples of the coumarin compound include 3-methyl-5-amino-((s-triazin-2-yl) amino) -3-phenylcoumarin, 3-chloro-5-diethylamino-((s-triazin-2-yl). ) Amino) -3-phenylcoumarin, 3-butyl-5-dimethylamino-((s-triazin-2-yl) amino) -3-phenylcoumarin, and the like.

  Examples of the azide compound include organic azide compounds described in U.S. Pat. No. 2,848,328, U.S. Pat. No. 2,852,379 and U.S. Pat. No. 2,940,553, 2,6-bis (4-azidobenzylidene) -4-ethyl. And cyclohexanone (BAC-E).

  Examples of the metallocene compound include JP-A-59-152396, JP-A-61-151197, JP-A-63-41484, JP-A-2-249, JP-A-2-4705, Various titanocene compounds described in JP-A-5-83588, such as di-cyclopentadienyl-Ti-bis-phenyl, di-cyclopentadienyl-Ti-bis-2,6-difluorophen-1-yl, di -Cyclopentadienyl-Ti-bis-2,4-di-fluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,4,6-trifluorophen-1-yl, di- Cyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,3,4,5,6-pentaful Lophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,6-difluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,4,6-trifluoropheny -1-yl, di-methylcyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,3,4 , 5,6-pentafluorophen-1-yl, iron-arene complexes described in JP-A-1-304453 and JP-A-1-152109, and the like.

  As the hexaarylbiimidazole compound, for example, JP-B-6-29285, US Pat. Nos. 3,479,185, 4,311,783, 4,622,286, etc. And, specifically, 2,2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-bromophenyl) )) 4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o, p-dichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2 ′ -Bis (o-chlorophenyl) -4,4 ', 5,5'-tetra (m-methoxyphenyl) biidazole, 2,2'-bis (o, o'-dichlorophenyl) -4,4', 5,5 '-Tetraphenylbi Dazole, 2,2′-bis (o-nitrophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-methylphenyl) -4,4 ′, 5 Examples include 5′-tetraphenylbiimidazole, 2,2′-bis (o-trifluorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, and the like.

  Examples of the organic borate compound include JP-A-62-143044, JP-A-62-1050242, JP-A-9-188585, JP-A-9-188686, JP-A-9-188710, JP-A-2000. -131837, Japanese Patent Application Laid-Open No. 2002-107916, Japanese Patent No. 2764769, Japanese Patent Application No. 2000-310808, etc., and Kunz, Martin “Rad Tech '98. Proceeding April 19-22, 1998, Chicago”. Organoboron salts described in JP-A-6-157623, JP-A-6-175564, JP-A-6-175561, JP-A-6-175554 In Japanese Patent Laid-Open No. 6-175553 Organoboron iodonium complexes, organoboron phosphonium complexes described in JP-A-9-188710, JP-A-6-348011, JP-A-7-128785, JP-A-7-140589, JP-A-7- Specific examples include organoboron transition metal coordination complexes such as those described in Japanese Patent No. 306527 and Japanese Patent Laid-Open No. 7-292014.

  Examples of the disulfone compound include compounds described in JP-A Nos. 61-166544 and 2002-328465 (Japanese Patent Application No. 2001-132318).

  Examples of oxime compounds include J.M. C. S. Perkin II (1979) 1653-1660), J. MoI. C. S. Perkin II (1979) 156-162, Journal of Photopolymer Science and Technology (1995) 202-232, JP-A 2000-66385, compounds described in JP-A 2000-80068, JP-T 2004-534797 Compounds and the like.

  Examples of onium salt compounds include S.I. I. Schlesinger, Photogr. Sci. Eng. , 18, 387 (1974), T.A. S. Bal et al, Polymer, 21, 423 (1980), diazonium salts described in U.S. Pat. No. 4,069,055, ammonium salts described in JP-A-4-365049, U.S. Pat. No. 4,069, No. 055, No. 4,069,056, phosphonium salts described in European Patent Nos. 104 and 143, U.S. Pat. Nos. 339,049 and 410,201, JP Examples include iodonium salts described in JP-A No. -150848 and JP-A-2-296514.

  The iodonium salt that can be suitably used in the present invention is a diaryl iodonium salt, and is preferably substituted with two or more electron donating groups such as an alkyl group, an alkoxy group, and an aryloxy group from the viewpoint of stability. . In addition, as another preferable form of the sulfonium salt, an iodonium salt in which one substituent of the triarylsulfonium salt has a coumarin or an anthraquinone structure and absorption at 300 nm or more is preferable.

Examples of the sulfonium salt that can be suitably used in the present invention include European Patent Nos. 370,693, 390,214, 233,567, 297,443, 297,442, and U.S. Pat. 933,377, 161,811, 410,201, 339,049, 4,760,013, 4,734,444, 2,833,827, Germany Examples thereof include sulfonium salts described in the specifications of Patent Nos. 2,904,626, 3,604,580, and 3,604,581, and are preferably electron withdrawing groups from the viewpoint of stability. It is preferably substituted. The electron withdrawing group preferably has a Hammett value greater than zero. Preferred electron-withdrawing groups include halogen atoms and carboxylic acids.
Other preferable sulfonium salts include sulfonium salts in which one substituent of the triarylsulfonium salt has a coumarin or anthraquinone structure and absorbs at 300 nm or more. As another preferable sulfonium salt, a sulfonium salt in which the triarylsulfonium salt has an aryloxy group or an arylthio group as a substituent and has absorption at 300 nm or more can be mentioned.

  Moreover, as an onium salt compound, J.M. V. Crivello et al, Macromolecules, 10 (6), 1307 (1977), J. MoI. V. Crivello et al, J.A. Polymer Sci. , Polymer Chem. Ed. , 17, 1047 (1979), a selenonium salt described in C.I. S. Wen et al, Teh, Proc. Conf. Rad. An onium salt such as an arsonium salt described in Curing ASIA, p478 Tokyo, Oct (1988) can also be used.

  Examples of the acylphosphine compound include Irgacure 819, Darocur 4265, and Darocur TPO manufactured by Ciba Specialty Chemicals.

  Examples of the alkylamino compound include compounds having a dialkylaminophenyl group described in paragraph No. [0047] of JP-A-9-281698, JP-A-6-19240, JP-A-6-19249, and the like. An amine compound is mentioned. Specifically, compounds having a dialkylaminophenyl group include compounds such as ethyl p-dimethylaminobenzoate, and dialkylaminophenyl carbaldehydes such as p-diethylaminobenzcarbaldehyde and 9-julolidylcarbaldehyde. Examples of the amine compound include triethanolamine, diethanolamine, and triethylamine.

  As the photopolymerization initiator (D) used in the present invention, from the viewpoint of exposure sensitivity, a triazine compound, an alkylamino compound, a benzyldimethyl ketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, Phosphine oxide compounds, metallocene compounds, oxime compounds, biimidazole compounds, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds and derivatives thereof, cyclopentadiene-benzene-iron complexes and salts thereof, halo A compound selected from the group consisting of a methyloxadiazole compound and a 3-aryl-substituted coumarin compound is preferred.

  More preferably, they are triazine compounds, alkylamino compounds, α-aminoketone compounds, acylphosphine compounds, phosphine oxide compounds, oxime compounds, biimidazole compounds, onium compounds, benzophenone compounds, acetophenone compounds. More preferably, at least one compound selected from the group consisting of triazine compounds, alkylamino compounds, oxime compounds, and biimidazole compounds.

  The content of the (D) photopolymerization initiator in the curable composition is preferably 0.1 to 50% by mass, more preferably 0.5 to 30% by mass, based on the total solid content of the composition. %, Particularly preferably 1 to 20% by mass. In particular, when the curable composition of the present invention is used for forming a colored pattern of a color filter, the content of (D) the photopolymerization initiator is cured in terms of photosensitivity, support adhesion, and degree of cure. 1-40 mass% is preferable with respect to the total solid contained in an adhesive composition, 2-30 mass% is more preferable, and 3-20 mass% is still more preferable.

(E) Photopolymerizable compound The curable composition of the present invention is a photopolymerizable compound other than the polymer compound having the structural unit represented by any one of (A) general formulas (1) to (3). It is preferable to contain a compound having an ethylenically unsaturated double bond.

  The “compound having an ethylenically unsaturated double bond” that can be used in the present invention is other than the dispersion resin (A) in the present invention, and is an addition polymerization having at least one ethylenically unsaturated double bond. Selected from compounds having at least one terminal ethylenically unsaturated bond, preferably two or more. Such compound groups are widely known in the industrial field, and these can be used without any particular limitation in the present invention. These have chemical forms such as monomers, prepolymers, that is, dimers, trimers and oligomers, or mixtures thereof and copolymers thereof. Examples of monomers and copolymers thereof include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), and esters and amides thereof. In this case, an ester of an unsaturated carboxylic acid and an aliphatic polyhydric alcohol compound, or an amide of an unsaturated carboxylic acid and an aliphatic polyvalent amine compound is used. In addition, an addition reaction product of an unsaturated carboxylic acid ester or amide having a nucleophilic substituent such as a hydroxy group, an amino group or a mercapto group with a monofunctional or polyfunctional isocyanate or epoxy, and a monofunctional or polyfunctional compound. A dehydration condensation reaction product with a functional carboxylic acid is also preferably used. Further, an addition reaction product of an unsaturated carboxylic acid ester or amide having an electrophilic substituent such as an epoxy group or an epoxy group with a monofunctional or polyfunctional alcohol, amine or thiol, a halogen group or In addition, a substitution reaction product of an unsaturated carboxylic acid ester or amide having a leaving substituent such as a tosyloxy group and a monofunctional or polyfunctional alcohol, amine or thiol is also suitable. As another example, it is also possible to use a group of compounds substituted with unsaturated phosphonic acid, styrene, vinyl ether or the like instead of the unsaturated carboxylic acid.

  Specific examples of the monomer of an ester of an aliphatic polyhydric alcohol compound and an unsaturated carboxylic acid include acrylic acid esters such as ethylene glycol diacrylate, triethylene glycol diacrylate, 1,3-butanediol diacrylate, and tetramethylene glycol. Diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate, 1,4-cyclohexanediol diacrylate , Tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate , Pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester acrylate oligomer, isocyanuric acid There are EO-modified triacrylate and the like.

  Methacrylic acid esters include tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, ethylene glycol dimethacrylate, 1,3-butanediol dimethacrylate, Hexanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate, bis [p- (3-methacryloxy- 2-hydroxypro ) Phenyl] dimethyl methane, bis - [p- (methacryloxyethoxy) phenyl] dimethyl methane.

  Itaconic acid esters include ethylene glycol diitaconate, propylene glycol diitaconate, 1,3-butanediol diitaconate, 1,4-butanediol diitaconate, tetramethylene glycol diitaconate, pentaerythritol diitaconate And sorbitol tetritaconate. Examples of crotonic acid esters include ethylene glycol dicrotonate, tetramethylene glycol dicrotonate, pentaerythritol dicrotonate, and sorbitol tetradicrotonate. Examples of isocrotonic acid esters include ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, and sorbitol tetraisocrotonate. Examples of maleic acid esters include ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, and sorbitol tetramaleate.

  Examples of other esters include aliphatic alcohol esters described in JP-B-51-47334 and JP-A-57-196231, JP-A-59-5240, JP-A-59-5241, and JP-A-2-226149. Those having the aromatic skeleton described above and those having an amino group described in JP-A-1-165613 are also preferably used. Furthermore, the ester monomers described above can also be used as a mixture.

  Specific examples of amide monomers of aliphatic polyvalent amine compounds and unsaturated carboxylic acids include methylene bis-acrylamide, methylene bis-methacrylamide, 1,6-hexamethylene bis-acrylamide, 1,6-hexamethylene bis. -Methacrylamide, diethylenetriamine trisacrylamide, xylylene bisacrylamide, xylylene bismethacrylamide and the like. Examples of other preferable amide monomers include those having a cyclohexylene structure described in JP-B-54-21726.

