200808456 九、發明說明： 【發明所屬之技術領域】 本發明關於點膠機之塗佈頭單元，尤其是關於具有快速地 移動之簡化配置之點膠機之塗佈頭單元。 【先前技術】 點膠機用以粘著兩基板以製造液晶顯示面板（LCD)，立 • ^錄佈給定_的賴至兩基板其中之-上。點賴包含 设，基板的平台，配置喷嘴塗佈膠體之塗佈頭單元，設置塗佈 頭早70之頭支撐框’控制移動頭支撐框之馬達及移動塗佈頭單 元之馬達的控制單元。 _ 拓給定随塗佈雜於基鱗，必須轉喷嘴與基 維=:== 機移藉動由上二移動塗佈頭單元來 平取叫額別地以水 軸移動單it須奴夠移動 ς啊早70。因此z =軸移動單量=佈 200808456 尤其是，z軸移動單元包含第一與第二致動器(揭露於韓 國專利申請案2003-0001338號）。第一致動器用以低速大幅度 調整喷嘴及基板間之距離，第二致動器用以高速微調噴嘴及基 板間之距離。塗佈頭單元配置二個Z轴移動單元之重量較配 置一個Z軸移動單元沉重。 第二致動器上下移動噴嘴、膠體容器及感測器，使得加速 调整贺嘴與基板間之距離很困難。第一致動器移動第二致動器 上下移動，此增加施於第一致動器的負載。因此，當移動塗佈 頭於X軸方向及/或γ軸方向，以預定圖案塗佈膠體於基板上 時，因為加上兩個致動器之塗佈頭單元重量增加，對於塗佈頭 單元移動的速度及穩定度有顯著的影響。 【發明内容】 因此，本發明之一目的在於減少z軸移動單元可移動之 裝置的數量，以快速調整喷嘴與基板間之距離。 本發明之又一目的在於使塗佈頭單元配置有一個Z軸移 動單元，以快速並穩定地操作塗佈頭單元。 根據本發明之一面向，提供一種點膠機之塗佈頭單元，其 包含其上提供喷嘴之塗佈頭；一 Z軸移動單元，於z軸方向' 上下移動塗佈頭，以調整喷嘴與基板間之距離；第一感测器， 感測噴嘴之垂直位置；第二感測器，於z軸移動單元之固定 200808456 部分上，感測第二感測器與基板間之距離；以及2軸控制單 元，依據第一感測器與第二感測器所感測之距離控制2軸移 動單凡，其包含第一調整單元，於塗佈膠體至基板前，調整噴 嘴與基板間之雜至預定值；以及第二調整單元，於塗佈=體 至基板時，調整喷嘴與基板間之距離至該預定值。200808456 IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD OF THE INVENTION The present invention relates to a coating head unit of a dispenser, and more particularly to a coating head unit of a dispenser having a simplified configuration for rapid movement. [Prior Art] A dispenser is used to adhere two substrates to manufacture a liquid crystal display panel (LCD), which is placed on the top of the two substrates. The control unit including the base plate of the substrate, the nozzle coating unit for the nozzle coating, and the support frame for the head of the moving head support frame and the motor for moving the coating head unit are disposed. _ extension given with the coating mixed with the base scale, must rotate the nozzle and the base dimension =:== machine shift borrowing by the second two moving coating head unit to draw the amount of the water to move the single axis to move enough Oh, 70. Therefore, z = axis shift unit amount = cloth 200808456 In particular, the z-axis moving unit includes first and second actuators (exposure to Korean Patent Application No. 2003-0001338). The first actuator is used to greatly adjust the distance between the nozzle and the substrate at a low speed, and the second actuator is used to finely adjust the distance between the nozzle and the substrate at a high speed. The coating head unit is configured to have two Z-axis moving units that are heavier than a Z-axis moving unit. The second actuator moves the nozzle, the colloidal container, and the sensor up and down, making it difficult to adjust the distance between the mouthpiece and the substrate. The first actuator moves the second actuator up and down, which increases the load applied to the first actuator. Therefore, when the coating head is applied to the substrate in a predetermined pattern in the X-axis direction and/or the γ-axis direction, since the weight of the coating head unit to which the two actuators are added is increased, for the coating head unit The speed and stability of movement have a significant impact. SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to reduce the number of devices that can be moved by a z-axis moving unit to quickly adjust the distance between the nozzle and the substrate. Still another object of the present invention is to provide a coating head unit with a Z-axis moving unit for operating the coating head unit quickly and stably. According to one aspect of the present invention, there is provided a coating head unit of a dispenser comprising a coating head on which a nozzle is provided; a Z-axis moving unit that moves the coating head up and down in the z-axis direction to adjust the nozzle and a distance between the substrates; a first sensor that senses a vertical position of the nozzle; and a second sensor that senses a distance between the second sensor and the substrate on a portion of the fixed portion of the z-axis moving unit; The axis control unit controls the 2-axis movement according to the distance sensed by the first sensor and the second sensor, and includes a first adjusting unit, and adjusts the gap between the nozzle and the substrate before applying the glue to the substrate a predetermined value; and a second adjusting unit that adjusts a distance between the nozzle and the substrate to the predetermined value when coating the body to the substrate.
