TW200802531A - Heat treatment unit, heat treatment method, and computer-readable recording medium - Google Patents

Heat treatment unit, heat treatment method, and computer-readable recording medium

Info

Publication number
TW200802531A
TW200802531A TW095144627A TW95144627A TW200802531A TW 200802531 A TW200802531 A TW 200802531A TW 095144627 A TW095144627 A TW 095144627A TW 95144627 A TW95144627 A TW 95144627A TW 200802531 A TW200802531 A TW 200802531A
Authority
TW
Taiwan
Prior art keywords
heat treatment
temperature
computer
recording medium
readable recording
Prior art date
Application number
TW095144627A
Other languages
Chinese (zh)
Other versions
TWI371777B (en
Inventor
Yasutaka Souma
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200802531A publication Critical patent/TW200802531A/en
Application granted granted Critical
Publication of TWI371777B publication Critical patent/TWI371777B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Tunnel Furnaces (AREA)
  • Photovoltaic Devices (AREA)

Abstract

Heat treatment unit 28 has the roller transportation mechanism 5 as the transportation path where the substrate G is transported to one direction and the heating mechanism 7 that heats the substrate G which are transported on the transportation path. As for the heating mechanism 7, a preheating part 7a and a main heating part 7b are arranged from the transportation direction upstream side along the transportation path. A main heating part 7b is set at the first temperature, and the preheating part 7a is set at the second temperature that is higher than the first temperature. After the substrate G is heated to the first temperature neighborhood in the preheating part 7a, the heating mechanism 7 is heated at the first temperature in a main heating part 7b.
TW095144627A 2005-12-06 2006-12-01 Heat treatment unit, heat treatment method, and computer-readable recording medium TWI371777B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005352131A JP4672538B2 (en) 2005-12-06 2005-12-06 Heat treatment device

Publications (2)

Publication Number Publication Date
TW200802531A true TW200802531A (en) 2008-01-01
TWI371777B TWI371777B (en) 2012-09-01

Family

ID=38130874

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095144627A TWI371777B (en) 2005-12-06 2006-12-01 Heat treatment unit, heat treatment method, and computer-readable recording medium

Country Status (4)

Country Link
JP (1) JP4672538B2 (en)
KR (1) KR101332120B1 (en)
CN (1) CN100454482C (en)
TW (1) TWI371777B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI557389B (en) * 2014-10-24 2016-11-11 Dong-Ming Li Improvement of Heating Device of Light Resistance Pre - oven

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KR101464207B1 (en) * 2008-05-30 2014-11-24 세메스 주식회사 Flat panel display manufacturing apparatus and ir heater used in manufacturing flat panel display
JP4592787B2 (en) * 2008-07-11 2010-12-08 東京エレクトロン株式会社 Substrate processing equipment
JP4638931B2 (en) * 2008-09-12 2011-02-23 東京エレクトロン株式会社 Substrate processing equipment
JP4813583B2 (en) * 2009-07-15 2011-11-09 東京エレクトロン株式会社 Substrate processing equipment
JP2011222834A (en) * 2010-04-12 2011-11-04 Hoya Corp Baking apparatus, method for forming resist pattern, method for manufacturing photo mask, and method for manufacturing mold for nanoimprint
JP5063741B2 (en) * 2010-06-03 2012-10-31 東京エレクトロン株式会社 Heat treatment apparatus and heat treatment method
JP5226037B2 (en) * 2010-06-04 2013-07-03 東京エレクトロン株式会社 Heat treatment apparatus and heat treatment method
JP5048810B2 (en) * 2010-06-23 2012-10-17 東京エレクトロン株式会社 Heat treatment apparatus and heat treatment method
JP5377463B2 (en) * 2010-11-16 2013-12-25 東京エレクトロン株式会社 Heat treatment device
JP7403234B2 (en) * 2019-04-25 2023-12-22 東京エレクトロン株式会社 Substrate processing equipment and substrate processing method

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JPS5875154A (en) * 1981-10-29 1983-05-06 Toppan Printing Co Ltd Heater
JPH0193121A (en) * 1987-10-05 1989-04-12 Kawasaki Steel Corp Semiconductor wafer baking device
JPS64738A (en) * 1988-05-20 1989-01-05 Hitachi Ltd Heat treatment of semiconductor wafer
JP2691907B2 (en) * 1988-05-27 1997-12-17 東京エレクトロン株式会社 Heating method, processing apparatus and processing method
JP2931992B2 (en) * 1990-06-02 1999-08-09 東京エレクトロン株式会社 Heat treatment equipment
JPH05304085A (en) * 1992-04-27 1993-11-16 Fujitsu Ltd Semiconductor wafer baking device
JPH07135154A (en) * 1993-06-18 1995-05-23 Hitachi Ltd Method and device of baking photoresist film
JP3052116B2 (en) * 1994-10-26 2000-06-12 東京エレクトロン株式会社 Heat treatment equipment
JPH0953881A (en) * 1995-08-11 1997-02-25 Fuji Photo Film Co Ltd Baking device of hard board
JP3811247B2 (en) * 1997-02-17 2006-08-16 大日本スクリーン製造株式会社 Substrate heating device
JP3596312B2 (en) * 1998-10-27 2004-12-02 松下電器産業株式会社 Heat treatment equipment
JP4040814B2 (en) * 1998-11-30 2008-01-30 株式会社小松製作所 Disk heater and temperature control device
JP4042244B2 (en) * 1999-02-23 2008-02-06 松下電工株式会社 Semiconductor microactuator, semiconductor microvalve, and semiconductor microrelay
US20020088608A1 (en) * 1999-07-26 2002-07-11 Park Chan-Hoon Method and apparatus for heating a wafer, and method and apparatus for baking a photoresist film on a wafer
JP2001230199A (en) * 1999-07-28 2001-08-24 Komatsu Ltd Temperature controller for semiconductor substrate and heat exchange plate
US6344631B1 (en) * 2001-05-11 2002-02-05 Applied Materials, Inc. Substrate support assembly and processing apparatus
JP2003279245A (en) * 2002-03-19 2003-10-02 Seiko Epson Corp Drying method and device for coating film, manufacturing method for device, and device
WO2004010480A1 (en) * 2002-07-24 2004-01-29 Applied Materials, Inc. Apparatus and method for thermally isolating a heat chamber
JP4384538B2 (en) * 2003-06-16 2009-12-16 東京エレクトロン株式会社 Substrate processing apparatus and substrate processing method
JP4257586B2 (en) * 2003-10-20 2009-04-22 富士電機システムズ株式会社 Substrate processing method
JP4741307B2 (en) * 2005-05-20 2011-08-03 富士フイルム株式会社 Heating apparatus and heating method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI557389B (en) * 2014-10-24 2016-11-11 Dong-Ming Li Improvement of Heating Device of Light Resistance Pre - oven

Also Published As

Publication number Publication date
CN100454482C (en) 2009-01-21
JP4672538B2 (en) 2011-04-20
KR101332120B1 (en) 2013-11-21
JP2007158088A (en) 2007-06-21
TWI371777B (en) 2012-09-01
KR20070059990A (en) 2007-06-12
CN1979764A (en) 2007-06-13

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees