WO2019080888A1 - 多轴激光位移测量系统中干涉仪的安装偏差标定方法 - Google Patents
多轴激光位移测量系统中干涉仪的安装偏差标定方法Info
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- WO2019080888A1 WO2019080888A1 PCT/CN2018/111800 CN2018111800W WO2019080888A1 WO 2019080888 A1 WO2019080888 A1 WO 2019080888A1 CN 2018111800 W CN2018111800 W CN 2018111800W WO 2019080888 A1 WO2019080888 A1 WO 2019080888A1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
- G01B9/02072—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02027—Two or more interferometric channels or interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/70—Using polarization in the interferometer
Definitions
- the invention relates to a calibration method for mounting deviation of an interferometer in a multi-axis laser displacement measuring system, which is suitable for calibration of mounting axis deviation in a three-degree-of-freedom displacement measuring system of a multi-axis laser interferometer in a precision motion stage.
- the laser interferometer has the advantages of high measurement resolution, high precision and large measuring stroke. It is widely used in the field of precision manufacturing in measuring multi-degree-of-freedom precision motion displacement measurement systems with nanometer or sub-nanometer scale. Both academic and industrial circles have received attention.
- the measuring system of the laser interferometer is composed of a laser generator (light source), a lens, a mirror, a photoelectric converter and a data acquisition card. Since the interferometer has installation deviation during the installation process, the axis of the laser beam cannot be parallel and moved. The direction of movement of the platform. The measurement error caused by this deviation has a relatively large influence on the laser interferometer measurement system whose accuracy requirement is nanometer and sub-nanometer. At present, other auxiliary sensors are often used in industrial applications to calibrate their installation errors, and the calibration process is complicated.
- the object of the present invention is to solve the problem that the installation deviation of the interferometer is difficult to be calibrated in the multi-axis laser displacement measuring system, and propose a method for realizing the calibration deviation of the multi-axis laser interferometer by adding a redundant interferometer.
- a method for calibrating an installation deviation of an interferometer in a multi-axis laser displacement measuring system characterized in that the method comprises a motion stage 1, an interferometer 301 mounted in the X direction, and a first interferometer 302 mounted in the Y direction. And a second interferometer 303, and an added redundant interferometer 4;
- the method includes the following steps:
- L 1 is the measured value of the redundant interferometer
- L 2 is the measured value of the interferometer installed in the X direction
- S 1 is the measured value of the first interferometer installed in the Y direction
- S 2 is mounted in the Y direction
- d is the mounting pitch of the redundant interferometer and the interferometer mounted in the X direction in the Y direction
- r is the first interferometer mounted in the Y direction and the second interferometer in the X direction
- the installation pitch x is the displacement of the motion table along the X-axis of the coordinate system
- y is the displacement of the motion table along the Y-axis of the coordinate system
- ⁇ z is the rotational displacement of the motion table around the Z-axis of the coordinate system
- a 1 , b 1 and b 2 Is the intermediate variable
- ⁇ 1 is the angle of installation deviation between the X-axis interferometer and the coordinate system X-axis. Is the
- Sports station (1) continuous movement 3 positions with Where x 1 , x 2 and x 3 are the displacements of the position points P1, P2, P3 in the coordinate system X axis, respectively, and y 1 , y 2 and y 3 are the position points P1, P2, P3, respectively, in the coordinate system Y axis Displacement, with They are the rotational displacements of the position points P1, P2, and P3 around the coordinate system Z axis; the interferometers installed in the X and Y directions and the redundant interferometer respectively obtain the measured values of the corresponding position points, and form the following equations:
- step 3) the measured values of the interferometers and redundant interferometers installed in the X and Y directions
- the redundant interferometer and the interferometer mounting pitch d installed in the X direction, the mounting distance r of the first interferometer installed in the Y direction and the second interferometer are all known, and the equation group is solved to obtain the mounting deviation clip.
- Angle ⁇ 1 with
- the interferometer adopts a laser interferometer.
