KR101953936B1 - Black photosensitive resin composition, black matrix and image display device having the same - Google Patents
Black photosensitive resin composition, black matrix and image display device having the same Download PDFInfo
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- KR101953936B1 KR101953936B1 KR1020140112934A KR20140112934A KR101953936B1 KR 101953936 B1 KR101953936 B1 KR 101953936B1 KR 1020140112934 A KR1020140112934 A KR 1020140112934A KR 20140112934 A KR20140112934 A KR 20140112934A KR 101953936 B1 KR101953936 B1 KR 101953936B1
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- KR
- South Korea
- Prior art keywords
- group
- carbon atoms
- black
- weight
- photosensitive resin
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 33
- 239000011159 matrix material Substances 0.000 title claims abstract description 23
- 150000001875 compounds Chemical class 0.000 claims description 45
- 239000000049 pigment Substances 0.000 claims description 44
- 229920005989 resin Polymers 0.000 claims description 44
- 239000011347 resin Substances 0.000 claims description 44
- -1 -OR 15 Chemical group 0.000 claims description 42
- 125000004432 carbon atom Chemical group C* 0.000 claims description 38
- 239000011230 binding agent Substances 0.000 claims description 28
- 239000003999 initiator Substances 0.000 claims description 27
- 239000002904 solvent Substances 0.000 claims description 17
- 125000000217 alkyl group Chemical group 0.000 claims description 14
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 13
- 125000002091 cationic group Chemical group 0.000 claims description 10
- 125000005843 halogen group Chemical group 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 9
- 150000008065 acid anhydrides Chemical group 0.000 claims description 8
- 125000002947 alkylene group Chemical group 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 6
- 125000001424 substituent group Chemical group 0.000 claims description 6
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 5
- 125000000732 arylene group Chemical group 0.000 claims description 4
- 125000002993 cycloalkylene group Chemical group 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000000758 substrate Substances 0.000 abstract description 18
- 230000000052 comparative effect Effects 0.000 description 23
- 238000000034 method Methods 0.000 description 20
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 18
- 239000002253 acid Substances 0.000 description 18
- 239000002270 dispersing agent Substances 0.000 description 18
- 239000006229 carbon black Substances 0.000 description 16
- 238000010586 diagram Methods 0.000 description 14
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 13
- 229930185605 Bisphenol Natural products 0.000 description 11
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- 239000000203 mixture Substances 0.000 description 10
- 238000004299 exfoliation Methods 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 8
- 239000000178 monomer Substances 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 7
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 239000004094 surface-active agent Substances 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 5
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 5
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 5
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 239000012965 benzophenone Substances 0.000 description 4
- 239000003013 cathode binding agent Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 3
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Natural products CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 239000002318 adhesion promoter Substances 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- DBGSRZSKGVSXRK-UHFFFAOYSA-N 1-[2-[5-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]acetyl]-3,6-dihydro-2H-pyridine-4-carboxylic acid Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1=NN=C(O1)CC(=O)N1CCC(=CC1)C(=O)O DBGSRZSKGVSXRK-UHFFFAOYSA-N 0.000 description 2
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 2
- GBOJZXLCJZDBKO-UHFFFAOYSA-N 2-(2-chlorophenyl)-2-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 GBOJZXLCJZDBKO-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- WJQOZHYUIDYNHM-UHFFFAOYSA-N 2-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC=C1O WJQOZHYUIDYNHM-UHFFFAOYSA-N 0.000 description 2
- BZCWFJMZVXHYQA-UHFFFAOYSA-N 3-dimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[SiH](OC)CCCOC(=O)C(C)=C BZCWFJMZVXHYQA-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- LNONZTZEQHLTIZ-UHFFFAOYSA-N [4-(9H-fluoren-1-yl)phenyl] 2-aminoacetate Chemical compound NCC(=O)OC1=CC=C(C=C1)C1=CC=CC=2C3=CC=CC=C3CC1=2 LNONZTZEQHLTIZ-UHFFFAOYSA-N 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 2
- 229920005822 acrylic binder Polymers 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 2
- 230000001588 bifunctional effect Effects 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910001919 chlorite Inorganic materials 0.000 description 2
- 229910052619 chlorite group Inorganic materials 0.000 description 2
- QBWCMBCROVPCKQ-UHFFFAOYSA-N chlorous acid Chemical compound OCl=O QBWCMBCROVPCKQ-UHFFFAOYSA-N 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 125000006159 dianhydride group Chemical group 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 235000010187 litholrubine BK Nutrition 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 2
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 150000002898 organic sulfur compounds Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- LCPDWSOZIOUXRV-UHFFFAOYSA-N phenoxyacetic acid Chemical compound OC(=O)COC1=CC=CC=C1 LCPDWSOZIOUXRV-UHFFFAOYSA-N 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000012719 thermal polymerization Methods 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- HHQAGBQXOWLTLL-UHFFFAOYSA-N (2-hydroxy-3-phenoxypropyl) prop-2-enoate Chemical compound C=CC(=O)OCC(O)COC1=CC=CC=C1 HHQAGBQXOWLTLL-UHFFFAOYSA-N 0.000 description 1
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 description 1
- KMOUUZVZFBCRAM-UHFFFAOYSA-N 1,2,3,6-tetrahydrophthalic anhydride Chemical compound C1C=CCC2C(=O)OC(=O)C21 KMOUUZVZFBCRAM-UHFFFAOYSA-N 0.000 description 1
- OXFSTTJBVAAALW-UHFFFAOYSA-N 1,3-dihydroimidazole-2-thione Chemical compound SC1=NC=CN1 OXFSTTJBVAAALW-UHFFFAOYSA-N 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- HMLSBRLVTDLLOI-UHFFFAOYSA-N 1-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)C(C)OC(=O)C(C)=C HMLSBRLVTDLLOI-UHFFFAOYSA-N 0.000 description 1
- BOGFHOWTVGAYFK-UHFFFAOYSA-N 1-[2-(2-propoxyethoxy)ethoxy]propane Chemical compound CCCOCCOCCOCCC BOGFHOWTVGAYFK-UHFFFAOYSA-N 0.000 description 1
- OSNILPMOSNGHLC-UHFFFAOYSA-N 1-[4-methoxy-3-(piperidin-1-ylmethyl)phenyl]ethanone Chemical compound COC1=CC=C(C(C)=O)C=C1CN1CCCCC1 OSNILPMOSNGHLC-UHFFFAOYSA-N 0.000 description 1
- MLRCQIICAYVJHD-UHFFFAOYSA-N 1-but-1-enoxybut-1-ene Chemical compound CCC=COC=CCC MLRCQIICAYVJHD-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- XXIWEINLJFAWFR-UHFFFAOYSA-N 1-ethenylpyrrolidin-2-one;2-hydroxyethyl prop-2-enoate Chemical compound C=CN1CCCC1=O.OCCOC(=O)C=C XXIWEINLJFAWFR-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- HOQAPVYOGBLGOC-UHFFFAOYSA-N 1-ethyl-9h-carbazole Chemical group C12=CC=CC=C2NC2=C1C=CC=C2CC HOQAPVYOGBLGOC-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- VYOKOQDVBBWPKO-UHFFFAOYSA-N 1-nitro-9h-carbazole Chemical compound N1C2=CC=CC=C2C2=C1C([N+](=O)[O-])=CC=C2 VYOKOQDVBBWPKO-UHFFFAOYSA-N 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 1
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 1
- IMQFZQVZKBIPCQ-UHFFFAOYSA-N 2,2-bis(3-sulfanylpropanoyloxymethyl)butyl 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(CC)(COC(=O)CCS)COC(=O)CCS IMQFZQVZKBIPCQ-UHFFFAOYSA-N 0.000 description 1
- UIJSCOPBBPNHFC-UHFFFAOYSA-N 2,2-dichloro-2-phenylethanethioic s-acid Chemical compound SC(=O)C(Cl)(Cl)C1=CC=CC=C1 UIJSCOPBBPNHFC-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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Abstract
본 발명은 흑색 감광성 수지 조성물, 이를 이용한 블랙매트릭스 및 이를 구비한 화상 표시 장치에 관한 것이다. 본 발명에 따른 흑색 감광성 수지 조성물은 기판에 대한 접착력이 우수하고, 고해상도 구현을 위한 미세 패턴 형성이 가능하다.The present invention relates to a black photosensitive resin composition, a black matrix using the black photosensitive resin composition, and an image display device having the black matrix. The black photosensitive resin composition according to the present invention has excellent adhesion to a substrate and can form a fine pattern for realizing a high resolution.
Description
본 발명은 흑색 감광성 수지 조성물, 이를 이용한 블랙매트릭스 및 이를 구비한 화상 표시 장치에 관한 것이다.The present invention relates to a black photosensitive resin composition, a black matrix using the black photosensitive resin composition, and an image display device having the black matrix.
디스플레이의 화질은 컬러 필터에 의해 좌우된다. 컬러 필터의 컬러 픽셀 사이에는 블랙매트릭스라고 불리는 격자 상의 흑색패턴이 배치되며, 넓은 스크린 면적과 높은 콘트라스트를 실현하기 위하여, 컬러 필터의 블랙매트릭스는 충분한 광차광성을 가지고 고해상도로 패터닝 될 것이 요구된다. The quality of the display depends on the color filter. A black pattern on the lattice called a black matrix is disposed between the color pixels of the color filter. In order to realize a large screen area and high contrast, the black matrix of the color filter is required to be patterned with high light resolution and high resolution.
종래의 블랙매트릭스는 크롬을 사용하였는데, 이 공정은 크롬을 유리기판 전체에 증착시키고 에칭 처리에 의해 패턴을 형성하는 방식으로 공정상 고비용이 요구되고, 크롬의 고반사율, 크롬 폐액에 의한 환경오염 등의 문제점이 있었다. 이와 같은 이유로 미세가공이 가능한 안료 분산법에 의한 레진 블랙매트릭스의 연구가 활발히 이루어지고 있다.In the conventional black matrix, chromium has been used. This process deposits chromium on the entire glass substrate and forms a pattern by etching treatment. Therefore, high cost is required in the process, and high reflection of chrome, environmental pollution . For this reason, studies of a resin black matrix by a pigment dispersion method capable of micromachining are actively conducted.
또한, 카본 블랙 이외의 착색 안료로 흑색 조성물을 제조하는 연구도 진행되고 있으나, 카본 블랙 이외의 착색 안료는 차광성이 약하기 때문에 그 배합량을 극히 많이 해야 하고, 그 결과 조성물의 점도가 증가하여 취급이 곤란해지거나 형성된 피막의 강도 또는 기판에 대한 밀착성이 현저히 저하된다는 문제점이 있다. 현재, 업계의 지속적인 성능 향상에 대한 요청에 따라 다양한 연구들이 진행되고 있다. In addition, studies have been made to prepare black compositions using color pigments other than carbon black. However, color pigments other than carbon black are required to have a very large blending amount because of low light shielding property. As a result, viscosity of the composition increases, There is a problem that the strength of the formed film or the adhesion to the substrate is considerably lowered. Currently, various studies are under way in response to the demand for continuous improvement of the industry.
또한, 디스플레이의 슬림화와 보다 넓은 화면의 요구에 따라, 모듈의 상, 하판 합착 부분에 있어서도 최소한의 면적을 사용함으로써 1인치라도 화면을 크게 가져가기 위한 기술이 적용되고 있다. 특히 모바일 시장이 점차적으로 커지고 모바일의 특성을 극대화하기 위해 모듈 자체의 슬림화 외에도 장비는 소량화하면서 디스플레이는 최대한으로 가져가기 위한 방안들이 강구되고 있다.In addition, according to the slimness of the display and the requirement for a wider screen, a technique for increasing the screen size even by one inch is applied by using a minimum area even in the upper and lower plate joint portions of the module. Particularly, in order to maximize the characteristics of the mobile as the mobile market gradually grows, besides the slimming of the module itself, there are also plans to reduce the number of devices and maximize the display.
그 방안 중의 하나로, 기존의 합착 방법이 아닌 새로운 형태의 합착 방법을 사용하게 되었다. 기존의 합착 방법에 있어서는 글래스와 블랙매트릭스의 테두리를 동시에 이용하여 합착하는 방법을 진행하였으나, 실제 보여지는 영역보다 더 큰 글래스를 이용하여 합착함으로써 판넬에서의 디스플레이 효율성이 떨어졌다. 반면 새로운 합착 방법에서는 디스플레이의 효율성을 높이기 위해 합착시 글래스를 이용하지 않고 블랙매트릭스 부분에서만 합착을 진행함으로써 판넬에서 디스플레이의 효율성을 극대화할 수 있게 되었으며, 이 방법에서는 카도계 바인더를 필수적으로 사용하여 공정특성을 확보할 수 있었다. As one of the methods, a new type of cementation method is used instead of the existing cementation method. In the conventional bonding method, the method of attaching the glass and the black matrices at the same time has been performed, but the display efficiency on the panel is lowered by using a larger glass than the actual visible region. On the other hand, in the new joining method, in order to increase the display efficiency, the joining is performed only in the black matrix portion without using the glass during joining, thereby maximizing the display efficiency in the panel. In this method, Characteristics can be secured.
그러나, 기존 방법에서는 글래스와 블랙매트릭스를 동시에 이용하여 합착을 진행했기 때문에 합착시 가해지는 압력 및 신뢰성 공정 중 실란트의 접착력에 큰 문제가 없었으나, 카도계 바인더를 사용하여 블랙매트릭스 부분에서만 합착을 진행한 경우에는 합착시 가해지는 압력과 신뢰성 공정 중 블랙매트릭스의 기판 접착력이 문제가 되어 실터짐 및 도막 파괴 등이 발생하였으며, 고OD(Optical Density, 광학밀도) 특성과 기판 접착력의 두 조건을 만족시키지 못하는 문제점이 있었다.However, in the conventional method, since adhesion was carried out using glass and black matrix at the same time, there was no big problem in adhesion of sealant in reliability and pressure applied at the time of adhesion, but adhesion with only black matrix portion was carried out using cadmium binder In one case, the pressure applied during bonding and the adhesion of the black matrix to the substrate in the reliability process became a problem, resulting in cracking and film breakage. Both the OD (Optical Density) characteristics and the substrate adhesion were satisfied There was a problem.
한국등록특허 제1068622 호에는 기판접착력이 향상된 고차광성 블랙매트릭스 조성물이 개시되어 있어 고OD(Optical Density, 광학밀도) 특성과 기판 접착력의 문제는 해결하였으나, 상기 조성물로는 고해상도를 구현할 수 없는 문제점이 있다.Korean Patent No. 1068622 discloses a high-order black matrix composition with improved substrate adhesion, which solves the problem of high OD (Optical Density) characteristics and substrate adhesion, but the problem is that high resolution can not be achieved with the composition have.
본 발명은 기판에 대한 접착력이 우수하고, 고해상도 구현을 위한 미세 패턴 형성이 가능한 흑색 감광성 수지 조성물을 제공하는 것을 목적으로 한다.An object of the present invention is to provide a black photosensitive resin composition excellent in adhesion to a substrate and capable of forming a fine pattern for realizing a high resolution.
또한, 본 발명은 상기 흑색 감광성 수지 조성물을 이용하여 형성되는 블랙매트릭스를 제공하는 것을 목적으로 한다.It is another object of the present invention to provide a black matrix formed using the black photosensitive resin composition.
또한, 본 발명은 상기 블랙매트릭스를 구비한 액정표시장치를 제공하는 것을 목적으로 한다.It is another object of the present invention to provide a liquid crystal display device having the black matrix.
상기 과제를 해결하고자, 본 발명은 알칼리 가용성 바인더 수지(A), 광중합성 화합물(B), 광중합 개시제(C), 흑색 안료(D) 및 용매(E)를 포함하고, 상기 알칼리 가용성 수지(A)는 하기 화학식 1 및 화학식 2 중 적어도 하나의 반복 단위를 갖는 카도계 바인더 수지(A)를 포함하며, 상기 광중합 개시제(C)는 하기 화학식 3으로 표시되는 화합물을 포함하는, 흑색 감광성 수지 조성물을 제공한다.(A), a photopolymerizable compound (B), a photopolymerization initiator (C), a black pigment (D) and a solvent (E), wherein the alkali soluble resin ) Comprises a cationic binder resin (A) having at least one repeating unit of the following general formula (1) and (2), wherein the photopolymerization initiator (C) comprises a compound represented by the following general formula to provide.
[화학식 1][Chemical Formula 1]
[화학식 2](2)
상기 화학식 1 또는 2에서, X 및 X'은 각각 독립적으로 단일 결합, -CO-, -SO2-, -C(CF3)2-, -Si(CH3)2-, -CH2-, -C(CH3)2-, -O-, , , , , , , , , , , , 또는이고,In Formula 1 or 2, X and X 'each independently represents a single bond, -CO-, -SO 2 -, -C (CF 3 ) 2 -, -Si (CH 3 ) 2 -, -CH 2 - -C (CH 3) 2 -, -O-, , , , , , , , , , , , or ego,
Y는 산무수물잔기이고,Y is an acid anhydride residue,
Z는 산2무수물잔기이고,Z is an acid dianhydride residue,
R'은 수소 원자, 에틸기, 페닐기, -C2H4Cl, -C2H4OH, 또는 -CH2CH=CH2이고,R 'is a hydrogen atom, an ethyl group, a phenyl group, -C 2 H 4 Cl, -C 2 H 4 OH, or -CH 2 CH = CH 2,
R1, R1', R2, R2', R3, R3', R4, R4', R5, R5', R6 및 R6'은 각각 독립적으로 수소 원자 또는 메틸기이고, R 1 , R 1 ', R 2 , R 2 ', R 3 , R 3 ', R 4 , R 4 ', R 5 , R 5 ', R 6 and R 6 ' are each independently a hydrogen atom or a methyl group ,
R7, R7', R8 및 R8'은 각각 독립적으로 탄소수 1 내지 6의 직쇄 또는 분지쇄의 알킬렌기이며, 상기 알킬렌기는 에스테르 결합, 탄소수 6 내지 14의 싸이클로알킬렌기 및 탄소수 6 내지 14의 아릴렌기 중 적어도 하나를 포함할 수 있고,R 7 , R 7 ', R 8 and R 8 ' are each independently a straight or branched alkylene group having 1 to 6 carbon atoms, and the alkylene group is an ester bond, a cycloalkylene group having 6 to 14 carbon atoms, Or an arylene group having 1 to 14 carbon atoms,
R9, R9', R10, R10', R11, R11', R12, 및 R12'은 각각 독립적으로 수소 원자, 할로겐 원자 또는 탄소수 1 내지 5의 직쇄 또는 분지쇄의 알킬기이고,R 9 , R 9 ', R 10 , R 10 ', R 11 , R 11 ', R 12 and R 12 ' are each independently a hydrogen atom, a halogen atom or a straight or branched alkyl group having 1 to 5 carbon atoms ,
m 및 n 은 각각 0 ≤ m ≤ 30, 0 ≤ n ≤ 30을 만족하는 정수이다.m and n are integers satisfying 0? m? 30 and 0? n? 30, respectively.
[화학식 3](3)
상기 화학식 3에서, R13은 탄소수 1 내지 8의 알킬기, -O-R15, 및 할로겐기로 이루어진 군으로부터 선택되는 1개 이상의 치환기로 치환된 탄소수 6 내지 10의 아릴기, 또는 -O-R15 및 할로겐기로 이루어진 군으로부터 선택되는 1개 이상의 치환기로 치환된 탄소수 7 내지 24의 아릴알킬기이고,In Formula 3, R 13 is an aryl group having 6 to 10 carbon atoms and substituted with at least one substituent selected from the group consisting of an alkyl group having 1 to 8 carbon atoms, -OR 15 , and a halogen group, or -OR 15 and a halogen group Gt; is an arylalkyl group having 7 to 24 carbon atoms and substituted with at least one substituent selected from the group consisting of < RTI ID = 0.0 >
R14는 탄소수 1 내지 8의 알킬기, 탄소수 6 내지 10의 아릴기 또는 탄소수 7 내지 24의 아릴알칼기이고,R 14 is an alkyl group having 1 to 8 carbon atoms, an aryl group having 6 to 10 carbon atoms, or an arylalkyl group having 7 to 24 carbon atoms,
R15는 수소, 탄소수 1 내지 20의 알킬기, 또는 탄소수 1 내지 8의 알콕시기로 치환된 탄소수 1 내지 20의 알킬기이다.R 15 is hydrogen, an alkyl group having 1 to 20 carbon atoms, or an alkyl group having 1 to 20 carbon atoms substituted with an alkoxy group having 1 to 8 carbon atoms.
본 발명의 일 구현예는 흑색 감광성 수지 조성물 100중량부에 대하여, 알칼리 가용성 바인더 수지(A) 1 내지 40중량부, 광중합성 화합물(B) 1 내지 20중량부, 광중합 개시제(C) 0.1 내지 10중량부, 흑색 안료(D) 5 내지 20중량부 및 용매(E) 20 내지 85중량부를 포함할 수 있다.An embodiment of the present invention relates to a photosensitive resin composition comprising 1 to 40 parts by weight of an alkali-soluble binder resin (A), 1 to 20 parts by weight of a photopolymerizable compound (B), 0.1 to 10 parts by weight of a photopolymerization initiator (C) 5 to 20 parts by weight of the black pigment (D) and 20 to 85 parts by weight of the solvent (E).
또한, 본 발명은 흑색 감광성 수지 조성물을 이용하여 형성되는 블랙매트릭스를 제공한다.The present invention also provides a black matrix formed using a black photosensitive resin composition.
또한, 본 발명은 블랙매트릭스가 구비된 화상표시장치를 제공한다.Further, the present invention provides an image display apparatus provided with a black matrix.
본 발명에 따른 흑색 감광성 수지 조성물은 기판에 대한 접착력이 우수하고, 고해상도 구현을 위한 미세 패턴 형성이 가능하다.
The black photosensitive resin composition according to the present invention has excellent adhesion to a substrate and can form a fine pattern for realizing a high resolution.
도 1은 실험예의 접착력 평가 결과를 나타낸 것으로, 왼쪽은 미박리, 오른쪽은 박리된 것이다.
도 2는 실험예의 현상 밀착성 평가에 따른 최소패턴을 나타낸 것이다.Fig. 1 shows the results of the evaluation of adhesion in the experimental example.
Fig. 2 shows a minimum pattern according to the evaluation of developing adhesion in the experimental example.
본 발명은 알칼리 가용성 바인더 수지(A), 광중합성 화합물(B), 광중합 개시제(C), 흑색 안료(D) 및 용매(E)를 포함하고, 상기 알칼리 가용성 수지(A)는 하기 화학식 1 및 화학식 2 중 적어도 하나의 반복 단위를 갖는 카도계 바인더 수지(A)를 포함하며, 상기 광중합 개시제(C)는 화학식 3으로 표시되는 화합물을 포함하는 흑색 감광성 수지 조성물에 관한 것으로, 상기 조성물은 화학식 1 및 화학식 2 중 적어도 하나의 반복 단위를 갖는 카도계 바인더(A)와, 화학식 3으로 표시되는 화합물을 포함함에 따라 기판에 대한 접착력이 우수하고, 고해상도 구현을 위한 미세 패턴 형성이 가능한 것이 특징이다.
The present invention relates to a photosensitive resin composition comprising an alkali soluble binder resin (A), a photopolymerizable compound (B), a photopolymerization initiator (C), a black pigment (D) and a solvent (E) (A) having at least one repeating unit of formula (2), wherein the photopolymerization initiator (C) is a black photosensitive resin composition comprising a compound represented by formula (3) And a compound represented by the general formula (3), the adhesion to the substrate is excellent, and a fine pattern can be formed for realizing a high resolution.
이하, 본 발명을 상세히 설명한다.Hereinafter, the present invention will be described in detail.
본 발명의 흑색 감광성 수지 조성물은 알칼리 가용성 바인더 수지(A), 광중합성 화합물(B), 광중합 개시제(C), 흑색 안료(D) 및 용매(E)를 포함한다.
The black photosensitive resin composition of the present invention comprises an alkali-soluble binder resin (A), a photopolymerizable compound (B), a photopolymerization initiator (C), a black pigment (D) and a solvent (E).
<알칼리 가용성 바인더 수지(A)>≪ Alkali-soluble binder resin (A) >
본 발명에 따른 카도계 바인더 수지(A)는 하기 화학식 1 및 화학식 2 중 적어도 하나의 반복 단위를 포함함으로써, 기판과의 접착력을 향상시키고, 현상 밀착력이 우수하여 고해상도를 위한 미세 패턴을 구현할 수 있게 한다.The cationic binder resin (A) according to the present invention includes at least one repeating unit represented by the following formulas (1) and (2) to improve the adhesion to a substrate and to provide a fine pattern for high resolution do.
[화학식 1][Chemical Formula 1]
[화학식 2](2)
식 중에서, X 및 X'은 각각 독립적으로 단일 결합, -CO-, -SO2-, -C(CF3)2-, -Si(CH3)2-, -CH2-, -C(CH3)2-, -O-, , , , , , , , , , , , 또는 이고,Expression in, X and X 'is a single bond, -CO-, -SO 2 each independently -, -C (CF 3) 2 -, -Si (CH 3) 2 -, -CH 2 -, -C (CH 3 ) 2- , -O-, , , , , , , , , , , , or ego,
Y는 산무수물잔기이고,Y is an acid anhydride residue,
Z는 산2무수물잔기이고,Z is an acid dianhydride residue,
R'는 수소 원자, 에틸기, 페닐기, -C2H4Cl, -C2H4OH, 또는 -CH2CH=CH2이고,R 'is a hydrogen atom, an ethyl group, a phenyl group, -C 2 H 4 Cl, -C 2 H 4 OH, or -CH 2 CH = CH 2,
R1, R1`, R2, R2`, R3, R3`, R4, R4`, R5, R5`, R6 및 R6`는 각각 독립적으로 수소 원자 또는 메틸기이고, R 1, R 1 `, R 2, R 2`, R 3, R 3 `, R 4, R 4`, R 5, R 5 `, R 6 and R 6` are each independently a hydrogen atom or a methyl group ,
R7, R7`, R8 및 R8`은 각각 독립적으로 탄소수 1 내지 6의 직쇄 또는 분지쇄의 알킬렌기이며, 상기 알킬렌기는 에스테르 결합, 탄소수 6 내지 14의 싸이클로알킬렌기 및 탄소수 6 내지 14의 아릴렌기 중 적어도 하나를 포함할 수 있고, 바람직하게는, 에틸렌기, , , , 또는인 것이 좋다.R 7 , R 7 , R 8 and R 8 'are each independently a straight or branched alkylene group having 1 to 6 carbon atoms, and the alkylene group is an ester bond, a cycloalkylene group having 6 to 14 carbon atoms, An arylene group having 1 to 14 carbon atoms, preferably an ethylene group, , , , or .
R9, R9`, R10, R10`, R11, R11`, R12, 및 R12'은각각 독립적으로 수소 원자, 할로겐 원자 또는 탄소수 1 내지 5의 직쇄 또는 분지쇄의 알킬기이고,R 9 , R 9 , R 10 , R 10 , R 11 , R 11 , R 12 and R 12 'each independently represents a hydrogen atom, a halogen atom or a straight or branched alkyl group having 1 to 5 carbon atoms ,
m 및 n 은 각각 0 ≤ m ≤ 30, 0 ≤ n ≤ 30을 만족하는 정수이다.m and n are integers satisfying 0? m? 30 and 0? n? 30, respectively.
본 발명의 카도계 바인더 수지(A)가 상기 화학식 1 및 화학식 2의 반복 단위를 모두 포함하는 경우 몰비는 특별히 한정되지 않으나, m/n은 예를 들면, 1/99 내지 90/10일 수 있으며, 보다 바람직하게는 5/95 내지 80/20인 것이 좋다. When the cationic binder resin (A) of the present invention contains all the repeating units of the above formulas (1) and (2), the molar ratio is not particularly limited, but m / n may be, for example, 1/99 to 90/10 , More preferably 5/95 to 80/20.
m/n이 상기 범위를 만족하는 경우, 바인더 수지의 카르복시기 함량이 적절하게 유지되어 내알칼리성이 우수하게 유지될 수 있으며, 노광부에 현상용액이 용출되지 않고, 우수한 알칼리 현상성을 나타내어 미세패턴을 형성할 수 있게 한다. When the ratio m / n satisfies the above range, the content of the carboxyl group of the binder resin is appropriately maintained to maintain the excellent alkali resistance, the developing solution does not dissolve in the exposed portion, .
상기 화학식 1의 Y는 산무수물의 잔기로서, 본 발명의 카도계 바인더 수지(A)의 합성 중간체인 비스페놀 에폭시아크릴레이트 화합물을 산무수물 화합물과 반응시켜 얻어질 수 있다. 잔기 Y를 도입할 수 있는 산무수물 화합물은 특별히 한정되지 않으며, 예를 들면, 무수말레인산, 무수숙신산, 무수이타콘산, 무수프탈산, 무수테트라히드로프탈산, 무수헥사히드로프탈산, 무수메틸렌도 메틸렌테트라히드로프탈산, 무수클로로렌드산, 무수메틸테트라히드로프탈산 등을 들 수 있다.Y in the formula (1) can be obtained by reacting a bisphenol epoxy acrylate compound, which is a synthetic intermediate of the cationic binder resin (A) of the present invention, with an acid anhydride compound as a residue of an acid anhydride. The acid anhydride compound capable of introducing the residue Y is not particularly limited and includes, for example, maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic acid anhydride, hexahydrophthalic anhydride, methylenedomethylene tetrahydrophthalic anhydride , Anhydrous chlorinated acid, and anhydrous methyl tetrahydrophthalic acid.
상기 화학식 2의 Z는 산2무수물의 잔기로서, 본 발명의 카도계 바인더 수지(A)의 합성 중간체인 비스페놀 에폭시아크릴레이트 화합물을 산2무수물 화합물과 반응시켜 얻어질 수 있다. 잔기 Z를 도입할 수 있는 산2무수물 화합물은 특별히 한정되지 않으며, 예를 들면, 무수피로멜리트산, 벤조페논테트라카르복시산2무수물, 바이페닐테트라카르복시산2무수물, 바이테닐에테르테트라카르복시산2무수물 등의 방향족다가카르복시시산무수물을 들 수 있다. Z in the above formula (2) can be obtained by reacting a bisphenol epoxy acrylate compound, which is a synthetic intermediate of the cationic binder resin (A) of the present invention, with an acid dianhydride compound as a residue of an acid anhydride. The acid dianhydride compound capable of introducing the residue Z is not particularly limited and includes, for example, an aromatic acid such as anhydrous pyromellitic acid, benzophenonetetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride and butenyl ether tetracarboxylic acid dianhydride And polybasic carboxylic acid anhydrides.
본 발명에 있어서, '단일 결합'이란 다른 작용기 없이 직접 연결된 구조를 의미하며, 예를 들면 상기 화학식 1에 있어서, X 및 X' 없이, 옥시페닐기가 직접 연결된 것을 의미한다.In the present invention, 'single bond' means a structure directly connected without any other functional group. For example, in the above formula (1), it means that an oxyphenyl group is directly connected without X and X '.
또한, 본 발명에 있어서, '산2무수물'이란 분자 내에 산무수물기를 2개 포함하는 화합물을 의미한다.In the present invention, "acid dianhydride" means a compound containing two acid anhydride groups in the molecule.
본 발명의 카도계 바인더 수지(A)는 하기와 같은 방법을 통해 제조될 수 있다.The cationic binder resin (A) of the present invention can be prepared by the following method.
먼저, 비스페놀 화합물과 에폭시 화합물을 반응시켜 비스페놀 에폭시 화합물을 합성한 후, 합성된 비스페놀 에폭시 화합물을 아크릴레이트 화합물과 반응시켜 비스페놀 에폭시아크릴레이트 화합물을 합성하는 단계로 수행될 수 있다.First, a bisphenol epoxy compound is synthesized by reacting a bisphenol compound with an epoxy compound, and then the synthesized bisphenol epoxy compound is reacted with an acrylate compound to synthesize a bisphenol epoxy acrylate compound.
이후, 상기의 단계를 거쳐 합성된 비스페놀 에폭시아크릴레이트 화합물을 산무수물, 산2무수물 또는 이들의 혼합물과 반응시켜 본 발명의 카도계 바인더 수지(A)를 합성할 수 있다. Thereafter, the cationic binder resin (A) of the present invention can be synthesized by reacting the synthesized bisphenol epoxy acrylate compound with an acid anhydride, an acid anhydride or a mixture thereof.
상기 비스페놀 화합물의 종류는 특별히 한정되지 않으며, 예를 들면, 비스(4-히드록시페닐)케톤, 비스(4-히드록시-3,5-디메틸페닐)케톤, 비스(4-히드록시-3,5-디클로로페닐)케톤, 비스(4-히드록시페닐)설폰, 비스(4-히드록시-3,5-디메틸페닐)설폰, 비스(4-히드록시-3,5-디클로로페닐)설폰, 비스(4-히드록시페닐)헥사플루오로프로판, 비스(4-히드록시-3,5-디메틸페닐)헥사플루오로프로판, 비스(4-히드록시-3,5-디클로로페닐)헥사플루오로프로판, 비스(4-히드록시페닐)디메틸실란, 비스(4-히드록시-3,5-디메틸페닐) 디메틸실란, 비스(4-히드록시-3,5-디클로로페닐)디메틸실란, 비스(4-히드록시페닐)메탄, 비스(4-히드록시-3,5-디메틸페닐)메탄, 비스(4-히드록시-3,5-디클로로페닐)메탄, 비스(4-히드록시-3,5-디브로모페닐)메탄, 2,2-비스(4-히드록시페닐)프로판, 2,2-비스(4-히드록시-3,5-디메틸페닐)프로판, 2,2-비스(4-히드록시-3,5-디클로로페닐)프로판, 2,2-비스(4-히드록시-3-메틸페닐)프로판, 2,2-비스(4-히드록시-3-클로로페닐)프로판, 비스(4-히드록시페닐)에테르, 비스(4-히드록시-3,5-디메틸페닐)에테르, 비스(4-히드록시-3,5-디클로페닐)에테르, 9,9-비스(4-히드록시페닐)플루오렌, 9,9-비스(4-히드록시-3-메틸페닐)플루오렌, 9,9-비스(4-히드록시-3-클로로페닐)플루오렌, 9,9-비스(4-히드록시-3-브로모페닐)플루오렌, 9,9-비스(4-히드록시-3-플루오로페닐)플루오렌, 9,9-비스(4-히드록시-3-메톡시페닐)플루오렌, 9,9-비스(4-히드록시-3,5-디메틸페닐)플루오렌, 9,9-비스(4-히드록시-3,5-디클로로페닐)플루오렌, 9,9-비스(4-히드록시-3,5-디브로모페닐)플루오렌, 4,4'-비페놀, 3,3'-비페놀을 등을 들 수 있다. The bisphenol compound is not particularly limited and includes, for example, bis (4-hydroxyphenyl) ketone, bis (4-hydroxy- (4-hydroxy-3,5-dimethylphenyl) sulfone, bis (4-hydroxy-3,5-dichlorophenyl) sulfone, bis (4-hydroxy-3,5-dimethylphenyl) hexafluoropropane, bis (4-hydroxy-3,5-dichlorophenyl) hexafluoropropane, Bis (4-hydroxyphenyl) dimethylsilane, bis (4-hydroxy-3,5-dimethylphenyl) dimethylsilane, bis (4-hydroxy-3,5-dimethylphenyl) methane, bis (4-hydroxy-3,5-dichlorophenyl) methane, bis 2-bis (4-hydroxyphenyl) propane, 2,2-bis (4-hydroxy- Propane, 2,2-bis (4-hydroxy-3-methylphenyl) propane, 2,2- Bis (4-hydroxy-3-chlorophenyl) propane, bis (4-hydroxyphenyl) ether, bis (4-hydroxyphenyl) fluorene, 9,9-bis (4-hydroxyphenyl) fluorene, 9,9- Fluorene) fluorene, 9,9-bis (4-hydroxy-3-bromophenyl) fluorene, , 9,9-bis (4-hydroxy-3-methoxyphenyl) fluorene, 9,9-bis -3,5-dichlorophenyl) fluorene, 9,9-bis (4-hydroxy-3,5-dibromophenyl) fluorene, 4,4'-biphenol, And the like.
상기 아크릴레이트 화합물의 종류는 특별히 한정되지 않으며, 예를 들면, 하기 화학식 4으로 표시되는 화합물일 수 있다.The type of the acrylate compound is not particularly limited and may be, for example, a compound represented by the following general formula (4).
[화학식 4][Chemical Formula 4]
식 중에서, R16, R17, R18은 각각 독립적으로, 수소 원자 또는 메틸기이고,In the formula, R 16 , R 17 and R 18 are each independently a hydrogen atom or a methyl group,
R19는 탄소수 1 내지 6의 직쇄 또는 분지쇄의 알킬렌기이며, 상기 알킬렌기는 에스테르 결합, 탄소수 6 내지 14의 싸이클로알킬렌기 및 탄소수 6 내지 14의 아릴렌기 중 적어도 하나로 중단될 수 있다.R 19 is a straight or branched alkylene group having 1 to 6 carbon atoms, and the alkylene group may be interrupted by at least one of an ester bond, a cycloalkylene group having 6 to 14 carbon atoms, and an arylene group having 6 to 14 carbon atoms.
상기 산무수물 및 산2무수물의 종류는 특별히 한정되지 않으며, 전술한 Y 및 Z를 도입하기 위해 사용한 화합물과 동일한 화합물을 사용할 수 있다.The kinds of the acid anhydride and the acid dianhydride are not particularly limited, and the same compounds as those used for introducing Y and Z described above can be used.
상기 카도계 바인더 수지(A)의 산가는 20 내지 200mgKOH/g일 수 있으며, 바람직하게는 50 내지 150mgKOH/g인 것이 좋다. 20 내지 200mgKOH/g의 산가를 가지는 경우, 충분한 현상 속도를 확보할 수 있어, 고해상도의 블랙매트릭스를 구현할 수 있게 한다.The acid value of the cationic binder resin (A) may be 20 to 200 mgKOH / g, preferably 50 to 150 mgKOH / g. When the acid value is in the range of 20 to 200 mgKOH / g, a sufficient developing rate can be ensured and a black matrix of high resolution can be realized.
상기 카도계 바인더 수지(A)의 중량평균 분자량은 2,000 내지 100,000일 수 있으며, 바람직하게는 3,000 내지 40,000인 것이 좋다. 2,000 내지 100,000 중량평균 분자량을 가지는 경우, 밀착성 및 현상성이 향상될 수 있다.The weight average molecular weight of the cationic binder resin (A) may be 2,000 to 100,000, preferably 3,000 to 40,000. When it has a weight average molecular weight of 2,000 to 100,000, adhesion and developability can be improved.