  In addition, urethane-based addition polymerizable compounds produced by using an addition reaction of isocyanate and hydroxyl group are also suitable, and specific examples thereof include, for example, one molecule described in JP-B-48-41708. Containing two or more polymerizable vinyl groups in one molecule obtained by adding a vinyl monomer containing a hydroxyl group in the compound represented by the following general formula (A) to a polyisocyanate compound having two or more isocyanate groups Vinyl urethane compounds to be used.

^{_{CH 2 = C (R 10)}} COOCH 2 CH (R 11) OH ... formula (A)
(In general formula (A), R ¹⁰ and R ¹¹ represent H or CH _3. )

  Also, urethane acrylates such as those described in JP-A-51-37193, JP-B-2-32293, and JP-B-2-16765, JP-B-58-49860, JP-B-56-17654, Urethane compounds having an ethylene oxide skeleton described in JP-B-62-39417 and JP-B-62-39418 are also suitable. Further, by using addition polymerizable compounds having an amino structure or a sulfide structure in the molecule described in JP-A-63-277653, JP-A-63-260909, and JP-A-1-105238, It is possible to obtain a photopolymerizable composition excellent in the photosensitive speed.

  Other examples include polyester acrylates, epoxy resins and (meth) acrylic acid as described in JP-A-48-64183, JP-B-49-43191, JP-B-52-30490, and JP-A-52-30490. Mention may be made of polyfunctional acrylates and methacrylates such as reacted epoxy acrylates. Further, specific unsaturated compounds described in JP-B-46-43946, JP-B-1-40337 and JP-B-1-40336, vinylphosphonic acid compounds described in JP-A-2-25493, and the like can also be mentioned. . In some cases, a structure containing a perfluoroalkyl group described in JP-A-61-22048 is preferably used. Furthermore, Journal of Japan Adhesion Association vol. 20, no. 7, pages 300 to 308 (1984), which are introduced as photocurable monomers and oligomers, can also be used.

  About these addition polymerizable compounds, the details of usage methods such as the structure, single use or combined use, addition amount and the like can be arbitrarily set according to the performance design of the curable composition. For example, it is selected from the following viewpoints.

From the viewpoint of sensitivity, a structure having a large unsaturated group content per molecule is preferable, and in many cases, a bifunctional or higher functionality is preferable. Further, in order to increase the strength of the cured film, those having three or more functionalities are preferable, and furthermore, different functional numbers and different polymerizable groups (for example, acrylic acid ester, methacrylic acid ester, styrene compound, vinyl ether compound). It is also effective to adjust both sensitivity and intensity by using both of these. From the viewpoint of curing sensitivity, it is preferable to use a compound containing two or more (meth) acrylic acid ester structures, more preferably a compound containing three or more, and most preferably a compound containing four or more. preferable. Moreover, it is preferable to contain an EO modified body from a viewpoint of a curing sensitivity and the developability of an uncured area. Moreover, it is preferable to contain a urethane bond from a viewpoint of hardening sensitivity and exposure part intensity | strength.
In addition, the selection and use method of the addition polymerization compound is an important factor for the compatibility and dispersibility with other components (for example, resin, photopolymerization initiator, pigment) in the curable composition, For example, the compatibility may be improved by using a low-purity compound or using two or more kinds in combination. In addition, a specific structure may be selected for the purpose of improving the adhesion with a support or the like.

  From the above viewpoint, bisphenol A diacrylate, bisphenol A diacrylate EO modified product, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, tetraethylene glycol diacrylate, pentaerythritol diacrylate Acrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxy D (I) Isocyanurate, pentaerythritol tetraacrylate EO modified product, dipentaerythritol hexaacrylate EO modified product, etc. are mentioned as preferable ones. Also, as commercially available products, urethane oligomer UAS-10, UAB-140 (Sanyo Kokusaku Pulp Co., Ltd.) Manufactured), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600 (manufactured by Kyoei), UA-7200 (Shin Nakamura Chemical Co., Ltd.) Product).

  Among them, bisphenol A diacrylate EO modified, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, pentaerythritol tetraacrylate EO modified, di Examples of commercially available modified products such as pentaerythritol hexaacrylate EO include DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600 ( Kyoeisha Chemical) is more preferable.

  The content of the photopolymerizable compound (E) is preferably 1 to 90% by mass and more preferably 5 to 80% by mass with respect to the total solid content of the curable composition of the present invention. More preferably, the content is 10% to 70% by mass. In particular, when the curable composition of the present invention is used for forming a colored pattern of a color filter, the content of (E) a photopolymerizable compound is further improved in terms of photosensitivity, support adhesion, and degree of cure. Is preferably 5 to 50% by mass, more preferably 7 to 40% by mass, and further preferably 10 to 35% by mass, based on the total solid content of the curable composition of the present invention. preferable.

  Further, (A) a polymer compound (dispersion resin in the present invention) having a structural unit represented by any one of the general formulas (1) to (3), and (A) (A) other than the dispersion resin in the present invention ( E) When the photopolymerizable compound is used in combination, the content ratio [(A) / (E); mass ratio] is preferably 10/1 to 1/100 from the viewpoint of sensitivity and storage stability. / 1 to 1/10 is more preferable, and 3/1 to 1/5 is still more preferable.

Next, other components that can be further used in the curable composition of the present invention will be described.
(F) Sensitizer The curable composition of the present invention contains (F) a sensitizer for the purpose of (D) improving the radical generation efficiency by the photopolymerization initiator and increasing the photosensitive wavelength. Also good. As the sensitizer that can be used in the present invention, a sensitizer that is sensitized by an electron transfer mechanism or an energy transfer mechanism to the above-described (D) photopolymerization initiator is preferable.

Examples of the sensitizer that can be used in the present invention include those belonging to the compounds listed below and having an absorption wavelength in a wavelength region of 300 nm to 450 nm.
Examples of preferred sensitizers include those belonging to the following compounds and having an absorption wavelength in the range of 330 nm to 450 nm.
For example, polynuclear aromatics (for example, phenanthrene, anthracene, pyrene, perylene, triphenylene, 9,10-dialkoxyanthracene), xanthenes (for example, fluorescein, eosin, erythrosine, rhodamine B, rose bengal), thioxanthones (Isopropylthioxanthone, diethylthioxanthone, chlorothioxanthone), cyanines (eg thiacarbocyanine, oxacarbocyanine), merocyanines (eg merocyanine, carbomerocyanine), phthalocyanines, thiazines (eg thionine, methylene blue, toluidine blue) , Acridines (eg, acridine orange, chloroflavin, acriflavine), anthraquinones (eg, anthraquinone), squariums (eg Squalium), acridine orange, coumarins (eg 7-diethylamino-4-methylcoumarin), ketocoumarin, phenothiazines, phenazines, styrylbenzenes, azo compounds, diphenylmethane, triphenylmethane, distyrylbenzenes, carbazole , Porphyrins, spiro compounds, quinacridone, indigo, styryl, pyrylium compounds, pyromethene compounds, pyrazolotriazole compounds, benzothiazole compounds, barbituric acid derivatives, thiobarbituric acid derivatives, acetophenone, benzophenone, thioxanthone, Michler's ketone and other aromatics Examples include ketone compounds and heterocyclic compounds such as N-aryloxazolidinones.
Further, European Patent No. 568,993, US Patent No. 4,508,811, No. 5,227,227, Japanese Patent Application Laid-Open No. 2001-125255, Japanese Patent Application Laid-Open No. 11-271969, etc. And the like.

  More preferable examples of the sensitizer include compounds represented by the following general formulas (i) to (iv).

In general formula (i), A ¹ represents a sulfur atom or NR ⁵⁰ , R ⁵⁰ represents an alkyl group or an aryl group, and L ² represents the basic nucleus of the dye in combination with adjacent A ¹ and the adjacent carbon atom. Represents a non-metallic atomic group to be formed, R ⁵¹ and R ⁵² each independently represent a hydrogen atom or a monovalent non-metallic atomic group, and R ⁵¹ and R ⁵² are bonded to each other to form an acidic nucleus of the dye. Also good. W represents an oxygen atom or a sulfur atom.

In General Formula (ii), Ar ¹ and Ar ² each independently represent an aryl group, and are linked via a bond with —L ³ —. Here, L ³ represents —O— or —S—. W is synonymous with that shown in the general formula (i).

In general formula (iii), A ² represents a sulfur atom or NR ⁵⁹ , L ⁴ represents a nonmetallic atomic group that forms a basic nucleus of a dye in combination with adjacent A ² and a carbon atom, R ⁵³ , R ⁵⁴ , R ⁵⁵ , R ⁵⁶ , R ⁵⁷ and R ⁵⁸ each independently represent a monovalent nonmetallic atomic group, and R ⁵⁹ represents an alkyl group or an aryl group.

In general formula (iv), A ³ and A ⁴ each independently represent —S— or —NR ⁶² — or —NR ⁶³ —, wherein R ⁶² and R ⁶³ each independently represent a substituted or unsubstituted alkyl group, substituted Or an unsubstituted aryl group, and L ⁵ and L ⁶ each independently represent a nonmetallic atomic group that forms a basic nucleus of a dye together with adjacent A ³ , A ⁴ and an adjacent carbon atom; ⁶⁰ and R ⁶¹ are each independently a monovalent non-metallic atomic group, or may be bonded to each other to form an aliphatic or aromatic ring.

  Moreover, as a preferable sensitizer which can be contained in the curable composition of this invention, at least 1 type selected from the compound represented by the following general formula (IV)-(VI) other than the above thing is mentioned.

In general formula (IV) or general formula (V), R ¹ and R ² each independently represent a monovalent substituent, and R ³ , R ⁴ , R ⁵ and R ⁶ each independently represent a hydrogen atom or Represents a monovalent substituent. n represents an integer of 0 to 5, n ′ represents an integer of 0 to 5, and n and n ′ are not both 0. When n is 2 or more, a plurality of R ¹ may be the same or different. When n ′ is 2 or more, a plurality of R ² may be the same or different.

  The compound represented by the general formula (IV) is preferably a compound represented by the following general formula (IV-1) from the viewpoint of sensitivity and colorability in the case of containing a pigment.

In general formula (IV-1), R ¹ and R ² each independently represents a monovalent substituent. n represents an integer of 0 to 5, and n ′ represents an integer of 1 to 5. When n is 2 or more, a plurality of R ¹ may be the same or different, and when n ′ is 2 or more, a plurality of R ² are the same or different. Also good.

In the general formula (IV-1), the monovalent substituent represented by R ¹ and R ² are synonymous with the monovalent substituent represented by R ¹ and R ² in the general formula (IV) The preferable range is also the same.

The general formula (IV) or general formula (V) compounds represented by is preferably a molar extinction coefficient epsilon at a wavelength of 365nm is ^{500mol -1} · L · ^cm -1 or more, epsilon at a wavelength of 365nm is 3000 mol ^- more preferably ¹ · L · ^{cm -1} or more, and most preferably ε at a wavelength of 365nm is 20000mol ^-1 · L · ^{cm -1} or more. It is preferable that the value of the molar extinction coefficient ε at each wavelength is in the above range because the sensitivity improvement effect is high from the viewpoint of light absorption efficiency.
Here, the molar extinction coefficient ε is obtained by measuring a transmission spectrum of a sample at 365 nm using a dye solution adjusted to a concentration of 0.01 g / l in a 1-methoxy-2-propanol solution as a sample, and UV-visible absorption of the sample. It is obtained by determining the absorbance from the spectrum. The measurement apparatus used was a Varian UV-Vis-MR Spectrophotometer Cary 5G type spectral altimeter.

Although the preferable specific example of a compound represented by general formula (IV) or general formula (V) is illustrated below, this invention is not limited to these.
Note that in this specification, a chemical formula may be described by a simplified structural formula, and a solid line or the like that does not clearly indicate an element or a substituent particularly represents a hydrocarbon group. In the following specific examples, Me represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, n-Bu represents an n-butyl group, and Ph represents a phenyl group.

In General Formula (VI), A represents an aromatic ring or a hetero ring which may have a substituent, X represents an oxygen atom, a sulfur atom, or -N (R ³ )-, Y represents an oxygen atom, A sulfur atom or -N (R < ³ >)-is represented. R ¹ , R ² , and R ³ each independently represent a hydrogen atom or a monovalent nonmetallic atomic group, and A, R ¹ , R ² , and R ³ are each bonded to each other to form an aliphatic group Or you may form an aromatic ring.

In the general formula (VI), R ¹ , R ² and R ³ each independently represents a hydrogen atom or a monovalent nonmetallic atomic group. When R ¹ , R ² and R ³ represent a monovalent nonmetal atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aromatic group It is preferably a heterocyclic residue, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted alkylthio group, a hydroxy group, or a halogen atom.

In the compound represented by the general formula (VI), Y is preferably an oxygen atom or —N (R ³ ) — from the viewpoint of improving the decomposition efficiency of the photopolymerization initiator. R ³ each independently represents a hydrogen atom or a monovalent nonmetallic atomic group. Furthermore, Y is most preferably —N (R ³ ) —.

  Hereinafter, preferred specific examples (VI1) to (VI124) of the compound represented by the general formula (VI) are shown, but the present invention is not limited thereto. Further, it is not clear about an isomer by a double bond connecting an acidic nucleus and a basic nucleus, and the present invention is not limited to either isomer.

With respect to the sensitizing dye in the present invention, various chemical modifications for improving the properties of the curable composition can be further performed.
For example, sensitizing dye and addition polymerizable compound structure (for example, acryloyl group or methacryloyl group) are bonded by a method such as covalent bond, ionic bond, hydrogen bond, etc. Unnecessary precipitation suppression of the sensitizing dye from the later film can be performed.
In addition, partial structures having radical generating ability in the sensitizing dye and the above-described photopolymerization initiator (for example, reductive decomposable sites such as alkyl halide, onium, peroxide, biimidazole, borate, amine, trimethylsilylmethyl) , An oxidatively cleavable site such as carboxymethyl, carbonyl, imine, etc.), the photosensitivity can be remarkably enhanced particularly in a state where the concentration of the starting system is low.

  The compounds represented by the above general formulas (IV) to (VI) have a very high pigment concentration in the curable composition, and the light transmittance of the formed colored pattern (photosensitive layer) becomes extremely low. In this case, for example, when the curable composition of the present invention is used for forming a coloring pattern of a color filter, more specifically, 365 nm light can be transmitted through the photosensitive layer when formed without adding a sensitizing dye. By adding in a case where the rate is 10% or less, the effect is remarkably exhibited. In particular, among the above general formulas (IV) to (VI), the compound represented by the general formula (VI) is most preferable, and specifically, the compounds of (VI56) to (VI122) are most preferable.

A sensitizer may be used individually by 1 type and may use 2 or more types together.
The content of the (F) sensitizer in the curable composition of the present invention is curable from the viewpoint of light absorption efficiency to the deep part and starting decomposition efficiency, including the case where it is used for forming a color filter color pattern. It is preferable that it is 0.1-20 mass% with respect to the total solid of a composition, and 0.5-15 mass% is more preferable.

(G) Binder polymer The curable composition of the present invention is other than the polymer compound having the structural unit represented by any one of (A) general formulas (1) to (3) for the purpose of improving film properties. (G) a binder polymer may be contained.
It is preferable to use a linear organic polymer as the binder polymer. As such a “linear organic polymer”, a known one can be arbitrarily used. For example, when the curable composition of the present invention is applied to an application in which a pattern is formed by removing an unexposed portion by water or alkali development after pattern exposure and curing of an exposed portion, preferably water development or weakness is used. In order to enable alkaline water development, a linear organic polymer that is soluble or swellable in water or weak alkaline water is selected. The linear organic polymer is selected and used not only as a film forming agent but also according to the type of water, weak alkaline water, or organic solvent developer. For example, when a water-soluble organic polymer is used, water development becomes possible. Examples of such linear organic polymers include radical polymers having a carboxylic acid group in the side chain, such as JP 59-44615, JP-B 54-34327, JP-B 58-12577, JP-B 54-. No. 25957, JP-A-54-92723, JP-A-59-53836, and JP-A-59-71048. In other words, a resin having a carboxyl group alone or copolymerized, a resin having an acid anhydride alone or copolymerized, and a hydrolyzed, half-esterified or half-amidated acid anhydride unit, epoxy Examples thereof include epoxy acrylate obtained by modifying a resin with an unsaturated monocarboxylic acid and an acid anhydride. Examples of the monomer having a carboxyl group include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, 4-carboxylstyrene, and the monomer having an acid anhydride includes maleic anhydride. It is done.
Similarly, an acidic cellulose derivative having a carboxylic acid group in the side chain can also be used. In addition, those obtained by adding a cyclic acid anhydride to a polymer having a hydroxyl group are useful.

  As described above, when the radical polymer having a carboxylic acid group in the side chain is a copolymer, a monomer other than the above-mentioned monomers can also be used as the compound to be copolymerized. Examples of other monomers include the following compounds (1) to (12).

(1) 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 3-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl methacrylate, 4-hydroxybutyl methacrylate Acrylic acid esters and methacrylic acid esters having an aliphatic hydroxyl group such as
(2) Methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, isobutyl acrylate, amyl acrylate, hexyl acrylate, 2-ethylhexyl acrylate, octyl acrylate, benzyl acrylate, acrylic acid-2- Alkyl acrylates such as chloroethyl, glycidyl acrylate, 3,4-epoxycyclohexylmethyl acrylate, vinyl acrylate, 2-phenylvinyl acrylate, 1-propenyl acrylate, allyl acrylate, 2-allyloxyethyl acrylate, propargyl acrylate;

(3) Methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, isobutyl methacrylate, amyl methacrylate, hexyl methacrylate, 2-ethylhexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, methacrylic acid-2- Alkyl methacrylates such as chloroethyl, glycidyl methacrylate, 3,4-epoxycyclohexylmethyl methacrylate, vinyl methacrylate, 2-phenylvinyl methacrylate, 1-propenyl methacrylate, allyl methacrylate, 2-allyloxyethyl methacrylate, and propargyl methacrylate.
(4) Acrylamide, methacrylamide, N-methylolacrylamide, N-ethylacrylamide, N-hexylmethacrylamide, N-cyclohexylacrylamide, N-hydroxyethylacrylamide, N-phenylacrylamide, N-nitrophenylacrylamide, N-ethyl- Acrylamide or methacrylamide such as N-phenylacrylamide, vinylacrylamide, vinylmethacrylamide, N, N-diallylacrylamide, N, N-diallylmethacrylamide, allylacrylamide, allylmethacrylamide.

(5) Vinyl ethers such as ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether, and phenyl vinyl ether.
(6) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate and vinyl benzoate.
(7) Styrenes such as styrene, α-methylstyrene, methylstyrene, chloromethylstyrene, and p-acetoxystyrene.
(8) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, and phenyl vinyl ketone.
(9) Olefins such as ethylene, propylene, isobutylene, butadiene, and isoprene.

(10) N-vinylpyrrolidone, acrylonitrile, methacrylonitrile and the like.
(11) Unsaturated imides such as maleimide, N-acryloylacrylamide, N-acetylmethacrylamide, N-propionylmethacrylamide, N- (p-chlorobenzoyl) methacrylamide.
(12) A methacrylic acid monomer having a hetero atom bonded to the α-position. For example, compounds described in Japanese Patent Application No. 2001-115595, Japanese Patent Application No. 2001-115598, and the like can be mentioned.

  Among these, (meth) acrylic resins having an allyl group, a vinyl ester group and a carboxyl group in the side chain, and two side chains described in JP-A Nos. 2000-187322 and 2002-62698 are included. An alkali-soluble resin having a heavy bond and an alkali-soluble resin having an amide group in the side chain described in JP-A No. 2001-242612 are preferable because of excellent balance of film strength, sensitivity and developability.

In addition, Japanese Patent Publication No. 7-2004, Japanese Patent Publication No. 7-120041, Japanese Patent Publication No. 7-120042, Japanese Patent Publication No. 8-12424, Japanese Patent Laid-Open No. 63-287944, Japanese Patent Laid-Open No. 63-287947, Japanese Patent Laid-Open No. Urethane binder polymers containing acid groups described in No. 271741 and Japanese Patent Application No. 10-116232, and urethane binder polymers having acid groups and double bonds in side chains as described in JP-A No. 2002-107918 Is very excellent in strength, and is advantageous in terms of suitability for low exposure.
In addition, the acetal-modified polyvinyl alcohol-based binder polymer having an acid group described in European Patent 993966, European Patent 1204000, Japanese Patent Application Laid-Open No. 2001-318463, and the like is preferable because of its excellent balance of film strength and developability.
In addition, polyvinyl pyrrolidone, polyethylene oxide, and the like are useful as the water-soluble linear organic polymer. In order to increase the strength of the cured film, alcohol-soluble nylon, polyether of 2,2-bis- (4-hydroxyphenyl) -propane and epichlorohydrin, and the like are also useful.

The weight average molecular weight of the (G) binder polymer is preferably 5,000 or more, more preferably 10,000 to 300,000, and the number average molecular weight is preferably 1,000 or more. Preferably it is the range of 2,000-250,000. The polydispersity (weight average molecular weight / number average molecular weight) is preferably 1 or more, and more preferably 1.1 to 10.
These resins may be any of random polymers, block polymers, graft polymers and the like.

(G) The binder polymer can be synthesized by a conventionally known method. Solvents used in the synthesis include, for example, tetrahydrofuran, ethylene dichloride, cyclohexanone, methyl ethyl ketone, acetone, methanol, ethanol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, 2-methoxyethyl acetate, diethylene glycol dimethyl ether, 1-methoxy. 2-propanol, 1-methoxy-2-propylacetate, N, N-dimethylformamide, N, N-dimethylacetamide, toluene, ethyl acetate, methyl lactate, ethyl lactate, dimethyl sulfoxide, 1-methyl-2-pyrrolidone, Water etc. are mentioned. These solvents are used alone or in combination of two or more.
Examples of the radical polymerization initiator used in synthesizing the binder polymer that can be used in the present invention include known compounds such as an azo initiator and a peroxide initiator.

  (G) The content of the binder polymer in the curable composition is such that when the curable composition of the present invention is used for forming a color pattern of a color filter, the balance between the pigment dispersion stability and the developability over time. From a viewpoint, it is preferable that it is 5-60 mass% with respect to the total solid of a curable composition, It is more preferable that it is 7-50 mass%, It is most preferable that it is 10-40 mass%.

  Further, (A) a polymer compound (dispersion resin in the present invention) having a structural unit represented by any one of the general formulas (1) to (3), and (A) (A) other than the dispersion resin in the present invention ( G) When the binder polymer is used in combination, the content ratio [(A) / (G); mass ratio] is preferably 100/1 to 1/10 from the viewpoint of storage stability and developability, 1 to 1/5 is more preferable, and 20/1 to 1/1 is still more preferable.

(H) Dispersant In the curable composition of the present invention, it is preferable to add a dispersant other than the above components from the viewpoint of further improving the dispersibility of the (B) pigment.

Dispersants (pigment dispersants) include polymer dispersants [for example, polyamidoamines and salts thereof, polycarboxylic acids and salts thereof, high molecular weight unsaturated acid esters, modified polyurethanes, modified polyesters, modified poly (meth) acrylates, (Meth) acrylic copolymer, naphthalenesulfonic acid formalin condensate], polyoxyethylene alkyl phosphate ester, polyoxyethylene alkyl amine, alkanol amine, pigment derivative and the like.
The polymer dispersant can be further classified into a linear polymer, a terminal-modified polymer, a graft polymer, and a block polymer from the structure thereof.

  The polymer dispersant is adsorbed on the surface of the pigment and acts to prevent reaggregation. Therefore, a terminal-modified polymer, a graft polymer and a block polymer having an anchor site to the pigment surface can be mentioned as preferred structures. On the other hand, the pigment derivative has an effect of promoting the adsorption of the polymer dispersant by modifying the pigment surface.

  Specific examples of the pigment dispersant that can be used in the present invention include “Disperbyk-101 (polyamidoamine phosphate), 107 (carboxylic acid ester), 110 (copolymer containing an acid group), 130 (polyamide) manufactured by BYK Chemie. ), 161, 162, 163, 164, 165, 166, 170 (polymer copolymer), “BYK-P104, P105 (high molecular weight unsaturated polycarboxylic acid), BYK2001”, “EFKA 4047, 4050” manufactured by EFKA. 4010, 4165 (polyurethane type), EFKA4330, 4340 (block copolymer), 4400, 4402 (modified polyacrylate), 5010 (polyesteramide), 5765 (high molecular weight polycarboxylate), 6220 (fatty acid polyester), 6745 (phthalocyanine derivative , 6750 (azo pigment derivative) "," Ajisper PB821, PB822 "manufactured by Ajinomoto Fan Techno Co.," Floren TG-710 (urethane oligomer) "manufactured by Kyoeisha Chemical Co.," Polyflow No. 50E, No. 300 (acrylic copolymer weight). "Disparon KS-860, 873SN, 874, # 2150 (aliphatic polycarboxylic acid), # 7004 (polyetherester), DA-703-50, DA-705, DA-725" "Demol RN, N (Naphthalenesulfonic acid formalin polycondensate), MS, C, SN-B (aromatic sulfonic acid formalin polycondensate)", "Homogenol L-18 (polymeric polycarboxylic acid)" ) "," Emulgen 920, 930, 935, 985 (polyoxyethylene nonylphenyl ether) ) ”,“ Acetamine 86 (stearylamine acetate) ”,“ Solsperse 5000 (phthalocyanine derivative), 22000 (azo pigment derivative), 13240 (polyesteramine), 3000, 17000, 27000 (functional part at the terminal part) manufactured by Lubrizol. 24000, 28000, 32000, 38500 (graft type polymer) "," Nikkor T106 (polyoxyethylene sorbitan monooleate), MYS-IEX (polyoxyethylene monostearate) "manufactured by Nikko Chemical Co., Ltd. Can be mentioned.

  These dispersants may be used alone or in combination of two or more. In the present invention, it is particularly preferable to use a combination of a pigment derivative and a polymer dispersant.

As content of (H) dispersing agent in this invention, it is preferable that it is 1-100 mass% with respect to a pigment, 3-100 mass% is more preferable, 5-80 mass% is still more preferable.
Specifically, if a polymer dispersant is used, the amount of use thereof is preferably in the range of 5 to 100% by mass, more preferably in the range of 10 to 80% by mass with respect to the pigment. In the case of using a pigment derivative, the amount used is preferably in the range of 1 to 30% by mass, more preferably in the range of 3 to 20% by mass, based on the pigment, A range of 15% by mass is particularly preferable.

  In the present invention, when a pigment and a dispersant are used, from the viewpoint of curing sensitivity and color density, the total content of the pigment and the dispersant is 35 to 90 with respect to the total solid content constituting the curable composition. It is preferably mass%, more preferably 45-85 mass%, and even more preferably 50-80 mass%.

(I) Co-sensitizer The curable composition of the present invention preferably contains (I) a co-sensitizer. In the present invention, the co-sensitizer further improves the sensitivity of (F) sensitizer (sensitizing dye) and (D) photopolymerization initiator to active radiation, or suppresses polymerization inhibition of the polymerizable compound by oxygen. Etc.
Examples of such cosensitizers include amines such as M.I. R. Sander et al., “Journal of Polymer Society”, Vol. 10, 3173 (1972), Japanese Patent Publication No. 44-20189, Japanese Patent Publication No. 51-82102, Japanese Patent Publication No. 52-134692, Japanese Patent Publication No. 59-138205. No. 60-84305, JP-A 62-18537, JP-A 64-33104, Research Disclosure 33825, and the like. Specific examples include triethanolamine. P-dimethylaminobenzoic acid ethyl ester, p-formyldimethylaniline, p-methylthiodimethylaniline and the like.

  Other examples of co-sensitizers include thiols and sulfides such as thiol compounds described in JP-A-53-702, JP-B-55-500806, JP-A-5-142772, No. 56-75643, such as 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, 2-mercapto-4 (3H) -quinazoline, β-mercapto. And naphthalene.

  Other examples of the co-sensitizer include amino acid compounds (eg, N-phenylglycine), organometallic compounds described in JP-B-48-42965 (eg, tributyltin acetate), JP-B 55- Examples include a hydrogen donor described in Japanese Patent No. 34414, a sulfur compound (eg, trithiane) described in Japanese Patent Laid-Open No. 6-308727, and the like.

  (I) Content of a co-sensitizer is 0.1-30 mass% with respect to the mass of the total solid of a curable composition from a viewpoint of the improvement of the cure rate by the balance of a polymerization growth rate and chain transfer. The range is preferable, the range of 0.5 to 25% by mass is more preferable, and the range of 1.0 to 20% by mass is further preferable.

(J) Polymerization inhibitor In the present invention, during the production or storage of the curable composition, (A) a polymer compound having a structural unit represented by any one of the general formulas (1) to (3) (E) In order to prevent unnecessary thermal polymerization of a compound having an ethylenically unsaturated double bond in the molecule, such as a photopolymerizable compound, (J) a small amount of thermal polymerization inhibitor is used as a polymerization inhibitor. It is desirable to add.

  As thermal polymerization inhibitors, hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol) 2,2′-methylenebis (4-methyl-6-tert-butylphenol), N-nitrosophenylhydroxyamine primary cerium salt and the like.

(J) As for the addition amount of a polymerization inhibitor, about 0.01 to about 5 mass% is preferable with respect to the mass of a curable composition.
Further, if necessary, a higher fatty acid derivative such as behenic acid or behenamide is added to prevent polymerization inhibition by oxygen, and the curable composition of the present invention is unevenly distributed on the surface until it is dried. You may let them. The amount of the higher fatty acid derivative added is preferably about 0.5 to about 10% by mass relative to the mass of the curable composition.

[Other ingredients]
Furthermore, the curable composition of the present invention includes a filler, a plasticizer, a polymer compound other than those described above, a surfactant, an antioxidant, an ultraviolet absorber, and an aggregation inhibitor for improving the physical properties of the cured film. Etc. can be blended.
More specifically, fillers such as glass and alumina; plastics such as dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, and triacetyl glycerin Agents: Polymer compounds such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ether, polyfluoroalkyl acrylate, nonionic, cationic and anionic surfactants; 2,2-thiobis (4-methyl-6) -T-butylphenol), 2,6-di-t-butylphenol and other antioxidants: 2- (3-t-butyl-5-methyl-2-hydroxyphenyl) -5-chlorobenzotriazole, alkoxybenzophenone, etc. ultraviolet Absorbents; and aggregation inhibitor such as sodium polyacrylate and the like.

In addition, when the curable composition of the present invention is applied to the surface of a hard material such as a support, an additive for improving the adhesion to the surface of the hard material (hereinafter referred to as “support adhesive”). .) May be added.
As the support adhesion agent, known materials can be used, but it is particularly preferable to use a silane coupling agent, a titanate coupling agent, or an aluminum coupling agent.
Examples of the silane coupling agent include γ- (2-aminoethyl) aminopropyltrimethoxysilane, γ- (2-aminoethyl) aminopropyldimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxy. Silane, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-acryloxypropyltrimethoxysilane, γ-acryloxypropyl Triethoxysilane, γ-isocyanatopropyltrimethoxysilane, γ-isocyanatopropyltriethoxysilane, N-β- (N-vinylbenzylaminoethyl) -γ-aminopropyltrimethoxysilane / hydrochloride, γ-glycidoxypro Pyrtrimethoxysilane, γ-glycidoxypropyltriethoxysilane, aminosilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, vinyltriacetoxysilane, γ- Chloropropyltrimethoxysilane, hexamethyldisilazane, γ-anilinopropyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (β-methoxyethoxy) silane, octadecyldimethyl [3- (trimethoxysilyl) propyl ] Ammonium chloride, γ-chloropropylmethyldimethoxysilane, γ-mercaptopropylmethyldimethoxysilane, methyltrichlorosilane, dimethyldichlorosilane, trimethyl Chlorosilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, bisallyltrimethoxysilane, tetraethoxysilane, bis (trimethoxysilyl) hexane, phenyltrimethoxysilane, N- (3-acryloxy-2-hydroxy Propyl) -3-aminopropyltriethoxysilane, N- (3-methacryloxy-2-hydroxypropyl) -3-aminopropyltriethoxysilane, (methacryloxymethyl) methyldiethoxysilane, (acryloxymethyl) methyldimethoxysilane , Etc.
Among them, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-acryloxypropyltrimethoxysilane, γ-acryloxypropyltriethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-aminopropyl Triethoxysilane and phenyltrimethoxysilane are preferable, and γ-methacryloxypropyltrimethoxysilane is most preferable.

  Examples of titanate coupling agents include isopropyl triisostearoyl titanate, isopropyl tridecylbenzenesulfonyl titanate, isopropyl tris (dioctyl pyrophosphate) titanate, tetraisopropyl bis (dioctyl phosphite) titanate, tetraoctyl bis (ditridecyl phosphite). ) Titanate, tetra (2,2-diallyloxymethyl) bis (di-tridecyl) phosphite titanate, bis (dioctylpyrophosphate) oxyacetate titanate, bis (dioctylpyrophosphate) ethylene titanate, isopropyltrioctanoyl titanate, isopropyldi Methacrylic isostearoyl titanate, isopropyl isostearoyl diacryl titanate, Li isopropyl tri (dioctyl phosphate) titanate, isopropyl tricumylphenyl titanate, isopropyl tri (N- amidoethyl-aminoethyl) titanate, dicumyl phenyloxy acetate titanate, diisostearoyl ethylene titanate.

  Examples of the aluminum coupling agent include acetoalkoxyaluminum diisopropylate.

  The content of the support adhesion agent is 0.1 to 30% by mass with respect to the total solid content of the curable composition of the present invention, from the viewpoint of leaving no residue in the uncured region of the curable composition. It is preferable that it is 0.5-20 mass%, It is more preferable that it is 1-10 mass%.

In addition, when the curable composition of the present invention is applied to a use in which a pattern is formed by removing an unexposed portion with water or alkali development after pattern exposure and curing of an exposed portion, the alkali solubility is promoted and developed. In order to further improve the property, an organic carboxylic acid, preferably a low molecular weight organic carboxylic acid having a molecular weight of 1000 or less can be added to the curable composition.
Specifically, for example, aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, diethyl acetic acid, enanthic acid, caprylic acid; oxalic acid, malonic acid, succinic acid, Aliphatic dicarboxylic acids such as glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, brassic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methylsuccinic acid, tetramethylsuccinic acid, citraconic acid; Aliphatic tricarboxylic acids such as tricarballylic acid, aconitic acid, camphoric acid; aromatic monocarboxylic acids such as benzoic acid, toluic acid, cumic acid, hemelitic acid, mesitylene acid; phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, Aromatic polycarboxylic acids such as trimesic acid, melophanoic acid, pyromellitic acid; phenylacetic acid Hydratropic acid, hydrocinnamic acid, mandelic acid, phenyl succinic acid, atropic acid, cinnamic acid, methyl cinnamate, benzyl cinnamate, cinnamylidene acetic acid, coumaric acid, other carboxylic acids such as umbellic acid.

The curable composition of the present invention comprises (A) a polymer compound having a structural unit represented by any one of the general formulas (1) to (3) (dispersion resin in the present invention), (B) a pigment, (D ) Mixing and dispersing step of mixing photopolymerization initiator and other components such as (H) dispersant as needed with (C) solvent and mixing and dispersing using various mixers and dispersers. It is preferable to be prepared. That is, the curable composition of the present invention is prepared by preparing a pigment dispersion (the pigment dispersion composition of the present invention) in advance by performing a mixing and dispersing step and mixing the pigment dispersion and the remaining components. Is preferably prepared.
The mixing and dispersing step preferably comprises kneading and dispersing followed by fine dispersion treatment, but kneading and dispersing can be omitted.

<Color filter and manufacturing method thereof>
Next, the color filter of the present invention and the manufacturing method thereof will be described.
The color filter of the present invention is characterized by having a colored pattern formed using the curable composition of the present invention on a support.
Hereinafter, the color filter of the present invention will be described in detail through its manufacturing method (color filter manufacturing method of the present invention).

The method for producing a color filter of the present invention comprises a colored layer forming step of forming a colored layer comprising the curable composition by applying the curable composition of the present invention on a support, and using the colored layer as a mask. And a development step of developing the colored layer after exposure to form a colored pattern.
Hereafter, each process in the manufacturing method of this invention is demonstrated.

[Colored layer forming step]
In the colored layer forming step, the curable composition of the present invention is applied on the support to form a colored layer comprising the curable composition.

Examples of the support that can be used in this step include soda glass, Pyrex (registered trademark) glass, quartz glass, and those obtained by attaching a transparent conductive film to these, and image sensors. Examples of the photoelectric conversion element substrate include a silicon substrate and a complementary metal oxide semiconductor (CMOS). These supports may be formed with black stripes that separate pixels.
In addition, an undercoat layer may be provided on these supports, if necessary, in order to improve adhesion with the colored layer, prevent diffusion of substances, or flatten the surface.

As a method for applying the curable composition of the present invention on a support, various methods such as slit coating, ink jet method, spin coating, cast coating, roll coating, screen printing method and the like can be applied.
The film thickness immediately after application (for example, application) of the curable composition is preferably 0.1 to 10 μm, more preferably 0.2 to 5 μm, from the viewpoint of film thickness uniformity and ease of drying of the solvent. 0.2-3 micrometers is still more preferable.

  Drying (prebaking) of the colored layer (curable composition layer) provided by coating on the support can be performed at a temperature of 50 ° C. to 140 ° C. for 10 to 300 seconds with a hot plate, oven or the like. .

As the film thickness after drying of the curable composition (hereinafter, referred to as “dry film thickness” as appropriate), in order to use as a color filter for LCD, it can cope with LCD thinning, from the viewpoint of securing color density, It is preferably 0.1 μm or more and less than 2.0 μm, more preferably 0.2 μm or more and 1.8 μm or less, and particularly preferably 0.3 μm or more and 1.75 μm or less.
In addition, in order to use as an IS color filter, in view of securing color density, light in an oblique direction does not reach the light receiving part, and a difference in light collection rate between the end and the center of the device becomes remarkable. From the viewpoint of reducing defects, it is preferably 0.05 μm or more and less than 1.0 μm, more preferably 0.1 μm or more and 0.8 μm or less, and particularly preferably 0.2 μm or more and 0.7 μm or less.

[Exposure process]
In the exposure step, the colored layer (curable composition layer) formed in the colored layer forming step is exposed in a pattern manner through a mask having a predetermined mask pattern.
As radiation that can be used for exposure, ultraviolet rays such as g-line and i-line are particularly preferably used. Irradiation dose is preferably 5~1500mJ / cm ^2, more preferably 10~1000mJ / cm ^2, and most preferably 10 to 500 mJ / cm ^2.
If the color filter of the present invention is a liquid crystal display device, it is more preferably preferably 10~150mJ / cm ² 5~200mJ / cm ² within the above range, and most preferably 10 to 100 mJ / cm ^2. Further, when the color filter of the present invention is for a solid-state imaging device, more preferably 30~1500mJ / cm ² is preferably 50~1000mJ / cm ² within the above range, and most preferably 80~500mJ / cm ^2.

[Development process]
Next, by performing an alkali development process (development process), the unexposed part in the exposure process is eluted in the developer, and only the photocured part remains.
As the developer, an organic alkali developer that does not damage the underlying circuit or the like is desirable. The development temperature is usually 20 ° C. to 30 ° C., and the development time is 20 to 90 seconds.

Examples of the alkaline agent used in the developer include ammonia water, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo- [5, 4, 0] -7-undecene and the like, and these alkaline agents are added with pure water so that the concentration becomes 0.001% by mass to 10% by mass, preferably 0.01% by mass to 1% by mass. A diluted alkaline aqueous solution is preferably used as the developer. In the case where a developer composed of such an alkaline aqueous solution is used, it is generally washed (rinsed) with pure water after development.
Next, excess developer is washed away and dried.

  In addition, in the manufacturing method of this invention, after performing the colored layer formation process, exposure process, and image development process which were mentioned above, the formed colored pattern is hardened by heating (post-baking) and / or exposure as needed. A curing step may be included.

The post-baking is a heat treatment after development for complete curing, and usually a heat curing treatment at 100 ° C. to 240 ° C. is performed. When a support body is a glass substrate or a silicon substrate, 200 to 240 degreeC is preferable among the said temperature range.
This post-bake treatment can be carried out continuously or batchwise using heating means such as a hot plate, a convection oven (hot air circulation dryer), a high-frequency heater or the like so as to satisfy the above conditions.

  By repeating the colored layer forming step, the exposing step, and the developing step (and the curing step if necessary) as described above for the desired number of hues (3 colors or 4 colors), a color filter having a desired hue is produced. The

  As described above, the application of the curable composition of the present invention has been described mainly with respect to the application to the pixels of the color filter, but it goes without saying that it can also be applied to the black matrix provided between the pixels of the color filter. . The black matrix is subjected to pattern exposure and alkali development in the same manner as in the above pixel production method except that a black pigment such as carbon black or titanium black is added to the curable composition of the present invention as a colorant. Further, after that, post-baking can be performed to promote the curing of the film.

Since the color filter of the present invention uses the curable composition of the present invention, the formed colored pattern has high adhesion to the support, and the uncured region is easily removed by the developer. Therefore, it has a high-resolution colored pattern having good adhesion to the support and a desired cross-sectional shape. Therefore, it can be suitably used for a solid-state imaging device such as a liquid crystal display device or a CCD, and is particularly suitable for a high-resolution CCD device or CMOS that exceeds 1 million pixels.
The color filter of the present invention can be used as, for example, a color filter disposed between a light receiving portion of each pixel constituting a CCD and a microlens for condensing light.

  EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples. However, the present invention is not limited to the following examples unless it exceeds the gist thereof. Unless otherwise specified, “part” and “%” are based on mass.

  The weight average molecular weight was measured by gel permeation chromatography (GPC). GPC uses HLC-8120GPC, SC-8020 (manufactured by Tosoh Corporation), and TSKgel, SuperHM-H (manufactured by Tosoh Corporation, 6.0 mm ID × 15 cm) as the column, eluent THF (tetrahydrofuran) was used. The conditions were as follows: the sample concentration was 0.5 mass%, the flow rate was 0.6 ml / min, the sample injection amount was 10 μl, the measurement temperature was 40 ° C., and the RI detector was used. In addition, the calibration curve is “polystyrene standard sample TSK standard” manufactured by Tosoh Corporation: “A-500”, “F-1”, “F-10”, “F-80”, “F-380”, “A-”. It was prepared from 10 samples of “2,500”, “F-4”, “F-40”, “F-128”, and “F-700”.

(Synthesis Example 1)
-Synthesis of Dispersing Resin (I) -1-
In a 1000 ml three-necked flask, 120 g of propylene glycol monomethyl ether was added and heated to 90 ° C. under a nitrogen stream. To this was added dropwise 120 g of propylene glycol monomethyl ether solution of 74 g of benzyl methacrylate, 84 g of methacrylic acid, and 9.7 g of V-601 (manufactured by Wako Pure Chemical Industries, Ltd.) over 2 hours. After completion of dropping, the mixture was further stirred for 2 hours. Thereafter, the reaction solution was cooled to room temperature, and then poured into 8 L of water (liter; the same applies hereinafter) to precipitate a polymer compound. The precipitated polymer compound was collected by filtration, washed with water and dried to obtain 150 g of a polymer compound.
As a result of measuring the weight average molecular weight of the obtained polymer compound by gel permeation chromatography (GPC) using polystyrene as a standard substance, it was 12,000. The acid value of this polymer compound was determined by titration to be 202 mgKOH / g (calculated value 204 mgKOH / g), which is close to the theoretical value 204 mgKOH / g calculated from the charged ratio of benzyl methacrylate to methacrylic acid. From the results, it was found that the composition ratio of benzyl methacrylate and methacrylic acid introduced into the polymer was almost the same as the charged ratio, and it was confirmed that the polymerization was normally performed.

  As described above, 110 mg of p-methoxyphenol was added to 40 g of the polymer compound obtained in a 1000 ml three-necked flask, and 60 g of propylene glycol monomethyl ether was further added and dissolved. To this was further added 820 mg of tetrabutylammonium bromide, and after heating to 80 ° C., 15 g of glycidyl methacrylate was added and stirred for 6 hours. And it was confirmed by gas chromatography that the peak derived from glycidyl methacrylate disappeared. This reaction solution was poured into 7 L of water to precipitate a polymer compound (dispersion resin (I) -1). The precipitated polymer compound was collected by filtration, washed with water and dried to obtain 54 g of the intended dispersion resin (I) -1.

  It was 18100 as a result of measuring a weight average molecular weight by the gel permeation chromatography method (GPC) which used polystyrene as the standard substance about the obtained high molecular compound (dispersion resin (I) -1). Furthermore, when the acid value of this polymer compound was determined by titration, it was 97.6 mgKOH / g (calculated value 98.8 mgKOH / g). Further, the unsaturated equivalent was calculated to be 425 by arithmetic.

—Synthesis of Dispersing Resins (I) -2 to (I) -10—
Dispersion resins (I) -2 to (I) that give the physical properties shown in Table 1 below by adjusting the ratio of monomers to be used and the amount of initiator in the same synthesis method as the above dispersion resin (I) -1. -10 was synthesized.

(Synthesis Example 2)
-Synthesis of Resin (II) -1-
In a 1000 ml three-necked flask, 100 g of 1-methyl-2-pyrrolidone was added and heated to 90 ° C. under a nitrogen stream. To this, 100 g of 1-methyl-2-pyrrolidone solution of 84 g of the following compound (i-1), 33 g of benzyl methacrylate, 23 g of methacrylic acid, and 5.2 g of V-601 (manufactured by Wako Pure Chemical Industries, Ltd.) was taken over 2 hours. It was dripped. After completion of dropping, the mixture was further stirred for 2 hours. Thereafter, the reaction solution was cooled to room temperature and then poured into 7 L of water to precipitate a polymer compound. The precipitated polymer compound was collected by filtration, washed with water and dried to obtain 131 g of a polymer compound.
As a result of measuring the weight average molecular weight of the obtained polymer compound by gel permeation chromatography (GPC) using polystyrene as a standard substance, it was 12800. Further, when the acid value of this polymer compound was determined by titration, it was 69.6 mgKOH / g (calculated value 67.3 mgKOH / g), and it was confirmed that the polymerization was normally performed.

As described above, 1.0 g of p-methoxyphenol was added to 131 g of the high molecular compound obtained in a 1000 ml three-necked flask, and 580 g of 1-methyl-2-pyrrolidone was further added and dissolved, and then in an ice bath containing ice water. Cooled down. After the temperature of the mixed solution became 5 ° C. or lower, 150 g of 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) was further added dropwise over 1 hour using a dropping funnel. After completion of dropping, the ice bath was removed and the mixture was further stirred for 8 hours. The obtained reaction solution was adjusted to pH 7 by adding concentrated hydrochloric acid, and then poured into 7 L of water to precipitate a polymer compound (dispersion resin (II) -1). The precipitated polymer compound was collected by filtration, washed with water and dried to obtain 113 g of the desired dispersion resin (II) -1.
When ¹ H-NMR of the obtained polymer compound (dispersion resin (II) -1) was measured, it was confirmed that 100% of the side chain groups derived from the compound (i-1) were converted to ethylene methacrylate groups. It was done. The weight average molecular weight measured by gel permeation chromatography (GPC) using polystyrene as a standard substance was 10600. Furthermore, when the acid value of this polymer compound was determined by titration, it was 84.7 meq / g (calculated value 84.2 meq / g). The unsaturated equivalent was calculated to be 415.

—Synthesis of Dispersing Resin (II) -2 to (II) -10—
Dispersion resins (II) -2 to (II) that give the physical properties shown in Table 2 below by adjusting the ratio of the monomers used and the amount of the initiator by the same synthesis method as the above dispersion resin (II) -1. -10 was synthesized.

In Reference Examples 1 to 20 shown below, an example in which a curable composition containing a pigment is prepared for forming a color filter for use in a liquid crystal display element will be described.

( Reference Example 1)
-A1. Preparation of curable composition
(A1-1) Preparation of pigment dispersion C.I. I. Pigment Green 36 and C.I. I. 40 parts of 30/70 (mass ratio) mixture with Pigment Yellow 219 (average primary particle diameter: 32 nm), BYK2001 (Disperbyk: manufactured by Big Chemie (BYK), solid content concentration: 45.1%) 50 parts (solid content) About 22.6 parts of conversion), 5 parts of the dispersion resin (I) -1 [(A) dispersion resin in the present invention] synthesized above, and 110 parts of ethyl 3-ethoxypropionate as a solvent were mixed. The pigment dispersion (P1) was prepared by further mixing and dispersing for 15 hours with a bead mill.
≪Measurement of particle size distribution of pigment dispersion≫
For the pigment dispersion (P1), the average particle size of the pigment immediately after preparation was measured by a dynamic light scattering method (measured using Microtrac Nanotrac UPA-EX150 (manufactured by Nikkiso Co., Ltd., without further diluting P1)). It was 61 nm.

(A1-2) Preparation of curable composition (coating liquid) Using the pigment dispersion liquid (P1) obtained above, stirring and mixing were performed to obtain the following composition to prepare a curable composition solution. .
<composition>
-Pigment dispersion (P1)-600 parts-2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenyl-1,2'-biimidazole [(D) light Polymerization initiator] ... 30 parts-Pentaerythritol tetraacrylate [(E) photopolymerizable compound] ... 50 parts-Benzyl methacrylate / methacrylic acid / hydroxyethyl methacrylate (80/10/10 [molar ratio]) copolymer ... 5 Part (Mw: 10,000; alkali-soluble resin [(G) binder polymer)]
Propylene glycol monomethyl ether acetate: 900 parts (PGMEA; (C) solvent)
・ 3-Methacryloxypropyltrimethoxysilane (support adhesion agent) 1 part ・ The following compound α [(F) sensitizer] 15 parts ・ 2-mercaptobenzimidazole [(I) co-sensitizer] 15 Part

-A2. Color filter production
(A2-1) Formation of curable composition layer The curable composition containing the pigment prepared as described above was applied as a resist solution to a 550 mm × 650 mm glass substrate by slit coating under the following conditions, and then left for 10 minutes. It was made to wait in a state, and vacuum drying and prebaking (prebake; 80 degreeC at 100 degreeC) were given, and the curable composition layer was formed.

* Slit application conditions ・ Gap of the opening at the tip of the application head: 50 μm
・ Application speed: 100 mm / second ・ Clearance between substrate and application head: 150 μm
-Dry film thickness: 1.75 μm
・ Application temperature: 23 ℃

(A2-2) Exposure and development Thereafter, this curable composition layer was exposed to a pattern with a 2.5 kW ultrahigh pressure mercury lamp using a test photomask having a line width of 20 μm, and after exposure, the entire surface of the layer was exposed. Was covered with a 10% aqueous solution of an organic developer (trade name: CD, manufactured by FUJIFILM Electronics Materials Co., Ltd.), and developed by resting for 60 seconds.

(A2-3) Heat treatment After resting, pure water was jetted in a shower to wash away the developer, and the curable composition layer that had been pre-baked and developed was heated in an oven at 220 ° C. for 1 hour (post) Bake). Thereby, the color filter in which the coloring pattern formed by hardening the curable composition layer on the glass substrate was obtained.

-A3. Performance evaluation
Storage stability of the solution (coating solution) of the curable composition prepared above, and exposure sensitivity of the curable composition layer formed on the glass substrate using the curable composition, substrate adhesion, developability, The pattern cross-sectional shape was evaluated as follows. The evaluation results are shown in Table 3 below.

(A3-1) Storage stability of curable composition over time After the curable composition (coating liquid) prepared above was stored at room temperature for 1 month, the viscosity of the liquid was measured using an E-type viscometer (manufactured by Tokyo Keiki Co., Ltd.). ) And evaluated according to the following criteria.
-Evaluation criteria-
○: No increase in viscosity was observed.
Δ: An increase in viscosity of 5% or more and less than 10% with respect to the viscosity before storage was observed.
X: A viscosity increase of 10% or more with respect to the viscosity before storage was observed.

(A3-2) Exposure Sensitivity of Curable Composition Layer The curable composition layer after coating was exposed by changing the exposure amount to various exposure amounts in the range of 10 to 100 mJ / cm ² , and after post-baking. The exposure amount at which the pattern line width was 20 μm was evaluated as the exposure sensitivity. The exposure sensitivity indicates higher sensitivity as the value is smaller.

(A3-3) Developability, pattern cross-sectional shape, substrate adhesiveness The substrate surface after post-baking and the cross-sectional shape of the pattern were confirmed by observation with an optical microscope and SEM photograph. The cross-sectional shape and substrate adhesion were evaluated. Details of the evaluation method and evaluation criteria are as follows.

<Developability>
In the above (A2-2) exposure and development, the presence or absence of a residue in a region not irradiated with light (unexposed portion) was observed, and developability was evaluated according to the following evaluation criteria.
-Evaluation criteria-
○: No residue was observed in the unexposed area.
Δ: A slight residue was confirmed in the unexposed area, but there was no practical problem.
X: Residue was remarkably confirmed in the unexposed part.

<Pattern cross section shape>
The cross-sectional shape of the formed colored pattern was observed and evaluated. The pattern cross-sectional shape is most preferably a forward taper, and a rectangular shape is next preferred. Reverse taper is not preferred.

<Board adhesion>
The substrate adhesion was evaluated according to the following evaluation criteria by observing whether or not pattern defects occurred.
-Evaluation criteria-
○: No pattern defect was observed.
Δ: Pattern defects were hardly observed, but some defects were observed.
X: A pattern defect was remarkably observed.

( Reference Examples 2 to 16)
In the curable composition prepared in Reference Example 1, resin (I) -1 was replaced with resins (I) -2 to (I) -8 and resins (II) -1 to (II) as shown in Table 3 below. A curable composition was prepared and a color filter was prepared in the same manner as in Reference Example 1 except that each was replaced with −8, and the same evaluation as in Reference Example 1 was performed. The evaluation results are shown in Table 3 below.

( Reference Examples 17 to 20)
In the curable composition prepared in Reference Example 1, resin (I) -1 was replaced with resin (I) -9 or (I) -10, resin (II) -9 or (II) as shown in Table 3 below. A curable composition was prepared and a color filter was prepared in the same manner as in Reference Example 1 except that each was replaced with −10, and the same evaluation as in Reference Example 1 was performed. The evaluation results are shown in Table 3 below.

From the results in Table 3, it can be seen that the curable compositions of the respective reference examples are excellent in storage stability in the solution state. In addition, when a colored pattern is formed on a substrate using this curable composition, a color filter having high exposure sensitivity, excellent developability, and excellent substrate adhesion and pattern cross-sectional shape is obtained. You can see that it was obtained. This was particularly good when the dispersion resin according to the present invention having an unsaturated equivalent of less than 600 was used.

Next, in Reference Examples 21 to 40 shown below, an example in which a curable composition containing a pigment is prepared for forming a color filter for use in a solid-state imaging device will be described.

( Reference Example 21)
-B1. Preparation of resist solution
Components of the following composition were mixed and dissolved to prepare a resist solution.
<Composition of resist solution>
Propylene glycol monomethyl ether acetate 19.20 parts (PGMEA: (C) solvent)
-Ethyl lactate [(C) solvent] ... 36.67 parts-40% propylene glycol monomethyl ether acetate of benzyl methacrylate / methacrylic acid / -2-hydroxyethyl methacrylate (molar ratio = 60/22/18) copolymer (PGMEA) Solution [(G) Binder Polymer)] 30.51 parts Dipentaerythritol hexaacrylate [(E) ethylenically unsaturated double bond-containing photopolymerizable compound] 12.20 parts Polymerization inhibitor (P-methoxyphenol): 0.0061 part Fluorosurfactant: 0.83 part (F-475, manufactured by Dainippon Ink & Chemicals, Inc.)
-TAZ-107 0.586 parts (manufactured by Midori Kagaku; trihalomethyltriazine-based (D) photopolymerization initiator)

-B2. Fabrication of silicon wafer with undercoat layer
A 6 inch silicon wafer was heat-treated in an oven at 200 ° C. for 30 minutes. Next, the resist solution is applied onto the silicon wafer so that the dry film thickness is 1.5 μm, and further heated and dried in an oven at 220 ° C. for 1 hour to form an undercoat layer. A silicon wafer substrate with an undercoat layer Got.

-B3. Preparation of pigment dispersion-
As a pigment, C.I. I. CI Pigment Blue 15: 6 (average primary particle size 32 nm) 95 parts, BYK2001 (Disperbyk: BYK Corporation (BYK), solid content concentration 45.1%) 35.5 parts (solid content conversion about 16 parts), A mixed liquid prepared by mixing 31 parts of the dispersion resin (I) -1 [(A) dispersion resin in the present invention] synthesized above and 830 parts of propylene glycol monomethyl ether acetate as a solvent was mixed and dispersed by a bead mill for 15 hours. A pigment dispersion (P2) was prepared.
With respect to the pigment dispersion (P2), the average particle diameter of the pigment immediately after preparation was measured by a dynamic light scattering method, whereby it was 200 nm.

-B4. Preparation of curable composition (coating solution)
Using the pigment dispersion (P2) obtained above, stirring and mixing were performed to obtain the following composition to prepare a solution of the curable composition.
<composition>
-Pigment dispersion liquid (P2) ... 600 parts-Irgacure 907 ... 5 parts (Ciba Specialty Chemicals; acetophenone-based (D) photopolymerization initiator)
Dipentaerythritol hexaacrylate [(E) photopolymerizable compound] 15 parts Propylene glycol monomethyl ether acetate 280 parts (PGMEA; (C) solvent)

-B5. Preparation and evaluation of color filter with curable composition-
(B5-1) Formation of pattern and evaluation of sensitivity The curable composition prepared as described above was prepared using the B2. The colored layer (coating film) was formed by coating on the undercoat layer of the silicon wafer with the undercoat layer obtained in (1). Then, heat treatment (pre-baking) was performed for 120 seconds using a hot plate at 100 ° C. so that the dry film thickness of the coating film became 0.7 μm.
Next, using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.), various exposure doses in the range of 50 to 1200 mJ / cm ² through an Island pattern mask having a pattern of 1.5 μm square at a wavelength of 365 nm. And exposed.
Thereafter, the silicon wafer substrate on which the coating film after exposure is formed is placed on a horizontal rotary table of a spin shower developing machine (DW-30 type, manufactured by Chemitronics Co., Ltd.), and CD-2000 (Fuji Film Electronics Material). Paddle development was performed at 23 ° C. for 60 seconds to form a colored pattern on the silicon wafer.