本發明歧及其他多個目的、面向、特色及優點，將可於 本發明其後之詳述並結合伴隨的圖式顯而易見。 【實施 範例纟會示於 本發日^之較佳具體實施例詳述如下，例舉之示 伴隨的圖式。 μ 塗佈膠體於基板上定圖案置 圖 第1圖係本發明-實_之卿機之塗佈醉元之透視 如第ί圖所示’塗佈頭單元卿包含塗m 動=〇、第-感測器13"二感咖及2軸控2 兀 150 〇 喷嘴111及連驗噴嘴111謂财n m，其内含膠體 200808456 供給至塗佈頭110。璆體經喷嘴m塗佈於基板ι〇上如第2 置於塗佈頭110上之支撐塊113支撐膠體容器112, 〜’、&夕體至贺嘴ηι。可提供一固定I 仏 扑以供給固定勤至謬體容器112，使喷嘴=塗(佈未^體。 认^轴移動單元12G於ζ軸方向上下移動塗佈頭m，因而 供-f上下_翁11卜依本發狀—賤實施例，提 供個軸移動皁70120於點膠機。如下敘述，z軸控制單元 :鮮-感測㈣及第二感測請所感測之距離制= 喷鳴111及基板1〇間之距離。 軸移動板可藉由z軸馬達121(像是旋轉馬達或線性馬達) 於Z軸方向移動’並與塗佈頭携固定地結合。z轴移動 120移動Z軸移動板’如此於2軸方向上下移動塗佈頭⑽。 舉例說明旋轉馬達。滚珠螺桿於Z軸方向與旋轉馬達之 旋轉棒輕合。滾珠螺桿縱向插入與2軸移動板麵合之滚 帽。線性馬達（LM)導件，沿著z軸移動板的轉設置。因 此，Z軸飾板於Z軸方向由滚_桿之旋騎動產生線性 動0 、 更進一步可提供Y軸移動單元16〇及Χ軸移動單元 於塗佈頭100上，以分別地於γ軸方向移動與z轴移動單元 12〇|馬合之塗佈頭110，因而於丫軸方向移動噴嘴。置於 200808456 頭支撐框20及Y軸移動單元160間之χ軸移動單元17〇，於 X軸方向移動頭單元100,因而於X軸方向調整喷嘴ιη之垂 直位置。像是線性馬達之致動器可實施為γ轴移動單元16〇 及X轴移動單元170。 第一感測器130感測喷嘴之垂直位置。第一感測器13〇 提供垂直位置的資料給Ζ軸控制單元150。第一感測器130可 包含任何能感測喷嘴111與基板位置的元件。第一感測器13〇 可包含一線性編碼器(linearencoder)，以精確的控制喷嘴ηΐ 之位置。線性編碼器置於Z軸移動單元120，以彳貞測ζ軸移動 板的移動距離量及Z軸移動板移動的方向。線性編碼器提供 距離量及方向之資料給Z軸控制單元150。Z軸控制單元15〇 依距離量及方向之資料，計算喷嘴111之垂直位置。可提供另 一感測益’其感測Z轴移動單元120移動的參考點。於設定 時，喷嘴m移動至參考點。 第二感測器140固定於ζ轴移動單元120之固定部分， 用以感測第二感測器140與基板10間之距離。也就是，當噴 嘴Π1相對於基板10移動，塗佈預定圖案之膠體於基板10上 時，第二感測器14〇即時地感測第二感測器140及基板1〇間 之距離。此舉可偵測第二感測器140及基板10間距離的改變， 因此間接地偵測噴嘴111及基板10間距離的改變。提供量測 到的改變資料給Z軸控制單元150。 200808456 Z軸移動單元120並不上下移動第二感測器14〇，係固定 於Z轴移動單元120之固定部分。此舉不僅減少z轴移動單 元120之負載’也可使Z軸移動單元12〇較輕，因此當塗佈 膠體於基板11上時，有助於快速地調整噴嘴m與基板n間 之距離。當喷嘴111上下移動時，連接至第二感測器140之纜 線亦不會上下移動。此舉能防止因纜線移動產生之微粒。 第二感測器140可以下列方式設置：當塗佈時，第二感測 ，140必須感測之距離係在第二感測器14〇涵蓋的範圍。也就 疋第一感測斋140必須感測的距離之中點與第二感測器14〇 涵蓋範圍的中點對準。The invention will be apparent from the following detailed description of the invention and the accompanying drawings. [Examples of Embodiments] The preferred embodiments of the present invention will be described in detail below, and the accompanying drawings are exemplified. μ coating colloid on the substrate to set the pattern Figure 1 is the invention - the actual _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ - The sensor 13 " two sensory and two axis control 2 兀 150 〇 nozzle 111 and the continuous test nozzle 111 are said to be rich in nm, and the colloid 200808456 is supplied to the coating head 110. The carcass is coated on the substrate by the nozzle m, and the support block 113 placed on the coating head 110 as in the second support the colloidal container 112, 〜', &夕; A fixed I can be provided to supply the fixed body to the body container 112, so that the nozzle = coating (the cloth is not in the body. The axis moving unit 12G moves the coating head m up and down in the direction of the x-axis, thus providing -f up and down _ According to the embodiment of the present invention, a shaft moving soap 70120 is provided on the dispenser. As described below, the z-axis control unit: fresh-sensing (four) and the second sensing are sensed by the distance system = squirting The distance between the 111 and the substrate 1. The shaft moving plate can be moved in the Z-axis direction by the z-axis motor 121 (such as a rotary motor or a linear motor) and is fixedly coupled with the coating head. The z-axis moves 120 to move Z. The shaft moving plate 'moves the coating head (10) up and down in the 2-axis direction. The rotating motor is exemplified. The ball screw is lightly coupled to the rotating rod of the rotating motor in the Z-axis direction. The ball screw is longitudinally inserted into the roller cap that is combined with the 2-axis moving plate. The linear motor (LM) guide moves the plate along the z-axis. Therefore, the Z-axis plaque is linearly moved by the roller-rod in the Z-axis direction, and a Y-axis moving unit is further provided. 16〇 and the x-axis moving unit are on the coating head 100 to move in the γ-axis direction and the z-axis, respectively The moving unit 12〇|Mahe's coating head 110 moves the nozzle in the x-axis direction. The crucible moving unit 17〇 is placed between the head support frame 20 and the Y-axis moving unit 160, and the head unit is moved in the X-axis direction. 100, thereby adjusting the vertical position of the nozzle i in the X-axis direction. An actuator such as a linear motor can be implemented as a γ-axis moving unit 16 〇 and an X-axis moving unit 170. The first sensor 130 senses the vertical position of the nozzle The first sensor 13A provides vertical position information to the spindle control unit 150. The first sensor 130 can include any component capable of sensing the position of the nozzle 111 and the substrate. The first sensor 13 can include a line. A linear encoder (linearencoder) to precisely control the position of the nozzle η. The linear encoder is placed in the Z-axis moving unit 120 to measure the moving distance of the y-axis moving plate and the direction in which the Z-axis moving plate moves. Linear coding The device provides the distance quantity and the direction information to the Z-axis control unit 150. The Z-axis control unit 15 calculates the vertical position of the nozzle 111 according to the distance quantity and direction data. Another sensing benefit can be provided. The unit 120 moves The test point is moved to the reference point. The second sensor 140 is fixed to the fixed portion of the x-axis moving unit 120 for sensing the distance between the second sensor 140 and the substrate 10. That is, When the nozzle Π1 moves relative to the substrate 10, when the gel of the predetermined pattern is coated on the substrate 10, the second sensor 14 〇 instantly senses the distance between the second sensor 140 and the substrate 1 。. The change in the distance between the second sensor 140 and the substrate 10 is measured, thereby indirectly detecting the change in the distance between the nozzle 111 and the substrate 10. The measured change information is supplied to the Z-axis control unit 150. 200808456 The Z-axis moving unit 120 does not move the second sensor 14A up and down, and is fixed to the fixed portion of the Z-axis moving unit 120. This not only reduces the load of the z-axis moving unit 120 but also makes the Z-axis moving unit 12 〇 lighter, so that when the glue is applied to the substrate 11, it helps to quickly adjust the distance between the nozzle m and the substrate n. When the nozzle 111 moves up and down, the cable connected to the second sensor 140 does not move up and down. This will prevent particles from moving due to cable movement. The second sensor 140 can be arranged in such a manner that when applied, the second sensing 140 must sense the distance within the range covered by the second sensor 14A. That is, the midpoint of the distance that the first sensing 140 must sense is aligned with the midpoint of the coverage of the second sensor 14?.
Z軸控制單元15G接收第—感測器13G與第二感測器14〇 =巨離貧料。Z軸控制單元15G控制z軸移動單^ 12〇，以調 I喷嘴111與基板10間之距離。Z軸控制單元150包 調整單元151及第二調整單元152。 在塗佈賴祕板1G前，第_霞單元⑸調整喷嘴⑴ K)敗距離至號值。也就是’第—罐單元⑸ ==器m感測當噴嘴ηι接觸基板1G織離開 偵測喷嘴m接觸基板10之接觸點。並且，第 基板10間之預定距離的點。 、嘴及 11 200808456 此接觸點為第一感測器130感測喷嘴111接觸及離開基板 10之距離停止改變或恢復改變之處。也就是，當噴嘴U1向 下朝基板10移動時，第一感測器130感測之距離改變。然而， 當喷嘴111接觸基板1〇時，第一感測器130感測之距離無變 化。當喷嘴m從基板1〇離開，第一感測器13〇感測之距離 開始變化》。 如此’第一感測器130所感測之距離於接觸點停止變動， 亦即’喷嘴111接觸基板ίο之處，以及喷嘴m離開基板1〇 開始變動之點，也就是，喷嘴nl離開接觸點。 接觸點作為設定喷嘴m及基板1〇間之距離至預定值之 參考點。也就是，喷嘴ηι從接觸點向上移動，以使噴嘴ln 及基板10間之距離達到預定值。 當預定距離因基板10之不平整表面改變時，第二調整單 凡152調整噴嘴111及基板10間之距離至預定值，以維持喷 嘴111及基板10之固定距離。此舉使膠體圖案以均勻高度及 寬度形成於基板10上。 第一調整單元152比較於塗佈時即時感測到的第二感測 裔140及基板10間之距離，以及當開始塗佈膠體於基板1〇 上，所感測到的第二感測器140及基板10間之距離。第二調 整單元152補償喷嘴m及基板1〇間兩距離的差異。也就是， 12 200808456 弟一調整單元152上下移動喷嘴111該兩距離之差異，以調整 喷嘴111及基板10間之距離至預定距離，係第一調整單元151 於塗佈前調整喷嘴111及基板10間之距離。第二調整單元152 依第一感測器130感測之距離上下移動喷嘴ill。 參考第1圖、第2圖及第3圖，現將描述調整噴嘴lu及 基板10間之距離之步驟。第2圖為塗佈頭單元之正視圖，顯 ⑩ 不喷嘴1U置於參考點之狀態。第3圖為塗佈頭單元之正視 圖，顯示定位噴嘴111之狀態，其中喷嘴ηι及基板間之距離 調整至預定值。 第調正單元151自參考點向下移動噴嘴ui，以允許 嘴ηι接觸基板1〇,並向上移動喷嘴ln以允許喷嘴⑴離開 基板10。此舉係用以制喷嘴lu接觸基板1〇之接觸點。幵 接觸點储由第—制II 13崎貞 =動’感，嘴⑴之位置來_。於接觸二止二 ^ + 111 ’第一感測器130所感測之距離停止變動，且告往 上移嘴嘴⑴，其恢復變動。此舉可重 到接觸點。 木f以正確偵測 感測广調整單元151依第-感測器13。 上移動喷嘴111崎距離，以調整 η及基板ω此輯至敢值。_ 13The Z-axis control unit 15G receives the first sensor 13G and the second sensor 14 〇 = a large lean. The Z-axis control unit 15G controls the z-axis movement unit 12 to adjust the distance between the nozzle 111 and the substrate 10. The Z-axis control unit 150 includes an adjustment unit 151 and a second adjustment unit 152. Before the coating of the Lai board 1G, the _ Xia unit (5) adjusts the nozzle (1) K) to the distance to the value. That is, the 'th-tank unit (5) == m senses when the nozzle ηι contacts the substrate 1G to leave the contact point where the detecting nozzle m contacts the substrate 10. Further, a point of a predetermined distance between the first substrates 10. , mouth and 11 200808456 This contact point is where the first sensor 130 senses that the nozzle 111 contacts and leaves the substrate 10 to stop changing or recover. That is, as the nozzle U1 moves downward toward the substrate 10, the distance sensed by the first sensor 130 changes. However, when the nozzle 111 contacts the substrate 1〇, the distance sensed by the first sensor 130 does not change. When the nozzle m is separated from the substrate 1 ,, the distance sensed by the first sensor 13 开始 starts to change. Thus, the distance sensed by the first sensor 130 stops changing at the contact point, that is, where the nozzle 111 contacts the substrate ί, and the point at which the nozzle m moves away from the substrate 1 ,, that is, the nozzle n1 leaves the contact point. The contact point serves as a reference point for setting the distance between the nozzle m and the substrate 1 to a predetermined value. That is, the nozzle ηι is moved upward from the contact point so that the distance between the nozzle ln and the substrate 10 reaches a predetermined value. When the predetermined distance is changed due to the uneven surface of the substrate 10, the second adjustment unit 152 adjusts the distance between the nozzle 111 and the substrate 10 to a predetermined value to maintain the fixed distance between the nozzle 111 and the substrate 10. This causes the colloid pattern to be formed on the substrate 10 with a uniform height and width. The first adjusting unit 152 compares the distance between the second sensing body 140 and the substrate 10 that is sensed immediately upon coating, and the second sensor 140 sensed when the coating of the glue is started on the substrate 1 . And the distance between the substrates 10. The second adjusting unit 152 compensates for the difference between the two distances between the nozzle m and the substrate 1. That is, 12 200808456 The adjustment unit 152 moves the nozzle 111 up and down to adjust the difference between the two distances to adjust the distance between the nozzle 111 and the substrate 10 to a predetermined distance. The first adjustment unit 151 adjusts the nozzle 111 and the substrate 10 before coating. The distance between them. The second adjusting unit 152 moves the nozzle ill up and down according to the distance sensed by the first sensor 130. Referring to Figures 1, 2 and 3, the steps of adjusting the distance between the nozzle lu and the substrate 10 will now be described. Figure 2 is a front view of the coating head unit, showing the state in which the nozzle 1U is placed at the reference point. Fig. 3 is a front elevational view of the coating head unit showing the state of the positioning nozzle 111 in which the distance between the nozzle ηι and the substrate is adjusted to a predetermined value. The first modulating unit 151 moves the nozzle ui downward from the reference point to allow the nozzle η to contact the substrate 1 〇 and move the nozzle ln upward to allow the nozzle (1) to leave the substrate 10. This is used to make the contact point of the nozzle lu contacting the substrate 1〇.接触 The contact point is stored by the first-stage II 13 rugged = moving sense, the position of the mouth (1). The distance sensed by the first sensor 130 at the second stop + ^ 111 ′ stops changing, and the nozzle (1) is moved upward to resume the change. This can be done to the point of contact. The wood f is correctly detected by the sensing adjustment unit 151 in accordance with the first sensor. Move the nozzle 111 to the distance to adjust the η and the substrate ω to the value. _ 13
200808456 ill及基板10間之距離於預定值 在調整噴嘴111及基板10間之距離至預定值後，達成於 塗佈時喷嘴111及基板間之距離調整，如第3圖所示。當喷嘴 111及基板10間之距離已調整至預定值，而塗佈時因基田板u 之不平整表面改變時’第二罐單元152機料ln鱼基板 10改變的距離至預定值。 在第-調整單元151調整喷嘴ηι及基板1〇間之距離至 預^值後，就在塗佈前，第二調整單元152接收並儲存第二感 測盗140感測之距離資料。第二調整單元152於塗佈時接收第 二感測器14G感測之距離資料。第二調整單元152比較塗佈時 所感測=距離與塗佈前感測之距離，以計算兩距離之差異。第 -调整單το I52料算之差異向上移動喷嘴⑴，關整喷嘴 111及基板10間之距離至預定值。 、叙叹第一感測态140於塗佈前感測之距離為“A”，而第 一感測益140於塗佈時感測之距離為“B”。 在B大於A的散況下，喷嘴m及基板ω間目前的距較 喷嘴111及基板1〇之預定距離大。因此，第二調整單元152 以差值（=B減A)向下移動噴嘴m，以調整噴嘴⑴及絲 10間之距離至預定值。 14 200808456 將第二感測器固定於Z軸移動單元之固定部分，移除了 移動第二感測器的需求，因此減少Z軸移動單元之負載。 此舉不僅於塗佈時加快調整喷嘴及基板間之距離，且可以 防止連接至第二感測器之纜線於移動時產生微粒。 以一個Z軸移動單元上下移動喷嘴可使塗佈頭之重量較 % 輕，因此，於塗佈時穩定及加速塗佈頭於X軸方向之移動。 以上所述僅為本發明之較佳實施例而已，除非另有特別說 明’並非用以限定本發明之申請補細；凡其它未脫離本發 月戶斤揭示之精神下所元成之等效改變或修飾，均應包含在下述 之申請專利範圍内。 