상기 카도계 바인더 수지(A)의 함량은 특별히 한정되지 않으나, 착색 감광성 수지 조성물 100중량부에 대하여 1 내지 40중량부로 포함될 수 있으며, 바람직하게는 5 내지 20중량부인 것이 좋다. 바인더 수지의 함량이 상기 범위내인 경우 현상액에서의 용해성이 충분하여 패턴 형성이 용이하다.
The content of the cadmium binder resin (A) is not particularly limited, but may be 1 to 40 parts by weight, preferably 5 to 20 parts by weight based on 100 parts by weight of the colored photosensitive resin composition. When the content of the binder resin is within the above range, solubility in a developing solution is sufficient and pattern formation is easy.
<광중합성 화합물(B)>≪ Photopolymerizable compound (B) >
본 발명에 따른 광중합성 화합물(B)은 패턴의 강도를 강화시키기 위한 성분으로서, 단관능 단량체, 2관능 단량체 또는 다관능 단량체를 사용할 수 있으며, 바람직하게는 2관능 이상의 단량체를 사용하는 것이 좋다. The photopolymerizable compound (B) according to the present invention may be a monofunctional monomer, a bifunctional monomer or a polyfunctional monomer as a component for enhancing the strength of a pattern, and preferably a monomer having two or more functionalities is preferably used.
상기 단관능 단량체의 종류는 특별히 한정되지 않으며, 예를 들면 노닐페닐카르비톨아크릴레이트, 2-히드록시-3-페녹시프로필아크릴레이트, 2-에틸헥실카르비톨아크릴레이트, 2-히드록시에틸아크릴레이트, N-비닐피롤리돈 등을 들 수 있다.The type of the monofunctional monomer is not particularly limited, and examples thereof include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate N-vinylpyrrolidone, and the like.
상기 2관능 단량체의 종류는 특별히 한정되지 않으며, 예를 들면, 1,6-헥산디올디(메타)아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 네오펜틸글리콜디(메타)아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 비스페놀 A의 비스(아크릴로일옥시에틸)에테르, 3-메틸펜탄디올디(메타)아크릴레이트 등을 들 수 있다.The type of the bifunctional monomer is not particularly limited and examples thereof include 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) Glycol di (meth) acrylate, bis (acryloyloxyethyl) ether of bisphenol A, and 3-methylpentanediol di (meth) acrylate.
상기 다관능 단량체의 종류는 특별히 한정되지 않으며, 예를 들면, 트리메틸올프로판트리(메타)아크릴레이트, 에톡실레이티드트리메틸올프로판트리(메타)아크릴레이트, 프로폭실레이티드트리메틸올프로판트리(메타)아크릴레이트, 펜타에리스리톨트리(메타)아크릴레이트, 펜타에리스리톨테트라(메타)아크릴레이트, 디펜타에리스리톨트리(메타)아크릴레이트, 디펜타에리스리톨펜타(메타)아크릴레이트, 에톡실레이티드디펜타에리스리톨헥사(메타)아크릴레이트, 프로폭실레이티드디펜타에리스리톨헥사(메타)아크릴레이트, 디펜타에리스리톨헥사(메타)아크릴레이트 등을 들 수 있다.The type of the polyfunctional monomer is not particularly limited and includes, for example, trimethylolpropane tri (meth) acrylate, ethoxylated trimethylolpropane tri (meth) acrylate, propoxylated trimethylolpropane tri Acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, ethoxylated dipentaerythritol hexa (Meth) acrylate, propoxylated dipentaerythritol hexa (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and the like.
상기 광중합성 화합물(B) 의 함량은 특별히 한정되지 않으나, 흑색 감광성 수지 조성물 100중량부에 대하여 1 내지 20중량부로 포함될 수 있으며, 바람직하게는 1 내지 10중량부인 것이 좋다. 상기 광중합성 화합물의 함량이 1 중량부 미만인 경우 광감도가 저하될 수 있으며, 20중량부를 초과하는 경우 감광성 수지층의 점착성이 과잉되어 필름의 강도가 충분치 않고 현상이 패턴이 손실될 수 있다.
The content of the photopolymerizable compound (B) is not particularly limited, but may be 1 to 20 parts by weight, preferably 1 to 10 parts by weight, per 100 parts by weight of the black photosensitive resin composition. If the content of the photopolymerizable compound is less than 1 part by weight, the photosensitivity may be lowered. If the content of the photopolymerizable compound is more than 20 parts by weight, the photosensitive resin layer may be excessively tacky and the strength of the film may be insufficient.
<광중합 개시제(C)>≪ Photopolymerization initiator (C) >
본 발명의 광중합 개시제는 하기 화학식 3으로 나타내는 에틸카바졸 구조에 NO2가 치환된 옥심 에스테르계 화합물을 포함하는 것이 특징이다. 또한, 본 발명의 광중합 개시제는 광중합 개시제를 0.01% 이상의 농도로 포함한 용액의 흡광도가 405nm에서 0.5 이상인 것이 특징이다. 여기서 상기 광중합 개시제를 용해시키는 용매는 광중합 개시제를 보다 효과적으로 용해시킬 수 있어야 하는 것으로, 프로필렌글리콜메틸에테르아세테이트, 1,2-프로필렌글리콜디아세테이트, 3-메톡시부틸아세테이트, 프로필렌글리콜메틸에테르, 에틸-3-에톡시프로피오네이트 및 디프로필렌글리콜모노메틸에테르아세테이트로 이루어진 군으로부터 선택되는 1종 이상을 사용할 수 있으며, 프로필렌글리콜메틸에테르아세테이트를 사용하는 것이 바람직하다.The photopolymerization initiator of the present invention is characterized by containing an oxime ester compound in which NO 2 is substituted for the ethyl carbazole structure represented by the following formula (3). The photopolymerization initiator of the present invention is characterized in that the absorbance of the solution containing the photopolymerization initiator at a concentration of 0.01% or more is 0.5 or more at 405 nm. The solvent for dissolving the photopolymerization initiator should be one which can dissolve the photopolymerization initiator more effectively. Examples of the solvent include propylene glycol methyl ether acetate, 1,2-propylene glycol diacetate, 3-methoxybutyl acetate, propylene glycol methyl ether, 3-ethoxypropionate, and dipropylene glycol monomethyl ether acetate. It is preferable to use propylene glycol methyl ether acetate.
[화학식 3](3)
상기 화학식 3에서, R13은 탄소수 1 내지 8의 알킬기, -O-R15, 및 할로겐기로 이루어진 군으로부터 선택되는 1개 이상의 치환기로 치환된 탄소수 6 내지 10의 아릴기, 또는 -O-R15 및 할로겐기로 이루어진 군으로부터 선택되는 1개 이상의 치환기로 치환된 탄소수 7 내지 24의 아릴알킬기이고, R14는 탄소수 1 내지 8의 알킬기, 탄소수 6 내지 10의 아릴기 또는 탄소수 7 내지 24의 아릴알칼기이고, R15는 수소, 탄소수 1 내지 20의 알킬기, 또는 탄소수 1 내지 8의 알콕시기로 치환된 탄소수 1 내지 20의 알킬기이다.In Formula 3, R 13 is an aryl group having 6 to 10 carbon atoms and substituted with at least one substituent selected from the group consisting of an alkyl group having 1 to 8 carbon atoms, -OR 15 , and a halogen group, or -OR 15 and a halogen group and an arylalkyl group having 7 to 24 substituted with one or more substituents selected from the group, R 14 is an arylalkenyl kalgi C 1 -C 8 alkyl group, a C6 - C10 aryl group or C7 to 24, R 15 Is an alkyl group having 1 to 20 carbon atoms substituted with hydrogen, an alkyl group having 1 to 20 carbon atoms, or an alkoxy group having 1 to 8 carbon atoms.
상기 화학식 3을 포함하는 광중합 개시제가 0.01%의 농도로 포함된 용액의 흡광도가 405nm에서 0.5 이상이면, 405nm의 단일파장 노광기로 노광하여 컬러필터의 패턴을 형성할 때, 개시 효율이 높아져 과량의 광중합 개시제를 사용하지 않고서도 착색 감광성 수지 조성물의 우수한 감도 및 신뢰성을 얻을 수 있다. When the absorbance of the solution containing the photopolymerization initiator (Formula 3) at a concentration of 0.01% is 0.5 or more at 405 nm, when the color filter pattern is formed by exposure with a 405 nm single wavelength exposing device, the initiation efficiency is increased, Excellent sensitivity and reliability of the colored photosensitive resin composition can be obtained without using an initiator.
또한, 본 발명의 효과를 손상하지 않는 범위에서 상기 이외의 광중합 개시제를 추가로 사용할 수도 있다. 상기 추가로 사용할 수 있는 광중합 개시제는 예를 들어, 아세토페논계 화합물, 벤조페논계 화합물, 트리아진계 화합물, 비이미다졸계 화합물 및 티오크산톤계 화합물로 이루어진 군으로부터 선택되는 1종 이상의 화합물을 사용하는 것이 바람직하다.Further, other photopolymerization initiators than those described above may be further used within the scope of not impairing the effects of the present invention. The photopolymerization initiator that can be further used includes, for example, at least one compound selected from the group consisting of an acetophenone compound, a benzophenone compound, a triazine compound, a nonimidazole compound, and a thioxanone compound .
상기 아세토페논계 화합물은 예를 들어, 디에톡시아세토페논, 2-히드록시-2-메틸-1-페닐프로판-1-온, 벤질디메틸케탈, 2-히드록시-1-[4-(2-히드록시에톡시)페닐]-2-메틸프로판-1-온, 1-히드록시시클로헥실페닐케톤, 2-메틸-1-(4-메틸티오페닐)-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온, 2-히드록시-2-메틸-1-[4-(1-메틸비닐)페닐]프로판-1-온 및 2-(4-메틸벤질)-2-(디메틸아미노)-1-(4-모르폴리노페닐)부탄-1-온 등을 들 수 있다.The acetophenone-based compounds include, for example, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethylketal, 2- (4-methylthioxy) phenyl] -2-methylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2- 2-methyl-1- [4- (1-methylvinyl) phenyl] propane-1-one, 1-one and 2- (4-methylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butan-1-one.
상기 벤조페논계 화합물은 예를 들어, 벤조페논, 0-벤조일벤조산 메틸, 4-페닐벤조페논, 4-벤조일-4'-메틸디페닐술피드, 3,3',4,4'-테트라(tert-부틸퍼옥시카르보닐)벤조페논 및 2,4,6-트리메틸벤조페논 등을 들 수 있다.The benzophenone compound may be, for example, benzophenone, methyl 0-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4'- methyldiphenylsulfide, 3,3 ', 4,4'-tetra tert-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, and the like.
상기 트리아진계 화합물은 예를 들어, 2,4-비스(트리클로로메틸)-6-(4-메톡시페닐)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시나프틸)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-피페로닐-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(5-메틸퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(4-디에틸아미노-2-메틸페닐)에테닐]-1,3,5-트리아진 및 2,4-비스(트리클로로메틸)-6-[2-(3,4-디메톡시페닐)에테닐]-1,3,5-트리아진 등을 들 수 있다.Examples of the triazine-based compound include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine, 2,4- (Trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4-bis (trichloromethyl) Bis (trichloromethyl) -6- [2- (5-methylfuran-2-yl) -Yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (furan- Azine, 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino-2-methylphenyl) ethenyl] -1,3,5-triazine and 2,4- Methyl) -6- [2- (3,4-dimethoxyphenyl) ethenyl] -1,3,5-triazine.
상기 비이미다졸 화합물은 예를 들어, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(알콕시페닐)비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(트리알콕시페닐)비이미다졸, 2,2-비스(2,6-디클로로페닐)-4,4’,5,5’-테트라페닐-1,2’-비이미다졸 및 4,4',5,5' 위치의 페닐기가 카르보알콕시기에 의해 치환되어 있는 이미다졸 화합물 등을 들 수 있다. 상기 비이미다졸 화합물 중에서 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸 및 2,2-비스(2,6-디클로로페닐)-4,4’5,5’-테트라페닐-1,2’-비이미다졸이 바람직하게 사용된다.The non-imidazole compound may be, for example, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'- Dichlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (alkoxyphenyl) Bis (2,6-dichlorophenyl) -4, 5,5'-tetra (trialkoxyphenyl) bimidazole, 2,2- , 4 ', 5,5'-tetraphenyl-1,2'-biimidazole and imidazole compounds wherein the phenyl group at the 4,4', 5,5 'position is substituted by a carboalkoxy group . Among the imidazole compounds, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,3- 4,4 ', 5,5'-tetraphenylbiimidazole and 2,2-bis (2,6-dichlorophenyl) -4,4'5,5'-tetraphenyl-1,2'-biimidazole Is preferably used.
상기 티오크산톤계 화합물은 예를 들어, 2-이소프로필티오크산콘, 2,4-디에틸티오크산톤, 2,4-디클로로티오크산톤 및 1-클로로-4-프로폭시티오크산톤 등을 들 수 있다.The thioxanthone compound may be, for example, 2-isopropylthioxanecone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone and 1-chloro-4- .
또한, 상기 광중합 개시제는 본 발명의 착색 감광성 수지 조성물의 감도를 향상시키기 위해서, 광중합 개시 보조제를 더 포함할 수 있다. 본 발명에 따른 착색 감광성 수지 조성물은 광중합 개시 보조제를 포함함으로써, 감도를 더욱 향상시킬 수 있어 생산성을 증가시킬 수 있다.The photopolymerization initiator may further include a photopolymerization initiator to improve the sensitivity of the colored photosensitive resin composition of the present invention. Since the colored photosensitive resin composition according to the present invention contains a photopolymerization initiator auxiliary agent, the sensitivity can be further improved and the productivity can be increased.
상기 광중합 개시 보조제는 예를 들어, 아민 화합물, 카르복실산 화합물 및 티올기를 가지는 유기 황화합물로 이루어진 군으로부터 선택되는 1종 이상의 화합물이 바람직하게 사용될 수 있다.As the photopolymerization initiation auxiliary, for example, at least one compound selected from the group consisting of an amine compound, a carboxylic acid compound and an organic sulfur compound having a thiol group can be preferably used.
상기 아민 화합물은 예를 들어, 트리에탄올아민, 메틸디에탄올아민 및 트리이소프로판올아민 등의 지방족 아민 화합물; 4-디메틸아미노벤조산메틸, 4-디메틸아미노벤조산 에틸, 4-디메틸아미노벤조산 이소아밀, 4-디메틸아미노벤조산 2-에틸헥실, 벤조산 2-디메틸아미노에틸, N,N-디메틸파라톨루이딘, 4,4'-비스(디메틸아미노)벤조페논(통칭 : 미힐러 케톤) 및 4,4'-비스(디에틸아미노)벤조페논 등의 방향족 아민 화합물을 들 수 있으며, 상기 아민 화합물로 방향족아민 화합물이 사용되는 것이 바람직하다.The amine compounds include, for example, aliphatic amine compounds such as triethanolamine, methyldiethanolamine and triisopropanolamine; 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, N, N-dimethylparatoluidine, 4,4- Aromatic amine compounds such as bis (dimethylamino) benzophenone (commonly known as Michler's ketone) and 4,4'-bis (diethylamino) benzophenone, and aromatic amine compounds are used as the amine compounds .
상기 카르복실산 화합물은 예를 들어, 페닐티오아세트산, 메틸페닐티오아세트산, 에틸페닐티오아세트산, 메틸에틸페닐티오아세트산, 디메틸페닐티오아세트산, 메톡시페닐티오아세트산, 디메톡시페닐티오아세트산, 클로로페닐티오아세트산, 디클로로페닐티오아세트산, N-페닐글리신, 페녹시아세트산, 나프틸티오아세트산, N-나프틸글리신 및 나프톡시아세트산 등의 방향족 헤테로아세트산류를 들 수 있다.The carboxylic acid compound is, for example, selected from the group consisting of phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, , And aromatic heteroacetic acids such as dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine and naphthoxyacetic acid.
상기 티올기를 가지는 유기 황화합물은 예를 들어, 2-머캅토벤조티아졸, 1,4-비스(3-머캅토부티릴옥시)부탄, 1,3,5-트리스(3-머캅토부틸옥시에틸)-1,3,5-트리아진-2,4,6(1H,3H,5H)-트리온, 트리메틸올프로판트리스(3-머갑토프로피오네이트), 펜타에리트리톨테트라키스(3-머캅토부틸레이트), 펜타에리트리톨테트라키스(3-머캅토프로피오네이트), 디펜타에리트리톨헥사키스(3-머캅토프로피오네이트) 및 테트라에틸렌글리콜비스(3-머캅토프로피오네이트) 등을 들 수 있다.The organic sulfur compounds having thiol groups include, for example, 2-mercaptobenzothiazole, 1,4-bis (3-mercaptobutyryloxy) butane, 1,3,5-tris (3-mercaptobutyloxyethyl ) -1,3,5-triazine-2,4,6 (1H, 3H, 5H) -thione, trimethylolpropane tris (3-mercaptopropionate), pentaerythritol tetrakis (3-mercaptopropionate), tetraethylene glycol bis (3-mercaptopropionate), and the like can be used. .
상기 광중합 개시제(C)의 함량은 특별히 한정되지 않으나, 흑색 감광성 수지 조성물 100중량부에 대하여 0.1 내지 10중량부로 포함될 수 있으며, 바람직하게는 0.5 내지 5중량부인 것이 좋다. 0.1중량부 미만으로 포함되는 경우, 감도가 저하되어 현상 공정 중 패턴의 탈락이 발생할 수 있으며, 10중량부를 초과하는 경우 주름이 발생할 수 있다.
The content of the photopolymerization initiator (C) is not particularly limited, but may be 0.1 to 10 parts by weight, preferably 0.5 to 5 parts by weight, based on 100 parts by weight of the black photosensitive resin composition. If it is contained in an amount of less than 0.1 part by weight, the sensitivity may be lowered and the pattern may be detached during the developing process. If the amount exceeds 10 parts by weight, wrinkles may occur.
<흑색 안료(D)>≪ Black pigment (D) >
본 발명에 사용되는 흑색 안료(D)는 카본 블랙, 유기블랙안료, 티타늄 블랙 및 적색, 청색, 녹색을 혼합한 안료 등을 사용할 수 있다.Examples of the black pigment (D) used in the present invention include carbon black, organic black pigment, titanium black and pigments obtained by mixing red, blue and green.
보다 구체적으로 상기 흑색 안료는 카본 블랙과 2가지 이상의 착색 안료를 혼합하여 밀링한 착색 분산액을 제조하여 사용할 수 있다. 사용 가능한 카본블랙으로는 미쿠니색소사의 CHBK-17; 동해카본(주)의 시스토 5HIISAF-HS, 시스토 KH, 시스토 3HHAF-HS, 시스토 NH, 시스토 3M, 시스토 300HAF-LS, 시스토 116HMMAF-HS, 시스토 116MAF, 시스토 FMFEF-HS, 시스토 SOFEF, 시스토 VGPF, 시스토 SVHSRF-HS, 및 시스토 SSRF; 미쯔비시화학(주)의 다이어그램 블랙 Ⅱ, 다이어그램 블랙 N339, 다이어그램 블랙 SH, 다이어그램 블랙 H, 다이어그램 LH, 다이어그램 HA, 다이어그램 SF, 다이어그램 N550M, 다이어그램 M, 다이어그램 E, 다이어그램 G, 다이어그램 R, 다이어그램 N760M, 다이어그램 LR, #2700, #2600, #2400, #2350, #2300, #2200, #1000, #980, #900, MCF88, #52, #50, #47, #45, #45L, #25, #CF9, #95, #3030, #3050, MA7, MA77, MA8, MA11, OIL7B, OIL9B, OIL11B, OIL30B, 및 OIL31B; 대구사(주)의 PRINTEX-U, PRINTEX-V, PRINTEX-140U, PRINTEX-140V, PRINTEX-95, PRINTEX-85, PRINTEX-75, PRINTEX-55, PRINTEX-45, PRINTEX-300, PRINTEX-35, PRINTEX-25, PRINTEX-200, PRINTEX-40, PRINTEX-30, PRINTEX-3, PRINTEX-A, SPECIAL BLACK-550, SPECIAL BLACK-350, SPECIAL BLACK-250, SPECIAL BLACK-100, 및 LAMP BLACK-101; 콜롬비아 카본(주)의 RAVEN-1100ULTRA, RAVEN-1080ULTRA, RAVEN-1060ULTRA, RAVEN-1040, RAVEN-1035, RAVEN-1020, RAVEN-1000, RAVEN-890H, RAVEN-890, RAVEN-880ULTRA, RAVEN-860ULTRA, RAVEN-850, RAVEN-820, RAVEN-790ULTRA, RAVEN-780ULTRA, RAVEN-760ULTRA, RAVEN-520, RAVEN-500, RAVEN-460, RAVEN-450, RAVEN-430ULTRA, RAVEN-420, RAVEN-410, RAVEN-2500ULTRA, RAVEN-2000, RAVEN-1500, RAVEN-1255, RAVEN-1250, RAVEN-1200, RAVEN-1190ULTRA, 및 RAVEN-1170 등을 들 수 있다.More specifically, the black pigment may be prepared by mixing a carbon black and two or more colored pigments to prepare a milled colored dispersion. Examples of usable carbon black include CHBK-17 from Mikuni Color; HS, SISO 3HHAF-HS, Sisato NH, Sisato 3M, Sisso 300HAF-LS, Sisso 116HMMAF-HS, Sisato 116MAF, Sisito FMFEF- HS, Cysto SOFEF, Cysto VGPF, Cysto SVHSRF-HS, and Cysto SSRF; Diagram Black II, Diagram Black N339, Diagram Black SH, Diagram Black H, Diagram LH, Diagram HA, Diagram SF, Diagram N550M, Diagram M, Diagram E, Diagram G, Diagram R, Diagram N760M, Diagram LR, # 2700, # 2600, # 2400, # 2350, # 2300, # 2200, # 1000, # 980, # 900, MCF88, # 52, # 50, # 47, # 45, # 45L, CF9, # 95, # 3030, # 3050, MA7, MA77, MA8, MA11, OIL7B, OIL9B, OIL11B, OIL30B, and OIL31B; PRINTEX-55, PRINTEX-55, PRINTEX-45, PRINTEX-35, PRINTEX-55, PRINTEX-85, PRINTEX-75, PRINTEX- SPECIAL BLACK-350, SPECIAL BLACK-250, SPECIAL BLACK-100, and LAMP BLACK-101; PRINTEX-25, PRINTEX-200, PRINTEX-40, PRINTEX-30, PRINTEX-3, PRINTEX-A; SPECIAL BLACK-550; RAVEN-1080 ULTRA, RAVEN-1060ULTRA, RAVEN-1060ULTRA, RAVEN-1040, RAVEN-1035, RAVEN-1020, RAVEN-1000, RAVEN-890H, RAVEN-890, RAVEN-880ULTRA, RAVEN-860ULTRA, 420, RAVEN-410, RAVEN-850, RAVEN-820, RAVEN-790ULTRA, RAVEN-780ULTRA, RAVEN-760ULTRA, RAVEN-520, RAVEN-500, RAVEN-460, RAVEN- RAVEN-1250, RAVEN-1200, RAVEN-1190ULTRA, and RAVEN-1170.
상기 카본블랙과 혼합하여 사용 가능한 착색 안료로는 카민 6B(C.I.12490), 프탈로시아닌 그린(C.I. 74260), 프탈로시아닌 블루(C.I. 74160), 미쓰비시 카본 블랙 MA100, 페릴렌 블랙(BASF K0084. K0086), 시아닌 블랙, 리놀옐로우(C.I.21090), 리놀 옐로우GRO(C.I. 21090), 벤지딘 옐로우4T-564D, 미쓰비시 카본 블랙 MA-40, 빅토리아 퓨어 블루(C.I.42595), C.I. PIGMENT RED97, 122, 149, 168, 177, 180, 192, 215, C.I. PIGMENT GREEN 7, 36, C.I. PIGMENT 15:1, 15:4, 15:6, 22, 60, 64, C.I. PIGMENT 83, 139 C.I. PIGMENT VIOLET 23 등이 있으며, 이 밖에 백색 안료, 형광 안료 등을 사용할 수도 있다.Examples of color pigments usable in combination with the carbon black include carmine 6B (CI12490), phthalocyanine green (CI 74260), phthalocyanine blue (CI 74160), Mitsubishi carbon black MA100, perylene black (BASF K0084. K0086) , Linol Yellow (CI 21090), Linol Yellow GRO (CI 21090), Benzidine Yellow 4T-564D, Mitsubishi Carbon Black MA-40, Victoria Pure Blue (CI42595) PIGMENT RED97, 122, 149, 168, 177, 180, 192, 215, C.I. PIGMENT GREEN 7, 36, C.I. PIGMENT 15: 1, 15: 4, 15: 6, 22, 60, 64, C.I. PIGMENT 83, 139 C.I. PIGMENT VIOLET 23, etc. In addition, white pigments, fluorescent pigments, etc. may be used.
상기 카본 블랙은 차광성이 있는 안료이면 특별히 한정되지 않으며, 공지된 카본 블랙을 사용할 수 있다. 상기 흑색 안료인 카본 블랙으로는 구체적으로 채널 블랙(channel black), 퍼니스 블랙(furnace black), 서멀 블랙(thermal black), 램프 블랙(lamp black) 등을 들 수 있다.The carbon black is not particularly limited as long as it is a light-shielding pigment, and known carbon black can be used. Specific examples of the carbon black that is the black pigment include channel black, furnace black, thermal black, lamp black, and the like.
또한, 상기 흑색 안료인 카본 블랙은 수지가 피복된 카본 블랙을 이용할 수도 있다. 상기 수지가 피복된 카본 블랙은 수지가 피복되어 있지 않은 카본 블랙에 비해 도전성이 낮기 때문에 블랙 매트릭스 또는 블랙 컬럼스페이서 형성시에 우수한 전기 절연성을 부여 할 수 있다.The carbon black, which is the black pigment, may be a resin-coated carbon black. Since the carbon black coated with the resin has a lower conductivity than that of the carbon black not coated with the resin, excellent electrical insulation can be imparted to the black matrix or black column spacer when the spacer is formed.
상기 흑색 안료는 흑색 안료의 입경이 균일하게 분산된 안료 분산액으로 사용할 수 있다. 안료의 입경을 균일하게 분산시키기 위한 방법의 예로는 안료 분산제(d1)를 함유시켜 분산 처리하는 방법 등을 들 수 있으며, 상기 방법에 따라 안료가 용액 중에 균일하게 분산된 상태의 안료 분산액을 얻을 수 있다.
The black pigment may be used as a pigment dispersion in which the particle size of the black pigment is uniformly dispersed. Examples of a method for uniformly dispersing the particle diameter of the pigment include a method of dispersing the pigment dispersion (d1) by containing the pigment dispersant (d1), and a method of obtaining a pigment dispersion in which the pigment is uniformly dispersed in a solution have.
(( d1d1 )안료 ) Pigment 분산제Dispersant
상기 안료 분산제의 구체적인 예로는 양이온계, 음이온계, 비이온계, 양성, 폴리에스테르계, 폴리아민계 등의 계면활성제 등을 들 수 있고, 이들은 각각 단독 또는 2종이상을 조합하여 사용할 수 있다.Specific examples of the pigment dispersant include a cationic surfactant, an anionic surfactant, a nonionic surfactant, a positive surfactant, a polyester surfactant, and a polyamine surfactant. These surfactants may be used singly or in combination of two or more.
또한, 부틸메타아크릴레이트(BMA) 또는 N,N-디메틸아미노에틸메타아크릴레이트(DMAEMA)를 포함하는 아크릴레이트계 분산제 (이하, 아크릴레이트계 분산제라고 함)를 포함하는 것이 바람직하다. 상기 아크릴레이트계 분산제의 시판품으로는 DISPER BYK-2000, DISPER BYK-2001, DISPER BYK-2070 또는 DISPER BYK-2150 등을 들 수 있으며, 상기 아크릴레이트계 분산제는 각각 단독 또는 2종이상을 조합하여 사용할 수 있다.It is also preferable to include an acrylate-based dispersant (hereinafter referred to as an acrylate-based dispersant) containing butyl methacrylate (BMA) or N, N-dimethylaminoethyl methacrylate (DMAEMA). Examples of commercially available acrylate dispersants include DISPER BYK-2000, DISPER BYK-2001, DISPER BYK-2070 and DISPER BYK-2150. The acrylate dispersants may be used alone or in combination of two or more. .
상기 안료 분산제(d1)는 상기한 아크릴 분산제 이외에 다른 수지 타입의 안료 분산제를 사용할 수도 있다. 상기 다른 수지 타입의 안료 분산제로는 공지된 수지 타입의 안료 분산제, 특히 폴리우레탄, 폴리아크릴레이트로 대표되는 폴리카르복실산 에스테르, 불포화 폴리아미드, 폴리카르복실산, 폴리카르복실산의 (부분적)아민 염, 폴리카르복실산의 암모늄 염, 폴리카르복실산의 알킬아민 염, 폴리실록산, 장쇄 폴리아미노아미드 포스페이트 염, 히드록실기-함 폴리카르복실산의 에스테르 및 이들의 개질 생성물, 또는 프리(free) 카르복실기를 갖는 폴리에스테르와 폴리(저급 알킬렌이민)의 반응에 의해 형성된 아미드 또는 이들의 염과 같은 유질의 분산제; (메트)아크릴산-스티렌 코폴리머, (메트)아크릴산-(메트)아크릴레이트 에스테르 코폴리머, 스티렌-말레산 코폴리머, 폴리비닐 알코올 또는 폴리비닐 피롤리돈과 같은 수용성 수지 또는 수용성 폴리머 화합물; 폴리에스테르; 개질 폴리아크릴레이트; 에틸렌 옥사이드/프로필렌 옥사이드의 부가생성물 및 포스페이트 에스테르 등을 들 수 있다. 상기한 수지형 분산제의 시판품으로는 양이온계 수지 분산제로서는, 예를 들면, BYK(빅) 케미사의 상품명: DISPER BYK-160, DISPER BYK-161, DISPER BYK-162,DISPER BYK-163, DISPER BYK-164, DISPER BYK-166, DISPER BYK-171, DISPER BYK-182,DISPER BYK-184; BASF사의 상품명: EFKA-44, EFKA-46, EFKA-47, EFKA-48,EFKA-4010, EFKA-4050, EFKA-4055, EFKA-4020, EFKA-4015, EFKA-4060, EFKA-4300, EFKA-4330, EFKA-4400, EFKA-4406, EFKA-4510, EFKA-4800 ; Lubirzol사의 상품명:SOLSPERS-24000, SOLSPERS-32550, NBZ-4204 /10; 카와켄 파인 케미컬사의 상품명: 히노액트(HINOACT) T-6000, 히노액트 T-7000, 히노액트 T-8000; 아지노모토사의 상품명: 아지스퍼(AJISPUR) PB-821, 아지스퍼 PB-822, 아지스퍼 PB-823; 쿄에이샤 화학사의 상품명: 플로렌 (FLORENE) DOPA-17HF, 플로렌 DOPA-15BHF, 플로렌 DOPA-33, 플로렌 DOPA-44 등을 들 수 있다. 상기한 아크릴 분산제 이외에 다른 수지 타입의 안료 분산제는 각각 단독 또는 2종이상을 조합하여 사용할 수 있으며, 아크릴 분산제와 병용하여 사용할 수도 있다.The pigment dispersant (d1) may be a pigment dispersant of a resin type other than the above acrylic dispersant. The other resin type pigment dispersing agent may be a known resin type pigment dispersing agent, especially a polycarboxylic acid ester such as polyurethane, polyacrylate, unsaturated polyamide, polycarboxylic acid, polycarboxylic acid (partial) Amine salts of polycarboxylic acids, alkylamine salts of polycarboxylic acids, polysiloxanes, long chain polyaminoamide phosphate salts, esters of hydroxyl group-containing polycarboxylic acids and their modified products, or free ) Oil-based dispersants such as amides formed by reaction of a polyester having a carboxyl group with poly (lower alkyleneimine) or salts thereof; Soluble resin or water-soluble polymer compound such as (meth) acrylic acid-styrene copolymer, (meth) acrylic acid- (meth) acrylate ester copolymer, styrene-maleic acid copolymer, polyvinyl alcohol or polyvinylpyrrolidone; Polyester; Modified polyacrylates; Adducts of ethylene oxide / propylene oxide, and phosphate esters. DISPER BYK-161, DISPER BYK-162, DISPER BYK-163, DISPER BYK-160, BYK (trade name) 164, DISPER BYK-166, DISPER BYK-171, DISPER BYK-182, DISPER BYK-184; EFKA-4060, EFKA-4060, EFKA-4055, EFKA-4055, EFKA-4055, EFKA-4020, EFKA-4015, EFKA-4060, EFKA- 4330, EFKA-4400, EFKA-4406, EFKA-4510, EFKA-4800; SOLSPERS-24000, SOLSPERS-32550, NBZ-4204/10 from Lubirzol; Hinoact T-6000, Hinoact T-7000, Hinoact T-8000; available from Kawaken Fine Chemicals; AJISPUR PB-821, Ajisper PB-822, Ajisper PB-823 manufactured by Ajinomoto; FLORENE DOPA-17HF, fluorene DOPA-15BHF, fluorene DOPA-33, and fluorene DOPA-44 are trade names of Kyoeisha Chemical Co., In addition to the acrylic dispersant, other resin type pigment dispersants may be used alone or in combination of two or more, and may be used in combination with an acrylic dispersant.
본 발명의 흑색 안료(D)는 흑색 감광성 수지 조성물 100중량부에 대하여 5 내지 20중량부로 포함될 수 있으며, 바람직하게는 5 내지 10중량부인 것이 좋다.
The black pigment (D) of the present invention may be contained in an amount of 5 to 20 parts by weight, preferably 5 to 10 parts by weight, based on 100 parts by weight of the black photosensitive resin composition.
<용매(E)>≪ Solvent (E) >
본 발명에 따른 용매(E)는 본 발명의 흑색 감광성 수지 조성물의 다른 성분들을 용해시키기 위해 사용되는 것으로서, 통상적으로 사용되는 흑색 감광성 수지 조성물에 사용되는 용매라면 특별히 제한하지 않고 사용될 수 있으며, 에테르류, 방향족 탄화수소류, 케톤류, 알코올류, 에스테르류, 아미드류 등이 바람직하다.The solvent (E) according to the present invention is used for dissolving other components of the black photosensitive resin composition of the present invention, and can be used without any particular limitation as long as it is a solvent used in a commonly used black photosensitive resin composition. , Aromatic hydrocarbons, ketones, alcohols, esters, amides and the like are preferable.
상기 용매(E)의 구체적인 예를 들면, 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 에틸렌글리콜모노프로필에테르, 에틸렌글리콜모노부틸에테르 등의 에틸렌글리콜모노알킬에테르류;Specific examples of the solvent (E) include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether;
프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노에틸에테르, 프로필렌글리콜모노프로필에테르, 프로필렌글리콜모노부틸에테르 등의 프로필렌글리콜모노알킬에테르류;Propylene glycol monoalkyl ethers such as propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether and propylene glycol monobutyl ether;
디에틸렌글리콜디메틸에테르, 디에틸렌글리콜디에틸에테르, 디에틸렌글리콜디프로필에테르, 디에틸렌글리콜디부틸에테르 등의 디에틸렌글리콜디알킬에테르류;Diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether and diethylene glycol dibutyl ether;
메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트 등의 에틸렌글리콜알킬에테르아세테이트류;Ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate;
프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르아세테이트, 프로필렌글리콜모노프로필에테르아세테이트, 메톡시부틸아세테이트, 메톡시펜틸아세테이트 등의 알킬렌글리콜알킬에테르아세테이트류;Alkylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate, and methoxypentyl acetate;
벤젠, 톨루엔, 크실렌, 메시틸렌 등의 방향족 탄화수소류;Aromatic hydrocarbons such as benzene, toluene, xylene, and mesitylene;
메틸에틸케톤, 아세톤, 메틸아밀케톤, 메틸이소부틸케톤, 시클로헥사논 등의 케톤류;Ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, and cyclohexanone;
에탄올, 프로판올, 부탄올, 헥사놀, 시클로헥산올, 에틸렌글리콜, 글리세린 등의 알코올류;Alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol and glycerin;
3-에톡시프로피온산에틸, 3-메톡시프로피온산메틸 등의 에스테르류, γ-부티롤락톤 등의 환상 에스테르류 등을 들 수 있다.Esters such as ethyl 3-ethoxypropionate and methyl 3-methoxypropionate, and cyclic esters such as? -Butyrolactone.
상기 용매(E)는 도포성 및 건조성 면에서 비점이 100 내지 200℃인 유기 용매가 바람직하며, 예를 들면 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르아세테이트, 시클로헥사논, 에틸락테이트, 부틸락테이트, 3-에톡시프로피온산에틸, 3-메톡시프로피온산메틸 등을 들 수 있다. 상기 예시한 용매(E)는 각각 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. The solvent (E) is preferably an organic solvent having a boiling point of 100 to 200 DEG C in terms of coatability and dryness, and examples thereof include propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, ethyl lactate , Butyl lactate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, and the like. The solvents (E) exemplified above may be used alone or in combination of two or more.
상기 용매(E)의 함량은 특별히 한정되지 않으나, 흑색 감광성 수지 조성물 100중량부 대하여 20 내지 85중량부로 포함될 수 있으며, 상기 범위내로 포함되는 경우 도포성이 양호해질 수 있다.
The content of the solvent (E) is not particularly limited, but may be 20 to 85 parts by weight based on 100 parts by weight of the black photosensitive resin composition. When the content is within the above range, the coating ability can be improved.
또한, 본 발명의 감광성 수지 조성물은 밀착촉진제, 계면활성제, 분산제, 산화방지제, 자외선흡수제, 열중합방지제, 및 레벨링제 중에서 선택되는 1종 이상의 첨가제를 추가로 포함할 수 있다.Further, the photosensitive resin composition of the present invention may further include at least one additive selected from an adhesion promoter, a surfactant, a dispersant, an antioxidant, an ultraviolet absorber, a thermal polymerization inhibitor, and a leveling agent.
상기 밀착촉진제로는 메타아크릴로일옥시 프로필트리메톡시 실란, 메타아크릴로일옥시 프로필 디메톡시 실란, 메타아크릴로일옥시 프로필트리에톡시 실란, 메타아크릴로일옥시 프로필디메톡시실란 등의 메타아크릴로일 실란 커플링제로 이루어진 군에서 선택된 적어도 1종을 사용할 수 있고, 알킬 트리메톡시 실란으로서 옥틸트리메톡시 실란, 도데실트리메톡시 실란, 옥타데실트리메톡시 실란으로 이루어진 군에서 선택된 적어도 1종을 사용할 수 있다.Examples of the adhesion promoter include methacrylate such as methacryloyloxypropyltrimethoxysilane, methacryloyloxypropyldimethoxysilane, methacryloyloxypropyltriethoxysilane, and methacryloyloxypropyldimethoxysilane. At least one member selected from the group consisting of octyltrimethoxysilane, dodecyltrimethoxysilane, and octadecyltrimethoxysilane may be used as the alkyltrimethoxysilane. Species can be used.
상기 계면 활성제로는 MCF 350SF, F-475, F-488, F-552(이하 DIC 사)등을 사용할 수 있으나 이들에만 한정하는 것은 아니며, 경우에 따라 좀 더 그 범위가 확대될 수 있다.Examples of the surfactant include MCF 350SF, F-475, F-488 and F-552 (hereinafter referred to as DIC), but the present invention is not limited thereto.
상기 분산제 및 레벨링제로는 당업계에서 일반적으로 쓰이는 것들이 모두 사용될 수 있다.As the dispersant and leveling agent, any of those commonly used in the art can be used.
상기 산화방지제로는 2,2-티오비스(4-메틸-6-t-부틸페놀), 2,6-g,t-부틸페놀 등을 사용할 수 있고, 상기 자외선 흡수제로는 2-(3-t-부틸-5-메틸-2-히드록시페닐)-5-클로로-벤조트리아졸, 알콕시 벤조페논 등을 사용할 수 있다. 상기 열중합방지제로는 히드로퀴논, p-메톡시페놀, 디-t-부틸-p-크레졸, 피로가롤, t-부틸카테콜, 벤조퀴논, 4,4-티오비스(3-메틸-6-t-부틸페놀), 2,2-메틸렌비스(4-메틸-6-t-부틸페놀), 2-머캅토이미다졸 등을 사용할 수 있다.Examples of the antioxidant include 2,2-thiobis (4-methyl-6-t-butylphenol), 2,6-g, t-butylphenol, t-butyl-5-methyl-2-hydroxyphenyl) -5-chloro-benzotriazole, alkoxybenzophenone and the like. Examples of the thermal polymerization inhibitor include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t- butylcatechol, benzoquinone, 4,4-thiobis t-butylphenol), 2,2-methylenebis (4-methyl-6-t-butylphenol), 2-mercaptoimidazole and the like.
그리고, 본 발명의 감광성 수지 조성물은 카본블랙 분산물, 기능성을 가지는 수지바인더, 모노머, 감방사선성 화합물, 및 그 밖의 첨가제 중에서 선택되는 1 종 이상의 2차 첨가제를 추가로 포함할 수 있다.The photosensitive resin composition of the present invention may further comprise at least one secondary additive selected from a carbon black dispersion, a functional resin binder, a monomer, a radiation-sensitive compound, and other additives.
또한, 본 발명은 상기 흑색 감광성 수지 조성물로 제조된 블랙매트리스 및 이를 구비하는 화상 표시 장치를 제공한다.The present invention also provides a black mattress made of the black photosensitive resin composition and an image display device having the black mattress.
본 발명의 화상 표시 장치는 상기 블랙매트릭스를 구비한 것으로서, 구체적인 예를 들면, 액정 디스플레이, OLED, 플렉서블 디스플레이 등을 들 수 있으며, 이에 한정되는 것은 아니다.
The image display apparatus of the present invention includes the above-described black matrix, and specific examples thereof include a liquid crystal display, an OLED, and a flexible display. However, the present invention is not limited thereto.
이하, 본 발명을 실시예, 비교예 및 실험예를 이용하여 더욱 상세하게 설명한다. 그러나 하기 실시예, 비교예 및 실험예는 본 발명을 예시하기 위한 것으로서, 본 발명은 하기 실시예, 비교예 및 실험예에 의해 한정되지 않고 다양하게 수정 및 변경될 수 있다.
Hereinafter, the present invention will be described in more detail with reference to Examples, Comparative Examples and Experimental Examples. However, the following examples, comparative examples and experimental examples are for illustrating the present invention, and the present invention is not limited by the following examples, comparative examples and experimental examples, and can be variously modified and changed.
합성예Synthetic example 1: One: 카도계Carometer 바인더 수지(A-1)의 합성 Synthesis of binder resin (A-1)
(1) 반응기에 비스페놀 에폭시 화합물인 9,9'-비스(4-글리실록시페닐)플루오렌(Hear chem社) 138g, 2-카복시에틸 아크릴레이트(2-Carboxyethyl acrylate) 54g, 벤질트리에틸암모늄클로라이드(대정화금社) 1.4g, 트리페닐포스핀(Aldrich社) 1g, 프로필글리콜메틸에틸아세테이트(Daicel Chemical社) 128g, 및 하이드로퀴논 0.5g을 넣고 120℃로 승온 후 12시간 유지하여, 하기 화학식 5로 표시되는 화합물을 합성하였다.(1) A reactor was charged with 138 g of bisphenol epoxy compound 9,9'-bis (4-glycyloxyphenyl) fluorene (Hear chem), 54 g of 2-carboxyethyl acrylate, 1 g of triphenylphosphine (Aldrich), 128 g of propylglycolmethylethylacetate (Daicel Chemical Co.), and 0.5 g of hydroquinone were charged, and the mixture was heated to 120 캜 and maintained at that temperature for 12 hours. A compound represented by the general formula (5) was synthesized.
(2) 반응기에 상기 화학식 5로 표시되는 화합물 60g, 비페닐테트라카르복실산 디무수물(Mitsubishi Gas社) 11g, 테트라히드로프탈 무수물(Aldrich社) 3g, 프로필글리콜메틸에틸아세테이트(Daicel Chemical社) 20g, 및 N,N'-테트라메틸암모늄 클로라이트 0.1g을 넣고 120℃로 승온 후 2시간 유지하여, 하기 화학식 6으로 표시되는 화합물을 합성하였다. 얻어진 화학식 6로 표시되는 화합물의 중량평균 분자량은 5,400 g/mol 이었다.(2) In the reactor, 60 g of the compound represented by the formula 5, 11 g of biphenyltetracarboxylic dianhydride (Mitsubishi Gas), 3 g of tetrahydrophthalic anhydride (Aldrich), 20 g of propylglycolmethylethylacetate (Daicel Chemical Co.) And 0.1 g of N, N'-tetramethylammonium chlorite were charged, heated to 120 ° C and maintained at this temperature for 2 hours to synthesize a compound represented by the following formula (6). The weight average molecular weight of the compound represented by the formula (6) was 5,400 g / mol.
[화학식 5][Chemical Formula 5]
[화학식 6][Chemical Formula 6]
합성예Synthetic example 2: 2: 카도계Carometer 바인더 수지(A-2)의 합성 Synthesis of binder resin (A-2)
(1) 반응기에 비스페놀 에폭시 화합물인 9,9'-비스(4-글리실록시페닐)플루오렌(Hear chem社) 138g, mono-2-acryloyloxyethyl succinate 54g, 벤질트리에틸암모늄클로라이드(대정화금社) 1.4g, 트리페닐포스핀(Aldrich社) 1g, 프로필글리콜메틸에틸아세테이트(Daicel Chemical社) 128g, 및 하이드로퀴논 0.5g을 넣고 120℃로 승온 후 12시간 유지하여, 하기 화학식 7로 표시되는 화합물을 합성하였다. (1) 138 g of bisphenol epoxy compound 9,9'-bis (4-glycyloxyphenyl) fluorene (Hear chem), 54 g of mono-2-acryloyloxyethyl succinate, benzyltriethylammonium chloride 1 g of triphenylphosphine (Aldrich), 128 g of propylglycolmethylethylacetate (Daicel Chemical Co.) and 0.5 g of hydroquinone were charged, and the mixture was heated to 120 DEG C and maintained at that temperature for 12 hours to obtain a compound Were synthesized.
(2) 반응기에 상기 화학식 7로 표시되는 화합물 60g, 비페닐테트라카르복실산 디무수물(Mitsubishi Gas社) 11g, 테트라히드로프탈 무수물(Aldrich社) 3g, 프로필글리콜메틸에틸아세테이트(Daicel Chemical社) 20g, 및 N,N'-테트라메틸암모늄 클로라이트 0.1g을 넣고 120℃로 승온 후 2시간 유지하여, 하기 화학식 8로 표시되는 화합물을 합성하였다. 얻어진 화학식 8로 표시되는 화합물의 중량평균 분자량은 5,400 g/mol 이었다.(2) In the reactor, 60 g of the compound represented by the formula (7), 11 g of biphenyltetracarboxylic dianhydride (Mitsubishi Gas), 3 g of tetrahydrophthalic anhydride (Aldrich), 20 g of propylglycolmethylethylacetate , And 0.1 g of N, N'-tetramethylammonium chlorite were charged, and the mixture was heated to 120 ° C and maintained at this temperature for 2 hours to synthesize a compound represented by the following formula (8). The weight average molecular weight of the compound represented by the formula (8) was 5,400 g / mol.
[화학식 7] (7)
[화학식 8][Chemical Formula 8]
비교합성예Comparative Synthetic Example : 바인더 수지(A-3)합성: Binder resin (A-3) Synthesis
반응용매로 THF(테트라하이드로퓨란) 용액 200g을 500ml 4구 플라스크에 투입하고 50℃로 유지시킨다. 화학식 9로 표시되는 화합물 89g을 투입하고 화학식 10으로 표시되는 에피클로히드린 용액을 44.5g을 드롭핑 펀넬을 이용하여 분당 5.25g의 속도로 투입하여 1시간 30분간 반응시켰다. 반응으로 얻어진 비스페놀계 플루오렌형 에폭시 레진 화합물 348g을 1000mL 반응기에 투입하고 아크릴산 용액 140.52g을 넣고 80℃로 승온하여 반응을 시켰다. 이 후, 테트라에틸 암모늄 브로마이드 13.5g을 서서히 투입하여 60시간 동안 반응을 시켰다. 상기 반응물 150g을 반응기에 넣고 산무수물(무수프탈산) 180.5g과 산2무수물(무수피로메리트산) 348.8g을 투입한 후 120℃로 유지시킨다. 이때 촉매로써 Fascat 4101을 0.718g을 서서히 넣고 5시간 동안 반응시켜 바인더 수지를 제조하였다.200 g of a THF (tetrahydrofuran) solution as a reaction solvent was charged into a 500 ml four-necked flask and maintained at 50 캜. 89 g of the compound represented by the formula (9) was introduced and 44.5 g of the epiklohydrin solution represented by the formula (10) was introduced at a rate of 5.25 g per minute using a dropping funnel, and the reaction was conducted for 1 hour and 30 minutes. 348 g of the bisphenol-based fluorene-type epoxy resin compound obtained by the reaction was charged into a 1000-mL reactor, 140.52 g of an acrylic acid solution was added, and the temperature was raised to 80 ° C to conduct the reaction. Thereafter, 13.5 g of tetraethylammonium bromide was slowly added thereto, and the reaction was allowed to proceed for 60 hours. 150 g of the above reaction product was placed in a reactor, and 180.5 g of anhydride (phthalic anhydride) and 348.8 g of anhydride (anhydrous pyromellitic acid) were added thereto and maintained at 120 ° C. At this time, 0.718 g of Fascat 4101 as a catalyst was slowly added thereto and reacted for 5 hours to prepare a binder resin.
[화학식 9][Chemical Formula 9]
[화학식 10][Chemical formula 10]
합성예Synthetic example 3: 3: 광중합Light curing 개시제Initiator 합성 synthesis
3.13.1
질소 분위기의 반응기에 AlCl3 37.3g과 디클로로에탄 112.0g을 투입하여 온도를 5℃로 유지하며 교반하였다. 아세틸클로라이드 용액 17.27g에 디클로로에탄 240.3g 및 니트로카르바졸 48.1g을 용해하고, 상기 용해된 용액을 1시간 동안 반응기에 적하하였다. 그 후 온도를 15℃로 상승시켜 2시간 더 교반하였다. 상기 반응액에 증류수를 투입하여 세척 및 분리 후에 용매를 건조하여 순도 94%인 반응물 1을 수득하였다.37.3 g of AlCl 3 and 112.0 g of dichloroethane were charged into a reactor having a nitrogen atmosphere, and the mixture was stirred at a temperature of 5 ° C. 240.3 g of dichloroethane and 48.1 g of nitrocarbazole were dissolved in 17.27 g of acetyl chloride solution, and the dissolved solution was added dropwise to the reactor for 1 hour. The temperature was then raised to 15 ° C and stirring was continued for another 2 hours. Distilled water was added to the reaction solution, washed and separated, and then the solvent was dried to obtain a reactant 1 having a purity of 94%.
3.23.2
질소 분위기의 반응기에 상기 반응물 1 35.0g, 염산히드록실아민 11.1g, 아세트산나트륨 15.1g, 에탄올 90g, 증류수 30g을 투입하여 온도를 80℃로 유지하며 5시간 동안 교반하였다. 그 후 증류수를 투입하여 석출물을 분리 및 건조하여 순도 92%인 반응물 2를 수득하였다.35.0 g of the above reaction product 1, 11.1 g of hydrochloric acid hydroxylamine, 15.1 g of sodium acetate, 90 g of ethanol and 30 g of distilled water were put into a reactor having a nitrogen atmosphere, and the mixture was stirred at the temperature of 80 캜 for 5 hours. Thereafter, distilled water was added to separate the precipitate and dried to obtain a reactant 2 having a purity of 92%.
3.33.3
질소 분위기의 반응기에 반응물 2 26.0g, 디클로로메탄 78g을 투입하여 상온에서 교반하였다. 그 후 아세트산무수물 15.0g을 디클로로에탄 15.0g으로 희석한 혼합 용액을 1시간 동안 반응기에 적하한 후 1시간 동안 교반하였다. 교반 후 증류수를 투입하여 여러 번 세척한 후 디클로로메탄을 증발시켜 순도 90%인 화학식 11을 수득하였다. 화학식 11은 화학식 3의 R13 및 R14가 메틸기인 구조로, 하기와 같이 나타낼 수 있다.26.0 g of Reactant 2 and 78 g of dichloromethane were charged into a reactor having a nitrogen atmosphere and stirred at room temperature. Then, a mixed solution obtained by diluting 15.0 g of acetic anhydride with 15.0 g of dichloroethane was added dropwise to the reactor for 1 hour, followed by stirring for 1 hour. After stirring, distilled water was added thereto, washed several times, and dichloromethane was evaporated to obtain a compound of formula 11 having a purity of 90%. Formula 11 is a structure in which R 13 and R 14 in Formula 3 are methyl groups, and can be represented as follows.
[화학식 11](11)
실시예Example 1~10 및 1 to 10 and 비교예Comparative Example 1~6 1 to 6
하기 표 1의 성분 및 함량(단위: 중량부, 감광성 수지 조성물 100중량부 기준)을 사용하여 감광성 수지 조성물을 제조하였다.The photosensitive resin composition was prepared using the components and the content (unit: parts by weight, based on 100 parts by weight of the photosensitive resin composition) shown in Table 1 below.
(E)menstruum
(E)
A-1: 합성예 1의 카도계 바인더 수지 (본 발명의 카도계 바인더 수지)
A-2: 합성예 2의 카도계 바인더 수지 (본 발명의 카도계 바인더 수지)
A-3: 비교합성예의 바인더 수지
A-4: 아크릴계 바인더(벤질메타아크릴레이트/N-페닐말레이미드/스티렌/메타아크릴산)
(몰비 55/9/11/25, Mw=20,000, 산가 100 ㎎KOH /g)
[광중합성 화합물(B)]: 디펜타에리스리톨트리아크릴레이트
[광중합 개시제(C)]
C-1: 합성예 3의 광중합 개시제
C-2: N-1919 (Adeka사)
C-3: Triazine-EB(Tronly사)
[흑색 안료(D)]: CHBK-17(미쿠니색소사)
[용매(E)]: 프로필렌글리콜모노메틸에테르아세테이트
[밀착촉진제(F)]: 3-메타아크릴로일옥시 프로필트리메톡시 실란(신에츠사)[Binder resin (A)]
A-1: Cathode binder resin of Synthesis Example 1 (Cathode binder resin of the present invention)
A-2: Cathode binder resin of Synthesis Example 2 (Cathode binder resin of the present invention)
A-3: Binder resin of Comparative Synthesis Example
A-4: Acrylic binder (benzylmethacrylate / N-phenylmaleimide / styrene / methacrylic acid)
(Molar ratio: 55/9/11/25, Mw = 20,000, acid value: 100 mgKOH / g)
[Photopolymerizable Compound (B)]: Dipentaerythritol triacrylate
[Photopolymerization initiator (C)]
C-1: A photopolymerization initiator of Synthesis Example 3
C-2: N-1919 (Adeka)
C-3: Triazine-EB (Tronly)
[Black pigment (D)]: CHBK-17 (Mikuni Color Company)
[Solvent (E)]: Propylene glycol monomethyl ether acetate
[Adhesion promoter (F)]: 3-methacryloyloxypropyltrimethoxysilane (Shin-Etsu)
실험예Experimental Example
[접착력 평가][Evaluation of adhesion strength]
실시예 및 비교예의 감광성 수지 조성물을 도포하고, 핫플레이트 상에서 100℃에서 1분 동안 건조시켜 도막을 수득하였다. 이후, 도막 위에 패턴 두께가 1 내지 20㎛까지 1㎛단위로 새겨진 마스크를 사용하여 365㎚의 파장을 가진 고압 수은 램프를 사용하여 노광 공정을 수행하였다. 노광 공정까지 진행한 도면에 대해 현상을 진행하지 않고 230℃의 컨벡션 오븐에서 100분간 포스트베이크(post-bake)한 후 PCT(Pressure-cookertest) 를 실시 후, Cross-cut 테스트로 글라스와 코팅편의 박리여부를 판단하였고(도 1 참조), 그 결과를 하기 표 2에 나타내었다 (PCT 공정조건: 2기압, 습도 120% 4hr/1cycle).
The photosensitive resin compositions of Examples and Comparative Examples were applied and dried on a hot plate at 100 占 폚 for 1 minute to obtain a coated film. Thereafter, the exposure process was carried out using a high-pressure mercury lamp having a wavelength of 365 nm by using a mask having a pattern thickness of 1 to 20 mu m and engraved in a unit of 1 mu m on the coating film. After performing the post-bake for 100 minutes in a convection oven at 230 ° C without performing development for the exposure process, PCT (Pressure-cookertest) was performed, and then the glass and coating pieces were peeled off by a cross- (See FIG. 1). The results are shown in Table 2 below (PCT process condition: 2 atmospheres, humidity 120% 4hr / 1 cycle).
[현상 밀착성 평가][Evaluation of developing adhesion]
두께 1㎜의 유리기판 상에 1㎛의 두께로 실시예 및 비교예의 감광성 수지 조성물을 도포하고, 핫플레이트 상에서 100℃에서 1분 동안 건조시켜 도막을 수득하였다. 이후, 도막 위에 패턴의 폭이 1 내지 20㎛까지 1㎛단위로 새겨진 마스크를 사용하여 365㎚의 파장을 가진 고압 수은 램프를 사용하여 노광한 후, 1% KOH계 수용액을 사용하여 30℃, 상압 하에서 일정 시간 동안 현상을 진행하였다. 패턴이 잔존하는 마스크 사이즈를 기준으로 최소패턴을 측정하였고(도 2 참조), 그 결과를 하기 표 2에 나타내었다.The photosensitive resin compositions of Examples and Comparative Examples were applied to a glass substrate having a thickness of 1 mm at a thickness of 1 占 퐉 and dried on a hot plate at 100 占 폚 for 1 minute to obtain a coated film. Thereafter, using a mask engraved in a unit of 1 mu m in width from 1 to 20 mu m in pattern width on the coating film, the resist film was exposed using a high-pressure mercury lamp having a wavelength of 365 nm, and then developed with a 1% KOH aqueous solution at 30 DEG C, The development was carried out for a certain period of time. The minimum pattern was measured based on the mask size in which the pattern remained (see FIG. 2), and the results are shown in Table 2 below.
표 2에 나타난 바와 같이, 실시예 1 내지 10의 경우, 현상 밀착력이 우수하여 패턴의 유실 없이 형성 가능한 최소 패턴의 크기가 현저히 작아 고해상도의 컬러 필터를 구현할 수 있고, 기판에 대한 접착력도 우수하여 내구성 또한 우수한 것을 확인하였으며, 특히 실시예 1 내지 3 및 6 내지 8이 최소패턴의 크기가 작고 기판접착력이 우수하였다.As shown in Table 2, in Examples 1 to 10, a color filter having a high resolution can be realized because the developing adhesion is excellent and the minimum pattern size that can be formed without loss of the pattern is remarkably small, and the adhesion to the substrate is excellent, In particular, Examples 1 to 3 and 6 to 8 were small in the minimum pattern size and excellent in substrate adhesion.
화학식 5 및 7과는 다른 구조를 갖는 화합물로부터 중합한 바인더 수지를 사용한 비교예 1의 경우, 현상 밀착력이 저하되어 최소 패턴의 크기가 컸고, 내습열 조건에서의 기판력이 저하되어 내구성이 약한 것을 확인하였다. 또한, 아크릴계 바인더 수지를 사용한 비교예 2의 경우, 기판에 대한 접착력은 다소 우수하였으나, 내구성이 약한 것을 확인하였고, 옥심에스테르계 광개시제 대신 트리아진계 광개시제를 사용한 비교예 3 및 4의 경우에는 현상 밀착력과 기판에 대한 접착성이 모두 저하된 것으로 나타났다.In the case of Comparative Example 1 using the binder resin polymerized from a compound having a structure different from the formulas 5 and 7, it was confirmed that the developing adhesion was decreased, the minimum pattern size was large, the substrate strength under the anti- Respectively. In the case of Comparative Example 2 using the acrylic binder resin, the adhesion to the substrate was somewhat superior, but it was confirmed that the durability was weak. In the case of Comparative Examples 3 and 4 in which a triazine-based photoinitiator was used in place of the oxime ester-based photoinitiator, The adhesiveness to the substrate was all lowered.
Claims (4)
상기 알칼리 가용성 수지(A)는 하기 화학식 1의 반복 단위를 갖는 카도계 바인더 수지(A)를 포함하며,
상기 광중합 개시제(C)는 하기 화학식 3으로 표시되는 화합물을 포함하는, 흑색 감광성 수지 조성물:
[화학식 1]
(상기 화학식 1에서, X는 단일 결합, -CO-, -SO2-, -C(CF3)2-, -Si(CH3)2-, -CH2-, -C(CH3)2-, -O-, , , , , , , , , , , , 또는이고,
Y는 산무수물잔기이고,
R'는 수소 원자, 에틸기, 페닐기, -C2H4Cl, -C2H4OH, 또는 -CH2CH=CH2이고,
R1, R2, R3, R4, R5 및 R6은 각각 독립적으로 수소 원자 또는 메틸기이고,
R7 및 R8은 각각 독립적으로 탄소수 1 내지 6의 직쇄 또는 분지쇄의 알킬렌기이며, 상기 알킬렌기는 에스테르 결합, 탄소수 6 내지 14의 싸이클로알킬렌기 및 탄소수 6 내지 14의 아릴렌기 중 적어도 하나를 포함할 수 있고,
R9, R10, R11 및 R12는 각각 독립적으로 수소 원자, 할로겐 원자 또는 탄소수 1 내지 5의 직쇄 또는 분지쇄의 알킬기이고,
m은 0 ≤ m ≤ 30을 만족하는 정수임)
[화학식 3]
(상기 화학식 3에서,
R13은 탄소수 1 내지 8의 알킬기, -O-R15, 및 할로겐기로 이루어진 군으로부터 선택되는 1개 이상의 치환기로 치환된 탄소수 6 내지 10의 아릴기, 또는 -O-R15 및 할로겐기로 이루어진 군으로부터 선택되는 1개 이상의 치환기로 치환된 탄소수 7 내지 24의 아릴알킬기이고,
R14는 탄소수 1 내지 8의 알킬기, 탄소수 6 내지 10의 아릴기 또는 탄소수 7 내지 24의 아릴알칼기이고,
R15는 수소, 탄소수 1 내지 20의 알킬기, 또는 탄소수 1 내지 8의 알콕시기로 치환된 탄소수 1 내지 20의 알킬기임).(A), a photopolymerizable compound (B), a photopolymerization initiator (C), a black pigment (D) and a solvent (E)
The alkali-soluble resin (A) comprises a cationic binder resin (A) having a repeating unit represented by the following formula (1)
Wherein the photopolymerization initiator (C) comprises a compound represented by the following general formula (3):
[Chemical Formula 1]
(In Formula 1, X is a single bond, -CO-, -SO 2 -, -C (CF 3) 2 -, -Si (CH 3) 2 -, -CH 2 -, -C (CH 3) 2 -, -O-, , , , , , , , , , , , or ego,
Y is an acid anhydride residue,
R 'is a hydrogen atom, an ethyl group, a phenyl group, -C 2 H 4 Cl, -C 2 H 4 OH, or -CH 2 CH = CH 2,
R 1 , R 2 , R 3 , R 4 , R 5 and R 6 are each independently a hydrogen atom or a methyl group,
R 7 and R 8 are each independently a straight or branched alkylene group having 1 to 6 carbon atoms, and the alkylene group may have at least one of an ester bond, a cycloalkylene group having 6 to 14 carbon atoms and an arylene group having 6 to 14 carbon atoms May include,
R 9 , R 10 , R 11 and R 12 are each independently a hydrogen atom, a halogen atom or a straight or branched alkyl group having 1 to 5 carbon atoms,
and m is an integer satisfying 0? m? 30)
(3)
(3)
R 13 is an aryl group having 6 to 10 carbon atoms substituted with at least one substituent selected from the group consisting of an alkyl group having 1 to 8 carbon atoms, -OR 15 , and a halogen group, or a group selected from the group consisting of -OR 15 and a halogen group An arylalkyl group having 7 to 24 carbon atoms substituted with at least one substituent,
R 14 is an alkyl group having 1 to 8 carbon atoms, an aryl group having 6 to 10 carbon atoms, or an arylalkyl group having 7 to 24 carbon atoms,
R 15 is hydrogen, an alkyl group having 1 to 20 carbon atoms, or an alkyl group having 1 to 20 carbon atoms substituted with an alkoxy group having 1 to 8 carbon atoms.
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