  A silicon wafer on which a colored pattern is formed is fixed to the horizontal rotary table by a vacuum chuck method, and pure water is supplied from above the rotation center while rotating the silicon wafer at a rotation speed of 50 rpm by a rotating device. A rinsing process was performed by supplying a shower from a jet nozzle, followed by spray drying.

  Thereafter, the size of the colored pattern was measured using a length measuring SEM “S-9260A” (manufactured by Hitachi High-Technologies Corporation). The exposure amount at which the pattern line width was 1.5 μm was evaluated as the exposure sensitivity. As the exposure sensitivity is smaller, the sensitivity is higher. The measurement results are shown in Table 4 below.

(B5-2) Performance Evaluation For evaluations other than sensitivity, the storage stability of the solution (coating liquid) of the curable composition prepared above, and the curable composition formed on the glass substrate using the curable composition exposure sensitivity of the object layer, substrate adhesion, developability, and pattern cross-sectional shape, in reference example 1 above A3. Evaluation was performed in the same manner as the performance evaluation (A3-1 to A3-3). The evaluation results are shown in Table 4 below.
In addition, about pattern cross-sectional shape, a rectangle is preferable and a reverse taper is not preferable.

( Reference Examples 22 to 36)
In the curable composition prepared in Reference Example 21, resin (I) -1 was replaced with resins (I) -2 to (I) -8 and resins (II) -1 to (II) as shown in Table 4 below. A curable composition was prepared and a color filter was prepared in the same manner as in Reference Example 21 except that each was replaced with −8, and the same evaluation as in Reference Example 21 was performed. The evaluation results are shown in Table 4 below.

(Comparative Examples 37-40)
In the curable composition prepared in Reference Example 21, resin (I) -1 was replaced with resin (I) -9 or (I) -10, resin (II) -9 or (II) as shown in Table 4 below. A curable composition was prepared and a color filter was prepared in the same manner as in Reference Example 21 except that each was replaced with −10, and the same evaluation as in Reference Example 21 was performed. The evaluation results are shown in Table 4 below.

From the results of Table 4, it can be seen that the curable compositions (pigment-based) of each Reference Example used for forming a color filter for a solid-state imaging device are excellent in storage stability in the solution state. . In addition, when a colored pattern is formed on a support using this curable composition, the color filter has high exposure sensitivity, excellent developability, and excellent substrate adhesion and pattern cross-sectional shape. It can be seen that This was particularly good when the dispersion resin according to the present invention having an unsaturated equivalent of less than 600 was used.
From these results, the curable composition of the reference example achieves excellent pattern formability even when producing a color filter for use in a solid-state imaging device, as in the case of producing a color filter for use in a liquid crystal display device. I found out that

Furthermore, in Reference Examples 41 to 43, Examples 44 to 49, Reference Examples 50 to 63, Examples 64 to 74, Reference Examples 75 to 76, Examples 77 to 79, and Comparative Examples 1 to 9 shown below, solids An example of preparing a curable composition containing a pigment for forming a color filter for use in an imaging device will be given.

(Synthesis Example 3)
-Synthesis of Dispersing Resin (I) -11-
In a 1000 ml three-necked flask, 120 g of propylene glycol monomethyl ether was added and heated to 90 ° C. under a nitrogen stream. To this was added dropwise 120 g of propylene glycol monomethyl ether solution of 74 g of benzyl methacrylate, 84 g of methacrylic acid, and 9.7 g of V-601 (manufactured by Wako Pure Chemical Industries, Ltd.) over 2 hours. After completion of dropping, the mixture was further stirred for 2 hours. Thereafter, the reaction solution was cooled to room temperature, and then poured into 8 L of water (liter; the same applies hereinafter) to precipitate a polymer compound. The precipitated polymer compound was collected by filtration, washed with water and dried to obtain 150 g of a polymer compound.
As a result of measuring the weight average molecular weight of the obtained polymer compound by gel permeation chromatography (GPC) using polystyrene as a standard substance, it was 12,000. The acid value of this polymer compound was determined by titration to be 202 mgKOH / g (calculated value 204 mgKOH / g), which is close to the theoretical value 204 mgKOH / g calculated from the charged ratio of benzyl methacrylate to methacrylic acid. From the results, it was found that the composition ratio of benzyl methacrylate and methacrylic acid introduced into the polymer was almost the same as the charged ratio, and it was confirmed that the polymerization was normally performed.

As described above, 110 mg of p-methoxyphenol was added to 40 g of the polymer compound obtained in a 1000 ml three-necked flask, and 60 g of propylene glycol monomethyl ether was further added and dissolved. To this was further added 820 mg of tetrabutylammonium bromide, and after heating to 80 ° C., 15 g of glycidyl methacrylate was added and stirred for 6 hours. And it was confirmed by gas chromatography that the peak derived from glycidyl methacrylate disappeared. This reaction solution was poured into 7 L of water to precipitate a polymer compound (dispersion resin (I) -11). The precipitated polymer compound was collected by filtration, washed with water and dried to obtain 54 g of the intended dispersion resin (I) -11.
It was 10200 as a result of measuring a weight average molecular weight by the gel permeation chromatography method (GPC method) which used polystyrene as the standard substance about obtained dispersion resin (I) -11. The unsaturated equivalent was calculated as 265.

—Synthesis of Dispersing Resins (I) -12 to (I) -24—
Dispersion resins (I) -12 to (I) that give the physical properties shown in Table 5 below by adjusting the ratio of monomers used and the amount of initiator in the same synthesis method as dispersion resin (I) -11. -24 was synthesized.

(Synthesis Example 4)
-Synthesis of Resin (II) -11-
In a 1000 ml three-necked flask, 100 g of 1-methyl-2-pyrrolidone was added and heated to 90 ° C. under a nitrogen stream. To this, 100 g of 1-methyl-2-pyrrolidone solution of 84 g of the above compound (i-1), 33 g of benzyl methacrylate, 23 g of methacrylic acid, and 5.2 g of V-601 (manufactured by Wako Pure Chemical Industries, Ltd.) was taken over 2 hours. And dripped. After completion of dropping, the mixture was further stirred for 2 hours. Thereafter, the reaction solution was cooled to room temperature and then poured into 7 L of water to precipitate a polymer compound. The precipitated polymer compound was collected by filtration, washed with water and dried to obtain 131 g of a polymer compound.

In a 1000 ml three-necked flask, 131 g of the polymer compound obtained above and 1.0 g of p-methoxyphenol were added, and 580 g of 1-methyl-2-pyrrolidone was further added and dissolved, followed by cooling in an ice bath containing ice water. . After the temperature of the mixed solution became 5 ° C. or lower, 150 g of 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) was further added dropwise over 1 hour using a dropping funnel. After completion of dropping, the ice bath was removed and the mixture was further stirred for 8 hours. The obtained reaction solution was adjusted to pH 7 by adding concentrated hydrochloric acid, and then poured into 7 L of water to precipitate a polymer compound (dispersion resin (II) -11). The precipitated polymer compound was collected by filtration, washed with water, and dried to obtain 113 g of the desired dispersion resin (II) -11.
When ¹ H-NMR of the obtained polymer compound (dispersion resin (II) -11) was measured, it was confirmed that 100% of the side chain groups derived from the compound (i-1) were converted to ethylene methacrylate groups. It was done. The weight average molecular weight measured by gel permeation chromatography method (GPC method) using polystyrene as a standard substance was 9800. The unsaturated equivalent weight was calculated to be 255.

—Synthesis of Dispersing Resin (II) -12 to (II) -24—
Dispersion resins (II) -12 to (II) that give the physical properties shown in Table 5 below by adjusting the ratio of monomers to be used and the amount of initiator by the same synthesis method as the above dispersion resin (II) -11 -24 was synthesized.

(Synthesis Example 5)
In the same manner as in Synthesis Examples 3 to 4, the following dispersion resin (III) and dispersion resin (IV) were synthesized.

( Reference Example 41)
-Step 1: Preparation of pigment dispersion-
A liquid in which the following components were mixed was dispersed with a bead mill for 1 hour under the conditions that the zirconia bead diameter was 0.1 mm and the bead filling rate was 40%, to prepare a pigment dispersion liquid (Q1).
<Composition>
・ C. I. Pigment Blue 15: 6 (average primary particle size 32 nm: pigment) ... 10.12 parts / L147 (manufactured by Sanyo Dye Co., Ltd., solid content concentration 50%; dispersant) ... 3.04 parts (solid content) (Conversion 1.52 parts)
-Dispersion resin (I) -11 synthesized above-3.56 parts-Propylene glycol monomethyl ether acetate (PGMEA; solvent) ... 63.63 parts-Cyclohexanone (solvent) ) 21.19 parts

≪Measurement of particle size distribution of pigment dispersion≫
For the purpose of suppressing the shock aggregation of the pigment, the pigment dispersion (Q1) prepared in Step 1 was used as a solvent and a dispersant (PGMEA: Cyclohexone: L147 = 20.9: 6.96). 1) and gradually diluted to a pigment concentration of 2% ± 0.1%. For the diluted pigment dispersion, the particle size distribution is measured using a particle size distribution measuring apparatus based on a dynamic light scattering method (frequency analysis method) [Microtrac Nanotrac UPA-EX150 particle size analyzer (manufactured by Nikkiso Co., Ltd.)]. It was measured. As a result of the measurement, D90 was 0.035 μm and Fmax was 0.019 μm.
D90 is a particle diameter (μm) corresponding to 90% of the cumulative amount when the total amount is 100% when counting the cumulative amount from the small size particles in the pigment dispersion composition. Fmax is defined as the particle diameter (μm) at which the particle abundance is maximum in the particle size distribution of the pigment dispersion.

-Step 3: Preparation of base solution-
Components of the following composition were mixed and dissolved to prepare a base solution.
<Composition of base solution>
Benzyl methacrylate / methacrylic acid copolymer: 16.4 parts (molar ratio 70/30, mass average molecular weight 30,000; resin)
Dipentaerythritol pentaacrylate (monomer) 6.5 parts Irgacure OXE01 0.3 parts (Ciba Specialty Chemicals: Oxime-based photopolymerization initiator)
Solvent 1: propylene glycol monomethyl ether acetate 13.8 parts Solvent 2: ethyl-3-ethoxypropionate 12.3 parts

-Step 4: Preparation of silicon wafer coated with base solution-
A 6 inch silicon wafer was heat-treated in an oven at 200 ° C. for 30 minutes. Next, the above base solution was applied onto this silicon wafer so as to have a dry film thickness of 1.0 μm, and further dried by heating in an oven at 220 ° C. for 1 hour to form a base layer. In this way, a silicon wafer with an underlayer was obtained.

-Step 5: Preparation of curable composition (color resist solution)-
Using the pigment dispersion (Q1) obtained as described above, a curable composition was prepared by stirring and mixing to obtain the following composition.
<Composition of curable composition>
-Pigment dispersion liquid (Q1)-600 parts-Irgacure OXE01-5 parts (Ciba Specialty Chemicals; oxime-based photopolymerization initiator)
・ Dipentaerythritol hexaacrylate (monomer) 15 parts ・ Propylene glycol monomethyl ether acetate (solvent) 280 parts

-Step 6: Production of a color filter with a curable composition-
The curable composition prepared as described above was applied onto the underlayer of the silicon wafer with an underlayer obtained in Step 4 to form a colored layer (coating film). Then, heat treatment (pre-baking) was performed for 120 seconds using a hot plate at 100 ° C. so that the dry film thickness of the coating film became 0.7 μm.
Next, using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.), various exposure doses in the range of 50 to 1200 mJ / cm ² through an Island pattern mask having a pattern of 1.5 μm square at a wavelength of 365 nm. And exposed.
Thereafter, the silicon wafer substrate on which the coating film after exposure is formed is placed on a horizontal rotary table of a spin shower developing machine (DW-30 type, manufactured by Chemitronics Co., Ltd.), and CD-2000 (Fuji Film Electronics Material). Paddle development was carried out at 23 ° C. for 60 seconds to form a colored pattern on the silicon wafer with the underlayer.
A silicon wafer with an underlayer on which a colored pattern is formed is fixed to the horizontal rotary table by a vacuum chuck method, and the silicon wafer with an underlayer is rotated at a rotation speed of 50 r. p. m. While being rotated, the pure water was supplied from the upper part of the rotation center in the form of a shower and rinsed, and then spray-dried to obtain a color filter.

-Step 7. Performance evaluation
[Evaluation of roughness]
A glass substrate coated with the monochromatic pigment dispersion (Q1) obtained in Step 1 and dried is prepared, and this glass substrate is placed between the observation lens and the light source of the optical microscope to use the light as the observation lens. The state of the transmitted light when irradiated toward was observed with an optical microscope provided with a digital camera with a magnification of 1000 times. The digital camera installed in this optical microscope is equipped with a CCD with 1.28 million pixels and photographed the film surface through which light passes. The captured image was stored as digitally converted data (digital image) in an 8-bit bitmap format. The film surface was photographed on 20 arbitrarily selected areas. In addition, the digitally converted data was stored by digitizing the captured image as a density distribution of 256 gradations from 0 to 255 for each of the three primary colors of RGB.
Next, the stored digital image was partitioned in a lattice shape so that one lattice size corresponds to 2 μm square on the actual substrate, and the luminance in one partition was averaged. In this reference example , since an image of optical 1000 times was taken with a 1.28 million pixel digital camera, 2 μm on the actual substrate was 2 mm on the taken image, and the image size on the display was 452 mm × 352 mm. The total number of sections in one area was 39976.
And about all the divisions of each area | region, the average brightness | luminance of arbitrary 1 division and the average brightness | luminance of all the adjacent divisions adjacent to it were measured. A zone where the difference between the measured average brightness of any one zone and the average brightness of adjacent zones is 5 or more is recognized as a significant zone, the average total number of significant zones in all areas, and the average of the significant zones in all areas The ratio of the total number to the total number of partitions (39976) in each region was calculated. The ratio of the significant difference sections to the total number of sections was used as an index for performing roughness evaluation (rough evaluation) of images, and evaluated according to the following evaluation criteria. The evaluation results are shown in Tables 6 to 7 below.
<Evaluation criteria>
◯: The ratio of significant difference blocks to the total number of blocks is less than 4%.
○: The ratio of significant difference blocks to the total number of blocks is 4% or more and less than 6%.
Δ: The ratio of significant difference sections to the total number of sections is 6% or more and less than 8%. ×: The ratio of significant difference sections to the total number of sections is 8% or more and less than 10%.
XX: The ratio of significant difference sections to the total number of sections is 10% or more.

[Evaluation of pattern shape]
Using the length measurement SEM (S-9260S, manufactured by Hitachi, Ltd.), the colored pattern prepared in Step 6 using the curable composition (containing the pigment dispersion (Q1)) prepared in Step 5 above. Observed. As an observation object, a pattern shape of a 1.5 μm square square pixel pattern was selected. At this time, the following method was used as a pattern evaluation method, and evaluation was performed according to the following evaluation criteria. The evaluation results are shown in Tables 6 to 7 below.
As the worst shape of the pattern, it is assumed that the pattern is circular as shown in FIGS. 1 (a) and 2 (a), and the best shape is shown in FIGS. 1 (b) and 2 (b). Assuming that the pattern is square as shown in FIG. 1C and FIG. 2C, when one side of the pattern is A and its diagonal is B, B is the ratio. / A (this is defined as the rectangular ratio) moves in the range of 1 ≦ B / A ≦ 2 ^1/2 . Here, as the rectangular ratio B / A is closer to 1, the pattern shape is closer to a circle, and as the rectangular ratio is closer to 2 ^1/2 (= 1.414...), The pattern shape is closer to a rectangle. It becomes.
<Evaluation criteria>
◯: Rectangular ratio B / A is 1.35 or more.
○: Rectangular ratio B / A is 1.25 or more and less than 1.35.
Δ: Rectangular ratio B / A is 1.15 or more and less than 1.25.
X: Rectangular ratio B / A is 1.1 or more and less than 1.15.
Xx: Rectangular ratio B / A is less than 1.1.

[Evaluation of development residue]
The peripheral portion of the colored pattern formed in Step 6 and the space between the colored patterns are observed using a length measuring SEM (S-9260S, manufactured by Hitachi, Ltd.), and the degree of development residue such as deposits and undissolved residue is observed. Was observed. As an observation object, a 1.5 μm square pixel pattern shape was selected and evaluated according to the following evaluation criteria. The evaluation results are shown in Tables 6 to 7 below.
<Evaluation criteria>
◯: As shown in FIG. 3A, there was no residue between the pattern periphery and the pattern.
○: As shown in FIG. 3B, a slight residue was observed between the periphery of the pattern and between the patterns.
Δ: As shown in FIG. 3C, a small amount of residue was observed between the pattern periphery and the pattern.
X: As shown in FIG.3 (d), the residue was seen by the peripheral part of the pattern and between patterns.
XX: As shown in FIG. 3 (e), a residue was remarkably observed in the periphery of the pattern and between the patterns.

[Evaluation of heat resistance]
A glass substrate with an underlayer on which a colored pattern is formed is placed on a hot plate so as to be in contact with the glass substrate surface, heated at 200 ° C. for 1 hour, and then a chromaticity meter MCPD-1000 (manufactured by Otsuka Electronics Co., Ltd.) is used. Used to measure the chromaticity change in the colored pattern, ie, the ΔEab value. The ΔEab value indicates that the smaller the value, the better the heat resistance. The evaluation results are shown in Tables 6 to 7 below.

( Reference Examples 42-43, Examples 44-49, Reference Examples 50-63, Examples 64-74, Reference Examples 75-76, Examples 77-79, Comparative Examples 1-9)
In Reference Example 41, the dispersion resin (I) -11 [dispersion resin in the present invention] used in Step 1 was changed as shown in the following Tables 6 to 7, and the dispersion conditions were changed (dispersion time, beads). The pigment dispersions (Q2) to (Q51) were prepared in the same manner as in Reference Example 41 except that the amount was adjusted by the amount and the bead diameter), the particle size distribution was measured, and a curable composition and a color filter were produced. .
Further, the same performance evaluation as that in Step 7 of Reference Example 41 was performed on each obtained color filter.

  As shown in Tables 6 to 7, in the examples using the dispersion resin in the present invention, “zara” which is one of important performances in the color filter, and all of the pattern shape, residue, and heat resistance are excellent. It was.

( Reference Examples 80 to 82, Examples 83 to 85, Reference Examples 86 to 89, Examples 90 to 93, Reference Examples 94 to 95, Examples 96 to 99, Reference Examples 100 to 101, and Comparative Examples 13 to 20)
In Reference Example 41, pigment dispersions (Q52) to (Q81) were prepared in the same manner as in Reference Example 41 except that the type and particle size distribution of the dispersion resin were changed as shown in Table 8 below. In addition, a curable composition and a color filter were prepared. Further, the same performance evaluation as in step 7 of Reference Example 41 was performed.
The particle size distribution was adjusted by changing the dispersion conditions (dispersion time, bead amount, bead diameter).

  As shown in Table 8, in Examples using the dispersion resin in the present invention, “zara” which is one of important performances in the color filter, and the pattern shape, residue, and heat resistance were all excellent.

( Reference Examples 102 to 104, Examples 105 to 107, Reference Examples 108 to 111, Examples 112 to 115, Reference Examples 116 to 117, Examples 118 to 120, Reference Example 121, and Comparative Examples 21 to 24)
Reference Example 41, instead of the step 1 of preparing a pigment dispersion in the following step 8, except for changing the kind and particle size distribution of the dispersed resin, as shown in Table 9, in the same manner as in Reference Example 41, Pigment dispersions (R1) to (R24) were prepared, the particle size distribution was measured, and a curable composition and a color filter were further produced. Further, the same performance evaluation as in step 7 of Reference Example 41 was performed.
The particle size distribution was adjusted by changing the dispersion conditions (dispersion time, bead amount, bead diameter).

-Step 8: Preparation of pigment dispersion-
A liquid in which the following components were mixed was dispersed with a bead mill for 1 hour under the condition that the zirconia bead diameter was 0.1 mm and the bead filling rate was 40% to prepare a pigment dispersion.
<Composition>
・ C. I. Pigment Green 36 (average primary particle size 30 nm: pigment) 15 parts / F411 (manufactured by Sanyo Dye Co., Ltd., solid content concentration 80%; dispersant) 5.0 parts (4.0 parts in terms of solid content)
-Dispersed resin shown above in Table 9 ... 7.5 parts-Propylene glycol monomethyl ether acetate (PGMEA; solvent) ... 72.5 parts

  As shown in Table 9, in Examples using the dispersion resin in the present invention, “zara” which is one of important performances in the color filter, and the pattern shape, residue, and heat resistance were all excellent.

(A) is a figure showing the pattern of the worst shape, (b) is a figure showing the pattern of the best shape, and (c) is a figure showing the pattern shape with rounded four corners. (A) is a figure showing the pattern of the worst shape, (b) is a figure showing the pattern of the best shape, and (c) is a figure showing the pattern shape with rounded four corners. (A) is a figure which shows a mode that there is no residue between a pattern peripheral part and a pattern, (b) is a figure which shows a mode that a residue has arisen slightly between a pattern peripheral part and a pattern, (c) It is a figure which shows a mode that a small amount of residue has arisen between a pattern peripheral part and a pattern, (d) is a figure which shows a mode that a residue has arisen between a pattern peripheral part and a pattern, (e) is a pattern peripheral It is a figure which shows a mode that the residue has arisen notably between a part and a pattern.

Claims (6)

(A) a polymer compound having at least one selected from structural units represented by the following general formula (1) or (2), (B) a pigment, (C) a solvent, and (D) photopolymerization initiation A curable composition containing an oxime compound as an agent.


[Wherein R ¹ , R ² , R ³ , R ⁴ , R ⁵ , R ⁶ , R ⁷ , R ⁸ , R ⁹ , R ¹⁰ , R ¹¹ , and R ¹² are each independently a hydrogen atom, or Represents a monovalent organic group. A ¹ and A ² each independently represent an oxygen atom, a sulfur atom, or —N (R ²¹ ) —, and R ²¹ represents an alkyl group that may have a substituent. G ¹ and G ² each independently represent an alkylene group having no substituent . X represents an oxygen atom, a sulfur atom, or —N (R ²² ) —, and R ²² represents an alkyl group which may have a substituent. Y represents an oxygen atom, a sulfur atom, a phenylene group which may have a substituent, or —N (R ²³ ) —, and R ²³ represents an alkyl group which may have a substituent. ]   The curable composition according to claim 1, wherein the (A) polymer compound has an unsaturated equivalent of less than 600.   (E) The curable composition according to claim 1, further comprising a photopolymerizable compound.   The curable composition according to any one of claims 1 to 3, wherein the oxime compound is 2-benzoyloxyimino-4 '-(phenylthio) octanophenone.   The color filter which has a coloring pattern formed with the curable composition of any one of Claims 1-4 on a support body. A colored layer forming step of forming a colored layer by applying the curable composition according to any one of claims 1 to 4 on a support,
An exposure step of exposing the colored layer in a pattern-like manner through a mask;
A development step of developing the colored layer after exposure to form a colored pattern;
A method for producing a color filter comprising: