TW200807862A - XY stage - Google Patents

XY stage Download PDF

Info

Publication number
TW200807862A
TW200807862A TW096127542A TW96127542A TW200807862A TW 200807862 A TW200807862 A TW 200807862A TW 096127542 A TW096127542 A TW 096127542A TW 96127542 A TW96127542 A TW 96127542A TW 200807862 A TW200807862 A TW 200807862A
Authority
TW
Taiwan
Prior art keywords
axis
slider
shaft
platform
deviation
Prior art date
Application number
TW096127542A
Other languages
English (en)
Chinese (zh)
Inventor
Masahiro Onuma
Yuzuru Hoshi
Original Assignee
Yokogawa Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yokogawa Electric Corp filed Critical Yokogawa Electric Corp
Publication of TW200807862A publication Critical patent/TW200807862A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
    • G05B19/19—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Control Of Position Or Direction (AREA)
  • Details Of Measuring And Other Instruments (AREA)
TW096127542A 2006-07-28 2007-07-27 XY stage TW200807862A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006205860A JP2008033610A (ja) 2006-07-28 2006-07-28 Ｘｙステージ

Publications (1)

Publication Number Publication Date
TW200807862A true TW200807862A (en) 2008-02-01

Family

ID=39022976

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096127542A TW200807862A (en) 2006-07-28 2007-07-27 XY stage

Country Status (4)

Country Link
JP (1) JP2008033610A (ko)
KR (1) KR100811669B1 (ko)
CN (1) CN101114806A (ko)
TW (1) TW200807862A (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3236329B1 (de) * 2016-04-22 2021-02-24 Siemens Aktiengesellschaft Linearantrieb und verfahren zum betrieb eines linearantriebs
KR102497342B1 (ko) * 2021-03-17 2023-02-07 하이윈 마이크로시스템 코포레이션 동적 변위 오차 보상 시스템

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60140408A (ja) * 1983-12-28 1985-07-25 Hitachi Ltd 外観検査装置
JPH04322302A (ja) * 1991-04-23 1992-11-12 Amada Co Ltd 平面移動体の位置決め制御方法
JP3480192B2 (ja) * 1996-10-01 2003-12-15 ウシオ電機株式会社 Ｘｙステージの位置決め装置
JPH10283033A (ja) * 1997-04-07 1998-10-23 Amada Co Ltd 軸送りにおける位置決め補正方法およびその装置
JP2000112527A (ja) * 1998-09-30 2000-04-21 Denso Corp 移動位置決め装置及びその移動位置決め方法
JP2003162308A (ja) 2001-11-28 2003-06-06 Matsushita Electric Ind Co Ltd 作業装置の位置決め方法および装置
JP2004087798A (ja) 2002-08-27 2004-03-18 Dainippon Screen Mfg Co Ltd 基板処理装置
JP4408682B2 (ja) * 2003-10-31 2010-02-03 株式会社日立ハイテクインスツルメンツ 電子部品装着装置
JP4327672B2 (ja) * 2004-07-14 2009-09-09 住友重機械工業株式会社 移動体位置制御装置及びこの制御装置を用いたステージ装置
KR100802596B1 (ko) * 2006-05-11 2008-02-13 (주)와이티에스 아이디위치 검사기능을 갖는 레이저마킹 시스템 및 그검사방법

Also Published As

Publication number Publication date
CN101114806A (zh) 2008-01-30
JP2008033610A (ja) 2008-02-14
KR20080011041A (ko) 2008-01-31
KR100811669B1 (ko) 2008-03-11

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