【圖式簡單說明】200808456 The distance between the ill and the substrate 10 is at a predetermined value. After adjusting the distance between the nozzle 111 and the substrate 10 to a predetermined value, the distance between the nozzle 111 and the substrate during coating is adjusted, as shown in Fig. 3. When the distance between the nozzle 111 and the substrate 10 has been adjusted to a predetermined value, and the uneven surface of the substrate plate u is changed at the time of coating, the second tank unit 152 changes the distance of the fish substrate 10 to a predetermined value. After the first adjusting unit 151 adjusts the distance between the nozzle ηι and the substrate 1 to the preset value, the second adjusting unit 152 receives and stores the distance data sensed by the second sensing pirate 140 before coating. The second adjusting unit 152 receives the distance data sensed by the second sensor 14G at the time of coating. The second adjusting unit 152 compares the sensed distance at the time of coating with the distance sensed before coating to calculate the difference between the two distances. The first-adjustment sheet το I52 calculates the difference to move the nozzle (1) upward, and closes the distance between the nozzle 111 and the substrate 10 to a predetermined value. The first sensing state 140 is sensed to be "A" before coating, and the first sensing benefit 140 is "B" when applied. In the case where B is larger than A, the current distance between the nozzle m and the substrate ω is larger than the predetermined distance between the nozzle 111 and the substrate 1〇. Therefore, the second adjusting unit 152 moves the nozzle m downward by the difference (= B minus A) to adjust the distance between the nozzle (1) and the wire 10 to a predetermined value. 14 200808456 Fixing the second sensor to the fixed part of the Z-axis moving unit removes the need to move the second sensor, thus reducing the load on the Z-axis moving unit. This not only speeds up the adjustment of the distance between the nozzle and the substrate during coating, but also prevents the cable connected to the second sensor from generating particles when moving. Moving the nozzle up and down with a Z-axis moving unit makes the weight of the coating head lighter than %, thus stabilizing and accelerating the movement of the coating head in the X-axis direction during coating. The above is only the preferred embodiment of the present invention, unless otherwise specified, 'is not intended to limit the application of the present invention; the other equivalents are not deviated from the spirit of the present disclosure. Changes or modifications are intended to be included in the scope of the claims below. [Simple description of the map]
所附圖式提供縣發明更進一步的了解，並結合為說明書 t部份，鱗本發明之實蝴，且餅細說明_同用以說明 本發明之原理。 第1圖係本發明—實關之輯機之塗麵單元之透視 第2圖係塗佈頭 之狀態 單元之正視圖，顯示喷嘴置於參考點位置 之距 離調=:頭;:噴之嘴正=〜 15 200808456The drawings provide a further understanding of the invention of the invention, and are incorporated in the specification of the specification, and the description of the invention. Figure 1 is a perspective view of the coating unit of the present invention - the actual closing machine. Figure 2 is a front view of the state unit of the coating head, showing the distance at which the nozzle is placed at the reference point =: head;正=~ 15 200808456
【主要元件符號說明】 10 基板 20 頭支撐框 100 塗佈頭單元 110 塗佈頭 111 喷嘴 112 膠體容器 113 支撐塊 120 Z軸移動單元 121 Z轴馬達 130 第一感測器 140 第二感測器 150 Z軸控制單元 151 第一調整單元 152 第二調整單元 160 Y軸移動單元 170 X軸移動單元 16[Main component symbol description] 10 substrate 20 head support frame 100 coating head unit 110 coating head 111 nozzle 112 colloid container 113 support block 120 Z-axis moving unit 121 Z-axis motor 130 first sensor 140 second sensor 150 Z-axis control unit 151 First adjustment unit 152 Second adjustment unit 160 Y-axis movement unit 170 X-axis movement unit 16