- the calibration method for mounting position of an interferometer in a multi-axis laser displacement measuring system has the following advantages and outstanding technical effects: using redundant measurement information, the calibration process is simple; in a multi-axis laser interferometer displacement measuring system A redundant interferometer is added. By continuously measuring the displacement information of a plurality of position points, the number of equations in the set of displacement solving equations is equal to the number of unknowns, thereby realizing the calibration of the installation deviation of the laser interferometer. This method is easy to implement in industrial applications without the aid of other auxiliary displacement sensors.
- FIG. 1 is a schematic diagram of a calibration method for mounting deviation of an interferometer in a multi-axis laser displacement measuring system according to the present invention.
- Figure 2 is a schematic diagram of the measurement when there is a mounting deviation of the single-axis laser interferometer.
- FIG. 1 is a schematic diagram of a calibration method for mounting deviation of an interferometer in a three-axis laser displacement measurement according to the present invention, which includes an interferometer 301 mounted in the X direction, a first interferometer 302 and a second interferometer 303 installed in the Y direction. And an increased redundant interferometer 4; the specific implementation steps of the method are as follows:
- L 1 is the measured value of the redundant interferometer
- L 2 is the interferometer measured value installed in the X direction
- S 1 is the first interferometer measured value installed in the Y direction
- S 2 is the second mounted in the Y direction.
- Interferometer measurement d is the mounting pitch of the redundant interferometer and the X-interferometer in the Y direction
- r is the mounting pitch of the first interferometer and the second interferometer mounted in the Y direction in the X direction
- x is The displacement of the motion table along the X-axis of the coordinate system
- y is the displacement of the motion table along the Y-axis of the coordinate system
- ⁇ z is the rotational displacement of the motion table around the Z-axis of the coordinate system
- a 1 , b 1 and b 2 are intermediate variables
- ⁇ 1 Is the installation angle of the X-axis interferometer and the X-axis. Is the installation angle between the first interferometer installed in the Y direction
- the sports station continuously moves 3 positions with x 1 , x 2 and x 3 are displacements of the position points P1, P2, P3 in the coordinate system X axis, respectively, and y 1 , y 2 and y 3 are the position points P1, P2, P3 in the coordinate system Y axis, respectively.
- Displacement with They are the rotational displacements of the position points P1, P2, and P3 around the coordinate system Z axis; the interferometers installed in the X direction, the first interferometer in the Y direction, the second interferometer, and the redundant interferometer respectively obtain the corresponding position points.
- the measured values of the redundant interferometer at three position points P1, P2 and P3, respectively. with The measured values of the interferometer mounted in the X direction, the first interferometer in the Y direction, and the second interferometer at 3 position points, respectively;
- the measured values of the X- and Y-direction interferometers and redundant interferometers are installed.
- the redundant interferometer and the interferometer mounting pitch d installed in the X direction, the mounting pitch r of the first interferometer and the second interferometer installed in the Y direction are known, and the values of d and r are design values. .
- the installation deviation angle ⁇ 1 can be obtained by solving the equations (5). with
- the installation deviation calibration of the three-axis laser interferometer can be realized by a simple operation, and the auxiliary displacement sensor is not required, and the method is simple and easy for industrial application.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Abstract
一种多轴激光位移测量系统中干涉仪的安装偏差标定方法,是在激光干涉仪位移测量系统中,增加一个或多个冗余干涉仪(4)。然后建立包含激光干涉仪安装偏差的位移解算方程,通过连续测量多个位置点的位移信息,得到冗余测量信息,组合形成的位移解算方程个数等于未知量个数,进而利用此方程组求解得到干涉仪的安装偏差。通过采用冗余布置激光干涉仪方法,实现其安装偏差自标定。无需借助其他更高精度的位移传感器,可解决工业应用中多轴干涉仪安装偏差难以标定的问题。
Description
本发明涉及一种多轴激光位移测量系统中干涉仪的安装偏差标定方法,适用于精密运动台中多轴激光干涉仪三自由度位移测量系统中的测量轴安装偏差标定。
激光干涉仪具有测量分辨率高、精度高、测量行程大等优势,在精密制造领域中,被广泛应用于测量分辨率需求在纳米或亚纳米级的多自由度精密运动位移测量系统中,在学术界和工业界均受到关注。
激光干涉仪的测量系统是有激光发生器(光源)、透镜、反射镜、光电转换器以及数据采集卡等组成,由于在安装过程中,干涉仪存在安装偏差,激光光束所在轴线不能平行与运动台的运动方向。该偏差引起的测量误差,对于精度需求是纳米和亚纳米级的激光干涉仪测量系统来说,会产生相对较大影响。目前,工业应用中常借助其他辅助传感器,用于对其安装误差进行标定,标定过程复杂。
因此,一种不需要借助其他辅助传感器,且能简单有效标定激光干涉仪位移测量系统安装偏差的方法亟待提出。
发明内容
本发明的目的在于针对多轴激光位移测量系统中干涉仪安装偏差难以标定的问题,提出一种通过增加冗余干涉仪,实现多轴激光干涉仪安装偏差标定的方法。
本发明所采用的技术方案如下:
所涉及的一种多轴激光位移测量系统中干涉仪的安装偏差标定方法,其特征在于:该方法包括运动台1、安装在X向的干涉仪301、安装在Y向的第一干涉仪302和第二干涉仪303、以及增加的冗余干涉仪4;
所述方法包括如下步骤:
1)安装冗余干涉仪4,设定其为安装参考轴;并以运动台1的几何中心为原点建立坐标系OXYZ,坐标系X轴与冗余干涉仪4的光束所在方向平行;
2)建立包含安装在X向的干涉仪301、安装在Y向的第一干涉仪302、第二干涉仪303的安装偏差和冗余干涉仪4的三自由度位移解算模型:
式中:
其中L
1是冗余干涉仪的测量值,L
2是安装在X向的干涉仪的测量值,S
1是安装在Y向的第一干涉仪的测量值,S
2是安装在Y向的第二干涉仪的测量值,d是冗余干涉仪和安装在X向的干涉仪在Y方向上的安装间距,r是安装在Y向的第一干涉仪和第二干涉仪在X方向上的安装间距,x是运动台沿坐标系X轴的位移,y是运动台沿坐标系Y轴的位移,θ
z是运动台绕坐标系Z轴的旋转位移,a
1、b
1和b
2是中间变量,η
1是安装在X向的干涉仪与坐标系X轴的安装偏差夹角,
是安装在Y向的第一干涉仪与坐标系Y轴的安装偏差夹角,
是安装在Y向的第二干涉仪与坐标系Y轴的安装偏差夹角;
3)运动台(1)连续运动3个位置点
和
其中,x
1、x
2和x
3分别是位置点P1、P2、P3在坐标系X轴向的位移,y
1、y
2和y
3分别是位置点P1、P2、P3在坐标系Y轴向的位移,
和
分别是位置点P1、P2、P3绕坐标系Z轴的旋转位移;安装在X向、Y向的干涉仪和冗余干涉仪分别得到相应位置点的测量值,并组成如下的方程组:
4)在上述步骤3)的方程组中,安装在X向、Y向的干涉仪和冗余干涉仪的测量值
以及冗余干涉仪和安装在X向的干涉仪安装间距d、安装在Y向的第一干涉仪和第二干涉仪的安装间距r均为已知量,求解此方程组,得到安装偏差夹角η
1,
和
其中:
上述技术方案中,所述的干涉仪采用激光干涉仪。
本发明提供的一种多轴激光位移测量系统中干涉仪的安装位置标定方法具有以下优点及突出性的技术效果:利用冗余测量信息,标定过程简单;在多轴激光干涉仪位移测量系统中增加一个冗余干涉仪,通过连续测量多个位置点的位移信息,组合形成的位移解算方程组中的方程个数等于未知量个数,从而实现激光干涉仪安装偏差的标定。该方法无需借助其他辅助位移传感器,易于在工业应用中实现。
图1为本发明多轴激光位移测量系统中干涉仪的安装偏差标定方法示意图。
图2为单轴激光干涉仪存在安装偏差时的测量原理图。
其中:1-运动台;2-平面反射镜;1′-移动位移S后的运动台;S-运动台在X向位移;3-单轴激光干涉仪;301-安装在X向的干涉仪;302-安装在Y向的第一干涉仪;303-安装在Y向的第二干涉仪;4-增加的冗余干涉仪。
以运动平台的三轴激光干涉仪三自由度位移测量系统为例,下面结合附图对本发明的具 体实施方式作进一步详细描述。
图1为本发明所述的三轴激光位移测量中干涉仪的安装偏差标定方法示意图,其包括安装在X向的干涉仪301,安装在Y向的第一干涉仪302和第二干涉仪303和增加的冗余干涉仪4;该方法具体实施步骤如下:
1)在三轴激光干涉仪测量系统中,安装一个冗余干涉仪,设定其为安装参考轴;然后以运动台的几何中心为原点O建立坐标系OXYZ,坐标系X轴与冗余干涉仪的激光束所在方向平行;
式中:
其中L
1是冗余干涉仪的测量值,L
2是安装在X向的干涉仪测量值,S
1是安装在Y向的第一干涉仪测量值,S
2是安装在Y向的第二干涉仪测量值,d是冗余干涉仪和X向干涉仪在Y方向上的安装间距,r是安装在Y向的第一干涉仪和第二干涉仪在X方向上的安装间距,x是运动台沿坐标系X轴的位移,y是运动台沿坐标系Y轴的位移,θ
z是运动台绕坐标系Z轴的旋转位移,a
1、b
1和b
2是中间变量,η
1是安装在X向的干涉仪与X轴的安装偏差夹角,
是安装在Y向的第一干涉仪与Y轴的安装偏差夹角,
是安装在Y向的第二干涉仪与Y轴的安装偏差夹角。
式中中间变量a
1、b
1和b
2是根据单轴激光干涉仪存在安装偏差时的测量结果分析得到的。如图2所示为单轴干涉仪存在安装偏差时的测量原理。设单轴激光干涉仪与坐标系X轴的安装偏差夹角为θ,运动台在X向移动位移S后,单轴干涉仪的测量值R与运动台的运动位移S之间的关系为:
对θ取一阶泰勒近似,可得:
根据公式(4),可得到与安装偏差夹角有关的中间变量a
1、b
1和b
2。
3)运动台连续运动3个位置点
和
x
1、x
2和x
3分别是位置点P1、P2、P3在坐标系X轴向的位移,y
1、y
2和y
3分别是位置点P1、P2、P3在坐标系Y轴向的位移,
和
分别是位置点P1、P2、P3绕坐标系Z轴的旋转位移;安装在X向的干涉仪、Y向的第一干涉仪和第二干涉仪、冗余干涉仪分别得到相应位置点的测量值,并组成如下的方程组(5):
4)上述步骤3)中的方程组(5),共有12个方程,12个未知数,其中包括3个安装偏差η
1、
和9个位移值x
1、y
1、
x
2、y
2、
x
3、y
3、
在此方程中,安装在X向、Y向的干涉仪和冗余干涉仪的测量值
以及冗余干涉仪和安装在X向的干涉仪安装间距d、安装在Y向的第一干涉仪和第二干涉仪的安装间距r均为已知量,d和r的取值为设计值。
其中:
通过上述步骤,只要通过简单的运算就可以实现三轴激光干涉仪的安装偏差标定,不需借助其他辅助位移传感器,方法简单,易于工业应用。
Claims (2)
- 一种多轴激光位移测量系统中干涉仪的安装偏差标定方法,所述的多轴激光位移测量系统包括运动台(1)、安装在X向的干涉仪(301)、安装在Y向的第一干涉仪(302)和第二干涉仪(303),其特征在于所述标定方法包括如下步骤:1)安装冗余干涉仪(4),设定其为安装参考轴;并以运动台(1)的几何中心为原点建立坐标系OXYZ,坐标系X轴与冗余干涉仪(4)的光束所在方向平行;2)建立包含安装在X向的干涉仪(301)以及安装在Y向的第一干涉仪(302)、第二干涉仪(303)的安装偏差和冗余干涉仪(4)的三自由度位移解算模型:式中:其中L 1是冗余干涉仪的测量值,L 2是安装在X向的干涉仪的测量值,S 1是安装在Y向的第一干涉仪的测量值,S 2是安装在Y向的第二干涉仪的测量值,d是冗余干涉仪和安装在X向的干涉仪在Y方向上的安装间距,r是安装在Y向的第一干涉仪和第二干涉仪在X方向上的安装间距,x是运动台沿坐标系X轴的位移,y是运动台沿坐标系Y轴的位移,θ z是运动台绕坐标系Z轴的旋转位移,a 1、b 1和b 2是中间变量,η 1是安装在X向的干涉仪与坐标系X轴的安装偏差夹角, 是安装在Y向的第一干涉仪与坐标系Y轴的安装偏差夹角, 是安装在Y向的第二干涉仪与坐标系Y轴的安装偏差夹角;3)运动台(1)连续运动3个位置点 和 其中,x 1、x 2和x 3分别是位置点P1、P2、P3在坐标系X轴向的位移,y 1、y 2和y 3分别是位置点P1、P2、P3在坐标系Y轴向的位移, 和 分别是位置点P1、P2、P3绕坐标系Z轴的旋转位移;安装在X向、Y向的干涉仪和冗余干涉仪分别得到相应位置点的测量值,并组成如 下的方程组:4)在上述步骤3)的方程组中,安装在X向、Y向的干涉仪和冗余干涉仪的测量值 以及冗余干涉仪和安装在X向的干涉仪安装间距d、安装在Y向的第一干涉仪和第二干涉仪的安装间距r均为已知量,求解此方程组,得到安装偏差夹角η 1, 和其中:
- 如权利要求1所述的一种多轴激光位移测量系统中干涉仪的安装偏差标定方法,其特征在于:所述的干涉仪采用激光干涉仪。
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CN111678428A (zh) * | 2020-06-30 | 2020-09-18 | 中国计量科学研究院 | 一种激光跟踪干涉仪多站异步坐标标定方法 |
CN113551600A (zh) * | 2021-07-29 | 2021-10-26 | 河北工业大学 | 一种二维运动平台路径精度的检测系统 |
WO2022111940A1 (en) * | 2020-11-26 | 2022-06-02 | Asml Netherlands B.V. | A mirror spot position calibrating method, a lithographic apparatus and a device manufacturing method |
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Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5341702A (en) * | 1991-09-10 | 1994-08-30 | Renishaw Transducer Systems Limited | Apparatus for calibration of an angular displacement |
US20080049211A1 (en) * | 2006-08-25 | 2008-02-28 | Mitutoyo Corporation | Optical-axis deflection type laser interferometer, calibration method thereof, correcting method thereof, and measuring method thereof |
US20100020330A1 (en) * | 2008-07-25 | 2010-01-28 | Geraint Owen | Interferometer Calibration System and Method |
CN103499292A (zh) * | 2013-10-11 | 2014-01-08 | 哈尔滨工业大学 | 基于双标准光轴的角位移激光干涉仪校准方法与装置 |
CN103528500A (zh) * | 2013-10-11 | 2014-01-22 | 哈尔滨工业大学 | 基于四标准光轴的线位移激光干涉仪校准方法与装置 |
CN104297718A (zh) * | 2014-09-29 | 2015-01-21 | 西安空间无线电技术研究所 | 一种干涉仪阵列综合校准方法 |
CN106154762A (zh) * | 2015-04-15 | 2016-11-23 | 上海微电子装备有限公司 | 一种干涉仪误差校准装置及校准方法 |
CN106154753A (zh) * | 2015-03-26 | 2016-11-23 | 上海微电子装备有限公司 | 一种工件台干涉仪切换偏差校准方法 |
CN107560553A (zh) * | 2017-10-26 | 2018-01-09 | 清华大学 | 多轴激光位移测量系统中干涉仪的安装偏差标定方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09275072A (ja) * | 1996-04-05 | 1997-10-21 | Nikon Corp | 移動鏡の真直度誤差補正方法及びステージ装置 |
US5757160A (en) * | 1996-12-23 | 1998-05-26 | Svg Lithography Systems, Inc. | Moving interferometer wafer stage |
US20030020924A1 (en) * | 2001-06-19 | 2003-01-30 | Fuyuhiko Inoue | Interferometer system |
JP3890233B2 (ja) * | 2002-01-07 | 2007-03-07 | キヤノン株式会社 | 位置決めステージ装置、露光装置及び半導体デバイスの製造方法 |
US7274462B2 (en) * | 2002-09-09 | 2007-09-25 | Zygo Corporation | In SITU measurement and compensation of errors due to imperfections in interferometer optics in displacement measuring interferometry systems |
WO2006041984A2 (en) * | 2004-10-06 | 2006-04-20 | Zygo Corporation | Error correction in interferometry systems |
US7876452B2 (en) * | 2007-03-05 | 2011-01-25 | Nikon Corporation | Interferometric position-measuring devices and methods |
-
2017
- 2017-10-26 CN CN201711013864.7A patent/CN107560553B/zh active Active
-
2018
- 2018-10-25 US US16/759,294 patent/US11022423B2/en active Active
- 2018-10-25 WO PCT/CN2018/111800 patent/WO2019080888A1/zh active Application Filing
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5341702A (en) * | 1991-09-10 | 1994-08-30 | Renishaw Transducer Systems Limited | Apparatus for calibration of an angular displacement |
US20080049211A1 (en) * | 2006-08-25 | 2008-02-28 | Mitutoyo Corporation | Optical-axis deflection type laser interferometer, calibration method thereof, correcting method thereof, and measuring method thereof |
US20100020330A1 (en) * | 2008-07-25 | 2010-01-28 | Geraint Owen | Interferometer Calibration System and Method |
CN103499292A (zh) * | 2013-10-11 | 2014-01-08 | 哈尔滨工业大学 | 基于双标准光轴的角位移激光干涉仪校准方法与装置 |
CN103528500A (zh) * | 2013-10-11 | 2014-01-22 | 哈尔滨工业大学 | 基于四标准光轴的线位移激光干涉仪校准方法与装置 |
CN104297718A (zh) * | 2014-09-29 | 2015-01-21 | 西安空间无线电技术研究所 | 一种干涉仪阵列综合校准方法 |
CN106154753A (zh) * | 2015-03-26 | 2016-11-23 | 上海微电子装备有限公司 | 一种工件台干涉仪切换偏差校准方法 |
CN106154762A (zh) * | 2015-04-15 | 2016-11-23 | 上海微电子装备有限公司 | 一种干涉仪误差校准装置及校准方法 |
CN107560553A (zh) * | 2017-10-26 | 2018-01-09 | 清华大学 | 多轴激光位移测量系统中干涉仪的安装偏差标定方法 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111678428A (zh) * | 2020-06-30 | 2020-09-18 | 中国计量科学研究院 | 一种激光跟踪干涉仪多站异步坐标标定方法 |
CN111678428B (zh) * | 2020-06-30 | 2021-11-16 | 中国计量科学研究院 | 一种激光跟踪干涉仪多站异步坐标标定方法 |
WO2022111940A1 (en) * | 2020-11-26 | 2022-06-02 | Asml Netherlands B.V. | A mirror spot position calibrating method, a lithographic apparatus and a device manufacturing method |
CN113551600A (zh) * | 2021-07-29 | 2021-10-26 | 河北工业大学 | 一种二维运动平台路径精度的检测系统 |
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